By SOUMITRA SULEKAR - University of...

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DEFECT DYNAMICS IN DOPED CERIA ELECTROLYTES By SOUMITRA SULEKAR A DISSERTATION PRESENTED TO THE GRADUATE SCHOOL OF THE UNIVERSITY OF FLORIDA IN PARTIAL FULFILLMENT OF THE REQUIREMENTS FOR THE DEGREE OF DOCTOR OF PHILOSOPHY UNIVERSITY OF FLORIDA 2017

Transcript of By SOUMITRA SULEKAR - University of...

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DEFECT DYNAMICS IN DOPED CERIA ELECTROLYTES

By

SOUMITRA SULEKAR

A DISSERTATION PRESENTED TO THE GRADUATE SCHOOL OF THE UNIVERSITY OF FLORIDA IN PARTIAL FULFILLMENT

OF THE REQUIREMENTS FOR THE DEGREE OF DOCTOR OF PHILOSOPHY

UNIVERSITY OF FLORIDA

2017

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© 2017 Soumitra Sulekar

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To my family and friends

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ACKNOWLEDGMENTS

First and foremost, I would like to express my gratitude towards my advisor, Dr.

Juan C. Nino. Without his guidance and constant support, this work and my Ph.D. would

not have been possible. Throughout my time here at the University of Florida, he has

been a constant source of inspiration. At times, when I felt lost, it was he who pointed me

in the right direction and gave me motivation. His constant high standards and demand

for improvement has given me a vision for perfection, and a work ethic which I will carry

for the rest of my life. I thank Professor Perry, Professor Andrew, Professor Sigmund,

and Professor Weaver, for being on my advisory committee and giving me their time and

advice.

At the Nino Research group, I have had the privilege and pleasure of working with

some of the smartest, brightest and diverse group people I have known. I would like to

thank all the past and present members of the group for their company, the stimulating

discussions, and all the constructive criticism. I specially thank Mehrad Mehr and Ji Kim

for their contribution to the reducing atmosphere sintering work, Paul Johns for always

pushing me to grow better BiI3 single crystals, and Hiraku Maruyama and Mariia

Stozhkova for their help with the MARMOT simulation validation work. I would also like

to thank visiting researchers Andres Romero and Marcia Meireles for their help with the

impedance testing of thin films under bias. Finally, I would like to thank undergraduate

students Ji Kim, Tatiana Konstantis, Elisa Cristino, and Ryan Russell for the many hours

they have spent helping with experiments.

I would also like to thank Andres Trucco at the Nanoscale Research Facility at the

University of Florida for his help with the electron probe micro-analysis work presented in

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this dissertation. Without the help and support of all these collaborators and group

members, this work would not be possible.

I thank my family whose support and guidance has made me who I am today. I

also thank my friends at the group, especially Mehrad and Ji, for putting up with me. I

thank my roommates and friends amongst the Indian student community here who helped

me make my time in Gainesville more enjoyable.

A part of this dissertation is based upon work supported by the National Science

Foundation Grant No. DMR-1207293. Any opinions, findings, conclusions or

recommendations expressed in this publication are those of the author and do not

necessarily reflect the views of the National Science Foundation.

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TABLE OF CONTENTS page

ACKNOWLEDGMENTS .................................................................................................. 4

LIST OF FIGURES .......................................................................................................... 9

LIST OF TABLES .......................................................................................................... 16

ABSTRACT ................................................................................................................... 18

CHAPTER

1 INTRODUCTION .................................................................................................... 21

1.1 Statement of Problem and Motivation ............................................................. 21 1.2 Scientific Approach ......................................................................................... 23

1.3 Organization of Dissertation ............................................................................ 24 1.4 Contributions to the Field ................................................................................ 26

2 BACKGROUND AND MOTIVATION ...................................................................... 28

2.1 Fuel Cells ........................................................................................................ 28 2.2 Solid Oxide Fuel Cells ..................................................................................... 30

2.3 Gadolinia Doped Ceria .................................................................................... 33

2.4 Ionic Conductivity ............................................................................................ 35

2.4.1 Dopant Concentration and Defect Associates ..................................... 36 2.4.2 Dopant and Impurity Segregation ........................................................ 40

2.5 Impedance Spectroscopy ............................................................................... 47

3 EXPERIMENTAL PROCEDURES .......................................................................... 53

3.1 Sample Preparation ........................................................................................ 53

3.1.1 Bulk Samples ....................................................................................... 53 3.1.2 Sintering under Reducing Atmosphere ................................................ 56 3.1.3 Thin Film Fabrication ........................................................................... 56

3.2 Profilometry ..................................................................................................... 58

3.3 X-Ray Diffraction ............................................................................................. 59 3.4 Microstructural Characterization ..................................................................... 60 3.5 AC Impedance Spectroscopy ......................................................................... 62

3.6 DC I-V Measurement ...................................................................................... 66

4 PROTOCOL FOR IMPEDANCE TESTING AND DATA ANALYSIS ....................... 68

4.1 Common Mistakes .......................................................................................... 69 4.2 Best Practices ................................................................................................. 70

4.2.1 Definitions of Parameters .................................................................... 71

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4.2.2 Selection and Fitting of Appropriate Equivalent Circuit ........................ 74

4.2.3 Starting Values for Fitting .................................................................... 79 4.2.4 Quality of Fit ........................................................................................ 81

5 IMPEDANCE RESULTS FOR THIN FILM AND BULK SAMPLES ......................... 83

5.1 Thin Film Samples .......................................................................................... 83 5.2 Bulk Samples .................................................................................................. 88

6 EFFECT OF A DC BIAS ON IMPEDANCE RESULTS ........................................... 90

6.1 Background ..................................................................................................... 90

6.2 Bias Effect on GDC Thin Films ....................................................................... 99

6.3 Characteristic Steps in Nyquist Plots under Bias .......................................... 101

6.4 Fitting and Analysis ....................................................................................... 107 6.5 Mechanism ................................................................................................... 113

6.5.1 Low Bias ............................................................................................ 113 6.5.2 Medium Bias ...................................................................................... 116

6.5.3 High Bias ........................................................................................... 118

7 DOPANT SEGREGATION AND SINTERING UNDER REDUCING ATMOSPHERE ..................................................................................................... 121

7.1 Segregation and Defect Associates .............................................................. 121 7.2 Fast firing and Microwave Sintering .............................................................. 122

7.3 Sintering under Reducing Atmosphere ......................................................... 125

7.4 Electron Probe Micro-Analysis ...................................................................... 127

7.5 Conductivity Measurements .......................................................................... 136

8 SUMMARY AND FUTURE WORK ....................................................................... 141

8.1 Summary ...................................................................................................... 141 8.1.1 Protocol for Impedance Data Analysis ............................................... 141 8.1.2 Impedance and Effect of DC Bias ...................................................... 141

8.1.3 Sintering under Reducing Atmosphere .............................................. 143 8.2 Future Work .................................................................................................. 144

8.2.1 Effect of DC Bias ............................................................................... 144 8.2.2 Sintering under Reducing Atmosphere .............................................. 144

A IMPEDANCE DATA FITTING WITH ZVIEW ......................................................... 147

B DIELECTRIC POLARIZATION FUNCTIONS ....................................................... 151

C THERMALLY STIMULATED DEPOLARIZATION CURRENT .............................. 153

D COLOSSAL PERMITTIVITY IN BARIUM STRONTIUM TITANATE ..................... 159

D.1 Introduction .................................................................................................. 159

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D.2 Experimental procedure ............................................................................... 161

D.2.1 Fabrication ........................................................................................ 161 D.2.2 Characterization ................................................................................ 161

D.3 Results and Discussion ................................................................................ 162 D.3.1 Dielectric Spectroscopy..................................................................... 163 D.3.2 Impedance Spectroscopy.................................................................. 166 D.3.3 Polarization mechanisms .................................................................. 168

D.3.3.1 Debye Model ...................................................................... 169

D.3.3.2. Universal Dielectric Response Model ............................... 170 D.3.3.2 Thermal Hopping Polaron Model ....................................... 173

D.3.4 Internal Barrier Layer Capacitor ........................................................ 176 D.3.5 Variable Range and Nearest Neighbor Hopping ............................... 179

D.4 Summary ...................................................................................................... 185

E I DON’T KNOW WHAT THIS MEANS BUT… ....................................................... 186

LIST OF REFERENCES ............................................................................................. 189

BIOGRAPHICAL SKETCH .......................................................................................... 204

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LIST OF FIGURES Figure page 2-1 Schematic of a solid oxide fuel cell. .................................................................... 31

2-2 Ionic conductivity for different fluorite oxide electrolytes with respect to temperature adapted from B.C.H. Steele. .......................................................... 32

2-3 Cubic fluorite unit cell of cerium oxide. ............................................................... 34

2-4 Doping and oxygen vacancy jump in acceptor doped ceria. ............................... 34

2-5 Grain ionic conductivity of different doped ceria electrolyte materials as a function of temperature after Gerhardt-Anderson and Nowick. .......................... 37

2-6 Conductivity as a function of dopant concentration in the (CeO2)1-x(Sm2O3)x system at different temperatures after Yahiro et al. ............................................ 38

2-7 Arrhenius plots for the grain ionic conductivity of Sm/Nd co-doped ceria as shown by Omar et al. .......................................................................................... 41

2-8 Transmission electron micrographs showing segregation of siliceous phases. .. 42

2-9 Schematic of a grain boundary in an oxide ion conductor. ................................. 43

2-10 Atom probe tomography data for a grain boundary in 10 mol% Nd doped ceria adapted from Diercks et al. ........................................................................ 46

2-11 Impedance response in a 3D perspective plots for a 10 mol% gadolinia doped ceria sample. ........................................................................................... 49

2-12 Schematic of complex impedance plot obtained using EIS for a polycrystalline electroded sample adapted from Omar. ...................................... 51

3-1 Flow chart for conventional solid state processing of ceramic materials (left) and that for the co-precipitation route (right). ...................................................... 55

3-2 Examples of green and sintered pellets of cerium oxide. ................................... 56

3-3 The magnetron sputtering setup at Universidad del Valle in Cali, Colombia used for deposition of GDC thin films. ................................................................ 57

3-4 Schematic of a gadolinia doped ceria thin film on top of a Pt/TiO2/SiO2/Si substrate with Pt electrodes on top adapted from R. Kasse. .............................. 58

3-5 Image of a gadolinia doped ceria thin film (left) and optical micrograph showing the surface of the film with the circular Pt top electrodes (right). .......... 58

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3-6 Graph showing an example of the profilometry data for a GDC thin film under study. .................................................................................................................. 59

3-7 X-ray diffraction pattern for 10 mol% gadolinia doped ceria sintered sample. .... 60

3-8 A scanning electron micrograph showing the microstructure on the surface of a 10 mol% GDC bulk pellet................................................................................. 61

3-9 A scanning electron micrograph of the surface of a GDC thin film. .................... 61

3-10 Scanning electron micrographs of the edge of a gadolinia doped ceria film showing the different layers. ............................................................................... 62

3-11 The setup for impedance spectroscopy of bulk samples at different temperatures. ..................................................................................................... 62

3-12 The reactor setup used for EIS (left) and an example of an electroded bulk sample (right). ..................................................................................................... 63

3-13 Probe station setup for electrical testing of thin films. ......................................... 66

3-14 Schematic of probe contact adapted from R. Kasse (left) and a picture of the same (right) for across plane impedance measurement ..................................... 67

4-1 Flow diagram for the measurement and characterization of material electrode system adapted from Macdonald. ....................................................................... 68

4-2 Numbering systems for quadrants in the coordinate system used throughout this work. ............................................................................................................ 71

4-3 Schematic showing shift in complex impedance plots and the respective equivalent circuits. .............................................................................................. 75

4-4 Example data set showing the difference between linear and log representations. .................................................................................................. 76

4-5 Sample data showing a complex impedance plot and the frequency explicit plot of theta for the same data which enhances the data in the blue box. .......... 77

4-6 Imaginary part of the impedance as a function of frequency with α as a parameter. Figure adapted from Orazem et al.................................................... 80

4-7 Schematic of log Y’ against log ω with a low frequency plateau and a high frequency dispersion adapted from Abram et al. ................................................ 80

4-8 An example of residuals for the real and imaginary parts of impedance. ........... 82

5-1 Nyquist plot showing impedance data for a 267 nm 10GDC thin film at different temperatures. ....................................................................................... 83

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5-2 Complex impedance plot showing the data for a 10 GDC 267 nm thin film at 130ºC along with the equivalent circuit used to fit the data. ................................ 84

5-3 A plot of log Y’ versus log ω for estimating the values of CPE-P and CPE-T for the 10 GDC bulk sample. .............................................................................. 85

5-4 Arrhenius plot showing the grain ionic conductivity for a single electrode on the 10GDC thin film accounting for error propagation. ....................................... 85

5-5 Arrhenius plot showing the average grain ionic conductivity for multiple electrodes on a 10GDC thin film with 95% confidence bands. ........................... 87

5-6 Complex impedance data for a 10GDC bulk sample at different temperatures. ..................................................................................................... 88

5-7 Arrhenius plot showing the average grain ionic conductivity of the 10GDC samples at different temperatures. ..................................................................... 89

6-1 Schematic representation of the oxygen vacancy concentration and the space charge layer without any applied bias (left) and with an applied bias (right), as proposed by Guo and Waser. ............................................................. 90

6-2 Impedance complex plane plots for 8 mol% YSZ at different temperatures and DC bias values as shown by Masó and West where 10 V 43 V-cm-1. ....... 92

6-3 Oxygen concentration in the region adjacent to the Pt cathode interface in a TiOx single crystal after degradation under 15 V bias determined using EELS as shown by and adapted from Moballegh and Dickey. ..................................... 93

6-4 A schematic showing concentration of vacancies in an Fe-SrTiO3 film at high and low frequencies and the corresponding Nyquist plot showing an inductive loop, adapted from Taibl et al. ............................................................................ 94

6-5 The brick layer model for a polycrystalline ceramic with the paths for conduction as shown by and adapted from Macdonald. ..................................... 96

6-6 Schematic showing ionic and electronic conduction paths for a polycrystalline ceramic assumed to have a brick layer model as proposed by and adapted from Guo and Waser. ......................................................................................... 96

6-7 Inversion layer with high electron concentration near the grain boundary adapted from Guo et al. ...................................................................................... 97

6-8 Complex impedance plot showing the effect of a low DC bias on 10 mol% doped gadolinia doped ceria bulk specimen at 200ºC. ....................................... 98

6-9 Nyquist plot showing the example of a DC bias effect on a 267 nm thick 10 mol% GDC film at 120⁰C. ................................................................................... 99

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6-10 Nyquist plots showing the effect of a DC bias on a 267 nm thick 10 mol% GDC film at different temperatures. .................................................................. 100

6-11 A very detailed plot showing every step in the evolution of a 10 mol% gadolinia doped ceria thin film under bias at 130⁰C. ......................................... 101

6-12 Nyquist plot showing characteristic steps in the evolution of the impedance response of a 10GDC thin film under increasing bias. ...................................... 102

6-13 Frequency explicit plots showing the magnitude of impedance |Z| and the

phase angle as a function of different DC bias values for a 10 GDC, 267 nm thin film. ...................................................................................................... 103

6-14 Frequency explicit plots showing the real and imaginary parts of impedance (Z’ and -Z” respectively) as a function of applied DC bias for a 10GDC 267 nm thin film. ...................................................................................................... 105

6-15 Frequency explicit plot showing the real permittivity for different bias values for a 10GDC 267 nm film. ................................................................................. 106

6-16 Proposed equivalent circuit based on the visual analysis of the data in different formalisms and similar data presented in literature. ........................... 108

6-17 Equivalent circuits used to fit impedance data shown in Figure 6-12 along with the respective bias values. ........................................................................ 109

6-18 Plot showing the values of R1 (grain resistance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC. .............................................................................................. 111

6-19 Plot showing the values of R2 (grain boundary resistance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC. .......................................................................... 112

6-20 Plot showing the values of R3 (representing electronic conduction) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC. .......................................................... 112

6-21 Plot showing the values of L (inductance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC. ............................................................................................................... 113

6-22 Schematic Brouwer diagram for acceptor doped ceria adapted from Eufinger et al. .................................................................................................................. 114

6-23 Schematic of a gadolinia doped ceria sample under low bias. ......................... 115

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6-24 Leakage current as a function of time and different applied DC voltages for a 10GDC 267 nm thin film measured at 120ºC. ................................................... 115

6-25 Schematic showing phenomena during impedance testing under medium bias in gadolinia doped ceria. ........................................................................... 117

6-26 Schematic band diagrams showing the cathode and anode interface under bias. .................................................................................................................. 117

6-27 Schematic showing phenomena during impedance testing under high bias in gadolinia doped ceria. ...................................................................................... 119

6-28 DC I-V measurement and complex impedance with matching resistances for a 10GDC 267 nm film at 130ºC under 2.1 V bias and oscillation voltage of 300 mV. ............................................................................................................ 120

7-1 A sub-surface triple grain junction in Sm/Nd doped ceria obtained using focused ion beam. EDS line scans were conducted across this junction (Performed by Bruce Peacock at Medtronic Inc.). ............................................ 123

7-2 EDS line scans across a sub-surface triple grain junction in a Sm/Nd doped ceria sample sintered conventionally. Sm segregation is observed (Performed by Bruce Peacock at Medtronic Inc.). ............................................ 124

7-3 EDS line scans across the surface of a Sm/Nd doped ceria sample sintered in a microwave. Both Sm and Nd are relatively uniformly distributed (Performed by Bruce Peacock at Medtronic Inc.). ............................................ 124

7-4 Schematic of dopant and vacancy distribution at grain boundaries for a sample sintered in air (left) and for one sintered in H2 and re-oxidized (right). . 126

7-5 Appearance of a 10GDC control pellet sintered at 1600⁰C for 10 hours (left) and one sintered under 4%H2-N2 at 1100⁰C for 20 hours (right). ..................... 127

7-6 WDS spectra from the LPET (top) and LLIF (bottom) detectors used to characterize Ce and Gd distribution using EPMA, shown here for a GDC conventional sample after sintering. ................................................................. 128

7-7 BSE image for 10GDC control sample. ............................................................ 129

7-8 EPMA area scan for Gd Lβ peak, for 10 GDC control sample. ......................... 130

7-9 EPMA area scan for Ce Lα peak, for 10 GDC control sample........................... 131

7-10 EPMA area scan for O Kα peak, for 10 GDC control sample. ........................... 131

7-11 Line scans of O, Gd and Ce concentration across a representative grain boundary in the 10GDC control sample. ........................................................... 132

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7-12 BSE image for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. ...................................... 133

7-13 EPMA area scan for Gd Lβ peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. ...... 133

7-14 EPMA area scan for Ce Lα peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. ........... 134

7-15 EPMA area scan for O Kα peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. ........... 134

7-16 Line scans of O, Gd and Ce concentration across a representative grain boundary in the 10GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. ...................................... 135

7-17 Normalized Nyquist plot showing the comparison between the 10GDC control and H2 sintered samples measure at 300⁰C in air................................. 137

7-18 Arrhenius type plot of grain conductivity with respect to temperature for the 10GDC control and H2 sintered samples. ......................................................... 138

7-19 Arrhenius type plot of total conductivity with respect to temperature for the 10GDC control and H2 sintered samples. ......................................................... 139

B-1 Schematic representing the complex plane plot for permittivity according to Debye theory (left) and the effect of the exponents and . .......................... 152

C-1 Schematic diagram of polarization and heating profile for TSDC measurement. ................................................................................................... 153

C-2 A schematic of an expected TSDC spectrum for doped ceria. ......................... 154

C-3 TSDC results showing the current density with respect to temperature for a 10 mol% gadolinia doped ceria sample with different polarizing temperatures and heating rates. ............................................................................................. 155

C-4 Arrhenius plots of the current density with respect to temperature for the two peaks in Figure C-3. ......................................................................................... 157

C-5 Plot showing the effect of polarizing temperature on TSDC peak intensity for a 10 mol% gadolinia doped ceria sample. ........................................................ 157

C-6 Plot showing the effect of different dopants and different dopant concentrations on TSDC peak intensity. ........................................................... 158

D-1 Variation of the real part of relative permittivity and losses (tan) as a function

of frequency for the Ba1–xSrxTiO3– nanoceramics at 300K............................... 163

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D-2 Variation of the real part of the relative permittivity and losses (tan) as a function of temperature measured at 1 kHz for the Ba1–xSrxTiO3–δ nanoceramics. .................................................................................................. 165

D-3 Impedance complex plane plots and Z′′/M′′ spectroscopic plots at 170 K, and capacitance data at 150 and 170 K for Ba0.8Sr0.2TiO3−δ (a, c and e) and Ba0.2Sr0.8TiO3−δ (b, d and f) nanoceramics. ....................................................... 167

D-4 Variation of the real parts (a) and (c) and the imaginary parts (b) and (d) of permittivity as a function of temperature and at different frequencies for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics. ......................................... 168

D-5 Temperature dependence of relaxation frequency for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics. ......................................................................... 170

D-6 Variation of the real part (a) and (c) and the imaginary part (b) and (d) of permittivity as a function of frequency and at different temperatures for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics. ......................................... 171

D-7 fr vs. f plot in log–log scales for (a) Ba0.8Sr0.2TiO3–δ and (b)

Ba0.2Sr0.8TiO3–δ dense nanoceramics at different temperatures (40–300K). ..... 172

D-8 Activation energy values extracted from the hopping polarons model for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics. ......................................... 174

D-9 BST permittivity data fitted with IBLC model ..................................................... 177

D-10 Frequency dependence of the conductivity at different temperatures for (a) Ba0.8Sr0.2TiO3-δ and (b) Ba0.2Sr0.8TiO3−δ. ........................................................... 180

D-11 NNH model applied to BST nanoceramics. ...................................................... 182

D-12 Temperature dependence of DC bulk conductivity of Ba0.8Sr0.2TiO3−δ nanoceramic sample. ....................................................................................... 183

E-1 M” peak position frequency as a function of temperature and bias. .................. 188

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LIST OF TABLES Table page 3-1 Sources of experimental errors involved in the impedance measurement and

fitting for a GDC sample. .................................................................................... 64

6-1 The values for equivalent circuit parameters obtained after fitting of the impedance data shown in figure. ...................................................................... 110

D-1 Dielectric properties of the Ba1–xSrxTiO3–δ nanoceramics. ................................ 164

D-2 Calculated activation energies and s values for BST compounds using three different analytical models. ............................................................................... 176

D-3 Fitting parameters using the IBLC model. ........................................................ 178

D-4 Fitting parameters using the UDR model. ......................................................... 181

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LIST OF ABBREVIATIONS

10GDC 10 mol% Gadolinia Doped Ceria

AC Alternating Current

At% Atomic Percent

BSE Backscattered Electron

CPE Constant Phase Element

DC Direct Current

EDS Energy Dispersive Spectroscopy

EIS Electrochemical Impedance Spectroscopy

EPMA Electron Probe Micro-analysis

GDC Gadolinia Doped Ceria

IT-SOFC Intermediate Temperature Solid Oxide Fuel Cell

I-V Current-Voltage

Mol% Mole Percent

SEM Scanning Electron Microscopy

Sm/NdDC Samarium Neodymium Co-doped Ceria

SOFC Solid Oxide Fuel Cell

SPS Spark Plasma Sintering

WDS Wavelength Dispersive Spectroscopy

Wt% Weight Percent

XRD X-ray Diffraction

YSZ Yttria Stabilized Zirconia

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Abstract of Dissertation Presented to the Graduate School of the University of Florida in Partial Fulfillment of the Requirements for the Degree of Doctor of Philosophy

DEFECT DYNAMICS IN DOPED CERIA ELECTROLYTES

By

Soumitra Sulekar

May 2017

Chair: Juan C. Nino Major: Materials Science and Engineering

Gadolinia doped ceria is a well-established material use as electrolyte in

intermediate temperature solid oxide fuel cells. Trivalent acceptor dopants such as

gadolinium substitute the Ce4+ ions and lead to ionic conductivity in ceria by creating

oxygen vacancies, which act as charge carriers. Numerous doping schemes have been

studied to elicit the highest possible ionic conductivity from these materials in the

intermediate temperature range. During the sintering step of processing, these dopants,

the accompanying oxygen vacancies and any impurities tend to segregate to the high

energy grain boundaries. This high concentration of dopants at grain boundaries and

triple points, and dopant-vacancy interaction makes these regions highly resistive. Many

changes have been proposed to the conventional solid state processing route used to

fabricate these materials. Techniques like co-precipitation of starting powders, fast firing

achieved by various means, and grain size control have been successfully shown to

improve the ionic conductivity. In this work, the effect of additional new stimuli on the

defect equilibria, defect interactions and the behavior of grain boundaries was studied.

The phenomenon of mixed ionic and electronic conductivity in gadolinia doped

ceria thin films produced using magnetron sputtering under the effect of an applied DC

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bias was studied. Electrochemical impedance spectroscopy was used to measure the

change in impedance under applied biases of ~ 4 - 20 kV/mm and an alternating voltage

of 300 mV at temperatures between 25⁰C and 350⁰C. The application of a DC bias

produces a reversible decrease in both the grain and grain boundary resistances for GDC.

