Key Success Factor of SSD - dcslab.hanyang.ac.krdcslab.hanyang.ac.kr/nvramos08/SungheeHong.pdf ·...
Transcript of Key Success Factor of SSD - dcslab.hanyang.ac.krdcslab.hanyang.ac.kr/nvramos08/SungheeHong.pdf ·...
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Presentation Agenda
-- Raw NANDRaw NAND-- Performance & ReliabilityPerformance & Reliability
Key Success FactorKey Success Factor
Market IntroductionMarket Introduction
ConclusionConclusion
3
0.4 0.9 2.24.5
6.5
10.6 11.514.5
15.918.2
21.424.1
13%18%15%10%
26%
8%
63%
44%
105%
144%125%
0
10
20
30
40
2000 2001 2002 2003 2004 2005 2006 2007 2008 2009 2010 20110
0.2
0.4
0.6
0.8
1
1.2
1.4
1.6
Revenue Growth
CAGR: 15% (2008~2011)
Unit : B$
Source : WSTS
Slower but Continuous Growth in NAND Market from 2008
NAND Market Forecast: OverallNAND Market Forecast: Overall
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Strong & Continuous Demand from PC Storage
Source : Hynix Marketing
Unit : Mpcs (8Gb EQ)
0 10,000 20,000 30,000 40,000 50,000 60,000 70,000
'12
'11
'10
'09
'08
'07
Game
Mobile Phone DSCUSBMP3 /PMPPC StorageOthers
432% 111% 84% 83% 114% 61%
25%
3%
PCStorage
5%
6%
Others
9%
13%
USB
27%
25%
MobilePhone
8%
17%
DSC
2%24%2012
2%34%2008
GameMP3/PMPPortion
4,047
1,785
8,610
18,250
33,385
58,850
NAND Application TrendNAND Application Trend
5
0
10
20
30
40
50
60
70
2008 2009 2010 2011 20120
40
80
120
160
200
240
280Shipment Avg. GB
PC will be a new killer application of NAND
Source : Hynix Marketing
10%
19%
24%
25%
PC Portion in NAND Market SSD Market ForecastUnit : Mpcs Unit : GB
2.6%
SSD Market ForecastSSD Market Forecast
0
10000
20000
30000
40000
50000
60000
70000
2008 2009 2010 2011 2012
70
60
50
40
30
20
10
0
Unit : Bpcs (8Gb EQ)
6
Source : Hynix Marketing
0.3%
0.8%
1.5%
2.0%
0
50
100
150
200
2009 2010 2011 2012
0%
1%
1%
2%
2%
3%
DT DT with SSD Portion
[Desktop]
13%
21%
25%
6%
0
50
100
150
200
250
2009 2010 2011 2012
0%
5%
10%
15%
20%
25%
30%
NB NB with SSD Portion
[Notebook]
6%
13%
27%
3%
0
2
4
6
8
10
12
2009 2010 2011 2012
0%
5%
10%
15%
20%
25%
30%
Server Server with SSD Portion
[Server]Unit : Mpcs
SSD Adoption Rate in Computing DeviceSSD Adoption Rate in Computing Device
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Server
Notebook
Enterprise
UMPC
MID
Low-cost PC
GPS Navigation
DVC
Computing Device
ConsumerDevice
[HDD Type]
[Module Type]
[Chip Type]
I/F: SATA 3Gbps
Size: 1.8”, 2.5”
Density: 256GB in 2009
I/F: PATA, SATA
Size: Customized
Density: 64GB in 2009
I/F: eMMC
Size: 14 x 18 x 1.3 mm, 169FBGA
Density: 32GB in 2009
SSD Market SegmentationSSD Market Segmentation
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Presentation Agenda
-- Raw NANDRaw NAND-- Performance & ReliabilityPerformance & Reliability
Key Success FactorKey Success Factor
Market IntroductionMarket Introduction
ConclusionConclusion
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19MB/sec
112MB/sec
HS-NAND
(MLC)
16MB/sec
38MB/sec
Standard NAND
(MLC)
Write Performance
Read Performance
2Plane with Interleave + 2CE
38MB/sec
2Plane with Interleave + 2CE
38MB/sec
RemarkStandard NAND
(SLC)
NAND Performance Comparison
Standard NAND: tPROG=200us(SLC)/800us(MLC), tRC/tWC=25ns, tR=25us(SLC)/50us(MLC)
HS-NAND : tPROG=800us(MLC), tRC/tWC=7.5ns, tR=50us
Standard NAND
HS-NAND
Command,Address,Data for page0
Command,Address,Data for page1
Command,Address,Data for page2
900us300us 600us 1200us 1500us 1800us 2100us
tPROG=800us
tPROG=800us
tPROG=800us
tPROG=800us
100us 100us 100us
30us 30us 30us tPROG=800us
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Interface SpeedCycle time(tRC/tWC) is important for NAND performance
Maximize the performance using by high speed interface scheme
HS-NAND (High speed NAND, DDR)
Comparison between HS NAND and STD NAND
2.7V ~ 3.6VVCC2.7V ~ 3.6V
YesScalable Higher PerformanceNo
YesCache ModeSome
1.7V ~ 1.95VVCCq2.7V ~ 3.6V
7.5ns (DDR)tRC/tWC≥ 25ns (SDR)
YesSynchronous InterfaceNo
HS-NAND
(ONFI 2.0)
Standard NAND
(ONFI 1.0)Feature
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Migration for NAND Cell structure
0%
25%
50%
75%
100%
2007 2008 2009 2010
Now4Q ‘08
Source : Hynix Marketing
SSD : <64GBSLC 2GB
128GBMLC 8GB
256GB16GB
512GB16GB
Floating Gate 5XnmFloating Gate 5Xnm
F.G 4XnmF.G 4Xnm
F.G or CTD
CTD will be one of solution for <3xnm NAND
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Characteristics of CTD Technology
Floating gate spacing limitation; ~35nm
Cell to cell interference
Retention
CTD (Charge Trap Device)
What are the critical issues?
