Final Program Abstracts 2010 SVC Technical Conference Program Abstracts.pdf · properties of high...

Final Program Abstracts for the

2010 SVC Technical Conference

To view changes to the program since this publication was produced, please visit the Final Program Addendum after April 12, 2010 at

http://www.svc.org/r/2010finalprogram.cfm on the SVC Web Site.

http://www.svc.org/r/2010finalprogram.cfm

http://www.svc.org/ConferencesExhibits/2010-TechCon-Conference/2010-Preliminary-Program.cfm

http://www.svc.org/Education/At-the-TechCon.cfm

http://www.svc.org/ConferencesExhibits/2010-TechCon-Conference/2010-Exhibitor-Locator.cfm

Sunday Evening

April 18, 2010

Plenary Address

Sunday, April 18

7:00 p.m.

PL

1

Understanding

P.L. Ward, Teton Tectonics,Jackson, WY

Our life-sustaining,

Sunday, April 18

7:00 p.m. PL 1 Understandin

Sunday, April 18

7:00 p.m. PL-1 Understanding Volcanology May be the Key to Controlling Global Warming

P.L. Ward, Teton Tectonics, Jackson, WY

Invited 40 min. Talk

Our life-sustaining, oxygen-rich atmosphere was formed primarily by gases erupted from volcanoes. Without continued eruptions, most life on Earth would soon vanish. Yet moderate sequences of large volcanic eruptions have cooled the Earth incrementally into ice ages. High rates of eruptions have propelled the Earth out of ice ages, and massive eruptions of flood basalts covering areas as large as Washington, Oregon, California and Nevada combined have caused widespread extinctions of the majority of species. We live in a delicate balance and are dependent in a significant way on changes in the rates and types of volcanism. During the 20th century, man burning fossil fuels upset this balance. Man emitted as much sulfur dioxide as volcanoes emitted during the times of most-rapid warmingat the end of the last ice age. The earth warmed rapidly. Between 1980 and 2000, man reduced sulfur emissions by 18% in an effort to reduce acid rain. The rapid rise in global temperatures ceased by 1998. Understanding how volcanoes have initiated an abrupt climate change over the eons suggests ways for man to mitigate global warming during the 21st century.

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Monday Morning

April 19, 2010

Keynote Presentation

Monday, April 19

8:30 a.m.- 9:15 a.

K

1

Nanostructured Hard

M. Odén, Linköping University, Linköping,

Multifunctional carbides and

Monday, April 19

8:30 a.m. - K 1 Nanostructure

Monday, April 19

8:30 a.m. - 9:15 a.m. K-1 Nanostructured Hard Coatings

M. Odén, Linköping University, Linköping, Sweden


Multifunctional carbides and nitrides processed by PVD methods are strategic materials in advanced surface engineering applications. Recent findings of nanostructuring by design and self-organizing in different compounds will be presented here. Nanoscale multilayer coatings, such as TiN/NbN, exhibit superhardening compared to the constituent layer materials. This is explained by dislocation hindering at interfaces between layers of different shear modulus. Superhardening also occurs in TiN/Si3N4 nanocomposites with monolayer-thick SiNx tissue phase. Here, weshow that this tissue phase can be a cubic SiNx layer that is epitaxially stabilized to TiN. The concept of age hardeningis introduced for supersaturated cubic-phase transition metal nitride alloys systems. Spinodal decomposition of TiAlNinto coherent nm-sized domains of TiN and AlN is demonstrated. The nature and impact of the elastic anisotropic nature of the TiAlN alloy is addressed especially on the decomposition behavior and the hardening mechanism. Furthermore, the influence of temperature, composition, and pressure on the spinodal decomposition process is givenand how it can be used to form different types of microstructures. The microstructures that may evolve at the cutting edge of a metal machining tool are discussed. Finally, examples of how multilayer TiAlN/TiN can be used to combine superhardening and age hardening effect to enhance their mechanical properties and at the same time improve their thermal stability.


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Technology Review Session

Monday, April 19

9:30 a.m.

R

1

EmergingTechnolog

C. Bright, 3M Company, Tucson, AZ

The variety of technologies

Monday, April 19

9:30 a.m. R 1 Emerging

Monday, April 19

9:30 a.m. R-1 Emerging Technologies

C. Bright, 3M Company, Tucson, AZ

The variety of technologies used for surface treatments, materials deposition and control of film properties continues to grow and to be embellished. These emerging technologies are being refined and adapted to achieve specific desiredattributes of a surface or in the deposited film or application of the film. This review paper will focus on selected emerging technologies and their applications chosen from recent and 2010 TechCon Emerging Technologies (ET) Session papers. The presentation provides an overview and technical background on selected emerging technologies,and previews some presentations in the 2010 ET Session featuring these technologies. ET examples are Atomic LayerDeposition (ALD), Fast Cycle Sputtering, Cubic Boron Nitride Coatings and Plasma and Ion Sources and Surface Treatments. Applications or potential applications using some of these emerging technologies are discussed. For example, ALD has been used to provide enhance adhesion of metal films, and to produce moisture vapor diffusion barrier films. This paper provides an introduction to ET and high interest 2010 ET presentations to enhance their value for all listeners, even non-experts in that particular emerging technology.

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Monday, April 19

10:10 a.m.

R

2

Atmospheric Plasma

H. Baránková, Uppsala University, Ångström

Atmospheric pressure plasma

Monday, April 19

10:10 a.m. R 2 Atmospheric

Monday, April 19

10:10 a.m. R-2 Atmospheric Plasma Technologies

H. Baránková, Uppsala University, Ångström Laboratory, Uppsala, Sweden

Atmospheric pressure plasma technologies, especially those based on non-thermal processes, have been extensively studied in the last decade, with focus on surface treatment, coating and post-treatment/surface modification. A non-equilibrium atmospheric plasma is capable of high rate production of reactive radicals and processes based on radicalchemistry. There are applications where the non-equilibrium atmospheric plasma is even more advantageous than thevacuum based processes. However, individual applications depend on the current status of development in atmospheric pressure plasma sources and, very importantly, in power supplies. For example, multiplying of plasma sources for large area application will depend on efficient solutions, possibly integrated designs. Atmospheric plasmasurface treatment, activation and cleaning, enables replacement of chemicals and wet chemistry by a more environment-friendly process. The atmospheric pressure PECVD of oxides, carbon nanotubes and polymers can reachvery high deposition rates, provided the homogeneous plasma parameters are achieved and the gas transport is optimized. The atmospheric non-thermal plasma is also used for disinfection and decontamination of surfaces and recently in the plasma medicine. The paper gives a review of the field and highlights 2010 TechCon presentations in the Joint Session on Atmospheric Plasma Technologies.

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Technology Review Session

Monday, April 19

11:10 a.m.

R

3

Vacuum Processes

D. Glocker, Isoflux Incorporated, Rochester,

As materials and devices for

Monday, April 19

11:10 a.m. R 3 Vacuum

Monday, April 19

11:10 a.m. R-3 Vacuum Processes and Coatings for Health Care Applications

D. Glocker, Isoflux Incorporated, Rochester, NY

As materials and devices for health care grow more sophisticated, vacuum technology is playing an increasingly important role. The 2010 TechCon marks the fifth year in a row that a session has been devoted to highlighting developments in this rapidly changing field. This paper reviews some of the applications discussed in past sessions and previews this year’s presentations. It provides an overview of products that are presently enabled by vacuum processes and some of those that hold promise for the future. In the former category, pacemaker electrodes use vacuum deposited layers to improve the electrical coupling to heart tissue, pharmaceutical companies rely on vacuumfreeze drying on a huge scale to package drugs under sterile conditions, and thin layers of high Z materials are sputtered onto stents and other devices to provide X-ray visibility. In the future we may find coatings and surface treatments to encourage cell growth and tissue regeneration and even use artificial organs that rely on thin films in order to function. The historical importance and active development of vacuum processes and coatings for health careproducts continues to create exciting opportunities for new methods and materials.

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Tribological and Decorative Coating

Monday, April 19

9:30 a.m.

T

4

Low Friction,

H.-J. Scheibe, Fraunhofer Institute for Material and

Hydrogen-free tetrahedral

Monday, April 19

9:30 a.m. T 4 Low Friction,

Monday, April 19

9:30 a.m. T-4 Low Friction, High Wear Resistant ta-C Films and their Industrial Coating Technology by a NewLaser-Arc-Module-System

H.-J. Scheibe, Fraunhofer Institute for Material and Beam Technology IWS, Dresden, Germany; M. Falz and M. Holzherr, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany; M. Leonhard, A. Leson, and C.-F. Meyer, Fraunhofer Institute for Material and Beam Technology IWS, Dresden, Germany; and K. Steinborn, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany

Hydrogen-free tetrahedral amorphous carbon (ta-C) coatings are known to have extraordinary low-wear and low-friction properties. Therefore, they are of increasing interest for sliding automotive and machinery components as wellas tool applications. In contrast to the deposition of most other DLC and hard coatings, an efficient deposition of ta-Cis only possible by vacuum-arc technologies, e.g., arc ion plating or pulsed arc deposition. Two difficulties commonly are associated with the industrial deposition of ta-C by these technologies: (1) a limited control and long-term stability of the arc sources and (2) an emission of particles and droplets leading to a high coating roughness. By controlling the pulsed arc discharge by a laser (Laser-Arc) an efficient tool for a long-term stable and efficient working carbon plasma source for ta-C deposition was obtained. The graphite cathode is designed as a rotating roll and placed in a separate source chamber (Laser-Arc-Module / LAM). This module is combined by an adapting flangewith the industrial batch coater DREVA 600. A Q-switched Nd-YAG-Laser is used for the temporally and locally controlled arc-ignition while the ta-C deposition mainly originates from the pulsed arc discharge parameters. This combination of LAM with industrial coaters also opens new opportunities to design new generations of coating stacksincorporating super hard top-layers in combination with classical and proofed interface designs and hard coatings. Moreover, by replacing the adapting flange with a novel filtering unit, the industrial deposition of smooth and virtually defect-free ta-C coating is possible.

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Monday, April 19

10:10 a.m.

T

2

The WearProperties

L. Haubold, Center for Coatings and Laser

Hard and low friction thin film

Monday, April 19

10:10 a.m. T 2 The Wear

Monday, April 19

10:10 a.m. T-2 The Wear Properties of Aluminum-Magnesium-Boride Ceramic Alloys and Hydrogen-Free Amorphous Carbon Thin Film Coatings in Comparison to Conventional Hard Coatings

L. Haubold, Center for Coatings and Laser Applications, Fraunhofer USA, Inc., East Lansing, MI; W. Anderson, Newtech Ceramics Inc., Boone, IA; and M. Becker and T. Schuelke, Center for Coatings and Laser Applications, Fraunhofer USA, Inc., East Lansing, MI

Hard and low friction thin film coatings improve the performance, energy efficiency and service life of machinery components that operate in sliding, rolling, impact and mixed mode contact situations. The paper presents the properties of high performance wear resistant thin film materials: (1) aluminum-magnesium-boride based ceramic alloys and (2) hydrogen free tetrahedral amorphous carbon. The films were deposited using magnetron sputtering andpulsed cathodic arc evaporation. Deposition conditions and wear properties are discussed and compared to more conventional wear coating materials such as metal nitrides.

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Monday, April 19

10:30 a.m.

T

3

Engineered PVD

J.A. Araujo and G.A. Marques, MAHLE Metal

This article intends to

Monday, April 19

10:30 a.m. T 3 Engineered

Monday, April 19

10:30 a.m. T-3 Engineered PVD Coatings for Piston Rings Application

J.A. Araujo and G.A. Marques, MAHLE Metal Leve SA, São Paulo, Brazil

This article intends to describe a typical CrN Physical Vapor deposited hard coating used for piston ring application and evaluate different structured CrN PVD coatings, developed for piston ring application, concerning coating delamination and wear resistance. Due to the harsh environmental conditions of a piston ring during engine life this application requires thick, wear resistant coatings with high durability, having also good coating delamination resistance which is linked to resistance to thermal and contact fatigue. CrN has been a typical candidate because it canbe deposited up to 40 to 50 microns thick on rings. To maintain function as piston rings, the tribological performanceof the coating is especially important. Therefore, various structure modifications were applied in order to identify newtypes of high toughness coating material, such as CrN low stress, CrN multilayer, doped CrN and CrN/Cr multilayer.Evaluation of structured CrN coatings was made through Scratch test and Reciprocating bench test machine. The engineered CrN PVD coatings developed in this work were made varying process parameters, as nitrogen carrier gas and reactive gas composition resulting in coatings with different mechanical properties.

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Monday, April 19

11:10 a.m.

T

19

Influenceof Hollow

B. Gebhardt, M. Holzherr, M. Falz, and T. Schmidt,

In the past, plasma assisted

Monday, April 19

11:10 a.m. T 19 Influence of

Monday, April 19

11:10 a.m. T-19 Influence of Hollow Cathode Plasma on AlTiSiN- Thin Film Deposition with Vacuum Arc Evaporation Sources

B. Gebhardt, M. Holzherr, M. Falz, and T. Schmidt, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany

In the past, plasma assisted AlTiN- and AlCrN- thin film depositions had been carried out by means of simultaneousoperation of hollow cathode with vacuum arc evaporation sources. The additional hollow cathode plasma ( P+- technology) results in advanced thin film properties such as higher hardness, lower droplet density and improved wearresistance properties. Although by the addition of silicon to AlTiN- or AlCrN- standard vacuum arc coatings a phase separation and the forming of nanocomposites TiAlN / Si3N4 or AlCrN / Si3N4 coatings with super hardness and excellent temperature stability were reported, the goal of the presented application of the newly developed P+- technology is to further improve the deposition conditions as well as to optimise the AlTiSiN- thin film properties. Acomparison of AlTiSiN thin film coatings deposited by standard vacuum arc sources and the P+ - process will be presented. AlTiSi- target materials with three different Si- at % contents (5, 10 and 15 at %) had been used for the thinfilm depositions. The experiments were arranged in a medium sized industrial batch coater. The effects of modified Sicontents in AlTiSi- target materials and the simultaneous operation of the two hollow cathodes on plasma parametersduring the vacuum arc coating process were examined by the use of optical emission spectroscopy (OES) method andlangmuir probe. The influence of the measured plasma parameters on selected AlTiSiN- thin film properties will be demonstrated in the standard as well as in the P+- process. Verbose invited

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Monday, April 19

11:30 a.m.

T

5

Internal Plasma

H. Kousaka, K. Mori, and N.Umehara, Nagoya

Recently, internal coating

Monday, April 19

11:30 a.m. T 5 Internal

Monday, April 19

11:30 a.m. T-5 Internal Plasma Processing of Narrow Halls and Tubes with Microwave Propagation along Plasma Sheath Interfaces

H. Kousaka, K. Mori, and N. Umehara, Nagoya University, Department of Mechanical Science and Engineering, Nagoya, Japan; and N. Tamura and T. Shindo, Contamination Control Services, Inc., Sagamihara, Japan

Recently, internal coating of halls and tubes with diamond-like carbon (DLC) is strongly desired for further improvement of sliding interfaces of molds and mechanical parts. However, conventional low-density plasmas (electron density ne<1010 cm−3) such as RF and DC plasmas cannot be steadily sustained inside small halls and tubes less than 1 cm in width under typical processing conditions. For the purpose of internal DLC coating of narrower metal halls and tubes, the use of higher-density (ne>1011 cm−3) plasma is essential. Therefore, we developed a new generation method of high-density plasma which can be steadily sustained inside small halls and tubes by using microwave propagation along plasma-sheath-metal interface. In this work, we deposited DLC film to the inner surfaceof a stainless-steel tube 4.4 mm in inner diameter and 50 mm in length by using the plasma column sustained inside the tube in methane and tetramethylsilane with the new method. The rotational friction test of the DLC was conductedagainst cast iron shaft, 4.2 mm in outer diameter and 10 mm in length, indicating that the friction coefficient was 0.17.

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Monday, April 19

11:50 a.m.

T

6

Characterization of

B.C. Jarvis, D.M. Mihut, andK. Lozano, The University

Different metal and metal

Monday, April 19

11:50 a.m. T 6 Characterizati

Monday, April 19

11:50 a.m. T-6 Characterization of Substrate/Thin Film Interactions and Properties of Multilayered StructuresDeposited via Magnetron Sputtering on High Density Polyethylene/ Carbon Nanofiber Composites

B.C. Jarvis, D.M. Mihut, and K. Lozano, The University of Texas Pan American, Department of Mechanical Engineering, Edinburg, TX

Different metal and metal nitride thin films configurations (Al, Ti, AlN and TiN) are deposited using low temperatureultra high vacuum RF magnetron sputtering onto High Density Polyethylene/Carbon Nanofiber (HDPE/CNF) composites with various levels of NF concentration. These composites have shown electromagnetic interference shielding capability of up to 35 db at 25 wt% NF concentration. The effects of the varying deposited layer thickness and thin films’ structures have been examined to obtain the optimum compositions where shielding is increased and good adhesion together with enhanced mechanical, electrical and thermophysical properties are obtained. The fundamental interactions that take place at the interface of the thin films and nanoreinforced polymer matrix are also investigated.

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Plasma Processing

Monday, April 19

9:30 a.m.

P

1

Ion-Bombard

O. Novak, J. Sicha, and J. Vlcek, Department of

Pulsed DC dualmagnetron

Monday, April 19

9:30 a.m. P 1 Ion-

Monday, April 19

9:30 a.m. P-1 Ion-Bombardment Characteristics during Deposition of Photoactive TiO2 Films Using a Pulsed Dual Magnetron System

O. Novak, J. Sicha, and J. Vlcek, Department of Physics, University of West Bohemia, Plzen, Czech Republic

Pulsed DC dual magnetron sputtering of photocatalytic crystalline TiO2 films was investigated. The depositions wereperformed in argon (0.7 Pa) – oxygen (0.2 Pa) gas mixture using two unbalanced magnetrons with planar titanium targets of 50 mm diameter. The substrate temperature was 160°C. Both the magnetrons operated in the same asymmetric bipolar mode at the repetition frequency of 100 kHz with a fixed 50% duty cycle and the average target power density in a pulse close to 50 Wcm-2, but their operation was shifted by a half of the period. Time-averaged energy-resolved mass spectroscopy was performed at a substrate located 100 mm from the target. Ion flux characteristics were measured for several connections of a dual bipolar power supply. A complicated structure of ion energy distributions at the substrate, affected by the simultaneous operation of both magnetrons with a closed magnetic field, was explained. Relatively narrow (only up to 45 eV) ion energy distributions were obtained for the dual magnetron system with a floating power supply. The suppression of high-energy ions in the flux onto the substrate resulted in production of a highly photoactive (see decomposition of an AO7 organic dye solution) TiO2 anatase phase with larger grains (see X-ray diffraction).

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Monday, April 19

9:50 a.m.

P

2

ThresholdIonisation

J. Benedikt, Ruhr University, Bochum,

The knowledgeof absolute

Monday, April 19

9:50 a.m. P 2 Threshold

Monday, April 19

9:50 a.m. P-2 Threshold Ionisation Mass Spectrometry Detection of Reactive Species in Plasmas

J. Benedikt, Ruhr University, Bochum, Germany


The knowledge of absolute fluxes of reactive species such as radicals or energetic ions to the surface is crucial to the understanding of growth or etching of thin films. These species have very low densities due to their high reactivity, and their detection is therefore a challenging task. Mass spectrometry (MS) is very sensitive technique and it will be demonstrated in this talk that it is the optimal choice for identification of growth precursors. Also, MS is useful for thestudy of plasma chemistry in general. MS measures the plasma composition directly at the surface; it is not limited bythe (non)existence of accessible optical transitions. When the MS is properly designed and carefully calibrated, it provides absolute densities of measured species. It can even measure internally excited metastable species. Importantissues regarding proper design of a multiple differential pumping stage system and proper absolute calibration of themeasured signal will be discussed. Examples of measurements of stable and radical species in acetylene and oxygen plasmas will be shown.


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Plasma Processing

Monday, April 19

10:30 a.m.

P

3

Plasma Analysis

S. Lapp, F. Placido, and A.Ogwu, University of the

The main problems of

Monday, April 19

10:30 a.m. P 3 Plasma

Monday, April 19

10:30 a.m. P-3 Plasma Analysis of a Hollow Cathode PECVD Process for DLC Interior Coating of Pipelines

S. Lapp, F. Placido, and A. Ogwu, University of the West of Scotland, Paisley, United Kingdom; and D. Lusk and M.Gore, Sub-One Technology, Inc., Pleasanton, CA

The main problems of industrial piping are corrosion and erosion/wear of the interior surface. A low-priced and effective coating technology to produce a hard and smooth film without any pinholes would reduce cost of plant construction and maintenance in a wide area of industry. The Thin Film Centre at UWS is working in collaboration with Californian-based Sub-One Technology, Inc. to characterise a novel DLC coating technology to reduce corrosioninside of pipelines and improve flow rates of fluids. The pipe itself acts as the vacuum chamber where the molecules of the process gases are decomposed by the ignited pulsed DC plasma inside the pipe. This novel concept allows the interior coating of parts with different dimensions and geometries. Optical emission spectroscopy (OES) is used to analyse the emitted light of the plasma to characterise the plasma condition inside the pipe at different positions alongthe pipe. The neutral density and ion density of the different process gases can be determined to understand the respective transition for different process conditions. The electrical properties of the plasma such as electron density, ion density and electron energy distribution function (EEDF) were analysed by a Langmuir Probe plasma diagnostic system. The set up used allows a spatial and time resolved investigation of the plasma condition along and across thepipe. The presentation contains the analysis of the plasma conditions in pipes of variable size and for different processparameters like power, pressure and gas flow.

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Monday, April 19

11:10 a.m.

P

4

FrequencyProbe

D.R. Boris, S.G. Walton, M.Baraket, E.H. Lock, and R.

Plasma densitymeasurements

Monday, April 19

11:10 a.m. P 4 Frequency

Monday, April 19

11:10 a.m. P-4 Frequency Probe Measurements in Processing Plasmas

D.R. Boris, S.G. Walton, M. Baraket, E.H. Lock, and R.F. Fernsler, U.S. Naval Research Laboratory, Plasma PhysicsDivision, Washington, DC

Plasma density measurements are an essential tool in understanding and controlling processing plasmas across a widerange of applications. Charge collection probes (Langmuir probes) are of limited utility in depositing plasmas, high pressure applications or in processes that require the use of reactive gases, as these environments result in unreliable data acquisition. Plasma frequency probes are an attractive alternative to Langmuir probes in such applications since they do not suffer performance degradation in these environments. Frequency probes are capable of measuring plasmadensity over a range of 108 to 1012 cm-3 and, it is possible to extract the plasma potential and electron temperature. This presentation details the use of plasma frequency probes to measure plasma parameters in unique systems operating at higher pressures or in reactive gases (O2 and SF6). Where possible these measurements are compared with Langmuir probe measurements for identical experimental parameters.

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Plasma Processing

Monday, April 19

11:30 a.m.

P

10

Novel Uniform

P. Maschwitz, AGC Flatglass North America,

A novel, linear,plasma source

Monday, April 19

11:30 a.m. P 10 Novel Uniform

Monday, April 19

11:30 a.m. P-10 Novel Uniform Linear Plasma Source for Large Area PECVD Coating or Surface Treatment

P. Maschwitz, AGC Flatglass North America, Sebastopol, CA

A novel, linear, plasma source is reported for use as a large area, plasma enhanced, CVD deposition tool or as a plasma surface treatment device. The basic apparatus does not require the use of magnetic fields to establish long uniform plasmas. Two design configurations are described; however, in both cases, the basic device consists of two or more parallel hollow cathode discharge tubes powered by a bipolar mid-frequency power supply. Dense plasmas,with lengths as long as three meters and with widths ranging from 10 mm to 200 mm may be formed. Power consumption by the plasma in some configurations is as high as 500 watts per cm of device length, although powers of 60 watts per cm are used for SiO2 deposition processes. The characterization and deposition rate of SiO2 coatings derived from PECVD of tetramethyldisiloxane is described. Dense, carbon free layers of SiO2 are deposited at rates of approximately 100 nanometer·meters/minute. For applications aimed at surface treatment processes, the addition of magnetic fields is shown. The addition of a magnetic field can create a densified plasma directly in contact with a substrate surface. By this method, large amounts of plasma energy may be transferred to a surface.

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Monday, April 19

11:50 a.m.

P

11

600 mm Wide

D.-H. Park, B.-T. Bae, andW.-K. Choi, Korea Insistute

A closed drift thruster with an

Monday, April 19

11:50 a.m. P 11 600 mm Wide

Monday, April 19

11:50 a.m. P-11 600 mm Wide Linear Stationary Plasma Thruster (LSPT) for Large Area Ion Beam Modification

D.-H. Park, B.-T. Bae, and W.-K. Choi, Korea Insistute of Science and Technology, Seoul, Korea

A closed drift thruster with an extended acceleration region, called stationary plasma thruster (SPT), has been mounted in a satellite from the 1960s. Since it has advantages of high efficiency of gas ionization, low ion beam energy, charge neutralization effect, and stable operation, it is researched as an applicable ion source for surface modification. While conventional SPTs have a circular shape for trapped electron motion along the ceramic wall, a 600 mm wide horse-track shaped closed drift region is newly designed and investigated. With an electromagnetic winding coil, a magnetic field of discharge region is optimized by magnetic filed simulation code. The ion beam current density is measured to be more than 0.2 mA/cm2 and ion beam current spatial distribution is about 80% acrossthe beam extraction region. The average ion beam energy is measured to be lower than 300V, which is quite suitable for polymer modification. Linear SPT is applied for polymer film surface modification to enhance surface energy in avacuum web-coater. It shows that reactive ion beam irradiation reduces the wetting angle less than 10 degrees withina few seconds and enhances surface energy higher than 80 [erg/cm2]. The treated surface also shows uniform characteristics across the modified region without much surface damage.

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Vacuum Web Coating

Monday, April 19

9:30 a.m.

W

1

Researchof

M. Misels-Piesis, E. Machevsky, I. Ashmanis,

While Al-dopedZnO films on

Monday, April 19

9:30 a.m. W 1 Research of

Monday, April 19

9:30 a.m. W-1 Research of Electrical, Optical and Structural Characteristics of ITO, AZO and GZO Coatingson the Polymeric Substrate

M. Misels-Piesis, E. Machevsky, I. Ashmanis, and V. Kozlov, Sidrabe Inc., Riga, Latvia

While Al-doped ZnO films on glass have been recently brought into production as a low-cost TCO for silicon solar cells, they are not applicable to plastic substrates due to elevated deposition temperatures. The most promising low-cost TCO for flexible substrates and a wide range of applications is ZnO doped with gallium. The electrical propertiesof this material are highly dependent on the process parameters, therefore it needs thorough investigation and optimization of the deposition technology. Gallium-doped ZnO (GZO), aluminum-doped ZnO (AZO) and indium-tinoxide (ITO) thin films were deposited by magnetron sputtering and ion sputtering on PET and glass substrates in a roll-to-roll coater. Dependence of material characteristics upon its deposition conditions and substrate pre-treatment were studied. The GZO films show a typical ZnO wurtzite structure and c-axis orientation. Electrical resistivity of GZO is strongly increased directly above erosion zones while optical transparency is not influenced.

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Monday, April 19

9:50 a.m.

W

2

Zinc OxideBased

M. Fahland, T. Vogt, and A.Schönberger, Fraunhofer

Transparent electrodes are

Monday, April 19

9:50 a.m. W 2 Zinc Oxide

Monday, April 19

9:50 a.m. W-2 Zinc Oxide Based Transparent Electrodes for Flexible Thin Film Devices

M. Fahland, T. Vogt, and A. Schönberger, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; and U. Partsch, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Dresden, Germany

Transparent electrodes are an important component for various thin film devices. The paper will present a review of present solutions covering single layer conducting oxides as well as composite technologies. Special emphasis will beput on the mechanical stability of the electrode on plastic film. Conventional indium tin oxide (ITO) layers break at astretching of 1-2 %. The mechanical sensitivity of the samples increases with increasing thickness. This requires newsolutions for low sheet resistance electrodes on flexible substrates. A novel, cost effective technology for the deposition of zinc oxide on polyethylene terephtalate film is presented. The deposition was performed in a roll-to-rollcoating machine at low substrate temperature. Silicon was used as the dopant material with a concentration varying indifferent samples between 1 and 4 %. The optimum parameters provided a transparent layer with a sheet resistance of16 Ω/square. The carrier density and the mobility were determined by Hall measurements. They amounted to 8.8 cm²V-1s-1 and 2.5x1020 cm-3, respectively. These values are a promising starting point for the deposition on heat sensitive substrates.

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Vacuum Web Coating

Monday, April 19

10:10 a.m.

W

3

High Performan

H. Suttle, A.J. Topping, A.A.R. Watt, and H.E. Assender,

The use of polymer films as

Monday, April 19

10:10 a.m. W 3 High

Monday, April 19

10:10 a.m. W-3 High Performance Gas Barrier Materials for Electronics Applications

H. Suttle, A.J. Topping, A.A.R. Watt, and H.E. Assender, University of Oxford, Oxford, United Kingdom

Sponsored Student Presentation

The use of polymer films as substrates in electronics applications promises numerous advantages over those materialsbeing used at present. They are lightweight, flexible and low cost and may function as substrates and encapsulation for devices. At present the use of polymer films as substrates in electronics is limited by their poor performance as barriers to water and oxygen. The presence of these species is the primary cause of degradation of the materials in devices such as organic and other thin film photovoltaics (PVs) and organic LEDs (OLEDs). This work has aimed toproduce gas barrier materials close to the level required for electronics applications by optimising processing conditions as well as examining and understanding the mechanism of gas transport across the barrier. The roll-to-rollcoating facility in Oxford is capable of reactive sputtering of oxide layers as well as flash evaporation, with e-beam cure of acrylic layers in-line, allowing the deposition of polymeric smoothing and interlayers. We present results on polymer-AlOx reactive sputtered barrier layer composites with WVTR below 10-3g/m2/day. Our studies have focused, in the first instance, on developing an ultra-low defect dense single layer of oxide on high quality PEN film, with further work to achieve higher barriers with oxide/polymer multilayers. The reactive sputtering of AlOx onto PEN andalternating polymer smoothing layers will be discussed, along with the performance of the barrier films in conventional permeation measurements (Mocons, Calcium test) and as encapsulation in device degradation tests.

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ABSTRACTEntry

Monday, April 19

10:30 a.m.

W

4

Atmospheric

M. Roehrig, 3M Corporate Research Lab, St. Paul,

Next generationbarrier films are

Monday, April 19

10:30 a.m. W 4 Atmospheric

Monday, April 19

10:30 a.m. W-4 Atmospheric Pressure Mass Spectrometry Based Measurements of Permeant Transmission through Barrier Films

M. Roehrig, 3M Corporate Research Lab, St. Paul, MN; F. McCormick, 3M Display & Graphics Business Lab, St. Paul MN; and A. Nachtigal, J. Pieper, D. Reed, and F. Deroos, 3M Corporate Research Lab, St. Paul, MN

Next generation barrier films are designed to have extremely low permeant transmission rates, so low in fact that it isa major challenge to measure these films analytically. Methods based on mass spectrometry have been around for some time but often employ high vacuum techniques in order to measure transmission rates. In this paper we describea mass spectrometry detection method combined with pulsed valve permeant introduction system which allows the barrier films under test to remain at atmospheric conditions. The instrumental hardware, method and evaluation of barrier films will be presented.

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ABSTRACTEntry

Vacuum Web Coating

Monday, April 19

11:10 a.m.

W

5

Low Stress

D.R. Gibson and R. Waugh,Applied Multilayers Ltd.,

There is an increasing

Monday, April 19

11:10 a.m. W 5 Low Stress

Monday, April 19

11:10 a.m. W-5 Low Stress Transmitting Conducting Oxides on Polymer Sheet

D.R. Gibson and R. Waugh, Applied Multilayers Ltd., Coalville, United Kingdom; H.M. Upadhyaya and N.S. Nasikkar, Centre for Renewable Energy Systems Technology, Department of Electronic and Electrical Engineering, Loughborough University, Leicestershire, United Kingdom; and J.M. Walls, Applied Multilayers Ltd., Coalville, United Kingdom and Centre for Renewable Energy Systems Technology, Department of Electronic and Electrical Engineering, Loughborough University, Leicestershire, United Kingdom

There is an increasing requirement for depositing complex multilayer active coatings onto surfaces of flexible polymer sheet. Applications include thin film photovoltaics, electrochromic coatings and displays. All these applications require the deposition of a transmitting conducting oxide layer such as ITO or Al:ZnO. Coating flexiblepolymer sheet presents a challenge since it requires a low temperature process that deposits thin films that are spectrally stable but also low in stress to prevent cracking. This paper describes a flexible reactive sputtering process in which adjacent unbalanced magnetrons are constructed of opposite magnetic polarity. The resulting closed magnetic field maintains a high density reactive plasma that does not require the use of high voltage ion acceleration.As a result, the deposition energy is optimized and insufficient to cause damage in the growing thin film. The substrate temperature is typically maintained below 100˚C without the need for direct cooling. The thin films exhibitbulk optical properties, they are also dense and super-smooth (<1nm rms roughness). The thin films also have typically low compressive stress. The deposition process is high rate using pulsed DC power. This paper provides dataderived from high throughput batch systems with substrate carriers up to 0.75m in diameter and with linear magnetrons up to 1.2m in length. The process geometry is scaleable and adaptable to roll to roll deposition. Examplesof active coatings using on polymer substrates including polycarbonate, PET and Polyimide will be included.

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ABSTRACTEntry

Monday, April 19

11:30 a.m.

W

6

If Not ITO,Then

J.B Fenn, Fennagain, WestHills, CA; D.J. McClure,

Indium tin oxide(ITO) sputter

Monday, April 19

11:30 a.m. W 6 If Not ITO,

Monday, April 19

11:30 a.m. W-6 If Not ITO, Then What?

J.B Fenn, Fennagain, West Hills, CA; D.J. McClure, Acuity Consulting and Training, Siren, WI; and C.A. Bishop, C.A. Bishop Consulting Ltd., Near Loughborough, United Kingdom

Indium tin oxide (ITO) sputter deposited on flexible transparent polymer webs has been the standard for the transparent conductive (TC) coatings industry for over 30 years. It has been around long enough to have gathered many complaints about it. Some of these are the price of the ITO coating materials, the pending worldwide shortage of In, its supposed lack of flexibility, its susceptibility to scratching during handling and its perceived short comings in performance demands with respect to visible light transparency, reflectivity, color and available range of suitable sheet resistivities. Because of the rapid growth in the last few years in demand for more cost effective flexible TC coatings, fueled by touch panels for smart phones, other portable electronic communication devices and e-books, many other coating technologies have been, or are being, developed to take the place of ITO. This paper will attemptto compare and contrast the actual performances of ITO vs. the newcomers in the market, provide some market volume and growth potential for flexible TC coatings and present the author’s view from his own crystal ball of futuretrends in this industry.