Many acceptor-doped dielectrics have been shown to exhibit similar mixed ionic and

electronic conductivity under the application of a DC bias. New features become visible

in the Nyquist plots with increasing bias, drastically changing the material behavior.

Particularly interesting is the appearance of inductive loops in the low frequency regime,

at very high bias values, rarely seen for this kind of a system. Here this novel behavior

was analyzed by fitting the data using equivalent circuits to understand the underlying

mechanisms at play. Through this work, it was established that the change in behavior

is attributed to electronic conduction through grain boundaries parallel to the direction of

the applied field. As a prelude to this process a protocol for better and more accurate

analysis of impedance data was established. Different impedance formalisms and

different ways of visualizing data were studied and were shown to provide more

information about the different phenomena at play, helped in identifying circuit elements

for equivalent circuits, and in general better analyzing the data.

Additionally, a novel method was proposed to arrest the segregation of dopants,

and improve the ionic conductivity. Fast firing techniques commonly used towards such

ends, exploit the kinetics of diffusion to solve this issue. In this approach, however, the

energetics of the system are also modified, where gadolinia doped ceria is sintered under

a reducing atmosphere. The reducing atmosphere changes the valence of Ce4+ to Ce3+,

thus reducing the tendency of the Gd3+ dopant ions to segregate. On re-oxidation, the

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material returns to the previous state, except without any dopant segregation. The ionic

conductivity improves as the resistance across the grain boundary drops, when compared

with conventionally processed samples. Using electron probe micro-analysis, the

distribution of dopants was characterized. It was shown that the dopants do not segregate

in samples sintered under a reducing atmosphere and subsequently re-oxidized. A

comparison of conductivity determined using impedance spectroscopy showed an

improvement in conductivity as compared to the conventional processing route.

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CHAPTER 1 INTRODUCTION

1. 1.1. Statement of Problem and Motivation

The world population as of March 2017 has been estimated at above 7.4 billion

people. It has grown from about 6 billion in the year 2000 at a growth rate of almost 1.1%

per year.1 Such a high population growth rate combined with increased per capita energy

consumption, has led to a continuous increase in demand for energy.2 Fossil fuels are a

major source of energy for the world. Given the non-renewable nature and shortage of

fossil fuels, pollution caused by their extraction and use, and global warming and its

effects on the environment and human habitat, there is a need to move towards more

sustainable and clean energy systems such as solar cells, wind mills, fuel cells, and

batteries. It also calls for sources which are portable and more adaptable to distributed

systems. Fuel cells in particular show significant promise just in terms of the number of

their potential applications. They can be used to power anything from utility power

stations to cars, to consumer electronic devices.3,4 Amongst the various fuel cell

technologies under development, solid oxide fuel cells (SOFCs) are particularly attractive

given their scalability, modularity, durability, portability, and fuel flexibility.5 Various

materials have been considered over the years as possible candidates for use in solid

oxide fuel cells6 with companies like Bloom Energy and Redox Power Systems currently

using yttria stabilized zirconia and ceria based Sm/Nd co-doped systems respectively.

Amongst the different components and materials, this work focusses on the ionically

conducting electrolyte part of the SOFCs. The material of choice for this study is gadolinia

doped ceria (GDC) owing to its relatively high ionic conductivity and thermal stability at

intermediate temperatures (400⁰C - 600⁰C).7

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High operating temperatures of SOFCs reduces their portability, and places

constraints on the materials that can be used for various components of the fuel cell stack,

eventually making them unviable economically. The ionic conductivity and stability of the

electrolyte material are the main limiting factors for low temperature SOFC use. In order

for them to be economically viable and be able to be used in portable applications,

materials that show good intermediate temperature ionic conductivity and stability are

called for. Rare earth doped ceria compounds have been shown to be some of the best

for SOFC electrolyte application.7,8 Various processing techniques have been proposed

for improving the ionic conductivity of doped ceria compounds in the intermediate

temperature range. Ionic defects are what makes ionic conductivity in doped ceria

possible in the first place. Any changes in the defect type, distribution, concentration, and

mobility has the ability to drastically improve or degrade the electrical properties of the

material. It is hence essential to understand and exploit these defects for better

performance, and tailor the processing and operational conditions accordingly. Over the

past decade, a lot of work has been done studying and optimizing various factors like the

nature of defects, their interactions and the effect of different processing parameters and

stimuli on these defects and the resulting change in ionic conductivity. This optimization

has led to several commercial applications as mentioned before.

With the basics of structure-property-processing relationships for fuel cell materials

in place, this work takes the luxury to look at newer interesting phenomena, which could

possibly open up other avenues and applications for the material, such as for mixed ionic

and electronic conducting applications or for splitting of water. The effect of a DC bias

and processing under reducing atmospheres and their effect on the distribution and

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mobility of defects present in gadolinia doped ceria are the goal of this body of work. For

this purpose, both bulk and thin film forms of gadolinia doped ceria are studied with the

focus being on complex impedance, it being the electrical property of choice, which helps

determine different conduction mechanisms.9

1.2. Scientific Approach

The focus of this dissertation is to understand the various defect mechanisms in

rare earth doped ceria electrolytes in solid oxide fuel cells, with the goal of better tailoring

them for intermediate temperature use.

A detailed background about solid oxide fuel cells, the materials used, and the

mechanisms responsible for ionic conductivity is first provided. The principal method

used to measure ionic conductivity in ceramic materials is electrochemical impedance

spectroscopy. The analysis of data using equivalent circuits and assigning physical

models based on the different circuit elements however can be very challenging.

Towards this end, the first part of the study looks at existing analysis techniques and

compiles a protocol for impedance data fitting and analysis to give more reproducible and

accurate results. This protocol is used throughout this body of work for the analysis of

both bulk and thin film impedance data.

The various factors affecting the intermediate temperature ionic conductivity in

doped ceria materials are also discussed. Despite the extensive work done in this area,10–

14 there is still little understanding about the underlying mechanisms and the defects

responsible for the conductivity, the role of grains and grain boundaries, and their

behavior under various stimuli. To study this, the present work looks at the effect of a DC

bias on the complex impedance behavior in doped ceria materials. Novel mechanisms

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are proposed to explain the interesting new effects being observed. To better understand

the effects being observed here, DC I-V measurements performed at different sweep

speeds are used to better inform the interpretation and analysis of impedance data.

The second part of this dissertation looks at improving ionic conductivity by

proposing new processing routes. Dopant and impurity segregation at grain boundaries

and triple points during fabrication leads to increased resistance. Various processing

techniques have been used to address this, and improve the ionic conductivity of doped

ceria in the intermediate temperature range. These techniques however, focus only on

exploiting the kinetics of the sintering process. This work exploits the thermodynamics of

defects along with the kinetics, by sintering doped ceria samples under a reducing

atmosphere, as compared to conventional techniques. The hypothesis is that the

reducing atmosphere prevents segregation of dopants, and leads to improvement in ionic

conductivity. The question is investigated using electron probe micro analysis and

impedance spectroscopy.

1.3. Organization of Dissertation

Chapter 2 provides the background information about solid oxide fuel cells, the

materials of interest, and their relevant structural information. It discusses the existing

knowledge about the underlying mechanisms for ionic conduction, the role played by

defects, and the effect of various factors like dopant concentration, impurities, and

processing conditions. In addition, the technique of electrochemical impedance

spectroscopy is also introduced, given that a bulk of this work is based on this technique.

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Chapter 3 details the experimental procedures used to fabricate and process the

thin film and bulk ceria samples. It also covers the characterization techniques, both

electrical and microstructural, used to analyze the samples.

Chapter 4 introduces a protocol to be followed for impedance data analysis. This

protocol was developed to reduce the ambiguity in complex impedance data analysis and

get better, more accurate results.

Chapter 5 shows typical impedance results for bulk and thin film doped ceria

samples as a function of temperature, and applies the protocol described in chapter 4 to

this data, to obtain ionic conductivity results.

Chapter 6 focuses on the effect of a DC bias on the conductivity. It looks at the

changes in complex impedance plots with increasing bias and looks at possible

underlying defect mechanisms that can explain the observed unique behavior. Unlike

prior studies which focused mainly on bulk materials, the focus here is on thin films. Bias

values higher than those ever studied before are used here. DC current-voltage

measurements are used as a way of verifying the complex impedance results.

Chapter 7 discusses the effect of different processing routes on dopant and

impurity segregation and the resultant effect on ionic conductivity. It introduces sintering

under a reducing atmosphere as a means of reducing dopant segregation and improving

ionic conductivity.

Chapter 8 presents a summary of the main findings of this work and envisaged

future work.

In addition to the content above, extra information and other work performed by

the author is included in the appendices. Appendix A details the steps for analysis of

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impedance data. Appendix B discusses the different types of dielectric functions.

Appendix C discusses thermally stimulated depolarization current as a way of studying

defect associates. Appendix D presents work on colossal permittivity in barium strontium

titanate ceramics where impedance spectroscopy was used to distinguish between

different relaxation mechanisms. Lastly Appendix E lists interesting phenomena and

trends observed by the author during the course of his work, which still remain

unexplained.

1.4. Contributions to the Field

As a part of this work, a protocol for impedance data analysis was established

using best practices in existing literature and those developed in-house. Despite the

technique of impedance spectroscopy being widely used, there is a lot of ambiguity and

room for making errors in analysis of impedance data. There are numerous instances of

erroneous interpretation of such impedance data in the literature, where inconsistencies

are simply glossed over. This protocol provides a template for better identification of

equivalent circuits, explains the significance of various parameters used in fitting, gives

more accurate values for individual circuit parameters, and helps assess the quality of the

fit.

The study of complex impedance demonstrates the possibility of a novel

mechanism in response to the bias. The study looks at thin film samples of gadolinia

doped ceria at different temperatures and bias values, which has not been looked at

before in literature. The values of bias applied (as high as 112 kV/cm) are higher than

those in any study before.15,16 The unique features observed in the complex impedance

plots, indicate the injection of electrons and by extension the possibility of a change in

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defect equilibria under bias. The trends are similar to a shift in the Brouwer diagram

showing charge carrier concentration for different oxygen partial pressures.15

The work on processing, for the first time successfully demonstrates that sintering

under a reducing atmosphere and subsequent re-oxidation, reduces the segregation of

dopants compared to conventional sintering techniques. The more even distribution of

dopants across the grain boundaries leads to a decrease in resistance across grain

boundaries, and an overall improvement in ionic conductivity. The conductivity increases

by an order of magnitude in the samples sintered under reducing atmospheres as

compared to conventionally sintered samples. This opens up a new avenue for ceramic

material processing, where dopant segregation is not desired.

Although the work performed here focusses mainly on gadolinia doped ceria, it can

be easily extended to not only other dopants for ceria, but also to other oxide ceramic

compounds where a controlled introduction of dopants and resulting defects results in

favorable electrical properties.

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CHAPTER 2 BACKGROUND AND MOTIVATION

2. 2.1. Fuel Cells

In today’s energy-intensive world, we are in the need of a non-polluting, high

efficiency power source. Fuel cells are a promising alternative to the current energy

systems as they directly convert chemical energy to electrical energy without any

intermediate steps. Unlike traditional fossil fuel based systems such as internal

combustion engines, fuel cells do not have any moving parts. This reduces energy losses

and makes them inherently more efficient. Instead of converting chemical energy to

mechanical and then on to electrical, fuel cells produce electrical energy by an

electrochemical reaction between a fuel (usually hydrogen or gaseous hydrocarbons) with

an oxidant (air or oxygen). Heat is produced as a by-product. Fuel cells efficiencies can

go up to 60% and even up to 85-90% if the heat produced as a byproduct is also used for

other applications, as has been shown by Siemens Westinghouse in hybrid gas turbine

fuel cell systems.17 Although fuel cells still use fossil fuels as a source of energy, they

are attractive because of their reduced greenhouse gas emissions, depending on the

source of the hydrogen fuel. Compared to other renewable sources of energy, like solar

power, fuel cells have lower capital cost and higher energy density.18 They can also be

combined with existing and legacy energy systems to improve their efficiencies, and

reduce energy wastage. They can also be used in combination with renewables, for

example, to store surplus solar energy in the form of hydrogen obtained using electrolysis

of later, and later using it as a fuel for fuel cells. All these factors place fuel cell

technologies at a unique position in the energy landscape, which warrants for their further

development.

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Fuel cells are made up of a cathode, an anode and an oxygen ion conducting

electrolyte sandwiched in between the two. Fuel cells are usually classified on the basis

of the electrolyte used. The different types of fuel cells that have been developed are

polymer electrolyte membrane fuel cells (PEMFC), direct methanol fuel cells (DMFC),

alkaline fuel cells (AFC), phosphoric acid fuel cells (PAFC), molten carbonate fuel cells

(MCFC), and solid oxide fuel cells (SOFC). There are also reversible fuel cells, which

produce electricity as described above, but can also be fed electricity to split water by

electrolysis, enabling energy storage in the form of hydrogen. Depending on the type of

electrolyte, the mechanism with which the fuel cell produces electricity changes.19 Each

different mechanism has its own issues and hence each design presents unique

challenges. For example, PEMFCs and PAFCs need expensive catalysts and are

sensitive to impurities, AFCs have a liquid electrolyte which is difficult to handle, MCFCs

and SOFCs require high operating temperatures, amongst other challenges.20

Depending on the various electrochemical reactions taking place in the cell and the

constraints presented by the electrolyte, electrode and ancillary materials, the operating

conditions like temperature, fuel, atmosphere and catalysts are selected. Hence, each

type of fuel cell has an ideal set of operating conditions which decides its applications in

the real world. The applications are usually divided into the broad areas of stationary and

portable power generation. They have been used in a wide range of applications like the

space program, unmanned aerial vehicles, in submarines, for fuel cell vehicles, and even

residential power units. Since the term ‘fuel cell’ was first established by Charles Langer

and Ludwig Mond in 1889,21 fuel cells have come a long way in terms of their

applications,22 where portable fuel cells have seen a rapid rate of growth in the recent

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past and are moving towards wider commercialization, with several companies like Bloom

energy, FuelCell Energy, Doosan Fuel Cell America, Watt Fuel Cell, Altergy, Redox

Power Systems, and many more all over the world setting up commercial operations.

Amongst the different kinds of fuel cells, solid oxide fuel cells are the focus of this study.

2.2. Solid Oxide Fuel Cells

Solid oxide fuel cells, amongst the different types fuel cells, have a distinct

advantage for auxiliary power, electric utility and distributed generation.19 They do not

require the use of expensive catalysts, the excess heat generated by SOFCs can be used

for secondary operations, they are fuel flexible, are easy to handle, and have a long life

expectancy, with all the components being solid.5 SOFCs have shown efficiencies higher

than 65% with possibilities for co-generation.23

Figure 2-15 shows the structure of a fuel cell and the associated reactions at the

cathode and anode are given by equations (2-1) and (2-2) respectively. The fuel is fed

to the anode and the oxidant is fed to a cathode. The electrode-electrolyte interface

provides sites for the electrochemical reactions, whereas the electrolyte serves a diffusion

medium for ions, with the electrons generated by the reactions usually flowing in the

external circuit.4

Two main types of solid oxide fuel cell designs have been looked at in literature,

planar and tubular.24 The schematic shown in Figure 2-1 is an example of a planar fuel

cell stack. Various planar stack designs with different flow patterns have been proposed,

but they have issues with sealing and temperature gradients. Tubular and micro-tubular

designs offer the advantage of seal less design. Planar cells however have higher power

densities compared to tubular designs and they can be manufactured with simpler lower

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cost manufacturing techniques, making them popular. Planar cells can be anode

supported, cathode supported, electrolyte supported, or even externally supported using

the interconnect (shown here) or a porous substrate. The kind of cell design dictates the

fabrication processes used and also places constraints on the materials used.

Figure 2-1. Schematic of a solid oxide fuel cell.5

Anode: e2OHOH 2

2

2 (2-1)

Cathode: 2

2 Oe2O2

1

(2-2)

The materials for solid oxide fuel cells are selected based on the design of the cell,

the required electrical properties, chemical and structural stability, and matching thermal

expansion coefficients. An ideal cathode, for example, must have mixed ionic and

electronic conductivity, high porosity, and a thermal expansion coefficient matching that

of the electrolyte. SrxLa1-xMnO3 (LSM) is a perovskite material that is commonly used

and well- studied.25–28 Similarly, the anode material should be porous, should provide

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catalytic sites for electrochemical reactions, have low ionic conductivity, and be

chemically and thermally compatible with other components. Ni-cermet anode materials

are amongst the most commonly used.29–33

Figure 2-2. Ionic conductivity for different fluorite oxide electrolytes with respect to temperature adapted from B.C.H. Steele.34

The third component of a solid oxide fuel cell, and the focus of this study is the

electrolyte. The electrolyte must be dense to be able to separate the fuel and the oxidizer.

It must possess high ionic conductivity at the desired operating temperature for easy

migration of oxide ions. It should be an electronic insulator, and should maintain its

properties over a wide range of oxygen partial pressures, since the pO2 could vary by as

much as an order of magnitude between the anode and the cathode.14 Various materials

like yttria stabilized zirconia (YSZ), rare earth doped ceria, strontium/magnesium doped

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lanthanum gallate, and bismuth oxide based electrolytes have been considered and

studied for use as electrolyte materials for solid oxide fuel cells.35 Amongst these, YSZ

has been used extensively for high temperature (~1000⁰C) fuel cells.6,7,35,36 The goal

here, however, is to obtain enhanced ionic conductivity in the intermediate temperature

range (400⁰C to 800⁰C). Figure 2-2 shows the ionic conductivities of some SOFC

electrolyte materials.7 Bi2O3 based compounds have the highest ionic conductivity in the

intermediate temperature range. However, they are not thermally stable as they undergo

an order-disorder transition around 600⁰C, making them unsuitable. The next candidate

in the graph is gadolinia doped ceria (GDC). It is more stable than the Bi2O3 and has

higher ionic conductivity than YSZ. Hence, GDC is the material of interest for this study.

Gadolinia doped ceria has been studied extensively for ionically conducting electrolytes

and mixed ionic-electronic conducting applications and even for applications in bilayer

electrolytes.13,29,32,37–39

2.3. Gadolinia Doped Ceria

Pure stoichiometric ceria has a cubic fluorite structure as shown in Figure 2-3 with

an associated lattice parameter of 5.411 Å and space group m3Fm . Each unit cell

consists of Ce4+ ions at the corners and the face centers of the cubic cell (Wyckoff position

4a), whereas the O2- ions are located within the tetrahedral voids (Wyckoff position 8c).

Ce4+ ions have 8-fold co-ordination and the O2- ions have 4-fold co-ordination.

However, cerium oxide by itself is not a good ionic conductor. For ceria to conduct

ions, it has to be doped with rare earth acceptor dopants. Substitution of Ce4+ by trivalent

dopant cations D3+ (Gd3+ in this case) causes the formation oxygen vacancies to maintain

electro-neutrality as denoted by the Kröger-Vink notation in equation (2-3).

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O

x

OCe2CeO32 VO3D2OD (2-3)

The vacancies created as a result of the doping allow for the discrete hopping of

oxygen ions from one tetrahedral site to another, giving ionic conduction as shown in

Figure 2-4.

Figure 2-3. Cubic fluorite unit cell of cerium oxide.

Figure 2-4.Doping and oxygen vacancy jump in acceptor doped ceria.

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2.4. Ionic Conductivity

The hopping of these vacancies is a thermally activated process. The electrical

conductivity (σ ) due to hopping is governed by the Arrhenius relation as denoted in

equation (2-4) where oσ is a pre-exponential factor, T is the temperature in Kelvin and

aE is the activation energy.

kT

EexpT a

o (2-4)

In a detailed form, this equation can be written as (2-5).14

kT

Hexp

k

SexpaNV

k

qT mm

o

2

oo

2

v (2-5)

Here, oN is the number of oxygen sites per unit volume, OV is the fraction of free

mobile oxygen vacancies, vq is the charge of an oxygen vacancy, a is the jump distance,

𝜗𝑜 is the lattice vibration frequency and mHΔ and mSΔ are the enthalpy and entropy

involved in oxygen diffusion.

The conductivity also depends on the oxygen partial pressure (pO2). Since

diffusion of vacancies is driven by a concentration difference between the cathode and

anode, a higher concentration difference, and a high subsequent partial pressure

difference is essential for good ionic conductivity. With air at the cathode side, the lower

the partial pressure of oxygen at the anode, the better. However, under such reducing

conditions at the anode, Ce4+ gets reduced and the following defect reaction takes place,

promoting n-type conductivity and electron hopping paths in the electrolyte material. A

similar electrochemical reaction can be induced by means of an electric field. The effect

of a DC electric field has been discussed at length in Chapter 6.

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Ce2O

x

O

x

Ce eC2O2

1VOCe

(2-6)

eonion

ioniont

(2-7)

It is important to know exactly what fraction of the conductivity of a material is ionic.

The ionic contribution to conductivity is measured using the ionic transference number,

which is the ratio of ionic conductivity to total conductivity of a sample as shown in

equation (2-7) where ion is the ionic contribution to conductivity and eon is the electronic

contribution. A material must have a high ionic transference number and a low electronic

transference number for SOFC electrolyte application. A detailed study on the

thermochemical behavior of the undoped cerium-oxygen system has been performed by

Chueh and Haile.40 With increasing temperature, this reduction of ceria is further

exacerbated, producing more electrons. This is one more reason that makes it imperative

that the electrolytes for SOFCs be developed to operate at lower temperatures. On a

side note, this redox behavior of ceria also makes it a possible for candidate for reversible

fuel cells using solar thermochemical hydrogen production.40,41

2.4.1. Dopant Concentration and Defect Associates

Various authors have found that rare earth elements like gadolinium (Gd),

neodymium (Nd) and samarium (Sm) are the best dopants for doped ceria. 42,43 Co-

doping strategies have also been studied as a means to improve the ionic

conductivity.11,17,18 Exhaustive work has been performed on the effect of various dopants

on the ionic conductivity of doped ceria.13,46 When using different dopants, the ionic

conductivity of ceria and zirconia based ceramics has been shown to be affected by the

radius mismatch between the host and dopant cations.13,47 The higher the mismatch, the

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lower the ionic conductivity. A larger ionic mismatch leads to a higher strain in the lattice,

and the diffusion of vacancies is affected by the elastic strain energy of the lattice.48 With

higher dopant concentration, it would be expected that the grain ionic conductivity of the

material also increases. However, this is not always the case, and usually a maximum in

the ionic conductivity is observed at a certain concentration, above which the conductivity

starts to fall again, as has been shown for both ceria and zirconia based systems.42,47,49

Figure 2-6 shows a typical dopant concentration versus ionic conductivity behavior as

reported by Yahiro et al.49

Figure 2-5. Grain ionic conductivity of different doped ceria electrolyte materials as a function of temperature after Gerhardt-Anderson and Nowick.38

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Figure 2-6. Conductivity as a function of dopant concentration in the (CeO2)1-

x(Sm2O3)x system at different temperatures after Yahiro et al.45

In the distorted cubic structure of doped ceria, the vacancies tend to interact with

the dopant cations creating defect associates. Such associates were first reported in

ceria by Nowick and coworkers.46,50,51 The interactions could be electrostatic due to

charge differences on the defects or elastic interactions due to local stresses. These

defect associates bind the oxygen vacancies, effectively reducing the number of movable

vacancies. At lower concentrations, only dimers OA VD can be assumed to be

formed, as they have been shown to be more likely to occur.52 As the concentration

increases, higher order associates such as trimers xAOA DVD and so on are

formed.53,54 The existence of defect associates can be proven using positron annihilation

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spectroscopy as has been shown by Guo and Wang.55 Defect associates can also be

studied using the technique of thermally stimulated depolarization current as has been

shown for multiple materials and has been detailed in Appendix A.50,56 The presence of

defect associates leads to a higher required temperature for ionic conduction as the

activation energy for oxygen diffusion now consists of the energy required to break apart

the defect associates i.e. the association enthalpy ( aHΔ ) in addition to the migration

enthalpy ( mHΔ ).57,58 It has been found that the migration enthalpy ( mHΔ ) for oxygen

vacancies is independent of the dopant concentration.59

ama HHE (2-8)

Figure 2-7 shows the Arrhenius plot of the grain ionic conductivity for Sm/Nd co-

doped ceria for different dopant concentrations.42 In the dilute regime, the conductivity

increases with an increase in the dopant concentration. This has been explained on the

basis of limited defect interactions, and thus the ionic conductivity depends mainly on the

vacancy concentration. However, with an increase in dopant concentrations, more and

more oxygen vacancies are bound in complexes, effectively leading to a drop in the ionic

conductivity in the lower intermediate temperature range (< 450ᵒC). The grain ionic

conductivity plots for higher dopant concentrations all converge at a point around 475ᵒC

above which the behavior is flipped and the conductivity again starts to increase with

increasing dopant concentration. Such behavior is commonly said to be following the

Meyer – Neldel rule and this trend has been reported for doped ceria materials by various

researchers.14,58,60,61 The transition temperature T corresponds to an order – disorder

transition in the ionically conducive material, at which point the conductivity is

independent of dopant concentration and is a function only of the activation energy. It is

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the transition between the stage where most carriers are bound to the stage where most

carriers are free.58 In many cases, a change in the slope of the conductivity plot is also

observed at this transition temperature, sometimes sharp, sometimes gradual. Above

this temperature, the activation energy drops, indicating that the defect associates have

been dissociated and the vacancies are free.48,52,62,63 The activation energy in this high

temperature regime can be considered to be the migration enthalpy of the particular

compound (assuming completely free vacancies), and the difference between the low and

high temperature migration energies can be considered the association enthalpy. The

values obtained from such measurements have been shown to agree well with calculated

values.47

Similar trends have been reported in other oxide ceramic systems, where the

conductivity decreases with increasing dopant concentration at high dopant

concentrations.64,65 Defect associates clearly play a major role, and in order to better

utilize doped ceria materials, it is essential that these defect complexes be better

understood and the effect of processing on reducing the formation of defect associates

be studied.

