PHYSICAL VAPOR DEPOSITION and ION BEAM MILLING

NANOQUEST I

Up to 22cm D.C. or R.F. Ion Source

Load-lock accommodates up to 4” wafers Retractable SIMS

End-point Detector

SiO2 Passivation by R.F. Sputtering

D.C., A.C., or R.F. Magnetron Sputtering

4cm R.F. Ion Source for IBS with Target Indexer

Direct Water-cooled Stage

Fully customizable, compact platform for ion beam processes

NANOQUEST ION BEAM ETCH

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OPTIONS INCLUDE:• Ion Beam Sputtering• Magnetron Sputtering• In-situ Camera• S.I.M.S. End-point Detection• Load-lock accommodates up to 8” wafers

FEATURES• 22 or 36 cm RF ICP

Ion Source• Up to 3×6”

Planetary• S.I.M.S. End-point

Detection• Load-lock up to 8”

wafers

NANOQUEST II

NANOQUEST III

Ion Beam Etch platform for wafers up to 8”

Multi-substrate ion milling system with next-gen RF ICP ion source.

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NANOCHROME™ I

NANOCHROME™ II

Thin Film Deposition System

Thin Film Deposition System

PROCESS• Ion Beam Assisted Deposition• e-Beam Evaporation• Thermal Evaporation• Magnetron Sputtering• Co-Evaporation• Reactive growth

FEATURES• Ion source for Assist,

Reactive Operation and Pre-cleaning

• IR lamps for substrate pre-heating• Customized substrate holder• Load-lock option

NANOCHROME™ PHYSICAL VAPOR

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NANOCHROME™ IV PARMS Advanced Plasma Deposition

The New Nanochrome™ IV (PARMS) produces dielectric thin film layers by advanced plasma deposition. The new Nanochrome™ IV (PARMS) is designed to produce high quality oxide and nitride films. Shift-free, hard coatings are used to produce complex interference filters. Our ultra-stable deposition process with optical monitoring through the substrate has been proven in daily production environments.

Oxides that have been produced in the NC-IV, from metal targets, include Tantalum, Niobium, Titanium, Aluminum, Zirconium and Silicon. The films are suitable for the

UV, VIS NIR, SWIR, and MWIR ranges. It can also produce transparent conductive AZO.

The Intlvac PARMS is a cost effective alternative to Ion Beam Sputtering, out-producing IBS on a daily basis.

DEPOSITION

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PICO PVD & ION BEAM ETCH

NANOCHROME™ PICO

NANOQUEST PICO

The low cost and small footprint of the Nanochrome™ Pico make it ideal for working with small substrates that are irregular in shape and difficult to mount.

Designed for variable angle etching with continuous rotation and cooling of small wafer pieces using inert gas. The low cost and small footprint of the NQ Pico make it ideal when working with 1×1” dies or other small substrates, up to 4” wafers.

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This production machine is designed to produce a single or multilayer fully symmetrical metal coating on ends, or mid spans, of optical fibers. Window coating can also be achieved. The system uses a low energy plasma pre-clean to ensure adhesion by removing residual hydrocarbon and water vapour contamination. The coating chamber has an array of sputter cathodes allowing for different metal and multilayer combinations.

NANOCHROME™ I LONG THROW EVAPORATOR

FIBER METALIZATION SYSTEM

The Long Throw Evaporator is designed for “lift off” processes providing a high level of automatically or manually con-trolled deposition of materials.

Applications: • Indium-Bump bonding for fabrication

of focal plane arrays.• Ohmic contacts for III-V and II-VI

materials with diffusion barriers

Optional features:• Double axis planetary motion• Cooling to -70°C• Low energy pre-cleaning in an

automated load lock

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Intlvac Thin Film has a long-standing commitment to quality and excellence in the optical coating industry. Our goal is to deliver value-added solutions that exceed expectations. Research and development play a major role in our technology’s edge in the market.

PROVIDING LEADING-EDGE TECHNOLOGY SOLUTIONS

Intlvac Thin Film Corporation247 Armstrong Avenue, Unit 6, Halton Hills, Ontario, Canada L7G 1G8

Phone: 905.873.0166, Fax: 905.873.0168

800.959.5517 • www.int lvacthinf i lm.ca

PECVD DIAMOND LIKE CARBONSUBSTRATES FOR DLCIR Optics: • Silicon, GermaniumPlastics: • Ultem, Polycarbonate, Polyimide, PEEKGlass: • Crown Glass, UVFS, SF11, SapphireMetals: • Aluminum, Copper, High-carbon Steel.

APPLICATIONSOpticsDLC coating acts as a single-layer anti-reflection coating for high index substrates and it provides wear & chemical resistance for optical elements used in harsh environments.

Bio-engineeringDLC provides advantages of bio-compatibility, wear resistance, and diffusion resistance.

Mechanical EngineeringDLC provides wear & corrosion resistance, low friction, and good thermal conductivity.

11/2016