Creating a Mechanical Mask Aligner workaround to be used ...
Facility meeting Nov. 2013 Gopal Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask...
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Transcript of Facility meeting Nov. 2013 Gopal Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask...
Facility meeting Nov. 2013GopalLithography Bay
Equipments:Laser writerEVG Mask alignerMJB4 mask alignerEVG Bonder
E-Line systemPioneer E-beam system
Raith e-Line off hrs
Raith e-Line non off hrs
Raith Pioneer off hrs
Raith Pioneer non off hrs
Used
105
131
NaN
136
196Not Used
Downtime
Unavailable
Total
50
150
250
Litho Equipments Utilization Chart.Nov.2013
Tota
l hrs
Laser writer (OH)
Laser writer (NOH)
EVG620 (OH)
EVG620 (NOH)
EVG501 (OH)
EVG501 (NOH)
MJB4 (TH)
Used 180 394 124 40 30 10 40
Not Used
0 146 56 320 150 350 140
Downtime
0 0 0 0 0 0 0
Un-available
0 0 0 180 0 180 540
Total 180 540 180 540 180 540 720
0100200300400500600700
Litho Equipments Utilization Chart. Nov. - 2013To
tal h
rs
Other Issues:• E-line- Laser resonator is replaced.•E-line was down(14,15thNov.)- Load lock switch was broken. Replaced with the spare switch got from local agent
•Bonder quartz bond glass plate got fabricated in CENTUM Local fabrication cost, about Rs.15000, EVG quoted about 1.25 lakhs. It is working….
Trend chart Nov. 2013 : E-line
Oct Nov Dec Jan Feb Mar Apr May Jun Jul Aug sept Oct Nov Dec0
5
10
15
20
25
30
9 10 10 1012 13 14 14 13 13 14 14
25 25
HSQ 120nm E-line
Month
CD in
nm
Trend chart. Nov.2013 : Pioneer
Jun Jul Aug Sept Oct Nov0
5
10
15
20
25
30
13 1315 15
25 25HSQ 120nm Pioneer
Month
CD in
nm
July Aug Sep Oct Nov0
0.5
1
1.5
2
2.5
3
3.5
MJB4
1 Micron2 Micron3 Micron
Feat
ure
size
in M
icron
s
Resist: AZnLoFSpin coated at 3000rpm for 40 sec.Thickness: 2umSoft bake 1 min at 110CExposure for 8 seconds in MJB4Post exposure bake for 1 min at 110CDevelopment for 25 secs (AZ726MIF)
Trend chart: Nov.2013:
Trend chart : Nov.2013
Resist: AZ5214ESpin coated at 6000rpm for 40 secsThickness: 1 umSoft bake 1 min at 110CExposure 50 mJ/cm2 in EVG620Development for 18-20 secs (AZ351B 1:4)
May
JuneJuly
August
Septem
ber
October Nov
0
0.5
1
1.5
2
2.5
3
3.5
EVG 620
Series3Series5Series7
Months
Feat
ure
size
in M
icron
s
Laser writer trend from Nov-12 to Nov- 13
Nov Dec Jan Feb Mar Apr May June Aug Sep Oct Nov0
0.5
1
1.5
2
2.5
3
3.5
Laser Writer (Direct writing)
Series1Series3Series5
Months
Feat
ure
size
in M
icron
s
Resist: S1813Spin coated at 4000rpm for 40 secsThickness: 1.3 umSoft bake 1 min at 110CDose: Lens-5, Filter-3%, Gain-12, D-step-2, Pos speed -1Development for 38 secs (AZ351B 1:4)
Laser writer trend from Oct -13 to Nov- 13
Oct Nov0
1
2
3
4
5
6
2.2 2.1
3.2 3.2
5.2 5.3
Laser writer (Mask writing)
Series3Series5
Months
Feat
ure
size
in M
icron
s
SEM image of Mask
Thanks