'IDW '99 ; 6 (Sendai) : 1999.12.01-03' - gbv.de · IDW'99 Proceedings of TheSixth International...

IDW '99Proceedings

of

The Sixth International Display Workshops

Workshops on

• LC Science and Technologies• Active Matrix Displays• Passive Matrix LCDs

• FPD Materials and Components•CRTs

• Plasma Displays• EL Displays, LEDs, and Phosphors• Field Emission Display• Large-Area and Projection Displays,

and Their Components• 3D Display Technologies and

Human Factors

December 1 -3, 1999

Sendai International Center

Sendai, JapanUB/TIB Hannover120 057 182

89

Sponsored byThe Institute of Image Information and Television Engineers

ITE | Kikai-Shinko-Kaikan, 3-5-8 Shiba-Koen, Minato-ku, Tokyo 105-0011, Japan

The Society for Information Display, Japan Chapter

M. Maeda, SID Japan Chapter Chair, c/o Display Device,

Home Network Company, SONY, 4-16, Okata, Atsugi 243-0021, Japan

SIDJAPAN CHAPTER

IDW '99

TABLE OF CONTENTS

IDW '99

10:00-10:15Wednesday, December 1

Main Hall

Opening

Master of Ceremony: H, Murakami, Executive Chair

Opening Remarks

S. Mikoshiba, Organizing Chair

H. Kawakami, Steering Chair

S. Tanaka, Program Chair

10:20-11:50 Main Hall

Keynote Addresses

Keynote Address -1

HDTV-Based Digital Broadcasting in Japan

T. Hasegawa

NHK, Japan

Keynote Address - 2

Display Technology and ComputerEntertainment (Console, Portable, Location)

S. Okamoto

Sony Computer Entertainment, Japan

Thursday, December 218:00-19:10 Tachibana

Invited Addresses

Invited Address -1

Present Status and Future Prospect of

Technological Development on Color PDPs

11

T. Hirose, K, KariyaFujitsu Hitachi Plasma Display (FHP), Japan

18:35

Invited Address - 2

Recent Progress and Strategies of TFT-LCD

Manufacturing in LG.Philips LCD 15

H.-S. Soh

LG.Philips LCD, Korea

Workshop on LC Science and Technologies

Thursday, December 2

14:00-16:30 Sakura

Poster LCTpl: Photo-Alignment Technologies

LCTpl -1 New LC Photo-Alignment Materials II: Effect

of Polymer Structure on the LC Photo-

Alignment Characteristics 21

Y. Nagase, E. Akiyama, Y. Miyama*,T. Nihira* H. Endo* H. Fukuro*

Sagami Chem. Res. Ctr., Japan*Nissan Chem. Inds., Japan

LCTpl - 2 Photo-Induced Liquid Crystal Alignment on

Polyimide Containing Fluorine Group 25

S.-J. Sung, H.-T. Kim*, J.-W. Lee, J.-K. Park

KAIST, Korea

Inst, for Adv. Eng., Korea

LCTpl - 3 Synthesis of Thermally Stable Photopolymerand Its Application to LC Alignment with a

Linearly Polarized UV Exposure 29

J. Kim, T. Kim

Sung Kyun Kwan Univ., Korea

LCTpl - 4 Pulsed Laser-Induced Liquid Crystal

Alignment Parallel to the ExposurePolarization 33

Y. H. Wang, T. Natsui, Y. Makita, A. Kumano,

Y. Takeuchi

JSR, Japan

See Late-News

14:00-16:30 Sakura

Poster LCTp2: Simulation and Modeling

LCTp2 -1 Dynamic Bend Mode in a Pi-Cell 37

H. Nakamura

IBMJapan, Japan

LCTp2 - 2 Electro-Optic Study of an IPS Mode by

Using a Uniaxial Medium Model 41

T. Satake, T. Nishioka, T. Kurata

Mitsubishi Elec, Japan

LCTp2 - 3 Two Dimensional Optical Analysis of

Reflective TN Modes with Variable Rubbing

Angles on the Pixel Array 45

D. D. Huang, J. Chen, H.-C. Huang,H. S. Kwok

Hong Kong Univ. ofS&T, Hong Kong

LCTp2 - 4 Optical Design of the LC Layer on Reflective

LCDs with a Single Polarizer 49

M. Okamoto, K. Minoura, S. Mitsui

Sharp, Japan

LCTp2 - 5 Modeling and ComputerSimulation of

Polymer Stabilized FLCDs ExhibitingMonostability and Fast Response 53

T. Umeda, T. Takahashi, H. Furue,

S. KobayashiSci. Univ. of Tokyo in Yamaguchi, Japan

LCTp2 - 6 Study on New Reflective Display Modes

Using Amorphous LC Alignment Structure

57

H. Kobayashi, Y. Takahashi, Y. iimura

Tokyo Univ. ofA&T, Japan

LCTp2 - 7 Real Time Measurement of Twist Angles in

Nematic Liquid Crystal Cells Using

Circularly-Homogeneously Aligned Cells

61

M. Honma, H. Yamaguchi, S. Sato

Akita Univ., Japan

IDW'99 V

TABLE OF CONTENTS

14:00-16:30

Poster LCTp3: New Panel Design

Sakura 10:40-12:10 Tachibana

LCTp3-1

LCTp3- 2

LCTp3- 3

LCTp3- 4

..65Method for Gap Formation in LCDs

V. A. Konovalov, A. A. Muravski,

S. N. Timofeev, S. Y. Yakovenko,S. T. Lagerwall*Inst. ofAppl. Phys. Problems, Belarus

*Chalmers Univ. of Tech., Sweden

Fabrication of Plastic Substrates with

Controlled Relief for Optical Componentsand Light Weight FPD 69

V. Belyaev, A. Volynski*, £ Voronina*

S. Bazhenov**, S. Ivanov*

AR Tech., Russia

*Moscow State Lomonosov Univ., Russia

**Semyonov Inst, of Chem. Phys., Russia

Negative Dielectric Anisotropic Liquid

Crystal Mixtures for TFT-LCD Applications

LCT2-1:

LCT2- 2

LCT2- 3

..73

S. T. Hong, W. C. Hu, J. L Lin, K. J. Chen,

S. T. WW

UCL, ITRI, Taiwan

*HRL Lab., USA

High Contrast PDLC Panels Having a Matrix

in which Pole Directions are RandomlyDistributed in a Plane 77

K. Nakao, H. Kubota, T. Uemura

Matsushita Elec. Ind., Japan

LCT2: Polymer-Based LCDs

Invited Holographically-Formed Polymer

Dispersed Liquid Crystal Reflective

Displays: A Diffusion Model Description..97

See Late-News

C. C. Bowley, G. P. Crawford

Brown Univ., USA

Transmission-Type Alignment-Controlled

Holographic PDLC for Reflective Displays101

M. Date, T. Hisaki

NTT, Japan

Drive-Voltage Reduction for HPDLC Displays105

J. K. Colegrove*'**, H. Yuan**, T. Fiske**,S.-T. Wu***, J. R. Kelly*, C. Bowley****,G. P. Crawford****

*Kent State Univ., USA

**dpiX, USA

***HRL Lab., USA

****Brown Univ., USA

LCT2-4: Invited Integral-Color Plastic LCD - The

Ultimate Flat Panel Display 109

C. Chiulli, J. DelPico, W. Vetterling,K. M. Johnson*, G. D. Sharp*, M. Schadt**,H. Seiberle**

Polaroid, USA

*ColorLink, USA

**ROLIC Res., Switzerland

Friday, December 3

9:00-10:25 Tachibana

LCT1: Photo-Alignment Technologies

LCT1 -1:

LCT1- 2

LCT1- 3

LCT1- 4

Invited Recent Progress in Optical

Alignment for LCDs 81

W. M. Gibbons, B. P. McGinnis, P. J. Shannon,

S. T. Sun, H. ZhengElsicon, USA

New LC Photo-Alignment Materials I:

Aromatic Polyamides with High Sensitivityand Stability 85

V. Miyama, T. Nihira, H. Endo, H. Fukuro,

E. Akiyama*, Y. Nagase*Nissan Chem. Inds., Japan

*Sagami Chem. Res. Ctr„ Japan

LC Alignment Properties of Photo-AlignmentMaterials Based on co-(4-chalconyloxy)alkylGroups 89

