GaN Components for Aeronautics and Space …...2018/11/08 · Source 1: Applications & markets for...
Transcript of GaN Components for Aeronautics and Space …...2018/11/08 · Source 1: Applications & markets for...
GaN Components for
Aeronautics and Space Applications
Dr. Fabio COCCETTI
Head of Components Modelling and Reliability Competence Centre
More Electrical Aircraft Domain
www.irt-saintexupery.com
Outlook
General Context
WBG in the electromechanical chain - Module level
COTS Reliability and Risk Analysis
Natural Radiation Immunity
Conclusions and Perspectives
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IRT Saint Exupéryat a Glance
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IRTs
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8 IRTs were launched since 2012 in the frame of the French ‘Investissement d’Avenir’ (PIA), to supplement to other instruments (Competitivity Clusters, SATT for IP valorization, IDEX for higher education and fundamental research, etc.)
The aim of those thematic multi-disciplinary institutes is to reinforce competitiveness of French industry on the global market through world class technology research projects, teams and platforms.
Based on a 50-50 private-public partnership between French government and Public Research and Higher Educations establishments on the one hand, and key industrial partners on the other hand.
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In 2015, the 8 IRTs came together to create the Association of
Technological Research Institutes (FIT)
Public-Private
partnerships 50-50 long-term commitment of major
industrial and public partners
Technological
Research Programs derived from the roadmaps in the field
(competitivity clusters, CORAC, etc.)
Skills
development and
training supportTechnological platforms
accelerating technological
innovation and transfer to
industry
Integrated
collaborative
environment fitting into the public and
industrial research landscape
Vision
5
Excellence CenterWorld class in 3 key technology domains
for Aeronautics, Space and Embedded Systems
More Electrical Aircraft Embedded Systems
Materialsmultifunctional / high performance
Products / Marketsdevelopment
FundamentalResearch
Indu
stry
Pub
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esea
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*Technology Readiness Level © IRT AESE “Saint Exupéry” - All rights reserved Confidential and proprietary document
Main partners
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Public institutions & academics Industrial members
Laboratories
SMEs
Private ResearchCollectivities
Networks
Founding Members
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The MEA Department
Context: More Electrical Aircraft
at a Glance
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Electric & Hybrid PropulsionPo
wer
leve
lfo
r el
ectr
ical
pro
pu
lsio
n
Today 10 Year 20 Year 30 Year 40 Year
KWAll electric and hybrid electric
Hybrid electric 50 PAX regionalTurbo-electric distributed propulsion 100 PAX All electric Full range all general aviation
Hybrid electric 100 PAX regionalTurbo-electric distributed propulsion 150 PAX All electric Full range 50 PAX regional
Hybrid electric 150 PAX regionalTurbo-electric 100 PAX
Turbo/hybrid electric distributed propul. 300PAX
1 to 2 MW
5 to 10 MW
>10MW
2 to 5 MW
Challenges
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From Low Voltage to Medium Voltage From 750VDC for MW-class to >6kV for 20MW-class
increase energy density of batteries From 180Wh/kg to >>500Wh/kg
increase power density of electrical machines From 15kW/kg to 40kW/kg
increase power density of power electronic From 2kW/kg to >> 10kW/kg (25kW/kg?)
Network distribution, protection
Conductor & dielectric technologies
Lithium air/sulphur technology?
Other?
Thermal management
High Speed
HV Insulation
Conductors (nano-tube, Supra…)
Permanent Magnet
Wide Band Gap components
Integration & Reliability (component to system)
Thermal management
Filter optimization, packaging
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More Electrical Aircraft
Fan
Galley
28 Vdc conv
EHA
Motor
Pump
Anti-icing
1 2 5 10 20 50 100 150
Power (kVA)
Electrical Applications in Aircrafts
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Trade-off in power converters:
VolumeLosses
Weight
Cost Reliability
Advanced Topologies
Monolithic Coupled
Inductors
Multilevel
Converters
Wideband Gap
SemiconductorsSiC GaN
New Materials and Technologies
Nanocrystalline
Cores
WBG in the electromechanical chain
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Context: Electrical Power Drive System Optimization
WBG Inverter (Classical 3 cells topology & 6 cells topology)
Filters
Cables
Electrical machines
Power Modules (Parasitic loop inductance reduced )
High Voltage materials for packaging, passives & motors
Thermal techno
Optimization of Electromechanical Chain
EMC issues – Challenges:
Modeling & Ensure the non regression regarding EMC
(SiC semiconductors)
Multi-physical optimization Electromechanical Chain
Health Monitoring
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Integrated design by optimization of electrical systems
Technologies,
components
Equipment
Systems
Network11/18/2018
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IRT - Power Technology Integration Comp. Center – Dr. B. COGO-FRANCA
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Quadripolar approach : Frequency resolution Fast computation time (less than 300 ms)Represent CM equivalent circuit as a chain of two-port networks.
