ENJET Catalog eNano System
Transcript of ENJET Catalog eNano System
ENJET Catalog
eNano SystemWe aim to become innovative manufacturing solutionprovider based on printing and coating technologies.
Our goal is to satisfy customers with our solution.
eNano System
Enjet inc. has developed the patented iEHD(Electrohydrodynamics) technology, which allows to discharge and spray functional inks and chemicals using an electric field and perform super-high resolution printing and uniform thin film coating. Compared with the conventional technologies, nanoscale high resolution characteristics can be realized, so that ultra-fine droplets and patterns can be formed.It has been actively applied to the mobile and display industries that require high precision and reproducibility, and is a next-generation technology that can be of great help in future industrial development.
iElectrohydrodynamics (EHD) Introduction
iElectrohydrodynamics[EHD]Jet Printing /Coating iEHD Jet
PrintingCoating
Continuous Jet Printing-High Viscosity lnk (up to 50,000cPs)-Line Fabrication
Drop-on-Demand (DOD) Jet Printing-Low Viscosity lnk-Electrode, Dielectric Layer Patterning
Spray Coating-Functional Materials-Thin Film Coating
Ar RF Plasma
Line Printing
eNanoJet Printer
Dot/Line Printing
eMicroJet Printer
JET Coating
Hydrophilic Surface TreatmentGlass Dry cleaningPre-treatment of SurfaceRe-Work of Functional CoatingIn-Line Plasma Treatment
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Display· OLED Repair (<1㎛)· LCD Repair (<5㎛)PCB · PCB Repairmicro-LED Bonder
Display· 3D Electrode · Sealant PatterningMobile· Camera PackagingSemiconductor· Underfill3D Printing
eNanoJet Coater
Mobile/Display· AF(Anti-Fingerprint)· AG(Anti-Glare)· AR[Anti-Reflection]· OC(Over Coating)· PI(Polyimide)Semiconductor· EMI ShieldingBio-Medical CoatingFlux CoatingAnti-Static Coating
eNano System
What is atmospheric plasma? It is one of the four fundamental states of matter, which is produced by an electromagnetic field in atmospheric condition. The ionized gases become increasingly electrically conductive and shows behaviors unlike those of other states. Argon RF plasma produces various chemical reactions byco-existing ions, electrons, neutral particles and active particles.
PLASMA Introduction
Solid
H2O (S) H2O (I) H2O (g) H, H2, H+,e-,H2
-,O,O2,O3,O-,O2
-
Liquid Gas Plasma
Add energy
Organic pollutant
ExhaustGas
CO2, H2O
ReactionGas
Ar, O2, N2 ETC
Bonding, Coating, Painting, Molding
Sample (Metal, Glass, Ceramics, Polymers ETC)
eNano System eNPL-Ar80s
eNPL-Ar80s
Plasma product
- Atmospheric pressure plasma generator consists of novel designed head, matcher, RF power generator.
- It is applied to enhance the performance of the washing / adhesion / coating / plating / evaporation etc. It is also applied to cleaning and surface treatment in many industries such as display, film, touch panel, battery, PCB, vehicle, semiconductor, etc.
- Plasma Module - Electrode Headset : 810mm x 90mm x 60mm- Scan Width: 800mm - Metal Body : Anodized Al- Gas : Ar/O2/He/C4F8
- Power Supply : 1,000W- Hydrophillic, Hydrophobic
- Display, Semiconductor, TSP, Film, Cleaning
* Specifications can be changed depending on the application.
