Multi-Physics Analysis Methodologies for Signal Integrity · dr r 2 23 dG 2 dr r 3 34 dG 6 dr r 2 1...

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Title Multi-physics analysis methodologies for signal integrity Author(s) Jiang, L Citation The IEEE International Symposium on Electromagnetic Compatibility (ISEMC), Fort Lauderdale, FL., 25-30 July 2010. Issued Date 2010 URL http://hdl.handle.net/10722/126097 Rights Creative Commons: Attribution 3.0 Hong Kong License

Transcript of Multi-Physics Analysis Methodologies for Signal Integrity · dr r 2 23 dG 2 dr r 3 34 dG 6 dr r 2 1...

Page 1: Multi-Physics Analysis Methodologies for Signal Integrity · dr r 2 23 dG 2 dr r 3 34 dG 6 dr r 2 1 Or, r ˙˝ ˚˜ ˛! 3 1 Or, r ˙˝ ˚˜ ˛! 4 1 Or, r ˙˝ ˚˜ ˛! ~ dG eikr ik

Title Multi-physics analysis methodologies for signal integrity

Author(s) Jiang, L

Citation The IEEE International Symposium on ElectromagneticCompatibility (ISEMC), Fort Lauderdale, FL., 25-30 July 2010.

Issued Date 2010

URL http://hdl.handle.net/10722/126097

Rights Creative Commons: Attribution 3.0 Hong Kong License

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2010 IEEE International Symposium on Electromagnetic Compatibility

Multi-Physics Analysis Methodologies for Signal Integrity

Lijun Jiang

EEE, the University of Hong Kong (Associate Professor)IBM EDA, IBM T. J. Watson Research Center (LOA)

[email protected]

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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OUTLINES

� Multi-physics vs. Frequencies– Helmholtz Decomposition

– Evanescent Waves and Propagating Waves

– Algorithm Dependencies

� Multi-physics Thermal Electrical Coupling Analysis– Thermal Conduction Modeling

– Novel Equivalent Thermal Conductivity Calculation

– Thermal Guideline Study

– Thermal-electrical Coupling Simulation

� Conclusions

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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MAXWELL’S EQUATIONS

Jt��

� � � ��

Ampere’s Law

Faraday’s Law

Gauss’s Law for Magnetism

Gauss’s Law

Integral FormDifferential Form

JS

Qdst�

�� � �

���Continuity Equation

And GOD said

and THEN there was light.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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MAXWELL’S EQUATIONS

E = 0�

fH = J�

Jt��

� � � ��

Jt��

� � � ��

Consider the coupling

Consider no coupling

Page 6: Multi-Physics Analysis Methodologies for Signal Integrity · dr r 2 23 dG 2 dr r 3 34 dG 6 dr r 2 1 Or, r ˙˝ ˚˜ ˛! 3 1 Or, r ˙˝ ˚˜ ˛! 4 1 Or, r ˙˝ ˚˜ ˛! ~ dG eikr ik

2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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HELMHOLTZ DECOMPOSITION

Let F be a vector field on R3, which is twice continuously differentiable and which vanishes faster than 1/r at infinity.[1] Then F is a sum of a gradient and a curl as follows:

where represents the Newtonian potential operator. (When acting on a vector field, such as � × F, it is defined to act on each component.)If F has zero divergence, �·F = 0, then F is called solenoidal or divergence-free, and the Helmholtz decomposition of F collapses to

In this case, A is known as a vector potential for F. This particular choice of vector potential is divergence-free, which in physics is referred to as the Coulomb gaugecondition.Likewise, if F has zero curl, �×F = 0, then F is called irrotational or curl-free, and the Helmholtz decomposition of F collapses to

In this case, � is known as a scalar potential for F.In general F is the sum of these two terms,

where the negative gradient of the scalar potential is the irrotational component, and the curl of the vector potential is the solenoidal component.Cited from: http://en.wikipedia.org/wiki/Helmholtz_decomposition

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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� Electric Field Integral Equation (EFIE) at Low Frequencies:

� � � � �1, ' ' ' , ' ' ' 'i

SS

i g d g di

� ��

� � � � � �� �E r r r J r r r r J r r

( )VE r ( )SE r2 2( ), 0.

