Lecture 13 Graphene Properties
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Transcript of Lecture 13 Graphene Properties
7/25/2019 Lecture 13 Graphene Properties
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Graphene
Single atomic layer of graphite
Castro-Neto, et al.Rev. Mod. Phys. 81
(!!"# 1!"
1
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I. Graphene Electronic Properties(isolated graphene sheets)
II.Graphene Formation—Growth on SiC
III.Graphene Growth on BN, Co!", etc.
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Castro-Neto, et al.Rev. Mod. Phys. 81
(!!"# 1!"
$
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CastroNeto
%&
'raphenes )and str*ct*reyields *n*s*al properties
%+ective mass (m# d%/d0-1
Most semicond*ctors, !.1 m! 2 m 2 1 me
'raphene, m 2 !.!1 m! (depending on n*m)erof carriers# 3herefore, e4pect 5%R6 high mo)ility in graphene
3he velocity of anelectron at the &ermilevel (v&#s inversely related tome+
9
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Castro-Neto, et al. Rev. Mod.Phys. 81 (!!"# 1!"%+ective mass for graphene does
get very small as n 1!1
:
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;
7/25/2019 Lecture 13 Graphene Properties
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<. =>? 'raphene is great, lots of interestingproperties for devices@
7. AoB do yo* ma0e a device
<. 6o* need a sheet of graphene@
7. =>, hoB do yo* get a sheet of graphene
<. A=P', scotch tape, and tBeeDers@
7. @EFGHH
#he Big Pro$lem with graphene% an
imagined con&ersation%
I
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AoB do yo* JgroBK graphene
6o* can evaporate Si from SiC(!!!1# (either face#Pop*lariDed )y the de Aeer gro*p at 'eorgia 3ech.
8
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Can groB m*ltilayer Llms of graphene on SiC(aDim*thally rotated from each otherelectronically deco*pled@#
SiC
nterfacial layer
(anneal at 11:! C#
<nneal at 1$:! C
<*ger, graphene groBth on SiC, deAeer etal.
"
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7/25/2019 Lecture 13 Graphene Properties
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<ngle resolved PS (%mtsev, et al, PR7II(!!8# 1::$!$# shoBs transition to
graphene )and str*ct*re
11
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<dQacent layers on graphene /SiC are deco*pled fromeach other,O*e to aDim*thal rotation
1
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M7
'raphene on SiC(!!!1# Not *niform on an atomic level,di+erent regions d*e to di+erent Fs of layers, orientations
1$
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'raphene/SiC photoemission? varying hv can varythe sampling depth (%mtsev, et al, PR7 II (!!8#
1::$!$
19
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3he covalently )o*nd stretched graphene (CS'model#%mtsev, et al., PR7 II (!!8# 1::$!$
1:
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Pertinent *estions? AoB do <dQacent 'raphene Sheets co*pleelectronically
Single layer 'raphene (good#
Many layer'raphite (meh@#
<nsBer? =n SiC, <dQacent Sheets apparently not co*pled d*eto aDim*thal rotation
hen/hoB this transitionocc*rs is very pertinent todevices
1;
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Core (let) and &alence $and(right) PES graphene growthon SiC (Emtse&, et al)
%4plain the implications of this for graphene co*pling
)etBeen layers
1I
+ i i
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+oti&ation% irect Growth on ielectric S*$strates%
#oward Ind*striall- Practical, Scala$le Graphene—Basede&ices
Graphene Growth% Con&entionalpproaches
Metal or A=P'
C/ graphene monola-er
Si!0Si
transfer
1es*lt% graphenemonola-er, interacial inhomogen
SiC(!!!1#
T 1:!! >
SiC(!!!1#
1es*lt% graphenemonola-er or m*ltila-eronSiC(2223)
Si evaporation
!*r Foc*s%irect C/,P/ or +BE
!n
ielectrics
graphene
Si(322)
+g!(333)
n#opGate
FE#% Band gap
Coherent4SpinFE#%
Spintronics
Charge-)ased devices
+*lti4*nctional,non4&olatilede&ices
18
graphene
Co!"(3
33)
Co(333 ) or
S i(322 )4
ga te
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irect Growth o Graphene on ielectric S*$strates% S*mmar-
1"
Gate
N7 7*tterUy
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*ger
5EE I(/)
S#+
Intro6transer
deposition
Gate&al&es BCl
N7
#*r$o
7*tterUyvalve
Sample heating
to 1000 K @ 1Torr
87/ cham$er, 324
33 #orr
+BE
LEED
Hemispheri
cal analyzer
(XPS)
Sample processing P = 10-9
-10-3 orr!H" #nalysis
$ham%er
P & ' 1 0-10 orr
Freeradicalso*rce
5 orP/
Sample Introcham$er P 932
#orr :324;
Graphene6Co!"