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ABSTRACTEntry

Vacuum Web Coating

Monday, April 19

11:50 a.m.

W

7

Study of High Gas

H. Yanagihara, C. Ookawara, and S. Yoshida,

Recently, film with high gas-

Monday, April 19

11:50 a.m. W 7 Study of High

Monday, April 19

11:50 a.m. W-7 Study of High Gas Barrier Performance of Film with Coated SiOxNy Layers

H. Yanagihara, C. Ookawara, and S. Yoshida, Mitsubishi Plastics Inc., Nagahama, Japan; and K. Ohdaira and H. Matsumura, Japan Advanced Institute of Science and Technology, Ishikawa, Japan

Recently, film with high gas-barrier performance for penetration of oxygen and water vapor has been strongly expected in the food packaging and the coating of electronic devices. In order to get high gas barrier performance, wehave tried to coat SiOxNy layers on film by catalytic CVD (Cat-CVD). Cat-CVD is a method to make thin film by decomposing gas molecules on heated surface of catalyzer using catalytic cracking reactions and transporting them tocooled substrates. In this study, the water vapor transmission rate (WVTR) of SiNx/SiOxNy double-layer coated film showed one order superior to that of monolayer coated samples with same thickness. We will show some WVTR results of samples produced by Cat-CVD mainly, and also show measurements and other approaches.

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ABSTRACTEntry

Monday Afternoon

April 19, 2010

The Donald M. Mattox Tutorial Program

Monday, April 19

12:30 p.m. - 1:10

TS

1

Engineered Surfaces

G.E. McGuire, InternationalTechnology Center,

Substrate preparation is

Monday, April 19

12:30 p.m. - TS 1 Engineered

Monday, April 19

12:30 p.m. - 1:10 p.m. TS-1 Engineered Surfaces through Surface Preparation and Cleaning

G.E. McGuire, International Technology Center, Research Triangle Park, NC


Substrate preparation is an integral part of any film deposition process. This includes removal of unwanted impurities and residues as well as conditioning of the surface to generate the desired microstructure and composition. The substrate-film interfacial region plays a critical role in condensation and nucleation during the initial stages of film growth. In addition, the interface plays a role in both the microscopic and macroscopic properties of the growing film.The interface not only influences nucleation but also adhesion, film stress and other properties. In spite of the wide range of film deposition techniques and associated pressures, temperatures and energies of the deposited species there are many common aspects of surface preparation and cleaning which will be discussed. The nature of the surface and coating may play a role in the choice of surface cleaning and preparation technique and may influence the choice of a wet or dry process for this purpose. With a wide arsenal of surface characterization techniques it is possible to gain insight into the nature of the interface including the microstructure, elemental composition, chemical state and materialphases present. The interplay of all of these factors will be discussed in an overview of the field.


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ABSTRACTEntry

Emerging Technologies

Monday, April 19

1:30 p.m.

E

1

Advancesin Science

W.J. Zhang, Y.M. Chong, Q.Ye, B. He, I. Bello, and S.T.

Cubic BN (cBN) is structurally

Monday, April 19

1:30 p.m. E 1 Advances in

Monday, April 19

1:30 p.m. E-1 Advances in Science and Technology of CVD Cubic Boron Nitride (cBN) Films

W.J. Zhang, Y.M. Chong, Q. Ye, B. He, I. Bello, and S.T. Lee, City University of Hong Kong, Kowloon, Hong Kong


Cubic BN (cBN) is structurally analogous to diamond, and has a set of extreme properties similar or even superior todiamond. For example, cBN is the second hardest and the second most thermally conductive material next to diamond. The band gap of cBN (6.3±0.2 eV) is larger than that of diamond (5.5 eV); cBN is chemically inert againstmolten ferrous materials, while diamond readily forms soot when in contact with them. Moreover, cBN is potentiallya semiconducting material superior to diamond because cBN can be doped for both n- and p-type conductivity while n-type conductivity of diamond is still problematic. The extreme properties of cBN have prompted material scientiststo develop their novel structures and new industrial products. To date, cBN has been commercially synthesized in large quantities as powders with sizes ranging from submicron to millimeters by a high-pressure high-temperature (HPHT) method. Together with HPHT diamond, HPHT cBN has a billion dollar market especially in cutting tools andwear parts. The severe nature of the HPHT methods and the limited size of cBN grains produced, however, prohibit many attractive potential applications of cBN. This is a major motivation for thin film synthesis of both cBN and diamond. This presentation reviews the recent progress in the following aspects on the synthesis and applications of cBN films: 1) Successful approaches in the interface engineering and growth techniques in increasing film thickness,and improving crystallinity and adhesion of cBN films to the substrate, which are the major issues hindering cBN films for both mechanical and electronic applications. 2) Growth mechanisms of cBN films via physical and chemicalroutes. 3) In situ and post-growth doping techniques for achieving semiconductor cBN films. 4) New development inconstructing diamond and cBN films to various nanostructures (e.g., superlattice, nanocone, and nanopillar arrays). 5)Applications of cBN films in cutting tools, DUV detectors, and chemical/biological sensors.


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ABSTRACTEntry

Monday, April 19

2:10 p.m.

E

2

Cubic Boron

K. Bewilogua, M. Keunecke, S.-T. Park, C.

Because of theirhigh hardness

Monday, April 19

2:10 p.m. E 2 Cubic Boron

Monday, April 19

2:10 p.m. E-2 Cubic Boron Nitride Coatings - Sputter Deposition, Properties and Application Tests

K. Bewilogua, M. Keunecke, S.-T. Park, C. Stein, and K. Weigel, Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany; V. Richter, Fraunhofer Institute for Ceramic Technologies and Systems, Dresden, Germany; and J. Fuentes, University of Technology, Berlin, Germany

Because of their high hardness and thermal stability, cubic boron nitride (cBN) coatings are highly attractive for cutting tool applications, especially for ferrous materials. However, there are still some obstacles to overcome beforecBN coatings will meet an industrial level. After several years of development, sufficiently thick (up to 2 µm) and well adhering cBN films can be prepared on cemented carbide cutting inserts. The deposition processes were carried out in laboratory scale equipment by reactive sputtering using boron carbide B4C targets and Ar/N2 gas mixtures. Adhesion improving interlayers and hard coatings like TiN and TiAlN were prepared. The coating properties were very similar to those known for bulk cBN. Cutting tests, both by turning and milling under conditions near to actual practice, revealed the high potential of these cBN coatings. There are indications that the coatings behavior will be influenced by the grain structure and composition of the cemented carbide substrate. Finally, the present state and theconsequences in view of cBN deposition on 3-dimensional tools, and an up scaling to industrial machine dimensionswill be discussed.

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ABSTRACTEntry


Monday, April 19

2:30 p.m.

E

3

Atomic Layer

T.O. Kääriäinen and D.C. Cameron, Lappeenranta

One of the mostpromising areas

Monday, April 19

2:30 p.m. E 3 Atomic Layer

Monday, April 19

2:30 p.m. E-3 Atomic Layer Deposition of Metal Oxide Films as Diffusion Barriers on Flexible Packaging Materials

T.O. Kääriäinen and D.C. Cameron, Lappeenranta University of Technology, ASTRaL, Mikkeli, Finland; and K. Lahtinen, P. Johansson, and J. Kuusipalo, Tampere University of Technology, Paper Converting and Packaging Technology, Tampere, Finland

One of the most promising areas for the industrial application of atomic layer deposition (ALD) is gas diffusion barriers on polymer based materials. In this work a novel packaging material system with improved diffusion barrier properties has been developed. Nanometer scale metal oxide films have been applied to paper-based packaging materials and their diffusion barrier properties have been studied by means of water vapour and oxygen transmission rates. The paper is firstly extrusion coated with polymer film followed by ALD deposited Al2O3. The polymers used as extrusion coatings were polypropylene, low and high density polyethylene, polylactide and polyethylene terephthalate. Water vapour transmission rates (WVTRs) were measured according to method SCAN-P 22:68 and oxygen transmission rates according to a standard ASTM D 3985. A 10 nm oxide layer already decreased the oxygentransmission by a factor of 10 compared to uncoated material. WVTR with 40 nm ALD layer was better than the levelcurrently required for most common dry flexible packaging applications. When the oxide layer thickness was increased to 100 nm and above, the measured WVTRs were limited by the measurement set up. Using an ALD layer allowed the polymer thickness on flexible packaging materials to be reduced. Once the ALD layer was 40 nm thick,WVTRs did not improve with increasing polymer layer thickness. Thus, nanometer scale ALD oxide layers have beenshown to be an effective way to fabricate flexible packaging materials with high quality barrier properties.

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ABSTRACTEntry

Monday, April 19

2:50 p.m.

E

4

SignificantReduction

P. Lach, P. Ozimek, and M.Zelechowski, Huettinger

Sophisticated arc management

Monday, April 19

2:50 p.m. E 4 Significant

Monday, April 19

2:50 p.m. E-4 Significant Reduction of Arc Caused Sputtering Losses

P. Lach, P. Ozimek, and M. Zelechowski, Huettinger Electronic Sp. z o.o., Zielonka, Poland; and G. Hintz, HüttingerElektronik GmbH, Freiburg, Germany

Sophisticated arc management with extremely short detection time and fast recovery are of great importance in modern DC power supplies for plasma applications. However, opportunity of improvements in hardware is almost ending. By using the best available elements, it is possible to extinguish an arc within less then 2 ms. Further improvements are still possible by software related changes. This paper presents a method of significant (tenfold) reduction of sputtering losses caused by arc extinguishing breaks. Moreover, reduction of the detection time to a rangeof tens of nanoseconds is obtained by using new developed software algorithms and advanced microprocessor techniques. Decreasing detection and reaction time minimize arc energy. which results in elimination of cathode damage and prevents droplet formation on a substrate. Introduced software algorithm also focuses on new control solutions to optimize arc quenching power circuitry. Power supplies equipped with the mentioned features are able tohandle arcs with energy lower then 0.4 mJ/kW, which is an additional significant reduction compared with the currentbest on the market generators. Also, the number of arcs per second that the power supply is able to manage is substantially increased. This is crucial for some processes in which arcing rate may reach up to 10,000 arc/s and dynamically - even up to 100,000 arc/s. All presented improvements allow using standard DC power supplies in applications reserved so far for expensive pulsed generators. Increase of deposition rate and process time savings are an additional gain. Practical results of above mentioned improvements obtained on industrial TCO processes will be presented.

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ABSTRACTEntry


Monday, April 19

3:30 p.m.

E

5

Applications of Fast-

R. Sargent, M. Tilsch, G. Ockenfuss, K. Hendrix, and

A fast-cycle sputter coating

Monday, April 19

3:30 p.m. E 5 Applications

Monday, April 19

3:30 p.m. E-5 Applications of Fast-Cycle Sputtering Processes: Optical Coatings and Beyond

R. Sargent, M. Tilsch, G. Ockenfuss, K. Hendrix, and M. Grigonis, JDSU, Santa Clara, CA


A fast-cycle sputter coating platform has been implemented and used in a production environment for several years.The system is used to fabricate optical interference coatings to enable components for biomedical instrumentation, display devices, aerospace systems, and other applications. The coater has proven to be a robust tool and is advantageous in many situations as compared to older precision coating processes such as ion-assisted deposition andion beam sputtering. The fast-cycle sputter coater is based on magnetron sputtering, with a geometric arrangement that optimizes the uniformity and deposition rate. The system hardware incorporates a load lock which increases efficiency and lowers defect densities. Recently, the capability of the process has been expanded in several directions.First, the range of wavelengths that may be addressed by the coater has been expanded beyond the visible and near infrared regions to include optical coatings covering a range from below 240 nm to above 6000 nm. A new direction is the use of the process for “non-optical” applications. Several examples will be discussed, including the depositionof conductive metallic films which require precise uniformity and thickness control as well as low defect levels.


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ABSTRACTEntry

Monday, April 19

4:10 p.m.

E

6

Vacuum Deposited

P. Peumans, Stanford University, Stanford, CA

Vacuum deposited films

Monday, April 19

4:10 p.m. E 6 Vacuum

Monday, April 19

4:10 p.m. E-6 Vacuum Deposited Organic Thin Film Solar Cells

P. Peumans, Stanford University, Stanford, CA


Vacuum deposited films of small molecular weight organic compounds can be engineered to convert sunlight into electrical power with power conversion efficiencies exceeding 5%. Recent progress in achieving increased efficiencies and will discuss optimal device designs will be discussed.


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Monday, April 19

4:50 p.m.

E

7

Atomic Layer

M.-L. Kääriäinen, T.O. Kääriäinen, and D.C.

Atomic layer deposition

Monday, April 19

4:50 p.m. E 7 Atomic Layer

Monday, April 19

4:50 p.m. E-7 Atomic Layer Deposition for Creating Nanostructures and Nanolaminates

M.-L. Kääriäinen, T.O. Kääriäinen, and D.C. Cameron, Lappeenranta University of Technology, ASTRaL, Mikkeli, Finalnd

Atomic layer deposition (ALD) has proven to be a unique method in creating nanostructures in thin films with high uniformity and conformality. ALD enables growth of a film material with only one molecular layer thickness. Furthermore, ALD allows using variable molecular layers to form a molecular laminate thin film. This technique canbe used, for instance, for doping a material or to create a functional surface for a bulk material. In this work, titaniumdioxide has been doped with nitrogen by using this method. The thicknesses of the films are up to 15 nm. The dopinghas shown to improve the photoactivity and the photocatalytic activity of titanium dioxide. The band gap estimation shows a blue shift which is most probably due to quantum effect since the films are nanostructures. This type of titanium dioxide structures has shown to possess a high ability to decompose organic compounds in water solutions. Additionally, glass and stainless steel surfaces have been modified to be more hydrophilic by depositing a few nanometers thick film of titanium dioxide. ALD has shown its potential in effective surface modification method.

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ABSTRACTEntry

Monday, April 19

5:10 p.m.

E

8

Industrial Ion

V.V. Zhurin, Colorado Advanced Technology LLC,

Industrial broad-beam Hall-

Monday, April 19

5:10 p.m. E 8 Industrial Ion

Monday, April 19

5:10 p.m. E-8 Industrial Ion Sources - New Designs, Problems and Perspectives

V.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO


Industrial broad-beam Hall-current gridless ion sources are reviewed. A modern state of established varieties of ion sources utilized for different tasks in the development of thin films and other applications in science and technology isdiscussed. Closed drift with magnetic and anode layers, and end-Hall varieties of ion sources are compared. Certain improvements and future features in design and operation of ion sources are suggested. Special attention is applied tonew generation of end-Hall ion sources with specific areas of applications for monochromatic ion energy distribution,high ion beam current, operation of ion sources without significant oscillations and instabilities of major operational parameters. Modern gridless Hall-current ion sources are substantially simpler, cheaper and rigid than old generationgridded sources. Gridless ion sources deliver practically any features necessary for industrial thin film technology: high energy and close to monochromatic ion beam energy. Various improvements in design and operation of gridlession sources make various transformations possible with the ion beam shape and energy; ion beams can be focused with the current in tens of Amperes at very small areas and defocused and distributed over large areas with controlledion beam exposure to those areas.


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ABSTRACTEntry

Symposium on Cleantech Energy – Large Area Coating

Monday, April 19

1:30 p.m.

LC

1

Transparent

P. Greene, Applied Materials, Glass Coating

Transparent conductive

Monday, April 19

1:30 p.m. LC 1 Transparent

Monday, April 19

1:30 p.m. LC-1 Transparent Conductive Sputtered Zinc Oxide for Si Thin Film Solar Cell Applications

P. Greene, Applied Materials, Glass Coating Technology Group, Fairfield, CA; V. Komin and M. Le, Applied Materials, Solar Technology Group, Santa Clara, CA; and J. Papanu, Applied Materials, Glass Coating Technology Group, Fairfield, CA


Transparent conductive oxide (TCO) films are used for the front contact in thin film solar cells. The TCO must provide high optical transparency, low electrical resistivity, and be readily textured or “hazed” to enhance light scattering for high cell efficiencies. Zinc oxide TCO is well-suited to meet these requirements. We have developed a large area TCO coating process utilizing ambient temperature sputtering of aluminum-doped zinc oxide (AZO) ceramic targets. As part of the in-line process, a silicon based dielectric barrier layer is deposited onto standard or low-iron float glass followed by deposition of the AZO. Post-deposition processing consists of a thermal treatment to increase transmission and reduce resistivity, and wet etching with dilute acid mixtures for surface texturing. In this paper, the effects of deposition parameters and post-deposition processes on the electrical, optical, and morphologicalproperties of the AZO will be presented. The deposition parameter trend data will include the influences of pressure, gas composition, power, power type (AC versus DC), and deposition thickness. Scale-up challenges will also be discussed. Finally, photovoltaic performance data in terms of tandem junction cell efficiency, which is the critical measure of TCO effectiveness, will be shown.


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ABSTRACTEntry

Monday, April 19

2:10 p.m.

LC

2

High Performan

K. Omi, Tosoh, Kanagawa,Japan; and E. Ivanov and

Rotary TCO targets such as

Monday, April 19

2:10 p.m. LC 2 High

Monday, April 19

2:10 p.m. LC-2 High Performance ITO Rotary Target Assembly

K. Omi, Tosoh, Kanagawa, Japan; and E. Ivanov and E.W. Theado, Tosoh SMD, Columbus, OH

Rotary TCO targets such as ITO and AZO are widely requested in coating and PV field because of increased productivity, higher material utilization and improved process stability. As TCO materials are intrinsically brittle, cracking may happen due to the thermal stress during sputtering. In order to prevent cracking, Tosoh developed rotaryITO and AZO with such unique properties as density greater than 99% theoretical, uniform microstructure, improvedmechanical properties and innovative bonding technology. These features allow the application of higher input powerduring sputtering (up to 20 W/cm2) which results in higher productivity and throughput. In this paper, FEA analysis and experimental sputtering data will be compared for rotary assemblies with titanium and steel backing plates.

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ABSTRACTEntry


Monday, April 19

2:30 p.m.

LC

3

AluminumDoped

P. Lippens, UMICORE ThinFilm Products, Olen,

Aluminum doped zinc

Monday, April 19

2:30 p.m. LC 3 Aluminum

Monday, April 19

2:30 p.m. LC-3 Aluminum Doped Zinc Oxide Coatings Sputtered on Large Area with Rotatable AZO Targets:New Insights to Improve Productivity and Coating Quality

P. Lippens, UMICORE Thin Film Products, Olen, Begium; and K. Leitner, N. Margadant, M. Kaitz, A. Broenstrup, and S. Sutter, UMICORE Thin Film Products, Balzers, Principality of Liechtenstein

Aluminum doped zinc oxide (Al:ZnO or AZO) coatings are transparent conductive oxides (TCO) which are today mainly used in two different application areas: architectural glass (mainly low-e glass) and photovoltaics. Within photovoltaics, there are three different applications: front contact in CIGS-cells, front contact in thin film Si cells andback reflector in such thin film Si cells. In each of the indicated applications, different coating specifications in termsof optical transparency (both in the visible and the infrared), electrical conductivity, surface texture, etc., are required.Of course, the choice of the chemical composition of the AZO target is made in line with the required thin film properties, but the sputter process itself needs to be tuned in order to achieve those characteristics. The most importantprocessing parameters are substrate temperature, sputter gas composition and the kind of electrical energy with whichthe plasma is sustained (DC, pulsed DC or AC). The AZO coating micro-structure and density and by consequence itselectro-optical properties, are also strongly influenced by the deposition rate of the coating. Of course, for economicalreasons, high dynamic deposition rates are favoured, but in some cases they are limited by the application. The economics of the coating process on the other hand are not only enhanced by the deposition rate but depend also on other parameters such as target thickness, stability of the sputter process throughout the target life, etc. This presentation will cover an overview of sputter process experience with AZO sintered ceramic targets.

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ABSTRACTEntry

Monday, April 19

2:50 p.m.

LC

4

Low CostLarge

S. Sneck, P. Soininen, N. Isomäki, and R. Törnqvist,

There is an increasing need

Monday, April 19

2:50 p.m. LC 4 Low Cost

Monday, April 19

2:50 p.m. LC-4 Low Cost Large Area Moisture Barriers by Atomic Layer Deposition

S. Sneck, P. Soininen, N. Isomäki, and R. Törnqvist, Beneq, Vantaa, Finland

There is an increasing need for high performance moisture barriers, particularly in OLED and PV industries, where devices require better and more cost efficient barrier solutions. Atomic Layer Deposition (ALD) has been studied as amethod to deposit thin pin-hole free barriers and ALD has showed excellent barrier performance both in Ca-tests andon OLED structures. Recently the same excellent barrier performance has been reached with production-scale ALD equipment (batch size up to 10m2) and very low cost precursor materials. Important work has also been done on roll-to-roll ALD development and now continuous ALD research systems are already commercially available. These major advances suggest that ALD is going to be the solution for many applications requiring high performance barriers. This paper summarizes the barrier results we have obtained so far, WVTR of: 0.8 ± 2.6 x 10-4 g/m²day (80°C,80% RH), which corresponds to < 10-6 g/m²day at room temperature. These results are from Ca-test, where ALD is deposited directly on Ca. Production-related aspects, such as cost and throughput will be discussed in detail.

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ABSTRACTEntry


Monday, April 19

3:30 p.m.

LC

5

Influenceof Process

V. Sittinger, W. Dewald, W.Werner, and B. Szyszka,

With the demand of a low

Monday, April 19

3:30 p.m. LC 5 Influence of

Monday, April 19

3:30 p.m. LC-5 Influence of Process Parameter and Magnetic Field Strength on DC Magnetron Sputtered ZnO:Al Films from Ceramic Targets

V. Sittinger, W. Dewald, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

With the demand of a low cost and high quality TCO layer in thin film solar cell applications, the need for a production process of ZnO:Al films suited for large area coatings in industry became apparent. Throughout the last years, strong efforts have been made to use Al-doped ZnO films on glass as substrates for amorphous or amorphous/microcrystalline silicon solar cells. The material promises better performance at low cost especially because ZnO:Al can be roughened in order to enhance the light scattering into the cell. With the rise of production capacities, the first sputtering coaters for large area deposition of ZnO:Al are now being set up. Cost efficient, sinteredceramic ZnO:Al2O3 targets with high conductivity can nowadays be sputtered by using DC power. Ceramic ZnO:1 wt.% Al2O3 targets were DC sputtered using a screening experiment design, which covers a wide interval of the main process parameters total pressure (ptot= 200-1000 mPa), sputtering power (P = 4-8 kW), and oxygen partial pressure (q(O2) = 0 - 0.3%), while substrate temperature was held constant at 300°C. In this experiment, a big influence on the target erosion was shown. During sputtering from a ceramic target, the film is damaged perpendicular to the erosion area by high energetic oxygen ion bombardment. The ions receive their energy from the potential difference betweencathode and floating substrate. Their impact leads to a higher resistivity, lower mobility and a higher etching rate of the deposited layer in diluted hydrochloric acid. This counteracts the necessary properties of a TCO as front contact ina-Si/µc-Si solar cells. In order to understand and minimize these problems, static imprints with a standard and a strongmagnet were performed additionally. A new plane ZnO:Al2O3 (1 wt.%) target was used and finally the static imprint of the standard magnet was repeated to ensure that there is no influence of the race track depth on the sputter processes. Photometric and four-point measurements of the deposited films were done. Thickness, resistivity, mobility, crystal structure, and etching behavior were determined by profilometer, Hall, XRD and SEM measurements. Comparing these imprints, their height profiles remained similar but a huge impact on resistivity was observed depending on the target state, namely the race track depth. Options to diminish the damaging effect of oxygen were examined, in particular the use of stronger magnets for magnetron sputtering to reduce the applied targetvoltage. The observed film damage increases with higher target voltage, therefore both are reduced by applying a higher magnetic field. The results show a clear reduction of target voltage by 40V at the same applied power and alsoa loss of damage opposite of the race tracks. Resistivity is lowered by a factor of 1.5 which yields better properties ofZnO:Al as front contact of thin film solar cells. Also the crystal structure and etching behavior changed positively. The new approach of using stronger magnets during sputtering can be applied at planar targets and even more important at rotatable targets. Even though a maximum magnetic field strength exists, where a plasma is still burning,the cathode voltage is reduced significantly, which yields a better quality of the deposited layers.

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Monday, April 19

3:50 p.m.

LC

6

IndustrialSputtering

V. Bellido-Gonzalez, M. Holik, M. Audronis, B.

Transparent Conductive

Monday, April 19

3:50 p.m. LC 6 Industrial

Monday, April 19

3:50 p.m. LC-6 Industrial Sputtering - Improvements in Productivity and Control for Transparent ConductiveOxides

V. Bellido-Gonzalez, M. Holik, M. Audronis, B. Daniel, and D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom;and S. Williams, Gencoa Ltd., San Francisco, CA

Transparent Conductive Oxides (TCOs) are one of the most important technological coating families deposited by the vacuum industry. Although the deposition of this type of coatings is not exclusive to the vacuum coating industry (e.g.,SnO2:F by CVD, TCO printing, plasma spray, sol-gel, etc.), the vacuum industry has been able to offer competitive advantages mainly in terms of performance. Typically processing in a vacuum environment, the type of source materialand particular technology used for the deposition add costs to the product. Product quality, consistency, deposition areaand throughput add to the cost equation. The production costs are in a constant need of reviewing. In an economical environment where capital investment is very limited the extension of deposition to larger area is not easy without a large investment. At the present time the most economical way to keep any TCO industry in the market place would require process, technology and business to move in two directions: (i) rapidly finding new markets to which competing techniques would find difficult to tap into and (ii) increase of throughput by deposition process review, generally involving low cost capital investment and/or new process management and control techniques. Following successful implementations of the latter approach, the authors would like to present results of improvements in throughput in the TCO deposition industry, especially in large area deposition of TCOs. Although the focus of activityhas been around reactive magnetron sputtering, similar principles could be extended to other deposition techniques. In this paper the results used for the improvement implementation combine elements of simulation-modeling, developments in magnetron sputtering sources, process understanding, selection of adequate sensors and feedback control. The ability to have an understanding of all those aspects have made possible significant process improvement such as a three fold increase in the throughput of an industrial TCO glass line.

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Joint Session on Atmospheric Plasma Technologies

Monday, April 19

1:30 p.m.

JAPT

1

Study of aPECVD

N. Gherardi, Université de Toulouse, Toulouse,

The development of

Monday, April 19

1:30 p.m. JAPT 1 Study of a

Monday, April 19

1:30 p.m. JAPT-1 Study of a PECVD Process Using Homogeneous Dielectric Barrier Discharges at AtmosphericPressure

N. Gherardi, Université de Toulouse, Toulouse, France


The development of a PECVD process working at atmospheric pressure and allowing an easy on-line treatment is a challenge of great interest. In the case of two dimensional materials such as roll of thin polymer films, metal foils or glass plates, the dielectric barrier discharge (DBD) appears like one of the more suitable discharge conditions. This is because the DBD is cold, robust and not disturbed by the movement of the substrate. However, previous to a process development, there are several questions to be solved such as: How to get a well controlled thin film in terms of chemical composition, structure and thickness? And how to get a high growth rate? It is now well-known that depending on the gas, electrical parameters, and electrode configuration, the dielectric barrier discharges can operate inthe classical filamentary mode or in diffuse mode. The diffuse mode is more adapted for the making of homogeneous coatings. Depending on the main gas in which the discharge is ignited (the reactive gas used for the coating formation being diluted in this main gas which rules the discharge physics), the diffuse DBDs operates in a glow mode (in noble gases), or in a Townsend mode (in nitrogen or in air). It will be shown that such homogeneous discharges allow gettinguniform coatings, with well controlled properties. The question of the reactive transport will also be discussed, as it is acritical point at atmospheric pressure, in particular due to the fact that the diffusion is very low.


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Monday, April 19

2:10 p.m.

JAPT

2

Characterization of a

R. Gesche, S. Kühn, and H.-E. Porteanu, Ferdinand-

A new design ofan integrated

Monday, April 19

2:10 p.m. JAPT 2 Characterizati

Monday, April 19

2:10 p.m. JAPT-2 Characterization of a Microwave Microplasma Source Using an Auxiliary Electrode

R. Gesche, S. Kühn, and H.-E. Porteanu, Ferdinand-Braun-Institut, Berlin, Germany; and J. Scherer and R. Kovacs, Aurion Anlagentechnik GmbH, Seligenstadt, Germany

A new design of an integrated microwave driven microplasma source is presented. The source works at a microwave frequency of 2.45 GHz, which is delivered by an integrated free-running power oscillator. Active element is a GaN HEMT developed at the Ferdinand-Braun-Institute. The frequency is stabilized by an electrode structure, which is builtas a microwave resonator, which acts at the same time as an impedance transformer, matching the plasma load to the HEMT impedance. An auxiliary electrode is placed in the afterglow zone of the source. The I-V curve of this electroderelative to source ground is measured using a Keithley source-measure unit. The strongly nonlinear behaviour of this characteristic is discussed. This measurement, which is cost efficient and easy to use, allows a characterisation of the plasma source performance. Possible applications are presented.

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Monday, April 19

2:30 p.m.

JAPT

3

Development of

M. Kogoma, Sophia University, Tokyo, Japan;

The laminated polymer films

Monday, April 19

2:30 p.m. JAPT 3 Development

Monday, April 19

2:30 p.m. JAPT-3 Development of Adhesive-Free Lamination Technique Using a Plasma Surface Treatment atAtmospheric Pressure

M. Kogoma, Sophia University, Tokyo, Japan; A. Manabe, Fujimori Kogyo Co. Ltd., Yokohama, Japan; and K. Tanaka, Sophia University, Tokyo, Japan


The laminated polymer films are widely used for the packaging materials of foods, cosmetics and so on. These laminated films are generally two or more kinds of polymer films pasted together with an organic adhesive diluted by the toxic organic solvent. Thus, a new adhesive-free lamination technique is desired. In this study, we tried to develop an adhesive-free lamination technique using the atmospheric pressure glow (APG) plasma surface treatment and the thermo-compression of the treated super posed films. The popular lamination materials, PET/PE, NY/PE were treated by N2 /He or He APG plasma reactor. The reactor can treat the film surfaces faster than 10 ms/cm. The adhesive strength of the laminated film was measured with a 180 degree peel tester. In the results, the maximum adhesive strength of both materials were attained much higher value (>500 N/m) than that of the required in the industry. XPS spectra in the valence band region of the treated LDPE surfaces show some decreasing of the main peak obtained around 15 eV that should be related to C-C bonds of the PE structure. We supposed that some low molecular weight PEwere produced on the film surface and that they acted as an adhesive for the heat-press lamination. Verbose invited Invited 40

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ABSTRACTEntry

Monday, April 19

3:30 p.m.

JAPT

4

Surface Treatment

L. Bárdos and H. Baránková, Ångström

Wind turbine blade surface

Monday, April 19

3:30 p.m. JAPT 4 Surface

Monday, April 19

3:30 p.m. JAPT-4 Surface Treatment of Energy System Components by Cold Atmospheric Plasma

L. Bárdos and H. Baránková, Ångström Laboratory, Uppsala University, Uppsala, Sweden

Wind turbine blade surface and steel plates used for ocean buoys driving linear wave energy converters have been treated by the Fused Hollow Cathode (FHC) and Hybrid Hollow Electrode Activated Discharge (H-HEAD) atmospheric plasma sources. Processes to reach permanent hydrophobicity of the epoxy composite blade surface and low sticking probability of the ice have been tested. Plasma treatment of the construction steel sheets used for fabrication of ocean buoys has been tested to increase the surface energy for better adhesion of the lacquer and, consequently, for an increased anticorrosion protection for a lifetime in a harsh ocean environment. Argon, neon, nitrogen and air mixtures have been used for the plasma treatments and the resulting surface energy has been examinedby contact angle measurements. Results of tests under different plasma parameters are presented and discussed.

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Monday, April 19

3:50 p.m.

JAPT

6

Functionalization of

C. Côté, C. Robado, and A.Sarkissian, Plasmionique,

Important research efforts

Monday, April 19

3:50 p.m. JAPT 6 Functionalizati

Monday, April 19

3:50 p.m. JAPT-6 Functionalization of Wood Surfaces in the Afterglow of an Atmospheric Pressure Dielectric Barrier Discharge

C. Côté, C. Robado, and A. Sarkissian, Plasmionique, Inc., Varennes, Canada; V. Blanchard, R. Stirling, M. Gignac, and P. Blanchet, FPInnovations-Division Forintek, Québec City, Canada; J. Prégent and L. Stafford, Département de Physique, Université de Montréal, Montréal, Canada; C. Anghel and B. Riedl, Centre de Recherche sur le Bois, Université Laval, Québec City, Canada

Important research efforts have been recently devoted to the development of cold plasma sources operating at or near atmospheric pressure. These sources are particularly useful for the treatment of heat-sensitive materials such as polymers. Plasmionique has recently developed an atmospheric pressure dielectric barrier discharge source (Flarion-Atmos-1200) for the functionalization of wood surfaces. We examined the influence of a plasma treatment in N2/O2 mixtures on the wettability of sugar maple (acer saccharum). After less than 1s exposure to the discharge afterglow, thesurface became highly hydrophobic, with average contact angles >100 degrees. For the same experimental conditions, significant enhancement in fungal resistance of white pine (pinus strobus) was also observed. In both type of experiments, the maximum surface modification was obtained at intermediate O2 concentrations in N2/O2. Optical emission spectroscopy (OES) was used to understand the change in plasma properties leading to these observations. Bycombining OES results with XPS and FTIR analysis, it is found that a combination of (i) structural modification induced by UV radiation (in particular NO) and N2 metastable particles impingement and (ii) chemical reorganization due to surface oxidation are responsible for the change in wood properties.

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Vacuum Web Coating

Monday, April 19

1:30 p.m.