V

SO k R kR� �

E

E

�� Scalar Helmholtz system for Scalar Helmholtz system for DirichletDirichlet problems:problems:

� � � �, ' ' ', , '4

iki

S

eg J d g��

� � ��r-r'

r r r r r r rr - r'

HELMHOLTZ DECOMPOSITION

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– Loop Basis: divergence free

– Star Basis: quasi-curl-free.

– Tree Basis: RWG basis with

the basis along a cut removed.

The cut prevents the rest of the

RWG basis (tree basis) from

forming any loop.

� LS or LT formulation isolates the contribution of vector potential and scalar potential.

� Information of vector potential will not be lost due to machine precision.

LOOP STAR DECOMPOSITION

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� EFIE with Loop-Tree Basis– The current density can be expanded as

• : Loop basis (divergence free)• : Tree basis (non-divergence-free)

– Impedance Matrix

J J r I J r Ir Lt

L Tt

T' ' 'a f a f a f� � � �

J LJT

Z Z

Z Z

II

VV

LL LT

TL TT

L

T

L

T

LNMM

OQPPLNMOQP �LNMOQP

Z i J r g r r J rLL L Lt� � ��

� � � � � �( ), ( , ), ( )

Z i J r g r r J r ZLT L Tt

TLt� � � ��

� � � � � �( ), ( , ), ( )

Z i J r g r r J r i J r g r r J rTT T Tt

T Tt� � � � � � � �� � ��

��

� � � � � � � � � � � �( ), ( , ), ( ) ( ), ( , ), ( )

LOW FREQUENCY EFIE

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FREQUENCY NORMALIZATION

( ( )) ( ( )) ( (1)) ( ( ))1 ( ( )) ( (1))( ( )) ( ( ))

LL LTL L

T TTL TT

O O O OO OO O

� � ���

� �� � � �� � �� � � �� � � � � �� �� �

Z Z I VI VZ Z

1 ( (1)) 1( (1)) ( ( )) ( (1))1 ( (1)) ( (1))( ( )) ( (1))

LLL LT L

TTTL TT

OO O OO OO O

�� �

� �

� � � � � �� � � � � ��� � � � � �

� � � �� � � � � �� �

IZ Z VI VZ Z

LLZ CCZ

� Original matrix scaled in frequency

� Normalized matrix scaled in frequency

� Convergence is still slow

fast slow

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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�� Low frequency normalization based on the loopLow frequency normalization based on the loop--tree basis is not valid tree basis is not valid for mid frequencies: loopfor mid frequencies: loop--tree couplings become stronger and the tree couplings become stronger and the impedance matrix becomes ill conditionedimpedance matrix becomes ill conditioned

�� RWG based EFIE does not work well at very low frequenciesRWG based EFIE does not work well at very low frequencies

Where is the boundary ?Where is the boundary ?

FROM LF TO HF

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FROM LF TO HF

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EVANESCENT AND PROPAGATING WAVES

� Two different kernels

1Gr

ikreGr

2

1dGdr r

� �

2

2 3

2d Gdr r

3

3 4

6d Gdr r

� �

2

1 ,O rr

� � � �� � !

3

1 ,O rr

� � � �� � !

4

1 ,O rr

� � � �� � !

~ikrdG eik

dr r2

22 ~

ikrd G ekdr r

33

3 ~ikrd G eik

dr r�

1 ,O rr

� � � �� � !

1 ,O rr

� � � �� � !

1 ,O rr

� � � �� � !

Static Source. e.g. charges

Dynamic Source. e.g. Hertian

dipole

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�� Angular spectral plane wave decomposition of the free Angular spectral plane wave decomposition of the free space Greenspace Green’’s functions function

�� Propagating waves and evanescent waves contribute to the Propagating waves and evanescent waves contribute to the final fieldfinal field

EVANESCENT AND PROPAGATING WAVES

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�� Integration path can be divided into three segments. Integration path can be divided into three segments. �� Plane waves are therefore categorized into three kindsPlane waves are therefore categorized into three kinds

Deep Evanescent WavesDeep Evanescent Waves

Propagating WavesPropagating Waves

Shallow Evanescent WavesShallow Evanescent Waves

�� Evanescent waves on are less significant when it Evanescent waves on are less significant when it goes to goes to �� Truncation of determines the accuracyTruncation of determines the accuracy

EVANESCENT AND PROPAGATING WAVES

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DIRECTION DEPENDENCE

�� Propagating waves can be accurately computedPropagating waves can be accurately computed�� Evanescent waves can be truncatedEvanescent waves can be truncated�� Both kinds of waves are direction dependentBoth kinds of waves are direction dependent

