Calculation of minibandstructure balanced type II GaAsBi...
Transcript of Calculation of minibandstructure balanced type II GaAsBi...
Calculation of miniband structurein strain‐balanced type‐II GaAsBi/GaAsN superlattice
Jinyoung Hwang and Jamie Phillips*Jinyoung Hwang and Jamie PhillipsSolid State Electronics LaboratoryDepartment of Electrical Engineering and Computer ScienceUniversity of Michigan, Ann Arbor, MI, United States*j hilli@ i h d*[email protected]
University of MichiganElectrical Engineering and Computer Science
OutlineOutline
Motivations for GaAsBi/GaAsN Type‐II SLS/ yp
Study Objectives
Calculation Methodology Strain‐Balanced Criteria
Band alignment and Strain effect
Schrödinger Poisson Self Consistent Equation Schrödinger – Poisson Self‐Consistent Equation
Results
Future worku u e o
Conclusion
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Motivations for GaAsBi/GaAsNMotivations for GaAsBi/GaAsN
Desire narrow bandgap material with effective lattice match g pto GaAs Key for low‐cost GaAs
technologytechnology
Particularly important for optoelectronic devices such as detectors wheresuch as detectors where thick active regions required
Lasers?
GaAs
GaAsN GaAsBi
GaAs
Lasers
Photodetectors
Solar Cells
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Motivations for Type‐II SLSMotivations for Type II SLS
Advantages of superlattices – ee Enhance
Bandstructure engineering Effective bandgap Electronic transport Effective
ee EnhanceCarrier transport(barrier tunneling)(miniband conduction)
Electronic transport Controlled by layer thickness
Advantages of GaAsBi/GaAsN
Effective bandgap Increase
g /Type‐II superlattice Effective lattice match to GaAs Minibands in conduction/valence Effective
Minibande
Radiativetransition can
GaAsBi
Minibands in conduction/valence band can be independently controlled
Radiative transitions (lifetime, absorption) can be controlled
bandgap
h
Radiativetransition
Miniband
transition can be controlled by overlap of the minibands
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p )GaAsN
Study ObjectivesStudy Objectives
Develop method for calculating electronic structurep g
Determine range of transition energies for SLS Strain balanced structures
“Reasonable” Bi and N content (up to 5% Bi and N composition)
Varying thickness for GaAsBi GaAsN layers Varying thickness for GaAsBi, GaAsN layers
Initial objective to determine criteria to achieve “1 eV” material for photovoltaics
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Simulation MethodologySimulation Methodology
1 Determine precondition of concentrations of Bi and N using the strain‐balanced criteria on a GaAs substrate
Strain‐balanced Criteria1
Obtain band edge discontinuity of the heterostructure based on GaAsBi and GaAsN band alignment
Band alignment of GaAsBi/GaAsN superlattice2
Consider strain effect due to lattice mismatch
Mi ib d l l i i S h ödi P i i3 Simulate energy states in the superlattice using self consistent Schrödinger – Poisson equation Transfer matrix algorithm used to solve Schrödinger equation
Miniband calculation using Schrödinger – Poisson equation3
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Strain‐Balanced SLSStrain Balanced SLS
Strain ‐ balanced criteria on GaAs substrate Balancing compressive strain (GaAsBi) and tensile strain (GaAsN)
Condition of zero average in‐plane stress[1]
Results: GaAs1‐xBix / GaAs1‐yNy
t1 (GaAsBi)= t2 (GaAsN)
Bi (x) N (y)
0.01 0.006
0.02 0.011
0.03 0.017
0.04 0.022
0.05 0.028
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[1] N. J. Ekins‐Daukes, K. Kawaguchi, and J. Zhang, Crystal Growth & Design 2, 287 (2002)
Strain‐Balanced SLSStrain Balanced SLS
Critical thickness of GaAsBi and GaAsN on GaAs substrate
2000
GaAsBiGaAsN | |
1000
1500
GaAsN
knes
s (Å
)
| |
500
1000
Crit
ical
thic
k
100 Å
0 0.01 0.02 0.03 0.04 0.050
Composition of Bi and N
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Band alignment – Bi N alloysBand alignment Bi, N alloys
GaAsBi GaAsN
Conduction and Valence band alignment[2] Conduction and Valence band alignment[3]
GaAsBi GaAsN
Conduction band of GaAs Conduction band of GaAsConduction band of GaAs Conduction band of GaAs
HH/LH bands of GaAs HH/LH band of GaAs1‐yNy
