GEM production facility upgrade
14
GEM production facility upgrade Piotr Bielówka RD51, CERN, Dec 2012
description
GEM production facility upgrade. Piotr Bielówka. RD51, CERN, Dec 2012. Laboratory scale production line, with limitation caused by:. t echnology m achinery. Kapton etching set, Techtra, Wroclaw. RD51, CERN, Dec 2012. Steps towards big GEMs : - PowerPoint PPT Presentation
Transcript of GEM production facility upgrade
GEM production facility upgrade
Piotr Bielówka
RD51, CERN, Dec 2012
Laboratory scale production line, with limitation caused by: -
technology- machinery
RD51, CERN, Dec 2012
Kapton etching set, Techtra, Wroclaw.
RD51, CERN, Dec 2012
Access to EU funds through Wroclaw Technology Park (WPT) - non profit organization.
Steps towards big GEMs:• to implement „single mask” technique - CERN• to acquire dedicated set of PCB machines - WPT
WPT support for the implementation of a research and development project
Cost comparison
„Research and development project” – transfer of support from WPT to Techtra
RD51, CERN, Dec 2012
RD51, CERN, Dec 2012
CERN
TECHTRAWPT
PRODUCER
BROKER
PRODUCERPRODUCER
PRODUCER
Tendering procedure inconvenient for suppliers:
External Validation Board
RD51, CERN, Dec 2012
EU tendering rules means:- long lasting procedure- bidders claims
„Delivery”:
-Installation-Filling with consumables-First run: “GEM like boards”-Training: additional human resources
Delivery ScheduleMachine Producer Delivery Time [weeks] Status
Developer
WISE NEWCu EtcherKapton Etcher 0 12 14Washer
Exposure TECHNIGRAF NEW 0 7 14
Microscope OLYMPUS NEW 0 9 14
Set of tanks for Stripping and Electro Etching.
MATUSEWICZ NEW 0 11 14
Oven, Laminator,Others
MEMMERT and othersSecondHand
0 4 14
Civil Works WROCLAW TECHNOLOGY PARK NEW 0 11 14
GEM Diagnostics System
TECHTRA + NATIONAL CENTRE FOR NUCLEAR RESEARCH
Unknown NEW
RD51, CERN, Dec 2012
1
2
3
Room 1 – 48 m2
Room 2 – 48 m2
Room 3 – 86 m2
Total – 182 m2
Reserve
RD51, CERN, Dec 2012
New machinery for BIG GEMs
Old Kapton etching machine
New Kapton etching machine
RD51, CERN, Dec 2012
Old developing and etching set
New developer
New Cu etcher
Single mask technology implementation
RD51, CERN, Dec 2012
Current optic microscopes set.
Additional optic microscope.
Single mask technology implementation
RD51, CERN, Dec 2012
Preliminary „Single side” Kapton etching test :
Problems caused by:- Cleaning procedure - High etching reagents concentration
RD51, CERN, Dec 2012
Summery:
- Dedicated line for big GEMs become operational by the end of March 2013.
- Automatization of electrical and optical testing position
- Testing, tuning, work – until production starts
RD51, CERN, Dec 2012