W

8

Transparent High

H. Tamagaki, T. Okimoto, and T. Segawa, Kobe Steel,

A new roll-to-rollPlasma

Monday, April 19

1:30 p.m. W 8 Transparent

Monday, April 19

1:30 p.m. W-8 Transparent High Barrier Coating on Polymer Web by PE-CVD Roll Coater

H. Tamagaki, T. Okimoto, and T. Segawa, Kobe Steel, Ltd., Takasago, Japan

A new roll-to-roll Plasma Enhanced Chemical Vapor Deposition (PE-CVD) System was developed for the deposition of SiOx transparent high barrier coating on polymer substrate. The system generates plasma between a pair of rollers connected to bipolar MF-AC power supply. Since the surface of the rollers was covered with the film substrate to be coated, the system does not have powered electrodes to be contaminated with the coating, and this results in stable process during a long deposition process for a web. By using HMDSO/O2 mixture as process gases, the system was able to deposit SiOx coating at a deposition rate up to 900 nm-m/min. As usual for PE-CVD, the resulting film was flexible and relatively thick coating up to 2000 nm was able to be deposited on PEN and PET substrate without any cracks or delimitations. The water vapor transmission rate (WVTR) below 5x10-4 g/m2day was demonstrated at 1000 nm SiOx single layer coating on PEN film.

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Monday, April 19

1:50 p.m.

W

9

Optimization of

E. Dickey and W.A. Barrow,Lotus Applied Technology,

Thin clear oxidefilms deposited

Monday, April 19

1:50 p.m. W 9 Optimization

Monday, April 19

1:50 p.m. W-9 Optimization of Cycle Elements for Increased Throughput in Roll-to-Roll Atomic Layer Deposition

E. Dickey and W.A. Barrow, Lotus Applied Technology, LLC, Hillsboro, OR

Thin clear oxide films deposited by Atomic Layer Deposition (ALD) have been shown to have excellent properties as gas diffusion barriers. New techniques for continuous ALD, incorporating substrate translation as the mechanism for alternating precursor exposure and purge have also recently been reported, and show promise toward achieving high speed coating of flexible substrates. This method of ALD processing provides unique opportunities for optimization, asconditions for each element of an ALD cycle, including precursor exposures and purges, may be physically separated and independently optimized in a steady state. In this paper, we investigate the critical elements of the cycle necessary for achieving high quality aluminum oxide barrier layers made using substrate translation based ALD, with particular attention given to the oxygen precursor exposure and purge steps of the cycle. For low temperature processes using water vapor, deposition speed is limited by the time required to purge the water. Novel techniques to increase the speed of water desorption during the purge process are characterized, as are alternatives to water, including ozone and steady state plasmas as the oxygen source. Resulting improvements in growth rate and web speed are presented, alongwith WVTR data for the various approaches.

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Vacuum Web Coating

Monday, April 19

2:10 p.m.

W

10

Production Proven

R. Ludwig, H.-G. Lotz, andG. Hoffmann, Applied

The market for transparent

Monday, April 19

2:10 p.m. W 10 Production

Monday, April 19

2:10 p.m. W-10 Production Proven Vacuum Web Coating System for Robust and Environmentally-Friendly Transparent Barriers

R. Ludwig, H.-G. Lotz, and G. Hoffmann, Applied Materials GmbH & Co., Alzenau, Germany

The market for transparent flexible barrier films is larger than that for metallised films. However, this market is dominated by polymeric barrier layers, which are normally within the micrometer thickness range. Higher barrier efficiency alternative materials can also be produced by a variety of different vacuum coating techniques. One such alternative material, namely aluminium oxide (AlOx), can be deposited within the tens of nanometres thickness range with a barrier level superior to that obtained from micrometer thickness traditional polymeric barrier layers. The movetowards oxide based transparent flexible barrier films is therefore not only cost effective but environmentally friendly as no chemistry, as for example chlorine, is involved in the production. One further environmental advantage relates tothe ease of recycling of oxide based packaging when compared with more traditional polymeric barriers. The choice ofbarrier material must also be compatible both with the substrate material and the subsequent downstream converting processes. These requirements can be fulfilled through the use of an AlOx coating produced by a plasma assisted reactive evaporation process. The work presented here discusses the development of the next generation of web coatersdesigned for the high rate production of dense, high barrier AlOx layers using an innovative plasma source technology in combination with standard aluminium boat evaporation. The production scale process suitability is demonstrated through the provision of transparent barrier coatings with outstanding robustness, barrier performance and optical clarity on BOPP, PET and PLA substrates.

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Monday, April 19

2:30 p.m.

W

17

AdvancedCoating

W. Decker, VAST FILMS, Ltd., Darlington, PA

Roll- to-Roll (R2R)

Monday, April 19

2:30 p.m. W 17 Advanced

Monday, April 19

2:30 p.m. W-17 Advanced Coating Technologies for Roll-to-Roll Metallizers

W. Decker, VAST FILMS, Ltd., Darlington, PA

Roll- to-Roll (R2R) metallization with aluminum is by now the most widespread application in terms of installed coating capacity as well as actually coated surface area. In many of the applications where aluminum metallization is used, the material is further converted in downstream processes such as coating, laminating and or de-metalization. This presentation will show how some of the up- and down-stream processes can be integrated into the metallization process, thus streamlining the production process for a wide range of webs used in packaging, electronics and other technical applications.

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Vacuum Web Coating

Monday, April 19

2:50 p.m.

W

12

ALD Barrier

W.A. Barrow and E.R. Dickey, Lotus Applied

Interest has recently arisen

Monday, April 19

2:50 p.m. W 12 ALD Barrier

Monday, April 19

2:50 p.m. W-12 ALD Barrier Layer Materials and Configuration and their Effects on Water Vapor Transmission Performance

W.A. Barrow and E.R. Dickey, Lotus Applied Technology, Hillsboro, OR

Interest has recently arisen in transparent barrier layers on plastic web deposited by Atomic Layer Deposition (ALD). ALD naturally deposits symmetrical barrier films on both sides of the substrate, unless measures are taken to limit deposition to one side. There has also been some indication that ALD Al2O3 barrier layers may degrade in the presenceof very high humidity and temperature. It is important to understand if Water Vapor Transmission Rate (WVTR) data for ALD barrier layers is dominated by lag time and if barrier layer degradation plays a significant role. WVTR data forsingle-sided and double sided barrier films comprised of Al2O3, TiO2 and combinations of these materials deposited onplastic web in a conventional ALD reactor are presented. To discern the effects of possible barrier layer degradation inhigh humidity, results for barrier films coated with polymer layers to control humidity exposure after ALD deposition are also presented. Effects of barrier layer material and configuration are summarized and discussed in the context of steady state permeation theory. The resulting implications for high performance, long lasting ALD barrier layers are also discussed.

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Monday, April 19

3:30 p.m.

W

13

Reactive Sputter

S. Louch, Centre for Process Innovation,

This presentation will

Monday, April 19

3:30 p.m. W 13 Reactive

Monday, April 19

3:30 p.m. W-13 Reactive Sputter Deposition Using a Dual Cylindrical Magnetron in a Roll-to-Roll Coater

S. Louch, Centre for Process Innovation, Redcar, United Kingdom

This presentation will look at aspects of four different reactive sputter-deposition web-coating processes: AlOx; TiOx; SiOx; AZO. The substrate material is PET. The processes are carried out using an AC powered dual magnetron with cylindrical rotating targets. Issues and parameters unique to this type of magnetron will be considered and benefits of the technology highlighted. Of particular importance, is the uniformity of the coating, both across and along the web. Parameters affecting these uniformity profiles, such as gas distribution, magnetron design and process control, are considered. Characterisation of the coatings using a variety of different measurement techniques will be described, anddata presented.

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Vacuum Web Coating

Monday, April 19

3:50 p.m.

W

14

Recent Developm

R. Nyderle, M. Fahland, R.Blüthner, J. Fahlteich, and

Magnetron PECVD is a new

Monday, April 19

3:50 p.m. W 14 Recent

Monday, April 19

3:50 p.m. W-14 Recent Developments with Magnetron PECVD for Industrial Applications

R. Nyderle, M. Fahland, R. Blüthner, J. Fahlteich, and S. Bunk, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

Magnetron PECVD is a new technology for the deposition of SiOx-layers. The process tool achieves dynamic deposition rates exceeding 300 nm·m/min at process pressures below 10 Pa. These features enable the combination ofmagnetron PECVD with either sputtering or evaporation in continuous inline processes. In this paper, recent advances regarding long-term stability will be presented. HMDSO precursor gas is used for a magnetron PECVD process in a roll coater of 600 mm deposition width. The down-web stability was investigated. This included both the plasma parameters and the coating properties on PET film. The layers were investigated by UV-VIS and IR spectroscopy. Special importance was attached to different target setups and plasma power supply optimization. The stability of the process under industrial conditions has been optimized. Depending on the process conditions the optical and mechanical properties can be tuned. The real part of the refractive index could be adapted between 1.48 and 1.54. TheYoung modulus varied between 8 and 20 GPa. Based on these results magnetron PECVD has been used to produce optical layer stacks, multilayer barriers and chemical protective layers.

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Monday, April 19

4:10 p.m.

W

15

Validationof the

A. Jones and J. McShane,Avery Dennison, Optical Density,

defined as the

Monday, April 19

4:10 p.m. W 15 Validation of

Monday, April 19

4:10 p.m. W-15 Validation of the Regression Analysis for Optical Density and Integration of Eddy Current System

A. Jones and J. McShane, Avery Dennison, Shererville, IN

Optical Density, defined as the absorbance of light, is an integral property for the production of Avery Dennison’s Metalure product line. The product construction creates too high of an OD product that cannot be read on any optical system. Previously, we discussed a regression analysis using process data to infer OD. Recently, an upgrade in measurement was made to the machine (eddy current system) to deliver higher OD readings in situ. Previously, a regression analysis using process data was used to predict the wire feed to deliver a specific optical density within ±2 cm/min. This time, true optical density and eddy current data were taken along with the regression analysis. This paper will validate the regression analysis and compare it to the eddy current system. Successful use of both systems will result in a double check for enhancing product consistency and quality.

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Vacuum Web Coating

Monday, April 19

4:30 p.m.

W

16

Magneto-Optical

K. Schmidegg and V. Rinnerbauer, Hueck Folien

We have deposited

Monday, April 19

4:30 p.m. W 16 Magneto-

Monday, April 19

4:30 p.m. W-16 Magneto-Optical Studies of Magnetic Clusters and Thin Films on PET Substrates

K. Schmidegg and V. Rinnerbauer, Hueck Folien Ges.mbH, Baumgartenberg, Austria; L.D. Sun, M. Hohage, and P. Zeppenfeld, University of Linz, Linz, Austria

We have deposited magnetic clusters and thin film of Ni and Co by magnetron sputtering and by electron beam evaporation in an industrial pilot web coating line on PET substrates. Morphological and magnetic properties were studied as a function of the deposition parameters, film thickness and purity using reflectance difference spectroscopy (RDS), which is an optical probe not only sensitive to optical anisotropy, but also to the polar magneto-optical Kerr effect (MOKE). The advantage of this RD-MOKE method as compared to a standard MOKE setup is that informationon the film morphology as well as on its magnetic properties can be obtained in the same measurement. From the so obtained Kerr spectra the Voigt function of the films was extracted, which is in good agreement with Voigt functions derived for Ni single crystals and thin Ni films on Cu. The magnetic data obtained by additional Hall and SQUID measurements were found to be consistent with the magneto-optical measurements and thus confirm that this method can be used for measuring the magnetic properties of ultra-thin films and even clusters. Furthermore it can also be usedas an in-line monitoring tool to study the deposition process itself.

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Monday, April 19

4:50 p.m.

W

25

Vacuum Feedthrou

S. Visintin and E. Golfetto,Genefinity S.R.L., Trieste,

An air-to-air feedthrough for

Monday, April 19

4:50 p.m. W 25 Vacuum

Monday, April 19

4:50 p.m. W-25 Vacuum Feedthrough for Roll-to-Roll Deposition

S. Visintin and E. Golfetto, Genefinity S.R.L., Trieste, Italy

An air-to-air feedthrough for vacuum coating of films is presented. The feedthrough has been specifically designed towork in roll-to-roll systems. Standard roll-to-roll vacuum plants are designed with film rolls inside the chamber, thus forcing to break the vacuum in order to replace them. Our feedthrough lets the film move from air to vacuum and thenagain into air without braking vacuum so that rolls can be kept outside the chamber. At the same time the design is simple and only requires a little differential pumping with no need for a dedicated pumping station. Tests performed inour laboratories show that the feedthrough is consistent with high vacuum level and low contamination from atmosphere gases. Tests have been carried on both with evaporation and sputtering sources and there is no evidence ofcoating contamination or defects attributed to feedthrough use. Finally, little increase in pumping speed and in overall electrical power consumption is needed with respect to standard sealed vacuum chamber. The novel feedthrough is alsoconsistent with high film transit velocity, thus having the potential to drastically increase production rate of roll-to-rollsystems.

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Monday Evening

April 19, 2010

Heuréka! Post Deadline Recent Developments

Monday, April 19

6:00 p.m.

H

1

HIPIMS-MPP-

S.L. Lee, F. Yee, M. Cipollo,S. Smith, and C. Rickard, U.

High Contraction

Monday, April 19

6:00 p.m. H 1 HIPIMS-MPP-

Monday, April 19

6:00 p.m. H-1 HIPIMS-MPP-PEMS Deposition of Cr, Ta, CrN Coatings on Steel

S.L. Lee, F. Yee, M. Cipollo, S. Smith, and C. Rickard, U.S. Army ARDEC-Benét Laboratories, Watervliet, NY; R. Wei, E. Langa, and K. Coulter, Southwest Research Institute, San Antonio, TX; and J.L. Lin, B. Sproul, and J.J. Moore,Colorado School of Mines, Golden, CO

High Contraction Chrome (HC Cr) coatings have been used for decades to extend service life of engineering components. They are deposited on the external surfaces of components to prevent wear and corrosion. They are also deposited on the interior surfaces of cylinders to prevent high temperature wear and erosion. In this work, physical vapor deposition processes, including High Power Impulse Magnetron Sputtering (HIPIMS) and Modulated Pulsed Power (MPP) using ionized physical vapor deposition (I-PVD) technology, conventional DC and Plasma Enhanced Magnetron Sputtering (PEMS) technology using external ion source to increase plasma intensity, are being tested for potential chrome electroplating process replacement. Chromium and tantalum coatings are being studied for high temperature wear and erosion, and chrome nitride coatings are being studied for low-to-medium temperature wear andcorrosion applications. Chromium and tantalum coatings were deposited on A723 steel samples using biased DC, HIPIMS, MPP, and PEMS generated plasma and analytical tests were performed. Thick Tantalum coatings, 100 to 250 micron thick, were successfully deposited on the interior surfaces of cylindrical structure using biased DC and MPP processes. On the other hand, thick chrome nitride coatings, 10-55 microns, were deposited on steel samples using biased DC, PEMS, and MPP process using an unbalanced magnetron sputter system. The HIPIMS-MPP-PEMSdeposition processes and coatings characteristics will be discussed. This presentation presents the latest results on theCr, Ta and CrN coatings using various deposition techniques.

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Monday, April 19

6:20 p.m.

H

2

Nanomechanical

R. Nair, CSM Instruments,Needham, MA; and G.

Diamond Like Carbon (DLC)

Monday, April 19

6:20 p.m. H 2 Nanomechani

Monday, April 19

6:20 p.m. H-2 Nanomechanical Characterization of Ultra-Thin DLC Coatings by Nanoindentation and Nano Scratch Testing

R. Nair, CSM Instruments, Needham, MA; and G. Favaro, CSM Instruments SA, Peseux, Switzerland

Diamond Like Carbon (DLC) thin films are being developed for use in a wide range of applications (biomedical, semiconductor, etc). In order to simulate (and if possible extend) the service life of a particular coating system and to improve efficiency, it is important to characterize the true coating material properties. This can be particularly difficultfor thin films whose thickness is often less than 50 nm (common in the magnetic hard disk industry, for example). Thispaper will focus on the particular challenges which are encountered when attempting to measure a wide range of properties, including hardness, elastic modulus, coating adhesion, strain-hardening exponent, fracture toughness, viscoelasticity and creep. A specific focus will be placed on the ability of a thermal-drift-free nanoindentation system toaccurately and reproducibly measure the elastic/plastic transition in such thin films and why this can be of importance in obtaining stress-strain information about the coating. The advantages of measuring creep decay over significant timeperiods (>5 minutes) and guaranteeing that such creep is entirely material-dependent (and not having a component originating from the measurement equipment) will also be covered.

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Monday, April 19

6:40 p.m.

H

3

Comparison of

V.Z. Poenitzsch, SouthwestResearch Institute, San

Southwest Research

Monday, April 19

6:40 p.m. H 3 Comparison

Monday, April 19

6:40 p.m. H-3 Comparison of Solution-Based Synthetic Diamond-Like Carbon/Carbon Nanotube Coatings withTraditional DLC Coatings

V.Z. Poenitzsch, Southwest Research Institute, San Antonio, TX; K.A. Slinker, Lockheed Martin Aeronuatics Company, Fort Worth, TX; C.A. Ellis, Southwest Research Institute, San Antonio, TX; S.H. Gardner, Lockheed MartinSpace Systems Company, Palo Alto, CA; and R. Wei and K.E. Coulter, Southwest Research Institute, San Antonio, TX

Southwest Research Institute and Lockheed Martin are advancing an innovative method of fabricating diamond-like carbon (DLC) composite coatings that involves chemical synthesis of hydrocarbon polymers possessing diamond-like structure at the atomic level, mixing these polymers with carbon nanotubes (CNTs), and subsequent pyrolytic conversion to synthetic diamond-like carbon (s-DLC). The low-temperature, atmospheric, and solution-based processing allows for coating substrates previously considered impractical or impossible due to their size, geometry, orincompatibility with vacuum processes. Whereas conventional DLC films are plagued by internal stresses, reinforcing the DLC with CNTs enables thick films with adjustable properties tuned with precursor chemistry to control sp2/sp3/H content or by adjusting the CNT loading. The chemical composition, microstructure, and properties of the s-DLC and s-DLC/CNT coatings were examined with and compared to those of plasma immersion ion processing (PIIP) DLC usingFTIR and Raman spectroscopy, scanning electron microscopy (SEM), electrical impedance, and nanoindentation measurements. This presentation provides an overview of the synthesis, application and performance of S-DLC/CNT compared to traditional PIIP DLC coatings. Verbose invited

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Monday, April 19

7:00 p.m.

H

4

A Continuou

P.S. Maydannik, T.O. Kääriäinen, and D.C.

A novel AtomicLayer

Monday, April 19

7:00 p.m. H 4 A Continuous

Monday, April 19

7:00 p.m. H-4 A Continuous ALD Process for Deposition on Flexible Substrates

P.S. Maydannik, T.O. Kääriäinen, and D.C. Cameron, ASTRaL, Lappeenranta University of Technology, Mikkeli, Finland

A novel Atomic Layer Deposition (ALD) system has been constructed to investigate continuous deposition on flexiblesubstrates as a precursor stage for a roll-to-roll web coating process. The process is based on the movement of the substrate through the precursor vapour zones, rather than a stationary substrate with time-separated precursor flows. The process was studied for the deposition of aluminium oxide using trimethylaluminium (TMA) and water as the precursors. Deposition studies were carried out using metallised polymer sheets of dimensions 297 × 120 mm2 as substrates. Process parameters such as temperature, vapour and gas flow rates and substrate moving speed were studied. The film growth behaviour was similar to conventional ALD in that the deposition saturated at ~1 Å/cycle as the precursor dose was increased. Film thickness was determined using spectroscopic ellipsometry. With the correct gas flow conditions, films showed excellent uniformity over the whole area of the substrate sheet. Films were depositedat substrate speeds up to 150 m•min-1.

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Monday, April 19

7:20 p.m.

H

5

MagnetronSputter

R. Wei and N.S. Cheruvu, Southwest Research

Magnetron sputter

Monday, April 19

7:20 p.m. H 5 Magnetron

Monday, April 19

7:20 p.m. H-5 Magnetron Sputter Deposition of MCrAl Coatings for High Temperature Cyclic Oxidation Environments

R. Wei and N.S. Cheruvu, Southwest Research Institute, San Antonio, TX; and D. Gandy, Electric Power Research Institute, Charlotte, NC

Magnetron sputter deposition was used to prepare MCrAl coatings (M=Fe, Ni, Co or the combination). Commercial plates of 310 stainless steel (SS), 304 SS and Ni:20Cr were used as the MCr targets to achieve various compositions (Fe-Ni-Cr), while Al is added from a separate pure Al target to obtain the desired Al composition. Two deposition technologies were employed including conventional magnetron sputter deposition and plasma enhanced magnetron sputter (PEMS) deposition, in which a global plasma was generated from hot filament thermionic electron emission. The effect of deposition parameters on the coating morphology, microstructure, composition and adhesion were studiedextensively and the coatings were examined using a number of techniques including SEM, EDS, XRD and Rc indentation. It has been observed that the sputter deposited coatings are typically nanocrystalline with the average grainsize being about a few tens of nanometers, which is quite different from the MCrAl coatings obtained from thermal (orplasma) spray techniques. Under selected deposition conditions, the coatings are very dense with nearly no appearanceof columnar structure. They have excellent adhesion to the substrates. Dense, continuous and stable oxide layers have been observed after oxidation tests up to 1010°C. The oxide layers also show to be excellent in resistance to spallation.In this paper, the deposition process will be discussed and the coating characterization results will be presented. Verbose invited

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Monday, April 19

7:40 p.m.

H

6

Ga-DopedZnO

T. Yamaoto, T. Yamada, H.Makino, and N. Yamamoto,

The fabricationand field test of

Monday, April 19

7:40 p.m. H 6 Ga-Doped

Monday, April 19

7:40 p.m. H-6 Ga-Doped ZnO Transparent Electrodes for Application as an Alternative to ITO Electrodes

T. Yamaoto, T. Yamada, H. Makino, and N. Yamamoto, Kochi University of Technology, Kochi, Japan

The fabrication and field test of 3 inch and 20 inch thin film transistor liquid crystal display panels (TFT-LCDPs) utilizing the ZnO transparent common electrodes on the color filter substrate, was successfully achieved for the first time. Substitution of ZnO for indium-tin-oxide (ITO) as the the common electrode layers on the color filter is used to reduce usage amount of indium, a rare metal. The fabrication was realized by an entirely compatible process with conventional manufacturing process of commercial TFT-LCDPs. We executed the operation test for the long-term reliability evaluation of TFT-LCDP utilizing the common electrode of Ga-doped ZnO (GZO). 240 to 1000 hours of operation without any change in performance under the condition of 60˚C in 90% humidity atmosphere was confirmed.This result suggests good reliability of the GZO films as common electrodes in TFT-LCDPs. For 3 inch LCD panels, we succeeded in developing a manufacturing technology with a process flow that is entirely compatible with the currentprocess for existing commercially available LCD panels with ITO electrodes. The advantage over ITO films of GZO films is unique characteristic of high visible transmittance, whereas the issues concerning chemical and thermal stability to be solved for practical applicability of GZO films have remained.

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Tuesday Morning

April 20, 2010

Large Area Coating

Tuesday, April 20

8:30 a.m.

L

1

Large Area

M.A. George, J.E. Madocks,and H. Chandra, General

General Plasmahas invented

Tuesday, April 20

8:30 a.m. L 1 Large Area

Tuesday, April 20

8:30 a.m. L-1 Large Area Plasma Chemical Vapor Deposition Process Technology and Applications

M.A. George, J.E. Madocks, and H. Chandra, General Plasma Inc., Tucson, AZ

General Plasma has invented novel plasma source technology that now enables Plasma Enhanced Chemical Vapor Deposition (PECVD) for large area continuous processing applications. The PECVD process features high rate deposition of dielectrics with film quality matching and in many instances exceeding that of sputtering processes. In this paper we discuss recent progress of this new technology along with the latest results. We discuss the economics ofthe PECVD process and compare that to reactive sputtering for thin films such as ZnO, SiO2 and TiO2. Films depositedby the PECVD technology include hard coatings on plastics (SiO2), transparent barrier films (SiC, SiN), transparent conductive oxide (SnO2), anti-reflection layers (ZnO, SiO2, TiO2), passivation of silver and active layer passivation in solar cells (SiN and Al2O3). The PECVD process achieves high deposition rates, long campaign cycles and exhibits ease of maintenance. We will review the requirements for source implementation into coaters up to 2 meters in width aswell as discuss the film properties and characterization for various applications.

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Tuesday, April 20

8:50 a.m.

L

2

Measuringthe

T. Acchione and J. Hisert, The Indium Corporation,

Solar module manufacturers

Tuesday, April 20

8:50 a.m. L 2 Measuring the

Tuesday, April 20

8:50 a.m. L-2 Measuring the Performance of Low Melting Point Alloy Sputtering Targets Bonded At Room Temperature

T. Acchione and J. Hisert, The Indium Corporation, Clinton, NY

Solar module manufacturers are looking for new solar assembly materials and processes to increase throughput, reducecost, and improve cell efficiency. To reach these higher goals, new materials and processes are needed in the area of thin film deposition, in this case: sputtering targets. When conventional bonding is simply not possible because of the low melting point range of materials, sputtering the target material directly onto the backing plate is typically employed. For the case of the lowest melting alloys used in thin film cells (CIG, CIGS, and InSn), it is possible to usea localized heat source to bond them at room temperature. This enables the 1) casting of these low melting alloy sputtering targets and 2) subsequent bonding to a backing plate for use in existing equipment. This presentation will demonstrate the capability of bonding low melting point alloy sputtering targets as well as how to verify the performance of these targets during operation.

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Large Area Coating

Tuesday, April 20

9:10 a.m.

L

3

On-Line, 100% Haze

T.A. Potts, Dark Field Technologies, Inc., Orange,

A critical parameter in the

Tuesday, April 20

9:10 a.m. L 3 On-Line,

Tuesday, April 20

9:10 a.m. L-3 On-Line, 100% Haze Measurement

T.A. Potts, Dark Field Technologies, Inc., Orange, CT

A critical parameter in the control of coating processes and their associated quality is haze measurement. Traditionally,haze measurement has been performed off line, by lab instruments. While this provides an idea of the haze value for agiven panel or portion of the glass float line, it is woefully inadequate when premier quality and close process control are required. A new system for 100% inspection of glass panels and for use on the float line, has been developed. Thissystem provides a haze map for a panel or ribbon and provides alerts when the haze values violate critical control limits.

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Tuesday, April 20

9:30 a.m.

L

4

ManagingArcs for

D. Carter and H. Walde, Advanced Energy

Over the years,a broad range of

Tuesday, April 20

9:30 a.m. L 4 Managing

Tuesday, April 20

9:30 a.m. L-4 Managing Arcs for Optimum Deposition Performance

D. Carter and H. Walde, Advanced Energy Industries, Inc., Fort Collins, CO

Over the years, a broad range of arc detection and power supply response technology has found its way into the powerdelivery systems driving thin film sputtering applications. While different applications carry different propensities forarcing, it is generally accepted that arcs will occur, at some level, through the course of a typical deposition process. The seemingly simple goal of detection and management to extinguish arcs and recover the plasma to a working state isin fact quite complex given the sensitivity of sub-micron films to arc induced particles and the heavy arcing common on many popular target materials. Effective management of arcs requires an understanding of both the nature of, and the contributors to, arcs that are occurring. Minimizing their impact requires an appropriate response that takes into account the characteristics of the arcs and also manages the elements that influence or interact with these characteristics. This study looks into the factors that influence key arc characteristics including arc rate, arc energy andarc persistence in large area sputtering applications. An understanding of these characteristics and the influence of modern arc response techniques is shown to offer key insight for methods extending beyond arc handling and into an approach better characterized as arc management. Ultimately, improved arc management provides the user better means for controlling the factors that affect arc formation and persistence. This, in the end, allows for more purposefulresponse to the arcs that occur and better control over the impact arcs have on the deposition being performed.

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Large Area Coating

Tuesday, April 20

9:50 a.m.

L

5

Uniform Large

V. Bellido-Gonzalez, M. Holik, M. Audronis, A.

Some magnetron

Tuesday, April 20

9:50 a.m. L 5 Uniform Large

Tuesday, April 20

9:50 a.m. L-5 Uniform Large Area Magnetron Sputtering

V. Bellido-Gonzalez, M. Holik, M. Audronis, A. Uchida, and D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom;S. Williams, Gencoa Ltd., San Francisco, CA

Some magnetron sputtering deposition applications have found the use of RF as the power source beneficial. In some instances this is related to the coating nature, e.g., sputtering a non conductive oxide target. In others the reason could be, for example, the decrease in coating defects, the increase of electron temperature of plasma, ionisation, etc. Whatever the benefit that the RF application could offer, the main problem comes when the industrial process economics would require to up-scale the process to large area deposition. The RF discharge runs at very high frequencies (13.56 MHz typically). In many instances, compared to DC, DC pulsed, or even medium frequency discharges (10 - 350 kHz) the RF discharge is more complex. In larger area deposition the problems of handling a higher power at such very high frequency is a challenge in itself. Added to power, handling the RF deposition, for example, typically deviates from the uniformity that would correspond if the discharge is conducted in DC mode. Thisdifference is a result of a different distribution of the plasma discharge on the magnetron target surface. In order to produce a uniform plasma discharge changes to the plasma source construction and ability to incorporate tuning elements would be required. In the present paper, authors will show results of industrial high uniformity large area RFmagnetron sputtering.

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Business Topics

Tuesday, April 20

10:30 a.m.

BT

1

SVC 2010and

R. Sager, Williams Advanced Materials,

Dick Sager will discuss how we

Tuesday, April 20

10:30 a.m. BT 1 SVC 2010

Tuesday, April 20

10:30 a.m. BT-1 SVC 2010 and Beyond - What’s in Store for Us in the Next Decade?

R. Sager, Williams Advanced Materials, Buffalo, NY


Dick Sager will discuss how we are all responsible for making this industry/market capable of growing with new applications and advances in technology. What is it that your company does, how does it fit in the market and what canbe done differently? What is it that defines the idea of building a business that has established competitive advantages and how do we then translate that into building a business that has sustainable profitable growth? Dick will examine theidea of service, total cost, technology, innovation, and quality as key differentiators.


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Tuesday, April 20

11:10 a.m.

BT

2

Solar Energy

E.V. Etzkorn, Solar EnergyTechnologies Program, U.

The mission of the DOE Solar

Tuesday, April 20

11:10 a.m. BT 2 Solar Energy

Tuesday, April 20

11:10 a.m. BT-2 Solar Energy Technologies Program at DOE: Priorities, Outlook, and Opportunities for PV Suppliers

E.V. Etzkorn, Solar Energy Technologies Program, U.S. Department of Energy, Washington, DC


The mission of the DOE Solar Energy Technologies Program is to accelerate the widespread adoption of solar electric technologies across the United States, including cost-competitiveness by 2015-2020, grid integration, and the development of a strong domestic manufacturing base and supply chain. This talk will provide an overview of the program’s priorities and outlook; its applied research, development, and demonstration activities; and its perspectives on the critical technical challenges and opportunities in the PV market and in the PV coatings industry in particular. Additionally, current and upcoming funding opportunities will be highlighted, including the PV Manufacturing Initiative and the High Impact Supply Chain R&D for PV Technologies and Systems program. Both of these solicitations are highly relevant to the PV coatings, materials, and equipment supply industries, and the context, goals, and content of the two will be discussed.


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Symposium on Cleantech Energy – Vacuum Web Coating

Tuesday, April 20

8:30 a.m.

W

18

Roll-to-Roll

A.N. Tiwari, EMPA - SwissFederal Laboratories for

Among all the existing thin film

Tuesday, April 20

8:30 a.m. W 18 Roll-to-Roll

Tuesday, April 20

8:30 a.m. W-18 Roll-to-Roll Manufacturing for Flexible CIGS and CdTe Solar Cells and Modules

A.N. Tiwari, EMPA - Swiss Federal Laboratories for Material Testing and Research, Dübendorf, Switzerland


Among all the existing thin film solar cells, highest photovoltaic conversion efficiency and lowest manufacturing cost have been achieved with Cu(In,Ga)Se2 (called CIGS) and CdTe based solar cells, respectively. Lightweight and flexiblesolar cells based on CIGS and CdTe absorber layers are considered important for potentially cost competitive generation of solar electricity as module costs below 0.6 $/Wp have been predicted. These solar cells are multi-layered structures consisting of ZnO:Al/ZnO/CdS/CIGS/Mo/Substrate, and Metal/buffer/CdTe/CdS/TCO/Substrate. For flexible solar cells different metal foils and polyimide films have been used as substrate and record efficiencies of 17.5% and 16% have been achieved on Ti foil and polyimide film, respectively. Roll-to-roll manufacturing of flexible solar cells and monolithically connected modules offer several advantages but also several challenges. Although every layer and interface has important functionality in solar cell devices, the most critical component is the absorber (CIGSor CdTe) layer and its related interfaces to the adjoining layers. Layers of different thermo-physical characteristics are grown using sputtering, vacuum evaporation, chemical methods, but high temperature (450° – 550°C) growth of absorber layer with optimized properties is the most challenging issue in roll-to-roll manufacturing. Other important issues relate to electrical interconnects for large area module manufacturing and application of cost effective encapsulation to protect solar modules against outdoor environmental conditions. The talk will provide an overview addressing challenges and prospects of the flexible CIGS and CdTe solar cell technology.


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Tuesday, April 20

9:10 a.m.

W

19

Nanoparticulate

S.K. Ramadas, S.Z. Ma, andS. Shanmugavel, Tera-

The ultra-high barrier

Tuesday, April 20

9:10 a.m. W 19 Nanoparticula

Tuesday, April 20

9:10 a.m. W-19 Nanoparticulate Barrier Stacks for Display and Solar Applications

S.K. Ramadas, S.Z. Ma, and S. Shanmugavel, Tera-Barrier Films, Singapore


The ultra-high barrier properties of nanoparticulate barrier stack is demonstrated. The nanoparticulate barrier stack concept has resolved barrier film’s pore effect issues by sealing the defects of the barrier oxide films using reactive andnon-reactive nanoparticles. The result is a breakthrough moisture barrier performance of better than 10-6g/m2/day (WVTR) at 60˚C & 90% relative humidity. The calcium test method is used to measure permeability, diffusion coefficient and to identify the type of defects exhibits in single and multi-layer barrier stacks. Ultra high barrier stacks are fabricated with different nanoparticles and carbon nanotubes used for sealing the defects and absorbing residual moisture. The water vapour permeation mechanism is investigated and correlated to laminate theory. This study provides better understandings and scientific solutions for designing effective barrier stacks for future robust plastic electronics applications. Nanoscratch testing has shown very clear differences in deformation behavior for different barrier stacks. Nano-scratch testing can be used to optimize the mechanical properties of the barrier defects sealing layers.