2.4.2. Dopant and Impurity Segregation

Many studies over the years have come to the conclusion that a major culprit for

lowering the ionic conductivity in oxide ceramics are the grain boundaries14,55,66,67. The

high resistance or the blocking nature of grain boundaries compared to the bulk has been

ascribed to various reasons like, amorphous phases, impurities, misorientation at the

grain boundaries and segregation of dopants. Due to their high energy, any anomalies

present in the crystal structure, tend to accumulate at the grain boundaries during

sintering. It is these anomalies that lead to blocking grain boundaries.

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Figure 2-7. Arrhenius plots for the grain ionic conductivity of Sm/Nd co-doped ceria as shown by Omar et al.42

Following are a few examples amongst various studies that look at dopant and

impurity segregation:

The conventional sintering process used for most ceramics, makes use of milling

and mixing operations to get the desired particle size, and to add dopants and other

additives. However, these steps tend to introduce siliceous impurities from the milling

media into the ceramic powder. During sintering, it has been shown that these impurities

segregate at the grain boundaries and at triple point junctions showing up as a glassy

phase shown in Figure 2-8.14,68 Gerhardt and Nowick have shown that the high grain

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boundary resistance is due to the siliceous impurities and it virtually disappears when

nearly silicon-free materials are used. Even a few hundred ppm impurities has been

shown increase the resistivity in gadolinia doped ceria by up to 100 times.66 One possible

solution to reduce the amount of impurities in the samples can be the use of alternative

processing routes like co-precipitation which avoid milling.

Figure 2-8. Transmission electron micrographs showing segregation of siliceous phases. (A) Continuous layer of a siliceous phase in the grain boundary of 10 mol% GDC and (B) glassy phase formed at triple grain junction in 5 mol% Sm/NdDC as observed by using transmission electron microscopy.14

Contrastingly, in high purity undoped ceria samples, Guo et al.55,69 have shown

that an amorphous siliceous phase is formed only at a few triple grain junctions and the

grain boundaries are relatively clean. Despite the blocking effect from the siliceous phase

being expected to be negligible, it was found that there is still a difference of about two

orders of magnitude between the grain boundary and bulk conductivity. There has been

a lot more focus on a mechanism involving space charge layers and the Mott-Schottky

model at grain boundaries, to try and explain their blocking nature. Such blocking grain

boundaries are observed not only in doped materials or materials with impurities, but even

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in so called pure materials. The segregation of defects at grain boundaries, creates a

space charge layer, forming a sort of Schottky-type potential barrier for conduction at the

interface.67,70

Figure 2-9. Schematic of a grain boundary in an oxide ion conductor. Schottky barrier grain boundary as is commonly hypothesized (top) and a model based on recent elemental distribution studies (bottom). Segregation of dopant is not necessary for explaining the top model.

This model has a positively charged grain boundary core, with a high concentration

of oxygen vacancies, which is compensated by oppositely charged defects, usually

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acceptor ions, and a depletion of oxygen vacancies in the adjacent region. This model

proposes a high concentration of vacancies at the grain boundaries and a depletion

region around the grain boundaries, with a lower concentration of vacancies and a higher

concentration of dopant ions. Figure 2-9 (top) shows a schematic of the space-charge

grain boundary model for doped zirconia and ceria as proposed by Guo and Waser.69

This model although widely accepted, has not been proven experimentally with actual

concentration data for different species at grain boundaries. In fact, as is discussed later

in this chapter, high resolution elemental distribution studies paint a slightly different

picture which is depicted in the bottom part of Figure 2-9.

Considerable amount of work has been done to explain the origin of blocking grain

boundaries in oxide ceramics. For SrTiO3, it has been theoretically shown that grain

boundaries in oxide ceramics are intrinsically non-stoichiometric and non-stoichiometry

in the grain boundary cores is energetically favorable in undoped SrTiO3.71 Electron

energy loss spectra (EELS) at atomic resolution have established the coordination of the

species at an atomic resolution, and provided evidence of the non-stoichiometry.71,72 It

has also been shown using atomic resolution analysis that 5 36⁰ [001] tilt grain

boundaries in SrTiO3 have incomplete oxygen octahedra, which act as effective oxygen

vacancies at the grain boundaries.73 This also suggests that the extent of accumulation

changes with the type of grain boundary. It has been established that the existence of

vacancies at grain boundaries is an intrinsic behavior that is seen even in undoped

materials. The grain boundary core has been proposed to have a positive charge due to

this accumulation of vacancies. In the case of doped materials, for example in Mn doped

SrTiO3, the dopant also tends to accumulate at the grain boundaries. During sintering,

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the mobility of the acceptor dopant ions is high enough for them to segregate at the grain

boundaries due to the high positive charge of the grain boundary core and to relieve

elastic strain.69 The dopant segregation itself however, was said to be insufficient to

charge balance the vacancies at grain boundaries.74 The positive core charge was thus

hypothesized to cause a depletion of oxygen vacancies in the regions surrounding the

grain boundary along with the accumulation of the dopants. Similar results have been

shown for yttria stabilized zirconia (YSZ) where the vacancy accumulation at grain

boundaries has been attributed to a structure relaxation.75 Z-contrast STEM imaging and

atomic resolution EELS of well-defined grain boundaries have been performed for both

yttria stabilized zirconia and gadolinia doped ceria.74 In YSZ, it was found that the yttrium

segregates at the grain boundaries. EELS profiles across grain boundaries in GDC have

shown similar results, where the Gd/Ce ratio increases at the grain boundary whereas

the O/Ce ratio decreases. It was also found that about 70% of the Ce4+ changes to Ce3+

at the grain boundaries, leading to an excess of electrons near the grain boundaries.

This proposed Schottky barrier model for the grain boundaries has been found to

satisfactorily explain the observed electrical properties for grain boundaries. However,

as said before, there has been no proof so far for the depletion or space-charge layer

around grain boundaries. The segregation of acceptor dopants, at grain boundaries and

triple point junctions has been looked at in much more detail recently, with the

advancement in elemental characterization techniques. For example, Li et al.76 have

shown using laser assisted atom probe tomography in gadolinia doped ceria, that there

is a segregation of dopants at the grain boundaries. However, contrary to the space

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charge model, the Ce concentration was actually found to decrease, whereas there was

no significant change in the oxygen concentration at the grain boundary.

Figure 2-10. Atom probe tomography data for a grain boundary in 10 mol% Nd doped ceria adapted from Diercks et al.77

More recent work by Diercks et al.77 using atom probe tomography for Nd doped

ceria has shown segregation of dopants and oxygen vacancies at the grain boundaries,

accompanied by a rise in Ce at the grain boundaries, as depicted in Figure 2-10. The

change in concentrations was found to be till about 4-6 nm from the grain boundary

center, similar to that shown by Li et alError! Reference source not found..76 The co-e

nrichment of vacancies and dopants at grain boundaries was suggested to be consistent

with the theory of defect-defect interactions. The electrostatic potential at boundaries was

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calculated using the Poisson equation by Diercks et al.77 and the results match with typical

results grain boundary potentials measured using impedance spectroscopy for GDC.

Recently, a different model has been proposed by Frechero et al. for YSZ using a

combination of experimental and simulation techniques.78 Like others, no depletion layer

of oxygen vacancies was found. The Y ions segregated at grain boundaries are not

sufficient to balance the charge of the positive vacancies. Using density functional theory,

it was shown that the two electrons accompanying the formation of each oxygen vacancy,

instead of localizing around the vacancy, go into empty electronic states in the grain

boundaries. These grain-boundary induced electronic states act as acceptors, creating

a negatively charged core and it is this negative charge which acts as a trap for vacancies

and creates a barrier for ion transport at grain boundaries. This model contrasts with

established models and needs to be further studied.

It is important to be familiar with and understand the various proposed mechanisms

responsible for blocking grain boundaries since the boundaries and surfaces play

increasingly dominant roles as device sizes reduce. This knowledge can be used to

modify processing conditions and obtain better performing materials and will be revisited

in Chapter 7.

2.5. Impedance Spectroscopy

Impedance spectroscopy (IS) is a technique that can be used to study the

dynamics of charges in solids and liquids. More particularly, electrochemical impedance

spectroscopy (EIS) is the subset of impedance spectroscopy where ionic conduction is

the dominant mechanism, is of interest here. It involves the linear electrical response of

a material to a small signal stimulus in the frequency or time domain.79 The very first

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examples of such experiments are by Randles (1947) and Jaffe (1952). Randles studied

the kinetics of rapid electrode reactions using a capillary electrode immersed in a suitable

solution, a method called polarography.80 Jaffe studied polarization in electrolytic

solutions using a sophisticated conductance cell.81 It was Bauerle in 1969 who first dealt

with impedance spectroscopy of ionic solids and measured their conductivity accurately.82

Today it is widely used as a tool for investigating electrochemical systems. It is of

particular importance because there usually exists a direct analogy between the

impedance behavior of a material and the physical processes occurring in a material.

The most common way of measuring impedance is by applying a single frequency

current or voltage to a sample and measuring the resultant phase shift or amplitude of the

resulting current at that frequency using fast Fourier transform analysis of the response.79

When an electrical response is applied to a material, many processes take place inside

it. Some examples are transport of charge carriers, transfer of charges at interfaces,

oxidation and reduction reactions etc. All these processes are characterized by a specific

frequency, at which they respond to the stimulus, thus helping in their identification. For

the study of solid electrolyte materials for fuel cells, a few hundred mV is used as a

stimulus in a frequency range of typically 0.01 Hz to 10 MHz, depending on the equipment

used. The response is usually analyzed in terms of one of the following four formalisms:

impedance (Z*), modulus (M*), admittance (Y*) and permittivity (ε*), all complex numbers.

For most solid ionic conductors, the data is usually represented as a frequency dependent

plot of Z where the real and imaginary parts of Z are as follows.

ZiZZ (2-9)

cosZZZRe (2-10)

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sinZZZIm (2-11)

The complex impedance is data is typically represented in the form of a Nyquist

plot (also called complex impedance plot) where the frequency is implicit. The y axis is

usually -Z” (convention for capacitive systems) and the x axis is Z’. Alternatively, it can

also be represented in the form of frequency explicit plots (also referred to as Bode plots).

The two kinds of plots and their interrelation is shown in Figure 2-11 in the form of 3D

perspective plots.

Figure 2-11. Impedance response in a 3D perspective plots for a 10 mol% gadolinia doped ceria sample. The different planes show the complex plane and frequency explicit projections of the data.

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Since all the processes occurring at the atomic and microstructural level in an ionic

conductor have their own respective characteristic relaxation frequencies, they show up

as different arcs on the Nyquist plot. A typical example is that of an RC circuit, with a

fixed time constant. The response for such an element shows up as a semicircle in the

first quadrant, where the diameter of the semicircle is the resistance (R) the top of the

semicircle corresponds to the relaxation time (𝜏 = RC) where C is the capacitance. If a

process has a distribution of relaxation times, it leads to distortion of the semicircle, which

is very common among real materials. Similarly, any arc in the fourth quadrant usually

indicates that an inductance (L) is involved. The data obtained is thus usually fit to an

equivalent circuit consisting of various circuit elements. Based on the values of the

various circuit elements, inferences can be drawn as to the relaxation processes taking

place in the material.

Typical data for an electroded polycrystalline sample usually looks like Figure 2-12.

It usually has three sections, the first smaller arc denoting relaxation within the grain, the

second larger arc denoting the relaxation across the grain boundary, and the third large

arc representing processes at the electrode interface. Under ideal conditions, all the arcs

are semicircular and the data is usually modelled using an equivalent circuit that consists

of three pairs of parallel RC elements in series with each other. However, in many cases,

the semicircles are depressed and the capacitance C has to be replaced by a constant

phase element (CPE) in the circuit to simulate distributed time constants. The nature of

CPE will be discussed further in Chapter 4. R1 and CPE1 thus denote grain contribution,

R2 and CPE2 denote grain boundary contribution, and R3 and CPE3 denote electrode

contribution. The arcs also frequently overlap to a varying extent, depending on the

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characteristic relaxation times of the respective mechanisms and the difference between

them. Similar relaxation times give more overlap between the arcs.

The resistance values obtained from the fitting of the impedance data can be used

to calculate the grain (from R1) and total ionic conductivity (from R1 + R2). The grain

boundary conductivity is not calculated, because it is extremely difficult to calculate the

area and thickness of all the grain boundaries in the sample. It can be calculated only in

very specific conditions by making certain assumptions and using some special models

depending on the material.79 Hence only the grain conductivity and total conductivity are

calculated in this work. The grain conductivity can be calculated by assuming the grain

boundary volume to be negligible and taking the sample volume as the grain volume.

Figure 2-12. Schematic of complex impedance plot obtained using EIS for a polycrystalline electroded sample adapted from Omar.14

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Conductivity can be calculated from resistance using the following relation,

RA

L

(2-12)

where R is the resistance, L is the length and A is the cross-section area of the sample.

Further details about data fitting, circuit elements and the involved intricacies are

discussed in Chapter 4.

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CHAPTER 3 EXPERIMENTAL PROCEDURES

3. 3.1. Sample Preparation

3.1.1. Bulk Samples

To prepare bulk samples, the conventional solid state processing route (shown in

Figure 3-1) was modified, where instead of the mixing and milling operations, the co-

precipitation technique was used to synthesize phase pure 10 mol% doped gadolinia

doped ceria powder. The co-precipitation technique has been shown to produce phase

pure powders with less siliceous impurities as compared to the conventional powder

processing route involving powder mixing and ball milling. It also gives a smaller particle

size which leads to better sintering kinetics. Thus high density pellets can be obtained

using lower sintering temperatures and times.14 For co-precipitation, stoichiometric

amounts of cerium nitrate hexahydrate (Ce(NO3)3.6H2O, 99.5%, Acros Organics) and

gadolinium nitrate hexahydrate (Gd(NO3)3.6H2O, 99.9%, Strem Chemicals) were mixed

in de-ionized water forming an aqueous solution. Under magnetic stirring, an ammonium

hydroxide solution (82-30 wt% NH3 solution in water, Acros Organics) was slowly added

to this solution till the pH was raised to 12. With the addition of ammonium hydroxide, a

brownish precipitate separates out. This precipitate was then washed with DI water and

dried in a drying oven at 120°C for 12 hours. The reactions are detailed in equations (3-3)

and (3-4). The conversion from Ce3+ to Ce4+ takes place in the solution at a high pH and

the corresponding reactions for Gd3+ and Ce3+ forming the respective hydroxide

precipitates are as shown in equations (3-3) and (3-4).83 In case of low pH, the conversion

from Ce3+ to Ce4+ does not take place in the solution, but instead occurs during drying

and calcination steps in the presence of air.

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34x4xx1

pHHigh

2243333

NONH3OHGdCe

OH2

x1aqO

4

x1OHNH3NOGdxNOCex1

(3-1)

OH2

x4OGdCeOH

2

x4OGdCeOHGdCe 2

2

x4xx12

2

x4xx1x4xx1

(3-2)

422

3 OHCe4OH2aqOH12aqOaqCe4 (3-3)

3

3 OHGdaqOH3aqGd (3-4)

The dried powder was ground using a mortar and pestle. The ground powder was

calcined at 900°C for 10 hours. The calcination temperature and time used were

optimized previously.14 The calcined powder was ground again using a mortar pestle and

checked for phase purity using X-ray diffraction. For pressing into pellets, the powder

was sieved using a 212 µm sieve. It was uniaxially pressed into disc shaped pellets under

150 MPa using a Carver Inc. 3912 uniaxial press. This was followed by cold isostatic

pressing under 250 MPa using an MTI corporation CIP-50M isostatic press. For this

purpose, the pellet was sealed in a common rubber balloon, which was then evacuated

and tied up. The sample at this stage is the green pellet. This green pellet was

subsequently sintered at 1650°C for 10 hours in air with a heating and cooling rate of

200°C/hour in a box furnace (CM Furnaces 1600 Series Rapid Temp Furnace). The

density (following ASTM B962-15) and dimensions of both the green and sintered pellets

were measured. A flowchart in Figure 3-1 summarizes the co-precipitation process as

against the conventional solid state processing route.

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Figure 3-1. Flow chart for conventional solid state processing of ceramic materials (left) and that for the co-precipitation route (right).

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Figure 3-2. Examples of green and sintered pellets of cerium oxide.

3.1.2. Sintering under Reducing Atmosphere

To study the effect of sintering atmosphere, the pellets pressed using calcined

powder as described above were sintered in a 4% H2-N2 atmosphere. The green pellets

were sintered in a tube furnace (Barnstead Thermolyne 21100 Tube Furnace) at 1100°C

for 20 hours under ~2 SCFH flow of 4% H2-N2 mixture (Airgas Inc.). The heating and

cooling rate was maintained at 200°C/hr. The reduced GDC samples thus obtained were

subsequently re-oxidized under an O2 (Airgas Inc.) atmosphere in the tube furnace at a

much lower temperature of 900°C for 24 hours, with slow heating and cooling. The density

and dimensions of both the reduced and re-oxidized samples were measured.

3.1.3. Thin Film Fabrication

Gadolinia doped ceria (10 mol.% dopant concentration) thin films were prepared

by John Edward Ordonez and Professor Maria Elena Gomez at Universidad del Valle in

Cali, Colombia using a custom-made magnetron sputtering setup using a target made by

the powder processing route as described above. A picture of the setup is shown in

Figure 3-3. The films were deposited on a Pt/TiO2/SiO2/Si substrate maintained at a

temperature of 550°C under an atmosphere of highly pure oxygen (99.9992%) with a

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base pressure of 1.2x10-4 mbar and a work pressure of 10-1 mbar. The Pt layer was

approximately 200 nm thick and the TiO2/SiO2 layer around 504 nm thick as received

(MTI Corporation). The deposition times were varied between 60 to 150 minutes to obtain

films with varying thicknesses from 100-500 nm. Based on the deposition times and film

thicknesses, a sputtering deposition rate of 1 nm/min was estimated. The samples were

annealed at 500°C for 2 hours to complete crystallization. Pt top electrodes 50 nm thick

were deposited using DC sputtering (Kurt J. Lesker Multi-Source RF and DC Sputter

System) with a shadow mask at room temperature to give a pattern of circular electrodes

each with a diameter of ~100 µm. Figure 3-4 shows a schematic of the films whereas

Figure 3-5 shows an example of a film.

Figure 3-3. The magnetron sputtering setup at Universidad del Valle in Cali, Colombia used for deposition of GDC thin films. Photo courtesy of John Edward Ordonez.

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Figure 3-4. Schematic of a gadolinia doped ceria thin film on top of a Pt/TiO2/SiO2/Si substrate with Pt electrodes on top adapted from R. Kasse.45

Figure 3-5. Image of a gadolinia doped ceria thin film (left) and optical micrograph showing the surface of the film with the circular Pt top electrodes (right). Photo courtesy of author.

3.2. Profilometry

The thickness of the thin films was measured using a Tencor AS500 profilometer

equipped with a diamond tipped stylus. The film thickness was measured by calculating

the drop in height when crossing over from the film onto the bottom electrode. An

example profile for one off the GDC films is shown in Figure 3-6. Five different

measurements were taken for each film and an average value was used. This value also

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matched satisfactorily with the values obtained using scanning electron microcopy as

described in the next section.

Figure 3-6. Graph showing an example of the profilometry data for a GDC thin film under study. The lower part is the bottom electrode whereas the top part is the GDC film, and the difference in the heights is the thickness of the film.

3.3. X-Ray Diffraction

Phase purity analysis was performed using a PANalytical X’Pert Powder diffraction

system to verify the complete dissolution of the gadolinia dopant in ceria. XRD patterns

were obtained using Cu Kα radiation with a wavelength of 0.154 nm. Figure 3-7 shows

the diffraction pattern for a sintered 10 mol% gadolinia doped ceria sample. Comparing

it with the calculated patterns for CeO2 and Gd2O3, it can be seen that the peaks are

similar to those for CeO2 and no extra peaks of Gd2O3 are present in the diffraction pattern

of the sample. This shows that the sample is phase pure as far as can be determined

based on the resolution and sensitivity of the instrument.

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Figure 3-7. X-ray diffraction pattern for 10 mol% gadolinia doped ceria sintered sample. The calculated spectra for CeO2 and Gd2O3 are shown for comparison. Intensities are normalized with respect to the highest peak for each pattern.

3.4. Microstructural Characterization

Microstructural characterization was performed using optical microscopy and

scanning electron microscopy (SEM, Cameca SXFive). For the analysis of bulk samples,

the sintered ceramic samples were mechanically polished to a mirror finish using diamond

lapping films down to 0.1 μm on an Allied Multiprep polisher. They were cleaned using

sonication for 30 minutes. To make the grain boundaries visible, the samples were

thermally etched at 1400°C for 1 hour with rapid heating ramp rates of 600°C/h. For the

samples where dopant segregation during thermal etching is a concern, they were etched

using a 25 vol% HF solution in DI water with an exposure time of 4 minutes. The samples

were then either observed directly under an optical microscope or coated with an

approximately 10 nm thick layer of carbon for SEM and related analysis. Figure 3-8

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shows an example microstructure observed in a bulk sample. Electron probe micro-

analysis (EPMA, Cameca SXFiveFE) was used to determine elemental distribution and

concentrations in the bulk samples (details of both instruments here). Scanning electron

microscopy was used to analyze as fabricated thin films, both on the surface and the

cross section. Figure 3-9 and Figure 3-10 show the surface and the cross section

respectively of a GDC thin film as observed using SEM.

Figure 3-8. A scanning electron micrograph showing the microstructure on the surface of a 10 mol% GDC bulk pellet.

Figure 3-9. A scanning electron micrograph of the surface of a GDC thin film.

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Figure 3-10. Scanning electron micrographs of the edge of a gadolinia doped ceria film showing the different layers.

3.5. AC Impedance Spectroscopy

Ionic conductivity measurements were performed using electrochemical

impedance spectroscopy (EIS). A two-probe setup was used for both bulk and thin film

samples.

Figure 3-11. The setup for impedance spectroscopy of bulk samples at different temperatures. Photo courtesy of author.

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Figure 3-12. The reactor setup used for EIS (left) and an example of an electroded bulk sample (right). Photo courtesy of author.

The bulk samples were tested using a Solartron 1260 impedance analyzer and a

custom-made quartz reactor. The flat faces of the samples were polished using SiC

polishing paper, cleaned using a sonicator and electroded using Pt paint (CL11-5349,

Heraeus). Each side was dried in a drying oven (details) for 1 hour at 120°C, following

which the samples were fired at 900°C for 1 hour. The sample faces electroded with

platinum were connected to platinum wires using silver paste. The Pt wires were in turn

tied to the gold wire electrodes, shielded with Pt coated alumina tubes, which were

connected to the Solartron 1260 using BNC connections. A Lindberg Blue M tube furnace

was used to provide high temperatures. Complex impedance measurements were

performed from 200°C to 650°C with an oscillating voltage of 500 mV in a frequency range

from 0.1 Hz to 10 MHz, and DC bias from 0 V to 10 V under an air atmosphere. Nulling

files for open and short circuit compensation were recorded for each data point before the

actual sample measurement. Data was recorded using ZPlot® software (Scribner

Associates Inc.). The setup is shown in Figure 3-11 and Figure 3-12.

The thin film samples were tested using an Agilent 4924 precision impedance

analyzer and a Micromanipulator Inc. probe station. Heating was achieved using a

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hotplate and an infrared thermometer was used to measure the temperature. The test

setup is shown in Figure 3-13 and Figure 3-14. Across plane complex impedance

measurements were performed from 25°C to 150°C with an oscillating voltage of 300 mV

and an applied DC bias ranging from 0 V to 5 V. Open and short circuit compensation

were performed to account for the contribution of the test setup to the measurement.

The data obtained was fit to relevant equivalent circuits using Zview software

(Scribner Associates Inc.). Fitting protocols as described later in Chapter 4 were used to

obtain consistently good fits for the data. The quality of fit was quantified using the sum

of squares values and residuals between the measured and simulated data. Using the

grain and grain boundary resistance values obtained from fitting, the grain and total

conductivity of the samples were calculated using equation (2-12). The conductivity

plotted as a function of temperature follows an Arrhenius type equation shown in equation

(2-4). The slope of these plots was calculated (as is shown in Chapter 5 and 7) to give

the activation energy for conduction.

