EUV High-NA scanner and mask optimization for sub 8 nm...
Transcript of EUV High-NA scanner and mask optimization for sub 8 nm...
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Jan van Schoot1, Koen van Ingen-Schenau1, Gerardo Bottiglieri1, Kars Troost1, John Zimmerman2,
Sascha Migura3 , Bernhard Kneer3, Jens Timo Neumann3, Winfried Kaiser3
7 October 2015, EUVL 2015, Maastricht
EUV High-NA scanner and mask optimization for sub 8 nm resolution
Public
1 ASML Veldhoven, The Netherlands 2 ASML Wilton, CT, USA
3 Carl Zeiss Oberkochen, Germany
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Under study
Resolution [nm] 32 27 22 16 13 10 7 <7
layo
ut NA 0.25 0.33
>0.5NA
13.5
Lens flare 8% 6% 4%
Illumination Flex-OAI s=0.8 Extended Flex-OAI
reduced pupil fill ratio
0.33NA DPT
s=0.5 s=0.2-0.9 coherence
Wavelength [nm]
4.0 7 3.0 DCO [nm]
MMO [nm] 7.0 - 5.0
1.4 1.5 1.2
2.0 2.5 1.7
pupil fill ratio defined as the
bright fraction of the pupil Overlay
10 5 15 Dose [mJ/cm2]
Power [W] 10 - 105 3 80 - 250
20 20
250 250 TPT (300mm)
Throughput [W/hr] 6 - 60 - 50 - 125 125 125
20
500
165
2.0 - 1.7 CDU [nm] 1.1 1.3 1.0 Imaging
1.0
1.4
0.9
NXE technology roadmap - Extendibility
Extend NA 0.33
to below 10nm
Improved lens
and illuminator
performance
Imaging / Overlay
performance
match node
requirements
Increased
throughput at
higher dose
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0.55NA
0.33NA
High-NA EUV enables ~2 nodes of shrink
for random cut mask applications
Simulation conditions:
• Conventional illumination
• No SMO applied
• Selection of cut mask features
• NA gain shown for minimum pitch
~2 nodes
𝐶𝐷 = 𝑘1λ
𝑁𝐴
Rayleigh
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Summary
• The EUV roadmap can be extended economically with High-NA
• Anamorphic optical concept resulting in half-field imaging using 6” masks
• Throughputs > 150WpH
• Further optimization of the anamorphic concept is under study
• Optimizing NILS, MEEF, dose and mask 3D effects for relevant use cases
• Facilitating adoption by minimizing impact on the mask supply chain
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Agenda
• High-NA EUV lithography
• Design challenges
• Mask optimization
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High-NA EUV lithography • Imaging: new concept needed
29 September 2015
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EUV Optical Train
intermediate focus
collector
Reticle (mask)
wafer
plasma
illuminator
field facet mirror
pupil facet mirror
projection
optics
source
9 July 2013, Sematech Workshop on High-NA, Winfried Kaiser, Jan van Schoot
diffraction orders
0th 1st
-1st
Mask = grating
Larger NA lens to
capture the orders:
larger cone
0th 1st
-1st
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Image contrast increases with a larger magnification But only needed in one orientation
NXE:3300
requirement
0
1
2
3
4 5 6 7 8
Magnification
Horizontal Lines
13 nm L/S, 0.33 NA (k1=0.318)
NIL
S*
8 nm L/S, 0.55 NA (k1=0.326)
High-NA tool
*NILS = Normalized Image Log Slope,
measure for image contrast
4 5 6 7 8
Magnification
Vertical Lines
NIL
S*
0
1
2
3
13 nm L/S, 0.33 NA (k1=0.318)
8 nm L/S, 0.55 NA (k1=0.326)
Anamorphic
magnification needed
for High-NA
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Mask
Wafer
Lens
High-NA Anamorphic Lens prints a half field By utilizing the current 6” mask
Mask
field
size
Wafer
field
size
104 mm
13
2 m
m
4x
26 mm
33
mm
4x Conventional lens
Full Field (FF)
HF
26 mm
16
.5 m
m
New
Half Field (HF)
QF
104 mm
13
2 m
m
4x/8x
Note: rectangular slit shown for illustration purposes
FF
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High-NA new anamorphic Half Field concept
2x more dies
Only half fields can be printed
2x more mask acceleration time
• Speed of wafer stays the same (26mm slit)
• Magnification 2x (4x 8x)
4x more overhead
Faster stages needed
Full Fields Half Fields
Acceleration of the reticle stage
needs to go up ~4x
29 September 2015
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High-NA Field and Mask Size productivity 500W enables throughput of 150wph with anamorphic HF
High-NA Half Field scanner
needs 500W for
150wph at 60mJ/cm2
Thro
ugh
pu
t [3
00
mm
/hr]
Source Power/Dose [W/(mJ/cm2]
Throughput for various source powers and doses
0
20
40
60
80
100
120
140
160
180
200
0 5 10 15 20 25 30 35
500 Watt
60mJ/cm2
1kW Watt
60mJ/cm2
NXE:3300
WS, RS current performance
WS 2x, RS 4x
HF
High NA anamorphic
FF
29 September 2015