S. Nakata, K. Kuriyama, M. Kimura,

T. Natsui, Y. Makita, Y. Matsuki, A. Kumano,Y. Takeuchi

JSR, Japan

Fabrication of Defect Free FLCDs Using

Photo-Alignment and Their Characteristics

93

R. Kurihara, H. Fume, T. Takahashi,

S. Kobayashi

Sci. Univ. of Tokyo in Yamaguchi, Japan

14:00 -15:20 Tachibana

LCT3: Novel LC Technologies

LCT3 - 1 A Reflective HAN-LCD Compensated by a

DiscoticFilm 113

V. Tanaka, Y. limura

Tokyo Univ. ofA&T, Japan

LCT3 - 2 Reflective Three-Layer GH-LC Panel

Fabricated by Using Lithographic LC/Resist

Composite Films 117

N. Wakita, Y. Yamanaka


LCT3 - 3 Homeotropic Alignment of Liquid Crystals

by Single Evaporation of Si02 121

M. Lu, K. H. Yang, J. S. CheyIBM, USA

LCT3 - 4 Liquid Crystal Switching Using Comb-on-

Plane Electrodes 125

Z. Meng, H. S. Kwok, M. Wong


15:40 -17:00 Tachibana

LCT4: Polarization Effects in LC Devices

LCT4 -1 Wide-Viewing Display Configuration of

Helix-Deformed Ferroelectric Liquid Crystals129

J.-H. Lee, C.-J. Yu, D.-H. You, S.-D. Lee

Seoul Nat. Univ., Korea

VI IDW '99

TABLE OF CONTENTS

LCT4 - 2 Controlling Monostability of Polymer

Stabilized FLCDs by Changing PhotocuringCondition and Its Switchability with FETs

133

M. Shikada, T. Takahashi, H. Fume,

S. KobayashiSci. Univ. of Tokyo in Yamaguchi, Japan

LCT4 - 3 Influence of Ions on Voltage Holding

Property 137

Y. Nakazono, T, Takagi, H. Sato, A. Sawada,

S. Naemura

Merck Japan, Japan

LCT4 - 4 Surface Dynamics in SSFLC as Studied by

Time-Resolved Spectroellipsometry 141

H. Toriumi, T. Tadokoro*, T. Yoshihara**,

S. Okutani***, M. Kimura***, T. Akahane***

Univ. of Tokyo, Japan

*JASCO, Japan

**Fujitsu Labs., Japan

***Nagaoka Univ. of Tech., Japan

Workshop on Active Matrix Displays

Wednesday, December 1


AMD1: Poly-Si Technologies

AMD1 -1: Invited Low-Temperature Poly-Si TFT

Technology 147

H. J. Kim, J. H. Souk

Samsung Elect., Korea

AMD1 - 2 Low Parasitic Resistance Process in Laser

Crystallized Low-Temperature Poly-Si TFTs

151

S.-C. Chang, G.-L. Un, l.-M. Lu, W.-Y. Huang

ERSO/ITRI, Taiwan

AMD1 - 3 Microcrystalline-Si Thin Films by Physical

Vapor Deposition for Wide-Area Low-

Temperature Poly-Si Production 155

E. Demaray, B. Lee, R. Mullapudi,K.-A. Wang

Symmorphix, USA

See Late-News



AMD3: Novel Displays

AMD3 -1: Invited Low-Temperature Poly-Si TFTDriven

Light Emitting Polymer Displays and Digital

Gray Scale for Uniformity 171

M. Kimura, H. Maeda, Y. Matsueda,

S. Miyashita, T. Shimoda, S. W. B. Tarn*,

P. Migliorato*, J, H. Burroughes**,C. R. Towns**, R. H. Friend**

Seiko Epson, Japan

*Epson Cambridge Lab., UK

**Cambridge Display Tech., UK

AMD3 - 2 Poly-Si TFT Drivers for Light Emitting

Polymer Displays 175

S. W.-B. Tarn*, Y. Matsueda**, H. Maeda**,

M. Kimura**, T. Shimoda**, P. Migliorato*1***

*Epson Cambridge Lab., UK

**Seiko Epson, Japan

***Cambridge Univ., UK

AMD3 - 3 An AC-PALC Display 179

K. J. Ilcisin, T. S. Buzak, R. D. Hinchliffe,

W. R. Kurowski

Technical Visions, USA

AMD3 - 4 Development of Advanced TFT with Good

Legibility under Any Intensity of Ambient

Light 183

M. Kubo, S. Fujioka, T. Ochi, Y. Narutaki,T. Shinomiya, Y. Ishii, F. Funada

Sharp, Japan


AMD4: Wide Viewing Angle Technologies

AMD4-1: Invited Advanced 18.1-in.-Diagonal Super-TFT-LCDs with Mega Wide Viewing Angle

and Fast Response Speed of 20ms 187

S. Endoh, M. Ohta, N. Konishi, K. Kondo

Hitachi, Japan

AMD4-2: Invited A High Quality AM-LCD Using

Fringe-Field Switching Technology 191

S. H. Lee, H. Y. Kim, S. L. Lee

Hyundai Elect., Korea

AMD4 - 3


AMD2 : TFT Processes

AMD2-1: Invited Novel TFT Manufacturing with

Microwave Excited High Density and Low

Electron Temperature Plasma 159

T. Ohmi, K. Sekine, Y. Saito, H. Tanaka,

M. HirayamaTohoku Univ., Japan

AMD2 - 2 High Reliability in Back-Channel-Oxidized a-

Si:HTFTs 163

K. Takechi, H. Hayama, S. Ihida, S. Kido

NEC, Japan

AMD2 - 3 Silicon Dioxide Film Formation on LargeArea Substrates Using a Novel Radical

Source 167

H. Nogami, G. Xu, S. T. Ko, K. Numajiri,O. Okada

Anelva, Japan

A New Wide-Viewing-Angle VA-Mode LCD

with a Simpler Cell Fabrication Process

195

B. G. Rho, J. I. Han*, B. K. Yang**, J. S. Kim**

Asadal Display, Korea

*KETI, Korea

**ChonbukNat. Univ., Korea

AMD4 - 4 ATFT-LCD Using FrustratingAntiferroelectric Liquid CrystalJ. Ogura, T. Yoshida, M. Takei, H. Wakai,

H. Aoki

Casio Computer, Japan

,199

See Late-News

IDW '99 VII

TABLE OF CONTENTS

14:00-15:05 TachibanaAMDS: High Resolution/Reflective Technologies

AMD5-1: Invited Super High Resolution AM-LCD

Technology 203

R. L. Wisnieff

IBM, USA

AMD5 - 2 A 7.94ppm, 10-cm-Diagonal TFT-LCD UsingLow-Temperature Poly-Si Technology

207

M. Miyatake, T. Maeda, K. Nagayama,T. Morita, K. Kimura, K. Kawamata

Toshiba, Japan

AMD5 - 3 A Full-Color Reflective TFT-LCD Using an

Reflective Optically Compensated Twist

Mode with Wide Viewing Angle 211

M. Shibazaki, T. Ishinabe, T. Miyashita,T. Uchida, K. Yoshida*. H. Tanaka*, T. Sunata*

Tohoku Univ., Japan*Hosiden & Philips Display, Japan

AMDp - 4 New Bias Voltage Generators for TFT-LCD's

Drivers 239

M. Hirata, Y. Suzuki, M. Yoshida,

Y. Arayashiki, M. Teramoto, S. Choomchuay*Tokai Univ., Japan*ReCCIT/KMITL, Thailand

AMDp - 5 LCD Circuit Optimization by Genetic

AlgorithmS. Hatta


See Late-News

..243

Workshop on Passive Matrix LCDs

15:40-16 :50 Tachibana

AMD6: Plastic Substrates

AMD6-1: Invited Passive-Matrix and MIM-Driven LCDs

with Plastic Substrates 215

E. Lueder

Univ. of Stuttgart, Germany


14:00-15:20 Shirakashi 2

PLC1: Enhanced Passive Matrix LCDs

PLC1 -1: Invited Advanced Reflective Color

STN-LCDs 249

S. Komura, K. Kuwabara, O. Itou, M. Abe,K. Funahata, K. Kondo, N. Hoshino,Y. Iwakabe

Hitachi, Japan

PLC1 - 2: Invited Plastic LCD for Mobile Application.253

AMD6-2: Invited Low-Temperature Poly-Si for AM-LCDs on Glass and Polymer Substrates

..219

N. D. Young, I. D. French, M. J. Trainor,

D. T. Murley, D. J. McCulloch, R. W. Wilks

Philips Res. Labs., UK

AMD6 - 3 Characteristics of Low-Temperature-Processed a-Si TFT on Plastic Substrates

..223

M. Ikeda, Y. Mizutani, S. Ashida, K Yamada

Toshiba, Japan

Friday, December 3

14:00-16:30 Sakura

Poster AMDp: Active Matrix Displays

AMDp - 1 High Crystallinity Poly-Si by Excimer Laser

Annealing of Macrocrystalline Si 227

K. H. Jang, J. N. Lee, M. G. Lee, W. Y. So,K. N. Kim, H. D. Kim

Samsung Display Devices, Korea

AMDp - 2 Evaluation Method for Viewing Angle of TFT-

LCDs Based on Overall Picture Quality231

T. Suzuki, W. Song, J. Noguchi,Y. Shimodaira, G. Ohashi

Shizuoka Univ., Japan

AMDp - 3 Cost Effective Reticule Design for Very HighResolution Si Backplane Prototypes 235