Table 3-1. Sources of experimental errors involved in the impedance measurement and fitting for a GDC sample.

Systematic errors Random errors

Thermocouple calibration

Chemical composition of samples

Impedance analyzer calibration

Processing furnace calibration

Precision of temperature measurement

Error in resistance values obtained from fitting

Standard deviation in dimension measurement

Sample shape effects

It is important to note here the possible error sources involved in the experiment

and the propagation of these errors to the final result. The experimental errors associated

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with the testing of a sample can be divided into systematic errors and random errors.

They are listed below in Table 3-1. The systematic errors involved can be neglected as

they are not expected to change. All the experiments were performed with the same

thermocouple and impedance analyzer calibrations. Any error in the chemical

composition of the samples was avoided by using the same batch pf doped starting

powders for making samples.

Considering the sources of random errors, the temperature for the impedance

measurement system has a precision of 0.1ºC for thin films and 1ºC for bulk samples.

Equivalent circuit fitting using ZView® gives a percentage error for each of the resistances

used in the equivalent circuit. The error in dimension measurement can be calculated as

a standard deviation for multiple values of the thickness and diameter of the disc shaped

samples. Using the relationships for propagation of errors, the errors in different

quantities can be calculated as follows:

The error in cross sectional area is given by equation (3-5) where A is the area of

a circle, and D is the diameter.

AD

D

2A

(3-5)

Based on the error in resistance (R), thickness (l), and area (A), the error in

conductivity can be calculated by equation (3-6).

222

A

A

R

R

l

l

(3-6)

For plotting the Arrhenius plot of conductivity versus temperature, the error in (𝜎T)

is given by equation (3-7) and the error in 1000/T is given by equation (3-8).

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22

avg

avg

avgavgT

TTT

(3-7)

TT

1

T

12

(3-8)

This should eventually lead to an Arrhenius plot with x and y error bars based on

all the random errors mentioned above for a sample as is shown later in Chapter

5. It is after this point that the sample to sample variation can be taken into

consideration by averaging for different samples processed and tested under the

same conditions.

Figure 3-13. Probe station setup for electrical testing of thin films. Photo courtesy of author.

3.6. DC I-V Measurement

The leakage current and current-voltage DC measurements were performed using

an Agilent 4156C precision semiconductor parameter analyzer. The probe and heating

setup was the same as described above for bulk and thin film samples. Leakage currents

for the thin films samples were measured for the same bias values and temperatures as

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used during impedance spectroscopy. The sweep speeds for I-V measurements were

varied to match different frequencies in impedance data. The range for the I-V sweep

was set at twice the oscillation voltage amplitude (mostly set at 300 mV) for impedance

spectroscopy, with the bias value used lying in the middle of the sweep range. For

example, to do a measurement equivalent to a 300 mV oscillating voltage and 2 V bias,

the DC I-V sweep would be done from -1.7 V to 2.3 V, with the midpoint lying at 2 V. A

pulse sweep measurement mode on the system was used. To match the sweep speeds

with the frequency of different points on the complex impedance plot, the number of steps

in the sweep range, the step size, and the integration time at each point was varied. A

change in the integration time essentially modifies the pulse width at each of the voltage

points. Using the Agilent 4156C system, which has three default integration times, short,

medium and long, the short integration time mode was used which allows for the smallest

possible integration time of 80 μs. The pulse width on the other hand, which is the sum

of the pulse width and the hold time after each pulse was set to a minimum value of 5 ms.

Such settings allow sweep speeds equivalent to frequencies in the range of a ~100 Hz.

Figure 3-14. Schematic of probe contact adapted from R. Kasse45 (left) and a picture of the same (right) for across plane impedance measurement

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CHAPTER 4 PROTOCOL FOR IMPEDANCE TESTING AND DATA ANALYSIS

4.

Figure 4-1. Flow diagram for the measurement and characterization of material electrode system adapted from Macdonald.84

Impedance spectroscopy is the primary technique used to analyze relaxation

mechanisms in ionically conducting materials as was described in Chapter 2. To be able

to extract meaningful parameters with some physical significance, in this case to

accurately determine grain and grain boundary contributions to the ionic conductivity, it is

essential that the correct equivalent circuit model be selected and properly fit. This fitting

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is usually done based on the well-known flowchart shown in Figure 4-184. Based on the

user’s knowledge of the material-electrode system, a plausible physical model is

proposed in the form of an equivalent circuit. This model is then fit to the complex

impedance data usually using the complex non-linear least squares (CNLS) fitting

technique. The fitting nowadays is usually done automatically using commercial software

like ZView (Scribner Associates Inc.). Although this process seems simple enough in

principle, it can become extremely complicated very quickly.

4.1. Common Mistakes

If one is not careful, multiple things can go wrong while fitting of impedance data.

The most obvious error is the use of an incorrect model. It is very easy to miss certain

nuances during impedance data analysis, for example when using simple circuits with

parallel RC elements in series, to model impedance data. Though this might work well in

certain cases, it is a very ideal combination of circuit elements that does not apply to many

practical material systems.79 Most practical systems deviate from ideal Debye like

behavior as they have a distribution of relaxation times, due to various reasons. Another

mistake very easily committed is to go to the other extreme and keep adding elements to

the equivalent circuit to get a good fit. With enough number of circuit elements, almost

any data set can be fit. However, this circuit has little physical significance. Any number

of circuits can fit a certain data set, if they have a lot of parameters. Each parameter used

for fitting has to be used only because it has a certain physical significance in the expected

material behavior. The correct equivalent circuit should have a proper experimental

justification. Additionally, most literature does not provide information about the quality

of fit for a particular model and data set. The reader thus has to take the extracted results

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at face value without any proof. Quality of fit is a very important part of impedance data

analysis. In fact, detailed quality of fit studies can help identify the correct model among

different competing models.

In the absence of a proper protocol for data fitting, there is very little reproducibility

in the results. A single set of data can be fit using multiple equivalent circuits. The same

set of data when analyzed by two different people can yield very different results. This

calls for standardization of the procedure for fitting of impedance data. In brief, the

different factors involved in the proper analysis of impedance data are:

Physical significance of the different circuit parameters in fitting programs

Selection of the correct equivalent circuit based on a physical model.

Approximate starting values for parameters to be fit.

Estimation of fitting quality.

4.2. Best Practices

There has been some work towards developing strategies for accurate and

reproducible analysis of impedance data. Abram et al.85 have shown how to discriminate

between competing model circuits using the four complex immitance formalisms, namely,

impedance, modulus, admittance, and permittivity. They have also provided a guide to

determine approximately accurate starting values of parameters for fitting. Macdonald

has worked on a wide variety of models for impedance analysis in addition to all the

strategies and detailed work on CNLS fitting.9,86,87 The ‘Help’ section of the Zview

software also has a lot of useful information. The following is a compilation of best

practices based on the factors listed above that should make more uniform and

reproducible analysis of impedance data possible.

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4.2.1. Definitions of Parameters

To be able to perform fitting of data with ease, it is necessary to be familiar with

the various circuit elements commonly used for fitting, their physical significance and the

related math. Following is a list of parameters commonly used:

Resistance (R): It is the obstacle to the flow of charge carriers. It forms the real

part of impedance ( Z ), with no imaginary component (Z ) associated with it.

RZ 0Z (4-1)

Capacitance (C): It is the geometrical capacitance associated with the grain, grain

boundary or electrode. It contributes to the imaginary part of impedance, with no

associated real component. It forms a semicircular arc in the first quadrant of the

Nyquist plot when in parallel with R. Here ω is the angular frequency and the

numbering for quadrants used throughout the document is as shown in Figure 4-2.

C

1Z

0Z (4-2)

Figure 4-2. Numbering systems for quadrants in the coordinate system used throughout this work.

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Inductance (L): At low frequencies, it indicates the reversible storage of electric

kinetic energy. It contributes to the imaginary part of the impedance, with no

associated real component. Usually pushes data towards the fourth quadrant

when it is a part of the circuit.

LZ 0Z (4-3)

Constant phase element (CPE): It models the behavior of an imperfect capacitor

(in non-homogenous systems). When in parallel to a resistor, it produces a

depressed semicircle in the Nyquist plot. In Zview software, the CPE is defined by

two values, CPE-T and CPE-P.

P

CPE iTZ 1i (4-4)

The P value here (CPE-P) determines the split of the impedance into real and

imaginary parts. CPE-T is the equivalent of a capacitance, and it represents a

perfect capacitor when CPE-P equals 1. When CPE-P equals 0, CPE-T is a

resistor, and when it equals -1, it is an inductor. At CPE-P equal to 0.5, a 45⁰ line

is produced in the plot, which indicates a Warburg element, sometimes used to

model electrodes.

In literature84, the impedance of CPE is also given as,

γ

CPE ωiAZ 1i (4-5)

where γ is a constant. A on the other hand, equals 2πncosa , where a is

constant. CPE-P thus equals γ , and CPE-T equals A from equations (4-4) and

(4-5). The value of CPE-P or γ is indicative of the amount of distribution in

relaxation time. This representation of distributed time constants originated from

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the Cole-Cole modification to the Debye relaxation relationship, which gives a

depressed, but symmetric semicircle.88 The associated mathematical expression

for complex permittivity is denoted by equation (4-6).

α1

oωτi1

εΔεωε

(4-6)

Here is the angular frequency, is the dielectric constant at infinite frequency,

is the difference between the static and infinite frequency dielectric constants, and o

is a generalized relaxation time. Other mathematical models for dielectric relaxation have

also been proposed,89,90 the details of which are included in Appendix D. The constant α

in the Cole-Cole and other models for permittivity is should not be confused with the

constant γ used for defining CPE. These constants although related are different.

In addition to the common circuit elements, it also helps to know the different

impedance formalisms which are defined as follows:85

Admittance

Z1Y (4-7)

Relative permittivity

M1 (4-8)

oCi

Y

(4-9)

Relative electric modulus ZCiM o (4-10)

Here oC is the vacuum capacitance of the sample holder and electrode arrangement.

Impedance is the combined the effect of reactance and ohmic resistance in a circuit which

impedes the flow of current. Admittance, opposite to impedance is the ease with which

current can flow. Permittivity is the measure of the electric field or flux formed in a material

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as a function of charge, and as expected is dependent on the admittance and capacitance

of the medium. It represents the opposition to field formation whereas modulus measures

the opposite of that. It has been shown by Gerhardt that these different formalisms can

be used to separate and magnify different effects in the materials under test. For example,

the presence of a peak in the modulus with respect to frequency indicates localized

relaxation, as opposed to long range conductivity in its absence. Similarly, a peak in the

imaginary impedance can be related to space charge effects. Long range conductivity

though clearly visible in the impedance formalism, but does not show up in the permittivity

formalism.91

4.2.2. Selection and Fitting of Appropriate Equivalent Circuit

When testing a new material, a number of competing circuits must be considered,

based on possible physical mechanisms the user can envisage in the material. One

needs to have a fair knowledge about the material under study for this purpose. Since

the objective of this work is to study gadolinia doped ceria, an ionic conductor, the typical

response for a polycrystalline ionically conducting ceramic is considered. As shown in

Figure 2-12 in Chapter 2, it typically consists of three arcs, grain in the MHz frequency

range, grain boundary in the kHz range and electrode in the Hz range. These frequency

ranges can be used as guide to identify the contributing mechanisms, as they are fairly

typical of ionic conductors, in a given temperature range. Under ideal Debye like

conditions, such semicircular arcs are fit using parallel RC elements. In ionic conductors,

the grain boundary resistance is usually much larger than the grain resistance, thus

separating the two is easier. Similarly, a C value of 10-7 or higher is characteristic of

space charge layer effects at electrode interfaces, nF range for grain boundary and pF

range for grains.85 As stated before, most materials have distributed time constants, as

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opposed to a single constant. CPE is used to model such behavior, which shows up as

depressed and distorted arcs. The value of α associated with the CPE signifies the

distribution of time constants and the extent of depression of the semicircle in the complex

plane plot. Often two or more relaxation processes have similar time constants and hence

their arcs overlap and need to be de-convoluted and fit accordingly. In case the first arc

does not begin at the origin, an appropriate extra circuit element/s (L, C, or R) is/are used

in series to model this deviation. In case the graph is shifted along the x-axis, a series

resistance is used, a capacitance is used for the first quadrant and an inductance for the

fourth quadrant as is shown in . Same applies even between and at the end of the other

arcs. For example, there could be a series resistance between two arcs, or there could

be a resistance or even an inductance parallel to all the other circuit elements (as will be

shown later in Chapter 6). As described in section 4.2.3, approximate initial values need

to be estimated.

Figure 4-3. Schematic showing shift in complex impedance plots and the respective equivalent circuits.

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During fitting, as has been highlighted by Abram et al.85, it is important to give full

weight to the entire frequency range measured. The data must be viewed both in the

linear scale and the log-log scale. Linear scale representation gives an initial visual

overview, whereas the logarithmic scales allow more accurate assessment as it ensures

equal weighting of the data. More features become visible in the log representation as

can be seen from Figure 4-4.

Figure 4-4. Example data set showing the difference between linear and log representations.

Similarly frequency explicit plots can be used to separate out overlapping arcs in

the complex impedance plots which are hard to distinguish. All four immitance

formalisms, Z*, Y*, M*, and ε* need to be analyzed during fitting, as each of these

highlights different circuit elements. For example, the Z formalism is dominated by

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resistances, and Rgb being the dominant resistance, this formalism highlights the grain

boundary contribution. The M formalism on the other hand, highlights the bulk

contribution, since it is dominated by the inverse of capacitance, with 1/Cg being

dominant. The correct equivalent circuit must give a good fit to all the formalisms.

Figure 4-5. Sample data showing a complex impedance plot and the frequency explicit plot of theta for the same data which enhances the data in the blue box.

As discussed in chapter 2, the data for any of the four formalisms in addition to the

complex Nyquist representation, can also be represented by frequency explicit or

spectroscopic plots (Figure 2-11). Low impedance values which might be harder to

observe in the complex plane plots can be seen more clearly in frequency explicit plots

as is shown in Figure 4-5. These plots make it easier to identify the number of relaxation

mechanisms. For impedance and permittivity for example, each relaxation mechanism

in the material, within the frequency range measured shows up as a peak in the Z” and ε”

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versus frequency plots and valley in θ frequency explicit plots. Broader peaks imply more

distributed time constants for the relaxation mechanisms. Slopes of these plots can thus

be used to determine the value of α as has been shown by Orazem and Tribollet.92 An

example of the same is shown in Figure 4-6. Gerhardt has shown that frequency explicit

plots in combination with various dielectric functions, can be used to distinguish between

localized relaxation and long range conductivity.91 For example, it was shown that

overlapping Z” and M” peaks imply long range conductivity. Using frequency explicit

plots, the change in the relaxation time for mechanisms with temperature can also be

followed and studied easily. As such these data representation techniques can be used

for other electroceramics to gain a better insight into the various phenomena at play.

Data should generally be fit from low temperature (or DC bias) to high, with new

circuit elements being added if and when they appear. At low temperatures, the analysis

of the bulk response is easier. Higher temperature bulk response can then be fit using

the n value obtained from the first fit as an estimate. Progressively, the grain boundary

and electrode contributions can be fitted.85 In case a circuit contains a large number of

parameters, certain features may be fixed for the initial fitting runs, and the rest of the

factors may be allowed to vary. The values of R, C (or CPE) or L as obtained from fitting

should follow the expected temperature and frequency trends for the given material. For

example, for GDC, ionic conductivity should follow the Arrhenius equation. There should

be a drop in the CPE values for GDC with increasing temperature. Similarly, Re for a

parallel electronic resistance introduced in doped ceria (looked at in Chapter 6) should

drop with increasing bias. Any deviation from such expected behavior could be due to an

incorrect circuit or fit.

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The best circuit amongst different circuits with similar response can be determined

from the residual analysis of the fit. An incorrect model will usually have high residual

values and might even show high or low frequency tails, indicating a poor fit. After fitting,

if it is still found that multiple circuits yield the same frequency response and low residuals,

then additional experimental observations are required to validate a particular model.92

4.2.3. Starting Values for Fitting

Most fitting programs and algorithms require reasonably approximate starting

values of all the circuit elements for fitting. Poor initial values can lead to poor fits (a false

minimum) or even no fits at all. Based on the model to be fit, approximate initial values

of the parameters need to be estimated. R and C values for parallel RC elements can be

estimated either by hand fitting of individual arcs, or by the ‘Fit Circle’ option in commercial

software, if available. R is estimated as the x-axis intercepts of the arc and C is estimated

from the relation RC=𝜏, where 𝜏 is the relaxation time for the mechanism (corresponds to

the angular frequency ωmax at the highest point in the arc). As shown by Abram et al.85,

CPE values can be estimated by plotting the admittance (log Y’ vs log ω) as shown in

Figure 4-7.85 For low temperature data, this plot should contain a low frequency plateau,

with a higher frequency dispersion region with a power law gradient equal to n (calculated

from slope of the tangent). The intercept with the y-axis, is equal to log[A cos(nπ/2)].

Hence the values of A and n for CPE can be estimated. At higher temperatures, the high

frequency gradient starts to disappear and a low frequency gradient appears,

corresponding to the grain boundary dispersion. A and n values can be estimated just as

for the grain. In case a clear slope is not visible in the measured temperature range, a

typical value of n=0.6 can be assumed. The value of n (or α) can also be determined

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from the slope of the |Z| versus log (frequency) plot as shown in Figure 4-6.93 Similarly,

if an inductance is present in the circuit, its value can be estimated from 𝜏=L/R.

Figure 4-6. Imaginary part of the impedance as a function of frequency with α as a parameter. Figure adapted from Orazem et al.93

Figure 4-7. Schematic of log Y’ against log ω with a low frequency plateau and a high frequency dispersion adapted from Abram et al. 85

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After estimating the initial values, it is advisable to run a simulation of the circuit,

to check whether it is close to the experimental data. A fitting routine should be run only

after a satisfactory simulation.

4.2.4. Quality of Fit

Once an appropriate physical model has been selected and its parameters have

been fit to the impedance data, it is essential that the quality of fit be determined. This is

the single most important factor that helps determine whether a particular model is correct

or the CNLS routine gave a proper fit. The primary and easiest way of doing this is by

visually checking that the fitted data matches well with the measured data. Another

indicator is the actual and percentage error values for the different circuit elements,

provided by the fitting software. Low error values are desirable. A percentage error below

5% can usually be tolerated, however, this threshold is usually subjective. Very large

errors indicate an incorrect model, usually with more elements than required. The

redundant elements however do not have any effect on the goodness of fit.

The goodness of the fit can be determined by two parameters. The first is Chi-

Squared, which is the square of the standard deviation between the measured and fitted

data. However, given that the impedance values can vary by orders of magnitude, it is a

relatively poor estimate of quality of fit. A data set with a poor fit at low impedance values,

but a good fit at higher impedance values will give a low chi-squared value, thus giving

an inaccurate analysis. A much better estimate of quality is the Sum of Squares. It is

proportional to the average percentage error between the measured and fitted data. By

looking at percentage values instead of absolute values, it gives equal weightage to all

parts of the impedance curve, no matter what the magnitude. As per Macdonald and

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Porter, proportional weighting is more accurate compared to modulus weighting for CNLS

fitting.87

Another really good measure of the quality of a fit is the analysis of residuals, as

is frequently used in statistical analysis of data.94 An example of such analysis has been

shown by Masó and West15. The values of residuals can help distinguish between a good

and a bad model for the same set of data. More, importantly, any trends in residuals with

frequency are indicative of an incorrect model. Residual analysis should in fact be

reported with impedance analysis whenever possible, so that it gives the reader more

confidence in the data. An example of residual data is shown in Figure 4-8.

Figure 4-8. An example of residuals for the real and imaginary parts of impedance.

Based on the practices described in this chapter, a detailed protocol with step-by-

step instructions for performing impedance data analysis using ZView® software was

developed. The steps are detailed in Appendix A.

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CHAPTER 5 IMPEDANCE RESULTS FOR THIN FILM AND BULK SAMPLES

5. 5.1. Thin Film Samples

Gadolinia doped ceria thin films were tested for impedance behavior. These films

were later used to study the effect of bias, as is presented later in Chapter 6. This section

discusses the impedance data for one such thin film and follows the fitting process. As

an example, Nyquist plots showing the results of impedance spectroscopy for a 10 mol%

GDC thin film as a function of temperature are shown in Figure 5-1. As expected, the

arcs in the impedance plots shrink with increasing temperature, indicating in general, a

trend of increasing conductivity.

Figure 5-1. Nyquist plot showing impedance data for a 267 nm 10GDC thin film at different temperatures.

The data shown here was fit following the protocol described in Chapter 4. An

individual data set is shown in Figure 5-2. First step is the identification of an appropriate

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equivalent circuit. A typical equivalent circuit for gadolinia doped ceria that has been used

extensively in literature uses a parallel R-CPE combination to represent each arc in the

data. The circuit used is shown in Figure 5-2. R1 and R2 represent the grain and grain

boundary resistance respectively.

Figure 5-2. Complex impedance plot showing the data for a 10 GDC 267 nm thin film at 130ºC along with the equivalent circuit used to fit the data.

The ‘Fit circle’ option in ZView software was used to estimate starting values for

the resistances. The estimated values are R1 = 79335 Ω and R2 = 5.84x106 Ω. The

CPE-P1 value was estimated as 0.8 by plotting log Y’ vs. log ω (Figure 5-3). The CPE-

P2 values was assumed to be 0.6. The values of CPE-T1 = 1.02 x 10-11 F, and CPE-T2

= 5.13 x 10-9 F were estimated based on the circle fit in ZView. Individual arcs were fitted

first and the values obtained were used to obtain the final fit. The grain ionic conductivity

was calculated based on R1 using the formula defined in Chapter 2. Similarly, the total

ionic conductivity was calculated from R1+R2.

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Figure 5-3. A plot of log Y’ versus log ω for estimating the values of CPE-P and CPE-T for the 10 GDC bulk sample.

Figure 5-4. Arrhenius plot showing the grain ionic conductivity for a single electrode on the 10GDC thin film accounting for error propagation.

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As the temperature increases, the conductivity of the films increases. The single

arc at 25ºC becomes smaller and smaller until at about 50ºC a second arc appears. With

further rise in temperature, both these arcs progressively become smaller. The low

temperature data is fit using a parallel combination resistance and a constant phase

element (R-CPE), whereas at higher temperatures, the two arcs can be reasonably fit

using two parallel R-CPE combinations in series with each other. The fitting was done

similar to the bulk sample mentioned in the previous section. The grain ionic conductivity

can be calculated using the value of R1 obtained from equivalent circuit fitting and

adjusting for area and width as per equation (2-4).

Based on the error propagation discussion in Chapter 3, the total error for

conductivity measurement of a film for a single electrode was calculated by considering

the errors in the R values as obtained from ZView®, errors in dimension measurement,

and the error in temperature measurement. Figure 5-4 shows a plot of conductivity with

respect to temperature including the respective x and y errors. The total error associated

with the fitting, dimension measurement, and temperature measurement propagating to

the conductivity of a sample is very small and will have minimal effect on the activation

energy calculated. This is expected to be the same for all samples tested if all the

instructions in the fitting protocol are followed. The conductivity values thus obtained for

each sample can hence be trusted. Given that the same procedure and protocol is

followed for measuring samples throughout this study, the error for these individual

samples will be small. The only other major factor that can affect the conductivity is the

sample to sample variation, which can be accounted for by testing multiple samples and

presenting their combined results. The error introduced from different samples is much

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higher than the error in conductivity measurement in a single sample and hence cannot

be neglected. In the case of thin films, this can be accounted for by measuring the

conductivity for different spot electrodes. For the 10GDC 267 nm thin film, the

corresponding Arrhenius plot is shown in Figure 5-5. The plot could not be fit with a single

slope as the data points lay outside the confidence bands (95%). Fitting the data with

two slopes give a better with all the data within the confidence bands. This technique can

be used to decide whether a single slope or multiple slopes for data fitting, and has been

used throughout this work. Origin® software takes care of the errors in conductivity and

accounts for them during the calculation of the slope.

Figure 5-5. Arrhenius plot showing the average grain ionic conductivity for multiple electrodes on a 10GDC thin film with 95% confidence bands.

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The conductivity follows Arrhenius behavior and for a 267 nm thick 10 mol%

gadolinia doped ceria film has activation energies of 1.34 eV and 0.871 eV calculated

from the slope of the graph in Figure 5-4 based on equation (2-4).

5.2. Bulk Samples

Figure 5-6. Complex impedance data for a 10GDC bulk sample at different temperatures.