Use of [T] matrices to easily compute consecutive two-port networks in cascade.
PL
Sub-System
or
Frequency dependent
Trade-off: Impact of WBG Inverter on EMI
SiC and GaN
Noise Generation
IRT - Power Technology Integration Comp. Center – Dr. B. COGO-FRANCA
Trade-off: Impact of WBG Inverter on PD
Impact of PD in motors
Idealized voltage waveforms at the output of SiC Inverter for different
Gate Resistances Idealized voltage waveform at the input of motor terminals for different
Gate Resistances
Variation of maximum overvoltage with harness length
High Voltage (Overshoot)
IRT - Power Technology Integration Comp. Center – Dr. B. COGO-FRANCA
Project PGIP Improve power density of converters by inserting components inside a
PCB. Evaluate the gain of such technique regarding reduction of parasitic inductance and capacitance, thermal resistance and surface (1 year project).
Next / Ongoing Programs
16IRT - Power Technology Integration Comp. Center – Dr. B. COGO-FRANCA
Next / Ongoing Programs EPOWERDRIVE Project Objectives
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General Objective: Contribute with models, characterization results and technologies in order to help optimizing the
Power Drive System
Specific Objective: Design, Built and Test a Full Compliant 70kVA/56kW/540V THREE-PHASE INVERTER
APSI3D-Based SiC-Based Best Topo and Compo
- Evaluation of thermal and
efficiency potential of such
performing power module
technology
- Simple Topology, reliable
and performing components,
optimized efficiency and
filters
- Performing Topology,
components and technology
for maximum integration
Efficiency = 99%
P. Dens. = 15kW/kg
Efficiency = 98.5%
P. Dens. = 8kW/kg
Efficiency = 99%
Efficiency = 99,2% P. Dens. = 5.3kW/kg
Reference Filter
Power Core
Power Core + Filters
IRT - Power Technology Integration Comp. Center – Dr. B. COGO-FRANCA
GaN COTS Reliability assessment
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Power GaN HEMT timeline
2010 2011 2012 2013 2014 2015 2016 2017
Source 1: Applications & markets for GaN in Power electronics by Point the Power, 2016
1er power GaN module
GaN 20V – 200V
600 V HEMT
600 V cascode HEMT
GaN-on-Si GiT600V
GaN-on- SiCUp to 1200 V 400V CoolGaN™
Source 2: Yole GaN and SiC devices for Power Electronics by Yole, 2015
650V HEMT1200V modules
600V power GaN Drivers
Tuesday, December 14, 2010
EPC, the first company to deliver discrete enhancement mode GaN (eGaN™) HEMTs
Spins off Soitec/CEA
Spins off MIT
&
1st GaN vertical 1500V transistor TrueGaN™
(no HEMT)
2018
Source 3: Intersil Extends Leading Radiation-Tolerant Portfolio with Gallium Nitride Power Conversion ICs for Satellite Applications by Intersil, May 2016
Radiation-hardened GaN HEMT Driver
for aeronautics
600V GaN power ICs
GaN Power module with 600V cascode 100V-650V GaNXP™
Avogy becomes
STMicroelectronics and CEA-Leti GaN-on-Si Power GaN
Source 4: STMicroelectronics and Leti Develop GaN-on-Silicon Technology for Power Conversion Applications. Geneva, Switzerland, and Grenoble, France / 24 Sep 2018
The RAMS Switching Paradigm
Driven by Emerging (COTS) / disruptive components (never used before) in AEROnautic SPACE and AUTOmotiveapplications
RAMS: Reliability Availability Maintainability and Safety (RAMS)
Difficult to untangle CFR from EOL (complex degradation mechanisms reliability model) Precise/Accurate assessment of component EOL becomes paramount for mission planning (derating, redundancy, ….)
Source: J. Berthon, et al., "Utilisation des composants DSM dans le contexte aéronautique.," in 19ème Congrés de Maitrise des Risques et Sûreté de Fonctionnement, Dijon, 21-23 Oct. 2014.
