ChemInform Abstract: Ba2Cu18-xAs10: A New Mixed-Valent Ternary Copper-Rich Arsenide with Metallic...
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2001 structure structure (solids and liquids) D 2000 04 - 005 Ba 2 Cu 18-x As 10 : A New Mixed-Valent Ternary Copper-Rich Arsenide with Metallic Properties. — The title compound is prepared by heating a mixture of the elements in a sealed graphite tube at 700 ◦ C for 1 d. As revealed by single crystal XRD, Ba 2 Cu 18-x As 10 crystallizes in the trigonal space group P 31c with Z = 1. The compound has a three-dimensional structure with parallel tunnels running along the c-direction which are occupied by the Ba atoms. The framework of [Cu 18-x As 10 ] 4- units features Cu atom vacancies with x = 1.67 which enhance the metallic character of the compound as suggested by extended Hueckel band structure calculations. The room temperature resistivity along the c-axis is 1.7·10 -4 Ω·cm. — (KIM, SUNG-JIN; IRELAND, JOHN; KANNEWURF, CARL R.; KANATZIDIS, MERCOURI G.; Chem. Mater. 12 (2000) 10, 3133-3138; Dep. Chem., Mich. State Univ., East Lansing, MI 48824, USA; EN) 1
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Transcript of ChemInform Abstract: Ba2Cu18-xAs10: A New Mixed-Valent Ternary Copper-Rich Arsenide with Metallic...
2001 structure
structure (solids and liquids)D 2000
04 - 005Ba2Cu18−xAs10: A New Mixed-Valent Ternary Copper-Rich Arsenidewith Metallic Properties. — The title compound is prepared by heating amixture of the elements in a sealed graphite tube at 700 C for 1 d. As revealedby single crystal XRD, Ba2Cu18−xAs10 crystallizes in the trigonal space groupP31c with Z = 1. The compound has a three-dimensional structure with paralleltunnels running along the c-direction which are occupied by the Ba atoms.The framework of [Cu18−xAs10]4− units features Cu atom vacancies withx = 1.67 which enhance the metallic character of the compound as suggested byextended Hueckel band structure calculations. The room temperature resistivityalong the c-axis is 1.7·10−4 Ω·cm. — (KIM, SUNG-JIN; IRELAND, JOHN;KANNEWURF, CARL R.; KANATZIDIS, MERCOURI G.; Chem. Mater. 12(2000) 10, 3133-3138; Dep. Chem., Mich. State Univ., East Lansing, MI 48824,USA; EN)
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