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VAN ATTAC. M. VAN ATTA
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VACUUM SCIENCE ANDENGINEERINGProperties of Gases at Low Pressure;
Vacuum Measurements;
Design and Operating Features of
Vacuum Pumps and Systems
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VACUUM SCIENCEAND ENGINEERING
Properties of Gases at Low Pressure;
Vacuum Measurements ; Design and OperatingFeatures of Vacuum Pumps and Systems
C. M. VAN ATTAConsultant on Vacuum Technology
McGRAW-HILL BOOK COMPANYNew York San Francisco Toronto London Sydney
FOREWORD
b6->lSi*i2-** ,,._. *^*---.--.^.<.^
HARRIS 'X
6 '3-^ '>2r jifi^
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£ ---^c^ '^
VACUUM SCIENCE AND ENGINEERING
Copyright © 1965 by McGraw-Hill, Inc. All Rights Reserved.Printed in the United States of America. This book, or partsthereof, may not be reproduced in any form without permission ofthe publishers. Library of Congress Catalog Card Number 65-17497
The dynamic character of the vacuum industry caused by the
ever -increasing variety of applications, as well as advances in tech-
nology, clearly presents the need for a current text on vacuum science
and engineering. On two other occasions in the past the author,
Dr. C. M. Van Atta, in conjunction with the Kinney Vacuum Division
of The New York Air Brake Company, saw this need and supplied the
industry with The Design for High Vacuum Systems in 1945 and a
revised edition under the same title in 1958. The presence of manyof these worn, dog-eared manuals on engineers' and scientists' desks,
as well as the great demand for new and replacement copies, stands
as testimony to Dr. Van Atta's success in meeting the needs of prac-
titioners in the field.
By comparison, this new effort
—
Vacuum Science and Engineering—is far superior to and is certainly much more comprehensive than the
prior book. We believe that Dr. Van Atta has achieved in this new
writing a complete and up-to-date coverage of his subject, which
should again meet the needs of the industry and become a standard
text and reference for all those who wish to study or practice in the
field of vacuum science and engineering.
It has been a privilege for the Kinney Vacuum Division to encourage
and support this work. It is with admiration and respect for the
eminently qualified author that we submit this book for your use.
J. E. Chappell, General Manager
Kinney Vacuum Division
The New York Air Brake Company
66854
23456789-MP-9876
PREFACE
Over the past forty years vacuum technology has evolved from an
incidental but essential tool of scientific research to a rapidly growing
branch of engineering. In the 1930s the principal engineering appli-
cation of vacuum technology was in the manufacture of light bulbs
and radio tubes, for which processes ingenious equipment wasdeveloped largely by an empirical approach to the problems of evacu-
ating and surface conditioning. The transition from a research tool
to engineering application was greatly accelerated during WorldWar II, particularly by the multilateral attack on the release of
atomic energy by the Manhattan Project. Many divisions of that
project required the development of vacuum equipment of morediverse and greater capabilities than had ever been contemplated
previously. Subsequently the design and construction of large
particle accelerators for nuclear and high-energy physics and the
development of such processes as vacuum coating, distillation, andmetal degassing made further engineering applications of the vacuumtechnology developed during the war. More recently the require-
ments of controlled thermonuclear research and space simulation have
converted to an engineering scale the techniques of ultrahigh vacuumwhich had previously been applied only to small scale laboratory
experiments.
The process of evolution and growth of vacuum engineering is by nomeans complete. Requirements in many fields of research andmaterials processing are even now inadequately met, either becausethe desired vacuum conditions cannot be reliably attained, or becausethe cost of doing so is excessive. Improved methods of vacuumpumping, surface degassing, and the measurement of low pressuresare needed to meet these present requirements. The role of sorption
(adsorption, absorption, and chemisorption) on surfaces is imperfectly
understood, so that significant further progress will depend upon aconcerted experimental and theoretical effort to understand the basic
phenomena involved in the interaction between gases and surfaces atlow pressure.
Vlll PREFACE
In Vactmm Science and Engineering the objectives are to give in
fairly classical form the scientific basis of vacuum technology, to
describe in some detail the performance characteristics and limitations
of vacuum pumps, gauges for measuring gas pressure, and other
components of vacuum systems, and finally to provide design criteria
in sufficiently general form to be useful in designing vacuum systems
for a wide range of applications. Throughout the text an effort has
been made to describe in some detail the physical processes which
determine the operating features of the various devices which are
discussed. The object in doing so has been to give the reader not
merely a catalogue of typical vacuum components and perform^ance
data, but in addition a basis for judging the importance of various
phenomena which occur in vacuum systems. It is my belief that only
by this approach can one provide guidance for the optimization of
the design of vacuum systems for a variety of uses.
Aside from my own experience in large scale experimental research
and industrial vacuum development, I have drawn heavily upon the
expanding technical literature dealing with vacuum technology.
The emergence of the published proceedings of the American VacuumSociety and its predecessor organizations, and those of the Inter-
national Organization for Vacuum Science and Technology, as well
as such journals as Vacuum (Pergamon Press, London), Le Vide (la
Societe Francaise des Ingenieurs et Techniciens du Vide, Nogent-sur-Marne (Seine) France), and Vakuum-Technik ( Springer-Verlag
OHG, Berlin) has greatly eased the task of locating literature on newdevelopments in vacuum technology. With the kind cooperation of
Dr. J. H. Leek, I have found his excellent book. Pressure Measure-ment in Vacuum Systems (published for the Institute of Physics andthe Physical Society by Chapman and Hall, Ltd., London), most help-
ful in writing Chapter 3 of the text.
It is with deep appreciation that I acknowledge the incentive andsupport provided by the New York Air Brake Company for under-taking the task of writing a book of this character. The critical
comments of R. R. Cyr and Z. C. Dobrowolski of the Kinney VacuumDivision of the company contributed significantly to the final version,
particularly of Chapters 5, 6, 7, and 8 of the text. I am deeplyindebted to Miss Margaret R. Thomas, who not only typed the manu-script with its many revisions, but also maintained order in the grow-ing lists of references, permissions, and credits. I also wish to thankthe many authors, publishers, and vacuum equipment manufacturerswho have responded so generously to requests to use illustrative
material and who, in many cases, have provided the glossy printsnecessary to reproduce photographic illustrations.
C. M. Van Atta
CONTENTS
Foreword
Preface
Chapter 1. The Nature and Behavior of Gases
1-1. The General Gas Law ......1-2. Molecular Constitution and Kinetic Theory of Gases
1-3. Pressure Related to the Average Molecular Kinetic Energy1-4. The Maxwell-Boltzmann Distribution Law1-5. Velocity of Sound in a Gas1-6. Flow of Molecules through a Hole1-7. Molecular Mean Free Path .
1-8. Van der Waals' Equation of State
1-9. Dependence of Viscosity on Molecular Diameter
BEFEBENCES ......Chapter 2. Gas Flow
2-1. Gas Flow in Vacuum Systems2-2. Pumping Speed and Conductance2-3. Viscous Flow—Poiseuille's Law .
2-4. Pressure Drop Formula2-5. Turbulent Flow in Vacuum Systems2-6. Correction to Poiseuille's Law Due to Surface Slip
2-7. Gas Flow in the Transition Pressure Range .
2-8. Gas Flow at Low Pressure ....2-9. Conductance of a Long Tube at Low Pressure
2-10. Conductance of an Aperture2-11. Conductance of a Tube at Low Pressure Corrected for End Effect
2-12. Clausing and Monte Carlo Corrections to the Knudsen Conductance
Formulas .........2-13. Summary of Gas-flow and Conductance Formulas
RErEBENCES .........t^* Chapter 3. Pressure Measurement in Vacuum Systems
3-1. Liquid Manometers ........3-2. The Diaphragm Manometer ......
v
vii
1
4
5
8
11
12
13
15
18
22
23
23
26
30
31
34
36
43
44
47
49
51
57
62
63
65
X CONTENTS
3-3. The Dubrovin Gauge
3-4. The McLeod Gauge .
* 3-5. Thermal Conductivity Gauges
3-6. Hot-cathode Ionization Gauge
)C_3-7. The Bayard-Alpert Ionization Gauge3-8. Hot-cathode Magnetron Ionization Gauge
3-9. Magnetically CoUimated Electron Beam Ionization
3-10. Cold-cathode Ionization Gauges .
3-11. The Alphatron Gauge ....^3-12. The Knudsen Radiometer Gauge
3-13. Calibration of Vacuum Gauges
3-14. General Remarks on Ambiguities of Pressure
Vacuum Systems ....KEFBBBNCES ......
Gauge
Measurement in
Chapter 4. Vacuum Analyzers and Leak Detectors
4-1. Magnetic-deflection Mass Spectrometers
4-2. The Omegatron Mass Spectrometer
4-3. Linear High-frequency Mass Spectrometers
4-4. Halogen Leak Detector
4-5. Leak-detection Techniques .
BErBBBNCES .....Chapter 5. Mechanical Vacuum Pumps
5-1. Functions of Mechanical Pumps ......5-2. General Features of Oil-sealed Mechanical Pumps .
5-3. Pumping Speed of Oil-sealed Mechanical Pumps5-4. The Effect of Condensable Vapor upon Mechanical Pump Perform
ance .........5-5. Gas Ballast .........5-6. Other Methods of Preventing Contamination by Condensables
5-7. Mechanical Booster Pumps ......5-8. Analysis of Mechanical Booster-pump Performance
5-9. Computed Performance Curves for Mechanical Booster Pumps5-10. Measured Performance Curves for Mechanical Booster Pumps5-11. Overheating of Mechanical Booster-pump Rotors .
5-12. Vapor Compressor Action of a Mechanical Booster Pump5-13. Molecular-drag Pumps ......5-14. Axial-flow Molecular Turbine Pump ....
RErBBENCBS ........Chapter 6. Vapor-jet Vacuum Pumps
,6-1. The Steam Ejector
6-2. Diffusion Pumps . . .
6-3. Theoretical Compression Ratio for a Vapor-jet Pump6-4. Working Fluids for Diffusion Pumps
69
78
90
103
107
111
113
122
123
124
128
131
133
143
152
159
161
167
169
169
172
177
179
183
185
186
194
199
202
204
205
214
218
219
227
230
240
CONTENTS XI
6-5. Pumping Speed of Diffusion Pumps 249
6-6. Limiting Forepressure for Diffusion Pumps ..... 254
6-7. Factors Contributing to the Ultimate Pressure of a Diffusion Pump 257
6-8. Fractionation and Purging........ 268
6-9. Resume of Diffusion-pump Performance ..... 272
BBFERENCBS .......... 272
Chapter 7. The Measurement of Pumping Speed
7-1. Alternative Definitions of Pumping Speed ..... 274
7-2. Measurement of Gas Flow ....... 277
7-3. Mechanical Pump Speed Measurements .... 291
jfJ:"^-Measurement of the Pumping Speed of Diffusion Pumps 293
RBFBBENCES . . . . 302
^^-1.
Chapter 8. The Design of Vacuum Systems
The Vacuum Vessel ......... 303
8-2. Demountable Seals 307
8-3. Motion Seals 313
8-4. Vacuum Valves 318
8-5. Vapor Baffles and Traps 328
8-6. Absorption Traps 341
8-7. The Pumpdown Time 348
8-8. Selection of Vacuum Components 358
BEFEBENCES . 362
Chapter 9. Ultrahigh Vacuum
9-1. The Dominance of Surface Phenomena ..... 363
9-2. High-temperature Bakeout . 365
9-3 Metal Gaskets ..... . 370
9-4 Bakeable Valves .... . 378
9-5 Two -region Vacuum Systems . 382
9-6 Getter-ion Pumping .... . 385
9-7 Absorption Pumping.... . 398
9-8 Evaporative Deposition of Reactive Metals . 401
9-9 Cryogenic Pumping .... . 408
9-10 Ultrahigh-vacuum Systems
BEFEBENCES .....APPENDIX I . . . •
APPENDIX II . . .
APPENDIX III .....APPENDIX IV . . . •
APPENDIX V . . . • •
. 434
. 435
. 439
. 440
. 441
. 442
. 445
Author Index.. . 447
Suhject Index . . . . 451
COMMONLY USED SYMBOLS
In some cases it has not been convenient to avoid the use of a symbol for
more than one purpose. The most prevalent meaning of each commonly
used symbol is defined in the following list. Exceptions are clearly indicated
in the text.
a radius of aperture or tube
A area
B magnetic flux density
c nozzle coefficient
C conductance
Cj, specific heat at constant pressure
C^ specific heat at constant volume
D diameter of aperture or tube
e electronic charge
E energy, electric field intensity
/ molecular sticking coefficient, frequency
¥ force
h, height of a column of liquid
R Ho coefficient
ij^ positive ion current
i_ electron current
1 electrical current
Ic gas constant per molecule (Boltzmann constant)
/v conductance factor
L length
m mass of molecule
M molecular weight
n number of molecules per unit volume
Wmoi number of molecules in one mole
N total number of molecules present
p probability of ionization
pressure
gas flow in molecules per second
P
COMMONLY USED SYMBOLS
QRRg
Res
S
t
gas throughput, PdVjdtgeneral gas constant
gas constant per mole, w,,,^]/^
Reynolds numbersensitivity
pumping speed
displacement speed of a mechanical pumppumping speed at the inlet of a pumptime
T temperature
u drift velocity of a gas
U velocity
V velocity
F volume
w mass flow
W power, mass of gas
z number of electronic charges per ion
Z atomic number
a accommodation coefficient
y ratio GJC^e slip coefficient, efficiency
r] viscosity
A mean free path
A free molecular heat conductivity
V number of molecules impinging on one square centimeter of surface in
one second
I molecular diameter
p density, mass per unit volumea collision cross section
T period
VACUUM SCIENCE AND ENGINEERING
I
CHAPTER 1
THE NATURE AND BEHAVIOR OF GASES
1-1. The General Gas Law. Our understanding of the behaviorof permanent gases is based upon the experiments of Boyle, Charles,and Gay-Lussac which lead to the general gas law. Experiments byBoyle resulted in the conclusion that the volume of a body of gas atconstant temperature is inversely proportional to the pressure, whichis equivalent to the expression
PV = const (1-1)
where the pressure is defined as the force per unit area exerted by thegas on the walls of the containing vessel. Charles and Gay-Lussacobserved that if the volume of a body of gas is kept constant and itstemperature varied, the pressure increases linearly with the temper-ature, so that
^1 = -Po(l + aT) (i_2)
in which T is the temperature on any chosen scale, such as centigradeF^is the pressure of the body of gas at zero on the same temperaturescale, and « is a constant. If Eq. (1-2) is multiplied by V^, the initialstandard volume of the gas sample,
PiFo = PoFo(l + ocT) (1.3)
Then if the volume is changed to some other value, such as V, we haveaccordmg to Boyle's law
PV = P„F„(1 + aT) (1.4)
which can be written as
PV = P.V^T + 1/a) (1.5)
The experimental fact is that if the temperature is measured on thecentigrade scale, 1/a = 273.I6°C, that is, the volume of a body of
T^^o^''?*^^^ changes by an amount equal to 1/273.16 of its value
at C for each degree change in temperature. This constant isessentially the same for a large number of gases (hydrogen, helium
2 VACUUM SCIENCE AND ENGINEERING
nitrogen, oxygen, and others) and therefore has very broad signifi-
cance. If one chooses a new temperature scale such that —273.16 C
is zero, then one can write
PV = PoFoaT (1-6)
where now the temperature is measured on the absolute centigrade,
or Kelvin, scale.
The implication of Eq. (1-6) is that the pressure exerted by a gas
at constant volume approaches zero as the temperature approaches
0°K. Although many common gases follow Eq. (1-6) over a wide
Table 1-1. Molecular Weights of Some Common Gases*
Chemical Scale
Chemical formula Molecular weight
Ha 2.016
He 4.003
Xe 20.18
^'2 28.02
Air (mean) 28.98
O2 32.00
Ar 39.94
CO2 44.01
CL 70.91
* See, for example, American Institute of Physics Handbook (McGraw-Hill
Book Company, New York, 1957), pp. 7-9-7-12.
range of temperature and pressure, all real gases depart from this
relationship at sufficiently large values of the pressure and low values
of the temperature. Thus only for an ideal gas would the pressure
actually approach zero as the temperature approaches absolute zero.
Returning to Eq. (1-6), since at constant temperature the product
PV for a given body of gas is constant for a given mass of gas, andsince twice the volume at the same pressure contains twice the mass,
the product PF is proportional to the mass of the body of gas. Thusthe product PF in Eq. (1-6) is proportional not only to the absolute
temperature but also to the mass of the body of gas W, and we maywrite
PV = P,V„^T WRT (1-7)
where i? is a constant of proportionality. Equa,tion (1-7) is one formof the general gas law which describes the behavior of an ideal gas
and is approximately correct for many common gases over a widerange of practical conditions.
Further understanding of the nature of gases was contributed byAvogadro, who demonstrated experimentally that at the same
THE NATUEE AND BEHAVIOR OF GASES 3
temperature and pressure the mass of a standard volume of gas is pro-portional to its chemical combining (or molecular) weight. Consistentwith Avogadro's law, precise experiments have shown that understandard conditions of temperature (0°C or 273.16°K) and pressure(normal atmospheric pressure defined as 760 torr) 1 gram molecularweight of any gas occupies a volume of 22,415 cm^. This is the volumeoccupied by 32.00 g of oxygen (0^) at STP standard temperature andpressure, which is the arbitrary standard on the chemical scale ofmolecular weights. A partial list of molecular weights of somecommon gases is given in Table 1-1. A more comprehensive table ofmolecular weights of gases is given in Appendix I.
By referring to Eq. (1-7) we can now write the general gas law interms of the molecular weight of the gas, as follows:
^^=|^oT (1-8)
where W = mass of the sample of gasM = molecular weight of the gasB„ = universal gas constant per mole
The ratio W/M is the number of moles (gram molecular weights) ofthe gas present. The numerical value of E^ depends upon the unitsof mass, pressure, volume, and temperature used. If the pressure is
measured in torr, the volume in liters (1 hter = 1,000.027 cm^), andthe temperature in degrees Kelvin, then for 1 mole (W/M = 1) of gas
PV = R,T (i-sa)
Under standard conditions
so that E(, =
P = 760 torr
F = 22,415/1,000.027 = 22.415 liters
T = 273.16°K = 0°C
PV 760 X 22.415
T 273.16= 62.364 torr liters/°K g mole
For the common choices of units the numerical value of E^ is given inTable 1-2. In many situations the mass of a body of gas is of noconcern, but the changes in pressure, volume, and temperature are ofinterest. In this case a convenient form of the general gas law is
PiFi P2F,(1-9)
which follows directly from Eq. (1-8), since for a given body of gasPVjT is a, constant.
4
Table 1-2.
VACUUM SCIENCE AND ENGINEERING
KuMERicAL Values of Bg Gas Constant peb Mole fob Vabious
Systems of Units* f
p V T i?„
dynes/cm^ cm^ "K 8.314 X 10' ergs/°K
newtons/m^ mS °K 8,314 joules/°K
torr cm^ °K 62,364 torr cm'/°K
torr liters °K 62.364 torr liters/°K
atm cm' "K 82.057 atm cm'/°K
psi ftS "R 1,546 lb ft/°R
* In engineering units, 1 lb mole of gas occupies 359 ft' at 32°F and atmos-
pheric pressure (14.67 psi). The Bankine absolute temperature scale is based
upon the Fahrenheit scale for which absolute zero temperature is — 459.69°F.
Thus T °R = T °F + 459.69 just as T °K = T "C + 273.16.
t Sources: W. E. Forsythe, Smithsonian Physical Tables (Smithsonian Insti-
tution, Washington, D.C., 1954, 9th rev. ed.; T. Baumeister (ed.), Marks'
Mechanical Engineers' Handbook (McGraw-Hill Book Company, New York,
1958), 6th ed.
1-2. Molecular Constitution and Kinetic Theory of Gases.
From the time of the Greek philosophers the concept that all matter
is made up of tiny indivisible particles called molecules had been
sporadically put forward to explain one or another of the observed
properties of matter . On the basi s of the experimental results reported
by a number of independent investigators, Avogadro concluded that
equal volumes of all gases under the same conditions of temperature
and pressure contain equal numbers of molecules.
We have already seen that under standard conditions (760 torr
pressure and 0°C) a gram molecular weight of any gas fills a volume of
22.415 hters. The number of molecules contained in this standard
sample of gas is obtained from the precise measurement of the faraday,
F = 96,488 coulomb
the electrical charge necessary to deposit a gram equivalent of a
substance in electrolysis, and the charge on an electron,
e = 1.602 X 10-19 coulombs
which is the unit of ionic charge,
determined quantities
96.488''mol"^.^i —
1.602 X 10-1-
The ratio of these experimentally
6.023 X 1023
is known as Avogadro's number; it is the number of molecules in a
gram molecular weight of a substance, and is therefore the number of
THE NATURE AND BEHAVIOR OF GASES 5
molecules present in 22.415 liters of any gas under normal conditions.The number of molecules in a unit of volume of gas under normalconditions is therefore
ti,
6.023 X 1023=^^^Y5 = ^-^^^ ^ ^^" molecuIes/cm3
It is worthwhile pausing to note the magnitude of this number. Itsmeaning can perhaps be visualized best by noting that if the moleculesin a cubic centimeter of gas under standard conditions were arrangedat the corners of tiny cubic cells, the number of such cells in a centi-meter length would be
(2.687 X lO^")!^ <^ (27 X 10i8)'/iS = 3 x 10"
sothatthedistancebetweenmolecules would be about 3.3 x 10"' cm,which is approximately the average distance between molecules for agas under standard conditions.
Actually, in a gas the molecules are not arranged in a simple patternbut are moving randomly relative to one another. During theirmotion the molecules suffer collisions between themselves and bounceoff one another. The average distance which the molecules movebetween collisions is called the mean free path (A). The moleculesalso impinge on the walls of the confining vessel and bounce back (orare reemitted) from the wall. The momentum transfer from themolecules to the walls of the vessel produces the outward forceexerted by the gas upon the walls of the vessel. This force per unitarea is precisely the pressure which appears in the general gas lawdiscussed in the previous section.
The molecules of an ideal gas may be considered as a first approxi-mation to be elastic spheres about 10"* cm in diameter. The randommotion of the molecules consists of motion in all possible directionswith various individual molecular velocities. As will be shown, thetemperature of the gas determines the mean square velocity (i.e., theaverage value of the square of the velocity) for any particular type ofmolecule and the average kinetic energy for molecules of all types ina mixture of gases. The kinetic theory of gases consists of thestatistical mechanical treatment of the microscopic molecular motionsand leads to a basic understanding of the gross behavior of a gas interms of molecular motions.
1-3. Pressure Related to the Average Molecular KineticEnergy. Consider a box of rectangular cross section filled with apure gas such that the density in the box is n molecules/cm', eachmolecule having a mass of m grams. The two walls of the boxperpendicular to the x axis suffer collisions by molecules by reason of
6 VACUUM SCIENCE AND ENGINEERING
their x component of velocity v^. If the molecules in the box are
moving in a random manner, half will be moving with positive v^
and half with negative v^. Those moving in the positive x direction
with a specific value of v^ will strike the wall in a time ht if they are
contained in a sheet of thickness v^ dt adjacent to the wall. The
number striking a unit area of the surface in the time dt is thus
n^v^ ?)tj2, so that the number striking a unit area in a unit of time is
If each molecule on striking the surface of the contamer experiences
an elastic collision, the magnitude of v^ does not change on collision
with the wall but the direction reverses. The other components of
velocity, f„ and v^, are not changed in the collision since the surface
under consideration is parallel with the yz plane. The change in
momentum of a molecule on striking the wall is thus 2mv^. If in the
above discussion n^ is the number of atoms with x components of
velocity in the range between v^ and v^ + dv^, then the number
striking a unit area each second with the velocity in the range dv^ is
n^v^ dvj2. Therefore the rate of change of momentum for this group
of molecules is
n„v^ dv^[2mv^ n.mvj dv^
For the entire distribution in v^, the total rate of transfer ofmomentum,
and therefore the force per unit of area, is
f*CC
Jo
2 dv^ = nmv^^ (1-10)
where v^^ is the mean square velocity in the x direction. Similarly
P,
nmVy^
and nmv.
Since the motion is random there is no difference in the average
motion in the various coordinate directions, so that
«,/ = V,
V^ = VJ' + V^'' + V,
Vj = }/3V^
Also since
then
and the pressure measured in any direction
P = P^ = P^ = P,= y^nmv^ (1-11)
From this result it is evident that the pressure exerted by a gas is
THE NATURE AND BEHAVIOR OF GASES 7
proportional to the kinetic energy of the molecules contained in aunit volume nmv^j2. If the mass of the molecules is measured ingrams and their velocities in centimeters per second, the pressure is
measured in dynes per square centimeter.
Comparing the expression for the pressure given in Eq. (1-11) withthat of the general gas law given in Eq. (1-8), one concludes that
P = WVM R.T ^/snmv^
If this expression is divided by 2w/3 the result is
since
Introducing
y^mv' = -
i?n
2 VM n 2 Wmoi
Wmol = K —: Ww
k = —- = 1.3805 X 10-i«erg/°K
(1-12)
(1-13)
(1-14)
known as the Boltzmann constant, which is the gas constant permolecule, Eq. (1-13) yields
E = Yzniv^ = %kT (1-15)
i.e., the average kinetic energy of a molecule is proportional to thetemperature, and the energy associated with each coordinate direction(x, y, z) in its motion is therefore A;T/2. Combining (1-15) with (1-12)results in the important fundamental expression
P = %n(}4mv^) = 34n(%kT) = nkT dynes/cm^ (/^bar)
(1-16)
The derivation of the preceding relationships from elementarykinetic theory does not depend upon the molecular mass of the gasinvolved. Remembering that from Avogadro's law equal volumesof gas under the same conditions of temperature and pressure containequal numbers of molecules, it follows that for two different gases
y2miV^^ = J^ma^a^ = /4kT (1-17)If we now define
V, = («;2)'^ (j.jg)
as the root-mean-square velocity, then
^ =W = [m-J(1-19)
Thus, in general, the root-mean-square velocities of molecules of
8 VACUUM SCIENCE AND ENGINEERING
different gases at the same temperatures are inversely proportional
to the square roots of their molecular masses, or of their gram molecular
weights.
From Eq. (1-11) P = nrnv^fZ, so that the value of the root-mean-
square velocity of the molecules in terms of macroscopic parameters is
(V i\M\nml \ p
(1-20)
where p =nm\s the density of the gas in grams per cubic centimeter
and the pressure is in dynes per square centimeter or microbars
(see Sec. 3-1).
1-4. The Maxwell-Boltzmann Distribution Law. In the
discussion of the previous section it was not necessary to inquire into
the distribution in velocity which the molecules of a gas might assume
as a result of mutual collisions. It is clear that even if the molecules
of a gas were to have equal but randomly directed velocities the sub-
sequent elastic collisions would quickly introduce a wide distribution
in velocity. Since in an elastic collision the total kinetic energy of the
particles is preserved, the quantity m{v^^ + v^)l2 is the same before
and after each molecular collision, even if v^ and v^ must change to
satisfy the conservation of momentum. For a body of gas composed
of a large number of molecules, therefore, (m/2) ^ «' remains constantn
even though the individual molecular velocities change because of
mutual collisions. The root-mean-square velocity and therefore also
the pressure exerted by the gas are independent of the velocity
distribution which may result from mutual collisions. Some features
of gas behavior, however, do depend upon the form of the equilibrium
distribution in velocities which gas molecules assume, so that a
knowledge of the velocity distribution is essential to a complete
understanding of the properties of a gas.
The actual distribution in velocity of the molecules of a gas was
deduced by Maxwell and Boltzmann by arguments beyond the scope
of this text. The Maxwell-Boltzmann distribution law expressed in
terms of the velocity in a randomly chosen direction is
^ dn _ 4
\2kTjl.-mv'ltkT (1-21)
The quantity dnfn is the fraction of the total number of molecules in
the velocity range between v and v + dv, bo that dnjn dv is the frac-
tional number of molecules in this velocity range per unit of velocity
range. A plot of /^ is shown in Fig. 1-1. The distribution function
f^ goes to zero at v = because of the w^ term, since at « = the
THE NATURE AND BEHAVIOR OF GASES 9
exponential term is e» = 1. It also goes to zero as v approachesinfinity because of the dominance of the exponential term. For all
values of v between zero and infinity /^ is positive and therefore musthave a maximum value, which is the most probable value of thevelocity.
0.2 0.4 0.6 08 1.0 1.2 14 16 1.8 2.0 22 24 26 2.8 30
V in units of vp
Fig. 1-1. A plot of/„, the Maxwell-Boltzmann velocity distribution function.
By differentiating /^ with respect to v and setting the result equalto zero, the most probable value of the velocity can be determined.
dv
4 / mY"
^\2fcy/ kT ^ '
so that _ l2kTY* \ TO /
(1-22)
The meaning of the most probable value of the velocity is that moremolecules have this value than any other value of the velocity. Themost probable velocity is not, however, the arithmetic average valueof the velocity, which is calculated as follows
/•oo
dv2 l2kT\^
1.128t;.„ (1-23)
Finally, the mean square velocity is obtained from the Maxwell-Boltzmann distribution function by a similar averaging process.
W =:
J»oo
dv
= 3kTTO
(1-24)
IQ VACUUM SCIENCE AND ENGINEEBING
from which the average molecular kinetic energy is
(1-25)
consistent with Eq. (1-15), which was arrived at without consider-
ation of the details of the distribution law. Also from Eq. (1-25)
we have for the root-mean-square velocity
Which of the above velocities is of interest as representing the average
behavior of a gas depends upon the process under consideration.
Table 1-3 provides a convenient summary of these representative
velocities and the numerical factors for converting from one to another.
Table 1-3. Most Pbobable, Average, and Root-mean-squarb Velocities
Equation
2 /2J;TV^^av = —A
1
1.128
1.225
0.887
1.086
XV.
0.816
0.921
The conversion factors in Table 1-3 are so near unity that for many
approximate calculations, it is not necessary to distinguish between
the most probable, the average, and the root-mean-square velocities.
The basic factor (2A;T/m)« appears in all three with numerical factors
which are not very different from one. The average molecular weight
of air (28.98 g/mole) divided by Wmoi, the number of molecules in a gram
molecular weight, gives for the average mass of an air molecule
28.98
6.023 X 10^34.81 X 10-" g
Using this average molecular mass and the value of h given in Eq.
(1-14), the most probable velocity of an air molecule at 68°r ( = 20°C
= 293°K) is
^ (
2 X 1.371 X 10-^- X 293f ^^^ ^ ^^,
\ 4.81 X 10-23 /
THE NATURE AND BEHAVIOR OF GASES 11
Correspondingly for this case
v^y = 1.128 X 4.09 X 10* = 4.61 x 10* cm/sec
and V, = 1.225 x 4.09 x 10* = 5.01 x 10* cm/sec
In general, the above basic factor may be written in terms of the massof a molecule of unit molecular weight, m^ = 1.66 x 10-^*
g
/2kTY_ /2kY( TY
2 X 1.38 X io-i«\^/y
1.66 X 10-2*
•vA/ y Y^
( T\A= 1.29 X 10*177) cm/sec (1-27)
when T is expressed in degrees Kelvin and M in grams per mole.1-5. Velocity of Sound in a Gas. A velocity closely related to
those discussed above is the velocity of sound in a gas, which accordingto elementary texts on sound is given by
(t7
in which
(1-28)
(1-29)
where C^ is the specific heat of a gas at constant pressure and G^ is
the specific heat at constant volume. According to the kinetic theoryof gases the value of y is simply related to the number of degrees offreedom of the molecule in terms of the independent coordinates ofmotion (three represented by x, y, and 2), the axes of rotation, and themodes of vibration. The result is that for the common gases, themolecules of which are monatomic (one atom per molecule), diatomic(two atoms per molecule), or polyatomic (more than two atoms permolecule), the predicted values of y are respectively % = 1.66, % =1.40, and % = 1.33. The observed values of y for a number ofcommon gases are given in Table 1-4. The velocity of sound is
_ lykTf\ m I
- (ir- (1-30)
J2 VACUUM SCIENCE AND ENGINEEKING
For air at 68°F = 20°C, therefore,
v^ = 0.837 X 4.09 X 10* = 3.43 X 10* cm/sec
= 1121 ft/sec = 770 mi/hr
and in general the speed of sound in a gas is of the order of three-
fourths the average speed (vav) of the gas molecules. It is evident
from Eq. (1-30) that the sound speed is independent of the density (n)
of the gas, but is proportional to the square root of the temperature
as is the average molecular velocity.
Table 1-4. Observed Values of y fob Common Gases
Diatomic
Air 1-401
Hydrogen 1-408
Nitrogen 1-402
Oxygen 1-400
Carbon monoxide ... . 1.401
Monatomic
Helium 1-63
Argon 1.667
Krypton 1-66
Mercury (vapor) . . 1.66
Polyatomic
Ozone 1-29
• Water (vapor) .... 1.305
Carbon dioxide ... . 1.300
Ammonia 1.336
1-6. Flow of Molecules through a Hole. A quantity of some
interest in vacuum technology is the number of molecules which
strike a surface in a unit of time. It can be shown that the number
of gas molecules which impinge on each unit of surface area of the walls
of a containing vessel during a second is given by^-*
V = yinvav ~ 2^1 m /
molecules/cm^ sec (1-31)
in which the value of v^y given in (1-23) is substituted. The above
result can be applied to the calculation of the rate of flow of molecules
through a tiny hole in a very thin plate. If a tiny hole of area, A is
cut in the thin wall of the vessel beyond which the gas density is
zero, the rate at which molecules of gas leave the vessel is
^ = ''^=2^1"-^)nA /2kT\
2^\~m"j
= 3.64 X W^iTIMY'^nA molecules/sec (1-32)
References indicated by superscript numbers are listed at the end of the
chapter.
THE NATURE AND BEHAVIOB OF GASES 13
by reference to Eq. (1-27) when n is in molecules per cubic centimeterand A is in square centimeters. The volume of gas at the pressure
in the vessel escaping each second is obtained by dividing the molec-ular flow rate q by the density n, so that
dV q Av JT\^= 3.64 X 10^ — A
dt n n \M cm^/see (1-33)
which for air at 0°C would be
dV_
11= 3.64 X 10^
/ 273 \^
\28.98/
11.2^ liters/sec (1-34)
For the flow rate through a hole to agree with this value the thicknessof the wall at the point where the hole perforates the wall and thediameter of the hole must be small as compared with the mean freepath for collisions between the molecules, a dimension to be definedand evaluated in the next section.
1-7. Molecular Mean Free Path. The concept of the mean free
path of the molecules in a gas is of considerable practical importancein defining the behavior of a gas in a vacuum system. As waspreviously mentioned, the molecules of a gas may be considered to
act in a first approximation as if they were elastic spheres of diameterof the order of 10-^ cm. Let us designate the molecular diameter ofa particular gas as | and attempt to calculate the distance a moleculewill travel on the average before undergoing a collision with anothermolecule.
A molecule having a velocity v moves a distance v dt in the time dt.
The molecule under consideration suffers a collision with anothermolecule if anywhere its center is within the distance f , the moleculardiameter, of the center of another molecule and therefore sweeps outthe volume
dV=TTPvdt (1-35)
Since there are n molecules/cm', the volume associated with onemolecule on the average is l/n cm^. Thus when the volume in Eq.(1-35) becomes equal to l/n, it must contain on the average one othermolecule and a collision has occurred. That is, for a collision to occuron the average
1- = TTi^VT, (1-36)
when dt = t„, the average time between collisions.
14 VACUUM SCIENCE AND ENGINEERING
The mean free path is the distance traveled, that is, A = vt^
corresponding to Eq. (1-36) and is therefore
A =TTWl*
(1-37)
Although the above derivation gives the correct general dependence
of the mean free path on the density and molecular diameter, it is
oversimplified by not taking into consideration the fact that the
molecules have a distribution in velocity and that not only the refer-
ence molecule but also all others are in motion. The exact calcu-
lation, ^ which will not be given here, introduces a factor of 25^ in the
denominator so that the corrected value for the mean free path is
kT
P =nkT
(1-38)
since from (1-16)
The mean free path is thus inversely proportional to the molecular
density and to the square of the molecular diameter. Alternatively,
it is proportional to the temperature and inversely proportional to
the pressure. As the pressure in a vacuum system decreases during
pumpdown, the mean free path changes from the order of 7 x 10"* cm
at atmospheric pressure to about 5,000 cm at a pressure of 10"* torr.
Values of the mean free path for various gases, determined from Eq.
(1-38) using values of the molecular diameter f deduced from two
different types of measurement, are given in Appendixes II and III.
The mean free path is a parameter which enters into the determina-
tion of the flow of gases under the influence of pressure difference. If
the mean free path is short as compared with the diameter of a tube
through which the gas is flowing, collisions between molecules will
predominate and collisions with the walls of the tube will occur only
for those molecules which are close to the walls. The flow dominated
by intermolecular collision is referred to as viscous flow because the
flow pattern is that of a viscous fluid. However, if the mean free
path is long as compared with the diameter of the tube, collisions of
the molecules with the walls predominate and intermolecular col-
lisions are not important. In this latter regime the molecules moveindependently of one another and nothing like viscous flow occurs.
The molecules move randomly in straight lines, colliding with the
walls of the tube and proceeding in a chaotic manner. On the
average, more molecules move from a region of higher density (or
pressure) to a region of lower density for purely statistical reasons.
This process is referred to as molecular flow. When the mean free
THE NATURE AND BEHAVIOR OF GASES 15
path is of the same order as the dimensions of the tube, both types of
collisions are important and the flow is of intermediate character.
The range of pressure over which the flow is not strictly viscous or
molecular is referred to as the transition region. Flow rates for this
pressure regime will be discussed in a later section.
1-8. Van der Waals' Equation of State. From the general gas
law as stated in Eq. (1-8) one concludes that at T = 0°K and finite
pressure the volume of the gas becomes zero. This conclusion is in
contradiction to the concept of a definite molecular diameter, i,
discussed in the previous section. Clearly the gas cannot be compressedto a volume smaller than that occupied by the
tightly packed molecules without destroying the __
structure of the molecules themselves. Even be-
fore this extremely compact arrangement of the
molecules is reached the assumption of entirely
random motion would no longer be valid because
of the restrictive effect of collisions between closely
spaced molecules. Moreover, the finite size of
each molecule eliminates a certain amount of
volume which cannot be occupied by anothercolliding molecule, no matter how low the molecu-lar density may be. Consider a molecule A whichundergoes a collision by molecule B moving in a given direction, asshown in Fig. 1-2. The center of the molecule B can lie anywhereoutside the hemisphere of radius |, the molecular diameter, but can-not lie inside this hemisphere because of the collision process. Thecenter of molecule B is therefore excluded from the volume
Fig. 1-2. Exclusionvolume in molecular
collisions.
V^ = %7Ti^ (1-39)
Such an exclusion volume is associated with each molecule so that thevolume available for random motion of the molecules is not V, thevolume of the vessel, but is V - b where
b = VzttNP (1-40)
which is a volume four times that of the N molecules present.The general gas law is also based upon the assumption that there are
no forces acting between the molecules of a gas until a collision occursand that the force acting between the molecules during impact is anelastic force similar to that between two colliding billiard balls. How-ever, it is known, for example, from the behavior of condensed gasesthat definite attractive forces act between molecules. Surface tensionIS an evidence of the existence of such forces. The origin of the
16 VACUUM SCIENCE AND ENGINEERING
attractive force is the mutual electrical polarization of one molecule
by another and the attraction between the resulting electrical dipoles.
This attractive force is relatively long-range in terms of the molecular
separation distances over which it remains effective and is referred to as
the Van der Waals force.
Van der Waals, largely on an empirical basis, had proposed an
equation of state for gases of the form
{^-v)^^b) = RT (1-41)
which differs from the general gas law for perfect gases in the correction
term AjV^ added to the pressure due to the attractive forces between
the molecules and the subtraction of b from the volume to allow for the
region in space from which the molecules are excluded by one another
because of their finite dimensions. By multiplying out Van der Waals'
equation and rearranging terms one has
PV / A\A \ 1_
V(1-42)
plus terms of higher order such as b^jV, etc., which are negligible.
It has been shown* that Van der Waals' empirical equation (1-41) is
consistent with the equation of state for an imperfect gas calculated
from basic assumptions about the intermolecular forces to terms of as
high an order as we normally need to consider.
For our present purposes it is instructive to write Van der Waals'
equation (1-41) in descending powers of F as follows
F3 V^ + jVAb = (1-43)
This is a cubic in V for any given values of T and P. In Fig. 1-3 are
plotted typical isothermal curves (pressure versus volume) for various
values of temperature. For sufficiently small values of the pressure
and temperature there are three values of the volume, corresponding
to Eq. (1-43), for a given value of the pressure as represented by the
horizontal dotted line in Fig. 1-3 passing through the points i,j, and k.
However, when the temperature is sufficiently high the isothermal curve
has only one root. The critical point is that indicated at c where for
specific values of temperature, pressure, and volume all three roots of
the equation are equal. At this point
(7 _ 7^)3 = F* - 37^7, + 3FF,2 _ F/ = (1-44)
THE NATURE AND BEHAVIOR OF GASES 17
in order that all three roots be equal. Comparing the coefficients of
(1-44) with those of (1-43) we see that
3F. = 6RT.
3F.2 F„3:Ab
Po"
P,'
P,
from which the critical point is defined as that for which
F„ = 36A
27627'.=
8t7
276^(1-45)
Conversely, one can solve for A, b, and R in terms of the "triple point"
parameters and find that
F 8P F^ = 3F,''P, 6=-!-^ -R = ^7^' ° 3 3T,
(1-46)
Returning to the form of Van der Waals' equation given in (1-42),
it is evident that for large values of the temperature the term b in the
coefficient (6 — AjRT) dominates and the pressure is higher than that
of a perfect gas. Alternatively, when the temperature is very low,
the term AjRT dominates and the
pressure is less than that for a per-
fect gas.
In Fig. 1-3 the behavior of the
isothermal curves (dependence of
pressure on volume for a constant
value of the temperature) above
and below the critical temperature
is shown. Curves for tempera-
tures below the critical tempera-
ture represent three domains. Atthe high-pressure end of the curve
the substance is condensed in the
form of a liquid. When the pres-
sure has been reduced to a critical
value, some of the substance evap-
orates to form a vapor. From the
point i to the point k on the iso-
thermal curve the actual behaviorof the substance does not follow
the Van der Waals equation witha minimum and a maximum in the
pressure. In the mixture domain „ i o rr, •i it j nr i
• „,, Fig. 1-3. Typical Van der Waals iso-the pressure remams constant as thermal curves for various values ofthe volume is increased until all the temperature.
18 VACUUM SCIENCE AND ENGINEERING
the liquid is converted into vapor. This is illustrated by the horizontal
straight line from i to k. After the liquid is all evaporated, the pressure
decreases as the volume is further increased in a manner somewhat
similar to the behavior of a permanent gas. In this third, or vapor,
domain the behavior differs from that of a permanent gas in that it does
not quite follow the general gas law since the Aj V^ and b terms of Eq.
(1-41) do not become negligible until the volume has become quite
large and the pressure small as compared with their values at the
point k.
At the critical temperature the isothermal curve passes through the
triple point where the region of liquid-vapor mixture has narrowed
down to a zero range in pressure. At all values of the temperature
above the critical temperature there is no condensation of the substance
into a liquid so that for all values of the pressure, no matter how large,
no condensation occurs. This is the condition in which the substance
is called a permanent gas. The higher the temperature above the
critical temperature the more nearly does the PV curve approach that
of a perfect gas as represented by the general law, Eq. (1-8).
All substances conform approximately to the behavior described
above, the difference being in the values of the parameters given in
Eqs. (1-45) and (1-46).
In Appendix II values of the critical temperature, the Van der Waals
parameters A and b, the molecular diameter | calculated by Eq. (1-40),
and the mean free path calculated by Eq. (1-38) are given for several
gases and vapors.
1-9. Dependence of Viscosity on Molecular Diameter.Because the molecules of a gas have an appreciable cross section for
collision determined by the molecular diameter discussed in Sec. 1-7,
the flow of a gas through a tube or hole due to a pressure difference is
characterized by a viscous drag. The viscosity of a gas can be derived
in terms of the molecular diameter, which also determines the meanfree path and the correction to the volume term in Van der Waals'
equation of state.
Viscous forces appear when there is a variation in the drift or flow
velocity of a gas from point to point. Such variations will occur
whenever gas flows through a tube because of the maintenance of a
pressure difference, the gas flowing from a region of high pressure to one
of low pressure. Our quantitative understanding of viscosity origi-
nated in the work of Newton, who assumed that the internal viscous
forces are directly proportional to the velocity gradient in the fluid.
Consider a body of gas, as shown in Fig. 1-4, between two parallel
plates separated by a distance w, with the lower plate at rest and the
upper plate pulled to the right with a force F. The drift velocity of
THE NATURE AND BEHAVIOR OF GASES 19
the gas in contact with the lower plate is zero, whereas that in contact
with the upper plate is m„, the velocity of the upper plate. The drift
velocity of the gas u at some intermediate point is proportional to the
distance y from the stationary plate, so that
- = — ory w w
(1-47)
The drift velocity u is superimposed upon the random velocity of the
molecules and in most physical situations is much less than the average
molecular velocity.
The assumption of direct proportionality for the above equation is
consistent with that of Newton and has been confirmed experimentally
for gases over a wide range of pres-
sure and for liquids. In the case
of a gas the uniform velocity gra-
dient can be understood in terms
of the transfer of momentum from
one layer of gas to the adjacent
layer. In order to approximate
the momentum transfer we note
that molecules on the average
move up or down because of their
random motions a distance A, the
mean free path. Molecules from a distance A above move down into
the layer under consideration with a momentum given by
y + ^(mu). = m Wy
w
'
W/^^X^^W^^^/^^X^/^/Z/W//^1 u. ^y
11/j%mMm^^^%^^%^^^%;^^,Fig. 1-4. Drift velocity distribution
due to viscous forces.
(1-48)
However, molecules from the layer at the height y — ^ also move into
the higher layer at y with a momentum
(mu)_ = m u„w
(1-49)
In the random motion one-third of the molecules may be regarded as
moving in the vertical direction and one-third each in the directions
parallel and perpendicular to the motion. Only the one-third movingm the vertical direction contribute to a transfer of momentum betweenthe layers. Of these one-half are moving upward and one-half down-ward. If Va,v is the average random velocity of the molecules, thenumber crossing an area A is the number contained in the volumeAva.yt and moving in the required direction. If the total number ofmolecules per cubic centimeter is n, then the number crossing from
20 VACUUM SCIENCE AND ENGINEERING
above during the time A< is KnAv^v M and the momentum transfer is
I 3
Ap_^ = HnAva,v('mu)+ A< = Hnm Ave.yU„ A< (1-50)
Similarly, the transfer upward across the boundary due to molecules
moving upward is
A2)_ = }4nAva,y(mu)_ M = Hnm Avs.yU„ M (1-51)
The total increase in the momentum of the gas below the boundary is
the difference between these two quantities, so that
nmXAva,yU„,^p = ^p+ - AiJ_ =——— M (1-52)
Since the rate of change in momentum is the force acting on the gas
below the boundary by that above.
F = -r- = }/inmVa,\X—-
A< w(1-53)
By definition the coefficient of viscosity is the ratio between the
tangential force per unit area divided by the resultant velocity gradient
dujdy of the shear motion in the fluid. In this case
»?=
which according to (1-53) is
FjA FjA
dujdy ujw
rj = HnmVavX
(1-54)
(1-55)
Substituting the value of the mean free path A given in (1-38), we find
the viscosity of a gas is
' 3(2)'^77|2
in which f is again the molecular diameter. According to Eq. (1-23)
the average molecular velocity is
2 /2fcT\^'av =-u—Va,y
tt'-^V m /
so that n2 /mjfcn^_ 0.667 /mfen^^
37Tf'\—) ^1^ I—) (1-57)
From Eq. (1-56) it can readily be seen that the dimensions of viscosity
are mass/length x time. In the cgs system the unit of viscosity is
1 poise = 1 g/cm sec = 1 dyne sec/cm^.
THE NATURE AND BEHAVIOR OF GASES 21
The above calculation of the viscosity is only approximate since the
ndom motion of the molecules is treated inexactly by assuming
that the molecules all move in their random motion with the average
thermal velocity and since every molecule is assumed to travel a
distance equal to the mean free path between collisions. When the
distribution in random velocities and the distribution in free paths are
taken into account, the problem becomes much more complicated and
the solution can be arrived, at only by successive approximations.*'^
The result of the calculation for rigid, elastic, spherical molecules is
that the viscosity is
, 0.499 mvav 0.499 pvav ,, ,„,, = 0.499 «vA ^ -^^p;j^ =^^^ (1-58)
where p = nm is the density in g/cm*. Accepting this latter result we
then have instead of Eq. (1-57)
0.998 /mA;T\^(1-59)
Equation (1-59) provides another basis for measurement of the
molecular diameters of various gases. Solving for the molecular
diameter,
_ 0.999 /mkTY'i\i4
(1-60)
from which the cross section for collisions between the molecules of a
gas is
0.998 /mA;T\'^a= 77|2
r] \ TT-) (1-61)
Substituting numerical values for k and tt and the molecular weight Mfor Wmoim = 6.023 x lO^* ^ ^^ ^j^g following numerical results are
obtained
:
5.22 X 10-11M
and 8.52 X 10-21
iv)
(MT)H
cm
cm'
(1-62)
(1-63)
Experimental values of the viscosity for several gases are given in
Appendix III together with computed values of the molecular diameterf from Eq. (1-62) and of the mean free path A from Eq. (1-38). Thesevalues of f and A based upon viscosity measurements should becompared with those given in Appendix II based upon the experimentalvalues of the Van der Waals parameter b.
22 VACXJUM SCIENCE AND BNGINEEBING
The above result is rather surprising in two respects. The viscosity
of a gas is predicted to be independent of the density and to increase
as the square root of the temperature, whereas in the case of common
liquids the viscosity is known to decrease as the temperature is
increased. Also for two different gases the viscosities at some standard
temperature should be proportional to the square roots of their molec-
ular weights. As surprising as these results may be, experimental
measurements of the viscosity of gases confirm them for a wide range
of temperatures and pressures. However, at extreme values of the
pressure, both high and low, the viscosity of a gas departs from this
prediction. At very high pressure the average distance between the
molecules is so small that the intermolecular forces become important
and the momentum transfer differs markedly from that assumed above.
At values of the pressure which are so low that the mean free path
exceeds the distance between the walls, colUsions between molecules
only rarely occur so that collisions with the walls predominate. In this
case there is no transfer of momentum directly from one layer of gas to
another, but only between the moving gas and the walls of the tube or
vessel. Thus, as mentioned in Sec. 1-7, the mean free path is a
characteristic dimension which determines the behavior of a gas and
in particular determines whether the gas exhibits the property of viscous
or of molecular flow.
The flow of gas due to a pressure difference will be discussed in the
next chapter. In that discussion the relative magnitude of the mean
free path as compared with the dimensions of the tube or passage
through which the flow occurs will be of basic importance.
REFERENCES
1. L. B. Loeb, Kinetic Theory of Gases (McGraw-Hill Book Company, New York,
1927), pp. 94-96.
2. Ibid., pp. 86-88.
3. J. C. Slater and N. H. Frank, Introduction to Theoretical Physics (McGraw-
Hill Book Company, New York, 1933), pp. 462-465.
4. S. Chapman, Phil. Trans. Roy. Soc. London 211 A, 433 (1912); 216A, 279
(1916); 217A, 115 (1918).
5. D. Enskog, Kinetische Theorie der Vorgange in massig verdilnnten Gasen,
Dissertation, Uppsala, 1917.
CHAPTER 2
GAS FLOW
2-1. Gas Flow in Vacuum Systems. An understanding of gas
flow over a very wide range of pressure is essential to an intelligent
approach to vacuum-system design. A system is generally at atmos-
pheric pressure initially, is then "roughed out" by mechanical vacuum
pumps, and is flnally evacuated to the desired limiting pressure by
diffusion pumps with an appropriate arrangement of water-cooled
baffles or cold traps. The mean free path of the gas in the system is
initially very smaU (about 7 x 10-" cm), as discussed in Sec. 1-7,
so that the dimensions of the pipes and manifolds are many times the
mean free path and the flow of gas is limited by viscosity. When very
low pressures are finally attained, the mean free path may be large
(perhaps hundreds or thousands of centimeters, depending upon the
pressure attained), so that the dimensions of the pipes and manifolds
are then a very small fraction of the mean free path of the molecules.
Viscosity then no longer characterizes the gas flow, which is then
referred to as molecular flow. At some value of the pressure, depending
upon the cross-sectional dimensions of the particular part of the system
under consideration, the molecular mean free path is about equal to
those dimensions and the flow is neither purely viscous nor purely
molecular in character. This is the transition region for which the
equations for gas flow are rather complex.
The characteristics of viscous and molecular flow will be developed
in some detail in this chapter, and a number of formulas of practical
interest given. The transition region will be discussed qualitatively
to illustrate the approximate behavior of gas flow in this range of
pressure. In addition, the conductance formulas so essential for the
design of vacuum systems to meet specifications will be developed.
Applications to typicd vacuum-system situations will be made in Chap.
8, dealing with vacuum-system design.
2-2. Pumping Speed and Conductance. Before proceedingWith a detailed discussion of the characteristics of gas flow it will beuseful to define the terms pumping speed and conductance as used in
"Vacuum-system design.
23
24 VACUUM SCIENCE AND ENGINEERING
The prime movers in vacuum systems are the mechanical vacuum
pumps, steam or oil vapor ejectors, diffusion pumps, and a variety of
specialized pumping devices, such as ion and getter pumps. These
devices all remove gas from the system to be evacuated at a rate which
is measured by the pumping speed Sj,, which is defined as the volume of
gas per unit of time dVldt which the pumping device removes from the
system at the pressure existing at the inlet to the pumping device.
The common units of pumping speed are liters per second, cubic feet
per minute (cfm), and cubic meters per hour; several other combinations
of volume and time are used occasionally. A convenient table of
conversion factors for these units is given in Appendix IV.
The gas flow into a pumping device, called the throughput, is
defined as the product of the pumping speed and the inlet pressure,
I.e.
Q = P,A = ^idV~di
(2-1)
Q = ^'7dt
d
"dtiW)^BoTdWM dt
by reference to (1- 8). Thus the mass flow is
dWdt
for which the common units are torr liters per second, torr cubic feet
per minute, // liters per second (n = micron = 10"^ torr), listed with
conversion factors in Appendix IV. The throughput is proportional to
the mass flow of gas since under conditions of steady flow such that the
pressure is constantdV rl /W \ R.TdW
(2-2)
(2-3)
The flow of gas entering the pump from the vessel being evacuated
generally passes through a series of pipes or conduits which present a
resistance to flow, so that between any two points along the flow path
(e.g., between the ends of a pipe leading to the pump) a pressure
difference will exist. In fact, a net flow will occur only if such a
pressure difference does exist. By analogy with an electrical circuit,
the conductance between two points along the flow path is so defined
that the quantity of gas flowing through the system is the product of
the conductance and the pressure diff'erence, i.e.,
Q = (P,- P,)G (2-4)
Since Q is the quantity of gas per unit of time entering the pipe or
conduit at the pressure Pj, then if no additional gas leaks into or is
removed from the pipe between the points of interest this same quantityof gas comes out the pipe at pressure P^.
GAS FLOW 25
The pumping speed of a vacuum pump according to (2-1) is 8^, =QlPm- By analogy with this expression it is convenient to define the
pumping speed at any point in a vacuum system as
S = Q(2-5)
where Q is the gas flow in the system and P is the gas pressure at the
point at which the pumping speed is defined. In the case of an opening
or pipe through which the quantity of gas Q is flowing from a region at
pressure Pi to a region at Pj, the pumping speeds at the two points in
the system are given by
so that P -^
and
and
Sn = T^
QP = — (2-6)
Substituting these values of P^ and Pa into (2-4), the result is
Dividing through by Q and rearranging terms leads to
1
8,
1 1
c(2-7)
Thus the pumping speed at any point in the system can be obtained fromthe known pumping speed at some other point and the conductance of
the portion of the system (pipes, holes, or passages) in between. Inparticular, for the combination of a pump of pumping speed 8„ and a
pipe of conductance G the combined pumping speed is, by analogy.
or
1
8^
8 =
1 1
8, + C(2-8)
By reasoning similar to that given above, it can easily be shown thatlor several openings, pipes, or conduits in series, each with individual
conductances G^, G^, C3, etc., the combined conductance is given by
- (series) = — + —G G\ Cj C,
+ (2-9)
26 VACUUM SCIENCE AND ENGINEERING
Also for several openings or pipes in parallel, so that the gas flow divides
between them, the combined conductance is
C (parallel) = Ci + C^ + C3 (2-10)
The analogy with the conductance in an electrical circuit is obvious.
The performance of a vacuum system is normally calculated by first
determining or assuming the total gas flow Q to be expected, then
choosing a combination of pumping speed and conductance such that
the desired working pressure can be maintained. The individual
conductances of components {G^, C^, C^, etc.) are first determined, then
the combined conductance is calculated by some combination of Eqs.
(2-9) and (2-10), and finally the pumping speed is calculated by (2-8).
This resulting pumping speed 8 for the system must then satisfy (2-5)
when Q is the gas flow expected from the vacuum process concerned and
P is the specified pressure to be maintained. The definition of
pumping speed under more complex conditions involving the out-
gassing of surfaces at reduced pressure, residual leaks into the system,
and variation of the pressure with time is discussed in Chap. 7.
2-3. Viscous Flow—Poiseuille's Law. The characteristics of
flow of highly viscous liquids, such as "heavy" oil or molasses, have
been observed qualitatively by nearly everyone. The flow rate of such
a hquid through a tube is proportional to the pressure difference causing
the flow and to a high power of the diameter of the tube. This same
tj^e of behavior occurs for gas flow at relatively high density. The
formulas governing gas flow under these conditions will now be
discussed.
Consider the flow of gas through a long tube of uniform circular
cross section (see Fig. 2-1). Between the ends of a segment of this
tube a pressure difference Pj — P^ exists, and gas flow occurs along
the tube from the region of higher to that of lower pressure, i.e., from
Pj to Pj. The gas contained within a thin-walled cylinder of radius
r and wall thickness dr, and within a differential length dx of the tube,
experiences a force in the direction of flow given by the cross-sectional
area 2Trr dr multiplied by the pressure difference 8P, so that
^F = 2^r8PJ^r (2-11)
The flow quickly reaches a steady
state in which an equilibrium
. I exists between this force and the
L viscous forces from the gas, both
at smaller and larger values of
Fig. 2-1. Viscous flow through a tube, the radius. The gas nearer the
GAS FLOW 27
center moves faster, and that farther from the center, and thus nearer
the wall, moves more slowly than that in our sample cylinder. Thecomponent of force due to the faster-moving gas just inside the
cylinder under consideration can be written by reference to the defini-
tion of viscosity given in Eq. (1-54) as
P,dv
where rj = coefficient of viscosity of the gas
;Sf = surface area of the cylinder
dvjdr = velocity gradient
S = 277r Sx is the area of interest, and the viscous force due to the
inside gas is thus
^ „ dvFf = -27T7]r dx— (2-12)
where the negative sign arises because the velocity v decreases as r
increases. The corresponding viscous force due to the more slowly
moving gas outside the cylinder under consideration is
P„ = 27Tw(r + 8r) 8x(^]\dr/r+ar
However, a,t r + dr the value of the velocity is i; + (dvjdr) dr, so that
v\ d I ^^s \
r/r+ir dr\ dr I
dv\
Tr)
and P, = 27Tri{r + dr) dx—\v+^drdr\ dr
(2-13)
Equilibrium will occur when the force due to the pressure difference
given in Eq. (2-11) is just balanced by the sum of the viscous forcesF^ and P„ given in Eqs. (2-12) and (2-13), so that
277r dP dr = -27Tri dx
which yields
rdP
dv, , , d ( dv \
'dr-^"^^-^drV^dr^n.
^ I , dv , d^v d^v „— ZTTf) dx\dr-—y r dr 1- ^— dr^\ dr dr^ dr^
,(dv d^v d^v \
28 VACUUM SCIENCE AND ENGINEERING
If we drop {d^jdr^) dr as being a small term of higher order than the
remaining terms we have
1 dP dH \dv ,„ , .-• =
1(2-14)
r] dx dr^ r dr
It is easily seen that a solution of (2-14) is of the form v = A + Br^
and that the particular solution of interest is
A - 1 dP.
(2-15)
4jy ox
in which ^ is a constant determined by the boundary conditions. In
the event that there is no motion of the gas
in contact with the wall of the tube then
?; = at r = a, and in this case
4:r) ox(2-16)
Fig. 2-2. Velocity as a
function of the radius in
viscous flow through a
tube.
According to (2-16) the gas velocity as a
function of the radius is parabolic with maxi-
mum velocity Vraa.y. = {\r)){dPldx)a^ on the
axis (r = 0) and zero velocity at the wall
(r = a) as illustrated in Fig. 2-2.
The volume of gas flowing through the
cross section of the tube each second is obtained by integrating Eq.
(2-16) across the cross section of the tube, so that the flow in volume F
of gas per unit of time is
—- = 2iTrvdr =——-] (a^
dt Jr=0 ^n dxJr=0
If we define the gas flow as in (2-2), then from Eq. (2-17) we have for
the gas flow through the cross section of the tube
r^)rdr=^'-^ (2-17)8?^ ox
^dt 8r] dx
(2-18)
If we now extend the pressure drop under consideration to a length Lof the tube, where L = j dx, then
Q =na^j^ri P(dPjdx) dx
fJodx
na*
l6r]L(Px' - P^') (2-19)
This is one form of Poiseuille's law describing the flow of a viscous,
compressible fluid through a tube of circular cross section.
GAS FLOW 29
Since Pj^ - P^^ = (Pj - P2)(Pi + Pa), and since we define Pay =(Pj + P2)/2, Poiseuille's law can also be written as
QTra*
-* av(Pi ParZ)*
Pav(Pi (2-20)8rjL "'' ' " 128»;L
where D = 2a is the diameter of the tube. As this equation is written
the pressure is measured in dynes per square centimeter and the radius
(or diameter) and length of the tube in centimeters. The quantity Qis thus measured in (dynes/cm^)(cm^/sec) = microbar cm^/sec, since
10* djrnes/cm^ by definition is equal to 750.06 torr = 1 bar.
Referring to the definition of conductance given in Eq. (2-4), it
follows from (2-20) that the conductance of a tube of circular cross
section at high gas pressure is
C(cm3/sec)=^-^^=^Pa. (2-21)
in which the quantities are all in basic (cgs) units, i.e., the dimensions
D and L are in centimeters, -q is in poises, and Pav is measured in
dynes per square centimeter. Since 10* dynes/cm^ = 750.06 torr
(mm Hg), the expression for the conductance in (2-21) becomes
ttD* 10* D*^ (^«^^/^^^) = m^ ^- ^ 7^6 = ^'' ^ ^- ^^-''^^
when the pressure Pav is measured in torr. A more usual unit of
conductance is liters per second, for which (2-21) becomes
C (liters/sec) = lO-V (cm^/sec) = 3.27 x IO-2— PavriL
(2-226)
in which the pressure is again in torr, the dimensions L and D are in
centimeters, and the viscosity is in poises. Finally, since 1 ft^ =28.3 liters, 1 in. = 2.54 cm, and 12 in. = 1 ft,
C (cfm) = 3.27 X 10-^^ Pav X^^rjL 1 min
2.54 cmVlin.
Ift^ 1ft
28.3 liters 12 in.
= 9.46 X 10-2— Pav (2-22c)
m which the diameter is measured in inches, the length of the tube infeet, the viscosity in poises, and the pressure in torr.
The viscosities of various gases at a temperature of 20°C are givenin Appendix III. For the particular case of air at 20°C = 68°F the
30 VACUUM SCIENCE AND ENGINEEKING
viscosity is 1.829 X lO"* poise, so that in this case (2-226) becomes
C (liters/sec)(air at 20°C) = 179— Pav (2-23a)
in which the pressure is in torr and D and L are in centimeters. Corre-
spondingly, (2-22c) becomes
C (cfm)(air at 20°C) = 517— Pav (2-236)Ij
in which the pressure is in torr, D in inches, and L in feet.
2-4. Pressure Drop Formula. From Eqs. (2-23a) and (2-236)
a convenient "pressure drop" formula can be derived which provides
guidance in the selection of a pipe size to be used for pumping air with
a mechanical vacuum pump. Since by definitions (2-1) and (2-4)
Q = PmS^ and Q = (Pi - P,)G,
P -P,^^ = ±-9Il. (2-24)
for air at 20°C, according to (2-23a). If a pipe of diameter D is
connected to a mechanical vacuum pump of pumping speed Sj,, then,
since the pressure at the pump inlet is the same as P^, the gas flow into
the pump is Q = PiSj,, so that
If for the efficient utilization of the pump capacity the rule is adopted
that the pressure drop in the pipe must not be greater than one-fifth
the pump inlet pressure, since Pav = (Pi + P2)/2, then the quantity
2P,0.9 to 1.0 (2-26)
Pav Pi "T P2
is approximately unity, as long as the rule stated for selection of pipe
sizes is followed. Thus (2-25) yields for the approximate value of
Pressure drop (torr) =1 S^
5.6X10-"%^179 D*
when Sj, is in liters per second and D andL are in centimeters
Pressure drop (torr)517 D*
1.9 X 10-»
(2-27a)
Similarly
(2-276)
if Sj, is in cubic feet per minute, D in inches, and L in feet. These
expressions provide a means of obtaining a rough check on the selection
of the proper size for a given operating pressure range. If the pressure
drop so calculated is not small as compared with the desired operating
pressure, a larger pipe size must be selected.
GAS FLOW 31
2-5. Turbulent Flow in Vacuum Systems. The flow of a fluid
through a tube may be characterized by the dimensionless number
pvDRe
V(2-28)
where p = density of the fluid
V = flow velocity
D = diameter of the tube
rj = viscosity of the fluid
This is known as the Reynolds number. As the fiow velocity increases,
the Reynolds number increases and the pressure difiference betweentwo points along the tube increases consistently with Eq. (2-20) (where
Q = ttD^PvI4:) until the Reynolds number exceeds a critical value.
When Re > 2,000 (approximately), then the character of the flow
changes. Instead of flowing in a smooth pattern of continuous flow
lines characterized by viscous flow, the fluid becomes turbulent anderratic with the appearance of eddies and oscillations . This is turbulent
flow, the onset of which can be predicted for any fluid by evaluating
the Rejmolds number. The transition from viscous to turbulent flowwill occur for any fluid approximately in the range 1,000 > Re < 2,000.
For Re < 1,000 the flow is nearly always viscous in character andfollows Poiseuille's law. When Re > 2,000 the flow is nearly alwaysturbulent in character, in which case the pressiire difference betweentwo points along the tube no longer is given by Poiseuille's law (2-20),
but becomes erratic in value and greater than that corresponding to
viscous flow. At what exact value of the Reynolds number the flow
becomes turbulent depends upon the roughness of the surface of thetube and other factors, but in any case is in the range 1,000 to 2,000.
The throughput may be expressed in terms of the Reynolds numberas follows
:
QtD^
PvttD^ fjHe rjl
But since from (1-8) p = WjV
pD
PMjR^T
77,?P„T
ReZ)
(2-29)
For air at 20°C, r] = 1.829 x lO^* poise, R^ = 62.364 torr liters/°K,T = 293.16°K, and M = 28.98 so that
Q (air 20°C) = "L(1-829 x 10-^)(62.364)(293.16)
^^ ^4 .28.98
= 9.06 X 10-2 Re D torr liters/sec (2-30)
when D is measured in centimeters.
32 VACUUM SCIENCE AND ENGINEERING
If we assume that turbulence sets in at Re = 2,000, then the critical
throughput above which the flow will be turbulent is
Q, = ISlDtorr liters/sec (2-31)
Situations do develop in vacuum practice in which turbulence occurs.
Consider the case in which a vacuum tank has been evacuated to a very
low pressure, and then air is admitted by opening a valve to atmospheric
pressure. To be specific, assume that the valve is connected to the
vacuum tank by a tube 1 cm in bore diameter and 10 cm in length.
According to (2.19) and (2-23a) the throughput will be
Q179 Z)*
(P,^ - p^)
Initially P^* < Pi'' so that according to Poiseuille's law
Q = i7^Ho(760)2 = 5.17 X 10' torr liters/sec
whereas according to (2-31) turbulence occurs for any value of through-
put greater than Q„ which for our chosen example is just 181 torr liters/
sec. Thus initially, when the pressure Pj in the tank is low, the in-
rushing air will experience turbulent flow. The flow will continue to
be turbulent until the internal pressure has reached a value such that
e = Oo or
1^^0(7602 - Pa^) = 181
that is, until Pj = 759.5 torr, so that turbulent flow occurs essentially
for the entire period of admitting air to the vacuum tank since the
throughput does not drop below the critical value for turbulent flow
until the pressure in the tank is within about 0.5 torr of atmospheric
pressure.
However, when pumping situations are considered, the occurrence
of throughput in excess of the critical value for turbulence is not usual
and in any case does not lead to the need for design alterations. At
low pressure, the throughput is automatically low since in the region of
viscous flow the throughput depends upon the square of the pressure.
The question is then whether the flow during the roughing-down period
of a system is turbulent during the early (high-pressure) portion of the
pumpdown cycle when a reasonable combination of mechanical pumpdisplacement and connecting pipe is used. According to the criterion
suggested in Sec, 2-4, the pressure drop in the pipeline should not
exceed one-fifth of the pump inlet pressure when the system is at the
operating level. Consider a system for which the mechanical pumpmust maintain a base pressure of 0.05 torr, so that the pressure drop in
the pipeline should not exceed 0.01 torr. To be ouite specific, let us
GAS FLOW 33
assume that a mechanical pump of 110 cfm or about 50 liters/sec
displacement speed is to be used and the connecting pipe length is 2 m.The pumping speed of such a mechanical pump at a pressure of 0.05 torr
is about 38 liters/sec. (See Chap. 5 for mechanical vacuum-pumpcharacteristics.) Then according to (2-27a)
0.01 = 1 38 X 200
179 D*
so that the appropriate internal pipe diameter is
D = 8.1 cm = 3.3 in.
Now assuming that the connecting pipe has an inside diameter of
8.1 cm and length of 200 cm, the question is whether pumping downthe system from atmospheric pressure will result in turbulent flow for
some portion of the pumpdown cycle. Since at high pressure thepumping speed will be nearly equal to the theoretical displacementspeed of the pump, the pumping speed S^ s» 50 liters/sec. From Eq.(2-23a)
Z)<Q = S,P = C(P, - Pi) = 179— P,y(P, - P,)
D*= 179— P(O.Ol)Ij
for the conditions described above. From (2-31) the critical throughputis
Z)<Q, = 1812) = 179 -— P,(0.01)
jj
so that turbulence will be present during the pumpdown until thepressure
181 LP^= ^- 102 = 38.5 torr
179 Z)3
is reached, below which the flow will be viscous. At this value of thepressure the pipe conductance, according to (2-23a), is
D*C (at P = 38.5 torr) = 179 -— (38.5)
(8.1)*= 1'79^177T7^(38.5)200'
= 1.46 X 10^ liters/sec
34 VACUUM SCIENCE AND ENGINEERING
The conductance of the connecting pipe at this value of the pressure is
so much larger than the pumping speed of the pump that the speed of
evacuation is not affected by the very small pressure drop (0.01 torr)
in the pipe. Even though turbulence creates a pressure difference
significantly greater than 0.01 torr at higher pressures, from 760 down
to 38.5 torr, the actual speed of evacuation is not measurably decreased
by the presence of turbulence. Thus, as long as the criterion in Sec.
2-4 is followed in the design of the connecting pipe, the occurrence of
turbulent flow during pumpdown does not present any need for altering
the choice of pipe size. Although turbulent flow may be expected to
occur during the early phase of the pumpdown cycle in almost any
vacuum system, the design parameters based upon viscous flow in the
low-pressure range, where the performance is critically dependent upon
the dimensions of the connecting pipe, need not be altered by the
occurrence of turbulent flow in the high-pressure portion of the pump-
down cycle. Turbulent flow therefore does occur in vacuum systems,
but not in a way which imposes any additional design requirement.^
2-6. Correction to Poisseuille's Law Due to Surface Slip.
Poiseuille's law for viscous flow as given in Eq. (2-20) has been confirmed
experimentally over a wide range of gas pressure and tube diameter.
However, as the pressure is decreased for a given diameter of tube, the
flow rate eventually begins to deviate from that predicted by Poiseuille's
law. In the derivation of Poiseuille's law it is assumed that the gas
velocity drops to zero at the tube wall. If this is not the case, but
instead if the gas next to the wall has an appreciable velocity, referred
to as surface slip, then the flow is given by an expression of the form
Q = -^Pav(P.-Pi)(l +128»yL
Pi)( D16^
(2-32)L \l28rj
in which e is the coefficient which determines the velocity of the gas
at the inner surface of the tube.
The interaction of the gas with the walls can be analyzed in terms of
two distinct processes. Some gas molecules in striking the wall
experience specular reflection and thus retain the same component of
velocity in the direction of flow as before the impact. If all molecules
striking the tube wall were to experience specular reflection there
would be no "drag" effect at the wall and the gas velocity would be
uniform over the cross section of the tube. Other molecules strike
microscopic irregularities in the wall and bounce several times. Under
these conditions a molecule may be absorbed by the wall and then
reemitted later with a random distribution in angle and velocity.
GAS FLOW 35
Molecules experiencing absorption and reemission represent a layer ofgas which is at rest next to the wall and provide the viscous dragdiscussed above. It can be shown that the coefiicient e, which definesthis effect, is given by
U R^Tl 2 - /(2-33)
where / is the fraction of molecules which are absorbed and reemitted,and 1 — / is the fraction which are specularly reflected. By substi-tuting this expression into Eq. (2-32) one obtains for the gas flowthrough a tube of circular cross section
Q-128»j
CiPavi>*
16\2 M I
Pl-P2
-f
fD^
Pi
c,D^) (2-34)
where
and
c, =128>;
'^^ ~ 16\2 lW~/ ~ /
(2-35)
(2-36)
When the pressure Pav is sufficiently high, the term c^P^yD^ domi-nates the term c^D^ and the flow follows Poiseuille's law as given inEq. (2-20). When the value of the pressure is such that in (2-34) theterm CiPav-D* is equal to the term c^D^, the character of the flow departssignificantly from that of Poiseuille's law. The pressure for whichthis condition occurs will be referred to as the transition pressure Pjand is given by
c,P,D* = c,D3
or P.=c^D
(2-37)
At pressures significantly below P^ the viscous flow term c^Ps^vD* is
of decreasing importance and the nonviscous term CjD^ dominates.The correction to Poiseuille's law due to slip is therefore negligible atvalues of the pressure which are large as compared with the transitionpressure, but becomes so important below the transition pressure thatthe character of the flow is completely altered.
From (2-34) and the definition for conductance
C = Q C^P^yD* + CaD^
P. -P. (2-38)
36 VACUUM SCIENCE AND ENGINEERING
where Cj and c^ are given by Eqs. (2-35) and (2-36). From the dis-
cussion above and the form of Eq. (2-38), the character of the conduct-
ance of a tube can be seen to change radically, depending upon the
pressure.
1. If the pressure is large compared with P(, the conductance is
given by Eq. (2-21) and is (a) proportional to D*, (6) proportional to
the pressure, and (c) inversely proportional to the viscosity.
2. If the pressure is small compared with P„ the conductance is
(a) proportional to D^, (6) independent of the pressure, and (c) inde-
pendent of the viscosity.
2-7. Gas Flow in the Transition Pressure Range. An exact
treatment of gas flow in the pressure range in which both viscous and
molecular flow are important is difficult and unsatisfactory because the
coefficient of slip, the e which appears in (2-32) and is defined in (2-33),.
is not calculable from first principles. An empirical approach to this
problem was offered by Knudsen^* based upon a series of carefully
controlled experiments on gas flow. Knudsen found experimentally
that the coefficient Cj given in (2-36), which determines the magnitude
of the nonviscous term in the corrected form of Poiseuille's law (2-34),
can be expressed in the form
1 -f fciPav= Kkari
(2-39)2^ av
in which
A-=-«., ^x4(5^f. 3.81X10.(1)" (2-40)12 n^X m J \M]
by substituting the value of Vav given in Eq. (1-23) and the numerical
value for {2kTlm)''^ given in (1-27). The values
and k. 5(i!L)"=1.38xlO-.:?(||n \kT/ rj \ TJ
1.24
(2-41)
(2-42)
were obtained by fitting the experimental results ofmany measurementsof gas flow and pressure difference. At sufficiently small values of
the pressure the terms JfcjPav and AjaPav are both negligible compared
with unity, and1 + fciPa
1 + fc^Pa1
* References indicated by superscript numbers are listed at the end of the
chapter.
GAS FLOW 37
so that K = 3.81 X 103 MIf the empirical expression for c^ at very low pressure given in (2-39)
is compared with the theoretical expression given in (2-36), one finds
that the value of / (the fraction of molecules which are absorbed andreemitted randomly when they hit the wall) is approximately 0.74, andtherefore the fraction specularly reflected is about 0.26. If the
pressure is sufficiently, high the terms k^Pa,^ and k^P&Y are very large
compared with unity and c^ ^ Kikjk^) = 3.07 x lO^TIM)'^. Thecorresponding value of/ is then about 0.85. Thus Knudsen's results
imply that the fraction of molecules absorbed and reemitted, as con-
trasted with those which are specularly reflected, changes slowly in
the transitional pressure region. Including Knudsen's results in the
complete expression for the conductance of a tube given in (2-38), the
final result is
C (cm3/sec) =^ Pav^ + 3.81 x M^f ^-^1^5^^ (2-43)128?? k^Pav L'
in which the values for k^ and fcj are those given in (2-41) and (2-42),
the viscosity is measured in poises, the dimensions in centimeters, the
pressure in dynes per square centimeter {fi bars), the temperature in
degrees Kelvin, and the mass in grams, so that the conductance is
measured in cubic centimeters per second. Converting units to torr
for pressure and to liters for volume, the above expression becomes
C (liter/sec)P Z)*
3.269 X 10-2-^—rj L
3.81T\^ 1 + 1.333 X 103A;iPav D^
333 X lO^jfcoPav i"
ITV^l + 1.