For COTS in severe environment (Aero Space Mission Profile)
FRAME methodology Assumption : the manufacturer have the deepest knowledges about
their components
But if it does not share them, we need to evaluate if the component canbe used in the final application -> risk analysis of lifetime
The different levels of the method :
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Complexity
Manufacturerdata
availability
Level 2
Level 3
Level 1
Level 4Manufacturer: provide EOLLaboratory: no roleUser : provide Mission Profile
M: provide parts infoLaboratory: no roleUser : compute reliabillitybased on EOL and MP
M: no role (data sheet)Laboratory: CA, Max rating verif)User : bibliography and compute EOL/MP
M: no role (data sheet)Laboratory: CA, DoE / PoF)User : bibliography and compute EOL/MP
Risk assessment resultCompletion of report
LEVEL 3 : PoF off the shelf
Exemple: Evaluate the lifetime of Dynamic RAM
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time
IRT Laboratory
Evaluation
Construction analysisMOS planar
MIM capacitormetals used : Cu, Al, Ti Cu, Al…
Dielectrics used : Zr, SiO2…
Level of risk
Criteria used
Component samples
Scientific publications
Instructions
Mechanisms :BTI, HCI, EM, leakage of cells…
Material : Cu, Al, Ti, Zr…
TTF reference + AF :need to find for all mechanisms
State of art :Vt=0,5V cell charge =1,5V…
Exemple of Case Study: GaN HEMT
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• Structure GaN HEMT normally off : couche pGaN sous la grille
• Substrat de croissance : Si
• Couche d’AlN : réduire le courant de fuite du substrat et le désaccord de maille
• Couche tampon d’AlGaN : diminuer les dislocations
Omar CHIHANI – IRT-IMS PhD
Thermiquement activable
Typical Failure Mechanisms
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Dégradation du métal
de grilleDélamination de la
passivation
Dégradation des contacts
ohmiques
Dégradation des interconnexions métalliques
Piégeage d’électrons dans
la passivation
Création de pièges à cause des électrons
chauds
Génération de pièges à cause des défauts à
l’hétérojonction AlGaN/GaN : température , Champ
électrique et stress mécanique
Dégradation du côté drain de la grille à cause de la
température et du champ électrique
Existence d’électrons chauds
Propres aux composants GaN
• Mécanisme de défaillance : processus physiques de dégradation
• Indicateur de défaillance : signature électrique
G. Meneghesso et al., Int. J. Microw. Wirel. Technol., vol. 2, no 1, p. 39-50, févr. 2010.
Omar CHIHANI – IRT-IMS PhD
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f(S) = exponential form f(S) = power law form
exp(a·S) or exp(a/S) Sk
1) E model or constant field/voltage acceleration
exponential model TTF = Ao * exp(–gEox) * exp(Eaa / kT)exp(–gEox)
2) 1/E model or, equivalently, anode hole
injection model TTF = to(T) * exp(G(T) / Eox)exp(G(T) / Eox)
3) V model, where failure rate is exponential
with voltage (gate oxyde < 4 nm) TTF = Ao * exp(–b V) * exp(Eaa / kT)exp(–b V)
4) Anode hydrogen release for the power-law
model Time to breakdown tBD = to * V–n * exp(Eaa / kT)V–n
5) N-Channel TTF = B * (Isub)–N * exp(Eaa / kT) (Isub)–N
6) P-Channel l < 0.25µm TTF = B * (Ig)–M * exp(Eaa / kT) (Ig)–M
7) Power law model TTF = [Dpt / Ao * exp(Eaa / kTappl) * (VG, appl)a]1/n
(VG, appl)a/n
8) Exponential voltage law model TTF = [Dpt / Ao * exp(Eaa / kTappl) * exp(a VG, appl)]1/n exp(a VG, appl)
9) Eyring model TTF = A * (< Jion >)–1 * exp(Eaa / kT) (< Jion >)–1
with < Jion > = < (e E r Do / kT) – (Do r(x,t) / x)
> is the time-averaged mobile ion flux
10) SILC-related dielectric leakage induced by
program/erase cycling - charge-loss TF = Ao * (cycles-n) * exp[Eaa/kT] * exp[-g*(VT,Crit - VG)]exp[-g*(VT,Crit - VG) (cycles-n)
charge-gain SILC TF = Ao * (cycles-n) * exp[Eaa/kT] * exp[-g*(VG - VT,Crit)] exp[-g*(VG-VT,Crit) (cycles-n)
Wearout failure rates and models (from JEDEC JEP122G)
TTF = Ao * f(S) * exp(Eaa / kT)
5.1 FEoL Failure Mechanisms – Time-Dependent Dielectric Breakdown (TDDB) – Gate Oxide
5.2 FEoL Failure Mechanisms – Hot Carrier Injection (HCI)
5.3 FEoL Failure Mechanisms – Negative Bias Temperature Instability (NBTI)
5.4 FEoL Failure Mechanisms – Surface inversion (mobile ions)
5.5 FEoL Failure Mechanisms - Floating-Gate Nonvolatile Memory Data Retention
Failure mechanisms models according to Quality Standard
JEDEC
…. To be completed / extended for WBG
Risk assessment resultCompletion of report
LEVEL 4 : PoF + tests
Need to evaluate the lifetime of a device
But no data of TTF and AF are available about degradation of leakage of cells
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time
IRT Laboratory
Evaluation
Construction analysis
Level of risk
Criteria used
Component samples
Scientific publications
Instructions
Tests of componentsDOE based on degradation
of retention time
Tests facilities
InstructionsMechanisms, materials ….