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Tuesday, April 20

9:50 a.m.

W

20

Transparent,

M.P. Rosenblum, X. Chu, S.Lin, and D. Boesch, Vitex

Multi-layer ultra-barrier films are

Tuesday, April 20

9:50 a.m. W 20 Transparent,

Tuesday, April 20

9:50 a.m. W-20 Transparent, Flexible Ultra-Barrier Films for Thin-Film PV and OLED Lighting

M.P. Rosenblum, X. Chu, S. Lin, and D. Boesch, Vitex Systems, Inc., San Jose, CA

Multi-layer ultra-barrier films are a proven way to provide protection against moisture and oxygen for the long-term stability of thin-film photovoltaic cells and OLED devices. Ultra-barrier films are generated by the deposition of a thinmulti-layer structure of organic and inorganic films. The barrier performance of the inorganic layers is enhanced through the application of the organic separation layers. The organic film serves several critical functions; it planarizessurface topography, covers particles, decouples defects in the barrier layers and provides a clean and uniform surface for nucleation of the deposition of the inorganic layer. These features of the organic layer allow the inorganic film to form an effective, low defect-density barrier layer at nanometer scale thicknesses. Barrier performance as characterized by effective WVTR of less than 10-6 g/m2·day has been demonstrated with barrier layer thicknesses of 20nm. The reduction of the barrier layer thickness increases the throughput of the web coating process allowing for the cost-effective manufacture of ultra-barrier films. The organic layer is vacuum deposited by flash evaporation of a multi-component resin system and converted in situ to polymer by ultraviolet radiation. The polymer process has proven scalability and throughput more than sufficient to match any barrier deposition process.

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Tuesday, April 20

10:30 a.m.

W

21

Web Coating of

K. Otte, A. Rahm, and A. Braun, Solarion AG,

This paper describes the

Tuesday, April 20

10:30 a.m. W 21 Web Coating

Tuesday, April 20

10:30 a.m. W-21 Web Coating of Flexible CIGS on Polyimide Substrate

K. Otte, A. Rahm, and A. Braun, Solarion AG, Leipzig, Germany


This paper describes the technological aspects of web coating for the manufacturing of flexible CIGS solar cells (SC) on polyimide (PI) substrates. Each of the production stages in Solarion´s industrial pilot production facility for modulegrade cells are automated roll-to-roll processes utilizing in situ process control. The absorber layer is deposited by a low-temperature ion beam assisted co-evaporation process (IBAD). We describe the main features of this proprietary IBAD process: increased solar cell efficiency, superior selenium utilization and improved process control. Technological issues concerning the choice of substrate, the choice of deposition method as well as advantages and disadvantages concerning continuous roll-to-roll manufacturing are reflected. We will describe and discuss topics to beconsidered by transferring a batch process based on glass substrate to web-coating of flexible substrates with respect tomanufacturing of flexible CIGS cells. Optimised deposition parameters yield device efficiencies above 10% (total area)for module grade SCs and above 13% (active area) for test cells.


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Tuesday, April 20

11:10 a.m.

W

22

Transparent

K.-L. Choy, Department ofMechanical, Materials and

This paper describes the

Tuesday, April 20

11:10 a.m. W 22 Transparent

Tuesday, April 20

11:10 a.m. W-22 Transparent Conducting Oxide Films on Flexible and Glass Substrates by ALD and ESAVD

K.-L. Choy, Department of Mechanical, Materials and Manufacturing Engineering, University of Nottingham, Nottingham, United Kingdom


This paper describes the fabrication of transparent conducting oxides (TCOs) films based on tin doped indium oxide, aswell as aluminium-doped, and antimony-doped ZnO and nanocomposite of carbon nanotubes in TCOs. These TCO films have been deposited onto flexible and glass substrates using Atomic Layer Deposition (ALD) and the emerging low cost aerosol assisted chemical vapour deposition (AACVD) techniques. The deposited TCO films have been characterized to determine their structure, optical and electrical properties. The effects of the substrates and the deposition conditions on the structure and properties of TCO films have been established. The advantages of ALD andAACVD thin film deposition process will be highlighted and compared with other CVD and PVD methods. The technical viability and the potential of the AACVD process to be scaled up for roll-to-roll deposition and large area planar deposition will also be presented.


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Tuesday, April 20

11:50 a.m.

W

23

GZO Transpare

T. Hinoki, C. Kyuhara, H. Agura, and K. Yazawa, Oike

Our final goal isZnO transparent

Tuesday, April 20

11:50 a.m. W 23 GZO

Tuesday, April 20

11:50 a.m. W-23 GZO Transparent Conductive Films Prepared by RF Plasma Assisted DC Magnetron Sputtering on Plastic Substrates without Intentional Substrate Heating

T. Hinoki, C. Kyuhara, H. Agura, and K. Yazawa, Oike & Co., Ltd., Kyoto, Japan; and K. Kinoshita, K. Ohmi, and S.Kishida, Tottori University, Tottori, Japan

Our final goal is ZnO transparent conductive oxide (TCO) films on large area plastic films in order to apply these filmsto solar panels and electrical display panels. Generally, ZnO films deposited on polyethylene telephthalate (PET) substrates have higher resistivity and poorer environmental reliability compared to those deposited on glass substrates,since a temperature should be maintained at less than 100°C during the deposition process using PET substrates. In thecase that the ZnO films on plastic film substrate prepared by roll-to-roll (RTR) deposition system, an inhomogeneous layered structure with high and low resistivity is alternately formed in the ZnO films, since ZnO films prepared by normal DC magnetron sputtering have high resistivity region which faces the area of target erosion. In this study, we have attempted to improve electrical properties and environmental reliability of Ga doped ZnO (GZO) films on PET substrates by applying RF plasma assisted DC magnetron sputtering technique and by using the organic under coated layer between GZO film and PET substrate. These approaches probably can be applied to large area ZnO films prepared by RTR deposition. Furthermore, attempting to actual touch panel application using ZnO TCO film is investigated.

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Tuesday, April 20

12:10 p.m.W

24

PolyimideFilm as a

D.J. McClure, Acuity Consulting and Training,

Polyimide film substrates offer

Tuesday, April 20

12:10 p.m. W 24 Polyimide

Tuesday, April 20

12:10 p.m. W-24 Polyimide Film as a Vacuum Coating Substrate

D.J. McClure, Acuity Consulting and Training, Siren, WI

Polyimide film substrates offer performance at very high temperatures (400°C and above). They have been used widelyfor flexible circuit constructions, for space applications, and are now finding use as substrates for flexible photovoltaicand display applications. Polyimide films are available in several chemistries and from several suppliers. This paper ispresented from an experienced user’s perspective. It seeks to consolidate data on these films from many sources, with aparticular emphasis on their use as substrates for roll-to-roll thin film vacuum deposition. A major take-home message is that the high temperature performance of polyimide films and the resulting losses of mechanical properties are limited by decomposition not by softening or melting, as is the case for polyester (PET or PEN) or polypropylene (BOPP). This decomposition is largely an oxidative process, and thus the threshold temperatures for decomposition in vacuum (no oxygen) are substantially higher than that in air, the commonly reported ambient for high temperature data.

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High Power Impulse Magnetron Sputtering (HIPIMS)

Tuesday, April 20

8:30 a.m.

HP

1

Comparative Study

M. Hala, J. Capek, O. Zabeida, J.E. Klemberg-

Since its introduction,

Tuesday, April 20

8:30 a.m. HP 1 Comparative

Tuesday, April 20

8:30 a.m. HP-1 Comparative Study of HIPIMS Discharges with Different Pulsing Characteristics Using Time-Resolved Electrical and Optical Diagnostics

M. Hala, J. Capek, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

Since its introduction, HIPIMS has enjoyed growing interest from the international coating community; much progresshas been made in understanding it, and specific applications have appeared. A direct comparison of the results obtainedin different laboratories is, however, complicated given the variety of DC pulse generators from different producers andwith different pulse characteristics. The present study aims at systematically investigating and comparing the characteristics of HIPIMS discharges ignited in the same sputtering reactor using two commercially available power supplies, a conventional square voltage pulse generator and an arbitrary voltage pulse generator, using voltage and current monitoring and time-resolved optical emission spectroscopy. The investigated discharges involve a niobium target and various gas mixtures (Ar mixed with either N2 or O2). Each power supply offers different possibilities to increase power, specifically higher voltage for square pulse generator, and longer, custom-shaped pulses for the arbitrary pulse generator. We discuss the consequences of these differences on the discharge dynamics and their possible influence on the deposition process.

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Tuesday, April 20

8:50 a.m.

HP

2

Dynamicsof

M. Hala, N. Viau, O. Zabeida, J.E. Klemberg-

Time- and space-resolved

Tuesday, April 20

8:50 a.m. HP 2 Dynamics of

Tuesday, April 20

8:50 a.m. HP-2 Dynamics of Reactive HIPIMS Discharge Studied by Time- and Space-Resolved Optical Emission Spectroscopy and Fast Imaging

M. Hala, N. Viau, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

Time- and space-resolved high-resolution optical emission spectroscopy (OES) was used for the investigation of plasma dynamics of HIPIMS discharges using a Cr cathode and Ar, N2 and O2 gases at pressures ranging from 0.7 to 2.6 Pa. In addition, time-resolved discharge imaging using custom-made optical filters for detecting specific spectral features was performed to better understand the propagation of individual excited species (e.g., Cr0, Ar0, N2

0, O21+)

within the chamber reactor. Excited working gas emission observed during the discharge ignition indicated the occurance of electron avalanches. The propagation speed of these avalanches was 24 km·s−1 in Ar discharges at 1.3 Pa,but it decreased significantly with increasing N2 content in the N2/Ar mixture, down to 7.6 km·s−1 in pure N2 at 1.3 Pa.Dense metal plasma created next to the target propagated within the chamber at a speed ranging from 0.7 to 3.5 km·s-1,depending on the working gas composition and the pressure: It increased with higher N2 concentrations and lower pressure. In Ar discharges, the emission of the advancing metal plasma wave exhibited a hemispherical shape with excited working gas species on its wavefront. In reactive mixtures, the plasma wavefront changed during the pulse from hemispherical through conical to a drop-like shape, visibly detaching from the dense plasma close to the target. Information about HIPIMS discharge dynamics will be discussed with respect to the mechanisms of energy transfer in the plasma and during thin-film growth.

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ABSTRACTEntry


Tuesday, April 20

9:10 a.m.

HP

3

CrNx

G. Greczynski, J. Jensen, and L. Hultman, The focus of thepresent work is

Tuesday, April 20

9:10 a.m. HP 3 CrNx Coatings

Tuesday, April 20

9:10 a.m. HP-3 CrNx Coatings Grown by HPPMS: A Basic Parameter Study

G. Greczynski, J. Jensen, and L. Hultman, Department of Physics, Chemistry, and Biology, Linköping University, Linköping, Sweden; M.P. Johansson, Seco Tools AB, Fagersta, Sweden; and Ch. Schiffers, CemeCon AG, Würselen,Germany

The focus of the present work is the basic parameter study of the Cr-N film growth process using High Power Pulsed Magnetron Sputtering (HPPMS or HiPIMS). Samples with various nitrogen content were prepared by means of reactive sputtering of Cr targets in Ar/N2 atmosphere at the fixed total pressure of 0.4 Pa and varied N2-to-Ar flow ratio.The effects of gas composition, substrate bias and pulsing frequency on the properties of the resulting films are investigated. Energy resolved mass spectroscopy was used for analysis of the ion flux incident on the substrate. Elemental analysis reveals stoichiometry of HPPMS films similar to that of reference DC films prepared at the corresponding gas flow ratio. Cross-sectional SEM and TEM studies combined with XRD investigations show that a column-free growth takes place for films containing less than 30% atomic N and composed of a mixture of β-Cr2N phase and Cr(N) solid solution. The onset of columnar growth (above 30 at.% N) coincides with the formation of CrN phase. The single phase CrN films exhibit high compressive stress levels ranging between 7 and 10 GPa. A drastic hardness increase, from 9.5 GPa to 26.2 GPa, takes place already for films containing as little as 5 at.% N.

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ABSTRACTEntry

Tuesday, April 20

9:30 a.m.

HP

4

Characterization of

J. Lazar, Department of Physics, University of West

High power impulse

Tuesday, April 20

9:30 a.m. HP 4 Characterizati

Tuesday, April 20

9:30 a.m. HP-4 Characterization of High Power Impulse Magnetron Sputtering of Zirconium

J. Lazar, Department of Physics, University of West Bohemia, Plzen, Czech Republic


High power impulse magnetron sputtering of zirconium was investigated at an average target power density in a periodbeing approximately 100W·cm-2. The depositions were performed in 1 Pa argon atmosphere using an unbalanced circular magnetron with a directly water-cooled planar zirconium target of 100 mm diameter. The repetition frequencywas 500 Hz at duty cycles ranging from 4 to 10%. Time evolutions of the discharge characteristics were measured providing information on absorption of energy by the discharge and on transfer of arising ions to a substrate located 100 mm from the target. Time-averaged mass spectroscopy was performed at the substrate position. High fractions (21-32%) of doubly charged zirconium ions were found in total ion fluxes onto the substrate at decreasing fractions (from23 to 3%) of singly charged zirconium ions when the average target power density in a pulse increased from 0.97 to 2.22 kW·cm-2. It was shown that ion energy distributions exhibit high-energy tails (up to 100 eV relative to ground potential) under these conditions. The rise in the average target power density in a pulse resulted in a decrease of the deposition rate from 590 to 440 nm/min. A qualitative analysis of the deposition processes was performed to explain the observed effects.

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ABSTRACTEntry


Tuesday, April 20

9:50 a.m.

HP

10

The Effectof the

A.K. Mishra, Department ofElectrical Engineering and

The effect of themagnetic field

Tuesday, April 20

9:50 a.m. HP 10 The Effect of

Tuesday, April 20

9:50 a.m. HP-10 The Effect of the Magnetic Field on the Evolution of Pre-Sheath Potentials in a HiPIMS Discharge

A.K. Mishra, Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool, United Kingdom; P.J. Kelly, Dalton Research Institute, Manchester Metropolitan University, Manchester, United Kingdom; and J.W. Bradley, Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool, United Kingdom

The effect of the magnetic field on the pre-sheath dynamics in a High Power Impulse Magnetron Sputtering (HiPIMS)discharge has been studied through time-resolved plasma potential (Vp) measurements carried out along a line parallel to the discharge centreline and above the racetrack. Vp was obtained using a time-resolved emissive probe with a time-resolution of 20 ns or better, operated in the “saturated floating potential” mode. Anomalously high plasma potential drops across the pre-sheath were observed, which increased with magnetic field strength and decreased the pre-sheathwidth leading to higher bulk plasma electric fields. One interesting observation was that the pre-sheath (potential drop across the plasma) evolved in two phases. It grows in the initial phase of the discharge voltage pulse (2.5 to 4 µs) to amaximum of ~90 V, followed by a relaxation to very low values. Following this, (between 65 and 90 µs), the potentialdrop is re-established to values ~30 V. The time of reestablishment increased with lower magnetic field strength. The experimental results show that the magnetic field strength can be used to control the magnitude of the potential drop across the bulk of the plasma and potentially the deposition rate of ionised material. Verbose invited



ABSTRACTEntry

Tuesday, April 20

10:30 a.m.

HP

6

First Decade of

V. Lieberman, Systec GmbH, Karlstadt, Germany

2010 marks the first decade of

Tuesday, April 20

10:30 a.m. HP 6 First Decade

Tuesday, April 20

10:30 a.m. HP-6 First Decade of HIPIMS: Status and Outlook from an Industrial Perspective

V. Lieberman, Systec GmbH, Karlstadt, Germany


2010 marks the first decade of HIPIMS, or High-Power Impulse Magnetron Sputtering, making it interesting to have a look at this technology from the perspective of the industrial users and see how the migration from the labs into the commercial world takes place. HIPIMS technology offers a range of important advantages as compared with the conventional PVD methods. At the root of these advantages lies the inherent ability of the HIPIMS to generate high density plasma with elevated metal ions content. Generating metal plasma is a challenging task and HIPIMS is one offew methods that can manage it without having ‘side effects’. Ease of metal ion management during PVD processing dramatically improves coating adhesion, hardness and other properties. Moreover, the HIPIMS technology allows producing films with unique properties, which are difficult or impossible to produce using conventional deposition methods. The experience of Systec, the first company that offered commercial equipment and technology for HIPIMSprocessing, in the field of practical applications, will be reviewed. Known industrial applications of HIPIMS will be also discussed, as well as hopes and challenges that HIPIMS may face on the way forward.


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Tuesday, April 20

11:10 a.m.

HP

7

Micro-Structural

G. Kamath, A.P. Ehiasarian,Y. Purandare, and P.

High Power Impulse

Tuesday, April 20

11:10 a.m. HP 7 Micro-

Tuesday, April 20

11:10 a.m. HP-7 Micro-Structural and Oxidative Mechanical Wear Study on TiAlCN/VCN Nanostructured Multilayer Coating Deposited by HIPIMS/HIPIMS Technique – Impression of High Density Metal-Ion Irradiation in Reactive Atmosphere

G. Kamath, A.P. Ehiasarian, Y. Purandare, and P. Hovsepian, Sheffield Hallam University, Sheffield, United Kingdom


High Power Impulse Magnetron Sputtering (HIPIMS) is a novel technique producing large area uniform discharge withhigh concentration of metal ions. About 2µm thick TiAlCN/VCN nanostructured multilayer with periodicity 2.3 nm hasbeen deposited by HIPIMS/HIPIMS technique, where HIPIMS is used for both surface pre-treatment as well as deposition. The coatings were produced in industrial sized Hauzer HTC 1000-4 system enabled with HIPIMS technology by sputtering from 2-Vandium and 2-TiAl targets in a mixed CH4+Ar+N2 atmosphere. The HIPIMS plasmacomposition was studied by plasma sampling energy resolved mass spectrometer as a function of discharge current. Spectral intensities have shown high metal ion concentration of Ti+, V+, and Al+ in the discharge. Significant amount ofC+ was also observed due to the decomposition of the reactive gas (CH4) as well as Ar+ and N+. As a result, highly densemicrostructure of the multilayer has been achieved. This has been confirmed through the cross-sectional TEM micrograph of multilayer. Thermo gravimetric analysis has shown a significant raise of oxidation resistant temperature≈ 780˚C, in contrast to carbon free TiAlN/VN multilayer coating. High-temperature sliding wear tests have been conducted on the the coatings where the friction coefficient was found to decrease from µ=0.6 to µ=0.4 when the temperature was increased from room temperature to 650˚C. In contrast, the wear coefficients were found to increase steeply from Kc in the range of 8.115x10-14 m3/Nm at room temperature to Kc in the range of 11.16 x10-14 m3/Nm at 650˚C. These effects were attributed to the formation of V and Ti based oxides in the wear track during the test. The formation of the lubricious V2O5 with oxygen deficiency and planar lattice defect known as magnelie phases was assumed to be the main reason behind the reduction of friction coefficient at elevated temperature. This was further influenced by the segregation of carbon in between multilayer's of TiAlCN/VCN producing lower shear strength interfaces and therefore promoting layer by layer wear mechanism. The lower mechanical strength and adhesion bonding of the oxide layers however, reduces the wear resistance as confirmed by the higher wear coefficient values atelevated temperatures as given above, in contrast to room temperature value (10-17m3N-1m-1 range). XRD and Raman spectra taken on the wear track of coating has marked the presence of magnelie phase oxides of the form, VnO3n-1, TinO2n-1.

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ABSTRACTEntry


Tuesday, April 20

11:30 a.m.

HP

8

Depositionof Alumina

R. Bandorf, H. Gerdes, D. Lock, and G. Bräuer,

For the reactivedeposition of

Tuesday, April 20

11:30 a.m. HP 8 Deposition of

Tuesday, April 20

11:30 a.m. HP-8 Deposition of Alumina Coatings by Modulated Pulse Power Magnetron Sputtering

R. Bandorf, H. Gerdes, D. Lock, and G. Bräuer, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

For the reactive deposition of alumina coatings modulated pulse plasma sputtering (MPP) was investigated. RF and MFsputtered coatings were used as reference. The focus of the investigation was the development of an industrially suitedprocess with deposition rate comparable or higher than the reference processes and improved film properties. All investigations were carried out on 315 cm2 cathods (125 x 250 mm2). The films were characterised regarding their electric properties, i.e., the insulating properties of the films. Therefore high voltage breakdown tests were carried out.For films with 1 µm thickness a breakdown voltage higher than 1 kV could be realised using improved pulsing parameters. SEM investigations show that depending on the pulsing parameters the film morphology changed from columnar to a dense glassy structure. The improved deposition rate was approximately 2.5 µm per hour, compared to MF processes at the same average power five times higher.

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ABSTRACTEntry

Tuesday, April 20

11:50 a.m.

HP

9

Reactive HiPIMS of

M. Vergöhl, S. Bruns, F. Neumann, T. Neubert, T.

TiO2 thin films

Tuesday, April 20

11:50 a.m. HP 9 Reactive

Tuesday, April 20

11:50 a.m. HP-9 Reactive HiPIMS of TiO2 Thin Films

M. Vergöhl, S. Bruns, F. Neumann, T. Neubert, T. Graumann, and O. Werner, Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

TiO2 thin films are of practical interest for applications such as optical or photocatalytic coatings. While for optical coatings a high density, high refractive index and low surface roughness are needed, in photocatalytic applications rather crystalline films in the anatase phase are preferred. Pulsed reactive magnetron sputtering and especially high power impulse magnetron sputtering (HiPIMS) have been used to study the properties of TiO2 thin films. With bipolar reactive HiPIMS, a very high refractive index of 2,7 could be demonstrated. However, this value was obtained in the oxide mode with a poisoned target at very low deposition rates. The influence of negatively charged oxygen atoms on the film morphology is of great importance, as found for ZrO2 films. In the present paper, TiO2 films are deposited withpartial pressure controlled bipolar HiPIMS in both static and dynamic deposition mode. The optical, structural and morphological film properties are investigated as a function of the duty cycle which indicates the fraction of ionized metal atoms in the plasma.

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ABSTRACTEntry


Tuesday, April 20

12:10 p.m.HP

5

MPP Deposition

W.D. Sproul, Department ofMetallurgical and Materials

Tantalum coatings with

Tuesday, April 20

12:10 p.m. HP 5 MPP

Tuesday, April 20

12:10 p.m. HP-5 MPP Deposition of Thick Tantalum Coatings

W.D. Sproul, Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO and Reactive Sputtering, Inc., San Marcos, CA; J. Lin and J.J. Moore, Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO; S.L. Lee, U.S. Army ARDEC - Benét Laboratories, Watervliet,NY; J. Wang, HeFei University of Technology, HeFei, China; and B. Mishra, Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO

Tantalum coatings with thicknesses up to 150 µm were sputter deposited onto steel substrates using Modulated Pulse Power (MPP). The deposition rate was 13-14 µm/hr at an average power of 4.5 kW. Both alpha and beta phases of tantalum were deposited depending on deposition conditions. Major factors affecting the deposited phase were substrate bias voltage and working pressure. For a bias voltage was between 0 to -70 volts, the phase changed from beta at 0 volts, to a mixed alpha and beta phase for biases between -12 to -40 volts, and finally to an all alpha phase when the negative bias voltage was -50 volts or greater. At floating potential, the working pressure determined the deposited phase. As the working pressure was increased from 2.3 to 4 mTorr, the crystalline phase of the coatings changed from pure alpha to a mixed alpha and beta phase, whereas at 5 mTorr and above the crystalline structure was the beta phase. The working pressure also affected coating hardness. At floating potential, the hardness of alpha-tantalum films deposited at pressures between 2-4 mTorr was 9-11 GPa, but for beta-tantalum films deposited between5-10 mTorr the hardness in the range of 19-17 GPa. Verbose invited

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ABSTRACTEntry

Optical Coatings

Tuesday, April 20

8:30 a.m.

O

1

Optical Coatings

E. Franke-Schubert, D. Schmidt, T. Hofmann, A.C.

Bottom-up and self-organized

Tuesday, April 20

8:30 a.m. O 1 Optical

Tuesday, April 20

8:30 a.m. O-1 Optical Coatings from Sculptured Thin Films: Art and Promise

E. Franke-Schubert, D. Schmidt, T. Hofmann, A.C. Kjerstad, and M. Schubert, University of Nebraska, Lincoln, NE


Bottom-up and self-organized three-dimensional (3-D) structure design on the nanoscale opens a new field of nanostructure based thin film optical coatings. Sculptured thin films (STF’s) belong to this group of coatings and current research creates exciting new knowledge about the unique response of those materials to light at different wavelength. STF’s are fabricated by glancing angle deposition and the thin film growth is dominated by physical shadowing due to a very oblique angle of incidence for the particle flux, and a limited surface diffusion. A simultaneous variation of the particle flux azimuth during deposition may lead to the growth of a new thin film materialclass with chiral properties. Structure related optical properties with special emphasize on the demonstration of chiralityin sculptured thin films are investigated by generalized 4 x 4 Mueller Matrix ellipsometry. Non-chiral STF’s from slanted metal nano-needles were found to exhibit monoclinic optical anisotropy with large dichroism and strong form birefringence, and investigations in the IR reveal structure dependent electron and lattice absorptions. Chiral and non-chiral sculptured thin films are useful for a broad range of application in optics. We will present promising concepts fornew optical filter materials, sub-wavelength antireflection coatings, diffractive optics from nanogratings and active Terahertz materials. Verbose invited Invited 40

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ABSTRACTEntry

Tuesday, April 20

9:10 a.m.

O

2

California“Cool Car”

M. Coda and L. Boman, Southwall Technologies,

In Europe, IR-reflecting (IRR)

Tuesday, April 20

9:10 a.m. O 2 California

Tuesday, April 20

9:10 a.m. O-2 California “Cool Car” Regulation Drives Development of High Performance IR-Reflecting Glazing

M. Coda and L. Boman, Southwall Technologies, Inc. Palo Alto, CA; and A. Wahl, R. Kleinhempel, and R. Thielsch, Southwall Europe GmbH, Grossroehrsdorf, Germany

In Europe, IR-reflecting (IRR) glazing is commonly available as an option or standard in cars for increased driving comfort. The IRR glazing consists of dielectric-meta-dielectric layer stacks coated directly on glass or on polyester filmlaminated between two glass panes, with silver as the primary constituent in the metallic layers. Reducing green housegas emissions (GHG) from light and medium duty vehicles is becoming increasingly important to a variety of governmental organizations world wide and one route to this is the reduction of air conditioning usage. To reduce fuelconsumption due to air conditioning use, and thereby reducing GHG emission, it is desired to improve IR- energy blocking performance of the vehicle glazing to minimize heating of the cabin. The California Air Resource Board (CARB) has defined solar parameters for vehicle glazing starting in 2012 which in certain cases requires the use of IR reflective coatings. The talk will give an overview about the regulation and reports about the challenges and consequences for coating design and deposition technology to meet the specification in a short period of time.

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ABSTRACTEntry

Optical Coatings

Tuesday, April 20

9:30 a.m.

O

3

Polymer Metal

T. Neubert and M. Vergöhl,Fraunhofer Institute for

The objective ofthis work was to

Tuesday, April 20

9:30 a.m. O 3 Polymer Metal

Tuesday, April 20

9:30 a.m. O-3 Polymer Metal Oxide Composite Layers for Optical Functional Coatings

T. Neubert and M. Vergöhl, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

The objective of this work was to prove the suitability of metal oxide polymer composite layers for optical functional coatings. Because of their flexibility, such layers could better meet the mechanical requirements of flexible substrates such as plastic foils than conventional dielectric coatings. Furthermore, with organic film components, it should be possible to integrate specific layer properties like hydrophobicity or other functionalities. Thin composite layers of ditantalum pentoxide (Ta2O5) and polytetrafluoroethylene (PTFE) were made by a co-sputter deposition process. The Ta2O5 films were coated with reactive DC magnetron sputtering in an Ar/O2 atmosphere. For the PTFE films a PTFE target with RF power input was used. The influence of process parameters (power, gas atmosphere) on the optical andmechanical layer properties (transmittance in the visible range, dispersion, infrared absorption, adhesion, crack onset strain) was investigated. In addition different optical layer systems based on conventional material combinations and onpolymer composites were compared.

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ABSTRACTEntry

Tuesday, April 20

9:50 a.m.

O

4

ImprovedMagnesiu

R.R. Willey, Willey Optical,Consultants, Charlevoix,

When Ion Assisted

Tuesday, April 20

9:50 a.m. O 4 Improved

Tuesday, April 20

9:50 a.m. O-4 Improved Magnesium Fluoride Process by Ion-Assisted Deposition

R.R. Willey, Willey Optical, Consultants, Charlevoix, MI; and K. Patel and R. Kaneriya, Astro Optics Pvt. Ltd., Mumbai, India

When Ion Assisted Deposition (IAD) started to appear on the scene, there was great hope that MgF2 could be done withIAD on room temperature substrates and also allow robust AR coating on plastic substrates. The use of IAD for MgF2

on plastics is almost mandatory to get reasonable adhesion and hardness. A review of the history of attempts to use IAD with MgF2 at low temperatures has shown limited success. MgF2 has been and will continue to be an attractive and well used low index material. It has appeared that there is still an opportunity for study and improvement of MgF2

deposition using IAD with respect to absorption, stress, and scattering. The goal of this work has been to produce, on achamber-full production scale, dense and non-absorbing MgF2 films on glass and plastic at temperatures below 100˚Cwhich are equal to or better than those deposited at 250-300˚C without IAD. The effort of this study has been to investigate the realm of IAD variables from 30-100 eV and ion-atom-arrival rates well below the resputtering rates withargon or nitrogen gas, to the extent possible with a broad beam ion source of the End-Hall type.

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ABSTRACTEntry

Optical Coatings

Tuesday, April 20

10:30 a.m.

O

5

Manufacturing of All-

U. Schallenberg, mso jenaMikroschichtoptik GmbH,

Optical remote sensing from air

Tuesday, April 20

10:30 a.m. O 5 Manufacturing

Tuesday, April 20

10:30 a.m. O-5 Manufacturing of All-Dielectric SWIR Band-Pass Filters

U. Schallenberg, mso jena Mikroschichtoptik GmbH, Jena, Germany

Optical remote sensing from air and space utilizes also some channels in the short-wave infrared (SWIR). Thin-film optical filters are applied to select different channels but the application of classical multiple-cavity band-pass filters isimpossible because their additional blocking elements are disallowed due to geometrical or other non-optical reasons. The selection and blocking of radiation in the complete sensitivity region of the used MCT detector, from 800 nm to 2500 nm, has to be provided by a single multilayer system. The spectral region of the SWIR as well as blocking width and depth require necessarily designs with layer numbers up to 100 and overall thicknesses of more than 20 µm. SiO2 and TiO2 were used as thin-film materials deposited with reactive e-beam evaporation under ion assistance in a Leybold SyrusPro box coater. A special challenge was the thickness measurement of the thin films taken by an opticalbroadband monitoring in the VIS range, including the simulation of the monitoring for error checking. The manufacturing of such filters is presented by means of three examples for the center wavelengths of 1375 nm, 1610 nm,and 2190 nm.

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ABSTRACTEntry

Tuesday, April 20

10:50 a.m.

O

6

Studies onZinc Oxide

N.R. Kolli and D. Yuvaraj, Department of

Zinc oxide is animportant wide

Tuesday, April 20

10:50 a.m. O 6 Studies on

Tuesday, April 20

10:50 a.m. O-6 Studies on Zinc Oxide Nanostructured Films by Activated Reactive Evaporation

N.R. Kolli and D. Yuvaraj, Department of Instrumentation, Indian Institute of Science, Bangalore, India

Zinc oxide is an important wide band gap semiconductor material and it has many interesting properties in thin film form, such as wide band gap, large exiton binding energy (60 mV), good pizo-electric properties, optically transparentand electrically conducting. It has many applications including electronics, actuators, optics and optoelectronics. ZnO films with different physical properties and microstructures were deposited on glass and polymer substrates by activated reactive evaporation (ARE). High purity zinc was evaporated in an ionized oxygen generated using a home made cold cathode discharge source. The influence of deposition parameters such as the zinc evaporation rate, the partial pressure of oxygen and the nature of the substrate (glass, polymer) on the morphology of the deposited films hasbeen investigated. ZnO films deposited at high oxygen partial pressures were highly transparent and electrically conducting in nature. ZnO films deposited at high zinc evaporation rate and intermediate oxygen partial pressure resulted in the formation of nano-structured films. Nanostructures with different morphologies such as sea-urchin, marigold, rose and bush were grown on glass substrates at room temperatures by suitably varying the zinc evaporation rate during deposition. The preparation and characterization of the ZnO nanostructures will be presented. Preliminary studies on the possible use of these nanostructured films for applications such as UV detection, field emission, gas sensing, antibacterial coatings, etc., will be reported.

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ABSTRACTEntry

Optical Coatings

Tuesday, April 20

11:10 a.m.

O

7

Some Aspects of

A. Macleod and C. Clark, Thin Film Center, Inc.,

Gain can be introduced into

Tuesday, April 20

11:10 a.m. O 7 Some

Tuesday, April 20

11:10 a.m. O-7 Some Aspects of Gain in Optical Coatings

A. Macleod and C. Clark, Thin Film Center, Inc., Tucson, AZ

Gain can be introduced into optical coating calculations by reversing the sign of the extinction coefficient. This leads tosome interesting effects. The previously forbidden second and third quadrants of the admittance diagram now become accessible and reflectance and transmittance can now exceed 100%. This helps to give insight into the operation of amplifiers and, to some extent, lasers. The situation becomes particularly interesting at oblique incidence and especiallybeyond the critical angle. Here even the smallest gain causes a strange jump in phase that has very important consequences including the complete extinction of a surface plasmon resonance, an enormous response to an exceptionally small stimulus.

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ABSTRACTEntry

Tuesday, April 20

11:30 a.m.

O

8

Is this Specificati

C. Clark, Thin Film Center Inc., Tucson, AZ

Many coating specifications

Tuesday, April 20

11:30 a.m. O 8 Is this

Tuesday, April 20

11:30 a.m. O-8 Is this Specification Reasonable?