\m) 1 + 1.(2-44)
This latter expression can be written
C- =3.269 10-PavJ>
n3.81
/TWl + 0.1
\m) 1 +0.1
.liliMITf^iP^^DIr])
81(MITf^{P^^DIrj)
(2-45)
The quantity on the left side of (2-45), the conductance multiplied bythe length divided by the cube of the diameter of the tube, is thereforea simple function of the variable Pav-D/»? as shown graphically in Fig.2-3.
Equation (2-45) is of the form
y = ax -\- bex
I + dx(2-46)
38
where
VACUUM SCIENCE AND ENGINEERING
Ly=^C-
X =n
a = 3.269 X 10-2 ^ = 0.181
/MY'
(ff
Differentiating (2-46) with respect to x and setting the resultant
derivative equal to zero determines the value of x at which y has a
minimum value. The result is
3^Tnin — ,.
'b(d 14
(2-47)
Substituting the values of the various quantities into (2-47) yields
(E^) =5.47(^f (2-48)
\ ri /mm \M/
This is the value of Pav£>/»? at which CLjD^ has a minimum value.
According to (1-58) the viscosity is given by
VavT] = 0.499 wmUavA = 1.497 — XP (2-49)
by substituting from (1-11). Thus from (2-49), (1-27), and Table 1-3
1
1.497 «av A
^ ^ = 1.145 X 10^\m) 'l
(2-50a)
when the pressure is measured in dynes per square centimeter (/xbars)
Since 10* dynes/cm^ = 750.06 torr,
1.145 X 10* X 750 X 10"'l]^l \
''Am) \(2-506)
when the pressure is measured in torr. From (2-48) and (2-49) it
follows that at the point of minimum conductance
so that „,n = 1.57i)
-^ (2-51)
(2-52)
That is, when the mean free path of the molecules is 1.57 times the
diameter of the tube, the parameter GLjD^, and therefore also
GAS FLOW 39
the conductance, reaches a minimum. For pressures less than Pminthe conductance increases asymptotically toward the low-pressure value
to be discussed in the next section, and at pressures greater than Pminthe conductance increases with increasing pressure and eventuallybecomes proportional to the pressure as given by Poiseuille's law (2-21).
In (2-37) the transition pressure P, is defined as that value of thepressure for which the viscous term CjD^Pav in the expression for theconductance of a tube given in (2-38) is equal to the nonviscous termC2D^. When (2-38) is compared with (2-45) and (2-46) it is evident
that in the notation of (2-46) when Pav = P(,
exax
dx
Solving this expression for x yields
1
2ad{(be -a) ± [(be - ay + iabdf"'} (2-53)
in which the negative sign leads to a meaningless negative value for x.
Using the positive sign, substituting the values for x, a, b, e, and d given
above into (2-53), and noting that Pav is now the transition pressure
Pj, we have
P.D I T\^^ = ''-Am)^'-''^
By combining (2-54) with (2-506) we obtain
Thus at the transition pressure
8.59
96?7D
D11.14
(2-56)
That is, at the transition pressure the diameter of the tube is about 11
times the molecular mean free path.
Since for air at 20°C the viscosity r] = 1.829 x 10"* poise, the meanfree path according to (2-506) is
A = 8.59/ 293 Y 1
\28.98/
829 X 10-* 5 x 10-3(2-57)P P
where A is given in centimeters and P in torr. Thus for air at roomtemperature the minimum value of the conductance of a tube occursat a pressure
5 X 10-3 5 X 10-3 3.18 X 10-3-i min —
1.57Z> D
40 VACUUM SCIENCE AND ENGINEBBING
in which the pressure is given in torr and the tube diameter in centi-
meters. Correspondingly, in the case of air at room temperature the
transition pressure occurs at
5.57 X 10-2
Ft-5 X 10-3 5 X 10-3 X 11.14
K D D(2-58)
so that, for example, the transition pressure for a tube of i) = 1 cm is
5.57 X 10-2 torr or 55.7 fi. . r
At the transition pressure as defined above, the dependence ot
conductance on pressure is inconveniently complex. The pressure
region over which the conductance changes from predominantly viscous
to predominantly molecular in character can be defined in terms of
(2-45) and (2-46) and is bracketed between an upper limit P„ and a lower
limit Pi. If the first term on the right is much greater than the second
term, the flow is predominantly viscous in character. For convenience
let us require that the first term be greater by a factor of 10. Then
(2-59)ax = 106I + ex
I + dx
Solving this expression for x yields
X = —-{(106c -a) ± [(106c - a)'
2ad40abdf^}
in which, as before, the negative sign leads to a meaningless negative
value of X. Using the positive sign and the values for a, 6, c, and d,
the result is ^ = 948(^f (2-60)
so that, by comparison with (2-55),
P„ = 9.91P, (2-61)
Correspondingly, if the second term on the right side of (2-46) is 10
times the first, then the flow is predominantly molecular in character.
That is,
1 + cx^2-62)lOax = b
I + dx
Solving for the value of x yields
= 10.99rfsM
so that, by comparison with (2-55),
Pi = 0.114P,
(2-63.)
(2-64)
GAS FLOW 41
so that the transition pressure range within which the character of the
flow changes ranges essentially from P„ = lOP, to P, = O.IP,.
For air at 20°C = 293°K,M = 28.98 g, and rj = 1.829 x 10^* poise,
the transition pressure from (2-55) is
293 V-^ 1.829 X 10-4P, (air 20°C) = 95.7 -
28.98,
5.57 X 10-2
D
so that
and
D
lOPt0.557
O.IP,
D
5.57 X 10-3
D
(2-65)
(2-66)
(2-67)
when the pressure is given in torr and the pipe diameter in centimeters.
In Table 2- 1 is given the range of pressure for the transition region for
various pipe sizes in the case of air at 20°C.
Table 2-1. Transition Pressure Ranges for Various Pipe Sizes fob AirAT 20°C
Pipe diameter Transition pressure range, torr
Centimeters Inches Pi Pt Pu
0.254
0.635
1.27
2.54
5.08
10.16
20.3
40.6
0.1
0.25
0.5
1.0
2.0
4.0
8.0
16.0
2.2 X 10-2
8.8 X 10-3
4.4 X 10-3
2.2 X 10-3
1.1 X 10-3
5.5 X 10-4
2.8 X 10-4
1.4 X 10-4
0.22
8.8 X 10-2
4.4 X 10-2
2.2 X 10-2
1.1 X 10-2
5.5 X 10-3
2.8 X 10-3
1.4 X 10-3
2.20
0.88
0.44
0.22
0.11
5.5 X 10-2
2.8 X 10-2
1.4 X 10-2
Also for air at 20°C the conductance of a long tube in the transition
pressure range is obtained bj^ substituting the above constants into
(2-45), with the result
C (liters/sec) = 178.7Pa1)4
12.12252.lPavi)-D3
311.7Pavi)T(2-68)
when the pressure is measured in torr and the dimensions in centimeters.
Note that the first term on the right side of (2-68) is identical to (2-23a)
and is therefore the viscous-flow term. Equation (2-68) may also be
42 VACUUM SCIENCE AND ENGINEERING
written in the formD'
C (liters/sec) = 12.12 ^|l4.74Pav-D +^
1 + 252.lPav-D
311.7Pav£>
where
= 12.12—
G
G = 14.74Pav^ +1 + 252.lPav-P
1 + 311.7Pav-D
(2-69)
(2-70)
At sufficiently large values of the parameter Pav-D the fraction
1 + 252.1 PayJ> 252.1
1 + 311.7Pavi>~ 311.7
= 0.808
which is then negligible as compared with 14.74Pavi>. The first term
in the bracket then dominates, and (2-69) reduces to (2-23a) for viscous
flow. However, when P^^D is very small, the first term becomes
negligible as compared with the second, which approaches unity for
sufficiently small values of the parameter. The value of G is then 1 and
the conductance is given simply by 12.12D3/L, the low-pressure limiting
value of the conductance to be discussed in the next section. In
Table 2-2 are given values ofG from (2-70) as a function of the parameter
Table 2-2. Values of the Factor O fob Vaeious Values
OF THE PaBAMETER P^yD
Air at 20°C
Pe^yD,
torr cm
10-5 0.9994
io-« 0.9957
10-3 0.969
10-2 1.002
10-1 2.289
1 15.55
10 148.2
102 1,475
103 14,740
Pav-D. These values may be obtained from Fig. 2-3 by dividing the
values of the term CL/D» plotted in the graph by the factor 12.12.
In designing a vacuum system in which prolonged operation is
expected to occur in the transition pressure range, calculation of con-
ductances by (2-45) or (2-68) may be justified. However, in most
practical systems the pressure in the forevacuum portion of the system
remains in the viscous-flow regime during the crucial period of opera-
tion, whereas the piping and main chamber beyond the diffusion pump
GAS FLOW 43
pass through the transition region rapidly as the system is pumpeddown. In such cases the laborious calculation of conductance in the
transition pressure range is not justified and the operation of the
system is sufficiently well represented by using the viscous-flow or
Poiseuille form of conductance given in (2-23a to c) from atmospheric
pressure down to the transition pressure P^ and the molecular-flow
form of conductance to be discussed in the next section for values of
the pressure below P^.
r" r rr r rConductance curve from Eqs.(2-45) and (2-68)
[
viscous Term only, as given in t%\Z-Zt^]
/1 1 1 [ill /
/
180
160
140
120
100
80
11
/1
11
/ /00
rrJ
ll J
f
/ /1
1 yf ;
;
1 / 12.12;
/;60
7154"_ ^ 1 , rt: -
iyj 40
1
20^'.-'
LK**
1
'11 _ ^ji
IQ-52 3 5 7jQ-4 2 3 5 7|q-3 2 3 5 7 jq-2 2 3 5 7 ]q-I 2 3 5 7 1
Fig. 2-3. Conductance of a tube as a function of the pressure.
2-8. Gas Flow at Low Pressure. At low pressure, i.e., at valuesof the pressure at which the mean free path for collisions betweenmolecules is long as compared with the dimensions of the tube orconduit through which gas flows, the mechanics of flow are entirely
diff"erent from those at high pressure. The gas molecules move in
random directions with a velocity distribution characteristic of thetemperature as given by the Maxwell-Boltzmann distribution law(1-21), and by pure chance individually progress from one point in thesystem to another. Collisions between molecules are very rare events,whereas collisions with the walls of the system dominate so that themolecules, instead of jostling each other by collision processes, moveindependently of one another. Pressure is not transmitted from one
44 VACUUM SCIENCE AND ENGINEERING
region in the system to another by direct transfer of momentum from
molecule to molecule, thus producing a flow toward the region of lower
pressure; instead, the transfer of momentum is between the molecules
and the walls of the system. In spite of the independent character of
motion of the individual molecules, net flow does nevertheless occur
from the region of higher density (or pressure) to the region of lower
density. Net flow results because the number of molecules leaving a
unit volume of any given region in the system is proportional to the
density in that region, whereas the number arriving in the unit of
volume from elsewhere is proportional to the density in those other
regions. By a purely statistical effect, therefore, net flow is always in
the direction tending to equalize the density everywhere and thus from
regions of higher to regions of lower density or pressure. In the pressure
regime for which the above conditions hold the flow process is called
molecular flow. Approximate formulas for molecular-flow rates
through tubes and apertures of various shapes were developed princi-
pally by Knudsen.^
2-9. Conductance of a Long Tube at Low Pressure. In a
tube through which gas is flowing at very low pressure (see Fig. 2-4)
the molecules move in random straight lines, striking the wall at the
end of each free flight. If the molecules have the Maxwell-Boltzmann
distribution of velocities [Eq.
(1-21)], then the number of gas
molecules impinging on a square
centimeter of surface area each
second is given by Eq. (1-31) as
Fig. 2-4. Motion of molecules at low
pressure.V =
WWav
2n^
1 /2)fcT\^
Thus the number striking the wall each second in the length Az of the
tube is
dn ^n /2kTf
dt Stt'-^V m /
in which s is the periphery of the cross section of the tube, which might
be circular or have any other shape.
If each molecule is completely stopped by the impact at the surface
and then reemitted randomly, there is a net momentum transferred to
the wall of the tube, provided that there is a mean drift velocity u in
the direction of flow. The momentum transferred to the increment of
length Az of the tube will therefore be mu on the average for each
molecule hitting the wall in the segment Az. This momentum transfer
GAS FLOW 45
per second is thus
dp
'di
dnmu—- =
dt
mn (2kT\^^m I 1 su Az2tt^\ m J
(2-72)
Since the rate of change of momentum represents a force exerted bythe gas molecules on the tube A/ = dpjdt, the tube reacts with a
retarding force on the flow of gas of this same magnitude. This
retarding force acts over the cross section of the tube so that the changein pressure is
1 dp(2-73)A A dt
where A is the cross-sectional area of the tube. Combining (2-73) with
(2-72) we have for the change in pressure
mnl2hT\^s277-^ \ m I A
(2-74)
Since, according to Eq. (1-16)
AP"a7
nkT, the pressure gradient is
nkTI m \'^g_ _ P
~i^\^kT) a'^~m \-^i
-^1(2-75)
7T'^\2kT/
The quantity of gas flowing through the tube is
Q = PAu /jh&T cm*/sec (2-76)
from which Pu = QjA. Substituting this expression into (2-75) yields
For an extended section of a tube of uniform cross section
AP/Az = (Pi - Pa)/^
in which Pj and Pj are the values of the pressure at the ends of asection of tube of length L. Substituting this value of AP/Az into
(2-77) and solving for Q gives for the gas flow through a tube of uniformcross section
\ m I
P,A^(2-78)
The above derivation contains the implicit assumption that a uniformdrift velocity u is superimposed upon the random Maxwell-Boltzmanndistribution of the molecules. Knudsen has shown that one shouldmore reasonably assume that the superimposed drift velocity of amolecule is proportional to its thermal or random velocity. On this
46 VACUUM SCIENCE AND ENGINEERING
modified assumption Knudsen found that the numerical factor in
(2-78) must be multiphed by S/Stt, so that the flow along a tube of
uniform cross section is given correctly by
_ _8_ (2JcTf P^ -Pi A^(2-79)
which proves to agree with experimental results. The conductance of
a segment of a long, straight tube of uniform cross section is therefore
Q 8 /2fcr\^^^
'P^^Hp^~ 3^\ m J sLC =
= ^,(1.29xl0^)y ^3.44 X 10V?'\'^^'
_34^/T\^£^liters/:
cm^/sec
(2-80)
by substttuting from (1-27). The conductance of a tube of uniform
circular cross section, for which A^js = ttD^JW, is therefore
C
3.81 X 103[mJ T cm^/sec
IPliters/sec
when D and L are measured in centimeters, and
C = 4.34 cfm
(2-81)
(2-81a)
when B is measured in inches and L in feet. For air at room temper-
ature (20°C)
Ml \ 28.98/
so that
.if,
(7air = (3,810)(3.181)Z)3
i)312.12 X 10^^^
= 12.12-—Li
cm^/sec
liters/sec (2-82)
GAS FLOW 47
when D and L are measured in centimeters, and
Cair = 13.82-— cfm (2-82a)
when D is in inches and L in feet. Equations (2-80) to (2-82) apply to
a segment of length L of a long, straight tube well removed from theends. They also apply to the case of a tube for which the length is
very large as compared with the diameter so that the end effect is
small. If the tube is short, how-ever, an end correction is required
to obtain results which are even
approximately correct.
Consider a tube of circular cross
section and finite length L connect-
ing two regions, one at pressure P^
and the other at pressure P^, as
indicated in Fig. 2-5. If the length
of the tube is decreased to zero,
the result is an aperture of cross-
sectional area A = ttD^I^. Theformula for the conductance of the tube must become equal to that of
the aperture as the length of the tube shrinks to zero. In order to com-plete the derivation of the conductance of a short tube, including endeffects, it is necessary first to derive the conductance of the aperture.
2-10. Conductance of an Aperture. In accordance with (1-32)
the number of molecules which pass through a circular aperture fromthe region at the left is
% (2kTY^ ttD'^
1i = M =im\—) -^
Fig. 2-5. Tube end effects.
277^^
i2kT^
m
\ mD^ molecules/sec (2-83)
Similarly, the number of those which pass through the aperture fromthe region at pressure P^ on the right is given by
, n^7T''^(2kTYq^=v^A=-i--\ Z)2 molecules/sec (2-84)
The net flow from the region at Pj to the region at Pg is then
9' = g-i- ^2 = — I
-:- ) (wi - n^)D^
277 Y D"^
8 \ m /
^i\mkTI
since in each region n = PjkT
(Pj — Pj) molecules/sec (2-85)
48 VACUUM SCIENCE AND ENGINEEBING
If this net flow is put in terms of the volume of gas leaving the
region of higher pressure Pj from which the net flow occurs, then
q (molecules/sec) ^ ^JcT ^^.^^^^
n^ (molecules/cm^) Pi(2-86)
The flow in quantity of gas is defined as Q = (dldt)PV(fihaT cm'/sec)
and in this case from (2-86) is given by
Q = P,±=qkTn.
= !^(?^fZ).(P, _ P„8 \ m /
:)(2-87)
by substitution from (2-85). Referring to (1-27), one finds that this
expression becomes
Q=!^(1.29xlO*)(|)V(Pi-P.)
= 2.86 X 10^ (-^) D%Pi - P2) /^bar cm^/sec (2-88)
The conductivity of a circular aperture is thus
C = QP,-P
= 2.86 X lOM-— I D^ cm^/sec
/ TY2 86 — D^ liters/sec
\MI(2-89)
when D is measured in centimeters, and
C = 39.i/-|f Z)2 cfm (2-89a)
when D is measured in inches. For air at 20°C, since (TIM)'-^' = 3.181,
C = 9.16Z)2 liters/sec (2-90)
when D is measured in centimeters, and
C = 125.31)2 cfm (2-90a)
when D is measured in inches.
Note that the above derivation could have been carried out for an
aperture of any shape since the result given in (2-89) depends only on
the cross-sectional area. In general, the net flow through an aperture
GAS FLOW 49
of area A at low pressure is
q = _L-I 1 J(Pi - Pa) molecules/sec (2-91)
of which (2-85) is a special case. Correspondingly, the gas flow through
an aperture is
= 3.64 X lO'(^) '^(Pi - P2) /^laar cm^/sec (2-92)
Thus the conductivity of an aperture of any shape at low pressure is
/ T'YC = 3.64 X lOH T7I ^ cm^/sec
I TY= 3.641— 1 A liters/sec (2-93)
when A is measured in square centimeters, corresponding to (2-89) for
a circular aperture. Also
C = 49.
i
rp\Vi
cfm (2-93a)
when A is measured in square inches. Again, as in (2-90), for air at
20°C these expressions become
C = 11.6^ liters/sec
when A is measured in square centimeters, and
C = 159A cfm
(2-94)
(2-94a)
when A is measured in square inches.
2-11. Conductance of a Tube at Low Pressure Corrected for
End Effect. Let us return now to the conductance of a tube of
circular cross section and limited length, as shown in Fig. 2-5. Joining
two regions at pressures Pj and Pj respectively, the tube may be
considered as an aperture, the two sides of which are separated and the
tube of length L connected between them. The result is a combination
of two conductances in series, that of the tube C^ and that of the
aperture Co, so that according to (2-9) the resultant conductance is
- =\
or C = 7;——
^
(2-95)
50 VACUUM SCIENCE AND ENGINEERING
in which C^ is given by (2-81) and Cq is given by (2-89). Thus for a
tube of limited length L the conductance at low pressure is
C(3.810)(2.86) X 10<'(TIM)(D^IL)
2.86 X 103(T/Jf)'^Z)2 -f 3.810 X \0^{T jM)'^^ {D'' jL)
= 3.810 X lO''(—1*AD
cm^/sec
3.810y\!^ 2)3
(I)liters/sec (2-96)
when D and L are measured in centimeters, and
when D is measured in inches and L in feet. Comparing this expression
with (2-82) we see that for air at 20°C the conductance of a tube with
the correction for the end effects is
Z)3cm^/secC = 12.12 X 109
L + %
12.12Z>3
liters/secL + %D
when D and L are measured in centimeters, and
7)3
C = 13.82O.llD
cfm
(2-97)
(2-97a)
when D is measured in inches and L in feet.
The above calculation was carried out for a tube of circular cross
section. The conductance of a tube or conduit of uniform cross
section of any shape can be derived by combining the conductances
given in (2-80) and (2-93) in accordance with (2-95), using the appro-
priate values for the cross-sectional area A and the periphery s. Thus,
for a channel of rectangular cross section with sides a and h and length
L, the conductance at low pressure is made up of the two components
C, 9.71 X 103TV a^ft^
and
Ml {a + b)L
rpVA/rpVA
Co = 3.64 X lO^I— I ab
(2-98)'
(2-99)
GAS FLOW 51
which, when combined according to (2-95), yield
a262C 9.71 X 103
' j'VA
W) (a
9.71
(a + b)L
MI (a +b)L +% ab
% ab
liters/sec
cm3/sec
(2-100)
In the case of a long slot in which a ^ b and in which the length L of
the slot in the direction of flow is not necessarily very large as compared
with the width b of the slot,
C 9.71ab^T
Ml L + %bliters/sec (2-101)
Finally, for a long, narrow slot a '^ b, in which the length in the
direction of flow is also large {L > 6), the conductance is
C »"lsab''
liters/sec (2-102)
In Eqs. (2-100) to (2-102) the conductance for air at 20°C is obtained
by setting 9.7l(TjMy-^^ = 30.9, so that, as an example, the conductance
of a slot from (2-102) is
ab^C = 30.9 -— liters/sec (air at 20°C) (2-103)
Ij
Another geometrical form of interest is the annular region betweentwo coaxial tubes, of which the inside diameter of the outer wall is
Dj, and the outside diameter of the inner wall is D2. Considering the
periphery to be made up of the sum of the circumferences of the inner
and outer walls and following a procedure similar to that for a tube as
developed in (2-71) through (2-96), the conductance of an annulus is
found to be
which for air at 20°C is
C = 12.12{D,'
Hi (D, - D,)
D,^)(D, - D,)
liters/sec (2-104)
liters/sec (2-105)
2-12. Clausing and Monte Carlo Corrections to the KnudsenConductance Formulas. The method of Knudsen, by which theabove formulas for conductances at low gas pressure were derived, is
only approximately correct, even for simple tubes and conduits ofuniform cross section. Clausing3 has carried out a much more exact
52 VACUUM SCIENCE AND ENGINEERING
calculation for tubes of circular cross section and has shown that
Knudsen's formula (2-96) gives conductances which are too large for
short tubes (i.e., tubes for which the length is not very much larger
than the diameter). For more complicated configurations, such as
occur in manifolds, baffles, and vapor traps, only very crude approxi-
mations can be made of the conductance using Knudsen's method. In
this case the procedure is to represent the system by a combination of
tubes, slots, and apertures. The individual conductances are computed
and then combined in series or parallel by use of (2-9) or (2-10).
Recently, progress has been made in computing conductances at low
pressure by applying Monte Carlo methods, i.e., by tracing individual
molecules through the system analytically. The availability of large
electronic computing machines has made it possible to trace large
numbers of randomly selected molecules and thereby determine the
conductance from the net behavior of a large sample of molecules.
Davis, Levenson, and Milleron*-^ have carried out a series of Monte
Carlo calculations for the configurations shown in Figs. 2-6 through
2-13 and have compared the computed conductances with carefully
measured values. In the computation a randomly selected entering
molecule is followed by numerical computation. At each collision
with the wall the molecule is assumed to be effectively absorbed and
promptly reemitted. The molecule is then assigned random numbers
to specify the velocity and direction after leaving the wall. The
velocity selection is based on the assumption of a Maxwell-Boltzmann
distribution at the temperature of the wall. The selection of direction
is based upon Lambert's law of emission, i.e., the molecules leaving a
unit area of the wall are distributed in angle according to Ig = /„ cos Q,
where I^ is the number per second leaving at the angle Q with respect
to the normal to the surface and /„ is the number per second leaving
normal to the surface.
Davis, Levenson, and Milleron adopt as a reference the conductance
Co of an aperture of area equal to that of the opening into the geo-
metrical configuration (tube, elbow, baffle system, etc.) being investi-
gated. The computed and measured conductance C is related to Co
by a geometrical factor K such that
C = ZCo (2-106)
The assumptions made in the calculations and the conditions provided
in the experimental arrangement are
:
1. The flow is steady-state with the molecular mean free path long-
as compared with the dimensions of the system.
2. The geometries under study connect effectively infinite volumes,
i.e., volumes large enough so that diffuse flow is not inhibited.
GAS FLOW 53
3. The walls of the geometries are microscopically rough so that
molecules are diffusely reflected according to the cosine law.
For some of the configurations investigated conductances can be
calculated either directly by the formulas developed above or by
combining conductances calculated from these formulas in accordance
with (2-9) and (2-10). As an example, consider the first geometry
investigated, that of a tube of circular cross section, the conductance
of which is given according to Knudsen's method by (2-96). The value
Table 2-3. Knudsen and Clausing Conductance Factors and Ebbor in
Knudsen Factor for Tubes of Vaeious LjD Ratios
L/D Kk Kc Per cent error
1.000 1.000
0.5 0.727 0.672 8.2
1 0.571 0.514 11.1
2 0.400 0.359 11.4
3 0.307 0.281 9.3
4 0.250 0.232 7.8
6 0.182 0.172 5.8
10 0.117 0.114 2.6
20 0.0625 0.0613 2.0
30 0.0425 0.0420 1.2
40 0.0322 0.0319 0.9
50 0.0260 0.0258 0.8
of Co in this case is the conductance of a circular aperture as given in
(2-89). Thus the value of K obtained from Knudsen's formulas for
this case is
C 3.810 Z»3 1
c:Kr
2.86 L
4 D3L +y3D Dl
(2-107)
Clausing's corrected values of this factor K^, arrived at by moreelaborate methods, cannot be expressed analytically but can becompared numerically with values computed from (2-107) as given in
Table 2-3.
In Fig. 2-6 the factors Kj^ and K^ are plotted as a function of the
parameter LID for a simple tube. The values of K computed by theMonte Carlo method and the measured values are also shown onthe graph. For this case it will be noted that the Clausing and Monte<-^arlo computed values are in excellent agreement and that the measuredvalues approximate these results very closely, but are generally lower
54 VACUUM SCIENCE AND ENGINEERING
than those obtained from the Knudsen formula by as much as 11 per
cent. The good agreement obtained in this simple case between the
Monte Carlo and Clausing calculated K factors and the measured values
lends confidence in the results obtained by Davis, Levenson, andMilleron in the more complicated geometries for which the Knudsenand Clausing methods are not so easily applied.
The second geometry investigated by Davis, Levenson, and Milleron
is a 90° elbow, the conductance factor K of which, calculated by the
:oh-A-H
Knudsen Kk
Clausing KcX X Monte Carlo calculations
\ \ Measured values
Calculated byClousing tor tube
Monte Carlo colculotion tor elbow
J Experimental points for elbow
I I I I I I I L.
I 3 5 7
(A + B)/R = L/R
Fig. 2-6. Molecular-flow factors for a
tube. [Taken with permission fromL. L. Levenson, ^N". Milleron, andD. H. Davis, in 1960 Vacuum Sym-posium Transactions (Pergamon Press,
London, 1961).]
Fig. 2-7. Molecular-flow factors for
90° elbow. [Taken with permission
from L. L. Levenson, N. Milleron,
and D. H. Davis, in 1960 Vacuum,Symposium, Transactions (Perga-
mon Press, London, 1961).]
Monte Carlo method, is compared in Fig. 2-7 with that of a tube for
which the length L is equal to the axial length of the elbow A + B.
The computed values of K do not differ significantly from those of a
straight tube such that LjD of the tube is equal to (A + B)ID of the
elbow. (Note that R = Dj2 is used in plotting the figure.) Theconductance measurements are in good agreement with this conclusion.
The importance of this result is that in the low-pressure or molecular-flow regime very little additional resistance to flow is introduced bythe presence of bends in the pipeline. The conductance for a tube withbends is the same as that for an equivalent straight tube with length'
equal to the axial length of the bent tube.
Results for the conductance of a cylindrical annulus are shown inFig. 2-8. In this case the conductance of the aperture calculated
GAS FLOW 55
from (2-93) is
= 2.86 (-j (D,^ - D,^)
(2-108)
The conductance for the annulus
according to the Knudsen method
is given in (2-104). The conduct-
ance factor in this case is then
KkC_ D,-D,
3L Vz{D, - D,)
(2-109)
If the ratio between the inner and
outer diameters of the annulus is
denoted by k = DJD2, then
(2-109) becomes
1 k
L/Dz
Fig. 2-8. Molecular-flow factors for
an annulus. [Taken with permission
from L. L. Levenson, N. Milleron, andD. H. Davis, Le Vide 18, 42 (1963).]
K {\-k)+ HiLjD,)
(2-110)
Values of Kj^ computed for various
values of the parameters k andL/Dj a-re given in Table 2-4 andare shown graphically in Fig. 2-8,
together with values of K com-puted by the Monte Carlo method.It will be noted that deviations of the order of 10 per cent occur betweenthe two calculations, but that the Knudsen formula for the conductivityof an annulus is surprisingly good.
In Figs. 2-9 and 2-10 the molecular-flow factors for various louverand chevron types of baffles are plotted as a function of the ratio oflength to the width of the slots for various baffle angles. Baffles of thechevron type are frequently used in vapor-trap design, the mainlunction of which is the trapping of condensable vapor in vacuum^y^*®nis as is discussed in Chap. 8. The experimental and theoretical(Monte Carlo) results of Davis, Levenson, and Milleron are given in thegures. The 45° chevron is most frequently used in vapor-trap design.he value of Kj^ = CjC^ for such a baffle can be computed according
56 VACUUM SCIENCE AND ENGINEERING
Table 2-4. Knudsen Conductance Factors fob Annuli op Various L/D^AND -Dj/Dj Ratios
LID2k = DJD2
0.25 0.5 0.75 0.90
1.000 1.000 1.000 1.000 1.000
1 0.571 0.500 0.400 0.250 0.118
2 0.400 0.333 0.250 0.143 0.0625
3 0.307 0.250 0.182 0.100 0.0426
4 0.250 0.200 0.143 0.0769 0.0323
6 0.182 0.143 0.100 0.0526 0.0217
10 0.117 0.0909 0.0625 0.0323 0.0132
to Knudsen's formula for the conductance of a long, narrow slot as
given in (2-101), which is applicable if a > rf in Fig. 2-10. The area oi
the aperture is A = ad so that the conductance of the unobstructed
aperture is, according to (2-93),
C„ = 3.64(r- (2-111)
The perpendicular distance between the chevron plates is b = dj2^^
I.O
0.6
04
0.2
• Calculated points
Experimental points
" 60° louver
• 45° louver
• 30° louver
0.4
0.3-
0,2
01
-^ d t~• Calculoted points A A a
Experimental points / / \
° 60° chevron \iV^•45° chevron N \
»30°chevrane=60'
o/d
00 Cole.
10 Exp.o/d
00 Cole.
10 Exp.
Fio. 2-9. Molecular-flow factors for
louver geometries. [Taken with per-mission from L. L. Levenson, N.Milleron, and D. H. Davis, in 1960Vacuum Symposium Transactions(Pergamon Press, London, 1961).]
Fig. 2-10. Molecular-flow factors for
chevron baffle geometries. [Takenwith permission from L. L. Levenson,-
Jf. Milleron, and D. H. Davis, in
1960 Vacuum Symposium Trans-
actions (Pergamon Press, London,1961).]
GAS FLOW 57
and is the width of the slot required for application of the slot formula(2-101). The length of the flow path is iy = 2'-^ d, so that on substi-
tuting into (2-101) the conductance is
^ = ''Am) 2y^d + %m^) = ''''''' (2-112)
The conductance factor is thus computed to be
1.030^K
3.640.28 (2-113)
It is interesting to note that this result is not drastically diff'erent fromthe value 0.25 calculated for a long 45° chevron slot by the MonteCarlo method and shown in the solid curve in Fig. 2-10. The measuredvalues of conductances reported by Levenson and Milleron for the45° chevron baffle are generally about 20 per cent below those computedby the Monte Carlo method. Furthermore, in a practical case cooling
tubes for liquid nitrogen or other refrigerant will be attached to the
baffles with the result that the effective area will be somewhat reduced.
Considering these factors, a realistic value ofK for a carefully designed
chevron baffle is about 0.20. The result given in (2- 1 13) is independentof the number of 45° chevron baffle plates used to fill an aperture of
area A . Since for such a baffle arrangment the length of the flow pathdecreases as the spacing between the plates decreases (and therefore
their number increases), this result is to be expected as long as the
thickness of the plates is inappreciable as compared with their spacing.
In a practical situation it is therefore important to choose a baffle
thickness not more than 5 per cent of the perpendicular spacing betweenthe plates. In Figs. 2-11 through 2-13 the molecular-flow factors
obtained by Davis, Levenson, and Milleron for a variety of useful
geometrical shapes are shown.2-13. Summary of Gas-flow and Conductance Formulas.
The following summary of the gas-flow and conductance formulasderived and discussed in this chapter is provided for convenientreference. The gas flow in vacuum systems is usually maintained bya pump for which the pumping speed <Sj, is defined as the volume perunit of time which the pump removes from the system at the inlet
pressure to the pump. Conversion factors between the various commonunits of pumping speed are given in Appendix IV. The gas flow, orthroughput, into the pump is defined as
Q = PinS, (2-1)
-The common units and conversion factors for throughput are given inAppendix IV.
58 VACUUM SCIENCE AND ENGINEERING
The conductance C between two points in a vacuum is defined such
that
g = (Pi - P,)C (2-4)
in which P^ and P^ are the values of the pressure at the two points in
question. The pumping speed at any point in the system is defined as
'^ = p(2-5)
where P is the pressure at the point where S is defined.
If Si and ^2 are the pumping speeds at points where the pressure
is respectively Pj and Pg, then
1 1
s«
1
c(2-7)
The units for conductance are the same as those for pumping speed.
The pumping speed of a system consisting of a pump of speed S^ with
an interconnecting conductance (a pipe or conduit) of conductance C
is given by 11 1
s >s„ c
or S = (2-8)
If several conductances are connected in series the resultant con-
ductance of the combination is given by
1 11 1- (series) =—+—+ —O Oj (^2 ^S
(2-9)
If several conductances are connected in parallel the resultant con-
ductance is
C(parallel) = Ci + C2 -f C3 + • •• (2-10)
High-pressure or Viscoiis Flow. The pressure region of viscous flow
is that for which the molecular mean free path is short as compared
with the diameter of the pipe or conduit. For these conditions the
conductance of a tube of circular cross section is
C (liters/sec) = 3.27 x 10"rjL
(2-226)
if D and L are measured in centimeters, the viscosity rj is in poises,
and the pressure is in torr, where Pav = (Pi + P2)/2, in which Pj and
GAS ELOW 59
P2 are the values of the pressure at the ends of the tube. It follows
that
C (cfm) = 9.46 X 10~2 _, p^^ (2-22c)rjL
if D is measured in inches, L in feet, rj in poises, and the pressure in
torr. The viscosity for several gases is given in Appendix III.
For air at 68°F = 20°C the viscosity rj = 1.829 x 10-« poises so
that
D*C (liters/sec) = 179 -— Pav (2-23a)
and C (cfm) = 517 —- Pav1j
(2-236)
The following approximate expression for the pressure drop in air along
a pipeline is applicable if the pressure drop is small (say not more
than 20 per cent) as compared with the pressure
:
o r
Pressure drop (torr) = 5.6 x 10~^ -y-^ (2-27a)
when Sj, is measured in liters per second and D and L are measured in
centimeters
;
.S„LPressure drop (torr) = 1.9 x 10"
D*(2-276)
when Sp is measured in cubic feet per minute, D in inches, and L in
feet.
Flow in the Transition Pressure Region. When the gas pressure is
such that the mean free path is of the same order as the cross-sectional
dimensions of the pipe or conduit through which it flows, the con-
ductance of a tube of circular cross section is then given by
C— = 3.269 X 10-2(^)--O^T\^ 1 + 0. 147(J//r)''^ P^yDIv
181(J//T)'^ Pavi>/»?
(2-45)
in which G is measured in liters per second, L and D are in centimeters,
Pav is in torr, T is in °K, M is in grams, and r] is in poises. For air at
20°C the conductance is
7)3/ \ _j_ 252 1 P D\C (liters/sec) ^ 12.12 .^(l4.74 P..D +
^ ^ 3,/,^J (2-69)
For accurate calculation of the conductance of a long tube, these
formulas should be applied over a range of pressure from lOP^ to 0.1 Pj,
60 VACUUM SCIENCE AND ENGINEERING
where P; is the transition pressure given by
P, = 95.7
which for air at 20°C is
MI D
5.57 X 10-2
D
(2-55)
(2-58)
Calculation of conductances by the transition formulas (2-45) and
(2-69) is seldom justified in practice. It generally suffices to use the
viscous-flow value of the conductance as given in (2-22) and (2-23)
from atmospheric pressure down to the transition pressure given in
(2-58) and the molecular-flow conductance such as that given in (2-97)
from the transition pressure on down.
Molecular Flow at Low Pressure. At sufficiently low pressure, i.e.,
when the mean free path is large as compared with the cross-sectional
dimension of the tube or conduit, the conductance is independent of the
pressure. For most purposes the conductance formulas derived partly
empirically by Knudsen are sufficiently accurate. In the following
formulas the linear dimensions are measured in centimeters, areas are
in square centimeters, conductances are in liters per second, temperature
is in degrees Kelvin, and mass is in grams. The values for air are given
at 20°C. The less frequently needed equivalents for conductance in
cubic feet per minute and dimensions in inches and feet are given in the
text.
Circular Aperture
C
C(air) = 9.16i)2
in which D is the diameter of the aperture.
Aperture of Any Shape
C ^ ZM{^fA
C (air) = 11.6^
in which A is the area of the aperture.
Tube of Circular Cross Section
'pVA 2)3
C ^ 3.810(-)
C (air) = 12.12
(2-89)
(2-90)
(2-93)
(2-94)
(2-96)
(2-97)
in which D is the diameter and L the length of the tube.
gas flow
Conduit of Rectangular Cross Section
a^b^C = 9.71
G (air)
[mJ 1m,
30.9-
(a + h)L + %ab
a%^
61
(2-100)
(2-lOOa)(a + b)L + y^ab
in which a and b are the dimensions of the cross section and L is the
length in the direction of flow.
1.0
Fig. 2-11. Molecular-flow factors for
a tube with two restricted ends.
[Taken with permission from L. L.
Levenson, K. Milleron, and D. H.Davis, Le Vide 18, 42 (1963).]
o1 T_.1 I n I /
. _. • Calculated points
I
' —ll-^^ L ° Expenmentol points
U Ll_L_L fnr(R/R/ =
L/Ro
Fig. 2-12. Molecular-flow factors for
a tube with two restricted ends and acircular blocking plate. [Taken with
permission from L. L. Levenson, N.Milleron, and D. H. Davis, in 1960Vacuum Symposium Transactions
(Pergamon Press, London, 1961).]
Slot of Long, Narrow Cross Section a > 6
ab^C = 9
\m]
C (air) = 30.9
L + %b
ab^
L +%bLong, Narrow Slot with a > 6 and L ^b
T
~L
C 9.71IT\M.
C (air) = 30.9
(2-101)
(2-lOla)
(2-102)
(2-103)
VACUUM SCIENCE AND ENGINEERING
Annulxjs between TwoConcentric Tubes
G =
3.810T\^ {D/ - D,^)(D, - D,)
\MI
C (air)
12.12
Fig. 2-13. Molecular-flow factors for
a tube with one restricted end and a
circular blocking plate. [Taken with
permission from L. L. Levenson, N.
Milleron, and D. H. Davis, in 1960
Vacuum Symposium Transactions
(Pergamon Press, London, 1961).]
lations and measurements for someFigs. 2-6 through 2-13.
L + %{D^ - A)(2-104)
{D^ - D,')(D, - -Di)
L + %{D, - D,)
(2-105)
By combinations of the above
formulas the conductances of manycomphcated shapes, such as baffle,
structures, can be roughly approxi-
mated. The Knudsen formulas are
generally only approximate and
for short tubes give conductances
which may be greater than the true
value by as much as 11 per cent.
The results of more accurate calcu-
shapes are given in the text and in
REFERENCES
1. M. Knudsen, Ann. Physik 28, 75 (1909).
2. M. Knudsen, Ann. Physik 28, 999 (1909).
3. P. Clausing, Ann. Physik 12, 961 (1932).
4. D. H. Davis, J. Appl. Phys. 31, 1169 (1960).
5. L. L. Levenson, N. Milleron, and D. H. Davis, in 1960 Vacuum SymposiumTransactions (Pergamon Press, London, 1961), p. 372.
6. L. L. Levenson, N. Milleron, and D. H. Davis, Le Vide 18, 42 (1963).
r
CHAPTER 3
PRESSURE MEASUREMENT IN VACUUM SYSTEMS
The most important parameter to be measured in a vacuum system
is the gas pressure. The pressure of interest may be the total pressure,
including both the easily condensable and the permanent gas compo-
nents present, either the condensable or permanent gas components
separately, or finally the partial pressure of each of the constituents,
such as oxygen, nitrogen, hydrogen, carbon dioxide, etc. The range of
pressure over which reasonably accurate measurements are of interest
extends from atmospheric pressure down to 10"^^ torr or lower. Gauges
and techniques have been developed by which any of the various types
of pressure mentioned above can, in principle, be measured with the
necessary sensitivity; but particularly for values of the pressure
below about 10~* torr ambiguity and error arise from parasitic effects
within existing gauges which make accurate determination of the
pressure difficult.
3-1. Liquid Manometers. A liquid manometer consists of a
U tube partly filled with liquid. One end of the U tube is connected
to the system in which the pressure
is to be measured. The other endis either open to some reference
pressure, such as atmospheric, or is
closed off with the volume abovethe liquid level evacuated. Openand closed manometers are illus-
trated in Fig. 3-1.
Open manometers are generally
used to measure pressure relative to
atmospheric pressure and may befilled with any liquid, ofwhich water,oil, and mercury are commonlyused. The engineering term gaugepressure and units such as inches ofwater and millimeters of Hg for thepressure difference grew naturallyfrom the use of open manometers.
63
To the
system
Open
To the
system
Closed
Fig. 3-1. Liquid manometer.
64 VACUUM SCIENCE AND ENGINEERING
Closed manometers are more generally used for measurement of
pressure small as compared with atmospheric. An exception to this
statement is the mercury barometer, which is in fact a closed manom-eter designed specifically to measure atmospheric pressure in absolute
units, i.e., relative to zero pressure. A closed manometer is first
thoroughly evacuated and then filled to the proper level while still
under vacuum so that the gas pressure over the liquid in the closed
arm is negligible as compared with any pressure to be measured.
The open end is connected to the system so that a difference in level
or head between the surfaces of the liquid in the two arms will be just
proportional to the total pressure in the system. The difference in
level h is related to the pressure according to
P=gph (3-1)
in which the pressure P is in dynes per square centimeter or /<bars when
the density p of the liquid is measured in grams per cubic centimeter,
the head in centimeters, and g = 981 cm/sec^. When the liquid is
mercury the difference in level in millimeters is by definition equal to
the pressure in torr. Since the density of mercury at 0°C is 13.59 g/cm^,
we have from (3-1)
10 X P(ubar)P(torr) = ft(mm)
981 X 13.59
7.50 X 10-«P fibaur (3-2)
thus 10* /^bar = 750 mm Hg, which is the range of atmospheric pressure
and is defined for some purposes as the standard atmosphere.
With some care in the arrangement of a mercury manometer, a
pressure of 0.1 torr can just be detected and a pressure of 1.0 torr can
be read with the unaided eye with a probable error of about 10 per cent.
For lower values of the pressure, differences in capillarity and sticking
in the tube tend to produce significant errors. However, if the tube
diameter is sufficiently large (---1 cm) and the tube and mercury kept
clean, a manometer can give accurate readings down to 10~^ torr by the
use of optical means of magnifying small differences in level.
The sensitivity of a manometer can be increased by about a factor
of 15 by using a diffusion-pump oil instead of mercury. However,organic fluids are much more susceptible of contamination by dissolving
gases than is mercury. For accurate reading of low pressures the oil
used in a manometer must be purified frequently by-vacuum distillation
and outgassing.i*
* References indicated by superscript numbers are listed at the end of thechapter.
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 65
Over the range for which it is effective the liquid manometer respondsdirectly to the total pressure in the system and is therefore an excellentabsolute standard of total pressure. However, since the readingdepends upon the density of the fluid, which in turn depends upon thetemperature, some care must be taken to control the temperature ofthe gauge when highly precise measurements are required. As anexample, the density of mercury changes about 0.5 per cent over thetemperature range from to 30°C.
3-2. The Diaphragm Manometer. The principle of the dia-phragm manometer for the measurement of low gas pressures is shownin Fig. 3-2, which is a cutaway view of a gauge manufactured byWallace and Tiernan.^
The diaphragm type of gauge is a very common device for themeasurement of pressure differences, such as the "gauge" pressurerelative to atmospheric pressure in many engineering applications.For the measurement of absolute pressure in the range of interest invacuum technology, the reference pressure of interest is zero absolutewithin the range of sensitivity of the gauge. In the Wallace andTiernan gauge an evacuated beryllium-copper capsule is used as thepressure-sensitive element. The capsule is mounted in the gaugechamber, which is connected to the system within which the pressureis to be measured. Distortion of the capsule due to the pressure is
transmitted through a mechanical linkage to a rotating pointer, whichindicates the pressure on a circular dial viewed through a sealed windowin the front of the gauge chamber. Standard models of this gaugeare available with scale divisions of 0.2 torr and pressure range fromto 50 torr.
A large variety of diaphragm gauges have been developed withsensitive means for detection of small displacements of the diaphragmfor measuring much lower pressures than can be measured mechanically.In the manometer of East and Kuhn^ the diaphragm is in the form ofa bellows, into the interior of which the pressure to be measured isadmitted. Elongation of the bellows due to the pressure is amplifiedby a light beam reflected by a small mirror which is tilted by motionof the bellows. By this means pressure changes of 5 x 10^* torr weredetected.
By using electrical methods of detecting changes in the position of adiaphragm, highly sensitive vacuum manometers have been developed.One such method, as illustrated in Fig. 3-3, depends upon the capaci-tance between a diaphragm and a fixed electrode. Movements of thediaphragm in response to the pressure changes the spacing, and there-lore the capacitance, which can be measured with a capacitance bridgeor made a part of a resonant circuit, the frequency of which is measured.
66 VACUUM SCIENCE AND ENGINEERING
GEAREDSECTOR
ZERO SETTIN6 ADJUSTMENT
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 67
Fig. 3-2. Diaphragm manometer with mechanical indication. [Reproduced
through the courtesy of Wallace and Tiernan, Inc., 25 Main Street, Belleville 9,
N.J.]
Connecting wire Insulator
Electrode
Diaphragm
2A
In either case the reading is a function
of the pressure, which may be linear
over a sufficiently wide range to beconvenient in use. The construction
of a gauge of this type, in which aplane diaphragm was used, is described
by Pressey* and is illustrated in Fig.
3-4. The range of linear response wasabout 1 torr with a sensitivity of 10-^
torr limited by fluctuations due to
temperature. More sensitive gaugesof this t5rpe have corrugated instead
of plane diaphragms, the corrugations
being concentric rings about a central
plane section. By this construction
the sensitivity to pressure changes is
increased by about a factor of 10 with no significant change in the re-
sponse to temperature variations so that sensitivity of about 10^* torr
Fig. 3-3. Diaphragm manometerfor electrical sensing of pressurechanges. [Taken with permissionfrom J. H. Leek, Pressure Meas-urement in Vacuum Systems (Pub-lished for the Institute of Physicsand the Physical Society byChapman and Hall, Ltd., London,1964), 2nd ed.]
,
Pig. 3-4. Cross section of diaphragm manometer designed for capacitance meas-urement of the differential pressure. [Taken with permission from J. H. Leek,Pressure Measurement in Vacuum Systems (Published for the Institute of Physicsand the Physical Society by Chapman and Hall, Ltd., London, 1964), 2nd ed.]
68 VACUUM SCIENCE AND ENGINEERING
Gloss tube
is achieved. However, in a panel discussion on the subject of vacuum
gauges held at the 1960 annual symposium of the American Vacuum
Society, P. A. Redhead fexpressed the opinion that mechanical manom-
eters have a lower limit of about IQ-^ torr because of effects, such as
that of vapor molecules with dipole moments on capacitance gauges,
which cannot be controlled.
Because the sensitivity of the diaphragm manometer depends
critically upon the mechanical properties of the diaphragm, such a
gauge cannot beregarded as a primary stand-
ard in the sense that a liquid manometer
may be. For this reason diaphragm ma-
nometers must be calibrated with reference
to a liquid manometer. It is also necessary
to have some convenient method of checking
and adjusting the zero reading periodically.'
3-3. The Dubrovin Gauge. The Du-
brovin gauge ^ is a type ofmanometer which
utilizes the displacement of mercury in such
a manner as to produce a sensitivity of the
order of 10 times greater than that of the
simple mercury U-tube manometer. The
gauge consists of a glass cylinder partly
filled with mercury and a stainless steel
tube, closed at the upper end and open at
the bottom, floating vertically in the mer-
cury. The gauge is prepared for use by
laying it on its side so that the open end of
the steel tube is exposed and evacuating
the gauge so that the residual pressure
throughout the gauge, including the region
inside the steel tube, is very low. While
still evacuated the gauge is returned to the
vertical position with the steel tube floating in the mercury, as shown
in Fig. 3-5. When gas is admitted through the connection at the top
of the gauge, the steel tube is pushed down by the pressure more deeply
into the mercury. For some pressure P in the gauge the balance is
reached when the weight of the tube plus the force exerted on the
closed end of the tube by the gas pressure is equal to the change in
weight of the displaced mercury. If d^ and d^ are respectively the inner
and outer diameters of the steel tube and p, its density, then
Thin-wall
steel tube
Mercury
\J>
Fig. 3-5. The Dubrovingauge.
Tdi2 n
4^ + 7 {d^ di^)ps9L =
JW d^')Pm9{^ - h) (3-3)
7
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 69
in which p„ is the density of mercury, L the length of the steel tube,and h the length of the steel tube protruding above the mercury. Then
„ d^^ - (^2
P = ^- glpJL ~h)- p^L]d,^
d^-d,^ lp„gpm\—
d,'h (3-4)
The zero position of the steel float is obtained by setting f = in (3-4)from which
K = (3-5)
is the length of steel tube protruding above the mercury level at zeropressure and (3-4) may be written as
P = d. d,^
d,^9Pm(K - h) (3-6)
(3-7)
The sensitivity of the Dubrovin gauge from (3-6) is
dh _ dj^ 1
dP~d^-d,^'^which is to be compared with (3-1) for the mercury U-tube manometerfor which the sensitivity is l/gp^. The sensitivity of the Dubrovingauge is thus greater than that of the mercury U-tube manometer bythe factor
dx'(3-8)F
d^^ - dj^
For a factor F = 10 and d^ = 1 cm one finds from (3.8) that d^ = 1.05cm so that the wall thickness of the steel tube must be about 0.025 cm,or 0.010 in. For such a gauge a change in A of 1 cm represents achange in pressure of 1 torr, so that pressure changes of 0.1 torr can bedetected with ease. With a sensitivity of this order the Dubrovingauge is a convenient instrument for the measurement of pressure in therange below that easily read on a manometer, but above that normallyreserved for the McLeod gauge discussed below.
3-4. The McLeod Gauge. By combining a liquid manometerwith means of compressing a sample of gas as is done in the McLeod*gauge, the range over which the pressure can be measured can beextended considerably below the practical limit of about 10-^ torr forthe mercury manometer. The essential elements of a McLeod gaugeare shown in Fig. 3-6, and consist of a glass bulb with a capillary tubeextension on the top, a side arm connnecting to the vacuum system,and some means of raising and lowering the liquid level within the
70 VACUUM SCIENCE AND ENGINEERING
gauge. The fluid normally used in McLeod gauges is
mercury, although in a few exceptional instances
organic fluids of low vapor pressure have been used.
When the mercury level in the gauge is lowered below
the branch point A the bulb of volume V is connected
to the system through side arm B. The gas in the
bulb is then at the same pressure as that in the
system. When the mercury level is raised, the bulb
is cut off from the side arm and the sample of gas
compressed into the capillary Cj. The capillary C^
is in parallel with a section of the side arm B and
has the same bore as C^ so that the surface tension
or capillary effect is the same. The difference in level
of the mercury in G^ and Cg is therefore due to the
pressure difference resulting from compression of the
sample from the large volume V into the small
-'volume of Cj above the mercury level.
The pressure of the compressed gas in the closed
capillary is proportional to (Ag — ^i) + ^O' ^^ which
hi and h^ are the heights in millimeters of the mercury
in capillaries G^ and C^, and P^ is the pressure in
the system still present in Cg. Since the compression
ratio is typically very large, P„ is negligible as com-
pared with A.2 — K- The pressure of the compressed sample of gas is
thus just equal to h^ — K torr within the limit of reading error when
hi and ^2 are measured in millimeters. If the system contains per-
manent gas only during the compression cycle, according to the general
gas law (1-1)
PV = P'V (3-9)
in which P and P' are the pressures before and after compression,
respectively, V is the volume of the bulb (i.e., the volume of the closed
portion of the gauge above the cutoff point A), and V, the volume
of the closed capillary above the mercury level h^, is given by
Fig. 3-6
gauge.
McLeod
F' =
(^0 - hi)a
1,000(3-10)
where h^ is the effective height of the closed end of capillary Cj and a
is its cross-sectional area in square millimeters. Then
PV = (^2 — hi){ho — hi)a
1,000(3-11)
PRESSUBE MEASUREMENT IN VACUUM SYSTEMS 71
which holds for all values of h^ and h^ as the mercury is raised in the
system. From (3-11) it is evident that
{K - K){K - h)-1,000
PV = const (3-12)
provided that the pressure is due to a permanent gas as defined by(3-9). In using a McLeod gauge this point should be periodically
checked, i.e., the mercury should be raised to two or more levels, the
values of A.2 a-nd h^ measured, and the criterion given in (3-12) checked.
In an extreme case the remaining gas present in the system may be dueto a substance for which the vapor pressure at room temperature is
P^. In that case the pressure will increase during compression only
to the point at which P = P^, beyond which condensation will occur
and the pressure will be independent of the volume of the sample. Inthat case for a condensable vapor
h^-hi = P^ = const (3-13)
which is in considerable contrast with the criterion in (3-12). If the
vapor pressure of the contaminant in the system is fairly low and somepermanent gas is also present, a behavior somewhat in between that of
(3-12) and that of (3-13) will result. The important point is that if
criterion (3-12) is not obeyed, the pressure readings as determined bya McLeod gauge will not be valid. One can then conclude that the
system or the gauge itself is contaminated by a condensable material,
the room-temperature saturated vapor pressure of which is givenapproximately by (3-13).
Returning to the measurement of permanent gas pressure with a
McLeod gauge we find that the pressure from (3-11) is
P = (^2 — hi){h„—hi)a
1,000F(3-14)
A McLeod gauge may conveniently be read by bringing the mercurylevel up to the point where ^2 = h^ (i.e., the level in the open capillary
opposite the end of the closed capillary) or the mercury level can be set
at some standard level h^ in the closed capillary. In the first methodwith ^2 = ^0 the pressure is
1,000F{h, - h,Y = ki(M)i^ (3-15)
in which the constant of the gauge k^ = a/l,000F. In the secondmethod with h^ = h.
„ a(h„ — h,)
^ = 1,000F ^^' ~ ^^^ = ^^^^^^' (3-16)
72 VACUUM SCIENCE AND ENGINEERING
in which the constant of the gauge k^ = a(^o - h^)j\,()()QV. In each
method A^ is the difference in mercury level in the open and closed
capillary when the mercury level is set in the prescribed manner. The
first method leading to the formula (3-15) results in a pressure reading
proportional to the square of the reading, whereas the second method
leads to (3-16), in which the pressure is proportional to the first power
of the reading. The sensitivity can perhaps best be defined from (3-15)
when AA = 1 mm, which is about as small a value as can be estimated
with reasonable accuracy. On this basis the sensitivity of the McLeod
gauge is
P. =4,000 X 200
3.9 X 10-« torr (3-17)
which is a practical and useful sensitivity for vacuum measurements.
The McLeod gauge has a unique role in the measurement of pressure
in vacuum systems and is frequently used as the standard gauge for
calibrating most other types of low-pressure gauges.* As can be seen
from Eqs. (3-15) and (3-16), the cahbration of a McLeod gauge depends
only upon the measurement of the volume V of the bulb and the cross-
sectional area of the capillary tube. The volume of the bulb can be
measured with great precision by inverting the gauge, filling the bulb
and tubing up to the branch point A with mercury, and weighing the
mercury. The cross-sectional area of the capillary can best be measured
by filling a measured length of the capillary with mercury and weighing
the small sample of mercury. Since capillary tubing is not necessarily
of uniform cross section, a length of tubing must be tested and a section
of sufficiently uniform diameter chosen. By placing a drop of mercury
in the tubing, moving it along the tube, and measuring the length of
the mercury column formed at several positions along the tube, the
variations in diameter can be easily determined and an acceptable
section found for making both the open and closed capillaries Cj
and C2.
Experience has shown that a bore diameter less than 1 mm is im-
practical because of the tendency for the mercury column in a finer
capillary to separate, leaving a bead of mercury plugging the closed
capillary after a reading has been taken and the mercury level lowered
to empty the bulb. For high sensitivity it is therefore necessary to
increase the volume F of the bulb rather than to decrease the capillary
bore to less than 1 mm. The end of the closed capillary must be
sealed off as squarely as possible in order that the zero point of the gauge
* Note: See Sec. 3-13 for discussion of the use of a McLeod gauge with a
refrigerated vapor trap for calibrating ionization gauges, and Ref. 51 for a report
on observed discrepancies.
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 73
1
^0 can more easily be determined and also to avoid an exaggeratedtendency of the mercury column to stick whenever the mercury levelcomes within a millimeter or so of the closed end of the capillary. Theeffective height of the closed end of the capillary cannot, in general, bedetermined accurately by eye because of irregularities near the end ofthe capillary produced in sealing the end. The true value of h^ can bedetermined by applying criterion (3-12) to the gauge, which is thor-oughly trapped to eliminate condensable vapors, and choosing a valueof h^ which fits (3-12) best for several values of h^ and h-^.
The McLeod gauge is inherently a cumbersome instrument to use inthe pressure range from 10-3 to 10-« torr, in which it is most neededas an absolute gauge. Since it must be made at least partly of glass,it is a fragile device in which the shifting load of mercury must becarefully supported or disastrous breakage will occur. The interior ofthe McLeod gauge and the mercury used must be scrupulously cleanand particularly free of oil and grease, otherwise readings are meaning-less and the mercury sticks in the capillary, refusing to come down whenthe mercury level is lowered.
The connecting tubing for a portable McLeod gauge is frequently asource of error since to be convenient in use its diameter must befairly small and its length typically a meter or more.The conductance of such a connecting tubing is very small, usually
not more than 0.1 liter/sec, so that a small leak at the gauge end of thetubing can give rise to an unexpectedly large discrepancy between thepressure in the system and that seen by the gauge. Such an error caneasily be detected and estimated if the gauge connection can be closedoff next to the system and the pressure rise in the gauge due to leakagemeasured for a specific time interval, such as 5 min. The procedure is
to take a normal reading P^ with the gauge, then close off the line nearthe system and wait several minutes and take a second reading P^.Any appreciable increase of P^ over P^ is an indication that the gaugeerror due to leakage may be serious. To evaluate the gauge error thetotal volume being filled by the leak must be estimated. This totalvolume consists of the gauge volume (the bulb and side tube) and thevolume of the connecting line up to the cutoff point. As an example,assume that
Pj = 10-3 torr
P2 = 10-2 torr
< = 5 min = 300 sec
ic (the length of the connecting line) = 100 cmd^ (the diameter of the connecting line) = 0.5 emF„ = 300 cm3
74 VACUUM SCIENCE AND ENGINEERING
then the volume of the connecting line is
^ , =—- L cm^" 4
The leakage rate is the volume filled by the gas multiplied by the
pressure rise divided by the time, or
P — PQ^ = — i {V, + Fe) torr cmS/sec
Pt-P^(7 4-7^)10-3 torr liters/sec
The conductance of the connecting line is, according to (2-82),
d ^
G =12.12-^ liters/sec
By the definition of conductance in (2-4) the flow rate and conductance
are related byQ. = G,{P, - Ps) = C, AP
in which P, is the pressure in the system when the gauge reading Pj is
taken, so that the difference between these values of the pressure is
the gauge error, which is
^0AP =C.
For the above example
77 X 0.25F„ =
Q.=
4
9 X 10-^
300
(100) = 19.6 cm^
(319.6)10-^ = 9.6 X 10-« torr liter/sec
125(7 = 12 X — = 1.5 X 10-2 Hter/sec
100
and the gauge error is
_ 9-^ X IQ"" = 0.64 X 10-3 torr1.5 X 10-2
Thus, for the example given of the reading Pj = 1 X 10-^ torr, the
greater part, or 0.64 x 10-^ torr, is the gauge error. Errors of this
magnitude and sometimes much greater frequently appear when this
simple test is carried out. The need for truly leakage-free connections
to a McLeod gauge and connecting tubing of reasonably large-bore
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 75
diameter can hardly be overemphasized. Other types ofvacuum gaugesare also sensitive to small air leaks, but the McLeod gauge is particularlyvulnerable because of the low conductance of the line with which it is
connected to the system in many applications. In systems built for thecalibration of other types of gauges, such as ionization gauges, in thepressure range 10-^ to 10-^ torr no compromises for reasons of conven-ience should be tolerated in the manner of connecting the McLeod
Set mark
760 mm
q)
-Flexible
hose
1
Fig. 3-7. Methods of controlling the mercury level in McLeod gauges.
gauge.
The system should be made of fairly large-diameter glass tubingwith a high-conductance liquid-nitrogen trap between the McLeodgauge and the gauges to be calibrated, and no questionable connectorswith rubber or other organic materials should be used.
Several methods, as illustrated in Fig. 3-7, have been devised for
raising and lowering the mercury level in McLeod gauges. For con-sistent readings it is important that the mercury be raised smoothly tothe proper level, but not beyond, since there is always a slight mechani-cal hysteresis in the response of the mercury in the closed capillary dueto surface effects.
The simplest method for controlling the mercury level is illustratedin Fig. 3-7a. A reservoir filled with mercury is connected to theMcLeod gauge just below the branch point with a length of rubbertubing. The mercury level in the gauge, riding at about a barometricheight above that in the reservoir, is adjusted to the proper height byraising and lowering the reservoir. This simple method has been usedfor many years although its disadvantages are the contamination of the
75 VACUUM SCIENCE AND ENGINEBEING
mercury by the rubber tubing and frequent loss of mercury by the
rubber tubing shpping off or rupturing..
A somewhat better arrangement for lifting the mercury level is
shown in Fig. 3-76 in which the reservoir, which in this case can be made
of steel, is coaxial with a long vertical tube extending below the branch
point a distance slightly greater than the barometric height of about
760 mm. The top of the reservoir can be made with relatively small
clearance at the top so that contamination of the mercury is not a
serious problem. For sensitive gauges, however, methods a and h
are cumbersome, even when combined with counterbalancing to reduce
the effort required to lift the heavy mercury load.
In Fig 3-7c a fixed mercury reservoir is located sufficiently below
the McLeod gauge that a barometric height for mercury places the level
below the branch point when the gauge is connected to a high vacuum.
The reservoir is in the form of a cylinder with a loosely fitting wooden
or hollow steel plunger which can be thrust down to displace most of the
mercury in the reservoir, raising the level. Relatively fine control can
be provided by clamping a threaded collar on the plunger near the top
arranged to mesh with threads at the top of the reservoir housing so
that the final inch or so of the stroke is controlled by rotating the
plunger.. -, , xu
In Fig. 3-7d a compact form of McLeod gauge is achieved by the use
of an auxiliary vacuum reservoir to control the mercury level. The
mercury in the gauge is lowered by pumping air out of the reservoir
above the mercury and raised by admitting atmospheric air, usually
through a tube partly filled with a drying agent, such as activated
alumina or silica gel. A two-way stopcock type of valve is a conven-
ient means of switching from admitting to removing air from the reser-
voir. Fine control in raising the mercury level can be provided by
notching the inner member of the stopcock with a file at both ends of
the hole through which air is admitted. With the development of
some skill an operator can then reduce the flow rate as the mercury
level approaches the zero mark and stop the flow without overshooting
the mark. Tapping the closed capillary with a finger or applying a
small mechanical vibrator will help to compensate for the tendency of
the mercury to stick and advance erratically.
The use of a flexible metallic diaphragm for raising and lowering the
mercury in a compact form of McLeod gauge is illustrated in Fig. 3-7e.
The particular model shown is an unusually compact form of McLeod
gauge and has the added feature of a dual range achieved by the use of
two closed capillaries connected to the same reservoir.
The pressure range of a McLeod gauge is determined by the length
of the capillary tube, which is limited to about 15 cm by practical
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 77
considerations. A gauge with a bulb volume of 300 cm^ and a closed
capillary of 15 mm length and 1 mm bore has a range as given by (3-9)
from
2.26 X 10-« torr for ^i = 1 mmto 5.9 X 10-2 torr for \ = 150 mm
Fig. 3-8. McLeod gaugewith several scales for
an extended pressure
range.
Fig. 3-9. Dual-range
McLeod gauge. [Takenwith permission fromJ. H. Leek, Pressure
Measurement in VacuumSystems (Published for
the Institute of Physics
and the Physical Society
by Chapman and Hall,
Ltd., London, 1964),
2nd ed.l
In many applications it is desirable to extend the range of the gaugeto appreciably higher pressure. One way in which this can be done is
to make the closed capillary out of short lengths of tubing of different
bore diameters and for each such section provide a Cg capillary, all in
parallel with the side arm, as illustrated in Fig. 3-8. An alternative
design due to Romann' is shown in Fig. 3-9 in which a small bulb is
inserted between the main bulb and the base of the closed capillary
with a second closed capillary tubing connected between the two bulbs.
The sensitivity for the second capillary is VijV[ of that for the main
78 VACUUM SCIENCE AND ENGINEERING
capillary so that the pressure range is increased by about the inverse
of this ratio.
3-5. Thermal Conductivity Gauges. The thermal conductivity
K oi a. substance is defined by the expression
H = -K—-ds
(3-18)
in which H is the amount of heat flowing per unit area per second in the
direction parallel to s, and dTjds is the temperature gradient in this
same direction. For rarified gases the kinetic theory of gases provides
a derivation* of an expression for the thermal conductivity by methods
similar to that given for the viscosity in Sec. 1-9. The derivation leads
to the conclusion that the thermal conductivity of a rarified gas is
given byK = M(9y - 5)riC, (3-19)
in which y = CJC^ is the ratio of the specific heat of the gas at constant
pressure to that at constant volume, and r] is the coefficient of viscosity.
But the expression (1-59) for the viscosity is independent of the pressure
so that the thermal conductivity is also independent of the pressure
over the same range for which the viscosity is given by (1-59). How-
ever, as was pointed out in the discussion of that expression, when the
gas pressure is so low that the molecular mean free path is about equal
to or greater than the distance between the walls of the containing
vessel, the gas is no longer characterized by a viscosity. In that case
the expression (3-19) is no longer valid and the conductivity is then
found to depend upon the pressure. Therefore, in the pressure range
for which the mean free path is comparable with or greater than the
dimensions across which the flow of heat occurs, the variation of the
thermal conductivity of the gas with the pressure can be used for the
measurement of the pressure. The process of heat flow under these
conditions is called free molecular conduction.
Consider a cylindrical tube with a heated filament of circular cross
section running along its axis. According to (1-31) the number of
molecules per second striking each square centimeter of the surface of
the filament is
V = yinva,T/
_ n/2kTY2\ 77m;
n/2RoTY'2\ uM !
(3-20)
PEESSUEE MEASUREMENT IN VACUUM SYSTEMS 79
from (1-23) and Table 1-3. If the diameter of the filament is very smallas compared with that of the tube, each molecule will strike the wallseveral times before finally hitting the filament and will therefore bein good thermal equilibrium with the wall temperature T^ beforehitting the filament. At the low pressure here assumed, however, eachmolecule which strikes the filament will do so only once before againcolliding with the wall. The molecules leaving the filament, therefore,
will not be in equilibrium with the temperature T, of the filament, butwill be characterized by some lower temperature T'^.
Under conditions of temperature equilibrium with both surfaces, the
kinetic theory of gases gives for the energy transferred by a monatomicmolecule
E = 2k{Tf - TJ {k = the Boltzmann constant)
which in this case can only be in the form of kinetic energy. However,more generally for diatomic and polyatomic molecules which acquire
vibrational and rotational as well as translational energy, the energytransferred is greater by the factor (y + l)/4(y — 1) where y = Cj,/C^,
the ratio of specific heats of the gas. Thus, in general, the energytransferred per molecule under the conditions of thermal equilibrium
with both surfaces is
^^)HT,-TJ (3-21)E
However, the situation of interest is one in which the molecules donot come into equilibrium with the temperature of the hot filament
so that the energy transfer per molecule is given by a similar expression
with T'f substituted for T, where T'f < Tf. Thus, in the case of
interest,
5^7^ ^(^-^J (3-22)E
Knudsen defines the accommodation coefficient a as the ratio of these
two quantities; i.e..
^ f -> w
so that the energy transferred per molecule is
(3-23)
(3-24)
Combining (3-20) with (3-24) one then obtains for the rate of energy
80 VACUUM SCIENCE AND ENGINEEBING
transfer from 1 cm^ of filament surface
_ g y + 1 / -Rq \^ (rp T )P ergs/sec cm^ (3-25)
2y - 1\27tMTJ ^ '
since from (1-16) nifc = P/T and since by our assumption regarding
the ratio of diameters of the filament and the tube, the gas molecules
hitting the filament will be in equilibrium with the temperature T„
of the tube wall. For numerical evaluation Eq. (3-25) may be written
in the form
w _«L±i/_^2_f(—f(T -T~27 - l\277i/(273)/ \T„/
..m\^, T^)P ergs/sec cm'' (3-26)
in which Ao is the free molecular conductivity at 0°C given by
Ao = Y + 1 Rn J}A
2(y - l)\277i/(273)/
llOy + 1
ilf'^ 7 - 1
1.47 X 10-2 y + 1
ergs/sec cm^ °C ^bar
jfVi y-1watts/cm^ °C torr (3-27)
The free molecular conductivity at 0°C for a given gas can be calculated
by (3-27) and the resulting value inserted in (3-26). However, the
accommodation coefficient a cannot be calculated since its value depends
not only upon the gas involved but also upon the material and surface
condition (roughness and adsorbed gas layer) of the filament. For
clean metallic surfaces exposed to air, the value of a is in the vicinity
of 0.9, whereas for hydrogen the value of a is generally quite low
(0.2 to 0.5). For roughened or blackened surfaces a approaches unity
for all gases. Since surfaces are generally not highly polished nor
completely free of adsorbed gas layers, the value a = 0.7 may be used
for rough approximation.
As an example, for air
1.47 X 10-2 2.401
(28.98)'-^ 0.401= 1.64 X 10-2 watt/cm2°C torr
so that the heat conduction per unit area from a filament at a temper-
ature of 100°C to the surrounding tube walls at room temperature
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 81
(20°C) in which the pressure of air is 10^ (0.01 torr) is
(273\!-2-—I (100 - 20)(0.01)
= 8.87 X 10-3 watt/cm2
If the filament is 1 mil (0.0025 cm) in diameter and 4 in. (10 cm) long,
the surface area is about 7.9 x 10"^ cm 2 and the gas heat conduction
will be of the order of 6.9 x 10-* watt.
Even under conditions of perfect vacuum (P = 0) in the tube, heat
will be lost from a hot filament by thermal radiation. If the surfaces
were perfectly absorbing to radiation of all wave lengths, the rate of
energy loss would be given by the Stefan-Boltzmann law for "black
body" radiation^^ ^ ^^^^, _ ^^,^ ^3^^)
in which a = 5.673 x IO-12 watt/cm2 (3-29)
All real surfaces, however, are not perfectly absorbing and are character-
ized by the emissivity e with the result that the rate of radiation of
energy becomes^^ ^ ^^^^^^, _ ^^^^,^
'
^33^^
If loss of heat from the filament due to radiation is large as comparedwith that due to gas conduction, the latter cannot be used as a means of
measuring the pressure because of the large background effect.
For the example above, the heat loss by radiation for perfectly
"black" surfaces would be
W, = 5.67 X 10-12(373* - 293*)
= 6.80 X 10-» watt/cm2
Since the surface area of the filament is 7.9 x IO-2 cm2, this wouldresult in a power loss due to radiation of 5.37 x 10-* watt, which is
comparable with the loss calculated above due to free molecular con-
duction at P = 10-2 torr. However, since the emissivities of sm^faces
of clean metals at temperatures in the range of to 100°C are generally
of the order of 0.1, the true loss due to radiation would be of the order
of 5 X 10-^ watt, so that radiation loss and gas-conduction loss wouldbecome about equal at a pressure of about [(5 x 10-^)/(6.9 x 10"*)]
X 10-2 <=» 7 X 10-* torr.
Inspection of Eqs. (3-26) and (3-30) shows that radiation increases
much faster with increasing temperature because of the T* dependencethan does gas conduction, so that an equality between radiation and gas
conduction occurs at higher pressure as the temperature is raised.
Therefore, for measurement down to lowest pressure, the filament should
be operated at the lowest temperature for which the heat loss due to
gas conduction can be measured. Because of the competition with
82 VACUUM SCIENCE AND ENGINEERING
radiation loss, thermal conductivity pressure gauges are not normally
used for pressure measurements below about 10~^ torr.
There is a third process by which a hot filament may lose heat to
its surroiuidings, i.e., by thermal conduction along the filament to the
end mountings. However, this loss can be kept sufficiently small byusing a filament of small cross section and heat conductivity. As an
Thermocouple
^Millicmmeter
Filament
:=: Battery
Microommeter
(low-resistance
type)
Rheostat for
current
adjustment
ID)
Fig. 3-10. (a) Thermocouple gauge; (6) simple electrical circuit diagram.[Taken with permission from Saul Dushman, Scientific Foundations of VacuumTechnique (John Wiley and Sons., Inc., New York, 1949).]
example nickel has a nearly constant heat conductivity of k <=« 0.14 gcal cm/°C in the temperature range from to 200°C. Exact calculation
of the heat-conduction loss along the wire is a bit tedious because of the
temperature variation along the wire. A crude estimate can be made,however, by assuming the central third of the wire to be at the
maximum temperature and the third at each end to have a uniform tem-perature gradient 3(T^ — TJjL. By this approximation the heat
conducted out both ends to the mountings is
dTW, = 2(0.239)jfc^
dL
= 2(0.239)(0.14)(4.9 x 10-«) X3(100 - 20)
10
= 7.9 X 10-« watt
in which A is the cross-sectional area of the 1-mil wire in squarecentimeters and the factor (0.239) converts from gram calories per
PKESSUEE MEASUREMENT IN VACUUM SYSTEMS 83
a- 10
second to watts. For this choice of dimensions the heat lost out to
the end mountings by heat conduction along the wire is smaller than
that lost by radiation, as calculated above, by a factor of about 750.
In general, therefore, the balance between free molecular conduction andradiation is all that needs to be considered as long as the cross-sectional
area of the filament is sufficiently small. As we have seen, this balance
occurs at a pressure of about 10~^ torr
or a bit less for the example chosen.
Since these two processes of energy loss
are both proportional to the surface
area of the hot filament, the balance
point is approximately independent of
the diameter of the filament.
The thermocouple vacuum gauge is
a thermal conductivity pressiu-e gauge
in which the temperature of the hot
filament is measured by a thermo-
couple. The heating current which is
passed through the hot filament is kept
constant at a standard value inde-
pendent of the temperature of the
filament. As the pressure increases
the heat conduction through the gas
increases and the temperature of the
filament decreases until the tempera-
ture corresponding to the high-pressure
value of the heat conduction through
the gas is reached. The thermocouple
responds to the temperature of the
filament and provides a direct reading
which can be calibrated against the
pressure in the gauge tube. Thethermocouple type of gauge was first developed by Voege' and has
been refined by a number of other investigators. ^"'^^
The thermocouple gauge manufactured for many years by General
Electric Company is shown in Fig. 3-10 together with the simple
electric circuit frequently used to heat the filament and record the
output of the thermocouple. The gauge element consists of a platinum-
iridium ribbon 0.0234 by 0.0078 cm in cross section and 3.66 6m in
length with a Nichrome-Advance thermocouple welded to its midpoint.
The heating current passing through the platinum-iridium element is
held constant in the range 30 to 60 mA depending upon the pressure
range of interest. In Fig. 3-11 are shown calibration curves of pressure
16 24 32 40 48 56
Scale reading
Fig. 3-11. Calibration curve for
General Electric thermocouple
gauge for Hg, Nj, and Xe. [Taken
with permission from Saul Dush-
man, Scientific Foundations of
Vacuum Technique (John Wiley
and Sons., Inc., New York, 1949).]
84 VACUUM SCIENCE AND ENGINEEBING
plotted against the thermocouple ciirrent for hydrogen, nitrogen, and
xenon. About two-thirds of the total deflection occurs in the pressure
range from 0.1 to 0.01 torr. Characteristically the curve becomes
very steep at 5 x 10-» torr, below which the accuracy of the gauge is
rather poor.
Triode
Clevite
CDT1349A
45 ohms
1wottl7o
WW
20ohmsPot WWCCW
Gouge
tube
Fig. 3-12. Schematic circuit diagram of Kimiey thermocouple gauge.