Bulk samples of 10 mol% GDC were tested using impedance spectroscopy as part

of the study involving dopant segregation in Chapter 7. Impedance data for a 10GDC

control sample sintered in air at 1600⁰C for 10 hours is shown in Figure 5-6. The grain

ionic conductivity follows the Arrhenius relation and was plotted against temperature as

shown in Figure 5-7. The slope of the line was used to calculate the activation energy,

based on equation (2-4), where two slopes were found. The values of activation energy

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calculated were 0.88 eV and 0.56 eV. The conductivity and activation energy values

obtained are comparable to those found in literature. The trends in conductivity show

that, as expected, the conductivity in thin films is higher than that for the bulk samples

given that both have similar dopant concentrations.

Figure 5-7. Arrhenius plot showing the average grain ionic conductivity of the 10GDC samples at different temperatures.

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CHAPTER 6 EFFECT OF A DC BIAS ON IMPEDANCE RESULTS

6. 6.1. Background

There have been several studies on the conductivity of oxide electroceramics

under the influence of a DC bias. A DC bias was initially used to study the nature of grain

boundaries in acceptor doped ceria by Guo et al.95, where individual grain boundaries

showed non-linear current-voltage behavior, and the effective grain boundary thickness

(electrical thickness) was found to increase with increasing bias. Work by Guo and

Waser69 involving yttria doped ceria, has attributed the change in behavior under bias to

phenomena occurring at the grain boundaries. They use the space-charge model of grain

boundaries to explain the observed behavior, as has been detailed earlier in Chapter 2.

According to their work, at zero bias, the two space charge layers on either side of a grain

boundary are symmetrical. However, on application of a DC bias, one space charge layer

is depressed, while the other one increases in width as shown in Figure 6-1.

Figure 6-1. Schematic representation of the oxygen vacancy concentration and the space charge layer without any applied bias (left) and with an applied bias (right), as proposed by Guo and Waser.69

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Overall, using bias measurements approximated over a single grain boundary, it

was shown that the total thickness of the grain boundary and the space-charge layers

combined increases. It was also shown that the bulk properties were almost independent

of bias, whereas, the effect on grain boundary resistance was significant. However, since

the focus of the work was on non-linear properties of the grain boundaries, the mechanism

behind the improved conduction was not further investigated. This was used to support

the space charge theory for blocking grain boundaries.

The effect of bias was studied in detail only much later by Masó and West15. Their

study concentrated on the effect of a small DC bias on the electronic conductivity in bulk

yttria stabilized zirconia (YSZ) samples. A drop in resistance was observed under a DC

bias, which was attributed to the onset of electronic conduction, and the possibility of

variable oxidation states of oxide ions and their response to a DC bias. The

corresponding complex impedance data is shown in Figure 6-2. It was found that it took

about 10 minutes for the impedance response to stabilize on the application or removal

of bias. The electronic contribution increases with increasing bias, and after a certain

bias value, it becomes more dominant than the ionic contribution to conductivity. This

happens at lower and lower bias values as the temperature is increased. The behavior

was modelled using equivalent circuits where a resistance starts to appear parallel to the

original equivalent circuit at low bias values (only low bias values were studied). This

new resistance was attributed to electronic conduction introduced along a parallel

pathway.15

Similar resistance degradation has also been reported by Wang et al.96 for Fe-

doped SrTiO3 single crystals. In this combined experimental and computational work, it

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was found that an applied electric field induces migration of oxygen vacancies and

establishes new local defect equilibria. It is this change in the local defect structure that

causes a drop in the resistance. It was also found that oxygen partial pressure and

temperature play a major role in this degradation mechanism. There has also been work

on various other acceptor doped oxides like BaTiO3, CaTiO3 and BiFeO3 which have

attributed field enhanced conductivity in these materials variously to ionization processes,

reactions between oxygen and surface species, underbonded oxide ions, and unique

electronic structure in defect complexes in these materials.97–101

Figure 6-2. Impedance complex plane plots for 8 mol% YSZ at different temperatures and DC bias values as shown by Masó and West15 where 10 V43 V-cm-1.

It is particularly interesting to look at work by Moballegh and Dickey which studied

the effect of bias on single crystal TiO2-x electroded with Pt.102 The use of a single crystal

instead of a polycrystalline material paints a clearer picture. The Pt electrode interfaces

exhibit Schottky contact behavior. As expected it was found that the applied electric field

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induces a redistribution of point defects throughout the crystal, causing accumulation of

Ti interstitials and oxygen vacancies at the cathode. The same is also corroborated by

the Brouwer defect diagram for titania,102 where under low oxygen partial pressures

(reducing condition) causes an increases in oxygen vacancy and titanium interstitials.

Such reducing conditions exist at the cathode under a DC bias.

Figure 6-3. Oxygen concentration in the region adjacent to the Pt cathode interface in a TiOx single crystal after degradation under 15 V bias determined using EELS as shown by and adapted from Moballegh and Dickey.98

Figure 6-3 shows the change in stoichiometry at the cathode interface as observed

by Moballegh and Dickey using electron energy loss spectra (EELS). This modifies the

Schottky barrier at the electrode and essentially degrades it. It was shown that

degradation takes place in two regimes. In the low field regime, the electrical transport is

dominated by local changes near electrodes, and results in macroscopic rectification

behavior, with one of the electrodes being forward biased and the other being reverse

biased, and leads to a drop in resistance when forward biased. However, at higher

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voltages, the stoichiometry is altered so much that it leads to the formation of

microstructural defects, in this case even a new phase. A significant change in the bulk

stoichiometry can lead to the conduction mechanism itself changing in such modified

regions, and in this case, it leads to an increase in resistance with time under an applied

bias.

Figure 6-4. A schematic showing concentration of vacancies in an Fe-SrTiO3 film at high and low frequencies and the corresponding Nyquist plot showing an inductive loop, adapted from Taibl et al.16

This work was further strengthened by Taibl et al.16 who have shown similar

behavior in Fe-doped SrTiO3 thin films, and have supported the vacancy migration theory

and stoichiometry variations under bias using characteristic inductive loops in the

impedance spectra. The segregation of vacancies was achieved by using two different

electrodes, only one of which was blocking to oxygen vacancies. The results were

supported by DC I-V curves at different speeds, which exhibit different trends depending

on the sweep speeds. The existence of inductive loops was explained on the basis of

the time required for oxygen vacancies to redistribute after a voltage change, and hence

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they were attributed to ion motion across the width of the film. Figure 6-4 shows a

schematic, and a Nyquist plot with a low frequency inductive loop for Fe-SrTiO3.

Since there is a possibility of electronic conduction under bias in GDC, it becomes

pertinent to look at the considerable amount work on mixed ionic and electronic

conductivity in ceria materials. Reducing atmospheres have been shown to introduce

electronic conductivity in pure ceria materials, and turning them from poor ionic

conductors to good electronic conductors. The associated reaction is shown in equation

(6-1).

e2O2

1VO 2O

x

O

(6-1)

Guo et al. have shown that under a reducing atmosphere, the bulk conductivity of

1% yttria doped ceria increases only slightly, whereas there is a drastic increase in the

grain boundary conductivity.55 Assuming a brick layer model, charge carriers can travel

either parallel to the current or perpendicular to the current direction. Thus grain

boundaries can be either parallel or perpendicular to the direction of current flow. Since

any conductivity across grain boundaries has to be in series to the bulk flow, as shown in

the schematic in Figure 6-6, a more pronounced partial electronic conductivity at the grain

boundaries was concluded to be due to conduction along grain boundaries parallel to the

current flow. It has been shown that in such a scenario, and the relations eon,

gb

ion,

gb RR

and eon||,

gb

ion||,

gb RR hold true. The electrons generated per equation (6-1) tend to

accumulate at the grain boundaries which eventually lead to such behavior.

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Figure 6-5. The brick layer model for a polycrystalline ceramic with the paths for conduction as shown by and adapted from Macdonald.79

Figure 6-6. Schematic showing ionic and electronic conduction paths for a polycrystalline ceramic assumed to have a brick layer model as proposed by and adapted from Guo and Waser.69 Here R is the resistance, ion stands for ionic, eon stands for electronic, gb stands for grain boundary, and || and denote grain boundary directions parallel and perpendicular to the current respectively.

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Similarly, with nanocrystalline ceria, it has been shown that under reducing

atmospheres a much higher conductivity is observed due to accumulation of electrons

and depletion of oxygen vacancies in the space-charge layer. Such regions near the

grain boundaries, within which electron concentration is higher than oxygen vacancy

concentration were designated as ‘inversion layers’. The inversion layer thickness

depends on temperature and oxygen partial pressure, and increases at higher

temperatures and lower partial pressures, as more and more electrons accumulate at the

grain boundaries, in essence decreasing the effective electrical grain boundary thickness.

It is the presence of such inversion layers with high electron concentration which makes

the grain boundaries more conductive than bulk. Hence the ions flow in the bulk and

across the grain boundaries perpendicular to the current flow, whereas electrons flow

along the grain boundaries parallel to the current flow with eon||,

gb

eon,

gb RR . This effect

was shown for both acceptor-doped and undoped ceria bulk samples.55,103

Figure 6-7. Inversion layer with high electron concentration near the grain boundary adapted from Guo et al.55

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Such studies as the ones mentioned above are important because they

demonstrate novel mechanisms of improving conductivity, introducing mixed ionic

conductivity, or in other cases shed light on the possible degradation of properties in

electroceramic devices.

Figure 6-8. Complex impedance plot showing the effect of a low DC bias on 10 mol% doped gadolinia doped ceria bulk specimen at 200ºC.

A similar study is performed here for gadolinia doped ceria, for which such an effect

has not been studied. Preliminary tests on bulk samples of GDC show behavior very

similar to that observed by Masó and West15 as has been shown in Figure 6-8.

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Interestingly at relatively higher bias values, a small inductive loop is observed at low

frequencies as shown in inset in Figure 6-8. To study this effect further, and understand

it in more detail, this study looks at gadolinia doped ceria thin films. Due to the small

thickness of the films, any applied voltage translates into very high electric fields, which

have not been studied before for such effects.

6.2. Bias Effect on GDC Thin Films

Figure 6-9. Nyquist plot showing the example of a DC bias effect on a 267 nm thick 10 mol% GDC film at 120⁰C. Inset is zoomed in at the origin.

To study the effect of DC bias on the observed ionic conductivity and the complex

impedance behavior of 10 mol% gadolinia doped ceria films, impedance spectroscopy

was performed as described in the previous chapters under positive DC bias values

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ranging from 0 V to 3 V at 10⁰C intervals up to 150⁰C. At every temperature, initially the

bias values were measured at 0.5 V intervals. It was found that with increasing bias, the

impedance response for the sample begins to change. The change is not much at low

temperatures however, it becomes more and more pronounced with a rise in temperature.

Figure 6-10. Nyquist plots showing the effect of a DC bias on a 267 nm thick 10 mol% GDC film at different temperatures.

A 267 nm film is considered here, for which the DC bias values used translate to

fields of up to 112 kV/cm. Figure 6-9 shows the effects of increasing bias on the Nyquist

for the aforementioned sample. With an increase in bias, the impedance arcs in the

Nyquist plot progressively shrink and new features appear progressively. Figure 6-10

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shows a comparison of similar data at different temperatures. It can be seen that these

changes occur only above certain temperatures depending on the processing conditions

for the films. With increased temperature, the effects of bias can be seen at progressively

lower bias values.

6.3. Characteristic Steps in Nyquist Plots under Bias

Figure 6-11. A very detailed plot showing every step in the evolution of a 10 mol% gadolinia doped ceria thin film under bias at 130⁰C.

To better understand the different stages in which bias affects the sample, even

shorter bias intervals were used. Figure 6-11 shows a plot with detailed effects of bias,

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and all the involved steps. It is interesting to note that at lower bias values the response

moves towards higher impedance, and only after a certain point it starts moving towards

lower impedance values as the applied bias is increased. These can be treated as two

regimes in the impedance response change with bias.

Figure 6-12. Nyquist plot showing characteristic steps in the evolution of the impedance response of a 10GDC thin film under increasing bias. Individual plots are labelled A through H and later correlated with equivalent circuits.

Using this figure, and based on the data for different films at different temperatures,

five major steps can be identified in the change of behavior with bias. These steps are

characteristic of the response of GDC thin films to DC bias. These are summarized in

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Figure 6-12 for a 10 GDC thin film sample 267 nm thick at 250ºC. A few interesting

features can be observed here. The arc ascribed to grain or bulk contribution does not

change much with increasing bias. At some intermediate bias values, a third new arc

appears. This is similar to the effect of temperature, where new additional arcs appear

at higher and higher temperatures as newer relaxation mechanisms come under the

experimental range. A pig tail like feature is also observed. Most interestingly, at higher

bias values, the plot enters the third, and even fourth quadrant in some cases.

Figure 6-13. Frequency explicit plots showing the magnitude of impedance |Z| and the

phase angle as a function of different DC bias values for a 10 GDC, 267 nm thin film.

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Figure 6-13 shows the frequency explicit plots of the magnitude of impedance and

phase angles for the same sample at 130ºC for different bias values. It can be seen that

there is a very high change in the impedance at low frequencies (<104 Hz). In the low

frequency range, the impedance progressively decreases and then around 2.2 V bias, it

starts increasing again, and eventually stabilizes around 3 V. There is not much change

in the impedance at higher voltages. There is also a change in the impedance response

at higher frequencies, but it is relatively small. However, it is interesting to note that in

the high frequency range, there is no switch in the trend of impedance magnitude with

bias as can be seen in the inset. Impedance steadily decreases with increasing bias.

Similarly, there is a very large phase shift at higher frequencies as bias is increased,

where the phase shift decreases progressively with increasing bias and subsequently

becomes negative. Such change in impedance and phase shift can only be explained by

introduction and subsequent increase of an inductive response in the low frequency

range.

Looking at the frequency explicit plots for the real and imaginary parts of

impedance, there is a change in both the real and imaginary parts of impedance, as can

be seen in Figure 6-14. In the low frequency range the change in the imaginary part is

larger than that in the real part, indicating that although both resistive and reactive

components are changing substantially, the change in the reactive contribution is higher.

On the contrary, in the high frequency range, the behavior is reversed, with the resistive

change being more dominant than the reactive change, although the change itself is

relatively small (not shown here). In other words, in the low frequency range, most of the

change in impedance is due to changes in capacitance and/or inductance (since they

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make up the reactance), whereas in the high frequency range, most of the small change

in impedance is due to resistance variation. The data in Figure 6-14 is plotted on a linear

scale instead of a log scale because negative values are expected in both the real and

imaginary impedance cases, and the data below the axis would have been lost in the log

scale.

Figure 6-14. Frequency explicit plots showing the real and imaginary parts of impedance (Z’ and -Z” respectively) as a function of applied DC bias for a 10GDC 267 nm thin film.

It is also helpful to look at the permittivity formalism, as it sheds some more light

on the phenomena at play. Figure 6-15 shows the frequency explicit plots for the real

part of permittivity. The real part of permittivity, increases with the value of applied

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bias.in the high frequency range, however there is a flip in the trend around 50 kHz and

starts decreasing. This flip can be seen in the inset of Figure 6-15. There is no such

corresponding change in the imaginary part of permittivity. This flip in trend means that

at high frequencies the capacitive response of the sample is more dominant, whereas in

the low frequency range the inductive response is dominant. A similar behavior is seen

in the imaginary part of admittance as expected (not shown here).

Figure 6-15. Frequency explicit plot showing the real permittivity for different bias values for a 10GDC 267 nm film. Inset shows the same plot zoomed in to the frequency range of 104-106 Hz.

Here one must note that this inductive behavior becomes more and more dominant

as the bias applied is increased, which leads to the plots crossing into the negative at

lower and lower frequencies. This corroborates the observation about inductive behavior

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from impedance and loss vs. frequency plots shown in Figure 6-13. This information

gained from the spectroscopic plots was used to determine the equivalent circuits for

fitting.

6.4. Fitting and Analysis

By fitting each of the data sets shown in Figure 6-12 using different equivalent

circuits, an idea as to the various processes and changes taking place in the material

behavior can be obtained. The trends in the values of circuit elements and the new

elements appearing, provide crucial information. Each of these data sets was then fit to

equivalent circuits as per the protocol in Chapter 4. The protocol becomes particularly

important here, as at almost every step, the equivalent circuit changes and new elements

are added.

The behavior observed in Figure 6-11 has rarely been seen for oxide ceramics, let

alone studied. Traditional interpretation of similar data has included inductive elements

related to reversible storage of electric kinetic energy. One example is the poisoning of

Pt anode in polymer electrolyte fuel cells (PEFCs), where a pseudo-inductive behavior is

observed below 3 Hz.79 Another example is that of Faradaic coupled reactions dependent

on potential and surface coverage, where an inductive loop is observed under high

potential.92 Only the very recent work by Masó and West15 and the work by Taibl et al.16

bears a resemblance to the phenomena observed here. Hence, their template for fitting

was used as a starting point. Multiple possible equivalent circuits were proposed based

on prior knowledge from literature. The circuits were tested for fitting and the most

probable circuit was identified from amongst them. The equivalent circuit proposed in this

case contains parallel pairs of R and CPE in series with each other, for each of the arcs

in the complex impedance plots. These arcs represent the grain and grain boundary

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contribution. Additionally, as shown using the spectroscopic plots in the previous section,

there needs to be an inductance parallel to these circuit elements. Any parallel inductive

path needs to have a resistance associated with it, so a resistance was also included

parallel to the inductance. This resistance has also been proposed by Masó and West

for YSZ under bias.15 The equivalent circuit proposed is depicted in Figure 6-16.

Depending on the shape of the individual plots, elements were added or removed from

this circuit.

Figure 6-16. Proposed equivalent circuit based on the visual analysis of the data in different formalisms and similar data presented in literature.

As shown in Figure 6-12, at 0 V bias the complex impedance plot shows two arcs,

common for such thin films. This data can be fit with an equivalent circuit consisting of

two parallel R-CPE pairs in series as shown in Figure 6-17, and as is commonly done for

doped ceria. With increase in bias, the value of R2 first increases and then starts

decreasing (as can be seen in figure for 0.5 V, 1 V and 1.5 V bias). In addition, a

resistance R3 appears parallel to the previous elements. The equivalent circuit is shown

in Figure 6-17. At around 1.7 V bias, a third arcs appears, barely visible as a curve in the

second arc. This arc is further enhanced at 1.9 V. Both of these data sets can be fit using

the equivalent circuit shown in Figure 6-17. An additional element CPE3 is needed in

series here to properly fit the data. This element is possibly due to an electrode effect.

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With further increase in bias, the third arc gets depressed and twists on itself creating a

pigtail like shape. At this point, an inductor must be introduced into the circuit to be able

to fit the data as shown in Figure 6-17. With further increase in bias, the pig tail opens up

and the arc crosses into the third quadrant of the Nyquist plot and then also eventually

into the fourth quadrant. The equivalent circuit remains the same although the values of

the circuit elements do change.

Figure 6-17. Equivalent circuits used to fit impedance data shown in Figure 6-12 along with the respective bias values.

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Table 6-1. The values for equivalent circuit parameters obtained after fitting of the impedance data shown in figure.

Element/Bias 0 V 1 V 1.5 V 1.7 V 1.9 V 2 V 2.1 V 2.8 V

R1 (Ω) 35301 36294 32666 33435 36247 31659 30226 12230

CPE1-T 1.7x10-10 2.1x10-10 1.3x10-10 1x10-10 1.1x10-10 9.4x10-11 8.2x10-11 1.6x10-10

CPE1-P 0.82 0.80 0.83 0.85 0.85 0.86 0.87 0.87

R2 (Ω) 1.2x1014 1.3x1015 6x1014 403840 356740 275010 166380 28632

CPE2-T 6.8x10-9 2.6x10-9 1x10-8 3.1x10-8 1.8x10-8 3.3x10-8 4x10-8 1.1x10-9

CPE2-P 0.76 0.84 0.72 0.63 0.66 0.6 0.58 0.77

CPE3-T -- -- -- 7.9x10-9 2.1x10-9 7.2x10-10 1.8x10-10 1.4x10-7

CPE3-P -- -- -- 0.86 1.27 1.54 1.85 3.65

R3 (Ω) -- 2.5x1014 5.8x1013 2.1x1011 511730 833310 156810 23567

L (H) -- -- -- -- -- 523.4 245.2 8.42

With increasing bias, the values of R1, R2, R3, and L show an overall decrease.

The value of R1 does not show much changes until at very high biases, and even then

the change is very small compared to the changes in R2 and R3. R2 increases slightly

at low biases followed by an abrupt drop. Around the same bias value as R2, R3 also

shows a drastic drop in value. CPE1 (T and P) does not change much. CPE2-T similar

to R2 increases at low bias and then decreases at higher values. CPE3-T decreases with

increasing bias, and then as the plots enter the fourth quadrant, it increases. Traditionally

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the three arcs as seen for 1.7 V bias, are usually ascribed to grain, grain boundary and

electrode effects in doped ceria systems.66,104 With increase in bias, there is a general

decrease in the values of circuit elements as would be expected. With increasing bias,

the electrode arc collapses first, followed by the grain boundary arc, whereas the arc

representing bulk conductivity remains the same although at higher bias values, its

corresponding resistance value is considerably lower.

The time required for the behavior to stabilize is about 30-45 seconds depending

on the temperature. A higher time of about 1-1.5 minutes is required for the behavior to

get back to normal after removal of the bias. The values of the different circuit elements

obtained using fitting for the various characteristic plots shown in Figure 6-12 are shown

in Table 6-1.

Figure 6-18. Plot showing the values of R1 (grain resistance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC.

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Figure 6-19. Plot showing the values of R2 (grain boundary resistance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC.

Figure 6-20. Plot showing the values of R3 (representing electronic conduction) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC.

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Figure 6-21. Plot showing the values of L (inductance) for different applied bias, obtained using equivalent circuit fitting of impedance data for a 10GDC 267 nm film at 130ºC.

6.5. Mechanism

Based on the prior work in literature, visual analysis of data, the values of circuit

elements obtained from fitting with equivalent circuits, and trends therein, a mechanism

is proposed. The various phenomena observed are divided into three regimes, based on

the three equivalent circuits and the bias values used.

6.5.1. Low Bias

At zero bias, the impedance behavior of the films is as expected. The two arcs,

small and large, can be attributed to the grain and the grain boundary relaxation

respectively. The electrode contribution is not visible in this case as it is beyond the

measurable frequency range, as is common with thin films.

As a small bias is applied, the grain boundary resistance increases, with the grain

resistance being almost constant as shown in Figure 6-18. The small bias leads to the

accumulation of positively charged oxygen vacancies at the grain boundaries and the

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electrode. This exacerbates the already blocking nature of the grain boundaries further

and leads to a rise in resistance of the grain boundaries as recorded in Table 6-1. The

accumulation of vacancies at the cathode due to the bias leads to reducing conditions,

which as per the schematic Brouwer defect diagram in Figure 6-22 should lead to a higher

concentration of electrons.

Figure 6-22. Schematic Brouwer diagram for acceptor doped ceria adapted from Eufinger et al.105

The small bias causes electrons to move into the sample from the cathode

interface. Grain boundaries being good conductors of electrons, these electrons travel

through grain boundaries parallel to the direction of applied field, to the opposite

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electrode, thus establishing a parallel pathway for electronic conduction. A schematic of

the sample under small bias is presented in Figure 6-23.

Figure 6-23. Schematic of a gadolinia doped ceria sample under low bias.

Figure 6-24. Leakage current as a function of time and different applied DC voltages for a 10GDC 267 nm thin film measured at 120ºC.

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The introduction of a parallel pathway with resistance R3 (although its value is very

large) leads to a drop in the overall resistance and a rise in the leakage current as is

shown in Figure 6-24. A finite time is required to reach a steady state distribution of

vacancies after applying bias. The same can be seen in the leakage current plot, where

the current stabilizes around 30-50 seconds, which corresponds well with the time

required for the impedance response to stabilize (30-45 seconds).

6.5.2. Medium Bias

Platinum forms a Schottky barrier with rare earth doped ceria. As the applied bias

is increased further, and platinum being a blocking electrode for oxygen vacancies, more

and more vacancies segregate at the cathode. At the same time, more and more

electrons accumulate at the interface from the side of the electrode. With increasing field,

an increasing number of electrons can now jump across the barrier. With increasing bias,

the current along grain boundaries increases and correspondingly, the value of the

resistance R3 decreases. With the electrons moving across the electrodes in the voltage

range, the electrode interface becomes visible in the impedance response within the

measured frequency range. This is represented by the new CPE addition in the

equivalent circuit, which decreases with increasing bias in the medium range. Thus, there

are three arcs instead of two from the previous regime. As the bias is further increased,

the arcs tend to become smaller. This indicates that the grain boundaries and electrode

interface become more and more conductive. They also tend to become more circular

and bend towards the real axis, indicating a change from capacitive towards resistive

behavior, caused due to conduction of electrons. A schematic is shown in Figure 6-25.

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Figure 6-25. Schematic showing phenomena during impedance testing under medium bias in gadolinia doped ceria. Arrows indicate the motion of electrons.

Figure 6-26. Schematic band diagrams showing the cathode and anode interface under bias.

The process happening at the electrodes can be better understood from the

schematic band diagrams of the electrode interfaces under bias shown in Figure 6-26.

