Nanotechnology is about Nano-Precision

John Randall Ph.D. Vice President

Zyvex Labs

jrandall@zyvexlabs.com

APEC March 2011 Fort Worth

What are the drivers for Human Progress?

• Human Ingenuity

What are the drivers for Human Progress?

• Human Ingenuity

• Materials

What are the drivers for Human Progress?

• Human Ingenuity

• Materials

• Manufacturing Precision

What are the drivers for Human Progress?

Human Ingenuity

• Wheel - 3500 BC

• Ball Bearings – 40 AD

• Steam Engines – 100 AD

• Computing Machines– 1822 AD

Human Ingenuity made practical

• Wheel - 3500 BCChariots – 2500 BC

• Ball Bearings – 40 AD Used in bicycles - 1869

• Steam Engines – 100 AD Newcomb Engine - 1712

• Computing Machines – 1822 AD IBM PC - 1980

New materials and improved manufacturing precision lead to lower cost, higher performing, more efficient, and more reliable products.

Norio Taniguchi’s Precision Chart

Effective nanotechnology: Small is not enough

• Carbon nanotubes are small and have outrageous electrical, thermal, and mechanical properties. – Their assembly and interfacial interaction must have precision to

capture these properties in macroscopic objects.

• High tech leads the charge in remarkable miniaturization of everything. But there is always “Some Assembly Required”. We are still in the dark ages in assembly of small parts which is still principally done by hand. – I will describe an automated, high-precision, micro assembly technology

that will allow downscaling and parallelization for high throughput.

• The ultimate in precision would be a manufacturing process that could make arbitrary 3D structures where we are in control of the position of every atom.

– Science fiction? – Stay tuned.

Graphite

Single-Walled Carbon NanotubesMulti-Walled Carbon Nanotubes

CNT Background

Zyvex’s Technology

• Two distinct functions: – Non-damaging binding– Controlling reactivity

• Binding applicable to SWNTs, MWNTs and other nanostructures

• Reactivity function may be engineered for different uses:– Solution in organic solvents– Adhesion to composite matrix– Solution in water– Sensor applications – Other chemical functionalityFunctionalization technology

The key• Zyvex’s IP protected polymer,

Kentera™ – is the Key– Nanotubes are the

strongest materials known to man and highly conductive

– Kentera enables Zyvex to integrate nanomaterials into composites and provide significant strength-to- weight increases at an affordable cost

Problems we solve • When they need cost effective solutions for

– Molecular technology developments – ½ the weight at 2X the size– Repairs stronger than original construction– Multifunctional materials

applications where we solve them…

Structures Infrastructure Maritime

Comparative Performance• Arovex

Comparative Performance• Arovex

Comparative Performance• Epovex Adhesive HK 100

Transforming assembly manufacturing:

1. Downscaling path 2. Parallel processing 3. Digitization

Micro Assembly

MEMS Fabrication Process

SOI wafer slice

525µm Handle

50µm SCS

2µm BOX

The 3D models are made using our MEMS emulation software: MEMulatorTM

Assembly Operation

1. Detether

4. Place

3. Rotate

2. Pick

The 3D models are made using our MEMS emulation software: MEMulatorTM

TetherEnd-effecter

Device layer

Gripping flexure

Connector Socket

Socket

Microassembly

Microassembly

Parallel Placement

Photon Optic Devices

• Heterogeneous assembly silicon and non- silicon parts

• Unique fiber connectors allow high tolerance placement of fibers and lens

• Integrated micro-motors allow tunable mirrors and gratings

• No epoxy usage

Optical Spectrometer

Charged Particle Optics

8mm Scanning Electron Microscope Column

5mm Rotating Field Mass Spectrometer

Miniaturized Systems

19 inch Equipment Rack 19mm Equipment Rack15,000X smaller volume

Power Bus10um PitchData Bus RF Bus

Electro-Mechanical Connector Slots

Power supplies, clocks, etc.

Chip-Cards

Atomically Precise Manufacturing

• The ability to create perfect structures with absolute precision.

Norio Taniguchi’s Precision Chart

Dr. Tayo AkinwandeDARPA Program Manager

Contract N66001-08-C-2040Supported by DARPA, the State of Texas and Industrial Cost Share.

Total of 14M-USD for 4.5 Years.