Failure Analysis
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Mécanisme de défaillance Indicateur de défaillance
État bloqué
(VGS < VGSth)
Pièges dans le buffer, la surface ou le coté drain de la grille
Augmentation de la résistance à l’état passant
Piégeage/Dépiégeage d’électrons dans la région de la grille
Dérive de la tension de seuil
État passant
(VGS > VGSth)
Piégeage d’électrons ou de trous dans la couche pGaN
Dérive de la tension de seuil (PBTI, NBTI)
Création de défauts ou de chemins de fuite dans l’empilement de grille p-GaN/AlGaN
Augmentation du courant de fuite de grille
M. Meneghini et al., 2017 IEEE IRPS) 2017, p. 3B-2.1-3B-2.8.
Classical standards based on Si-based components NOT Suitable for GaN !
GaN COTS Reliability assessment
Static stress conditions (HTRB and HTGB)
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Laboratoire de l'Intégration du Matériau au Système
Dr. Loïc THEOLIER
PhD Omar CHIHANI
Vieillissements par paliers
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HTRB-T :
• VDS = 180 V & 50 °C <T < 180 °C
HTRB-V :
• 150 V < VDS < 240 V & T = 150 °C
HTGB-T :
• VGS = 5 V & 50 °C <T < 180 °C
HTGB-V :
• 1 V < VGS < 7 V & T = 150 °C
• Deux types de vieillissements par paliers :
• HTRB : High Temperature Reverse Bias
• HTGB : High Temperature Gate Bias
PhD Omar CHIHANI
Résultats : HTRB-T @ VDS = 180 V
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HTRB-T : impact sur la RDSon , transconductance et VGSth
RDSon (20 %)
Transconductance
Tension de seuil (15%)
L’évolution de la tension de seuil commence à partir du 7ème palier (160 °C)
PhD Omar CHIHANI
Conditions de vieillissement calendaire
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HTRB HT1 : 175 °C / 220 V
HTRB HT2 : 190 °C / 200 V
HTRB HT3 : 190 °C / 220 V
HTRB MT1 : 135 °C / 240 V
HTRB MT2 : 150 °C / 220 V
HTRB MT3 : 150 °C / 240 V
HTGB1 : 6 V /165 °C
HTGB2 : 7 V / 150 °C
HTGB3 : 6 V / 150 °C
HTGB4 : 6,5 V / 150 °C
HTGB5 : 6,5V / 165 °C
HTGB6 : 6,5 V / 130 °CEntre 500 et 1000 heures de vieillissement
4 à 5 composants par condition
PhD Omar CHIHANI
Vieillissement calendaire : HTRB HT
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HTRB HT : impact sur la RDSon ( 50 %)
HTRB HT : impact sur la VGSth ( 20 %)
Racine du temps de vieillissement (s0,5) Racine du temps de vieillissement (s0,5)
PhD Omar CHIHANI
Indicateurs de défaillance et leurs mécanismes associés
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Evolution de la résistance à l’état passant :
• Observée sur le vieillissement HTRB
• Cause : création de défauts dans la
région Grille-Drain ou Grille-Source
• Activé par le champ électrique
Evolution de la tension de seuil :
