Creative Technology Solution

Company Profile

Name CTS (Creative Technology Solution)

President Dong-Kwan Lee

Foundation July 9, 2010

Address Cheongju-City,Chungcheong buk-do,Korea

Business Field

Single CMP Polisher & Auto CMP Polisher

Standalone Post Cleaner

Software Development

Semiconductor Parts Manufacture & Development

Equipment Refurbish & Modify_CMP 200MM,300MM

Certification

Quality Management System

ISO 9001 ISO 14001 Venture Enterprise Cert R&D Cert KCS Cert

Product Certification

CE Cert Design Patent Cert Patent Cert

Organization Chart

PRESIDENT

DESIGN

DEPARMENT SOFTWARE

DEPARMENT MANUGACTURING &

CS DEPARMENT SALES & OVERSEAS S

ALES DEPARMENT

Quality Control

TEAM

PURCHASING

TEAM

Factory & Office

Manufacture Room

☞ Manufacture Room Size : 230 M2

☞ Product : 8/12 inch CMP system

☞ Manufacturing Capacity : 20 tools/year

☞ Metrology for 8/12 inch oxide, Tungsten

History Model Name Customer Remark

Nov, 2017 AP-300 Shinhan Diamond CMP Disk_Korea

Nov, 2017 AP-300 MS Materials CMP Slurry_Korea

Jun, 2016 ScS-300 Soulbrain CMP Slurry_Korea

Mar, 2016 AIP-300 SKC CMP Pad_Korea

Jan, 2016 AP-300 SKC CMP Pad_Korea

Oct, 2015 AP-300 3M CMP Disk_Korea

Oct, 2015 AP-300 Dongjin CMP Slurry_Korea

Aug, 2015 AP-300 KC Tech CMP Slurry_Korea

Mar, 2015 AP-300 Shinhan Diamond CMP Disk_Korea

Feb, 2015 AP-300 FNS Tech CMP Pad_Korea

Nov, 2014 AP-300 E-hwa Diamond CMP Disk_Korea

Sep, 2014 AP-300 Sae-sol Diamond CMP Disk_Korea

Nov, 2013 AP-300 Soul-brain CMP Slurry_Korea

May, 2013 AP-300 Cabot Microelectronics CMP Slurry_Korea

Mainly, CTS CMP equipment is suitable to apply Pad, Diamond Disk, Slurry R&D field.

Sales Record

Business Portfolio

Business Detail Business

Unit

Cleaner Manufacturing

ScS-300TM

CMP Manufacturing

AP-300TM

♣ R&D CMP Polisher

♣ Zone Control able Carrier

♣ 200,300mm Polishing Carrier Compatible

♣ Rotary Type Concept Mechanism

♣ Best Solution for R&D System

♣ Post CMP Wafer Cleaning.

♣ Integration into cluster tools.

♣ Post Deposition Wafer Cleaning.

♣ Customized Wafer Flow Sequence per Chamber.

♣ High Speed Rotation Wafer & Brush_600rpm.

♣ 2 Cassette Foup + T.R + Brush#1,2 + SRD.

Business Portfolio

Business Detail Business

Unit

♣ Compact Size 840x840x1640 (W x L x H mm)

♣ N2 Blowing

♣ Spin 2500rpm

♣ Control PC Base

♣ 200mm, 300mm Spin Rinse Dry

SRD Manufacturing

AS-300

CMP Manufacturing

AIP-300TM

♣ Auto Wafer Polishing.

♣ High performance planarization process.

♣ Super-Qualified Reliability.

♣ Various Wafer Polishing Usage.

♣ Advanced carrier Zone controls.

♣ In & Ex-situ Pad Conditioning_13zone.

♣ Real Data monitor & Save Data.

Business Portfolio

Business Detail Business

Unit

♣ CMP Carrier Membrane

♣ CMP Retainer Ring

♣ PVA Brush

♣ Carrier Film

♣ We can supply CMP consumable parts. CMP

Consumable

Part

♣ Doosan Unipla231

♣ Mirra3400 Ontrak&Mesa

♣ Ebara Frex200,Frex300s,s2

♣ Auriga EC

♣ IPEC 776,472

♣ CMP System Installation, Service & Part Sales

CMP Refurbishing

Partner Companies

Thank you