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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Hull Group / RPI (UVa).
New Methods for Nanoscale Fabrication
Primarily Using Electron and Ion beams
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Low Energy Electron Microscopy (SPECS P90)
Spatial resolution 5 (2) nm; Spectral resolution 200 meV;Time resolution 100 (1) ms (R. Tromp IBM, J. Thorp, UVa)
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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g ange r ng w ne o s g o samp e:1) Focused ion beam (future); 2)Secondary electron detector (future); 3)Effusion cell x2; 4) Multi-cell e-beam evaporator; 5) PEEM source (Hg); 6)
yrometer; ar a e ocus on gun; as man o system
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Si (100)
Dark Field
Aug 21
DF 3rd Flash
R10.bmp
Left: Si(100) 2 x1 5m FOV;Right: Ge/Si(100) 10 m FOV
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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In-Situ Transmission Electron Microscopy
Range Capabilities
Heating, ST 30 - 1400 C
g, -
Heating + Electrical, ST 30 - 1400 C Electrical Currents to > 1 A
Heatin + Strainin ST 30 - 1000 C(a)
Strainin Rates 0.04-0.4 m/sHeating + Electrical + Optical,
ST
30 - 500 C(b)
Electrical Currents to > 1A
Optical Fluxes to >10
2
W -cm-2
Heating + Indentationc
30 600 C Indentation, x,y, positioning
~ 10 nm, z ~ 1nm
Piezo motor
Optical fiberfeed through
Electricalcontacts
Furnace for temperaturesup to ~300C
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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NatureMaterials,
2 532
Cu / Cu Cu / Pt
5 m FOV, real time
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Nanoscale Tomography with the Focused Ion Beam
5 m
Cu-15In Allo sHighest In Conc. Green, Matrix Conc. Blue
w/ Alan Kubis, UVa D. Dunn IBM
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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3D Assembly of Epitaxial Quantum Dots
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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PHI 700Auger Nanoprobe
In-situ growth, reaction,surface modification,FIB-Auger
PHI VersaProbeXPS Microprobe
Acquisition of Instrumentation for Nanoscale In-Situ Studies in Auger Electronand X-Ray Photoelectron Spectroscopy ; NSF-MRI; Oct 09
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Future Directions: Orion He Ion Microscope
Virtualsourcesize;oneatom Beamdiameter
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Nanoscale Surface Templating
FIB Nucleated Ge/Si QDsModify LocalSurface Diffusion
o y oca
Topography
Modify Surface
Chemistry
, ions / spot
With F. Ross,IBM, J. Floro,UVa, J. Gray,
U. Pittsburgh
o y ur ace tra n
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Single Object Basis on Each Lattice Point Complex Basis on Each Lattice Point
2.0m
R ~ 30 nm R < 10 nm R ~ 30 nm (R) < 10 nm
D ~ 50 nm L ~ 30 nm
(0) < i < 108
m-1
(0) < n < 107 m-1
D ~ 10 nm L ~ 10 nm
(0) < i < 108
m-1
106 < n < 109 m-1
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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FIB Patterning of CuO2/SrTiO3
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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* 10 pA, 100s
* 1014 ions cm-2
* 104features/s * c. 20 pJ / feature * 1 mm3of Ga 1019features * A: 1 ion assembles103atoms in cluster
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Goal: Delivery of pulses of 1-10n of
Atom-by-Atom Modification of Chemistry / Functionality
resolution/alignment to few tens of nm
Orsay Physics MassSelecting FIB Column
1pA beam, 11B+ ions. (from PdAsB)
nm
w/ J. Graham, UVa
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Towards Single Atom Delivery / Registration:Combinatorial Synthesis at the Nanoscale
()Rx,y
Doping Ion Beam
()Rx,y
Doping Ion Beam
TotalIonDoseperPulsevs.BeamCurrent
10000
100000
lse
Nanostructure
TemplatingIon Beam
Nanostructure
TemplatingIon Beam
10
100
1000
IonDose
perP 100ns
1s10s100s
x,y x,y
STM Tip
x,y x,y
STM Tip
1
1 11 21 31 41 51 61 71 81 91
IonCurrent(pA)Detect secondaryelectron burst from ionarrival:Matsukawa et al, JVST
,
Change in I-V
MOSFETShinada et al,
Nanotechnology 19,345202
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8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams
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Summary: Main Themes
Three dimensional nanoscale analysis ofmaterials
In-situ TEM imaging of liquid/solid interfaces andof liquid phase reactions
Nanoscale surface templating using focused ion
beams om c sca e mo ca on o ma er a s us ng
focused ion beams