C. Clark, Thin Film Center Inc., Tucson, AZ

Many coating specifications include requirements that performance be met under illumination by a cone of light. A response to specification typically involves entering the specification into a coating design program together, perhaps,with a starting design. The program’s optimizer will be used to see if the specification can be achieved. The results mayindicate that the specification cannot be met, or they may show a design that is tantalizingly close to the specification and give hope that an acceptable design can be found. However, the geometric properties of the cone of light place constraints on the set of possible coatings, even to the extent that the set is actually empty, that is, the specification cannot be achieved. This presentation will look at techniques that can be used before attempting a coating design that provide useful information on the practicality of the specification. With these techniques, for certain classes of coatings, we can demonstrate that a specification is impossible to meet, or is very difficult to achieve, without attempting any thin-film design work.

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ABSTRACTEntry

Optical Coatings

Tuesday, April 20

11:50 a.m.

O

9

Anti-Reflection

J.H. Yang, J.I. Jeong, Y.-H.Park, and K. Heo; Research

Silicon oxide and titanium

Tuesday, April 20

11:50 a.m. O 9 Anti-

Tuesday, April 20

11:50 a.m. O-9 Anti-Reflection and High Hardness Coating for Display Windows of Information Devices

J.H. Yang, J.I. Jeong, Y.-H. Park, and K. Heo; Research Institute of Industrial Science and Technology (RIST), Pohang, Korea; and K.-H. Lee and J.W. Park, Research Institute of Industrial Science and Technology (RIST), Ulsan,Korea

Silicon oxide and titanium oxide were coated on a transparent polymer substrate for a display window of information devices, using an e-beam evaporator and sputtering. Then a diamond-like carbon (DLC) thin film was deposited on theoxide films with an ion-beam system. The oxide films were an anti-reflection coating of the substrate, and DLC film was a high hardness coating, which protected the substrate and the oxide films from external scratch. The oxide films were deposited with a sequence of SiO2/TiO2/SiO2/substrate. Thickness of the first silicon and the second titanium oxide film was ~10 nm and that of the last silicon oxide film was ~40 nm. In addition, thickness of DLC film was ~50nm. The transmittance of the substrate, which was non-coated, was ~90 %. The transmittance of substrates coated withcarbon, without oxide films, decreased. However, the substrate coated both carbon and oxides maintained the transmittance of bare substrates. Multilayered oxide and DLC films could be an optical and a protective layer for display windows of mobile information devices.

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ABSTRACTEntry

Tuesday, April 20

12:10 p.m.

OFT

1

End-Hall Ion

V. Zhurin, Colorado Advanced Technology LLC,

Broad beam cylindrical end-

Tuesday, April 20

12:10 p.m. OFT 1 End-Hall Ion

Tuesday, April 20

12:10 p.m. OFT-1 End-Hall Ion Sources with Reduced Heat to a Magnet

V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; and M.-S. Choi, Korea VAC-TEC Co., Ltd., Paju-City, Republic of Korea

Broad beam cylindrical end-Hall ion sources for thin film technology are presented with the magnet isolated by a soft iron cylinder from a hot plasma discharge. Such design permits utilizing various magnets with low and high magnetic fields obtaining ion beams with low and high energy for specific thin film tasks. It is shown that such ion sources are quite stable in various ranges of discharge voltages (energies) with noble and reactive gases. This iron piece serves forprotection, not only from high temperatures, but from the ion beam’s tendency to be accelerated, not only into the exit side of ion source, but into the gas distributor (reflector) side. Measured and estimated temperatures of ion source discharge channel parts are provided. VTC End-Hall ion sources provide a broad range of ion beam mean energies from about 30 eV to about 200 eV and ion beam currents over 1A. With these latest improvements, ion sources are capable of delivering ion beam energies up to 300-500 eV and high ion beam currents up to 5A.

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Tuesday Afternoon

April 20, 2010

Large Area Coating

Tuesday, April 20

1:30 p.m.

L

6

Large Area

V.S. Veerasamy, Guardian Industries Corp., Carleton,

While nano-scale thin films

Tuesday, April 20

1:30 p.m. L 6 Large Area

Tuesday, April 20

1:30 p.m. L-6 Large Area Transparent Conductive Coatings from Carbon Nanotubes and Nanowire Compositeson Glass

V.S. Veerasamy, Guardian Industries Corp., Carleton, MI


While nano-scale thin films made from random meshed networks of carbon nanotubes have been successfully deposited on various transparent substrates, their sheet resistance is still a decade higher than would be practical for photovoltaic devices and other electronic applications. Herein, we report results on solution deposited thin films madefrom chemically altered carbon nanotubes and composites that have stable sheet resistance well below 100 Ohm/sq at avisible transmittance level of above 83.5%. The effect of modifying the carbon nanotubes is verified using thermopower vs. temperature measurements and changes in opto-electronics properties of the altered films due to weathering are studied via using SEM, XPS, Raman and spectral transmittance measurements. We also present preliminary results on two possible short term applications of these altered films on glass, namely capacitive touch sensor electrodes, as well as a functional coating in a fast de-icing/de-fogging device. In both cases these films have thepotential of being viable alternatives to transparent conductive oxides.


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Tuesday, April 20

2:10 p.m.

L

7

Recent Advances

R. Nyderle, B. Heimke, andT. Preußner, Fraunhofer

Sputtering ceramic targets

Tuesday, April 20

2:10 p.m. L 7 Recent

Tuesday, April 20

2:10 p.m. L-7 Recent Advances Depositing Intrinsic ZnO Thin Films by Sputtering Ceramic ZnO Targets

R. Nyderle, B. Heimke, and T. Preußner, Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden, Germany

Sputtering ceramic targets for the deposition of ZnO thin films provides some advantages compared to the reactive sputtering of metallic Zn targets in the presence of an argon/oxygen atmosphere. Competitive deposition rates can be achieved by sputtering ceramic targets using single cathode configuration without the necessity of a process control of the reactive gas content. It is widely common to deposit intrinsic ZnO layers by RF sputtering because of the low conductivity of ceramic ZnO sputter targets. In this paper recent advances from the deposition of intrinsic ZnO thin films by magnetron sputtering using ceramic targets will be presented. We have evaluated electrical and optical thin film properties of ZnO layers on float glass substrates deposited from an i-ZnO target. DC, pulsed DC (p-DC, 45 kHz)and RF-superimposed DC power (RF, 13.56 MHz) have been applied. The results of our study demonstrate the successful use of a new ceramic i-ZnO target for the deposition of intrinsic ZnO layers by DC and p-DC sputtering. Electronic thin film properties vary with the applied powering mode.

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Large Area Coating

Tuesday, April 20

2:30 p.m.

L

8

Developments in

G. Wityak, Academy Corporation, Albuquerque,

Silver rotary targets are

Tuesday, April 20

2:30 p.m. L 8 Developments

Tuesday, April 20

2:30 p.m. L-8 Developments in Silver Rotary Target Design and Application in Large Area Coatings

G. Wityak, Academy Corporation, Albuquerque, NM

Silver rotary targets are finding more applications in large area coatings, driven by demand for faster line speeds and lower cyclical costs. Recent developments in target production have provided greater design flexibility in both monolithic as well as bonded sleeved designs. Each of these designs have their attributes in terms of cost, technical merit, target life and film performance.

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Tuesday, April 20

2:50 p.m.

L

9

Cold Cathode

G. Mattausch, P. Feinaeugle, and F.-H.

Electron beamsare known to be

Tuesday, April 20

2:50 p.m. L 9 Cold Cathode

Tuesday, April 20

2:50 p.m. L-9 Cold Cathode Electron Beam Sources for High-Rate PVD and Beyond

G. Mattausch, P. Feinaeugle, and F.-H. Roegner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP,Dresden, Germany

Electron beams are known to be powerful and versatile tools for evaporation of various kinds of materials. Because of the sophistication of conventional electron beam technology based on thermionic emitters, its costs may be too high forsome applications. A simple but efficient alternative electron source with a cold cathode has been developed, tested andoptimized for industrial applications. Inside this electron gun, a High-Voltage-Glow-Discharge is sustained. Ions from the plasma are accelerated in the cathode fall and hit the cathode thus releasing secondary electrons. These electrons gain energy on the reverse path, and the plasma acts as a transparent anode to let the formed beam pass towards the process site. Besides the greatly simplified mechanical design and electric supply circuitry, cost reductions also result from the fact that the beam source does not require differential high-vacuum pumping. Understanding the interaction ofcathode material and plasma work gas as well as the handling of arc phenomena are crucial for stable operation of the source and have been subjects of our investigations. Several findings on the way towards an industry-ready tool will bepresented. As an example for utilizing the new EB sources in high-rate PVD applications, the coating of plastic substrates with copper will be reported. The work principle of the new electron sources holds promise for gaining benefits also in other EB applications beyond PVD. Some of them will be introduced as a survey of ongoing research.

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Tuesday, April 20

1:30 p.m.

HP

11

Coated Regenerat

A.P. Ehiasarian, Nanotechnology Centre for

Space-bourne astronomy and

Tuesday, April 20

1:30 p.m. HP 11 Coated

Tuesday, April 20

1:30 p.m. HP-11 Coated Regenerator Mesh for Closed Cycle Cryocoolers Operating at 10K

A.P. Ehiasarian, Nanotechnology Centre for PVD Research, Sheffield Hallam University, United Kingdom; and M.R.Crook, Rutherford Appleton Laboratory, Didcot, United Kingdom

Space-bourne astronomy and cosmology missions and space-based Earth observations are extensively utilised already and are becoming increasingly important. The detectors aboard many of the spacecraft and satellites operate at cryogenic temperatures provided by miniature Stirling cycle cryocoolers that reach temperatures of around 20 K. However, the increasing complexity of satellites demands ever lower temperatures and this is best achieved by improving the effectiveness of the regenerative heat exchanger in the cooler. Conventional regenerator materials suchas 304 stainless steel mesh reduce their specific heat capacity cp at low temperature. Materials such as Er and ErNi alloys exhibit significantly higher cp than steel below 20 K, however, they are very difficult to work with in bulk form.Stainless steel meshes were coated by Er and ErNi. The meshes were pre-treated in a high power impulse magnetron sputtering (HIPIMS) plasma with high metal ion-to-gas ion ratio. Coatings with thickness of 10 µm were deposited byconventional sputtering and HIPIMS. The formation of ErNi phase was confirmed by x-ray diffraction analysis and thechemical composition by energy-dispersive x-ray spectrometry. Limited micro-cracking of the coating was observed when bending coated mesh to 90 and 180 degrees. Thermal cycling tests between room temperature and 77 K (liquid nitrogen) showed no coating spallation after five cycles. Cryocooler tests were carried out to evaluate the performanceof the coated mesh. Verbose invited

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Tuesday, April 20

1:50 p.m.

HP

12

Characterisation of

H. Gerdes, R. Bandorf, K. Kodlubaj, and G. Bräuer,

In recent years different highly

Tuesday, April 20

1:50 p.m. HP 12 Characterisati

Tuesday, April 20

1:50 p.m. HP-12 Characterisation of Highly Ionized Pulsed Plasma Processes (HIPP-Processes) Using a Retarding Field Analyzer (RFA) and Optical Emission Spectroscopy (OES)

H. Gerdes, R. Bandorf, K. Kodlubaj, and G. Bräuer, Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

In recent years different highly ionised pulse plasma technologies like high power impulse magnetron sputtering (HiPIMS) and modulated pulse plasma sputtering (MPP) have emerged. A direct correlation of plasma properties for acomparable average operating power of both technologies is not yet reported. Therefore, for different target materials (Cu, Cr, Al) the characteristic discharge pattern of voltage and current using HiPIMS and MPP were measured. For both comparable average operating power and fixed charging voltage of the different power supplies the ion flux at substrate position and the plasma emission by optical emission spectroscopy were measured. The results will be discussed in terms of the ionisation and the arriving flux for the different technologies.

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Tuesday, April 20

2:10 p.m.

HP

13

Control ofReactive

M. Audronis, V. Bellido-Gonzalez, and B. Daniel,

High Power Impulse

Tuesday, April 20

2:10 p.m. HP 13 Control of

Tuesday, April 20

2:10 p.m. HP-13 Control of Reactive High Power Impulse Magnetron Sputtering Processes

M. Audronis, V. Bellido-Gonzalez, and B. Daniel, Gencoa Ltd., Liverpool, United Kingdom

High Power Impulse Magnetron Sputtering (HIPIMS) is a technologically important Physical Vapour Deposition process that is able to provide a highly ionised flux of sputtered species. It is thought to be particularly important for applications where there is a need to coat 3D features, e.g., vias and trenches in semiconductor industry. HIPIMS may have other added benefits, as compared to DC or medium frequency AC/pulse-DC magnetron sputtering, related to enhanced coating structure-property relationship control through self-species ion assistance. Many of the technologically important thin films, e.g., transparent conductive oxides, permeation barriers, hard wear-resistant metalnitride coatings, etc., are sputtered from metal targets in a reactive gas atmosphere, usually Ar + O2 or N2, to ensure industrially relevant coating deposition rates. Enhanced structure-property relationship control of these thin film materials is highly desirable; hence, it is desirable to apply HIPIMS in a reactive deposition mode. Trials of reactive HIPIMS, however, have indicated that the control of this process using conventional means, such as conventional plasma emission monitoring (PEM) is difficult. Thus, the application of reactive HIPIMS is rather limited and the potential benefits are not realised, especially in the areas where precise process control is required. In this paper, reactive HIPIMS processes are investigated and various control options evaluated. The recently developed PEM based reactive HIPIMS control method is reported. Performance of the new technique is compared to that of the conventionalPEM, Penning-PEM and λ-sensor based methods. It is shown that conventional PEM is not suitable to control reactiveHIPIMS, while constant reactive gas flow method does not lead to a stable deposition process. The new PEM based process control technology was shown to provide precise control and stable operation of reactive HIPIMS discharges anywhere within the hysteresis loop. The new PEM technology was also found to be superior when compared to oxygen partial pressure control based techniques.

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Tuesday, April 20

2:30 p.m.

HP

14

New Developm

R. Chistyakov and B. Abraham, Zond, Inc.

Modulated pulsepower (MPP)

Tuesday, April 20

2:30 p.m. HP 14 New

Tuesday, April 20

2:30 p.m. HP-14 New Development in Modulated Pulse Power Deposition of Aluminum Oxide and Aluminum Nitride Films

R. Chistyakov and B. Abraham, Zond, Inc./Zpulser, LLC, Mansfield MA

Modulated pulse power (MPP) sputtering is a versatile high power pulse magnetron sputtering technique in which therecan be multiple voltage steps within a pulse. In this study, multiple voltage steps have high amplitude voltage oscillations. It was found that at a certain level of voltage oscillations, amplitude, and frequency it is possible to sustainarc free discharge in reactive gas environment. A special plasma generator with adjustable voltage, oscillations, amplitude, and frequency was developed. The maximum output voltage is 1400V. Aluminum oxide and aluminum nitride films have been reactively deposited with new approach in arc free mode. The deposition rate, film structure, orientation, and mechanical properties were analyzed and measured, and the results of the film property measurementswill be presented.

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Tuesday, April 20

2:50 p.m.

HP

15

Characteristics of

D.-H. Park, J.-W. Choi, andW.-K. Choi, Korea Institute

Since HIPIMS was introduced

Tuesday, April 20

2:50 p.m. HP 15 Characteristic

Tuesday, April 20

2:50 p.m. HP-15 Characteristics of AL-Doped ZnO Thin Film by HIPIMS (High Power Impulse Magnetron Sputtering) with an Unbalanced Magnetic Field

D.-H. Park, J.-W. Choi, and W.-K. Choi, Korea Institute of Science and Technology, Seoul, Korea

Since HIPIMS was introduced in the late 1990s, it has been researched for the enhancement of hardness and adhesion of oxide and nitride thin films in reactive sputtering. We studied feasibility of the HIPIMS application using an oxide target for transparent conducting oxide layer in terms of film resistance, transmittance, crystallinity and morphology. Incomparison to a conventional RF sputtering process with the same working pressure, HIPIMS shows a low sputtering speed; but a deposited AZO film has very low surface roughness, about 1 nm, and similar transmittance of 85% at a 550 nm wavelength. When the frequency is decreased from 240 Hz to 120 Hz, the sputtering speed is lowered by 50%,but specific resistance is enhanced from 1×10-1 ohm·cm to 7×10-3 ohm·cm. With low frequency sputtering, its lattice parameter is reduced and residual compressive stress declines about 30%. In addition, the unbalanced magnetic field effect is also studied. With an electromagnetic winding coil changing outside the magnetic field, magnetic field to substrate is extended effectively and its coil current is optimized by a magnetic filed simulation code.

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Tuesday, April 20

3:10 p.m.

HP

16

Low Pressure

P. Poolcharuansin and J.W.Bradley, University of

A technique of low-power pre-

Tuesday, April 20

3:10 p.m. HP 16 Low Pressure

Tuesday, April 20

3:10 p.m. HP-16 Low Pressure HIPIMS Operation Using a Pre-Ionizer Technique

P. Poolcharuansin and J.W. Bradley, University of Liverpool, Liverpool, United Kingdom


A technique of low-power pre-ionization via an auxiliary (simmer) DC power supply has been developed for high power impulse magnetron sputtering (HIPIMS) to produce high-dense plasma operated at low pressure conditions. Thesimmer supply with a fixed negative output-voltage of 1000V providing a low density (109cm-3) background plasma allows subsequent HIPIMS conditions to be established immediately on application of the extra HIPIMS voltage at pressures as low as approximately 0.7 mTorr. It was found from the discharge voltage-current characteristics that the carbon plasma changes to the HiPIMS mode when current density is larger than 1 Acm-2 at a pressure range of about 0.7-1 mTorr. The electron density up to 1012 cm-3 and the high intensity of C·II emission line as well as the extension inthe energetic tail up to 40V of the normalized IEDFs for C+ and Ar+ ions can be observed at the low pressure range.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

1

Characterization of

J.-K. Kimm, S. Lee, J.-Y. Lee, and D.-G. Kim, Korea

Magnetic filter systems for

Tuesday, April 20

3:30 p.m.- Poster 1 Characterizati

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-1 Characterization of Beam Plasma Properties of T-Shape Filter Vacuum Arc System

J.-K. Kimm, S. Lee, J.-Y. Lee, and D.-G. Kim, Korea Institute of Materials Science, Chang-Won, South Korea

Magnetic filter systems for reducing macro particle in filter vacuum arc systems(FVAS) became important technology in industrial applications. The optimization of magnetic flux inside the chamber is the main issue to take advantage of arc discharge at a high plasma density. In this paper, ion beam extraction properties of a 90 degree filter vacuum arc system were investigated. The filter arc system consisted of five coils to extract charged particles without neutral macroparticles from the arc cathode. In order to find the optimum coil current combination, the geometry of the magnetic fluxwas simulated using a numerical method (FEMM 4.2) and ion current density distribution was also measured using nine points Faraday cup, which can measure ion current density distribution of a disk, 16 cm in diameter. Using a Taguchi method, weight factors of five coils to align the center of ion beam were investigated. The arc cathode was carbon and discharge gas was argon. The maximum ion current density was obtained as 2.5 mA·cm2 and the depositionuniformity shows below 6% in range of 15 cm diameter. The ion current density distribution shows a similar trend withdeposition thickness. The ion current density is proportional to arc current and 1/pressure linearly.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

2

Improvement of

B.C. Jarvis, J. Villanueva, D.M. Mihut, and K. Lozano,

The present research is

Tuesday, April 20

3:30 p.m.- Poster 2 Improvement

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-2 Improvement of Polymer/Carbon Nanofiber Composite Shielding Effectiveness viaThermal Evaporation of Metal Thin Films

B.C. Jarvis, J. Villanueva, D.M. Mihut, and K. Lozano, Department of Mechanical Engineering, The University of Texas Pan American, Edinburg, TX

The present research is investigating the surface modification scheme of Polymer/Carbon Nanofiber (PE/CNF) composite substrates by thin films deposition. The thermal evaporation system is used for depositing different monolayer and multilayer structures of metal. The influence of the deposited metal film structures upon electromagnetic interference (EMI), shielding effectiveness (SE), percolation, and also mechanical properties are investigated. Measured shielding performance is compared with expected values obtained from a model of shielding effectiveness of multilayered structures and with other analytical models obtained from literature.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

3

Effect of Material

J.M. González, M.F. Cano, J.S. Restrepo, A. Ruden,

Ti-Al-N coatingshave been

Tuesday, April 20

3:30 p.m.- Poster 3 Effect of

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-3 Effect of Material Ball on Tribological Properties of Ti-Al-N Coatings Deposited by Magnetron Sputtering Technique

J.M. González, M.F. Cano, J.S. Restrepo, A. Ruden, and F.O. Sequeda, Laboratorio de Recubrimientos Duros, Universidad de Valle, Cali, Colombia

Ti-Al-N coatings have been deposited by Reactive Magnetron Sputtering on AISI H13 steel substrates to study the influence of ball material on Pin on Disc tests, at different loads and speeds. The parameters evaluated were 1N load and 10 cm/s speed (standard conditions), 1N load and 20 cm/s speed (high speed condition) and 3N load and 10 cm/s speed (high load condition). The Ball on Disc test was stopped each 1000 laps to measure the worn area finding wear coefficient. The results showed that when the ball hardness is increased the friction coefficient (COF) decrease, the wear coefficient showed tendencies in all tests, the sample worn by a 100Cr6 ball presents the higher wear, followed byAl2O3 ball and WC ball for all conditions. Although, the Hertzian stress analysis showed that increasing ball hardness increases Hertzian stress.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

4

Rapid Synthesizi

E. Yassitepe and S.I. Shah,Department of Materials

A fast synthesizing

Tuesday, April 20

3:30 p.m.- Poster 4 Rapid

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-4 Rapid Synthesizing Route to Form CuIn1-xGaxSe2 Compounds by Tip Sonication for Solar Cell Applications

E. Yassitepe and S.I. Shah, Department of Materials Science and Engineering, University of Delaware, Newark, DE

A fast synthesizing technique will be described to obtain single phase CuIn1-xGaxSe2 (x=0 to 1) particles by dissolving elemental powders of Cu, In, Ga and Se in a solvent and drop casting. The technique is based on adding elemental powders in the necessary ratio and 2-cyanopyridine solvent in a reaction vial then tip sonicating for two minutes. Afterthe tip sonication, suspension is formed and drop casted on substrates such as glass, ITO coated glass. Films were subsequently annealed in Ar atmosphere at temperatures up to 500°C. Crystal structure, particle morphology, and elemental analysis of samples were carried out by X-ray diffraction, (XRD) scanning electron microscopy, (SEM), andenergy dispersive spectroscopy (EDS). Results indicate that Cu, In, Ga and Se particles are highly soluble in the solventby tip sonication and single phase structure is obtained from the annealed samples. EDS analysis shows that the films are stoichiometric and the distribution of the elements is uniform in the samples. However copper has a dramatic effecton the structure. For example, changing the fixed ratio from Cu0.9In0.5Ga0.5Se2 to Cu1In0.5Ga0.5Se2 results in a decrease inSe atomic concentration from 51% to 43% throughout the sample. Electrical and optical properties of the films will also be discussed.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

6

Influenceof Post-

B.S. Yang, M.S. Huh, S. Oh,B.D. Ahn, J. Lee, J.H. Kim,

Currently, oxidesemiconducting

Tuesday, April 20

3:30 p.m.- Poster 6 Influence of

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-6 Influence of Post-Annealing Conditions on the Performances of Zinc Tin Oxide Thin-Film Transistors

B.S. Yang, M.S. Huh, S. Oh, B.D. Ahn, J. Lee, J.H. Kim, and H.J. Kim, Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, Seoul National University, Seoul, Korea

Currently, oxide semiconducting materials are expected to serve in advanced optoelectronic applications such as active-matrix liquid crystal display (AMLCD), active-matrix organic light-emitting diodes (AMOLEDs), and flexible and transparent displays. For that reason, it was essential to study the behaviors of thin film transistors with oxide semiconductors. Many researchers have tried to improve the properties of channel layers by using oxide materials suchas GIZO, IZO, ZnO, SnOx and ZTO. ZnSnO (ZTO) is one of the promising oxide semiconducting materials because ofa wide band gap (e.g. : 3.3 ~ 3.9 eV) and n-type semiconducting behavior. In this study, bottom gate TFTs were fabricated on a SiO2/p+-Si substrate by using sputtered ZTO as a channel layer and sputtered ITO as a source/drain electrode. We report the performance of ZnSnO TFTs on the post-annealing conditions. The devices work in the enhancement mode and exhibit good saturation mobility, on-off ratios, and sub-threshold slope. The transfer characteristics of TFTs are closely related to the post-annealing temperature. The performance of the ZTO TFTs wouldbe improved with the increase of the post-annealing temperature, which could result in the enhancing on contact and channel resistance properties.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

7

The Influence

W.L. Liung, J.-Y. Wu, and C.-F. Ai, Institute of Nuclear

For improving film properties

Tuesday, April 20

3:30 p.m.- Poster 7 The Influence

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-7 The Influence of Different Substrate Bias Sources on Film Adhesion in the HIPIMS System

W.L. Liung, J.-Y. Wu, and C.-F. Ai, Institute of Nuclear Energy Research, Longtan, Taiwan

For improving film properties of high power impulse magnetron sputtering (HIPIMS) systems, the relation between film adhesion and different substrate bias has been investigated using a high power (SPIK1000A, limit 100A) and conventional power (15 KW, limit 15A) supply as a substrate bias source. A HIPIMS system used in this study is composed of a DC power supply (40 KW, 1000V) and a pulse controller (SPIK2000A, limit 2000A). The procedure ofTiN deposition is sequenced in substrate bombardment, Ti buffer layer and TiN deposition in Ar/N2 plasma. In all experiments the parameter for high power source of Ti target is fixed. During all processes, the pulse current and voltage of the substrate bias were observed by an oscilloscope. The adhesion of coating films was analyzed by a scratchtester. The results show that the bias voltage is unchanged when a high power source applied to substrate. The other bias voltage could severely fall to a value of near ground position due to impact of high density plasma from HIPIMS target source when using traditional power as bias source. Therefore, a compatible power source used as a substrate bias in a HIPIMS system is very important for achieving an excellent film.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

8

Laser Structurin

H. Neumann, A. Winkler, and R. Thielsch, Southwall

IR-reflecting (IRR) glazing in

Tuesday, April 20

3:30 p.m.- Poster 8 Laser

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-8 Laser Structuring of IR-reflective Coatings on Flexible Substrates for AutomotiveApplications

H. Neumann, A. Winkler, and R. Thielsch, Southwall Europe GmbH, Grossroehrsdorf, Germany; and M. Lasch, 3D-Micromac AG, Chemnitz, Germany (Poster presented by A. Wahl, Southwall Europe GmbH, Grossroehrsdorf, Germany)

IR-reflecting (IRR) glazing in cars, commonly available for increased driving comfort, is limiting the use of various sensors and electronic devices requiring RF transparency of the glazing. As IRR glazing consists of dielectric – metal –dielectric layer stacks coated directly on glass or on Polyester film laminated between two glass panes, with silver as the primary constituent in the metallic layers, this coating acts as an RF shielding. By partial removing of this coating in a pattern, the RF transparency of the coating can be achieved without destroying of the thin Polyester film. This partial removal can be achieved by the use of modern laser technology, e.g., ultra short pulse laser systems or lasers with short wavelengths.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

9

Fabrication of the

J.-S. Kim and J.-H. Yoon, University of Seoul, Seoul,

For hydrogen gas

Tuesday, April 20

3:30 p.m.- Poster 9 Fabrication of

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-9 Fabrication of the Micro Gas Sensor for Hydrogen Detection using MEMS Technology

J.-S. Kim and J.-H. Yoon, University of Seoul, Seoul, Korea

For hydrogen gas applications, as combustion or fuel in fuel cells, a reliable hydrogen sensor was needed to detect a leakage from storage and transportation as well as to monitor the concentration over a wide range. In this study, a highly sensitive hydrogen gas sensor was designed and fabricated using the MEMS (micro electro mechanical systems)process. The dimensions of the fabricated hydrogen gas sensor was 5 mm × mm and sensing layer were deposited in the middle of the device. The insulating layer (silicon nitride) was deposited by using LPCVD on an n-type Si wafer formembrane formation and backside Si etch stop. A platinum thin film was patterned for the sensing electrode and the micro heater. SiO2 thin films deposited by using PECVD were patterned to form a passivation layer, and sensing layer (palladium) was fabricated by RF magnetron sputtering. The temperature of the micro heater was found to increase well linearly with increasing heater voltage. The hydrogen gas sensor showed a very high sensitivity in the range of lowhydrogen concentration. The hydrogen sensing properties will be discussed in detail.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

10

Time-Resolved

D.N. Ruzic, Center for Plasma-Material Modulated pulse

power (MPP)

Tuesday, April 20

3:30 p.m.- Poster 10 Time-

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-10 Time-Resolved Plasma Characterization in Modulated Pulse Power (MPP) Magnetron Sputtering

D.N. Ruzic, Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, Urbana, IL; A.N. Cloud, Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, IL; andL. Meng, R.E. Flauta, and M.J. Neumann, Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, Urbana, IL

Modulated pulse power (MPP) technology is a derivative of high power pulsed magnetron sputtering (HPPMS) that canbe used to apply an arbitrary voltage waveform to the cathode. The degrees of freedom offered by this technique allowadditional process control during sputtering. Past investigations of MPP have only revealed time-averaged plasma parameters. The authors are now able to generate time-resolved measures of electron density and temperature in a MPP discharge. Discharges in a sputtering tool featuring a 1000 cm2 circular planar magnetron were characterized using a triple Langmuir probe. The plasma was determined to have an average electron temperature of 20 eV ±5 eV and electron densities on the order of 1011 cm-3 during the pulse. These properties are mapped at varying distances from the sputter target. Electron temperature shows little or no dependency on this distance, while density increases near the target. The electron energy distribution function is found to be non-Maxwellian. A gridded energy analyzer and quartz crystal microbalance were used to measure a higher ionization fraction of sputtered titanium than with conventional DC magnetron sputtering under a variety of deposition conditions. Ti ions were shown to have low energies of 2 eV or less.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

11

Growth Behaviors

S.-J. Won, Department of Materials Science and

Silicon oxide (SiO2) is one of

Tuesday, April 20

3:30 p.m.- Poster 11 Growth

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-11 Growth Behaviors and Electrical Properties of Silicon Oxide in Atomic Layer Deposition Using Bis(ethyl-methyl-amino)silane

S.-J. Won, Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, Republic of Korea and Advanced Process Development Team, Samsung ElectronicsCo. Ltd., Gyeonggi-Do, Republic of Korea; and S. Suh, M.S. Huh, Y.J. Choi, and H.J. Kim, Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, Republic of Korea

Silicon oxide (SiO2) is one of the most important materials in the semiconductor industry and its importance has attracted renewed attention. For example, SiO2 films with a low growth temperature and/or excellent qualities have been studied as a gate spacer, gap-fill oxide in STI (shallow trench isolation), an insulating layer in TSV (through silicon via), a sacrificial layer for the fabrication of three-dimensional (3-D) capacitor bottom electrodes, and a layer deposited on a photo resist to reduce the pattern pitches in nano-scaled semiconductor devices. For these applications, low temperature silicon oxide (LTSO) grown by atomic layer deposition (ALD) was proposed. ALD has been spotlighted as a promising film deposition method for dielectrics and metals because of low deposition temperature, excellent film qualities, and high conformality on 3-D structures. Recently, heteroleptic metal-organic precursors suchas SiH2[N(CH3)2]2, SiH[N(CH3)2]3, Si[N(CH3)(C2H5)]4, and SiH2[N(C2H5)2]2 have been studied instead of silicon chloridesources which have issues such as excessive particle formation, residual chlorine, and impurities in the film. Here, we report atomic layer deposition of SiO2 using SiH2[N(C2H5)(CH3)]2 with two hydrogen and two amino ligands. The use of ozone or water vapor as a reactant gas showed very different growth behaviors.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

12

Silver andAluminum

J. Kousal and O. Polonskyi,Department of

Ion cluster beams that are

Tuesday, April 20

3:30 p.m.- Poster 12 Silver and

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-12 Silver and Aluminum Oxide Nanocluster Films Prepared Using Simple Gas Aggregation Source

J. Kousal and O. Polonskyi, Department of Macromolecular Physics, Charles University, Prague, Czech Republic; J. Hanus, European Commission Joint Research Centre, Ispra, Italy; P. Solar, M. Drabik, A. Choukourov, and O. Kylian,Department of Macromolecular Physics, Charles University, Prague, Czech Republic; J. Pesicka, Department of Physics of Materials, Charles University, Prague, Czech Republic; I. Matolinova, Department of Surface and Plasma Science, Charles University, Prague, Czech Republic; E. Kolibalova, TESCAN s.r.o., Brno, Czech Republic; and D. Slavinska and H. Biederman, Department of Macromolecular Physics, Charles University, Prague, Czech Republic

Ion cluster beams that are operated in UHV systems and that are mass separated are often used for deposition of nanocluster films. In our case, a simple and compact gas aggregation source based on a planar magnetron (Haberland type) without mass separation was designed and placed into ordinary HV chamber. In this case cluster beam is composed of both charged and neutral clusters, however, resulting depositon rate is high. The source operates with thecircular magnetron equipped with 80 mm silver and/or aluminium targets. Argon was used as a working gas at pressures ranging from 30 to 120 Pa at flow rates up to 10 ccm/min. The optimized pressure and Ar flow were higher and less critical for the preparation of the silver clusters than in the case of aluminium. In addition the aluminium clusters were strongly oxidized. Using TEM and SEM the size of the clusters was determined to be in the range of 5-50nm. Nanocluster films were deposited on various substrates (glass, Si, etc.) in dependence on magnetron current, Ar pressure and its flow. Surface morphology was studied using AFM and SEM and composition by XPS. Possible applications are discussed.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

13

Modified Structure

R. Bandorf, D. Loch, and G.Bräuer, Fraunhofer

Gas flow sputtering GFS

Tuesday, April 20

3:30 p.m.- Poster 13 Modified

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-13 Modified Structure and Properties of NiFe Films by Ionised Pulse Power Gas Flow Sputtering

R. Bandorf, D. Loch, and G. Bräuer, Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

Gas flow sputtering GFS offers an alternative to electroplating for deposition of magnetic films. Due to the hollow cathode used, no additional magnets for improvement are required. Improvement of the process was expected when running the GFS sources with a pulsed power supply. For the presented investigations a modulated pulse power supplywas used to drive the GFS source to create highly ionised pulse plasma gas flow sputtering HIPP-GFS. The experiments were carried out with an applied average DC power of 2 kW to the GFS sources. The deposition rate of theHIPP-GFS process exceeded the conventional rate by 25%. The resulting film structure was an improved columnar growth in case of HIPP-GFS and a 200 texture of the films from 90% compared to 70% for the conventional process. Furthermore, the magnetic film properties were modified.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

14

Design and

Z. Li, X. Du and J. Ding, Institute for Chemical

Polymeric solarcell materials

Tuesday, April 20

3:30 p.m.- Poster 14 Design and

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-14 Design and Fabrication of Organic Solar Cell from a Low Band Gap Semi-Conducting Polymer

Z. Li, X. Du and J. Ding, Institute for Chemical Process and Environmental Technology (ICPET), National Research Council of Canada (NRC), Ottawa, Canada

Polymeric solar cell materials have drawn much research attention recently due to their low cost and broad commercialapplication potentials. Most of these polymers contain an alternating conjugated structure of an electron donor (ED) unit and an electron acceptor (EA) unit. This D/A structure can effectively lower the band gap of conjugated polymers,which is very important, especially for solar cell applications, where the polymer absorption should be fine-tuned to match solar spectrum. In this presentation, a low band polymer based on alkyl side chain attached benzo[1,2-b;3,4-b]dithiophene (BDT, ED) and 3,6-dithiophen-2-yl-2,5-dihydropyrrolo[3,4-c]pyrrole-1,4-dione (DPP, EA) was designed and synthesized. Combined with soluble fullerene, a bulk hetero junction (BHJ) active layer was spin coated on ITO patterned glass substrate. Then thin layers of LiF (1 nm) and Al (100 nm) were deposited on top of the active layer (with a mask) using vacuum evaporator. Initial performance test shows promising results. The effect of LiF layer’s thickness is also studied.

