UHV-EL %£>Ultra High Vacuum Compatible ***Reference Elements, Compounds,Alloys,Glasses and Minerals forMicro and Macro AnalysisSEM/X-RAY, EPMA, XRF, SURFACE ANALYSIS (Auger, SIMS, XPS)

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UHV-EL-37Packaged lor shipppingin our 2' VACU-STORR

under vacuumUHV-EL-37Circular RetainerStandard Configuration

UHV-EL-XRectangular RetainerCustom Configuration Only

GELLERMICROANALYTICALLABORATORY

ISO-9000ComplianceStandards

Suitable for:• Energy and

wavelengthdispersiveEPMA x-rayanalysis

• X-ray Fluores¬

cence• X-ray Photo¬

electron Spec¬

troscopy• Secondary Ion

Mass Spec¬

troscopy• Auger Electron

Spectroscopy

ISO -9000 COMPLIANCE INFORMATION ONHIGHPURITY REFERENCE MATERIALS FORMICRO AND MACRO ANALYSIS.

To be in compliance with ISO-9000 requires thecalibration of instruments if those instruments areused to make measurements for research or produc¬

tion purposes. The accuracy of those measurementsdictate what type of analytical equipment is required,and to what degree of calibration (accuracy, precision,and frequency of calibration) is needed. Referencestandards are necessary for energy scale andintensity calibration of electron, mass, and x-rayspectrometers. ISO-9000 (per ISO Guide 25) requireslaboratory instruments be calibrated using standardsfrom the following sources. The listing is from most toleast desirable.. Certified Reference Materials: those from a

national standards laboratory such as: NIST(National Institute of Standards of and Technol¬ogy), and the NPL (National Physical Laboratory,England). Standards traceable to a national laboratory (suchas some of those from Geller MicroAnalyticalLaboratory). Standards that have been the subject of an inter¬

company or inter-laboratory round-robin. Internal standards that have permanenceThere are very few reference materials (RMs)

available from national laboratories for microbeamanalysis techniques. Many RMs are available forapplications such as x-ray fluorescence, but these arenot guaranteed homogeneous to the micrometerscale.

The UHV-EL STANDARDS OFFER. Appropriate for spectral and intensity references inthe following spectroscopies; Auger,X-rayPhotoelectron Spectroscopy, SEM/X-ray, ElectronProbe Microanalysis, etc.... Ultra high vacuum (UHV) compatible (10'1° torr)construction. No epoxy or other high vaporpressure contaminating materials used. Retainersmachined from SS304.. Custom mounting bases for various instrumentsincluding; AMRAY, Cambridge (LEO), Zeiss,Philips, PHI, VG, Kratos, etc.. Each RM is individually and separately:. prepared from bulk or powdered materials.. polished individually to prevent cross¬

contamination.. removable and re-insertable into the retainer.. Vacuum desiccator (VUS-2) for shipment.WHY USE STANDARDS?. SEM/X-raySpectroscopists working with electron microprobe(EPMA) analyzers routinely use standards to deter¬

mine the proper Bragg diffraction angles for theirspectrometer, peak shapes, and reference intensitiesfor quantitative analysis. The accuracy of theiranalyses are routinely within 1-2% (relative). Quanti¬tative analysis based upon standardless techniques,which may normalize the concentrations to100%, giveno indication that some elements may not be ac¬

counted for or represent an oxide phase. In ourexperience, errors with standardless analysis can

range from a few % for common metal alloys (such asstainless steels) to as much as 200% for oxides.Errors can be predicted by analyzing standards asunknowns.. SURFACE ANALYSIS

Standards for surface analysis have been moredifficult to obtain since surface cleanliness, finish,oxidation state, cross contamination, and generalmaterial availability have been limited. Commonlyavailable (epoxy mounted) x-ray analysis standardsshould not be used in UHV systems due to mountingmaterial outgassing, and lack of conductivity whencarbon coatings are sputtered removed.