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Imaging verification of the new Half Field concept Logic N5 clip Metal-1, 11nm lines. OPC
132 nm
17
2 n
m
Dose Anchor metrology
Focus Anchor metrology
11nm
Target Pattern Mask Pattern
8x
Illumination Pattern
8x
OPC is done for the 8x case,
then scaled to 4x/8x
29 September 2015
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Imaging verification of the new Half Field concept
Aerial Image Intensity in Hyperlith
Logic N5 clip Metal-1, 11nm lines
FF QF HF
Note: pictures at same scale,
smaller mask reflection is
also visible
29 September 2015
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Smaller mask angle of incidence for anamorphic system High-NA anamorphic system has smaller M3D effects than 0.33NA
(4x)
*L. de Winter, Understanding the Litho-impact of Phase due to 3D Mask-Effects when using off-axis illumination, EMLC 2015
Two-bar trenches are a
canary for M3D effects
29 September 2015
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Design Challenges
29 September 2015
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Overview main System Changes High-NA tool
Source
• 500W/1kW
Lens
• NA >0.5, high transmission
• Improved Thermal Control
Reticle Stage
• 4x current acceleration
• Same for REMA
Wafer Stage
• 2x current acceleration
• Improved leveling
Illuminator
• Improved
transmission New Frames
• Larger to
support Lens
29 September 2015
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Some Mask Consequences
• The image on the mask is a
stretched version of the image on
the wafer
• A 1:2 rectangle on the mask will
yield a square pattern on the wafer
• Angles do not stay the same
• An intended 45deg line will have a
different angle on the reticle
• From now on the mask will be
critical mainly in one direction
• 4x puts highest demands on CD,
registration and defectivity
The mask pattern is stretched in the scanning direction
x
y
MAG 4x in x MAG 8x in y
Note: rectangular slit shown for illustration purposes
29 September 2015
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Mask optimization
29 September 2015
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Different NXE:3500 anamorphic mag ratios feasible Optimization within the boundary condition of half-field on wafer pursued
requirement
4 5 6 7 8 Magnification
Horizontal Lines Aerial Image Contrast
NIL
S*
0
1
2
3
*NILS = Normalized Image Log Slope
8 nm L/S, 0.55 NA (k1=0.326)
4 5 6 7 8 Magnification
Vertical Lines Aerial Image Contrast
NIL
S*
0
1
2
3
8 nm L/S, 0.55 NA (k1=0.326)
Mag ratio options with
good NILS performance
29 September 2015
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Different magnification & mask are possible to produce same 26x16.5mm2 field
Vertical option
4x/8x, 104x132mm2
Sca
n d
ire
ctio
n
Square option
4.8x/7.5x, 124x124mm2
Horizontal option
5.1x/6.3x, 132x104mm2
Current Mask Layout
Quality Area
29 September 2015
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Reflection at reticle is angle dependent Several effects play a role Public
Slide 21
CD
pitch
α
h
heff
Mask Reflection
α
=
ML Reflection
x
z
y
mask
Shadowing
+ CD
pitch
α
heff
Ideal mirror Lost Reflection
Angle/pitchmask [deg/nm] 0.00 0.02 0.04 0.06 0.08
0.5
1.0
0.8
0.6
0.7
0.9
Refl
ec
tio
n [
AU
]
Assumptions:
• 10nm DL @ wafer
• Heff = 100nm
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ML Reflection: V- and S-option have lower angles than 0.33NA The square option has the lowest maximum angle
α
Vertical
Square
Horizontal
Hig
h-N
A o
ptions
0.3
3N
A
Angles at centre of field, note that CRAO changes per option
Max angles over entire field
ML reflection 4x H
igh
-NA
op
tion
s
4x
29 September 2015 Slide 22 Public
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Mask pitch enhances angular benefits of square option Less shadowing for Square option than at 0.33NA
Vertical
Square
Horizontal
Hig
h-N
A o
ptio
ns
0.3
3N
A
*18nm DL for 0.33NA
Vertical
Square
Horizontal
Hig
h-N
A o
ptio
ns
Angle/pitchmask [deg/nm] 0.00 0.02 0.04 0.06 0.08
0.5
1.0
0.8
0.6
0.7
0.9
Refl
ec
tio
n [
AU
]
Assumptions:
• 10nm DL @ wafer
• Heff = 100nm
CD
pitch
α
heff
Ideal mirror Lost Reflection
29 September 2015
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Propose new Mask Error Factor definition: MEF MEF* Emphasizes difference in the two orientations
𝑀𝐸𝐹 =∆𝐶𝐷𝑤𝑎𝑓𝑒𝑟
∆𝐶𝐷𝑚𝑎𝑠𝑘𝑚𝑎𝑔
𝑀𝐸𝐹∗ =∆𝐶𝐷𝑤𝑎𝑓𝑒𝑟
∆𝐶𝐷𝑚𝑎𝑠𝑘
29 September 2015
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Public
Standard MEF definition:
Normalized wrt. magnification
• Difficult with two mag’s
Changed to MEF* definition:
Normalization taken out
• Now it’s direct impact of
mask errors on wafer errors
• H and V will be very different
due to anamorphic lens
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10nm L/S: The square option is the best compromise Mask errors favor the H-option, push-back from NILS and Dose
NILS -2% MEF* V -23% Dose -6%
Anchor V
29 September 2015 Slide 25
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10nm Honeycomb: Square option is best compromise Mask errors now favor square, strong push-back Dose
NILS +2% MEF* -14% Dose -1%
Dose +13%
29 September 2015 Slide 26
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Vertical option Square option Horizontal
option
Magnification 4x/8x 4.8x/7.5x 5.1x/6.3x
Image field area 104mm X 132mm 124mm x 124mm 132mm x 104mm
Minimum distance pattern to edge 10mm 14mm 10mm
Minimum distance pattern to corner 26mm 20mm 26mm
Minimum feature size reference 20% larger 26% larger
MEF* reference 14-23% better 0-25% better
NILS reference ~same 0-4% worse
Dose reference 2-7% better 0-14% worse
4.8x/7.5x results in best overall imaging performance Analysis of selected use cases takes into account MEF, NILS and Dose
3 uses cases studied: 10nm L/S (Quasar), 9.8nm honeycomb (hexapole), MPU cuts (annular)
29 September 2015
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Square field has better flatness than rectangular field
Most existing masks have better
flatness over the 124mm x 124mm
square field
-20
-15
-10
-5
0
5
10
1 6 11 16 21 26 31 36
Fla
tne
ss
Dif
fere
nc
e [
nm
]
Mask ID #
Vertical option Square option
Magnification 4x/8x 4.8x/7.5x
Image field area 104mm X 132mm 124mm x 124mm
Mean Blank Flatness [nm]
Sigma
26.3
4.9
22.5
6.3
Flatness relative to 4x8 layout 29 September 2015
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Square option has better overlay than rectangular option
• Better flatness translates into
better overlay performance
• Note: larger x-magnification will
also improve overlay errors due
to registration
Vertical option Square option
Magnification 4x/8x 4.8x/7.5x
Image field area 104mm X 132mm 124mm x 124mm
Blank Flatness (overlay) Reference ++
-0.3
-0.25
-0.2
-0.15
-0.1
-0.05
0
0.05
0.1
1 6 11 16 21 26 31 36
Ove
rla
y d
iffe
ren
ce
[n
m]
Mask ID #
Overlay relative to 4x8 layout 29 September 2015
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Vertical option Square option Horizontal option
Magnification 4x/8x 4.8x/7.5x 5.1x/6.3x
Image field area 104mm X 132mm
137.3cm2
124mm x 124mm
153.8cm2
132mm x 104mm
137.3cm2
CD Control Reference ++ ++
Registration Reference ++ ++
Impact of defects Reference + +
Inspection Reference + ++
Repair Reference + +
Blank Flatness (overlay) Reference ++ +/-
Higher magnification in x-direction helps mask suppliers
29 September 2015
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4.8x/7.5x leads to modified reticle layout vs. 0.33-NA Implications for alignment mark position and size and pellicle size
124mm 104mm
132mm
104 mm / 132mm (.33-NA) 124mm x 124mm (.55-NA)
Alignment targets, ReMa zones (contained in dashed lines) and pellicle reserved area (not
shown but considered in RPAS and 2D barcode location changes)
2D barcode, RPAS
and HRC change
location and size
RPAS
2D barcode
HR
C
* RPAS = Coarse align target, ** HRC = Human readable code
29 September 2015
Slide 31
Public
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Summary
• The EUV roadmap can be extended economically with High-NA
• New anamorphic concept resulting in half-field imaging
• Using 6” masks
• Throughputs > 150WpH
• Further optimization of anamorphic magnification ratio under study
• Optimizing NILS, MEEF, dose and mask 3D effects for relevant use cases
• Facilitating adoption by minimizing impact on the mask supply chain
• Requirements for mask placement error, mask & pellicle defectivity, blank flatness
• Room for placement of marks and pellicle mounting
• Requirements for mask writing accuracy
Slide 32
Public
29 September 2015
![Page 33: EUV High-NA scanner and mask optimization for sub 8 nm ...euvlsymposium.lbl.gov/pdf/2015/Oral_Wednesday... · Jan van Schoot1, Koen van Ingen-Schenau1, Gerardo Bottiglieri1, Kars](https://reader036.fdocuments.in/reader036/viewer/2022070908/5f8c8fdf6715ed77e11c3bbb/html5/thumbnails/33.jpg)
The authors would like to thank the High-NA teams in - Oberkochen - Wilton - Veldhoven