AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities...

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AR1682J Superior versatile 193nm Photoresist sold in large quantities worldwide AR1682J FEATURES • Wide Process Window • Good CD-Uniformity • Good LER/LWR Focus Latitude Well balanced dense & isolated litho performance! 120nm NODE Target CD: 130nm semi-dense and isolated Line NA:0.63, Annular illumination (0.80/0.50) Substrate: organic BARC AR1682J: 320nm film thickness Focus Latitude 130L325P 130 iso L negative focus best focus positive focus • Small Mask Dependency • Good PEB Sensitivity~1nm/C • Good Defectivity 130L325P 130 iso L negative focus best focus positive focus

Transcript of AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities...

Page 1: AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities worldwide ... AR1682J available viscosities PEB-sensitivity 0.97nm/°C. AR1682J Superior

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

AR1682J FEATURES

• Wide Process Window

• Good CD-Uniformity

• Good LER/LWR

Focus Latitude

Well balanced dense & isolated litho performance!

120nm NODE Target CD: 130nm semi-dense and isolated LineNA:0.63, Annular illumination (0.80/0.50)Substrate: organic BARCAR1682J: 320nm film thickness Focus Latitude130L325P 130 iso L negative focus best focus positive focus

• Small Mask Dependency

• Good PEB Sensitivity~1nm/C

• Good Defectivity

130L

325P

130

iso

L

negative focus best focus positive focus

Page 2: AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities worldwide ... AR1682J available viscosities PEB-sensitivity 0.97nm/°C. AR1682J Superior

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

Line Edge Roughness / Line width Roughness Target CD: 90nm dense LineNA:0.75, Annular illumination (0.89/0.50)Substrate: organic BARC. AR1682J: 270nm film thickness

Defectivity Target: Bridge and blob defectivity - Lot-to-lotInspection tool: KLA2351Pattern size: 110nm dense Line

Bright Field93%

Dark Field35%

Dark Field25%

Bright Field7%

Bright Field LER: 3.0nm LWR: 5.0nm

Dark Field LER: 2.5nm LWR: 4.8nm

Excellent LER/LEW in bright and dark field!

No mask dependency!

Consistent low defect count through different batches.

Bridge & Blob Defect

Page 3: AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities worldwide ... AR1682J available viscosities PEB-sensitivity 0.97nm/°C. AR1682J Superior

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

Consistent low defect count through different batches.

Post Exposure Bake sensitivity Target CD: 90nm dense LineNA:0.75, Annular illumination (0.89/0.50)Substrate: organic BARCAR1682J: 270nm film thickness

Improved process control by small PEBsensitivity!

PEB: 107C/60s PEB: 110C/60s PEB: 112C/60s PEB: 115C/60s PEB: 118C/60s

AR1682J available viscosities

PEB-sensitivity0.97nm/°C

Page 4: AR1682J - JSR Micro · AR1682J Superior versatile 193nm Photoresist sold in large uantities worldwide ... AR1682J available viscosities PEB-sensitivity 0.97nm/°C. AR1682J Superior

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

AR1682JSuperior versatile 193nm Photoresist

sold in large quantities worldwide

90nm node

Target CD: 100nm dense and semi-dense Line NA:0.75, Annular illumination (0.89/0.50) Substrate: organic BARCAR1682J: 320nm film thickness

65nm node Target CD: 80nm dense lineNA:0.75, Dipole illumination (0.89/0.59)Substrate: organic BARCAR1682J: 210nm film thickness

Focus Latitude

100L

250P

100L

200P

negative focus best focus positive focus

Superior litho performance at tight features!

For more information, please contact [email protected]

SC A

RF V1

80L1

6P

JSR YOKKAICHI

JSR LEUVEN

JSR SINGAPORE

JSR TOKYO (HQ)

JSR SUNNYVALE


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