Introduction
Configuration
Application
SpecificationITEM Specification
Dimension (mm) Approx. 2500 x1400 x 1600mm
Glass Size(mm) 800 x 700mm
Process Gas Ar/O2/He/C4F8
Process Speed 10~80mm/s(30mm/s)
AP Plasma Unit
- AP Plasma Module Electrode Headset : 810mm x 90mm x 60mm Scan Width: 800mm Metal Body : Anodized Al Gas : Ar/O2/He/C4F8
- Power Supply: 1,000W
Z Axis Unit manual height control(0~30mm)
Machine Weight Approx. 400 Kg
Power Specification 220V, single phase, 25A (grounded)
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Air Spray Ultrasonic Spray eNano Jet Coating
ADV
- High throuhgput (High Flowrate / 20㎖ / min) - Drop diameter : 10~25㎛
- Drop Dia.:200nm~5㎛
- Highest Uniformity
- Viscosity : ~500cPs
- High Throughput
(High Flowrate /20㎖/min)
- Save Materials :
Low reflectivity, inducing
electric fields
DISADV
- Drop diameter : 10~100㎛- High pressure & much vounce- Viscosity : ~50cPs- Stain due to Non-uniformity
- Low Throughput (Low Flowrate / Max. 100㎕/min) Viscosity : ~100cPs
eNano System eNano Coater Technology
eNano Coater Technology
DN-Series BN-Series SN-Series VN-Series
Image
TYPE Internal Atomization External Atomization
Flow Rate 0.8~25mL/min
Nozzle InnerDiameter(ID)
0.3, 0.5mm 0.3, 0.5, 0.8mm
High Voltage 0~20 kV
Application AF Coating / AS Coating / Ultra Thin CoatingHard CoatingPR Coating
Flux Coating
Material savings: 30-50% reduction compared to conventional air spray nozzle.The various nozzle can be optimized for specific coating and material characteristics. The nozzle can be customized and designed according to the customer needs.
ENJET eNanoJet Coating Nozzle
eNano System eNC-350eNano Coater
- Optimized for PCB Flux Coating- EHD nozzles (3ea)- Spraying nano materials- Saving materials by improving delivery rate- Improvement of material adhesion- User Friendly programmed GUI, convenient operation, production history management- Available for various materials- Easy nozzle replacement- Automatic inspection of coating weight- Customized design and equipment production according to material characteristics- Qualified by global display manufacturing company
- 3 Nozzles, Reliable Chemical Supply System(CSS)- Coating materials weight measurement system.- Sorting system.- Plasma unit (optional)
Configuration
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Mask Size 800 x 700mm
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module N/A
Dimension 3500 x 3500 x 1950mm
Weight 4,800kg
- PCB Flux CoatingApplication
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eNC-350Introduction
eNano System eNC-500eNano Coater
- Optimized for Anti-Glare Coating with heated stage- EHD nozzles (3ea)- Dual stages system- Spraying nano materials- Saving materials by improving delivery rate- Improvement of material adhesion- User Friendly programmed GUI, convenient operation, production history management.- Available for various materials- Uniformly heating stage unit- Easy nozzle replacement- Customized design and equipment production according to material characteristics.- Qualified by global display manufacturing company.
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Mask Size 560x550mm(Dual)
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module RF Plasma(Ar,O2)
Dimension 4300 x 2700 x 2050mm
Weight 7,500kg
- Anti-Glare Coating(Heating Method)Application
eNC-500Introduction
eNano System eNC-800eNano Coater
- Optimized for Anti-fingerprint and anti-smudge Coating- EHD nozzles (3ea)- Spraying nano materials- Saving materials by improving delivery rate- Improvement of material adhesion- User Friendly programmed GUI, convenient operation, production history management.- Available for various materials- Easy nozzle replacement- Customized design and equipment production according to material characteristics.- Qualified by global display manufacturing company.
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Mask Size 800 x1100mm
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module RF Plasma(Ar,O2)
Dimension 1800 x 3700 x 1750mm
Weight 1,500kg
- AF Coating, AS Coating, AR CoatingApplication
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eNC-800Introduction
eNano System eNC-G100eNano Coater
- Specially designed and optimized for Anti-glare coating (non-heated)- EHD nozzles (3ea)- 2D/3D glasses available- Spraying nano materials- Saving materials by improving delivery rate- Improvement of material adhesion- User Friendly programmed GUI, convenient operation, production history management.- Available for various materials- Easy nozzle replacement- Customized design and equipment production according to material characteristics.- Qualified by global display manufacturing company.
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Mask Size 600 x 1180 mm
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module RF Plasma(Ar,O2)
Dimension 6000 x 2300 x 3250mm
Weight 9,500kg
- AF Coating, AS Coating, AG Coating, AR CoatingApplication
eNC-G100Introduction
eNano System eNC-V80TeNano Coater
- Specially designed and optimized for functional coating with minimized contamination and particles- EHD nozzles (3ea)- Spraying nano materials- Reliable chemical supply system (CSS)- Saving materials by improving delivery rate- Improvement of material adhesion- User Friendly programmed GUI, convenient operation, production history management.- Available for various materials- Easy nozzle replacement- Optimized ventilation system- Customized design and equipment production according to material characteristics.- Qualified by global display manufacturing company.