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SHALLOW EVANESCENT WAVES

�� The evanescent waves close to the real axis (The evanescent waves close to the real axis (shallow shallow evanescent wavesevanescent waves) can be extrapolated) can be extrapolated

�� The shareable propagating wave data can be used to The shareable propagating wave data can be used to represent shallow evanescent waves represent shallow evanescent waves

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�� The resultant translators can be merged into the propagating The resultant translators can be merged into the propagating wave translators wave translators

�� High frequency evanescent waves and normal propagating High frequency evanescent waves and normal propagating waves are manipulated by one set of propagating wave data waves are manipulated by one set of propagating wave data on a sphereon a sphere

++ ==

SHALLOW EVANESCENT WAVES

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�� The residual evanescent waves (The residual evanescent waves (deep evanescent wavesdeep evanescent waves))have to be stored, especially for the low frequency case have to be stored, especially for the low frequency case

�� At high frequencies, this part will automatically disappear At high frequencies, this part will automatically disappear due to its decaying propertydue to its decaying property

DEEP EVANESCENT WAVES

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MULTIPOLE EXPANSION

�� The point source is expanded into The point source is expanded into multipolesmultipoles by the addition by the addition theoremtheorem

�� Normalization is needed at very low frequencies to achieve O(1) Normalization is needed at very low frequencies to achieve O(1) magnitude in the leading term of multipole expansionsmagnitude in the leading term of multipole expansions

�� OctOct--tree is used and dense translations have a cost of (P+1)tree is used and dense translations have a cost of (P+1)44 oror(P+1)(P+1)33 if P is the multipole truncation numberif P is the multipole truncation number

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ERRORS OF MULTIPOLE EXPANSIONS

�� The accuracy drops sharply after 0.2The accuracy drops sharply after 0.2�� MoreMore multipolesmultipoles have low efficiency in improving the accuracyhave low efficiency in improving the accuracy�� Dense matrix translation makes the algorithm not efficientDense matrix translation makes the algorithm not efficient

"

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ERRORS of PLANE WAVE REPRESENTATION

�� The accuracy drops below 0.2The accuracy drops below 0.2

�� An optimized mode number L is An optimized mode number L is required to achieve the best required to achieve the best possible accuracypossible accuracy

�� Several percent error could be Several percent error could be obtainedobtained

"

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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MULTIPOLE TO PLANE WAVE

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FULL BAND SIMULATION USING MULTIPOLES AND PLANE WAVES

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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STATIC SOLVERS AND FULL WAVE SOLVERS

Static analysis, quasi static parasitic parameter extraction

Circuit theories or circuit analogy solvers will work correctly

Full wave analysis, circuit approximation will not be a reliable

Choice.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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LF ALGORITHMS AND HF ALGORITHMS

QR decomposition, SVD, Pre-corrected FFT, LFFMA will work.

MLFMA, Ray Tracing, and GO will work.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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SHORT SUMMARY

� Multiscale problem is more than the computing capacity issue. It is a multi-physics problem in terms of frequency.

� Wave physics are altering vs frequencies.

� Electric field and magnetic field coupling features cause two different types of numerical analysis difficulties.

� Proper strategies shall be taken to deal with complicated on-chip and packaging problems.

� Both first principle solvers and their algorithms shall be taken into account to guarantee a meaningful SI simulation result.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

27 Lijun Jiang

OUTLINES

� Multi-physics vs. Frequencies– Helmholtz Decomposition

– Evanescent Waves and Propagating Waves

– Algorithm Dependencies

� Multi-physics Thermal Electrical Coupling Analysis– Thermal Conduction Modeling

– Novel Equivalent Thermal Conductivity Calculation

– Thermal Guideline Study

– Thermal-electrical Coupling Simulation

� Conclusions

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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THERMAL EFFECTS

� Self-heating or Joule heating caused by current flow in interconnects.

� Main impact will be Electromigration (EM) Reliability� Thermal effects are increasing with scaling, due to:

– Higher power-densities and more metal layers on the chip– Shrinking BEOL dimensions– 3D Integration– Use of low-k dielectric materials ( also have low thermal conductivity)– Thermally poor device technologies like SOI, strained silicon etc.