With increasing bias, the barrier height at the cathode is reduced and it is easier for

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electrons to flow from the Pt into the GDC, whereas at the anode, these electrons easily

flow back into the Pt electrode and the external circuit.

6.5.3. High Bias

At further higher bias values, above 2 V, more and more electrons flow across the

electrodes and through the parallel grain boundaries, leading to the collapse of first the

electrode arc followed by the grain boundary arc. The material starts exhibiting inductive

behavior. This results in the arc twisting up on itself although it stays in the first quadrant.

With increasing bias, the electrode and subsequently grain boundary arc move into the

fourth quadrant. The inductive loops can be explained by following the line of reasoning

used by Taibl et al.16 summarized at the start of this chapter. The model proposed

requires the assumption that the electronic current is much higher than the ionic current,

which mostly holds true in this case. With increasing bias, despite the low contribution of

ions to conduction, due to ion flux the vacancy segregation becomes even more

concentrated at the cathode after a steady state is achieved. The AC voltage stimulus

causes these vacancies to redistribute. However, their response depends on their

mobility. At high frequencies, there is almost no change in the distribution, as the

vacancies cannot oscillate with the AC voltage. At lower frequencies however, there is

enough time for the redistribution of oxygen vacancies within a half cycle of the sinusoidal

voltage signal. Thus every half cycle, as long as the ions can respond, a new vacancy

distribution is formed. This migration of ions is in series to the electronic current and

causes a negative phase shift, thus showing up as an inductive loop.16 With increasing

bias, there is even more vacancy accumulation, which accentuates the inductive loops.

A schematic is shown in Figure 6-27.

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Throughout the different bias regimes, the arc representing grain contribution does

not change much, except at very high bias values where it starts shrinking. It is only

under very high biases, that the grain interior is also reduced, such that electronic

conduction takes place.

Figure 6-27. Schematic showing phenomena during impedance testing under high bias in gadolinia doped ceria.

Additionally, to verify the reasoning for the inductive loops, DC I-V measurements

were performed at various sweep speeds. This measurement was based on the work by

Taibl et al. to explain the change in vacancy distribution on the length scale of the

sample.16 The sweep speeds were varied as described in Chapter 3 to match the

frequencies of the points where the complex impedance plot crosses the real axis. It was

found that when the sweep speed matches the frequency of the point at which the

complex impedance intersects the real axis, the resistance obtained from the slope of the

I-V plot matches the value obtained for electronic resistance (R3) obtained from

equivalent circuit fitting of the data. The corresponding data are shown in Figure 6-28.

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Figure 6-28. DC I-V measurement and complex impedance with matching resistances for a 10GDC 267 nm film at 130ºC under 2.1 V bias and oscillation voltage of 300 mV.

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CHAPTER 7 DOPANT SEGREGATION AND SINTERING UNDER REDUCING ATMOSPHERE 7.

7.1. Segregation and Defect Associates

It has been shown that the composition and microstructure of a ceramic material

have a strong effect on its ionic conductivity.11,12,32,70,106–108 For example, the resistance

to ionic conduction is much higher for grain boundaries than for the grains or the bulk of

the material.55,66,109 Various mechanisms have been proposed to explain this high

resistance to ionic conduction across the grain boundaries. It has been shown that the

high resistance of grain boundaries is due to the segregation of dopants and impurities at

grain boundaries and triple point junctions.14 Siliceous impurities present in the starting

powder and introduced during processing lead to the formation of a glassy phase at grain

boundaries and triple points.14,55 Similarly, any other rare earth impurities and

intentionally added dopants tend to segregate at grain boundaries during sintering as has

been shown by multiple sources.14,76,77 Atom probe tomography has shown that in Nd

doped ceria, the Nd ions and oxygen vacancies segregate at the grain boundaries with

the compositional difference extending up to 4-6 nm from the structural center of the

boundaries as was summarized earlier and shown in Figure 2-10.77 Conventional

sintering procedures in general lead to a very high concentration of dopants at grain

boundaries. As per equation (2-4), increasing the dopant concentration should lead to a

higher concentration of vacancies, and higher ionic conductivity. However, at higher

dopant concentrations, the positively charged vacancies form defect associates with the

negatively charged dopant ions. The details of this phenomenon are summarized in

Chapter 2. The defect complexes effectively lock in the oxygen vacancies, reducing the

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ionic conductivity as dopant concentration increases. These defect associates lower the

overall ionic conductivity, with the grain boundary resistance being the biggest detriment.

7.2. Fast firing and Microwave Sintering

The key to getting good intermediate-temperature performance is to reduce the

resistance of grain boundaries. Various solutions have been proposed with varying

degrees of success to address this issue. The earliest and the simplest was to modify

the processing so as to reduce the amount of grain boundaries.107,108,110,111 Smaller

starting powder size, and fast firing techniques can be used to obtain smaller grain

sizes.112–114 An interesting side effect of fast firing is that it also offers the opportunity to

mitigate dopant segregation. This route takes advantage of the kinetics of diffusion and

completes the sintering process before segregation of dopants takes place. However,

except in very small samples, chances of thermal shock and cracking due to uneven

heating are very high.

It has been shown that microwave assisted sintering can be used to improve

conductivity by sintering for a short amount of time (as low as one hour) compared to

conventional sintering.14,115,116 The short sintering time prevents segregation of dopants

and impurities at grain boundaries and gives a more uniform distribution over the entire

sample. The even heating throughout the sample gets rid of thermal shock and cracking

issues. Work performed by the author in collaboration with Bruce Peacock from

Medtronic Corporation showed that microwave sintering gives a more uniform dopant

distribution compared to the conventional route. Focused ion beam (FIB) was used to

extract samples of subsurface triple grain junctions (Figure 7-1) out of a bulk pellet

specimen which were then analyzed. Figure 7-2 shows the energy dispersive

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spectroscopy (EDS) line scans across a triple grain junction in Sm0.05Nd0.05Ce0.9O2-δ after

conventional sintering. There is a definite rise in the concentration of Sm at the junction,

Nd concentration distribution curiously does not change much. Contrasting that with

microwave sintered samples (Figure 7-3), it was difficult to isolate triple grain junctions

because of the small grain sizes, however, there was no discernible segregation of either

Sm or Nd at any point in the analyzed area. The more uniform dopant distribution explains

the higher observed conductivity.

Figure 7-1. A sub-surface triple grain junction in Sm/Nd doped ceria obtained using focused ion beam. EDS line scans were conducted across this junction (Performed by Bruce Peacock at Medtronic Inc.).

Despite the higher conductivity, both microwave and fast sintering require very

specific conditions, and often due to poor processing practices lead to a drop in the

density of the sintered ceramic as there is not enough diffusion for grain growth and

densification to occur. Another technique that has been experimented with is spark

plasma sintering (SPS) which is fast, gives low grain growth, and more uniform dopant

distribution.

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Figure 7-2. EDS line scans across a sub-surface triple grain junction in a Sm/Nd doped ceria sample sintered conventionally. Sm segregation is observed (Performed by Bruce Peacock at Medtronic Inc.).

Figure 7-3. EDS line scans across the surface of a Sm/Nd doped ceria sample sintered in a microwave. Both Sm and Nd are relatively uniformly distributed (Performed by Bruce Peacock at Medtronic Inc.).

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7.3. Sintering under Reducing Atmosphere

The above-mentioned approaches have some drawbacks, and all of them try to

solve the problem by taking advantage of the kinetics of dopant diffusion. Another

possible way of approaching the problem is by modifying the energetics of the system

along with the kinetics. The reason dopants segregate at the grain boundaries is to

reduce the overall free energy of the system. The extent to which a dopant will form a

uniform solid solution with ceria is dependent on several factors summarized as the

Hume-Rothery rules. The primary factors that affect the solid solution are, atomic or ionic

size, electronegativity difference, similarity of crystal structure and valency 117. All other

factors being similar, it is the crystal structure mismatch, cation mismatch, and the defect

charge difference between Gd+3 and Ce+4 that leads to the preferential segregation of Gd

(or other similar dopants) at the grain boundaries, with the driving force being the

reduction of grain boundary surface energy.118

To overcome this hurdle, the effect of sintering under reducing atmosphere on the

dopant segregation and ionic conductivity of doped ceria electrolytes was studied. The

hypothesis is that by sintering GDC pellets in a reducing atmosphere of 4% H2-N2, the

Ce+4 ions are expected to get reduced to Ce+3. CedG charged substitution defects are

thus not expected to form. All these factors combined are expected to lead to a more

uniform microstructure without much dopant and vacancy segregation at the grain

boundaries, thus improving the conductivity. A schematic is shown in Figure 7-4.

Esposito et al. in their work on gadolinia doped ceria have shown that sintering in reducing

atmospheres, produces highly defective GDC, and reduces the Gd/Ce cation mismatch

leading to a faster rate of mass diffusion.63 The grain growth and densification in

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conventional gadolinia doped ceria is otherwise inhibited due to a space charge effect

and is explained by the solute drag model.119 Esposito et al. use this phenomenon to

enable densification at lower sintering temperatures and also get a an increase in total

electrical conductivity.9

Figure 7-4. Schematic of dopant and vacancy distribution at grain boundaries for a sample sintered in air (left) and for one sintered in H2 and re-oxidized (right).

To prove the hypothesis of uniform dopant distribution and higher conductivity in

gadolinia doped ceria after sintering in a reducing atmosphere, control samples of 10GDC

were fabricated using the co-precipitation route as described in Chapter 3. The densities

obtained were in the range of ~97%. The other samples were sintered under a reducing

atmosphere of 4% H2-N2 as described in Chapter 2. Figure 7-5 shows the appearance of

the two kinds of samples. Control samples had a cream color, whereas, the reduced

samples showed shades of gray-black depending on the sintering conditions. The

reduced pellets were then oxidized at a lower temperature (900ºC) for 24 hours. Upon

re-oxidation, the color of the samples becomes similar to that of the control samples.

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Figure 7-5. Appearance of a 10GDC control pellet sintered at 1600⁰C for 10 hours (left) and one sintered under 4%H2-N2 at 1100⁰C for 20 hours (right).

7.4. Electron Probe Micro-Analysis

To determine the effect of processing on the segregation of dopants, electron

probe micro-analysis (EPMA) was used. EPMA uses a combination of wavelength and

energy dispersive spectroscopy (WDS and EDS), and makes possible minor and trace

analysis with high spatial resolution (sub-micron scale). For quantification of the

elemental distribution, the spectra standard materials were analyzed first. The standards

used were Gd metal (SPI supplies) for Gd, CeF3 (SPI supplies) for Ce and andradite

(Ca3Fe2Si3O12, P&H Developments Ltd. Geo Block MkII) for O, with the elemental

concentration in each of the standards already known. To identify and quantify the

elements, different peaks in the WDS spectra were used. The Lα peak was used for Ce,

since it was the highest intensity peak in the energy range analyzed. It was measured

using an LPET detector. For Gd, the Lβ peak was measured using an LLIF detector. This

is because, as shown in Figure 7-6, the Lα peak for Gd coincides with the Lγ peak for Ce,

thus making Gd detection very difficult. Similarly, a Kα peak is used to identify O using

an LLIF detector. The Gd Lβ peak has a lower intensity compared to other peaks. Hence,

for more accurate determination, longer collection times were used (10 ms).

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Figure 7-6. WDS spectra from the LPET (top) and LLIF (bottom) detectors used to characterize Ce and Gd distribution using EPMA, shown here for a GDC conventional sample after sintering.

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Figure 7-7. BSE image for 10GDC control sample.

Figure 7-7 - Figure 7-10 show area scans for the GDC control sample and Figure

7-12 - Figure 7-15 show the same for a sample sintered under a reducing atmosphere

and subsequently re-oxidized. Figure 7-11 and Figure 7-16 show representative line

scans across a grain boundary for the same respective samples. To obtain as

representative results as possible, multiple different area scans (total over 5000 μm2 per

sample) were performed on each sample. The initial data for each element is obtained

only in terms of intensity. This data was then converted to at% from intensity by applying

the information from the standards mentioned above. The line scans were obtained later

from the area scan data during post-processing using SX Results software accompanying

the equipment.

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Figure 7-8. EPMA area scan for Gd Lβ peak, for 10 GDC control sample. Gd segregation is observed at grain boundaries and triple grain junctions.

Figure 7-7 shows a backscattered image for a control 10 GDC sample. The

corresponding EPMA area scan for the same area shows segregation of Gd at the grain

boundaries and triple point junctions. As can be seen from the representative line scan

data in Figure 7-11, the concentration rises from ~4 at% in the grain to ~10 at% at the

grain boundary. Similar to the atom probe study by Diercks et al.77, there is also a rise in

the concentration of Ce , from ~32 at% in the bulk to ~49 at% at the grain boundary as

can be seen from Figure 7-9 and Figure 7-11. Oxygen concentration on the other hand,

shows a drop in the vicinity of the grain boundary, from ~62 at% in the bulk to ~48 at% at

the boundary. This indicates a segregation of oxygen vacancies at the grain boundaries

and triple point junctions. These results are more or less consistent with what has been

reported in literature so far.76,77

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Figure 7-9. EPMA area scan for Ce Lα peak, for 10 GDC control sample. Ce segregation is observed at grain boundaries and triple grain junctions.

Figure 7-10. EPMA area scan for O Kα peak, for 10 GDC control sample. Oxygen depletion is observed at grain boundaries and triple grain junctions.

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Figure 7-11. Line scans of O, Gd and Ce concentration across a representative grain boundary in the 10GDC control sample.

In comparison, for a sample sintered under hydrogen, and re-oxidized, the area

scans do not show any evidence of segregation at grain boundaries and triple points.

Figure 7-12 shows the backscattered image for a sample sintered at 1100⁰C and oxidized

at 900⁰C. The corresponding area scans for Gd, Ce, and O are shown in Figure 7-13 -

Figure 7-15 respectively. The line scans in Figure 7-16 also show no segregation at the

grain boundary, as expected. Hence, the segregation of dopants at grain boundaries and

triple point junctions is avoided by sintering under a reducing atmosphere at a

comparatively low temperature and subsequent re-oxidation.

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Figure 7-12. BSE image for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours.

Figure 7-13. EPMA area scan for Gd Lβ peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. A relatively uniform distribution of Gd is observed.

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Figure 7-14. EPMA area scan for Ce Lα peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. A relatively uniform distribution of Ce is observed.

Figure 7-15. EPMA area scan for O Kα peak, for 10 GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. A relatively uniform distribution of oxygen is observed.

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Figure 7-16. Line scans of O, Gd and Ce concentration across a representative grain boundary in the 10GDC sample sintered under 4%H2-N2 at 1100⁰C for 20 hours followed by re-oxidation at 900⁰C for 24 hours. A relatively uniform distribution is observed.

It is interesting to note that, for the control sample, the rise in Gd and Ce at the

grain boundary and the corresponding drop in O most often do not happen at the same

distance. Most line scans showed that the peaks and valleys in concentration at the grain

boundaries were in fact a little off from each other as can be seen in Figure 7-11.

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7.5. Conductivity Measurements

To study whether the changed processing technique has any effect on the ionic

conductivity of GDC, impedance spectroscopy measurements were performed as

described in Chapter 3. The measurements were performed at 50⁰C intervals from 200⁰C

to 650⁰C, both while heating and cooling. There was very little difference observed in the

Nyquist plots for heating and cooling, indicating that there was no oxidation of the samples

during the measurement. Figure 7-17 shows the Nyquist plot at 300⁰C for the two types

of samples normalized for their dimensions. As can be seen from the figure, the grain

boundary resistance for the conventionally sintered sample is much higher than the grain

boundary resistance for the sample sintered under reducing conditions. This is exactly

as expected, since the EPMA results show that only the first sample has segregation at

grain boundaries, and hence the higher resistance. Also, as can be seen from the inset

in Figure 7-17, the grain resistance also follows a similar trend, although the difference

between the two samples is not as much as the difference for the grain boundary

resistance. The lower grain boundary resistance for the sample sintered under hydrogen

can be explained by the fact that it now has a slightly higher dopant concentration and

more even distribution compared to the control sample. Admittedly, such a change in

grain and grain boundary resistance can also be brought about by a difference in grain

sizes. However, as can be seen from Figure 7-7 and Figure 7-12, there is not much

difference between the grain sizes of the two samples with their values being 2.64±0.15

μm and 2.46±0.36 μm respectively for the conventionally processed and reduced and re-

oxidized samples. The grain and total ionic conductivity for both the samples were

calculated from the resistances and dimensions as explained in Chapter 2. The thickness

of grain boundaries was neglected while calculating the grain conductivity.

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Figure 7-17. Normalized Nyquist plot showing the comparison between the 10GDC control and H2 sintered samples measure at 300⁰C in air.

Figure 7-18 shows a plot of the grain conductivity for both groups of samples.

There is not much difference between the grain conductivity for the two groups. On the

other hand, there is a marked difference in the total conductivity of the two groups, with

the reduced and re-oxidized samples being more conducting by almost an order of

magnitude as shown in Figure 7-19. For example, at 350ºC, the total conductivity for the

conventionally sintered sample is 3.95x10-5 S/cm, whereas that for the reducing

atmosphere sintered sample is 1.09x10-4 S/cm with a difference of 6.99x10-5 S/cm. On

the other hand, the respective grain conductivities are 1.07x10-4 S/cm and 3.32x10-4 S/cm

with a difference of 2.25x10-4 S/cm. The large difference in total conductivity but a much

smaller difference in grain conductivity indicates that most of the change in conductivity

is due to the modification of the grain boundaries. The reducing atmosphere sintering

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and re-oxidation routine lowers the barrier at the grain boundary for oxygen ion transport.

The slight if any increase in grain conductivity on the other hand can be explained by the

fact that, since there is less segregation at the boundaries, more dopant ions and by

extension more vacancies are uniformly distributed throughout the bulk.

Figure 7-18. Arrhenius type plot of grain conductivity with respect to temperature for the 10GDC control and H2 sintered samples.

Both the grain and total ionic conductivity for the conventionally sintered samples

shows a change in slope, and subsequently activation energy, around 400⁰C. This

temperature is around the same temperature where the Meyer-Neldel rule is applicable,

and the defect associates break apart.14 Similar behavior has been observed by Esposito

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et al.63 Interestingly, the 4% H2-N2 samples do not show this change in slope. A possible

reason for such an activation energy change could be the presence of a larger number of

defects associates which become free above a certain temperature. The defect

associates cannot be said to be just at the grain boundaries, but must be assumed to be

distributed throughout the conventional samples, because both the grain and total

conductivity show about the same change in activation energy (~ 0.3 eV). The reduced

and re-oxidized samples probably do not have such associates and hence do not exhibit

a slope change.

Figure 7-19. Arrhenius type plot of total conductivity with respect to temperature for the 10GDC control and H2 sintered samples.

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As the temperature is increased, the difference between the grain and total

conductivity for the reduced and re-oxidized samples becomes smaller and smaller, as is

expected due the grain boundaries becoming more and more conductive. This trend is

however not as strong in the conventionally sintered samples. This difference in behavior

needs to be further explored to better understand the phenomena at play. For the

purposes of this work however, there is a clear correlation between the segregation at

grain boundaries and the conductivity.

Since the process utilizes a reducing atmosphere, the contribution of electronic

conduction cannot be completely ruled out. However, any electronic contribution has to

be mostly through the grain boundaries parallel to the field as was discussed in the

previous chapter. This should lead to the appearance of a new resistance parallel to the

original equivalent circuit. This however does not happen, and for both the conditions,

the impedance data can be satisfactorily fit using the same equivalent circuit as shown in

Figure 7-17 indicating that the samples have been oxidized to a large extent after re-

oxidation. The same can be ascertained by the change of color from black/grey to cream

color. Hence any electronic contribution to conductivity is expected to be minimal. For a

more accurate conclusion, future work envisages transport number measurements to

determine the electronic contribution to conductivity.

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CHAPTER 9 SUMMARY AND FUTURE WORK

8. 8.1. Summary

8.1.1. Protocol for Impedance Data Analysis

There is a need for a protocol for more standardized testing and analysis of

impedance data, to get accurate and reproducible results. Such a protocol was compiled

together based on best practices in literature. The identification of a correct equivalent

circuit based on a plausible physical model is of utmost importance and various methods

of ensuring the same were suggested. An understanding of the various relaxation

mechanisms possible in a material is essential for identifying the correct model. This

requires a better understanding of the response of various parameters, especially

constant phase elements (CPEs). The mathematical nature of CPEs was presented in

detail, and their relationship to other parameters like resistance, capacitance, inductance

and Warburg elements were investigated. Various ways of identifying initial estimates of

parameters for fitting were presented based on literature. Incorrect starting values for

fitting can give wrong results. Different statistical ways for assessing the quality of fit were

identified. Residual analysis can be used as a good measure of how good a fit is, and

any trends in the residuals can show whether the equivalent circuit is appropriate.

Following these practices should give better results from data fitting.

8.1.2. Impedance and Effect of DC Bias

Impedance data for both bulk and thin film GDC samples were analyzed using the

protocol described in Chapter 4. The films prepared using magnetron sputtering were

tested for impedance under a DC bias. This is the first study of this kind on gadolinia

doped ceria. The bias values used in this study are higher than any similar study

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performed before for other materials. Under the application of a DC bias, new unique

features appear in the impedance Nyquist plots for the films. Bias values ranging from 0

V to 5 V were tried. The complex impedance plots were fit to equivalent circuits. The

change in behavior under bias was ascribed to the introduction of electronic conduction

in the system in addition to the already present ionic conduction. The application of a

bias causes the opening up of a parallel path for conduction of electrons, which becomes

more pronounced at higher fields. Both bias and temperature affect this electronic

conduction, with the effect of bias becoming more pronounced at higher temperatures.

Overall, three regimes were observed in the effect of bias on GDC thin films. A low bias

regime, where the grain boundary resistance increases due to segregation of vacancies

at the boundaries. In this regime, although there is an electronic pathway, its resistance

is very high. At higher bias values, in the second regime, due to the high bias, electrons

are injected from the cathode and are conducted through the grain boundaries parallel to

the field direction. With increasing bias, the conduction across grain boundaries also

increases. In both the first and the second regime, the grain contribution to the response

remains almost unchanged. At further higher bias in the third regime, inductive loops

start to appear in the impedance data at low frequencies, which introduces an inductance

in the equivalent circuit. This inductance is attributed to the possible redistribution of

segregated vacancies near the cathode at low frequencies.

The effect of bias was found to be reversible and independent of the polarity of the

applied bias. However, there was a time lag (on the order of tens of seconds, depending

on the temperature) for the material to return back to normal behavior on removal of bias.

DC I-V measurements were also used to better understand the observed behavior. The

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sweep rate of the of the I-V measurement was matched to the frequency of the impedance

plot intercept with the real axis. The resistance obtained from the I-V measurement was

found to match with the parallel resistance from the equivalent circuit analysis.

8.1.3. Sintering under Reducing Atmosphere

It was shown that sintering under reducing atmospheres can be used to prevent

dopant segregation. This was shown using gadolinia doped ceria as an example. The

elemental distribution was characterized using electron probe microanalysis. In 10GDC

samples sintered in air, area scans showed an increase in concentration of the dopant

gadolinium, in addition to the increase in cerium and depletion of oxygen. The depletion

of oxygen suggests a high concentration of oxygen vacancies. Such an elemental

distribution reinforces the theory of defect associate formation as has been suggested

before. Samples sintered under a reducing atmosphere in comparison, showed a

relatively uniform elemental distribution. There was no segregation of either gadolinium

ions or oxygen vacancies. With a more uniform dopant distribution and no vacancies

bound at grain boundaries in the samples sintered in a reducing atmosphere

(subsequently re-oxidized), they show both, a smaller grain boundary and grain

resistance. Hence, the hypothesis, that by reducing the cation mismatch between the

host and dopant ions, a dopant segregation can be prevented, was proven true with the

help of the new technique of sintering under reducing atmospheres. However, a lot of

questions are still unanswered. They are summarized in the next section.

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8.2 Future Work

8.2.1. Effect of DC Bias

This work was the first time the effect of bias was observed on gadolinia doped

ceria. However, the work performed only looked at thin films. Similar testing needs to be

performed with bulk GDC. Thin films have generally been shown to behave every

differently compared to bulk materials. This will help separate thin film effects from bias

effects. The testing of bulk samples however will be challenging given that it will be very

difficult to get comparable DC field levels in the bulk samples. The oscillating voltage for

impedance and its relation to the DC bias magnitude is also expected to play an important

role in the effect observed. To the knowledge of the author, no impedance measurement

system exists yet which can reproduce such conditions.

Even among thin films, further work can be envisaged. Transference number

measurements need to be performed to calculate more accurately the electronic

contribution under bias. The role of grain boundaries in this mechanism is not yet

completely understood. Their effect can be separated by testing of epitaxial thin films in

the across plane configuration. Such films should have no grain boundaries in the

conduction path between the top and bottom electrodes. Additionally, in-situ

characterization of the oxygen vacancy distribution under bias needs to be performed

which will help bolster the vacancy segregation theory. Leakage current measurements

at different temperatures and bias values can be used to measure the barrier height of

the Pt-GDC interface as further reinforcement of the theories proposed.