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Introduction to CTD
Floating Gate Cell
F. Gate
C. Gate
Tunnel Oxide
Nitride
C. Gate
Tunnel Oxide
Blocking Oxide
S D
S D
CTD Cell(TANOS/SONOS)
Thermal Oxide
Poly-silicon
(Free Electron)
Top Oxide/Nitride
/ Bottom Oxide
Poly-silicon
Tunnel
Oxide
Floating Gate
IPD
(ONO)
Control Gate
Thermal Oxide
Nitride
(Trapped electron)
High-K Dielectric
Metal Gate
Tunnel
Oxide
Charge Trap
Blocking Oxide
Control Gate
Structure & X-section Material
IPD
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Electrical Characteristics of CTD
Better E/W Characteristics
Less Interference
E/W Cycling Characteristics Cell-to-Cell Interference
than FG NAND
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Presentation Agenda
-- Raw NANDRaw NAND-- Performance & ReliabilityPerformance & Reliability
Key Success FactorKey Success Factor
Market IntroductionMarket Introduction
ConclusionConclusion
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Factors to enhance NAND performance - I
Maximize NANDPerformance
Large Page(4KB/8KB)
Optimize AC Timings
Optimize BUS Activities
Cache Program/Read
Multi-PlaneOperation
InterleavedOperations
Performance can be enhanced by key parameters(Multi chip operation, Larger page device, Cache Program/Read, etc)
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How to enhance the NAND performance ?
-Multi-channel, Multi-way interleaving parallelism.
26.4
78.4
13.2
39.2
6.6
19.6
1PLANE 2WAY
MLC
MLC
MLC
SLC
SLC
SLC
119.2108.494.853.247.63023.614.813.2
59.654.247.426.623.81511.87.46.6
29.827.123.713.311.97.55.93.73.3
119.2
59.6
29.8
1PLANE 8WAY
119.2114113.6113.6112.458.459.639.24
59.65756.856.856.229.229.819.62
29.828.528.428.428.114.614.99.81
2PLANE 8WAY
2PLANE 4WAY
1PLANE 4WAY
2PLANE 2WAY
2PLANE CACHE
2PLANECACHE1PLANECHANNEL
SLC PAGE SIZE : 4K, tWC : 25ns, tPROG : 200us
MLC PAGE SIZE : 4K, tWC : 25ns, tPROG : 800usUNIT [MB/S]
Factors to enhance NAND performance - II
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Performance Data
SLC- Page Size : 4KB- tWC : 25ns- tPROG : 200us
MLC- Page Size : 4KB- tWC : 25ns- tPROG : 800us
MB/S MB/S
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E/W endurance is related with tech and type of cell.Tech. shrink cause to lower E/W performance, so optimal wear-leveling must be required.
Introduction of Wear-leveling - I
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Dynamic Wear LevelStatic Wear LevelGlobal Wear Level
BLOCK
1
BLOCK
2
BLOCK
3
BLOCK
4
BLOCK
5
BLOCK
6
BLOCK N
-
2
BLOCK N
-
1
BLOCK N
Write Access
Compare E/W Cycle
OCCU
PIED
FREE OR
BUFFER
Victim Block
Does not need additional copy back
Does not need additional block erase
Introduction of Wear-leveling - II
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Dynamic Wear LevelStatic Wear LevelGlobal Wear Level
BLOCK
1
BLOCK
2
BLOCK
3
BLOCK
4
BLOCK
5
BLOCK
6
BLOCK N
-
2
BLOCK N
-
1
BLOCK N
Static Wear Level
Source Block
Compare E/W Cycle
OCCU
PIED
FREE OR
BUFFER
Victim Block
Need additional copy back
Need additional block erase
Introduction of Wear-leveling - III
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Dynamic Wear LevelStatic Wear LevelGlobal Wear Level
Introduction of Wear-leveling -Ⅳ
CHIP 0
BLO
CK
Nth
Global Wear Level
Target Block
Victim BlockCompare E/W Cycle between Chips
CHIP N
BLOCK M
th
Every global wear level cause
Additional copy back
Additional block erase
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Performance trade-off by Wear-leveling
Frequent wear leveling may degrade performance
Additional E/W cycle + Read out & Write back
Wear level threshold
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Advanced Controller (Hardwired-FTL)
Command Data Transfer
Latency Factors• Address transition• Map table Look-up• Define write buffer policy; Random or Sequential• (Channel 1)• Data transfer• (Channel 2)• Data transfer• (Channel 3)• …
Software based FTL causes Long latency
Reduced by Hardwired FTL
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Presentation Agenda
-- Raw NANDRaw NAND-- Performance & ReliabilityPerformance & Reliability
Key Success FactorKey Success Factor
Market IntroductionMarket Introduction
ConclusionConclusion
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Conclusion
• Limitation of current FG technology should beresolved by adopting new technology(CTD)
• High Speed interface enhances the performance
• Optimal Wear-leveling algorithm satisfying bothPerformance and Reliability
• Complexities of NAND Management require Hard-wired FTL design