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Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

15

Synthesisand

J.S. Restrepo, M.I. Serna, J.M. Gonzalez, F. Sequeda,

Aluminum-silicon nitride

Tuesday, April 20

3:30 p.m.- Poster 15 Synthesis and

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-15 Synthesis and Characterization of Aluminum-Silicon Nitride films Produced by Reactive Magnetron Sputtering

J.S. Restrepo, M.I. Serna, J.M. Gonzalez, F. Sequeda, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales (RDAI), Universidad del Valle, Cali, Colombia

Aluminum-silicon nitride films have been deposited by reactive (Ar+N2) magnetron sputtering using the nitrogen flowas a process parameter. Their effect on structural, mechanical and tribological properties was investigated using X-ray diffraction, Fourier Transform Infrared (FTIR) technique, nanoindentation and pin on disk tribometer. The results showed an increase in the mechanical properties as nitrogen flow is increased. X-ray diffraction analysis indicated an amorphous structure in all samples, The FTIR analysis showed absorption band typical (AlSi)N films consisting of broad band center at 681 cm-1, together with and absorption shoulder at 920 cm-1. The friction coefficient and wear rateshowed a decreased as the nitrogen flow increased due to improvement of mechanical properties. The oxidation resistance was studied observing the superficial and chemical changes by SEM-EDS and FTIR. After annealing the films at 900˚C on air, the coatings presented a higher oxidation resistance but films become more transparent.

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Poster Session

Tuesday, April 20

3:30 p.m.-6:00 p.m.

Poster

16

Tribological and

F. Sequeda, Laboratorio deRecubrimientos Duros y

TiN/CrxN

Tuesday, April 20

3:30 p.m.- Poster 16 Tribological

Tuesday, April 20

3:30 p.m.- 6:00 p.m. Poster-16 Tribological and Mechanical Properties of Multilayer TiN/CrxN Coatings Deposited by Reactive Magnetron Sputtering

F. Sequeda, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales (RDAI), Universidad del Valle, Cali, Colombia; F. Correa, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales (RDAI), Universidad del Valle,Cali, Colombia and Grupo de Ciencia e Ingeniera de Materiales (GCIM) Universidad Autónoma de Occidente, Cali, Colombia; M.F. Cano and J.S. Restrepo, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales (RDAI), Universidad del Valle, Cali, Colombia

TiN/CrxN multilayers, consisting of alternating nanometer-scale TiN and CrxN layers, were deposited by the reactive magnetron sputtering technique on 4140 tool steel, with the objective to study the effect of bilayers numbers (period λ)on tribological and mechanical properties. The monolayer TiN and CrxN were also deposited in the same conditions and used as reference. Multilayers were characterized using x-ray diffraction, nanoindentation, scratch test and pin on disc testing. The hardness of multilayer first increased rapidly with a number of layer increase, followed by a continuous decrease, giving rise to a maximum at 110 bilayer. Higher hardness corresponds to larger H3/E2 ratio, whichis an indication of plastic deformation resistance. The coefficient of friction of the multilayers againt alumina ball counterpart is in the range of 0.81 and 1.10, lower than for a standard TiN (1.26) coating. The lower coefficients of friction correspond to the enhancement of hardness and possible promotion of formation of the dense CrxYy oxide layer.To better understand the wear mechanism involved under dry sliding conditions of these multilayers, the worn surfaceof coating were analyzed using an optical microscopy and profilometry. The anomalous wear rate behavior could be explained taking into account interfacial changes such as an incoherent interface formation when the number of layers is higher, producing changes in the wear mechanism.

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Wednesday Morning

April 21, 2010

Symposium on Cleantech Energy

Wednesday, April 21

8:30 a.m.

CT

1

Thin Filmsin

W. Hoffmann, Applied Materials GmbH and Co.,

The contributionof the

Wednesday, April 21

8:30 a.m. CT 1 Thin Films in

Wednesday, April 21

8:30 a.m. CT-1 Thin Films in Photovoltaic Products

W. Hoffmann, Applied Materials GmbH and Co., KG, Alzenau, Germany and President, EPIA (European PhotovoltaicIndustry Association)


The contribution of the technology development for thin films to the growth of the PV industry, both c-Si wafer based and thin film products, will be described. Technology development will include various cell architectures to improve efficiency for the different technologies as well as new processes and equipment to achieve the necessary cost reductions. Based on price experience curves for both technology types, the future module price development will be discussed. Together with the total system price development, the contribution of PV towards Europe's 20-20-20 goals in their 2020 directive is emphasized.


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Wednesday, April 21

9:10 a.m.

CT

2

Challenges and

B. Rech, Helmholtz-Zentrum, Berlin, Germany

Renewable energy sources

Wednesday, April 21

9:10 a.m. CT 2 Challenges

Wednesday, April 21

9:10 a.m. CT-2 Challenges and Perspectives of Thin Film Photovoltaics

B. Rech, Helmholtz-Zentrum, Berlin, Germany


Renewable energy sources will play a key role to satisfy future energy demands. The contribution of solar electricity generation by photovoltaics increases rapidly, but further cost reductions are imperative. Thin-film technologies bare the potential to provide the required cost reduction and, thus, huge investments were made world-wide into a multiplicity of new production plants relying either on thin-film silicon (amorphous, microcrystalline or poly-crystalline Si), CdTe or Cu(In,Ga)(S,Se)2 based solar cells. Note that high quality coating technologies are the key to fulfil the required performance and cost requirements. The present contribution gives an overview about the most advanced thin-film solar cell technologies, highlights recent developments in industry and, finally, discusses challengesfor research and development to meet the future cost and efficiency targets.


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Wednesday, April 21

9:50 a.m.

CT

3

Thin FilmPV: 100%


Dominant thin film PV

Wednesday, April 21

9:50 a.m. CT 3 Thin Film PV:

Wednesday, April 21

9:50 a.m. CT-3 Thin Film PV: 100% Inspection of Incoming Glass Panels


Dominant thin film PV processes include CIGS and CdTe. Most processes utilize glass substrates. Glass panels, which enter the PV plant are typically 3.2 mm float glass. While float glass producers typically inspect glass for defects of 500 µm or greater, small float glass defects can wreak havoc with a solar panel. A 100 µm bubble will causea laser scribe to spread, deflect or be absorbed; in all cases the scribe is damaged and the panel efficiency is decreased.Other glass panel properties which further complicate the PV production challenge include glass warp, edge defects, broken corners, flairs, top tin, handling scratches, TCO defects, washer debris, haze and length, width and squareness measurements. Bottom line: The glass panel must be inspected prior to adding value. After washing, new laser-cameratechnology provides 100% inspection of the panel for all the aforementioned defects and measurements, providing defect maps and rejecting lites which fall outside acceptable quality limits.

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Wednesday, April 21

10:30 a.m.

CT

4

High RateDeposition

Y. Shigesato, Aoyama Gakuin University,

Transparent conductive

Wednesday, April 21

10:30 a.m. CT 4 High Rate

Wednesday, April 21

10:30 a.m. CT-4 High Rate Deposition for Transparent Conductive Al-Doped ZnO Films by Reactive Sputtering

Y. Shigesato, Aoyama Gakuin University, Kanagawa, Japan


Transparent conductive oxide (TCO) is a highly degenerate wide band-gap semiconductor with low electrical resistivityand high transparency in the visible and near-infrared regions. Al-doped ZnO (AZO) should be promising potential alternative to In-based transparent conducting oxides (TCO), such as ITO or IZO. AZO films have been prepared by magnetron sputtering using ceramic targets because of the various advantages for uniform depositions in large area. Ingeneral the deposition rate for the sputtering using the oxide ceramic targets is not so high and also the cost for the highquality ceramic targets is high. On the other hand, reactive sputtering using Zn-Al alloy targets is considered to be oneof the most promising techniques to achieve much higher deposition rate for various industrial applications because sputtering yield of the metallic surface is much larger than oxide surface and also the higher sputtering power density can be applied for metallic targets with the higher thermal conductivity. The reactive sputtering process, however, is strongly affected by the O2 flow ratio; the deposition rate exhibits hysteresis with respect to the O2 reactive gas flow rate. Such behavior originates in the oxidation state of the target surface, resulting in the marked decrease in depositionrate with the increasing O2 flow. In this study, AZO films were deposited on quartz glass substrates, unheated and heated at 200˚C, using reactive sputtering with a specially designed feedback system (Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik, FEP) of discharge impedance or plasma emission intensity, combined with 50 kHz pulsing.


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Wednesday, April 21

11:10 a.m.

CT

5

Flexible Transpare

H. Demiryont, Eclipse Energy Systems, Inc., St.

This paper presents a new

Wednesday, April 21

11:10 a.m. CT 5 Flexible

Wednesday, April 21

11:10 a.m. CT-5 Flexible Transparent Electrode (TEC)

H. Demiryont, Eclipse Energy Systems, Inc., St. Petersburg, FL


This paper presents a new transparent electronic conductor (TEC). TEC is a room temperature depositable nanostructured thin film coating system comprising metal-oxide semiconductor elements. The system exhibits metal like conductivity and glass like transparency in the visible region. TEC exhibits metamaterial properties with high transparency in MWIR and LWIR regions and high shielding efficiency due to high conductivity in the 1 to 100 GHz region. TEC can be deposited on rigid or flexible substrates. TEC deposited on polyethylene terephthalate (PET) is extremely flexible that can be rolled around a 9 mm diameter cylinder with little or no reduction in electrical conductivity and that can assume pre-extension states after an applied stress is relieved. The TEC exhibits high visibletransmittance without color. The transmission spectrum of the TEC, which matches the eye sensitivity curve, allows theviewing of true background colors through the coating. TEC can be designed with a broad band transmittance for photovoltaic (PV) applications, e.g., transparent electrode for PV. The photopic transmittance of the TEC is around 90% in the visible and around 90% in the LWIR regions and it can be an UV inhibiter or transparent in the near UV region. The new transparent conductor has 2-6 Ohms/sq of sheet resistance and conductivity of 200 KS/cm. The environmental stability of the TEC was evaluated in a wedeo-meter with the coating on a PET substrate withstanding 150 hours at 50°C, 95% humidity, and ultraviolet (UV), without changing its original performance. The coating can bepatterned using standard etching procedures. In this paper, the properties of the TEC are compared with those of common transparent conductive oxides (TCO) including ITO, ZnO: Al and SnO2:F. In addition to the technical description, the paper analyzes potential markets and applications of the TEC with emphasing on the replacing currentTCO coatings, specifically ITO for flexible display and PV electrode and energy saving window applications.


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Wednesday, April 21

11:50 a.m.

CT

6

Thin FilmPV: On-


In order to minimize the

Wednesday, April 21

11:50 a.m. CT 6 Thin Film PV:

Wednesday, April 21

11:50 a.m. CT-6 Thin Film PV: On-Line, 100% Scribe Inspection


In order to minimize the cost/watt of thin film solar PV modules, manufacturers must maximize throughput and conversion efficiency. Critical to meeting these challenges is the scribing process. Three main processes dominate thinfilm PV; CdTe and CIGS. In both processes, the scribing of the individual coating layers (P1, P2, P3) is vital; the scribes must be pristine, narrow and have sufficient separation from each other. Traditional metrology and inspection methods have utilized matrix cameras which sample 0.2% of the scribes. While these systems provide information about scribe width and offset, they do not ensure panel quality; defects could exist anywhere in the scribe, which wouldreduce panel efficiency. Only 100% inspection can ensure highly efficient and consistent panels. Panel warp, bounce and speed have frustrated this effort, as the conventional metrology systems would be defeated by any one of these realworld challenges. A new technology, utilizing dark field optics has been proven for on-line P1, P2 and P3 scribing operations. The optics and customized processing and software deliver 100% inspection of scribes, measuring them to±2 µm - 5 µm, while simultaneously finding defects and measuring the scribe offsets. A large depth of field ensures the system stays in focus in spite of glass warp and bounce. High speed processing and special algorithms keep up withpanel speeds to 30m/min.

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Vacuum Processes and Coatings for Health Care Applications

Wednesday, April 21

8:30 a.m.

HC

1

The Challenge

S. Russell, NDC, Freemont,CA

The shape memory

Wednesday, April 21

8:30 a.m. HC 1 The

Wednesday, April 21

8:30 a.m. HC-1 The Challenges of Radiopaque Coatings for Nitinol Products

S. Russell, NDC, Freemont, CA


The shape memory material Nitinol is used in variety of medical devices, especially cardiovascular devices such as stents, guidewires, blood clot filters, etc. Many of these devices are manipulated or implanted using X-ray guidance, and so the X-ray visibility of the device (i.e., its “radiopacity”) is an important design consideration. The radiopacity ofalloys such as stainless steel and Nitinol is insufficient in many circumstances, especially where the implant mass or cross-section is small. Common ways of improving the radiopacity include thick polymer coatings loaded with radiopaque filler materials and radiopaque markers made from materials such as platinum, gold, or tantalum. An idealradiopaque solution would: 1) cover the entire device, 2) be biocompatible, 3) not degrade over time, 4) be low profile,5) be galvanically compatible with the underlying base material, and 6) not adversely impact the performance of the underlying device. For devices made from Nitinol, the material’s thermomechanical sensitivity, galvanic incompatibility with platinum and gold, and its susceptibility to hydrogen embrittlement provide special challenges. This paper will review the various radiopacity approaches that have been used with Nitinol medical devices and will describe the development and performance of a new, tantalum coating technology applied via physical vapor deposition. Verbose invited Invited 40

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Wednesday, April 21

9:10 a.m.

HC

2

Towards the

E. Gallino and S. Massey, Laboratoire de Génie des

Stents are metallic medical

Wednesday, April 21

9:10 a.m. HC 2 Towards the

Wednesday, April 21

9:10 a.m. HC-2 Towards the Optimization of Plasma Polymerized Allylamine Thin Films for Cardiovascular Stent Coating: Correlation between Plasma Diagnostic and Film Characteristics

E. Gallino and S. Massey, Laboratoire de Génie des Procédés Plasmas et Traitement de Surface, UPMC-ENSCP, Paris,France and Laboratory for Biomaterials and Bioengineering, Laval University and University Hospital Research Center, Québec, Canada; D. Mantovani, Laboratory for Biomaterials and Bioengineering, Laval University and University Hospital Research Center, Québec, Canada; and M. Tatoulian, Laboratoire de Génie des Procédés Plasmas et Traitement de Surface, UPMC-ENSCP, Paris, France

Stents are metallic medical devices used to scaffold diseased arteries and prevent their reobstruction after angioplasty.To reduce restenosis rate, bare metal stent coating is a promising solution. However, before commercialization, coatingproperties (adhesion, barrier effectiveness, durability, stability) must be assessed and guaranteed even after stent expansion. The aim of this work is to optimize the plasma parameters (power, treatment time) to obtain stable, highly cohesive and adhesive coatings with high selectivity towards primary amino groups. These groups can be used, afterwards, to graft biomolecules to the device in order to improve its biocompatibility. In situ plasma diagnostics suchas optical emission spectroscopy (OES) and mass spectrometry (MS) have been used to estimate the reactive species formed in the plasma and molecular precursor fragmentation, respectively. Results obtained by in situ plasma diagnostics have been correlated to film characteristics. Our results show that plasma polymerized allylamine coatingsdepict high stability upon washing and the required adhesion and cohesion properties to resist to stent expansion. Furthermore, high selectivity towards primary amino groups has been obtained. Finally, OES and MS analysis show good correlation between the plasma phase composition, the fragmentation rate of the molecular precursor and the surface properties of the coatings.

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Wednesday, April 21

9:30 a.m.

HC

3

Nano-Coatings

D. Mantovani, Laval University, Quebec,

Nowadays, cardiovascular

Wednesday, April 21

9:30 a.m. HC 3 Nano-

Wednesday, April 21

9:30 a.m. HC-3 Nano-Coatings and Surface Functionalisation for the Replacement and the Regeneration of Cardiovascular Tissue

D. Mantovani, Laval University, Quebec, Canada


Nowadays, cardiovascular diseases are the primary cause of death in the world and at least 1 million patients undergo surgical operation for prosthesis implantation each year, however not without complications. As the major problem stillresides in an interfacial mismatch between the synthetic inert graft and the natural living tissue surrounding it, the common approaches consist of modulating the tissue/biomaterial interface by modifying the synthetic graft surface properties, in an attempt to improve their long-term bio- and haemocompatibility. Thus, several coating techniques, including plasma-based treatments, were investigated during the last 20 years to improve clinical performances of cardiovascular devices. Strong binding of selected bio-molecules, including protein-repellent ones, surface patterning, and a number of other strategies has already been investigated in order to obtain biological-like surfaces based on the hypothesis that the human body would positively interact with these biologically coated materials. Nevertheless, such coatings did not completely success clinically as it turned out that the bioactive materials could not play their biologicalrole as expected and eventually led to negative interactions and, as a consequence, to clinical complications. Today, nanotechnology and surface modifications provide a new insight to the current problem of biomaterial failures. Within this general framework, this talk will focus on highly-adherent and strongly-cohesive (after deployment) fluorocarbon nano-coatings for intravascular stents for cardiac application, bio-mimicking coatings for vascular prostheses, and surface functionalisation of scaffolds for tissue regeneration. The intrinsic goal is to present a personal view at how materials and surface modifications have progressed, from the glory days of their introduction, to the promising future that nanotechnology may or may not hold for improving the quality of the life of millions worldwide.


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Wednesday, April 21

10:30 a.m.

HC

4

Blood Glucose

D. Brown, Bayer HealthCare LLC, Once thought of

as primarily a

Wednesday, April 21

10:30 a.m. HC 4 Blood

Wednesday, April 21

10:30 a.m. HC-4 Blood Glucose Sensors Based on Vacuum Coated Flexible Substrates

D. Brown, Bayer HealthCare LLC, Mishawaka, IN

Once thought of as primarily a childhood disease, the increasing incidence of diabetes has been called an “epidemic” by U.S. and international health officials. The World Health Organization estimates that the number of diagnosed diabetes cases worldwide will be over 200 million by 2010. Uncontrolled diabetes can lead to serious complications such as cardiovascular disease, hypertension, blindness, amputation, and renal failure. A key tool in the management of diabetes is the over-the-counter blood glucose monitoring system, typically comprising an electronic meter and single-use test strips. More than 50 companies market such devices, and the global self-monitoring market is projectedto exceed $11 billion by 2012. The first blood glucose test strips designed for home use in the 1960s were based on absorbent substrates and utilized optical reporting technologies. Today, the volume of blood required by test strips is 150 times smaller, and the majority of strips are electrochemical. Many glucose test strips designs are based on conductors patterned in thin metal films sputtered onto flexible substrates. This presentation will describe the more prominent blood glucose sensor technologies currently in the marketplace.

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Wednesday, April 21

10:50 a.m.

HC

5

New Results

C. Misiano, P. Matarazzo, and M. Pezzilli, Romana

This work describes the

Wednesday, April 21

10:50 a.m. HC 5 New Results

Wednesday, April 21

10:50 a.m. HC-5 New Results and Characterizations of TiC Based Nanostructured Bioactive Treatment for Titanium Surgical Implants to Improve their Osseointregation

C. Misiano, P. Matarazzo, and M. Pezzilli, Romana Film Sottili, Anzio, Italy; R. Scandurra, University of Roma 1, Rome, Italy; and E. Bemporad and L. Mazzola

University Roma Tre, Rome, Italy

This work describes the latest results obtained in the use of a titanium carbide based treatment to improve the osseointegration of titanium surgical implants. The nanostructured layer obtained by Ion Plating Plasma Assisted Deposition with Reactive Magnetron Sputtering source is composed of a relatively critical mixture of titanium carbide,titanium dioxide, titanium suboxides and carbon. The in vitro bio-characterization is presented and the results are correlated with the chemical composition of the layer and with the deposition parameters. We also discuss the effect ofthe reproducibility of the deposition parameters on the titanium samples. Finally, the “in vivo” characterizations are also presented.

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Wednesday, April 21

11:10 a.m.

HC

6

Applications of TiOx

M. Horáková and Z. Michalčík, Department of

Titanium dioxidethin film has

Wednesday, April 21

11:10 a.m. HC 6 Applications

Wednesday, April 21

11:10 a.m. HC-6 Applications of TiOx Thin Films with Photoctatlytic Properties Deposited by PECVD Method with Heating Cathode

M. Horáková and Z. Michalčík, Department of Material Science, Technical University in Liberec, Liberec, Czech Republic; P. Kříž, Department of Physics, University of South Bohemia, České Budějovice, Czech Republic; I. Horská, Department of Chemistry, Technical University in Liberec, Liberec, Czech Republic; Š. Klementová, Faculty of Science, University of South Bohemia, České Budějovice, Czech Republic; and P. Špatenka, Department of MaterialScience, Technical University in Liberec, Liberec, Czech Republic and Department of Physics, University of South Bohemia, České Budějovice, Czech Republic

Titanium dioxide thin film has attracted great attention due to its unique properties like photocatalytic activity, optical,electrical and chemical properties making them suitable for many applications such as optical films, antireflection coating for solar cell, sensor material and photocatalytic self-cleaning and waste water purification. This work deals with TiOx thin films deposited by PECVD method in a planar reactor with powered heat-able substrate holder to reach layers with good photocatalytic activity. During process, the cathode was heating in the range 150 – 450°C and oxygenwas used as a working gas, and Titan-IV-iso-propoxid as a precursor. The photocatalytic activity was tested using AcidOrange 7 and decomposition speed in contact to TiOx films exposed to UV/VIS light. The photocatalytic activity of thedeposited films reached up to 40% of the sedimented P25 powder activity. The influence of the duty time, pulsed frequency and substrate temperature on photocatalytic efficiency was studied. We also compared the photocatalytic activity of the films deposited by pulsed discharge with films prepared by RF PECVD and by magnetron sputtering. The sterilization effect of the films was investigated by decomposition of microbiological substances. Also effect of photocatalytic properties on decomposition of pesticides was evaluated in our contribution.

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ABSTRACTEntry

Plasma Processing

Wednesday, April 21

8:30 a.m.

P

5

Depositionof a-C:H:N

S. Guimond, A. Ritter, andD. Hegemann, EMPA,

Plasma processing is

Wednesday, April 21

8:30 a.m. P 5 Deposition of

Wednesday, April 21

8:30 a.m. P-5 Deposition of a-C:H:N Plasma Polymer Thin Films for the Functionalization of Textiles

S. Guimond, A. Ritter, and D. Hegemann, EMPA, Swiss Federal Laboratories for Materials and Testing and Research,St. Gallen, Switzerland

Plasma processing is seen as an attractive alternative method to add new functionalities to textiles since it is a versatileand dry technology. Because plasma processing results in a nano-scaled surface modification, it also has the advantageof preserving the bulk properties of the textiles. In this study, plasma polymer thin films have been deposited on various polyester fabrics of defined structure using NH3/C2H4 low pressure RF glow discharges. The films were characterized using XPS, FTIR and AFM as a function of the plasma process parameters. For a defined range of energyinput and NH3/C2H4 gas flow ratio, the coatings are nanoporous and contain amine functional groups. These films can thus serve as high specific surface area templates for further surface functionalization. For instance, the amine groups contained in the films were used to covalently bind molecules containing OH and CF3 end-groups, giving the fabrics hydrophilic or hydrophobic properties, respectively. The properties of the coated fabrics remain generally rather stableduring abrasion tests, presumably due to the high crosslinking degree of the films. The scalability of the process investigated in this work has been demonstrated using a pilot-scale continuous web coater.

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ABSTRACTEntry

Wednesday, April 21

8:50 a.m.

P

6

Macroscopic

D. Hegemann, E. Körner, and S. Guimond, EMPA,

Plasma polymerdeposition

Wednesday, April 21

8:50 a.m. P 6 Macroscopic

Wednesday, April 21

8:50 a.m. P-6 Macroscopic Approach to Investigate Plasma Polymer Growth

D. Hegemann, E. Körner, and S. Guimond, EMPA, Swiss Federal Laboratories for Materials Testing and Research, St.Gallen, Switzerland


Plasma polymer deposition enables the controlled modification of materials’ surfaces such as polymers and textiles at the nanoscale. Industrial applications based on plasma polymerization require reliable processes that can be transferredto production-scale reactors. Due to the enormous difficulties lying in a microscopic approach, we are considering macroscopic kinetics to describe plasma polymerization processes. As long as gas phase processes such as the generation of film-forming species (plasma chemistry) dominate, the mass deposition rate is solely determined by the reaction parameter power input per gas flow W/F (specific energy input). Hence, the plasma polymer formation from different gas mixtures can be examined by measuring the deposition rate depending on power input and gas flows. Thismacroscopic approach also yields the energy demand to obtain a certain target product (plasma polymer) and enables comparison and up-scaling between plasma reactors. For HMDSO discharges, hydrophobic plasma polymers can be optimized turning into dense, hydrophilic SiOx coatings by addition of oxygen, both growth mechanisms that are governed by plasma-chemical processes. Acrylic acid discharges show several regimes of plasma polymer growth withincreasing energy input. At higher energies those plasmas resemble CO2/C2H2 gas mixtures. All transitions obtained forthe plasma polymer growth of these gaseous mixtures can be related to plasma-chemical processes (gas-phase processes plus chemical etching). For the deposition of hard a-C:H and a-C:H:N coatings, on the other hand, ion-enhanced etching (not sputtering) contributes to film formation. Co-sputtering can be used to incorporate metal particles into the growing plasma polymer film to combine, e.g., antimicrobial effects with functionalities of the plasmapolymer matrix, which can be tailored considering energy input for plasma polymerization and power input for sputtering. These examples were chosen to demonstrate the potential of the macroscopic approach to investigate plasma polymerization.


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Plasma Processing

Wednesday, April 21

9:30 a.m.

P

7

Linear IonSources -

V. Bellido-Gonzalez, M. Audronis, R. Brown, and D.

Linear Ion Sources (LIS) is

Wednesday, April 21

9:30 a.m. P 7 Linear Ion

Wednesday, April 21

9:30 a.m. P-7 Linear Ion Sources - New Designs and Processes for Improvements in Product Industrial Scale

V. Bellido-Gonzalez, M. Audronis, R. Brown, and D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom; and S. Williams, Gencoa Ltd., Liverpool, United Kingdom and Gencoa Ltd., San Francisco, CA

Linear Ion Sources (LIS) is a branch of the so-called Anode Layer/Closed-Drift ion sources. Such sources have a common beginning in the second part of the 20th century stimulated largely by the international aerospace exploration race. Although their industrial application as plasma/ion sources has already been demonstrated in the field, with very few exceptions, it is still a tool that can be found mostly in R&D departments of companies and universities rather thanin manufacturing lines in vacuum coating and/or plasma processing industries. Often this lack of industrial success is rooted in the misunderstanding of the source, its functionalities and capabilities, which could have lent to its use outsidethe optimal operation range. It is not strange to see project proposals which would require the use of LIS outside their real realm of applicability. By using modelling techniques and plasma process know-how it is possible to understand the strengths and weaknesses of LIS, making it possible to have a better informed choice when it comes to its practicalapplications. The present paper will give some insights into the design and operation aspects of LIS complemented withexperimental results from certain industrial applications.

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ABSTRACTEntry

Wednesday, April 21

9:50 a.m.

P

8

The Surface

M.S. Huh, Samsung MobileDisplay Co., Ltd.,

ITO films are highly

Wednesday, April 21

9:50 a.m. P 8 The Surface

Wednesday, April 21

9:50 a.m. P-8 The Surface Morphological and Electrical Properties of Ultralow-Pressure Sputtered Tin Doped Indium Oxide Film

M.S. Huh, Samsung Mobile Display Co., Ltd., Gyeonggi-Do, Korea and Department of Materials Science and Engineering, Seoul National University, Seoul, Korea; B.S. Yang and S.-J. Won, Department of Materials Science andEngineering, Seoul National University, Seoul, Korea; S.J. Han and C.L. Roh, Samsung Mobile Display Co., Ltd., Gyeonggi-Do, Korea; and H.J. Kim, Department of Materials Science and Engineering, Seoul National University, Seoul, Korea

ITO films are highly degenerate wide band gap semiconductors (e.g., 3.4–4.3 eV) with low electrical resistivity. ITO films have been widely studied for their potential use in the display devices. However, one of the practical drawbacks of sputtered ITO films is their rough surface morphology. Smooth surface morphology with high electrical conductivityis the critical factor for the current driven devices such as OLEDs. These properties of ITO films are strongly dependent on their microstructures, which are influenced by the deposition method and processing conditions. In this study, ITO films with smooth surface morphologies were obtained using an ultra-low-pressure sputtering method (ULPS). Here, ULPS denotes the sputtering pressure less than 1.3×10-1 Pa, while an conventional sputtering pressure (CSP) means that the sputtering pressure is more than 6.7×10-1 Pa. It was found that the sputtering pressure largely affects the surface morphology and crystalline structures of the films. By comparing the films deposited at ULPS and CSP, it turned out that the surface roughness of ULPS was five times lower. The ULPS method was found to be effective for producing ITO films with enhanced surface morphologies that make them suitable for use in display devices.

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Plasma Processing

Wednesday, April 21

10:30 a.m.

P

14

ExtendedPlaner

P.J. Hockley, J.D. Dutson, and M.J. Thwaites, Plasma

It has been shown in a

Wednesday, April 21

10:30 a.m. P 14 Extended

Wednesday, April 21

10:30 a.m. P-14 Extended Planer Plasma System - A Revolutionary New Design for Large Area Deposition (>1mWidth Coating) Using a Remotely Generated Plasma

P.J. Hockley, J.D. Dutson, and M.J. Thwaites, Plasma Quest Ltd, Hook, United Kingdom

It has been shown in a number of previous works that the use of a remotely generated high density, low energy plasmafor sputter deposition can be used to produce a multiplicity of thin films, e.g., dielectrics, transparent conducting oxidesand semi-conducting materials, with superior material properties at very high coating rates and at low temperatures. However, sustaining a plasma over large distances is very challenging, which has previously limited the size of available coating areas to <0.5m widths. In this paper, we describe a novel approach for large area coatings using a revolutionary new design of the remote plasma source. This new design produces a large planer plasma that is generated in close proximity to the target enabling a combined target-source configuration. The generation physics is very similar to that used previously so that it still demonstrates the superior coating properties previously reported. Thecritical difference with this technique is that the plasma area can be readily scaled, enabling coating widths >1m to be achieved. In the paper, we will describe the process in more detail with examples of depositions using this novel approach.

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Wednesday, April 21

10:50 a.m.

P

12

Plasma-Based

M. Baraket, S.G. Walton and E.H. Lock, Plasma

Graphene is thesubject of

Wednesday, April 21

10:50 a.m. P 12 Plasma-

Wednesday, April 21

10:50 a.m. P-12 Plasma-Based Functionalization of Graphene

M. Baraket, S.G. Walton and E.H. Lock, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC;P.E. Sheehan and Z. Wei, Chemistry Division, U.S. Naval Research Laboratory, Washington, DC; and J.T. Robinson,Electronics Division, U.S. Naval Research Laboratory, Washington, DC

Graphene is the subject of intense research because of its unique structural and electronic properties, which are advantageous in a large number of applications including nano-electronic and sensing devices. It is thought that, by varying the surface chemistry of graphene, the electronic properties of the material and the interaction with adsorbates can be controlled. In this work, we discuss adding functional groups to the surface of graphene, using electron beam generated plasmas. These novel plasma sources are characterized by low electron temperatures (<1 eV) and thus low incident ion energies at the substrates, features that are critically important when processing very thin substrates like graphene. The results of experimental investigations using these plasmas produced in different gases (H2, O2, SF6 and NH3) in an effort to introduce hydrogen, oxygen, fluorine and ammine elements/functional groups are presented. A study of the chemical, conductive and structural properties of the functionalized graphene will also be discussed. Thiswork was supported by the Office of the Naval Research.

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Plasma Processing

Wednesday, April 21

11:10 a.m.

P

13

Some Remarks

P. Špatenka and J. Hladík,Technical University of

Polyolefin granulates and

Wednesday, April 21

11:10 a.m. P 13 Some

Wednesday, April 21

11:10 a.m. P-13 Some Remarks to Application of Plasma-Modified Polyolefins

P. Špatenka and J. Hladík, Technical University of Liberec, Department of Material Science, Liberec, Czech Republic and SurfaceTreat a.s., Holešovice, Czech Republic; and M. Horáková, Technical University of Liberec, Department ofMaterial Science, Liberec, Czech Republic

Polyolefin granulates and particles are hydrophobic, which prevents their use for various applications. Plasma modification is an environment friendly method of polyolefin hydrophylization. We have developed an industrial-scaleplant for plasma treatment of particles as small as micrometers in diameter. These materials have been used and tested,e.g., as a filler for composite materials or for production of parts using roto-molding technique. Parts sintered from theplasma modified polyethylene powder preserved high surface tension, which allowed, e.g., direct painting or adhesive bonding without any additional pretreatment or using them as a filler in composite materials. Another application is corrosion resistive coating of metal. Demands on the treated particles as well as results of various tests will be presented in our contribution.

