NOV 2015 - Raith Downloads... · Chinese Academy of Sciences in Beijing. The meeting was perfectly...
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Transcript of NOV 2015 - Raith Downloads... · Chinese Academy of Sciences in Beijing. The meeting was perfectly...
No. 38NOV 2015
Your challenge is our mission.
New
No. 38NOV 2015
Table of Content
Product News• The new EBPG5150 - Select first choice evolutionary technology• NanoSense - Adding 3D to conventional SEM or FIB surface imaging information
Conferences and Events• Raith NANO 2016 - register now• Raith User Meetings - More than 500 users met in 2015
Service and Support News• Always at your service - introduction of Raith’s service and support organization, the world’s largest customer support network
Customer Success Stories• Raith EBPG5000 EBL system and 3 ELPHY Nanolithography upgrade kits installed at BINNCAS
• Raith EBPG5200 installed at Nanjing University, China
Other• Raith Micrograph Award 2015• Wall Calender 2016 - get your free copy
Automated system calibration
• Electron optics settings
• Off & on axis focus and atigmation corrections
• Distortion corrections of write field
Microdisk Resonator Xufeng Zhang; Yale University, USA GaAs T gate device Split ring resonators, Paul Scherrer Institute
10 µm
No. 38NOV 2015
Product News
The new EBPG5150 - Select First-choice Evolutionary Technology
To maintain its position at the leading edge of research and development, Raith has always offered its customers the most affordable and best possible technical solutions. Consistent with this policy, we areproud to present a new system within our portfolio: the EBPG5150.
This is a further evolutionary development based upon the EBPG5200 and the highly successful EBPG5000 series, which has now been in produc-tion for over 15 years.
The EBPG5000 has therefore incorporated the advantages of the EBPG5200 series updates by following a common parts strategy with respect to the system plinth and system electronics. The
EBPG5150 replaces the EBPG5000 while retaining all the automation and flexibility of the 5000 series.
Like its sister system, the EBPG5150 is the ideal system for achieving high reso-lution and accuracy in direct write application. Based on a 155-mm by 155-mm stage platform, it can load a wide variety of substrates from piece parts to full 6-inch wafers. The system has also been updated with a more efficient and faster pattern generator, offering 50Mhz operation as standard with the option to upgrade to 100MHz.
For the EBPG series systems, Raith offers the ability to upgrade the systems even after system purchase, which protects customers’ initial investment as well as enabling adaption to future technology changes.
For more details please contact our Sales Manager at [email protected] or visit our EBPG5150 website.
Example of deposition rate determination using height profiles of deposited lines applying electron beam induced deposition.
Nanosense scanning principle
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Adding 3D to conventional SEM or FIB surface imaging information
In situ Surface Sensing and Nanoprofilometry for Focused Electron and Ion Beam Induced Process Verification with the new Raith NanoSense
Nanopatterning processes and corresponding parameters are typically well understood for standard nanofabrication applications using resist-based electron beam lithography (EBL) or FIB milling processes.
However, advanced and innovative nanofabrication applications involving e.g.(3D-) focused electron or ion beam induced deposition/etching processes (FEBIP/FIBIP) or complex FIB patterning tasks on new materials might require challenging and elaborate process verification and optimization - typically in time-consuming iterative cycles. This is due to the fact that the number of variable parameters for such complex processes involving e.g. new gas chemistries or ion species is virtually “infinite”. As SEM imaging only delivers 2D information, AFM or cross-sectioning techniques are typically involved in order to retrieve the required 3D information.
Inhomogeneous milling results applying multi-pass versus single pass strategies
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Complex and challenging deposition processes using FEBIP
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Efficient 3D milling profile visualization
The new Raith NanoSense - available for eLINE Plus and ionLINE - offers a far more efficient and straightforward solution, helping to qualify FEBIP/FIBIP and milling processes in situ within minutes. Nanoprofilometric scans for both additive (deposition) or subtractive (milling/etching) surface treatment yield 3D information for deposition or milling rate determination in a very efficient way – without the need for laborious unloading of the sample and ex situ AFM analysis or use of FIB-SEM technologies.