Tip Based Nanofabrication Program

Universities:University of Texas at DallasBob Wallace, Yves Chabal, KJ Cho, JF Veyan

University of Illinois at UCJoe Lyding

University of North TexasBrian Gorman, Rick Reidy

University of Texas at AustinS. V. Sreenivasan

University of Central FloridaDennis Deppe

State Agency: N.Texas RCICR. Mike Lockerd

Industry:Zyvex LabsJ. Randall, J. Von Ehr, J. Ballard, R.Saini, J. Owen, S. Manning

IC Scanning Probe InstrumentsNeil Sarkar

General DynamicsTihamer Toth-Fejel

Molecular Imprints Inc.S. V. Sreenivasan

Vought AircraftMartin Wimmer

National Labs: NISTRick Silver, Jason Gorman

Sandia Mike Kanouff

International Collaborators:Univ. New South WalesMichelle Simmons Wolfgang Klesse

University College LondonDavid Bowler

Zyvex Asia Hai Xu, Shi Chen, Lerwen Liu

IMRE (Singapore)Alfred Huan, Johnson Goh, Eric Cox, WeiJie Ong

Your Institution Your name here

Future Collaborators

Atomically Precise Manufacturing: Our Technology Approach

• APM is the integration of two known experimental techniques: – The atomic precision removal of H atoms from a silicon surface– Atomic Layer epitaxy: the deposition of a single layer of Si atoms

• No direct tip manipulation – gas phase material transport

• Scalable process – expands to other material systems

• Not yet fully demonstrated

1nm

Invariant atomically-precise STM tip, with closed loop computer control, inside UHV system, removes H from Si surface with atomic precision

In deposition phase, gaseous SiH2 radicals deposit one Si atom wherever H atom is removed (patterned Atomic Layer Epitaxy)

After each deposition cycle, SiH2 is evacuated and patterning step is repeated to create designed 3D structure

AP H depassivation with STM

Hersam and Lyding UIUC

Butcher and Simmons UNSW

100 nm

“Perfect” Lithography

An unpublished example of perfect patterning by Lyding at Univ of Illinois.

44 H atoms have been removed to form a 1.55 x 4.26nm rectangle.

Blue circles indicate where the H atoms have been removed.

The two additional dangling bonds (missing H atoms) were there prior to the patterning process.

However this is not yet a highly reliable automated process.

Case Study: Atomically Precise Metrology Standards

• A wall of Si – A known number of lattice units wide – A known number of lattice units tall – Long enough to be found by an AFM, SEM, etc.

• Can be sold for > $10,000

Case Study: Life Sciences….

• Structures fabricated to interact in designed ways with specific molecules:

– Ultra high speed DNA sequencing

– Ultra precise molecular filtering

– Designed molecular binding sites

– Designed enzymatic catalysts

Nano Bio

Case Study: DNA Nanopore

• Only nanopores fabricated with atomic precision will be able to read individual bases at speeds required for low cost DNA sequencing enabling: – Genetically tailored drugs– Optimized crops– Rapid identification of evolving

diseases• Current fabrication techniques

have >1nm variation.– However, the tunnel current

readout mechanism is extremely sensitive to distance: a 0.1nm variation in tunneling distance results in ~10X variation in current.

• APM could enable this high value application.

Case Study: Nano Mechanics

• L=W= 89 Atomic layers = 12.1nm

• Minimum feature 9 atomic layers 1.2nm

• Operating Resonant Freq=246GHz

• Extremely High Q

LW

Substrate

ResonatingMass

DriveElectrode

SenseElectrode

Si Bulk Longitudinal Resonator

MEMS Oscillator

AP Structures Polymer

Products• Molecular binding sites• Nanopore membranes• Catalysts• Nanooptical elements • NOT VLSI

Case Study: Master Nanoimprint Templates

Some loss of fidelity: • From Si structure to template• From Master to Daughter • Imprint Process • Pattern Transfer

Cost of AP portion of Specific Products

• DNA Nanopore 2nm pore in membrane with local electrodes for read-out – Requires additional tip induced deposition of

electrodes– Requires additional processing to get pore

over opening • CD Metrology standard for semiconductor

industry • NEMS resonator for low-power High-

Frequency radio– Requires process that includes sacrificial layer

nm nm nm um3 LR % $/um3 Product component Cost/unit Units Total $1000 1000 10 1.0E-02 90% $ 476 DNA Nanopore $ 4.76 200 $952.00

1000 20 20 4.0E-04 0% $2,970 CD Metrology standard $ 1.19 10 $11.88

10 10 4 4.0E-07 0% $2,970 NEMS resonator $ 0.001 10 $0.01