• Observée sur les vieillissement HTRB
et HTGB pour T > 150 °C
• Cause : création de défauts sous la
grille du composant
• Activé par le champ électrique et la
température
M. Meneghini, E. Zanoni, et G. Meneghesso - ICSICT 2014.
PhD Omar CHIHANI
GaN COTS Reliability assessment
Dynamic (Active Power Cycling)
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Laboratoire d’Analyse et d’Architecture des Systèmes
Dr. Arnaud DUFOUR Pr. Patrick TOUNSI
PhD Manuel A González-Sentís
Methodology
Mise en place d’un Power cycling o Développement d’une carte de commande et stress
o Prise en compte des effets thermomécaniques (caméra IR)
o Identifier les signatures électriques de la dégradation
Localisation des MdD dans un HEMT.(1) Ionisation par impact ; (2) Punch-through ;(3) Surface hopping ; (4) Fuite verticale ;(5) TDDB ; (6) Effet piézoélectrique inverse
Source
Drain
Gate
Sub
strat
Image caméra Infrarouge
EPC2019 en cyclage
PhD Manuel A González-Sentís
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Banc de mesures
Drift effect Physical origin Measurement
Dynamic RDSON
increaseTrapping in GaN buffer and surface trapping between drain and gate
IG(VGS) measurementC(Vg) hysteresis measurement
Time-Dependent degradation
Generation of drain-source, gate-channel paths and vertical breakdown
Leakage current measurement
VTH shift Electron trapping beneath the gateID(VGS) characterisation
ID(VDS) for several VGS values
IG leakagecurrent
Path creation in the gate region, Trap-assisted tunnelling
IG(VGS) measurementC(Vg) hysteresis measurement
Source:Matteo Meneghini et al. IEEE, June 2017.
Spécial intérêt : effets de piégeage et les caractéristiques dynamiques, verrous qui freinent le développement de cette techno.
PhD Manuel A González-Sentís
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Exemple of Power Cycling Results
Cyclage actif avec un stress incrémental. Chaque step est d’une semaine
Étude de l’influence de la tension de grille sûr le vieillissement.
La mesure de la surface d’hystérésis de la courbe CG(V) permet de suivre la création de pièges pendant le cyclage.
PhD Manuel A González-Sentís
VG=4V
VG=5V
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Exemple of Power Cycling Results
PhD Manuel A González-Sentís
Measurments of the power cycling test. S0 is the initial characterization; and the stress S1, S2 & S3 are the steps. Note that DUTs 2 to 5 are driven at VG = 5V and
DUTs 6 to 8 are driven at VG = 4V.
Measured gate threshold voltageMeasured gate leakage
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GaN Radiation Immunity
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Robustness ©
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Background
Objectives: Investigation of effect of radiations (Dose and SEE) on COTS Power GaN
Les Evènements Singuliers (SEE)
Effet non destructifEffet destructif
Effets des radiations
Effets de dose
SEU
SET
SEL
SEB
SEGR
SEL: Single Event LatchupSEB : Single Event BurnoutSEGR : Single Event Gate rupture
IRT Project Robustesse
?
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Radiation Investigation: Results
ion
FP
G D S
2,2 MV/cm
Root cause: rupture of the dielectric passivation layer (SiN)
SiN SiN
SiN
GaN-Buffer
2DEG
AlGaN
FP
No 2DEG under gate
Ec
Ev
Ef
Electron distribution at
VGS = 0 & VDS = 0
Density of traps effect on electric
field (before and after radiation)
TCAD Simulation of Single Event Effect
RX frontside view of the component (GaN System)Electric Field
Failure after radiation (burnout)
Experimental Characterization (Heavy Ions)
FP
G
TCAD simulation allows to explain impact
of ionization mechanism and related
multiplication phenomena enhanced by
heavy ion strikes under the field plate
edge rather than the other locations
x
Power GaN TCAD Models
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Definition of technologies and demonstrators
Radiative tests on WBG technologies
construction analysis
Component preparation
Electrical characterizations
before testing
Tests underradiative
environment
Electrical characterization
after test
Characterization of immunity to radiations
by X-ray & pulsed laser
Modeling(Laser & X-
rays
TCAD simulation
Experiments
Sample preparation
Laser testing
X-rays testing
FailureAnalysis
Bibliography
EPC 2045 100 V
EPC 2046 200 V
GaNSystems GS1008P-E05-MR 100 V
GaNSystems GS66508P-E05-MR 650 V
Panasonic PGA26E07BA 600 V
Irradiation
substrat
contact in
backside
Opening
backside
YX
YY
X ray / Laser
substrat
contact in
backside
Opening
backside
YX
YY
SiN SiN
SiN
GaN-Buffer
2DEG
AlGaN
FP
No 2DEG under gate
Ec
Ev
Ef
Space (satellite & launchers) Heavy Ions
Drone / helicopter / Aircraft Neutron until800MeV Proton > 50 MeV
Cascade of particle
laser spot Define the cross
section anddetermine the safearea (SOA) of thesecomponents.