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[2] K. Alberi, J. Wu, W. Walukiewicz, K. M. Yu, O. D. Dubon, S. P. Watkins, C. X. Wang, X. Liu, Y. –J. Cho, and J. Furdyna, Phys. Rev. B. 75, 45203 (2007)[3] W. Shan, W. Walukiewicz, K. M. Yu, J. W. Ager III, E. E. Haller, J. F. Geisz, D. J. Friedman, J. M. Olson, S. R. Kurtz, H. P. Xin, and C. W. Tu, Phys. Stat. Sol 223, 75 (2001)
Band alignment‐ Bi N AlloysBand alignment Bi, N Alloys
General Band alignment of GaAs1‐xBix (x=0~0.05) , GaAs1‐yNy (y=0~0.05), y yand GaAs
E (GaAs) = 1 424 eVGaAs BiGaAs NGaAs GaAs Eg(GaAs) = 1.424 eVGaAs1‐xBixGaAs1‐yNyGaAs GaAs
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Band alignment ‐ Strain effectBand alignment Strain effect
Strain effect on band alignment
⁄
g GaAsBi: Compressive strain / GaAsN: Tensile strain
Pseudomorphically grown on a (100)‐oriented substrate
⁄
CB moving upward
Eg(GaAs) = 1.424 eVGaAsBi
GaAsNGaAs GaAs
CB moving downward
Heavy hole band
Light hole bandLight hole band
y
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Heavy hole bandHH and LH separated
Electronic Structure CalculationElectronic Structure Calculation
Coupled Schrödinger – Poisson Equation[4]p g q
Generate V(x) and ρ(x) Solve the Schrödinger equation for Ei and Ψi
Compute N(Ei) assuming Fermi distribution
Calculate charge density
Generate band profile from the charge
density
Compare with V(x)
DONE
Solving Schrödinger equationC l l bb d i h l i Calculate subband structure in the superlattice
Transfer matrix approach[5] used
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[4] C. H. Fischer IV, Ph.D. dissertation. University of Michigan (2004)[5] E. Anemogiannis, E. N. Glytsis, and T. K. Gaylord, IEEE Journal of Quantum Electronics 29, 2731 (1993)
Miniband structure of SLSMiniband structure of SLS
Miniband of GaAs0 96Bi0 04 / GaAs0 979N0 0210.96 0.04 / 0.979 0.021
Layer thicknessGaAs0.96Bi0.04GaAs0.979N0.021
40 Å40 Å
# f l 25# of layers 25
Total thickness of SLS 100nm
Effective
GaA
s
GaA
s
band gap 1.0011 eV
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Transition energy of SLS
Transition energy range for different Bi composition
Transition energy of SLS
gy g pComposition of Bi and N: 0 ~ 5%
12
1.3
1.4
1.5
rgy
(eV
)
Bi(1%): 1.40 ~ 1.20eV
0.9
1
1.1
1.2
Tran
sitio
n E
ner
Bi(2%): 1.37 ~ 1.01eVBi(3%): 1.33 ~ 0.88eVBi(4%): 1.30 ~ 0.80eV
020
4060
80100
020
4060
80100
0.7
0.8
T
Bi(5%): 1.26 ~ 0.72eV
100
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Transition energy of SLS
Transition energy range for different Bi composition
Transition energy of SLS
1.6
gy g p
1
1.2
1.4
n E
nerg
y (e
V)
GaAs
0
500
50
0.8
Tran
sitio
n
GaAsBi/GaAsN SLS
100100
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ResultsResults
Thickness of individual layer vs. transition energy with
1.6
0.8
y gydifferent N and Bi composition (t1,GaAsBi = t2,GaAsN)
1.2
1.4
rgy
(eV
)
1
0.9
h(um
)Bi: 1%
1
1.2
rans
ition
Ene
r
1 41.31.2
1.1
Wav
elen
gth
1eVBi: 2%
Bi: 3%
Bi: 4%
Bi 5%
20 0 60 80 1000.6
0.8
Tr
2
1.61.51.4Bi: 5%
20 40 60 80 1000.6
Thickness (A)
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Future workFuture work
Carrier transport simulationp Tunneling probability
Carrier scattering probability via Monte‐Carlo simulation
D i l i i l d l l di i Determine electron transport in vertical and lateral directions
Radiative transitions Wavefunction overlap Wavefunction overlap
Optical absorption/recombination lifetimes
Compare with experimental data Material parameters, band offsets, etc, used in simulation
Experimental SLS structures
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ConlclusionsConlclusions
Electronic structure of GaAsBi/GaAsN superlattices were calculated for varying layer thickness and alloy composition
GaAsBi/GaAsN superlattices offer a wide range of effective bandgap( 0 7 1 4 V) f i b l d G Aenergy (~0.7 – 1.4 eV) for strain‐balanced structures on GaAs
Attractive for variety of optoelectronic devices, and need further experimental and theoretical research effortsexperimental and theoretical research efforts
This work is supported by the Center for Solar and Thermal Energy Conversion, an Energy Frontier Research Center funded by the Department of Energy Office of Basic Energy Sciences
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Frontier Research Center funded by the Department of Energy Office of Basic Energy Sciences