Spectroscopists have commonly used sensitivityfactors from published reference data (books andtechnical papers). This practice inherently limits theaccuracy of their analysis since these factors shouldbe determined on one’s own instrument since everyspectrometer has its own transmission and resolutionfunction.

RMs supplied with the UHV-EL, which contain onlyUHV compatible components, can be used tocharacterize electron energy spectrometer transmis¬

sion, determine peak shapes, binding energies andsensitivity factors for quantitative analysis.

CONSTRUCTION & STANDARD PREPARATIONThe SS304 retainer is precision machined by

numerically controlled tools. The UHV-EL-37 circularretainer is laser engraved to help locate the desiredRM. The standards are loaded from the back of themount against a reference lip.All of the RMs areprecisely referenced within 0.13mm of the mounts topsurface. This recess helps protects the RM’s surfacesfrom contamination and scratching. The recess alsominimizes the possibility of x-ray fluorescence and ionsputter re-deposition.The RMs (which vary inthickness) are retained by SS304 clips which areinserted from the bottom of the mount. If an RMsurface gets roughened from excessive ion beamsputtering or is too heavily oxidized, it can easily beremoved and replaced by you. Tools for removal andinsertion of new RMs, as well as extra retaining clipsare provided.

The high purity materials we offer are among thebest available. We size and polish each according tothe properties of that material. You will find an abso¬

lute minimum of embedded abrasives. Standard setsfrom other manufacturers, which are polished as anentirety, suffer from poor surface finish on somematerials. The polishing technique used in this caserepresents a compromise where you will often findembedded abrasive and smearing of the softer ma¬

terials onto harder ones. Our way takes longer. Webelieve it is better.

Each of our RMs is a full 3mm in diameter, with theentire surface usable as a standard. If bulk materialsare not available we obtain the largest crystallinechunks or powder grains available.These materialsare mixed with silver flake, pressed, and thenpolished. What results is an analyte (the referencematerial) surrounded by an excellent heat absorbingand electrically conductive media.The silver can alsobe used as a standard. For some sulfides, which reactwith silver, we use tin flake as a substitute.

GellerMicroAnalyticalLaboratoryoffers severalunique productsand analyticalservices. Devel¬

oped out of theneed to supportour own labora¬

tory and ourcustomers’

needs.

SOME NOTES ABOUT OUR STANDARDSAfter preparing the standards we check them usingour Auger, SEM and electron microprobe instrumentsto verify that the proper material is in its designatedposition. We also examine the specimen surface forappropriate surface finish and use either Auger or x-ray analysis to insure the surface oxide is within acce¬

ptable limits and that there is an absolute minimum ofembedded abrasives.

Some of the powdered standards that are embed¬

ded in either silver or tin have rather small grains. Weget the largest grains available, but sometimes grainsof only a few micrometers are available. In thesecases it is important to position the electron beam ona polished grain surface to avoid exciting the mount¬ing medium.

For XPS and other larger area excitation tech¬

niques not all of our standards are suitable for inten¬

sity measurements, since the area on the standardanalyzed may be larger than the individual grains.They're generally adequate to measure bindingenergies.

To customize your set of RMs, or use our standardUHV-EL-37 configuration, please photocopy the backpage indicating your choice of materials. If you haveany questions at all, we encourage you to call andspeak to one of our experienced staff members. In ourexperience very few standards are sold withoutdiscussion.

USE OF THE STANDARDS AT GELLERMICROANALYTICAL LABORATORY

These standards, and all of our products, weredeveloped for use in our own commercial analyticalservice laboratory, where we provide Auger, ElectronMicroprobe, SEM/X-ray, XPS and metallographic ser¬

vices. Many of our customers require higher accuracyquantitative analysis than is commonly available. Forinstance, when we analyze carbon in SiC, TiC, WC,Mo2C, and TaC we use our RMs as standards todetermine sensitivity factors for Auger analysis or k-ratios for electron probe.Analyses that are often with¬

in a few % relative accuracy are common. It may takea little more time to be correct the first time, but wethink the results are justified.