Corresponding 2D SEM imaging information is not sufficient for qualitative process verification
Nanoprofilometric line scans revealing the resulting milling profiles for the respective milling strategy
Milling a rectangle with identical milling dose, yet applying different patterning strategies (single pass, multipass, concentric outwards single pass)
Position [nm]
Hei
ght
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Conferences and Events
Raith NANO 2016, Dortmund - register now
Are you interested in nanofabrication and the possibilities offered by electron beam lithography or focused ion beam nanofabrication? Then you should participate in this seminar, to be held at Raith’s headquarters in Dortmund on February 15-17, 2016. The annual nanotechnology seminar offers an excellent forum for everyone interested in interacting and learning about news and updates on state-of-the-art lithography technology. As every year, we have invited experts to teach you about their field of expertise and to discuss any questions you may have. Once again, a professional hands-on session will also be part of the seminar. You will gain a more detailed understanding of the solutions and workflows that Raith systems offer. Nano 2016 is also an excellent opportunity to network within the community.
Visit our Training & Education site to find out more about the seminar and register for Raith NANO 2006. We look forward to welcoming you in Dortmund!
In order to achieve the expected reliable and reproducible results for 3D nanostructures, NanoSense can be implemented in both eLINE Plus and ionLINE in order to optimize and verify complex nanofabrication tasks. A standard nano-manipulator, available for both systems, can be upgraded with a surface-sensitive sensor yielding height resolutions in the order of 5nm.
No. 38NOV 2015
Raith User Meetings - more than 500 users met in 2015
For many years Raith has made it a priority to constantly stay in touch with its Users, arrangingmeetings to stage discussions about the most recent developments, interesting applications, and research topics. As is now traditional, one of these User Meetings was held during this year’s MNE in The Hague, the Netherlands. The confer-ence brought together many EBL/IBL users, and on September 20th more than twenty Raith users gathered to discuss a wide range of different topics, from setting up a booking system for 24/7 multi-user occupancy to high-end applications. Some customer presentations impressively demonstrated that sophisticated results can be achieved even with simple pattern generator attachments. Others showed that dedicated EBL enables complex opti-cal structures like high-density diffraction gratings and 3D photonic crystals to be produced over large areas.
User Meeting, China 2015
Talk during the User Meeting in Russia
Group picture User Meeting Russia
MNE User Meeting
User Meetings around the world
Earlier this year 40 scientists in the Russian community gathered for their 4th User Meeting at the Institute of Super High Frequencies in Moscow. The one-day program included reports from local Raith users and also review presenta-tions provided by Raith staff. Given the research topic of the hosting institute, many user presentations focused on semiconductor device developments.
More than 100 participants joined the 2-day China User Meeting, which was hosted by the Institute of Physics of the Chinese Academy of Sciences in Beijing. The meeting was perfectly organized by staff from Germantech. On day one, users presented their scientific work and their progress in processes. Raith staff gave updates about products and the company Germantech. The second day was devoted to training sessions on proximity correction, stitch-error-free writing, and system maintenance. The participants listened closely and received answers to their many detailed questions.
Service and Support News
Remko Waagen at the helpdesk in Best
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Always at your service - Introduction to Raith’s service and support organization, the world’s largest customer support network
An important part of Raith’s business model is the provision of excellent technical service and support for our global customers. Over 50 support engineers are in place worldwide to provide fast service, deliver spare parts or offer con-sultation on-site. To get a better understanding of the service we offer, we aim to introduce Raith’s different service de-partments. To start off, we are talking to Remko Waagen, head of Field Service for the EBPG series systems in Europe and Asia-Pacific. Remko is based in Best, The Netherlands.
EBPG service in Europe and Asia-Pacific
“Remko, how many service engineers are currently working in your depart-ment?”
RW: “At the moment our service team for the EBPG and VB systems consists of 16 field service engineers. In the exceptional cases where it is required, we can also rely on further support from our in-house engineers within the engineering department.”