J. Van den Steen, H. De Smet,G. Van Doorselaer, A. Van Calster, P. Colson*

Univ. of Gent, Belgium*Alcatel Microelect, Belgium

M. Watanabe, Y. Inoue, S. Fukuchi

Sharp, Japan

PLC1 - 3 Gray Scale Addressing Method byMulti-Order Paraunitary/OrthogonalBuilding Blocks 257

S. Yeung, J. Lee, B. Lam, J. Ng, I. Tsoi

Varitronix, Hong Kong

PLC1 - 4 Suitable Addressing Schemes for Mobile

Phone STN-LCDs 261

K. Tamai, M. Nagai, A. Nakazawa,

M. Kitamura, Y. Hirai, S. Matsuoka*, Y. Soda*

Asahi Glass, Japan*Optrex, Japan


PLC2: New Modes and

Novel Addressing Technologies

PLC2 -1: Invited Recent Studies of Multiplex Drivingfor BTN-LCDs 265

H. Nomura, T. Obikawa, Y. Ozawa, T. Tanaka

Seiko Epson, Japan

PLC2 - 2: Invited The Parametric Analysis of a BTN-

LCD by using Computer Simulation 269

J.-S. Oh, S.-C. Pang, H.-Y. Lee, J.-G. Yoo,

K.-H. Kang, E.-S. Lee


PLC2 - 3 A New Codeword-Addressing Technique for

Low-Cost Driving of High-Resolution

Passive-Matrix Displays 273

A. P. Aitken

Hewlett-Packard Labs., UK

VIII IDW '99

TABLE OF CONTENTS

..277

PLC2 - 4 Electro-Optical Characteristics and

Optimizations of Vertically AlignedSTN-LCDs

V. Iwamoto

Stanley Elec, Japan

Friday, December 3

14:00-16:30 Sakura

Poster PLCp: Novel Studies in Passive Matrix LCDs

PLCp -1 Development of a New GH-Mode Reflective

LCD with High Dichroic Ratio 281

M. Kawaguri, Y. Yamanaka, N. Wakita


PLCp-2

PLCp - 3

PLCp-4

PLCp-5

PLCp-6

A GH-LCD with Slightly Tilted

Homeotropically Aligned NLC Having a

Negative Dielectric Constant Prepared by

Photo-Alignment 285

H. Ushinohama, H. Yoshikawa, H. Fume,T. Takahashi, S. KobayashiSci. Univ. of Tokyo in Yamaguchi, Japan

Dependence of Light-Leakage Caused byDomain Formation Around Spacers on

Liquid Crystal Mixture in Normally Black

Mode LCDs 289

Y. Utsumi, S. Komura, Y. Iwakabe,

S. Matsuyama, K. Kondo

Hitachi, Japan

Key Technologies for the FLC Displays

Having Wide Operation Temperature 293

A. Sakaigawa, T. Sako, T, Furukawa,

M. Kabe, A. Tagawa, S. Okazaki, M. Koden

Sharp, Japan

Reflective Type Antiferroelectric LCD with a

Single Polarizer 297

D.-H. You, J.-H. Lee, J.-H. Park, S.-D. Lee

SeoulNat. Univ., Korea

FMC1 - 3 Characteristics of Rewritable Media UtilizingSmectic A PDLC Films 315

K. Sekine, W. Saito, A. Baba

Dai Nippon Printing, Japan


FMC2: Projection Systems

FMC2 -1: Invited Overview of Head Mounted Display

Technology and Applications 319

H. Ong, M. Presz

Kopin, USA

FMC2-2: Invited Ultra High Contrast Screen 323

H. Sekiguchi, M. Honda, K. Oda


FMC2 - 3: Invited Screens for Rear Projection LCD

..327

J. A. Shimizu, J. Goldenberg

Philips Res., USA

Design Optimization of BTN-LCD

S. Yeung, S. K Kwok, B. Fok, B. Lam,

C. Chang, I. Tsoi

Varitronix, Hong Kong

..301

See Late-News

Workshop on FPD Materials

and Components



FMC1: Technology Trends of FPD

FMC1-1: Invited Display Manufacturing Alternatives

and Their Cost Effectiveness 307

S. Takata

Advanced Data Res., Japan

FMC1-2: Invited Optical Films for Increased

Readability in Reflective LCDs

W. Hibbard, T. Jones, S. C. Webster,

D. Wortman

3M, USA

..311

See Late-News



FMC3: Reflective LCDs

FMC3-1: Invited Recent Advances in Reflective LCDs

331

J. A. M. M. van Haaren, C. Doornkamp,

H. J. Cornelissen, L. J. M. Schlangen,J. P. A. Deeben, P. van de Witte,

R. van Asselt, A. V. Henzen

Philips, The Netherlands

FMC3 - 2: Invited Multi-Color Cholesteric Display

Using a Plastic Substrate 335

J. L. West, V. Bodnar, Y. Kim, H. WonderlyKent State Univ., USA

FMC3 - 3 Improved Reflectors for Ambient Lit Hand

Held Displays 339

ft Clabburn, A. M. Fairhurst, F. Konishi*

Microsharp, UK

innovation Partners Int., Japan

FMC3 - 4 Optical Characteristics of a Linear Polarizer

for Reflective LCDs 343

T. Uwano, H. Seki, T. Uchida*

Hachinohe Inst, of Tech., JapanTohoku Univ., Japan


FMC4: LCD Backlighting and Others

FMC4 -1: Invited No-Mercury Flat Discharge Lamp for

LCD Backlighting 347

T. Shiga, S. Mikoshiba, S. Shinada*

Univ. of Electro-Commun., Japan

*Hitachi Lighting Equipment, Japan

FMC4 - 2 A Novel Cold Cathode Fluorescent Lamp

with an Adiabatic Layer 351

K. Nishimura, N. Tsutsui

Toshiba Lighting & Tech., Japan

IDW '99 IX

TABLE OF CONTENTS

..355

FMC4-3 A New Approach for Overlay and

Registration ImprovementL Leonardsson, P. Ekberg, K. EdgrenMicronic Laser Syss., Sweden

FMC4 - 4 Development of a Thermal CrosslinkingPhotoresist for LCD 359

T. Nishino, K. Niwa, M. Endo

JSR, Japan

See Late-News


FMC5: Color Filters

FMC5 -1: Invited Development of a Color Filter for

LCDs Based on Polyimide Materials 363

Y. Sakurai

Toray Ind., Japan

FMC5 - 2 Development of a New Color Set of Transfer-

Type Color Filter Materials for LCDs 367

H. Yoshino, K. Hasebe, H. Ito

Fuji Photo Film, Japan

FMC5 - 3 Resin Black Matrix for Color Filters 371

M. Yoshioka, K. Inoue, J. Tsukamoto, T. Goto,K. Shimizu

Toray Ind., Japan

FMC5 - 4 Chemically Amplified Resin Black Matrix

System 375

S. Dan, N. Suzuki

Fujifilm Olin, Japan

See Late-News

15:40 -17:05 Shirakashi 1

FMC6: Optical Films

FMC6 - 1 Bright Reflective Color Filters Based on

Cholesteric Liquid Crystral Materials 379

D, Reddy, A. Hochbaum, Y. JiangCLC Display, USA

FMC6-2: Invited Advancement in Wide-Viewing-Angle

LCDs 383

l.-W. Wu, D.-L. Ting, C.-C. ChangERSO/ITRI, Taiwan

FMC6 - 3 Homeotropically Aligned Thin Layer of

Discotic Liquid Crystals by Coating Method

387

K. Kawata, H. Nishikawa, S. Yokoyama,M. Ichihashi, M. Okazaki

Fuji Photo Film, Japan

FMC6 - 4 Design of AG Treatment on Display Surface

for High Resolution LCDs 391

S. Kobayashi, H. Shibata, Y. Takahashi,

T. Shouda

Nitto Denko, Japan

14:00-16:30 Sakura

Poster FMCp: FPD Materials and Components

FMCp -1 Low-Refractive-Index Materials for Wet

Process Coating System 395

N. Oikawa, N. Kunimine, Y. Ohta, T. Yoshihara


FMCp - 2 Visibility Evaluation of AG Films for LCDs

and Design of a Novel AG Film 399

G. Furui, T. Matsuoka, Y. Iwata, N. Nakamura,S. Umise


FMCp - 3 Diffusive Layer for Reflective Type LCDs

403

M. Miyatake, S. Yano, T. Sakuramoto, K Hara,K. Kawamura, Y. Fujimura,Nitto Denko, Japan

FMCp - 4 Hybrid Aligned Rod-like Liquid CrystallinePolymer Film as Viewing Angle

Compensator for NW-TN-LCDs:

Improvement of Gray Scale Performance

407

T. Kaminade, E. Yoda, K. Suzuki,T. Toyooka, Y. Kobori, K. Inoue*, T. Kurita*

Nippon Mitsubishi Oil, Japan*Nippon Petrochems., Japan

FMCp - 5 Optical Anisotropy of PhenylacetyleneHomologs : The Effects of Core Substituent

Groups 411

C. Sekine, K. Fujisawa, N. Kenya, M. Minai''Sumitomo Chem., Japan

FMCp - 6 A New Photoresist for LCD Panel Spacer415

T. Okita, Y. Masaki

Fujifilm Olin, Japan

FMCp - 7 Novel Topcoat Planarization Derived from

CardoEpoxy 419

K. Sasaki, S. Kazama, Y. Miyagawa,Y. Uchimiya, K. Fujishiro

Nippon Steel Chem., Japan

FMCp - 8 Luminosity Compensation Method at Low

Temperatures by a Heater for Automobile-

Use Back Light 423

K. Matsunaga, Y. Wagatsuma*Toshiba AVE, Japan'Toshiba Lighting & Tech., Japan

FMCp - 9 2.2$ Double Tube Cold Cathode Fluorescent

Lamp 427

T. Nishihara, Y. Tomita

Harison Elec, Japan

FMCp -10 Novel Color Switching Mode in Fluorescent

LCDs 431

ft Yamaguchi, J. Kishida, S. Sato

Akita Univ., Japan

FMCp -11 An Inspection System and Methods for Pixel

Defects in LCDs 435

F. Saitoh

Iwate Pref. Univ., Japan

Workshop on CRTs


13:45-15:25

CRT1: CRTs and CRT AppliancesHagi

CRT1 -1: Invited Recent CRT Display Monitors and

Some Proposals to CRT for Survival 441

H. Kofune

LG Elect, Korea

X IDW '99

TABLE OF CONTENTS

CRT1-2: Invited A Design Concept of Perfect-Flat

CRT 445

T. Saito

Sony, Japan

CRT1 - 3 A New 46-cm DIAMONDTRON NF CRTfor

Display Monitors 449

T. Hirano, T. Otawa, T. Karita, K. Nagasawa,N. Hinomoto, M. NoguchiMitsubishi Elec, Japan

CRT1 - 4 46-cm 100° Super-High Deflection SensitivityColor Display Tube 453

K. Soneda, Y. Fukuda, M. Ishikawa, J. Kimiya,

S. SugawaraToshiba, Japan

CRT1 - 5 A 61-in. HD Projection TV with a Two-Mode

Digital Convergence System 457

K. Yoshizawa, T. Watanabe, S. Hatakeyama,

T. Nakiri, M. Tsukahara*. K, Matsumi*

Hitachi, Japan*Hitachi Video & Info., Japan

15:40-17:00

CRT2: Topical Session for Simulation Technologies

CRT2-1: Invited ProGUN: 3-D Electron Gun

Simulator 461

H. Y. Ahn, J. N. Kim, H. W. Jang, M. Fukushima


CRT2 - 2: Invited Simulation System of Deflection

Yoke for CRTs 465

H. Miyazawa, K. Oku, T. Hisada, N. /to*

H. Fukumoto, M. Koizumi, S. Shiral

Hitachi, Japan'Hitachi Media Elect, Japan

CRT3 - 4 Comparison Between Rectangular and

Circular Magnetic Cores of CRT Deflection

Yokes 489

K. Uchibori, T. Tsuchiya, H. Inoue

Totoku Elec, Japan

10:35-12:15 HagiCRT4: Glass and Surface Coating

CRT4-1: Invited Development of Low TemperatureFrit Glass for CRTs 493

M. Hayashi, Y. Jimura, K. Shindo, M. Kyono,N. Daiku, ft Schmidtz*. J. Bobinski*

Nippon Elect. Glass, Japan

*Technoglas, USA

CRT4 - 2 Anti-Contamination Coating for CRT Glass

497

M. Sasaki, S. Rokudai, S. Takeda

Asahi Glass, Japan

CRT4 - 3 Transmission Controlled Panel Glass for

CRT: "G-WARAS" 501

N. Horie, T. Sugawara, T. OyamaAsahi Glass, Japan

CRT4 - 4 The Temperature Variation Between Bulbs

Due to the Change of Inner Diameter of

Baffle Plate in Main Sealing Furnace 505

/. Cho, W. Soh, G. Lee


CRT4 - 5 A New Antistatic Coating Layer for CRT

Faceplate Using the Organic Conductive

Polymer 509

C.-H. Lee, H.-S. Sohn

Orion Elec, Korea

..469CRT2 - 3: Invited CRT Glass Modeling

J. J. GaviganSarnoff, USA

CRT2 - 4 Calculation of Phosphor Grain Size Effects

on CRT Screen Performance 473

H. Glaser, H. Bechtel, F. Busse, J. Kikkert*

Philips Res. Labs., Germany

*Philips Comps., TheNetherlands

Thursday, December 29:00-10:20 Hagi

CRT3: DY and Mask

CRT3 -1: Invited An Improved Mask Corner

Suspension for Real Flat Wide Screen Color

Picture Tubes 477

A. A. M. Hendriks

Philips Comps., The Netherlands

CRT3 - 2 Effect of Damping Wire on Aperture Grille

Vibration 481

V. Ohmura, M. Hashimoto, H. Taguchi

Sony, Japan

CRT3 - 3: Invited Simulation of Magnetic Shielding for

CRTs 485

A. Haga, H. Nasuno*, H. Ikeda**

Tohoku Gakuin Univ., Japan

*Polytechnocenter Miyagi, Japan

**Mitsubishi Elec, Japan

4:00-15:40 Hagi

CRT5: Electron Guns

CRT5 -1 Stabilization of CRT Performance by

Optimizing Gun Beading Condition 513

S. H. Lee

Orion Elec, Korea

CRT5 - 2 Development of a NEXT Electron Gun for

46-cm 100° Narrow Neck Color Display

Tubes 517

T. Nakamura, K. Noguchi, Y. Yatsu, S. Shirai

Hitachi, Japan

CRT5 - 3 A New Electron Gun for Color Monitor Tubes

with Large and Perfectly Flat Screen 521

y. Wada, T. Daimon

Matsushita Elect, Japan

CRT5 - 4 A Newly Developed Electron Gun for 19-in.

