ensuring reduced chemical consumption for a Chinese IC ... Mar-10 ensuring reduced chemical...
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Water Technologies & Solutions case study Find a contact near you by visiting www.suezwatertechnologies.com and clicking on “Contact Us.” *Trademark of SUEZ; may be registered in one or more countries. ©2017 SUEZ. All rights reserved. CS1106EN.docx Mar-10 ensuring reduced chemical consumption for a Chinese IC manufacturer Figure 1: SUEZ EDI challenge In Northern China, one semiconductor water fab needed to expand its facility to position itself for the rapidly increasing IC demand. Ultrapure water is at the very heart of semiconductor manufacturing. This leading manufacturer needed a UPW system that would not only remove critical contaminants, potentially affecting yield, but would also reduce the chemical consumption associated with the current traditional mixed-bed ion-exchange system. solution SUEZ EDI is the Right UPW Choice This leading Chinese IC manufacturer turned to electrodeionization (EDI) as the right technology for its new UPW system. The client chose SUEZ EDI (Figure 1) after an extensive technical evaluation and comparison among several EDI products in the market. SUEZ’s EDI technology not only removes the total dissolved solids (TDS) from the feedwater, but also offers superior performance in removing weakly ionized species such as boron, silica and carbon dioxide. SUEZ EDI is a continuous process, producing ultrapure water without chemical regeneration. This offers many advantages. The use of SUEZ EDI eliminates the storage, handling, maintenance, and disposal issues associated with the use of acid and caustic regeneration chemicals. For this client, and numerous semiconductor manufacturers in Asia and throughout the world, SUEZ EDI is the clear choice. Table 1 summarizes the project. Table 1: Project Summary End User Semiconductor water fab Location Beijing, People’s Republic of China Commissioned 1999 Application Ultrapure water (UPw) production Feedwater Well water Product quality 18 megohm-cm resistivity Capacity 9000 gpm (34 m 3 /h) Technology Double-pass reverse osmosis (RO), gas transfer membrane (GTM), electrodeionization (EDI), portable polishing mixed beds, ultrafiltration (UF)
Transcript of ensuring reduced chemical consumption for a Chinese IC ... Mar-10 ensuring reduced chemical...
Water Technologies & Solutions case study
Find a contact near you by visiting www.suezwatertechnologies.com and clicking on “Contact Us.” *Trademark of SUEZ; may be registered in one or more countries. ©2017 SUEZ. All rights reserved.
CS1106EN.docx Mar-10
ensuring reduced chemical consumption for a Chinese IC manufacturer
Figure 1: SUEZ EDI
challenge In Northern China, one semiconductor water fab needed to expand its facility to position itself for the rapidly increasing IC demand. Ultrapure water is at the very heart of semiconductor manufacturing. This leading manufacturer needed a UPW system that would not only remove critical contaminants, potentially affecting yield, but would also reduce the chemical consumption associated with the current traditional mixed-bed ion-exchange system.
solution SUEZ EDI is the Right UPW Choice
This leading Chinese IC manufacturer turned to electrodeionization (EDI) as the right technology for its new UPW system. The client chose SUEZ EDI (Figure 1) after an extensive technical evaluation and comparison among several EDI products in the market.
SUEZ’s EDI technology not only removes the total dissolved solids (TDS) from the feedwater, but also offers superior performance in removing weakly ionized species such as boron, silica and carbon dioxide.
SUEZ EDI is a continuous process, producing ultrapure water without chemical regeneration. This offers many advantages. The use of SUEZ EDI eliminates the storage, handling, maintenance, and disposal issues associated with the use of acid and caustic regeneration chemicals.
For this client, and numerous semiconductor manufacturers in Asia and throughout the world, SUEZ EDI is the clear choice. Table 1 summarizes the project.
Table 1: Project Summary
End User Semiconductor water fab
Location Beijing, People’s Republic of China
Commissioned 1999
Application Ultrapure water (UPw) production
Feedwater Well water
Product quality 18 megohm-cm resistivity
Capacity 9000 gpm (34 m3/h)
Technology Double-pass reverse osmosis (RO), gas transfer membrane (GTM), electrodeionization (EDI), portable polishing mixed beds, ultrafiltration (UF)