Thermocouple gauges are very useful and convenient in a variety of
applications. A number of commercial designs are available, of which
that manufactiu-ed by the Kinney Vacuum Division of The New York
Air Brake Company is of special interest. The gauge tube is of steel
construction and is both compact (length of 4 in. and outer diameter
of iK in.) and relatively sturdy. The thermocouple elements are
Chromel and Cupron, and the heater element is a timgsten wire.
A special feature of the Kinney thermocouple gauge is that the tubes
are all matched so that the circuit need not be reset for proper cali-
bration when tubes are changed. This is particularly convenient in
multistation installations in which a number of thermocouple gauge-
tubes are connected to a single control circuit through a selector switch.
The Kinney control unit is fully transistorized and features a printed
circuit, a simplified diagram for which is shown in Fig. 3-12. The
PEESSUKE MEASUREMENT IN VACUUM SYSTEMS 85
multistation control unit has an auxiliary heating circuit which keeps
the elements of all the gauge tubes in the system warm when they are
not connected to the pressure-reading circuit, so that there is no delay
in obtaining a pressure reading as the control unit is switched from one
tube to another.
Cufrent
Current
Gauge tube
Fig. 3-13. Hastings thermocouple
gauge schematic. [Taken with per-
mission from J. M. Benson, in 1956
Vacuum Symposium Transactions
(Pergamon Press, London, 1957).]
Gouge tube
Fig. 3-14. Equivalent circuit of
Hastings thermocouple gauge.
[Taken with permission from J. M.Benson, in 19S6 Vacuum, Sym,pos-
ium, Transactions (Pergamon Press,
London, 1957).]
A very successful design of thermocouple gauge manufactured byHastings-Raydist, Inc., is described by Benson. ^^ The sensitive element
of the Hastings gauge consists of two thermocouples acting in parallel
and a third thermocouple in series
to compensate for variations in
ambient temperature. The gauge
elements and circuit diagram are
shown in Fig. 3-13. The two thermo-
couples (A) and (B) are heated in
series by alternating current froma transformer. Thermocouple (C)
connected from the midpoint be-
tween {A) and {B) to the center tapon the transformer provides temper-ature compensation. Since thermo-couples {A) and {B) are connected"back to back" in the a-c circuit,
they act as parallel sources of electromotive force for the d-c circuit
for which the lead from (C) through the d-c meter to the center tap is
the common return path. The equivalent circuit for the gauge is
illustrated in Fig. 3-14, and a cutaway view of the metal gauge tuberevealing the thermocouple arrangement is shown in Fig. 3-15. Mul-tiple thermocouple or thermopile gauges are made for several ranges of
Fig. 3-15. Cutaway view of Hastings
gauge showing thermocouple arrange-
ment. [Taken with permission from
J. M. Benson, in 1956 VacuumSymposium. Transactions (Pergamon
Press, London, 1957).]
86 VACUUM SCIENCE AND ENGINEERING
pressure determined mainly by the dimensions of the thermocouple
wires and the temperature at which they are operated. The ranges
for which commercial units are available are 0.1 to 20 torr, 5 to
1,000fj,and 1 to 100
fj.,approximately. Calibration curves for several
gases are shown in Fig. 3-16. An outstanding feature of the Hastings
thermocouple gauge is the speed of response, which is significantly
shorter than for most other commercially available gauges. The metal
envelope and generally rugged construction are also features of practical
interest.
10 —
'
= "=::: i:r- ^^
s.8
"^<^ .
^^:wr2=-Argo 1
f, 6^^.
> ^s ^Carbon dioxide
::^N Mil
S 1Acetylene ^5^Xv^^ Freon
s ...^^2^:UJII2
Air- *C-^T-1pi<-:::='
i
10 50 100
Pressure, microns
500 1,000
Fig. 3-16. Calibration curves for Hastings gauge of intermediate sensitivity.
[Taken with permission from J. M. Benson, in 7956 Vacuum Symposium Trans-actions (Pergamon Press, London, 1957).]
About concurrently with the first appearance of the thermocouplegauge, Pirani^* developed a thermal-conductivity pressure gauge in whichthe resistance of the hot filament was calibrated as a function of the
gas pressure. As the pressure in the gauge tube increases, the thermalconduction of the gas surrounding the hot filament increases, and the
temperature of the filament and therefore also its electrical resistance
tend to decrease. The usual control circuit for a Pirani gauge is the
Wheatstone bridge, in which one leg of the bridge is the filament of the
gauge tube and the other three legs have resistances nearly equal to
that of the gauge tube, as shown in Fig. 3-17. It is sometimes ad-
vantageous to use two identical gauge tubes in the circuit, one of whichis evacuated to a low pressure and sealed ofi". If the sealed-off dummytube is mounted adjacent to the gauge tube, fiuctuations due to changesin ambient temperature and bridge voltage are to some degree com-pensated. In the circuit-in Fig. 3-17 the gauge tube is represented by'R„ and the compensating tube, if it is used, takes the place of R^.The Wheatstone bridge circuit can be operated in any of three ways
to provide an indication of the pressure
:
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 87
1. The constant-temperature bridge, in which the temperature of the
gauge filament is kept constant by adjusting the bridge voltage to
maintain a bridge balance as indicated by zero current through G in
Fig. 3-17. In this mode of operation the pressure is approximately a
linear function of the square of the
bridge voltage
P = (3-31)
Fig. 3-17. Wheatstone bridge circuit
for Pirani gauge control. [Taken
with permission from J. H. Leek,
Pressure Measurement in VacuumSystems (Published for the Institute
of Physics and the Physical Society
by Chapman and Hall, Ltd., London,
1964), 2nd ed.]
in which Fq is the voltage neces-
sary to balance the bridge when
the pressure in the tube is nom-
inally zero. The constant Bdepends upon the operating tem-
perature of the filament, the chem-
ical makeup of the gas, and the
geometrical parameters of the
gauge tube.
2. The constant-current bridge,
in which the current through the
hot filament of the gauge tube is
maintained at a steady value.
The bridge is balanced when the
pressure in the gauge tube is very
low, and the imbalance current registered on the meter designated
by G in Fig. 3-17 is used as an indication of the pressure.
3. The constant-voltage bridge, in which the voltage across the bridge
is kept constant, e.g., by means of a regulated power supply. Because
of the simplicity of the constant-voltage circuitry and because the
pressure is approximately a linear function of the imbalance current
over a limited range in pressure in this mode of operation, the constant-
voltage bridge has been widely adopted in commercial Pirani gauge
circuits. The bridge circuit is balanced as in the constant-current
bridge when the pressure in the gauge tube is very low (below the range
of detectable response) and the pressure observed as a function of
the imbalance current. A typical constant-voltage bridge circuiti^ is
shown in Fig. 3-18. Typical calibration curves" for constant-tem-
perature and constant-voltage-bridge operation are shown in Fig.
3-19. Although, with special precautions to ensure a constant ambient
temperature for the gauge tube, the Pirani gauge can be designed for
operation at much lower pressure, commercial Pirani gauges are useful
primarily in the range from 10"^ to 1 torr.
A thermistor is a semiconductor element which has a high negative
*105
Fig. 3-18. Typical constant-voltage bridge circuit for Pirani gauge. [Takenwith permission from C. M. Schwarz and R. Lavender, Rev. Sci. Instr. 19, 814(1948).]
88
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 89
100
10
„-i.o
0.10
temperature coefficient of resistance.
The use of a thermistor instead of a
wire as the heated element in a
Pirani gauge has been well knownin the literature for many years.
Becker, Green, and Pearson^' have
described the properties of therm-
istors and their use in vacuumgauges. The principal advantage of
the thermistor type of Pirani gauge
is that the response curve of the
bridge current as a function of the
pressure may be essentially linear
over a very wide pressure range bythe proper choice of circuit con-
stants. In spite of this very use-
ful feature, thermistor-type Pirani
gauges have not until quite recently
been successful commercially because
of the rather wide variation in prop-
erties of thermistors. This produc-
tion problem has recently been solved
so that thermistors of sufficiently
uniform properties can now be ob-
tained. Because of this improve-
ment in technology, the thermistor
gauge shown in Fig. 3-20 is nowcommercially available. The circuit diagram for this gauge is shownin Fig. 3-21, and a calibration curve is given in Fig. 3-22. The rela-
tively linear response is characteristic of thermistor-type Pirani gauges.
However, the special feature of this particular gauge is the extension of
the useful range to relatively high values of the pressure by the
0.010
/
>///
1
1
/
(
;
;
///
B,•
I
//
/
// /
/ /
ll1/
1/
//
/
20 40 60 80
Relative meter reading
100
Fig. 3-19. Pressure-sensitivity
curves for {A) constant-temperature
operation, and (B) constant-voltage
bridge operation. [Taken with per-
mission from A. R. Hamilton, Rev.
Sci. Instr. 28, 693 (1957).]
Insulator
Connector pins
Thermistor bead
Support wires
Fig. 3-20. Cross-sectional view of Kinney thermistor vacuum gauge.
90 VACUUM SCIENCE AND ENGINEERING
lOOohms lOwatts
Ohmite Brown-Devil
Victory 25 A 4 5,000 ohmsor
Fenwal GB 35LI 5,000 ohms
Fig. 3-21. Circuit diagram of Kinney thermistor vacuum gauge.
enclosure of the thermistor element in a metallic cylinder with small
clearances. The heat flow through the gas from the thermistor element
to the cylinder therefore occurs along a very short path so that the
conditions for free molecular conduction discussed at the beginning of
this section are realized at relatively high pressure.
3-6. Hot-cathode Ionization Gauge. The hot-cathode ioni-
zation gauge consists basically of three elements in a gastight tube :a
thermionic cathode, an electrode usually in the form of a grid for
extracting electrons from the cathode, and a positive ion collector or
plate. Any ordinary triode-type electronic tube has these elements
and can be used as an ionization gauge by opening the tube envelope
and sealing on a tubulation by which it can be connected to a vacuum
system.
The operation of an ionization gauge is illustrated in Fig. 3-23.
Electrons from the cathode are accelerated by the electrostatic field
through the grid of radius r^, which for this purpose is set at a positive
potential Vg relative to the cathode. The plate of radius r^ is set at a
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 91
negative potential V^ relative to the cathode to ensure that electrons
emitted by the cathode or created by collision processes in the annu-
lar space between the grid and plate are prevented from reaching
the plate and are essentially all attracted to the grid, which is
the most positive electrode. If the grid is made of fine wire, mostof the electrons from the cathode miss the grid wires as they are
propelled outward by the field and continue toward the plate until
they reach a point in the grid-to-plate region at which the electrical
potential is the same as that of the cathode; they are then turned
back to oscillate radially, passing through the holes between the
wires of the grid repeatedly until they finally strike a grid wire andare captured. As the electrons pass through the grid they reach their
maximum kinetic energy of eVg, in which e is the electronic charge
(-4.80 X 10-1" esu = -1.60 x 10"" coulomb) and F„ is the grid
potential. The kinetic energy is either in ergs or joules, depending
upon the units (cgs or practical) in which e and V^ are expressed.
Alternatively, this kinetic energy can be expressed in units of electron
volts in which case the maximum kinetic energy of the electrons is equal
to Vg electron volts, by which one simply means that kinetic energy
acquired by a particle with one electronic charge e falling through
a difference of potential equal to F, volts. In atomic and nuclear
50
J^ \rnV/ X ^ R
^s \ "iohms/
^40 k R?\/^"/ir
k.100 Nohms ^°°°(mAJ
ohms^CLiJ/
\30
\volts
20
\s
\10 \,\
N,V,^--
0.001 2 5 0.01 2 5 0.1 2 5 12 5 10 2 5 100
Torr
Fig. 3-22. Calibration curve of Kinney thermistor vacuum gauge for air.
92 VACUUM SCIENCE AND ENGINEEKING
Grid
Plate
structure as well as in electronics both kinetic and potential energies are
commonly quoted in electron volts, for which the following conversion
factors are useful
:
1 electron volt (eV) = 1.60 x 10"" coulomb x 1 V= 1.60 X 10-" joule
= 1.60 X 10-12 erg
or conversely 1 joule = 6.24 x 10^* eV
1 erg = 6.24 x 10" eV
As shown in Fig. 3-23, electrons oscillating in and out through the
grid will eventually collide with gas molecules if any are present in
the tube. If the kinetic energy of
the electron at the time of collision
with a molecule is greater than the
ionization potential of the molecule,
an electron may be knocked off the
molecule, leaving it in an ionized
state. Each such impact decreases
the energy of the electron and de-
flects it from its otherwise purely
radial path so that the electron loses
energy during its oscillatory motionand becomes more random in its
motion. In any case, it eventually
falls into one of the grid wires and is
captured. Electrons knocked out of
molecules in ionizing collisions mayalso gain sufficient kinetic energy to
cause some additional ionization, de-
pending on the electrical potential at
the point at which they are created,
but eventually they also fall into one
of the grid wires because the grid, being positive relative to both the
cathode and the plate, is the only electrode which they can reach.
Those positive ions which are created in the annulus between the
grid and the plate are in an electrostatic field directed radially outward.Being positively charged, these ions are driven outward to the plate,
where they register as a positive current. Those ions which are formedin the space between the cathode and grid, however, are in a field whichaccelerates electrons (— ) outward. These ions are therefore attractedto the cathode, where they are captured and are electrically equivalentto electrons leaving the cathode. Only those positive ions reaching
Cothode
Fig. 3-23. Hot-cathode ionization
gauge. A typical electron trajec-
tory is shown. The useful region
of positive ion production is the
shaded area. [Taken with permis-
sion from J. H. Leek, Pressure
Measurement in Vacuum Systems
(Published for the Institute of
Physics and the Physical Society byChapman and Hall, Ltd., London,
1964), 2nd ed.]
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 93
the plate or collector are recorded as positive ion current and contribute
to a measurement of the density of molecules in the tube.
An alternative method of operating a triode-type vacuum tube as anionization gauge is to use the grid as the positive ion collector. In this
case the plate potential Vj, is highly positive (e.g., +200 V) and the grid
potential somewhat negative (e.g., —25 V). This arrangement of
potentials is similar to that applied to the elements of a triode used in
an electronic circuit. The electron output from the cathode is then
heavily space-charge-limited because of the retarding effect of the inter-
posed negative grid. Those electrons which do escape into the grid-
to-plate region gain energy as they travel outward and strike the plate
with their maximum kinetic energy. Ionization occurs mostly in the
region near the plate, and the positive ions are drawn into and are
collected by the grid. Electronic tubes are traditionally checked after
assembly and evacuation by measuring the grid current, which is an
excellent indication of the residual gas. This process amounts to
the use of the tube as its own ionization gauge. Because in this modeof operation the electrons do not oscillate back and forth through the
grid as they do when the grid is at positive potential, the electron paths
are much shorter and the sensitivity as an ionization gauge is poor.
In practice, ionization-gauge tubes are therefore normally used with
the grid positive and the plate negative with respect to the cathode,
as described in the previous paragraphs.
In order to produce ionization by impact with an atom or molecule
an electron must have kinetic energy at least equal to the ionization
potential, which ranges from 3.89 eV for cesium to 24.6 eV for helium.
Of more practical interest in the formation of ions is the probability of
ionization Pi, which is defined as the fraction of electrons at a given
energy producing an ionizing collision per centimeter of path and per
torr of gas pressure. In Fig. 3-24 the probability of ionization is showngraphically as a function of electron energy for several common gases
as measured by Tate and Smith, i*
Since at a pressure of 1 torr and temperature of 0°C the molecular
density is
2.69 X 10"'
760
= 3.54 X 10" cm-»
the probability of ionization
Pi = Wio-j = 3.54 X lO^cTi (3-32)
in which a^ is the cross section for an ionizing collision by an electron.
The number of ions produced by an electron per centimeter ofpath from
94 VACUUM SCIENCE AND ENGINEBEING
(3-32) and (1-16) is then
273 273
20
(3-33)
15
Pi 10
AlA^sf/^^Vl
^:- '
^—
'
"=H
Plate or ion
collector
200 400
Electron energy, eV
600
-15 IVp+P^Vgto Z^ to ^
-30 :=: +180J_
volts -^ volts ^:
Fig. 3-25.
circuit.
Simple ionization-gaugeFig. 3-24. Probability of ionization
in C^HalD, 0^(2), ^^(Z), A(4), n^(5),
Ne(6), and He(7). [Taken with per-
mission from J. H. Leek, Pressure
Measurement in Vacuum Systems
(Published for the Institute of Phys-ics and the Physical Society byChapman and Hall, Ltd., London,
1964), 2nd ed.]
in which n is the molecular density corresponding to the pressure P andtemperature T of the gas. For an electron stream of current i_
amperes (6.24 x 10^* electrons/sec = 1 A), the positive ion current i^
amperes, assuming all the ions are collected, is thus given by
273 „.(3-34)
The maxima for the Pi curves for most gases occur in the energy rangefrom 60 to 200 eV, above which p^ decreases steadily with increasing
electron energy. For the common gases for which curves are shown in
Fig. 3-24, p^ reaches maximum values of about 1.5 for helium to about17 for acetylene so that the maximum values of the cross sections for
ionization (Tj vary from about 4 xfor the gases shown in the figure.
10-" cm2 to about 5 x lO-is cm^
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 95
The use of ionization of gas molecules by electron collisions as a means
of measuring the pressure (or more exactly the molecular density) of a
gas was first described by Buckley.^'' A simplified circuit for operating
an ionization gauge is shown in Fig. 3-25. The positive ion current
i^ to the plate (or ion collector) for a given value of the grid voltage Vg
and grid (electron) current i_ is a direct indication of the molecular
density and therefore also of the pressure. The sensitivity s of an
ionization gauge is defined by the relation
or
i^ = si_P
s i_(3-35)
and in principle could be calculated from (3-34) and the geometry of
the gauge tube. However, the average length of path for the electrons
is not easily estimated for tube geometries of practical interest, and
the energy of the electrons varies from the maximum value of the grid
voltage Vg to zero in a complicated way so that direct calibration of
each tjrpe of ionization gauge against a McLeod gauge is the only
practical means of determining the sensitivity. For sufficiently low
pressure only a small fraction of the electrons which contribute to i_
produce ionizing collisions, and therefore essentially none produce two
or more collisions. Therefore at sufficiently low pressure the sensitivity
s is expected to be independent ofC However, when the pressure is
high enough that a significant fraction of the electrons produce more
than one ionizing collision, then the multiplicity will increase with the
pressure, and the sensitivity is no longer independent of i_. In Fig.
3-26 the dependence of the ion current ^+ on the electron current i_ is
shown for three different makes of ionization gauges with nitrogen gas
at a pressure of 5 x lO-^ torr.^" At this pressure of nitrogen, i+ oc i_
for all three gauges up to values of i^ from about 10"^ to 3 X 10"* Adepending upon the characteristics of the gauge tube.
Measurement of the sensitivity 5 as a function of the pressure in the
range IQ-* to 1 torr shows that s increases with increasing pressure
until a maximum is reached and then decreases^" as shown in Fig. 3-27
for nitrogen and helium. The value of the pressure at which the gauge
sensitivity reaches its maximum value for helium is seen to be about
a factor of 10 greater than that for nitrogen. Since the process is
governed by the ionization probability Pi, which is about 6 to 10 times
as large for nitrogen as for helium in the electron energy range used in
ionization gauges, the pressure difference for the maxima is to be
expected. The rise in sensitivity in the vicinity of 10"^ torr for
nitrogen is caused by multiple ion production by each electron when the
96 VACITtrM SCIENCE AND ENGINEEEING
lO'10"* 10"
Electron current,I_,amp
10'
Fig. 3-26. Ion current as a function of electron current for three different gauges
operating on the same pressure of nitrogen gas. [Taken with permission fromW. B. Nottingham and F. L. Torney, Jr., in 1960 Vacuum Symposium Transac-
tions (Pergamon Press, London, 1961).]
ionization mean free path becomes small compared with the average
electron path length because of the high molecular density. Thedecrease in sensitivity with increasing pressure beyond the maximum is
attributed by Nottingham and Torney^" to ion-electron or positive-
ion-negative-ion recombination which becomes much more probable
at high molecular density.
Since those ions which are formed in the region between the cathode
p.torr
Fig. 3-27. Gauge sensitivity at very low electron current as a function of pressurefor nitrogen and helium. [Taken with permission from W. B. Nottingham andF. L. Torney, Jr., in 1960 Vacuum, Sym,posium, Transactions (Pergamon Press,London, 1961).]
PRESSTTBE MEASUREMENT IN VACUUM SYSTEMS 97
and the grid are drawn toward andbombard the cathode, operation of
an ionization gauge at pressures
much above 10"^ torr greatly short-
ens the life of the cathode. Theupper limit of operation of com-mercial gauges is therefore usually
set at this pressure with the result
that except near the upper limit of
the pressure range, say from 6 x 10"*
to 1 X 10~* torr, the sensitivity is
essentially independent of both the
electron current and the pressure.
However, for precision measure-
ments detailed calibration of eachgauge tube against a IMcLeod gaugeover the pressure range from 10~*
to 10-* torr is essential.
Since the ionization probability
Pi varies with the electron energy
(see Fig. 3-24) the sensitivity s de-
pends upon the grid potential V^.
As shown in Fig. 3-28 for nitrogen
H.U
1 ''<''^^T^n r^
;'/fpff
2.0
t/
////it
i J\r
—
'
1.0
/ A" i
ofA/
0.5
0.25!
50 100 150 200 250
Electron accelerotinq voltage.voits
Fig. 3-28. lonization-gauge sensi-
tivity for nitrogen and neon as afunction of the grid potential. (1)
Relative sensitivity, neon/nitrogen;
(2) sensitivity, nitrogen; (3) sensi-
tivity, neon. [Taken with permissionfrom J. H. Leek, Pressure, Measure-ment in Vacuun Systems (Published
for the Institute of Physics and the
Physical Society by Chapman andHall, Ltd., London, 1964), 2nd ed.]
(2) and neon (3) the sensitivity for
a given gas increases with the pressure rapidly for low values of Vgand then much more slowly, changing very little with increasing grid
potential above 200 V. Because the ionization potential for neon(21.6 V) is much higher than that for nitrogen (14.5 V) the relative
10 20
Electron current.mA
(o)
200 400Electron occ volts
(b)
'0-1 1.0 10 100
Collector-v bios
(c)
0.5 1.0
Pressure, microns
(d)
Fig. 3-29. Characteristics of typical triode ionization gauge for nitrogen. [Takenwith permission from J. H. Leek, Pressure Measurement in Vacuum Systems(Published for the Institute of Physics and the Physical Society by Chapmanand Hall, Ltd., London, 1964), 2nd ed.]
98 VACUUM SCIENCE AND ENGINEERING
sensitivity changes with grid potential as is shown in curve (1) in the
figure. Thus the relative sensitivities of an ionization gauge for
different gases are not fixed values but depend upon the gauge design
and the value of Vg.
The somewhat complex dependences of the positive ion current
on (a) the electron current , (6) the grid or accelerating potential F^,
(c) the plate or collector potential F,,,
and {d) the pressure are shown in the
curves in Fig. 3-29. These four ciurves
are convincing evidence that the sen-
sitivity 5 as defined in (3-35) is not a
true constant but depends upon a
number of factors.
Commercial ionization-gauge cir-
cuits are designed to maintain the
critical circuit parameters (partic-
ularly i_ and F^) constant at values for
which the sensitivity is approximately
independent of the pressure. The prob-
lem of regulating the cathode-emission
current was first solved by Ridenour
and Lampson^i by means of the circuit
shown schematically in Fig . 3-30 . The
lifetime of the cathode becomes quite
short at higher pressures because of
bombardment by positive ions formed
in the space between the cathode and
grid, so that commercial gauge circuits
are not normally made to operate
above 10-^ torr. Modern commercial
gauge circuits not only provide regu-
lation of the circuit constants for the
gauge but also means of precondition-
ing the tube by heating and outgassing
the electrodes as well as a sensitive
vacuum-tube electrometer circuit with
several ranges controlled by a selector
switch for reading the positive ion current conveniently over a wide
range on a simple panel meter. A sensitive relay in series with the
output meter is also frequently provided as a means of shutting off
the gauge circuit and performing other protective functions, such as
turning off diffusion-pump heaters and closing valves in the event that
the system pressure should exceed a safe limit.
" supply
Fig. 3-30. Circuit of Ridenour and
Lampson for regulating the emis-
sion current of an ionization gauge.
[Taken with permission from J. H.
Leek, Pressure Measurement in
Vacuum Systems (PubHshed for the
Institute of Physics and the Phys-
ical Society by Chapman and
Hall, Ltd., London, 1964), 2nd ed.]
PEESSUBE MEASUREMENT IN VACUUM SYSTEMS 99
The circuit constants and sensitivity (air) for a number of ionization-gauge tubes of different design are shown in Table 3-1. In this tablethe sensitivity is given in units of ,aA/micron/mA, that is, the positiveion current i^ in microamperes resulting from a pressure of 1 micron(10-3 torr) of air in the tube when the electron current i_ is 1 milli-ampere.
Table 3-1. Ionization-gauqe Opbbating Data"
Reference or supplier
Jaycox and Weinhart*"
Morse and Bowie*^
Bayard and Alpert**
Edwards High Vacuum IG.2Edwards High Vacuum IG.3 *
AEI. 29D.15 (miniature) . . .
AEI. 29D.2NRCNRC*CVC GIC.Oll*CVC VG.IA35 TG Eital-McCuUock"E 31 Precision Scientific Co.
1949 RCA"D 79512 Western Electric". . .
KIGT KinneyVAC-NIG, Vactronis Lab.f. .
F„, volts
-6-25
volts
-5 to -30-50 to -100-15 to -25
-25-20-40-45-25-25-25-25-25-30
+ 20 to -50
120
150
150
125
150
200
200
150
100
200
150
150
150
150
150
160
150
i_, mA
20
5
10
to 10
to 10
to 5
to 5
to 5
to 15
to 20
to 5
5
5
5
5
7
10
Sensitivity
(N^), s,
/<A/micron/mA
12.5
40
10
5
12.5
5.5
13
20
12.5
18
20
4
12
14
10
14.3
10
<• These data largely taken with permission from J. H. Leek, Pressure Measure-ment in Vacuum Systems (Published for the Institute of Physics and the PhysicalSociety by Chapman & Hall, Ltd., London, 1964), 2nd ed.
" E. K. Jaycox and H. W. Weinhart, Rev. Sci. Instr. 2, 401 (1931)." R. S. Morse and R. M. Bowie, Rev. Sci. Instr. 11, 91 (1940).'' R. T. Bayard and D. Alpert, Rev. Sci. Instr. 21, 571 (1950)." B. B. Dayton, Le Vide, p. 349 (1947).* Bayard-Alpert construction.
t Nude Bayard-Alpert constrviction.
Although the elements of the traditional ionization-gauge tube aresuperficially similar to those of an electronic tube, the function is quitedifferent and therefore also the details of the design. Since for manyapplications pressures of 10-« torr (10"^^) or lower are to be measured,the positive ion current is of the order of 10 x lO-^ x 5 ^A or5 X 10-8 A. There is no difficulty in amplifying such a current to themilliampere range for the operation of a sturdy panel meter. However,any electrical leakage in the gauge tube, in the leads, or in the power
100 VACUUM SCIENCE AND ENGINEERING
supply chassis must be small as compared with the minimum plate
current to be measured.
The design of ionization-gauge tubes is therefore such as to minimize
internal electrical leakage to the plate. In Fig. 3-31 is shown the
construction of the RCA 1949, which is widely used. The plate
support and lead are brought into the tube envelope
through the opposite end to those for the cathode and
grid, providing a very long leakage path from the
other elements of the tube to the plate. The RCA1949 also has two spiral-wound tungsten wire cath-
odes, only one of which is required for operation of
the tube. When one filament burns out, the other
one can be put into service, thus doubling the life of
the tube. The design of Morse and Bowie^^ shown
in Fig. 3-32 has been popular in industrial applica-
tions. The innovation introduced with this gauge
tube is the use of a platinum film deposited on the
inner wall of the tube as the ion collector. Not only
in this case is the electrical leakage path to the plate
large, but also the plate can be easily heated for out-
gassing by flaming the gauge tube. Connection to
the plate is made by a wire sealed into the side wall
of the tube. The grid is in the form of a spiral fila-
ment through which a current can be passed for
heating and outgassing.
Because all glass ionization-gauge tubes must be
connected to the system by a tubulation, the con-
ductance from the gauge to the system tends to be
somewhat constricted. In studying the performance
of diffusion pumps. Blears^* connected to the test
dome a normal ionization gauge with its usual tubu-
lation and also mounted inside the test dome an identical gauge from
which the glass envelope had been removed so that the gauge elements
were exposed directly in the test volume. Striking differences were
observed, the "nude" ionization gauge always reading higher by a
factor of 10 or more when the pressure reading was mainly due to the
vapor backstreaming from the oil diffusion pump. This effect was
attributed by Blears to the adsorption of the oil vapor on the inside
surfaces of the glass tube and tubulation of the conventional gauge.
Because of the very high conductance into the electrode structure of'
the nude gauge, the pressure indicated should be very nearly correct
even if adsorption does occur to some degree on the plate and
grid. Several designs of nude ionization gauges are now available
Fig. 3-31. RCA1949 ionization-
gauge tube. [Re-
produced through
the courtesy of
Radio Corpora-
tion of America.]
PEESSURE MEASUREMENT IN VACUUM SYSTEMS 101
commercially. The gauges are built on flanges for mounting withtheir electrodes inside the region where the pressure is to be measured.
Initial operation of an ionization gauge just after the system hasbeen pumped down from atmospheric pressure results in the heatingof the electrodes and the emission of large
quantities of absorbed gases from the surfaces.
Unless the gauge elements are heated vig-
orously to drive off absorbed gases, the readingwill remain high as compared with the systempressure for a long time. The grids of severalof the commercial designs are in the form offilaments which can be electrically heated.The plate can be heated by electron bombard-ment by connecting the grid and plate to-
gether at the same positive potential. Finally,
it is sometimes necessary to heat the glass ormetal envelope of the gauge tube to the safe
limit of temperature.
After the gauge tube and elements have beenthoroughly outgassed, an opposite effect be-comes noticeable. Because the surfaces withinthe tube are all thoroughly outgassed, gasentering the tube is readily adsorbed, partic-
ularly on the tube walls. Chemical reactionsinduced by the hot filament can further en-
hance the absorption of gas by the gauge.These processes are responsible for the pump-ing action of well-outgassed ionization gaugesreported by a number of observers beginningwith Langmuir.24 Riddiford^s has measured apumping speed for oxygen of about M Hter/sec
due to chemical reaction of oxygen with thehot filament of an ionization gauge. Gaspumping, either due to adsorption or due tochemical reaction, will cause the pressure atthe gauge to be lower than that in the system.If the pumping effect includes adsorption of gas on the inside surface ofthe tubulation, the pressure recorded by a conventional gauge is some-times a factor of 10 less than that recorded inside a test dome by anude gauge. Furthermore, according to Reich^s the time necessary forpressure equilibrium to be established between the test dome and thegauge tube through the tubulation can be many hours or even days.The adsorbed layer on the inner wall of the tubulation builds up first at
Fig. 3-32. Ionization
gauge designed by-
Morse and Bowie.
[Taken with permission
from R. S. Morse andR. M. Bowie, Rev. Sci.
Instr. 11, 91 (1940).]
102 VACUUM SCIENCE AND ENGINEERING
the end nearest to the test dome and then progressively grows along the
tabulation. Equilibrium is not estabhshed until the adsorbed layer has
grown the length of the tube. The growth rates of films for substances
of high molecular weight, such as oil vapor, are very slow so that the
equilibrium time becomes correspondingly long. Investigation of the
"Blears effect" by Haefer and Hengevoss^' confirms the original
results of Blears^* and leads to the conclusion that if diffusion-pump
oil vapor is present in a system operating in the ultrahigh vacuum
regime (P < 10-^ torr), a normal tubulated ionization gauge indicates
little more than the partial pressure of the permanent gases and does
not respond appreciably to the organic vapors present due to back-
streaming. According to these authors, "this behavior lies in the
vastly different conductance of the small connecting tube for oil vapor
and permanent gas in conjunction with the cracking of the oil molecules
by the gauge." The processes of thermal decomposition and wall
adsorption in ionization gauges are not completely understood, but
it is clear that these processes do, under some circumstances, lead to
large errors in pressure measurement which can be greatly minimized
by elimination of the tubulation and the use of the nude type of
ionization gauge.
The lower limit of pressure which can be measured with a conven-
tional ionization gauge is determined by a process not anticipated until
it was pointed out by Nottingham. ^^ He found that after all normal
leakage current was eliminated in an ionization gauge there remained
a base current to the plate even when the pressure in the system by
other indications was far too low to produce a positive ion current of
comparable magnitude. He found the residual plate current to be due
to the production of soft X-rays by the electrons striking the grid.
When electrons strike a target they produce X-ray photons of energies
up to the full kinetic energy of the electrons. These photons in turn
go in all directions from the source, in this case the grid, and release
photoelectrons from whatever surfaces they strike. Since in the con-
ventional ionization gauge most of the soft X rays produced at the grid
strike the plate, photoelectrons in significant numbers are continuously
produced at the plate. The electrostatic field at the plate is such as
to attract positive ions and therefore also to repel the photoelectrons,
the current of which is recorded by the external circuit as if it were
due to positive ions collected by the plate. Results by Nottingham
and others demonstrate that conventional ionization gauges never
give plate currents less than that corresponding to about 10~* torr even
when the pressure is of the order of IQ-i^ torr. Because of the X-ray
effect, the lower limit of reliability of the conventional ionization gauge
is found to be about 10-' torr.
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 103
3-7. The Bayard-Alpert Ionization Gauge. In order to reducethe low-pressure limit of the conventional ionization gauge due tophotoelectron emission from the plate, Bayard and Alpert^" deviseda modified ionization gauge as illustrated in Fig. 3-33. The gaugefeatures a cylindrical grid structure with a fine wire ion collector alongits axis and a cathode located just outside the grid structure to one side.
Because the plate structure of the conventional ionization gauge is
replaced by a fine wire, the total area exposed for X-ray-inducedphotoelectron emission is reduced by a factor of about 200. Thesensitivity of the Bayard-Alpert gauge proves to be comparable withthat of the conventional gauge because the electrons in oscillating fromthe external cathode back and forth through the grid structure spenda large portion of their time in the nearly field-free space (except for
the slight field due to the —20 V on the collector wire) within the gridat the kinetic energy (typically 200 eV) at which the probability ofionization 'p^ is near its maximum.The difference in performance between the Bayard-Alpert and the
conventional ionization gauge is shown graphically in Fig. 3-34 in whicha log-log plot of the collector current as a function of the grid potentialis shown for each type of gauge for various values of the pressure. Atsufficiently high pressure the collector current does not increase signifi-
cantly with grid potential above 200 V, a characteristic also illustrated
in Fig. 3-296. However, at very low pressure the positive ion currentbecomes small as compared with the photoemission current. Thecollector current then increases indefinitely with increasing grid poten-tial, being proportional to a power of the grid potential lying between1.5 and 2.0 as indicated by the slope of the log-log curve in the figure.
This characteristic can be explained on the assumption that the entire
collector current is due to photoemission. For intermediate pressuresa characteristic made up of a mixture of the ionization current andphotoemission current is obtained. The characteristic of the conven-tional ionization gauge at P < 10-^ torr is a pure power law typicalof photoemission with no vestige of any ionization current. Thecharacteristics for the Bayard-Alpert gauge, however, retain the ioniza-
tion component for values of the pressure lower by a factor of at least
100. Even at P < 5 x lO"" torr a slight departure from the purepower law provides a basis for crudely estimating the true positive ioncurrent. Gauge tubes made essentially as described by Bayard andAlpert are now commercially available from a number of sources andare frequently used on systems even when the operating pressure is
not below the limit of the conventional ionization gauge.A. van Oostrom^o describes a modified Bayard-Alpert gauge in which
the X-ray limit is reduced to lO-i^ torr or less by reducing the diameter
104 VACUUM SCIENCE ANB ENGINEERING
of the ion-collector wire to 4 /^ (1 /* = IQ-^ mm) and decreasing the
electron energy below 100 eV. The author states that by applying
a high negative voltage (-200 V or more) to the collector relative to
the grid, the sensitivity with the small-diameter collector is comparable
with that of the standard Bayard-Alpert gauge. Schuetze and Stork"
Conventional
Ion GougeNew Ion Gouge
torr
P=4xl0-'torr
100 1,000 100 1,000
Grid potentiol, volts
(a) (b)
Fig. 3-34. Ion collector current as a
function of grid potential for (a) con-
ventional ionization gauge and (6)
Bayard-Alpert gauge. [Taken with
permission from R. T. Bayard and D.
Alpert, Rev. Sci. Instr. 21, 571 (1950).]
Fig. 3-33. The Bayard-
Alpert ionization gauge.
(A) one of two alterna-
tive cathodes; {B) the
grid structure; (C) the ion
collector. [Taken with
permission from R. T.
Bayard and D. Alpert,
Rev. Sci. Instr. 21, 571
(1950).]
also report markedly reduced X-ray limit (5 x lO"" torr) by using an
ion-collector wire oflO /i diameter as compared with the usual diameter
of about 150fj.and by reducing the electron energy to 50 eV.
A further advance in the suppression of the X-ray photocurrent in
an ionization gauge is reported by Schuemann,*'' whose gauge modifi-
cation is shown schematically in Fig. 3-35. A suppressor ring electrode
located adjacent to the collector electrode is maintained at a high
negative potential ( — 300 V), imposing a strong electric field such as to
drive any photoelectrons emitted by the collector back into its surface.
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 105
_ Filament
(+50 volts)
ie-t-~^.
-Sh—Ionization grid
(+200 volts)
Shield (ground)
^
J
Between the suppressor electrode and the grid is a grounded shield,the function of which is to prevent X rays from the grid from strikingthe suppressor, causing emission of photoelectrons, which would thenbe attracted to the ion-collector plate and subtract from the ion-collector current. Schuemann states that this arrangement completelysuppresses the photocurrent and thus removes the X-ray limit entirely.Pressures as low as 2 x lO-i^ torr have been measured with the photo-current-suppressor gauge.
The Bayard-Alpert gauge displays the same tendencies either ofoutgassing or of "pumping" by gas absorption as were described forthe conventional ionization gauge.
According to Redhead,^^ the pump-ing speed of a Bayard-Alpert gauge,
operated at 8 mA electron current
and 250 eV electron energy, is about2 liters/sec for nitrogen when first
put into operation. This pumpingaction is made up of ion pumpingand chemical pumping. The ion
pumping results from ion bombard-ment of the electrodes and the glass
envelope. The chemical pumping is
due to chemisorption of gas on the
electrode and any metal films whichmay have formed, e.g., on the innersurface of the glass envelope. Red-head reports that the chemical pump-ing ceases for nitrogen after about lO^^ molecules have been pumped.The ion pumping continues at about 0.25 liter/sec until 10" moleculeshave been pumped, at which point it decreases rapidly. Chemicalchanges in gases are produced by the hot tungsten cathode normally op-erated at a temperature of about 1700°C, which is high enough to dissoci-
ate water vapor, hydrogen, and hydrocarbons. Carbon impurities in thetungsten cathode react with oxygen to form carbon monoxide anddioxide. Also at this temperature an appreciable fraction of hydrogenmolecules incident on the cathode are converted to atomic hydrogen.Since atomic hydrogen is readily absorbed at glass surfaces and reactschemically with components of the glass envelope and metal electrodesof the gauge tube to produce other gases such as carbon monoxide, anyhot-cathode gauge, such as the Bayard-Alpert, has an anomalouslyhigh pumping speed for hydrogen. Chemical changes which occur atthe surface of the hot filament result in serious errors in pressuremeasurement when hydrogen, oxygen, water vapor, or hydrocarbons
Suppressor wng (-300 volts)-' /
Collector /
Fig. 3-35. Schematic of photo-current suppressor gauge. [Re-printed with permission from TheMacmillan Company, from 1962Vacuum Symposium Transactions.
Copyright © 1962 by American Vac-uum Society.]
106 VACUUM SCIENCE AND ENGINEERING
are present. These effects are particularly troublesome in ultrahigh-
vacuum systems in which the predominant gas is hydrogen. These
troublesome effects can be largely eliminated by the use of a rhenium
filament coated with lanthanum boride (LaB,), which emits an ample
electron current (10 mA) at a much lower temperature (1,000°C) than
that (1,700°C) required for a tungsten
filament.
The Bayard-Alpert gauge is much
more susceptible to gross error due to
the accumulation of an insulating coat-
ing on the ion collector than is the con-
ventional ionization gauge. Lauer^*
reports that this condition, which can
result in gauge readings which are too
low by a factor of 10 or more, can be
easily corrected by connecting the ion-
ncollector electrode to the grid potential
for a few minutes, thus cleaning the
collector electrode by electron bombard-
ment.
Discrepancies between gauge readings
and the true system pressure are
greatly reduced, as in the case of the
conventional ionization gauge, when the
glass envelope is removed from a
Bayard-Alpert gauge and the gauge
unit immersed in the vacuum space.
In Fig. 3-36 is shown a flange-mounted
nude Bayard-Alpert gauge constructed
of ceramic and metal parts which
allegedly will withstand baking at high temperature for thorough
outgassing. Even if the elements of such an open gauge struc-
ture absorb, desorb, or chemically react to some degree with the
gases present in the system, the very large conductance for gas inter-
change ensures that the molecular density within the gauge will be
essentially the same as that in the surrounding volume and the gauge
reading will be reasonably accurate. Santeler^^ states that a nude
Bayard-Alpert gauge cannot measure pressures less than about lO""
torr, however, unless the backing plate which supports the gauge
elements can be baked at high temperature for thorough outgassing.
Also in the nude Bayard-Alpert gauge, space- and surface-charge effects
are frequently bothersome unless the gauge element is completely
enclosed in a metal-screen cylinder connected to ground potential.
Fig. 3-36. Nude Bayard-Alpert
gauge. [Reproducedthroughthe
courtesy of Vactronic Lab.
Equipment, Inc., East North-
port, Long Island, N.Y.]
PEESSURE MEASUREMENT IN VACUUM SYSTEMS 107
In a study of the operation of Bayard-Alpert gauges, Winters, Denison,and Bills^s conclude that many of the conditions leading to no'nlinearityin response can be greatly alleviated by the simple expedient ofreducingthe filament temperature and electron emission current. Accordingto Nottingham,^' one cause of anomalous behavior in the originaldesign of the Bayard-Alpert gauge is the loss of positive ions out theends of the grid structure. He has shown that this defect can becorrected by closing both ends of the grid structure with wire mesh.The uncertainty which develops at low pressure, particularly for
P < 10-« torr, is due to the fact that the composition of the residualgas cannot, in general, be predicted. Since the gauge sensitivity is
a function of the gas composition, varying by a factor of about 5 forthe common gases, interpretation of gauge readings in terms of molec-ular density at low pressure becomes quite uncertain. Because of thisobvious difficulty, low-pressure readings taken with a Bayard-Alperttype of ionization gauge are usually quoted in terms of the equivalentair pressure based upon a calibration against a McLeod gauge using acontrolled air flow. A much more precise measurement at low pressureinvolves vacuum analysis, i.e., the measurement of the partial pressuresof the gas components present in the system, a topic which will bediscussed in a later section.
3-8. Hot-cathode Magnetron Ionization Gauge. In the orig-inal design of the Bayard-Alpert gauge the X-ray limit (i.e., the pressurecorresponding to the photoelectron current emitted by the ion collectorbecause of X rays emitted by the grid) was reduced by a factor of about200, compared with the conventional hot-cathode ionization gauge.This was done by reducing the solid angle subtended at any point ofthe grid by the ion collector, thereby reducing the probability for anX-ray photon emitted by the grid to be intercepted by the ion collector.
A further improvement in this respect has been accomplished byLafferty,38 whose hot-cathode magnetron ionization gauge is shown inFig. 3-37. According to Lafferty,
It is evident that if the gauge is modified in such a way that the electronstravel in longer paths before they are collected by the positive grid or anode,the probability of them colliding with and ionizing a gas molecule will begreatly enchanced and the sensitivity of the gauge will be improved withno increase in x-ray photoemission. One obvious way of increasing the pathlength of the electrons is to employ a magnetic field.
The Lafferty gauge has certain features in common with the mag-netron, after which it is named. The hot-cathode filament is approxi-mately on the axis of symmetry of a cylindrical electrode, which is theanode. Electrons leaving the cathode in the absence of a magnetic
108 VACXTTJM SCIENCE AND ENGINEERING
field are attracted directly to the anode. However, when an axial
magnetic field is superimposed, the electron paths are bent. Finally,
as the magnetic field is increased in intensity, with the anode-to-cathode
potential held constant^ the electron current reaching the anode
suddenly decreases to a much smaller value. The magnetic field value
at which this sudden drop occurs corresponds to the magnetron cutoff.
Ep= 300 volts
Ec= -45 volts
Es= -10 volts
V-i,lon collector
Filament
Magnet
Anode
Shield
Ion current XIOO
Fig. 3-37. Hot-cathode magne-
tron ionization gauge. [Taken
with permission from J. M.
Lafferty, in 1960 Vacuum Sym-posium Transactions (Pergamon
Press, London, 1961).]
100 200 300 400 500 600
Magnetic tield, oersteds
Fig. 3-38. The anode electron current
and positive ion-collector current of the
magnetron gauge as a function of the
applied axial magnetic field. [Taken
with permission from J. M. Lafferty,
in 1960 Vacuum Symposium Transac-
tions (Pergamon Press, London, 1961).]
For higher values of the magnetic field, an electron emitted by the
cathode performs a cycloidal orbit which fails to reach the anode and
turns back toward the cathode. Only those electrons which are
disturbed from this orbit, either by high-frequency electrostatic fields
due to electron space-charge oscillation or by collision encounters with
gas molecules, ever reach the anode under these conditions. The
electron current curve, shown in Fig. 3-38 from Lafferty's paper,
decreases by about a factor of 10 as the magnetic field is increased from
zero to 200 oersteds.
The ion collector for the Lafferty gauge is a disk of about the same
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 109
diameter as the cylindrical anode, and is supported over one end of theanode with a sufficient gap to stand off a voltage. The lead for the ioncollector is at the end of the tube opposite that at which all the otherleads are located, to provide minimum electrical leakage. The loweror opposite end of the anode is closed by a similar disk, referred to asthe shield, which catches any positive ions leaving in that direction.The electrical potentials relative to the cathode are typically as follows
:
anode, 300 V; ion collector, -45 V; shield, -10 V. Typical magneticfield intensity is 250 oersteds, which can be maintained either by acylindrical alnico magnet or by a solenoidal coil placed around the tube.As the magnetic field is increased slightly beyond the magnetron
cutoff value, the length of the electron orbits, and thus also the numberof ions produced per electron, is increased by a large factor. The ioncurrent registered on the ion collector is also shown in Fig. 3-38 as afunction of the magnetic field intensity. It will be noted that thiscurrent is a maximum for a value of the magnetic field only slightlyabove the magnetron cutoff value. The positive ion current increasesby a factor of 10* or 10^ as the magnetic field is changed from less thanthe magnetron cutoffvalue of about 100 oersteds to about 150 oersteds,at which the ion current is a maximum. As the magnetic field is
further increased, the electrons emitted by the cathode are confinedmore closely to the vicinity of the cathode as their orbits are contracted,and thus sweep a shorter path through the gas, producing fewer ions.The maximum ratio of positive ion-collector current to electron anodecurrent is thus reached at a magnetic field value about twice as largeas the magnetron cutoff value. These are the most favorable con-ditions for operation in order that the X-ray limit be as low as possible.
In Fig. 3-39 the ion-collector current, as a function of the pressure,is plotted together with similar data taken with a Bayard-Alpert gauge.Based upon a determination of the X-ray limit of the ion magnetrongauge, which proves to be about 6 x 10"" torr, and a calibrationagainst the Bayard-Alpert gauge at higher pressures, the readings ofthe former were assumed to be a linear function of the pressure downto the lowest readings obtained. The Bayard-Alpert gauge readingsbegin to deviate noticeably from a straight line at lO-^" torr and reachan asymptotic value corresponding to an X-ray limit of about 3 x lO-^*torr, whereas the ion magnetron gauge indicates collector current aslow as that corresponding to a pressure of 4 x 10"" torr. Operatingparameters for both gauges are given in the figure. It will be notedthat for the ion magnetron gauge, /„ = 10-' A for the run, where I^ is
the emission current read on the anode when the magnetic field is zero.To produce approximately the same ion-collector current at higherpressures, the Bayard-Alpert gauge is operated with /j = 5 x 10-3 A,
no VACTJTJM SCIENCE AND ENGINEERING
indicating a greater sensitivity for the ion magnetron gauge by a factor
of 5 X 10-3/10-' = 5 X 10*.
At high pressure the secondary electrons produced by ionizing col-
lisions add to the electron space charge in the magnetron gauge, with
W-
10-'
10-'
10-'
10-'
10-'
Gauge Operating Conditions
o Magnetron gouge »Boyard-Aipert gouge
Ep= 300 volts
= -45 volts
Es= -10 volts
H = 250 oersteds
Ep= ISOvolts
Ec= -45 volts
Io= 5 mA
"I >I I I 1 1 III
I I I ' I I ml i_'
10",0-13 io-'2 IQ-" 10-'° 10-'
Pressure, torr
FlQ. 3-39. A comparison of the ion-collector current characteristics of the Bayard-
Alpert gauge and the magnetron gauge. A linear relationship between the
magnetron-gauge ion current and pressure is assumed at pressures below 10~*
torr. [Taken with permission from J. M. Lafferty, in 1960 Vacuum Symposium
Transactions (Pergamon Press, London, 1961).]
the result that the space charge becomes large enough for oscillations
to set in because of cooperative electrostatic forces. The gauge tends
to become unstable in operation, with frequent reversal of the ion-
collector current because of the ejection of high-energy electrons against
the repelling field of the collector. Because of this phenomenon, the
magnetron gauge is normally operated at low emission current of
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 111
Electron
multiplier
First dynode
Electrostatic lens
Multiplier
^/shield cylinder
Focusing
cylinder
Aperture
"--I .,
I
i-^-Alnico magnet^— Ion accelerator
w ^ M I I -Magnetron gauge
LaBfi
10-' A or less and is also normallyused only for measuring relatively
low pressures, say 10"' torr as theupper limit.
A further improvement in thehot-cathode magnetron ion gaugehas been described by Lafferty.^^*'
By drawing the ions produced in themagnetron gauge out one end byan electrostatic lens system designedto focus the ions on the first dynodeof an electron multiplier tube, as
shown in Fig. 3-40, the sensitivity
of the gauge has been increased bya large factor. The soft X raysfrom the magnetron anode wereprevented from falling on the dy-node, with the result that the X-raylevel was decreased to such a lowlevel that a pressure of 10"" ton-
should be detectable by countingindividual ions striking the first
dynode of the electron multiplier.
To prevent direct light emitted bythe thermionic cathode from pro-
ducing a response on the electron
multiplier, a lanthanum boride
(LaBg)-coated rhenium filament,
which produces electron emission at
much lower temperatures, was sub-stituted for the tungsten cathode.As shown in the figure, the low-
temperature cathode consisted of alO-mil-diameter rhenium wire, withan open helix of a 5-mil-diameterrhenium wire wound on it and then coated with lanthanum boride.The lower-temperature cathode should also contribute to a reductionin the anomalies caused by a hot cathode referred to in the previoussection.
3-9. Magnetically Collimated Electron-beam IonizationGauge. An ionization gauge in which the ions are produced by anelectron beam collimated by a carefully aligned magnetic field hasbeen described by Klopfer." As is apparent from Fig. 3-41, electrons
LJ Filament
detail
Fig. 3-40. Hot-cathode magnetronionization gauge with electrostatic
lens system to focus ions on the first
dynode of an electron multiplier tube.
Also detail of low-temperature, lan-
thanum boride (LaBg) coated cathode.
[Reprinted with permission of TheMaomillan Company from 1962 Vac-uum Sym.posium Transactions. Copy-right © 1962 by American VacuumSociety.]
112 VACUUM SCIENCE AND ENGINEERING
are emitted from a thermionic cathode K, coUimated through a series
of apertures at various electrical potentials, traverse an isolated chamber
in which ions are produced, and finally collected by an electron-trapping
electrode T. Ions produced within the chamber between G^ and G^
are attracted to the ion-collector plate / at ground potential, which is
negative relative to the electron beam and the chamber walls. The
magnetic field of about 1,000 oersteds intensity is carefully aligned
10'
field
1,000 gauss
30 volts
Fig. 3-41. Schematic diagram of
magnetically coUimated electron-
beami ionization gauge. [Takenwith permission from A. Klopfer,
in 1961 Vacuum Symposium Trans-
actions (Pergamon Press, London,1962).]
10
:10'
10"
10-"
// Vk= + 30,V5= VA=+180volts
B = l,000gauss
IQ-12,0-10 10-8 10-6 10-4 ,0-:
Pressure, torr
10"
Fig. 3-42. Relative ion current vs.
nitrogen pressure for the electron-
beam ionization gauge of Fig. 3-41.
[Taken with permission from A.
Klopfer, in 1961 Vacuum Sympo-sium. Transactions (Pergamon Press,
London, 1962).]
relative to the series of apertures through the electrodes G^ through
(t4 so that at all the electrons pass through the apertures and are caught
on the electrode T. The geometry of the gauge is such that X-ray
photons emitted by the electron-trapping electrode T because of electron
impact cannot irradiate the ion-collector electrode J directly, so that
electron emission from the ion collector is minimized. The presence of
the magnetic field further reduces the X-ray effect by causing anyelectrons emitted at the electrode surface to move in circular orbits
and return to the electrode. Emission of photoelectrons due to light
from the cathode striking the ion collector is avoided partly by the
geometry of the gauge, which shields the collector from direct irradiation
by the cathode, and also by the use of a low-temperature cathode, suchas a lanthanum boride-coated rhenium filament.
The use of a low-temperature cathode also serves to reduce substan-tially the pumping effect due to chemical reactions at the cathode. As
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 113
a consequence, the pumping effect of the gauge is determined primarily
by the rate of production and collection of positive ions. For nitrogen
the pumping speed of the gauge is calculated to be about 3 x 10"^
liter/sec with an electron beam current of 1 mA. One side of the
ionization chamber is covered by an open screen providing high con-
ductance to the surrounding space, so that the gauge error due to
pumping is believed to be very small.
As is illustrated in Fig. 3-42, the response of the gauge is linear from
about 10~^ torr to at least as low as 10~i^ torr. The linear response
up to such a high pressure is apparently due to the fact that only the
electrons coming directly from the cathode and not those produced byionization along the beam are effective in producing ionization. The
electrical potentials are arranged such that the electrons traverse the
ionization chamber at an energy of 100 eV, a value at which the specific
ionization is near maximum. Electrons formed by collision processes
in the chamber, however, have very little energy and no means of
gaining energy from the electric fields present in the chamber.
3-10. Cold-cathode Ionization Gauges. The useful life of a
hot-cathode ionization gauge is determined by that of the cathode.
lOcm
Fig. 3-43. Penning cold-cathode ionization gauge. [Taken with permission
from J. H. Leek, Pressure Measurement in Vacuum Systems (Published for the
Institute of Physics and the Physical Society by Chapman and Hall, Ltd.,
London, 1964), 2nd ed.]
Particularly at relatively high pressures, approaching 10"' torr, chem-
ical attack by some gases and bombardment by positive ions limit the
useful life of hot cathodes. In 1937, Penning*^ described a cold-cathode
gauge, sometimes called the Philips ion gauge or PIG. As shown
schematically in Fig. 3-43, Penning's original gauge consisted of two
parallel plates P at cathode potential separated by a distance of about
114 VACUUM SCIENCE AND ENGINEERING
• H
2 cm and a ring electrode R at anode potential suspended in the mid-
plane between the two plates. A magnetic field of about 500 oersteds,
with the lines of magnetic flux perpendicular to the planes of the
electrodes, was provided by a permanent magnet with a pole on either
side of the tube. When a potential difference of 2,000 V was applied
between the plates as cathodes and the ring as anode, a current was
observed to flow and was found to be
approximately proportional to the pressure
for the range 10"^ to 10"^ torr.
In the absence of the magnetic field the
electrode structure of the Penning gauge
would not result in a discharge current
except at relatively high pressure, of 10"^
torr or more. The presence of the magnetic
field changes completely the character of the
discharge because electrons emitted by the
cathodes are constrained to move in tight
helical paths along the lines of force and are
thereby prevented from going directly from
the cathode plates to the anode ring. The
electrons, instead, oscillate through the ring
between the plates and slowly drift outward
across the magnetic field toward the ring
only as a result of collisions with gas mole-
cules, which are ionized to form positive ions
and additional electrons. The positive ions
are attracted immediately to the cathodes
and, in contrast with the usual gaseous dis-
charges, account for most of the current flow
in the discharge. The additional electrons
contribute to further ionization. Because of the comparatively long
electron path, which results from the oscillatory motion, the gas breaks
down into a discharge even when the pressure is as low as 10~^ torr.
The original design of the Penning gauge, characterized by the ring
tjrpe of anode illustrated in Fig. 3-43, proved to be somewhat unsatis-
factory in that the discharge is unstable and the current as a function
of the pressure exhibits unpredictable changes of magnitude between
2 and 5 per cent. Below 10~^ torr the discharge becomes erratic andfrequently fails entirely at pressures of 10~* torr and below. These
difficulties were partly overcome in an improved form of the cold-
cathode gauge described by Penning and Nienhuis*^ and illustrated in
Fig. 3-44. The anode of the improved gauge is in the form of a cylinder
of about equal length and diameter, with flat plates as cathodes located
Fig. 3-44. Cold-cathode
ionization gauge ofPenning
and Nienhuis with cyhn-
drical anode. [Taken with
permission from F. M.Penning and K. Nienhuis,
N. V. Philips' Tech. Rev.
11, 116 (1949).]
PBESSUBE MEASUREMENT IN VACUUM SYSTEMS 115
at either end of the cylinder. The sensitivity of the gauge was in-
creased by about a factor of 10 to about 1 mA at 10"* torr for a circuit
voltage of 2 kV, the range of linear response extended down to less than10^' torr, and the amplitude of the erratic changes in the discharge
current reduced to 2 per cent or less. With a gauge of similar geometry,
but with nickel instead of zirconium cathodes, Leek and Riddoch**
obtained the calibration curves shown in Fig. 3-45, which are in goodagreement with those obtained by Penning and Nienhuis. The current
100
=1.
I 50
4kV 2ky
l^ j.-1kV
0.3
0.15
i\y
J^^ TkV
1 2 " 2.5 5
Pressure, X 10^ torr Pressure, X 10^ torr
Fig. 3-45. Penning gauge calibration curves for air obtained by Leek and
Riddoch (these characteristics are independent of the magnetic field over the
range 500 to 1,000 gauss). [Taken with permission from J. H. Leek, Pressure
Measurement in Vacuum Systems (Published for the Institute of Physics and the
Physical Society by Chapman and Hall, Ltd., London, 1964), 2nd ed.]
is proportional to the pressure over the useful range of the gauge, i.e.,
from about 10"' to 10"* torr. Also the sensitivity is proportional to the
anode-to-cathode voltage over the range 1 to 4 kV. At a pressure of
about 10-* torr the current decreases suddenly to a much lower value
so that the gauge is not considered reliable below about 10"' torr.
Since a ballast resistor must be put in series with the power supply for
protection in the event of a short circuit, the gauge is somewhat non-
linear from 10-* to 10-3 torr, above which the current increases steeply
with the pressure. The steep increase of the current with increasing
pressure above 10-^ torr can be used to protect a system against pressure
bursts. A relay in the circuit set to operate in this range can be used
to shut off gauges, close valves, and perform other protective functions
in the event of an excessive gas burst.
The Penning cold-cathode ionization gauge cannot be relied upon for
pressure measurements of high precision, even with great care in cali-
bration, because of the slightly unstable character of the discharge.
However, this type of gauge is sufficiently reliable as a pressure
indicator for many vacuum process applications and has a very long
116 VACUUM SCIENCE AND ENGINEERING
useful life as compared with the hot-cathode ionization gauges because
of the rugged character of the cold cathodes.
A cross-sectional view of a commercial Penning discharge type of
gauge is shown in Fig. 3-46. The anode in this design is shaped to
provide a maximum area while keeping the exterior dimensions of the
gauge tube to a minimum. A shield protects the high-voltage insulator
from accumulating spluttered atoms and ions, contributing to a long
life against electrical leakage and breakdown. The gauge tube and
tubulation are of stainless steel. Because of these features the gauge
is said to provide an operating life under favorable conditions up to
Section AA
Fig. 3-46. Cross section of Kinney all-metal Penning discharge vacuum gauge.
50,000 hr. However, as with all cold-cathode gauges, excessive
exposure to hydrocarbons will result in contamination due to decom-
position products deposited on the electrodes and insulator. To remove
oil from the gauge, the manufacturer recommends washing with
trichlorethylene, rinsing with acetone, and drying by gentle heating in
air. To remove decomposition products, a cleaning solution made up
of 225 g of ferric chloride, 500 cm^ of hydrochloric acid (38 per cent HCl)
and 1,400 cm' of distilled water is recommended. The gauge tube is
placed in a beaker and filled nearly to the top with hot cleaning
solution which is maintained at the boiling point for about 15 min;
the tube is then rinsed with distilled water followed by acetone, alcohol,
or ether and finally thoroughly dried by warming in air.
Although the Penning discharge gauge described above is mechani-
cally rugged and is not damaged by exposure to atmospheric pressure
while the voltage is on, observing certain precautions will contribute
to greater operating life by avoiding contamination. The gauge tube
should not be mounted in a position where it is in a direct line with a
source of hydrocarbon vapor. It should not be operated at pressures
in excess of 10 torr nor during the pumpdown period.
A simplified circuit diagram for the Penning discharge gauge is shownin Fig. 3-47, and the pressure response curve is shown in Fig. 3-48.
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 117
Note;S -Fully CCW ; rear view of switch shown
Fig. 3-47. Circuit diagram for Kinney Penning discharge vacuum gauge.
~^ -n ^ —000
L 1 1
">///
1 1 1
50/iAatO.Ol/i^
1 1 1
/100
N./y/—1—1—1
1 1 /lu 7
//
1 /
10' 10" 10"* 10"*
Pressure, torr
10" 10" 10"'
Fig. 3-48. Calibration curve for Kinney Penning discharge gauge.
118 VACUUM SCIENCE AND ENGINEERING
The gauge is calibrated over the pressure range from 2 x 10~' to 10 torr,
the response above about 2 x 10~* torr being much flatter than at lower
pressures as shown in the figure.
A further development of the cold-cathode ionization gauge wascarried out by Beck and Brisbane,*^ Haefer,** and Redhead*' and has
culminated in a gauge of high sensitivity and reliability. The added
ooo oo oo oo oo ooo
A xiol magnetic
field
start of electron
Fig. 3-49. Schematic of
the Haefer inverted-mag-
netron type ofcold-cathode
ionization gauge. [Takenwith permission from Hel-
mut Schwarz, Vacuum 11,
151 (1961).]
Auxiliory cathode -Anode
Cothode
Fig. 3-50. Cutaway view of inverted
-
magnetron cold-cathode ionization
gauge. [Taken with permission fromP. A. Redhead, in 1958 VacuumSymposium Transactions (PergamonPress, London, 1959).]
feature is the use of crossed electric and magnetic fields to increase bya large factor the path of the few electrons emitted by the cold cathode,
and thus also the efficiency of the electrons in producing positive ions.
A schematic representation of the Haefer inverted-magnetron gauge is
shown in Fig. 3-49. The cathode is a cylinder (actually the metal case
of the gauge tube) about 5 cm in diameter, and the anode is a small
diameter metal rod located on the axis of the cathode. A magneticfield of about 2,000 oersteds intensity parallel with the axis of the tubeis maintained by an external coil. A potential difference of several
kilovolts is applied between the anode and cathode so that a radial
electric field is superimposed upon the axial magnetic field. An electron
anywhere in the region between the anode and cathode will move on acycloidal path in the E x H (azimuthal) direction with a drift velocity
given by
v^ = lO^E/H) cm/sec
PRESSUEE MEASUREMENT IN VACUUM SYSTEMS 119
in which E is the electric field intensity in volts per centimeter and H is
the magnetic field strength in oersteds. Since the drift velocity is
everywhere perpendicular to both E and H, the electrons move in
circular cycloidal paths at a constant average radius from the center.
Only upon collision with a gas molecule is the electron disturbed from
this path because of energy loss in the collision. Each time such a
collision occurs the electron moves into a new circular cycloidal path
closer to the anode. With a proper
choice of the parameters the drift
velocity of the electrons is sufficient
to ionize gas atoms so that an
appreciable fraction of the colli-
sions results in the production of
positive ions which are attracted im-
mediately to the cathode. By this
process each electron emitted from
the cathode produces a large num-
ber ofionizing events before it finally
spirals into the center of the gauge
and is caught on the anode.
In Fig. 3-50 is shown a cutaway
view of an inverted-magnetron
gauge developed by Redhead*' in
which the cathode is surrounded byan auxiliary cathode outer shell
with cylindrical shields protruding
through the openings into the cath-
ode. The auxiliary cathode acts as
an electrostatic shield and protects
the edge of the openings through the cathode from field concentrations,
thus preventing field emission. The cathode and auxiliary cathode
are both grounded, but the current to the cathode alone is taken as
the measure of the true positive ion current. The anode rod is typically
maintained at 6 kV and the magnetic field intensity at 2,000 oersteds.
In the pressure range from 10"" to 10"* torr the positive ion current
was found to conform to the relationship
i+ = cP"
in which n varied from 1.10 to 1.15 and c was a constant. Above10-3 torr the space charge changes from negative to positive with
the result that the characteristics of the gauge change completely.
Calibration curves for several models of the inverted-magnetron
gauge are shown in Fig. 3-51, together with a similar curve for the
,0-11 ,0-9 ,0-7
Pressure, torr
Fig. 3-51. lon-current-vs. -pressure
relationship for inverted-ion-magne-
tron gauge. [Taken with permission
from P. A. Redhead, 1958 VacuumSymposium, Transactions (Pergamon
Press, London, 1959).]
120 VACUUM SCIENCE AND ENGINEERING
Anode
Cathode
Fig. 3-52. Cold-cathode magnetron gauge. [Taken with permission from P. A.
Redhead, 1958 Vacuum Symposium Transactions (Pergamon Press, London,
1959).]
Bayard-Alpert gauge. As in the case of the hot-cathode magnetron
gauge discussed in the previous section, the X-ray hmit of the
inverted-magnetron gauge is well below that of the Bayard-Alpert
gauge.
The type of gauge generally referred to as the Redhead gauge is aninversion of the geometry discussed above and designated the cold-
cathode magnetron gauge by Redhead.** The cathode, as shown in
Fig. 3-52, is in the form of a spool consisting of a small-diameter central
cylinder and two end disks. The anode is a cylinder with a diameter
about equal to that of the end disks
and is perforated with many holes
to ensure good conductance be-
tween the regions inside and outside
the gauge volume. An auxiliary
cathode in the form of an electro-
polished ring is placed at each endof the cylindrical anode in the gapbetween the anode and cathode to
reduce field emission currents to a
minimum. Redhead found that in
the pressure range from 10~^ to
10~* torr the cold-cathode magne-tron gauge with anode potential of
5 kV and magnetic field of 1,070
oersteds has a linear characteristic
as shown in Fig. 3-53 for nitrogen
and helium. As can be seen fromthe graph, the ion current in amperes
Pressure, torr
Fig. 3-53. lon-current-vs. -pressurerelationship for magnetron gauge inthe range 10"* to 10-9 tQj.r. [Takenwith permission from P. A. Redhead,1958 Vacuum, Symposium, Trans-actions (Pergamon Press, London,1959).]
PEESSUBE MEASUREMENT IN VACUUM SYSTEMS
Table 3-2. Cold-cathode Gauge Chaeactebistics*
121
GaugeAnodevoltage,
kV
Ion-current
pressure.
A/mm Hg
Pretreatmentof gauge
GasPumping
rate,
1/sec
Bayard-Alpert, 10 mA. . 0.1 Outgassed Argon 0.080
5.0 4.0 Baked at 400°C ArgonNitrogenOxygen
0.200
0.140
0.150
5.0 4.0 Operated for several
hotirs in oxygenArgonNitrogen
Oxygen
0.050
0.100
0.120
Reduced -size cold
5.0 4.4
Operated for several
hours in argonBaked at 400°CInduction heated to
800-900°C
Argon
ArgonArgon
0.018
0.042
0.350
Reduced-size cold
1.2 0.46
Induction heatedInduction heatedfInduction heatedf
ArgonArgonOxygen
0.110
0.330
0.340
Reduced-size cold
0.3 0.03t
* Taken with permission from T. N. Rhodin and L. H. Rovner, in 1960 Vacuum SymposiumTransactions (Pergamon Press, London, 1961), p. 228.
f Prolonged treatment with some evaporation of metal.
% Ratio of ion current to pressure is not constant.
for nitrogen is given approxi-
mately byi^ = lOP
in which the pressure is given in
torr. It was also observed that
at a pressure of about 2 x lO^^"
torr there is a break in the re-
sponse curve so that below this
value of the pressure the curve
is no longer linear but takes the
form
as shown for helium in Fig. 3-54.
Redhead reports that the cold-
cathode magnetron gauge has a
pumping speed of approximately0.15 liters/sec. Rhodin andRovner** have made extensive
measurements of the pumpingspeed of cold-cathode magnetron
10-'
eio''
10'1-12
Helium
,y
-->
• Run 1
,/59'
Magnetron gauge
operating alone
'SkVB=l,060 gauss
X Bayard-Alpert gauge
operating alone
Run 2
Run 3 J
1010 10"
Pressure, torr
Fig. 3-54. lon-current-vs.-pressure rela-
tionship for magnetron gauge in the
range 10~' to 10~l^ torr. [Taken with
permission from P. A. Redhead, in
1958 Vacuum Sym,posium Transactions
(Pergamon Press, London, 1959).]
122 VACUUM SCIENCE AND ENGINEERING
gauges similar to that of Redhead and report that the principal disad-
vantage is the high pumping speed of such gauges, leading to some
ambiguity in interpretation of the ion current reading. The results
of their measurements are summarized in Table 3-2 in which the pump-
ing speeds of the normal size (Redhead) cold-cathode magnetron gauge
and one of reduced size are compared with that of a Bayard-Alpert
type of hot-cathode ionization gauge. In spite of the high pumping
speed and its dependence upon the
Section A-A30 to 40 volts
contoined in amplifier
power supplyQutput
Housing
1 2l'Mi|i|i|
I II I
Fig. 3-55. The Alphatron gauge.
[Taken with permission from J. R.
Downing and G. Mellen, Rev. Sci.
Instr. 17, 218 (1946).]
previous history of the gauge, as
illustrated in Table 3-2, the cold-
cathode magnetron gauge is useful
in the pressure range below 10~ii
torr, a pressure well below the
range of the Bayard-Alpert gauge.
The high pumping speed is appar-
ently associated with the very high
efficiency of ionization by the elec-
trons in their circular cycloidal
orbits, which results in a high
sensitivity, i.e., high positive ion
current, as compared with that of
the Bayard-Alpert gauge operating
at the same pressure.
3-11. The Alphatron Gauge.Any process which causes ioniza-
tion of the residual gas in a tube or
chamber can, in principle, be used
as a basis for an ionization gauge.
X rays, alpha particles, beta
particles, and gamma rays are all ionizing agents, the advantages of
which may be considered as possible means of ionizing gas for the
purpose of measuring its molecular density. A practical development
of this type is the Alphatron (National Research Corporation) gauge of
Downing and Mellen'" which utilizes a small source of alpha particles,
for example, 0.5-mg piece of an alloy of gold and radium sealed in
a capsule. The gauge consists of a source holder and two grid struc-
tiires inside a small metallic ionization chamber which serves as the gauge
tube (see Fig. 3-55). A diiference in potential of 30 to 40V is maintained
between the two grid structures to sweep out the ions and electrons
formed by the ionization process. The ionization current is found to be
substantially a linear function of the pressure over a wide range, from10-* to 40 torr for the first version of the Alphatron, the current being
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 123
2 X 10-1" A for a pressure of 1 torr of dry air. An improved version of
the Alphatron described by Vacca'^ is provided with six ranges with full
scale readings of 10-^, 10"^, 10, 100, and 1,000 torr. The low range is
accomplished by an improved electrometer tube and circuit capable
of amplifying currents as low as 10-^* A. The higher ranges are
obtained by using a second ionization
chamber of very small volume. Thelinearity of the new gauge is said to
be within 2 per cent of full scale for
all ranges.
3-12. The Knudsen RadiometerGauge. The Knudsen*^ radiometer
gauge is perhaps the most widely
known and described^' of the less com-
mon vacuum gauges. The basic ele-
ment of the radiometer gauge consists
of two parallel plates, one of which is
heated, separated by a distance which
is small as compared with the dimen-
sions of the plates, as shown in
Fig. 3-56a. The unheated plate is
supported on a sensitive suspension so that a small force acting uponit can be measured. An alternative form is shown in Fig. 3-566 in which
the unheated vane is suspended between two fixed plates, one of which
is heated and the other cooled. The force per unit area on the sus-
pended vane or plate is given approximately by
Fig. 3-56. The two alternative
basic elements of the Knudsenradiometer vacuum gauge. [Takenwith permission from J. H. Leek,
Pressure Measurement in VacuumSystems (Published for the Institute
of Physios and the Physical Society
byChapman and HalI,Ltd., London,1964), 2nd ed.]
f-I ©% {^
dyne/cm^ (3-36)
for the first case in which T^ and T^ are the temperatures respectively
of the heated plate and the vane, T is the ambient temperature of the
walls of the gauge tube, and P is the gas pressure. In the second case
/2 =T,V^"
w^m dyne/cm ^ (3-37)
in which T^ and T^ are respectively the temperatures of the heated andcooled plates and T is the ambient temperature. In this latter case
the force on the vane does not depend on its temperature T^. In either
case the force depends directly upon the pressure in the strictest sense,
124 VACUUM SCIENCE AND ENGINEERING
the force per unit area exerted by the gas, with no dependence upon the
molecular weight of the gas. In this respect the Knudsen gauge maybe considered an absolute pressure-measuring device.
A more exact treatment of the theory of the Knudsen gauge, taking
into account the accommodation coefficients for the vane surfaces and
the inside surface of the gauge tube, leads to much more complicated
expressions for the force per unit area on the vane. Differences in
accommodation coefficients at the various surfaces result in responses
which differ for various gases, with the response to helium and hydrogen
being particularly low for some gauge designs.
The linear expressions for the response of the Knudsen gauge are
valid only in the pressure region for which the molecular mean free
path is large as compared with the spacing between the vane and fixed
plate or plates. By using the smallest practical spacing and a closed
box structure about the vane system, linear response up to a pressure
of 10-» torr can be obtained. At higher pressures the response is
always less than the linearly extrapolated value and eventually begins
to decrease with increasing pressure. The useful range of the radi-
ometer gauge thus tends to be from about 10"* to 10-* torr.
In practical designs of the Knudsen gauge pressures as low as 10-^
torr are detectable. Since a sensitive suspension is required, all designs
of the Knudsen gauge thus far developed are too cumbersome and
fragile for most applications. Many special adaptations have been
made and successfully applied, however, when the unique features of
the Knudsen type of gauge are important, such as freedom from
chemical decomposition of heavy organic molecules, a process which
does occur in all types of ionization gauges.
3-13. Calibration of Vacuum Gauges. For many years the
accepted standard for calibrating other vacuum gauges in the pressure
range below that easily accessible to the simple mercury U-tube
manometer has been the McLeod gauge. The limitations of the
McLeod gauge and the precautions necessary to obtain consistent
results are discussed in Sec. 3-4. It is clear from that discussion that
the calibration of other vacuum gauges is limited to gases which obey
Boyle's law up to the maximum pressure to which it is compressed
in the operation of the McLeod gauge. Accepted practice has been to
provide a glass- or metal-walled chamber evacuated by a liquid-
nitrogen-trapped diffusion pump to which the McLeod gauge and the
gauges to be calibrated are connected each through a liquid-nitrogen-
cooled trap, somewhat as shown in Fig. 3-57. The use of liquid-
nitrogen-cooled traps is essential to protect the ionization gauges
from mercury vapor from the McLeod gauge and also to protect the
McLeod gauge from contamination by hydrocarbon vapor from the
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 125
system. A needle valve is provided so that any chosen gas can be
admitted to the system at a controlled rate to vary the pressure.
For calibrating thermocouple and Pirani gauges, usually from 10'^ to
1 torr, only a rather insensitive McLeod gauge (small bulb and large-
diameter capillary) is required, and no serious difficulties are reported.
However, for calibrating ionization gauges over a sufficient pressure range
in the region of linear response, the greatest McLeod gauge sensitivity
Gas input
through drying tube
Gauges
to be
coiibrated
Severe I
locations
around
chamber
McLeodgauge
Liquid- Liquid-
nitrogen trap nitrogen trap
ffiK^'\K.'\K<^K Liquid-nitrogen and
Iwater-cooled baffles
Diffuion
pump
Fig. 3-57. System for calibrating vacuum gauges against a McLeod gauge.
is required. Even so, the lowest pressure which can be rehably
measured with sufficient precision by means of a McLeod gauge is
about 10-5 torr. Thus ionization gauges are normally calibrated from
10-5 to 10-^ torr, in the upper portion of which range the response of
most ionization gauges is no longer linear. The range of linear
response available for calibration in this manner is therefore only about
a factor of 30 in pressure for determination of the gauge constant.
Recently, however, a much more serious objection to this method of
calibration of ionization gauges has been raised by Ishii and Nakayama,^*
who find a pronounced dependence (up to 25 per cent) of the calibration
upon the ambient temperature. They attribute this effect to the
pumping action of the mercury vapor stream from the McLeod gauge
into the liquid-nitrogen-cooled vapor trap. By cooling the McLeod
126 VACUUM SCIENCE AND ENGINEERING
gauge at the cutoff point with dry ice before the mercury is raised,
thereby reducing substantially the vapor pressure driving mercuryvapor into the cold trap, this particular gauge error was eliminated.
The result of these observations brings into serious question the long-
accepted method of pressure measurement involving large temperaturedifferences when condensable vapor pressure dominates in some portion
of the vacuum system.
Gas
Throttle
valve
To (reference)
gougeGouge to be
calibroted
inlet
Fig. 3-58. Apparatus for calibrating vacuum gauges at low pressure by gas flowthrough apertures. [Taken with permission from J. R. Roehrig and J. C.
Simons, Jr., in 1961 Vacuum Symposium Transactions (Pergamon Press, London,1962).]
An alternative method for calibrating ionization gauges has beendeveloped by Roehrig and Simons^^ and results compared withcalibrations against a McLeod gauge. The apparatus as illustrated
in Fig. 3-58 consists of a test chamber and an adjoining pumpingchamber connected by an aperture of small conductance Cj. Thepumping chamber is evacuated by a high-speed trapped diffusion pumpthrough a second aperture of conductance C^ which is small as comparedwith the pumping speed Sj, of the trapped diffusion pump. Thepumping speed out of the pumping chamber is then, according to (2-8),
Co — GoS^
s^ Go(3-38)
which differs only slightly from G^ if Cj < S^. Thus the pumpingspeed out of the pumping chamber is relatively constant and independ-ent of small changes in S^. The pumping speed out of the test chamber
PRESSURE MEASUREMENT IN VACUUM SYSTEMS 127
IS
S,= Gi + S2
G1S2
G, + G2(3-39)
as long as Cj < S^.
For a measured flow of gas Q the resulting change in pressure AP is
given by
Q^^ = ^-^- = ^.-C,-fC;.Q
G-fi^(3-40)
The pumping apertures are most conveniently in the form of circular
holes for which the conductance given by (2-89) is
\^rC = 2.861— 11)2 liters/sec
and is accurately determined as long as the diameter of the aperture
and the ambient temperature are known. The method also requires
an accurate measurement of the gas flow Q, alternative methods for
which are discussed in Chap. 7. This type of system may be extended
by the addition of several pumping chambers with apertures between
stages to permit calibration down to very low pressure.
Gauges to be calibrated are connected to the test chamber, and the
gauge responses are compared with a series of pressure increases AP.
The authors state that results obtained in this manner on a four-stage
system were in agreement with results obtained by calibration of the
same gauges with a McLeod gauge within 2 per cent over the pressure
range from 10"^ to 10""^ torr, with poorer agreement below 10"* torr
because of the inaccuracy of the McLeod gauge in this range. This
agreement appears to be inconsistent with the discrepancies reported by
Ishii and Nakayama^* for McLeod gauge calibration. In any case, the
aperture method is free of criticism based upon the pumping action of
a liquid-nitrogen trap associated with a McLeod gauge and is apparently
the most reliable method yet developed for ionization gauge calibration.
This method has the further advantage of being applicable, according
to Roehrig and Simons, for accurate calibration of gauges down to
10-9 torr. Precautions which seem to the author to be important are
to ensure
1. That the diameters of the apertures between the test chamber and
the pumping chamber and between the stages are very small compared
with the dimensions of the chambers
128 VACUUM SCIENCE AND ENGINEERING
2. That the actual pumping speed of each diffusion pump is large as
compared with the conductance of the pumping apertures
3. That the base pressure P, is small as compared with the pressure
P at which calibrating measurements are made
Requirement 1 ensures that the gas in the test chamber is essentially
static so that directional pressure effects due to dynamic flow will be
negligible. Requirement 2 allows the use of the approximate expres-
sion in (3-40) involving the conductances only. Otherwise the value
of *Si given in (3-39) must be estimated and substituted for Cj in (3-40).
For precision calibration S^ should be at least of the order of lOCj.
Requirement 3 ensures the elimination of subtle questions regarding the
propriety of simply subtracting P^ from P for determining the pressure
rise P due to the gas flow Q.
3-14. General Remarks on Ambiguities of Pressure Meas-urement in Vacuum Systems. In describing the instrumentation
used in measuring the pressure in vacuum systems some of the pre-
cautions required to obtain consistent results have been mentioned.
However, the extent of the ambiguity in measurement at low pressure
(e.g., less than 10~* torr) has perhaps not been stressed sufficiently.
The processes which occur in ionization gauges and contribute to
uncertainties have been discussed in the descriptions of the various
types of gauges. These processes are
1
.
Surface adsorption (gauge pumping) and desorption
2. Chemical decomposition, dissociation, or reaction with the hot
filament
3. Electrical oscillations
4. Radiation (the Nottingham X-ray limit)
5. Electrostatic effects due to surface and space charges
Whether a vacuum gauge meets the requirements of a given appli-
cation depends not only upon its sensitivity, but also upon the extent
to which it reflects without excessive distortion the conditions wherethe pressure is to be measured. The distortions due to sorption proc-
esses are greatly minimized by making the conductance into the
sensitive portion of the gauge from the region of interest as high as
possible. The nude ionization gauge represents the logical extremein this regard. Proper electrostatic shielding, use of a low-temperaturecathode, thorough outgassing of the gauge components all contributefurther to minimizing the discrepancy between the gauge reading andthe true pressure. Specialized techniques have contributed to anextension of the range of measurement with improved assurance ofreliability down to exceedingly low values of the pressure. Redhead^*has extended the lower limit for a Bayard-Alpert type of gauge, as
PBESSUHB MEASUREMENT IN VACUUM SYSTEMS 129
determined by the X-ray effect, from lO-" to about 10-" torr bymtroducing an additional electrode and superimposing a voltagemodulation. Torney and Peaks*' have used this technique to extendthe range of comparison between the modulated Bayard-Alpert andthe cold-cathode ion magnetron gauges, confirming the results reportedby Redhead" down to 10-" torr and observing ion current readingscorresponding to a nitrogen pressure of about 3 x 10-" torr. Resultssuch as these suggest that, in spite of the difficulties listed above,reasonably reliable pressure measurements can be made even in therange below lO-" torr if the proper precautions are observed.
These processes have been discussed in relation to relatively staticsystems, i.e., systems in which the pumping speed is relatively smallso that directional effects are not important. In this case the isotropicpressure is given by the familiar P = QjS, where Q is the total gasload due to leaks and outgassing, and 8 is the pumping speed. Inorder to attain a very low pressure in such a system (as in the usualultrahigh vacuum systems), the gas load Q is reduced by eliminatingall leaks and outgassing the internal surfaces by baking the system athigh temperature.
An alternative approach to the attainment of low pressure is toprovide the highest possible pumping speed. The additional problemsarising in this instance because of directional effects have been discussedby Santeler.58 In space-simulation systems the objective is to exposea test body to an environment as nearly like that of outer space aspossible. Since such test bodies cannot generally be baked at hightemperature, the simulation must be accomplished as well as possible inthe presence of surface outgassing so that the gas load Q remains high.In outer space, molecules leaving a space vehicle fly off into space andvery few ever return. Thus true simulation of the outer space environ-ment would be accomplished by surrounding the test body withperfectly absorbing walls. If this could be done, then at low pressureat which the mean free path exceeds the dimensions of the system,gas molecules desorbed from the test body would travel on straight-linepaths to the wall of the vacuum vessel and there be absorbed, whereasno gas molecules would be received by the surface of thg test body.The pressure would then be highly directional. An ionization gaugelocated in a recess in the wall of the vacuum vessel would receive a fluxof molecules which could produce an ion current corresponding to apressure reading. An ion gauge located in a recess in the test bodyshielded from direct access by molecules from the surface of the testbody would receive nothing, as would be the case in outer space.
In practice no such perfectly absorbing surfaces exist. Liquid-nitrogen-cooled or cryogenically cooled surfaces condense some gas
130 VACUUM SCIENCE AND ENGINEERING
molecules more or less completely, but not generally on a single bounce.
Evaporated surfaces of active metals absorb certain gas molecules very
well, but again only after several encounters. Other gases must be
pumped by diffusion pumps. If A is defined as the ratio of the total
pumping speed of the system to that which would exist if all the walls
were perfectly absorbing, then, as Santeler shows, the directional
pressure effect is given by 1/(1 - A). An ordinary ionization gauge
Liquid-nitrogen
extension
Electrical
leads
Gouge
electrodes
Perforations
Chamber wolChamber liquid-nitrogen
surface
Fig. 3-59. Gauge mounting designed to compensate for directional pressure
effect. [Taken with permission from D. V. Santeler, Rev. Sci. Instr. 33, 283
(1962).]
located in the wall of the test vessel will then receive a flux of molecules
1/(1 —A) times the flux received by the surface of the test body.
In order for a gauge located in the wall of the vacuum vessel to
produce a reading corresponding to the flux arriving at the surface of
the test body, Santeler developed the gauge arrangement illustrated in
Fig. 3-59. A Bayard-Alpert nude gauge is mounted in a cylindrical
extension from the liquid-nitrogen-cooled inner surface of the chamber.
The liquid-nitrogen-cooled surface is perforated with an array of holes
through which gas is admitted from the center of the test chamber.
The ratio of the area of the holes to the total area of the cooled surface
is made equal to the wall pumping efficiency A of the main chamber.
Because the pumping speed for permanent gas is small both for the
gauge and for the main chamber, the pressure due to permanent gas is
isotropic and essentially uniform throughout the test chamber and the
gauge recess. However, only the fraction of condensable vapor which
returns from the surrounding walls to the test object is admitted to the
gauge recess. Thus the gauge reads the full value of the permanent
gas, all of which the test object receives, but only that portion of the
nonisotropic pressure of the condensable vapors which the test object
receives.
PEESSUEE MBASUEEMENT IN VACUUM SYSTEMS 131
The extent to which the techniques described by Santeler can beused to correct for the directional pressure effect in systems of veryhigh pumping speeds is difficult to assess. However, the directionaleffect exists and results in large gauge errors which cannot be easilyevaluated unless special precautions are exercised.
1
2
3
4
5
6
7,
8,
9.
10,
11,
12.
13.
14.
15.
16.
17.
19,
20.
21.
22.
23.
24.
25.
26.
27.
28.
29.
30.
31.
REFERENCES
. K. C. D. Hickman, Rev. Sci. Instr. 5, 161 (1934).
.Wallace and Tiernan, Incorporated, 25 Main Street, Belleville 9, N.J.,Absolute Pressure Indicator Type FA- 160.
. H. G. East and H. J. Kuhn, J. Sci. Instr. 23, 185 (1946).
. D. C. Pressey, J. Sci. Instr. 30, 20 (1953).J. Dubrovin, Instruments, 6, 194 (1933).H. McLeod, Phil. Mag. 48, 110 (1874).M. P. Romann, J. Sci. Instr. 3, 522 (1948).E. H. Kennard, Kinetic Theory of Gases (McGraw-Hill Book Company NewYork, 1938), pp. 162-168.
W. Voege, Physik Z. 7, 498 (1906).
T. Hasse, G. Klages, and H. Klumb, Physik Z. 37, 440 (1936).G. C. Dunlop and H. G. Trump, Rev. Sci. Instr. 8, 37 (1937).R. J. Webber and C. T. Lane, Rev. Sci. Instr. 17, 308 (1946).J. M. Benson, in 1956 Vacuum Symposium Transactions (Pergamon Press,London, 1957), p. 87.
M. Pirani, Verhandl. deut. physik. Ges. 8, 686 (1906).C. M. Schwartz and R. Lavender, Rev. Sci. Instr. 19, 814 (1948).A. R. Hamilton, Rev. Sci. Instr. 28, 693 (1957).J. A. Becker, C. B. Green, and G. L. Pearson, Trans. A.I.E.E. 65, 711 (1946);and Bell System Tech. J. 26, 170 (1947).P. T. Smith, Phys. Rev. 36, 1293 (1930); Phys. Rev. 37, 808 (1931); J. T.Tate and P. T. Smith, Phys. Rev. 39, 270 (1932).
0. E. Buckley, Proc. Natl. Acad. Sci. U.S. 2, 683 (1916).W. B. Nottingham and F. L. Torney, Jr., in 1960 Vacuum SymposiumTransactions (Pergamon Press, London, 1961), p. 117.L. N. Ridenour and C. W. Lampson, Rev. Sci. Instr. 8, 162 (1937).R. S. Morse and R. M. Bowie, Rev. Sci. Instr. 11, 91 (1940).J. Blears, Proc. Roy. Soc. (London) A188, 62 (1947).1. Langmuir, J. Am. Chem. Soc. 37, 1139 (1915).L. Riddiford, J. Sci. Instr. 28, 375 (1951).G. Reich, in 1960 Vacuum Symposium Transactions (Pergamon Press,London, 1961), p. 112.
R. A. Haefer and J. Hengevoss, in 1960 Vacuum Symposium Transactions(Pergamon Press, London, 1961), p. 67.
W. B. Nottingham, J. Appl. Phys. 8, 762 (1937).R. T. Bayard and D. Alpert, Rev. Sci. Instr. 21, 571 (1950).A. van Oostrom, in 1961 Vacuum Symposium Transactions (Pergamon Press,London, 1962), p. 443.
H. J. Schuetze and F. Stork, in 1962 Vacuum Symposium Transactions (TheMacmillan Company, New York, 1962), p. 431.
132 VACUUM SCIENCE AND ENGINEERING
32. W. C. Sohuemann in, 1962 Vacuum Symposium Transactions (Tho Macmillan
Company, New York, 1962), p. 428.
33. P. A. Redhead, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 108.
34. E. J. Lauer, Lawrence Radiation Laboratory, Livermore, private
communication
.
35. D. J. Santeler, Rev. Sci. Instr. 33, 283 (1962).
36. H. F. Winters, D. R. Denison, D. G. Bills, Rev. Sci. Instr. 33, 520 (1962).
37. W. B. Nottingham, in 1954 Vacuum Symposium Transactions (Committee
on Vacuum Techniques, Inc., Boston, 1955), p. 76.
38. J. M. Lafferty, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 97.
39. J. M. Lafferty, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962), p. 460.
40. J. M. Lafferty, in 1962 Vacuum Symposium Transactions (The Macmillan
Company, New York, 1962), p. 438.
41. A. Klopfer, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962), p. 439.
42. F. M. Penning, Physica 4, 71 (1937).
43. F. M. Perming and K. Nienhuis, Phillips Tech. Rev. 11, 116 (1949).
44. J. H. Leok and A. Riddoch, Brit. J. Appl. Phys. 7, 153 (1956).
45. A. H. Beck and A. D. Brisbane, Vacuum 2, 137 (1952).
46. R. A. Haefer, Acta Phys. Austr. 7, 251 (1953); 8, 213 (1954).
47. P. A. Redhead, Can. J. Phys. 36, 255 (1958).
48. P. A. Redhead, Report on the 18th Annual Conference on Physical Elec-
tronics, MIT (1958); and in 1958 Vacuum Symposium Transactions (Per-
gamon Press, London, 1959), p. 148.
49. T. N. Rhodin and L. H. Rovner, in 1960 Vacuum Symposium Transactions
(Pergamon Press, London, 1961), p. 228.
50. J. R. Downing and G. Mellen, Rev. Sci. Instr. 17, 218 (1946).
51. R. H. Vacca, in 1956 Vacuum Symposium Transactions (Pergamon Press,
London, 1957), p. 93.
52. M. Knudsen, Ann. Phys. 31, 633 (1910).
53. J. H. Leok, Pressure Measurement in Vacuum Systems (Published for the
Institute of Physics and the Physical Society by Chapman & Hall, Ltd.,
London, 1964), 2nd ed.. Chap. 4.
54. H. Ishii and K. Nakayama, in 1961 Vacuum Symposium Transactions
(Pergamon Press, London, 1962), p. 519.
55. J. R. Roehrig and J. C. Simons, Jr., in 1961 Vacuum Symposium Transactions
(Pergamon Press, London, 1962), p. 511.
56. P. A. Redhead, Rev. Sci. Instr. 31, 343 (1960).
57. F. L. Tomey, Jr., and F. Feakes, Rev. Sci. Instr. 34, 1041 (1963).
58. D. J. Santeler, in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, 1960), p. 129; and Rev. Sci. Instr. 33, 283 (1962).
CHAPTER 4
VACUUM ANALYZERS AND LEAK DETECTORS
Cover
cut away
The measurement of the "total" pressure as represented by the
response of an ionization or thermal-conductivity gauge is a very useful
indication of the state of a vacuum system, but is insufficient as a guide
toward further improvement.
Measurement of the partial pres-
sures (or molecular densities) of
the component gases, the com-
bined effects of which produce the
gauge reading, provides muchmore insight into the processes
which limit performance and stim-
ulates ideas for further improve-
ment. Measurement of specific
partial pressures also permits the
use of a gas not normally present
in significant quantities as a meansof detecting leaks in vacuum sys-
tems more quickly and with greatersensitivity than by other methods.
4-L Magnetic-deflectionMass Spectrometers. The first
systematic application of partial-
pressure measurement or vacuumanalysis for the purpose of under-
standing and improving vacuum-system performance, to the
author's knowledge, was that
Fig. 4-1. The mass spectrometer ana-
lyzer. [Taken with permission fromA. Guthrie and R. K. Wakerling (eds.),
Vacuum Equipment and Techniques
(McGraw-Hill Book Company, NewYork, 1949).]
carried out at the University of California Lawrence Radiation Labora-tory in connection with the development of the electromagnetic method(Calutron) for separation of uranium isotopes in 1943 and 1944. Theapparatus developed by Backus^'* was an adaptation of the simplestform of mass spectrometer due to Dempster,^ as illustrated in Fig. 4-1.
* References indicated by superscript numbers are listed at the end of thechapter.
133
134 VACUUM SCIENCE AND BNGINBEEING
Ions of the various gases present in the system are produced in a Penning(PIG) type of discharge, drawn out of the discharge through a narrowsource sht by means of an electric field, and deflected through approxi-
mately 180° by a magnetic field normal to the direction of motion of the
ions. Por appropriate values of the applied voltage and magnetic field
all ions of a given charge-to-mass ratio zejm are refocused at the 180°
point of a receiver slot, through which they pass to impinge on a
collector electrode, and can be recorded. The kinetic energy of the
ions issuing from the ion source is
y^mv^ 108zeV
(4-1)
where mV
e
z
Vc
= mass of the ion
= its velocity, cm/sec
= electronic charge, esu
= number of electronic charges carried by the ion
= applied potential difference in volts
= velocity of light, cm/sec
The radius of curvature of the orbit for an ion in a magnetic field is
P =cmv
cm (4-2)
in which B is the magnetic flux density in gauss. Combining (4-1) and(4-2) yields
cm /2zeV
zeB\ mc
= 1.12 X 10
108
,,hI_Y- (4-3)
Since the mass of an atom of unit atomic weight is 1.66 x 10~^* g, the
mass of an atom of atomic weight if is m = 1.66 x 10"^* M, so that
(4-3) becomes
144.5/ifF\^
B \~ (4-4)
As an example, for a singly charged atomic oxygen ion [M = 16), anaccelerating potential of 1,560 V, and a magnetic flux density of 3,600
gauss
p{M = 16) = 6.35 cm
so that the focus is located 2p = 12.7 cm from the slit of the ion source.
With a choice of this dimension for the location of the receiving slot,
the accelerating potential necessary to record an atomic hydrogen ion
{z=l,M
VACUUM ANALYZERS AND LEAK DETECTORS
1.008) would be
135
Vh{p = 6.35 cm)16.0
1.008X 1,560 = 24,700 V
which would be somewhat impractical. Rather than attempt to applysuch high voltages, a second receiving slot was provided in the Backusanalyzer at a distance 2p = 5.7 cm from the slit of the ion source sothat ions of p = 2.85 cm were also recorded. From (4-4)
if\144.5/
so that F Gc p2 for fixed values ofM and B. Thus
/2 85\^Fo(p = 2.85 cm) = I^ 1,560
315 V
and (285\^
^24,7006.35/ '
5,000 V
A wide range of masses could thus be focused on one or the other ofthe two slots with a reasonable range of the accelerating potential.
Ionic masses from 1 to 40 could be scanned by varying the accelerating
potential from 5,000 to 625 V. By imposing the accelerating voltagehorizontally on an oscilloscope and the current received through theslots vertically, a trace showing current peaks roughly proportionalto the partial pressures of the residual gases in the chamber was dis-
played by sweeping the accelerating voltage repeatedly over the desired
range. In Fig. 4-2 is shown a schematic diagram of the mass spec-
trometer vacuum analyzer together with its circuit diagram.The resolution of the 180° magnetic-deflection mass spectrometer
can be readily determined by reference to Fig. 4-3, in which the central
orbit of the ion beam and orbits diverging by ±a radians from the
central orbit are shown. If the source is a narrow slit parallel withthe magnetic fleld, which is perpendicular to the plane of the figure, thecentral ray reaches the base line drawn through the source and the centerof curvature of the central ray at a distance x^ = 2p from the source.
Prom the figure it is apparent that both the + a and — a rays return tothis same base line at a distance x^ = 2p cos a = 2/3(1 — ol^j2) =2p — pa^ since cos a = 1 — <x.^l2, approximately, when a is a smallangle. The width of slot to accept all orbits from +a to —a is
therefore
Ax = Xg — x^ = poL^ (4-5)
136
From (4-4)
so that
and
VACUUM SCIENCE AND ENGINEERING
M144.5/ V
\ 144.5/ V ^
^M Ap Aa;2— = 2—p X
(4-6)
Magnetic field
perpendicular
to paper
PIGsupply
Phase-shifting
network
Fig. 4-2. Schematic circuit diagram for the vacuum analyzer. [Taken with
permission from A. Guthrie and R. K. Wakerling (eds.), Vacuum Equipment and
Techniques (McGraw-Hill Book Company, New York, 1940).]
since x = 2p. For acceptable resolution of ion masses of interest in
vacuum analysis the slot width Ax was made to equal a half mass unit
for Jf = 16 (oxygen). Thus the slot width must be
A.=^^2 16
Po
32PoK (4-7)
VACUUM ANALYZERS AND LEAK DETECTORS 137
from (4-5) and the corresponding angular half-width of the beam is
32
or a = 0.177 radian !^ 10"
In the instrument the beam was limited by metal vanes at the 90° pointto a total angular width of 20°
( ± 10°). The receiving slot was located12.7 cm (p = 6.35 cm) from the ion source and had a width equal to6.35/32 fn 0.2 cm. Ionic masspeaks of If = 15, 16, 17 werethen completely resolved, andionic masses up to about 50 werereasonably distinct.
The gas-discharge ion source
produces a wide variety of ions
from the residual gas in a vacuumsystem. Atomic ions such as H+,C+, N+, and 0+, and molecular
ions such as H2+, N2+, O2+, CH+,CH3+, CH,+, C0+, CO2+, and B.fi+are nearly always observed. Some
Receiving
slot
Fig. 4-3. Quality of focus for 180°
magnetic -deflection mass spectrometer.
of the ions result from dissociation and ionization of atmospheric gasespresent because of small leaks in the system. Water is usually presentand produces not only the H2O+ ion but also H+, H2+, and 0+ ions.
Decomposition of hydrocarbon diffusion-pump fluid and of oil left oninner surfaces of the vacuum system results in C+, CH+, CH2+, andCH4+ ions as well as additional H+ and H2+ ions. The relativemagnitude of the peaks corresponding to these ions on the oscilloscope
trace changes as the pressure in the vacuum system decreases andthe internal surfaces outgas. The if = 18 (II2O+) peak usually domi-nates for some time after the system has been pumped down fromatmospheric pressure. Later, if the system is pumped by trapped oil
diffusion pumps, the hydrogen, carbon, hydrocarbon, C0+, and CO2+peaks become predominant and the water peak decreases and finally
disappears. If the M = 16 and M = U peaks remain high, there is astrong possibility of a leak admitting air into the system. If thisshould be the case the mass spectrometer vacuum analyzer can beused very effectively for locating the leak by directing a jet of gas otherthan air in turn over the flanges and other parts of the system vulnerableto developing leaks. When the jet falls on the leak, the air leakinginto the system is mixed with probe gas, and ion peaks appropriate tothe probe gas appear or increase on the oscilloscope trace. Because
138 VACUUM SCIENCE AND ENGINEERING
there is normally no if = 4 peak on the oscilloscope trace, helium
makes an ideal choice as a probe or leak-hunting gas since the ilf = 4
peak rises from the zero line very quickly when the helium jet strikes
the leak.
The use of helium gas in leak hunting was found to be so effective
that a simplified version of the mass spectrometer analyzer, as shown in
Fig. 4-4, was developed by Loevinger^ at the University of California
To pumps
Cathode
Tank
Removable
faceplate
Kovor seal
Fig. 4-4. The mass spectrometer helium leak detector. [Taken with permission
from A. Guthrie and R. K. Wakerling (eds.), Vacuum Equipment and Techniques
(McGraw-Hill Book Company, New York, 1949).]
Lawrence Radiation Laboratory. The ion source used was a PIG
similar to that in the Backus vacuum analyzer, but only one receiving
slot was provided, and the angular width of the beam was reduced to
increase the sharpness of focus. Since the leak detector was intended
to respond only to the If = 4 beam due to helium, the amplitude of the
a-c sweep applied to the accelerating potential was only large enough
to cover the full width for Jlf = 4 on the oscilloscope. The pulsating
current to the ion collector was amplified and applied to the vertical
plates of an oscilloscope and also to a meter through a tuned amplifier.
The design of the apparatus, with a self-contained vacuum system all
mounted in a compact cabinet on casters, made the helium leak
detector a convenient and effective instrument for vacuum-system
diagnostics.
VACUUM ANALYZERS AND LEAK DETECTORS 139
Electron torget
Electrons
Accelerator
^^\m% of mass^
^^12 or greoter
Plate PMognetic
field
Since the pioneering use of the
magnetic-deflection mass spec-
trometer in vacuum analysis andleak detection, many improve-
ments have been made and a
number of excellent units of far
greater mass resolution and sensi-
tivity are now available com-mercially. Thomas, Williams, andHippie* substituted a hot-filament
type of ion source for the PIG andgenerally refined the electronic cir-
cuits, with resulting improvementin resolution, sensitivity, and sta-
bility. In Fig. 4-5 is shown a per-
spective drawing of the ion source,
beam focusing, and collector
arrangement used by Charpentier^ in a simplified mass spectrometertype of helium leak detector. The author states that the sensitivity
of his improved instrument for relatively rapid detection of leaks is
Hydrogen
Helium target j Filament
Helium ions
Fig. 4-5. Ion source, beam focusing,
and collector for 180° magnetic-deflec-
tion helium mass spectrometer. [Takenwith permission from D. E. Charpentier,
1956 Vacuum, Sym'posium, Transactions
(Pergamon Press, London, 1957).]
/
t
A
Magnetic field
Filament
Section A-A
ollector
Baffle'-
Collector slit-
Suppressor^
100,000 megohms^
Fig. 4-6. 60° deflection mass spectrometer designed for helium leak detection.[Taken with permission from Saul Dushman, Scientific Foundations of VacuumTechnique (John Wiley and Sons, Inc., New York, 1949).]
140 VACUUM SCIENCE AND ENGINEERING
10-8 atm cm^/sec or 7.6 x lO-" torr liter/sec, and about an order of
magnitude lower for detectability over background when care in the
use of the instrument is exercised.
For the accurate measurement of the masses of the isotopes of the
Hght elements a 60° magnetic-deflection mass spectrometer was de-
veloped by Nier^ several years before initiation of the Manhattan
Project work reported above. Subsequently a vacuum analyzer and
helium leak detector of high resolution was developed for the Manhattan
Project operations at Oak Ridge under contract with the University
of Minnesota by Hustrulid and Nier' and was later perfected for com-
mercial manufacture in the form described by Nier, Stevens, Hustrulid,
and Abbott.8 An instrument of the Nier type, designed specifically as
a helium leak detector by Worcester and Doughty,^ is illustrated in
Fig. 4-6. In this design the Jf = 4 peak is focused on the collector slot
Fig. 4-7. Sensitive 90° magnetic-deflection mass spectrometer for ultrahigh-
vacuum applications. [Taken with permission from W. D. Davis and T. AVanderslice, in 1960 Vacuum Symposium Transactions (Pergamon Press, London,
1961).]
VACUUM ANALYZERS AND LEAK DETECTORS 141
when the accelerating voltage is set at about 270V and the magnetic field
at 900 oersteds. The preamplifier tube for the ion current to the collec-
tor is mounted inside the spectrometer tube to ensure high resistance
and to minimize leakage currents. The vacuum system for the massspectrometer tube consists of an oil difi"usion pump and dry-ice-cooled
vapor trap with a resultant pumping speed of about 30 liters/sec. Theauthors claim a sensitivity of about 1.5 x 10~^ torr liter/sec of helium.
A 90° magnetic-defiection mass spectrometer especially designed for
ultrahigh-vacuum applications has been developed by Davis andVanderslice. 1" The instrument is of unusually compact design, con-
sisting of an electron-bombardment type of ion source and an electron-
multiplier tube connected by a 90° elbow of welded stainless steel as
shown in Fig. 4-7. After bakeout is completed, a magnet is put in
place with poles on either side of the 90° elbow to bend the ion beaminto the detector. The ion detector is a 10-stage commercial photo-
multiplier tube with the glass envelope removed and the unit remounted
in a stainless steel housing. For ions incident upon the first dynode
of the electron multiplier the gain is 10^ at 300 V/stage before bakeout
and becomes about 10' after bakeout at 425°C. Slit dimensions andalignment in the ion source are so chosen that the mass peak width
is just equal to the separation due to one mass unit at an ion mass of
140. Partial pressures of the order of 10-^* torr can be measured with
the instrument. Fast electronic sweeping of the ion-accelerating
voltage, using a sawtooth sweep generator, provides a continuous
oscilloscope trace of the gas components present.
A double-focusing magnetic-deflection mass spectrometer, the beam-
focusing scheme for which is illustrated in Fig. 4-8, is described byPeters. ^^ The ion beam passes through a 90° deflection magnet and is
focused on the interstage slit, which becomes the source 8^ for an
identical second-stage deflection magnet which refocuses the beam on
the collector slot. The author states that by the double-focusing
technique the signal-to-background ratio is improved relative to the
typical single-focusing apparatus by about a factor of 100. The back-
ground signal in the normal mass spectrometer consists mainly of ions,
other than that for which the instrument is focused, entering the
collector slot either because the normal breadth of the focus overlaps
the mass separation or because ions which are well separated initially
are scattered and enter the receiving slot. In the double-focusing
instrument the intensity of the Jf = 4 beam is not changed significantly,
but the background due to random ions other than ilf = 4 is reduced
by a large factor. The author claims a sensitivity to helium of 10-^*
cm^/sec of helium at atmospheric pressure, or slightly less than 10-^^
torr liter/sec.
142 VACUUM SCIENCE AND ENGINEEBING
-i-s,l'°"
Median energy
1 St anolyzer
pole piece
Interstage
slit
2nd anolyzer
pole piece
Fig. 4-8. Ion beam trajectories
for double -focusing mass spectrom-
eter. [Taken with permission
from J. L. Peters, in 19S9 VacuumSymposium Transactions (PergamonPress, London, I960).]
Fig. 4-9. Ion trajectories in a cycloi-
dally focused mass spectrometer.
[Taken with permission from G. D.
Perkins and D. E. Charpentier, in
1957 Vacuum, Sym,posium Trans-
actions (Pergamon Press, London,
1958).]
Robinson and Hall^^ describe a cycloidally focused mass spectrometer,
the operating principles of which are illustrated in Fig. 4-9 and Fig.
4-10. The structure of the instrument consists of three parallel,
equally spaced plates. An electric field is maintained between the
plates by application of voltage across the outside positive and negative
field plates, and a magnetic field is applied parallel with the plate
structure. The region between the field plates is thus one of crossed
electric and magnetic fields. The center plate has a source slit, an
ion-resolving slit, and a collector slit, all running parallel to the magnetic
field. Ions are formed by an electron beam and projected through
the source slit by application of a substantial voltage to a repeller
electrode. The resulting beam of
ions is roughly focused on an4
passes through the resolving slit
and is then brought to a good focus
at the ion-collecting slit. Thecycloidal focusing is such that ions
of a given charge-to-mass ratio all
come to a sharp focus at the collec-
tor slit, even though the spread in
energy gained from the repeller is
large. The advantages of the de-
sign are (1) high resolving power
due to the double-focusing feature
resulting from the use of the re-
solving and collector slots, (2) high
ion efficiency because the focus is
Positive field plate
Ion
collector
resolving^slit
lectron
node
Negot
field
Fig. 4-10. Cutaway view of ion sourceand beam-focusing scheme for cyc-
loidally focused mass spectrometer.[Taken with permission from G. D.Perkins and D. E. Charpentier, in
1957 Vacuum Symposium, Transactions(Pergamon Press, London, 1958).]
VACUUM ANALYZERS AND LEAK. DETECTOBS 143
Moss spectrum of propane (C3Hg
H H H
Fig. 4-11. Complete mass spectrum of propane obtained with cycloidally focused
mass spectrometer. [Taken with permission from G. D. Perkins and D. E.
Charpentier, in 1957 Vacuum Symposium Trnasactions (Pergamon Press, London,
1958).]
Path of ions
at resonance
Signal
generotor
independent of the ion energy, and (3) unusually compact structure
compared with other magnetic-deflection mass spectrometers. Thecomplete ion mass spectrum obtained with a similar instrument devel-
oped by Perkins and Charpentier^* is shown in Fig. 4-11 and demon-
strates the resolution of individual
mass units in the range 16 to 44.
The sensitivity of the instrument
is reported to be about 1.7 x 10"^
torr partial pressure of nitrogen.
Sensitivity to other gases depends
upon the ionizing probability andvaries from about one-tenth to
twice the nitrogen sensitivity.
The spectrum is maintained on an
oscilloscope of medium persistence
by sweeping the voltage at the
rate of about 5 sweeps/sec, provid-
ing an almost continuous record of
the gas components in the system.
4-2. The Omegatron Mass Spectrometer. Sommer, Thomas,
and Hippie^* reported a precision determination of the charge-to-mass
ratio of the proton by measurement ofthe cyclotron resonance frequency
in a device illustrated in Fig. 4-12, which has since been referred to as an
omegatron. A singly charged ion moving in a direction perpendicular
End view
Ion collector h-
Side view
VTrapping
voltage
Fig. 4-12. The omegatron of Sommer,
Thomas, and Hippie. [Taken with
permission from H. Sommer, H. A.
Thomas, and J. A. Hippie, Phys. Rev.
82, 697 (1951).]
144 VACTJUM SCIENCE AND ENGINEERING
to a uniform magnetic field moves in a circular orbit of radius R, such
that
Bev mv^
and the radius of the orbit in centimeters is
J?mcv
(4-8)
(4-9)
where m = mass of the particle
c = velocity of light, cm/sec
V = velocity of the particle, cm/sec
B = flux density of the magnetic field, gauss
e = unit atomic charge, esu
The period of rotation is
277i? mc= 27Be
sec
so that the rotational frequency is
/ = - = cycles/sec' T 2TTCm •'
'
Substituting the numerical values e = 4.80 x IQ-i" esu, c = 3 x lO^"
cm/sec, and m = 1.66 x 10-^* M, in which M is the mass number of the
ion in question, this expression becomes
/ = 1.53 X 10=5M cycles/sec (4-10)
which depends only upon the flux density of the magnetic field and the.
charge-to-mass ratio of the ion. If the kinetic energy of an ion in a
uniform magnetic field increases, the radius of its circular path increases
according to (4-9), but the frequency of the motion remains constant.
The cyclotron type of particle accelerator is based upon this principle;
thus the term cyclotron frequency is used to refer to the rotational
frequency given in (4-10).
The omegatron is somewhat similar to the cyclotron in that ions are
produced at the center of the device and spiral outward as shown in
Fig. 4-13 under the influence of a high-frequency field which is perpen-
dicular to the steady magnetic field. The body of an omegatron is in
the form of a metal box, along the axis of which and parallel with the
magnetic field a beam of electrons is directed as shown in Fig. 4-14.
The electrons are drawn from a hot filament by an accelerating potential
,
pass through holes in opposite sides,of the box, and are collected on an
VAOUtrM ANALYZERS AND LEAK DETECTORS 145
Lost ion
VCollected ions
\ P,
i
.
>tt\ /
15 / / V2>C:n^
/ / /oc^ ^^^ *\ \
\'
''/^
\\^ ^v—ix^ J/
15 x^ _
, Ro=10 .>
'
< 3 -^-— 13——
Fig. 4-13. Spiral orbits of ions in an omegatron. [Taken with permission from
D. Charles and R. J. Wamecke, Jr., in 1959 Vacuum Symposium Transactions
(Pergamon Press, London, I960).]
Ion collector R-f electrode
Electron beam
Slit
Box (trapping voltage) >Ion-collector shield r-f,
d-c and electrometer
ground point
RN
L->-To electrometer
Electron-source
filament
Fig. 4-14. Electrode arrangement of an omegatron. [Taken with permission
from W. R. Watson, R. A. Wallace, and J. Lech, in 1960 Vacuum SymposiumTransactions (Pergamon Press, London, 1961).]
146 VACUUM SCIENCE AND ENGINEEEING
electrode on the far side of the box. Ions produced by ionization of
the residual gas molecules in the metal box are extracted from the
electron stream by an applied high-frequency electric field. If the
frequency of the applied field is equal to the cyclotron frequency for a
particular type of ion formed in the electron column, ions of this type
R-f ^^supply
Filament
supply
1,0 volts 221/2
dic volts d-c
Electrometer Recorder
to 2 cmp
Oto 2 volts o-c
10" 'to 10'^ amp
Fig. 4-15. Electrical circuit for the omegatron. [Taken with permission fromW. R. Watson, R. A. Wallace, and J. Lech, in 1960 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1961).]
gain transverse energy and spiral outward until they strike the ion-
collector electrode at the side of the box. Ifthe frequency ofthe applied
'
field is not equal to the ion cyclotron frequency, ions spiral out from the
electron beam a short distance and then spiral back in again, oscillating
in radius but never getting out to the ion collector. Such ions are
lost along the lines of force to the end plates of the box. At high gas
pressure nonresonant ions tend to accumulate and produce an excessive
space charge near the electron column and reduce the effectiveness of
the applied high-frequency field in extracting ions. At very lowpressure insufficient positive ions are formed to neutralize the space-
charge potential of the electron beam with the result that resonantions must be extracted from a potential well by the alternating field.
To counteract these effects a weak positive d-c trapping voltage is
applied to four sides of the box relative to the two sides across which thealternating voltage is applied. A schematic diagram of the circuit
VACUUM ANALYZERS AND LEAK DETECTORS 147
of the omegatron as developed by Watson, Wallace, and Lech" is
shown in Fig. 4-15.
As the frequency of the applied field is varied, the ion-collector
current varies from some low background value to peak values occur-ring whenever the oscillator frequency corresponds to the cyclotron
'^/iA
Variation of
magnitude of peak
44 OS a function of
the amplitude Eq
of the electric field
for various values
of the ionizing
current
+015volt
-0.48volt
—•-With B = 2,820gauss
P = 4»10"^torr
90 volts
1.5 20 2.5
Eo, volts/cm
Fig. 4-16. Influence of the amplitude of the alternating field on the magnitudeof the peaks for an omegatron. [Taken with permission from D. Charles and R.J. Warnecke, Jr., in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, I960).]
frequency of some type of ion present. The height of the current peakfor a given partial pressure is a measure of the sensitivity of the
instrument and has been examined by Charles and Warnecke. i® In
Fig. 4-16 are shown their results on the influence of the amplitude of the
alternating electric field on the magnitude of the current peak for M =44 (CO2+). When the alternating-field amplitude is very small, ex-
traction of ions from the negative space charge of the electron beam is
inefficient, and furthermore the spiral path for ions to reach the collector
is long as compared with the collision mean path. As a result, ions
are lost to the walls of the box by scattering along the magnetic field
before they reach the collector and the collector current is low. As the
alternating field is increased from about 0.5 to 1.0 V/cm, the magnitudeof the peak current increases rapidly as the spiral path to the collector
becomes progressively shorter. However, beyond 2.0 V/cm the mag-nitude of the peak current is observed to decrease again, and the authors
148 VACUUM SCIENCE AND ENGINEEBING
250-
200
150
100
50
Variation of the magnitude of the
peak 44 as function of the intensity
Ic of the ionizing current
|U--f(Ic)|
for different volues of the
amplitude Eq of the electric field E
Vpi=t0.15volt
Vp2 = -0.48volt
with B = 2,820 gau
P = 4xlO'Sn
Vo = Vo =90 V
Eo = 2.I98volts/cm
En = 1.884 vol ts/ci
l.57volts/cm
Eo=1.256volts
= 0.942 volt/cm
\Eo = 0.628 volt/cm
Eo= 0.314 volt/cm
0123456789Fig. 4-17. Influence of the electron-beam current on the magnitude of the
positive ion peaks for an omegatron. [Taken with permission from D. Charles
and R. J. Warnecke, Jr., in 7959 Vacuum Symposium Transactions (PergamonPress, London, I960).]
state that the ion-ciirrent-versus-frequency peaks become distorted
and broadened. This latter condition develops when the increase in
radius per turn in the spiral path is so large that some of the resonant
ions take the outer orbit shown in Fig. 4-13 and miss the collector
entirely. Thus an optimum alternating-field amplitude was found to
be about 2 V/cm, at which the collector current was maximum and the
current peaks (as a function of frequency) were sharp and undistorted.
The influence of the electron-beam current on the magnitude of ,the
ion peaks as measured by Charles and Warnecke is shown in Fig. 4-17
for various values of the amplitude of the alternating field. For analternating-field amplitude of about 1 V/cm or more the ion-collector
current is approximately proportional to the electron-beam current as is
expected. At lower values of the alternating-field amplitude the curvesare badly distorted, probably because of failure of the small alternating
field to extract ions from the negative space charge of the electron beam.Finally, Fig. 4-18 shows the results of Charles and Warnecke for the
VACUUM ANALYZERS AND LEAK DETECTORS 149
dependence of the peak ion current for ilf = 44 on the partial pressure
of CO2 for various values of the electron-beam current. It is noted that
the peak current is proportional to the partial pressure up to about4 X 10-* torr for small electron-beam currents (1 to 3 //A) and up to
about 2 X 10-* for an electron-beam current of 5 /lA. These authors
report that under favorable circumstances and with an electron-beam
current of 10 /lA a partial pressure of the order of 5 X lO-^^ torr
can be detected. The corresponding ion-collector current is about
5 X lO-is A.
Charles and Warnecke also report that the sensitivity of a similar
omegatron designed specifically as a leak detector using argon as the
probe gas is 2 x lO-^^ torr liter/sec in a dynamic system and as low as
2 X 10-1* torr liter/sec in a well-baked system using an accumulation
process. The authors state that for the omegatron leak detector, argon,
because of its relatively high ionization probability, is preferable to
helium as a probe gas.
In a detailed discussion of the potentialities of an omegatron as a
leak detector Nicollian^' reports results in agreement with those of
Charles and Warnecke,1* using argon as the probe gas. However, he
finds that the alternating-field gradient can be increased tenfold whenusing helium as the probe gas without causing broadening and splitting
60
.50
,40
30
20
10
Relotion between amplitude of peak 44
and the corresponding partial pressure Pp
n7^(p
for different values of the
ionizing current Iq
Vp|= 0.17 volt
Vp2=-0.48volt
B =2,820 gauss
E =0.94volt/cm
Vo = Vo =90 volts.
/
^.
/
la) ......lc = l/iA
0' 5 10 15 20 25 30
P« 10'^ torr
35 40
Fig. 4-18. Dependence of the peak ion current for M = 44 on the partial
pressure of COj for various values of the electron-beam current for an omegatron.
[Taken with permission from D. Charles and R. J. Warnecke, Jr., in 1959 VacuumSymposium Transactions (Pergamon Press, London, I960).]
150 VACUUM SCIENCE AND ENGINEERING
of the M = i peak. By taking advantage of this effect NicolHanobtains about the same leak-detection sensitivity with hehum as withargon. In either case a Hmiting partial-pressure sensitivity of about10-12 torr and an ultimate leak-rate sensitivity of about 10-" torrliter/sec are reported.
Hydrocarbon
fractions
12 13 14 15 1617 1819 202122 26 27 28 29 30 3132 4041424344
Mass number
Fig. 4-19. Mass spectrum during bakeout of reflex klystron, (a) Just before'development of an air leak; (6) just after development of a small air leak. Tem-perature 320°C, total pressure 5 x 10-^ to 1 x lO-^ torr by ionization gauge.[Taken with permission from D. Lichtman and A. Hebling, in 1960 VacuumSymposium Transactions (Pergamon Press, London, 1961).]
The use of an omegatron in the analysis of the residual gases dilring
the processing of ultrahigh-vacuum power tubes is discussed byLichtman and Hebling." In Fig. 4-19 are shown the residual gasspectra obtained (a) during the advanced stage of bakeout of a reflexklystron and (b) just after the development of an air leak. In (a)
the residual gas is made up mainly of hydrogen (H2+), water vapor,methane, and hydrocarbon fractions. When the leak develops in (&),the carbon dioxide, argon, oxygen (O2+ and 0+), nitrogen (N2+ and N+),and neon peaks become dominant.
VACUUM ANALYZEKS AND LEAK DETECTOES 151
Omegatron mass spectrometers have generally been operated with
magnetic-field flux densities in the range of 2,500 gauss. In order to
cover the ion mass range from M = 2to M = 50, using this strength of
magnetic field, the range of alternating-field frequency required, accord-
ing to (4-10), is from 1,915 kilocycles/sec down to 87 kilocycles/sec.
Since the ionization cross section for the formation of H2+ ions in
hydrogen gas is 30 to 50 times greater than for H+, the M = 1 peak is
frequently not seen on vacuum-analyzer traces.
Table 4-1. Pressures and Sensitivities of Omegatron to Methane andNeon*
Omegatron sensitivities calculated from ionization-gauge "pressure" readings
and the heights of the principal peaks of the respective gases, that is, ikf = 16
for methane and M = 20 for neon.
Methane
Pressvire, torr
Sensitivity, div/torr. . . .
Sensitivity, {*+/»'_)/-? • • •
1.15 X 10-«
5.8 X 10'
5.8
2.7 X 10-'
5.7 X 109
5.7
6.5 X 10-8
6.2 X 10"
6.2
ICeon
Pressure, torr
Sensitivity, div/torr ....
Sensitivity, (i_,_/'J_)/P . . •
2.4 X 10-5
6.1 X 109
6.1
3.9 X 10-'
8.1 X 109
8.1
* Taken with permission from W. R. Watson, R. A. Wallace, and J. Lech, in
1960 Vacuum, Symposium Transactions (Pergamon Press, London, 1961), p. 421.
Watson, Wallace, and Lech^^ have investigated the sensitivity in
terms of (i^/O/P,,, in which i^ is the peak current for a given ion, i__
the electron-beam current, and P^, the partial pressure of the gas from
which the ion current is produced. Table 4-1 gives some typical values
for the sensitivity obtained by Watson, Wallace, and Lech. The gases
used for these measurements were neon and methane. The "pressures"
quoted are the nominal readings ofan ionization gauge calibrated against
nitrogen. Since the sensitivity of ionization gauges, i.e., the ratio
{i+liJ)P, is about four times greater for nitrogen than for neon, the
actual pressure of neon present was greater by about a factor of 4 than
that indicated in the table. The conversion factor for methane (CH*)
is not known to the author. The decrease in sensitivity for neon at
2.45 X 10^5 torr partial pressure is consistent with the general obser-
vation that the sensitivity of the omegatron decreases noticeably for
pressures in excess of lO^^ torr. This trend is illustrated most clearly
in Fig. 4-20 from the paper of Watson, Wallace, and Lech, in which the
response to carbon monoxide is plotted as a function of pressure, giving a
152 VACUUM SCIENCE AND ENGINEERING
low-pressure sensitivity of about 9.5 x 10^ div/torr for the Jf = 28
peak and dropping off rapidly with increasing pressure beginning at
about 10~^ torr.
Considering that the omegatron element is a small metal box of only
about one inch on a side, the sensitivity and mass resolution achievable
10-7
Omegatron
Carbon monoxide calibration
o
o
^ SensitivityOiv.mass28 ^^q-9Torr pressure
,_^o„9.*o% oo- /„:„o?^o„„^o
oo
° oo
(feo
o o
o
cP
oo
o
•.-•,.• rf • t^ «
-(Pattern coefficient, m/e = 12) = (100 x
-D1V12
OiV28
11
i
10"6 10-5
Pressure, torr
10"
FiG. 4-20. Sensitivity of omegatron as a function of partial pressure of CO as
indicated by current in the M = 28 peak. The pattern coefficient ratio betweenM = 12 (C+) and the M = 28 (CO+) ion currents remains nearly constant as
the sensitivity decreases at pressures above 1 x 10~^ torr. [Taken with per-
mission from W. R. Watson, R. A. Wallace, and J. Lech, in 1960 VacuumSymposium Transactions (Pergamon Press, London, 1961).]
are remarkably high. A problem which has not to the author's
knowledge been satisfactorily resolved arises from the fact that the
omegatron element is almost completely closed and has an enormousratio of surface to volume. Both absorption and desorption effects
must be present so that pronounced differences in the partial pressures
of component gases must generally exist between the system being
tested and the interior of the omegatron.4-3. Linear High-frequency Mass Spectrometers. Linear
resonant systems which depend upon the selective processes familiar in
high-frequency linear accelerator design or upon the differences in timeof flight for ions of different mass have been utilized effectively for
VACUUM ANALYZERS AND LEAK DETECTOBS 153
jywvA*—o+Resolution
adjustment
Ion
chamber
Kinetic-energy
selector
atomic mass discrimination. One advantage of these systems is that a
magnetic field is not required to effect mass separation.
The linear accelerator scheme was adopted by Moody^' in the design
of a mass spectrometer helium leak detector and vacuum analyzer.
The arrangement of ion source, r-f accelerator, and ion detector is
illustrated schematically in Fig. 4-21. Ions are produced in a chamberby a beam of electrons which are emitted from a filament outside the
chamber, pass through small colli-
mating holes in the walls, pass
completely through the chamber,
and are stopped by an electrode
outside the chamber on the far
side. Positive ions formed by the
electron beam are drawn out of the
column by an extracting voltage
between the ionization chamberand the focusing electrode. Theextracted ions are focused on a
collector through apertures in a
series of plates which serve as
electrodes for applying a high-
frequency accelerating field. Alter-
nate elements of the high-fre-
quency electrode system are driven 180° out of phase by an oscillator.
Actually, one set of alternate plates is grounded and the other is
driven by the oscillator.
The electric field in the gaps between any two adjacent plates varies
as (EgjG) sin 2TTft, during the positive half-cycle of which ions comingfrom the source will experience an accelerating pulse. During the
negative half-cycle, ions will be decelerated. Thus, if the ions pass
through the series of high-frequency gaps in random phase, the net gain
or loss in energy will be very small. However, if the spacings G^
between the electrodes increase in the proper sequence, ions of a partic-
ular ejm ratio and initial velocity entering the first gap in the proper
phase will arrive at each succeeding gap at the proper time to receive
an accelerating pulse at each gap. Such ions gain energy about
proportional to the number of high-frequency gaps and attain consider-
ably higher energy than those ions which are not so synchronized. Bychanging the applied frequency, ions of other e/m ratios can also be
accelerated. Sweeping the frequency of the oscillating voltage througha sufficient range brings different ions into synchronism in succession.
The ion beam leaving the high-frequency section is electrostatically
deflected. Those ions which are not in synchronism, and thus have
R-f
analyzer
Fig. 4-21. Schematic of linear massanalyzer. [Taken with permission
from R. E. Moody, in 1956 VacuumSymposium Transactions (PergamonPress, London, 1957).!
154 VACUUM SCIENCE AND ENGINEERING
not gained much energy, are bent sharply by the deflecting field, whereas
those which are in synchronism and do gain maximum energy are only
slightly deflected and enter the ion collector. In order to discriminate
between the true ion current and the background current, the ion beam
is modulated by imposing a 15 cycle/sec voltage to an electrode between
the ion source and the accelerating electrode and detecting only the a-c
component of the collector current through a tuned amplifier. A block
diagram of the complete circuit for the helium leak detector version of
1
Ion
gouge
(21
-^ -^ 1 InFilament
regulator
(2)
+ 375 volts
powersupply
(4)
1—^ i_ |U
—
—
^^-i15-
modulotor
(2)
R-f
oscillator
(4)
- 250 volts
power
supply
(4)
,..,.„, .'., 1-
// z'
"a + \
Preomplifie
(2)
A-c
amplifier-^
(2)
Fig. 4-22. Block circuit diagram for linear r-f helium leak detector. [Taken
with permission from R. E. Moody, in 7956 Vacuum Symposium Transactions
(Pergamon Press, London, 1957).]
the device is shown in Fig. 4-22. In the vacuum analyzer version the
applied high frequency is swept over the range necessary to bring into
synchronism ion masses from M = 2 to M = 100. In Fig. 4-23 is
shown the electrode structure for the r-f vacuum analyzer.
An alternative form of linear r-f mass spectrometer featuring an
array of equally spaced grids as an e/m filter, illustrated in Fig. 4-24,
was originally proposed by Redhead^" for use as a vacuum analyzer.
Ehlbeck et al.^i have discussed the theory of this type of mass spec-
trometer and given results of measurements on the resolving power and
sensitivity as a function of operating parameters. Ions are produced
by electron bombardment in the ion source, accelerated through an r-f
filter consisting of {2N + 1) precision-made grids, decelerated by a
retarding grid, and finally selectively recorded on the partial-collector
electrode, provided a particular type of ion has gained sufficient energy
to surmount the potential applied to the retarding grid. Between the
ion-retarding grid and the collector is an additional grid at high negative
potential to prevent any electrons from reaching the collector. Asshown in the d-c potential plot in Fig. 4-24, the filament and partial
ion collector are at ground potential, the ion chamber at a positive
VACUUM ANALYZERS AND LEAK DETECTORS 155
potential f/j^, and the r-f grid structure at negative d-c potential.
Between the ion source and the r-f filter is a grid at high negative
potential so that ions are drawn out of the source by a high accelerating
electric field then decelerated somewhat to
attain an energy eUg (as indicated on the
diagram) on entering the r-f filter. Onlythose ions which gain an energy AW >e?7j(,t ill passing through the r-f filter will
reach the partial collector and be recorded
as a partial pressure. The highly negative
grid between the ion source and the r-f filter
is designated the total collector since it inter-
cepts a uniform fraction of ions of all masses
and thus provides a current indication
which is proportional to the total pressure
as read by an ionization gauge.
The grids of the r-f filter are equally
spaced, and are alternately connected to
the opposite polarities of a variable-fre-
quency r-f oscillator so that successive grids
are driven 180° out of phase. Each group
of three adjacent grids constitutes a sorting
structure of the Bennett type.^^ In passing
through the sorting structure, ions, in
general, experience a succession of acceler-
ating and decelerating impulses and on the
average gain or lose kinetic energy. Thechange in energy AlFy for an ion depends
upon the number N of Bennett stages in
the structure, the entering accelerating
potential ?7o, the amplitude U of the r-f
potential, the phase cp of the r-f at the in-
stant the ion enters the first stage, and the
transit angle oc where
Fig. 4-23. Linear r-f massspectrometer vacuum-ana-lyzer electrode structure.
[Taken with permission fromR. E. Moody, in 1956 Vac-
uum Symposium, Transac-
tions (Pergamon Press,
London, 1957), and through
the courtesy of BeckmanInstruments, Inc.Fullerton,
CaUf.]
The transit angle is the phase interval of the
applied r-f which a particle would spend in traversing the distance dbetween two adjacent grids of the ion sorter at the velocity v„ =[2(e/m)f7„] at which it enters the sorting structure. The entering phaseinterval A 99 over which the change in energy AW^- after N stages is
positive and the fractional gain in energy AW^I^U^ are both critical
2nfd\2-U„m
156 VACUUM SCIENCE AND ENGINEERING
functions of the ion e/m ratio when the remaining parameters (d, U„, U, f)
are held constant. Alternatively, if all other parameters are held con-
stant and the radio frequency varied, then ions of different e/m ratios
receive the maximum energy gain at discrete values of the frequency.
Pump
Fig. 4-24. Schematic drawing of electrode arrangement and d-c potential distri-
bution for r-f mass spectrometer according to Redhead. [Taken with permission
from H. W. Ehlbeck, K. H. Loecherer, J. Ruf, and H. J. Schuetze, in 1960
Vacuum Symposium Transactions (Pergamon Press, London, 1961).]
In the instrument developed by EhllDeck et al.^i using five stages as
shown in Fig. 4-24, the resolving power is defined as
R = /m
X(f2-A)= 100
in which /max is the radio frequency for a given e/m value at which the
collector current is maximum and f^ and /a the frequency values below'
and above /max at which the collector current reaches half the maximumvalue. The operating parameters of the instrument are given in Table
4-2 . The authors emphasize that the transparency of the grid structure
is a critical feature in determining the resolving power. They found
that a grid structure in which each grid was a square mesh of 5 X 10"*
cm diameter molybdenum wire with a spacing of 0.05 cm transmits only
7 per cent of the incident ions, whereas a structure in which each grid
consists of parallel wires precisely aligned transmits 35 per cent.
VACUUM ANALYZERS AND LEAK DETECTORS 157
Table 4-2. Operating Parameters for R-F Mass Spectrometer VacuumAnalyzer*
Total yield of ion source at 4 mA electron current. . . 1 x 10~^ A/torr
Half width of energy distribution of ions 4.5 eVTotal current sensitivity (signal to total ion collector) 8 x 10"^ A/torr
Partial current sensitivity at U (r-f amplitude) =140 volts 2 X 10-" A/torr
Resolving power at U = 140 volts 100
Upper limit of pressure at which the partial current
is proportional to the partial pressure 5 x 10—* torr, approx
* Taken with permission from H. W. Ehlbeck, K. H. Loecherer, J. Ruf, and
H. J. Schuetze, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 407.
Resolving power of 100 could only be attained by using such a high-
precision grid structure. A mass spectrogram obtained with the
instrument at a total pressure of 1 X 10"^ torr and resolving power of
about 100 is shown in Fig. 4-25.
Assuming that a partial-collector cur-
rent of 10-1* A can be detected above
background, the minimum partial
pressure detectable with the sensi-
tivity of 2 X 10-« A/torr is 5 X 10-»
torr. By sacrificing resolving power
this limit of detectable partial pressure
can probably be reduced somewhat,
at least for the lower range of mass
values.
A compact and relatively simple
type of r-f mass spectrometer, called
the Farvitron, has been described by
Reich. 23 The electrode system for
the Farvitron is shown schematically
in Fig. 4-26 together with the axial
potential distribution. Because of
the geometry of the electrodes and the
d-c voltages applied, the axial poten-
tial distribution is approximately a
parabola, that is, 99 = F — kx^, in which V is
between the two end electrodes and the central
3.10""amp
oLLuIIL JL10 12 14 16 18 22 2822
M
Fig. 4-25. Mass spectrogram at
total pressure of 1 x 10^^ torr
and resolution of i? = 100 from
r-f sorter type of r-f spectrometer
of Ehlbeck et al. [Taken with
permission from H. W. Ehlbeck,
K. H. Loecherer, J. Ruf, and H.
J. Schuetze, in 1960 Vacuum Sym-posium Transactions (Pergamon
Press, London, 1961).]
the voltage applied
ring electrode. An
ion of charge-to-mass ratio e/m injected into such a field experiences an
axial oscillation of frequencj^
f = C!\- V
V
158 VACUUM SCIENCE AND ENGINEERING
where C = 4/7rL and L is the distance between the end electrodes at
which the electrical potential g9 = 0. If an alternating potential of
frequency / is superimposed upon the d-c potential, an ion of e/m
satisfying the above frequency relation will resonate and gain sufficient
energy to escape from the potential pocket.
W A S
J r-'r-i-ii
r I"-!-"! :
D-c supply
Tube
I i^i'-r-'.3
R-f
amplifier
1
Wobbler
50cps
R-f generator
0,l3-l8Mc
Demodulator
D Oscilloscope
Fig. 4-26. Schematic diagram
of the electrodes and of the
axial potential distribution
of the Farvitron mass spec-
trometer. [Taken with per-
mission from G. Reich, in 1960
Vacuum Symposium Trans-
actions (Pergamon Press,
London, 1961).]
Fig. 4-27. Circuit diagram for the
Farvitron mass spectrometer. [Takenwith permission from G. Reich, in
1960 Vacuum, Symposium, Trans-
actious (Pergamon Press, London,
1961).]
In the Farvitron the ions are produced by accelerating a regulated
current of electrons from a tungsten filament axially into the electrode
on the left, the end of which is a wire mesh. The electrons start froma cathode potential of —100 V, as shown in the schematic circuit
diagram in Fig. 4-27, and will therefore penetrate the parabolic field
to a depth of —100 V, producing positive ions by collisions with anymolecules present. These ions oscillate in the parabolic field, most of
them not having sufficient energy to reach the cup-shaped electrode onthe far end. However, when an r-f voltage is applied to the electrode
on the left, ions of the e/m corresponding to the above frequencyrelation gain in amplitude of their motion and escape to the collector
electrode on the right. The r-f current to the collector electrode is
amplified and then rectified to produce a d-c voltage which is appliedto the vertical deflection electrodes of an oscilloscope. The radio
VACUUM ANALYZERS AND LEAK DETECTORS 159
frequency is varied periodically by a 50 cycles/sec wobbler signal over
the range of 0.13 to 1.8 megacylces/sec. For the dimensions and d-c
voltages chosen by Reich the resonant frequencies are given by
/ = 2AM- megacycles/sec
LflMfiiJ
whereM is the molecular weight of the atomic or molecular ion involved.
The frequency swing imposed by the wobbler can be varied in breadth
anywhere over the available frequency range so that either the full
mass range from ilf = 2 to ilf = 250 can be displayed, or a muchnarrower mass range can be chosen and expanded to the full width of
the oscilloscope trace.
The Farvitron is a relatively simple and compact form of r-f mass
spectrometer which can be conveniently constructed for baking out at
high temperature. The sensitivity is apparently limited, at least in
the form described by Reich, to partial pressures not less than about
10~^ torr. The high scanning rate
of 50 cycles/sec makes the Farvitron
particularly useful in following rapid-
ly changing conditions in a vacuumsystem.
4-4. Halogen Leak Detector.
A discussion of leak detectors
would not be complete without
mention of the halogen leak detector
based upon the enhanced positive
ion output of a halogen-sensitive
diode. Langmuir and Kingdon^*'^^
had demonstrated the production
of positive ions by ionization of gas
molecules coming into contact with
a hot surface provided the therm-
ionic work function of the surface
is greater than the ionization potential of the gas molecule. White
and Hiokey^" utilized the greatly enhanced production of positive ions
which occurs when a gas containing any one of the halogens (fluorine,
chlorine, bromine, and iodine) comes in contact with a hot (^^900°C)
platinum surface as the basis for a leak detector. Their detector
consists of a platinum cylinder mounted on a ceramic-clad heating
element placed centrally within a larger platinum cylinder, as shown
schematically in Fig. 4-28. The heated inner cylinder is made positive
(100 to 500 V) relative to the outer cylinder, and the ion current is
read on a microammeter, as shown in the diagram, or by means of an
Air flow-
FiG. 4-28. Schematic diagram of
halogen leak detector. [Taken with
permission from W. H. White and
J. S. Hickey, Electronics 21, 100
(1948).]
160 VACUUM SCIENCE AND ENGINEERING
amplifier. The halogen detector is most effectively used as a leak
detector by placing it inside the vacuum system and probing the
system with a fine jet of Freon-12 or other halogen-containing gas.
Torney^' has made a study of the optimum conditions for operating a
halogen detector to ensure stability and sensitivity. The platinum
diode produces a background current of positive ions even when no
halogens are present. The background current due to this effect varies
with the gas pressure and the tem-
perature of the inner element.
The signal due to the enhanced
ionization in the presence of a
halogen-containing gas also de-
pends upon the gas pressure (of
air). The dependence of the re-
sidual ionization current for two
different values of the heater cur-
rent and of the signal in detecting
a calibrated leak of 10~^ cm^/sec
on the pressure in the system is
shown graphically in Fig. 4-29.
The operating range (70 to 200 fi)
crosshatched in the figure is so
chosen that the background cur-
rent is relatively independent of
the pressure in the system andthe ratio of signal to background
is relatively large, resulting in anoptimum ratio of signal to background.
Torney also observed that the background positive ion current
changes slowly with time provided that the pressure and circuit param-eters are steady, whereas the signal due to the introduction of a halo-
gen gas rises much more rapidly. Utilizing this difference in response,
Torney developed a circuit which facilitates discrimination betweenbackground fluctuations and signals due to a leak. The circuit, a block
diagram of which is shown in Fig. 4-30, contains a network between the
detector and the amplifier which constitutes a bandpass filter which by-
passes through C2 the high-frequency noise generated in the detector, is
unresponsive to the very low frequencies associated with changes in
the background ion current, but transmits an intermediate band of
frequencies typical of changes in the signal due to detection of a leakby use of a halogen gas. Subsequent amplification of the signal beyondthe bandpass filter then permits the sensitive detection of the enhancedpositive ion current due to the application of a halogen gas to a leak even
20 40 100 200 400 ipOO
Pressure,;!
Fig. 4-29. Halogen leak detector back-
groand positive ion current for 1.60-A
and 1.75-A heater current and signal
current for standard leak of 10~*
cm^/sec as a function of the pressure in
the system. [Taken with permission
from F. L. Torney, Jr., in 1957 VacuumSymposium Transactions (PergamonPress, London, 1958).]
VACUUM ANALYZERS AND LEAK DETECTORS 161
Sensing
element
Loudspeaker
^C; Amplifier
relaxation
oscillator
ond
power
supply
Sensing head
From system
under test
From regulated source of
clean uncontaminoted air
RequlotedO ,. O 1
voltages
Fig. 4-30. Block diagram of circuit for halogen leak detector. [Taken withpermission from F. L. Torney, Jr., in 1957 Vacuum Symposium Transactions(Pergamon Press, London, 1958).]
though this change is small as compared with typical changes in the
background ion current.
One feature of halogen leak detectors which can cause difficulty is
the relatively long "memory" of the detector once it has been exposedto a surge of halogen gas. To re-
duce the memory period, Torney^'
devised a mounting for the detec-
tor which provides for the purging
of the detector by the introduction
of gas free of halogen contamination,
as shown in Fig. 4-31. The unit
is either connected in series in the
forevacuum line of the system as
shown in Fig. 4-31a or connected
in parallel as shown in Fig. 4-316.
The principal disadvantage of the
series arrangement is the resulting
low conductance for gas flow. Theparallel arrangement in Fig. 4-316
may be permanently installed in asystem without impairing pumpingperformance.
According to Torney, 2' leak rates
of 2 X 10~* atm cm^/sec will pro-
duce a full-scale deflection on his
version of the halogen leak detector,
and leak rates as small as 2 x 10"^
atm cm^/sec can be detected when proper precautions are observed.4-5. Leak-detection Techniques. Leakage through flange seals,
welded or soldered joints, and flaws such as cracks and porous sectionsof metal is an important cause of vacuum-system failure. The degree
To vacuum pump
Coble to
control unit
To vacuumpump
From system
under test
Fig. 4-31. Methods of connecting
halogen leak detector into a vacuumsystem. [Taken with permission
from F. L. Torney, Jr., in 1957Vacuum. Symposium Transactions
(Pergamon Press, London, 1958).]
162 VACUUM SCIENCE AND ENGINEERING
BurnerHole to view flame
Copper plote
to which leakage must be eliminated in vacuum systems is far greater
than that required for pressure and most other vessels in common
engineering experience. Because of the importance of eliminating
leakage, methods of detecting and localizing leaks constitute an impor-
tant element in vacuum practice.
Larger leaks in vacuum systems may be detected by any of several
relatively crude methods. The system may be pressurized slightly by
closing the valve to the pump and
connecting a tank of nitrogen to
the system through a regulating
valve set at a gauge pressure of a
few pounds per square inch, care-
fully avoiding the risk of applying
an unsafe overpressure. Gas will
then flow out through the leaks,
the larger of which can then be
located by painting suspicious
areas with soap solution and look-
ing for bubbles. A very large leak
can be detected most easily if the
gauge pressure is kept very low.
Alternatively, the system may be
pressurized with a halogen-con-
taining gas such as Preon-12 and
a sniffing method used to detect the halogen gas coming out through
the leaks. A hahde torch such as that illustrated in Fig. 4-32 is
convenient for this purpose and reasonably sensitive. The air-intake
hose shown in the figure is used to explore the system for leaks.
When the inlet end of the hose sniffs the halogen gas, the flame in the
torch turns green. Small components of a vacuum system can be
separately sealed, connected to a compressed-air supply, and immersed
in water. A trail of bubbles indicates the location ofa leak. According
to Guthrie and Wakerling,^* the pressurizing methods are limited in
sensitivity to a leak rate of the order of 10^^ atm cm'/sec, which is
entirely adequate for locating the larger leaks that would prevent
pumping a system down to the region of ionization-gauge operation.
When the leak rate in a vacuum system is low enough that the
diffusion pumps can be put into operation and a pressure less than 10~^
torr attained, more sensitive methods are required to locate the remain-
ing small leaks. In this case ionization gauges may be operated in the
fine vacuum portion of the system and heat-conductivity gauges in the
forevacuum section. The behavior of a vacuum in this condition has
been described by Briggs, Jones, and Roberts^^ in terms of the pressure
flir-intoke tube used
to hunt for leaks
Fig. 4-32. Halide torch and auxiliary
equipment. [Taken with permission
from A. Guthrie and R. K. Wakerhng(eds.), Vacuum Equipment and Tech-
niques (McGraw-Hill Book Company,Now York, 1949).]
VACUUM ANALYZEBS AND LEAK DETECTORS 163
as a function of the time, as shown in Fig. 4-33. The system assumedfor this example has a liquid-nitrogen-cooled baffle over the diffusionpump. When the pressure has reached a nearly steady value duringpumpdown, the trap is cooled by liquid nitrogen removing the condens-able vapor, after which a base pressure is reached depending upon theoutgassing and leak rates. The valve between the diffusion pump andthe liquid-nitrogen-cooled trap is then closed and the pressure rise
eokoge rote
Punnping
storted
ILiquid nitrogen
introduced
into trap
Pumpvolved off
from system
Time >Fig. 4-33. Pressure vs. time for a vacuum system with a significant leak present.[Taken with permission from W. F. Briggs, A. C. Jones, and ,T. A. Roberts, in
195S Vacuum. Symposium Transactions (Pergamon Press, London, 1959).]
followed in time. Since the outgassing rate diminishes with time, thepressure-rise curve typically has a decreasing slope as long as the curveis dominated by outgassing. However, if the curve becomes a straightline after some time, the pressure rise may be assumed to be dominatedby a leak, the value of which \s Q = V dPjdt, where V is the volume ofthe system.
When it has been determined that a leak is present, the next step is
to localize the source. The procedures which may be used are many,but only some of the most efficacious will be mentioned. Briggs et
al.29 describe the use of a null method in the circuit of a cold-cathode(PIG) type of ionization gauge as shown in Fig. 4-34 to detect with highsensitivity any change in the system pressure. Usually when a definite
leak is present, the system pressure remains fairly steady at a valuedetermined by the leak rate and the pumping speed of the system.Under these conditions the steady reading due to the system pressurecan be balanced out as shown schematically in the figure and anychanges in pressure, up or down, detected with increased sensitivity.
164 VACUUM SCIENCE AND ENGINEERING
D-cpower
supplyI—
I
Ionization
gouge d^
SrTo
vacuum system
ShuntoNull indicotor
If the leak rate can now be
changed by squirting water or
other liquid on suspicious parts of
the system to cause a momentary
decrease in the leak rate or by
using some gas other than air,
such as Freon, COj, or helium, to
cause a change in the gauge re-
sponse, the balance in the gauge
circuit will be disturbed and the
location of a leak indicated.
Methods such as these are gener-
ally capable of detecting leak
rates of the order of lO"" atmcm'/sec.
The next order of sensitivity is
the halogen leak detector described
in the previous section. As was
already stated, this device is in-
stalled in the forevacuum line of
the vacuum system and has a
sensitivity of about 2 X lO"** atmcm*/sec.
By far the most sensitive and versatile of the leak detectors is the
mass spectrometer helium leak detector, several types of which are
described earlier in this chapter. In application the helium leak
detector, which has its own complete vacuum system, is connected into
the forevacuum of the system being
tested through a control valve as
illustrated in Figs. 4-35 and 4-36.
In Fig. 4-35 the system to be leak
tested is enclosed in a hood into
which helium is injected so that the
system is surrounded by a mixture
of air and helium. This method is
particularly effective if the problem
is to determine whether a vacuumdevice has a leak greater than somespecified value, but it does not
help to locate the leak. On verylarge systems the hood method canbe applied to sections of the systemby enclosing portions of the system
Reference J.
voltage
P"iG. 4-34. Null method for detecting
changes in system pressure during
leak hunting. [Taken with per-
mission from W. F. Briggs, A. C.
Jones, and J. A. Roberts, in 195S
Vacuum Symposium Transactions
(Pergamon Press, London, 1959).]
Equipment
under test\
Envelope containing
helium-air mixture
Fig. 4-35. Hood method of applying
helium leak detector. [Taken with
permission from W. F. Briggs, A. C.
Jones, and .T. A. Roberts, in 1958
Vacuum Si/mposium Transactions
(Pergamon Press, London, 1959).]
VACUUM ANALYZERS AND LEAK DETECTORS 165
in hoods of plastic foil, thus roughly localizing any leaks present. Thegas probe method illustrated in Fig. 4-36 is very widely applied since
it facilitates localizing the leak within a small area. A tank of helium
with a regulator valve and a hose terminated by a small nozzle is used
to explore the vacuum system in detail. When the probing gas jet hits
the leak, the helium leak detector responds in a time depending uponthe capacity of the system and the size of the leak. Most leak detectors
produce an audible signal, the sensitivity of which can be set for
detection of small or large leaks. The sensitivity of a helium leak
detector is defined in terms of the
smallest air leak rate to which the
instrument will respond when air
is replaced by pure helium at at-
mospheric pressure. In the earlier
sections of this chapter the sensi-
tivities of several helium leak de-
tectors are given on this samebasis. However, in searching for
leaks in vacuum systems con-
ditions are much less favorable
than those under which the sensi-
' C3 a ^
S7 /?=^—® wrn y
Equipment
Leak
detecto
Roughing
pump
under test ^^|,^^
Fig. 4-36. Gas probe method of apply-
ing helium leak detector. [Taken with
permission from W. F. Briggs, A. C.
Jones, and J. A. Roberts, in 1958
Vacuum Symposium Transactions (Per-
gamon Press, London, 1959).]
tivity is measured. In any case, detection of leaks of 10"^ atm cm^/sec
is usually relatively straightforward, and detection of leaks as small as
10^1" atm cm^/sec is entirely possible under good conditions.
No matter what probe gas is used in leak detection, precautions must
be taken to avoid excessive flooding of the system and its surroundings
with probe gas. The objective is to determine the precise location of
the leak, not simply to determine whether one is present. If there is an
excessive amount of probe gas about the system, the leak detector will
continue to respond for some time, whether or not the gas probe is
directed at a leak, so that time is lost in localizing a leak. A fine gas
jet which is turned on only for brief intervals and then turned off again
is best. The leak detector can then be kept operating at high sensitivity
and will respond when the leak is struck by the gas probe with whatever
delay is characteristic of the system.
In Chap. 9 the operation of getter-ion pumps is discussed in somedetail. Ackley et al.^" describe how the current drawn by a Vac-Ion
type of pump may be used as a sensitive indicator for leak detection.
One property of this type of pump is that for a given type of gas the
current drawn by the pump is proportional to the throughput. Thusfor gas of type a
Qa = S,xPa (4-11)
and similarly for each component gas in the system, where 7„ is the
166 VACUUM SCIENCE AND ENGINEERING
current drawn for a given throughput Q^, P„ the resulting partial
pressure of the gas component in question, and S^ the pumping speed
of the getter-ion pump for that same component. Consider the case
of a system with a leak present. The getter-ion pump current is
I =h
SPh '
(4-12)
where Qg represents the internal outgassing load and Q^ is the leakage
throughput of gas of type 1. If, now, at time t = 0, gas of type 1 is
replaced by gas of type 2, then after a time t the change in the getter-ion
pump current is
Mit)
(4-13)
since presumably Qg, the internal outgassing, remains constant. The
detailed form of the current change with time depends critically on the
relative pumping speeds and leak rates for the two gases. After a
sufficient time the exponential factors approach zero and the fractional
change in the current is
lit) -
1
(^b' 1 -exp(^^^)_
(^h. 1 --exp(-^<)_
CO)[IIP). S, Q,
(IIP), S, Q,1 (4-14)
The data for the parameters (IjP)2l{IIP)i, S^jS^, and Q^jQi and the
observed values for A/// are given in Table 4-3 for several gases and
conditions. It is noteworthy that values of A7/7 ~ +1 are observed
in response to the substitution of one gas for another, providing an
excellent sensitivity for leak detection. The value of IjSP for air was
measured and found to be about 20. Using the data from Table 4-3
and the above parameter for air, one finds from (4-14) that by substi-
tuting helium for air at a leak in the system, the change in current drawn
by the getter-ion pump is
M = lOQair
in which A/ is in amperes when Qair is the leak rate for air in torr
liters per second. Ackley et al. claim that since a simple electrometer
circuit can easily measure currents of lO^^^ A, the corresponding
minimum detectable leak rate is about 10^^' torr liter/sec, and that
even smaller leak rates may be detected by using a more sensitive
VACUUM ANALYZERS AND LEAK DETECTORS 167
electrometer circuit. Since the measurement depends upon the change
in the value of the current resulting from the substitution of the gas at
the leak, the limit of sensitivity for leak detection by this methoddepends upon how small the fluctuations in the getter-ion pump current
may be before making the substitution. The authors state that bytaking proper precautions the fractional change in the getter-ion pumpcurrent can be of the order of 1/2,000. The smaller the equilibrium
value of the getter-ion pump current determined by Qg, the throughput
'r.\BLE 4-3. Relative Values of Pumping Speeds, Leak Rates, and IjP
Factors Used in Determining the Change in Getter-ion Pump CurrentDue to Substitution of One Gas for Another*
Probo gas (IlnjillPh SJS, Q2IQ, Ai//t
A 1.25 0.834 0.85 + 0.5
He 0.167 0.30 2.7 -1-0.5
He (with increased pumping speed) 0.167 0.50 2.7
Ha 0.50 1.73 3.8 + 0.1
Hj (with increased pumping speed) 0.50 2.12 3.8 -0.1
Oa 1.0 1.25 0.95 -0.5
CO, -0.5
* Taken with permission from Ackley, Harrington, Francis, Jopsen, Lothrop,
and MandoH, in 1902 Vacuum Symposium Transactions (The Macmillan Company,Xcw York, 1962), p. 380.
I The vahies of A/// were experimentally determined.
due to outgassing, the smaller the minimum detectable leak rate. The
consequence is that the minimum detectable leak rate is generally in the
range from 10^" to IQ-^^ torr liter/sec, depending upon the condition of
the system. Whatever the limiting value may be, it is comparable
with that achieved using a mass spectrometer type of leak detector and
is very convenient in systems in which getter-ion pumps are used.
REFERENCES
1. R. Loevingor and A. Guthrie, in A. Guthrie and R. K. Wakcrling (eds.),
Vacuum Equipment and TccliHiques, National Nuclear Enei-gy Series
(McGraw-Hill Book Company, New York, 1949), pp. 207ff.
2. A. J. Dempster, Phys. Rev. 11, 316 (1918).
3. Locvinger and Guthrie, in op. cit., pp. 212ff.
4. H. A. Thomas, T. W. Williams, and J. A. Hippie, Rev. Sci. Instr. 17, 368
(1946).
5. D. E. Charpentier, in 195G Vacuum. Symposium, Transactions (Pergamon
Press, London, 1957), p. 114.
6. A. O. C. Nior, Rev. Sci. Instr. 11, 212 (1940).
108 VACUUM SCIEKCE AND ENGINEERING
7. A. Hustrulid and A. O. C. Nier, The Mass Spectrometer as a Leak Detector for
High Vacuum Systems, University of Minnesota Report A-578, Apr. 5, 1943.
8. A. O. C. Nier, C. M. Stevens, A. Hustrulid, and T. A. Abbott, J. Appl. Phys.
18, 30 (1947).
9. W. G. Worcester and E. G. Doughty, Trans. AIEE 65, 946 (1946).
10. W. D. Davis and T. A. Vanderslice, in 19G0 Vacuum Symposium Transactions
(Pergamon Press, London, 1961), p. 417.
11. J. L. Peters, in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, 1960), p. 94.
12. C. F. Robinson and L. G. Hall, Rev. Sci. Instr. 27, 504 (1956).
13. G. D. Perkins and D. E. Charpentier, in 1957 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1958), p. 125.
14. H. Sommer, H. A. Thomas, and J. A. Hippie, Phys. Rev. 82, 697 (1951).
15. W. R. Watson, R. A. Wallace, and J. Lech, in 1960 Vacuum Symposium
Transactions (Pergamon Press, London, 1961), p. 421.
16. D. Charles and R. J. Warnecke, Jr., in 1959 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1960), p. 34.
17. E. H. Nicollian, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 80.
18. D. Lichtman and A. Hebling, in 1960 Vacuum Symposium Transactions
(Pergamon Press, London, 1961), p. 187.
19. R. E. Moody, in 7956' Vacuum Symposium Transactions (Pergamon Pr(>ss,
London, 1957), p. 119.
20. P. A. Redhead, Can. J. Phys. 30, 1 (1952).
21. H. W. Ehlbeck, K. H. Loocherer, J. Ruf, and H. J. Schuotzo, in 19G0 Vacuum
Symposium Transactions (Pergamon Press, London, 1961), p. 407.
22. W. H. Bennett, J. Appl. Phys. 21, 143 (1950).
23. G. Reich, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 396.
24. I. Langmuir and K. H. Kingdon, Science 57, 58 (1923); Phys. Rev. 21, 380
(1923); Proc. Royal Soc. (London) A107, 61 (1925).
25. K. H. Kingdon, Phys. Rev. 23, 774 (1924).
26. W. H. White and J. S. Rickey, Electronics 21, 100 (1948).
27. F. L. Torney, Jr., in 1957 Vacuum Symposium Transactions (Pergamon
Press, London, 1958), p. 115.
28. A. Guthrie and R. K. Wakerling (eds.). Vacuum Equipment and Techniques,
National Nuclear Energy Series (McGraw-Hill Book Company, New York,
1949). Chapter 5 of this book provides an excellent review of leak-detection
instruments and techniques developed by the Manhattan Project during
World War II.
29. W. F. Briggs, A. C. Jones, and J. A. Roberts, in 1958 Vacuum. Symposi^im
Transactio7is (Pergamon Press, London, 1959), p. 129.
30. J. W. Ackley, A. E. Barrington, A. B. Francis, R. L. Jepsen, C. F. Lothrop,
and H. Mandoli, in 1962 Vacuum Symposium Transactions (The Macmillan
Company, New York, 1962), p. 380.
CHAPTER 5
MECHANICAL VACUUM PUMPS
5-1. Functions of Mechanical Pumps. Mechanical vacuumpumps perform a variety of functions in vacuum systems. Tiie first
requirement is that of removing most of the atmospheric air from the
system to some acceptable operating pressure; this operation is some-times referred to as roughing out the system. The final operating level
as far as the mechanical roughing pump is concerned is in many cases
the forepressure required for safe operation of a diffusion pump. Theroughing pump must also maintain a satisfactory operating pressure
in the presence of whatever gas evolution occurs during the operation
of a system. Pumps which commonly perform these two functions are
essentially oil-sealed gas compressors in which the inlet pressure is that
of the system and the outlet pressure is that of the atmosphere. Twoother types of mechanical pumps which are effective in vacuum systems
when backed by a roughing pump as a second stage are the positive
displacement mechanical booster pump (sometimes called a blower)
and the molecular-drag pump. The function of these latter two types
of pumps is to provide high pumping speed at low pressure.
5-2. General Features of Oil-sealed Mechanical Pumps.Any mechanical pump capable of maintaining a high pressure ratio
when used as an air compressor may be used as a vacuum roughing
pump. Of the many possible types those which are most successful
are oil-sealed rotary pumps of positive displacement, i.e., pumps which
isolate at each revolution a specific volume of gas at the pressure in the
system, compress the sample, and exhaust it to atmospheric pressure.
In Fig. 5-1 is shown a cross section of a rotating plunger type of pumpin several phases of operation from suction to exhaust. Figure 5-2
illustrates one type of vane pump in which an eccentric cylinder rotates
within a hollow, cylindrical casing with a reciprocating vane mountedin the casing and maintained in contact with the eccentric rotor to
provide a seal between inlet and outlet ports. Another type of vanepump in which vanes are mounted in a balanced, rotating member is
shown in Fig. 5-3. Pumps of all these types are commercially available
169 ^
170 VACUUM SCIENCE AND ENGINEERING
II I III I I
(a) (b)
(c)
Fig. 5-1. Cross section of a rotating-plunger oi- Kinney type of pump (a) at thebeginning of the suction stroke, (6) at an intermediate position, and (c) at theend of the exhaust stroke.
MECHANICAL VACUUM PUMPS
Discharge valve
Inlet port
171
Rotor
Seal
Fig. 5-2. Vane type of |3ump in which an eccentric cyhnder rotates within ahollow, cylindrical ca.sing with a reciprocating vane mounted in the casing andmaintained in contact with the eccentric rotor to provide a seal between inlet
and outlet ports.
in both single- and double-stage versions. A compound or double-stage Kinney KC pump is illustrated in Fig. 5-4.
Two important characteristics to be considered in rating mechanicalroughing pumps are the pressure ratio which the pump can maintainbetween inlet pressure and the exhaust pressure, and the pumpingspeed with which the pump removes gas while decreasing the pressurefrom atmospheric pressure down to the limiting pressure of which thepump is capable. As a mechanical pump removes air or other gas froma tight system, the pressure decreases with the time until the pressurereaches the ultimate vacuum of the pump. As long as the system is
free of leaks, the ultimate pressure is the atmospheric pressure dividedby the compression ratio capability of the pump. As compared with
Fig. 5-3. Vane type ofpump in which\-anes are mounted in a balanced,rotating member.
Fig. 5-4. Schematic drawing of a com-pound, or double-stage, Kinney KCpump.
r
172 VACUUM SCIENCE AND ENGINEERING
ordinary air-compressor performance, the compression ratio required
of mechanical vacuum pumps is very high, typically from 10^ to 10'.
In the design of pumps to be used for vacuum service great care is
exercised to ensure that during each cycle the entire volume of gas
which is taken in during the suction stroke is exhausted at the end of the
cycle. Any small sample of gas which is not forced through the exhaust
valve will be added to the subsequent displacement volume and tend
to limit the ultimate pressure of the pump. Single-stage mechanical
vacuum pumps are typically capable of maintaining an ultimate
pressure of 5 x 10~^ torr partial pressure of air as indicated on a McLeod
gauge. This performance represents a compression ratio of over 10^
and in practice can be achieved more effectively by a rotary rather than
by a reciprocating compressor.
Because mechanical vacuum pumps must have positive clearances
between the operating parts which communicate directly between the
exhaust port and the inlet port, a sealing medium is required to prevent
leakage through the clearances and ensure the maintenance of a high
compression ratio. Because the closely mating parts require lubri-
cation, the most satisfactory sealing medium is lubricating oil of low
vapor pressure and high lubricity. In addition to sealing the pumpagainst blow-by from the exhaust into the intake, the proper flow of oil
through the pump is essential to ensure lowest attainable ultimate
vacuum. When the pressure on the inlet side of the pump is low, the
gas admitted to the pump during the early portion of the cycle is
compressed into a tiny bubble by the time it reaches the exhaust port.
If there is a sufficient flow of oil through the pump, this small bubble of
gas is carried out through the exhaust valve with the slug of oil admitted
during the cycle. Because the oil in a mechanical vacuum pump serves
these two separate functions, the rate of flow and the distribution of
oil through the pump are important features of the design. Unfortu-
nately, the processes of sealing the clearances in a rotary pump, the
entrainment of air in the oil stream, and the final ejection of the slug
of oil with entrained gas bubbles are not understood in detail so that the
design of mechanical vacuum pumps depends much more upon experi-
mental development than upon analytical procedures.
5-3. Pumping Speed of Oil-sealed Mechanical Pumps. In
Sec. 2-2 the pumping speed of a vacuum pump is defined as the volumeof gas, measured at the inlet pressure, which the pump removes fromthe system per unit of time. In the case of positive displacement
pumps the pumping speed can be defined as the product of two per-
formance factors, displacement speed and volumetric efficiency. Thedisplacement per revolution of such a pump is a purely geometrical
quantity and is the free volume exposed to the inlet port at each
'
MECHANICAL VACUUM PUMPS 173
revolution of the pump. This quantity multiplied by the rotational
speed of the pump is the displacement speed 8j). Mechanical pumpsgenerally are rated in terms of the displacement speed rather than thetrue pumping speed, which is the displacement speed multiplied by
Table 5-1. Displacement Speeds or Kinney Mechanical Vacuum Pumps
Model no. Pump rpin cfm liters/min liters/sec rc?jhr
Rotary Piston Type, Single Stage
KS-13 450 13 369 6.14 22.1
KS-27 360 27 765 12.7 45.9
KS-47 360 47 1,330 22.2 80
KD-30 530 31 880 14.6 52.7
KD-850 444 850 24,100 401 1,445
KDH-65 440 65 1,840 30.6 110.5
KDH-80 555 80 2,260 37.8 136
KDH-130 535 131 3,710 61.9 221.1
KDH-150 630 154 4,360 72.6 262
KDH-250 476 250 7,090 118 425
KT-300 880 301 8,540 142 510.2
KT-500 796 520 14,700 245 885
Rotary Piston Type, Compound
KC-2 755 2 57 0.944 3.4
KC-3 1,135 3 85 1.42 5.1
KC-5 630 5 142 2.36 8.5
KC-8 1,000 8 226 3.78 13.6
KC-15 525 15 424 7.08 25.3
KC-46 500 46 1,300 21.7 78.1
KTC-21 1,725 21.2 600 10 36
Vane Type, Compound
KCV-2 479 2.3 65.3 1.09 3.91
KCV-3 646 3.2 91 1.51 5.44
KCV-5 378 4.4 124.2 2.04 7.47
KCV-7 650 6.8 192 3.2 11.6
the volumetric efficiency, that is, Sj, = eSjj. In Table 5-1 are listed the
various models of Kinney rotary oil-sealed vacuum pumps together
with their displacement speeds at designated rotational speeds. For
convenience the theoretical displacements are given in cubic feet per
minute (cfm), liters per minute, cubic meters per hour, and liters per
second, all of which units are commonly used in designating the pumpingspeed of mechanical pumps. (See Appendix IV for conversion factors.)
174 VACUUM SCIENCE AND ENGINEERING
The true pumping speed of mechanical vacuum pumps varies from a
value which is nearly equal to the displacement speed at atmospheric
pressure to zero at the ultimate pressure of the pump . The performance
curve of a mechanical vacuum pump consists of a graph showing the
actual pumping speed as a function of the pressure from atmospheric
pressure down to the ultimate pressure of the pump. Such curves can
be obtained only by detailed measurement of the pumping speed over
many decades in the pressure by methods such as those described in
detail in Chap. 7. Air is bled through a needle valve at a constant rate
into a small, vacuum-tight vessel connected to the inlet of the pumpand the equilibrium pressure read on a McLeod gauge. The flow rate
of air at atmospheric pressure is measured by any of several methods,
depending upon the magnitude of the flow at each point. The flow
rate is then
760 vol of atmospheric air in ft' .
Q =: r^— torr cimtime in mm
760 vol of atmospheric air in liters
time in sectorr liters/sec (5-1)
when atmospheric pressure is 760 torr.
The reasons for the particular choice of the McLeod gauge (see Chap.
3) for these measurements are of some interest. One reason is that the
McLeod gauge is an absolute gauge for permanent gases, which obey
the general gas law PV = RT, and can therefore be calibrated bystraightforward measurement of gauge dimensions. The other reason
is that the McLeod gauge measures only the permanent gas pressure
and does not respond significantly to condensable vapor pressure unless
the vapor pressure is much higher than occurs under the conditions here
described. The permanent gas pressure rather than the total pressure
(permanent gas plus vapor) is also the only logical pressure to use in the
method described above. The gas flow which is measured and enters
the pump is that of the permanent gas, such as atmospheric air.
Therefore the equilibrium partial pressure of the permanent gas deter-
mined by this flow is the pressure which should be measured to deter-
mine the pumping speed. The vapor pressure present during these
measurements is mostly that of the sealing oil used in the pump and has
nothing directly to do with the mechanical pumping action being
measured. Moreover, the vapor pressure can be varied over a wide
range, depending upon whether the oil is vacuum-processed or ordinary
lubricating oil, without noticeably affecting the pumping speed of the
pump for permanent gas. The vapor pressure is thus not an indication
MECHANICAL VACUUM PUMPS 175
of the pumping speed of the pump but is only an indication of what is
put into the pump as a sealing medium.The pumping speed of Kinney oil-sealed mechanical pumps depends
upon the inlet pressure in a manner indicated by the graphs in Figs.
5-5 and 5-6, in which the pumping speed is plotted as a function of the
permanent gas pressure. It will be noted that, whereas the pumpingspeed of the single-stage pump falls to practically zero just below 10"^
torr, the pumping speed of the compound pump is greater than 50 per
19,824
16,992
0.001 0.005 0.010 0.050 0.100 0.500 1
Pressure, torr
500 1,000
Fig. 5-5. Pumping speed of Kinney single-stage oil-sealed mechanical pumps as
a function of inlet pressure.
cent of the theoretical displacement at 10~' torr and does not fall to
zero until the pressure reaches the range of 1 to 2 x 10^* torr McLeodgauge reading or about 10~* torr on a liquid-nitrogen-trapped ionization
gauge.
Equation (2-1) defines the gas flow through a pump as Q = P-m^j,^
which is equivalent to Eq. (2-18) in which the gas flow is defined as the
volume flow dVjdt multiplied by the pressure. This quantity is some-
times called the throughput and is the same at all points in a system
consisting of pumps and conductances, as long as there are no leaks.
The throughput of a pump as a function of the pressure is a useful
representation of pump performance for the design of vacuum systems.
I
KCV-7
Displocement;/ cfm (198 liters/mm)
ot 650 rpm
KCV-5
Displacement : 5 cfm (142 liters/min)
at 378 rpm I
KCV-3 ^Displacement: 3.2 cfm (91 liters/min)
at 646 rpm
KCV-2'Displocement; 2.3 cfm (65 liters/mini
ot 479 rpm
226,4
169.8
113.2
56.2
10
0.0001 00005 0.001 0.005 0.010 0.050 0.100 0500 1
Pressure, torr
(a)
5 10 50 100
2832
2264
169.8
113.2
56.6
0.0001 0.0005 OOOl O005 QOlO 0.050 0.10 0.500 1 5 10 50 100
Pressure, torr
(6)
Fig. 5-6. Pumping speed of Kinney compound oil-sealed mechanical vacuumpumps as a function of inlet pressure. (Continued on next page.)
176
MECHANICAL VACUUM PUMPS 177
0.0001 0.0005 0.001 0.005 QOlO 50 1000.050 0.100 0.500
Pressure, torr
(c)
Fig. 5-6 (continued). Pumping speed of Kinney compound oil-sealed mechanical
vacuum pumps as a function of inlet pressure.
In Fig. 5-7 the throughput for typical single- and double-stage mechan-
ical roughing pumps is shown as a function of the pressure from
"blank-off" to atmospheric pressure. The use of throughput curves
in vacuum-system design is discussed in Chap. 8.
5-4. The Effect of Condensable Vapor upon Mechanical
Pump Performance. After the pressure has been reduced to the
operating level, a mechanical vacuum pump removes the gas from a
vacuum system at a very low pressure and compresses it by a large
factor to somewhat above atmospheric pressure during ejection through
the exhaust valve. For permanent gases this process entails no serious
complications. However, condensable vapors are frequently present.
These materials tend to condense during compression and seriously
impair pumping efficiency.
The condensable materials of concern in the operation of mechanical
vacuum pumps are those which have a vapor pressure which at
moderate temperatures is high as compared with, or at least comparable
to, the desired total pressure in the system being evacuated, but low
as compared with atmospheric pressure. Such a material enters the
178 VACUUM SCIENCE AND ENGINEERING
vacuum pump as a vapor but condenses inside the pump during com-
pression. Performance of the pump is adversely affected in two ways:
(1) That portion of the condensed material which is not ejected through
the exhaust valve with the slug of sealing oil is added to the gas in the
subsequent displacement volume and reexpands, thereby reducing the
capacity of the pump for the subsequent stroke; (2) that portion which
is carried out in the ejected slug contaminates the sealing oil in the
10^
10^
10'
£ 10
10'
10"
10-2
10-3
10"
^^^
_^^^ ^ ''
^,^^y
f^^pump
...,.,_^y.
"
y"/ — 47-cfm single-stage pump^ h^ /^ :/
>^ f/1-4
10-3 10" 10"
110^ lO""
Inlet pressure, torr
Fig. 5-7. Throughput for typical single- and double-stage mechanical roughing
pumps as a function of the pressure.
reservoir. The contaminated oil eventually reenters the vacuum pumpand further impairs pumping efficiency. In some cases the contam-
inant also causes sludge formation in the reservoir with the result that
the oil does not flow properly and is no longer an effective sealant. In
any case, once the oil is excessively contaminated by a condensable
material there is no very effective cleanup action in the standard
operation of the pump, and the contaminated oil must be replaced byfresh oil to restore good pumping efficiency.
An important factor contributing to poor performance of a vacuumsystem, in which an appreciable quantity of water or other condensable
material is present, is the fact that the condensed material expands bya very large factor in evaporating and thus occupies a disproportion-
ately large pump capacity. As an example, water at 72°F expands bya factor of 50,000 in changing from the liquid to the vapor phase, so
that 1 lb of water becomes about 800 ft^ of vapor, provided the tem-perature of the source of vapor is maintained at the initial value. Inpractice, because of the high latent heat ofvaporization, the temperatureof the source of vapor drops significantly, the equilibrium vapor
MECHANICAL VACUUM PUMPS 179
pressure decreases correspondingly, and the pump capacity occupied
by the vapor is even larger. Thus, aside from questions of contami-
nation of the pump sealant, the pumping of condensables such as water
in a vacuum system is disadvantageous because of the extremely low
density of the material as it passes through the pump as compared with
its much higher density as a liquid or solid in the system.
Whereas the condensable material which most persistently causes
trouble in mechanical vacuum-pump applications is water, other
materials, such as the Freons encountered in the reconditioning of
refrigerator units and the various solvents encountered in vacuum
processing of many materials, also cause difficulties. Because of the
wide range of contaminants encountered in vacuum processes and the
wide range of requirements as to desired operating pressure, no one
solution to the problem of contamination of vacuum-pump sealing oil
has been found, but a variety of remedies applicable to specific situ-
ations have been developed.
In connection with the problem of contamination of vacuum-pump
sealing oil by condensable materials a word of caution is needed on the
installation of an exhaust pipeline to carry away the discharge. Such
lines, unless steam or electrically heated, normally provide very large
condensing surfaces. If the pump discharge contains water vapor or
other condensable material, condensation will occur in the exhaust
line. This line should not, therefore, run directly upward from the
outlet of the vacuum-pump separator tank because the condensate
formed in the line would then drop back into the oil reservoir and
recontaminate the sealing oil. An appropriate "drop-out" tank or
trap with a drain should be installed beside the separator tank and the
exhaust line taken up from the drop-out tank. Any condensate from
the line is then caught where it can be drained periodically without
getting back into the pump reservoir. The interconnection between
the separator tank and the drop-out tank should preferably be heated
to eliminate condensation at a point where flow back into the reservoir
would be possible. This precaution should be taken on any installation
involving an exhaust line, no matter which of the several methods for
dealing with condensable contaminants is adopted.
5-5. Gas Ballast. The term gas ballast was applied by Gaede^-*
to a method of preventing condensation in mechanical vacuum pumpsinvented by him and first applied to pumps manufactured by E.
Leybold's Nachfolger of Cologne, Germany.The principle of gas ballast is to admit sufficient air into the cylinder
during the compression stroke to prevent condensation of any vapor
* References indicated by superscript numbers are listed at the end of the
chapter.
180 VACUUM SCIENCE AND ENGINEERING
being pumped. In the adaptation of Kinney pumps for gas ballast a
hole is drilled through the head at the end of the cylinder in such a
position relative to the eccentric cam that the hole is uncovered only
during a portion of the compression stroke when the body of air being
compressed in preparation for ejection is sealed off from the intake by
the position of the piston. A valve is provided, which controls the
Outlet
Gas-bollast
line needle-
odjustment
valve
Gas-ballast
air inlet
180° 360° 540°
Amount ot rotation »-
Functional Piston Performancevs
Amount of Rotation
720°
Admission of gas ballast
Compression
harge to atmosphere
Fig. 5-8. Gas ballast arrangement is shown schematically.
flow of atmospheric air entering the pump through the hole from zero
up to about 10 per cent of the displacement of the pump. The arrange-
ment is shown schematically in Fig. 5-8.
Under conditions of gas-ballast flow the exhaust temperature, taken
conveniently as the temperature of the sealing oil in the vicinity of the
exhaust valve, may, for example, be 140°F (60°C), at which temperature
the vapor pressure of water is 150 torr. Thus in order to prevent
condensation when pumping water at a vapor pressure of 10 torr, the
body of vapor cannot be compressed in volume by more than a factor
of about 15/1 without causing condensation. Sufficient air must bebled into the cylinder during the compression stroke to prevent thevolume of gas mixture during e:khaust from being less than 1/15 that ofthe displacement. 2 The exhaust pressure is about 900 torr, determinedby atmospheric pressure plus the load of the valve spring. If the
MECHANICAL VACUUM PUMPS 181
temperature of the vacuum system is 68°F (20°C), the exhaust temper-ature is 140°F (60°C) and dry air is admitted as gas ballast at a flowrate equal to a fraction / of the displacement speed >S^, then from thegeneral gas law (1-9)
where T^ = 273
T^ = 273
F.,
20 = 293° abs
60 = 333° abs
fSi, X 760 _ Fex X 900
293 ~ 333
= 333^93 X 76^00 XfSjj = 0.96 /<S^
(5-2)
(5-3)
For the above example the exhaust volume V^^ must be no less than(l/15)»Sjr„ where Sj) is the initial volume per unit of time of the body of
vapor being pumped. Thus
Fex=^'S^ = 0.96/^^ (5-4)
so that /1
(15)(0.96)0.069 (5-5)
This means that for the assumptions in the above example the gas-
ballast dry air flow must be about 6.9 per cent of the displacement of
the pump in order to prevent condensation when water vapor at 10 torr
vapor pressure is being pumped.The ultimate pressure of a single-stage mechanical vacuum pump is
impaired by the introduction of gas-ballast air because the average gaspressure across the seals between intake and exhaust is greatly in-
creased with a corresponding increase in internal leakage past the seals.
The curve shown in Fig. 5-9 illustrates the performance of a gas-
ballasted Kinney KDH-130 vacuum pump. From these tests it
appears that a single-stage, duplex Kinney pump will blank off" at
approximately 1.0 torr with a full gas-ballast flow and 5 x 10-=* torr
with gas ballast turned off".
Gas ballast is even more attractive for two-stage mechanical vacuumpumps. To prevent condensation in the sealing oil, only the second or
backing stage requires gas ballasting. In the case of the older modelsof Kinney compound pumps the two stages are of equal displacement,so that there is no danger of condensation in the interstage volume.The newer models of Kinney compound pumps, however, have a 3 :
1
displacement ratio so that during full gas-ballast operation of the second
182 VACUUM SCIENCE AND ENGINEERING
120
.^ ^ .*-' /100
80
6 sb alia St off
7V
//
t
/
/
f-
1
/
^60/ L
40
/ 1
1z% ^" t
gas ballast / 5%gc s bollos
20
/-f
1. r0,001 0.01 0.1 1 10 100
Pressure, tcrr
Fig. 5-9. Performance curves for a gas-ballasted Kinney KDH-130 vacuum
pump with zero, 2 per cent, and 5 per cent gas-ballast flow.
stage, some interstage condensation is possible during the early phase
of pumping down a system which has been exposed to humid atmos-
pheric pressure. Since the ultimate pressure at the intake of such a
pump is not sensitively dependent upon the interstage pressure, the
interstage pressure can be raised considerably by gas-ballast air
injection into the second stage without seriously impairing the ultimate
pressure at the intake. A typical gas-ballasted Kinney KC-15 pump
blanks off at 2 x lO^^ torr with the gas-ballast valve open. In Fig.
5-10 are shown the performance curves for a KC-15 Kinney vacuum
pump with zero and full gas-ballast flow (10 per cent of the displacement
speed).
16
14
e 12
10
~1
Gas ballast off\^--'
X
s—^ "/?*
//
/ (/[
//
/
'
J
t
_} ?7 / -/gas ballast / -10% gas ballast
/ 1
0.0001 0.00) 0.01
Pressure, torr
0.1
Fig. 5-10. Performance curves for a KC-15 Kinney vacuum pump with zero,
2 per cent, and 10 per cent gas-ballast flow.
MECHANICAL VACUUM PUMPS 183
A problem of some concern in the application of gas ballast is the
water content of the injected air. Although dry air is obviously
preferred, in most cases it is inconvenient or impractical to use anythingbut regular atmospheric air.
Consider a gas-ballast flow of 10 per cent displacement with air at
78°F and 80 per cent relative humidity. Since saturation water vaporpressure at 78°F is 24 torr, the water vapor partial pressure is about20 torr in the gas-ballast air. The water vapor injected into the pumpwith 10 per cent gas-ballast flow of humid air is thus equal to that
which would be pumped at an inlet vapor pressure of about 2 torr.
Since a dry air gas-ballast flow of 10 per cent would normally permit
pumping water vapor at 10 torr, the use of air at 78°F and 80 per cent
relative humidity would limit satisfactory operation to 8 torr water
vapor pressure, about a 20 per cent reduction in the amount of water
vapor which the pump can handle without condensation in the sealing
oil. For the worst conditions of temperature and humidity likely
to be encountered, the capacity of a gas-ballasted pump for water vaporshould not be decreased to less than about 3^ of its capacity with dry
gas-ballast air. A single-stage mechanical pump with adequate gas-
ballast flow performs with good pumping efficiency with water vaporinlet pressure in the range 5 to 20 torr. However, the pumping effi-
ciency of a single-stage pump with adequate gas-ballast flow is poor at
pressures below 5 torr. For operation with gas ballast in the range
0.02 to 5 torr a compound pump is required for satisfactory pumpingefficiency.
All mechanical vacuum pumps make somewhat more noise when the
pressure is near the ultimate attainable by the pump. The hydraulic
noise due to action of the exhaust valves can be eliminated by opening
the gas-ballast valve slightly without impairing the inlet pressure to the
pump significantly.
5-6. Other Methods of Preventing Contamination by Con-densables. Although gas ballasting is a satisfactory method of
preventing contamination of vacuum-pump sealing oil by conden-
sables in many applications, other methods are more effective in someapplications. One disadvantage of gas ballast is the impairment in
pump performance, especially in the case of single-stage vacuum
'
pumps. Furthermore, gas ballast is particularly applicable to batchoperations in which condensables are pumped for only a brief period
followed by a period of relatively vapor-free operation during which the
pump can rid itself of contamination. However, for continuous pump-ing of saturated vapor, such as water, and in very large installations
other methods, some of which are briefly described below, are moreeffective.
184 VACUUM SCIENCE AND ENGINBEKING
Hot Pump. One of the most obvious methods of preventing con-
densation of a condensable material in any system is to maintain
throughout the system a temperature so high that the saturation vapor
pressure is in excess of the maximum gas pressure. Since the pressure
at the discharge of a mechanical vacuum pump is typically about
900 torr, a temperature throughout the pump and separator tank of
230°F (110°C) is normally sufficient to prevent condensation of water
vapor. At this temperature water vapor should pass through the
pump as if it were a permanent gas.
Kinney has developed a hot-pump installation and has applied it
successfully in a number of large installations. The hot pump is
particularly applicable to large installations involving very long running
periods and saturated water vapor, such as large freeze-drying and
vacuum-cooling installations and water deaeration, and for maintaining
vacuum in power-plant condensers.
The hot-pump installation should consist of a lagged pump and
separator tank with thermostatic control at 230 to 235°F connected to
a drop-out tank, as previously described. An oil of higher viscosity
must be used in place of the standard sealing oil so that the viscosity at
the elevated running temperature will be in the correct range to seal the
pump effectively.
Knox Method of Air Stripping. In some installations a method
consisting of blowing dry air into the discharge pipe between the
exhaust valve and the separator tank has proved to be effective in
preventing contamination. This method was devised by F. A. Knox'
at Oak Ridge during World War II and applied to large Kinney pumps
in the Y-12 plant. The method has been independently discovered by
others, particularly for application to small single-stage pumps where
the Freons are troublesome sealing-oil contaminants. One advantage
of the Knox method over gas ballast is that gas is not introduced into
the pump interior so that the ultimate pressure capability of the pumpis not impaired. For optimum effectiveness the air stream should be
injected just above the exhaust valve assembly.
Oil Purifier Systems. In many large installations involving several
large mechanical vacuum pumps, such as cable vacuum impregnation
'
plants, the use of oil circulating and purification systems has proved to
be advantageous. Oil from the discharge of all the pumps is pumpedthrough a purification system and thence into a reservoir for purified
oil. The sealing oil for all the pumps is supplied directly from this
reservoir, rather than from the separator tanks on the pumps.
Condensers and Vapor Traps. In some installations, particularly
for high-vacuum systems, it is preferable to prevent condensable
materials from passing through the mechanical vacuum pumps. In
MECHANICAL VACUUM PUMPS 185
Chap. 8 the use of refrigerated traps in this connection is discussed in
some detail. When systems of very large volume must occasionally
be let down to atmospheric pressure, the vapor load on condensers andtraps can frequently be greatly reduced by drying the air bled into
the system. Such a precaution can in some installations save hours of
outgassing time in restoring the system to operating pressure after
each letdown to atmospheric pressure.
5-7. Mechanical Booster Pumps. As can be seen from Fig. 5-6,
compound vacuum pumps consisting of two conventional, oil-sealed
pumping units connected in series are generally capable of maintaining
good pumping efficiencies down to pressures of the order of 10"^' torr
and of maintaining limiting pressures of 10~^ torr or lower. However,
in such a two-stage vacuum pump the compression ratio maintained bythe first or high-vacuum stage is very low. Thus the useful work done
by the first-stage unit in pumping the low-pressure gas is very small
indeed, whereas the power required for operation is large because of
the viscous drag of the sealing oil. In spite of doing little useful work,
a conventional, mechanical oil-sealed pump as a high-vacuum stage is
limited to operating at low rotational speeds in part because of the
viscous drag of the sealing oil and in part because of mechanical
limitations.
The net pumping action of a mechanical pump may be considered as
the theoretical pumping speed or displacement speed minus the rate at
which gas migrates back through the pump because of internal leakage
or other causes. If the forward pumping speed is large as compared
with the reverse migration, then the volumetric efficiency will be high
even with a high pressure ratio between outlet and inlet, and the
compression ratio which the pump can maintain at zero fiow (no fiow
into the inlet) will be large.
For operation at or near atmospheric pressure positive displacement
gas compressors of a variety of different types are used successfully
without the use of a sealing oil. Such pumps are built with well-
balanced interleaving rotors and definite clearances between the moving
parts so that operation at high rotational speeds is common practice.
Thus compressors or blowers of this type have high displacement
speed for relatively modest dimensions. In normal use, however, the
pressure ratio against which compressors of this type are required to
pump is small. The loss in pumping speed with increasing pressure
ratio, moreover, is very rapid even in the case of axial flow compressors,
which are designed specifically to extend the range of operation into
the region of higher compression ratios.
To adopt an unsealed, positive displacement compressor for use as a
vacuum pump would seem at first thought unpromising since good
186 VACUUM SCIENCE AND ENGINEEEING
pumping efficiency with a high pressure ratio is a normal requirement
for vacuum service. However, the hmitation on the attainable com-
pression ratio for positive displacement blowers is the reverse flow
called slip due to the pressure difference maintained by the pump.
This reverse-flow rate is given by the pressure difference across the
pump multiplied by the average conductance of the clearance slots
between the internal parts of the blower. As we have seen, gas con-
ductance is proportional to the pressure in the viscous-flow range and
at reduced pressure finally reaches the comparatively low value char-
acteristic of molecular flow. The effectiveness of the positive dis-
placement type of blower in terms of maintaining a high compression
ratio should therefore improve as the outlet pressure is decreased until
the transition pressure range, discussed in Sec. 2-6, is reached. Below
the transition pressure the conductance through the clearance slots
in the pump is constant, and the compression ratio of the pump should
therefore be expected to remain high. As the first-stage unit of a two-
stage vacuum pumping system, a positive displacement blower does
therefore have considerable potentiality.
5-8. Analysis of Mechanical Booster-pump Performance.
The pumping speed of a typical single-stage, oil-sealed vacuum pump
begins to decrease appreciably as the inlet pressure falls below 1 torr.
At this pressure the mean free path for air [see Eq. (2-57)] is
5 X 10~3 cm = 2 X 10-3 j^. Thus for mechanical clearances of several
thousandths of an inch, which are tjrpically maintained in positive
displacement blowers, the maxi-
mum compression ratio is attained
^^^ Pi ^^^ ^.gll within the range for good per-
formance of a single-stage backing
pump.An example of the type of pump
which can be designed and con-
structed to meet these requirements
is that commonly referred to as a
Roots blower, as illustrated in Fig.
5-11. Because of the high rota-
tional speed at which pumps of this
type can be operated, very large dis-
placement speeds can be obtained
in relatively small dimensions.
The operation of such a pump has
been analyzed in some detail by
Van Atta and Sylvester,* Van Atta,^
Ziock,'' and Winzenburger.'
Fig. 5-11. Schematic cross section of
a mechanical booster pump. [Takenwith permission from C. M. Van Atta,
in 1956 Vacuum Symposium Trans-actions (Pergamon Press, London,1957).]
MECHANICAL VACUUM PUMPS 187
In any multistage vacuum pumping system the throughput deter-
mines the pressure at the inlet of each successive stage in accordance
with the continuity equation (2-1) of Chap. 2, which for our present
purpose we shall write as
Q ^nPn const (5-6)
where Q = gas throughput
S^ = pumping speed of any of several stages of pumps arranged
in series
P„ = resulting inlet pressure
This is, in general, true for permanent gas flow as long as the gas which
enters the first-stage unit goes through all stages in series and noadditional gas is admitted, as for example by a leak, between the
stages. Then, in a two-stage pumping system the compression ratio
which the first-stage pump sustains is
Pi S9.(5-7)
Thus, if the first-stage pump is capable of sustaining a high compres-
sion ratio, the second-stage pump may have a correspondingly small
pumping speed, resulting in an overall economy in the size and cost
of the two-stage system.
The net forward pumping speed of a positive displacement booster
pump may be stated as
QOj = Si S,-
Pi(5-8)
where Sj) = displacement speed
Q = flow of gas into the pump at inlet pressure P^
S^ = loss in pumping speed due to internal leakage backward
through the pumpWhen there is no flow into the pump inlet, i.e., when Q = 0, the
inlet pressure reaches the limiting value determined by the internal
leakage parameter and the interstage pressure, i.e., the pressure Pj
maintained at the discharge by a backing pump. Under these con-
ditions of zero net flow the forward pumping capacity of the pumpSjj is completely balanced
Sr S,- (5-9)
by the internal leakage, which is due to two causes
:
1. The flow back through the clearances of the pump due to the
pressure difference (P2 — Pi) maintained by the pumping action. This
188 VACUUM SCIENCE AND ENGINEERING
may properly be referred to as the pump slippage, as a result of which
an amount of gas
Q, = (P, - Po)C, (5-10)
leaks back into the inlet side of the pump from the discharge side
through the clearances. Here P^ respresents the inlet pressure under
conditions of zero flow and C^ is the conductance through the clearances
in the pump mechanism.
2. The reverse pumping action due to the existence in the pumpmechanism of small pockets of gas which get trapped and carried back
from the discharge port to the inlet port. If S^ is the volume per unit
of time of gas at discharge pressure which is thus carried back, the
amount of gas due to this cause which must be again pumped out is
Qr Pj'S'r (5-11)
The combined effect of these two mechanisms accounts for the entire
loss of pumping speed. Thus the quantity of gas which flows back
from the discharge to the inlet because of these two internal processes
is
Qi ^Qs + Qr (5-12)
From Eqs. (5-9) through (5-12) the loss in pumping speed due to this
internal leakage is
o o Qi Qs+Qr^i = ^D =-B- = 5
-^ -^
p — p p
-^0 *
(5-13)
so that the compression ratio K maintained under conditions of zero
flow is
K = Sj) + C,
Po C', + S^(5-14)
In order for the compression ratio to be high, the two quantities in the
denominator must be small, i.e., both the gas conductance C^ through
the clearances of the pump and the reverse pumping speed S^ must besmall.
The above discussion applies to the compressive action of the pumpagainst the forepresssure when no net gas flows into the intake. Nowconsider the result of admitting a gas flow Q, as in Eq. (5-8), whichby reference to Eq. (5-13) becomes
S,Px
a Qi(5-15)
MECHANICAL VACUUM PUMPS 189
since now the inlet pressure is Pj instead of Pj. By combining this
result with Eq. (5-6) we have
Q = P^S, = P.Sr, - Q, = P,S, (5-16)
where S2 is the speed of the backing pump which maintains the fore-
pressure Pj. Since P^ is now the inlet pressure, by analogy withEq. (6-13) we have
Qi __°2 "1
r JL. ^ V
so that (5-16) becomes
PiSn - {P2 - Pi)Os - PA = P,S,
, s, + c, + s^from which P,
The pumping speed at pressure P^ is then
S,
(5-17)
(5-18)
(5-19)
(5-20)
from which it appears that the pumping speed of the mechanical booster
pump is a magnification of that of the backing pump. Moreover,
since from Eqs. (5-14) and (5-19)
Pi (So
Sj, + C, ' K (5-21)
the pumping speed of the first-stage pump is related to its zero-flow
compression ratio in accordance with
S^ Sj, + c.
1
(5-22)
obtained from Eqs. (5-20) and (5-21). Thus if K, the zero-flow com-pression ratio, is very large and therefore both 0^ and S^ are very small,
the pumping speed S-^ is nearly equal to the displacement speed Sj).
By a similar analysis Winzenburger' arrives at an expression slightly
different from (5-21) for the pressure ratio, namely
Pi S.
= T^ +SD Kby considering the reverse flow through the clearances to be of the
nature of gas flow through a nozzle in which the pressure ratio exceeds
190 VACUUM SCIENCE AND ENGINEERING
the critical value. For this case the mass flow is given by
cAP,w
PiS,
T^^ RT^
This assumption appears to be valid for P^ > Pc defined in (5-30), i.e.,
in the region of viscous flow, in which (5-21) reduces to a simflar ex-
pression to that given by Winzenburger. However, for P^ < P^ the
flow through the clearance slots is molecular, and an expression of the
form given in (5-21) is then valid.
In the foregoing discussion the conductance through the clearances
of the pump G, and the reverse pumping speed 8^ due to imperfections
in the rotor contours have been tacitly treated as constants independent
of the pressure. This is true only for limited ranges of the pressure.
In Sec. 2-6, the Knudsen formula for the conductance of a tube of
circular cross section in the transition pressure region is discussed.
By analogy with Eq. (2-39) the conductance of a slot of long, narrow
cross section in the transition pressure region is of the form
C = C„&lPa
KP:C,P^ (5-23)
2-* av
in which Pav is the average pressure through the slot, Co is the low
pressure or molecular-flow conductance of the slot similar to that
given in (2- 102), 6^ and 62 are constants similar to k^ and Ajj used in (2-39),
and Ci is a constant which replaces the constant TrD*ll28rjL of (2-39)
in the case of a slot. The clearance slot, the conductance of which we
wish to represent in general form, is one for which the width is a
minimum at the line of near contact between the rotors or between
rotor and cylinder and increases with the contour of the parts on either
side of this minimum clearance. This slot can be represented by one
of a uniform width equal to the minimum clearance and of a length in
the direction of flow, which depends on the details of the geometry.
The conductance is in any case given by an expression of the general
form of (5-23), although the exact values of the constants Cq and C^
which depend upon the geometry must be determined empirically.
Note that for very small values of the pressure Eq. (5-23) reduces to
1 1
C = Co Pav "< T ' -^av "^ 7~ (5-24)
and that for large values of the pressure (5-23) reduces to the approxi-
mate expression
C — Co T h CjPa61 62
(5-25)
MECHANICAL VACUUM PUMPS 191
in which the first term becomes negligible as compared with the second
when Pav is sufficiently large. Since 61/62 is a quantity somewhat less
than unity as has been shown for the case of a tube in (2-37) and (2-38),
Eq. (5-25) can be written in the form
where
C - Co + C,(^P.. -^)
„ 62 — 61 Co
p-1 av ^ —^
4
62 Ci
(5-26)
(5-27)
in which the constant 4 is arbitrary so far as the consistency in this
step is concerned but is chosen to conform with the definition of the
transition pressure P^ discussed in Sec. 2-6. An approximation to the
conductance of a tube to replace the more exact expression given in
(2-43) leads to an expression like (5-26) in which the transition pressure
is that given in (2-55). Equation (5-26) approximates the true
conductance (5-23), which has the same general form as Eq. (2-43),
shown graphically in Fig. 2-3 by two straight lines, a horizontal
straight line given by (5-24) for Pav < Pt/4 extending the molecular-
fiow value up to the transition pressure and a straight line proportional
to the pressure for the viscous-flow region for Pav > P«/4.
Since by definition the average pressure through the clearance slot
is
Pav = ^^^ (5-28)
then if the operating conditions are such that Pj is very small as com-
pared with P2 the former may be neglected in (5-28) so that
P — —-t av — ^r^ approx
and Eq. (5-26) becomes
C. ~r -^ (P2 p.>4'
(5-29)
(5-30)
in which P^ = Pj/2 will be called the critical pressure.
Several rather gross approximations are made in the transition from
the exact expression (5-23) for the conductance through a slot to the
combination of Eq. (5-24) for Pg < P(/2 and Eq. (5-30) for P2 > Pf/2.
For an analysis of the performance of a mechanical booster type of
vacuum pump, however, these approximations lead to a sufficiently
accurate representation of the conductance through the clearances
192 VACUUM SCIENCE AND ENGINEERING
since in practice Pj (the interstage pressure) is 10 or more times P^
(the inlet pressure) over most of the pressure range of interest.
The low-pressure conductance of a long, narrow slot for air at low
pressure is given by Eq. (2-102) of Chap. 2. For our present purposes
we write this equation in the following form
C, = k— (5-31)
in which the constant k depends upon the units used. The clearance
between the rotors of a Roots type of compressor, however, is not of
uniform width for a clearly defined depth z, but is defined by curved
surfaces. Nevertheless it can be seen that the low-pressure conductance
of such slots will have the form
Co = k^d^ (5-32)
where d is the root mean square of the mechanical clearance between the
rotors or between each rotor and the cylinder wall, and fcj is in part
a geometrical constant averaged over all orientations of the rotors.
What is of main significance is that the low-pressure conductance
varies as the square of the radial clearance d.
As can be seen from Eq. (5-30), for sufficiently high values of the
pressure the conductance through a slot is proportional to the pressure.
Also in the case of a slot the conductance at high pressure is proportional
to the cube of the slot width. Thus it is clear that in Eq. (5-30) as
applied to the conductance through the radial clearances of the pump,Cj must be of the form
Ci = fc^rf* (5-33)
in which k^ is in part a geometrical constant.
Note that in the above discussion no mention is made of conductance
through the clearances at the ends of the rotors. The reason for this
omission is that the flow path \z in Eq. (5-31)] for the end clearances
is very long between flat surfaces. Thus for very adequate endclearances this conductance is negligible as compared with that through
the radial clearances.
The transition pressure Pj has been related to the mean free path arid
diameter in the case of gas flowing through a tube. In Eq. (2-56) it is
seen that at the transition pressure the diameter of the tube D is about11 times the mean free path 1< of the gas molecules. Approximatelythis same factor applies to a slot in which case the width of the slot dat the transition pressure is
d = 12L approx (5-34)
The sharp knee in the approximate conductance curve in (5-30) occurs
MECHANICAL VACUUM PUMPS 193
when the interstage pressure Pg = P(/2 = P^, at which pressure themean free path is twice as long as it is at the pressure P^. Thus at
the value of the pressure Pa at which the sharp break appears in
the approximate conductance curve
d = 62, ^2 = Y = Pc (5-35)
For air at 20°C we have from (2-57) for the mean free path
A = -'(5-36)
where /Ij = 5 x 10-^ cm = 2 x 10~^ in. is the mean free path at P = 1
torr. Thus at the critical pressure P^ the width of the clearance slot
is related to the corresponding mean free path as follows
:
or P =d
(5-37)
in which d is the average rotor clearance.
From the above discussion of the conductance of gas through slots
it can be seen that the conductance through the mechanical clearances
of a positive displacement type of compressor used as a vacuum booster
pump may be represented with reasonable approximation by the fol-
lowing expressions, each applied to its proper pressure range
:
6Ai
TC, k^d^ for P, < (5-38)
and C^ = k^d^ + k^d^(--^) for P, > '-^d
(5-39)
The general form of the pumping speed 8^ of the mechanical booster
pump as a function of the pressure can now be seen from Eq. (5-20).
The fact that C^ is independent of the pressure until the interstage
pressure reaches the transition value and then increases linearly with
the pressure above this value, as given in Eqs. (5-38) and (5-39), is of
fundamental importance. When the gas flow Q is zero and the inter-
stage pressure is at the limiting pressure of the backing pump, that is,
82 = 0, the pumping speed 8-^ of the booster pump will also be zero.
At this point the limiting value Pq of the inlet pressure will be deter-
mined by the zero-flow compression ratio as in Eq. (5-14). Thepumping speed will then rise rapidly as the gas flow and pressure in-
crease, primarily because the pumping speed of the backing pump is
increasing. When the pumping speed of the backing pump reaches its
normal plateau value at an interstage pressure of about 0.1 torr, the
pumping speed of the booster pump will also reach a plateau value.
T194 VACUUM SCIENCE AND ENGINEERING
As the pressure is further increased this plateau value of the pumping
speed will then be maintained until the interstage pressure reaches the
critical value P^, which in practical cases may be in the range 1 to 5'
torr. Above this point the pumping speed is expected to decrease with
increasing pressure, primarily because C„ the internal leakage through
the clearances, is increasing rapidly with the pressure. Thus one
expects a very broad pumping-speed curve which rises from zero at
the ultimate pressure to a flat plateau value and then decreases as the
interstage pressure is increased beyond the critical pressure. If the
zero-flow compression ratio given in Eq. (5-14) is high as compared with
the staging ratio between the displacement of the booster and its backing
pump, the plateau pumping speed should be very nearly equal to the
pumping speed of the backing pump multiplied by the staging ratio.
5-9. Computed Performance Curves for Mechanical Booster
Pumps. By; choosing reasonable values for the parameters C^ and
8^ and knowing the pumping speed of the backing pump as a function
of the pressure, the performance curve of a positive displacement
compressor used as a mechanical booster pump can be computed point
by point from Eq. (5-20). The performance of the first experimental
mechanical booster pump was predicted in this manner and was later
confirmed in its general features by pumping speed measurements.
However, for a more accurate test of the theory and a better
understanding of mechanical booster-pump performance subsequent
calculations of pumping-speed curves have utilized the results of
two preliminary tests designed to measure directly the parameters C,
and K:
1. With the pump rotors at rest but set in turn at equally spaced
positions throughout a complete revolution, the conductance through
the clearances of the pump was determined by admitting a measured
flow of air into the inlet with the forepump in operation and measuring
the pressure at the inlet P^ and that at the interstage P^. By appli-
cation of the conductance formula
Q = C,{P, - P,)
to these observations for a small gas-flow rate and averaging these
results, the low-pressure value Co of the conductance C, through the
clearances was determined.
2. With the booster pump in operation but without any flow into the
inlet the forepressure was varied from the limiting pressure of the
backing pump up to several torr, and the pressures at the inlet and
interstage were measured. The ratio of these pressure readings, K =P2IP1, is the zero-flow compression ratio, which combined with C^ from
MECHANICAL VACUUM PUMPS 195
the preceding test and Eq. (5-14) amounts to a determination of the
parameter S^. In addition, the value of the interstage pressure at
which K begins to decrease as the pressure increases is identified as
the critical pressure P^.
f 14
I 12
^"110
h-i .,
--- --/r" ._.. ._..
J Hj /[ . 1.J
Average = 8.0 cfm
45 90 135 180 225 270 315 360
Angular position of rotors, deg
Fig. 5-12. Curve for obtaining experi-
mental value of conductance through
pump clearances. [Taken with per-
mission from C. M. Van Atta, in 19S6
Vacuum Symposium Transactions
(Pergamon Press, London, 1957).]
o .
70
^~60Q_
B 50
i''°
^ 30<L>
I 20O" 10
10"' 10"^ 10"' 1 10 100
Interstage pressure, torr
Fig. 5-13. Compression -ratio curve
for a mechanical booster pump.[Taken with permission from C. M.Van Atta, in 19S6 Vacuum, Sym,-
posium Transactions (PergamonPress, London, 1957).]
The significant dimensions of the positive displacement type of
mechanical booster pump, on which extensive calculations and tests
were carried out, were as follows
:
Cylinder length: 16 in.
Cylinder bore : 9-M in.
Radial clearances, d : 0.008 in. average
Displacement speed at 1,740 rpm, Sj^: 1,230 cfm
Displacement speed of backing pump: 130 cfm
The results of the measurements on the conductance through the
clearances as described in the first of the two preliminary tests outlined
above are given in Fig. 5-12. From these measurements the average
value of Co = 8 cfm. The dependence of the compression ratio on the
interstage pressure is shown in Fig. 5-13. Although these latter results
show an unanticipated droop in the compression ratio at the lower limit
of the pressure range, an average value for the low-pressure range is
taken to be ii' = 50. These values of Co and K substituted into Eq.
(5-14) yield S^ = 16.8 cfm.
The results of the second test also yield a value for the critical
pressure. Since K begins to decrease sharply at an interstage pres-
sure of 1.5 torr, P^ = 1.5 torr, consistent with a rotor clearance of
0.008 in.
196 VACUUM SCIENCE AND ENGINEERING
The remaining undetermined constant is C^ appearing in Eq. (5-30).
The value of this constant has been arrived at by trial-and-error
fitting of the high-pressure end of the experimental performance curve.
The value chosen by this procedure is Ci = 2.8 cfm/torr.
From these results we have for Eq. (5-30)
C, = 8.0 + 1.4(P2 - 1.5) cfm
1,200
1,000
e 800O
I 600
I 400Q.
200
Mechanical booster pumf own
\,'i"
r \
'
\ \ \ \;;'K
I
\\
\ I V
\I \
>/ \' \
L I\
\
\
/.\ \
\
> \
\ \ \
1 \
V \ ^°
f:\
\ \
\
\V
\ 1
\^ \ \
\ V\
\ \\ i I \
\\1
* \
PI
1>
\
\I
\\
/•
\ \
\ \» \
V 1 .
S \ ^
\
\ V -^\
',Ji
1 k _i..l
s.;^
^^ ^^Backing pump
10" 10-" 10" 10" 10-1 10 100
McLeod gauge pressure, torr
Fig. 5-14. Pumping-speed curve for a mechanical booster pump. [Taken with
permission from C. M. Van Atta, in 1956 Vacuum Symposium Transactions
(Pergamon Press, London, 1957).]
With the numerical values of the above constants measured or
assumed and the pumping speed 8^ of the backing pump as a function
of the interstage pressure Pg known from previous measurements, the
pumping speed S^ of the booster pump as a function of the inlet pressure
Pj can be calculated using Eq. (5-20). Thus we have
8i = -;;; —TT^ S, for Pj < 1.5 torr
1,238 + 1.4(P2 - 1.5)
8^ + 24.8
8,.
8^ + 24.8 + 1.4(P2 - 1.5)
The corresponding value of the inlet pressure is
^2 n
for P, > 1.5 torr
Pi8,
The calculated performance curve for the standard combination of
parameters given above is shown in Fig. 5-14 together with a typical
MECHANICAL VACUUM PUMPS 197
experimental performance curve of the 130-cfm backing pump used.Dotted lines connect points on the booster-pump performance curvewith those on the backing-pump curve from which they were computed.The staging ratio for the standard combination is 1,230 to 130, or
very nearly 10 to 1. The curve plotted in Fig. 5-15 as Case I is arepetition of the computed performance curve shown in Fig. 5-14.
Pressure (McLeod
Fig. 5-15. Pumping-speed curves showing dependence of mechanical booster-pump performance upon the displacement of the backing pump. [Taken withpermission from C. M. Van Atta, in 1956 Vacuum Symposium Transactions(Pergamon Press, London, 1957).]
Case II of Fig. 5-15 is a similarly calculated performance curve illus-
trating the expected effect on booster-pump performance of doublingthe staging ratio, i.e., decreasing the displacement of the backing pumpby a factor of 2 from 130 to 65 cfm. For simplicity it is assumed thatthe pumping speed of the smaller backing pump would be just half thatof the measured value for the standard backing pump at each value of
the pressure.
Conversely, the performance curve shown as Case III in Fig. 5-15
illustrates the expected effect on the booster-pump performance of
decreasing the staging ratio by a factor of 2, that is, by increasing the
displacement of the backing pump from 130 to 260 cfm.
Figure 5-16 illustrates the effect of radial clearances on the perform-ance of the mechanical booster pump. The calculated performance
198 VACUUM SCIENCE AND ENGINEERING
1,000
800
600
400
200
.,, .. CoseE"*
cy' •"
\ ^^/:^ ,„. s
^s
1 // •
' Case I
/ / \, \//
1Cose Rotor s \
// ( 0.008 in.
J 0.004 in.
[ 0.01 6 in.
cking-pump displacement = 1
oster-pumpdisplocement = 1
'''
Case!
I\,
1 i Ro 30cfI ±'.Bo 230cfm
n \
10"^ 10"' 10"-' 10"^ 10
Pressure (Mc Leodl,
100
torr
Fig. 5-16. Pumping-speed curves showing the effect of radial clearances on the
performance of the mechanical booster pump. [Taken with permission from
C. M. Van Atta, in 195(i Vacuum Symposium Transactions (Pergamon Press,
London, 1957).]
curve for Case I with standard clearances of 0.008 in. is shown for
comparison with similar curves calculated for radial clearances of 0.004
in. (Case IV) and of 0.016 in. (Case V). Note that for this latter case
the plateau has disappeared and the pumping-speed curve falls off
rapidly for values of the pressure above and below that at the peak.
The throughput curve for a typical combination consisting of a
10°
,10'
^ 10*
jio^
§•10'
,-<<^'i^^^--'-^ T
,^ Backing pump-KOH-130^y^
///
10° so
10* %
10^
0.001 0.001 0.010 0.100 1.0 10 15 100 1,000
Inlet pressure, torr
Fig. 5-17. Throughput curve for a typical combination consisting of a mechan-ical booster pump of 1,234 cfm displacement speed backed by a roughing pumpof 130 cfm displacement.
MECHANICAL VACUUM PUMPS 199
I
mechanical booster pump of 1,234-cfm displacement speed backed by aroughing pump of 130-cfm displacement speed is shown in Fig. 5-17.
The shaded area where the two curves join represents the changeoverfrom the booster-pump operation to the booster bypass.
5-10. Measured Performance Curves for Mechanical BoosterPumps. The pumping speed at any point in a multistage systemmay be defined in accordance with Eq. (5-6) as
Q_
P.*s«
in which Q is the throughput admitted as a steady flow at the inlet to
the system, and P„ is the resulting pressure at the point of interest.
However, if this definition of pumping speed is to bear any relation-
ship to the analysis of the pumping action given in the previous
sections, the significant pressure at each point in the system where
the pumping speed is to be measured is that due to the gas admitted at
the inlet. Under the usual conditions of test, the pressure of permanent
gas in the system is due to air and the remaining pressure is due to
condensable materials originating, for example, in the backing pump.Since a McLeod gauge measures the pressure due to the permanent gas
and is very little affected by the vapor pressure present under these
circumstances, the pressures used for pumping speed measurements are
McLeod gauge readings. The role of condensable materials back-
streaming from the backing pump is a separate matter and will be
discussed later.
Experimental results for the pumping speed of a 1 ,230-cfm mechanical
booster pump backed by a 130-cfm forepump are shown in circles in
Fig. 5-14. These results compare favorably with the calculated
pumping-speed curve for which the basic parameters are in good
agreement.
Experimental pumping-speed results are also shown as circles in
Fig. 5-15 for the 1,230-cfm booster pump backed by a 220-cfm fore-
pump. These results should correspond fairly closely with the calcu-
lated curve designated as Case III of Fig. 5-15, although the backing
speed is not quite as high as that assumed for the calculated curve.
Comparison between the experimental and calculated pumping speeds
shown in Fig. 5-15 indicates that the theory developed for the
operation of a positive displacement rotary compressor as a vacuumbooster pump is approximately correct. However, examination of the
experimental results reveals minor deviations in behavior from that
predicted.
The greatest and most fundamental deviation from expected perform-
ance is exhibited by the zero-flow compression ratio. From Eq. (5-14)
200 VACUUM SCIENCE AND ENGINEERING
'
it is apparent that the compression ratio should be independent
of the pressure from the lowest attainable pressure up to the point
where the interstage pressure equals the critical value. Above this
point the slippage conductance G^ through the rotor clearance is no
longer constant, but increases linearly with the pressure. Measure-
ments, as shown in Fig. 5-13, show that the compression ratio decreases
as expected as the pressure is increased above the critical value.
However, as the pressure is decreased from the critical value, the com-
pression ratio, instead of remaining constant at its maximum value as
expected, drops off appreciably.
Tests carried out by Dobrowolski^ show a pronounced dependence of
the zero-flow compression ratio of a mechanical booster pump on the
mechanical clearances and surface finish of the rotors. Three booster
pumps of 1,300-cfm displacement speed but with different rotor
clearances and surface finish were tested, all with a 220-cfm backing
pump. The rotor svirface finish in two of the booster pumps was the
standard machined surface whereas the surface in the case of the third
pump was polished (64-microinch finish). The clearances and rotor
surfaces of the three pumps were as follows
:
PumpAverage rotor
clearance, in.
Slippage
conductance (Cg), cfmRotor finish
ABC
0.012
0.008
0.0115
18.2
8.35
16.8
MachinedMachined64-microinch polished
In Fig. 5-18 the measured zero-flow compression ratio is shown as a
function of the interstage pressure for the three pumps. The curves
show the anticipated marked increase in compression ratio with de-
creasing clearances in the high-pressure region above the maximumcompression point. However, for pressures less than that for the
maximum, the compression ratio falls off rapidly with decreasing
pressure for pumps A and B, but much less rapidly for pump C. The
ratio of low pressure to maximum compression ratios is 0.27 for pumpA, 0.21 for B, and 0.67 for C. The very marked improvement in low-'
pressure compression ratio due to improved surface finish largely
explains the discrepancy between the theoretically predicted perform-
ance curves and the measured curves. The zero-flow compression
ratio at low pressure is theoretically expected to be independent of the
pressure. When the rotor surfaces are rough they may be expected to
carry gas back from the high-pressure outlet side of the pump to the low-
pressure inlet side in the form of adsorbed gas. The dependence of this
effect upon pressure cannot be predicted except that outgassing effects
MECHANICAL VACUUM PUMPS 201
generally are known to be steep functions of the pressure and to be muchmore pronounced for rough than for polished surfaces. Since pump Cin the above tests had large rotor clearances, the zero-flow compression
ratio at high pressure is poor. Even so, its compression ratio at low
pressure is much better owing to the polished surfaces than either pumpA, with about equal clearances, or pump B, with smaller clearances
but with the standard rough machined rotor surfaces.
80
60
40
^ 20
ys ee Fig. 5 -13-^
/ \\
=^i^ F^ s.
\^^>'^A
^^^—10" 10' 10" 10" 10 10'
Interstage pressure, torr
Fig. 5-18. Zero-flow compression ratio as a function of rotor clearances and
surface finish.
The pumping-speed curves also show a minor deviation from the
expected shape. The predicted pumping-speed curve rises very
sharply from zero for values of the pressure slightly in excess of the
ultimate value for zero flow. Although accurate measurements on the
steep part of the performance curve are difficult, the results indicate that
the rise in pumping speed with increasing pressure above the ultimate
value is not as steep as predicted. Furthermore, the experimental
results shown as circles in Fig. 5-14 are not quite as good a confirmation
of the predicted performance as first appears. The effect of the drop
in compression ratio in the low-pressure range on the pumping speed
was partly compensated by the fact that the performance of the
particular 130-cfm backing pump used in the tests was somewhat
better at low pressures than had been assumed for the calculations.
The minor differences between the observed and predicted perform-
ance noted above can best be explained by assuming that the reverse
pumping parameter, by which some gas at outlet pressure is carried
back to the inlet side of the pump, is not a constant but increases as
the inlet pressure decreases. Experimental study of this effect has
demonstrated that the reverse pumping action is partly due to an
outgassing process, that of alternating absorption and reemission of gas
202 VACUUM SCIENCE AND ENGINEERING
by the inner surfaces of the pump, which are alternately exposed to the
interstage and to the inlet pressure.
5-11. Overheating of Mechanical Booster-pump Rotors.
Compression of a gas in the process of pumping, as occurs in all me-
chanical vacuum pumps, involves doing work on the gas. Unless there
is some process by which heat can flow easily from the gas to a heat
sink, the temperature of the gas increases. In the case of mechanical
roughing pumps, oil is circulated with the gas stream and the exhaust
gas bubbles through oil in the reservoir. The result is that heat is
removed from the gas and rather efficiently distributed throughout the
pump. Because of this process, cooling the pump as a whole dissipates
the heat satisfactorily. Thus small roughing pumps are cooled by air
convection and large roughing pumps by water circulated through
portions of the pump housing. However, in the case of mechanical
booster pumps there is no oil present for distributing the heat generated
throughout the pump structure. Furthermore, the rotors are not in
immediate contact (except indirectly out through the shafts to the
bearings) with the pump housing and therefore tend to overheat when
the pressure difference across the pump is too great. As is pointed out
by Noller^ the power required for pumping the gas is
W = SniP, - Pi) (5-40)
in which Sjy is the displacement speed of the booster pump. From the
continuity equation (5-6)
PA = €P,S„ = PA (5-41)
where S-^ and S2 are the pumping speeds respectively of the booster
pump and its backing pump, and e = S^ISj^ is the volumetric efficiency
of the booster pump. Combining these two equations yields
W = S'^'ik~^)
(5-42)
From this equation there are obviously two ways of limiting the power
requirements of the booster pump: (1) The upper value of the inlet
pressure P^ during operation can be limited to some maximum value riot
to be exceeded in operation ; or (2) the pumping speed S^ of the backing
pump may be increased as needed to tolerate a larger value of the
pressure. In practice either remedy is applied, depending upon the
requirements of the system.
In the pressure range below 1 torr the power requirements of mechan-ical booster pumps is determined almost entirely by the frictional
characteristics (shaft seals, bearings, gears, etc.). However, at 10 torr
the power required for pumping has become significant. For example.
MECHANICAL VACUUM PUMPS 203
in the case of the pump, the test results of which are given in detail in
Sec. 5-9, the pumping power as computed from (5-42) with Sjj = 1,230
cfm. Si = 690 cfm, S2 = HO cfm at an inlet pressure P^ = 10 torr
turns out to be IT = 4,080 watts = 5.47 hp, which is in good agreement
with the measured power input. For this pump operating at an inlet
pressure of 10 torr, about 4 kW is therefore put into the gas fiow. Aportion of this power is dissipated in the pump rotors which heat up
and expand. If the pump is operated at inlet pressure above 10 torr
for an extended period, the expansion of the rotors exceeds the available
end clearances and the pump will
seize.
Two remedies have been applied
to extend the range of operation
of mechanical booster pumps to
higher pressure. Thees^" describes
a design of booster pump in
which the rotors are cooled by oil
circulated through hollow shafts.
He also describes the use of an
interstage cooler at the outlet of
the mechanical booster pump to
cool the exhaust gas and therefore
indirectly the rotors. Figure 5-19
illustrates the arrangement of an
exhaust cooler used in systems for vacuum melting of steel and similar
installations in which the operating pressure is high.
Because of the limit on pressure differential imposed by the expan-
sion of the rotors due to overheating, mechanical booster-pump
installations frequently include a pressure-sensitive switch set to operate
at 10 to 50 torr, depending upon the characteristics of the particular
booster and backing-pump combination. At pressures greater than the
set value the pressure switch holds a valve in a bypass connection open
so that the gas flows directly into the backing pump from the system
and the booster-pump power is turned off. When the pressure becomes
less than the set value, the pressure switch closes the bypass valve and
starts the booster pump. A system so equipped, when started from
atmospheric pressure, will pump down initially through the bypass
with only the backing pump in operation and will then switch over to
pump as a two-stage system as soon as the pressure passes through the
selected switch-over value. Figure 5-20 illustrates such a two-stage
system with the bypass connection around the mechanical booster
pump. Manual operation of the bypass valve is an obvious alternative
which is entirely suitable for some installations.
Fig. 5-19. Exhaust gas cooler in-
stalled at discharge port of mechanical
booster pump. [Taken with per-
mission from R. Thees, Vacuum V, 25
(1955).]
204 VACUUM SCIENCE AND ENGINEERING
Fig. 5-20. Mechanical booster pump, backing pump, and bypass connection.
5-12. Vapor Compressor Action of a Mechanical BoosterPump. As was emphasized in the discussion of the pumping-speedcurves, the pressure measured and referred to throughout in this
connection is the partial pressure of the permanent gas which is admittedin controlled and measured amounts at the inlet of the pump. This
procedure is justified on the grounds that only in terms of the pressures
at various points in the system of the gas admitted as a measured flow
at the inlet can one hope to understand the performance of a multistage
system. The condensable vapors present are generally progressing
backward through the system and therefore have nothing directly to
do with the processes by which the permanent gases are pumped.The behavior of condensable vapors originating from the sealing oil
used in the backing pump, however, is determined directly by the zero-
flow compression ratio. Since the mechanical booster pump itself canbe clean and free of sources of volatile materials, the condensablevapors of concern are those incident on the interstage side of the boosterpump. Therefore the vapor pressure on the high-vacuum side of thebooster pump will be that in the interstage region due to backstreamingfrom the forepump divided by the zero-flow compression ratio of thebooster pump.
MECHANICAL VACUUM PUMPS 205
Observations made on the performance of a mechanical booster
pump are consistent with this expectation. lonization-gauge readings
at the inlet of the two-stage system consisting of a 1,230-cfm booster
pump backed by a 130-cfm single-stage backing pump show limiting
plate currents corresponding to a pressure of 5 x 10"* torr on an air
calibration. A very small two-stage mechanical booster pump of only
30-cfm displacement backed by a conventional compound forepump
produced McLeod gauge readings of 1 X IQ-" torr or lower and un-
trapped ionization-gauge readings corresponding to 8 x 10~^ torr. Since
the true calibration of the ionization gauge for the vapor concerned is
not known, it can only be concluded that the true total pressure is
considerably below the latter value.
Another observation of interest is that the limiting pressure indicated
by an ionization gauge in a system evacuated by a mechanical booster
pump is not changed by putting dry ice in a trap situated between the
booster pump and the gauge tube. However, substituting liquid
nitrogen for dry ice in the trap results in the ionization-gauge reading
dropping to the pressure indicated by a McLeod gauge. This obser-
vation demonstrates that the vapor compression action of the mechan-
ical booster pump is such as to decrease the vapor pressure in the system
due to backstreaming from the forepump below that corresponding to
the equilibrium at dry ice temperature. Noller' confirms that the
vapor pressure "is 1 or 2 powers often lower behind the blower than it is
in front of it."
5-13. Molecular-drag Pumps. In 1912 Gaede^^ introduced a
type of mechanical pump which does not operate on the positive
displacement principle but upon the principle of im-
parting momentum to gas molecules preferentially
in the direction of the desired flow. In the molec-
ular-drag pump there is an open passage from the
inlet to the outlet, between which a pressure difl'er-
ential is maintained by the high-velocity motion of
one side of the passage relative to the housing of
the pump in which the inlet and outlet are located.
In Fig. 5-21 the principle of the molecular-drag
pump is illustrated. A cylindrical member rotates
within a casing with a radial clearance h between
them. At the top of the cylinder the clearance space
is blocked by a projection of the cylinder wall which reduces the clearance
locally to essentially zero. At either side of the projection the clearance
passage opens into a closed volume. If there are no leaks in the system
the total amount of gas in the system remains constant, but some gas is
shifted by the motion of the rotor with a reduction of the pressure Pj
Fig. 5-21. Prin-
ciple of the molec-
ular-drag pump.
206 VACUUM SCIENCE AND ENGINEERING
y//////////////A^7>my//.
and increase in the pressure P^. The equiUbrium relationship between
P^ and Pa depends upon the rotational velocity of the rotor and upon
the pressure regime in which the pump is operating, i.e., whether
viscous or molecular flow is involved in the process.
If the average pressure Pav = (Pi + P-Sl"^ is large enough so that
the mean free path of the gas molecules A < A, then the process is
dominated by viscous behavior. Assuming that the layer of gas at
each surface is at rest with or moving with the surface, then the gas in
contact with the outer cylinder is at rest and that in contact with the
rotor is moving with the peripheral speed rw, in which r is the radius
and w is the rotational speed in
radians per second. If A < r, the
curvature of the annular space can
be ignored and the problem re-
duced to that oftwo plane surfaces
separated by a distance A, with
the upper surface moving with
respect to the lower surface with
velocity v = rio, as illustrated in
Fig. 5-22. The peripheral dis-
tance between the inlet and outlet in Fig. 5-21 is L, which is the length
ofthelower or stationary plate in Fig. 5-22 in the plane case.
Following a procedure analogous to that in Sec. 2-3, the gas contained
in a thin layer of thickness by at height y above the stationary plate,
and of length bx in the direction of the motion, experiences a force
opposite to the direction of motion of the upper plate given by the cross-
sectional area w by, where w is the width of the plates perpendicular
to the plane of the figure, multiplied by the pressure difference bP
which occurs in the distance bx, so that
Fig. 5-22. Plane representation of the
molecular-drag pump.
F =wbP by (5-43)
At equilibrium this force is balanced by the difference between the
viscous forces from the gas above and below the thin layer under
consideration. The component of viscous force from the gas below
the layer can be written by reference to the definition of viscosity given
in (1-54) as
F, = -.,^s'^=-yjwbx[^^^ (5-44)dy
in which u is the velocity of the gas in the sample layer, since the area
S = w bx. The negative sign arises since the gas below the sample
layer is moving more slowly and therefore retards its motion. The
MECHANICAL VACUUM PUMPS
viscous force from the gas above the sample layer is
F
207
(du\TjW 0X1—-I
\dy/y+dy
= rjW bx-—\udu
dy ^y) (5-45)
Equilibrium will occur when the force due to the pressure difference
given in (5-43) balances the sum of the viscous forces in (5-44) and(5-45), so that
IV bP by^F, + F,
which yields
riw bx —— bydy^
d^v __ 1 bP
dy^ 7} dx
the solution of which is of the form
u = Ay^ + By + C
(5-46)
(5-47)
(5-48)
By differentiating (5-48) twice and comparing the result with (5-47),
one finds that
2rj bx(5-49)
Since the gas in contact with the lower plate is at rest, m = at y == 0,
so that the constant C = 0. Also, since the gas in contact with the
upper plate moves with its velocity v, u = v at y == Ji. Putting these
conditions into (5-48), the result is
1 bP
2,7] bxh^ Bh
so that BV 1 ^-P,
h 2rj bx
(5-50)
(5-51)
Substituting the above values for A, B, and C into (5-48) gives for the
velocity distribution
1 ^P /v I bPir^y h 2r] bx
h y (5-52)2r] bx
which is a parabolic form.
The net volume flow of gas from the region at the pressure Pi to
that at Pj is given by integrating the flow from y = to y = h. Since
208 VACUUM SCIENCE AND ENGINEERING
the volume flow in the layer of thickness by at the level y is wii by, the
total flow is
dV'dt v=o
wu by
Jy=0= W
Jy=i
wvh~^ Ur] bx
1 bP ^
y.2rj bx
w bP
\h 2ri bx / .
dy
h^ (5-53)
Under equilibrium conditions the pressure difference (Pj - -Pi) has
such a value that the net flow is zero. Thus from (5-53)
wvh w bP~2~ ~
12r] bx
so that bPQrjV bx
h^
(5-54)
(5-55)
If the length of the channel is L, then by integrating (5-55) one obtains
the pressure difference
f^^ 6-nv f
^
QrjvL
bx
h^
(5-56)
since the viscosity is independent of the pressure. The molecular-drag
pump operating in the regime of viscous flow is thus expected to
maintain a pressure difference between inlet and outlet under conditions
of zero flow which is directly proportional to the peripheral velocity and
the length of channel between inlet and outlet and inversely propor-
tional to the square of the channel depth. In order for this pressure
difference to give rise to a large compression ratio P2IP1, it is necessary
that P2 not be much larger than the pressure difference (P^ - Pi)-
Consider a pump in which the clearance between the outer and
inner cylinders is h = 0.2 in. = 0.5 cm, r = 4 in. = 10 cm; the
rotational speed is 10,000 rpm, so that w = 1.04 x 10^ radians/sec
and V = rm = 1.04 x 10^ cm/sec. Since for air at 20°C rj = 1.83 x 10"*
poise, the expected pressure difference is
^1 =X 1.83 X 10-* X 1.04 X 10* X 50
0.25
2.28 X 103 X 750 X 10-«
= 2.28 X 10^ /xbar
1.71 torr
assuming a distance of 50 cm between inlet and outlet ports m the
MECHANICAL VACUUM PUMPS 209
cylinder. The compression ratio P2IP1 for the pump described above
would not become large, therefore, unless the outlet pressure were only
slightly greater than 1.71 torr. The simple molecular-drag pump here
described is therefore effective only as the first stage of a two-stage
system in which the interstage pressure is fairly low. By decreasing
the depth of the pumping channel h, the pressure difference maintained
by the pump in the viscous-flow regime, and therefore also the backing
pressure required for a large compression ratio, can be substantially
increased since the pressure diff'erence depends inversely on h^.
If the molecular-drag pump is backed by a pump which maintains
the interstage pressure P^ at such a low value that the mean free path
of the gas molecules is long compared with the dimension h of the
pumping channel, viscosity no longer plays a role and the relationship
(5-56) between the inlet and outlet pressures no longer holds. In this
regime the gas molecules collide alternately with the stationary and
moving surface. Consider the flow across an element of length bx
of the channel. 12 Each molecule which strikes the moving surface of
area w bx receives drift velocity equal to v, the velocity of that surface.