The most recent Raith User Meeting took place in Delhi, where Raith organized a workshop in cooperation with the Nanoscale Research Facility (NRF), Indian Institute of Technology Delhi and Simco Global Technology & Systems Ltd. The workshop provided a broad overview of electron and ion beam lithography as fundamental techniques for nano-fabrication in R&D. The workshop, which was open to all interested participants, was followed by a User Meeting for existing Raith system users with the aim of exchanging knowledge and ideas. More than 120 people signed up for the workshop. 20 participants went a step further and joined the User Meeting to discuss more system-specific topics. The next Workshop and User Meeting are expected to be held in Chennai, India.
Discussion between Dr. Huigao Duan and other Users during the Raith User Meeting in China
Participants of the workshop in India
More to come
Altogether, Raith User Meetings have again proven to be a very valuable asset for our customers as well as for Raith staff. We want to thank everybody who attended and contributed to those events, and are already looking forward to welcoming you to the next User Meetings. Check our training & education information regularly to find out more about dates and locations.
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“Where are the service engineers located and which markets do they serve?”
RW: “The customer support and field service for our EBPG users in Europe and Asia-Pacific are coordinated from our European Service Center in the Netherlands. For the countries India, China and Korea, the engineers operate via a lo-cally based branch office. At the moment our service team consists of 11 engineers based in Europe, 2 in India as well as 2 in China and 1 engineer in Korea.
One of our “Key performance” targets within Service is to shorten the response time to a minimum. Therefore we have a combination of Service engineers based in Best, The Netherlands and Service engineers based strategically in the field, physically close to our customers. Within our team of engineers in Europe for instance, 3 operate from their home loca-tions in Italy, France and Germany. The remaining 8 engineers work from our office in the Netherlands.
Our customers are active across the full spectrum of lithography applications, meaning from research to production. They can be found in the educational sector (universities), private and governmental research institutes as well as manufacturing companies.”
“What is your response-time when a costumer approaches your department with a service request?”
RW: “The response time, meaning the time for an engineer to arrive on site, can be contracted as part of a Service agreement. The standard response time is within 48 hours. For some of our production oriented customers, we are contractually committed to arrive on site even within 24 hours.”
“What is the uptime of the systems installed?”
RW: “The average uptime of the EBPG Electron Beam Lithography systems in our area is above 95%. This is based on our records from over 50 systems at our customer sites.“
“How do you measure the uptime of the systems?”
RW: “All our Service activities are recorded in a global database. The data is used in a “Supplier Dependent Uptime” model, which is based on the SEMI E10 industry standard. The SEMI E10 standard is rather complex, and also involves local factors over which we have no control - think of the vacation shutdown of a complete facility, for example. Supplier dependent uptime is a general accepted measure for availability of equipment. Comparisons in the past between our data and that of a commercial user have confirmed that our model is accurate.
The systems have an automation level such that they can be used unattended, means 24/7. Therefore the uptime cal-culations are also based on a 24/7 availability. If, for example, preventative or corrective maintenance is performed, the system is considered to be not available for exposures for the full time until completion of the recovery actions.”
“Thank you very much for the interview”
Interview conducted by Meike Pränger, Marketing Assistant, Raith GmbH
No. 38NOV 2015
Raith EBPG5200 installed at Nanjing University, China
An EBPG5200 ultra-high-performance Electron Beam Lithography system has been installed on the Xianlin campus, the new main campus of Nanjing University. Installation and acceptance testing of the new EBPG5200 system finished in August 2015.
Nanjing brief
Nanjing University, one of the top universities in China, was found-ed in 1902. The Research Institute of Superconductor Electronics(RISE) at Nanjing University has pioneered superconductor elec-tronics in China for over thirty years and serves as a cradle for talent in superconductor electronics. Currently, RISE is improving its advanced micro-fabrication capability for developing supercon-ductor devices and their applications. The EBPG5200 electron-beam lithography system will enable RISE to further strengthen its investigation and fabrication capability with respect to supercon-ducting devices such as superconductor single photon detectors, terahertz detectors, superconducting qubit chips, etc.