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Vendor Innovators Showcase

Wednesday, April 21

10:30 a.m.

IS

1

Ultra Low Indentatio

R. Nair, CSM Instruments, Inc., Needham, MA

The elastic-plastic behavior

Wednesday, April 21

10:30 a.m. IS 1 Ultra Low

Wednesday, April 21

10:30 a.m. IS-1 Ultra Low Indentation Approach to Stress-Strain Behavior of Thin Films

R. Nair, CSM Instruments, Inc., Needham, MA

The elastic-plastic behavior of thin films has always been of a great interest. However, obtaining of a plot similar to uniaxial stress-strain curve has been facing serious methodological and technical obstacles. Recently, nanoindentationmethods have been employed for determination of such curves and theories relating indentation stress and strain to uniaxial stress and strain were developed. The new CSM Instruments Ultra Nanoindentation Tester has been used for measuring of elastic-plastic response of several thin films. The main advantage of the UNHT instrument is its extremely low thermal drift and frame compliance that are indispensable for long term and cyclic measurements. The measurement method consisted of performing repeated indentation with increasing force on one spot of the tested sample. The so-obtained curves were compared with plots of elastic to plastic indentation energy ratio as a function ofdepth. The onset of plastic deformation was observed and it corresponded to change in the elastic to plastic indentationenergy ratio. The results show that though such measurements do not have the same physical meaning as the well known stress-strain curve, they can be used as an efficient and fast method to determine the elastic-plastic response of thin films to mechanical deformation in compression.

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Wednesday, April 21

10:40 a.m.

IS

2

NxtGenTM,The Next


The next generation of

Wednesday, April 21

10:40 a.m. IS 2 NxtGenTM,

Wednesday, April 21

10:40 a.m. IS-2 NxtGenTM, The Next Generation of Inspection and Metrology Systems


The next generation of metrology technologies, NxtGen™, has been released by Dark Field Technologies. NxtGen™ represents the solution to high-end vs. low end inspection systems. NxtGen™ was born from the confluence of decades of laser and camera design and applications experience, coupled with the most advanced signal processing available, marrying both the high-resolution laser system with cost-effective imaging technology. This has never beendone before. The proprietary software and optics used in NxtGen™ delivers a level of detection that has never been possible at this price, and the development, engineering, production, software and service functions are 100% U.S.-based. NxtGen™ offers a distinctive array of capabilities:

- Greatest value system in the world: Highest Performance: Cost available.

- Design convergence of laser, camera and self-aligning optical systems.

- Integrated warp and contour measurement: On-line measurement of glass warp and contour.

- Variable Field Scanners deliver extraordinary detection: Proprietary scanners provide sub-pixel detection.

- Extraordinary signal processing capacity: Over 200 million pixels per second.

- Multiple optical channels: Bright field, mixed field and dark field.

- 100% Scribe metrology: Scribes, in solar thin film media, are inspected 100% on-line, real time and scribe width, offset and pitch are measured to the nearest 2µm - 5µm.

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Wednesday, April 21

10:50 a.m.

IS

3

Rapid Metallizer

B. Gebhardt, B. Buecken, M. Falz, and T. Steinborn,

A fast growing demand for

Wednesday, April 21

10:50 a.m. IS 3 Rapid

Wednesday, April 21

10:50 a.m. IS-3 Rapid Metallizer as a Part of a Fully Automated Production Line in the Packaging Industry

B. Gebhardt, B. Buecken, M. Falz, and T. Steinborn, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany

A fast growing demand for packaging in the cosmetic industry has been observed over the last years. One facet is the coating itself. An approved industrial layer system consists of a base lacquer, a metal film provided by PVD and a finaltop lacquer. Considerable progress has been achieved by the application of UV-lacquer. The globalisation of the markets, however, dramatically increases the cost pressure. As a matter of fact, lower process times and the automationof production systems consequently yield saving of resources. A new vacuum metallization system, particularly designed for integration in fully automated lines in packaging industry, is described below. The plant is executed as a batch machine with two opposite doors whereas the carrier provided with the parts to be metallized passes through the system. The substrates have been mounted on racks, before being introduced into the production line. The carrier is designed to accommodate up to 11 racks. Loading and unloading of the carrier will be handled by means of a manipulator system. The metallization system as a section of the completely automated line is characterized as follows:part size up to diameter of 100 mm and height of 130 mm; horizontal substrate flow in the production line; minimization of the complexity of substrate holders; cycle time of 130 s for one carrier (11 racks) including charging time; fully automated loading, unloading and transport; use of sputtering technology for coating of metals like aluminum, stainless steel or chromium; capacity of nearly 18 million parts (ø 45 mm; high 90 mm) per year in three shift operation. Verbose invited

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Wednesday, April 21

11:00 a.m.

IS

4

The New Power

G. Eichenhofer, SOLVIX SA, Holzgerlingen,

The new SOLVIXMagix ICE

Wednesday, April 21

11:00 a.m. IS 4 The New

Wednesday, April 21

11:00 a.m. IS-4 The New Power Supply Generation for TCO Thin-Film Applications; The SOLVIX ICE (Intelligent Controlled Energy)

G. Eichenhofer, SOLVIX SA, Holzgerlingen, Germany

The new SOLVIX Magix ICE (Intelligent Controlled Energy) DC-power supply platform has been designed for the advanced technological requirements of sputtering TCO-films (transparent conductive oxide such as AZO, ZNO, ITO,etc.) for large scale deposition, especially for the photovoltaic, display and glass industry. The power supplies’ ultra fast arc-handling and the energy recovery system eliminates defects caused by arcing on the substrate and on the target,without a deposition rate loss. Its new sophisticated cooling system allows operation in harsh and humid environments.The Magix ICE is built for a low cost of ownership with the highest demand on quality and performance.

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Wednesday, April 21

11:10 a.m.

IS

5

Galileo Nanotech

P. Profumo, Galileo Vacuum Systems, Prato,

Galileo Nanotech is the

Wednesday, April 21

11:10 a.m. IS 5 Galileo

Wednesday, April 21

11:10 a.m. IS-5 Galileo Nanotech – a New Partnership in Vacuum Coating Technology

P. Profumo, Galileo Vacuum Systems, Prato, Italy

Galileo Nanotech is the joint venture between Galileo Vacuum Systems and Russian Nanotechnology Corporation thatwas formed in 2009. The joint venture has been granted Euro 43M of initial capital, including 100% of Galileo Vacuum Systems SpA shares. Galileo Nanotech has set an ambitious growth plan that will see the establishment of a new manufacturing plant in Russia to fully exploit Galileo’s technology and know-how. Galileo Vacuum Systems’ operations in Italy and in the United States will remain focused on their core business of Vacuum Coating Equipment design and manufacturing. An update of the company’s current situation and future prospects will be discussed.

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Wednesday, April 21

11:20 a.m.

IS

6

Introducing Cryofox

J.W. Larsen and N. Aagaard, Polytecknik AS,

The Cryofox system is

Wednesday, April 21

11:20 a.m. IS 6 Introducing

Wednesday, April 21

11:20 a.m. IS-6 Introducing Cryofox by Polyteknik AS

J.W. Larsen and N. Aagaard, Polytecknik AS, Oestervraa, Denmark

The Cryofox system is constantly developed and Polyteknik AS is introducing two new machines as well as a deep tube coating, capable of handling tubes with a diameter as small as two inches. The Cryofox Explorer 700 is a DC/RFsputtering E-beam unit with a split chamber making it ideal for high demand thin film coatings within optical, lift-off and MEMS applications. The Cryofox Cluster is a general purpose cluster system that can be equipped with DC/RF sputtering, PECVD, ALD and RIE etching.

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Wednesday, April 21

11:30 a.m.

IS

7

QuadMapResistivity

B. Murphy, P. Sen, and B. Dickson, Lucas Signatone

The QuadMap provides high

Wednesday, April 21

11:30 a.m. IS 7 QuadMap

Wednesday, April 21

11:30 a.m. IS-7 QuadMap Resistivity Test System

B. Murphy, P. Sen, and B. Dickson, Lucas Signatone Corp., Gilroy, CA

The QuadMap provides high speed measurements of thin films and wafers or solar tiles in a production environment. Atest sample may be loaded and tested with 49 points in less than a minute. A touch screen interface allows users to set test parameters. A pin lift chuck allows easy placement of the sample on the chuck with a vacuum wand or tweezers. An option for an automatic cassette loader creates a fully automatic system. The system is standalone with a small footprint. Models are available in 150 mm, 156 mm square, 200 mm and 300 mm configurations. The standard configuration features a sheet resistance measurement range of 1mΩ to 10GΩ per square. Users may choose from predefined 5, 9, 25, 49, 121 mapping patterns or custom design their own testing patterns. Calibration routines and standards assure NIST traceable results with 1% accuracy within the standard range. The P/N typing feature allows users to determine the sample type. Results are displayed in a table and choice of five different 2D / 3D maps. The tabular data is automatically stored in a database and may be exported to a spread sheet. A SECSII/GEM interface is optional for uploading the data through a FAB management system.

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Wednesday Afternoon

April 21, 2010

The Donald M. Mattox Tutorial Program

Wednesday, April 21

12:30 p.m. - 1:10

TS

2

Polymer Coatings

H. Biederman, Charles University, Prague, Czech

Deposition of polymer-like

Wednesday, April 21

12:30 p.m. - TS 2 Polymer

Wednesday, April 21

12:30 p.m. - 1:10 p.m. TS-2 Polymer Coatings

H. Biederman, Charles University, Prague, Czech Republic


Deposition of polymer-like films in a vacuum usually employs thermal decomposition, sometimes shortly, but not exactly called “evaporation” of a polymeric solid or plasma polymerization (PECVD of an organic compound). In plasma polymerization processes, an organic vapor passes through a glow discharge, usually at low pressure, that results in a plasma polymer coating on adjacent surfaces. One should have in mind that the structure of the coating differs from the original conventional polymer. “Evaporated” films are low molecular weight materials and plasma polymers are very disordered, highly cross-linked networks containing frozen-in free radicals. Plasma polymer films have been proposed for a number of applications ranging from protective, low friction, non-abrasive coatings and filmsfor electronics and optics to coatings for biomedical purposes. In addition to plasma polymerization process, RF sputtering of polymeric materials in an inert (Ar) or active (e.g., N2) working gas or even self-sputtering mode can be applied. Several polymer targets: PTFE (polytetrafluoroethylene), PE (polyethylene), PP (polypropylene), PDMS (polydimethylsiloxane) and PI (polyimide) were RF sputtered using a planar magnetron in order to deposit plasma polymer films. Metal or metal oxide/plasma polymer nanocomposite films are concisely described. Adhesion of the coatings to various substrates is discussed with special regard to biomedical applications. Finally, deposition of variousfilms, especially metals, on polymer substrates is considered.


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Wednesday, April 21

1:30 p.m.

CT

7

Coatings Tuned to

G.B. Smith and A.R. Gentle,University of Technology,

To maximise a coating's net

Wednesday, April 21

1:30 p.m. CT 7 Coatings

Wednesday, April 21

1:30 p.m. CT-7 Coatings Tuned to Atmospheric Infrared Properties for High Performance Radiative Cooling

G.B. Smith and A.R. Gentle, University of Technology, Sydney, Australia


To maximise a coating's net radiative cooling to the sky, by night and by day, its spectral and angular dependent infra-red properties are tuned to local atmospheric conditions and to the desired operating temperature range. Practical working temperatures in low cost simple systems range down to 15°C degrees below the coldest ambient of the night.Cooling surfaces with a limited acceptance angle to incoming radiation from the atmosphere by using heat mirror linedapertures, have achievable working temperatures down to 30°C below ambient. Daytime cooling is achieved using coatings with high solar reflectance and optimized IR properties. The way a coating influences the balance between radiative emission, which falls as temperature drops, to absorption of incoming radiation which is fixed for fixed atmospheric conditions will be explained with practical examples. As working temperatures decrease the balance shiftsto lowering the absorbed radiation. Two nanoparticles for use in these coatings will be discussed, while two simple multilayers also work very well due to their combination of angular, IR spectral selectivity and solar reflectance. Applications include low energy air conditioning, water and agriculture, and low cost power generation. Buildings thathave achieved large CO2 emissions reductions will be shown.


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Wednesday, April 21

2:10 p.m.

CT

8

Optimisation of

R. Binions, University College London, London,

The atmospheric

Wednesday, April 21

2:10 p.m. CT 8 Optimisation

Wednesday, April 21

2:10 p.m. CT-8 Optimisation of Thermochromic Thin Films on Glass; Design of Intelligent Windows

R. Binions, University College London, London, United Kingdom; M. Saeli, Università Degli Studi di Palermo, Palermo, Italy; and I.P. Parkin, University College London, London, United Kingdom


The atmospheric pressure chemical vapour deposition reaction of vanadyl acetylacetonate and tungsten hexachloride with oxygen led to the production of thin films of tungsten doped monoclinic vanadium dioxide on glass substrates. Scanning electron microscopy and X-ray diffraction indicated that the films had different morphologies and crystalinities depending on the deposition conditions used. Transmission and reflectance measurements showed a significant change in properties in the near infrared either side of the metal to semiconductor transition. Variable temperature transmission studies show that the metal to semiconductor transition was lowered by tungsten doping. Theeffect of film thickness was studied with un-doped and doped films. It was found that film thickness limited the intensity of light passing through the film and the extent of the thermochromic transition but was found not to influencethe hysteresis width or temperature of transition. Different film growth conditions led to a range of film morphologieswhich profoundly affected the resulting optical properties of the films. It was found that film morphology and preferredcrystallographic orientation had a marked influence on the width and switching temperature of the thermochromic transition. Optical data was used in energy modelling studies to elucidate the films potential as an energy saving coating in architectural glazing. The energy modelling results suggest that for warmer climates the thermochromic nano-composites investigated here lead to significant energy savings when compared with plain glass and other standard industry products. We show that doping of vanadium dioxide films with W atoms and gold nano-particles offers an easy way to improve the materials properties, enabling both the thermochromic onset temperature and film colour to be altered.


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Wednesday, April 21

2:50 p.m.

CT

9

Thermo-Optical

O. Zabeida, C. Archambault, and L.

Perovskite-typeceramics exhibit

Wednesday, April 21

2:50 p.m. CT 9 Thermo-

Wednesday, April 21

2:50 p.m. CT-9 Thermo-Optical Properties of LSMO Films

O. Zabeida, C. Archambault, and L. Martinu, Department of Engineering Physics, École Polytechnique de Montréal, Montréal, Canada

Perovskite-type ceramics exhibit many intriguing properties related to the particularity of their crystalline structure andits transformation. These properties include colossal magnetoresistance, electro-optic effect, high-T superconductivity,ferro- to para-magnetic and metal-to-insulator phase transitions. In this work we study one of such materials: thin filmsof lanthanum strontium manganese oxide (LSMO) which, among other interesting properties, demonstrates a strong thermo-optic effect in the infrared part of the spectrum. LSMO films deposited by magnetron sputtering onto different substrates (c-Si, fused silica, sapphire) were analyzed using variable angle spectroscopic ellipsometry in the wavelengthrange from 0.25 to 25 µm at temperatures from -50°C to 150°C. Optical properties (refractive index, n, and extinction coefficient, k) of the films were modeled by a series of Tauc-Lorentz, Gaussian and Drude oscillators. We found that nof the LSMO films measured at 14 µm decreases from 5.6 at -50°C to 3.0 at 60°C; at the same time, k drops from 5.7 to 1.8. Further heating up to 150°C leads to rather small (less than 10%) changes in n and k. The charge carrier densityderived from the Drude function is correlated with the film conductivity measured by the 4-point probe. We discuss thethermo-optic properties with respect to the film microstructure and composition, and assess the possibilities for implementing the optical constants of LSMO films into the design of tunable IR reflectors and smart radiators.

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Wednesday, April 21

3:10 p.m.

CT

10

Progress in

C.G. Granqvist, The Ångström Laboratory,

Chromogenic materials

Wednesday, April 21

3:10 p.m. CT 10 Progress in

Wednesday, April 21

3:10 p.m. CT-10 Progress in Chromogenic Materials and Devices: New Data on Thermochromic Vanadium-Oxide-Based Films and on Electrochromic Nickel-Tungsten-Oxide Films

C.G. Granqvist, The Ångström Laboratory, Uppsala University, Uppsala, Sweden

Chromogenic materials change their properties under the action of an external stimulus. We first present new experimental data on thermochromic VO2-based films and computed data on VO2-based nanoparticles. In particular weshow that a lower luminous absorptance can be obtained than with earlier known materials. Then we turn to electrochromic thin films and present new results on Ni-W-oxide-based films. The focus here is on enhanced values ofthe coloration efficiency. Finally we discuss how thermochromics and electrochromics can be combined in order to achieve superior fenestration for energy efficient buildings.

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Wednesday, April 21

1:30 p.m.

T

15

DiamondCoating

K. Brondum, Vaportech Inc., Boulder, CO

Hydrogen free amorphous

Wednesday, April 21

1:30 p.m. T 15 Diamond

Wednesday, April 21

1:30 p.m. T-15 Diamond Coating Produced from Large Area Filtered Arc – Equipment and Application

K. Brondum, Vaportech Inc., Boulder, CO

Hydrogen free amorphous diamond, ta-C, has a set of unique properties: friction coefficient below 0.1 in water environment, close to natural diamond hardness and chemical inertness that, in combination, makes for superior wear performance in sliding applications. The unique characteristics of diamond produced from filtered cathodic arc have been matched with a wear application to produce superior performance faucet valves for consumer market. This presentation will go through the large area filtered arc production equipment and the coatings that can be produced from it specifically diamond films, their characteristics and performance.

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Wednesday, April 21

1:50 p.m.

T

16

New Generatio

P.Eh. Hovsepian and A.P. Ehiasarian, Sheffield

Recently, Gamma-TiAl has

Wednesday, April 21

1:50 p.m. T 16 New

Wednesday, April 21

1:50 p.m. T-16 New Generation HIPIMS and Combined HIPIMS/UBM PVD Coatings for Enhanced Fretting Wear Resistance of Gamma-TiAl Low Pressure Turbine Blades

P.Eh. Hovsepian and A.P. Ehiasarian, Sheffield Hallam University, Sheffield, United Kingdom; W. Smarsly and A. Werner, MTU Aero Engines GmbH, Munich, Germany; and R. Tietema, F. Papa, and R. Jacobs, Hauzer Techno Coating, Venlo, The Netherlands

Recently, Gamma-TiAl has been identified as a strong candidate to serve aerospace applications. One drawback of these alloys, however, is their poor oxidation behaviour and low wear resistance and low fretting wear resistance in particular. CrAlYN/CrN coatings, utilising a nanoscale multilayer structure with a typical bi-layer thickness of 4.2 nmwhen deposited on a lightweight Ti-45Al-8Nb, Gamma-TiAl alloy have shown excellent high temperature tribological behaviour. High coating adhesion to the Gamma-TiAl substrate was achieved by surface pre-treatment utilising bombardment with Cr+ ions generated by High Power Impulse Magnetron Sputtering (HIPIMS) discharge. HIPIMS was also used for the deposition of CrAlYN/CrN resulting in extremely dense and very smooth coatings. To further enhance the performance, a combination of CrAlYN/CrN base coat and Al2O3 top coat was produced. The alumina coating was deposited by reactive Dual Magnetron Sputtering (DMS) from two opposing cathodes in transitionmode. A control system for reactive dual magnetron sputtering was employed to achieve well balanced sputtering fromthe Al targets, resulting in improved properties for the alumina coating. Both types of coatings were deposited on Z-notch specimens, which in the real engine represent the contact area of the shroud at the top of the turbine blade, and subjected to fretting wear tests. The TiAl specimens were taken from forgings, representative for the turbine blade material. The fretting wear resistance of the HIPIMS, CrAlYN/CrN and HIPIMS/DMS, CrAlYN/CrN+ Al2O3 coatingson Gamma- TiAl specimens was investigated by using the best practice test equipment and test parameters to simulate the relevant fretting wear loads, cycles and temperatures for low pressure turbine blades at the blade shroud area of theaero engine. The tests have been performed at room temperature and at 700°C. The test results show sufficient wear resistance at room temperature and promising wear resistance at elevated temperatures using a CrAlYN/CrN and CrAlYN/CrN+Al2O3 test combinations.

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Wednesday, April 21

2:30 p.m.

T

17

High Performan

D.E. Koewler, Sprimag, West Chester, OH; R.

Newly advancedtechniques and

Wednesday, April 21

2:30 p.m. T 17 High

Wednesday, April 21

2:30 p.m. T-17 High Performance Alternatives for Colored Chrome Decoration on Plastics - an End User Perspective

D.E. Koewler, Sprimag, West Chester, OH; R. Schaefer, hartec, Stetten, Germany, J.R. Smith, Red Spot, Evansville, IN

Newly advanced techniques and materials provide still more attractive and functional coatings on plastic products. Plastic parts can now pass requirements for interior and exterior automotive and truck applications not possible in the past without expensive environmentally damaging techniques. The use of new materials in PVD targets and sputteringtechniques now makes it possible to match even the bluest chrome and provide unparalleled color selections without coloring the topcoat to create a reliable coating process. Advancements in UV cured base and top coats is providing protection not available in the past while using environmentally neutral materials. Combining state of the art application techniques with these advancements makes projects possible today that just two years ago failed. This presentation will follow the progression of technology to fulfill the requirements of a real world customer on real worldparts. The information will be presented by members of the team who participated in the project. Each aspect of the successful “Triangle” Team approach will be discussed.

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Wednesday, April 21

1:00 p.m.

IS

8

Water Vapor

K.P. Flynn and C. Rebecchi, Brooks

Water vapor cryopumps,

Wednesday, April 21

1:00 p.m. IS 8 Water Vapor

Wednesday, April 21

1:00 p.m. IS-8 Water Vapor Cryopumping: Refrigerant Phaseout Compliance and Energy Efficiency

K.P. Flynn and C. Rebecchi, Brooks Automation, Inc., Petaluma, CA

Water vapor cryopumps, which use mixed gas refrigeration technology, rely on mixtures containing four or more refrigerants, each with widely spaced boiling points. Historically, these mixtures contained two or more chlorinated refrigerants such as chlorofluocarbons (CFC’s) or hydrochlorofluorocarbons (HCFC’s). Both classes of compounds contribute to depletion of the stratospheric ozone layer and are subject to legislative action to phase out these compounds. CFC refrigerants were banned in the U.S. and other developed countries in 1995. HCFC refrigerants are currently in use, but are targeted for phase out. Mixed gas refrigerant water vapor cryopumps have relied on HCFC refrigerants, including HCFC R-22 since the early 1990s when CFC refrigerants were phased out. Although water vapor cryopumps experience much lower leakage rates than commercial refrigeration systems, they are subject to the same laws as all other refrigeration equipment. Effective January 1, 2010, the use of R-22 will be banned on new equipment in the U.S. R-22 is a key refrigerant in water vapor cryopumps due to its excellent refrigeration capacity andits relatively low freezing point (-160°C). The phase out of R-22 has required extensive development of alternative refrigerants. It has been accomplished for three important sizes of water vapor cryopumps. The resulting products provide water vapor cryopumping at the same speeds and water vapor partial pressures as the previous mixtures with R-22. This paper reviews the development approach, and compares system and pumping performance for these green products. Experimental data from commercial vacuum systems is presented for the old and new product along with power consumption data.

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Wednesday, April 21

1:20 p.m.

IS

9

ReducingEnergy

J. Makin, EBARA Technologies Inc.,

As costs to produce and

Wednesday, April 21

1:20 p.m. IS 9 Reducing

Wednesday, April 21

1:20 p.m. IS-9 Reducing Energy Consumption with Energy Efficient Vacuum Pumps

J. Makin, EBARA Technologies Inc., Sacramento, CA

As costs to produce and deliver energy increase, energy producers are passing the costs onto manufacturing companies.Manufactures are struggling to control and manage energy usage at various levels throughout their processes and reducing energy use is a major focus. Vacuum pumps are a significant area to focus on for energy savings. Large numbers of aging vacuum pumps are being used in today’s manufacturing. Depending on the process tool type, a vacuum system alone can contribute as much as 60% of the total electrical demand for a manufacturer. A more efficient vacuum pump design has been developed which incorporates three different elements that radically reduce thepower required by dry vacuum pumps. By improving motor efficiencies, increasing the number of compression stagesand enhancing motor controls - the energy consumption from vacuum pumps is significantly reduced - resulting in lower operating costs and improved profitability. Intelligent vacuum pump controls and enhanced communication between the processing tools and vacuum pumps also allow for further reduction in energy usage by placing the pumpsin idle when the tool calls for it.

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Wednesday, April 21

1:30 p.m.

IS

10

OCTIV Current-

M.B. Hopkins, P. Scullin, B.Dolinaj, D. OʼSullivan, and

Current- voltageprobes monitor

Wednesday, April 21

1:30 p.m. IS 10 OCTIV

Wednesday, April 21

1:30 p.m. IS-10 OCTIV Current-Voltage Probe for Diagnostics in Deposition Plasma.

M.B. Hopkins, P. Scullin, B. Dolinaj, D. O’Sullivan, and D. Gahan, Impedans Ltd., Dublin, Ireland

Current- voltage probes monitor power parameters, such as the voltage, current and phase angle of an RF power used togenerate the plasma (source) or to bias a substrate. A number of commercial systems are available and a key feature is that the sensors work in non-50Ω environment. This allows the sensors to be placed either pre-match or post-match andstill make accurate measurements. The OCTIV current- voltage probe uniquely measures power parameters in pulsed plasma with a time step resolution of a few microseconds, allowing the user to monitor the instantaneous power duringrepetitive pulsed plasma. The user can establish how the plasma impedance varies with time. More importantly, the OCTIV allows the user to measure not just the power parameters, but also the plasma parameters. The most important plasma parameter in capacitively coupled plasma source or bias configurations is the flux of ions to a substrate. The ionflux is difficult to establish in deposition tools as the plasma often deposits insulating layers, such as in the manufactureof solar panels. The OCTIV offers a unique, patent pending application to measure directly the ion flux to a biased substrate in situ during a process. In this presentation, we will show details of the application of the OCTIV system inmeasuring pulsed power parameters and in the direct measurement of ion flux to a biased substrate in a PECVD plasma.

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Wednesday, April 21

1:40 p.m.

IS

11

AchievingLaminar

C. OʼDonohue, University of Florida, Gainesville, FL;

Chemical VaporDeposition and

Wednesday, April 21

1:40 p.m. IS 11 Achieving

Wednesday, April 21

1:40 p.m. IS-11 Achieving Laminar Flow in Chemical Vapor Deposition

C. O’Donohue, University of Florida, Gainesville, FL; T. Anderson, Florida Energy Systems Consortium, University ofFlorida, Gainesville, FL; and R. Holoboff and B. Bowers, A&N Corporation, Williston, FL

Chemical Vapor Deposition and its variant Atomic Layer Deposition (ALD) are commonly used to deposit thin films. For most applications, the goal is to deposit films of uniform composition. ALD reactors rely on self-limiting chemisorption of sequentially delivered reactants on the surface, and thus is a reaction limited process. In reaction limited ALD processes, laminar flow yields isothermal surfaces and more uniform mass-transfer schemes, which contribute to the creation of uniform films. The importance of operating under conditions of laminar flow in CVD/ALDprocesses is explained and technology to achieve laminar flow is presented.

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Wednesday, April 21

1:50 p.m.

IS

12

Atomic Layer

S. Sneck, Beneq Oy, Vantaa, Finland

Atomic Layer Deposition

Wednesday, April 21

1:50 p.m. IS 12 Atomic Layer

Wednesday, April 21

1:50 p.m. IS-12 Atomic Layer Deposition for Solar and Photovoltaic Applications

S. Sneck, Beneq Oy, Vantaa, Finland

Atomic Layer Deposition (ALD) is a method to produce extremely conformal and dense thin films. The method is widely used in semiconductor industry, but is currently finding more and more applications. In the photovoltaic industry, an ALD zinc oxysulfide [Zn(O,S)] buffer layer has been shown to give 1%-unit increase of efficiency of copper indium gallium selenide (CIGS) solar cells compared to traditional chemical bath deposition (CBD) cadmium sulfide buffer layer. The ALD process is more economical than CBD. Furthermore, ALD is a vacuum integrated process, which significantly simplifies the production flow. Rear surface passivation by ALD aluminum oxide increases the efficiency of c-Si solar cells by approximately 1%-unit. Rear surface passivation is anticipated to be implemented into production in a couple of years. High capacity ALD production systems are being developed for thisapplication, with throughput of 3000 wafers per hour. Additionally ALD is a highly efficient anti-corrosion coating forsilver, superior to comparable PVD coatings. ALD has been used for years to protect silver articles, such as jewelry, from corrosion. The same method can be applied on silver mirrors in larger scale. Currently up to 1200 mm x 1200 mmsubstrate size has been coated with this process.

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Wednesday, April 21

2:00 p.m.

IS

13

A Novel RF Plasma

R. Merte, P. Wiedemuth, M.Glück, and T. Kirchmeier,

RF generators are widely used

Wednesday, April 21

2:00 p.m. IS 13 A Novel RF

Wednesday, April 21

2:00 p.m. IS-13 A Novel RF Plasma Power Supply Approach

R. Merte, P. Wiedemuth, M. Glück, and T. Kirchmeier, HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany

RF generators are widely used in semiconductor, flat panel display, and thin-film solar manufacturing processes. Meanwhile small-sized semiconductor based RF power generators featuring high reliability and high efficiency are available, such as the TruPlasma RF 1003, 13.56 MHz generator. However, for almost all applications system costs andoutput power yield are strongly influenced by additional components, such as RF cables including connectors and matching networks required for energy transfer from the RF generator to the plasma chamber. If the electrical parameters of such distributed systems are not matched perfectly together, performance and reliability loss may be the result. In order to reduce the overall system costs two things, widely considered as given facts for RF technology, havebeen put into question. Firstly, is there a need for a 50 Ohm link between generator and matchbox? And secondly, is a separate, cable connected matching unit really necessary? The paper provides an answer to both questions based upon the idea of combining a self-running RF generator in the kW range with an electronically variable or even fixed matching network in a single unit located directly at the plasma chamber without the common 50 Ohm RF link.

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Thursday Morning

April 22, 2010

Process Modeling and Control

Thursday, April 22

8:30 a.m.

A

1

Applied PIC-MC

M. Siemers, A. Pflug, and B. Szyszka, Fraunhofer

The increasing demands on

Thursday, April 22

8:30 a.m. A 1 Applied PIC-

Thursday, April 22

8:30 a.m. A-1 Applied PIC-MC Simulation for Process Analysis and Facility Development

M. Siemers, A. Pflug, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany


The increasing demands on size, throughput, and precision of industrial plasma coaters necessitate cost effective designand optimization tools. Thus, a parallel computing 3D simulation environment for gas flows and gas discharges has been implemented at Fraunhofer IST. The simulation environment, called “PICMC”, is based upon the Particle-in-CellMonte Carlo approach. Hereby multiples of neutral or charged particles are mapped as weighted “super particles” into adiscretized simulation domain. Subsequently, the molecular dynamic of the virtual particles is simulated within discretetime steps including a self consistent computation scheme for the electric field. After several time steps simulation results, like temperature or current, can be derived from the time and ensemble averaged particle states at the accordantgrid cells. To reduce the number of super particles and the computational work load, respectively various multi scale approaches have been implemented. Furthermore, a finite element mesh model has been incorporated to enhance geometry mapping into the simulation domain. Using massive parallelization, the PICMC framework allows for simulation based tuning of industrial plasma coaters with respect to tailored film growth conditions. Comparisons withexperimental measurements validate the reliability of the simulation results. For magnetron sputtering and plasma enhanced CVD examples of anomalous plasma aggregations and their causation are shown. Furthermore, we demonstrate some concrete applications of PICMC regarding layout optimizations of industrial plasma coaters.


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Thursday, April 22

9:10 a.m.

A

2

SputteringYield

S. Berg, T. Nyberg, and T. Kubert, Ångström

Sputtering yieldvalues for single

Thursday, April 22

9:10 a.m. A 2 Sputtering

Thursday, April 22

9:10 a.m. A-2 Sputtering Yield Amplification in Reactive Sputtering

S. Berg, T. Nyberg, and T. Kubert, Ångström Laboratory, Uppsala University, Uppsala, Sweden

Sputtering yield values for single elements are quite well documented. The situation is quite different for finding partialsputtering yield values for multi-element materials. Adding the alloy composition increases significantly the number ofpossible sputtering situations making it almost impossible to find reported values for arbitrary alloys. It has been reported that adding some heavy element atoms into a matrix of a low weight element significantly may increase the partial sputtering yield of the light atoms, sometimes as much as 2-300%. This effect has been named Sputtering YieldAmplification (SYA). In this study, we will report on efforts to obtain the SYA-effect on sputtering targets during reactive sputter deposition. This will enable to significantly compensate for the decrease in sputtering yield when the reactive deposition process approaches the target poisoned mode. Small amounts of heavy elements, e.g., Nb(93), Mo(96),Ta(181) and W(184) have been introduced to a target made from Al(27). To predict optimum heavy metal concentrations in the Al target, partial sputtering yield values have been simulated using the TRIDYN code. This is a binary collision approximation Monte-Carlo code frequently used for simulation of sputtering. Results from such calculations will be reported.

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Thursday, April 22

9:30 a.m.

A

3

Simulationof

F. Wang, R. Crocker, and R.Faber, Vacuum Process

In todayʼs thin-film fabrication,

Thursday, April 22

9:30 a.m. A 3 Simulation of

Thursday, April 22

9:30 a.m. A-3 Simulation of Precision Evaporation Coaters – Beyond Thickness Uniformity

F. Wang, R. Crocker, and R. Faber, Vacuum Process Technology, LLC, Plymouth, MA

In today’s thin-film fabrication, the demand for precision and throughput has made the empirical or trial-and-error methods inadequate. To develop high-precision equipment and processes for thin film manufacturing we have created acomputational model for evaporation coaters that feature complex substrate motions, including dome fixtures and planetary motions with planet tilt. The model permits accurate predictions of the thickness uniformity, material utilization and thickness per unit source-material for all these coater configurations. Properties of thin-film materials can be influenced by many factors during deposition. In evaporation coaters with planetary motion the growth of thin film materials can be affected by some important, however, invisible parameters such as the flux intensity and the incident angle, which change with time and differ from one location of the planet to another. By providing detailed analysis and statistics for these physical quantities the model allows developers to have a new level of understanding and control of their material growth. We will report the features of the computational model and its applications in coater design, process analysis and optimization.

