Awake electron beam requirements
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Awake electron beamrequirements
Parameter Baseline Phase 2 Range to check
Beam Energy 16 MeV 10- 20 MeV
Energy spread (s) 0.5 % < 0.5 % ?
Bunch Length (s) 4 ps 0.3-10 ps
Beam Focus Size (s) 250 mm 0.25 – 1mm
Normalized Emittance (rms) 2 mm mmrad 0.5 - 5 mm mrad
Bunch Charge 0.2 nC 0.1 - 1 nC
Let’s assume gaussian or truncated gaussian distributions for transverse phase space for time beingFor the longitudinal we will simulate gaussian and somewhat more uniform distribution depending what we can expect from the laser
No changes
Specifications for AWAKE photo-injectorBaseline (9,4 ps) 10 ps 0.3 ps Unit
e- beam Charge / bunch 0.2 1.0 0.1 nCBunch population 1.25E+09 6.25E+09 6.25E+08Bunch width (s) 4.000 4.255 0.128 psBunch width (FWHM) 9.40 10 0.30 psBunch length 0.282 0.3 0.009 cmNormalized emittance 2 2 2 p.mm.mradCathode material Cu Cu Cu
Photo-cathodeQuantum Efficiency 0.003 0.003 0.003 %Wavelength 262 262 262 nmUV energy / bunch @ the cathode 32 158 16 mJUV energy / bunch @ laser lab 90 451 45 mJ
Laser beam conv. and transport Transport of UV from laser to e-gun 0.5 0.5 0.5
Transport of UV to cathode 0.7 0.7 0.7
Effeicency of pulse compressor 0.6 0.6 0.6IR-UV conversion efficiency 0.1 0.1 0.1Efficiency of UV stretcher 0.5 0.5 1Beam shaping 0.8 0.8 0.8Safe margin 0.7 0.7 0.7UV cath. energy / Output IR energy 0.006 0.006 0.012IR pulse energy required 5366 26830 1342 mJ
Ablation limits
Litearture Ablation treshold from literature (Hashida 2002) 18 18 18 mJ/cm2data ref. pulse duration 0.07 0.07 0.07 ps
ref. wavelength 800 800 800 nmcorrection for UV 0.7 0.7 0.7
Estimation of the limit correction for pulse duration 26.2 27.3 2.6
Estimated ablation threshold 330 344 33 mJ/cm2Laser beam radius (waist) @ the cathode 0.9 2 2 mm
Safe size Peak laser fluence (gaussian beam) 248 251 25 mJ/cm2estimation Ratio to ablation threshold 0.75 0.73 0.76
Laser requirements
50 mJ
500 mJ
Laser update We still assume using copper cathodes Prefer a solution where Amplitude delivers a UV laser beam
This means they take care of the compression and the 3rd harmonic generation. CERN would then transport the UV to the gun and cathode. UV pulse required:
Wavelength: 262 nm; 500 uJ pulse energy and a FWHM pulse length of 10 ps.This pulse would guarantee the base line parameters and the 1 nC option.
For the short pulse 0.3 ps we would need only 50 uJ in the UV assuming that we would have to produce only 0.1 nC of charge (limited by ablation)
Pulse compression independent from the one for the proton beam Independent pulse picker allowing to use only some pulses out of the 10 Hz rep. rate.
The specification for an IR beam would be a pulse energy of 50 mJ.
We will still try to investigate the space constraints and keep the option to use different cathodes.
Electron source layout
Electron source layout
Laser table needs to be integrated as well
Electron source layout
Comments:
Layout is advancingSome conflicts with the overall
lengthNeed to optimise cathode
accelerating structure distanceNeed to specify quadrupolesStudy cathode loading system
optionsStudy shielding design and layout
Electron source design
Oznur Mete, Cockcroft
Starting points for calculations Proton line: the top mirror in vacuum before the laser core
tunnel
Electron line: intersection of the “electron” laser beam with the vertical plane formed by 2 vacuum mirrors for “proton” beam
727
98
Valentine and Mikhail
7387320
1188vertica
l 19929
7387+1188+320+19929 = 28824 mm Proton line: path to plasma cell
Electron line: path to photocathode
9846
1087vertical
1320
500 817
Optical table 1000x1800
9846+1087+1320+500+817 = 13570 mm
Electron beam path from photocathode to plasma cell
4627
377
377
377
377
3683
736
1536
4319
4627+377*4+3683+736+1536+4319 = 16409 mm
Summary Proton line path to plasma cell = 28824 mm• Electron line: laser path + electron path = 29979 mm
difference = - 1155 mm is to be compensated by delaying the “proton” pulse (could it exist in the main amplifier ?)
Delays due to compressor, THG, UV stretcher, telescope, are not counted!
A variable delay of 0 - 200 mm in the electron line is required