CDTs 525

H. C. Kim, K. B. Son, S. H. Cho, T. K. Kim,

D. Y. Kim, W. H. Kim

LG Elect, Korea

CRT5 - 5 Technology for a Very Small Aperture G1

with l-Cathodes 529

M. Mizuki, H. Tobita, Y. Amano

Sony, Japan

IDW '99 XI

TABLE OF CONTENTS

16:00-17:00 HagiCRT6: Cathodes

CRT6 -1 A Newly Developed HIP Cathode Sintered

under High Temperature and High Pressure533

T. Sugimura, M. Narita, ft Takeda, T. Hirai

NECKansai, Japan

CRT6 - 2 A Study on the Emission Characteristics of a

SC2O3-Dispersed Oxide Cathode 537

K.-C. Chou, H.-C. Cheng, C.-C. Chen,

C.-H. Yeh

Chunghwa Picture Tubes, Taiwan

CRT6-3 Area-Restricted Cathode for CRTs 541

T. Shiroishi, T. Ohira, H. Teramoto,S. Nakata, K. Oono


See Late-News

Friday, December 3

14:00-16:30 Sakura

Poster CRTp: CRTs

CRTp -1 AYAG Rear Projection Display for

Multimedia Application 545

J. Cheng, Z. Chen, G. Huang, Z. Lin, G. Cao

Univ. of Elect. S&Tof China, China

CRTp - 2 A Self-Circulating Cooling System Used in a

3-in. YAG Projection CRT 549

0. Ran, J. Wang, G. Li, Z. Li, Z. Lin, J. ChengUniv. of Elect. S&T of China, China

CRTp - 3 Assembling Method of a CRT with an Inner

Yoke 553

X. Li, Y. Zheng, L. U

Southeast Univ., China

CRTp - 4 A GUI Program for Convergence Simulation

of CRT 557

J. S. Fang, C. L. LiangTECO Info. Sys„ Taiwan

CRTp - 5 Simulation of Electron Guns Including

Space Charge 561

ft Harthoorn, D. Roozendaal

Philips Display Comps., The Netherlands

CRTp-6 New Photo Cathode Display 565

y. Sakamoto, H. Tanaka, A. Kuroda*,K. Takekawa**

Kanazawa Inst, of Tech., Japan

*NEC, Japan**Matsushita Elect., Japan

CRTp - 7 Center-Vibration of a Trinitron Aperture Grill

569

T. Aoki, KSaita

Sony, Japan

CRTp - 8 Stretched Tension Mask with Large Vertical

Pitch for CPTs 573

S. W. Ko, J.-E. Choi, P.-S. Jung,N.-J. Koh

LG Elect, Korea

CRTp - 9 Newly Developed Simulation Modeling of an

IMS 577

S. Nakata, K. Nishimura, S. Okuda


CRTp -10 A Reactive Sputter-Coating on CRT's

Surface

Y.-M. Teng, H.-S. Tong, C.-M. Hu

Chunghwa Picture Tubes, Taiwan

..581

Workshop on Plasma Displays

9:00-10:20Thursday, December 2

PDP1: Panel Configurations

Main Hall

PDP1 -1: Invited High Luminance AC-PDPs with

Waffle-Structured Barrier Ribs 587

T. Komaki, H. Taniguchi, K. Amemiya

Pioneer, Japan

PDP1 - 2 Improvement of Luminance and Luminous

Efficacy Based on the Investigation of Xe

Concentration and Sustain Voltage in PDPs

591

G. Oversluizen, S. de Zwart, S. van Heusden,T. Dekker

Philips Res. Labs., The Netherlands

PDP1 - 3 Rib Height Dependence of Vacuum

Ultraviolet Emission Efficiency in Surface-

Discharge AC-PDPs 595

N. Uemura, Y. Yajima*, Y. Kawanami, S. Ho,

H. Nakahara*, Y Hatano**, N. Kouchi**, K. Suzuki

Hitachi, Japan

*FHP, Japan**Tokyo Inst, of Tech., Japan

PDP1 - 4 A High Performance Delta Arrangement Cell

PDP with Meander Barrier Ribs 599

O. Toyoda, T. Kosaka, F. Namiki, A. Tokai,

H. Inoue, K. Betsui

Fujitsu Labs., Japan

10:40-12:00 Main Hall

PDP2: Fundamental Mechanisms (1)

PDP2 -1 Characterization of Micro-Cell Discharge in

AC-PDPs by Spatio-Temporal OpticalEmission and Laser AbsorptionSpectroscopy 603

T. Yoshioka, A. Okigawa, L Tessier*, K Toki

NEC, Japan*Orleans Univ., France

PDP2 - 2 Discharge Striations in a Coplanar AC-PDP607

G. Cho, E.-H. Choi, Y. Seo, Y.-G. Kim,D.-G. Joh, J.-J. Ko, C.-W. Lee, D.-l. Kim,

Y.-D. Joo*. J.-G. Han*, M.-C. Kim*, J.-D. Kim*

Kwangwoon Univ., Korea

'Orion Elec, Korea

PDP2 - 3 Wall Voltage Measurement in an AC-PDP

Cell by Laser Induced Fluorescence 611

J. H. Kim, J. H. Lee, Y. W. Choi* J. H. Yang,K.-W. WhangSeoul Nat. Univ., Korea

*Korea Electrotech. Res. Inst, Korea

XII IDW '99

TABLE OF CONTENTS

PDP2 - 4 Side-View Observations of IR Emission from

Surface-Discharge AC-PDP 615

K. Hagiwara, M. Ushirozawa, H. S. Jeong,

Y. Takano, M. Seki

NHK, Japan

14:00-16:30 Rooms 4/5

Poster PDPpI: Fundamental Mechanisms

PDPpI -1 Temporal Behaviors of the Charged and the

Metastable Particles in an AC-PDP 619

B.-J. Rhee, H.-N. Lee, K. C. Choi

Hyundai Elect. Ind., Korea

PDPpI - 2 The Influence of Gas-Mixing Ratio on the

Luminous Efficiency in Surface Discharge

AC-PDPs 623

J. C. Ahn, J. G. Kim, T. S. Cho, D. S. Cho,

J. Y. Urn, T. Y. Kim, S. S. Kim, J. J. Ko,D. I. Kim, C. W. Lee, Y. Seo, G. S. Cho,

S. O. Kang, £ H. Choi


PDPpI - 3 Influence of Sustain Voltage on Wall Chargeand Wall Voltage Characteristics in AC-PDPs

627

T. Y. Kim, T. S. Cho, M. C. Choi, J. C. Ahn,

J. M. Jeoung, J. Y. Lim, J. G. Kim, D. S. Cho,

S. H. Choi, M. W. Chong, S. S. Kim, J. J. Ko,

D. I. Kim, C. W. Lee, Y. Seo, G. S. Cho,

S. O. Kang, E. H. Choi


PDPpI - 4 Measurement of ionization Rate a and

Secondary Electron Emission Coefficient

yin AC-PDPs 631

D. S. Cho, J. J. Ko, J. C. Ahn, M. C. Choi,

T. S. Cho, J. y. Lim, J. G. Kim, T. Y. Kim,

S. S. Kim, M. W. Chung, S. H. Choi, D. I. Kim,

C. W. Lee, G. S. Cho, H.-S. Uhm, E. H. Choi


PDPpI - 5 Influence of Gas Mixture Ratio on Paschen

Breakdown Characteristics in Surface

Discharge AC-PDP 635

S. S. Kim, T. S. Cho, M. C. Choi, J. C. Ahn,

J. G. Kim, D. S. Cho, J. Y. Urn, T. Y. Kim,

M. W. Jung, S. H Choi, J. J. Ko, D. I. Kim,

C. W. Lee, S. O. Kang, H. S. Uhm, G. S. Cho,

E. H. Choi


PDPpI - 6 Influence of Gas Mixing Ratio on the

Secondary Electron Emission Coefficient

Y of MgO Single Crystals with Different

Orientation and MgO Protective Layer in

Surface Discharge AC-PDPs 639

J. Y. Lim, J. M. Jung, H. J. Oh, Y. G. Kim,

M. C. Choi, J. C. Ahn, T. S. Cho, D. S. Cho,

J. G. Kim, T. Y. Kim, S. S. Kim, M. W. Jung,

S. H. Choi, J. J. Ko, D. I. Kim, C. W. Lee,

Y. Seo, G. S. Cho, S. O. Kang, E. H. Choi


PDPpI - 7 A Theoretical Study of the Secondary

Electron Emission from MgO Surface 643

S.-J. Yoon, I. Lee, J.-W. Lee*, B. Oh

LG Corporate Inst, of Tech., Korea

*Hallym Univ., Korea

PDPpI - 8 Discharge Characteristics and SecondaryElectron Emission Properties of MgO