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Mask Size 800 x 1100 mm
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module RF Plasma(Ar,O2)
Dimension 4650 x 2000 x 1800mm
Weight 2,000kg
- Hard Coating, Barrier CoatingApplication
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eNC-V80TIntroduction
eNano System eNC-200
eNC-200
eNC-CSS ModuleeNano Coater
- R&D purpose equipment- EHD nozzle and uniform ink supply pump- Functional nano materials coating- Material adhesion improvement- Suitable for material testing- User Friendly programmed GUI, convenient operation, production history management.- Available for various materials- Easy nozzle replacement
Introduction
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 1ea
Mask Size 200 x 200 mm
HV Unit Up to 25 kV CTRL by Micro-Controller
Plasma Module RF Plasma(Ar,O2)
Dimension 900 x 940 x 1750mm
Weight 400kg
- AF Coating, AS Coating, AG Coating, AR Coating, EMI Shield Coating, Nano Particles Coating, Cover Coating
eNC-CSS Module - Very stable and reliable chemical supply system- Improve the efficiency of the spray- Material supply, Pneumatics, Bubble remover, Uniform pump.- Professional solution for manufacturing- convenient operation- customizable
Introduction
* The specification can be changed according to Application.
SpecificationDescription
Nozzle 3ea
Coating Area TBD
HV Unit Up to 25 kV CTRL by Micro-Controller
Dimension 940 x 860 x 1500mm
Weight 300kg
- Conversion of the existing spray equipment. (Saving materials, improving efficiency)Application
Application
eNano System iEHD Jet Printer
Various lnk Viscosity : 1~50,000 cPsResolution : 1㎛ ~2 Types of Pattern Mode (Dot, Line)
Limitied lnk Viscosity : ~20 cPsResolution : 20㎛
Only Dotting
ENJET has developed novel iEHD(electrohydrodynamics) valve, nozzle manufacturing, and electrical pulse control technology, which enable to generate femtoliter (nanoscale diameter) droplets. iEHD Jet Printer includes high precision nozzle, motion, dual nozzles, automatic focusing, stable ink supply, laser, optics technologies, which allows super-fine patterns less than 1㎛ structures (line, dot, and complex shapes).iEHD Jet Printer has been qualified for repairing solution of open defect in display, TSP and PCB.
eNano Printer Inkjet Printer
Resolution
1 ㎛
1 cPs10 cPs
1,000 cPs
50 cPs
50,000 cPs
20 ㎛ 100 ㎛ 300 ㎛
Visc
osity
eNanojetPrinter
eMicrojetPrinter
D = 10㎛ V = 1 pl
D < 1㎛ V < 1 fl
Dispenser
InkjetPrinter
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iEHD Jet PrintereNano System
eNanoJet Printer - Conventional inkjet printer has drawbacks such as
limited droplet diameter and ink viscosity.
- Patented eNanojet Printer is based on iEHD jetting
control and novel nozzle design and allows
nanoscale droplets and ultra-fine patterns
- High resolution patterning technology can be
applied in many applications such as display, PCB,
semiconductor, and bio-medical devices
- Line Width : 1 ~ 100㎛
- Viscosity : 1 ~ 1,000cPs
eMicroJet Printer - Conventional dispensers have drawbacks such as
pattern size with high viscous material
- Patented eMicrojet Printer can overcome these
drawbacks based on iEHD jetting technology and
novel nozzle and valve design
- eMicrojet printer allows high precision dispensing
and high resolution patterning, which is able to be
applied in many areas.
- Mode : Line, Dotting
- Line Width : 100 ~ 1,000㎛
- Viscosity : 1 ~ 50,000 cPs
Module based Platform: MXII Printer
The Module based platform supports customers with
powerful tools, which are easily replaced. Customers,
who want to manufacture small scale with various
tools such as printing, coating, cutting, marking, or
sintering, can use this solution. And researchers in a
lab can use multiple functions in one system.
