one batch of the IC are from 15 IC for reason of reasonable uniform of flux
description
Transcript of one batch of the IC are from 15 IC for reason of reasonable uniform of flux
• one batch of the IC are from 15 IC for reason of reasonable uniform of flux
• 1 central IC is as reference chamber• set up HV max 1500V• 50 measured points each 1 sec
• leakage current measurements done with picometer (noice +/-0.3 pA)
• switch on rad source: Cs-137, activity 98 GBq, distance from IC-source-1.4 m, dose
rate – 4.7 mSv/h • 50 measured points for rad source signal
• next batch… IC1330:Rad Source Measurements
72.0
73.074.0
75.076.0
77.0
78.079.0
80.0
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16
Reception test measurementsBehavior for reference IC during the one day , 16 batches
IC1330:LC
0.0
0.5
1.0
1.5
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16
pA
pA
N of the batch
N of the batch
1
8
15
.
.
.
.1.4 m Source
Leakage Current Measurements
0.00
0.20
0.40
0.60
0.80
1.00
1.20
1.40
1 2 3 4 5 6 7 8 9 10
IC
LC
,pA
Central IC
0.000.200.400.600.80
1.001.201.401.60
1 11 21 31 41 51 61 71
N of measurements
LC
,pA
March,2007, GIF1080 IC : Dec06,Jan07,Feb07 production
The same 10 IC measured twiceThe change of LC for reference IC during of the all 79 sets
0
10
20
30
40
50
60
70
80
90
0.0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1.0
1.1
1.2
1.3
1.4
1.5
1.6
LC,pA
N o
f IC
The 4 IC from 1080 measured at GIF has a LC problems.
1080 IC : Dec06,Jan07,Feb07 production
N of the measurements
-5.0-3.0-1.01.03.05.07.09.0
11.013.015.017.019.0
0 1000 2000 3000 4000
Leakage Current Measurementssummary
4250 IC :IHEP production
The IC with LC <2 pA accepted. The ~20 IC from 4250 measured at GIF has a big LC or some problemsIt checked in the Lab.
pA
N of the IC
Rad. Source Measurements
62.00
64.00
66.00
68.00
70.00
72.00
74.00
76.00
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15
Batch14:Rad
66.0
68.0
70.0
72.0
74.0
76.0
78.0
1 2 3 4 5 6 7 8 9 1 11 1 1 1 15
Batch15:Rad
66.0
68.0
70.0
72.0
74.0
76.0
78.0
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15
The signal from RS for two batches
The summary of signal for all batches during of the one day measurements
pA
Order N of the IC place in one batch
pA pA
N of the IC place in one batchN of the IC place in one batch
Rad Source signal at GIF
50.0
55.0
60.0
65.0
70.0
75.0
80.0
1 501 1001 1501 2001 2501 3001 3501 4001
53.00
54.00
55.00
0 5 10 15 20 25 30 35 40 45
4250 IC :IHEP production
40 first measured ICat RP source facility
pA
N of the IC
The RS signal +/- 5 %. The further analysis: flux uniform, reference IC signal, all chambers will be done.