8.2.2. Sintering under Reducing Atmosphere

For the work on sintering under a reducing atmosphere, further work needs to be

performed to ascertain a number of issues relating to the composition and electrical

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properties of the samples. It is still not clear as to what percentage of the ceria, gets

reduced, and what amount of the reduced oxides remain after re-oxidation. Although, the

impedance plots showed little change between heating and cooling, and the equivalent

circuit shows no new circuit elements suggesting significant electronic contribution to

conduction in re-oxidized samples, accurate assessment of electronic contribution needs

to be performed, as it is crucial and detrimental for the use of doped ceria in fuel cells.

Transference number measurements using ionic blocking electrodes need to be

performed to measure the electronic contribution. Although a lot of work has been done

on understanding the effect of grain boundaries on ionic conduction, the mechanism

behind the blocking nature of the boundaries is still under contention. Although this was

not explicitly addressed in this work, it is clear that in order to tailor electrical properties

of electroceramics, a fundamental knowledge of grain boundary behavior is essential.

Once the fundamentals are established, the technique sintering in a reducing atmosphere

can be better tailored by investigating different temperature and atmosphere

combinations.

The reducing atmosphere sintering technique can be applied to other ceramic

materials where dopant segregation leads to degradation of their electrical and

mechanical properties. The process however will be applicable only to those systems

which show variable valency states like Ce4+ and Ce3+ in cerium oxide based systems.

Various other factors like the ionic radii and crystal structure will also play an important

role, which needs to be investigated in detail. Additionally, the time behavior of the

reduced and re-oxidized sample needs to be investigated, to find out the endurance of

the samples against re-segregation after prolonged use.

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The technique can also be used to produce high density sintered oxide ceramics

at lower sintering temperatures by exploiting the higher mass diffusion rates under

reducing atmospheres as has been shown by Esposito et al.59 Application of this

technique to other material systems needs to be investigated.

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APPENDIX A IMPEDANCE DATA FITTING WITH ZVIEW

A. Following are the steps followed for fitting using ZView® software (Scribner

Associates Inc.) based on the best practices summarized in Chapter 6.

1. Import data for the entire temperature range into ZView®. ZPlot® software

(Scribner Associates Inc.) provides the data in a format which can be read using

ZView®. For other formats (obtained for example using the Agilent 4924 Precision

Impedance Analyzer), the data has to be arranged into the required column format

for ZView® first.

2. To ensure proper weighting of data over the entire frequency range, use log-log

plots, unless otherwise needed. A linear frequency range plot can hide important

features in the data. Zoom in to the data if needed to better see certain features.

3. Use the “auto color” option and view all the data at once in the Z* formalism for all

temperatures. This will show trends in the data with respect to temperature and

help in identifying possible equivalent circuits.

4. For most oxide ionic conducting materials, three arcs will be completely or partially

visible depending on the frequency range. They can be assigned from higher to

lower frequency to the grain, grain boundary and electrode interface contribution

respectively depending on the associated capacitance values. Bulk arcs usually

have capacitance in the 10-11-10-12 F range, grain boundary in the 10-8-10-10 F

range and, electrode interface around 10-6-10-7 F. The arcs can also be identified

on the basis of the frequency ranges they lie in, where the bulk is in the MHz range,

grain boundary in the kHz and electrode interface in the Hz range, although these

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may vary widely depending on the material, its processing and measurement

conditions.

5. Observe data in both Z and M formalisms, to clearly identify the number of arcs.

Each relaxation mechanism will give a separate peak in both these formalisms.

6. Each arc can be usually fit with a parallel combination of R and CPE, as defined in

Chapter 5. Based on the number of arcs, create a tentative equivalent circuit.

7. Calculate approximate starting values for all the components. R can be calculated

either by visual observation where the diameter of the semicircle is the resistance,

or by using the ‘fit circle’ option in Zview for each arc separately. Select sections

of the plot by moving the slider at the top of the Zview window. The fit circle option

also gives a C value. However, to get a better estimate of the values for CPE-P

and CPE-T, plot Y” against log ω. The slope is CPE-P and the intercept with the

Y-axis can be used to calculate CPE-T as shown in Chapter 6.

8. A CPE can be used even in place of a pure capacitor (C), as it can also model a

capacitor, where CPE-P is 1. In case the electrode interface part of the data is a

straight line instead of a curve, it can be modelled using just a CPE instead of an

R-CPE parallel combination.

9. With the starting values in hand, perform a ‘simulation’ for the values and the

equivalent circuit. This will give a clear idea if the circuit behavior and initial values

are far off from the data. Adjust the starting values accordingly if needed.

10. After obtaining a satisfactory simulation result, perform fitting using the ‘fitting’

option. Individual arcs can be fit one by one if needed, by fixing the remaining

parameters, and keeping only the R and CPE values for that part of the data free.

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11. On fitting, the calculated plot should better match the measured data, compared

to the simulation.

12. Check the data and the fit in all four formalisms, namely Z*, Y*, M* and ε*. Visually

inspect the data and make sure that it fits equally well in all the formalisms. Any

marked deviation in any of the formalisms indicates an incorrect equivalent circuit,

given that the fit is good for other formalisms. Change the circuit accordingly,

based on knowledge of the material, and repeat the process.

13. In case the arc does not begin at the origin, select appropriate extra circuit

element/s (L, C, or R) to model this deviation in series with all the other elements

in the beginning of the circuit. A shift along the x axis indicates a series resistance.

The starting point in the first quadrant indicates an extra capacitance, whereas a

starting point in the fourth quadrant indicates an inductance.

14. Start fitting data from the lowest temperature to the highest in the measured range.

Usually, the parameter values change consistently in a progression with changing

temperature. Thus, the fit at a certain temperature can be directly used to obtain

a fit for the next higher temperature and so on. This strategy greatly speeds up

the process and works satisfactorily unless new mechanisms and parameters are

being introduced.

15. It needs to be noted that after fitting, the values obtained for the different

parameters should make physical sense.

16. The % error values for each of the parameters should be below 5%, in addition to

the visual confirmation of the fit.

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17. The sum of squares and chi-squared values should be as low as possible. The

smaller these values, the better the fit. A good fit should have chi-squared lower

than 0.01 and sum of squares around or lower than 1.

18. To verify if there is any systematic error in the fit due to an incorrect circuit, the

residual values for the fit can be plotted against frequency, using the ‘residual’

option in Zview. For a good fit, the residual values should be low and there should

be no visible trend with respect to frequency.

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APPENDIX B DIELECTRIC POLARIZATION FUNCTIONS

B. The original theory on dielectric polarization and the related equations were

proposed by Debye.120 The related equation for the complex permittivity is given as

follows.

i1

(B-1)

Here s , with s and being the static and infinite frequency dielectric

constants, and is the relaxation time for a given temperature. On a complex plane plot,

the Debye relaxation shows up as a perfect semicircle with the two intercepts being the

static and infinite frequency dielectric constants. The highest point in the plot indicates

the dielectric relaxation frequency corresponding to the relaxation time. A schematic is

shown in Figure B-1.

However, most materials do not have a single relaxation time constant. In fact,

they exhibit a distribution of time constants. Following are a few of the important

modifications to the Debye formalism to account for distributed time constants. The Cole

-Cole88 model shown in equation (B-2), introduces an exponent , which accounts for

depression of the semicircle in the complex plane. When 0 , the relaxation is

stretched on the frequency scale, as the time constants become more distributed. This

modification accounts for arcs that are depressed, but are still symmetric. Figure B-1

shows the effect of increasing value of on the complex plane plot.

1i1

(B-2)

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Another modification to the formalism has been proposed by Davidson and Cole90

which introduces a factor as shown in equation (B-3). This change introduces an

asymmetric nature in the data as shown in Figure B-1. This function can be used to fit

data when the plot is not depressed, but is asymmetric.

i1

(B-3)

A combination of the above mentioned approaches was proposed by Havriliak and

Negami121,122 where both and are used as shown in equation (B-4). This expression

takes care of both, a wider distribution and asymmetry in the distribution of time constants.

1i1

(B-4)

The Havriliak-Negami expression can be easily converted to the other expressions

by assuming 0 (Davidson-Cole) and 1 (Cole-Cole) or both (Debye).

Figure B-1. Schematic representing the complex plane plot for permittivity according to Debye theory (left) and the effect of the exponents and .

In addition to these there are some other distributions like the ones by Kirkwood-

Fuoss, Frohlic, and Matsumoto-Higasi, which apply to specific cases and are not

discussed here.

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APPENDIX C THERMALLY STIMULATED DEPOLARIZATION CURRENT

C. As discussed in Chapter 2, defect complexes in doped ceria hinder the movement

of oxygen vacancies. Defect complexes have dipole moments and thus their orientation

can be influenced by an applied electric field. This fact can be exploited using thermally

stimulated depolarization current (TSDC) measurements to gain an insight into the

different kinds of complexes and their dynamics and also that of the free oxygen

vacancies in a given sample.

Figure C-1. Schematic diagram of polarization and heating profile for TSDC measurement.123

Typically, in TSDC, a sample is polarized under a constant electric field (𝐸𝑝) at an

elevated polarization temperature (𝑇𝑝). The possible defects present in the system such

as defect complex dipoles and free vacancies will respond to this field and form a

polarized metastable charge or dipole distribution. The sample is then cooled with the

field still applied, so that the alignment is frozen. The field is subsequently removed and

the sample is heated with a controlled heating rate. Figure C-1 shows a schematic of the

steps described above. With increasing temperature, the lattice vibrations will activate

the motion of charges or aligned dipoles. The charge distributions or polarized states

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then undergo relaxation at specific temperatures, giving rise to a current in the external

circuit which first increases with temperature and then decays when the supply of charges

is depleted or the dipoles are randomized. A current peak will thus be observed where

dipolar disorientation, ionic migration or release of charges from traps is activated and a

complete picture of temperature – dependent relaxations can in theory be obtained in the

form of a TSDC spectrum.56,124–126

Figure C-2. A schematic of an expected TSDC spectrum for doped ceria.

All mechanisms contributing to polarization which are temperature dependent can

be measured separately using this method, namely orientation polarization of permanent

dipoles or of dipoles induced by the electric field, space charge polarization, and electrode

effects. This can be done provided the corresponding relaxation times differ considerably.

In rare earth doped ceria, the two main mechanisms of interest are dipolar polarization of

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the defect associates at relatively low temperatures and space charge polarization at high

temperatures due to ionic movement. Figure C-2 shows a schematic of the expected

TSDC spectrum for doped ceria.

Preliminary TSDC testing was performed for acceptor doped bulk ceria samples in

the low temperature range. Factors such as polarizing temperature, heating rate and the

dopant were varied. Figure shows the TSDC spectra for two gadolinia doped ceria

samples. The temperature control was achieved using a Cryodyne refrigerator. Current

measurements were performed using an Agilent 4156 Precision Semiconductor Analyzer.

It also has a built-in voltage source which was used to apply the polarizing voltage.

Figure C-3. TSDC results showing the current density with respect to temperature for a 10 mol% gadolinia doped ceria sample with different polarizing temperatures and heating rates.

It can be seen that the data is very similar to that expected from the schematic.

The different peak heights are due to the polarization difference, which is shown

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separately later, whereas the position and width of the peaks is altered due to the different

heating rates. The data obtained can be used to determine the activation energy of the

rotation of defect complexes (and the motion of vacancies in the high temperature range).

An expression for TSDC current density was derived by Bucci and Fieschi.127

kT

Eexp

E

kT1exp

kT

Eexp

TPTJ a

a

2

o

a

o

pe

D (C-1)

Here pe TP is the equilibrium polarization at polarization temperature, pT . is the

heating rate, aE is the activation energy and o is the relaxation time at infinite

temperature. This discharge current represents an asymmetrical curve, the amplitude of

which is a linear function of the previously applied field. The first exponential which

dominates in the low temperature range represents the initial rise of current with

temperature. The second exponential dominating at higher temperatures is responsible

for gradually slowing the current rise and then depresses it rapidly.127 To determine the

activation energy for dipolar polarization, the “initial rise method” by Garlick and

Gibson.128 The current density of the initial part of the peak was plotted in an Arrhenius

form against temperature and the slope of the plot was used to determine the activation

energy as shown in Figure C-4. Figure C-5 shows the effect of different polarizing

temperatures on TSDC results for a gadolinia doped ceria sample. As expected, a higher

polarization temperature leads to a higher TSDC peak as there is more polarization.

However, the position of the peak is constant indicating that the kind of defect complexes

are the same. Peak positions act as a sort of a fingerprint for identifying different

associates, for a given constant heating rate.

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Figure C-4. Arrhenius plots of the current density with respect to temperature for the two peaks in Figure C-3.

Figure C-5. Plot showing the effect of polarizing temperature on TSDC peak intensity for a 10 mol% gadolinia doped ceria sample.

Figure C-6 on the other hand shows the effect of using different dopants and

different dopant concentrations, all other conditions remaining the same. It was found

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that a higher dopant concentration leads to smaller peaks. This could possibly be

because of more complicated and bigger associates forming at higher dopant

concentrations, which require higher temperature and applied fields for polarization. The

formation of different kinds of defect associates also leads to the peaks having different

widths and being slightly shifted from each other.

Figure C-6. Plot showing the effect of different dopants and different dopant concentrations on TSDC peak intensity.

A similar approach can be used to study vacancy migration in oxide ceramic

materials is sufficiently high temperatures are used for polarization. This preliminary data

presented here shows that TSDC can be a useful supplement to traditional electrical

characterization techniques by providing more information about the energetics for

polarization of different complexes and vacancy migration, and thus needs to be further

studied.

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APPENDIX D COLOSSAL PERMITTIVITY IN BARIUM STRONTIUM TITANATE*

D. D.1. Introduction

Barium strontium titanate (Ba1–xSrxTiO3, BST) is an intensively studied and well-

known material for various electronic applications such as capacitors,129 positive

temperature coefficient resistors,130 phase shifters,131 and gas sensors.132 BST

compounds are synthesized through a variety of methods like co-precipitation,133,134 sol–

gel synthesis,135 hydrothermal,136 and solid-state reactions.9 Conventionally sintered BST

bulk ceramics show high relative permittivity with low losses ( r = 103 and tan = 0.03)

and a variable Curie temperature.137,138

Since the turn of the century, there has been renewed interest in compounds with

colossal effective permittivity.139–142 They have been studied because of their high

technological potential, especially as dielectrics for capacitor applications. These

materials, usually metal oxides, can be fabricated as bulk materials and/or thin films.

Different techniques have been used to achieve high dielectric response in such

materials.143–149 An ideal colossal permittivity material should exhibit wide windows with

temperature- and frequency-independent response. Among bulk materials, different

oxides such as CaCu3Ti4O12 (CCTO),139–141,150,151 Li–Ti co-doped NiO,152 ferrites,153,154

and reduced perovskites155,156 show remarkably high dielectric permittivity which is

* This section is comprised of the work presented in the following journal articles:

S. Dupuis, S. Sulekar, J.H. Kim, H. Han, P. Dufour, C. Tenailleau, J.C. Nino, and S. Guillemet-Fritsch, “Colossal permittivity and low losses in Ba1–xSrxTiO3–δ reduced nanoceramics,” J. Eur. Ceram. Soc., 36 [3] 567–575 (2016).

S. Sulekar, J.H. Kim, H. Han, P. Dufour, C. Tenailleau, J.C. Nino, E. Cordoncillo, H. Beltran-Mir, et al., “Internal barrier layer capacitor, nearest neighbor hopping, and variable range hopping conduction in Ba1−xSrxTiO3−δ nanoceramics,” J. Mater. Sci., 51 [16] 7440–7450 (2016).

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temperature and frequency independent in a broad range. Such high permittivity is

attributed to a number of intrinsic and extrinsic interfacial mechanisms. For example,

Lunkenheimer et al. have shown that polarization effects at the electrode and material

contact contribute to the apparent high dielectric constant values in CCTO.151,157 The

intrinsic contribution on the other hand is attributed to hopping polarization, depletion

layers,158 and insulating domain and grain boundaries with respect to semiconducting

grains and domains.159 Moreover, in the case of barium titanate (BT), the electrode

effect has been separated out to be about 15 % by Han et al.160 Noble metals like Au

and Ag form Schottky contacts with BT, whereas Al electrodes form ohmic contacts.

The electrode effect on colossal permittivity can thus be estimated by subtracting the

permittivity obtained for Al electrode from that measured with Au. Overall, it has been

shown that for barium titanate, depending on processing conditions, the relative

contributions to colossal permittivity are approximately 65 % hopping polarization, 20 %

interfacial polarization, and 15 % electrode effects.160

Fast firing processes, such as spark plasma sintering (SPS) or microwave

sintering, have been employed to achieve colossal permittivity in BT based

ceramics.133,161–163 In these fast-fired materials, mixed valence state of the cations due

to extrinsic defects, localized in the vicinity of grain boundaries, has been proposed as a

mechanism at the origin of colossal permittivity.160,164 In addition, it has been shown that

semi-conductive grains are separated by thin insulating grain boundaries, leading to an

internal barrier layer effect (IBLC) for colossal permittivity in BT.160,164,165 The properties

of BT can be tuned by the substitution of Ba2+ by Sr2+ cations. The aim of the work

presented here was to understand the effect of Ba–Sr substitution on the dielectric

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properties of a series of Ba1–xSrxTiO3 (0 ≤ x ≤ 1) solid solutions and netter understand the

origin of colossal permittivity and the involved underlying mechanisms.

D.2. Experimental procedure

D.2.1. Fabrication

The co-precipitation method similar to that described in chapter 3 was used to

prepare the BST nanopowders. BaCl2·2H2O (Prolabo), SrCl2·6H2O (Sigma-Aldrich), and

lab-made TiOCl2 were weighed in appropriate proportions, dissolved in water, and added

to an ethanolic oxalic acid solution. After a 5 h aging, the solution was centrifuged and

dried for 12 h at 80°C. The powders were then ground and sieved before calcination at

850°C for 4 h. Spark plasma sintering (SPS) was carried out using a Dr. Sinter 2080

device from Sumitomo Coal Mining (Fuji Electronic Industrial, Saitama, Japan) in order to

densify the BST nanopowders. The oxide powder (0.5 gm) was loaded in the graphite

die (8 mm diameter) and the powders were sintered at 1150°C in vacuum (residual cell

pressure <10 Pa). The powders were heated at a rate of 25°C/min, with a 3-minute dwell

time at 1150°C before the electric current was switched off and the pressure was

released. A thin carbon layer, due to graphite contamination from the graphite sheets,

was observed on the as-sintered pellets surfaces, as has been reported before161, and

was removed by polishing the surface. Finally, the SPS sintered ceramics were annealed

for 15 minutes at 850°C in an oxidizing atmosphere and quenched in air.

D.2.2. Characterization

The chemical composition of the different oxide powders was determined using

inductively coupled plasma-atomic emission spectroscopy (ICP-AES) with a JY 2000

device (Horiba Jobin Yvon, Kyoto, Japan). The morphology of the powders was observed

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with a field emission gun scanning electron microscope (FEG-SEM, JSM 6700F, JEOL,

Tokyo, Japan) and the particle size was determined by ImageJ software.166 The grain

boundaries thicknesses were observed with a high resolution transmission electron

microscope (HRTEM, JEM 2100F, JEOL, Tokyo, Japan). The crystalline structure was

investigated by X-ray diffraction analysis using a D4 Endeavor X-ray diffractometer

(CuKα1 = 0.154056 nm and CuKα2 = 0.154044 nm; Bruker AXS, Karlsruhe, Germany)

from 20° to 80° (2-theta). The density of the pellets was determined by the Archimedes

method using an ARJ 220-4M balance (KERN, Murnau-Westried, Germany).167 Prior to

electrical measurements, the flat faces of the ceramic disks were coated with thin gold

electrodes (thickness ∼30 nm) by sputtering (108 Auto, Cressington Scientific

Instruments, Watford, U.K.). The relative permittivity and the dielectric losses were

obtained from impedance measurements using a 4294A Precision Impedance Analyzer

and an E4980A Precision LCR Meter (Agilent Technologies, Palo Alto, CA) in the range

of 40–100 kHz at room temperature and an applied AC voltage of 1 V. For temperature

dependence of the dielectric properties, the electroded samples were placed in a closed

cycle cryogenic workstation (CTI 22, Cryo Industries of America, Manchester, NH) and

measurements were taken as a function of temperature (40–300 K).

D.3. Results and Discussion

Only the results pertaining to the electrical characterization of the materials under

study are discussed here, since it was performed primarily by the author. The

microstructural characterization was performed by the other collaborators mentioned

above.

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D.3.1. Dielectric Spectroscopy

The dielectric response of the BST (0 ≤ x ≤ 1) nanoceramics measured as detailed

above is shown in Figure D-1.

Figure D-1. Variation of the real part of relative permittivity and losses (tan) as a

function of frequency for the Ba1–xSrxTiO3– nanoceramics at 300K.

As can be seen in Figure D-1, colossal permittivity up to 105 with low dielectric

losses (tan < 0.05) was achieved for most of the compositions (0 ≤ x ≤ 0.6). The values

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for rε and tan measured at 1 kHz and 300 K are reported in Table 2. It was observed

that the relative permittivity and dielectric losses of BST compounds gradually decreased

as Sr content increased.

Table D-1. Dielectric properties of the Ba1–xSrxTiO3–δ nanoceramics.

Composition r (1 kHz, 300 K) tan (1 kHz, 300 K) TCC (10−3 K−1)

BaTiO3–δ 729000 0.05 1.9

Ba0.8Sr0.2TiO3–δ 388000 0.04 1.5

Ba0.6Sr0.4TiO3–δ 174000 0.03 3.6

Ba0.4Sr0.6TiO3–δ 115000 0.03 3.3

Ba0.2Sr0.8TiO3–δ 30800 0.03 0.5

SrTiO3–δ 6300 0.01 0.04

The BST nanoceramics samples in this work exhibit much higher permittivity

compared to the results in the open literature. For instance, Fu et al. prepared the solid

solution BaxSr1–xTiO3 ceramics via solid-state reaction followed by conventional sintering,

and reported permittivity values at room temperature and for 1 kHz, ranging between

1500–3000 for increasing barium content.137 The combination of mechanosynthesis and

spark plasma sintering has been used for the first time for the Ba–Sr–Ti–O system by

Hungría et al.168 While the ceramics exhibited nanosize grains, low permittivity values

were observed, 1400 for BaTiO3 and 200 for SrTiO3 respectively. Gao et al. used an

organosol synthesis to prepare Ba0.6Sr0.4TiO3 nanoparticles with an average grain size of

35 nm and followed it by spark plasma sintering to prepare nanoceramics showing a

maximum permittivity value of 3000.169 These examples show the importance of each

step of the ceramic process to obtain controlled colossal permittivity values in the BST

ceramics: oxalate co-precipitation to synthesize homogeneous powder of controlled

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morphology, size and stoichiometry, SPS sintering to obtain ceramics with nano-size

grains and reduced titanium cations and a short annealing treatment to retain oxygen

sub-stoichiometric compounds.

Figure D-2. Variation of the real part of the relative permittivity and losses (tan) as a function of temperature measured at 1 kHz for the Ba1–xSrxTiO3–δ nanoceramics.

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The permittivity and the losses of BST compounds as a function of temperature

(300–450 K) are shown in Figure D-2. Colossal permittivity can be observed over a wide

temperature range (300–450 K). The ferroelectric–paraelectric transition, corresponding

to the tetragonal–cubic phase transition was seen only for pure BT ceramics by a peak of

rε occurring at the same temperature (TC = 396 K) whatever the frequency up to 100

kHz. The temperature coefficient of capacitance, TCC (variation of capacitance between

310–450 K), is determined according to equation (D-1):

K310K450

CC

C

1TCC minmax

K310

(D-1)

The lowest value of TCC, 44 ppm.K−1, observed for the composition SrTiO3–δ (Table 2),

is lower than the values reported for temperature stable capacitors, i.e., in the BaTiO3-

Bi(Zn1/2Ti1/2)O3-BiScO3 system.133

D.3.2. Impedance Spectroscopy

To analyze the behavior of the different regions of the samples, i.e., grains and

grain boundaries, impedance measurements were carried out as a function of frequency

over the temperature range from 120 to 473 K. Analysis of the impedance complex plane

plots for a high Ba-content sample and a high Sr-content sample at 170 K (Figure D-3),

showed an asymmetric arc of resistance R1 at high frequencies.

Assignment of the main impedance arc to grain regions is supported by the

representation of the same impedance data as MZ spectroscopic plots. The peak in

the M plot corresponds to the region of the sample with the smallest capacitance (

110 cmF108.2 for Ba0.8Sr0.2TiO3−δ and 110 cmF102 for Ba0.2Sr0.8TiO3−δ), and

therefore, to the grains. This also corresponds to the almost frequency independent, but

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temperature dependent plateau at high frequencies in the spectroscopic plots of C .

Thus, R1 corresponds to the sample bulk resistance and is in the order of 3500 Ω-cm for

Ba0.8Sr0.2TiO3−δ and 7500 Ω-cm for Ba0.2Sr0.8TiO3−δ at 170 K.