- Standard EHD Module (STD Module)
- High Resolution EHD Module (HR Module)
- Pressure EHD Module (PRS Module)
eNanoJet Printer eMicroJet Printer MXII Printer
Electrode patterning
Electrode patterning
- Products: eNanoJet Printer, eMicroJet Printer
- Based on the innovative iEHD Jet Printing technology, it allows to fabricate super-fine electrode
- Excellent step-coverage and control of ink spreading
- Good adhesion and electrical performance
- Pattern width: 1㎛ ~ hundreds ㎛
7.0 Ohm, ρ=1.37 x 10-3 Ohm.cm
7.0 Ohm, ρ=1.37 x 10-4 Ohm.cm
Examples
Resistance
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eNano System iEHD Jet Printer
- Products: eNanoJet Printer, eMicroJet Printer
- based on the iEHD technology, it can enhance
much penetration performance of underill
material into the gap of semiconductor chip.
- It can prevent from forming the void in a gap.
- Product: OLED TFT Ink Repair System (6Gen.)
- Based on the innovative iEHD Jet Printing technology, it can repair the open defects in
the thin-film-transistor
- With novel laser technology, it can repair short defects
OPEN DEFECT
Print (Conductive ink)
Laser Curing
Examples
OLED TFT Ink Repair
Underfill Solution for Semiconductor Chip Packaging
iEHD Jet PrintereNano System OLED TFT Ink Repair Underfill Solution for Semiconductor Chip Packaging
- Products: eMicroJet Printer, MXII Printer
- With innovative iEHD Jet Printing technology and 3D surface scanning technology, it can print
and manufacture on the 3D curved surfaces
Examples
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3D Surface PrintingeNano System iEHD Jet Printer
3D Surface Printing
- eNanoJet Printer
- Micro LED display has been paid much attention due to its excellent performances. On the
other hand, it suffers from lack of perfect transfer technology and repair solutions.
- eNanojet printer can produce pad electrodes with conductive glue whose size is around 10㎛
and is able to be solution for repair.
Process
- Ink Model : RS Ag Conductive Precursor Ink
- Viscosity : 50 cPs
- Resistivity : 5 ⅹ10̂ (−5) Ω·cm (@180 °C / 30 min)
- It is developed for micro-LED chip bonding.
It has high performance of bonding and
electrical characteristics
Ag(Silver) ink foreNanojet Printer
iEHD Jet PrintereNano System μLED Chip Bonder
μLED Display Solution
- Development of super-fine patterning technology based on iEHD printing technology
- World champion for high resolution printing solution with innovative nozzle, system
integration, vision, laser, and optics technologies based on patents.
- Enjet has also Ag and Cu ink optimized for eNano-Jet printer.
- Industrial experiences to apply the iElectrohydrodynamic Jet printing.
01
02
0304
05
- Femto-liter Droplet- Direct Ink Repair Module - Easy Maintenance - Automatic Alignment
01. Nozzle- Ag Ink- Life-time - Adhesion- Jetting Performance
02. Material
- Process Recipe- Repeatability- DOE-Optimization
05. Process
- Direct Ink Repair - Module & Laser System Integration- 6G OLED Repair Machine- Motion Stage & Driver- Ink Supply Unit
03. System Integration
- CW Laser for Curing- Optics- Femto-sec Laser
04. Laser
TOTALSOLUTION
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ENJET Technology SummaryeNano System iEHD Jet Printer
- Anti-Finger Coatings- Anti-Glare Coatings- Anti-Smudge Coatings- Optical Coatings- Electrochromic coatings- Photochromic coatings- Photoresist- Etc...
- RFID - OLED Display Cathode- EMI Shielding- Flexible Electronics
- EMI Shielding Coatings- RFI Shielding Coatings- Graphene Coatings
- Photovoltaic Cell- Silicon based Solar Cell- Fuel Cell
- En-Capsulation- Bio-Fuel Cell
- PCT- OGS- Flexible TSP
eNano System eNano System Applications
Glass
Electronics
Electronics
Energy
Bio-Medical
- Flux Coatings- Anti-Static Coatings
PCB
Touch Panel
- Reagent Coatings- Medical Diagnostic Device Coatings(Stent Coating)- Antimicrobial Coatings
MedicalCoating Application
Printing Application
Enjet is innovative manufacturing solution provider based on high resolution printer,
dispenser, coater, and atmospheric plasma. Enjet is developing and providing world best
solutions of novel manufacturing processes, replacing semi-conductor vacuum process
such as the sputtering, photo-lithography, and etching.
45, Saneop-ro 92beon-gil, Gwonseon-gu, Suwon-si, Gyeonggi-do, Republic of KoreaTel. 070-4892-8111 Fax. 070-4892-8121 E-mail. [email protected] homepage. www.enjet.co.kr
www.enjet.co.kr