Each molecule which strikes a stationary surface, either opposite to
the moving surface or at the two sides of the channel, receives a
zero-drift velocity. The resulting average drift velocity is the velocity
of the moving surface times the ratio of the area of this surface to the
total surface of the channel element of length bx,
wv" 2(w + h)
The flow due to this drift motion is
(5-57)
Qa ^^-^^^^
= 5X 10-«P-
IV%V
2{w + h)
w%vh
torr cm^/s^c
torr liters/sec (5-58)
If a pressure difference bP is produced by the above pumping action,
a flow will occur in the opposite direction because of this pressure
difference through the conductance of the channel. The counterflow
is given by
34.4/ T\'^ w%2 ^p
2{w + h) bx
9 71 — torr liters/ sec (5-o9)
\M/ w + h bx
210 VACUUM SCIENCE AND ENGINEERING
by reference to (2-79) and (2-80). Under equilibrium conditions with
no flow into the system Q^ = Q^, so that
9-^1 hr7 7— = 5\MJ w + h dx
10* Pw%vw
ordP _5x lO-^i^V
~P~~
9.71 \t} hdx (5-60)
Integrating this expression from P = P^ to P = P^ and x = to
X = L, the result is
InP,vL
\nP^=k—h
or
where
PP
kT~\t)
5 X 10-
(5-61)
(5-62)
Thus if the pressure P^, is sufficiently low that the flow is molecular,
the compression ratio maintained by the simple molecular pumpdescribed above is independent of the pressure and depends exponen-tially on the quantity vLjh, which is made up of the parameters of the
pump.For air at 20°C the constant (T/Jf)'^ = 3.181
kio-« 1
9.71
so that (5-61) then becomes
P
(3.181)1,62 X 10-5
Y =exp(l.62 X 10-s^j
(5-63)
(5-64)
Taking as an example the same values for v, L, and h as before for the
parameters of a pump,
vL _ 1.04 X 10* X 50
T ^(15
1.04 X 10"
so that the compression ratio for air should be
P2/P1 == exp (1.62 X 10-5 X 1.04 x lO")
= exp (16.8) = lO'-^"
which is surprisingly large.
MECHANICAL VACUUM PUMPS 211
From the foregoing calculation the zero-flow compression ratio for
a simple molecular-drag pump is predicted to be so very large whenoperating in the molecular-flow regime that the limitation in a real
pump is due to factors not specifically considered. In the simple
pump described, leakage from the outlet region back into the inlet
through the clearances at the ends of the rotor and the imperfect
sealing between the rotor and cylin-
der, where the radial clearance is
assumed to be zero, would prevent
the attainment of the theoretically
predicted compression ratio. Even
so, Gaede reports and Dushman^^
confirms compression ratios of the
order of 10^ attained by a multistage
molecular pump based upon the prin-
ciple of the simple design described
above.
A number of alternative designs
for molecular-drag pumps have been
devised with two considerations in
mind. The first is to ensure a low
conductance leakage path from out-
let to inlet through the running clear-
ances of the pump. The second is
to vary the depth of the pumping
channel to provide a decreasing
channel depth as the gas is com-
pressed so that the cross section of
the channel at the inlet of the pumpwill be as large as possible to ensure
good pumping speed, but still to
ensure that this depth will be small
relative to the molecular mean free path over as much of the com-
pression range of the pump as possible. In Fig. 5-23 is shown a cross
section of a design due to S. Siegbahn^* in which pumping channels
in the form of Archimedes' spirals are cut in the two flat sides of the
housing, within which a disk rotates at high rotational velocity. The
clearance between the disk surface and the flat section of the end
plate between the adjacent spirals is made as small as practicable for
free rotation. The inlet is at the periphery of the disk and the dis-
charge at the hub. In the unit shown, three spiral grooves are cut
in parallel, starting 120° apart, providing three times the pumping
speed of a single channel.
Fig. 5-23. Cross section of molecu-
lar-drag pump design due to S.
Siegbahn with pumping channels in
the form of Archimedes' spirals cut
in the two flat sides. [Taken with
permission from S. Von Friesen,
Rev. Sci. Instr. 11, 362 (1940).]
212 VACUUM SCIENCE AND ENGINEEEING
Fig. 5-24. Molecular pump of Williams and Beams. Rotor is suspended magnet-ically and driven by induction. [Taken with permission from C. E. Williams andJ. W. Beams, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962).]
Because the computed compression ratio for a pump of this descrip-
tion is tremendous when the internal leakage is ignored, the pump acts
as though it has a forward pumping speed which is independent of the
pressure shunted at intervals of pressure between Pj and Pj t>y leakage
conductances. Examination of this model leads to the conclusion that
the zero-flow compression ratio should have the form
- = exp ^'iri (5-65)
in which w is the rotational velocity, A; is a constant for the particular
pump design, and a is the clearance between the rotating disk and the
end plates through which the internal leakage flows. In comparingthis expression with (5-64) it must be realized that a in this expression
represents the internal leakage clearance, whereas the h in (5-64)
corresponds to the depth of the pumping channel.
The pumping speed of a pump of this description with disk diameterof 54 cm is reported by Eklund^^ to be as high as 80 liters/sec at 8,300rpm and to increase proportionally with the rotational speed. The inlet
pressure P^ was reported by Eklund to depend upon the forepressure
MECHANICAL VACUUM PUMPS 213
Pj according to
Pi cP,
where Pq was the lowest pressure attainable and c is a constant of the
order of 10^^.
The performance of a pump somewhat analogous to that of Siegbahn
(see Fig. 5-24) is described by Beams.^^ The rotor in this case is
suspended magnetically and driven by induction through the vacuumwall, eliminating the problems of shaft seal and material bearings.
Peripheral speeds of the order of 1.4 x 10* cm/sec, which is about
one-third Vav for air molecules at room temperature, are typical for the
preliminary model tested." Since the unit is completely sealed and is
Ijacked by an oil diffusion pump with a liquid-nitrogen-cooled trap,
the forepressure can be very low. A composite curve of the observed
compression ratio P2/P1 for various values of the forepressure Pg and
the rotational speed is shown in Fig. 5-25.1^ A theoretical curve for the
compression ratio as a function of rotational speed is shown for com-
parison. It is evident that P2/P1 departs further from the theoretically
predicted value as the forepressure Pg is decreased, indicating the
influence of outgassing from surfaces at the lower values of Pj attained
during the test. As an example, with a forepressure of 4 x 10"' torr
the untrapped ionization-gauge reading at the inlet was 2 X 10"* torr,
yielding a compression ratio of only 200 compared with the predicted
value of nearly 3,000 for 01/277 equal to 225 rps. Results of these tests,
10-^
10
P310-
olxlO'^torr / ,--©'
A 6x10"^ / ,-'-' 1.2x10
-''
s 4x10-^
X6xl0"^
y:° ,-'-^9'xio>^Theoretical
mass 30 y^'^^'\,''^''^^^^y^<''5<'^^ 4«10-'"
X^?-: ^^^^
- jk:> Theoretical moss 8
/^'^y^
/•1 1 . 1 . 1 1
100 200 300 400
27r
Fig. 5-25. Composite curve of observed compression ratio for various values of
the forepressure and the rotational speed. [Taken with permission from C. E.
Williams and J. W. Beams, in ld6l Vacuum Symposium, Transactions (PergamonPress, London, 1962).]
214 VACUUM SCIENCE AND ENGINEERING
including variation of the rotational speed and of the forepressure,
indicate that the zero-flow compression ratio is only in very rough
agreement with (5-65), although the deviations may be due entirely to
outgassing.
Some advantages claimed for the molecular-drag pump are freedom
from contamination by condensable vapors, high compression ratios,
and short startup time. One additional feature which is useful in someapplications is a higher pumping speed for gases of high molecular
weight, which is the inverse of the performance of diffusion pumps.One obvious disadvantage is the low pumping speed, considering the
size and complexity of the device. There is also a very real hazard
associated with rotational speeds of 10^ rpm and more, which are
required to ensure good performance. Although molecular-drag pumpshave proved to be effective in certain special applications, particularly
in Europe, they have not been widely used in the United States, either
for industrial or for scientific applications.
5-14. Axial-flow Molecular Turbine Pump. Brief mention
must be made of a type of molecular pump introduced in 1958 byA. Pfeiffer, GmbH, of Wetzlar, German Federal Republic, which maybe described as an axial-flow molecular turbine pump.^' Figure 5-26
shows the general arrangement of
the pump, and Fig. 5-27 illustrates
the details of the design. Rotating
disks all mounted on the central
shaft are disposed alternately with
stationary plates mounted in the
housing. The disks and plates are
cut with slots set at an angle so
that gas molecules caught in the
slots of the moving disk are pro-
jected preferentially in the direc-
tion of the slots in the stationary
plates. The running clearances be-
tween the rotating and stationary
plates generally are of the order of
1 mm, which is an order of magnitude greater than the permissible
clearances in a conventional type of molecular pump. The rotational
speed for a pump having a rotor diameter of about 17 cm is 16,000
rpm, giving a peripheral speed of 1.56 x 10* cm/sec, about one-third
Wav for air molecules at room temperature.
The observed dependence of the inlet pressure P^ on the outlet
pressure P^ is shown graphically in Fig. 5-28 for hydrogen, air, and therefrigerant Freon-12. A compression ratio P2/P1 of the order of 10'
Fig. 5-26. General arrangement of
the axial-flow molecular turbine
pump. [Taken with permission fromWilli Becker, Vakuum-Technik 7, 149
(1958).]
MECHANICAL VACUUM PUMPS 215
is obtained for air when Pj is equal to 0.1 torr, but the value drops off
rapidly with increasing pressure to about 10 when Pj is equal to 1 torr.
The compression ratio for hydrogen is significantly smaller for the sameoutlet pressure.
Fig. 5-27. De-
tails of the rotor
and stator plates
of the molecular
turbine pump.[Taken with per-
mission fromWilli Becker,
Vakuum-Technik7, 149 (1958).]
io''i 1 nil 1 nil 1III
1 nil: = : 1
10-2:=: = = .1 J = =
'-'-'- ==^ ?=::::10"' - 3 -
-^H ;=:|-:10-^::=
-J =4 =:--^^--
'---izl:Kf'-^' : = -. == :== =
--
° 10-' = -: :--: -. 1— - = :
- = = :: = = :=:;:= = ::
10-'::;;:=: .!_.-- '--
l-\zz-.10-8=-:: = -= t-.: -=-.
' hxi 1 •eoi-2]
io-'::;i:Z:;;|=;;:=:
^,o~~V" ::::::r'° A .1
10-' 10'^ I0-' 1 10
P2,torr
Fig. 5-28. Observed de-
pendence of inlet pres-
sure on outlet pressure
for hydrogen, air, andthe refrigerant Freon-12
for the molecular tur-
bine pump. [Taken
with permission fromWilli Becker, Vakuum-Technik 7, 149 (1958).]
The pumping speed of the molecular turbine pump as a function of
the inlet pressure P^ is shown in Fig. 5-29 for the same three gases.
The pumping speed characteristic of the forepump used in these tests is
not given in the paper so that the relationship between the curves in
these two graphs is not clear.
The pumping characteristics of an axial-flow, bladed turbine pumphave been investigated theoretically and experimentally by Kruger^"
and by Kruger and Shapiro. ^^ A portion of the vane structure of a
rotor of the type used in the high-vacuum turbine pump is shown in
Fig. 5-30, illustrating the probability of transmission of molecules
216 VACUUM SCIENCE AND ENGINEERING
700
600
500
400
300
200
100
Ha
Au.
Freon-12
I10-' 10"^ 10"' IQ-" 10"^
P,, torr
10"^ 10- 10-
FiG. 5-29. Pumping speed of the molecular turbine pump as a function of the
inlet pressure for hydrogen, air, and Freon-12. [Taken with permission from
Willi Becker, Vakuum-Technik 7, 149 (1958).]
through the rotor blade for the case in which the blade speed is large as
compared with molecular speed (a) when the molecules are incident
from upstream (side 1), and (6) when they are incident from downstream
(side 2). The difference between these probabilities, S12 and S21.
determines the net pumping speed. If we designate by H (the Hocoefficient) the ratio of the net molecular flow through the rotor to the
^Molecules incident
from side (T)
Fig. 5-30. Probability of transmission of molecules through the rotor blade of anaxial-flow turbine pump for the case in which the blade speed is large as comparedwith molecular speed, {a) Molecules incident from upstream; (b) molecules
incident from downstream. [Taken with permission from C. H. Krugor and A.
H. Shapiro, in 1960 Vacuum Symposium Transactions (Pergamon Press, London,1961).]
MECHANICAL VACUUM PUMPS 217
molecular flux v^ incident on the area A of the rotor blade from up-
stream, then the net flow in molecules per second is
Q = HAvy = Avj:^^ - J-VaSai
where v^ is the molecular flux incident from downstream,
the temperature is the same on both sides of the rotor,
"1 «i ^1
(5-66)
However, if
(5-67)
from Eqs. (1-31) and (1-16), where n^ and n^ are the molecular densities
and Pi and Pj the pressures respectively upstream and downstream.
Then from (5-66) and (5-67), the compression ratio is given by
^1 ^21(5-68)
and the zero-When the flow through the pump is zero then Hv^
flow compression ratio is
J) =^ (5-69)vPi/e=o 2.21
It is also evident that the compression ratio across the rotor blade
should decrease linearly as the flow Hv^ is increased. This prediction
has been confirmed experimentally by Kruger and Shapiro. ^^ Also
from (5-68) it appears that for no pressure rise across the blade, Pj = Pi,
the net flow through the rotor blade is
Qi (S12 — ^2\)A (5-70)
In order for the compression ratio to be high it is important that Sia
be large compared with Hji. However, for the pumping speed
[8 = QjP) to be large it is necessary for S12 to be large in an absolute
sense.
According to Kruger and Shapiro, ^^ in the design of a multistage
pump of the axial-flow turbine type it is possible to design the blades
of the first few rotors for large pumping speed and low compression
ratio and later stages increasingly for high compression ratio and low
pumping speed. The increase in pressure toward later stages permits a
lower pumping speed to accommodate the flow. By carrying out a series
of Monte Carlo calculations of the motion of individual molecules
through rotor blades, Kruger20 has determined the compression ratio
and pumping speed for rotors with various values of the pitch angle,
spacing, and length of the blades. To be effective the velocity of the
rotor blades must be two or three times the quantity (27^T)'^, but
increasing the blade velocity beyond this value does not result in a
218 VACUUM SCIENCE AND ENGINEERING
significant gain in performance. Although variation of the pitch
angle varies the zero-flow compression ratio and pumping speed, a
pitch angle of 20° appears to be a good compromise for many applica-
tions. Since a compression ratio per stage of about 5 can be achieved,
a pump having 9 stages should maintain a zero-flow compression ratio
of the order of 5" <=« 2 x 10''. The pumping speed of a well-designed
axial-flow turbine pump is comparable with that of a diffusion pumpof the same diameter but has the advantage of being free of hydro-
carbon vapors. The disadvantages of the axial-flow turbine pump are
(1) the hazard of very high rotational speeds, (2) the comparatively
great weight for the pumping speed, and (3) the very high cost in terms
of dollars per liter per second.
REFERENCES
1. W. Gaede, Z. Naturforsch. 2A, 233 (1947).
2. B. D. Power and R. A. Kenna, Vacuum V, 35 (1955).
3. F. A. Knox, U.S. Patent No. 2,551,541, May 1, 1951. NSA 5, No. 3578.
4. C. M. Van Atta and R. L. Sylvester, in Proceedings of the Vacuum MetallurgySymposium of the Electrochemical Society, Boston, Mass. (Electrochemical
Society, Inc., 1955), p. 86.
5. C. M. Van Atta, in 1956 Vacuum, Symposiwm Transactions (Pergamon Press,
London, 1957), pp. 62-70.
6. K. Ziock, Vakuum-Technick (Rudolph A. Long Verlag, Berlin, 1957).
7. E. A. Winzenburger, in 1957 Vacuum Symposium Transactions (PergamonPress, London, 1958), pp. 1-5.
8. Z. C. Dobrowolski, Lab. Rep. No. 2290, Kinney Vacuum Division, The NewYork Air Brake Company, Dec. 20, 1961.
9. H. G. Noller, in 1956 Vacuum Symposium Transactions (Pergamon Press,
London, 1957), pp. 57-61.
10. R. Thees, Vacuum V, 25 (1955).
11. W. Gaede, Ann. Physik 41, 337 (1913).
12. Robert B. Jacobs, J. Appl. Phys. 22, 217 (1951).
13. Saul Dushman, Phys. Rev. 5, 224 (1915).
14. S. Von Friesen, Rev. Sci. Instr. 11, 362 (1940).15. S. Eklund, Arch. Math. Astron. Phys. (Roy. Swed. Acad.) 27A, No. 21 (1940),
and 29A, No. 4 (1942).
16. J. W. Beams, Science 130, 1406 (1959).
17. C. E. Williams and J. W. Beams, Bull. Am. Phys. Soc. Ser. II 5, 286 (1960)'.
18. C. E. Williams and J. W. Beams, in 1961 Vacuum Symposium Transactions(Pergamon Press, London, 1962), pp. 295-299.
19. Willi Becker, Vakuum-Technik 7, 149 (1958).20. Charles H. Kruger, "The Axial-flow Compressor in the Free-molecular
Range," Ph.D. Thesis, Department of Mechanical Engineering, MassachusettsInstitute of Technology, Cambridge, Mass., 1960.
21. Charles H. Kruger and Asoher H. Shapiro, in 1960 Vacuum SymposiumTransactions (Pergamon Press, London, 1961), p. 6.
CHAPTER 6
VAPOR-JET VACUUM PUMPS
6-1. The Steam Ejector. Since the effectiveness of the steam-jet
ejector in evacuating large volumes down to pressures of the order of
about 1 torr was first demonstrated by M. Leblanc,i* steam ejectors
have been used successfully in a wide variety of rough vacuum appli-
cations. A typical steam ejector is illustrated in Fig. 6-1 and consists
of (a) a steam chest in which the pressure and temperature are main-
tained at the proper values, (6) the nozzle through which the steam
flows to form a jet, (c) the mixing chamber through which the steam
jet passes and entrains gas admitted to the chamber through {d) the
inlet port, and (e) the diffuser through which the jet carries the
entrained gas to (/) the discharge. Under normal operating conditions
the pressure in the mixing chamber is very low as compared with that
in the steam chest and at the discharge port so that the steam is
expanded in passing through the nozzle by a large factor and then
compressed in passing through the diffuser. Since the cross-sectional
area of the steam chest is large as compared with that of the nozzle,
the directed or drift velocity in the steam chest is small as compared
with that through the nozzle. The random energy of thermal motion
of the steam is therefore converted in passing through the nozzle into
directed kinetic energy with the formation of a supersonic jet, i.e.,
one in which the directed velocity of flow is large as compared with the
average random velocity of the molecules determined by the tempera-
ture.
The flow of steam from the steam chest, through the nozzle and
mixing chamber, and out through the diffuser is a special case of the
flow of a compressible fluid through a tube of varying cross section.
Thermodynamic analysis of the flow through a converging-diverging
nozzle, assuming isentropic behavior (no heat exchange with the walls,
that is, PV^^ = Pjpi = const), leads to two specific results. If Pj is
the pressure upstream from the nozzle, P^ the pressure at the throat
* References indicated by sviperscript numbers are listed at the end of the
chapter.
219 '^
220 VACUUM SCIENCE AND ENGINEERING
of the nozzle (the point of minimum cross section), and P^ the pressure
downstream from the nozzle,
1. The flow through the nozzle increases with decreasing pressure
P3 beyond the nozzle until a critical value P^ is reached beyond whichthe flow is independent of P3 and P^ = P^-
2. The flow velocity at the throat of the nozzle is Mach 1, that is,
is equal to the local sound velocity,
when P3 < Pj.
Steam inlet
Mixing
chamber
The calculation shows that
\r + 1/
v/(,-l)
Discharge
Fig. 6-1. Cross section of typical
steam ejector. [Taken with per-
mission from V. V. Fondrk, in 1957Vacuum Symposium Transactions
(Pergamon Press, London, 1958).]
1^1/ ^1 (^-^)\y + 1/
for the pressure at the throat as long
as P3 < Pj. If the gas flowing
through the nozzle is a perfect dia-
tomic gas for which y = 1.40 (see
Table 1-4), the result is P, =O.535P1. However, for steam y =1.32 and thus for steam sufficiently
superheated so that condensation
does not occur in the throat, P^. =O.545P1. For steam not sufficiently
superheated, however, condensation
does occur and the effective value of
y is such that P^ == 0.575Pi, approxi-
mately.
Associated with the critical flow
pressure P^ is the flow velocity v^
at the throat of the nozzle. This
velocity is given by
2y P,
y Pi
-©'(i-i)/y-l
•(6-2),
where p^ is the density of the gas
upstream from the nozzle (e.g., of the steam in the steam chest). Byreference to (6-1) the stream velocity at the critical pressure is given by
2y Pj 2yPiFi (6-3)
y + I Pi y + I
where V^ = l/p^ is the specific volume in cubic centimeters per gram.
VAPOE-JBT VACUUM PUMPS 221
According to (1-28) the velocity of sound in the gas at the nozzle
throat under critical flow conditions is given by
y—Pc
2y Pi
r + 1 Pi
Thus v^lVgj = 1 and the flow at the throat is Mach 1.
Since the flow is isentropic,
'pU/y / 9 \l/(y-l)
(6-4)
/PX'' I 2 V'' '
again by use of (6-1).
The mass flow rate through the nozzle is
dW = cp.v^A^dt
-cp,v,D^^ g/sec
(6-5)
(6-6)
where D^ is the diameter of the nozzle at the throat in centimeters andc is the nozzle coefficient, which is a number generally in the range of
0.95 to 1.0, depending upon the geometry of the nozzle and the flow
conditions (particularly the Reynolds number). By substituting (6-3)
and (6-5) into (6-6) the critical flow rate is
~dt
Since for steam the average value of y = 1.30, the mass flow for steam
through a converging-diverging nozzle is
d.W,
"df0.524c
(9P'g/sec (6-8)
when Pi is measured in /^bars (dynes per square centimeter), V^ in
cubic centimeters per gram, and Z>2 in centimeters. If the pressure
Pi is measured in torr, this expression becomes
dW^
dt19.14c Elf
vjD, g/sec (6-8a)
Finally, if as in most engineering applications Pi is in pounds per
square inch, V^ in cubic feet per pound, and D^ in inches, the expression
becomes
dW, /PiV^
dt892.6cm Ib/hr (6-86)
From the steam conditions upstream from the nozzle the mass-flow
rate may be calculated approximately from (6-8a or 6-86) by assuming
that c = 1. Engineering steam tables give values for the specific
VACUUM SCIENCE AND ENGINEERING
volume Vi as a function of temperature and pressure, which is all that
is needed to carry out the approximate calculation. A more precise
determination of steam-flow rate can he made by using the procedure
outlined in Standards for Steam Jet Ejectors published by the HeatExchange Institute, pp. 18-34. In Fig. 6-2 is a graph taken from this
publication showing the steam flow
through a 1-sq-in. nozzle throat
area for a nozzle coefficient c = 1
and a range of steam conditions.
Additional curves of this type as
well as the procedure for determin-
ing the value of the nozzle coefficient
are given in the reference.
As an example, for the steam
conditions given as
Pj = 4 atm = 58.8 psia
Ti = 508°K = 454.6°F
the steam tables give
Fi = 9.06 ft3/lb
13
12
11
10
9
8
7
6
5
4
3
2
1
n
oSaturation w^
T~4
3tal
00°remperature-
"~i¥
s ~ h1
/ f^V'
50frv^^'^
600° F-4^^O — ^f ^700°
F
^ 800° F
s s Am ho 0°F
E A^ lUU U''F
/^fr
20 40 60 80 100 120 140 160 180
Pressure, psig
Fig. 6-2. The critical mass-flow rate
for steam through a convefging-
diverging nozzle of 1 sq in. throat
area assuming a nozzle coefficient of
1.00 for the pressure range to 620
psi gauge pressure (14.7 to 634.7
psia) for steam temperatures up to
1000°F. [Reprinted from the Stan-
dards for Steam Jet Ejectors, 3rd ed.
Copyright 1956 by the Heat Ex-
change Institute, 122 East 42nd
Street, New York, X.Y. 10017.]
SO that according to (6-86) the flow
rate through a nozzle of 1 sq in.
throat area for which
£>, =^. in.
IS
dW,
~df2,900c Ib/hr
in which c is a number slightly less
than 1.
Beyond the throat the ejector
nozzle must diverge sufficiently to
allow for the expansion of the steam in its free expansion from the
pressure P^ = P„ at the throat to the design value for the pressure in
the mixing chamber where gas at pressure Pg is to be mixed with the
steam jet and pumped out through the diffuser. The external pressure
on the steam jet as it traverses the mixing chamber is P^, the inlet gas
pressure, which at the design point for the system is just balanced by
the transverse pressure in the steam jet because of the random thermal
molecular motion. Since in practice the design inlet pressure is quite
low, the intrinsic pressure in the steam jet is also low, corresponding
to a low temperature frequently well below the freezing point. The
VAPOB-JET VACUUM PUMPS 223
large random molecular energy of the steam in the steam chest is
converted by the converging-diverging nozzle into very low randomenergy plus a high directed energy. Since the drift velocity is then
large as compared with the random molecular velocity, the jet stream
in the mixing chamber has a high Mach number, typically in the range
2 to 4. Because the temperature of the steam jet is low in the mixing
chamber, the vapor pressure is also very low as compared with that at
room temperature, so that the water vapor pressure seen at the gas
inlet port is correspondingly low.
When the steam jet enters the difii'user, a process of isentropic
compression occurs. The steam together with the entrained gas being
pumped through the inlet port is compressed from the low pressure in
the mixing chamber to the exhaust pressure. The maximum exhaust
pressure attainable is that for which the flow velocity of the steam
jet is completely converted to random velocity. The design of the
diffuser and the imposed steam conditions must be such that this
minimum requirement is met. Otherwise the jet will be unable to
sustain the pressure differential and will break down, allowing exhaust
gas to flow back through the system.
The pumping speed of a steam ejector is a sensitive function of the
design of the nozzle and diffuser. The design of the nozzle is based
upon sound thermodynamic principles and can be specified with
considerable precision for a given set of requirements. The design of
the diffuser is much more empirical, for which experience in a great
variety of industrial vacuum applications provides a sound basis for
predicting performance. The pumping capacity of a steam ejector
is generally given in terms of the number of pounds of dry air removed
in one hour (lb air/hr). Since
Pair (760 torr and 20°C) = 1.205 x IQ-^ g/cm^
= 7.52 X 10-2 ib/ft3
1 lb dry air (68°F = 20°C) = 13.31 ft^ at 760 torr
and 1 lb dry air (68°C)/hr = 168.5 torr cfm
= 79.5 torr liters/sec
The capacity of a typical single-stage steam ejector as a function of
the inlet pressure is shown in Fig. 6-3, and the corresponding pumping
speed in Fig. 6-4.
^
For high-vacuum pumping, steam ejectors are used in multiple
combinations, such as the three-stage system illustrated in Fig. 6-5.
^
A water-cooled condenser is placed between the second and third
stages to decrease vapor load on the final stage. In such a system the
first two stages are referred to as booster stages, in which the steam
conditions are such that very low temperatures are reached by the
224 VACUUM SCIENCE AND ENGINEERING
50 100 200 500 1,000
Inlet pressure, torr
Fig. 6-3. Capacity of a typical single-
stage steam ejector as a function of
inlet pressure. [Taken with per-
mission from V. V. Fondrk, in 1957
Vacuum Symposium Transactions
(Pergamon Press, London, 1958).]
120
100 / ^80 / s
/ *•>,
60 /f
40 )
1
201
/
^
20 50 100 200 500
Inlet pressure, torr
1,000
Fig. 6-4. Pumping speed of a typical
single-stage steam ejector as a func-
tion of inlet pressure. [Taken with
permission from V. V. Fondrk, in
i957 Vacuum Sym,posium, Transac-
tions (Pergamon Press, London,
1958).]
Suction chomber
Steom inlet
Third stage
Discharge
Intercondenser
Water dischorqe
Fig. 6-5. Layout of three-stage steam ejector system. [Taken with permissionfrom V. V. Fondrk, in 1957 Vacuum Symposium Transactions (Pergamon Press,
London, 1958).]
VAPOR-JET VACUUM PUMPS 225
steam-water or steam-ice jet as it leaves the nozzle so that the vaporpressure of water from the jet is correspondingly very low. Theultimate vacuum attainable with steam ejector systems is consequently
surprisingly low as compared with the vapor pressure of water at roomtemperature (17.5 torr at 20°C). Multistage steam ejector systems
may consist of as many as seven stages with interstage condensers
after the first two or three stages. With such systems base pressures
as low as 10^^ torr are attainable with capacity of the order of 6 Ib/hr
of dry air or pumping speed of 100,000 cfm at 10~^ torr.
4-stage steam ejector
system tor hondling
gases at I torr
evolved from pour at
4-tons/min
Common surtace
condenser (C) servmg
4 2-stage units (8, ,82)
2-stage steam
ejector evocuatinq
common surface
condenser (C)
4 2-staqe steam ejectors
'B|, Bj) parallel for
reducing pressure to
I torr and handling goses
of pouring rote 4 tons/min
of I torr
v4 t2-in diophragm volves(V|l
hogging steam
ejectors (A)
62N62 range
30 to V2 torr
in 2 min
6-ia diophragm
volve (Vj'
Fig. 6-6. Schematic arrangement of four-stage, series-parallel steam ejector
system.
226 VACUUM SCIENCE AND ENGINEERING
For economy and flexibility in operation, steam ejector systems mayconsist of several booster ejectors in parallel, backed up by one or two
final stages. In the system illustrated in Fig. 6-6 there are four two-
stage boosters in parallel, backed by two final stages with interstage
Table 6-1. Perfobmance of Four-stage Steam Ejector System Shown in
Fig. 6-6
InletCapacity,
lb air/hr
Throughput Pumping speed
torr torr cfm torr Hters/soc cfm liters/sec
0.140
0.280
0.500 (design)
0.580
0.775
1.000
1.0
2.5
3.0
4.0
5.0
169
421
505
674
843
80
199
238
318
397
604
842
871
870
843
286
398
411
410
397
condensers. The performance of this four-stage multiple ejector
system is shown in Table 6-1 and shown graphically in Fig. 6-7 and
Fig. 6-8. The inlet pressure for which the system was designed was
0.500 torr as indicated in the table.
900
800
g 700yy
/y "-600
cu
S.500
//
,|'400
// §300
D-
200
// 100
5.0
4,0
3.0
2.0
1,0
01 0.2 03 04 Q5 06 0.7 0.8 09 1.0
Inlet pressure.torr
Fig. 6-7. Capacity of four-stage
steam ejector system shown in Fig.
6-6.
423
400
350 „
300"^
250:|
200 S
150 g'
100 IQ_
50
o'or 02 03 0.4 05 0.6 07 0.8 0.9 1.0
Inlet pressure.torr
Fig. 6-8. Pumping speed of four-stage
steam ejector system shown in Fig. 6-6.
^1 —•—r-'
//
J/
1
/
LL ;1401 1
As the inlet pressure is raised, the throughput of a steam ejector
system increases and the discharge pressure at each stage is correspond-
ingly increased. A limit is reached when the discharge pressure in oneof the interstage regions equals the maximum which the steam canattain in the diffuser during compression. If the flow is increased
VAPOR-JET VACUUM PUMPS 227
beyond this critical value, the jet collapses in one of the stages with the
result that discharge gas and steam flow back through the system into
the vacuum vessel. The steam conditions and load must be regulated
in such a manner as to avoid this type of blowback since the conse-
quences in most cases would be serious.
The problem of backstreaming of water vapor into the vacuum vessel
does not present a serious problem unless the flow of gas from the
vacuum vessel to the mixing chamber falls off to a value which is
considerably less than the design point for the system. However, at
zero throughput serious backstreaming will occur. It is sometimes
necessary to provide means for introducing air, steam, or other gas
at a controlled rate into the system between the steam ejector inlet
and the vacuum vessel through a needle valve to prevent the inlet
pressure from dropping to the point where backstreaming would
become serious.
Steam ejectors operate generally in the pressure range of single-stage
mechanical vacuum pumps. However, for processes involving the
evolution of large amounts of water vapor (as vacuum cooling or
dehydrating), steam ejectors usually have a distinct advantage in spite
of a high rate of consumption of steam. For processes in which
corrosive gases must be pumped, ejector systems lined throughout with
graphite or other corrosion-resisting material are used. The nozzle
and diffuser parts can be made of any material which can be machined
or ground with precision.
6-2. Diffusion Pumps. The term diffusion pump is normally
applied to jet pumps which utilize the vapor of liquids of comparatively
low vapor pressure at room temperature and which provide base
pressures significantly lower than those easily attainable with oil-sealed
mechanical vacuum pumps. The development of the modern diffusion
pump has a complicated history which is too involved to trace in
detail. Those interested should refer to Dushman's book^ for the
contributions of Gaede and Langmuir to the invention respectively of
the diffusion pump and the vapor-condensation pump, from which
beginnings the modern diffusion pump descended.
The cross section of a typical diffusion pump is shown in Fig. 6-9.
Such a pump normally consists of a cylindrical housing within which
is a jet assembly and at the bottom of which is a boiler for the work-
ing fluid. The nozzles which form the jets are generally annular and
arranged so that the vapor streams from them are directed downwardand outward. The housing, particularly in the region where the vapor
jets impinge, is cooled to ensure condensation. The vapor from the
boiler passes up through the chimney formed by the jet assembly and
out through the annular slits, which act as nozzles for directing the
228 VACUUM SCIENCE AND ENgAbEBING
vapor streams. Gas entering the pump at the inlet is given momentumdownward by the vapor streams and forced out the discharge, where
an appropriate forepressure is maintained by a backing pump, usually in
the form of an oil-sealed mechanical vacuum pump. The annular space
between the jet assembly and the housing must be completely sealed
by vapor at sufficiently high pressure so that the back pressure from the
discharge cannot break through the jets and flow backward through
the pump inlet. For any design of diffusion pump there is a fairly
critical forepressure below which the pump is effective and above which
the pump fails because of breakdown of the jets.
Typical diffusion-pump jet assemblies consist of three or four annular
nozzles, as shown in Fig. 6-9, or three annular nozzles and an ejector
type of nozzle located in the discharge port, as shown in Fig. 6-10.
The downwardly directed vapor stream from each annular nozzle
entrains gas molecules incident from above and gives them momentumdownward toward the discharge port. Each annular jet is capable
of maintaining performance against a specific forepressure, which is
relatively low for the first jet, for which the radial clearance is large,
Fig. 6-9. Cross section of typical diffusion pump with four annular jets.
VAPOR-JET VACUUM PUMPS 229
Pump inlet (low pressure) — = Pump fluid
^— ' = Gas molecules
Jet assembly
Fractionating
boiler
Electric heoter
y-. )-<-Foreline
(Pump outlet)
Foreiine c"'•
High forepressure
baffle ^;-;3
:i'u.<---::-
3
3
Fourth compression stoge
(Ejector type)
Pump fluid
Fig. 6-10. Cross section of typical diffusion pump with three annular and oneejector jet.
and relatively high for the final jet, for which the radial clearance is
small. In a pump of optimum design, the forepressure limits for the
successive jets are in regular progression. Although a great deal of
work has gone into the study of diffusion-pump design and performance,
an exact understanding of the mechanisms of jet formation, gas
entrainment, and pumping has not yet been attained.
Consider the enlarged view in Fig. 6-11 of the vapor jet issuing from
the nozzle, directed downward and radially across the annular space
between the jet assembly and the housing, and condensing on the wall.
The vapor stream cannot be regarded as a well-defined jet with a sharp
boundary, particularly if the surrounding gas pressure is very low.
The vapor stream in leaving the nozzle will tend to expand, causing
some molecules of the working fluid to acquire net upward velocities
opposite to the desired direction of flow, with the result that twoundesirable effects are introduced. The backward-directed vapor
molecules in colliding with gas molecules impart momentum in the
wrong direction so that some of the gas molecules are expelled from the
jet region and thus fail to be pumped out of the system. Also someof the backward-directed vapor molecules continue their contrary
flight upward and out through the inlet, resulting in backstreaming
of working vapor, which constitutes a major source of contamination
in vacuum systems. During the past few years significant steps have
been taken to decrease the backstreaming and improve the pumping
230 VACUUM SCIENCE AND ENGINEERING
efficiency of diffusion-pump jets with resulting increase in pumping
speed and decrease in the rate of contamination of the system by the
working fluid.
Serious attempts have been made*"* to understand in detail the
physical processes involved in vapor-jet vacuum pumping with the
conviction that optimum design can only be realized on this basis.
There are two principal performance characteristics of vapor-jet pumps
which need to be explained. These are (1) the compression ratio P2/-P1
which the pump can maintain under conditions of zero flow and (2) the
pumping speed under conditions of steady gas flow into the inlet.
Vapor
flow
wwwwwwGas
flow
,,j||||
Fig. 6-11. Enlarged cross section of
jet issuing from diffusion-pump
nozzle. [Taken with permission from
B. D. Power and D. J. Crawley,
Vacuum IV, 415 (1954).]
Exhoust
Fig. 6-12. Cross
section of simpli-
fied jet pump.
6-3. Theoretical Compression Ratio for a Vapor-jet Pump.Based upon the original work of Gaede,* Jaekel/" and Noller' the
following derivation of the compression ratio for a single-stage jet pumpis provided. Figure 6-12 is an idealized version of a vapor-jet
pump in which everywhere below the surface a-b the cross section of the
pump barrel will be assumed to be uniformly filled with vapor movingwith a velocity U downward to the surface c-d, where the vapor is
condensed and removed. Above the surface a-b the permanent gas
VAPOR-JET VACUUM PUMPS 231
pressure is Pj and the molecular density t^^ cm"". Below the surfacec-d the permanent gas pressure is Pg and the molecular density ?^2 cm-^.All gas molecules which become entrained in the vapor stream quicklyacquire the drift velocity U of the vapor. If the density of gas mole-cules entrained in the vapor is n^ cm-^, the number of gas moleculesper second and per square centimeter swept downward is n U. How-ever, since P^ is greater than P^ as a result of the pumping action,there is diffusion of gas molecules in the reverse direction given byD{dnjdy), where D is the diffusion coefficient of gas molecules in thevapor. Under conditions of zero flow these two quantities must beequal, so that
When, as in this case, the density rig of the gas molecules is very smallas compared with the density n„ of vapor molecules, then the diffusion
coefficient is inversely proportional to the vapor density and can bewritten as
D = ^ (6-10)
so thatDo drig
n^ dy
ordP~P
nJJ_
D„dy (6-11)
Integration of this expression yields
W2£1 exp(f4 (6-12)
where L is the distance from the surface a-b to the surface c-d.
Since the value of Z>„ is given approximately by the expression^
8\2/ 77(1, + |j4(6-13)
in which ^^ and |„ are respectively the diameters of the gas and vapormolecules, M^ and M^ are the molecular weights respectively of the gas
and vapor, Rj^ = 8.315 x 10' ergs/°C mole, and T^ is the temperature(°K) of the vapor stream.
As an example let us consider the case of air pumped by mercuryvapor for which the temperature in the jet may typically be about
232 VACUUM SCIENCE AND ENGINEERING
100°C. The constants for Eq. (6-13) are then
T^ = 373°K
ig = 3.72 X 10-8 cm
1^ = 4.26 X 10-8 cm
M, = 28.96 g
M, = 200.6 g
VAPOR-JET VACUUM PUMPS 233
D.4 X 10" 229.56
(8.315 X 10')(373)8 X (27t)'^ (7.98)2 L(28.96)(200.6)
= 3.32 X 10"
Since the pressure in the core of a mercury vapor jet is of the order
0.05 torr = 67 /ibar(dynes/cm2)
P, = n^kT, = 67 fih&T
in which k is the Boltzmann constant (1-14), so that
67n = = 1.3 X 10^^ molecules/cm*
" (1.38 X 10-i« X 373)
The vapor stream issuing from the nozzle, as in the case of the steam
ejector jet, is typically about Mach 1, so the velocity of the vapor would
be as given in (1-28)
in which, for mercury, y = 1.66 and
n„M„ 1-3 X 10" X 200.6
Pv = w„m^ =
giving
6.023 X 1023
U --
6.023 X 1023
/ 1.66 X 67 \^
\1.67 X 10-V
= 2.6 X 10* cm/sec
1.67 X 10-' g/cm^
Substituting the above approximate values of n^, U, and Dg into (6-12)
and taking for the length of the vapor column L = 10 cm, the exponent
in (6-12) becomes
n„U
so that
L = 1.3 X 1015 X 2.6 X 10*
3.32 X 10"
,102 _ ]^Q(102)(0.434) ^_ lO**-^
X 10 = 102
In the above crude calculation almost any reasonable set of numbersfor vapor density, pressure, and temperature in the vapor stream
results in a very large theoretically predicted compression ratio. The
calculation as presented tacitly assumes in Eq. (6-9) that the velocity
of the vapor stream U is small compared with the velocity of the gas
motectiles tiiffusing bacK through the vapor. If this were not the case,
the rate of back diffusion would be appreciably diminished by the flow
of the vapor stream and the compression ratio would be even greater
than that calculated above.
N
(c) (d)
Fig. 6-13. Configuration of a vapor jet for various values of forepressure. Oper-
ation of the vapor pump. {A) Pumping aperture; (B) nozzle; (C) nozzle aperture;
(D) vapor inlet; (E) gas inlet; (F) vapor jet; (G) pump casing; (H) water or air
cooling; (L )forepressure outlet; (M) to forepump; (JV) shock wave, (a) Fore-
pressure about 0.001 torr; (6) forepressure about 0.02 torr; (c) forepressure about
0.04 torr; (d) forepressure about 0.1 torr. [Taken with permission from N. A.
Florescu, Vacuum 10, 250 (I960).]
Florescu* approaches the analysis of vapor-jet pumping from a
somewhat different point of view from that given above. The be-
havior of a vapor jet for various values of the forepressure is illustrated
in Fig. 6-13 from Florescu's paper. When the forepressure is very low,
the jet spreads on leaving the nozzle, as shown in Fig. 6- 13a, and
completely fills the body of the pump from the pumping aperture Adown to the forepressure outlet L. The full length of the pump is
sealed against backward flow of gas which enters at E and is ejected
at L.
As the forepressure is increased (Fig. 6-136), a point is reached such
that the vapor stream no longer persists for the full length of the pumpbarrel but is terminated in a shock front as indicated at N by the
dashed line. With further increase in the forepressure the shock front
moves up close to the pumping aperture, as shown in Fig. 6-13c.
Beyond the shock front the vapor and gas densities are appreciably
greater than in the vapor stream. The molecules in the jet stream
above the shock front have net directed velocity downward, whereas
those below the shock front are randomly directed.
234 VACUUM SCIENCE AND ENGINEERING
Further increase in the forepressure results in a change in form of
the jet stream. Since the shock front would tend to retreat further,
the result is that the vapor stream can no longer reach the walls of the
pump barrel and effect a complete seal between inlet and outlet. The
jet stream then becomes narrow, as shown in Fig. Q-I3d, and gas from
the forevacuum region can then flow freely backward past the jet
through the inlet.
Florescu then considers the case corresponding to that shown in
Fig. 6-136, in which the forepres-
sure is low enough that an appreci-
able length of the pump barrel
is filled and sealed by the vapor
stream. The vapor stream, con-
sisting of vapor molecules with
velocities directed downward in
the pump barrel, subjects the gas
molecules present in this region to
a series of impacts, driving them
downward. This action estab-
lishes and maintains a gradient
of gas concentration increasing
toward the forevacuum outlet.
Also, gas molecules entering
through the pumping aperture are
continually captured and driven
toward the forevacuum outlet by
the downwardly directed vapor
molecules. Near the pumping
aperture where the gas molecules
first encounter impacts from
vapor molecules the gas mole-
nrPressure, torr
Fig. 6-14. Density distribution of
permanent gas along a diffusion-pump
barrel from inlet to exhaust pressure
due to the pumping action of the jet.
{A) Gas inlet; (B) vapor inlet; (C) fore-
pressure outlet. [Taken with per-
mission from N. A. Florescu, Vacuum10, 250 (I960).]
cules are given a high velocity in the direction of the vapor stream.
By this action the density of gas molecules should decrease sharply just
below the pumping aperture and then increase because of the pressure
gradient maintained by the vapor stream toward the forevacuum. In
Fig. 6-14 is shown the jet pump configuration and the pressure (or
density) of the permanent gas being pumped as deduced by Florescu
from measurements made by Alexander.^"
The gas pressure throughout the pump barrel can be visualized in
terms of a series of isobaric surfaces, which for convenience may be
assumed to be plane surfaces perpendicular to the axis of the barrel.
Between two successive isobars separated by a distance dy at a distance
y from the nozzle the pressure increase dP^ results from momentum
rVAPOR-JET VACUUM PUMPS 235
transferred during collisions from vapor molecules to the gas mole-
cules.
Since the gas pressure below the nozzle is everywhere, according to
(1-12),
P, = }4n^m,v^^ (6-14)
where v^ is the root-mean-square velocity of the gas molecules, andsince the density of the gas molecules increases with the distance below
the nozzle, the pressure difference between two isobars separated by the
distance dy is
dPg = }/3mgV^^ drig (6-15)
The number of vapor molecules in the volume between the isobars
within a unit area (1 cm^) is n^dy. Since n^ decreases with distance
below the nozzle as the vapor stream spreads, assume as a convenient
model that
n„ N(-1) (6-16)
such that n^ = Bit y = L, the length of the vapor stream.
For gas molecules of most probable thermal velocity Vj, passing
through the vapor of average thermal velocity Wav, the probability for
a given gas molecule to have one collision per second with the vapor
molecules is®
= n„aua,v
(D(x)
where
2
2
1 (f. + f.)
r+^;jo^"dz
(6-17)
and ^{x) = er^ + 2x-).rxl Jo
' dz
Since the average time between collisions is then t = 1/0, the mean
free path for the gas molecules between collisions with vapor molecules
is
v„V^r
V(6-18)
In an infinitesimal thickness dy the probability of a given gas molecule
suffering a collision with a vapor molecule is dy]!^. The number of gas
236 VACUUM SCIENCE AND ENGINEERING
molecules crossing a unit area of thickness dy in one second is WgWav so
that the number which suffer collisions with vapor molecules in this
infinitesimal volume per second is
n^v^y— = -^-- O a; dy
UgNaunv(l -|)(D(x)%
since from (1-23) Wav/«» = S/tt'-^. If the velocity of the vapor jet is U,
the momentum transfer per collision is m^U and the rate of change of
momentum per square centimeter over the layer in question, which is
equal to the change in pressure over the distance dy, is
dP^=^^U^^\l-l)^(.)dy (6-19)
But this pressure difference is the same as that given in (6-15) so that
^'^"?-^(l-|)0(.)<Z,}/3 m^v^ dtig = mJJ
anddP,
P„
ZNaniMun
tt'^ m„t; 2^j<^{x)dy (6-20)
Integrating (6-20) from P = P^ to P = P2 and from y = to y = I
gives for the compression ratio
Piexp
'3NaM„Uue.
M„v^^{x)L (6-21)
in which the ratio of the molecular weights MJM^ is substituted for the
ratio of the atomic masses m^jm^.
If the same conditions are assumed in evaluating this expression as
were assumed in evaluating (6-12), we note that
M^ (for mercury) = 200.6 g/mole
Mg (for air) = 28.96 g/mole
iV^ (for mercury) = 1.3 x 10" molecules/cm^
(I, + |,)2 = - (4.26 + 3.72)2 X 10-
= 5.01 X 10-15 cm^
[/ = 2.6 X 10* cm/sec
VAPOB-JET VACUUM PUMPS 237
assumed to be Mach 1 at 373°K for mercury vapor. Correspondingly,
u^ = (2/y)'-^C/ = 2.86 X 10* cm/sec
and ttav = (2/77'-^)Wj, = 3.24 x 10* cm/sec
from (1-30) and (1-23).
If we assume the temperature of the gas being pumped is 300°K,then from (1-15)
/3A;TV-^ /3 X 1.38 x 10"" x SOOV-^v^ = = r-^i 777^^ = 5.1 x 10* cm/sec
\ nig / \ 4.81 x 10-23 /
/2kT\^i 12^-Vj, = I I = I- 1 «r = 4.16 X 10* cm/secand
from (1-22). The parameter x appearing in (6-17) is
77'^ Mav
2 4.151.45
tt'-^ 3.24/•1-45
from which cl)(l.45) = e-^" + (2.90 + 0.69) e-^'dzJo
f* _ -
The integral \ e ' dz cannot be evaluated analytically but is relatedJo
to the probability integral
2 r^n(x) = -r2 e-''dz
77-^ Jo
numerical values of which can be found in tables. ^^ The result is that
so that
and
ri-i
Jo
n(1.45) = 0.960
'A
e- dz = '"—0(1.45) = — (0.960) = 0.848
^A
2--'--'
2
(D(1.45) = 0.122 + (3.59)(0.848) = 3.16
Substituting this value of together with the other parameters given
above into (6-21) gives for the compression ratio
p^=exp/3 X 1.3 X 1 015 X 5.01 X 10-16
277'/^
200.6 X 2.6 X 10* X 3.2x10* „_ ,\
X -— — -— X3.16 X 1028.96 X26.1 X 108
= exp (392) = 10(392)(0.434) = 10170
which again is a very high compression ratio, even higher than that
obtained for the same example by the method of Jaekel and Noller. ^m.
238 VACUUM SCIENCE AND ENGINEERING
A simple approach to the problem of the compression ratio for a jet
pump is to assume that the velocity of the gas molecules is high com-
pared with that of the vapor jet, which can then be considered essen-
tially at rest. Gas molecules penetrate the jet from the forevacuum
side, where the density is Wj and the pressure Pj. If we assume that
those gas molecules which experience a collision with a vapor molecule
are entrapped in the jet stream and are carried to the forevacuum
region, then only those gas molecules which pass completely through
the jet from the forevacuum region without collision with vapor
molecules penetrate to the high vacuum side of the vapor jet. If
^ =J
(f. + ^.r (6-22)
is the collision cross section for gas molecules on vapor molecules, then
the mean free path for the gas molecules between collisions with vapor
molecules is
X=— (6-23)W„(T
The number of gas molecules incident per square centimeter on the
vapor jet on the forevacuum side is, from (1-31),
- Xm%0z,v (6-24)
where n,^ is the density of gas molecules in the forevacuum region and
«av is their average thermal velocity. The number of these which
will penetrate a distance L through the vapor jet and thus reach the
high-vacuum region beyond is
dn dn
dt dt
2 g_i/AHn^Vs.^e-^"' (6-25)
If there are no other gas molecules entering the system on the high-
vacuum side of the vapor jet, then when a steady state is reached just
this same number of gas molecules (per second and per square centi-
meter) is being pumped by the jet from the high-vacuum region. Therate at which molecules strike each square centimeter of the exposed
area of the jet from the high-vacuum side is WiWav/4, according to
(1-31). However, because of the turbulent properties of the boundaryof the jet, with some vapor molecules moving in the opposite direction
of that desired, not all these gas molecules will become entrained in the
vapor jet. If we assume that about one-half this number are actually
VAPOR-JET VACUUM PUMPS 239
captured and carried to the forevacuum by the jet, then the numberpumped is
dn
dt(6-26)
Since at equilibrium this rate is the same as that given in (6-25), then
so that
Hn2Va,ye-^'^ = y%niVa.v
Pi ^1(6-27)
Using the previously selected values for the parameters, i = 10 cm,cr = 5.01 X 10-15 cm2, and ?i„ = 1.3 x 10" molecules/cm^, the value of
and
1.3 X 1015 X 5.01 X 10-15 6.52
L- = 10 X 6.52 = 65.2
cm
The compression ratio on this simplified model is thus
Pi ^ I, ,
: = _ g65.2 _ _ ]^()(6S.2)(0.434)
Pi 2 2
1= - 1028.3 = IQii2
again a very large number.Thus for the simplified model of a vapor jet which has been adopted
at the outset of this discussion any reasonable theoretical treatmentleads to a very high compression ratio P2/P1 against the forevacuumgas when the gas flow into the inlet is zero. However, the expression
for the compression ratio in each case is of the form
in which the quantity /S is different for each method of derivation.
The predicted compression ratio is thus in each case critically dependenton the average value of the vapor density n^ in the jet length L overwhich this density persists. In the typical diffusion pump the annularnozzles produce vapor jets in the form of conical sheets. The vertical
thickness through the dense part of such a jet may only be of the orderof 1 cm instead of 10 cm taken for the simple model with purely axial
flow. Furthermore, the first-stage jet in modern diffusion pumps, par-
ticularly those using organic fluids rather than mercury, is generally
found to be undersupplied with vapor so that n^ may be less than the-
240 VACUUM SCIENCE AND ENGINEERING
values assumed above by a factor of 10 or more. Finally, since a depends
upon the molecular diameter of the gas being pumped, a pronounced
difference between gases is to be expected. Since helium and hydrogen
have particularly small molecular diameters, the compression ratio for
these gases may be expected to be lower than for air. It is found in
practice that some commercial diffusion pumps are so marginal in
vapor density for the first-stage jet that the compression ratio for air
is quite adequate, but that for helium and hydrogen is poor. In some
cases the performance indicates that for pumping light gases the
first-stage jet is so ineffective that the pumping speed is determined
entirely by the subsequent jets. This deficiency comes about in an
effort to obtain high pumping speed for air while avoiding excessive
backstreaming of diffusion-pump fluid from the first-stage jet back-
ward out through the pump inlet.
6-4. Working Fluids for Diffusion Pumps. In the above
theoretical discussion of the compression ratio at zero gas flow for
vapor-jet pumps, mercury has been assumed to be the working fluid
because it is the only chemical element widely used for this purpose.
Since it is an element, mercury is not subject to decomposition. How-ever, because of its relatively high vapor pressure (about a micron at
room temperature) mercury can be used successfully as a working
fluid for many applications only if a vapor trap, usually in the form of a
baffle system maintained at low temperature, is installed between the
diffusion pump and the vessel being evacuated. In this case the
pressure for permanent gases is determined by the effective pumping
speed of the pump through the trap, whereas the pressure of conden-
sable vapors, including that of mercury, throughout the system is
determined by the efficiency and temperature of the trap. Thus, if
the pumping speed of a pump (normally quoted for air at room tempera-
ture) is 8 J, and the conductance of the vapor trap is C^, then the
effective pumping speed 8^ of the combination for air as given by (2-8)
is given by1 1 1
^ = ^ + 7T (6-28)
^e ^v ^t -,
In order to maintain a sufficiently low vapor pressure of mercury
beyond the baffle system and at the same time not cause rapid accum-
ulation of all the mercury from the diffusion-pump boiler on the
baffle system, the trap design becomes rather elaborate and the
resultant conductance lower than one would like. It is generally
difficult to design an effective trap within an acceptable volume which
has a conductance greater than the pumping speed of the diffusion
pump. Thus even with good trap design, typically 8^ ?« 8^,12 for
VAPOR-JET VACUUM PUMPS 241
,£lO-
pumping permanent gases. There is a bonus, however, in that for the
pumping of condensable vapors the effective pumping speed due to
condensation on the baffle surfaces
may be considerably greater than
that of the diffusion pump.During the past 25 years or more
the fluids most commonly used in
diffusion pumps are vacuum-dis-
tilled hydrocarbon oils and a variety
of synthetic liquids, all of which
have much lower vapor pressures
than mercury at room temperature.
The usual advantage of these fluids
is that the base pressure attainable
without the use of low-temperature
vapor traps is acceptable for manyapplications. Generally, systems
using the better grades of diffusion-
pump oils can be operated downto pressures of the order of 10~^
torr, and sometimes as low as 10~*
torr, using only water-cooled baffles
to impede the backstreaming of
working fluid vapor into the evacu-
ated vessel.
Latham, Power, and Dennis^^
have given the results shown graph-
ically in Fig. 6-15, in which the
vapor pressures of a number of
diffusion-pump oils are plotted as
a function of the pressure. Thecurve for mercury is shown for
comparison.
From the discussion in the pre-
vious section one might assume that
the ultimate pressure attainable in
terms of the partial pressure of the
permanent gas being pumped wouldbe so low that the observed base
pressures would be independent of the working fluid. This is, in fact,
essentially true, as long as the design ofthe diffusion pump is competent.
However, what is normally observed is not the base pressure due to the
permanent gas being pumped, but the total background pressure due to
10 15 20 25 30 35 40 45 50 55
Temperature ,°C
Fig. 6-15. Vapor pressure as a func-
tion of temperature of various diffu-
sion-pump oils and mercury. Temper-
ature-pressure curves for : ( 1 ) Mercury
;
(2) Arochlor 1254; (3) Narcoil 10; (4)
Edwards 8A Rotary Pump Oil; (5)
G.A.B. Pump Oil 6; (6) Apiezon G;
(7) Silicone 702; (8) Apiezon B; (9)
Apiezon BW; (10) Silicone 703; (11)
tri-TO-cresyl phosphate; (12) di-2-
ethyl hexyl sebacate; (13) Octoil S;
(14) tri-xylene phosphate; (15) Apie-
zon C. [Taken with permission from
D. Latham, B. D. Power, and N. T.
M. Dennis, Vacuum II, 33 (1957)].
242 VACUUM SCIENCE AND ENGINEERING
all causes existing on the high-vacuum side of the diffusion pump. Asdiffusion pumps are normally operated with oil as the working fluid, the
oil decomposes because of local regions of high temperature in the
boiler and the catalytic effect of the metal parts of the boiler chamber.
Some products of decomposition are of lower vapor pressure than the
original fluid and tend to remain in the boiler without evaporating.
Accumulation of tarlike, low-vapor-pressure decomposition products
will eventually clog the jet system. Other products of decomposition
are of high vapor pressure, so much so that they evaporate from the
jet region of the pump and escape condensation on water-cooled baffles.
The base pressure measured under these conditions represents the
equilibrium density of decomposition products on the high-vacuumside of the pump rather than the partial pressure of the gas being
pumped.Most measurements made on the base pressure of oil diffusion pumps
consist ofionization-gauge readings near the inlet of the pump when the
gas flow has been reduced to zero. Since ionization gauges are normally
calibrated for dry air and the readings being recorded in such measure-
ments are due to the ionization of heavy and complex organic molecules
from oil decomposition, no knowledge of the true pressures or molecular
densities corresponding to the ionization-gauge readings is obtained.
However, measurements taken in this manner with different workingfluids, or on different diffusion pumps, are still significant since anionization-gauge reading measures a property of the high-vacuumregion which is related to the electrical breakdown and is of primaryimportance in electronic and electronuclear applications.
Blears^* has investigated the base pressure attainable using various
commonly available diffusion-pump fluids. The measurements weremade in a metal test dome having a diameter about three times that of
the diffusion pump with a set of water-cooled baffles over the pumpinlet to prevent direct backstreaming of hot vapor from the jet region
into the test volume. A standard ionization gauge with the usual
long tubulation was connected to the test volume and a high-speed
or nude ionization gauge, consisting of a standard ionization gauge withthe glass envelope removed, was mounted inside the chamber. Theultimate pressure recorded by the nude gauge was always higher thanthat recorded by the standard gauge by about a factor of 10. Blears
used both a, fractionating and a nonfractionating version of the diffusion
pump and compared the base pressures obtained with various pumpingfluids with those previously published. He attributes the much lower
base pressures reported by others to the adsorption effects within the
standard gauges. His results are given in Table 6-2.
To this list of pump fluids must be added Silicone No. 704 and
VAPOR-JET VACUUM PUMPS 243
Silicone 705 (Dow-Corning Chemical Co.) and OS-124 high-temperature
functional fluid and lubricant (Monsanto Chemical Co.). The use of
the latter as a diffusion-pump fluid was first suggested by Hickman, i*
Silicone 704 and OS-124 have been tested by Batzer'^ in a multistage
Table 6-2. Ultimate Pressure Produced by a Diffusion Pump withVarious Oils*
Expressed in Terms of Equivalent Nitrogen Pressure at 20°C; P in 10"* torr
Oil
Measured valuesValues quoted in
Nonfractionating Fractionatingthe literature
Octoil-S 6.4
14.0
17.0
45.0
225
310
2.9
6.6
9.2
19.0
260
0.01-1.0
1.0
0.1-5.0
Aniezon A. 10.0
Dibutylphthalate . . .
Aroohlor 1254
100
100
* Taken with permission from J. Blears, Proc. Roy. Soc. (London) A188, 62
(1946).
diffusion pump with housing diameter of about five inches. In these
tests a 90° elbow served as a one-bounce baffle which could be main-
tained at about 20°C by passing water through a cooling coil, or at a
much lower temperature using liquid nitrogen. The pressure was
measured by a Bayard-Alpert type of ionization gauge connected to
Table 6-3. Ultimate Pressure Produced Using Silicone 704 and OS-124*
Expressed in Terms of Equivalent Air Pressure at 20°C
OilElbow
cooled byUltimate pressure,
torr
Silicone 704. .. .
OS-124WaterWaterLiquid nitrogen
0.5 X 10-8
1-2 X 10-9
OS-124 0.5-1 X 10-9
* Taken with permission from T. H. Batzer, in 1961 Vacuum SymposiumTransactions (Pergamon Press, London, 1962), pp. 315-319.
the end of the elbow furthest from the diffusion-pump inlet. The
ultimate pressures shown in Table 6-3 were observed. In order to
obtain optimum performance with OS-124 it was necessary to increase
the power input into the pump boiler by nearly a factor of 2 over the
rated power input and to allow the lower end of the pump barrel to
operate at a temperature of 90 to 100°C. The fact that the ultimate
244 VACUUM SCIENCE AND ENGINEERING
pressure decreased by only about 1 x 10-» torr when the elbow was
cooled with liquid nitrogen indicates a very low rate of production of
condensable vapor from the fluid. Whether the results quoted in
Table 6-3 are directly comparable with those in Table 6-2 is doubtful
because of the many differences between the conditions of measure-
ment.
Hickman" has also discussed- the use of the polyphenyl ethers as
diffusion-pump fluids. The chemical structure of these compounds
consists of a number of phenyls linked together by oxygen. BL-10
is a refined mixture of 5-ring polyphenyl ethers made available com-
mercially for use as a diffusion-pump fluid. The vapor pressure at
25°C is reported by Hickman as (1.3 ± 0.3) x IQ-^ torr, but later
samples were predicted to have substantially lower vapor pressure.
Hickman reports attainment of base pressures of 2 to 3 x 10"^ torr
using BL-10 in commercially available diffusion pumps with a room-
temperature baffle. He recommends the combination of two baffles
in series, one at slightly above ambient temperature and the other
cooled by chilled water for the attainment of partial pressure due to
backstreaming vapor of less than lO"" torr. The advantages of the
polyphenyl ethers are claimed to be due to the very high bond energies,
which are among the strongest in organic chemistry.
Latham, Power, and Dennis^'' tested the ruggedness of a number of
commonly used diffusion-pump oils by repeatedly pumping down a
system of a few liters volume and then letting in air with the diffusion
pump still hot but the heater turned off. The sequence was repeated
until the oil decomposed to the extent that the diffusion pump failed.
The fluids are given in Table 6-4 in the order of increasing ruggedness.
The choice between mercury and oil as the working fluid for a
diffusion pump is generally not difficult to make. However, the choice
between the vacuum-distflled hydrocarbons and the many synthetic
fluids is not so easily made. Mercury may be used for practically any
application for which diffusion pumps are required, provided only that
vapor baffles at sufficiently low temperature are used to condense the
mercury vapor which would otherwise be present at the room-tem-
perature vapor pressure of about 2 x 10-^ torr throughout the high-
vacuum region of the system.
For long periods of pumping, the vapor baffles must be designed to
avoid accumulation of frozen mercury in such quantities that the
contents of the boiler eventually are condensed on the baffles and the
pump fails for lack of working- fluid. The difficulty can be avoided bydividing the baffle into two sections, the section nearest the diffusion
pump operating at a temperature just above the melting point of
mercury (— 38.87°C) and arranged so that the condensed mercury
VAPOR-JET VACUUM PUMPS 245
runs back into the pump, and the second baffle at a much lower tem-
perature (such as that of liquid nitrogen), depending upon the accept-
able mercury vapor pressure in the system.
The performance of large mercury diffusion pumps has been in-
vestigated by Power, Dennis, and Crawley." The pumps were of mild
Table 6-4. Fluids Arranged in Ascending Obdeb op Ruggedness*
Fluids
Number of cycles
1st run 2nd run
160
279-307
230
323-359
368-430
530
574-582
491-504
205
376-395
302
566-583
516-583
670-714
Pumps failed because of
decomposition of the
Octoil S* residual oil.
Di-2-ethyl hexyl sebacate
Tri-xylene phosphate ....
G.A.B. Pump Oil 6t
Tri-m-cresyl phosphate . .
tC"areoil 10+ *.. 964-980
1,100
Pumps failed because of
Dow-Corning 703 § total loss of oil to the
backing pump.
Dow-Corning 702 § 500 1,51611 Test discontinued before
failure.
* Taken with permission from D. Latham, B. D. Power, and N. T. M. Dennis
Vacuum II, 33 (1952).
t Vacuum-distilled hydrocarbon oil.
J Di-2-ethyl hexyl sebacate.
§ Methyl polysiloxanes (silicones)
If In the case of Dow-Corning 702 the fluid never broke down, but the tests
were discontinued when half the original charge had been lost into the
forevacuum.
or stainless steel construction of conventional multijet design and of
2M to 24-in. barrel diameter. Since the vapor pressure of mercury
is considerably higher than that of most diffusion-pump oils, the density
of vapor backstreaming from the first jet is much greater than for oil.
In order for gas molecules entering the inlet to reach the first jet, they
must diffuse through this cloud of mercury vapor, the molecular
density of which is generally much greater than that of the gas being
pumped. In the absence of a vapor trap the pumping speed is found
to decrease with the distance above the mouth ofthe pump, as shown in
Fig. 6-16. These curves were taken for three different temperatures
of the condensing surface (25, 19, and 5°C), i.e., the upper portion of the
246 VACUUM SCIENCE AND ENGINEERING
pump barrel. By mildly refrigerating the condensing surface the
mercury vapor pressure throughout the region above the jet is reduced,
thereby reducing also the resistance to gas flow into the pump. The
pumping speed is increased by a factor of 3 or more by cooling the
condensing surface from 25 to 5°C. Power et al. take advantage of
the dependence of pumping speed on the distance above the inlet
Condensing wall temperature [I] 25°C,[2] I9°C,[3] 5%
Measured pumping speed,liters/sec
4,000 8,000 12,000 16,000
Fig. 6-16. Variation of air-pumping speed with distance above inlet flange for
three different cooling-wall temperatures. Curves plotted to scale for pump of
60 cm diameter. [Taken with permission from B. D. Power, N. T. M. Dennis, and
D. J. Crawley, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962).]
by placing the combination of a refrigerated (.~— 30°C) and a liquid-
nitrogen trap above the umbrella nozzle with as little vertical clearance
as possible without seriously obstructing the pump inlet.
Performance of mercury diffusion pumps has been found by many in-
vestigators to depend critically upon the cleanliness of the condensing
wall and of the pump housing generally. Mercury condensation is
seriously impeded by wall contamination, resulting in poor or even negli-
gible pumping speed and a higher than normal mercury vapor pressure
above the jet. Table 6-5 gives some data by Power et al. showing the
mercury back-migration rate and pumping speed for clean, slightly
VAPOR-JET VACUUM PUMPS 247
Table 6-5. Effect of Contaminated Condensing Wall on Back-migbationRate and Pumping Speed*
Wall Temperature 14°C
Wall conditionBack-migration rate,
cm^/hr (liquid)
Pumping speed,
liters/sec
Clean
Slight contamination
Heavy contamination. . . .
1.05
4.3
12.4
800-850750-800
150-200
* Taken with permission from B. D. Power, N. T. M. Dennis, and D. J.
Crawley, in 1961 Vacuum Sym,posium Transactions (Pergamon Press, London,
1962), p. 1218.
4.5
4.0
jf 3.5
13.06
or 2.5
2.0
f 1.5
1.0
contaminated, and heavily contaminated walls; all taken at a wall
temperature of 14°C, using a 9-in. diffusion pump. Back-migration
rate was measured as a function of wall temperature with and without
a water-cooled copper cover with a long skirt reaching down to intersect
a portion of the jet stream, as described by Vekshinsky, Menshikov,
and Rabinovich.^* The results of these measurements are shown in
Fig. 6-17. Power et al. recommendstainless steel for the pump barrel,
cleaned by vapor phase degreasing
or by electropolishing. The effect
of contaminants on the condensing
walls was also observed by Chupp^'
during the development of 24- and32-in. diameter mercury diffusion
pumps made of mild steel. Chuppobserved that thoroughly cleaned
pumps sometimes fail to exhibit
any appreciable pumping speed,
but after a day or two of opera-
tion become "conditioned" so that
mercury is efficiently condensed andthe performance finally comes upto standard. Once conditioned, the
pump operates at a high perform-
ance level indefinitely. An alter-
native precaution found by Chuppto be effective is to copper plate
the inner surface of the pump barrel
where the mercury vapor should
condense. Apparently the slight
0.5
-5 5 10 15 20 25 30
Condensing woll temperoture,°C
Fig. 6-17. Variation of mercury back
-
migration rate with temperature of
the pump condensing wall. [Taken
with permission from B. D. Power,
N. T. M. Dennis, and D. J. Crawley,
in 1961 Vacuum Symposium Trans-
actions (Pergamon Press, London,
1962).]
248 VACUUM SCIENCE AND ENGINEERING
amalgamating affinity between mercury and the copper surface en-
hances the condensing efficiency.
However, the choice of mercury usually means a significantly lower
pumping speed for a given size of diffusion pump. Whether this
disadvantage is due to an inherently lower Ho coefficient (see Sec. 6-5)
for mercury jets, or whether it is merely a reflection of the greater
effort expended in developing oil diffusion pumps is not clear. Even
with this disadvantage there are applications for which mercury is the
preferred diffusion-pump fluid
:
1. In the vacuum deposition of certain materials which are inordi-
nately sensitive to the presence of hydrocarbons, such as rhodium and
semiconducting films.
2. In the evacuation of vessels in which high electric-field gradients
must be maintained. At the University of California Lawrence
Radiation Laboratory large (32-in.-diameter) mercury diffusion pumps
are used on many particle accelerators and certain other electronuclear
machines in preference to oil diffusion pumps. Surface contamination
by oil films results in deterioration of the attainable voltage gradient,
probably because of the decomposition products remaining on the
surfaces after repeated vacuum sparking.
3. In systems in which a very high forepressure is an advantage,
either because of unusually large throughput or because of the choice
of the backing pump, e.g., a steam ejector.
4. For pumping highly reactive chemical vapors which might
decompose diffusion-pump oils. Mercury, being an element, is the
most rugged of the diffusion-pump fluids in the sense that it cannot be
decomposed by overheating or by chemical action.
5. For evacuation of mercury vapor electron tubes, such as rectifiers,
ignitrons, and thyratrons. For these applications a vapor trap is not
required since the finished tubes contain pools of mercury to be partly
vaporized during operation.
Oil diffusion pumps have the distinct advantage of simplicity for
the many applications in which the desired operating pressure caiT.be
maintained with a simple water-cooled baffle and no refrigerated trap.
Operating pressures down to 10"^ torr can easily be attained in this
manner, and with care in selection of the fiuid down to about 10~^
torr. Below 10"^ torr a refrigerated trap in addition to the water-
cooled baffle must usually be provided. The baffle arrangement
sometimes used is similar to that described for mercury, the baffle
nearest the pump maintained at a temperature of —30 to —40°C
by a refrigerator, and the second baffle at a much lower temperature.
VAPOR-JET VACUUM PUMPS 249
e.g. that of liquid nitrogen. In any case there are many applications
for which oil is the preferred diffusion-pump fluid
:
1. In general-purpose vacuum-pumping systems for laboratory andsmall production applications.
2. For the evacuation of most types of transmitting electron tubes,
klystrons, and magnetrons.
3. For the evacuation of particle accelerators in those cases in which
the voltage gradient requirement is not too severe. Most cyclotrons,
betatrons, and electron and proton synchrotons are oil-pumped, but
with the addition of liquid-nitrogen-cooled vapor baffles.
4. In vacuum coating and sputtering systems.
5. In vacuum molecular stills and fractionating columns.
6. In the vacuum purification of metals, as in vacuum melting and
casting, electron beam melting, and vacuum zone refining.
6-5. Pumping Speed of Diffusion Pumps. In the normal
operating pressure range the action ofa diffusion pump can be compared
with that of a somewhat imperfect hole into a region of zero pressure.
This behavior can be understood in terms of the incidence of gas
molecules on the surface of the vapor jet and the process by which
some fraction of them are trapped by the jet and carried into the
forevacuum region. Each gas molecule that approaches the vapor-jet
surface experiences collisions with heavy vapor molecules. If the
pressure at the inlet of the pump is low as compared with the vapor
pressure of the jet because of its local temperature, the jet will expand on
leaving the nozzle. The boundary layer of the jet consists in part of
vapor molecules which diverge outward and upward from the main
body of the jet and impede penetration of the jet by gas molecules.
However, some fraction H of the gas molecules incident on the jet
surface penetrate the boundary layer and are captured by the jet.
The value of H depends upon the detailed structure of the boundary
layer. If A is the pumping aperture (i.e., the surface area through
which gas molecules enter the vapor jet from the inlet) then the rate
of incidence of gas molecules on this surface is, according to (1-31),
vA = Hn.VavA (6-29)
The rate at which gas molecules are trapped and pumped by the jet is
thus
q = HvA = HHn^v^vA (6-30)
The pumping speed is defined as the volume of gas at inlet pressure
pumped per unit of time. If Q denotes the gas-flow rate as defined in
(2-18), then the pumping speed is obtained by dividing the molecular
250 VACUUM SCIENCE AND ENGINEEEING
flow given in (6-30) by the molecular density, so that
(6-31)
in which Pj represents the partial pressure at the inlet of the gas being
admitted at the flow rate Q. The existence of other gas components
which contribute additional background pressure at the pump inlet,
such as backstreaming vapor from the jet and outgassing from the
walls of the vacuum chamber, has nothing directly to do with the
pumping process and should, therefore, be ignored in the determination
of the pumping speed. By substituting the value of Wav from (1-23)
into (6-31) one obtains for the pumping speed
ITV= 3.64 X \0^H[— \ A cm^/sec
liters/sec= 'Mm) ^
which for air at room temperature (20°C) becomes
8^ = \\.%EA liters/sec
(6-32)
(6-33)
when the pumping aperture A is measured in square centimeters.
Because the surface of the vapor jet is diffuse and its area therefore
difficult to define, the cross section of the annulus between the nozzle
and the pump housing is normally taken as the pumping aperture A.
The coefficient R appearing in the above equations is a measure of the
efficiency of the pump and is referred to as the Ho coefficient. ^^ As-
suming that the Ho coefficient is independent of the molecular weight
of the gas being pumped, Eq. (6-32) implies that the pumping speed
of a diffusion pump should be inversely proportional to the squall
root of the molecular weight of the gas. This proves to be approxi-
mately true for some pump designs, but is by no means consistently
the case, particularly for multistage pumps with closely spaced jets.
For example, results reported by Noller, Reich, and Bachler^i obtained
for the pumping speed of a multistage diffusion pump, with a liquid-
nitrogen-cooled vapor trap, for hydrogen and air yield a ratio of 2.25
instead of 3.8. Stevenson^^ reports a factor of only 1.2 between the
pumping speed for hydrogen and that for air.
Equation (6-32) also implies that the pumping speed of a diffusion
pump is independent of the pressure. This is indeed very nearly the
VAPOR-JET VACUUM PUMPS 251
case when the pressure substituted into (6-31) is the partial pressure
of the gas admitted at the measured flow rate Q. The performanceof a typical four-stage diff'usion pump of modern design when pumpingair is shown graphically in Fig. 6-18. The solid curve represents thetrue pumping speed for air as a function of the pressure ; each pointon the curve was obtained by substituting the measured flow Q of air andthe corresponding pressure Pj in the
equation
Q„ „ (6-34)S„
^ 1.600
i. 1,200
800
400
r
^'-
^/
1
/ V\
/
\/
F^,
10" 10'" 10'' 10'^ 10'^ 10'
Inlet pressure, torr
where Pj is the inlet pressure
measured with either a McLeodgauge or an ionization gauge whenthe flow rate is Q, and Pq is the base
pressure of the pump when the flow
rate is zero. The base pressure Pg is
made up of backstreaming diffusion-
pump vapor, products of decomposi-
tion of the oil vapor, and permanentgas arising from outgassing of surfaces
on the inlet side of the pump. The difference between Pj and Pq is
due to the flow of air admitted at the inlet and is therefore equivalent
to Pi in (6-31).
The dotted curve in Fig. 6-18 is obtained by deflning the apparent
pumping speed as
Q
Fig. 6-18. Pumping speed as a
function of inlet pressure for a
typical 6 -in. oil diffusion pump.
W„ = (6-36)
which has generally been used in commercial practice, instead of the
true pumping speed. The apparent pumping speed given by (6-35)
becomes zero at the base pressure Pq. However, the true pumpingspeed obtained by using Eq. (6-34) is found to be independent of the
pressure for as small a value of the leak for which the pressure diff"erence
Pj — Pj can be reliably measured.
The validity of Eq. (6-34) in giving the true pumping speed is
emphasized by the measurement of the pumping speed through a
liquid-nitrogen-cooled vapor trap installed at the inlet of the pump.Figure 6-19 shows the conflguration of the trap and Fig. 6-20 the
resulting performance curve. The base pressure of the pump is nowreduced by a large factor by the condensation of the condensable
vapors from the pump oil. It is therefore possible to carry the
measurement of the pumping speed of the pump plus the vapor trap
252 VACUITM SCIENCE AND ENGINEERING
to much lower values of the leak rate. The expected pumpingspeed for air is that of the untrapped pump combined with the con-
ductance of the trap
or
1
8
S =
1 1
8p C,
8^ C,(6-36)
in accordance with (2-8). Note
that the measured pumping speed
for the combined diffusion pumpand cold trap as shown in Fig.
6-20 reaches a peak value at about10~^ torr and then decreases with
decreasing pressure to a value
which is then independent of the
pressure to values of the pressure
substantially less than the base
pressure of the pump without the
trap.* This would not be the
case if the true pumping speed for
air were zero at the base pressure
for the untrapped pump. Consis-
tent with the theoretical results
discussed in Sec. 6-3, indicating
that a very high zero-flow com-
pression ratio for the gas being
pumped by a jet pump is to be
expected, the true base pressure
in terms of the partial pressure of air due to migration back through
the jet is apparently always low as compared with the background
pressure due to outgassing and other factors. This being the case, the
true pumping speed should be essentially independent of the pressure
for many decades in pressure. Noller, Reich, and Bachler^^ have meas-
ured the pumping speed for air and hydrogen of a multistage diffusion
pump with a liquid-nitrogen-cooled trap over the range from 10~^ to 10~"
torr and observed a decrease in pumping speed of only about 20 per
* The peak in the curve at relatively high pressure arises from the fact thatthe annular clearances in the vapor trap are of the order of 2 in., which is com-parable with the mean free path at a pressure of 10~* torr. As the pressureincreases in this range, the conductance for the trap is no longer that for truemolecular flow but increases with the pressure as expected (see Chap. 2) in thetransition range.