� Existing tools are powerful, sophisticated, and expensive� Our motivation is

– use existing tools to answer the thermal questions– enable embedded thermal analysis for internal tools and processes– make it very easy to use

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

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ANALOGY BETWEEN CURRENT CONDUCTION AND HEAT CONDUCTION

START

3D Model Construction

Equivalent Medium

Thermal Model Construction

E Resistance Solver

Temperature Profile T Resistance Network

END

Geometry Data

Thermal B.C.

E Model

T Model

)(ResistanceThermal)(ResistanceElec.)(tyConductiviThermal)(tyConductiviElec.

FlowHeatCurrenteTemperaturPotential

thel

thel

RR

(q)(I)(T))(

####

$%

�� Both electrical and thermal resistance problems are using similar Laplace’s

equations.

� An electrical resistance solver can serve as the thermal conduction solver.

� IBM EIP/EDA RGEN/RSURF is used as the resistance solver.

Poisson's Equation( )

In the dielectric (Im. Part):( ) 0

Electrical Current Density:el

el elI J EA x

� � �

% �

�% %

� � � �

� � �

�� � � �

xT�

Aq

T

qT

thth

th

gth

��

���

���

����

$

$

$

:FluxThermal0)(

:)generationheat(NodielectrictheIn

)(:State)-(SteadyEquationHeat

'''

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FINITE DIFFERENCE SOLVER

� �

� � � �

� � �

, , , , 1 1

, , 1 1 , , 1 1

, , 1 1 1

14

%

% %

%

� � � � � �

� � � � � � � � � �

� � � � � �

�� � ��

� � � � � �

�� � � ��

i j k i j k j j k k

i j k j j k k i j k j j k k

i j k j j k k i i

G y y z z

y y z z y y z z

y y z z x x

� � � � � �

, , 1, , , , , , 1, , , ,

, , , 1, , , , , , 1, , ,

, , , , 1 , , , , , , 1 , , , ,&

� � � �

� � � �

� � � �

� � �

� � � �

� � � � � �

i j k i j k i j k i j k i j k i j k

i j k i j k i j k i j k i j k i j k

i j k i j k i j k i j k i j k i j k i j k

G V V G V V

G V V G V V

G V V G V V I

BA Metal 2 (Cu) Heat source

16 m

OY X

Z

Metal 1(Cu)

Via (Cu)

BA Metal 2 (Cu) Heat source

16 m

OY X

Z

Metal 1(Cu)

Via (Cu)

0.45%1.6841.677DTB -DTA (K)

-0.31%22.87122.943TB (K)

ErrorCHIPJOULE

( G = 3)C-ToolKCL is used

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

31 Lijun Jiang

ANISOTROPIC MEDIUM

Temperature Profile Obtained From 3D-ANSYS and CHIPJOULE

3.9433 +0.10%3.9393Anisotropic Dielectric (Kx = Ky = 0.1Kz = K0)

23.152 +0.03%23.146Anisotropic Dielectric (Kx = Kz = 0.1Ky = K0)

24.967 -0.11%24.995Anisotropic Dielectric (Ky = Kz = 0.1Kx = K0)

26.432 -0.36%26.529Isotropic Dielectric (K = K0 = 0.8 W/m-K)

CHIPJOULE (K)ANSYS (K)

(Unit: K)

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

32 Lijun Jiang

VARIOUS ON CHIP STRUCTURES

Collaboration with Evan Colgan (YKT), Jamil Wakil (STG, Austin)

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

33 Lijun Jiang

EMPIRICAL APPROACH BASED ON ELECTRO-THERMAL ANALOG

[4] J.-H. Chern, et al, “Multilevel Metal Capacitance Models For CAD Design Synthesis Systems,” EDL, Vol. 13, No. 1, Jan. 1992.

Valid for

Gth/Kth

� Assuming stratified medium with no vacuum or air gaps existing in the interested region. All fields are contained within the medium.

