A new track etchant for plastic detectors

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Abstracts--1 lth ICSSNTD 409 the data obtained to date the authors summarize systematically their interpretation procedures in which is stressed the proper use of observed double peaks of an anomaly, their depth and time gradients for locating ore bodies, and for selecting favourable anomalies for attempting to determine the ore body depth. A NEW TRACK ETCHANT FOR PLASTIC DETECTORS Teha[ Singh, Surinder Singh and H.S. Virk Department of Physics, Guru Nanak Dev University, Amritsar, (India) ABSTRACT Aqueous solutions of NaOH and KOH are commonly used as track etchants in plastics in all laboratories engaged in SSNTD work. Somogyi et al. suggested PEW solution (15 g KOH + 40 gin. C2H5OH + 45 g H20 ) and addition of KMnO4 to alkaline solutions. Hydroxides of alkali metals have been tested for their etching efficiency by various authors. CN and Lexan plastic were irradiated with Cf-252 source. Aqueous solution of Ba (OH)2 8H20 was used for etching fission fragment tracks in plastics. It is observed that this new etchant is as efficient as NaOH and KOH for track revelation.

Transcript of A new track etchant for plastic detectors

Abstracts--1 lth ICSSNTD 409

the data obtained to date the authors summar i ze sys temat i ca l ly the i r in te rpre ta t ion p rocedu re s in which is s t r e s s e d the p roper use of obse rved double peaks of an anomaly, the i r depth and t ime gradients for locating ore bodies , and for se lec t ing favourable anomal ies for a t tempt ing to de te rmine the ore body depth.

A NEW TRACK ETCHANT FOR PLASTIC DETECTORS

Teha[ Singh, Sur inder Singh and H.S. Virk

Depar tment of Phys ics , Guru Nanak Dev Univers i ty , A m r i t s a r , (India)

ABSTRACT

Aqueous solutions of NaOH and KOH are commonly used as t rack etchants in p las t ics in all l abora to r i e s engaged in SSNTD work. Somogyi et al. sugges ted PEW solution (15 g KOH + 40 gin. C2H5OH + 45 g H20 ) and addition of KMnO 4 to alkaline solut ions.

Hydroxides of alkali me ta l s have been tes ted for the i r e tching eff ic iency by var ious au thors .

CN and Lexan plast ic were i r rad ia ted with Cf-252 source . Aqueous solution of Ba (OH)2 8H20 was used for etching f i ss ion f ragment t racks in p las t i c s . It is obse rved

that this new etchant is as eff icient as NaOH and KOH for t rack revela t ion .