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Thursday, April 22

9:50 a.m.

A

4

Process Model

T. Unkelbach, Fraunhofer Institute for Electron Beam

Controlling of aninline Electron

Thursday, April 22

9:50 a.m. A 4 Process

Thursday, April 22

9:50 a.m. A-4 Process Model Identification for a Plasma Enhanced Electron Beam PVD Process

T. Unkelbach, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; T. Fochtmannand H. Kubin, Institut für Angewandte Informatik, Technische Universität Dresden, Dresden, Germany; and C. Metzner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

Controlling of an inline Electron Beam Physical Vapor Deposition (EBPVD) process requires, mostly, the identification of proper process models, even more if the distance between the measuring points of the process input quantity, e.g., the electron beam power, and output quantity, e.g., a layer thickness measurement, is large in comparisonto the used substrate velocity. In this cases remarkable dead times between the quantities are common and therefore it isvery hard to control such processes. If plasma enhanced EBPVD process is used, it’s possible to employ specific spectral emission lines of the plasma, e.g., captured by optical emissions spectroscopy (OES), as controller auxiliary input quantity to speed up the controllers reaction on the process dynamics. In this presentation we show the results ofour investigations about the possibility of using the plasma spectral emission intensities as auxiliary input quantity to control the layer thickness, measured by X-ray fluorescence spectroscopy, for a plasma enhanced EBPVD process of SiOx deposited on a steel strip, which is a dead time affected system. That contains the identification of static and dynamic process models for the different control paths: the dependency of the layer thickness and the plasma emissionintensities from the EB power, and the dependency of the layer thickness from the plasma emission intensities. Finally,we compared the modeling results of the path “EB power – layer thickness measurement” to the results of the composed path “EB power – plasma emission intensities – layer thickness measurement”.

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Thursday, April 22

10:30 a.m.

A

5

Quartz Crystal

A. Yalin, J. Topper, B. Rubon, and C. Farnell,

We present a quartz crystal

Thursday, April 22

10:30 a.m. A 5 Quartz Crystal

Thursday, April 22

10:30 a.m. A-5 Quartz Crystal Microbalance Based System for Angularly Resolved Sputter Yield Measurements

A. Yalin, J. Topper, B. Rubon, and C. Farnell, Colorado State University, Fort Collins, CO


We present a quartz crystal microbalance (QCM) based system for high sensitivity differential sputter yield measurements of different target materials due to ion bombardment. Detailed knowledge of differential sputter yield profiles can aid optimization of coating processes based on ion beam etching. The setup uses gridded ion sources to provide mono-energetic and collimated ion beams at different ion energies (~30-3000 eV). To obtain sputter measurements, the QCM deposition monitor is moved to a series of locations above the sputtered target. At each location the rate of mass deposition is measured and the set of measurements provides the differential sputter yield profile. The profiles are fit with analytic expressions using two free parameters to provide a compact description of theprofiles. The differential sputter yields can be integrated to find total yields. We present examples of differential sputter yield profiles for different target materials including metals and multi-component materials. In many cases, azimuthally asymmetric profiles with clear non-diffuse behavior are observed. Validation experiments are presented that confirm high sensitivity and accuracy of sputter yield measurements even at ion energies close to sputtering threshold. We also present demonstrative modeling that uses the ion beam conditions and differential sputter yield profiles to model and optimize placement of targets and substrates in coating processes. Verbose invited Invited 40

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Thursday, April 22

11:10 a.m.

A

6

The Angular

K. Van Aeken and W. Leroy, Department of Solid

Characterisationand optimisation

Thursday, April 22

11:10 a.m. A 6 The Angular

Thursday, April 22

11:10 a.m. A-6 The Angular Distribution of the Arriving Metal Flux during Magnetron Sputter Deposition

K. Van Aeken and W. Leroy, Department of Solid State Sciences, University of Ghent, Ghent, Belgium; M. Horkel, Technische Universitaet Wien, Vienna, Austria; S. Mahieu and D. Depla, Department of Solid State Sciences, University of Ghent, Ghent, Belgium; and C. Eisenmenger-Sittner, Technische Universitaet Wien, Vienna, Austria


Characterisation and optimisation of the metallic flux towards the substrate is an important step towards the controlleddeposition of complex layers with desired properties by magnetron sputtering. An important parameter is the angular distribution of the arriving flux, as it influences the crystallographic orientation and the microstructure, for instance byself-shadowing effects. In this work we present an approximate analytical model predicting the angular distribution of the arriving metal flux. The flux is separated in a thermalized, a scattered and a non-scattered contribution starting fromthe differential collision cross section and the pressure-distance product. By estimating and describing the relative contributions, the main parameters influencing the angular distribution are identified. The model is verified by comparing to 1) simulations using the home written test particle MC-code SIMTRA describing gas phase transport, and2) experimental measurements carried out with a flux monitor, being a differentially pumped pinhole camera. Experiments and simulations are performed for a range of sputtered materials (W, Cu, Ti, Al, Mg) in Ar-gas using botha 5” planar and a laboratory scale rotating cylindrical magnetron. For both source types the necessary input for the SIMTRA code is taken from an electron MC-simulation of the discharge.

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Thursday, April 22

11:30 a.m.

A

7

Change ofMorpholog

J.I. Jeong and J.H. Yang, Hybrid Materials

Al coatings having

Thursday, April 22

11:30 a.m. A 7 Change of

Thursday, April 22

11:30 a.m. A-7 Change of Morphologies of Aluminum Coatings with Modified Layers and its Corrosion Characteristics

J.I. Jeong and J.H. Yang, Hybrid Materials Processing Research Department, and Magnesium Research Project, Research Institute of Industrial Science and Technology, Pohang City, Korea; Y.H. Park and K.Y. Heo, Magnesium Research Project, Research Institute of Industrial Science and Technology, Pohang City, Korea; and K.H. Lee and J.W.Park, Ulsan Industrial Technology Research Center, Research Institute of Industrial Science and Technology, Ulsan, Korea

Al coatings having multilayer-type modified layers such as plasma treated and Al2O3 layers in the coatings and/or between the coatings and substrate have been prepared on Nd-Fe-B permanent magnet to modify the morphology of thecoating and to enhance the corrosion resistance of the magnet. Magnetron sputtering has been employed to make the various types of coatings. First, Al2O3 sputtering conditions were optimized in reactive sputtering by varying the deposition parameters prior to coatings. The formation of Al2O3 film was confirmed from the binding energy shift measured by electron spectroscopy for chemical analysis. Three types of coating structures were designed and preparedby magnetron sputtering. The coating structures consist of (1) single Al coating, (2) modified coatings having oxide orplasma treated layer in the middle of coating structure, and (3) Al/Al2O3 multilayer coatings. Surface and cross-sectional morphologies showed that Al/Al2O3 multilayer grew as a layered structure, and that very compact Zone 3 likestructure were formed. X-ray diffraction peak showed that the crystal orientations of multilayer coatings were similar tothat of the bulk powder pattern. Hardness increased drastically when the Al thickness was around 1μm in the Al/Al2O3

multilayer. From the salt spray test and pressure cooker test, it has been shown that the multilayer coatings showed good corrosion resistance compared to Al single or modified layer coatings.

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Thursday, April 22

11:50 a.m.

A

8

Process Control

E. Schultheiss, P. Frach, H.Bartzsch, D. Gloess, and K.

New developments in

Thursday, April 22

11:50 a.m. A 8 Process

Thursday, April 22

11:50 a.m. A-8 Process Control and Optical Applications for Sputtering and PECVD of Inorganic and Hybrid Coatings

E. Schultheiss, P. Frach, H. Bartzsch, D. Gloess, and K. Taeschner, Fraunhofer Institute for Electron Beam and PlasmaTechnology FEP, Dresden, Germany

New developments in reactive pulse magnetron sputtering have significantly improved process stability and reproducibility. In this paper, extended technological possibilities are described arising from plasma emission spectroscopy and multi-wavelength control. Flexible selection of characteristic emission lines ensure stable process control with different target materials and reactive gases. The possibility of operating the magnetron system in unipolar,bipolar and pulse packet mode allows adjusting the energetic substrate bombardment in a wide range. This gives new technological degrees of freedom to optimize the deposition process and the film properties. One group of applicationsis in the field of optical coatings. Interference filters with high quality are obtained by sputtering of a silicon target in aprecisely controlled reactive gas mixture of oxygen and nitrogen. Examples of deposited discrete and rugate filters as well as antireflective coatings are presented. Magnetron sputter sources can also be used as energy source in a PECVDprocess. This magnetron PECVD (magPECVD) process using HMDSO and HMDSN as precursors allows to adapt to the surface characteristics of soft and elastic polymer substrates. In this paper, a combination of magPECVD and reactive sputtering is presented, which is used to coat ophthalmic lenses with both scratch resistant and antireflective coating. Verbose invited

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Optical Coatings

Thursday, April 22

8:30 a.m.

O

10

Coherenceand

A. Macleod, Thin Film Center, Inc. Tucson, AZ

Coherence is essentially a

Thursday, April 22

8:30 a.m. O 10 Coherence

Thursday, April 22

8:30 a.m. O-10 Coherence and Optical Coatings

A. Macleod, Thin Film Center, Inc. Tucson, AZ


Coherence is essentially a measure of an ability to produce perceptible interference effects. It is a term that is frequentlyused in connection with a source of illumination and, especially, when the object of the illumination is an optical coating. However, whether or not interference effects are present and, therefore, a certain degree of coherence, is muchmore a function of the properties of the complete system than simply an attribute of the light that illuminates it. Although advanced coherence theory presents a somewhat forbidding mathematical appearance, nevertheless, the fundamental concept is clear and simple. This talk will concentrate on the simple aspects, and particularly how the concept applies to systems involving optical coatings.


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Thursday, April 22

9:10 a.m.

O

11

Calibration and

K. Dunn, E. Chelomentsev,R. Dabkowski, P. Wilson, T.

In this study, amorphous

Thursday, April 22

9:10 a.m. O 11 Calibration

Thursday, April 22

9:10 a.m. O-11 Calibration and Comparison of SiCxNy Thin Films Deposited by ICP CVD

K. Dunn, E. Chelomentsev, R. Dabkowski, P. Wilson, T. Roschuk, and J. Wojcik, Centre for Emerging Device Technologies, McMaster University, Hamilton, Canada; Y. Xiaoming, J. Hong, and M. Davies, SiXtron, Dorval, Canada; and P. Mascher, Centre for Emerging Device Technologies, McMaster University, Hamilton, Canada


In this study, amorphous silicon carbonitride (SiCxNy) films of varying composition were grown by inductively coupledplasma chemical vapour deposition (ICP CVD). The film composition was directly controlled by varying the process gas flow rates of 30% SiH4 in Ar (0-20 sccm), CH4(0-20 sccm), N2 (0-10 sccm), and a proprietary polymer source provided by SiXtron Advanced Materials Inc. (0-20 sccm). Film growth dependencies upon substrate heater temperature and RF plasma power were also examined in the neighborhood of 500°C and 300W. Elemental compositions of the films were determined through Rutherford backscattering spectroscopy (RBS) and elastic recoil detection (ERD) experiments on both as-deposited and annealed samples. In the films deposited using conventional gas combinations we find oxygen contamination that is not present in the films produced using SiXtron Gas. Variablewavelength spectroscopic ellipsometry shows that the dielectric constant varies smoothly between that of SiNx and SiCx

for both conventional and SiXtron gas films. Growth rates for the SiXtron gas films are most heavily dependent upon the SiXtron gas flow, similar to the role of SiH4 in the conventional gas films. Finally, Fourier transform infrared spectroscopy (FTIR) has been performed to examine the bonding characteristics of each series of films.

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Optical Coatings

Thursday, April 22

9:30 a.m.

O

12

Evaluatingthe High-

G. Czeremuszkin and M. Latreche, Nova-Plasma,

Fogging is commonly

Thursday, April 22

9:30 a.m. O 12 Evaluating the

Thursday, April 22

9:30 a.m. O-12 Evaluating the High-Quality Fog Protective Coatings

G. Czeremuszkin and M. Latreche, Nova-Plasma, Inc., Montreal, Canada; and G. Mendoza-Suarez and J. Bruneaux, Revision Eyewear Inc., Montreal, Canada

Fogging is commonly observed when the humid-warm air contacts a cold surface of eyewear lenses, making the observed image blurred and hazy. To protect from fogging, the lenses are typically modified by so-called Anti-Fog (AF) coatings, which make their surface strongly hydrophilic thus inducing water vapor condensation as a smooth, thinand invisible film that uniformly flows down on the lens as the condensation progresses. Various AF coatings differ inquality, stability, susceptibility to contamination, etc. Some of them show delayed fogging, others fog during drying, orexhibit nonuniformities in condensed water film, which degrades the acuity of vision through the lens. Comparing the performance of good, very good and excellent AF-coated lenses is difficult: they do not show classical fogging and theexisting testing methods, which are based on fog detection, are therefore inapplicable. The proposed method of evaluating and quantifying AF properties is based on measuring intensity of laser light scattered on the lenses exposed to controlled humidity and temperature conditions. We present the results of characterization of temporary- and permanent AF hydrophilic coatings. The method is especially useful in development of new AF coatings for military-,sport-, medical and industrial protective eyewear.

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Thursday, April 22

9:50 a.m.

O

13

Importance of

R.R. Willey, Willey Optical,Consultants, Charlevoix, MI

In a typical optical coater,

Thursday, April 22

9:50 a.m. O 13 Importance of

Thursday, April 22

9:50 a.m. O-13 Importance of Proper Deposition Rate Control and How to Achieve It

R.R. Willey, Willey Optical, Consultants, Charlevoix, MI

In a typical optical coater, the goal is that, when the shutter opens, the material is depositing at the desired rate and thatthe rate does not vary until the shutter closes. This goal is not often well satisfied in the industry, and therefore can contribute to various problems in the optical and physical properties of the films. Guidance is provided in finding the various settings for a quartz crystal controller which will minimize these problems. Although some of this informationmay be familiar to many in the field, it is thought to be of enough potential benefit to others that it is reviewed here.

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Optical Coatings

Thursday, April 22

10:30 a.m.

O

14

State of the Art

K. Scherer and R. Bosmans, Essilor

For the last years, plastic

Thursday, April 22

10:30 a.m. O 14 State of the

Thursday, April 22

10:30 a.m. O-14 State of the Art and Challenges for Coatings on Eyeglasses

K. Scherer and R. Bosmans, Essilor International, St. Maur des Fossés, France; and M. Mildebrath, Essilor of America,St. Petersburg, FL


For the last years, plastic lenses have been continuously replacing glass lenses for ophthalmic applications. This has only become possible through the use of protective functional coatings. Lens coatings are becoming more and more sophisticated, just as the optical designs of the corrective function of the lenses advance, especially with the introduction of digital surfacing. Still today, the expectations for the coating packages continue to grow. In the past, coatings that provided scratch resistance and anti-reflective properties were developed and marketed. Meanwhile, the list of expectations has grown to include easy cleaning, anti-static, hydrophobic, and high efficiency. Further, the technologies used to apply these coatings have developed and increased in sophistication and speed. In this paper we cover three main topics. We briefly review the requirements for such coatings, both mechanically and spectrally. Thiswill include a description of a 'typical' product available today, followed by a discussion on new and emerging attributes for such coatings. Finally, we will present new technologies being used or proposed for the application of such coatings.


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Thursday, April 22

11:10 a.m.

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15

Luminescent SiCxNy

K. Dunn, E. Chelomentsev,P. Wilson, T. Roschuk, J.

Thin films of hydrogenated

Thursday, April 22

11:10 a.m. O 15 Luminescent

Thursday, April 22

11:10 a.m. O-15 Luminescent SiCxNy Thin Films Deposited by ICP CVD

K. Dunn, E. Chelomentsev, P. Wilson, T. Roschuk, J. Wojcik, and P. Mascher, Centre for Emerging Device Technologies, McMaster University, Hamilton, Canada


Thin films of hydrogenated amorphous silicon carbides and nitrides have long been materials of interest due to their high hardness, chemical inertness, wide bandgap, luminescent properties and tunable optical constants. Photoluminescent activity is dependent on the cluster host matrix, local interfaces and the thin film deposition process.So, the increased compositional space of the ternary compound SiCxNy allows for increased control of the optical properties of these films while maintaining luminescent behavior. For this work, we used an inductively coupled plasma chemical vapor deposition (ICP CVD) system to deposit SiCxNy films while varying the gas flow rates (SiH4, CH4, N2, Ar), the gas entry positions, and post deposition thermal annealing temperatures (one hour long anneals at 600-1200°C under flowing forming gas). Photoluminescence (PL) measurements with a 325 nm He-Cd laser show a large,broad peak, centered at approximately 550 nm, and a distinct shoulder at around 475 nm. Both peaks are dependent upon composition and annealing conditions. The films were further investigated through the use of Fourier transform infrared spectroscopy reflectance measurements, spectroscopic ellipsometry, Rutherford backscattering spectrometry, and elastic recoil detection to determine bonding, refractive indices and film compositional properties and their relationship to their PL characteristics.

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Optical Coatings

Thursday, April 22

11:30 a.m.

O

16

Mechanical and

C. Hecquet, J.-M. Lamarre,N. Tueber, T. Poirie, O.

Highly transparent

Thursday, April 22

11:30 a.m. O 16 Mechanical

Thursday, April 22

11:30 a.m. O-16 Mechanical and Optical Properties of Organosilicone Glass Films

C. Hecquet, J.-M. Lamarre, N. Tueber, T. Poirie, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, Department of Engineering Physics, École Polytechnique de Montréal, Montréal, Canada

Highly transparent optical SiO2-like coatings were deposited by plasma enhanced chemical vapor deposition (PECVD)and physical vapor deposition (PVD) using organosilicone precursors mixed with oxygen. Presence of different molecules and atomic species in the deposition reactor were identified by optical emission spectroscopy and related to the films composition and microstructure determined by IR-ellipsometry, Fourier-Transform Infrared Spectroscopy, X-ray photoelectron spectroscopy and elastic recoil detection. The coatings’ optical properties (refractive index and absorption) were evaluated using a combination of optical transmission and spectroscopic ellipsometry measurements.Mechanical characteristics (hardness, elastic modulus and stress) of films fabricated at various precursor concentrationswere systematically analyzed using depth-sensing indentation and radius of curvature measurements. A methodology allowing for the measurement of the mechanical and tribological properties of thin films that simultaneously possess high elastic rebound and a significant visco-elastic behavior was developed.

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Thursday, April 22

11:50 a.m.

O

17

Optimization of

E. Gutierrez-Berasategui and J. Barriga, Tekniker

Al-doped ZnO films have been

Thursday, April 22

11:50 a.m. O 17 Optimization

Thursday, April 22

11:50 a.m. O-17 Optimization of Optical and Electrical Properties of Transparent and Conductive Al-Doped ZnO Films Prepared by DC Pulsed Magnetron Sputtering

E. Gutierrez-Berasategui and J. Barriga, Tekniker Research Centre, Eibar, Spain

Al-doped ZnO films have been extensively applied as frontal electrodes in solar cells because they combine high visible transparency and electrical conductivity. In this paper, an exhaustive analysis of the growth conditions of these films has been carried out in order to obtain the optimum properties of these layers. The films have been prepared by DC pulsed magnetron sputtering with a facing ceramic target (0.5 wt% of Al doped ZnO) where the influence of the main deposition parameters such as sputtering power, oxygen argon ratio, pulsing frequency and substrate temperaturehas been studied. The aim of this study is to correlate these deposition parameters with the structure and morphology ofthe layers measured by x-ray diffraction, scanning electron microscopy and atomic force microscopy, with the optical properties (transmittance and refractive index) measures by UV/VIS spectrometer and with the electrical properties measured by a four point probe.

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Tribological & Decorative Coating

Thursday, April 22

8:30 a.m.

T

7

Role of Wear-

M. Azzi, École Polytechnique de Montréal,

Wear, erosion, corrosion and

Thursday, April 22

8:30 a.m. T 7 Role of Wear-

Thursday, April 22

8:30 a.m. T-7 Role of Wear-Corrosion Synergism in the Degradation of Hard Protective Coating Systems

M. Azzi, École Polytechnique de Montréal, Montréal, Canada


Wear, erosion, corrosion and other forms of deterioration of materials and components surfaces used in different sectors of industry generally lead to a significant decrease of performance, efficiency, energy consumption, and safety,and substantially increase the production cost. In response to these problems, different protective coating systems haverecently been developed, especially those using vacuum-based technologies that can potentially replace the currently used polluting and energy inefficient methods. Further progress in this field, however, largely depends on the understanding of the surface and interface effects, especially in the case of tribocorrosion when degradation of materials results from the combination of tribological and electrochemical processes. In such situations, due to synergistic effects, the material loss can be larger than the sum of the losses due to wear and corrosion acting separately. This presentation will particularly focus on the methodology that allows one to conduct sliding wear and corrosion tests simultaneously and to follow in situ the degradation process of the coating system by controlling, in realtime, the corrosion current and corrosion potential. In combination with the electrochemical impedance spectroscopy and modeling using equivalent electrical circuits, this approach can then be applied for detailed analysis of the degradation mechanisms related to the electrochemical reactions at the coating/electrolyte interface under wear conditions. Possible mechanism of tribocorrosion involves effects such as infiltration of liquid through nano-scale porosities or pathways in the film followed by electrochemical reaction with the substrate leading to the reduction of adhesion strength. Using practical examples from the areas of biomedical and aeronautical applications, it will be shown that detailed understanding of the tribocorrosion mechanisms can be successfully used to design new coating architectures with substantially enhanced performance and long term stability.


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Thursday, April 22

9:10 a.m.

T

8

Improvement of

M. Shafiei, A.R. Riahi, F.G.Sen, and A. Alpas,

Proton exchange

Thursday, April 22

9:10 a.m. T 8 Improvement

Thursday, April 22

9:10 a.m. T-8 Improvement of Adhesion of Platinum to Carbon Surfaces Using PVD Coatings

M. Shafiei, A.R. Riahi, F.G. Sen, and A. Alpas, University of Windsor, Department of Mechanical, Automotive and Materials Engineering, Windsor, Canada

Proton exchange membrane fuel cells (PEMFCs) use platinum as a standard catalyst for both oxidation of hydrogen and reduction of oxygen. Migration and agglomeration of fine platinum particles supported on carbon surfaces reduce the effectiveness and durability of PEMFCs. In this work, thin films of gold, titanium and chromium were deposited asmonolayers on three different carbon surfaces, namely graphite, hydrogenated diamond-like carbon (H-DLC) and non-hydrogenated diamond-like carbon (NH-DLC), using an RF plasma sputtering system. Adhesion of platinum to the coated surfaces was evaluated by analyzing the coefficient of friction (COF) curves obtained from sliding a platinum pin against the coated surfaces using a micro-scratch system in ambient air. The contact surfaces were studied using scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and optical interferometry techniques. The results revealed that platinum formed a relatively strong bond to the NH-DLC surface, whereas the poor adhesionof platinum to graphite and H-DLC surfaces improved significantly by incorporating a thin interlayer (~40 nm) of carbide-forming elements like titanium and chromium. The experimental results were verified with interface strength calculations, carried out using first principles simulations, for graphite and platinum surfaces with and without metallicmonolayers at their interface.

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Thursday, April 22

9:30 a.m.

T

9

New Coatings

C. Leyens, Technische Universität Dresden,

Sand erosion ofaero engine

Thursday, April 22

9:30 a.m. T 9 New Coatings

Thursday, April 22

9:30 a.m. T-9 New Coatings for Aerospace Applications

C. Leyens, Technische Universität Dresden, Dresden, Germany; and O. Schroeter, W. Garkas and A. Flores Renteria, Brandenburg University of Technology Cottbus, Cottbus, Germany

Sand erosion of aero engine hardware is a severe problem that causes substantial loss of airfoil material and thus reduces engine thrust and efficiency. Simple hard coatings have shown only minor improvement against erosion; therefore, more sophisticated coating systems were developed in the past, mainly consisting of multilayered structures.The present paper will address recently developed nanolaminate coatings based on MAX-phase compositions that haveshown astonishing resistance against erosion in a laboratory erosion test. The coatings were produced in an industrial-scale magnetron sputtering equipment. Post-testing analysis of the damaged surfaces revealed that the nanolaminate coatings failed by incremental loss of thin layers thus providing a long incubation period that retards the onset of rapidmaterial loss of the underlying airfoil material.

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ABSTRACTEntry

Thursday, April 22

9:50 a.m.

T

18

Influenceof

M. Weber, P. Kaestner, andK. Köster, Fraunhofer

Forging tools have a short

Thursday, April 22

9:50 a.m. T 18 Influence of

Thursday, April 22

9:50 a.m. T-18 Influence of Different Plasma Nitriding Treatments and Coatings on the Wear Behaviours of Forging Tools for the Production of Automotive Diesel Injection Parts

M. Weber, P. Kaestner, and K. Köster, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; H. Paschke, Fraunhofer Institute for Surface Engineering and Thin Films, Dortmund, Germany; and H. Thomsen, Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

Forging tools have a short lifetime compared to cold forming tools, e.g., for sheet metal forming. Tool life quantities are often limited to just a few thousand parts. High local surface temperatures alternately to spray cooling with water based lubricants fatigue the tool material. Crack initiation and crack growth due to thermal shock exposure often causespalling of the tool steel and are starting points of extensive wear. Hard coatings like CrN or TiAlN only have a minor influence on this behaviour. That’s why forging tools are mostly uncoated up to now. There again, plasma nitriding hasa significant influence on the ductility and crack resistance of the tool surface especially under thermal shock conditions. Exemplary the main wear mechanism will be discussed for plasma nitrided and additionally coated forgingtools, made from 1.2367 hot forming tool steel. The influence of nitriding parameters like temperature, nitrogen supplyand nitriding time on nitriding depth, hardness and crack sensitivity will be analysed. Different chromium based coatings like CrWN and CrVN as well as boron based layers were investigated. Comparative application tests in the production of automotive diesel injection parts showed the influence of the different surface treatments on wear behaviour and lifetime. Verbose invited

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Thursday, April 22

10:30 a.m.

T

10

Plasma Deposition

H.T. Beyene, Materials Innovation Institute (M2i),

Nanocomposite(NC) thin films

Thursday, April 22

10:30 a.m. T 10 Plasma

Thursday, April 22

10:30 a.m. T-10 Plasma Deposition of Multilayer Au-SiO2 Nanocomposites for Surface Plasmon Resonance Based Red Colored Coatings

H.T. Beyene, Materials Innovation Institute (M2i), Delft, The Netherlands and Eindhoven University of Technology, Eindhoven, The Netherlands; F.D. Tichelaar, Kavli Institue of Nanoscience, Delft University of Technology, Delft, The Netherlands; and M.C.M. van de Sanden and M. Creatore, Department of Applied Physics, Eindhoven University,Eindhoven, The Netherlands

Nanocomposite (NC) thin films with metallic nanoparticles (NPs) embedded in a dielectric material show attractive plasmonic properties due to dielectric and quantum confinement effects. In this work, an expanding thermal plasma chemical vapor deposition process is combined with a radio frequency magnetron sputtering to deposit the dielectric/metal NCs with controlled size and density of NPs. Multilayer nanostructures were prepared in particular to increase the number density of the NPs at a fixed size and shape of the nanoparticles. The possibility to control independently size and number density of the NPs allows the development of surface plasmon resonance based deep colored coatings. The influence of the number of layers, metal filling in each layer, dielectric layer thickness and substrate temperature on the multilayer nanostructure and the relation with the color coating are presented in detail. Thenanoparticle size and distribution in the multilayer nanostructures were measured by transmission electron microscopy(TEM). Rutherford backscattering (RBS) and energy dispersive x-ray spectrum (EDS) were used to determine the metal filling factor (f). Fourier Transform Infra-Red transmission spectroscopy (FTIR) was used to determine the film chemical composition. Optical properties of the nano-composite layers have been investigated by UV-VIS-NIR variable angle spectroscopic ellipsometry (SE) and UV-Vis spectrophotometer (UVVS).

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Thursday, April 22

10:50 a.m.

T

11

Optical and

R. Birney and F. Placido, University of the West of

Diamond-like carbons (DLCs)

Thursday, April 22

10:50 a.m. T 11 Optical and

Thursday, April 22

10:50 a.m. T-11 Optical and Physical Aspects of Diamond-Like Carbon Thin Films

R. Birney and F. Placido, University of the West of Scotland, Paisley, United Kingdom

Diamond-like carbons (DLCs) have attracted much interest over the last 30 years, and have found a wide range of applications, including in optoelectronic devices, solar cells, infrared optics and as a protective coating for metals in corrosive and/or abrasive environment. These consist of the amorphous hydrogen-carbon alloys (a-C:H), hydrogen-freeamorphous carbons (a-C) and tetrahedrally-structured amorphous carbons, (ta-C), which can contain in excess of 90% sp3 bonding. In this paper, diamond-like carbon thin films have been deposited on silicon wafer, silica and various alloysubstrates by plasma-enhanced chemical vapour deposition (PECVD), using argon and hydrocarbon precursors. The optical properties of these films have been modeled and measured using spectroscopic ellipsometry and transmittance/reflectance spectroscopy. The physical properties of these films have also been examined, by nanoindentation, surface energy measurement, and the nano-structure of the films studied by SEM and AFM. The corrosion inhibiting properties of the films when deposited on various alloys have been quantified by voltammetry andelectrochemical impedance spectroscopy (EIS). The effects of varying the processing parameters on the properties of the films have also been considered.

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Thursday, April 22

11:10 a.m.

T

12

Design and

R. Vernhes and O. Zabeida,École Polytechnique de

It is well known that virtually any

Thursday, April 22

11:10 a.m. T 12 Design and

Thursday, April 22

11:10 a.m. T-12 Design and Fabrication of Red Color Coatings for Decorative Applications

R. Vernhes and O. Zabeida, École Polytechnique de Montréal, Montréal, Canada; R. Tietema and I. Kolev, Hauzer Techno Coating BV, Venlo, The Netherlands; and J.E. Klemberg-Sapieha and L. Martinu, École Polytechnique de Montréal, Montréal, Canada

It is well known that virtually any hue can be obtained by depositing interferometric multilayer filters composed of transparent films on any flat substrate. However, in order to reach a specific color with a high saturation level, this method usually requires depositing a large number of layers with well-controlled thicknesses and refractive indices. Furthermore, this type of design is subject to color shifting as the angle of incidence is changed, and coatings are proneto delamination due to high mechanical stress. In this work, we propose a simple design composed of three layers (TiN/Fe2O3/SiO2) that relies on both absorption and interference effects to produce red color coatings on stainless steel substrates with low color shift. Each of the three materials was selected to serve one or several functionalities, i.e., to modify the shape of the reflection spectrum (absorber, reflective and antireflective layers) or to improve the scratch resistance of the coating (hard bottom coating, protective top coating). The red color is insensitive to the TiN thicknessand the type of substrate, while the thicknesses of the two top layers were optimized for a specific red shade using simulations. The complete stack was successfully deposited and characterized by spectrophotometry and microscratch testing. The experimental results were found to be in good agreement with simulations.

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Thursday, April 22

11:30 a.m.

T

13

Optical and

G.G. Fuentes, F. Martin, R.Rodriguez, and J. Oses,

The deposition of metal thin

Thursday, April 22

11:30 a.m. T 13 Optical and

Thursday, April 22

11:30 a.m. T-13 Optical and Conductive Properties of Ag Thin Films Deposited on Plasma Pretreated PET andPEN Foils.

G.G. Fuentes, F. Martin, R. Rodriguez, and J. Oses, Centre of Advanced Surface Engineering-AIN, Pamplona, Spain; I.de Schrijver and K. Eufinger, Centexbel, Zwijnaarde, Belgium; and L. López, Fundación CETEMMSA, Mataró-Barcelona, Spain

The deposition of metal thin films on flexible substrates is a matter of strong interest among the coating industries. In this work we have investigated the properties of silver thin films deposited on PET and PEN thin foils by the cathodic arc evaporation physical vapour deposition techniques. The study has focused on the effects of DC pulsed plasma oxygen pre-treatments of the plastic foils on the conductive properties of the Ag films. It has been found that the opticalreflectivity R of the Ag films is higher all over the soft UV-VIS-NIR wavelength range (lambda 300-800 nm). These results will be correlated with the enhancement of the surface energy of the PET and PEN pre-treated surfaces, as observed by contact angle measurements. Tentatively, the oxygen plasma might graft oxygen functionalities onto the plastic foils, thus permitting a better wetting of the Ag atoms on the foils, and the growth thin films with a lesser number of microstructural defects. The plasma pre-treatments can also be applied during the Ag-metallization of varnish-coated PES woven textiles. In fact, the conductivity of the Ag-foils decreases by a factor 3 when the textiles arepre-treated with DC oxygen plasma.

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Thursday, April 22

11:50 a.m.

T

14

Study of Mechanica

J.M. González, A.U. Paladines, A. Ruden, C.A.

Chromium-Chromium

Thursday, April 22

11:50 a.m. T 14 Study of

Thursday, April 22

11:50 a.m. T-14 Study of Mechanical, Tribological and Corrosion Properties of CrN/Cr Coatings Deposited on AISI 304, 4140, 1075 Steel by Reactive Magnetron Sputtering

J.M. González, A.U. Paladines, A. Ruden, C.A. Barbosa, J.S. Restrepo, and F.O. Sequeda, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales, Universidad del Valle, Cali, Colombia

Chromium-Chromium nitride bi-layers were deposited on AISI 304, 1075 and 4140 steel substrates using Reactive Magnetron Sputtering. X-Ray Diffraction, nanohardness, Ball on Disc, Scratch, electrochemical test using Tafel and Electrochemical Impedance Spectroscopy (EIS) were performed to analyze the coating performance in saline environment. The XRD patterns showed a FCC-CrN on (111) orientation and δCr phase. The hardness in all coated samples was statistically equal, showing good mechanical properties. The tribological properties showed an influence of substrate material. The coating deposited on 4140 steel presents the lower wear coefficient followed by the coating deposited on 304 and finally the coating deposited on 1075. The Scratch showed that the coated-1075 has the higher critical load followed by coated-4140 and finally by coated-304 stainless steel.

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Final Program Abstracts 2010 SVC Technical Conference Program Abstracts.pdf · properties of high...

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