Figure D-3. Impedance complex plane plots and Z′′/M′′ spectroscopic plots at 170 K, and capacitance data at 150 and 170 K for Ba0.8Sr0.2TiO3−δ (a, c and e) and Ba0.2Sr0.8TiO3−δ (b, d and f) nanoceramics. The solid data points in (a) and (b) refer to frequencies of 200 and 4.5 kHz.

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In the spectroscopic plots for C , a second plateau is observed at lower frequency

with capacitance 18 cmF101 and 19 cmF105.6 at 170 K for Ba0.8Sr0.2TiO3−δ and

Ba0.2Sr0.8TiO3−δ, respectively, which might be attributed to a conventional (but high

permittivity) grain boundary, C2. Therefore, for both samples, the impedance data may

be represented ideally by an equivalent circuit containing two parallel RC elements in

series.

D.3.3. Polarization mechanisms

Figure D-4. Variation of the real parts (a) and (c) and the imaginary parts (b) and (d) of permittivity as a function of temperature and at different frequencies for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics.

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To investigate the relaxation phenomena observed in BST nanoceramics, the

dielectric properties of each composition were measured as a function of temperature

(40–300 K) at different frequencies. Figure D-4 shows the dielectric data for one Ba-rich

(x = 0.2) and one Sr-rich composition (x = 0.8), respectively, which exhibit distinctly

different dielectric relaxation behavior.

In the following sections, the possible mechanisms, explaining the temperature

stable dielectric properties of BST compounds by using corresponding physical models

such as Debye relaxation, universal dielectric response (UDR), and hopping polarization

models are discussed.

D.3.3.1. Debye Model

Debye-like dielectric relaxations were observed for both compositions, and the

maximum of rε shifts to higher temperature as frequency increases, indicating that

frequency dependent relaxation processes may exist in the compounds. In the Debye

model, the relaxation frequency and the activation energy can be extracted by using the

equation below:

Tk

Eexp

B

aO

(D-2)

where O , Bk , and aE are the pre-exponential factor, the Boltzmann constant, and the

activation energy for relaxation, respectively. The relaxation temperatures at different

frequencies were extracted from the maximum of r for each of the BST compounds and

plotted in the Arrhenius form to determine the activation energy.

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Figure D-5. Temperature dependence of relaxation frequency for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics.

It can be clearly seen in Figure D-5 that Ba0.8Sr0.2TiO3–δ shows two different slopes

corresponding to two activation energies, while no distinct slope change was observed

for Ba0.2Sr0.8TiO3–δ. This result indicates that, similar to BT,160 BST compounds with high

barium content might have two different polarization mechanisms, possibly hopping

polarization combined with interfacial space charge polarization, while Sr-rich BST might

have only one polarization mechanism.

D.3.3.2. Universal Dielectric Response Model

It is also well known that Jonscher’s universal dielectric response (UDR) model

can be applied to explain dielectric polarization in colossal permittivity materials, as

described by the following equations,170

O

O

1s

r

f2

stan

(D-3)

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sfTAf r (D-4)

where O and s represent the temperature dependent constants, O and f are the

permittivity of free space and experimental frequency ( 2f ), respectively, and TA

is equal to OO2stan . Thus one can extract the value of the exponent s by plotting

flog r vs. flog . An s value as closer to 1 implies that the polarization charges are

more highly localized.171

Figure D-6. Variation of the real part (a) and (c) and the imaginary part (b) and (d) of permittivity as a function of frequency and at different temperatures for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics.

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Figure D-6 shows the real and imaginary parts of dielectric permittivity for BST (x

= 0.2) and BST (x = 0.8) samples as a function of frequency (40–100 kHz) at different

temperatures (40–300 K). Dielectric relaxation occurs at each temperature, given that

distinct relaxation peaks of imaginary part of permittivity were observed for the

compositions. Furthermore, the relaxation peaks shift to lower frequencies as

temperature decreases, which indicates that thermally activated relaxation phenomena

are involved.

Figure D-7. fr vs. f plot in log–log scales for (a) Ba0.8Sr0.2TiO3–δ and (b)

Ba0.2Sr0.8TiO3–δ dense nanoceramics at different temperatures (40–300K).

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Figure D-7 presents fr vs. f plots in log–log scales for the same samples.

For the Ba-rich BST (x = 0.2) compound, high temperature slope is close to 1, which is

different from the value of the low temperature slope, indicating that dielectric polarization

is more localized at higher temperatures.

As has been shown in literature, the slope change in flog r vs. flog plot as

temperature decreases is associated with the hopping polarization which becomes

inactive at lower temperatures due to insufficient energy to overcome energy barrier for

polarization.160 For the Sr-rich BST compound (x = 0.8), no slope change was observed

for the different temperature regions. Thus, one can expect that hopping polarization

might not be significant in Sr-rich BST compounds.

D.3.3.2. Thermal Hopping Polaron Model

To investigate the behavior of Sr-rich compounds, it is important to recall the

thermally activated hopping polaron (THP) model,172 where the maximum of r is

proportional to the number of polarons participating in hopping polarization.

Tk3

N

B

2

maxr

(D-5)

Tk

EexpNN

B

aO

(D-6)

Nand represent the number of hopping polarons and the hopping dipole moment

respectively. ON and aE are the pre-exponential factor and the activation energy related

with relaxation of hopping dipoles respectively. By substituting equation (D-5) into (D-6),

the equation for the thermally activated hopping polaron model can be obtained as below.

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Tk

Eexp

k3

NT

B

a

B

2

Omax

(D-7)

Thus, activation energy for hopping polarization can be calculated from the

Tln max vs. T1 plot. Figure D-8 shows the same for BST compounds (x = 0.2 and

0.8). It should be noted that, if hopping polarization is present in colossal permittivity

material, activation energy of hopping polarization at high temperature region is

comparable to the difference of activation energies at high and low temperatures obtained

by using Debye model (Figure D-5).

Figure D-8. Activation energy values extracted from the hopping polarons model for Ba0.8Sr0.2TiO3–δ and Ba0.2Sr0.8TiO3–δ nanoceramics.

This statement seems to hold true for the case of Ba-rich BST sample (x = 0.2),

where the activation energy difference from Debye model (0.081 eV) is well comparable

with the activation energy for hopping polarization in the high temperature region (0.036

eV). However, for Sr-rich BST (x = 0.8), the value of Tln max remains constant at

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different temperatures, indicating that no thermally activated hopping process is present

in Sr-rich BST compounds (Figure D-8). Thus, one can conclude that the colossal

permittivity in Ba-rich BST compounds is due to hopping polarization combined with

interfacial polarization, while mostly interfacial polarization is responsible for Sr-rich BST

compounds.

Table D-2 summarizes calculated activation energy and extracted s values for

BST (x = 0.2 and 0.8) compounds by using Debye, UDR, and THP models, respectively.

The two BST compounds, Sr-rich and Ba-rich, were again selected for the analysis since

those compounds exhibit most distinct dielectric properties in terms of polarization

mechanisms. As observed by De Souza et al.,173,174 BaTiO3 exhibits lower oxygen

diffusion and surface exchange coefficients 1213

C850,Oscm102.1D

and

18

C850,Oscm108.3k

respectively than SrTiO3 1211

C850,Oscm102D

and

110

C850,Oscm105.7k

. Therefore, the faster diffusion of oxygen during the post

annealing treatment in BST compounds, compared to BT, leads to an increase of the Ti3+

to Ti4+ oxidation rate, which results in the decrease of hopping dipole concentration in the

material with increasing Sr concentration. Furthermore, it is well known that

ferroelectricity of BST decreases as Sr content increases, and transformation from the

ferroelectric phase to the paraelectric phase occurs when the Sr content increases above

0.3.175,176 It is thus clear that depending on the concentration of Sr in BST nanoceramics,

colossal permittivity is a result of interfacial polarization at insulating grain boundaries,

and thermally activated hopping polarization in the semiconducting grains. The following

sections discuss these in more detail.

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Table D-2. Calculated activation energies and s values for BST compounds using three different analytical models.

Ba0.8Sr0.2TiO3–δ Ba0.2Sr0.8TiO3–δ

Debye model (EA, eV) Low temp 0.029 0.165

High temp 0.110

UDR model (s value) Low temp 0.80 0.98

High temp 0.99 0.98

THP model (EA, eV) Low temp 0.015 ∼0

High temp 0.036

D.3.4. Internal Barrier Layer Capacitor

The interfacial polarization at the grain boundaries is modelled using the internal

barrier layer capacitor (IBLC) model. The IBLC model can be described by Koop’s

equivalent circuit consisting of capacitive, conductive, and a constant phase element in

parallel and/or in series. For colossal permittivity materials, electrical heterogeneities

between grains and grain boundaries drive the properties.150 According to the Koop’s

equivalent circuit, the grain and grain boundary responses are built in series and each

part is composed of a dc,gbggbg ,C parallel circuit, described by the following

equation.177

1iCbiCi

1iiCiiC

2

o

2

dc,ggP1

gdc,gbgbP1

gbo

odc,gbgbP1

gbodc,ggP1

g

(D-8)

dc,g is the DC conductivity of grain and dc,gb is the DC conductivity of grain boundary in

the frequency-independent part of Jonscher’s model. 0 , i , , and are, respectively,

the permittivity of vacuum/sample at infinite frequency, the imaginary unit, the angular

frequency, and the ratio of grain boundary thickness on average grain size. In addition,

equation (D-8) points out a gbgP contribution representing the conductive and capacitive

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trends of grains and grain boundaries. A value of P close to 1 indicates a conductive

behavior while a value close to 0 implies a capacitive response. Finally, gbgC is a function

of gbgP , as given by the equation (D-9) where O,gbg is the static conductivity of

grains/grain boundaries.

gbgO,gbggbg P1cos5.0C (D-9)

Experimental data for Ba1−xSrxTiO3−δ nanoceramics (0 ≤ x ≤ 1) are plotted in Figure

D-9 and the fitted curves using equation (D-9) are presented. The different fitting

parameters ( gbgP , gbg , gbgC , , and ) are shown in Table D-3. For all the

compositions, they are in good agreement with the experimental data (R2 > 0.997, except

for SrTiO3 where R2 = 0.950). As discussed above, the electrical properties of SrTiO3

are not driven by the thermally activated hopping polaron model, and thus this particular

composition is excluded from the following discussion.

Figure D-9. BST permittivity data fitted with IBLC model

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The values of gP of all the compounds are close to 1 and those of gbP are close

to 0, indicating a conductive response of the grains and a capacitive response of grain

boundaries. Moreover, dc,g are at least two orders of magnitude higher than dc,gb , which

is in accordance with the IBLC model. In addition, the values of gbgC support the fact that

grains are conductive (or semiconductive) while grain boundaries are insulating.

Table D-3. Fitting parameters using the IBLC model.

Composition

Ba1−xSrxTiO3−δ gP

gbP dc,g

(S/cm)

dc,gb

(S/cm)

gC

gbC

gbg tt

BaTiO3−δ 0.92 0.02 5.1×10−2 5.6×10−6 1.18 6.2×10−8 0.00996 479

Ba0.8Sr0.2TiO3−δ 0.92 0.01 8.1×10−4 2.5×10−6 0.23 2.9×10−8 0.00998 505

Ba0.6Sr0.4TiO3−δ 0.92 0.02 2.5×10−3 1.9×10−6 0.09 1.2×10−8 0.00996 512

Ba0.4Sr0.6TiO3−δ 0.89 0.04 2.3×10−2 2×10−12 0.04 1.4×10−8 0.00984 509

Ba0.2Sr0.8TiO3−δ 0.80 0.01 0.2 3.8×10−10 0.01 3.5×10−9 0.01307 500

SrTiO3−δ 0.028 0.0002 3.3 × 10−7 1.5 × 10−7 10−7 9.9 × 10−8 0.02113 553

Finally, a simple comparison between the six compositions could give us some

general trends about Ba–Sr substitution on electrical properties. In fact, we observe a

quasi-constant value of gP (≈ 0.92) until x = 0.4, then gP substantially decreases as x

increases above 0.4. This means that the grain conductivity behavior is similar for the

three highest Ba-content nanoceramics, while this conductive behavior drastically

decreases for the three other samples (i.e., Sr-rich BST compound). However, gbP is

almost constant for all the compositions, showing a similar trend of grain boundaries to

be capacitive. dc,gb shows a slow decrease as Sr content increases from 0 to 0.4, then

drastically decreases for higher Sr concentration. The values of gC and gbC related with

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gP and gbP decrease when x increases. is constant (≈ 1 × 10−2), indicating a grain

boundary thickness 100 times smaller than the grain size, which is consistent with the

results determined from HREM-TEM observations (not included here).178 The grain size

of the BaTiO3−δ nanoceramics lies between 100 and 250 nm, and the grain boundary

thickness was estimated to be 1 nm. Lastly, , corresponding to the permittivity at infinite

frequency remains quasi-constant for all the compositions tested.

D.3.5. Variable Range and Nearest Neighbor Hopping

The long-range hopping polarization within grains in BST and its variation with Sr

content can be explained on the basis of the conduction mechanisms involved. In order

to investigate the conduction mechanisms, it is necessary to link dielectric properties to

the bulk conductivity ( ), as shown in equation (D-10).

roo (D-10)

The universal dielectric response (UDR) model developed by Jonscher,179,180

established the relation between the bulk conductivity and the grains conductivity in the

high frequency-independent area. In this way, by plotting the bulk conductivity as a

function of frequency, it is possible to determine the dc conductivity ( dc ) of the grains.

s

odc f (D-11)

o is a pre-factor, f is the experimental frequency, and s is a temperature-dependent

constant. The value of s is between 0 and 1, and a value close to 1 indicates a localized

polarization mechanism, while a value closer to 0 indicates that charge carriers are free

to move through the entire bulk. In order to better understand the electrical properties of

the BST system, we will focus on two compositions: Ba-rich BST compound

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Ba0.8Sr0.2TiO3−δ and Sr-rich BST compound Ba0.2Sr0.8TiO3−δ, since these two compounds

show the most distinct dielectric behavior from each other.

Figure D-10. Frequency dependence of the conductivity at different temperatures for (a) Ba0.8Sr0.2TiO3-δ and (b) Ba0.2Sr0.8TiO3−δ.

versus f curves are plotted for different temperatures and the corresponding

fitting curves extracted from equation (D-11) are presented in Figure D-10 for these two

compositions. The results for fitting parameters are also presented in Table D-4. dc

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and o decrease as temperature decreases regardless of the composition. However, for

Ba0.8Sr0.2TiO3−δ, s values increase as temperature decreases from 140 to 80 K, then

further decreases at lower temperatures, while the s value is quasi-constant for

Ba0.2Sr0.8TiO3−δ. These contradictory dependences of s values as a function of

temperature for two compositions were further investigated using the two different

thermally activated hopping polaron models, the nearest neighbor hopping (NNH) and the

variable range hopping (VRH) model.

Table D-4. Fitting parameters using the UDR model.

Composition T(K) σdc (S-cm−1) σ0 s R2 Δf (kHz)

Ba0.8Sr0.2TiO3−δ 140 0.01799 2.1E−4 0.39488 0.99618 10–100

120 0.00636 1.4E−6 0.76218 0.99919 3–100

100 0.00227 3.3E−7 0.86625 0.99881 1–100

80 7.49E−4 9.3E−8 0.97315 0.99949 0.04–100

60 1.92E−4 4.5E−7 0.7935 0.9997 0.02–100

Ba0.2Sr0.8TiO3−δ 160 0.00959 3.04E−5 0.50982 0.99865 20–200

140 0.00262 5.08E−6 0.60553 0.99909 3–200

120 4.98E−4 2.8E−6 0.60234 0.99983 1–200

100 7.5E−5 1.13E−6 0.61787 0.99949 0.2–200

80 2.91E−6 1.28E−7 0.74267 0.99821 0.2–200

NNH conduction model considers a constant distance of hopping between nearest

neighbors, as described in equation (D-12),181 and is based on the linear variation of ln

dc as a function of 1/T:

TkEexp B1a1dc (D-12)

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where 1 is the pre-exponential factor dependent on the concentration and size of

defects, T is the absolute temperature, 1aE is the activation energy required for the

hopping polaron, and Bk is the Boltzmann constant.

Figure D-11. NNH model applied to BST nanoceramics.

The logarithm of dc was plotted as a function of 1/T for the two compositions of

Ba0.8Sr0.2TiO3−δ and Ba0.2Sr0.8TiO3−δ (Figure D-11), and it can be clearly seen that two

different behaviors exist for the compositions. In other words, for the case of the Sr-rich

composition, the variation of the grain’s conductivity with temperature fits well with the

NNH model. The calculated activation energy, 0.110 eV, is in agreement with a hopping

conduction process occurring between nearest neighbors.182,183 Moreover, this value is

in the same range of the value of 0.165 eV, determined using Debye model. On the other

hand, the Ba-rich composition does not follow NNH model and conductivity values deviate

from the linear relationship with 1/T as temperature decreases. In this latter case, one

can consider VRH model, in which the activation energy and the hopping distances of

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charge carriers are temperature dependent.184 This behavior was pointed out for the first

time by Mott184 and leads to an po TTexp conductivity dependence, as described in

equations (D-13) and (D-14).

p

o2dc TTexp (D-13)

F

3

o EkN24T (D-14)

Here 2 is the pre-exponential constant dependent on the defect concentration and size,

is the length of the localized wave function, and N(EF) is the number of electrons per

unit volume within a range of the Fermi level. Generally, the reported p exponent equals

1/4 (or 1/3 in two dimensions) as observed by Mott, Zhang, Ang, Zheng, and others for

space charge-disordered semiconductors.185–188 Furthermore, a p value of 1/2 was

already reported by Efros, Overhof and Thomas, and more recently by Han et al.165,189,190

However, these reported values have not been clearly explained yet.

Figure D-12. Temperature dependence of DC bulk conductivity of Ba0.8Sr0.2TiO3−δ nanoceramic sample.

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The p exponent can be deduced from the slope of the equation expressed in

equation (D-15) as shown in Figure D-12.

ATlogp1Tk1dlndlog Bdc (D-15)

For Ba0.8Sr0.2TiO3−δ the p value determined here is 1/4. The value of To is on the

order of 1.81×107 K, which is lower than the value published by Zheng187 for a

Ni0.5Zn0.5Fe2O4 ceramic exhibiting colossal permittivity or by Ang191 for Cu-doped BaTiO3

following variable range hopping conduction mechanism. Considering the value, which

is on the order of magnitude of the lattice parameter ( = 0.4 nm) and knowing the value

of To (from the fit of Figure D-12), it is then possible to calculate N(EF) = 7.6×1019 eV−1cm−3

from (D-14), which is in agreement with other authors,185–187 and the activation energies

(Ea2) and the hopping distances (R) at different temperatures following the VRH model.

4341

oB2a TTk25.0E (D-16)

41

BF TkEN23R (D-17)

The activation energies of the hopping process at low temperature are in the range

of 0.022 ± 0.002 ≤ Ea2 ≤ 0.057 ± 0.003 eV, which is in the same order as low-temperature

Debye’s activation energy. In addition, the most probable hopping distance increases

from 3.8 to 5.2 nm as the temperature decreases from 140 to 40 K. These distances that

are approximately 10 times higher than the nearest neighbor distance, can be explained

by the remarkably high concentration of polarons in the grains, allowing long-distance

hopping to reach an equivalent site with comparable energy.

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D.4. Summary

The electrical properties of a series of Ba1−xSrxTiO3−δ nanoceramics (0 ≤ x ≤ 1)

were investigated. Colossal permittivity (~105) with low losses (tan δ = 0.03) was

achieved. The electrical properties were analyzed in detail using Debye, UDR and

hopping polaron models. In Ba rich compounds, the properties are attributed to

polarization mechanisms at the grain boundary interfaces and to hopping in the grains.

In general, the grain conductivity decreases as Sr concentration increases. The

permittivity value also decreases as the Sr-content increases, attributed to a decrease of

the hopping contribution. The composition of Ba0.6Sr0.4TiO3–δ can be chosen as an

optimal BST compound for the colossal permittivity material as it shows the highest value

of r (174,000) and the lowest value of tanδ (0.03) over a wide temperature range.

Moreover, the strontium rich BST reduced nanostructured ceramics exhibit temperature

stable permittivity, albeit with lower values.

The hopping conduction mechanisms were further investigated in detail for two

compounds: Ba-rich (Ba0.8Sr0.2TiO3−δ) ceramic and Sr-rich (Ba0.2Sr0.8TiO3−δ) ceramic.

The Sr-rich ceramic exhibits a linear evolution of the DC grain conductivity versus 1/T,

which is in accordance with the NNH model, with an activation energy of 0.110 ± 0.002

eV. In Ba-rich compositions, the DC conductivity deviates from the 1/T law at low

temperature, which is typical of a VRH mechanism. The use of VRH model for Ba rich

compounds, indicates an increase of polaron activation energy (from 0.022 ± 0.002 to

0.057 ± 0.003 eV) and a decrease of hopping distances (from 5.2 to 3.8 nm) as the

temperature increases from 40 to 140 K.

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APPENDIX E I DON’T KNOW WHAT THIS MEANS BUT…

E. Over the course of this doctoral work, the author has come across many interesting

phenomena and trends in data that do not make a direct contribution to the topics covered

in this dissertation. These trends though unrelated are worthy or further exploration and

at this point, the author does not have a clear explanation for these based on his literature

review. Following is a short list of a few of such observed but unexplained phenomena.

The deviation from ideal Debye type behavior, with a distribution of time constants

is modelled by introducing a factor α, in the case of the Cole-Cole model as has

been shown in Appendix B in equation (4-6). In the impedance formalism, a

constant phase element is used to model similar behavior for fitting the data with

equivalent circuit fitting. The constant γ in this case as is introduced in equation

(4-5) acts as a distribution coefficient. Given that both α and γ are introducing a

distribution of time constants, there must be a certain equivalence between them.

It is not clear however, what the exact relation between the two constants is.

Continuing with modifications to Debye behavior, a factor β is used to model

asymmetry in the permittivity arc as has been shown in equation (B-3). Similar

asymmetry can also be often found in complex impedance data. However, as of

now it is not clear how it can be modelled using software like Zview, with a circuit

element or combination of circuit elements.

During the study of the effect of high bias values on complex impedance behavior

of gadolinia doped ceria thin films, at very high bias values it was found that the

behavior in the low frequency range starts becoming less inductive as opposed to

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the general trend of the samples showing more inductive behavior with increasing

bias. It is not clearly understood what this flip in behavior means and what is its

physical significance.

Similarly, at high bias values, the complex impedance plot has some data in the

third quadrant as can be seen from Figure 6-9. Although the CPE-P values take

care of it mathematically, it is not understood what a negative resistance (implied

by the third quadrant) means. It is not clear whether this is just a mathematical

phenomenon or whether it has any physical significance. It will be interesting to

see if this indicative of a current in the opposite direction.

During the analysis of impedance data under bias, the data was also analyzed in

the modulus formalism. A peak is observed in the imaginary modulus (M”) data

when plotted against frequency. This peak moves from low frequency to high with

increasing temperature and bias, although the effect of bias on peak movement is

observed only at high bias values. To analyze this further, the peak positions with

respect to frequency were calculated and the values so were plotted for different

temperatures and bias values as shown in Figure E-1. The data seems to follow

an Arrhenius type relationship denoted in equation (E-1). With increasing bias,

there is a slight change in the slope of the graphs, indicating a change in the

activation energy. However, more prominent is the shift in the plots with increasing

bias, which indicates a new conduction mechanism with its unique activation

energy related to the applied bias (B). This behavior ties in well with the hypothesis

of a parallel electronic conduction pathway. Equation (E-1) can be modified to

include the effect of bias as equation (E-2) where f1(B) and f2(B) are functions of

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the bias B. This effect needs to be further studied to better understand the effect

of bias.

kT

EexpFF a

1o (E-1)

kT

BfexpF

kT

BfEexpFF 2

2o1a

1o (E-2)

Figure E-1. M” peak position frequency as a function of temperature and bias.

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BIOGRAPHICAL SKETCH

Soumitra Sulekar was born in 1989 in Akola, India. He grew up in multiple cities

in the state of Maharashtra where he completed his schooling. After taking the national

entrance exams for engineering, he got accepted at the Visvesvaraya National Institute

of Technology in Nagpur, India, one off the premier engineering institutes in the country.

Here he studied Metallurgical Engineering and Materials Science, earning a Bachelor of

Technology degree in 2012. During this period, he was involved in different research

projects relating to solid oxide fuel cells. Inspired by the research experience during his

internships and senior year thesis, he decided to pursue a graduate degree in the United

States. He joined the Department of Materials Science and Engineering at the University

of Florida as a master’s student and started working with Professor Nino’s research group

from Spring 2013. Given the multidisciplinary and diverse nature of the group, he got

involved in multiple research projects involving energy applications, electronic device

components, geopolymers, radiation detectors and even plant derived biomaterials. A

bulk of his work however concentrated on studying defect dynamics in electroceramic

materials, which also forms the basis of his Ph.D. from the University of Florida.