Test the componentsbefore and after theradiation (measurethe degradation ofthe characteristics).
Find other alternativecharacterization less expensive,more accessible and addapted tothe miniaturization oftechnology.
Mapping in 3D or 2D thesensitive areas
Aim
Aim
Data analysisto understand the failure
mechanisms
Aim
Radiative environment
Test referencesRadiation Immunty Methodology©
IRT
AES
E “S
ain
t Ex
up
éry”
-A
ll ri
ghts
res
erve
d C
on
fid
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al a
nd
pro
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Perspective: Failure Risk Analysis Methodology
18/11/2018
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48
49
FPGA Ring-Oscillator DOE
• FPGA is built from the basic CMOS Cells in
the listed technology node
• Entire device is filled with oscillators
• Continuous measurements eliminates
recover !
• 45nm (present work),
• Work done on 28nm and 20nm
• Then work on 16 nm FinFET
• 150 oscillators of 3 stages (f3)
• 50 oscillators of 5 stages (f5)
• 20 oscillators of 33 stages (f20)
• 3 oscillators of 333 stages (f333)
• 1 oscillator of 1001 stages (f1001)
Incorporates Averaging with number of stages
2n + 1 stages (frequency conditions)
Voltage stress
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FIT dots (Raw data from 9 DOEs) FIT lines (calculated and fitted )
Chip Temperature (ºC)
V=1.2V
f=0 GHz
f=1 GHz V=2.5V , f =0.5 GHz
V=2.2V , f =0 GHz
V=2.9V , f =1 GHz
HCI
BTI
EM
𝑃𝐻𝐶𝐼𝑃𝐵𝑇𝐼𝑃𝐸𝑀
=5.039 ∙ 1010
3.476 ·107
3.116 ·1017
13
𝜆 = 𝜆0 ∙ 𝑒𝑥𝑝𝐸𝑎𝑒𝑞𝑘 ∙
Experimental Activation Energy (BAZ) (Multiple Stress cond. / multiple failure mech.)
𝐸𝑎𝑒𝑞 = 𝑘 ∙𝜕 ln(𝜆)
𝜕1
M-STORM results (example 1/2)
XILINX SPARTAN 6 45nm technology: FIT predictions based on 3 mechanisms as separated by
MTOL Reliability MODEL
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𝜆 = 𝜆0 ∙ 𝑒𝑥𝑝𝐸𝑎𝑒𝑞𝑘 ∙
Experimental Activation Energy (BAZ) (Multiple Stress cond. / multiple failure mech.)
𝐸𝑎𝑒𝑞 = 𝑘 ∙𝜕 ln(𝜆)
𝜕1
M-STORM results (example 2/2)
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WBG based Ring Oscillator M-STORM
18/11/2018
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52
The ring oscillator circuits are investigation in order to
understand the effects of threshold voltage and on-state
resistance with frequency and power dissipation in the
oscillator circuit. The goal of this study is to compare
environmental stress, including I,V and frequency, F, on the
device operation.
a.u
.
2n + 1 stages (frequency conditions)
Voltage stress
Conclusions
18/11/2018
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CONCLUSIONS
IRT-Saint Exupery supported R&D activities go from module design and technology optimisation to device Reliablity/Robustness assesment and risk management.
Module optimisation Reduce inductive parassite (swicthing and driver loops)
Reliability assesment static and dynamic methodologies to tackle FMA
Robustness evaluation under natural radiation (AS mission profiles)
Perspectives: Risk Analysis by Innovative Methodology (M-STORM)
18/11/2018
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© IRT AESE ”Saint Exupéry” - All rights reserved Confidential and proprietary document. This document and all information contained
herein is the sole property of IRT AESE “Saint Exupéry”. No intellectual property rights are granted by the delivery of this document
or the disclosure of its content. This document shall not be reproduced or disclosed to a third party without the express written
consent of IRT AESE “Saint Exupéry” . This document and its content shall not be used for any purpose other than that for which it is
supplied. IRT AESE ”Saint Exupéry” and its logo are registered trademarks.
5518/11/2018
Dr. A. Bensoussan (IRT-TAS), Dr. O. Crepel (IRT-AIRBUS) Mr. J.J. Fabre
(IRT-ACTIA), Mr. D. Ia (IRT-Techform), Dr. M. Zerarka (IRT),
Acknowledgments: