Multilayer Optics for 1 nm to 13.5 nm: Can we reduce the litho … · 2018. 12. 10. · Prague,...

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Multilayer Optics for 1 nm to 13.5 nm: Can we reduce the litho wavelength further? 2018 International Workshop on EUV and soft X-Ray Sources Torsten Feigl, Hagen Pauer, Tobias Fiedler, Marco Perske, Philipp Naujok optiX fab GmbH, Jena Prague, November 6, 2018

Transcript of Multilayer Optics for 1 nm to 13.5 nm: Can we reduce the litho … · 2018. 12. 10. · Prague,...

  • Multilayer Optics for 1 nm to 13.5 nm: Can we reduce the litho wavelength further?2018 International Workshop on EUV and soft X-Ray Sources

    Torsten Feigl, Hagen Pauer, Tobias Fiedler, Marco Perske, Philipp Naujok

    optiX fab GmbH, Jena

    Prague, November 6, 2018

  • 2 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Outline

    ◼ Introduction

    ◼ Multilayers for 1 nm … 13.5 nm – low reflectance, narrow bandwidth

    ◼ Narrow band sources meet narrow band multilayers

    ◼ Summary

  • 3 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Outline

    ◼ Introduction

    ◼ Multilayers for 1 nm … 13.5 nm – low reflectance, narrow bandwidth

    ◼ Narrow band sources meet narrow band multilayers

    ◼ Summary

  • 4 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    optiX fab.

    ◼ History

    1997: Start of EUV multilayer development @ Fraunhofer IOF2013: August 1st: Operations start @ optiX fab.TODAY: Delivery of 11,052 EUV and X-ray mirrors to customers

    ◼ Mission Fabrication of customized EUV optics and optical components forEUV lithography @ 13.5 nm, for EUV, soft and hard X-ray applications,synchrotron and FEL beamlines, metrology, R&D, HHG sources, etc.

    Torsten Feigl Marco Perske Hagen Pauer Tobias Fiedler Philipp Naujok

  • 5 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Outline

    ◼ Introduction

    ◼ Multilayers for 1 nm … 13.5 nm – low reflectance, narrow bandwidth

    ◼ Narrow band sources meet narrow band multilayers

    ◼ Summary

  • 6 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Multilayer mirror – principle of constructive interference

    Substrate

    •

    •

    •

    •

    30 cm

    13.4 nm

    4.0 nm

    2.7 nm

    Mo

    Si

    13.5 nm

    2.76 nm

    4.14 nm

    50 nm

    Mo/Si multilayer, TEM

    E. Spiller, Low-loss reflection coatings using absorbing materials, Appl. Phys. Lett. 20, pp. 365-367, 1972.

  • 7 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Multilayers for 13.5 nm

    R = 70.12 %

    l = 13.48 nm

    FWHM = 0.528 nm

    AOI = 5 deg.

    Measured @PTB Berlin

  • 8 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    ML coatings for short wavelengths

    ◼ main issues for ML coatings at shorter wavelengths (λ < 13.5 nm):

    1st: lower reflectance

    typical experimental values for near normal incidence:

    13.5 nm: R ≤ 70 %

    6.7 nm: R ≤ 65 %

    4.4 nm: R ≤ 15 %

    2.4 nm: R ≤ 20 %

  • 9 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    1st issue: lower reflectance at lower wavelengths

    ◼ real systems: reflection losses due to imperfect interfaces:

    ◼ roughness

    ◼ interdiffusion

    ◼ formation of compounds

    ideal ML real ML

    perfectinterfaces

    interface imperfections

    5 nm

    HR-TEM of a La/B-ML for 6.7 nmshowing interdiffusion between La and B

    [1]

    [1] P. Naujok et al., Thin Solid Films 642 (2017) 252–257

  • 10 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    1st issue: lower reflectance at lower wavelengths

    ◼ reflection losses due to imperfect interfaces

    ◼ higher losses for shorter wavelengths (stronger influence of interface regions)

    ◼ high near normal incidence reflectivity (R > 60%) impossible at short wavelengths(λ < 6.6 nm)

    d = 7.0 nm (λ = 13.5 nm)

    d = 1.2 nm (λ = 2.4 nm)

    d = 2.2 nm (λ = 4.4 nm)

    d = 3.4 nm (λ = 6.7 nm)

    d = 0.7 nm (λ = 1.4 nm)

  • 11 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    ML coatings for short wavelengths

    ◼ main issues for ML coatings at shorter wavelengths (λ < 13.5 nm):

    2nd: lower bandwidth1st: lower reflectance

    typical experimental values for near normal incidence:

    13.5 nm: R ≤ 70 %

    6.7 nm: R ≤ 65 %

    4.4 nm: R ≤ 15 %

    2.4 nm: R ≤ 20 %

  • 12 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    2nd issue: lower bandwidth at lower wavelengths

    ◼ strongly decreasing bandwidth (FWHM) of the ML coating for shorter wavelengths

    ◼ reason: higher number of required contributing interfaces

    N = 300FWHM = 25 pm

    N = 1500FWHM = 2 pm

    N = 200FWHM = 60 pm

    N = 60FWHM = 500 pm

    N = 100FWHM = 160 pm

    N = 500FWHM = 6 pm

  • 13 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    2nd issue: lower bandwidth at lower wavelengths

    ◼ strongly decreased bandwidth (FWHM) of the ML coating for shorter wavelengths

    ◼ consequences:

    ◼ wavelength matching betweenmirrors more complicated

    ◼ lower integrated reflection

    ➢ lower photon throughput(assuming broad plasma sources)

  • 14 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Experimental results

    λ, nm 1.4 2.4 2.7 4.4 6.7 9.0 12.0 13.5

    R, % 0.02 18.1 26.2 16.8 61.0 36.0 49.2 70.1

    FWHM, nm 0.002 0.005 0.008 0.02 0.05 0.11 0.32 0.52

    0

    10

    20

    30

    40

    50

    60

    70

    80

    1 3 5 7 9 11 13 15

    Ref

    lect

    ance

    , %

    Wavelength, nm

  • 15 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    0

    10

    20

    30

    40

    50

    60

    70

    80

    1 3 5 7 9 11 13 15

    Ref

    lect

    ance

    , %

    Wavelength, nm

    Experimental results

    λ, nm 1.4 2.4 2.7 4.4 6.7 9.0 12.0 13.5

    R, % 0.02 18.1 26.2 16.8 61.0 36.0 49.2 70.1

    FWHM, nm 0.002 0.005 0.008 0.02 0.05 0.11 0.32 0.52

  • 16 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Outline

    ◼ Introduction

    ◼ Multilayers for 1 nm … 13.5 nm – low reflectance, narrow bandwidth

    ◼ Narrow band sources meet narrow band multilayers

    ◼ Summary

  • 17 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Multilayer development for water window collector

  • 18 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Collector mirror – today: Reflectance mapping at l = 2.478 nm

    R = 4.58 %

    l = 2.478 nm

    FWHM = 0.005 nm

    AOI = 1.5 deg.

    Measured @PTB Berlin

  • 19 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    2018 multilayer collector mirror: Wavelength at different positions

    Measured @PTB Berlin

  • 20 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    2018 multilayer collector mirror: EUV reflectance at different radii

    2015: R = 2.45 %

    2018: R = 4.58 %

    → 2x more photons!

    2015 status:

    Measured @PTB Berlin

  • 21 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Outline

    ◼ Introduction

    ◼ Multilayers for 1 nm … 13.5 nm – low reflectance, narrow bandwidth

    ◼ Narrow band sources meet narrow band multilayers

    ◼ Summary

  • 22 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Summary

    ◼ It‘s really hard to make high-reflective multilayers for wavelengths < 13.5 nm

    ◼ Challenges: low reflectance, narrow bandwidth

    ◼ Please match source emission with multilayer absorption edges…

  • 23 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    Still a very long and steep way to go … but good to start now

  • 24 I 2018 International Workshop on EUV and Soft X-ray Sources,Prague, Nov. 6, 2018

    ◼ KTH:

    Hans Hertz and team

    ◼ MBI:

    Holger Stiel and team

    ◼ PTB Berlin:

    Frank Scholze, Christian Laubis and team

    ◼ Fraunhofer IOF:

    Thomas Müller, Michael Scheler, Steffen Schulze

    Acknowledgements

  • Thank you.

  • optiX fab.www.optixfab.com


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