A B C Triblock Thin Films for Large-Area Nanolithography
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ABC Triblock Thin Films for Large-Area Nanolithography Principal Investigators Chris Leighton (IRG-3) Marc Hillmyer (IRG-1) Description and Significance Thin films of the ABC triblock terpolymer have been used to prepare nanostructured magnetic films by a simple pattern transfer process. Toshi Kubo and Dr. Ruifang Wang have shown that these triblocks spontaneously align on a variety of metallic substrates upon simple spin coating; no annealing, substrate treatment or external fields are required. These new thin film templates hold great promise for the ready generation of large-area magnetic nanodot arrays for high density storage media applications. Supported in part by UMN MRSEC Award DMR 0212302 (a)Schematic of the initial structure. A 50 nm thick triblock film on a NiFe/Au/Si/SiO2 substrate. (b)AFM image after spin casting of the polymer. (c)AFM image after removal of the cylinders [purple in (a)] by chemical etching. (d)AFM image of the nanostructured NiFe film after Ar ion beam Timothy P. Lodge, University of Minnesota-Twin Cities, DMR 02123
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A B C Triblock Thin Films for Large-Area Nanolithography. Timothy P. Lodge, University of Minnesota-Twin Cities, DMR 0212302. Principal Investigators Chris Leighton (IRG-3) Marc Hillmyer (IRG-1) Description and Significance - PowerPoint PPT Presentation
Transcript of A B C Triblock Thin Films for Large-Area Nanolithography
ABC Triblock Thin Films for Large-Area Nanolithography
Principal Investigators Chris Leighton (IRG-3)Marc Hillmyer (IRG-1)
Description and SignificanceThin films of the ABC triblock terpolymer have been used to prepare nanostructured magnetic films by a simple pattern transfer process. Toshi Kubo and Dr. Ruifang Wang have shown that these triblocks spontaneously align on a variety of metallic substrates upon simple spin coating; no annealing, substrate treatment or external fields are required. These new thin film templates hold great promise for the ready generation of large-area magnetic nanodot arrays for high density storage media applications.
Supported in part by UMN MRSEC Award DMR 0212302
(a) Schematic of the initial structure. A 50 nm thick triblock film on a NiFe/Au/Si/SiO2 substrate.
(b) AFM image after spin casting of the polymer.
(c) AFM image after removal of the cylinders [purple in (a)] by chemical etching.
(d) AFM image of the nanostructured NiFe film after Ar ion beam milling.
Timothy P. Lodge, University of Minnesota-Twin Cities, DMR 0212302