Protecting Layers Prepared by Pulsed Laser

Deposition 647

S. Park, H. S. Jeon, H. G. Kim, J.-W. Lee*,

J. S. Kim**, J. H. Ryu**, ft Oh,LG Corporate Inst, of Tech., Korea

*Hallym Univ., Korea

**LG Elect., Korea

PDPpI - 9 Parameter Optimization of an AC CoplanarPDP by Computer Simulation 651

C. H. Shon, M. S. Hur, Y. K. Shin, H. J. Lee,

J. K. Lee

Pohang Univ. ofS&T, Korea

PDPpI -10 Two-Dimensional Simulations of Gas-

Discharge Characteristics for He/Xe, Ne/Xe

and He/Ne/Xe Filled Surface-Discharge AC-

PDPs 655

/. Lee, S. C. Choi, S. J. Yoon

LG Corporate Inst, of Tech., Korea

PDPpI -11 Zero-Dimensional Analysis for Discharge

Characteristics of AC-PDPs 659

W. Park, ft Hong* J. Kim*

SAIT, Korea

'Samsung Display Devices, Korea

PDPpI -12 Diagnostics and Modeling of a MacroscopicPDP Cell 663

T. Callegary, ft Ganter, P. Guillot, J. Galy,J. P. Boeuf

Univ. PaulSabatier, France

PDPpI -13 Discharge Efficiency Analysis of an AC-PDP

by Numerical Simulation 667

J. H. Seo, W. J. Chung, C. Yoon, J. K. Kim,

K.-W. WhangSeoul Nat. Univ., Korea

.671PDPpI -14 3-Dimensional Numerical Analysis on

AC-PDP Cell

H. S. Jeong, Y. Murakami, M. Seki

NHK, Japan

PDPpI -15 Measurement of Electron Temperature and

Plasma Density by Micro Langmuir Probe in

Coplanar AC-PDPs 675

J. G. Kim, Y. G. Kim, M. C. Choi, J. C. Ahn,

T. S. Cho, D. S. Cho, J. Y. Urn, T. Y. Kim,

S. S. Kim, M. W. Chong, S. H. Choi, J. J. Ko,

D. I. Kim, C. W. Lee, Y. Seo, G. S. Cho,

S. O. Kang, H. S. Uhm, £ H. Choi


PDPpI -16 Microscopic Observation of Potential

Distribution of MgO Surface by ScanningMaxwell-Stress Microscopy 679

T. Yamada, Y. Motoyama*. Y. Ikarashi,M. Sasaki, J. Itoh**, S. Yamamoto

Univ. of Tsukuba, Japan

*NHK, Japan**Electrotech. Lab., Japan

PDPpI -17 Determination of MgO Erosion Rate in

AC-PDP by Optical Method 683

S. Choi, S. Lee, S.-G. Oh, J.-H. Sun Woo*,

J.-G. Kim* G.-H. Lee* J.-D. Kim*

Ajau Univ., Korea'Orion Elec, Korea

IDW '99 Xlil

TABLE OF CONTENTS

PDPpI -18 Evaluation of Micro Positive Columns in

DC-PDPs by Laser Spectroscopic

Microscopy 687

N. Kosugl, K. Tachibana*, M. Seki**, T. Sakai**


'Kyoto Univ., Japan

"NHK, Japan

PDPpI -19 Improvement of Luminance and Luminous

Efficiency in PDPs Driven by Radio

Frequency Pulses 691

J. Kang, W. G. Jeon, O. D. Kim, J. W. Song,J. P. Boeuf, M. H. Park

LG Elect, Korea

*Univ. PaulSabatier, France

PDPpI - 20 Energy Loss Mechanisms in AC-PDP

Discharges 695

M. H. Klein, ft Snijkers, G. Hagelaar*

Philips Res., Germany'Eindhoven Univ. of Tech., The Netherlands

PDPpI - 21 Measurement of Addressing Speed in

Plasma Display Devices 699

A. Seguin, L Tessier, H. Doyeux, S. Salavin

Thomson Plasma, France

See Late-News

14:00-16:30 Rooms 4/5

Poster PDPp2: Materials and Driving Techniques

PDPp2 -1 Optimization of MgO Reactive SputteringDeposition for PDPs 703

J. Kester, J. Chapin, P. O'Keefe, £ Taylor,F. Krannig

Applied Films, USA

PDPp2-2 Withdrawn

PDPp2 - 3 Electronic Bulletin Board System UsingPDPs 711

K. Fujii, H. Kawaguchi, M. Kita

Eizo Nanao, Japan

PDPp2 - 7 Influence of Driving Frequency on the

Electrical Characteristics in Surface

Discharge AC-PDPs 727

T. S. Cho, T. Y. Kim, M. C. Choi, J. C. Ahn,

J. M. Jeong, J. Y. Lim, D. S. Cho, J. G. Kim,

S. H. Choi, M. W. Chong, S. S. Kim,

J. J. Ko, D. I. Kim, C. W. Lee, Y. Seo,

S. O. Kang, G. S. Cho, H. S. Uhm, £ H. Choi


PDPp2 - 8 Scan Conversion and Video Processing IC

Chip Set for High Image Quality Plasma

Displays 731

H. Honda, T. Shigeta, T. NagakuboPioneer, Japan

Friday, December 3

9:00-10:20 Main Hall

PDP3: Driving Techniques

PDP3 -1: Invited 60-in.-Diagonal HDTV Plasma

Display 735

W. C. Schindler

Plasmaco, USA

PDP3 - 2 Circuit Design and a High-Voltage Device

Structure for an Advanced PDP Scan Driver

IC 739

H. Sumida, A. Hirabayashi, H. Shimabukuro

Fuji Elec, Japan

PDP3 - 3 High-Luminance and High-Contrast HDTV

PDP with Overlapping Driving Scheme..743

J. Ryeom, K. H. Kang, S. C. Lee,

C. ft Park


PDP3 - 4 A Technique for Reducing Data Pulse Voltagein AC-PDPs Using Metastable-Particle

Priming 747

y. Takeda, M. Ishii, T. Shiga, S. Mikoshiba

Univ. ofElectro-Commun., Japan

PDPp2 - 4 Optimum Selection of Subfield Patterns for

Plasma Displays Based on Genetic

Algorithm 715

S.-H. Park, Y.-S. Choi, C.-W. Kim

Inha Univ., Korea

PDPp2 - 5 Influence of Sustain Pulse-Width on the

Luminous Efficiency in Surface-DischargeAC-PDPs 719

£ H. Choi, T. S. Cho, T. Y. Kim, M. C. Choi,

J. C. Ahn, J. M. Jeong, J. Y. Lim, J. G. Kim,

D. S. Cho, S. ft Choi, M. W. Chong,

S. S. Kim, J. J. Ko, D. I. Kim, C. W. Lee,

S. O. Kang, G. S. Cho


PDPp2 - 6 Influence of Reset Period with Control Pulse

on Sustain Discharge 723

J. J. Ko, Y. G. Kim, D. I. Kim, C. W. Lee,

G. S. Cho, £ H. Choi


10:40-11:40 Main Hall

PDP4: Fundamental Mechanisms (2)

PDP4 -1 Efficiency of RF Excited Plasma Display

Cells: Model Predictions 751

S. Cany, J. Kang*, C. Punset, J. P. Boeuf

Univ. Paul Sabatier, France

*LG Elect., Korea

PDP4 - 2 A Novel Electric Circuit Modeling of

Coplanar PDPs 755

T. Tamida, A. Iwata, J. Nishimae, M. Tanaka


PDP4 - 3 Analysis of Address Discharge on an

AC-PDP Using Particle-in-Cell Simulation

759

y. Ikeda, K. Suzuki, H. Fukumoto, M. Shibata*.

M. Ishigaki*

Hitachi, Japan*FHP, Japan

XIV IDW '99

TABLE OF CONTENTS

14:00-15:00 Main Hall

PDP5: Materials and Fabrication Processes

..763

PDP5 -1: Invited Study of Protecting Layers in

AC-PDPs

W. T. Lee, J. W. Lee, J. M. Kim

Samsung Advanced Inst, of Tech., Korea

PDP5 - 2 Gas Flow Sputter Deposition of MgO for

Large Area PDP Applications 767

U. Hoffmann, A. Kloppel, J. Trubo

Balzers Process Syss., Germany

PDP5 - 3 Metal Black Patterned Electrode for

AC-PDP via Novel Electroless Plating

Using ZnO Thin Film 771

J. J. Kim, J. M. Oh, K. Hashimoto*,

A. Fujishima*LG Elect, Korea

*Univ. of Tokyo, Japan

See Late-News

PH1 - 2 Penetration Depth of Low Energy Electron

Beam into ZnS and InzOa 797

H. Kominami, Y. Nakanishi, Y. Hatanaka


PH1 - 3 Influence of Solvent on the Preparation of

Fine Particle SnOz:Eu Phosphor and its Low

Voltage Luminescent Properties 801

M. Kottaisamy, K. Horikawa, H. Kominami,

T. Aoki, N. Azuma, T. Nakamura, Y. Nakanishi,

Y. Hatanaka



PH2: FED Phosphors (2)

PH2-1:

15:40-17:00 Main Hall PH2-2

PDP6: Image Quality

PDP6-1: Invited A Novel Driving Scheme and Panel

Design for Realization of a Picture Quality

Equivalent to CRTs 775

K. Wani


PDP6 - 2 A Comparison of Motion Artifact Reduction

Methods in PDPs 779

J. Hoppenbrouwers, ft van Dijk, T. Holtslag

Philips Res. Labs., The Netherlands

PDP6 - 3 Quantitative Measure of Dynamic False

Contour on Plasma Display 783

Y.-S. Choi, C.-W. Kim

Inha Univ., Korea

PDP6-4 Development of New Driving Method for

AC-PDPs: High-Contrast, Low EnergyAddress and Reduction of False Contour

Sequence "CLEAR" 787

T. Tokunaga, H. Nakamura, M. Suzuki,

N. SaegusaPioneer, Japan

PH2-3

Invited New Oxide Phosphors for FEDs:

