© ABB Group September 5, 2011 | Slide 1

Wet Process Analyzer

Jerry Tsai, ABB Taiwan, 2011/8/26

© ABB Group September 5, 2011 | Slide 2

Our Markets

Petroleum Chemical

Pharmaceutical Semiconductors

Academic Environmental

Dairy OEM

Markets

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What is WPA?

Wet Process AnalyzerABB’s solution for real-time, on-line wet process monitoring and control in the Semiconductor and TFT-LCD industry

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Wet Process Analyzer SamplingClippIR+ the Patented Teflon Cell (¾ inch or ½ inch tubing)

1. Unscrew the Cap

2. Insert Tubing into the Slot

3. Screw on Cap

Installed !!

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Wet Process Analyzer: features

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Communication Supplied as Standard Protocols with FTSW100

1. OPC Protocol

An Ethernet Communication Link

Provides for high / low (digital like) inputs and outputs

Provides predicted value outputs

Requires an OPC client on the control system side.

OPC is a Microsoft communication protocol standard

2. MODBUS Protocol

A serial communications link

Works on RS-232

Works on RS-485 if a 232 / 485 converter package is employed

Provides for high / low (digital like) inputs and outputs

Provides predicted value outputs

Requires a MODBUS RTU master on the control system side.

MODBUS emulates a hardwire communication, but the communication is performed through a single serial cable

MODBUS is used in a wide variety of industries

Both OPC and MODBUS will accept inputs from most benches without additional hardware requirements.

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Instrument CheckDuring operation instrument continuously performs self-diagnosticsComplete instrument re-validation can be performed any time by an operator by launching pre-configured test sequences (5 min)

Preventive MaintenanceNIR source replacement

Source lifetime: 9-12 months (instrument on 24/7)Recommended replacement every 6 monthsReplacement + test takes ~3hCan be performed by customer

Laser replacement

Recommended replacement every 3 yearsReplacement & Test requires ~4hMust be performed by certified service engineer

WPA Maintenance

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Key Figures WPA MaintenanceEquipment Uptime: 99.5% / Year

2 days for source replacement (1every 6 months)

Mean Time Between Failures (MTBF)5 year

Parts#SMA1700G#SMC2900G

WPA Maintenance

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ABB Michelson FT-IR

Cube Corner Mirrors Cube Corner Mirrors

HeHe--Ne laserNe laser

Scan armScan armMovingMoving

CoilCoil

Beam Splitter Beam Splitter

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Light Source-replacement

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Why WPA?

QC

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How? ABB Wet Process Analyzer

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FTNIR instruments

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ABB WPA

(< 25 seconds)

(up to 6+)Bench/per WPA

(Ethernet)

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Supported Chemicals by WPASC1 (APM) NH4OH, H2O2, H2OSC2 HCl, H2O2, H2OHF (DHF) HF, H2OSPM (Piranha) H2SO4, H2O2, H2OHF-HCl HF, HClBOE (BHF) NH4F, HF, H2ODSP H2SO4, H2O2, H2OKOH / H2O2 KOH, H2O2, H2OAFN Acetic Acid, HF, HNO3, H2OEG-HF Ethylene Glycol, HF, H2OVapox Etch Acetic Acid, Ethylene Glycol, HF, H2OSILOX NHF4, HF, Ethylene Glycol, H2OTMAH TMAH, H2OTMAH / H2O2 TMAH, H2O2, H2OCitric Acid Citric Acid, H2OPhosphoric Acid H3PO4

MAE (HF type) H3PO4, HNO3, H2O, HFMAE (AA type) H3PO4, HNO3, H2O, Acetic AcidBSG (SHF) HF, H2SO4, H2OIPA/KOH IPA, KOH, H2O

Microstrip-5002 (Proprietary chemistry)

EKC 265 (Proprietary chemistry)

Kanto Deer Clean (Proprietary chemistry)

ESC MR 10 (Proprietary chemistry)

ESC 784 (Proprietary chemistry)

ESC 774 (Proprietary chemistry)

ST-250 (Proprietary chemistry)

ST-255 (Proprietary chemistry)

REZI-38 (Proprietary chemistry)

ALEG310 (Proprietary chemistry)

CLK 888 (Proprietary chemistry)

ACT 930 (Proprietary chemistry)

ACT 970 (Proprietary chemistry)

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Applications

For DRAM application:Clean (SC1/HF/HCl/BHF…)Etch (SPM/DSP+/HCl)CMP (SC1/H2O2)

For TFT-LCD: AUO,PR-Stripper(N300/TOK-106/DPS3300)Al Etch (H3PO4, HNO3, H2O, Acetic Acid)

For Solar cell :Etch (IPA-KOH/HNO3-HF-H2SiF6)Clean (HF/HCl)

Customized applications TSMC,Du PontCLC32EKC

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Installed base 2008: ~250 WPA, 800 Clippirs (1/3 Europe, 1/3 Asia, 1/3 USA)

FTPA : ABB

ABB Semiconductors, SWITZERLAND Micron Technology, USAAdvanced Micro Devices, GERMANY Mitsubishi Chemical Engineering, JAPANAdvanced Micro Devices, USA Northrop grumann, USAAkrion, USA Philips Semiconductors, NETHERLANDSALTIS, FRANCE ProMOS Technogies, TAIWANATMEL, FRANCE Samsung Electronics, KOREA ATMI, USA Samsung Electronics, USA AUO, TAIWAN Samsung SDI, KOREACPT, TAIWAN SCP Global Technologies, USADalsa Semiconductors, CANADA Seki Technotron, TAIWANDongjin SemiChem, KOREA Semitool, USAFraunhofer Institute, GERMANY SEZ, AUSTRIA Freescale MOS 12, USA SMIC, CHINAInf ineon Technologies, GERMANY STI, KOREAInf ineon Technologies, AUSTRIA SunPow er, PHILIPPINES INTEL, USA Tateyama Devices, JAPANLAM Research, USA Wacker Siltronic, GERMANY Mattson Wet Products, USA Wafer Works Corporation, TAIWAN

Eliminating production excursions caused by unregulated

photoresist baths—that was my main goal when installing

ABB’s WPA. I not only met this goal, I exceeded it: the WPA

enabled us to eliminate scrap and extend overall bath life

by 23%. We estimate combined savings from a reduction

of chemicals purchased (thanks to extended bath life), lower

disposal costs of used chemicals and reduced excursion risk

has resulted in a savings of over $600,000 US per year.

WPA Payback Assessment: Economic Data

WPA Results: DSP with Spiking

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