� Capacitance analog works for thermal analysis

� Capacitive coupling is analog of the thermal conductance

� Transmission line coupling effects are considered.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

34 Lijun Jiang

COMPARISON BETWEEN DIFFERENT ANALYTICAL AND EMPIRICAL MODELS (NO VIAS)

0.280.28440.5250.4753800.54

Wvias(um)

Wlines(um)

No. ofILDs

No. ofIMDs

Lvias(um)

Llines(um)

Kmetal(W/mK)

Kdiel(W/mK)

Thermal Resistance in unit Area (K-mm2/W) and % error w.r.t. ANSYS

6.26 (9.8%)3.97 (-3.2%)Our Method

3.92 (-31.3%)3.90 (-4.9%)Im [3]

13.14 (130.5%)4.69 (14.4%)Chiang [2]

5.74.1ANSYS

Line density = 0.167Line density = 0.5

[1] T.-Y. Chiang, K. Banerjee, and K. C. Saraswat, “Analytical Thermal Model for Multilevel VLSI Interconnects Incorporating Via Effect,” EDL, Vol. 23, No. 1, Jan. 2002.

[2] S. Im, N. Srivastava, K. Banerjee, and et al, “Scaling Analysis of Multi-level Interconnect Temperatures for High-Performance ICs,” TED, Vol. 52, No. 12, Dec. 2005.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

35 Lijun Jiang

3

No. ILDswith vias

0.280.28140.5250.4753800.54

Wvias(um)

Wlines(um)

No. ILDsw/o. vias

No. ofIMDs

Lvias(um)

Llines(um)

Kmetal(W/mK)

Kdiel(W/mK)

Thermal Resistance in unit Area (K-mm2/W) (Line density = 0.5)

3.05 (5.2%)

1.90 (-34.5%)

2.9

Via density = 0.0031

1.12 (-6.7%)3.97 (-3.2%)Proposed Model

1.05 (-12.5%)3.90 (-4.9%)Im [2]

1.24.1ANSYS

Via density = 0.0625Via density = 0

Proposed Model: Rth = Rth,no-vias || (NviasRvia+ Rline /4)

Im’s Model [2]: Rth = Rth,no-vias || NviasRvia

COMPARISON BETWEEN DIFFERENT ANALYTICAL AND EMPIRICAL MODELS (WITH STACKED VIAS)

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

36 Lijun Jiang

10x – 2 mm4x – 1 mm2x - 0.5 mm1.25x – 0.25 mm

12K bodies – Layers 4 – 11, signal lines on layers 5, 7, 9, 11with vias between power conductors, orthogonal power on layers 4, 6, 8, 10

ON-CHIP THERMAL GUIDELINE STUDY

Based on discussions with Howard Smith. Created by Alina Deutsch.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

37 Lijun Jiang

SIMPLIFICATION OF THE STACK

S1 S2 S3Vdd1Gnd1

M1-1x

M2-1x

M3-1x

M4-1.25x

M51.25x

I = 1 mA in S1, S2 and S3 Gridding level = 2

S1 S2 S3Vdd1Gnd1

M3-1x

M4-1.25x

M5-1.25x

�eff, M1

�eff, M2

�eff, M2_M3

Use the proposed empirical model to extract thermal conductance per unit length (Gth,no_via) in each layer (not including via effect, using average wire width and/or spacing);

�eff, no_via = Gth, no_via (t+h)/(w+s);

�eff = �eff, no_via(1-ViaDensity)+�viaViaDensity

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

38 Lijun Jiang

50 min5.8 hComputation time

1.5%0.45270.4462'TC2,C1

-1.9%0.43000.4381'TS3,Vdd1

-2.0%0.39960.4079'TS2,Vdd1

-1.2%0.40960.4145'TS1,Gnd1

-2.7%0.91160.93711.10118.2402.2801.1010.0000.000Tavg, C1 (K)

-1.4%1.36431.38331.43618.2402.2801.4360.0000.000Tavg, C2 (K)

-1.0%1.67071.68751.43618.2401.9181.4360.0001.918Tavg, S3 (K)

-0.7%1.24071.24941.43618.2401.6521.4360.0001.652Tavg, Vdd1 (K)

-1.0%1.64031.65731.43618.2401.3861.4360.0001.386Tavg, S2 (K)

-1.3%1.62971.65071.43618.2400.2661.4360.0000.266Tavg, S1 (K)

-1.3%1.22001.23621.43618.2400.0001.4360.0000.000Tavg, Gnd1 (K)

error%OnlyM3~M5

FullStackZ2Y2X2Z1Y1X1

SIMPLIFICATION OF THE STACK

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

39 Lijun Jiang

8 WIRE JOULE HEATING

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

S1 S6 S7GNDVdd S2 S3 S5S4 S8

x

z

-100 -50 0 50 1000123456

a

S4 Wire, x = 0.941 m Vdd Wire, x = 0 m

Tem

pera

ture

rise

(K)