Graphene6+g!(33
Graphene growth<
characteri=ation !
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'raphene/7N/R*(!!!1#? 7Qel0evig, et al
%%O shoBs 7N and 'raphene N=3 aDim*thally rotated@
!r$italh-$ridi=ation with1* d?
1
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'r/7N/R*(!!!1#? nverse photoemission. V not o)served@
7N layer does N=3 screen graphene from or)italhy)ridiDation and charge transfer from R*@
Graphene on Co ! (333)% +olec*lar Beam
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Graphene on Co!"(333)% +olec*lar Beam
Epita>-S*$strate Preparation
E&aporato
r P@ 324A #orr
Sapphire(2223)
2 D
Sapphire(2223)
Co(333) dissol&ed!
Sapphire(2223
)
Co(333)
3222 D687/
@ +5Co!"(333)
! segregation
$
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Graphene growth onCo!"(333)6Co(2223)
+BE (graphite so*rce)3222 D%5a-er4$-4la-er growth
9
1st M
nd M
2."+5
+5
M. Zhou, et al., J. Phys.: Cond. Matt. ! "01# 0$01
5EE%
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5EE%!>ide6Car$onInterace isincommens*rate%
ierent thangraphene onSiC or BN?
%raphene&omain Si'ed
"(rom )*+M#1-00 "/omp. to+P%#
400 300 200 100 05000
10000
15000
20000
25000
30000
35000
40000
O1
O2
G2
I
n t e n s i t y
Pixel Position
G1
400 300 200 100 05000
10000
15000
20000
25000
30000
35000
40000
I n t e n s i t y
Pixel Position
O1
O2
G2
G1
=4ide spotsatten*atedBithincreasingCar)oncoverage
.8 W =-= s*rface repeatdistance on Co$=9(111#W. Meyer, et al. JPCM 0 (2008) 265011
.8W
.:W
2."+5
+5
graphene
Co!"(333)
:
;: e5 )eam energy
M. Zhou, et al., J. Phys.: Cond. Matt. !"01# 0$01
HPS% C(3s) Shows ' s-stem%
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HPS (separate cham$er)%
0A".(J2.3) e/$indingenerg-%Interacial
polari=ation6charge transerto o>ide
No C4! $ondormation
;
'K'
HPS% C(3s) Shows ' s-stem%Binding Energ- indicatesgraphene
o>ide chargetranser
l DL
so*rce
M. Zhou, et al., J. Phys.:Cond. Matt. ! "01#
chargen4t-pe
irectl- grown
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E
chargetranser
For$ea*>, et
al.
n t-pep4t-peirectl- grown
graphene6metals anddielectrics%
In&erse photoemission andcharge transer
Position of σ (relative to %&#indicates direction of interfacialcharge transfer(>ong, et al., X.Phys. Chem. C.119 (!1!# 1;18
M*ltilayers
I
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8
Generali=ation, irectl- Grown Graphene andCharge #ranser% !>ides (p4t-pe) &s. +etals (n4
t-pe)
3ransition
metals(R*, Ni, C*, rY#
n4t-peM metal tographene charge
transer
=4ides, SiC
p4t-peM
graphene tos*$stratecharge transer
%&
%&
graphene
graphene
e4
e4
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S*spendedgraphene
'raphene (feB layer# onCo$=9?
M*ch more cond*ctive thans*speneded graphene
hy•SigniLcant doping•Aigh mo)ility (AoB
high# "
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Concl*sion%
Graphene%
5arge area growth onpractical s*$strates
critical or de&icede&elopment.
Interactions with
s*$strates and (ma-$e)other graphene la-ers arecritical to de&ice
properties $!