The enclosed list of standards is updated periodically.A continuously updated list can be found at our website,http://www.gellermicro.com. If there is a standardyou desire that is not listed, please call.

PRODUCTS• MRS-3 Magnification Reference Standard

and Stage Micrometer: a NIST and NPL trace¬

able standard for all types of microscopy (optical,

SEM, video, etc.).. Ion sputtering standards: for calibrating ionetch rates. Si02and Ta205 thin films.. Specimen Holders: for JEOL microscopes,top referencing holder that accommodate two1 1/4” specimens.. Counter-Rota-Cutter : pat. #4,949,605 for lowspeed diamond saws (Buehler ISOMET ,LECO VC-50, & Struer’s Minitom) that allowsyou to cut faster, smoother, and thinner sectionswith less deformation.. Vacu-Storr : vacuum desiccators with holdingtimes up to 5 years! Developed to protect ourUHV-EL standards during shipping and whilein storage.

COMPUTER CONTROL SYSTEMS• Energy-dispersive System upgrades:

Be window upgrades to ultra-thin for B, O and Cdetection. Replacement pulse processors, HVand PC based pulse height analysis boards withcomplete software.. dQant: a replacement EPMA computer andsoftware (Windows) system.

• dPICT: digital photo image collection tool, a PCbased computer system (Windows) for automat¬ing analog SEMs. With its own scan generatorup to 9 images can be digitized simultaneously.. Auger-32: This is a Windows95 replacementcomputer system for the JEOL/Kevex computercontrol system for the JEOL JAMP-10(S) and 30Auger microprobe analyzer.

SERVICESOur staff takes pride in performing state-of-the-artanalyses on difficult specimens and we do our utmostto go beyond just offering analytical data. We interpretthe information, as well. As our satisfied repeat clientsand publications reveal, we have developed severalunique techniques for problem solving. We maintainyour confidentiality with the utmost care as our smallbut capable company concentrates on providing youwith the answers.

. Scanning Electron Microscopy: JEOL 840 withEDS and WDS, and LaB6 source.. Electron Probe Microanalysis: JEOL 733 with 4WDS, EDS, full computer control.. Auger Electron Spectroscopy: JEOLJAMP-10Swith EDS and full computer control.. X-ray Photoelectron Spectroscopy: XPS(ESCA) SSI-X100 small spot analysis.

• Other services: Profilometry (Dektak 3030),Metallography, Optical Microscopy,Particle SizeCounting, Microhardness testing, Critical Dimen¬

sional Measurements.

Our current list of reference materialsshould be included in this brochure. An up-

to-date list can be found at our web site. Ifyou can’t find what you are looking for wemay be able to supply other ReferenceMaterials to suit your needs or customprepare your own materials for the UHV-EL.

[J Geller MicroAnalytical Laboratory426e Boston St. (Rt. 1)Topsfield, MA 01983-1216800 MICRO-LL (642-7655); 508 887-7000; fax 508 887-6671sales@gellermicro.com http://www.gellermicro.com

. GellerMicroAnalytical

Laboratory

UHV-EL-XRectangular Retainer

UHV-EL-37Circular Retainer

For Our Information

Instructions

ORDERING INFORMATION

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Instrument MfgModelTechnique (AES, XPS, etc.).RM Requested (UHV-EL-?)Carbon Coat Insulators?

Your NameCompanyDepartmentAddressCity State Zip.Phone FAX

Please photocopy this page, indicating your choice of retainer and Reference Materials from theprevious page. If you wish to include any materials not listed, please contact us directly foravailability. Again, we are prepared to mount and polish your own special materials inour Metallographic Laboratory.

f; GELLERMICROANALYTICALLABORATORY

426e Boston St. (Rt. 1)Topsfield, MA 01983-1216800 MICRO-LL (642-7655); 508 887-7000; fax 508 887-6671