Fig. 6-19. Cross section of vapor trap
mounted on 6-in. diffusion pump.
VAPOE-JET VACUUM PUMPS 253
600
,200/ I
800 ^y \\
400 \
^ _j10"' 10"^ 10"=' 10'" 10"^
Inlet pressure.torr
10"'
cent. Whether the observed slight decrease with decreasing pressure
is real or instrumental is a valid question in view of the difficulty of the
measurement at pressures as low as 10~* torr.
The principal difference between the measured pumping speeds of
diffusion pumps and that implied by (6-32) is that the pumping speed
is not necessarily inversely proportional to the square root of the
molecular weight of the gas. The pumping speed for hydrogen should
be greater than that for air by a factor of 3.8, but for most multistage
diffusion pumps the factor is consider-
ably smaller. One may conclude that
the Ho coefficient // is a function of
the molecular weight of the gas and
more specifically that H decreases
with molecular weight. There is someevidence that the difficulty arises be-
cause of an insufficient quantity of
vapor flowing through the flrst-stage
nozzle. Since for hydrogen the molec-
ular velocity is greater and the colli-
sional cross section smaller than for
air, the effectiveness of the first-stage
jet may be good for air and poor for
hydrogen as is implied by the remarks
at the end of Sec. 6-3. In this case the pumping speed for hydrogen
would be primarily determined by the second-stage jet for which the
aperture is smaller. Since commercial diffusion pumps are usually
rated on the basis of maximum pumping speed for air with minimumbackstreaming of oil vapor, the optimum jet design tends toward
minimum effective vapor flow through the first-stage nozzle compatible
with high pumping speed for air. This criterion may automatically
ensure insufficient vapor flow for pumping gases of low molecular
weight, such as hydrogen and helium. Results reported by Normand^^
on the pumping speed of a commercial diffusion pump show a normal,
smooth performance curve for air with a pumping speed of about 320
liters/sec over the range from 5 x 10"^ to 2 x lO"' torr, but an erratic
behavior when pumping hydrogen. The pressure fluctuations were
such that the pumping speed varied rapidly over the range from about
320 to 480 liters/sec.
The Ho coefficient is not necessarily the best figure of merit for
diffusion pumps, as has been pointed out by Stevenson. ^^ The area
A referred to in (6-32) is the cross-sectional area of the annular space
between the first-stage nozzle and the pump housing. A design which
requires a large diameter nozzle may have a high Ho coefficient in —
Fig. 6-20. Pumping speed as a
function of inlet pressure for
diffusion pump (Fig. 6-18) with
vapor trap (Fig. 6-19).
254 VACUUM SCIENCE AND ENGINEEBING
terms of the small pumping aperture which remains but a small
pumping speed for the diameter of the pump. Stevenson suggests
that a better criterion is the speed factor defined in terms of the
pumping speed for air as
S^ M'^
3.64J„ T
U.6A,for air at 20°C (6-37)
similar to the definition of the Ho coefficient H in (6-32) and (6-33)
except that A^ is the cross-sectional area of the pump housing rather
than the annulus. This definition is consistent with the Knudsen andClausing conductance factors discussed in Chap. 2. For the particular
pump developed by Stevenson the Ho coefficient was found to be 0.51
and the speed factor as defined by (6-37) was 0.45.
6-6. Limiting Forepressure for Diffusion Pumps. In Fig.
6-13 the behavior of a vapor jet as a function of the forepressure is
illustrated. When the forepressure is sufficiently high, the shock
front, which is the boundary between the jet composed of directed
vapor molecules and the randomized region of forevacuum vapor andgas, contracts to the point where the jet fails to bridge the pumpingaperture. When this condition is reached, there is direct communi-cation between the forevacuum and high-vacuum sides of the jet andeffective pumping ceases.
The forepressure limit of a diffusion pump may be explored either byincreasing the flow rate Q through the pump or by increasing the fore-
pressure (e.g., by admitting an increasing flow of gas into the forevac-
uum region) with a constant or zero flow of gas into the diffusion-pump
inlet. In the former method the pumping speed of the pump is found
to be independent of the pressure until the forepressure limit is ap-
proached. The pumping speed then decreases rapidly with increasing'
flow and finally reaches the pumping speed of the forepump. Thecurve in Fig. 6-18 shows the decrease in pumping speed as the fore-
pressure reaches the limiting value. This effect can be presented moredramatically by plotting for a constant throughput Q, the inlet pressure
as a function of the forepressure controlled by admitting air into the
forevacuum region, as is done in Fig. 6-21. In this latter method the
inlet pressure is found to be independent of the forepressure over a
wide range and then to increase rapidly as the forepressure is increased
beyond a critical value. The value of the forepressure at which theinlet pressure has increased above its normal value by 10 per cent canbe used as an arbitrary definition of the limiting forepressure. Thelimiting forepressure as a function of the flow rate or throughput
VAPOR-JET VACUUM PUMPS 255
(Q = PSJ,)
is shown graphically in
Fig. 6-22 for the pump used in
obtaining the performance curves
shown in Figs. 6-18, 6-20, and 6-21.
The zero-flow limiting forepressure
is independent of the pumping
speed of the forepump and is there-
fore a useful standard for comparing
diffusion pumps.
The limiting forepressure of a
diffusion pump depends upon a
number of factors of which the
following may be listed
:
1. Clearances between the nozzle
and housing, particularly of the
final stage; the smaller clearance
generally giving the higher limiting
forepressure
2. Vapor pressure of the work-
ing fluid ; the higher vapor pressure
giving the higher limiting fore-
pressure
3. Power input into the boiler;
the greater power input giving the
higher limiting forepressure
10"
10"
^ 10"
- 10'
10"
10'
0,100 0.200 0.300 0.400 0.500
Forepressure, torr
Fig. 6-21. Inlet pressure as a function
of forepressure with a constant value
of throughput for a 6-in. diffusion
pump.
/
= 1,440 torr iters/sec
Q = 144 tor liters/sec/
Q = 14.4 torr liters/sec /
Q= torr liters /sec/
Optimum design and operating conditions for a multistage diffusion
pump are a compromise between these factors and others, such as the
rates of decomposition and backstreaming of the working fluid. In
Fig. 6-23 are curves of inlet pressiu-e
as a function of forepressure with
constant throughput for various
values of the power input. It will
be noted that for power input
appreciably above that recom-
mended for normal operation the
pumping speed for low gas flow
decreases as the power input and
limiting forepressure increase.
Increase in the power input,
and therefore the temperature and
density of the vapor in the first-
stage jet, causes greater expansion
lo.6
5 0.5
|o.4>£ 0.3
B 0.2
lo.i
^s
_Iff
,-2 2 3 5 7 ]Q-I 2 3 5 71 10
Throughput, torr liters/sec
Fig. 6-22. Limiting forepressure as a
function of throughput for 6-in.
diffusion pump.
256 VACtrUM SCIENCE AND ENGINEERING
of the jet in leaving the nozzle and therefore more vapor molecules
adversely directed on the surface of the jet exposed to the high vacuum.
The result is a greater proportion of gas molecules knocked away from
the jet by backward-moving vapor molecules before penetrating to the
core of the jet where they can be
propelled toward the forevacuum.
The first-stage jet must withstand
not only the back pressure due to
the gas being pumped, but also
the higher vapor pressure from
the subsequent jets. The result
is a change in the jet form which
contributes to the condition men-
tioned above. Also, in the case of
organic fluids, as contrasted with
mercury for producing the work-
ing vapor, the diecomposition rate
increases rapidly with tempera-
ture. Some of the components of
the decomposition are permanent
gases in the sense that they do not
condense at any convenient trap
temperature, and others are of
comparatively high vapor pres-
sure. These contaminants con-
tribute further to the decrease in
the net pumping speed as the
boiler temperature is increased.
A high limiting forepressure is
important but not because of any
difficulty in attaining sufficiently
low pressure with mechanical
backing pumps to meet the re-
quirements at low gas flow. A high limiting forepressure permits
the continued operation of a vacuum system at the full pumping speed
of the diffusion pump for a high gas flow or throughput with a backing
pump of modest capacity. Since the throughput is Q = PS^,, thenat the limiting forepressure for the diffusion pump the forepump speedmust be
10"
10"
o 10"*
^10
10"'
10"
0,100 Q200 0.300 0.400 0.500
Forepressure, torr
Fig. 6-23. Inlet pressure as a function
of forepressure for various values of
power input for a 6-in. diffusion
pump.
o or<S
O
o
ooro
1
—CO T3- o
0\J
- o —
§- o,
—
oo o
* * *o o o
J J J
Q.torr liters/sec
OOo_
;
- o c
o o o 5
o o o £O _0 C\J ^
7 77 ?Q,torr liters/sec
^ I
(6-38)
m order to maintain operation in which P, is the limiting forepressure.
VAPOB-JET VACUUM PUMPS 257
The larger Pj is, the smaller need 8^, be to meet this requirement.In Fig. 6-23 on the left is the throughput as a function of inlet
pressure, showing the maximum reached at that value of the inlet
pressure for which the forepressure is equal to its limiting value. Fromthis characteristic of the diffusion-pump performance and a knowledgeof the maximum throughput to be expected the required capacity
of the forepump can be determined from (6-38). Alternatively, in abatch-processing system in which a short roughing-down time is
important, the high limiting forepressure permits transfer from the
relatively low pumping speed of the mechanical pump to the high
speed of the diffusion pump at an earlier point in time. For systems
of high throughput or of frequent pumpdown a high limiting fore-
pressure contributes to economy and efficiency.
In order to increase further the maximum throughput without
increasing the size of the mechanical backing pump, an additional
vapor-jet pump may be inserted at the exhaust of a diffusion pump.Two types of vapor-jet pumps using working fluids of higher vapor
pressure than those normally used in diffusion pumps have been
developed for this purpose, the booster diffusion pump and the oil-
vapor ejector pump. The former is similar in design to a diffusion pumpexcept that the jet clearances are smaller and the number of stages
is usually only two. The latter resembles the steam ejectors described
at the beginning of this chapter, having a converging-diverging nozzle
and a diflfuser. The designs of booster diffusion and oil ejector pumpsare optimized for fluids such as butyl phthalate, butyl sebacate, high-
vapor-pressure hydrocarbons, chlorinated hydrocarbons, and ethyl
or propyl phthalate. Limiting backing pressures are typically of the
order of 0.5 torr for booster diffusion pumps and several torr for oil-
vapor ejector pumps. In addition to their usefulness in backing
diffusion pumps, boosters and ejectors are effective in rough vacuumapplications such as vacuum distillation of organic materials and
vacuum degassing of metals.
6-7. Factors Contributing to tlie Ultimate Pressure of a
Diffusion Pump. The ultimate pressure of a diffusion pump is the
inlet pressure which the pump maintains with zero gas flow. This
definition is incomplete because the conditions of measurement are
not defined. The use of low-vapor-pressure oil instead of mercury
as a working fluid makes it possible under many circumstances to use
water-cooled baffles without a refrigerated trap for obtaining a suf-
ficiently low base pressure for many applications. Because of the
convenience of this type of operation it has become customary to define
the ultimate pressure of an oil diffusion pump as the ionization-gauge
reading obtained in a test dome protected from the direct backstreaming
258 VACUUM SCIENCE AND ENGINEERING
vapor from the pump by a simple water-cooled baffle. For such
measurements the air calibration of the ionization gauge is normally
used, even though the residual gas remaining in the test dome is not air
but is a mixture of gaseous and vaporous products of decomposition
from the diffusion-pump fluid, as was briefly mentioned in Sec. 6-4.
Some of the factors which in-
fluence the ultimate pressure as
defined above are
:
1. Backstreaming of vaporized
working fluid from the diffu-
sion pump.
2. Decomposition of the working
fluid with the evolution of com-
ponents which in part consist
of condensable vapors of high
vapor pressure and of perma-
nent gases.
3. Release in the vapor jet of
forevacuum gases dissolved in
the working fluid after conden-
sation and carried into the
boiler by the circulating fluid.
4. Outgassing of surfaces on the
high-vacuum side of the pump.
Some aspects of the back-
streaming of diffusion-pump
fluid from the jet region have
already been briefly discussed
in Sec. 6-4. The results of a
comprehensive study of the
backstreaming problem have
been published by Power arid
Crawley.2* They report that for a diffusion pump of typical design
at the time of their investigation the sources of backstreaming
vapor could be identified as indicated in Fig. 6-24 as
a. The leakage of vapor around the nut with which the "umbrella"
for the first jet was secured to the center post.
6. The wetting of the umbrella of the first jet by condensation of
vapor on the lip followed by evaporation.
c. The scattering of some oil molecules upward toward the inlet
of the pump by collision processes in the first-stage jet.
d. The evaporation of oil vapor and spitting of oil droplets up
Fig. 6-24. Sources of vapor back-
streaming in a diffusion pump.[Taken with permission from B. D.
Power and D. J. Crawley, VacuumIV, 415 (1954).]
VAPOR-JET VACUUM PUMPS 259
Copper supporting arm
through the annular space between the nozzle structure and the
pump housing from the free surface of oil in the reservoir.
e. The evaporation of oil vapor from the region of the pumphousing where the first-stage jet impinges and is intended to
condense.
The leakage of vapor from source (a) was easily eliminated by providing
an unperforated cap and attaching it to the center post from below.
Wetting of the lip of the umbrella
of the first-stage jet (6) was found
to result from condensation of the
working fluid on the bottom sur-
face of the nozzle cap due to the
continual loss of heat by radiation.
Heating the umbrella cap was found
to eliminate "wet running" and
reduce the backstreaming substan-
tially. They found that evapora-
tion and spitting from the region
of the oil reservoir {d) could be
eliminated by proper design of the
boiler. The remaining sources of
backstreaming (c) and (e) from the
region of the flrst jet and the region
of its impingement on the condens-
ing wall were found to be substan-
tial. Working on the hypothesis
that the boundary layer of the jet
adjacent to the nozzle surface consists largely of vapor molecules some-
what randomized in direction because of collisions with the nozzle sur-
face, as illustrated in Fig. 6-11, they devised a water-cooled guard ring,
one form of which is shown in Fig. 6-25, to intercept and condense the
randomly directed vapor molecules originating in the boundary layer.
When the bottom rim of the cap extends sufficiently below the lip of
the nozzle to intercept a significant portion of the jet, the back-
streaming is found to be reduced by a factor of 10 to 30, depending
upon the design of the pump tested. Except in pumps of small bore,
the pumping speed is not reduced by addition of the cooled guard ring.
Vekshinsky, Menshikov, and Rabinovichi* described the use of a
water-cooled cap with a long skirt placed over the first-stage nozzle
and reaching down far enough to intercept the boundary layer of the
jet to reduce the backstreaming, as illustrated in Fig. 6-26. The func-
tion of the cap is identical with that of the guard ring described by
Power and Crawley.
Fig. 6-25. Water-cooled guard ring
to repress backstreaming from diffu-
sion-pump jet. [Taken with per-
mission from B. D. Power and D. J.
Crawley, Vacuum IV, 415 (1954).]
260 VACUUM SCIENCE AND ENGINEERING
The thermodynamic principles involved in the performance of a
diffusion-pump boiler and nozzle system in producing vapor jets were
examined theoretically and experimentally by Smith. ^^ Observation
of the temperature of the oil in the boiler and that at various locations
on the vapor stack and nozzle system showed that the stream issuing
from the nozzles in a typical commercial oil diffusion pump is a mixture
of vapor and condensed fluid due to contact with relatively cold surfaces
in the stack and nozzle assembly. The "wet running" referred to by
Power and Crawley above was therefore attributed to condensation on
these cold surfaces.
Fig. 6-26. Water-cooled cap
over diffusion-pump nozzle to
repress backstreaming. [Taken
with permission from S. A.
Vekshinsky, M. I. Menshikov,
and I. S. Rabinovich, Vacuum 9,
201 (1959).]
Enthalpy
Fig. 6-27. Curve of enthalpy as a
function of temperature for diffu-
sion-pump fluid. [Taken with per-
mission from H. R. Smith, in 1959
Vacuum Symposium Transactions
(Pergamon Press, London, I960).]
Smith points out that a minimum requirement for the formation of a
well-defined supersonic jet is for the oil vapor to be everywhere abovfe
the vapor-mixture line on the enthalpy diagram as represented by
point 3 in Fig. 6-27, corresponding to superheated vapor. The amount
of superheating desired is such that in expanding through the nozzle
the vapor temperature does not drop below that corresponding to
point 1 in Fig. 6-27 on the vapor-mixture line. Cooling to a lower
temperature corresponding to point 2, which is in the mixture zone,
during expansion through the nozzle will result in some condensation
with the formation of droplets of oil in the jet stream and a deposit
of a film of liquid oil on the nozzle surfaces.
Another requirement discussed by Smith is the generation of sufficient
VAPOE-JET VACUUM PUMPS 261
vapor in the boiler to maintain the pressure required by the nozzles
of the diffusion pump. It is noted that the boiler temperature for the
particular diffusion pump tested increased more than it should for agiven increase in power input if the Clausius-Clapeyron equation for
change of state and the Langmuir equation for the rate of vaporization
both apply to the fluid. The conclusion reached as a consequence of
these tests was that the pump boiler did not provide adequate surfaces
of proper geometry to promote the generation of vapor at a rate highenough to supply the jets at the normal rate of evaporation. In-
creasing power input instead of increasing the rate of evaporation by asigniflcant factor raised the temperature of the oil by more than the
appropriate amount.
By providing a tubular radiant heater down through the center of
the jet assembly above the level of the oil and a separate heater
attached to the top umbrella, the nozzle assembly could be kept
at higher temperature than the oil in the boiler and the vaporthus superheated. As a consequence of these changes Smith found
that the peak pumping speed of the pump was about one-third greater
and the base pressure typically reduced by a factor of 2.5 as comparedwith the performance of the pump without the axial superheater andtop nozzle heater in operation.
Another approach to the problem of jet formation is that described
by Florescu,* who has developed a special coaxial nozzle illustrated
in Fig. 6-28. The nozzle consists of a central cylindrical section which,
because of the lack of any expansion, produces a dense, low-velocity jet
core and an outer de Laval type of expanding nozzle which produces a
supersonic jet of low density. According to the author, the coaxial
nozzle reduces backstreaming substantially but at the same time
provides the high-density core necessary for effective pumping against
a high forepressure. The coaxial nozzle had not been incorporated
in any commercial diffusion-pump design of which the author wasfamiliar at the time of writing this section.
In two excellent papers Hablanian and his colleagues^*'^' have
reported results on the backstreaming rates and the sources of back-
streaming vapor for diffusion pumps of improved design. Theymeasured the backstreaming rate for a 6-in. diffusion pump with the
apparatus shown in Fig. 6-29. The backstreaming oil vapor wascaught on the walls of a chamber mounted on the pump with a flange
cut conically at the top to admit all oil molecules leaving the rim of the
top nozzle and flying directly out of the pump inlet. The oil ac-
cumulation drained into the calibrated collector was measured period-
ically during each run. With the flrst-stage nozzle, as illustrated in
Fig. 6-29, the backstreaming rates shown in Fig. 6-30 were obtained.
262 VACUUM SCIENCE AND ENGINEERING
Fio. 6-28. Coaxial diffu-
sion-pump nozzle. [Takenwith permission from N.A. Florescu, Vacuum 10,
250 (I960).]
Ion gouge
Collector'
Fig. 6-29. Apparatus for backstream-
ing measurements. [Taken with per-
mission from M. H. Hablanian andH. A. Steinherz, in 1961 VacuumSymposium Transactions (PergamonPress, London, 1962).]
.0.04
;0,02
V
Dry dome /50
Time.hr
100
Fig. 6-30. Backstreaming rates
measured by two different tech-niques showing eventual agreementbetween the methods after sufR-ciently long running time. [Takenwith permission from M. H. Hab-lanian and H. A. Steinherz, in 1961Vacuum Symposium Transactions(Pergamon Press, London, 1963).]
1
Speed
\" \- \
\Bockst——•—reoming
05
D 2D
Distance from pump inlet
Fig. 6-31. Effect of length of
connecting pipe on backstreamingrate. [Taken with permission fromM. H. Hablanian and H. A. Stein-
herz, in 7967 Vacuum Sym,posiumTransactions (Pergamon Press,
London, 1962).]
VAPOR-JET VACUUM PUMPS 263
IT
IT
Bockstreoming
foctor
1
05 to 03
When the chamber was thoroughly cleaned before the run, the curvelabeled dry dome was obtained; whereas when the inner surfaces of thechamber were dehberately wetted in advance with diffusion pumpoil, the curve labeled wet dome resulted. It may be seen that aboutforty hours of operation were required to reach a steady rate with thewet dome, but nearly twice that long was required with the dry dome.The authors emphasize the need for long periods
of operation to reach equilibrium rates in experi-
ments of this type.
By inserting lengths of pipe between the collect-
ing chamber and the pump, the dependence of the
backstreaming rate on the length of connecting
pipe was measured, with results shown in Fig.
6-31. The decrease in pumping speed due to the
added lengths of connecting pipe is also shown.The insertion of a length of pipe equal to 1.5
diameters of the pump reduces backstreaming to
only about 2.5 per cent of the original value,
whereas the pumping speed is reduced to about63 per cent. Thus for the simple,uncovered first-
stage nozzle used in these tests the backstreamingrate could be reduced by a large factor by in-
sertion of a length of connecting tubing withoutexcessive loss in the resulting pumping speed.
The effect of various cold-cap shapes added to
the original simple first-stage nozzle is shown in
Fig. 6-32. For the type of water-cooled capadopted as standard the reduction in backstream-ing rate was a factor of 0.02 to 0.01. Applyingthis factor to the asymptotic results shown in Fig. 6-30, one obtained0.024 to 0.012 mg/cm^ hr as the backstreaming rate for the pumpwith optimized cold cap, which is said not to impair pumping speed.
This backstreaming rate is of the same order as, but slightly smaller
than, that reported by Hickman^" for a pump of similar improveddesign.
Hablanian and Steinherz^" have also reported results on the back-streaming rate as a function of inlet pressure which show a rapid
increase with pressure as the pressure exceeds lO^^* torr. The results
are shown in Fig. 6-33, in this case using a 32-in. diffusion pump and adifferent tjrpe of collecting system. The change in backstreamingrate is negligible with increasing pressure until the inlet pressure
reaches 10-^ torr; then the rate increases by more than a factor of
1,000 as the inlet pressure increases from 10^^ to 10-^ torr. In systems
0.5 to I
02 to 015
O02to0.01
Fig. 6-32. Effect of
cold-cap configura-
tion on backstream-
ing. [Taken with per-
mission from M. H.Hablanian and H. A.
Steinherz, in 7967
Vacuum Symposium,Transactions (Perga-
mon Press, London,1962).]
264 VACUUM SCIENCE AND ENGINEERING
requiring contaminant-free operation the need for avoiding high-
pressure operation of the diffusion pumps is emphasized by these
results, which are more quantitative but entirely consistent vi^ith
previous results, such as those of Power and Crawley.^*
In a study of the remaining sources of backstreaming in a diffusion
pump with a water-cooled cap over the first-stage nozzle, Hablanian
1,000
100
10 r
0.1
*
/:
/
/
=
//
/
/
" •—
-
/
//
10"^ 10"^ 10"^ 10"' 10"2 10"'
Inlet pressure, torr
Fig. 6-33. Backstreaming rate vs.
inlet pressure for a 32-in. diffusion
pump (fluid: Narcoil 40). [Taken
with permission from M. H. Hab-lanian and H. A. Steinherz, in 19C)1
Vacuum Symposium TransacHofis
(Pergamon Press, London, 1962).]
-6-in, diffusion pump (HS-6-1500)
Fig. 6-34. Experimental arrangement
for detection of backstreaming source.
[Reprinted with permission from TheMacmillan Company from M. H. Hab-lanian, in 1962 Vacuum Sym,posium
Transactions. Copyright © 1962 byAmerican Vacuum Society.]
uses a pinhole camera technique, as illustrated in Fig. 6-34. His
conclusion is that the remaining major source of backstreaming is
the region of the jet around the edge of the cold cap.
Decomposition of the working fluid in an oil diffusion pump always
occurs at operating temperature, the decomposition rate depending
upon a number of factors. In Sec. 6-4 various fluids are rated in
terms of their relative ruggedness. In all cases, as one should expect,
the decomposition rate increases rapidly with the boiler temperature.
The heat transfer area in contact with the oil is an important design
parameter which has recently received critical study. Several ob-
servers have noted the occurrence of eruptive boiling resulting froman insufficient heat-transfer area. The heat of vaporization for the
VAPOR-JET VACUUM PUMPS 265
Glass tape I «O.OI4in
vapor flow required by the jets determines the power input necessary
for effective pumping. The power density must be relatively low in
order to avoid local hot spots resulting in a high decomposition rate
and eruptive boiling. Erratic pressure surges, excessive backstream-ing, and poor average base pressure are observed in the performanceof most of the older types of oil diffusion pump. Stevenson^^ describes
a major advance in boiler design, in which the heat-transfer area is not
only large as compared with that of
previous designs but is in the form
of hot baffles which extend up above
the fluid level, providing flash heat-
ing of droplets thrown up from the
fluid and superheating of the vapor.
Stevenson reports a much lower
rate of decomposition, broader
pumping-speed curve, higher peakpumping speed, and higher limiting
forepressure than were obtained
with heater systems previously
used. A further advance in heater
design for diffusion pumps is re-
ported by Milleron and Levenson.^*
Their heater consists of a corru-
gated strip of Nichrome woundinto a spiral with a strip of glass
tape to provide insulation between
adjacent turns. The heater, as shown in Fig. 6-35, is operated only
partially submerged at the surface of the oil. Even with a high rate
of evaporation from the surface, the oil below the heater remains
relatively cool.
Stevenson^' has demonstrated a pronounced effect of the shape of the
first-stage nozzle upon the backstreaming rate of a diffusion pump.Backstreaming from the first-stage vapor jet may be thought of either
as a random scattering of some of the oil molecules toward the pumpinlet or as the directed expansion of a coherent supersonic vapor jet
into a region of relatively low surrounding gas pressure, both of which
processes are illustrated schematically in Fig. 6-36 from Stevenson's
paper. The distribution of backstreaming vapor from the jet wasmeasured by catching the condensed vapor as it drained down the wall
of the extended pump casing into a series of gutters arranged at several
heights above the pump nozzle, the first gutter being located at the
same height as the lip of the pump nozzle, as shown in Fig. 6-37.
The apparatus also provided means of draining off the oil vapor
Nichrome 1 xO.OOl in.
Fig. 6-35. Diffusion-pump heater of
Milleron and Levenson. [Taken with
permission from X. Milleron and L.
L. Levenson, in 1961 Vacuum Sym-posium Transactions (PergamonPress, London, 1962).]
266 VACUUM SCIENCE AND ENGINEERING
o
c
o
o
o
Directional scottering from this
portion of the coherent vopor jet
Random scattering
o
D
Fig. 6-36. Nature of backstreaming.
[Reprinted with permission from TheMacmillan Company, from D. L.
Stevenson, in 1963 Vacuum Sym-posium Transactions. Copyright ©1963 by American Vacuum Society.]
Return line to boiler
Fig. 6-37. Schematic diagram of test
apparatus for measuring amount anddistribution of backstreaming. [Re-
printed with permission from TheMacmillan Company, from D. L.
Stevenson, in 1963 Vacuum Sym,posium,
Transactions. Copyright © 1963 byAmerican Vacuum Society.]
condensed on the top of the test chamber. The oil flow from each of
the collecting surfaces was conveyed by a tube to a separate buret
so that the accumulation during a specified period of time could bemeasured. The backstreaming total rate was measured as a function
of the angle of the lower member of the nozzle, as shown in Fig. 6-38.
The angle of the conical surface of the lower member of the nozzle
was varied from +15° (protruding) to —45° (receding) relative to the^
vertical. Curve A was obtained with normal heater power input andcurve B with heater input reduced about 18 per cent. The dotted
curves are corrections to curves A and B due to a measurement of
the backstreaming contributed by the lower jets of the pump. It is
apparent from these results that the total backstreaming rate is reducedby a factor of about 5 by changing the angle in question from + 15° to
— 45°. The distribution of relative rates of backstreaming as deter-
mined by readings on the separate collection burets is shown in Fig.
6-39. The rapid decrease in backstreaming rate as a function of theaverage angle above the plane of the nozzle lip is evident from the
VAPOR-JET VACUUM PUMPS 267
curves shown for the various nozzle configurations tested. The dotted
curve shows the correction to the —45° curve due to subtraction of
backstreaming from the lower jets. From these results Stevenson
concludes that the rate of backstreaming of oil diffusion pumps can besubstantially reduced by improving the configuration of the nozzle.
The paper does not give any data, however, on the effect on pumpingspeed of various gases such as nitrogen and hydrogen caused by chang-
ing the nozzle configuration in the manner described. If the improve-
ment in backstreaming results in a decrease in vapor-jet density, it mayalso result in a poorer ratio of pumping speed for hydrogen relative to
that for air, which would be a distinct disadvantage for some applica-
tions.
The rate of decomposition of diffusion-pump fluids is greatly
increased by the catalytic effect of some materials of construction and
is self-catalytic in the sense that the carbon deposits resulting from the
1.0 p
5 1.0
- '1
'1
'1
11 _
r- 1
1
>. *I5° -15°
1 :-30°
1-
\\ °1
I NX. z
~Correction ^ ^
_ bosed on effect of
installation of a baffle
under the first stoge
.1,1,1
A I
B -
, 1
+ 15° 0° -15° -30° -45°
Angle of inner wall of nozzle
Fig. 6-38. Relative rates of total
backstreaming for various nozzle
configurations. [Reprinted with per-
mission from The Macmillan Com-pany, from D. L. Stevenson, in 1963
Vacuum Symposium Transactions.
Copyright © 1963 by AmericanVacuum Society.]
20 40 60
Angle, deg
Fig. 6-39. Distribution of relative
rates of backstreaming as a function
of the angle above the plane of the
diffusion-pump nozzle. [Reprinted
with permission from The INIacmillan
Company, from D. L. Stevenson, in
1963 Vacuum Symposium Trans-
actions. Copyright © 1963 byAmerican Vacuum Society.]
268 VACUUM SCIENCE AND ENGINEERING
decomposition act as a catalyst. Insufficient quantitative work on the
role of materials in catalyzing the decomposition of diffusion-pump
fluids has been reported to permit a detailed discussion of the subject.
However, the decomposition rate in glass pumps is apparently sig-
nificantly less than in comparable metal pumps. Hot aluminum in
contact with the working fluid is regarded as undesirable. However,
individual differences in chemical properties of the fluids used are so
great that generalizations are not valid.
The products of decomposition of diffusion-pump fluids consist of
materials of both higher and lower vapor pressure than the original
fluid. Those of sufficiently high vapor pressure act as permanent
gases in the sense that their vapor pressures are so large that they are
not condensed on liquid-nitrogen-cooled baffles. Other products are
heavy liquids and solids of very low vapor pressure which accumulate
in the boiler and eventually clog the nozzle system with a dark deposit.
Because an appreciable decomposition rate is typical of diffusion-pump
operation, the ultimate pressure, even with good liquid-nitrogen-cooled
baffles, is limited by the rate of decomposition and production of high-
vapor-pressure products which migrate into the high-vacuum system
beyond the baffles and must then be pumped out again. Best results
in terms of very low ultimate pressure are obtained when a diffusion
pump is run with low power input and with a fluid of greater than
normal stability.
6-8. Fractionation and Purging. From the time high-boiling-
point fluids were first introduced by Burch^" in 1928 for use instead of
mercury in diffusion pumps, the need for continual purification to
eliminate high-vapor-pressure components initially present in the oil,
or produced during operation by decomposition, was realized. Hick-
man'i and his collaborators were largely responsible for the systematic
study of decomposition and contamination of diffusion-pump fluids
and the development of specific mechanisms for purging the pump-boiler of undesirable constituents and separating the remaining
constituents in the proper order. Figure 6-40 shows a two-stagb
glass diffusion pump with boiler compartments to separate the fluid
roughly according to the vapor pressure of the constituents and
catchment lobes on the exhaust arm of the pump for elimination of
high-vapor-pressure components into the backing pump. Large
horizontal pumps of metal construction based upon the glass fraction-
ating designs were developed but have not proved to be as convenient
in practice as pumps of vertical design.
The principles of fractionation have been incorporated into the
design of metal vertical pumps. One of many such designs is illus-
trated in Fig. 6-41. Fluid returning from the jets to the boiler flows
VAPOR-JET VACUUM PUMPS 269
radially inward toward the center of the reservoir. If this flow is
impeded by barriers with small openings, the fluid is heated substan-
tially while it is still near the outer portion of the reservoir so that
high-vapor-pressure constituents are boiled off near the outside.
As the fluid flows toward the center it is further heated and lower-
vapor-pressure components are vaporized. The nozzle stack is con-
structed of concentric tubes arranged such that each nozzle receives
Fig. 6-40. Two-stage fractionating glass diffusion pump. [Reproduced throughthe courtesy of ConsoHdated Vacuum Corp., Rochester, N.Y.]
vapor from only a specific annular region of the boiler. The backing
or flnal jet receives vapor from the outer portion of the boiler where the
vapor pressure is highest, and the first jet receives vapor from the
central section where the vapor pressure of the fluid is the lowest.
One advantage claimed for the mechanism of fractionation is that the
high-vacuum jet is supplied only by the relatively low-vapor-pressure
constituents of the working fluid, contributing to a lower backstreamingrate and vapor pressure at the inlet of the pump. Another advantageclaimed is a higher forepressure tolerance because of the relatively
high vapor pressure of the constituents forming the backing or final jet.
However, these advantages have not been as clearly demonstratedin commercial diffusion pumps of metal construction as in glass pumpsof the type fllustrated in Fig. 6-40, at least in part because of the
process of reverse fractionation discussed by Hickman. ^^'^^
270 VACUUM SCIENCE AND ENGINEERING
Fig. 6-41. Three-stage fractionating oil diffusion pump of metal construction.
Effective fractionation can only be obtained by careful separation of the respec-
tive boiler zones. This is obtained by shaping the component resting on the
pump base plate as shown (shaded). The lower jet cap is at the same height as-
the lower end of the cooling jacket. As a result, the oil flowing down the walls is
warmed, facilitating degassing. [Taken with permission from H. G. Nollei-,
Vacuum V, 59 (1955).]
The partial condensation of the vapor on the inner walls of the tubes
supplying vapor to the nozzles in fractionating pumps, such as that
shown in Fig. 6-41, is held to be responsible for a reversal of the desired
direction of fractionation. Furthermore, the separation of the fluid into
constituents according to vapor pressure is not as well controlled or
efficient in the commercial metal pumps as in the glass fractionating
pump, such as that shown in Fig. 6-40, since the concentrically dividedboiler of the vertical metal pump is not the equivalent of the separatedboiler compartments of the horizontal glass pump. Another serious
VAPOR-JET VACUUM PUMPS 271
disadvantage in the construction of a metal fractionating pump is the
low conductance for vapor flow to the nozzles inherent in the concentric
tube design for the nozzle stack. Because of the relatively small gain
in ultimate vacuum actually achieved by the introduction of fractiona-
tion in metal diffusion pumps and the limitations imposed by the
presence of the concentric tubes against significant improvements to the
boiler and jet system, the design trend has been away from fractionation
to gain some of the features described in the previous section. All
recent commercial pump designs, such as those illustrated in Figs. 6-9
and 6-10, as of the date of this writing (1964), achieve better perform-
ance without the fractionating feature than earlier designs of either
fractionating or nonfractionating pumps.Distinct from the question of fractionation of the diffusion-pump
fluid into components according to vapor pressure is the problem of
purging the pump fluid of high-vapor-pressure components by ejection
into the forevacuum. Hickman^^ and Latham, Power, and Dennis^^
have demonstrated that complete ejection of the more volatile con-
stituents of the working fluid from the pump is more effective than
fractionation. The rate of ejection of volatiles in a design such as that
shown in Fig. 6-9 is influenced by the vertical spacing from the bottom
nozzle to the liquid level in the reservoir and the temperature of the
pump housing on which the oil condenses. The temperature of the
pump housing near the top must be cool to ensure efficient condensation
of the fluid from the first jet. In some applications the top few turns
of tubing are separated from the rest of the cooling coil and either
cooled by chilled water just above the freezing point or by a mechanical
refrigerator to reduce further the vapor pressure at the inlet of the
pump. However, the wall temperature should preferably increase
from the region of condensation of the first jet to a considerably higher
temperature below the bottom jet so that higher-vapor-pressure
components which are condensed near the top are evaporated as the
fluid drains down the housing wall toward the backing jet and pumpedout with the permanent gas into the forevacuum.
The forevacuum section of the diffusion pump must also be allowed
to run warm so that the more volatile constituents of the effluent will
not be condensed and permitted to flow back into the boiler. Theoptimum temperature distribution is a compromise which allows a
sufficiently high rate of ejection of volatiles from the pump without
permitting an excessive rate of loss of pump fluid into the forevacuum.
For a given pump design the stability and vapor pressure of the fluid
are factors which determine the optimum temperature distribution
along the pump housing and forevacuum connection. An extreme
example mentioned in Sec. 6-4 is OS- 124 (Monsanto Chemical Company)
272 VACUUM SCIENCE AND ENGINEERING
for which best performance was obtained by Batzer" when the lower
end of the pump housing was allowed to run at 90 to 100°C.
6-9. Resume of Diffusion-pump Performance. Although his-
torically the original development of diffusion pumps was based upon
mercury as the working fluid, since about 1930 the far greater eff'ort
has been devoted to understanding and improving "oil" diffusion
pumps. With a few important exceptions listed in Sec. 6-4, oil
diffusion pumps instead of mercury diffusion pumps are used on nearly
all industrial and electronuclear systems. In spite of certain inherent
advantages of mercury, such as chemical stability, the speed factor
(6-37) for oil diffusion pumps is significantly greater than for mercury
diffusion pumps.
Organic fluids, usually referred to as oils, now available for use
in diffusion pumps range in vapor pressure from that about equal to
mercury down to such low values that the room-temperature vapor
pressure can only be estimated by extrapolation from high-temperature
measurements. Narrow cuts of petroleum oils, chlorinated hydro-
carbons, and a wide variety of synthetic organic fluids have been
successfully used. In the development of synthetic fluids of high
molecular stability and low vapor pressure there would appear to be an
opportunity for continued improvement in the future. Highly stable
fluids with a wide range of vapor pressures are needed to meet an
extreme range in performance from high pumping speed at low ultimate
pressure to high throughput at high backing pressure.
The performance of diffusion pumps can be judged in terms of the
base pressure, backstreaming rate, speed factor, and limiting fore-
pressure. Several industrial vacuum firms have demonstrated dif-
fusion pump designs for which
:
1. The base pressure for baflftes at 20°C is of the order of lO^' torr
using Silicone 705 or OS- 124 fluid.
2. The backstreaming rate is of the order of lO"" g/cm^ min.
3. The speed factor as defined in Eq. (6-37) is of the order of 0.5.
4. The limiting forepressure is 0.3 torr or higher.
System designs should be based upon the assumption that diffusion
pumps meeting approximately the above performance specifications
can be obtained.
REFERENCES
1. M. LeBlanc, in L. Dunoyer, Vacuum Practice, trans, by J. H. Smith (D. Van
Nostrand Company, Inc., New York, 1962), pp. 41-42.
2. V. V. Fondrk, in 19S7 Vacuum Symposium Transactions (Porgamon Press,
London, 1958), p. 88.
VAPOB-JET VACUUM PUMPS 273
3; Saul Dushman, Scientific Foundations of Vacuum Technique (John Wiley &§ons, Inc., New York, 1949).
4. W. Gaede, Ann. Physik 46, 357 (1915); Z. Tech. Physik 4, 337 (1923).
5. R. Jaekel, in Proceedings First International Congress on Vacuum Technology,
1958 (Pergamon Press, London, 1960), p. 21.
6. R. Jaekel, Kleinste Drucke (Springer-Verlag, 1950), pp. 140-197.
7. H. G. Noller, Vacuum V, 59 (1955).
8. N. A. Floresou, Vacuum 10, 250 (1960).
9. E. H. Kennard, Kinetic Theory of Oases (McGraw-Hill Book Company, NewYork, 1938), p. 108, p. 194.
10. P. Alexander, J. Sci. Instr. 23, 11 (1946).
11. Smithsonian Physical Tables, 9th rev. ed. 1954, p. 40.
12. D. Latham, B. D. Power, and N. T. M. Dennis, Vacuum II, 33 (1952).
13. J. Blears, Nature 154, 20 (1944); Proc. Roy. Soc. (London) A 188, 62 (1946).
14. K. C. D. Hickman, Nature 187, 405 (1960).
15. T. H. Batzer, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962), p. 315.
16. K. C. D. Hickman, in 1961 Vacuum Symposium Transactions (Pergamon
Press, London, 1962), p. 307.
17. B. D. Power, N. T. M. Dennis, and D. J. Crawley, in 1961 Vacuum Sym-
posium Transactions (Pergamon Press, London, 1962), p. 1218.
18. S. A. Vekshinsky, M. I. Menshikov, and I. S. Rabinovich, Vacuum 9, 201
(1959).
19. Warren W. Chupp, Lawrence Radiation Laboratory, Berkeley, Calif., private
communication
.
20. T. L. Ho, Physics 2, 386 (1932).
21. H. G. Noller, G. Reich, and W. Bachler, in 1959 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1960), p. 72.
22. D. L. Stevenson, in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, 1960), p. 134.
23. C. E. Normand, Oak Ridge National Laboratory, private communication.
24. B. D. Power and D. J. Crawley, Vacuum IV, 415 (1954).
25. H. R. Smith, in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, 1960), p. 140.
26. M. H. Hablanian and H. A. Steinherz, in 1961 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1962), p. 333.
27. M. H. Hablanian, in 1962 Vacuum Symposium Transactions (The Macmillan
Company, New York, 1962), p. 384.
28. Norman Milleron and L. L. Levenson, in 1961 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1962), p. 342.
29. D. L. Stevenson, in 1963 Vacuum Symposium Transactions (The Macmillan
Company, New York, 1963), p. 134.
30. R. C. Burch, Nature 122, 729 (1928).
31. K. C. D. Hickman, J. Franklin Inst. 221, 215 and 383 (1936).
32. K. C. D. Hickman and J. J. Kinsella, in 1956 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1957), p. 52.
33. K. C. D. Hickman, Rev. Sci. Instr. 22, 141 (1951).
CHAPTER 7
THE MEASUREMENT OF PUMPING SPEED
7-1. Alternative Definitions of Pumping Speed. The basic
equation for the pressure in a vacuum system is
dPPS V
dtQ + Qo (7-1)
in which P is the pressure measured at some particular point in the
system, S is the pumping speed at that same point, V is the volume of
the system for which S is the effective pumping speed, Q is the through-
put (e.g., in torr liters/sec) of gas flowing into the system, and Qgis the gas flow due to interior surface outgassing. Thus, in general,
the pumping speed is
VdP Q Qo
^^-P^ P PIn order to measure the pumping speed, conditions are imposed on
the system so that a simplified form of Eq. (7-2) is applicable. Forexample, if the outgassing rate is negligible {Qq = 0) and the systemis operated at constant pressure with a steady flow of gas {Q = const)
entering the system, then dPjdt = and from what remains of (7-2)
-I (7-3)
as given in (2-1). This expression is sometimes used as the definition
of pumping speed and is a valid basis for measuring the pumping speedin the pressure range of most oil-sealed mechanical pumps, provided
'
the pressure measured actually corresponds to the gas admitted to the
system, as discussed in Sec. 5-3. If air is admitted to the system at a
measured flow rate Q and the pressure measured with a McLeod gauge,then because of the compression effect of the McLeod gauge, as de-
scribed in Sec. 3-4, the pressure reading will be just the partial pressureof the permanent gas (in this case air) admitted to the system at themeasured flow rate Q. Also, in the pressure regime of oil-sealed
mechanical pumps the sorption processes (adsorption and desorption)
274
THE MEASUREMENT OF PUMPING SPEED 275
of surfaces reach a balance in a relatively short time, particularly for
permanent gases, so that if Q (the admitted flow) is kept constant,
Qf, (the outgassing rate) rapidly approaches zero and the pressure
reaches the value given in (7-3) rather quickly.
Also, in the case of mechanical vacuum pumps, the pumping speed
varies considerably with the inlet pressure, decreasing rapidly with
decreasing pressure near the ultimate pressure Pq of the pump. Thusthe ultimate pressure is determined not so much by the outgassing
in the system as it is by the decreasing pumping speed approaching
zero at the ultimate pressure.
Whether the outgassing rate Qg is important (or whether there is an
excessive leak in the system) can be ascertained by closing off a valve at
the pump so that S = 0. Then with the flow Q = 0, Eq. (7-1) becomes
dP'dt
or
Qo
V
p -u9if ;7-4)
Observation of the pressure several times during the pressure rise
yields a linear curve, the slope of which is Qo/ V. By putting the result-
ing value of Qo into (7-1) with Q = and dPjdt = 0, the pumping
speed at the ultimate pressure can then be determined from
a ^0On = -;^ (7-5)
If the system is free of accidental leaks then, for mechanical pumps,
Sf, is generally very small as compared with the value of S at higher
pressures and can be neglected.
In the case of diffusion pumps, however, the situation is quite
different. As discussed in Sec. 6-5, the pumping speed of a diffusion
pump is essentially independent of the pressure over the range in which
measurements are normally carried out. The ultimate pressure is then
not the result of the pumping speed approaching zero but of a limitation
on the attainable pressure due to the outgassing rate Q^. The situation
is frequently such that a base pressure is soon reached which then
changes only very slowly with the time because the outgassing rate
becomes nearly constant.
Returning to (7-1) for the case in which the system is operated at
constant pressure, we have
PS = Q + Qo
and (7-6)
276 VACUUM SCIENCE AND ENGINEEEING
SO that instead of (7-3) we have the equivalent of (6-34)
(7-7)
which is unambiguous only if the pumping speed is essentially inde-
pendent of the pressure. In this case it also follows that
S = P2-P1(7-8)
Thus if the equilibrium pressure P is measured for each of several values
of the gas flow Q, in sequence, and Q is plotted against the resulting P,
then the slope of the curve is the pumping speed S, as illustrated in
Fig. 7-1.
Still another way in which the pumping speed can, in principle, be
determined is by observing the pressure as a function of the time as the
system is pumped down. If the
gas flow Q = and the outgassing
rate Q^, is negligible, then from (7-1)
SdtdP
(7-9)
so that by integrating and re-
arranging we have
V P,S = 2.30 login^
(7-10)
Unfortunately, there are very few
real situations to which this ideal
pumpdown equation applies. In
the regime of mechanical roughing
pumps, the pressure usually changes
so rapidly during the pumpdown,
operation that the outgassing rate is not negligible and is changingwith time. Only if the volume of the system is very large as comparedwith the displacement speed of the pump, so that the pressure changesslowly during pumpdown, will observations based upon Eq. (7-10)
check approximately with the known pumping speed of a mechanicalvacuum pump. In this case the walls remain nearly in equilibriumwith the pressure in the system and outgassing does not play an im-portant role.
Pressure, P
Fig. 7-1. Graph of throughputagainst resulting pressure for deter-
mination of the pumping speed.
THE MEASUREMENT OF PUMPING SPEED 277
In the pressure regime of diffusion-pump operation (7-9) and (7-10)
do not generally apply because the outgassing rate is an important
factor near the base pressure. However, in this case the outgassing
rate rather soon reaches a nearly constant value, changing slowly
enough that it may be regarded a constant during the period required
for a pumpdown test. In this case Eq. (7-1) can be written
dP_
dtPS + Q, (7-11)
Since the pumping speed of a diffusion pump is independent of the
pressure and since for periods of interest the outgassing rate Q„ may
be regarded as constant, the value of Q^ can be substituted from (7-6)
so thatdP
F^ = -S(P - Po)at
the base pressure. Rearranging terms and integratingwhere P,, is
yields
so that
Jp, P-Po ~ V k
In
PP
dt
Po 8
Pi~Po= - T7 (*2 - ^1)
V
and S = 2.30V
H ^1
logiP1--P0
(7-12)
When the assumptions leading to Eq. (7-11) are vahd, then Eq. (7-12)
provides a basis for pumping-speed measurement which has certain
distinct advantages. Measurement of the gas flow is not required, and
the gauge constant cancels out, provided that the gauge is linear over
the pressure range of the measurement. The volume of a system can
generally be determined with fair precision from external dimensions.
The procedure is simply to pump down the system to a steady base
pressure, then let in enough air (preferably through a drying tube)
to bring the pressure back up by a factor of 10 or more, and flnally
to read the pressure at several specific values of the time as the system
pumps down again. This procedure works well on large systems,
particularly when the rate of change of pressure during pumpdown
is not so rapid as to make pressure readings difficult.
7-2. Measurement of Gas Flow. Pumping-speed measurements
for determining vacuum-pump performance are predominantly carried
out under conditions of constant flow. The full range over which gas
flow must be controlled and measured for the routine measurement of
pumping speeds of commercial vacuum pumps extends from about 10"
278 VACUUM SCIENCE AND ENGINEERING
to about 10-5 torr liters/sec. Gas is normally admitted through a
control valve or standard orifice into an appropriate test dome mounted
on the pump and the flow rate controlled to a value at which the desired
pressure is maintained. The gas flow must be measured in such a waythat the volume per second and the pressure are both known, so that
the throughput Q = P{dVjdt) is determined. In those cases in which
no significant pressure drop occurs in the flow-measuring device, the
pressure of interest is the barometric pressure when the test is in
progress. In those cases in which there is a pressure drop, the value of
the pressure at which the flow dVjdt is measured must be determined.
Some of the devices commonly used for throughput determination in
various flow ranges will be briefly described.
Calibrated Orifice. For large flow rates a calibrated orifice
connected to the test dome through a gate valve is convenient and
reliable. The surrounding air at atmospheric pressure or any desired
gas maintained at a controlled pressure in a tank upstream from the
orifice flows into the system at a rate determined by the diameter of the
oriflce and the temperature, average molecular weight, and pressure of
the gas upstream of the orifice. The flow rate is independent of the
pressure downstream from the oriflce, provided that the pressure is less
than the critical pressure given in Eq. (6-1), as in the case of the flow
of steam through an ejector nozzle. For the common diatomic gases
y = 1.40, so that the critical pressure from (6-1) is
P, = 0.535Pi (7-13)
where P^ is the pressure upstream from the orifice.
The critical mass flow through an oriflce under these conditions is
given by Eq. (6-7), which for a diatomic gas becomes
dMHI
= 0.538c(Pipy^'D^ g/sec (7-14)
when the pressure is measured in /ibars (dynes per square centimeter)
and D, the diameter at the throat of the orifice, is in centimeters
ordW-^ = 19.64c(Pip)'^^Z»2dt
g/sec
when the pressure is measured in torr. Finally,
dW11
915c(Pi/Fi)'^i)^ Ib/hr
(7-14a)
'
(7-146)
in the usual engineering form in which D is in inches, the pressure is in
pounds per square inch, and F^ = 1/p is the specific volume in cubic
THE MEASUREMENT OF PUMPING SPEED 279
feet per pound. The parameter c is the nozzle coefficient and generally
has a value close to unity. Since from Eq. (1-8) the gas density is
W MPV R,T
the critical volume flow through the orifice is
dt p dt
= 4904c|— Z)2 cm^/secMl
(7-15)
by substituting R^ = 62,364 from Table 1-2.
For air, for which M = 28.98, at a normal room temperature of
20°C
dY— = 15.6 X 103cZ)2 cm^/secdt
= 15.60c7)2 liters/sec
when D is measured in centimeters, or
dVdt= 213.3cZ'2 cfm
(7-16)
(7- 16a)
when D is measured in inches.
For example, the approximate critical flow of atmospheric air through
an orifice of 1 in. throat diameter under the above conditions is 100.6
liters/sec or 213.3 cfm, obtained by setting c = 1 in the above equation.
If atmospheric pressure is 760 torr, then the throughput for air through
a 1-in. -diameter orifice is
Q = P— = 760 X 100.6 = 7.65 X 10* torr liters/secdt
= 760 X 213.3 = 1.62 x 10^ torr cfm
In practice the values of the temperature and pressure at the time of
the measurement must be substituted in (7-15).
The exact value of the nozzle coefficient depends upon the flow
conditions and the detailed shape of the orifice. For testing the
"capacity" or pumping speed of steam ejectors, the Heat Exchange
Institute! * has developed a standardized long radius orifice, the design
of which is shown in Fig. 7-2. The arrangement prescribed by the
institute for the mounting of the standard orifices in pumping-speed
* References indicated by superscript numbers are listed at the end of the
chapter.
280 VACUUM SCIENCE AND ENGINEERING
measurements is shown in Fig. 7-3. The above reference also gives
tables and graphs of flow rates in pounds of air per hour for a sequence
of standard nozzles ranging in throat diameter from 0.0625 in. to 1.0 in.
Table 7-1 contains a sample of the data given in one section of the
above reference with the flow rates
in pounds per hour as in the
original, and also for convenience
with the flow rates converted to
torr cubic feet per minute and
to torr liters per second. These
values differ very little in general
from those calculated from (7-15)
by assuming that c = 1, indicat-
ing that for flow in the range of
interest for vacuum applications
the nozzle coefficient c for the
HEI standard orifice shape is very
nearly equal to 1. The tables
and curves permit accurate deter-
mination of the critical flow rates
for a wide range of atmospheric
pressure and temperature for the
full set of standardized orifices
listed in Table 7-1.
Also in Ref. 1 a detailed method
is given for computing the nozzle
coefficient for an orifice of any
throat diameter, but of the HEIstandard shape. The flow values
given in Table 7-1 are extended to orifices of larger dimensions than
those of the HEI series.
In using standard HEI orifices for controlling and determining flow
rates it is most important to note whether the pressure in the system
just downstream from the orifice satisfies
P3 < P^ = 0.535Pi
from (7-13), where
P, (^ 400 torr for P^ = 760 torr
If this condition is not fulfilled, then the flow is subcritical and
depends on the pressure difference across the orifice instead of simply
the upstream pressure. The expression for subcritical flow is
dW— = 19.64c(Pi - P^y-^'p^'^D^ g/sec (7-17)
Fig. 7-2. Proportions of standard
long-radius flow nozzle recommendedby the Heat Exchange Institute for
gas-flow determination. [Reprinted
from the Standards for Steam Jet
Ejectors, 3rd ed. Copyright 1956 bythe Heat Exchange Institute, 122 East
42nd Street, New Yorli, N.Y. 10017.]
THE MEASUREMENT OF PUMPING SPEED 281
-Manometer
ly^^^ Downstream pressure tap
To ejector suction —*-
Control volves
Fig. 7-3. Arrangement of standard orifice for critical air-flow tests. [Reprinted
from the Standards for Steam Jet Ejectors, 3rd ed. Copyright 1956 by the HeatExchange Institute, 122 East 42nd Street, Xew Yorlc, N.Y. 10017.]
Table 7-1. Critical Flow Rates fob Heat Exchange Institute StandardOrifices *t
Dry Air at 70°F and Barometer Pressure of 30.0 in. Hg = 762 torr
Density = 0.07510 Ib/ft^ = 1.203 g/liter
Orifice Volume flow Mass Throi] ghputHEI flow
no. diameter, in. cfm liters/sec Ib/hr torr cfm torr liters/sec
1 0.063 0.810 0.382 3.65 6.17 X 102 2.91 X 102
2 0.094 1.82 0.857 8.18 1.38 X 103 6.53 X 102
3 0.125 3.24 1.53 14.6 2.47 X 103 1.17 X 103
4 0.188 7.35 3.45 33.1 5.60 X 103 2.64 X 103
5 0.250 13.0 6.16 58.8 9.94 X 103 4.69 X 103
6 0.313 20.5 9.68 92.4 1.56 X 10* 7.37 X 103
7 0.375 29.5 13.9 133 2.25 X 10* 1.06 X 10*
8 0.500 52.6 24.8 237 4.01 X 10* 1.89 X 10*
9 0.750 119 56.0 535 9.05 X 10* 4.27 X 10*
10 1.000 212 100.1 956 1.62 X 105 7.63 X 10*
1.250 332 156 1497 2.53 X 105 1.19 X 105
1.500 476 224 21.50 3.63 X 105 1.71 X 105
* Reprinted from the Standards for Steam Jet Ejectors, 3rd ed. Copyright
1956 by the Heat Exchange Institute, 122 East 42nd Street, New York, N.Y.10017.
t Mass flow data for HEI standard orifices Xos. 1 through 10 given in ibid.
Pig. 20, p. 23.
282 VACUUM SCIENCE AND ENGINEERING
when D is in centimeters, the density in grams per cubic centimeter,
and the pressure in torr. This expression becomes
915cP,
V,D^ Ib/hr (7-17a)
when the pressure is measured in pounds per square inch, V^ = l/p
is the specific volume in cubic feet per pound, and D is measured in
inches.
1.0 [- n ~1~11 nn —:= __
,
—0.99 -
Nozzle dio^^S5^:—
:
;
—
——= =0.98 -
.--'^^=—
!
Z.0.5003£^
;:: ::::"""=— ^"
t-°-5^
^
FT^=^^.._ .
—
—— ^S 0.96 r ^& —
'
".— — — ,
.—— —° 0.95
-
/yP rz-^^^---^ ,^ ..^
-^ U.94-
'/,0^ <^
y' ^-^ —> 0^ .f /
^c->
/'
o^-
.^—
^ 0.91- -f-
/OJ / /S 0.89
^
oJ^ 0.88
-
/0.87
nflfi"""100 200 300 400 500 600 700 800 900 1,000 1,100 1,200 1,300
Flow, pounds per hour per square inch of nozzle throat area
Fig. 7-4. Nozzle coefficients for standard orifices. Dry air at 70°F. [Reprinted
from the Standards for Steam Jet Ejectors, 3rd ed. Copyrigiit 1956 by the Heat
Exchange Institute, 122 East 42nd Street, New York, N.Y. 10017.]
The expressions for critical and subcritical flow are correct as long
as the diameter of the pipe immediately downstream from the orifice
is at least four times the throat diameter of the orifice.
Values of the nozzle coefficient c have been determined for the
standard orifices by a series of tests conducted by the Heat Exch3,nge
Institute. Some results of these tests are shown graphically in Fig.
7-4. Inspection of this set of curves and comparison with the flow
rates shown in Table 7-1 for critical flow will reveal that the range
of values of the nozzle coefficient of interest for most vacuum work is
from 0.94 for the smallest orifice {D = 0.0625 in.) to 0.99 for the
largest shown on the graph (D = 1.00 in.).
Rotameter. The rotameter (see Fig. 7-5), which is a variable
orifice device, is a vertically mounted tube of tapered precision bore
THE MEASUREMENT OF PUMPING SPEED 283
i
with a rotating float inside. The height of the float is determined by the
gas-flow rate upward through the tube. Rotameters are calibrated bythe manufacturer and can be obtained in a wide range of sizes. Thethroughput range from about 150 torr liters/sec to about 1 x 10*
torr liters/sec can be covered conveniently with overlapping ranges
with a set of four units. Care must be exercised
to ensure that the rotameter is accurately vertical
or the float will rub on the side of the tube, pro-
ducing erratic readings.
Inverted Buret. This term is used here to
designate any of several versions of a simple de-
vice which in its original form consisted of an
inverted buret thrust into a beaker of diffusion-
pump liquid, as shown in Fig. 7-6. The outlet at
the top of the buret may be connected to a T in a
tube leading to the needle valve, the other leg of
the T opening to atmosphere through a stopcock,
so that when the stopcock is closed the gas flow
sucks oil up into the tube. To a first approxi-
mation the rate of rise of the oil level in the tube
multiplied by the cross-sectional area of the tube
is a direct measure of the flow rate. However, in
this simple arrangement the pressure on the gas
above the oil level is continually decreased by the
difference in head of oil in the buret and in the
beaker, so that for precise results a correction
must be made.
Since the density of a light oil is only about Ksthat of mercury, the reduction in pressure of the
gas entering the pump when the oil level in the
buret is 30 cm above that in the reservoir is only
about 20 torr in a normal atmospheric pressure
of 760 torr, or a pressure reduction of about 2.6
per cent. The pressure of the gas entering the
pump can be kept constant by using as a reservoir
a tall cylinder which is moved up around the
buret as the oil level rises. Timing the rise in level between two marks
and manipulating the oil reservoir to keep the levels inside and outside
the buret the same is somewhat inconvenient, but can be managed. If
this is not done, then the pressure of the entrapped gas decreases as
the oil level rises^ such that
poil
Fig. 7-5. The rotam-
eter gas flowmeter.
[Reprinted through
the courtesy of
Fischer and Porter
Co., Warminster, Pa.]
png(7-18)
284 VACUUM SCIENCE AND ENGINEERING
where P„ = atmospheric pressure
h = difference in height of the oil levels
pjjg = density of mercury
poii = density of the oil in the buret
If V represents the volume of gas at atmospheric pressure initially
trapped above the oil level at the instant the bypass valve is closed,
then when the oil level has risen h cm, the volume is
V =Vo-hA (7-19)
in which A is the cross-sectional area of the buret. The total quantity
of gas in the apparatus above the oil level is the product of (7-18) and
(7-19), which is
pollTo needle valve
on system
PV PaVo P„AhPag
Light
(Voh -h^A)
(7-20)
The average flow of gas through the needle
valve for the time interval A< is then
e=^(P„F„ PV)
i*: iisi;
I WM
P„APoll
PHg{V,-hA)
(7-21)
If h is measured in centimeters, A in square
centimeters, t in seconds, and P in torr, the
Fig. 7-6. The inverted-resulting flow is given in torr cubic centi-
buret type of flowmeter, meters per second.
If the volume hA displaced by the ofl is
nearly equal to V^, the correction term in (7-21) becomes very small
so that
Q (7-22)
This is the case when the diameter of the buret is large, the oil level
is raised essentially to the top, and the volume of the connecting tubing
over to the needle valve is small. However, if hA < Fo,
Q AAPA +^ F,
PHg .)(7-23)
In this case, which is more usual, the correction term may be quite large
THE MEASUREMENT OF PUMPING SPEED 285
and use of the simple expression (7-22) will lead to a large systematic
error in the measurement of the flow rate.
In the use of the inverted-buret flowmeter the bypass valve is opened
after each measurement and the oil level in the measuring tube drops
back down to that of the reservoir. Before closing the valve and
starting another measurement it is essential to wait long enough for
the oil to drain down from the wall of the tube. Since the surface film
initially left behind on the tube wall can, in effect, reduce the cross-
sectional area of the tube significantly, large errors in the flow measure-
ments can result from this effect, particularly when the diameter of the
measuring tube is small. This type of error can be reduced consider-
ably by using a liquid of low viscosity. Since air cannot have a larger
content than that corresponding to 100 per cent relative humidity
(Ph o ^ 18 torr at room temperature or ~2.4 per cent of atmospheric
pressure), water is for some purposes a better choice than oil. With
a 0.2-cm3 buret tube calibrated in units of lO-^^ cm^ a throughput as
low as 10"* torr liter/sec can be measured with acceptable accuracy.
The importance of variations in room temperature in measuring small
flow rates by the inverted-buret method is emphasized by Dayton.
»
A change of temperature of 3°C results in a 1 per cent change in volume
of a body of gas at constant pressure. During the measurement of a
small throughput the rise in the oil level may be completely masked
by a change in volume of the gas entrapped between the oil level and
the needle valve. An example given by Dayton is quoted below
:
For example, a 50-cc buret is a convenient size for testing 4-inch pumps
having peak speeds of about 200 liters per second at pressures from 10"^ to
10-2 mm. But in the range from 10"* to the ultimate vacuum of about
3 X 10"* mm the leak rate drops below 1 cc in 10 minutes. While the oil
might normally rise from to the 1-cc mark in 10 minutes, if the room
temperature increases by 3°C and about 50 cc of air are trapped above the
oil, the expansion wiU force the oil back down the tube by 0.5 cc. The
measured leak rate is thus 0.55 cc in 10 minutes, which is just one-half the
true leak rate. A rise of only 0.3°C in 10 minutes will cause an error of
about 5% in this case. Of course, the ambient temperature of the buret
could be held constant by a water jacket, but the author has found it more
convenient to hang a thermometer near the buret and note the temperature
at the times of starting and stopping the stop watch. Usually the room
temperature can be adjusted so that the final temperature is within O.TC of
the initial temperature.
The Pipe Organ. The pipe organ is a compact multiple-tube
arrangement, based upon the principle of the inverted buret, designed
and built at the Kinney vacuum laboratory for measuring gas flow
over a wide range.* The apparatus shown in Fig. 7-7 consists of two
286 VACUUM SCIENCE AND ENGINEERING
Ven1 valve
Selector volve
(typical)
To pump under
test
Sight glass
Calibrated
measuring
cylinder (typical)
Oil or other low-
vapor -pressure
fluid
Drain plug
Section A-A
Fig. 7-7. The pipe organ flowmeter of J. F. Cleveland.
groups of concentric, vertical metal tubes with several valves at the
top so that the volume of each central tube and each of the several
annular spaces between the tubes can be separately, or in combination,
connected to the manifold at the top. A large rectangular reservoir
at the base provides an ample volume of the fluid.
Two glass sight tubes are mounted on the front of the instrument.
One runs from the reservoir in the base to the manifold at the top and is
connected in parallel with whatever combination of tubes is being used
for measuring the flow rate. The liquid from the reservoir rises in this
tube as well as in the measuring volume and provides a means of
observing the liquid level. The other transparent tube protrudes into
the liquid in the reservoir at the bottom and is open at the top. Bymeans of a two-way valve, which is normally open to the atmosphere,
the volume above the liquid surface in the reservoir can be connected
to a compressed-air supply and the pressure raised as necessary to
maintain the liquid level in the open sight tube the same as that in the
measuring volume.
When all measuring volumes are connected into the manifold, the
total volume displaced is about 2.3 liters, which enables the operator
to measure throughput up to about 200 torr liters/sec. By using only
the liquid-level indicating tube as a measuring volume, flow rates as
low as 0.1 torr liter/sec can be measured.
THE MEASUREMENT OP PUMPING SPEED 28/
The volume of the connecting manifold is small so that the liquid-
level compensation makes a perceptible difference only when the smaller
measuring volumes are being used. By applying a correction of the
type given in (7-23) to these smaller measuring volumes, the com-
pensation system can be eliminated entirely, thus simplifying somewhatthe operating procedure.
Constant-pressure Gas Flowmeters. In Fig. 7-8 is shown a sketch
of a constant-pressure flowmeter described by Stevenson'* in which a
group of five calibrated tubes of widely differing volumes are used for
measuring the flow rate. The novel feature of this instrument is the
upper reservoir and overflow arrangement by which the tube in use
is filled by oil flowing in near the top instead of by suction from below.
The level in the upper reservoir is maintained by pumping oil from the
lower to the upper reservoir, from which it returns to the lower reservoir
by way of an overflow. The spout for supplying oil requires the oil
level to rise only a limited amount to spill over into the measuring
tubes.
The static head corresponds to no more than 0.2 torr for the smallest
to 2.0 torr for the largest buret. Maximum correction throughout
in the measured flow due to pressure difference does not exceed 0.5
per cent on any of the burets. The practical range of throughput
measurement is from about 50 to about 3 x 10-^ torr liter/sec. As in
the simple inverted buret, an oil film remaining on the inner surface
of a measuring tube due to a previous operation can cause significant
error, especially in the use of the smaller-diameter tubes. Sufficient
Overflow
column
Fig. 7-8. Constant -pressure gas flowmeter. [Taken with permission from D. L.
Stevenson, in 1961 Vacuum Symposium Transactions (Pergamon Press, London,
1962).]
288 VACUUM SCIENCE AND ENGINEERING
time for the oil to drain back into the reservoir must be allowed be-
tween measurements. Also reasonably constant room temperature is
essential to avoid error due to expansion.
Another form of a constant-pressure flowmeter, which is particularly
effective for the measurement of small flow rates, is shown in Fig. 7-9.
This instrument* consists of a glass capillary tube of 0.1 to 0.3 cm bore
in an approximately horizontal position with a drop of mercury
inserted at one end. If a small
Needle volve
Baffle,
Test dome
McLeodgouge
Colibroted
copillory
Air ond
mercury inlef
Mercury pellet
Mercury trop
MonometerVacuum pump
Fig. 7-9. Gas flowmeter consisting of a
calibrated glass capillary with a travel-
ing mercury pellet. [Taken with per-
mission from C. E. Rufer, in 1956
Vacuum Symposium, Transactions
(Pergamon Press, London, 1957).]
gas flow has previously been estab-
lished through the tube, the mer-
cury drop moves along the tube
at the flow rate of the gas with
very little frictional drag. Thecapillary is expanded into a
funnel at one end into which a
drop of mercury can be inserted
with an eye dropper whenever a
measurement is to be made. Theother end of the capillary is ex-
panded into a normal-diameter
tubing for connecting to the needle
valve and also for connecting a
small reservoir on a T, in which to
accumulate the mercury droplets which come through the tube. Al-
though the pressure difference required to move the mercury drop
in the capillary is small, the true pressure of the gas entering the system
can easily be measured by means of a manometer connected to the
connecting T near the mercury trap, as shown in Fig. 7-9. The cross-
sectional area of the capillary can be checked for uniformity by noting
any variation in length of a mercury drop in passing along the tube
and can be measured by weighing several mercury fillings of a markedlength. Flow rates as low as about 3 x 10~* torr liter/sec can be
measured with acceptable accuracy.
Calibrated Capillary Leaks. The trick of preparing very fine
capillaries is known to many familiar with glassblowing techniques.
A short length of glass tubing is softened in a flame and allowed to
thicken and contract. When the central part of the tube is nearly
a solid rod, the bore having contracted to a fine line, the tube is removedfrom the flame and quickly stretched out at arm's length. Thewhisker of glass connecting the two ends of the tubing will then be a
capillary of small diameter and microscopic bore. The fine capillary
can be broken off at one end but left attached at the other end of the
normal-diameter tubing from which it was drawn to be used for
THE MEASUREMENT OF PUMPING SPEED 289
connecting to the vacuum system. When the system is pumped downagainst the air leakage through the capillary from atmosphere, the leak
rate can be adjusted by breaking off sections of the capillary until the
desired equilibrium pressure or flow rate is achieved. The system musthave a valve at the inlet to the vacuum pump, and the volume isolated
from the pump by the valve must be known. Then by closing the
valve and noting the rate of pres-
Controlled leok
1^ Liquid
Hz
Pz
|_Jlon gauge
4- in.
pump
Metering
tube
To forepump
D = 1.27cm
L= 30.5 cm
i-2-in.pump
To forepump
D,= )0.5cm
D2=5.3 cm
sure rise, the leakage rate of the
capillary can be determined. Aset of capillaries can be adjusted
and calibrated on a laboratory
vacuum system and then used
for pumping-speed measurements.
By this technique capillaries of
leak rates as low as 10~^ torr
liter/sec can be prepared. Theprincipal drawback in the use of
calibrated capillaries is their ten-
dency to become partially clogged
by dust particles. By enclosing
each capillary in a rugged glass
sleeve plugged by a filter of glass
wool, the tendency to clog up is
reduced and the capillary is pro-
tected against breakage. Evenwith the best protection, however,
the leakage rate of a capillary
can change because of clogging
so that a periodic check of the leakage rate is essential to ensure
reliability.
Pressure Drop through a Known Conductance. The measurementof very small flow rates can frequently be most effectively accomplished
by measurement of the pressure difference across a known conductance
in the form of a tube or aperture.''* The gas entering the test dome of
a vacuum pump flows through a tube or aperture of known dimensions
from an auxiliary chamber, as in Fig. 7-10. A needle valve for ad-
mitting the test gas and a separate diffusion pump are connected to the
auxiliary chamber so that the pressure Pi can be adjusted to any
desired value. If the pressure is sufficiently low that the molecular meanfree path is not too small compared with the diameter, the gas flow
through the interconnecting tube into the test chamber is then, ac-
cording to (2-4),
Q = C{P, - P,)
Fig. 7-10. Arrangement for deter-
mining gas flow by measuring the
pressure drop across a known con-
ductance. [Taken with permission
from A. A. Landfors and M. H. Hab-lanian, in 1958 Vacuum Symposium,Transactions (Pergamon Press, Lon-
don, 1959).]
290 VACUUM SCIENCE AND ENGINEERING
in which, according to (2-96),
C ^ 3.810yZ)3
hters/secL + %D
when the diameter D and the length L of the tube are measured in
centimeters. If, instead of a tube, the conductance is in the form of an
aperture, according to (2-93),
MlC 3.641 ^J A Hters/sec
in which A is the area of the aperture in square centimeters.
The conductance of the metering tube or aperture is accurately
known from dimensions which can be measured with great precision.
The principal error in determining the throughput by this means is in
the determination of Pj, the pressure in the auxiliary chamber, since
generally Pg < Pi for cases of interest. The uncertainty can be
reduced substantially if the parameters are so chosen that P^ is in any
case greater than 10"* torr so that an accurate determination using a
McLeod gauge is possible. However, in order to maintain the ad-
vantage of using the simple conductance formulas given above, the
parameters must be chosen to ensure that the maximum value of P^
does not exceed the lower limit Pj of the transition pressure range,
as discussed in Sec. 2-7, for which values for air at room temperature
are given in Table 2-1. This requirement is approximately equivalent
to the requirement that the molecular mean free path not be less than
the diameter of the metering tube.
Thus, for example, the metering tube diameter should not exceed 0.5
cm if the pressure Pj is to be as high as lO-^ torr. If the length of the
tube is 30 cm and its diameter is 0.5 cm, then from (2-97) the conduct-
ance C = 4.94 X 10-2 liter/sec for air at room temperature. The
highest pressure for which this conductance value is valid is lO^^ torr,
so that the maximum flow rate measurable is Qmax = 4.94 x 10~* torr
liter/sec, provided Pj < Pj. The lowest flow measurable with
accuracy using a McLeod gauge (Pj = 10"* torr) is then about 5x10-"torr liter/sec using this same metering tube.
By using ionization gauges instead of a McLeod gauge much lower
flow rates have been measured by this method, as described in Refs. 5
and 6. Although reliance upon ionization gauges for absolute measure-
ments is open to criticism due to the difficulties described in Chap. 3,
the measurement of the throughput, described above as applied to
pumping-speed determination, is a relative measurement, Pj relative
to Pj in a sequence of observations. Since in such a system the base
pressure for zero flow is nearly the same for both gauges, the error in the
THE MEASUREMENT OF PUMPING SPEED 291
pressure difference (P^ — Pg) is less than the error in either pressure
reading alone. At very low values of the pressure, such as lO"" torr
as observed in Ref. 6, however, significant gauge errors, even for the
pressure differences, are to be expected. Errors of this type dueprimarily to sorption and decomposition effects in the gauges can be
significantly reduced by using the noble gases such as helium, neon, andargon, for which these effects are far less bothersome than for the
chemically active gases.
7-3. Mechanical Pump Speed Measurements. Over most of
the operating pressure range of mechanical vacuum pumps the molec-
ular mean free path is short as compared with the diameter of the
Leak valve
Q. To flowmeter2 min
10 D max
Vacuum gauge I
I« min
L_i_:Pump
"TtMini D
I min
-~. To flowmeter
-©Vacuum gouge
(a)
Pump
(b)
Fig. 7-11. Arrangements for measuring the pumping speed of oil-sealed
mechanical vacuum pumps, (a) For inlet larger than 2 in. inside diameter;
(6) for inlet smaller than 2 in. inside diameter.
pump inlet. Gas flow is therefore viscous and the conductance into the
pump large as compared with the molecular-flow value. The con-
ductance of any reasonably proportioned test dome connected to the
pump inlet for the purpose of making pumping-speed measurementswill therefore be very large over most of the pressure range of interest
and will not seriously affect the results. However, some precautions
are necessary to ensure consistent results.
Typical arrangements for measuring the pumping speed of a mechani-cal vacuum pump with constant gas flow are illustrated in Fig. 7-11.
The system consists of a test dome of the same diameter D as the pumpinlet and of height equal to at least 1.5Z). The connection for at-
taching a McLeod gauge should be perpendicular to the wall of the test
dome at a distance of 1 in. or 0.25i), whichever is larger, above the
pump inlet. The gas flow should preferably be admitted at a distance
at least equal to 1.257) above the pump inlet near the closed end of the
test dome furthest from the pump inlet through a small tube bent so
that the air flow is directed toward the closed end of the dome. This
precaution is necessary only when the pressure is less than 1 torr to
292 VACUUM SCIENCE AND ENGINEERING
avoid the possible formation of a supersonic gas jet directed into the
pump inlet, the occurrence of which may result in fictitiously high values
of the pumping speed. For pressures above 1 torr this precaution is
not necessary However, the gas inlet should not be oriented directly
toward the gauge inlet.
Oil-sealed mechanical pumps all tend to splash or spit some oil out
the inlet into the test dome. In some cases this condition can be so
troublesome that the gauge connection becomes clogged and the gauge
Table 7-2. Pkbssube Gauges Recommended fob Use in Determination of
Pumping Speeds op Oil-sealed Mechanical Vacuum Pumps
Pressure range, torr
1 X 10-*-0.5
10-2-5.0
0.1-100
1.0-760
Type oj gauge
Fine McLeod gauge
Coarse McLeod gauge
Precision mercury manometerMercury manometer
contaminated with sealing oil. It is frequently necessary to introduce
some baffling in the test dome or some manifolding of larger diameter
between the pump inlet and the test dome to prevent oil accumulation
from interfering with pressure measurements.
Pressure measurements should preferably be made with closed
mercury U-tube manometers and McLeod gauges connected directly
to the test dome without a low-temperature vapor trap. The ranges
of the pressure gauges should overlap and have full scale readings no
greater than the upper range of the pressure limits given in Table 7-2.