Ruddlesden-Popper Phases Synthesizedwith Ill-Group Elements 805

H. Yamamoto, S. Okamoto*, S. Mitsumine

Tokyo Eng. Univ., Japan'Tottori Univ., Japan

The Cathodoluminescent Change of

YNb04:Bi Phosphor Induced by Surface

Treatments 809

S. H. Shin, D. Y. Jeon, K.-S. Suh*,

KAIST, Korea

*ETRI, Korea

A Study on Adhesion and Brightness of

Electrophoretically Deposited ZnS:Ag,CI

Phosphor by Heat Treatment Condition

..813

PH2-4

H. Kim, S. H. Shin, D. Y. Jeon

KAIST, Korea

Grain Size Effect on Luminescent Properties

of ZnO:Zn Phosphor Thin Films Prepared byLaser Ablation 817

A. Ueki, T. Kunimoto, K. Ohmi, S. Tanaka,

H. KobayashiTottori Univ., Japan

14:00-16:30 Sakura

Workshop on EL Displays,LEDs, and Phosphors


9:00 - 9:05 Shirakashi 2

Opening

Opening Remarks

H. Kobayashi, Workshop Chair


PH1: FED Phosphors (1)

PH1-1: Invited Characterization of Phosphors from

Synthesis Level to Device Level for MicrotipBased FED and Carbon Nanotube Based

FEDs 793

J. M. Kim, Y. W. Jin

SamsungAdvanced Inst, of Tech., Korea

Poster PHp: ELDs, LEDs and Phosphors

PHp - 1 Blue Emitting BaAl2S4: Eu TFEL Device

Prepared by Two Targets Pulse Electron

Beam Evaporation 821

M. Kawanishi, N. Miura, H. Matsumoto,

ft Nakano

Meiji Univ., Japan

PHp - 2 Electroluminescent Devices UsingGa20a:Mn Thin Films Prepared by

Magnetron Sputtering 825

T. Minami, T. Nakatani, T. Miyata, S. Suzuki


PHp - 3 Effects of Doped Oxygen on SrGa2S4:Ce

Blue Phosphor Thin Films Evaluated byX-

Ray Photoelectron Spectroscopy 829

y. Izumi, S. Okamoto, K. Tanaka, Y. Inoue

NHK, Japan

IDW '99 XV

TABLE OF CONTENTS

PHp - 4 Cathode Metal Dependence of PVCz Multi-

Layered EL Devices 833

V. Horii, M. Kitagawa, H. Kusano*, K. Hatano,

S. Kawakami, D. Morita, T. Tsushima,

ft Kobayashi

Tottori Univ., Japan*Res. Inst, of Tech., Tottori, Japan

PHp - 5 High-Density LED Array Unit with Side-Wall

Wiring 837

K. Takahashi, S. Takano

Saitama Univ., Japan

PHp - 6 A New Long Persistence Red Phosphor

Phosphor 841

Y. Murazaki, K. Aral, K Ichinomiya, T. Oishi*

Nichia, Japan

*GifuPref. C.R.T., Japan

PHp - 7 Cathodoluminescence Properties of Surface

Treated Y203:Eu Phosphor with a-Fe203 byDifferent Coating Method 845

B.-C. Kim, J.-B. Paik, Y.-S. Han, N.-Y. Lee,

L-S. Park* C.-Y. Lee*, B.-K. Lee*

Orion Elec, Korea

'Kyungpook Nat. Univ., Korea

PHp - 8 A Study on Luminescence Enhancement

and Surface Distribution of ItoOa on In20a-

Coated on ZnGa204:Mn Phosphors 849

J. y. Kim, Z.-M. Park, D. Y. Jeon, I. Yu*,

H-G. Yang'KAIST, Korea

'Samsung Display Devices, Korea

PHp - 9 Growth of Y203:Tm Thin Film Blue Emitting

Phosphor 853

ft Wada, H. Kominami, M. Kottaisamy,Y. Nakanishi, Y. Hatanaka


PHp -10 Fabrication of Phosphor Screen byElectrophoretic and PhotolithographicMethod for 5-in. FEDs 857

Y.-S. Han, B.-C. Kim, J.-B. Paik, N.-Y. Lee,

L-S. Park*

Orion Elec, Korea

'Kyungpook Nat. Univ., Korea

Friday, December 3


PH3: Inorganic EL

PH3-1: Invited Full Color Solid State EL Display861

D. Seale, X. Wu

Westaim Advanced Display Tech., Canada

PH3 - 2 Stability of Oxide Phosphor TFEL Devices

Using a Thick Ceramic Insulator 865

T. Miyata, T. Nakatani, T. Minami


PH3 - 3 Color Characterization of ZnS:Mn/SrS:Ce EL

Devices Designed by Optical Simulation

869

A. Mikami, T. Ishikawa, N. Yamaura


PH3 - 4 Temperature Dependency of Electrical

Properties for ZnS:Mn TFEL Devices 873

S. Furukawa, K. Sowa, T. Mashiko

Denso Tech. College, Japan


PH4: Organic EL and LED

PH4-1: Invited Stable Polymer LEDs Suitable for

Full-Colour Applications 877

D, J. LaceyCambridge Display Tech., UK

PH4 - 2: Invited Novel Semiconductor Technologiesof ZnO Films Towards Ultraviolet LEDs and

Invisible FETs 881

A. Ohtomo, M. Kawasaki

Tokyo Inst, ofTech., Japan

PH4 - 3 Emission Characteristics of Alqa Doped with

DCM 885

J.-H. Lee, S.-H. Ju, S.-W. Kim, W.-G. Lee,W. Y. Kim, J.-S. Choi *, Y.-K. Park"

Hyundai Elect., Korea

'Hongik Univ., Korea

"Korea Elect. Tech. Inst, Korea

PH4 - 4 Four-Level Gray-Scale Virtual Display UsingLinear LED Array 889

/. H. Kim, K. B. Park, ft C. Moon, S. M. Shin,W. Jung*Korea Elect. Tech. Inst, Korea

'Dongguk Univ., Korea

Workshop on Field Emission Display

Friday, December 39:00-9:10 Shirakashi 1

Opening

Opening Remarks

K. Yokoo, Workshop Chair


FED1: FED and Novel Devices

FED1 - 1: Invited Medium Voltage Color FED 895

J. F. Clerc

CEA-LETI, France

FED1-2: Invited Research and Development of Field

Emission Diodes and Displays in Taiwan

899

ft C. ChengNat. Chiao Tung Univ., Taiwan

FED1-3: Invited FEA-CRT 903

K. Konuma, Y. Okada, A. Okamoto,

Y. Tomihari, S. MiyanoNEC, Japan

FED1 - 4 Faceplate Design for High Voltage FED and

Operational Characteristics 907

T. Aoki, Y. Iguchi, C. J. Spindt*. T. S. Fahlen*

Sony, Japan'Candescent Tech., USA

XVI IDW'99

TABLE OF CONTENTS

FED1 - 5 Carbon Cold Cathode Picture Element Tubes

for Large Area Displays 911

ft L. Fink, Z. L. Tolt, L H. Thuesen,

Z. Yaniv, K. Kasano* K. Tatsuda*

FEPET, USA

*lse Elect, Japan


FED2: Fabrication Technologies for FED

FED2 -1 A Novel Fabrication Process of Chimney

Shape FEA 915

K-J. Chen, F.-G. Tarntair, W.-K. Hong,

H.-C. Cheng

Nat. Chiao Tung Univ., Taiwan

FED2 - 2 Fabrication of Field Emitters from Organic

Materials Using a Stamp Technology 919

A. Baba, M. Hizukuri, M. Iwamoto, T. Asano

Kyushu Inst, of Tech., Japan

FED2 - 3 Fabrication of FEA Using Focused Ion and

Electron Beams 923

C. Ochiai, O. Yavas, M. Takai, A. Hosono*,

S. Okuda*

Osaka Univ., Japan'Mitsubishi Elec, Japan

FED2 - 4 Structure Analysis of Vacuum Panel for FED

......927

S. y. Moon, J. S. Kim, S. K. Kang, W. Y. Soh,Y. S. Choe


FED2 - 5 Mechanical Design of FED IncludingTAGLIA® Spacers with High Aspect Ratio

.931

ft Gy, D. Martin, D. Jousse*, ft Nomizu*

Saint-Gobain Recherche, France

'Saint-Gobain Display Glass, France

"Saint-Gobain Display Glass, Japan

See Late-News


FED3: Materials and Emission

Characteristics (1)

