ECE 663 Metal-Semiconductor Interfaces Metal-Semiconductor contact Schottky Barrier/Diode Ohmic...
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Transcript of ECE 663 Metal-Semiconductor Interfaces Metal-Semiconductor contact Schottky Barrier/Diode Ohmic...
ECE 663
Metal-Semiconductor Interfaces
• Metal-Semiconductor contact
• Schottky Barrier/Diode
• Ohmic Contacts
• MESFET
ECE 663
Device Building Blocks
Schottky (MS) p-n junction
HBT MOS
ECE 663
Energy band diagram of an isolated metal adjacent to an isolated n-type semiconductor
q(s-) = EC – EF = kTln(NC/ND) for n-type = EG – kTln(Nv/NA) for p-type
ECE 663
Energy band diagram of a metal-n semiconductor contact in thermal equilibrium.
qBn = qms + kTln(NC/ND)
ECE 663
Measured barrier height ms for metal-Si and metal-GaAs contacts
Theory still evolving (see review article by Tung)
ECE 663
Energy band diagrams of metal n-type and p-type semiconductors under thermal equilibrium
ECE 663
Energy band diagrams of metal n-type and p-type semiconductors under forward bias
Energy band diagrams of metal n-type and p-type semiconductors under reverse bias
ECE 663
ECE 663
Charge distribution
electric-field distribution
Em = qNDW/Ks0
E(x) = qND(x-W)/Ks0
(Vbi-V) = - ∫E(x)dx = qNDW2/Ks0
0
W
Vbi = ms (Doping does not matter!)Bn = ms + kTln(NC/ND)
ECE 663
Dbis qNVVW /)(2
)(2 VVNqWQNQ biDsD
Depletion width
Charge per unit area
Depletion
q
ECE 663
Capacitance
WVVNq
VQ
C s
bi
Ds
2Per unit area:
Ds
bi
NqVV
C
21
2
Rearranging:
Or:
dV
Cdq
Ns
D/1
12
2
ECE 663
1/C2 versus applied voltage for W-Si and W-GaAs diodes
ECE 663
1/C2 vs V
•If straight line – constant doping profile –
slope = doping concentration
•If not straight line, can be used to find profile
•Intercept = Vbi can be used to find Bn
i
Dn
binBn
nN
qkT
V
VV
ln
ECE 663
Current transport by the thermionic emission process
Thermal equilibrium forward biasreverse bias
J = Jsm(V) – Jms(V) Jms(V) = Jms(0) = Jsm(0)
• Barrier from metal side is pinned
• Els from metal must jump over barrier
• Current is limited by speed of jumping electrons (that the ones jumping from the right cancel at equilibrium)
• Unipolar majority carrier device, since valence band is entirely inside metal band
Note the difference with p-n junctions!!
• Barrier is not pinned
• Els with zero kinetic energy can slide down negative barrier to initiate current
• Current is limited by how fast minority carriers can be removed (diffusion rate)
• Both el and hole currents important (charges X-over and become min. carriers)
In both cases, we’re modulating the population of backflowing electrons, hence the Shockley form, but…
V > 0
V < 0
V > 0V < 0
ECE 663
Let’s roll up our sleeves and do the algebra !!
Jsm = 2qf(Ek-EF)vxvx > vmin,vy,vz
dkxdkydkzvxe-(Ek-EF)/kT(2)3/
= 2q
Ek-EF = (Ek-EC) + (EC -EF)
EC - EF = q(Bn-Vbi)
Ek - EC = m(vx2 + vy
2 + vz2 )/2
m*vmin2/2 = q(Vbi – V)
kx,y,z = m*vx,y,z/ħ
V > 0
Vbi - V
ECE 663
This means…
Jsm = q(m*)3/43ħ3 dvye-m*vy2/2kT
∞
-∞dvze-m*vz2/2kT
∞
-∞dvxvxe-m*vx2/2kT
∞
vmin
x e-q(Bn-Vbi)/kT
(2kT/m*) (2kT/m*) (kT/m*)e-m*vmin2/2kT
= (kT/m*)e-q(Vbi-V)kT
= qm*k2T2/22ħ3e-q(Bn-V)kT
= A*T2e-q(Bn-V)kT
A* = 4m*qk2/h3
= 120 A/cm2/K2
dxe-x2/22 = 2
∞
-∞
dx xe-x2/22 = 2e-A2/22
∞
A
J = A*T2e-qBN
/kT(eqV/kT-1)
In regular pn junctions, charge needs to move throughdrift-diffusion, and get whisked away by RG processes
MS junctions are majority carrier devices, and RG is notas critical. Charges that go over a barrier already have high velocity, and these continue with those velocities togive the current
ECE 663
Forward current density vs applied voltage of W-Si and W-GaAs diodes
ECE 663
Thermionic Emission over the barrier – low doping
ECE 663
Tunneling through the barrier – high doping
Schottky barrier becomes Ohmic !!
ECE 663