Chamber cleaning end point monitoringfor deposition process

Gas Monitor

IR-422

IR-432

Real time monitoringof key species in the process effluent

Features

Easy optimizationfor cleaning processReduction of clean timeand gas usageLong life timefor chamber components

IR-422

IR-432

Multi gas monitoring Analog / Digitalcommunication

Multi-displayHigh sensitivity Gas cell heating(Support SiF4,CF4/WF6,NF3)only IR-422＊

Specification

Model

AO: 0-5VDC, AI: 0-10VDCDO: 4ch, DI: 1ch (Zero)

208V, 84VA 115V, 132VA208V, 94VA

AO: 4-20mADC, AI: 0-10VDCDO: 4ch, DI: 1ch (Zero)

IR-422

SiF4: 100mTorr, CF4: 100mTorr

SUS316L, BaF2, FFKM

NW25 f lange

RS485 (F-Net)

W433×H117.5×D83

3.2kg

WF6：200mTorr, NF3：200mTorr

IR-432

SiF4: 3800mTorr

30mm

20-50℃

SUS316L (Clean S AF type), BaF2, FFKM

NW25 f lange

RS485 (F-Net)

W259×H130×D86

2.8kg

*1：The specifications are guaranteed under HORIBA STEC’s inspection conditions using calibration gas.

±0.5%F.S.

±1%F.S.

±0.5%F.S.(3σ)

±1%F.S./day

SUS304, ZnSe, FFKM

NW50 f lange

1x10-6 Pa・m3/s (He)

300kPa (A)

RS485 (F-Net), RS232C (mini PC)

24VDC, 1.5A

W433×H93×D83

3.8kg

CE, FCC

Meas. gas & full scale

Cell length

Cell set temperature

Heater jacket

Repeatability *1

Linearity *1

Zero noise *1

Zero drift *1

Ambient temperature

Warm-up time

Wetted material

Fitting

Leak rate

Proof pressure

I/O interface

Digital communication

Power supply

Dimensions (mm)

Weight

Certification

SiF4, CF4 WF6, NF3

180℃ 100℃

T/C K-type, Thermostat (Manual reset)

20-35℃

200mm

MFC

MFC

IR-400

MFC for sample line

Valve

Pump

Pressuresensor

Equipment

Dry pump

Settingswitch

MFCfor diluting

MFC

IR-400PV

IR 400PVPV

Plasma

Process chamber

Vacuum pump

Exhaust valve

CapacitanceManometer

Piezo actuator valve

NDIR UnitIntegrated IR-400 Series and a pump

The infrared absorptiometry method employed by IR-400 Series uses the principle of infrared light absorbance.The target gas species in the effluents absorbance is compared to a reference signal to calculate the concentrationof the target species. This double beam method enables long term, stable measurement results.

Reliable, High-performance

Non-dispersive Infrared Absorptiometry (NDIR)

PreamplifierLight source

Gas cellPyroelectric infrared detector

Reference

Sample

Optical filter

Sensor element

When sample gas isflowing, outputchanges on samplesensor only

Wavelength

When the sample gasis not flowing,output is the same

Sampledetector

Referencedetector

Abs

orba

nce

Application Example

The optical system is made up of a light source, gas cell and double beam detectors.The stability of the double beam detector has been proven over a period of more than 40 years.

〔 〕

〔 〕●

Support products of exhaust line

IR-400 Series : Chamber cleaning end point monitoring for deposition process

PV Series : Chamber pressure control by N2 ballast control

VG-200 Series : Pressure monitoring of exhaust line

●

●

Gas/Vacuum Monitoring

● Contribute process optimizationof various manufacturing process

● Integrated vacuum pump enable to workunder limited differential pressure condition

● Extra MFC is optional on dilution gas linefor concentration optimization

● Trans portable design

Pressure control

Vapor Concentration Monitor

External dimensions

Related product

For stable material gas supply

p

For stable material gas suIR-300 Series

［Unit： mm］

IR-422 IR-432

(433)

140±0.5210 3030 9271

45

5283

87 117.5

83

46

81

Light sourceunit

Detectorunit

200mm gas cellwith heater jacket 119±1 140±1

(259)DTU connector

External connector

LSU connector

Power supply connector

86±183

RS485 connector

83

65

(24.5)

(22.5)

Thermostat(inside)

130±0.5

Benefits●

●

●

Continuous concentration monitoring of precursor

Check precursor concentration while adjustingsupply conditions

Monitor residual quantities of liquid and solidprecursors for better utilization

MFC

Pump

Thermalbath

Bubbler

Back pressureregulator

N2

MOCVDprecursor

IR-300

Measurement example

Please contact HORIBA STEC about WF6,NF3 specification

SiF4,CF4 Specification

Printed in Japan 1706IG13IR4-CE

● The contents of this catalog are subject to change without prior notice, and without any subsequent liability to this company. ● It is strictly forbidden to copy the content of this catalog in part or in full.● All brand names, product names and service names in this catalog are trademarks or registered trademarks of their respective companies.

http://www.horiba.com/horiba-stec/Please read the operation manual before using this productto ensure safe and proper handling of the product.

HEAD OFFICE 11-5, Hokodate-cho, Kamitoba, Minami-ku, Kyoto, 601-8116 Japan PHONE: (81)75-693-2312　FAX: (81)75-693-2331

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