Position along y direction ( m)

a

M1M2M3M4M5

M7

M6

M1M2M3M4M5

M7

M6

(a) y = -124.95 mm (b) y = -124.00 mm (c) y = -95.00 mm

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

40 Lijun Jiang

IBM_GIT CHIPJOULE THERMAL-ELECTRICAL COUPLING SIMULATION PROJECT

START

IR drop solving(formulation, mesh, solving)

Heat source calculation(Joule heating)

Temperature solving (formulation, mesh, solving)

Update material properties

Convergent ?No

END

Procedure:• Temperature distribution solving based on initial

thermal conditions (chipJoule).

• Update the temperature distribution profiles to every location of conductors in PDN.

• Voltage distribution solving based on the temperature profile (Rgen).

• Ohmic loss (Joule heating) calculation from the power density distribution (Rgen)

• Judge whether convergence or not? If convergent, stop and output results; If not, go to next step. ( first iteration is enabled)

• New temperature distribution solving based on the thermal condition plus the new heat source from electrical field (chipJoule).

• Do close-loop iteration from step 2-6.

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

41 Lijun Jiang

SIMULATION SETUP FOR 3D STACKED CHIPS BY GIT FOR IBM-GIT PROJECT

Die2: 4A, 10 WDie1: 24A, 60 W

a

b

Geometry Parameters:

Cross section view:

copperGlass-ceramiccopper

t1t2t3

Heat sink (25 C) Heat sink (25 C)

TIM

2.5 V

copperGlass-ceramic

copper

Thermal conductivities:K_tim = 2 W/m-KK_die = 110 W/m-KK_underfil = 4.3 W/m-K.K_glass-ceramic = 5 W/m-KK_C4 = 40 W/m-K

2.5 V

die2

Die4: 4A, 10 W Die3: 12A, 30 W

a= 20 cm, b= 20 cmt1 = 36 micront2 = 350 micron t3 = 36 micront_tim = 200 micront_die = 500 micront_underfil = 200 micron

Underfilldie1 die3

die4C4

meCuSnC �(��� 8157.0_4�Electrical Resistivity:

1. C4 balls are added between two stacked chips2. C4 balls are also added between bottom chip and substrate.3. C4 balls are converted to pillars in the simulation. 4. The material of C4 is Sn-0.7Cu alloy. 5. The total area occupied by C4 is 50% of the interface area (assumption).6. At chip area, the power distribution is non-uniform (shown in next page).

meCu �(�� 88.1�meTungsten �(�� 86.5�

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

42 Lijun Jiang

TEMPERATURE DISTRIBUTION IN THE 1ST ITERATION BY GIT FOR IBM-GIT PROJECT

58.32453.267

77.58277.582

53.267

Temperature distribution and hot spotfor CPU (bottom) chip

Temperature distribution and hot spotfor CPU (bottom) chip

• The temperature distributions of substrate and bottom chips (cpu) are shown• The hot spots are at not at the center of chips (different from uniform chip power map)

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

43 Lijun Jiang

• Equivalent resistance also shows convergence.

• Compared to original value at room temperature, it grows about 10% because of Joule heating effect for

both case.

11 blockDieVR �� 12 blockDieVR �� 13 blockDieVR �� 14 blockDieVR ��

EQUIVALENT RESISTANCE NETWORK (NON UNIFORM POWER CHIPS) BY GIT FOR IBM-GIT PROJECT

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

44 Lijun Jiang

CONCLUSIONS� An automatic, multi-physics, general purpose framework was developed

� Electrical simulation scheme was used for thermal analysis without solver rewrite

� Extremely large problem sizes can be handled due to the computation power of the electrical algorithm

– Full BEOL stacks with full detail of all metals and dielectrics

– Large multi-chip stacks

– Complete accuracy is maintained in-spite of high density requirements

� Various thermal boundary conditions, such as constant temperature, heat density, and joule heating can be created through this analogy.

� General 3D stacking, on-chip interconnect, and packaging structures could be analyzed through this scheme

� Electrical-thermal coupling simulation using a common solver has been developed

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2010 INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY

45 Lijun Jiang

THANK YOU

Acknowledgement:

Collaborators from GIT, HKU, IBM, UIUC, AND UCSB