Customer Success Stories
Raith EBPG5000 EBL system and 3 ELPHY Nanolithography upgrade kits installed at BINNCAS
Raith installed an EBPG5000 at the Beijing Institute of Nanoenergy and Nanosystems (BINN),Chinese Academy of Sciences (CAS), and finished the first part of training at customer site. The system is installed at the Micro-Nano fabrication center in the institute and will provide service and support to all R&D division. Besides the EBPG5000, BINNCAS also installed three ELPHY Quantum as SEMs attachments, which will provide high flexibility and meet the increasing ebeam nano lithography needs.
BINNCAS brief
The Beijing Institute of Nanoenergy and Nanosystems (BINN), Chinese Academy of Sciences (CAS), was jointly estab-lished by CAS and the city of Beijing in 2012.
BINN is a comprehensive and multi-disciplinary research organization engaged in research into nanoenergy and nano-systems. Its current research activities concentrate mainly on fundamental research and applications for nanogenera-tors, piezotronics and piezo-phototronics, nano-piezoelectric semiconductor materials, self-charging power packs, hybrid cells for harvesting multi-type energies, nano-optoelectronics technology, micro/nanosystems, coupling sensors, etc. Aiming to achieve unique innovation and key technology in the field of nanoscience, BINN’s mission is to be the center of the development and innovation of nanoenergy and nanosystems so as to promote industrialization of nano-technology. BINN is devoting all efforts to reaching its goal of becoming a “first-class nanoenergy and nanosystems research center of the world.”
Other
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10 µm
1 µm
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Micrograph Award 2015
The Raith Micrograph Award 2015 again proved to be a popular competition among our system users. Many partic-ipants shared their interesting work, showing us once again the wide range of applications our customers are creating. The entries were very varied, and their exceptionally high quality made it very hard to select three winners out of the numerous micrographs we received. After a thorough evaluation of the micrographs and their corresponding descriptions, a decision was made. As an exception, for the first time since the introduction of the Micrograph Award in 2004 we are rewarding not just three participants, but have selected two applications for joint third place, thus increas-ing the number of winners to four. On top of that, we are happy to announce six winners in the “Art Award” category. The high number of winners reflects how impressed we were by the contributions we received. We at Raith want to thank all entrants for their participation and are already looking forward to next year’s Micrograph Award. To check out this year’s winners please visit our Micrograph Award page. You can also check out our terms of entry in preparation for the Micrograph Award 2016!
1st place - ‘Photonic CNOT quantum gate’, Menno Poot, Yale University, USA
3rd place - ‘2D crystal of artificial gold nanoparticles with quasi-3D shape control’, Vitaliy Guzenko, Paul Scherrer Institute, Switzerland
2nd place - ‘Silicon nitride suspended membrane’, Alessandro Pitanti, NEST - CNR, Italy
3rd place - ‘Ring of Plasmonics’, Thomas Loeber, TU Kaiserslautern, Germany (coauthor: Laegel)
No. 38NOV 2015
Wall Calendar 2016 - get your free copy
As in recent years, we have used the outstanding micrographs to create a Wall Calendar for 2016. This calendar is a thank-you to all our customers, partners and friends, and we would be happy to send you your free copy.
Please register on
www.raith.com/infoletter-2-15/wall-calendar-2016.html
to receive your Raith Wall Calendar 2016.
Raith B.V. De Dintel 27a 5684 PS Best The Netherlands
Phone +31 499 336 880 Fax +31 499 336 899 Email [email protected]
Raith GmbH Konrad-Adenauer-Allee 8 44263 DortmundGermany
Phone +49 231 95004 0 Fax +49 231 95004 460 Email [email protected]
Raith Asia Ltd. Two Chinachem Exchange Square, No. 338 King‘s RoadFloor 7, Unit 05-06North Point, Hong Kong
Phone +852 2887 6828 Fax +852 2887 6122 Email [email protected]
Raith B.V. – Indian BranchSri Krishna Complex, No 36, 2nd Floor.Opposite to Mother Theresa SchoolM. E. S. Ring RoadBangalore - 560054India
Phone +91 990 2991 786Email [email protected]
Raith America, Inc. 1377 Long Island Motor Parkway, Suite 101 Islandia, New York 11749 USA
Phone +1 631 738 9500 Fax +1 631 738 2055 Email [email protected]
www.raith.com
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