Nikhef Annual Meeting 13 Dec 2001 Future Vertexing Els Koffeman for Nikhef Vertex Group.

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Nikhef Annual Meeting 13 Dec 2001 Future Vertexing Els Koffeman for Nikhef Vertex Group

Transcript of Nikhef Annual Meeting 13 Dec 2001 Future Vertexing Els Koffeman for Nikhef Vertex Group.

Page 1: Nikhef Annual Meeting 13 Dec 2001 Future Vertexing Els Koffeman for Nikhef Vertex Group.

Nikhef Annual Meeting13 Dec 2001

Future Vertexing

Els Koffemanfor

Nikhef Vertex Group

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Topics

• No report on Zeus, Hermes, Alice, LHC-B, Atlas in spite of much progress

• No report on beautiful infrastructure• R&D vertex detectors

– Very High Luminosity Hadron Colliders• Extreme radiation hardness (1x 1016 /cm-2)

– Linear Colliders• High precision (1-5 micron point resolution)

• Low material (0.1 X0 per layer)

• ‘small’ detectors

• Medipix• Time Projection Chamber

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Electronic Department

• Recent projects– Alice: analoge buffer/line driver, digital control ic (jtag +

glue logic), power supply is prevented for single event latchup

– LHCB: analog line driver en comparators voor beetle chip– pixel: 4 bits adc per pixel– zeus: fail safe token voor helix– general: low noise amplifier

• Four FTE engineers working on VLSI• Education

– EPFL (Lausanne)– Advanced Analog IC Design (5 people)– Advanced Digital IC Design (3 people)– Practical Aspects in Analog & Mixed Mode ICs (3 people) – Transistor-level Analog IC Design (2 people)– expected: low voltage analog IC (2 people)

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NP

Quick Reminder

• Silicon as a sensor – 300 micron thick wafer– High resistivity, purity– Surface strips, pixels, pads

• Silicon as readout– Poor quality wafer– Photolitography makes

Integrated Circuits – All structure contained in few

micron thickness– Most important component is

transistor – Current technology

‘CMOS 0.25 micron’

P

Silicon pixel,pad,strip

gate

contact

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Signal!

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Crystal Damage !(vacancy, interstitials)

Charge generationInside CMOS!

Leakage currentsNeed High VoltageLess collected

charge

Transistor performancedegradesChip ‘blows up’

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R&D vertexing

• CERN– RD 19 Pixels– RD 39 Cryogenic operation of silicon– RD 42 Diamond detectors– RD 48 ROSE radhard silicon– RD 49 Radhard Electronics– Proposal for new R&D group

• LCFI (linear collider flavour identification)– CCD detector for TESLA– 8 UK institutes, CERN, SLAC

• MIMOSA – Monolithic pixels– Proposal submitted to DESY PRC – Strassbourg, Geneve, Nikhef, Liverpool, Glasgow, RAL, …

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Radiation Hardness of Silicon

• The leakage current damage parameter is material independent

• Radiation damage very different for different particles (expressed in hardness factor K)– 24 GeV protons K =1– Slow neutrons K=0.9– Fast neutrons K=1.7– Gamma 60-Co K=2x10-6

• ‘Effective doping changes’ (or increasing depletion voltage) improved by oxygenation of the material

• A macroscopic damage parameter model has been developed which can be used to predict detector parameters in a given radiation environment including annealing effects

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Radiation harder with oxygen?

•Two methods were found to highly oxygenate silicon.

– Firstly, at the ingot growing stage.

– Secondly by diffusion of oxygen into ANY wafer using a high temperature drive-in

– Technology has been successfully transferred to several silicon detector manufacturers (SINTEF,Micron, ST, CIS) and full-scale microstrip detectors have been produced.

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Pixel systems

• MCM multi chip module– ‘traditional’ 300 um thick

pixel sensor bump bonded to a chips with amplifiers and readout.

• CCD – Charge collection in thin

surface layer– charge transferred through

the wafer

• Monolithic pixel– use standard CMOS wafer– simple readout per pixel

sensor

chip

sensor

Surface

sensor

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Monolithic Pixels

• No depletion layer• charge diffusion

only• < 1000 electrons• cell =• Monolithic:part of

the CMOS is used as detector element

• Will it work ?

2μm 20 x 20 μm 10

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MIMOSA - I

4000 pixels !

1.2 x 1.2 mm2

2μm 20 x 20

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MIMOSA

Signal / noise = 40

Efficiency = 99%

Resolution μm 1.8

NIKHEF proposeda ladder ‘concept’thickness 0.05 mm12 cm long3 x 2 cm wide

0.9 g silicon 0.8 g support

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Diamond – Pixel detector

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Medipix- recent developments

• Chip Design (0.25 mm) (TMR EU project)

– DAC's for Alice/LHCb chip (radhard)– DAC's for Medipix2 chip

• MUROS2 Interface for Medipix2

• Multi-Chip Board for 2x4 multichip Medipix2 imager

• Dynamical Defectoscopy – micro-crack development in Aluminium (Marie Curie EU

project)

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Multi-Chip Board

MUROS2 Chi

pboa

rd

8 ASIC chips Medipix2 chip size 14 x 16 mm2

1 Sensor 28 x 56 mm2 (fully sensitive area)

512 x 1024 Pixels of 55 x 55 mm2 (0.5 Megapixel)

Prototype, useful for e.g. Small Animal Imaging

Vbias

SCSI-5 Cable160 Mhz LVDS

PC+DIO

10 Mhz

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3 different micro ADC's

<100 x 100 mm area<1 mW power

David San Segundo Bello

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Chipboard Top layer metal

High Density Interconnect Technology9 metal layers (5 in kapton build-up)1840 staggered m-via's 366 drilled-through via's 80 SMT capacitors

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1mm Hole 7

X-ray Defectoscopy

Si GaAs

Si + FlatField Correction

5 mm 0.5 mm

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TPC for a linear collider

• Traditional TPC: signal collected on wires • Principle of GEM introduced by Sauli• Used in conjunction with MSGC’s or plain

electrodes

• New idea: get the electrons directly in a chip! (Harry v.d Graaf, Jan Visschers, Erik Heijne)

• If successful (with 60 *60 micron pitch) – Resolution limited by diffusion– Optimise gas max for this– Much better track separation– Can improve all time favorite Aleph TPC with 30-40 %

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TPC + medipix chip

GEM

Medipix chipkathode

~ 1mm

~ 1mSensitive area

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TPC plans

• Build proto type• If charge measured

= > connect to Medipix chip.

• Develop prototype for TESLA….

• Need 15 m2 of chips!

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Conclusion….

• Medipix• Diamond • CMOS sensors• micro-electronics• Novel TPC

R&D is in good shape

we need a vertex group !Do we need a vertex group ? R & D

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