FED3 -1: Invited A Mo-Silicidized a-Si FEA 935

J. D. Lee, ft C. Shim, B. G. Park, S. J. Kwon*

Seoul Nat. Univ., Korea

'Kyungwon Univ., Korea

FED3 - 2 Efficient Quasi-Ballistic Cold Cathode

Based on Porous Polysilicon Thin Film

for Possible Application to Flat Panel

Display 939

T. Komoda, Y. Honda, T. Hatai, Y. Watabe,

T. Ichihara, K. Aizawa, Y. Kondo, X. Sheng*,A. Kojima', N. Koshida*

Matsushita Elec. Works, Japan

'Tokyo Univ. ofA&T, Japan

FED3 - 3 Uniformity of Field Emission from Si FEAs

Evaluated by Electrostatic-Lens Projector943

T. Matsukawa, S. Kanemaru, M. Nagao, J. Itoh

Electrotech. Lab., Japan

FED3 - 4 Optimization of Field Emitter Geometry to

Improve Emission Efficiency and Reliability

for FED 947

B. H. Chung, J. O. Choi, J. ft Jung,ft ft Chung, S. Y. Han, J. ft Han, M. W. Nam,

Y. W. Choi, S. Y. Hwang, N. Y. Lee

Ajou Univ., Korea

FED3 - 5 Individual Emission Stability of FEA Microtip951

ft Nakane, K. Yamane, Y. Muto, ft Adachi

Muroran Inst, of Tech., Japan

FED3 - 6 Improvement of Spindt-Type Platinum Field

Emitters in Carbon Monoxide Ambient

955

y. Gotoh, D. Nozaki, K. Utsumi, M. Nagao,ft Tsuji, J. Ishikawa, T. Nakatani',

T. Sakashita*, K. Betsui*

Kyoto Univ., Japan

'Fujitsu Labs., Japan


FED4: Materials and Emission Characteristics (2)

.959

FED4 -1: Invited Field Emission from Carbon

Materials

Z. Sitar

North Carolina State Univ., USA

FED4 - 2 A Novel Emitter Material - SiCN Nano-Rods

963

F. G. Tarntair, W. K. Hong, K. J. Chen,

L C. Chen*, K. H. Chen", ft C. ChengNat. Chiao Tung Univ., Taiwan

'Nat. Taiwan Univ., Taiwan

"Academia Sinica, Taiwan

FED4 - 3 Field Emission from Boron Carbon Nitride

Films Synthesized by Plasma-Assisted CVD

967

T. Sugino, H. Hieda

Osaka Univ., Japan

FED4 - 4 High-Luminance Triode Panel Using Carbon

Nanotube Field Emitters 971

J. Yotani, S. Uemura, T. Nagasako, Y. Saito*,

M. Yumura**

Ise Elect., Japan

*Mie Univ., Japan"Nat. Inst, of Materials & Chem. Res., Japan

FED4 - 5 Field Emission Properties of Diamond Films

975

G. Yuan, ft Ji, Z. S. Jin, Y. X. Jin, K. Yokoo*

Chinese Academy ofSci., China

'Tohoku Univ., Japan

Workshop on Large-Area and ProjectionDisplays, and Their Components

Friday, December 3

9:00-10:25 HagiLAD1: Si-Chip and Field-Sequential Technologies

LAD1-1: Invited Projection Display TechnologyBased on Reflective LCOS Light Valves

..981

ft L. Melcher

IBM, USA

IDW '99 XVII

TABLE OF CONTENTS

LAD1-2: Invited A Silicon-Chip-Based Light Valve

Reflective TN Mode for High Definition

Projectors 985

S. Hirota, M. Tsumura, ft Nakagawa,T. Miyazawa, I. Takemoto

Hitachi, Japan

LAD1 - 3: Invited Single Panel Reflective LCD Optics989

J. A. Shimizu

Philips Res., USA

LAD1 - 4 Analysis of Color Breakup in Field-

Sequential Color Projection System for

Large Area Displays 993

O. Wada, J. Nakamura, K. Ishikawa*,

T. Hatada*

Seiko Epson, Japan

'Tokyo Inst. ofPolytech., Japan

See Late-News

10:40-12:05 HagiLAD2: Large-Area Displays and Applications

LAD2 -1: Invited Application of High-BrightnessInGaN LEDs for the Large Size Full Color

Display 997

K. Bando

Nichia Chem. Ind., Japan

LAD2 - 2 Stereoscopic Full Color LED Display Using

Parallax Barrier 1001

ft Yamamoto, S. Muguruma*. T. Sato,K. Ono, Y. Hayasaki, Y. Nagai*, Y. Shimizu*

N. Nishida

Univ. of Tokushima, Japan

*Nichia Chem. Ind., Japan

LAD2 - 3 New Learning Environment Using Large

Projection Display, 3D Sound, and VR

Contents 1005

y. Harada, K. Nosu, T. Okimura

NTT, Japan

.1009

LAD2 - 4: Invited Digital Cinema Using the ILA

ProjectorW. P. Bleha, ft D. Sterling

Hughes-JVC Tech., USA

14:00-15:25 HagiLAD3: Components

LAD3 -1: Invited Novel Photo-Aligned Color Filters

and Optical Interference Elements for LCD

Projection 1013

M. Schadt, H. Seiberle, F. Moia

ROLIC Res., Switzerland

LAD3-2: Invited Recent Technology of ProjectionLens System 1017

S. SugawaraCanon, Japan

LAD3 - 3 New Polarization Conversion Device 1021

N. Mushiake, Y. Sawai, ft Tani, ft Tokumaru

Minolta, Japan

LAD3-4: Invited Phase Volume Holographic

Components for LCD Applications 1025

B. A. Loiseaux, C. Joubert, A. Delboulbe,J. P. Huignard, B. Morbieu*, F. Delauzun*,T. J. Trout", W. J. Gambogi**

Thomson, France

'Sextant, France

"DuPont, USA

15:40-17:05 HagiLAD4: Novel Projection Technologies

LAD4 -1: Invited Novel Thin Film Polarizing Beam¬

splitter and High-Efficiency Liquid CrystalDisplays 1029

LLi

Nat. Res. Council, Canada

LAD4 - 2: Invited Projection Display Using a

Bacteriorhodopsin Thin Film as a SpatialLight Modulator 1033

L R. Lindvold, ft Lausen*

Ris0 Nat. Lab., Denmark

'Laser Interface, Denmark

LAD4 - 3: Invited Recent Progresses of Thin-Film

Micromirror Array (TMA) 1037

S.-G. Kim, K.-H. HwangDaewoo Elect, Korea

LAD4 - 4: Invited An Overview of TMA Projection

Concept and Comparison to DLP 1041

G. S. Urn

Display Consultant, USA

Workshop on

3D Display Technologiesand Human Factors



Opening

Opening Remarks

H. Isono, Workshop Chair


3D1:3D Displays

3D1 -1: Invited Autonomic Nervous SystemReaction to the Virtual Reality Immersion

1047

S. Nitta, T. Yambe

Tohoku Univ., Japan

3D1 - 2 3D Stereoscopic Display Device Based on

Silicon Microdisplay Technology 1051

K C. Lee, C. K. Yip, ft L Cheung,

P. W. Cheng, H.-C. Huang


3D1 - 3 Analysis of Viewing Zones Parameters by a

Full Color Transmission Type HolographicScreen with a Stereoscopic Image Projection

1055

J.-E. Bahn, S. Shin, Y.-J. Choi, V. I. Bobrinev,J.-Y. Son

KIST, Korea

XVIII IDW '99

TABLE OF CONTENTS

3D1 - 4 An Evaluation of Visual Formed in

Binocular Disparity 3D Display (2): An

Analysis of Psychological Index* 1059

T. Sugihara, T. Miyasato

ATR, Japan


3D2: Human Factors

3D2 -1: Invited Monitoring and Evaluating Oculo-

Motor Activities of the Subject Viewing 3D

Images 1063

K Ukai

NihonFukushi Univ., Japan

3D2 - 2 A Study of the Presentation Position for a

Title and a 3D Object on a 3D Display1067

K. Shigeta, M. Nakayama, Y. Shimizu

Tokyo Inst, of Tech., Japan

3D2 - 3 Development of a Compact 3D HDTV

Camera with Zoom Lens and Psychological

Effects of the Images 1071

ft Yamanoue, M. Okui, F. Okano, I. Yuyama

NHK, Japan

3D2 - 4 The Shape and Distance of a Surface with

Zero Binocular Disparity 1075

P. M. Grove*-**, ft Kaneko*, H. Ono*-**

'ATR, Japan"YorkUniv., Canada

14:00-16:30


Poster 3Dp: 3D Displays

Sakura

3Dp -1 Reduction of Cross Talk in Stereoscopic

Displays Using Total Reflection 1079

y. Bao, N. Hamaguchi, T. Gotoh

Yokohama Nat Univ., Japan

LATE-NEWSPAPERS 1083

COLOR PAGES 1125

AUTHOR INDEX 1135

AFFILIATION INDEX 1146

IDW '99 COMMITTEE 1150

LIST OF EXHIBITORS 1157

FLOOR PLAN 1158

'IDW '99 ; 6 (Sendai) : 1999.12.01-03' - gbv.de · IDW'99 Proceedings of TheSixth International...

Documents

Transcript of 'IDW '99 ; 6 (Sendai) : 1999.12.01-03' - gbv.de · IDW'99 Proceedings of TheSixth International...