As has been discussed in Sec. 5-3, the objective of the pressure measure-
ment is to determine the partial pressure of the gas admitted as the
measured throughput Q, unaffected by the vapor pressure of the sealing
oil in the pump. Total pressure gauges, such as a precision U-tube
manometer, should not be used for pressures below about 1 torr, since
the pressure of a poor quality or contaminated oil can easily be as great
as 0.05 torr without affecting the pumping speed of a mechanical
pump significantly. The McLeod gauge (see Chap. 3) has the distinct
advantage of responding perceptibly only to the permanent gas under
these conditions and should therefore be used for all values of the
pressure less than 1 torr.
For all but the largest flow rates, air should be admitted to the system
through a properly chosen needle valve after passing through the
flowmeter. When calibrated orifices are used, a gate valve should be
installed between the test dome and the orifice mounting to facilitate
changing orifices without shutting down the pump being tested.
Approximate ranges for various flow-measuring devices are given in
THE measurement OF PUMPING SPEED 293
Table 7-3. Instruments should be chosen to provide some overlap
in ranges to minimize errors in transition from one instrument to the
next as the throughput is changed.
In testing mechanical pumps by the constant-flow method it is foundthat consistent results are most readily obtained by first pumping downthe test system to an acceptable base pressure and then increasing
the throughput from zero upward, taking pumping-speed readings at
Table 7-3. Flow-measuring Means Recommended for Use in Determi-nation OF Pumping Speeds of Oil-sealed Mechanical Vacuum Pumps*
Flow range QFlow-measuring device
scfm torr cfm
0-0.2
0.1-100
20 and up
0-150
76-7.6 X 10*
15,200 and up
Inverted buret
Rotameters (1% accuracy) of
overlapping ranges
ASME standard, long-radius
orifices
* Orifices should preferably be used in the critical flow range (i.e., P < 400
torr). If they are used in the subcritical flow range (i.e., P > 400 torr) the flow
rate should be computed as outlined in Ref. 1.
successively higher values of the pressure. By this procedure the base
pressure is checked to see whether it is reasonable and the system is
tested for excessive leaks. Also, by the time the preliminary pump-down is completed the outgassing rate will have dropped to a low
enough value not to affect the results measurably.
A typical set of data of this type is shown in Table 7-4 and showngraphically in Fig. 7-12. A smooth curve is drawn through the data
points as representative of pump performance. The combined un-
certainty in the measurement of the gas throughput and the attending
pressure result in errors of the order of 5 per cent in pumping-speed de-
termination, when all reasonable precautions are taken.
7-4. Measurement of the Pumping Speed of Diffusion Pumps.As can be seen from the pumping-speed curves shown in Sec. 6-5, the
pressure range of interest for diffusion-pump operation is generally less
than 10-* torr, the pressure range in which the molecular mean free
path is of the order of, or greater than, the diameter of the pump barrel.
In this pressure range the geometry and dimensions leading into the
pump inlet affect the resulting pumping speed critically. For example,
adding a tubular extension of the same diameter as the pump barrel
and of length equal to three times its diameter to the inlet of a diffusion
pump will reduce the net pumping speed to about half that measured
294 VACUUM SCIENCE AND ENGINEERING
Table 7-4. Typical Set of Data for Determining Pumping Speed as a
Function of Inlet Pressure for a Single-stage Mechanical VacuumPump
Inlet Throughput P umping speed
pressure,
torr torr cfm torr liters/sec cfm liters/sec m^/hr
0.007
0.010 0.149 0.0703 15.0 7.08 25.5
0.021 0.821 0.389 39.2 18.5 66.6
0.030 2.01 0.95 67.0 31.2 114
0.050 4.18 1.97 83.5 39.4 142
0.070 6.50 3.07 93.0 43.9 158
0.10 9.66 4.56 96.6 45.6 164
0.20 21.9 10.3 109.5 51.8 186
0.50 55.3 26.2 111 52.2 189
1.0 117.3 55.35 117.3 55.35 199
3.0 375 177 125 59.0 212
5.0 690 325 138 65.0 234
7.0 924 436 132 62.2 224
10 1,280 604 128 60.4 217
20 2,640 1,244 132 62.2 224
30 3,960 1,866 132 62.2 224
50 6,295 2,967 126 59.5 214
80 10,400 4,910 130 61.3 221
100 12,800 6,040 128 60.4 217
200 26,200 12,500 131 61.8 222
300 39,000 18,390 130 61.3 221
10"' 10"' 10° 10' 10^
Inlet pressure, torr
Fig. 7-12. Plot of typical data(Table 7-4) of pumping-speedmeasurements on an oil-sealed
mechanical vacuum pump.
Air inlet
Diffusion punnp
Fig. 7-13. Incorrect method of
measuring pumping speed.
[Taken with permission from B. B.
Dayton, Ind. and Eng. Chem. 40,
795 (1948).]
THE MEASTJBEMBNT OF PUMPING SPEED 295
directly at the pump inlet. The configuration of the test dome con-
nected to the pump inlet, the location and orientation of the gas inlet
into the test dome all influence the measured value of the pumpingspeed more or less critically.
In a significant paper Dayton^ has discussed directional effects in
pumping-speed measurements. An extreme example of incorrect
method criticized by Dayton is illustrated in Fig. 7-13. In this
80° 70°
Fig. 7-14. Entrance and exit flow patterns for gas flowing through a circular
hole for which L = 5D (solid curves) compared with a cosine pattern (dotted
curve). [Taken with permission from B. B. Dayton, in 195G Vacuum, SymposiumTransactions (Pergamon Press, London, 1957).]
arrangement there is no test dome, but simply a flat plate bolted to the
inlet flange of the pump with connections for vacuum gauges and the
gas inlet. Gas molecules flowing from the inlet tube form a molecular
beam in which the molecular velocities are far from randomly oriented.
The angular distribution of molecular velocities resulting from gas
flow through a tube of length equal to five times its diameter, as
calculated by Dayton,^ is illustrated in Fig. 7-14, which must be
compared with the normal cosine distribution (dotted curve) char-
acteristic of random molecular motion. The angular distribution is
even more forwardly directed if the length of the inlet tube is manytimes its diameter. The gas molecules preferentially directed into the
pump jet are more effectively removed from the system than are
randomly directed molecules. The result is that the pseudo pumpingspeed measured by this incorrect method is invariably much greater
(such as a factor of 2) than that obtained by recommended methods
296 VACUUM SCIENCE AND ENGINEERING
't^'T^'t:^150 liters/sec 280 liters/sec
or
230 liters/sec
1 "^180 liters/sec 240 lifers/sec
Fig. 7-15. Effect of position and
orientation of the gauge opening on
the measured pumping speed of a
diffusion pump. [Taken with per-
mission from B. B. Dayton, Ind.
and Eng. Chem. 40, 795 (1948).]
which do not involve beaming of the gas flow into the pump inlet.
As Dayton^ has also pointed out, pumping-speed measurements can
easily be in error pessimistically if
the gas inlet is so oriented that a gas
jet is directed into the gauge opening.
The position and orientation of the
gauge opening also has a striking
effect upon the measured pumping
speed as illustrated in Fig. 7-15 from
Dayton's paper.^ This striking effect
arises because the flux of molecules
(i.e., the number per second per
square centimeter) through a small
opening placed above the inlet to the
pump is not independent of the
orientation of the opening. The distribution of the molecules is not
isotropic because they are coming generally from above, where they are
admitted, and disappearing below, where many of them are removed
by the diffusion-pump jet. Par-
ticularly in the pressure range be-
low 10-* torr, where the molecular
mean free path is very long, this
effect is pronounced. Since the
pressure measured by the gauge
is proportional to the flux of mole-
cules entering the gauge opening,
the gauge reading reflects the
nonisotropic distribution, giving a
higher reading if the end of the
gauge tube is turned upward to-
ward the top of the test dome and
a lower reading if it is turned
downward toward the pumping
inlet.
As a result of his investigation
of pumping-speed measurements
Dayton^ recommended the test
dome arrangement shown in Fig.
7-16 for testing diffusion pumps.The gas flow was admitted at the
top of the test dome through a series of circular baffles so placed as to
break up the molecular beam from the inlet tube and distribute the
flow randomly. The question arose whether the gauge connection
Fig. 7-16. Test dome arrangement for
measuring diffusion-pump speeds.
[Taken with permission from B. B.
Dayton, Ind. and Eng. Chem. 40, 795
(1948).]
THE MEASUREMENT OF PUMPING SPEED 297
shown at A or that at B in the figure would be more appropriate. Thegauge connection at A, with its opening oriented directly away from thepump inlet, will receive the same flux of molecules as does the pumpitself and will therefore produce a pressure reading equivalent to thatreceived by the pump. However, the question is not so much thepressure incident on the pump inlet, but the pressure associated withthe random motion of the molecules just above the pump inlet, unin-fluenced by the added increment of flux due to the downward flow.
Dayton reasoned that the gauge connection at B, with the plane of its
open end parallel with the direction of flow, would receive no additionalflux (positive or negative) due to the gas flow, but only that due to therandom thermal motion of the molecules, and would therefore receive
just the correct flux to produce a reading properly characterizing thepressure above the pump inlet. In addition, a nude gauge C of the typerecommended by Blears (see Sec. 6-4) was also included in the test domeas an alternative means of pressure measurement. The signiflcant
differences between nude and tubulated ionization gauges are dis-
cussed in some detail in Chap. 3.
Because of the critical dependence of the measured pumping speedof a diffusion pump on the arrangement of the test dome and its
accessories, adoption of a standardized test dome and procedure is
needed so that the performance of different models of diffusion pumpscan be specified unambiguously. A preliminary step toward meetingthis need was taken by the Committee on Standards and Nomenclatureof the American Vacuum Society." The committee recommendedthat the test dome to be used for this purpose have
:
1. Inner diameter D equal to that of the pump barrel.
2. Height (face of diffusion-pump flange to the closed end of thedome) of at least 1.5Z).
3. Exit of gas-inlet tube located on the axis of the test dome 1.0Z>
above the face of the pump flange and oriented directly toward thetop of the dome.
4. Gauge-connection tube oriented so that the plane of the open endis parallel with the axis of the test dome and located so that the openend is just above the top surface of the pump and protruding inwardfrom the wall of the test dome about 0.25 in. to avoid fouling by dif-
fusion-pump fluid condensed on the wall. Such a test dome is illus-
trated in Fig. 7-17.
The committee also recommended that the gauge not be connectedthrough a low-temperature vapor trap and that the gauge be cali-
brated before and after each series of measurements by inserting a
298 VACUUM SCIENCE AND ENGINEERING
and the test dome and
Sloped top
Gas-inlet line
Leak vol«e
Input meter
Optional cooling coils
Test dome
Vacuum gauge
Diffusion pump
standard conductance between the pumpobserving the resulting change in pressure.
The principal difference between the recommendations of the
committee" and those made earlier by Dayton^ is in the choice of the
diameter of the test dome. By choosing the diameter equal to that
of the pump barrel the problem of
the entrance conductance (equiva-
lent to the end effect in the case of
the conductance of a tube, as dis-
cussed in Sec. 2-11) is avoided
since the test dome becomes a
uniform extension of the pumpbarrel. If the test dome is con-
siderably larger in diameter than
the pump barrel, as illustrated in
Fig. 7-16, then the flow pattern
for gas entering the diffusion
pump would be somewhat similar
to the entrance flow pattern illus-
trated in Fig. 7-14, showing that
some of the molecules are reflected
back from the entrance, resulting
in an impedance to the flow.
Because no entrance conductance
is involved in the use of a test
dome of a diameter equal to that
of the pump barrel, the pumping
speed measured by the procedure
recommended in the committee's
report will be somewhat greater than that which would be obtained by
using a test dome of larger diameter.
In estimating the net speed of a diffusion pump when installed on a
system this effect must be taken into account by combining the
specified pumping speed with the appropriate entrance conductance
if the pump is to be installed on a valve body, manifold, or vapor
trap of expanded diameter. An effort to be more precise on this point
is hardly justified, however, since the geometry of a diffusion pumptogether with its associated components is such that only rather rough
calculations of the net pumping speed can be made using the simple
formulas given in Chap. 2. In most cases the net pumping speed can
be calculated accurately only by the Monte Carlo method described
in Sec. 2-12. This method has been applied by Pinson and Peck"to a number of practical combinations of vacuum components.
Fig. 7-17. Test dome and accessories
for measuring the pumping speed of a
diffusion pump consistent with the
recommendations of the Committee on
Standards and Nomenclature of Amer-ican Vacuum Society.
THE MEASUREMENT OF PUMPING SPEED 299
Although the recommendations contained in the committee's reporthave not been officially adopted by the American Vacuum Society,the testing of diffusion pumps in commercial practice generally followsthe recommended procedure with respect to the four items listed
above. Choice of gauge, use of refrigerated traps, method of flowmeasurement, and the like are still questions left to individual choice.
However, the procedure as practiced at the Kinney Vacuum Laboratorymay be considered as an example and is illustrated in some detail inFig. 7-17.
Pressure Measurement. There are two gauge-connection tubesin the test dome, both installed as prescribed in item 4 above. Forpressure greater than 10"* torr a McLeod gauge is used, connected to
the test dome through a liquid-nitrogen-cooled vapor trap. The useof the vapor trap with the McLeod gauge is essential to prevent mercuryvapor from the gauge from contaminating the test dome and to preventbackstreaming oil vapor from the diffusion pump from contaminatingthe gauge. The McLeod gauge in any case responds only to permanentgas, which is appropriate for the measurement of the true pumpingspeed as defined in (6-34).
For pressure less than 10"* torr two ionization gauges are used, oneconnected directly and the other connected through a liquid-nitrogen-
cooled vapor trap. The pressure read by the trapped ionization gaugeis the partial pressure of permanent gas only and is again appropriate
for substitution into (6-34) for the true pumping speed. The untrappedionization gauge provides a reading dependent upon the "total pres-
sure," including condensable vapor, which can be used for determination
of the apparent pumping speed according to (6-35).
Gas Flow. The gas flow into the test dome passes through a
flowmeter and needle valve. Since the throughput must be constant
for appreciable periods of time in order to establish equilibrium pressure
in the test dome for each reading, the needle valve must be of suitable
design to ensure steady and controllable flow at the low flow rates usedfor diffusion-pump tests (typically from about 10"^ to about 10*
cm^/min at atmospheric pressure). All routine pumping-speed tests
are made with air, although measurements for other gases, such as
hydrogen, helium, and argon, are also made for the purpose of under-
standing pump performance.
Various types of flowmeters suitable for measuring the throughputare described in Sec. 7-2. In the diffusion-pump range some form of the
inverted buret, such as the pipe organ shown in Fig. 7-7 or the con-
stant-pressure version shown in Fig. 7-8, is most convenient in use andis relatively free of systematic error when used with proper pre-
cautions.
300 VACUUM SCIENCE AND ENGINEEEING
The pumping-speed curve shown in Fig. 6-18 was obtained sub-
stantially as described above. As will be apparent from the deviations
of the experimental points from the smooth curve, the probable error
in individual determinations of pumping speed is about 5 per cent
because of uncertainty in the measurement of the pressure and through-
put. Provided that systematic errors due to vacuum-gauge calibration
and flowmeter reading are avoided,
results of this quality are satis-
factory for most applications.
With increasing interest in
pumping speeds at very low pres-
sure, the methods described above
are frequently found to be inade-
quate since they depend upon the
integrity of a vacuum gauge.
The problems of calibration of
ionization gauges and the errors
inherent in the use of a McLeodgauge have been sufficiently em-
phasized in Chap. 3 to raise
doubts concerning the validity of
a pumping-speed measurement
based upon a presumably pre-
cision reading of a vacuum gauge.
With this problem in mind,
Oatleyi^ has developed a method
of measuring pumping speeds
which is independent of the accuracy of vacuum-gauge calibration.
The method consists essentially of comparing the pumping speed
of a diffusion pump with the conductances of a series of apertures
placed in series with the pump. The experimental arrangement as
shown in Fig. 7-18 consists of a short tube A of diameter large as
compared with that of the pump barrel to which is connected the test
dome B. The opening between B and A is obstructed by a thin plate
D, in which there is a series of apertures C of various diameters, aijy
one of which can be brought in line with the opening into A by rotating
the plate. The plate D is mounted snugly on the base plate F so
that leakage of gas from the test dome around the selected aperture
into the region A is negligible. Gas enters the system through the
capillaries L and K between which there is a small chamber M main-
tained at a chosen value of the pressure by means of a mechanical
vacuum pump and throttling valve. The leak rate through K can
by this means be set and maintained at any desired value. With a
Fig. 7-18. (o) General arrangement
of Oatley's apparatus for measuring
pumping speeds; (6) arrangement of
apertures in plate D. [Taken with
permission from C. W. Oatley, Brit.
J. Appl. Phys. 5, 358 (1954).]
THE MEASUREMENT OF PUMPING SPEED 301
fixed value of the leak rate Q, the pressure in the chamber is read on the
ionization gauge B with each of the apertures C set in position over the
central hole. The conductance C through any of the apertures fromEq. (2-93) is known accurately from its diameter. From Eqs. (2-5)
and (2-7) the total pumping speed of the diffusion pump and the
aperture is given by1 P 1 1
S Q S^ C(7-24)
The pressure in the test dome (provided only that it is in the region of
linear response of the gauge) is
P = ki+ (7-25)
where ^+ is the positive ion current reading of the ionization gauge.
Thus
1j-
k \o„ C(7-26)
so that the gauge reading is a linear function of the quantity 1/C and
the intercept of the curve at 1/C = is reciprocal of the pumpingspeed Sj, of the pump alone. The pumping speed of the pump is thus
determined without measuring the gas throughput Q or the calibration
constant k of the ionization gauge.
The procedure of Oatley described above contains the elements of
what is needed to meet the final recommendation of the Committee on
Standards of the American Vacuum Society, i" that of calibrating the
gauge by inserting a standard conductance between the pump and the
test dome. By measuring the gas flow Q in the above procedure and
inserting its value in (7-26), the gauge constant k is also determined
from the slope of the line.
The accuracy of the method described above depends upon the
constancy of the flow rate Q throughout a series of readings for all
values of the conductance C. The selection of aperture diameters must
also be chosen so that the conductances are in reasonable proportion
to the pumping speed to be measured.
A pumpdown method of measuring the pumping speed at very low
pressure in a situation in which Eq. (7-10) is applicable is described
by Milleron.i^ Equation (7-10) is valid when the base pressure Pq
of the system is small as compared with Pj and Pg. The method
described by Milleron consists of baking the system and pumping downto a low base pressure P,,, increasing the pressure by admitting helium
or neon gas, and then observing the pressure as a function of the time
from Pj to Pj, where P^ > lOOP^ and P^ > lOPo- Since neither
helium nor neon is adsorbed appreciably, the pumping speed with
302 VACUUM SCIENCE AKD ENGINEERING
these gases can be determined without appreciable error due to sorption
or outgassing effects. Since only the ratio of the pressures PijP^
enters the calculation of the pumping speed, the gauge calibration
cancels out. If the measured pumping speeds for helium and neon are
accurately proportional to the square roots of the molecular weights,
then this law can be assumed to hold in general and the pumpingspeed for air and other gases computed accordingly. However, if
the pumping speeds measured for these two gases do not follow this
relationship, it is not clear how to extrapolate these results to other
gases. In that event a similar measurement using dry nitrogen would
probably yield reasonably accurate results in spite of the somewhatgreater problem due to sorption processes.
REFERENCES
1. Standards for Steam Jet Ejectors, 3rd ed. (Heat Exchange Institute, NewYork, 1956).
2. J. H. Leek, Pressure Measurement in Vacuum, Systems, 2nd ed. (Published
for the Institute of Physics and the Physical Society by Chapman and Hall,
Ltd., London, 1964), pp. 173ff.
3. B. B. Dayton, Ind. and Eng. Chem. 40, 795 (1948).
4. J. F. Cleveland, Kinney Vacuum Division, The Xew York Air Brake Com-pany, private communication, Sept. 19, 1949.
5. D. L. Stevenson, in 1961 Vacuum, Symposium Transactions (PergamonPress, London, 1962), p. 555.
6. C. E. Rufer, in 7956' Vacuum Symposium Transactions (Pergamon Press,
London, 1957), p. 74.
7. A. A. Landfors and M. H. Hablanian, in 1958 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1959), p. 22.
8. H. G. Noller, G. Reich, and W. Bachler, in 1959 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1960), p. 72.
9. B. B. Dayton, in 195G Vacuum Symposium Transactions (Pergamon Press,
London, 1957), p. 5.
"Report of Committee on Standards and Nomenclature" (Chairman, B. B.
Dayton), in 1955 Vacuum Symposium Transactions (Committee on VacuumTechniques, Boston, 1956), p. 91.
J. D. Pinson and A. W. Peck, in 1962 Vacuum Symposium Transactions
(The Macmillan Company, New York, 1962), p. 406.
C. W. Oatley, Brit. J. of Appl. Phys. 5, 358 (1954).
Norman Milleron, in 1958 Vacuum Symposium Transactions (PergamonPress, London, 1959), p. 140.
10.
11
12
13
CHAPTER 8
THE DESIGN OF VACUUM SYSTEMS
A vacuum system consists of a vessel to be evacuated together withthe vacuum gauges, vapor jet and mechanical pumps, vapor traps,valves, connecting manifolds, and pipes. The vacuum vessel may bea processing tank, a space simulator, the chamber of a particle acceler-ator, or any enclosure within which the gas pressure must be reducedto a value substantially less than atmospheric. Designing the systemconsists of deciding upon the features of the vessel, selecting specific
commercial vacuum components, and arranging these componentstogether with interconnecting piping and accessories to achieve thespecified vacuum conditions in the vessel.
8-1. The Vacuum Vessel. Vacuum vessels are built to meetsuch a wide variety of requirements that a detailed description appli-cable to all circumstances is not feasible. However, a design philosophycan be suggested, and certain generally desirable features and fabri-
cating methods will be described.
Since a vacuum vessel is subjected to external atmospheric pressure,the usual precautions for the design of tanks subject to externalpressure should be taken to ensure that the vessel can safely withstandan external pressure of somewhat more than 1 ton/ft^. Aside from thepossible danger of buckling or collapsing, the walls of a vacuum vesselwill deflect during evacuation and return to normal when air is re-
admitted. Such deflections must be evaluated and any excessivedeflections corrected by increasing the wall thickness or by providingstructure to aid in sustaining the load imposed by the atmosphere.The materials of construction of vacuum vessels are predominantly
mild steel, stainless steel, and aluminum, although brass and copperare also fairly common. Castings are generally troublesome owing toporosity and are to be avoided whenever possible. Sections of glassm the form of plates or of tubes are frequently used for viewing portsor for electrical insulation. High-quality ceramics are frequentlyused as insulators for high-voltage leads. The vacuum vessels of large
proton synchrotrons are probably the most complex in design and303
304 VACUUM SCIENCE AND ENGINEERING
exotic in the choice of materials because of the unusual combination
of electrical and mechanical properties required. Certain of the epoxy
resins were first used extensively in this application and have since
been used to advantage in other vacuum applications involving unusual
electrical, magnetic, and mechanical requirements.
Table 8-1. Some Properties op Commonly Used Solvents*
VaporBoiling Flash Toxicity, •
Solvent Formulapressure
at 20°C,point, point. M.A.C.
torr°C °C in ppm
Chlorinated hydrocarbons:
Trichloroethylene (_/ {j-HOlq 60 87 None 200
Carbon tetrachloride CCI4 88 77 None 25
Chloroform CHCI3 180 61 None 100
Aromatic hydrocarbons:
Benzene t_/rt_tle 80 80 -11 25
Toluene C,Hg 23
5
110
140
5
30
200
200XylenePetroleum hydrocarbons:
Stoddard solvent 25 155 40 500
Ethers:
Ethyl ether C,H,„0 440 35 -30 400
Ketones
:
^4^^10^
Acetone C,H„0 180 56 -20 1,000
Methyl ethyl ketone C.HgO 71 80 ^2 250
Alcohols
:
Methyl (wood) alcohol CH4O 98 65 15 200
Ethyl (grain) alcohol C2H5O 46 78 18 1,000
Isopropyl alcohol CoHoO 38 82 15 400
Fluorinated hydrocarbons:3 8
Trichloromonofluoromethane
Freon-MF(CCl3F) 700 24 None 1,000
Trichl orotrifluoroethane
Freon-TF(CCl2FCClF2) .... 284 48 None 1,000
Tetrachlorodifluoroethane
Froon-BF(CCl2FCCl2F) . . . 57 93 None 1,000
* From Bulletin FS-6, Solvent Properties Chart, issued by E. I. du Pont deNemours & Company, Inc., by permission.
The interior of a vacuum vessel should be as smooth and free of
crevices as possible. After fabrication the interior surfaces should becleaned by vapor-phase degreasing or by the use of a highly volatile
solvent to remove oil and other contaminants which would otherwise
maintain a high organic vapor pressure long after the vessel is evacuated.A list of useful solvents and their properties is given in Table 8-1.
THE DESIGN OF VACUUM SYSTEMS 305
The cleaning of a very large vacuum vessel can be a rather difficult
undertaking since health hazards and the danger of an explosion areserious factors. The use of detergents with water is not recommendedsince detergents leave a thin, highly tenacious film. In the case of anaccelerator cavity 9 ft in diameter and 90 ft in length the most satis-
factory answer to the problem of cleaning has been to scour the surfacewith fine emery and then wash with distilled water using carefully
selected cloths.
The quality of welding required for the fabrication of vacuum vessels
is such that only gas-shielded arc welding is recommended. Atomichydrogen welding produces excellent results and was for several years
the best commercially available process. The molten metal at the
weld is protected by a blanket of atomic hydrogen, reducing any oxides
present and preventing further oxidizing of the metal. More recently,
arc welding with helium or argon has become generally available,
helium being more common and inexpensive in the United States andargon in Europe. Using these methods a skillful welder can produce
leak-proof welds with far greater dependability than by oxyacetylene
or by ordinary electric arc welding in air. These latter methodsrequire the use of flux, which frequently results in occlusions whichcan cause leaks to develop after a weld has been tested and found to be
free of leaks.
In order to present a smooth interior surface free of crevices the welds
in a vacuum vessel should either be prepared for welding from inside
or, if to be done from outside the vessel, should be prepared for full
penetration. In either case no crack or crevice remains on the interior
surface. The exposed weld metal can then be machined or ground to a
smooth finish if desired.
A vacuum vessel must generally have a number of access and viewing
ports, flanged connections for the attachment of pumps, motion seals,
and other features required for the process to be carried out. Eachsuch feature requires cutting through the wall of the vacuum vessel
and welding in a tube or a flange and should be planned with care to
facilitate the welding operation and thereby minimize the probability
of a leak. Figure 8-1 illustrates acceptable designs for (A) a tube in the
side of a cylindrical tank, {B) a flange at the end of a tube, (C) a side
seam in a cylindrical tank and (D) the joining of an end bell onto the
cylindrical section of a tank. If internal welded joints need reenforce-
ment by additional welding on the outside, as illustrated in (B) above,
the outside weld should not be continuous, but should consist of a
series of segments with gaps between. If the outside as well as the
inside weld were continuous, then a volume of gas would be trapped
between the two welds. A small hole in the inner weld would slowly
306 VACUUM SCIENCE AND ENGINEERING
leak gas into the chamber but could not be located by a helium leakdetector or any other method. Such leaks are referred to as virtual
leaks and can arise whenever pockets of trapped gas are formed duringfabrication. The very anomalous symptoms of a vacuum system witha virtual leak are so difficult to diagnose that the designer shouldconscientiously avoid any possibility of pockets of trapped gas.
'Bell
^^—Tcnk
(D) Bell-to-tonk Weld
rK'Tank
S /, Tube
^Tank
(Where inside
welding possible
Tube
1
Where only
outside welding
possible
A) Tube-to-tank Weld
Outside
W^WVxVM ^th>TankVocuum side
Where inside ( Where only outside'
welding possible) welding possible
(C) Seam Weld
Flange
B) Flange-to-tube Weld
Fig. 8-1. Details of welds for vacuum vessels and compononts. {A) Tube intothe side of a cylindrical tank; (_B) flange on the end of a tube; (C) side seam in acylindrical tank; (£») end bell on a cylindrical tank.
Of major importance in the design of a vacuum vessel is the areaallocated to the pumping port. In the pressure range below 10"* torrthe flow is molecular so that the conductance at room temperaturethrough an aperture in a thin wall is that given by Eq. (2-93),
c
which for air at room temperature is
G = 11.6^ liters/s
where A is the area of the hole in square centimeters. Levenson,Milleron, and Davis^* have shown that the transmission probabilityachievable in the design of the combined vapor baffle and valve for adiff"usion pump is about 0.35; that is, the conductance of the baffleand valve can be as great as 0.35 that of the aperture alone. Com-bining this result with an assumed Ho coefficient (see Sec. 6-5) of 0.5,
* References indicated by superscript numbers are listed at the end of thechapter.
THE DESIGN OF VACUUM SYSTEMS
the pumping speed for air achievable with good design is
S = 0.2C = 2.3^ liters/sec
307
(8-1)
Thus the pumping speed for air realizable through a 6-in. pumpingport is about 400 liters/sec. In the weighing of priorities for wall space
in a vacuum vessel, the importance of providing an adequately pro-
portional pumping port should not be neglected if the system is to
perform in accordance with requirements.
The final step in the fabrication of a vacuum vessel should be a
thorough job of leak hunting using a mass-spectrometer type of leak
detector. All the openings in the vessel should be blanked off with
gasketed cover plates, and the vessel evacuated by means of a mechan-
ical roughing pump with the leak-detector unit in the pumping line.
All welded joints should be inspected for leaks using a fine jet of probe
gas in brief, carefully directed bursts in order to facilitate localizing
any leak which may be present. With the superior leak-detection
(see Chap. 4) and welding methods now available it is no longer neces-
sary to accept as unavoidable a leakage rate which is great enough to
constitute a serious limitation on the performance of a vacuum system.
8-2. Demountable Seals. In the assembling, operating, and
servicing of vacuum systems demountable seals are convenient if not
absolutely essential. The major components of a vacuum system are
generally assembled using demountable seals to facilitate subsequent
disassembly for servicing or modification. Access port covers, viewing
windows, gauges, and other accessories are typically connected to the
vacuum vessel with demountable seals. Many types of seals have been
used for this purpose, but with the development during World War II of
rings for seals in aircraft hydraulic systems, the adoption of various
flange configurations sealed by rings has become an almost universal
practice.
An ring is a molded, ring-shaped gasket with circular cross section
made in a wide range of dimensions and of any of several elastomers,
depending upon its intended use. For vacuum service the material
should have a Shore hardness of about 60. Buna N is commonly used
because it does not deteriorate when exposed to oil and has excellent
mechanical properties for room-temperature seals. Figure 8-2 illus-
trates a number of typical 0-ring seals. For sealing flanges an O ring
is inserted in a groove cut in one member of the mating flanges, the
other member having a smooth, flat surface. Several shapes of
grooves, some of which are illustrated in Fig. 8-2a, have proved to be
useful. However, whatever the shape of the groove, its depth should
not exceed two-thirds the cord diameter of the O ring, and the area
308 VACUUM SCIENCE AND ENGINEEEING
of its cross section should exceed that of the ring. When the
mating flanges are then forced together metal-to-metal, as shown in
Fig. 8-26, the ring is sufficiently distorted to provide a good seal
but does not fill completely the volume available in the groove. This
latter provision ensures that the elastomer of the O ring is not over-
stressed. If the volume of the groove does not exceed that of the
aAJ:ij
A= ~ 13/16 X O-ring diameter
B = ~ 1 1/2 xO-ring diameter
A=~ 49/64x0-ring diameter
B = ~ 7/8 X O-ring diameter
(c)
Body
Gland nut
^Glond
^''<'!<-/M/A
O-ring
Bell jar
Fig. 8-2. O-ring demountable seals, (a) Types of O-ring grooves; (6) flangewith single O ring; (c) flange with double O ring and guard ring; {d) O-ringcouplings; (e) double O-ring seal for a metal bell jar.
ring, the ring will lose its elasticity and may fail to maintain aleak-proof seal. In any case, an overstressed ring cannot be reusedand may have to be scraped out of its groove. For some vacuunlcryogenic applications it has been found necessary to compress the
ring to as little as one-third its original thickness to ensure a leak-proof seal at low temperature. The rule of providing sufficient volumefor the ring to expand laterally still applies even when the grooveis as shallow as that required for this type of application. The groovedesign for an O-ring seal assumes that the bolting or clamping means is
adequate to bring the faces of the mating flanges into contact (metal-to-metal). In most cases the need for rigidity of the system ensures thatthe bolts or clamps provide much greater total compressional forcethan is needed to achieve metal-to-metal contact, and the groove
THE DESIGN OF VACUUM SYSTEMS 309
dimensions are such as to ensure that the O rings are not overstressed.
Another advantage of the metal-to-metal contact is that the conduct-
ance from the O ring to the vacuum space is then very small so that
outgassing of the elastomer is somewhat inhibited. rings are
commercially available over a wide range of sizes, from about aneighth of an inch in major diameter to about eighteen inches. More-
over, much larger rings can be made from extruded buna N cord
cut to the desired length and vulcanized, preferably with a 45° splice.
The use of a double O-ring seal with a guard-ring groove between
the rings is illustrated in Fig. 8-2c. The guard ring is normally vented
to atmosphere through a small fitting. Leakage at the flange can be
checked by evacuating the guard ring, which reduces the pressure on
the inner ring substantially and therefore also the leakage rate if a
leak is present. Alternatively, a probe gas may be introduced into the
guard ring to provide a very sensitive test for leaks through the inner
O-ring seal. The guard ring can also be filled with a low-vapor-
pressure liquid, such as diff'usion-pump oil, as a means of decreasing
the leak rate. Farkass and Barry ^ report that by circulating cold
(6°C) water through the guard ring of such a seal "significant reductions
can be made in the total gas load of the system by lowering the tem-
perature of the sealant material." For seals which are to be opened
and closed frequently, as in the case of the seal at the base of a metal
bell jar (see Fig. 8-2e), the use of a double O ring with the guard ring
routinely pumped out by an auxiliary vacuum pump reduces sub-
stantially the leakage problem.
rings can be used in convenient couplings for connecting lengths
of pipe together or for connecting a glass tubing to a metal tubing.
A typical coupling of this type is shown in Fig. S-2d and is merely
illustrative of many such couplings now available. Vacuum couplings
of this type are also convenient for attaching gauges and other acces-
sories to vacuum systems and for improvising temporary vacuum
systems for bench use.
Guthrie and Wakerling^ have described the use of square-cross-section
synthetic rubber (buna N) gaskets for the purposes for which rings
are now commonly used. Because of the greater convenience and
availability of rings the square-cross-section gasket material is now
seldom used. However, the double grooveless gasket described by
Guthrie and WakerUng (see Fig. 8-3a) also developed during the Man-
hatten Project period is now available commercially to fit several sizes
of standard flanges. The grooveless gasket assembly consists of two
rings of rubber vulcanized to both sides of a metal ring on which are
mounted an array of metal spacers to limit the spacing between the
flanges as they are bolted together to prevent overstressing the rubber
310 VACUUM SCIENCE AND ENGINEERING
gaskets. The space between the two rubber rings may be used as aguard ring by drilling a hole through one flange and installing a fitting.
Since no grooves are required, all flanges are ground flat. This type of
gasket is particularly convenient and eff^ective for assembling fore-
vacuum pipe lines. The Gask-0-Seal (Parker Seal Company) illus-
trated in Fig. 8-36 is a commercially available example of a grooveless
A^
Gaskets
Spocers
Spacers spot-welded
to each face
(a)Section A-A
(6)
Fig. 8-3. (a) Grooveless gasket for use on standard pipe flanges. [Taken withpermission from A. Guthrie and R. K. Wakorling (ods.), Vacuum Equipmentand Techniques (McGraw-Hill Book Company, New York, 1949).] (6) ParkerGask-0-Soal. [Taken with permission from the Parker Seal Company, Hayward,-Calif.]
gasket suitable for sealing between two flat flanges. A metal ringhas grooves cut in both sides and filled with molded elastomer gasketswhich have protruding ridges. The shape of the gasket material is
such that when the mating flanges are pulled metal-to-metal againstboth sides of the metal ring, there remains some free volume when thetwo ridges on each gasket are fully compressed. Thus the elastomeris never overstressed. The figure shows the gaskets before and aftercompression by the flanges.
THE DESIGN OF VACUUM SYSTEMS 311
Atmospheric
pressure
Ultrahigh
vacuum
Farkass and Barry^ have carried out tests on the base pressure
attainable in a vacuum chamber using rings made of various elas-
tomers. The O ring under test
was placed in the inner groove of a
double seal, between the grooves
of which was a guard-ring channel,
as shown in Fig. 8-4. In these tests
the guard-ring channel was used
to control the temperature of the
ring and flanges. The results
obtained with flange temperatures
of 6°C and -25°C are shown in
Table 8-2. In another set of tests
the base pressure of the empty
chamber was observed at room
temperature with inner rings of
either butyl or neoprene. Then
a 143^-in.-diameter ring of the
material to be tested was placed
loosely in the chamber and the base
pressure again observed. The in-
crease in base pressure multiplied
by the known pumping speed of
the system was taken as a measure
of the room-temperature outgassing rate. In Table 8-3 the results
of these tests are shown together with the measured outgassing rates
in micron liters per second per square centimeter of 0-ring surface area.
Fig. 8-4. Double O-ring seal with
guard ring cooling channel. (1)
Inner O ring; (2) cooling channel;
(3) outer O ring. [Taken with per-
mission from I. Farkass and K. J.
Barry, in 1960 Vacuum Symposium
Transactions (Pergamon Press,
London, 1961).]
Table 8-2. Base Pressures with O Rings Made of Various Elastomers
WITH Flange Temperature Maintained at 6°C and at — 25°C*
Flange temperature 6°C Flange temperature — 25°C
ElastomoterLowestpressure
attained,
torr
Numberof runs
Ranges of
values,
torr
Lowestpressure
attained,
torr
Numberof runs
Ranges of
values,
torr
ButylNatural rubberNeopreneBuna NSilicone (red). .
Silicone (green)
Viton ATeflon
1.0 X 10-"
4.5 X 10-"
2.1 X 10-"
3.8 X 10-"
2.2 X 10-'
3.2 X 10-'
1.3 X 10-"
4.2 X 10-"
5
2
6
4
2
2
3
4
0.8-1.2 X 10-"
4.0-5.0 X 10-"
2.0-2.4 X 10-"
3.6-4.0 X 10-"
2.1-2.3 X 10-'
2.4-4.0 X 10-'
1.2-1.4 X 10-"
4.0-4.4 X 10-"
1.75 X 10-"
1.2 X 10-"
2.1 X 10-"
4.8 X 10-"
5.6 X 10-"
1.0 X 10-"
2
2
2
2
2
2
1.5-2.0 X 10-"
1.0-1.4 X 10-"
2.0-2.2 X 10-1"
4.6-5.0 X 10-"
5.5-5.7 X 10-"
0.9-1.1 X 10-"
, „ , .,, . . „ T T7 I . „„,! V T Rnrrv in 1960 Vacuum Symposium Trans-* Taken with permission from I. Farkass and h,. J. uarry, ni jjt>i/ a i-
actions (Pergamon Press, London, 1961), p. 35.
312 VACUUM SCIENCE AND ENGINEERING
As an example of one of the tests performed, the authors state that
when the flange and 0-ring seal were at room temperature, the base
pressure attained was 2 x 10~^ torr. However, when the temperature
of the flange and O ring was raised to 40°C, the pressure increased
to 1.5 X 10~*torr; and when the temperature was —25°C, the pressure
decreased to 1.5 x 10^^" torr. These tests indicate that butyl is a
preferred 0-ring material for room temperature or below, having both
Table 8-3. Material Outgassing Rates of Rubber O RingsAll Tests Conducted at Room Temperature*
Material of
vacuumsystemO ring
Pressure with Pressure with Outgassing rate
empty chamberafter 24 hr
pumping,
Material of
tost ring
test O ring in
chamber after
24 hr pumping,
of test O ring
with entire
surface exposed,
torr torr ^fl/sec cm^
Butyl 1.0 X 10-" Neoprene 4.6 X 10-8 6.40 X 10-5
Neoprene . . . 2.0 X 10-» silicone (red) 5.8 X 10-" 0.44 X 10-5
Nooprone . . . 2,0 X lO-" Silicone (green) 5.8 X 10-" 0.44 X 10-5
Butyl 1.0 X io-» Teflon 2.2 X 10-8 2.32 X 10-5
Butyl 1.0 X io-i> Butyl 1.0 X 10-8 1.08 X 10-5
Butyl 1.0 X 10-" Viton A 1.8 X 10-8 2.04 X 10-5
Neoprene . . . 2.0 X 10-» Natural rubber 2.0 X 10-8 2.16 X 10-5
* Taken with permission from I. Farkass and E. J. Barry, in 1960 Vacuum Symposium Trans-actions (Pergamon Press, London, 1961), p. 35.
a low outgassing rate and low base pressure so that its gas permeability
must also be low. Neoprene and Viton A also rate very close to butyl
according to these tests. It is to be noted that although the silicones
tested have the lowest outgassing rates, the base pressure at 6°C is veryhigh, indicating a high gas permeability.
Addis, Pensak, and Scott* have compared Viton A and B with buna NO rings using a mass spectrometer and a vacuum chamber which could
be baked out at temperatures up to about 300°C. After some prelimin-
ary tests it was established
1
.
That the gases given off by Viton as it is baked out to tempera-
tures up to about 300°C is predominantly water vapor, CO, and CO2',
and no detectable hydrocarbons, whereas buna N rubber gives off
water vapor and a whole series of hydrocarbons from C2H3 to C^Hjg
and presumably beyond2. That Viton does not decompose until the temperature exceeds
300°C, whereas buna N cannot safely be baked at temperatures in
excess of about 150°C
3. That prebaking the Viton rings in vacuum at 200°C for several
days and then storing them in a desiccator greatly reduces the evolutionof water, CO, and COj when they are finally put into use
The lowest pressure attainable in the vacuum chamber using buna N
THE DESIGN OF VACUUM SYSTEMS 313
rings was about 10"' torr. When the buna N was replaced by Viton
rings, a base pressure of 3 x 10-^ was attained. The mass spectrom-
eter trace of residual gases in the chamber with buna N and with
Viton rings shows that, aside from the total gas present being muchless with the Viton than with the buna N O rings, hydrocarbons are
essentially absent with Viton, whereas the entire series of hydrocarbons
are present with buna N rings. The authors recommend the use of
Viton A or B O rings with baking the system at a temperature of
about 250°C for several hours whenever low base pressure and absence
of hydrocarbons are important.
For many years various forms of metal gaskets have been developed
to avoid the use of elastomers as gaskets. Because metal gaskets play
an important role in ultrahigh-vacuum technology, this topic is reserved
for Chap. 9. Two distinct advantages may be gained by the use of metal
gaskets: (1) the hydrocarbons and other gases associated with elas-
tomers are eliminated from the system, and (2) metal gaskets permit
baking the system to much higher temperatures than can be tolerated
by elastomers, permitting a more thorough outgassing of the metal
parts of the system.
8-3. Motion Seals. Manipulation of objects inside a vacuumchamber while the system is at high vacuum is a common requirement.
In some cases the motion can be accomplished by mounting a soft steel
member on a shaft inside the vacuum chamber and a rotatable per-
manent magnet just outside the chamber wall. The shaft then responds
to the motion of the magnet as long as the torque required is not too
great. Continuous rotation can be achieved by mounting the rotor
of a small induction motor on a shaft inside the vacuum chamber and
the stator outside with a thin metal casing between to provide the
vacuum barrier. The rotating magnetic field from the stator penetrates
through the thin wall of the casing and drives the rotor in the usual way.
The molecular-drag pump of Beams and Williams described in Sec. 5-13
is driven in this manner.
Both rotational and translational shaft motion is made possible by
the Wilson'^ seal, the construction of which is shown in Fig. 8-5a. The
seal is built into a cylindrical fitting with a smoothly machined opening,
the base of which has a conical contour around the shaft hole. Twoelastomer washers, two metal spacers, and a packing nut make up the
seal. The outside diameter of the elastomer washers is cut to fit the
inside diameter of the casing closely, and the central hole diameter is
about two-thirds that of the shaft. The first metal spacer has a
central conical portion which matches the conical shape at the base
of the casing. The second spacer is a plain circular collar which
transmits pressure from the compression nut to the outer rim of the two
314 VACUUM SCIENCE AKD ENGINEERING
gaskets, causing them to seal against the outer wall of the casing. Theconical sections support the gaskets at the proper angle and prevent
them from being pushed inward by the external pressure. In order
to seal properly, the elastomer gaskets must be cut smoothly andlubricated with a low-vapor-pressure grease or with diffusion-pump oil.
The elastomer material should have a Shore hardness of 50 to 60.
The region between the two washers may be pumped out to reduce
Pumpouf connection
Pumpout port
Fig. 8-5. (a) The Wilson seal. (1) Body; (2) seal washer; (3) pumpout ring;
(4) compression ring; (5) compression nut; (6) shaft.
(6) Chevron seal. (1) Body; (2) seat ring; (3) gasket; (4) pressure andpumpout ring; (5) pressure ring; (6) compression spring; (7) compression nut;
(8) shaft. [Talien with permission from Lawrence Radiation Report UCRL-7830,Apr. 15, 1964, by T. H. Batzer.]
leakage through the inner seal, may be filled with a low-vapor-pressure
oil, or may be used for testing the leakage through the inner seal.
When properly assembled, the leakage rate for a Wilson seal for a
M-in. shaft is, according to Dawton,* not more than 10~' torr liter/sec,
most of which is condensable at liquid nitrogen temperature. Theleakage rate during rotation of the shaft is about three times the
stationary leak and that due to translational motion inward is consider-
ably greater. For repeated in-and-out motion the shaft must be kept
lubricated. The surface of the shaft must be very smooth and, free
of scratches in order for the washers to seal properly. Since atmos-pheric pressure tends to push the shaft into the vacuum chamber,provision should be made to limit the motion of the shaft, particularly
for shaft diameters in excess of 2 in. Very similar to the Wilson seal
is the chevron seal illustrated in Fig. 8-56. The chevron seal permitsgreater range of adjustment of the compressional loading with the
result that materials such as Teflon may be used for the washers.A number of commercial seals similar to the Wilson seal have
THE DESIGN OF VACUUM SYSTEMS 315
To mechonicol pump
t
Silicone rubber
Gorlock Klozures
become available. In Fig. 8-6 is shown the rotating vacuum seal
described by Roberts,' which utilizes two Garlock Klozures (the
Garlock Packing Company, Palmyra, New York) of silicone elastomer
lubricated with Dow-Corning 704 Silicone diffusion-pump liquid.
Silicone rings are used to seal against leakage between the Garlock
Klozure units and the wall of the seal housing. The shaft is supported
on two ball bearings, one of which
is on the vacuum side of the seals,
presenting the problem of lubrica-
tion at high vacuum. Although
this problem can be solved by the
use of low-vapor-pressure grease or
a dry lubricant such as molybdenumdisulfide, a better solution for some
applications would be to locate both
bearings outside the double seal.
As used by Roberts, the space be-
tween the two seals is evacuated to
a pressure of about 10"* torr by
a mechanical pump. With a shaft
diameter of 0.406 in. he reports a
base pressure of 1 X 10"' torr with
the shaft stationary and 7 x 10"'
torr with the shaft rotating at 1,000
rpm. The system was pumped by
a 300-liter/sec diffusion pump with
a liquid-nitrogen-cooled trap.
Very simple shaft seals can be made using rings as shown in Fig.
8-7. In Fig. 8-7a is shown a seal in which two 0-ring grooves have
been machined in the wall of the clearance hole for the shaft. A third
groove placed between the 0-ring grooves is connected by a small
drilled hole to a pump-out fitting. In assembling this type of seal
the rings are well lubricated with vacuum grease and placed in the
grooves. The shaft with its leading end tapered is then thrust down
through the seal.
In Fig. 8-76 the shaft hole is drilled oversize down to the depth of
the seal, the total diameter being about equal to the shaft diameter
plus 1.5 times the cord diameter of the ring, so that the 0-ring
circular section will be compressed to about three-quarters of its initial
diameter. A metal collar serves as a spacer between the rings, and a
nut permits adjustment of the pressure on the rings. The region
between the rings may be filled with low-vapor-pressure oil or may
be used as a vacuum guard ring.
Scale
Fig. 8-6. Rotary vacuum seal con-
struction. [Taken with permission
from R. W. Roberts, Rev. Sci. Instr.
32, 750 (1961).]
316 VACUUM SCIENCE AND ENGINEERING
A type of shaft seal frequently used in mechanical booster-pump
construction is shown in Fig. 8-8. The heart of the seal consists of a
highly polished graphite surface which is held in contact with a similarly
Compression
nut
Vacuum chamber
wall Vacuum chamber
wall
Fig. 8-7. O-ring shaft seals.
highly polished steel surface by means of a spring. Elastomer O rings
and gaskets are used to prevent leakage between one seal member and
the shaft as well as between the
other seal member and the wall
of the housing. Ordinary lubricat-
ing oil or a low-vapor-pressure oil
such as diffusion-pump fluid maybe used for lubricating the rotary
seal, depending upon requirements.
The principal advantage of this
type of seal is the high rotational
speed—1,200-3,600 rpm and more
—of which it is capable. When the
seal is properly assembled, the leak-
age rate for permanent gas can Hbe
very small, the principal difficulty
being the tendency to weep lubri-
cant along the shaft into the vacuumregion.
For many years metal bellows
have been used as schematically
illustrated in Fig. 8-9 to transmit translational motion of a shaft into a
vacuum chamber. Bellows of bronze and stainless steel are mostgenerally useful for this purpose, the bronze bellows normally being
soldered and the stainless steel bellows generally being arc-welded for
Fig. 8-8. Mechanical rotary shaft
seal. (1) Sealing washer; (2) floating
seat; (3) bellows; (4) retainer shell;
(5) driving band; (6) disk; (7) spring;
(8) spring holder; (9) seat sealing
ring.
THE DESIGN OF VACUUM SYSTEMS 317
sealing the ends. Metal bellows seals of this type have the great
advantage over Wilson and similar seals in that they can be completely
free of leakage. Their disadvantage is the relatively more difficult
job of effecting a repair in case of failure. The stroke permitted by a
bellows seal is limited so that the designer must be strictly guided by
the recommendations provided by the bellows manufacturer. Even
Welded or brazed closures
Air
Welded or brazed closures
Vacuum ^
Fig. 8-9. Metal bellows seal for linear
motion. (1) Guide bushing; (2) stop
collar; (3) bellows; (4) shaft. [Taken
with permission from Lawrence Radia-
tion Lab. Rep. UCRL-7830, Apr. 15,
1964, by T. H. Batzer.]
Fig. 8-10. Metal bellows seal for trans-
mitting rotary motion. (1) Guide
bushing; (2) collar; (3) drive shaft;
(4) bellows; (5) drive rotor; (6) driven
rotor; (7) bushing; (8) driven shaft;
(9) housing. [Taken with permission
from Lawrence Radiation Lab. Rep.
UCRL-7830, Apr. 15, 1964, by T. H.Batzer.]
then, metal bellows crack, usually near one of the end welds. By far
the greatest use of bellows seals is in the construction of vacuum valves,
some examples of which are given in the next section.
Metal bellows can also be used for transmitting rotary motion into a
vacuum vessel. An example of one of the many designs for this pur-
pose is shown schematically in Fig. 8-10. Although several designs
of rotary bellows seals have been developed, they are not used ex-
tensively, probably because of frequent failure and the complexity
of construction. In all such devices some torque is imposed on the
bellows during rotation of the shaft. Whenever bearings in which the
shaft should turn freely tend to seize or gall, the bellows receives a
twist which can cause it to buckle and crack.
A unique design of dual-motion feedthrough has been described by
Gerber .8 The construction of this device is shown in Fig. 8- 1 1 ;a detail
of the weld joint at one end of the type 316 stainless steel bellows
is shown in Fig. 8-12. All joints are Heliaro welded and are designed
so that relatively thin mating edges can be fused without the use of any
filling material. For a travel of 2 in. the bellows used has an extended
length of 3M in. and an outside diameter of iKe in. The rotary
318 VACUUM SCIENCE AND ENGINEERING
Leod -screw key
Wheel -retoining
ring
Bellows-seoling
flonge
Heliarc weld
Bellows
motion is accomplished by means of an inner and an outer magnetassembly of which the inner is supported on the linear motion rod by
means of a ball bearing. If the
unit is required to tolerate high-
temperature bakeout, the inner
magnet is replaced by a Kovarblock machined in a quadrupoleconfiguration and the outer mag-net assembly is removable during
baking. For situations not per-
mitting the use of a lubricant, the
moving stainless steel parts maybe treated by a nitriding process
which produces a relatively abra-
sion-free surface.
8-4. Vacuum Valves. Theconvenience in operation of avacuum system depends greatly
upon the choice and location of
valves for isolating various por-
tions of the system. Very early
in the development of all-metal
vacuum systems it was discoveredthat valves which are entirely
satisfactory for use on steam andcompressed-air systems are un-satisfactory for vacuum apphca-
Heliarc weld
Ball-bearing
mounting screw
Outer
magnets^'
Magnetic
locoting pin
Heliarc weld
Handwheel
Wheel bearingplate
Lead screw
Mounting bracket
Linear motion
activating rod
Moin assembly
body
Boll-bearing
retaining tlonge
Ball beoring
Inner magnets
'nner magnet
capsule
Vacuum spoce Gasket groove
Fig. 8-11. Sectional view of
motion feedthrough. [Takenpermission from J. F. Gerber,
Sci. Instr. 34, 1111 (1963).]
dual
with
Rev.
tions because of excessive leakage through the packing around thevalve stem and at the joint between the bonnet, which carries the stempacking, and the valve body. Many different methods for modify-ing standard steam globe valves to re-
duce or eliminate leakage may be foundin the literature. Steam valves in
which the bonnet is remachined to
accommodate a Wilson or chevron seal
and an adequate gasket, such as anring at the joint between the bonnetand valve body, are satisfactory for
many rough vacuum applications.
However, there are so many different
varieties of diaphragm and metallic bellows-sealed valves designed spe-cifically for vacuum application now available commercially that impro-vising adaptations of steam valves is no longer necessary or expedient.
Fusion weld
Welding relief
Fig. 8-12. Typical Heliarc weldjoint. [Taken with permissionfrom J. F. Gerber, Rev. Sci.
Instr. 34, 1111 (1963).]
THE DESIGN OF VACUUM SYSTEMS 319
\^'Vacuum
chamber ^4
5
Diffusion
pump
Liguid-nitrogen
^^<1- baffle
y^
Vacuumreservoir
y^1
The major locations and functions of valves in vacuum systems are
(see Fig. 8-13):
1
.
Near the inlet of the mechanical roughing pump to permit checking
the performance of the mechanical pump isolated from the system
and to permit bringing the mechanical pump up to operating speed
before opening the valve for roughing down the system.
2. A small side valve and gauge
connection in the short length of
pipe between the main valve and
the pump inlet facilitates the check-
ing of mechanical pump perform-
ance.
3. At the outlet of the diffusion
pump to be used in conjunction
with item 4 to isolate the diffu-
sion pump from the system when
the pressure exceeds the stalling
limit, as during the pumpdownperiod. A forevacuum reservoir be-
tween this valve and the diffusion-
pump outlet will provide the
capability of a period of diffusion-
pump operation before the pressure will exceed the stalling point.
4. At the inlet to the diffusion pump, a large conductance valve to
permit isolation of the diffusion pump from the system for testing
purposes and protection.
5. A small side valve and gauge connection between item 4 and the
inlet to the diffusion pump to facilitate performance tests on the
diffusion pump when isolated from the system with valve 4 closed.
6. At the vacuum vessel to provide a connection for a bypass
roughing line to permit pumping down the system from atmospheric
pressure with valves 3 and 4 closed. The roughing bypass permits
batch operation of the system without subjecting the diffusion pump
to high-pressure gas, so that the diffusion pump may be kept operating
continuously—isolated from the system when the pressure is too high.
This arrangement proves to be a convenience in most large systems and
is particularly advantageous in systems operating on a repetitive batch
process involving frequent reloading of the vacuum chamber.
7. On the vacuum vessel, a small valve and gauge connection for use
in testing the performance of the system as a whole. Actually, on
most systems several such connections to the vacuum vessel will be
needed.
Mechanical
vacuum pump
Fig. 8-13. Locations of valves in a
typical vacuum system.
320 VACUUM SCIENCE AND ENGINEERING
The valves listed above are generally of three fairly distinct types.
Valves 1,3, and 6 may be referred to as forevacuum or roughing valves
for which the conductance need not be very large. For this type of
(a) (&)
Fig. 8-14. Diaphragm-sealed valves, (a) Manual operation; (6) pneumaticoperation.
service, steam globe valves with modifications described above are
suitable as are certain diaphragm-sealed valves. In Fig. 8-14 is
illustrated the Kinney diaphragm-sealed valve which is available in
sizes from 1 to 6 in. and for either
manual or pneumatic operation. Across-sectional view of the manually
operated diaphragm valve is shown in
Fig. 8-15. Bronze bellows-sealed valves
derived from modified steam valves are
shown in Fig. 8-16, the cross-sectional
view showing the metal bellows seal be-
tween the bonnet and the valve disk andthe vacuum-tight gasket joint between
the bonnet and the valve body. Out-
line drawings show the threaded andflange connections as well as the 90° and45° stem configurations. An impro^^ed
version of bronze bellows-sealed globe
valve for high-vacuum applications is
shown in Fig. 8- 17a and h in manuallyand pneumatically operated forms and in cross section in Fig. 8-18.
In this design the bellows assembly, cover plate, stem, and valve disk
can all be conveniently removed in one assembly from the valve body.This feature facilitates soldering or brazing the valve body into thepiping system. Because of the amalgamation with mercury, bronze
Fig. 8-15. Cross section
diaphragm-sealed valve.
of
THE DESIGN OF VACUUM SYSTEMS 321
K-pipe tap
inlet
2- and 3- in. valves
90° stem
D Closed
Flanged bodies have standard
150-lb ASA flonges
K-pipe
tap inlet
K-pipe tap
outlet
C Open
D^CIosed1K-pipe tap
outlet
1- and 1 l/2-in valves
45° stem
Fig. 8-16. Bronze bellows-sealed valves.
(a) (6)
Fig. 8-17. High-vacuum bronze bellows-sealed globe valves, (a) Manuallyoperated valvo; (b) pneumatically operated valve.
322 VACUUM SCIENCE AND ENGINEERING
DISC SEAL BOTTOM"O" RING (BUNA-N)
STEM
"O" RING (BUNA-N)
SCREW
DISC ADAPTER(BRASS)
DISC SEAL TOP"O" RING (BUNA-N)
PIN
COVER (BRONZE)'
tf.THRUST WASHER^ 5.
BODY (BRONZE)-
BELLOWS (BRASS)
NUT (BRASS)-
-WASHER (BRASS) DISC (BUNA-N)
Fig. 8-18. Cross section of high-vacuum bronze bellows-sealed globe valve.
Fig. 8-19. Fabricated steel valve with cover and bellows assembly removed.
THE DESIGN OF VACUUM SYSTEMS 323
valves should not be used in systems in which mercury may be aproblem.
A fabricated steel bellows-sealed valve is shown with its cover andbellows assembly removed in Fig. 8-19 and in cross-sectional view inFig. 8-20. Since silicone rubber gaskets and valve disk are used thevalve can be operated over the temperature range from about —90to -fl75°C. The stainless steel
bellows, made of a series of thin
washers welded alternately onthe inner and outer edges, pro-
vides greater flexibility and longer
life than the usual corrugated
bellows. This type of valve is
available in 1-, ij^-, 2-, 3-, and4-in. sizes.
Bellows-sealed globe valves are
convenient and relatively inex-
pensive for a limited range of sizes.
However, even for the 4-in. valve
the globe design is unduly heavyand cumbersome. The passage
through a globe valve moreoveris rather tortuous with the result
that the conductance at high
vacuum is small. Use of the
globe valve should therefore belimited to the pressure range
above about 10-^ torr in whichthe conductance is high compared with its value at high vacuum, or
to auxiliary applications in which its relatively low conductance is
not of serious concern.
For many years gate valves of the type generally used in watersystems have been used with modifications similar to those appliedto steam valves to reduce leakage sufficiently for vacuum applicationas is illustrated in Fig. 8-21.9 ^^g advantages of the gate valve are the
straight-through gas flow and the relatively short flange-to-flange
dimension. The gate valve also provides a convenient basis for avacuum lock through which items may be inserted into and withdrawnfrom a vacuum chamber without letting a significant amount of air
into the chamber. The main difficulty encountered in attempting a
completely satisfactory vacuum conversion of the conventional gate
valve is the long travel of the stem from the closed to the fully openposition. Although compound bellows designs may be found in the
Fig. 8-20. Cross section of fabricated
stool valve.
324 VACUUM SCIENCE AND ENGINEERING
literature, a bellows seal for the stem of a conventional gate valve is
much more complicated than that for a globe valve.
The modern vacuum gate valve seems to have descended from a
design by Wahl, Forbes, Nyer, and Little"
shown in Fig. 8-22. The sliding-plate type of
gate valve has appeared in a variety of com-
mercial designs adapted for hand wheel, toggle,
or pneumatic operation as illustrated in Fig.
8-23. Valves of this description are available
over a wide range of sizes (2 to 32 in.). The
flange-to-fiange dimension is much smaller than
for any other type of valve yet devised, and the
conductance is correspondingly high. In most
commercial valves of this type buna N rings
are used for sealing, in which case the temper-
ature range is limited. However, with Viton
O rings the sliding-plate type of valve can be
baked to temperatures of about 300°C. The
interior surfaces of a valve of this type can be
thoroughly cleaned so that outgassing problems
are a minimum and are determined primarily
by the type of rings used in the assembly.
Because of the wide range of sizes and high
conductance of the sliding-plate gate valve, it
is suitable not only for use in forevacuum lines
but also on the high-vacuum side of diffusion
pumps. This type of valve has in fact become
in recent years the most generally useful be-
cause of its compact design, straight-through
opening, high conductance, and relatively low
cost.
Another type of valve which has distinct
advantages for some installations is the butter-
fly valve, one type of which is illustrated in
Fig. 8-24. The butterfly valve is somewhat
similar to a damper of the type used in stove
pipes. It consists of a relatively thin, ringhke
valve bod}^ the inner surface of which is
machined to conform to a spherical shape and
a flat disk mounted on a shaft across its
diameter. The disk is thick enough to accommodate an 0-ring groove
which runs completely around the edge of the disk. An ring mounted
in the groove makes an excellent seal when the disk is turned to a
Fig. 8-21. A commer-
cial gate valve modified
for vacuum application.
The gate seats (A) are
machined to a blunt
edge, and rubber an-
nulae {B) are inserted
into the gates. Thejimction between the
body and the bonnet is
made vacuum tight bysetting a gasket (C) into
a groove cut in the
body. The stem is
sealed with a Wilson
seal {D). [Taken with
permission fromF.^v . D.
Kurie, Rev. Sci. Instr.
19, 485 (1948).]
THE DESIGN OF VACUUM SYSTEMS 325
=o
position such that it lies in the median plane of the valve body. Whenthe disk is turned 90° from the closed position the valve has relativelygood conductance, although not quite as good as a gate or sliding-platevalve of the same aperture. One end of the shaft on which the diskis mounted passes through an 0-ring seal on one side of the valve bodyand is fitted with a handle for setting the valve position. The butterflyvalve has two distinct advantagesover the gate and sliding-plate
types of valves. One is that there
is much less surface exposed to the
vacuum space so that there is less
difficulty with contaminants. Theother advantage is that the butter-
fly valve is more compact in every
dimension for a given aperture.
As is clear from Fig. 8-24 the
flange-to-flange dimension is evenless than that of the sliding-plate
type of valve, which is also rather
good in this respect.
A class of valves generally re-
ferred to as disk valves are par-
ticularly suitable for use in the
low-pressure range in which high
conductance is of primary concern.
The features of a disk valve are
illustrated in Fig. 8-25. The valve
disk covers a large opening equal in
diameter to the diffusion pump to
which it is to be connected. The vertical travel of the disk in openingis chosen to be sufficient that the open conductance of the valve
imposes a minimum restriction on the resultant pumping speed. Disk
valves are most conveniently built as right-angle valves such as the
commercial models shown in Fig. 8-25 in the manually and pneumati-
cally operated forms. Valves of this type are commercially available
in sizes ranging from 2 to 32 in. in aperture diameter, corresponding to
the range of diffusion-pump diameters. Modern versions of the disk
valve utilize O rings for sealing between the disk and the seal face, as
illustrated in the figure.
Both for testing vacuum-pump performance and for carrying out
tests on vacuum systems a means of admitting air or other gases at a
controllable, steady rate is needed. For many situations an ordinary
gas needle valve is satisfactory. However, for control of a small gas
Fig.
plate
J. S.
Xyor,
8-22. Gate valve with sliding
[Taken with permission fromWahl, S. G. Forbes, W. E.
and R. N. Little, Rev. Sci.
Instr. 23, 379 (1952).]
326 VACUUM SCIENCE AKD ENGINEERING
'^i>r<^Fig. 8-23. Commercial sliding plate gate valves, (a) Pneumatic operation;
(6) toggle operation; (c) hand wheel operation.
2.250",
pump side
Fig. 8-24. Cross section of butterfly type of vacuum valve.
THE DESIGN OF VACUUM SYSTEMS 327
o
a
-3
o
>>>> n J >>>/!?> /7-r
^Wyj^j^^/zf ////// ///r9n^
mur>|oo
"
scS
328 VACUUM SCIENCE AND ENGINEERING
flow with reasonably steady throughput at a given setting, a needle
valve of special design is required. An early but quite successful type
of needle valve is that described by Bush" and illustrated in Fig. 8-26.
The principal feature of the design is the slowly tapering needle fitting
snugly into a carefully reamed conical seat. For some applications
a bellows seal may be substituted for the packing shown in the figure.
Such valves are now commercially available. As Bush" mentions,
-Coated lightly with glyptol
'^^^^^fp^^^^"J0<;'M fe».-^^~^'^^^^^^^^p^'H {y|^j64^^^y::^^s:^^^^|^l
Material Brass, except
where noted otherwise
String packing soaked in
Lubriseal grease
Fig. 8-26. Vacuum needle valve. [Taken with permission from A. Guthrie
and R. K. Wakerling (eds.), Vacuum Equipment and Techniques (McGraw-Hill
Book Company, New York, 1949).]
very fine adjustment of the gas flow can be obtained by the use of two
valves in series with a small volume in between. The first valve is
adjusted to take most of the pressure drop and the second valve used
for fine adjustment of the flow rate. Johnson and Good^^ also describe
a double needle valve for small gas-flow rates (2 to 3 cm^/hr) using this
same principle.
8-5. Vapor Baffles and Traps. The term vapor trap is applied
to a device which may have either of two functions in a vacuumsystem : (a) to prevent the back migration of the vaporized pump fluid
from a vacuum pump into the vacuum chamber and (6) to condense
from the volume of the vacuum chamber any condensable vapor which
may be present. In many cases a refrigerated vapor trap placed
between a diffusion pump and the vacuum chamber performs both
these functions. However, depending upon circumstances, one
function may be much more important than the other, in which case
the choice of type and location of the refrigerated trap should be madewith its principal function in mind. Cryogenic pumps which are
discussed in Chap. 9 are, in fact, vapor traps of category (b) operated
at such a low temperature that many gases which are normally regarded
as permanent gases condense on the cryogenically cooled surface.
THE DESIGN OF VACUUM SYSTEMS 329
Fig. 8-27.
baiHe unit.
Water- or Freon-cooled
Vapor traps are most widely known in their use at the inlets ofdiffusion pumps primarily to condense vaporized pump fluid andproducts of decomposition of the pump fluid. The backstreaming ofdiff'usion pumps is discussed in some detail in Chap. 6, and the use ofwater-cooled baffles and refrigerated traps is also briefly described.The direct blast of vapor back-
streaming from the inlet to a
diff'usion pump is so great that
without some precautions to con-
dense and return the vaporized
fluid to the diffusion-pump boiler
the entire charge of working fluid
would be lost and the pump wouldfail after a few days of continuous
operation. Placing a water-cooled
cap over the first-stage nozzle andcooling the upper portion of the
pump barrel or using a set of
water-cooled baffles, such as that
shown in Fig. 8-27, at the inlet
of the pump suffice to eliminate
the more virulent components of
backstreaming vapor. These measures also greatly reduce the rateof loss of pump fluid so that the operating lifetime of a boiler filling
is not determined by loss of fluid by backstreaming but by eventualdeterioration due to decomposition (except in the special case ofmercury as the working fluid). To make these measures even moreeffective, the water cooling may be replaced by the use of refrigerationby which the baffles and other cooled surfaces are cooled to the lowesttemperature at which the condensed fluid will still flow back into thediffusion pump. Both for mercury and for many of the organic pumpfluids a temperature of about — 35°C is optimum for this purpose,although this temperature is too low for those pump fluids which havehigher pour points. For many applications of off diffusion pumps thewater-cooled baffle system is sufficient to maintain the base pressureand surface cleanliness required. lonization-gauge readings of theorder of 10-" torr are typically maintained in systems so equipped.Refrigerating the baffle at -35°C will generally result in a reductionof the base pressure to about 10"' torr.
The backstreaming that still persists after elimination of the direct
blast of high-temperature vapor from the hot jet region is the volumemigration of vapor at the approximate temperature of the condensingsurfaces. In the case of organic pump fluids which wet metal sur-
faces, the surface film of the fluid spreads out from the area of direct
330 VACUUM SCIENCE AND ENGINEEEING
Thin-wosfainless-steel
tubing
Chomber wa
Liquid nitrogen
or dry ice in
low -freezing-
point liquid
Well-
polished
surface
Fig. 8-28. Thimble trap.
condensation and by surface migration may also spread into the region
beyond the baffle structure. The volume and surface migration
results in the contamination of the high-vacuum chamber with approxi-
mately the room-temperature vapor pressure of the pumping fluid
and its decomposition products. In a system
evacuated by an oil diffusion pump protect-
ed only by water or Freon-cooled baffles a
base pressure reading on an ionization gauge
less than IQ-® torr (air calibration) can
seldom be realized for an extended period of
time. To realize base pressures significantly
less than this value requires the use of re-
frigerated traps at lower temperature and
of special design.
The most common type of refrigerated
vapor trap for many years has been the
thimble trap, as shown in Fig. 8-28, cooled
either by dry ice (solid CO2) at -78.5°C in
a low-freezing-point liquid such as trichlor-
ethylene to provide good thermal contact or by liquid nitrogen at
about — 195°C. A trap of this type has frequently been installed
in the manifold between the disk valve at the inlet of the diffusion
pump and the vacuum chamber. If the manifold has large enough
dimensions, the conductance for flow of gas into the diffusion pump
is not seriously impaired and the thimble trap is in a strategic position
to condense backstreaming vapor from the diffusion pump and also
to pump by condensation any water or other condensable vapors which
may be present in the chamber. If the temperature of a thimble trap
is very low as compared with that at which the vapor in the system
would be at saturation, then the sticking probability for condensation
is very high and the trap acts like a nearly perfect pump for the con-
densable vapors. The trap in the position indicated thus not only
reduces significantly the pressure due to backstreaming from the
diffusion pump, but also in most cases provides a much higher pumping
speed for water vapor and other condensables from the vacuum chamber
than the diffusion pump alone would provide. If the area of the cold
section of the thimble trap is B cm2, then by reference to Eq. (2-93)
the condensing speed of the trap for vapor is
MISr 3.64^—J B (liters/sec) (8-2)
For the case of water vapor at room temperature (293°K) the result is
Sr = 14:.1B liters/sec (8-3)
THE DESIGN OF VACUUM SYSTEMS 331
If the conductance for water vapor of the manifold up to the locationof the trap is large as compared with the condensing speed given in(8-3), then the pumping speed of the trap for water vapor can easilyexceed that of the diffusion pump by a large factor. A thimble trap2 in. in diameter and with a cold length of 4 in. will have a condensingspeed of nearly 5,000 liters/sec for water vapor. Since the trap will
Table 8-4. Vapor Pressure op Various Substances as a Function orTemperature *
Temperature Vapor pressure, torr
°C °K Water NH3 CO2 Hg
100
50
-40
~78.5t-120-150-195.81
373.1
423.1
273.1
233.1
194.6
153.1
123.1
77.3
760
93
4.6
0.1
5 X 10-4
10-7
10-14
~ 10-24
3,220
540
42
0.2
6 X 10-4
10-11
760
10
6 X 10-2
10-8
2.7 X 10-1
1.3 X 10-2
2 X 10-4
1 X 10-6
3 X 10-9
10-13
* Source: Handbook of Phijsics and Chemistry (Chemical Rubber PublishingCompany, Cleveland, Ohio).
t Sublimation temperature of dry ice at pressure of 760 torr.
I Boiling point of liquid nitrogen at pressure of 760 torr.
accumulate a surface layer of condensate, the temperature must below enough so that the equilibrium vapor pressure is low as comparedwith the base pressure required in the vacuum chamber. In Table8-4 are given the values of the vapor pressure of water, NII3, COj, andmercury at a few significant values of the temperature. Note that for
a base pressure of 10-^ torr the temperature of dry ice is not low enoughfor water vapor, so that the next convenient temperature is that of
liquid nitrogen, for which the extrapolated value of the vapor pressure
is negligible for most practical purposes. Whether anything approxi-
mating the equilibrium vapor pressure corresponding to the tempera-ture of the trap is realized in practice depends upon the amount of
material co^^densed on the trap. In the case of water vapor, the
accumulation of ice, which has a very low thermal conductivity, maycause the surface exposed to the vacuum space to attain a temperature
well above that of the metal or glass surface of the trap with the result
that the limiting vapor pressure may be considerably above that
expected. This particular difficulty applies to a thimble trap, the cold
surfaces of which are usually exposed to surrounding walls of the system
332 VACUUM SCIENCE AND ENGINEERING
at room temperature, but not so critically to some other types of vapor
traps the cold surfaces of which are not so exposed.
Because thimble traps do provide very high pumping speed for
condensing vapor under favorable circumstances, they are frequently
installed directly in the vacuum chamber independently of the dilFusion-
pump manifold to ensure essentially infinite conductance for vapor
in reaching the condensing surface. A vacuum chamber thus equipped
is normally pumped down to the pressure at which the diffusion pumps
can be put into operation (e.g., by closing the bypass roughing valve
and opening the forevacuum and disk valves) and the thimble trap
then immediately filled with liquid nitrogen to ensure very rapid
reduction of the pressure. In the case of large accelerators, which are
usually evacuated for long periods after each pumpdown cycle, the
thimble traps may later be allowed slowly to run out of liquid nitrogen
and warm up to room temperature. The slowly evaporating vapors
from the thimble trap in this case are pumped out of the system by
the diffusion pumps over a period of m.any hours. The thimble trap
thus provides for a rapid reduction of total pressure to an acceptable
operating level and may save several hours of machine time. In
systems involving frequent recycling from atmospheric pressure to
high vacuum, a thimble trap may decrease by a large factor the time
for each cycle. In this type of application the thimble trap should be
removed and cleaned each time the system is brought to atmospheric
pressure to ensure reasonable efficiency.
The thimble trap placed in the diffusion-pump manifold is quite
effective in systems using mercury as a working fluid. Mercury does
not wet surfaces and migrate along surfaces to any significant degree,
nor does mercury decompose into products of widely differing vapor
pressures. Any mercury molecules which happen to escape the
condensing surface and enter the vacuum chamber will eventually
return to the trap and be condensed. If the diffusion pump is prevented
from blasting a hot stream of vapor back into the chamber by an
effective combination of Freon-cooled baffles or jet cap and cooled
pump barrel, the partial pressure of mercury in the system with a
properly proportioned thimble trap at liquid-nitrogen temperature
will normally be negligible as compared with that of the other elements
present.
When organic pump fluids are used, however, the thimble trap is
much less effective. As discussed by Milleron^^ and illustrated in
Fig. 8-29, the working fluid from the diffusion pump may invade the
high-vacuum space either by volume migration or by surface migration.
Volume migration can be prevented by arranging refrigerated surfaces
in the vapor trap so that an oil molecule must have at least one
THE DESIGN OF VACUUM SYSTEMS 333
encounter with a cold surface before it can enter the high-vacuumspace. Surface migration is greatly inhibited and essentially stoppedby so designing the trap that oil films migrating along surfaces will
encounter a cold barrier before entering the high-vacuum space.Figure 8-30 illustrates a refrigerated trap of the chevron type with anoil creep barrier together with a water-cooled baffle to prevent anexcessive backstreaming load on the liquid-nitrogen-cooled baffle
Clean vacuum
Cleon vacuum
Volume Surface
migration migration
Oil -creep
barrier Heat shield continuous
roll of polished stainless
three layers thick
Air vent"Diffusion
pump
_A_Conductance I
-100I iters /sec
Liquid nitrogen
in
Fig. 8-29. Schematic illus-
tration of the migration of
pump fluid. [Taken with
permission from KormanMilleron, in 1958 VacuumSymposium Transactions
(Pergamon Press, London,1959).]
Strips first cooled
by HjO then by
radiotion loss to
liquid nitrogen
Fig. 8-30. Schematic drawing of
chevron type of vapor trap withsurface creep barrier. [Taken withpermission from Norman Milleron,
in 1958 Vacuum Sym,posium, Trans-actions (Pergamon Press, London,19,59).]
system. Another form of trap with these same features is that illus-
trated in Fig. 8-31 and attributed by Ullman " to R. F. Post. Liquid-
nitrogen-cooled vapor traps with surface creep barriers such as those
illustrated in Fig. 8-30 and Fig. 8-31 have proved to be effective in
reducing by a very large factor the backstreaming of condensable
materials from the diffusion pump back into the high-vacuum space.
Traps of this tj^e, combined with other techniques to be described
in Chap. 9, have in many systems contributed to the attainment of
operating pressures below 10"^ torr in the region referred to as ultrahigh
vacuum.
A disadvantage of vapor traps such as those shown in Figs. 8-30 and8-31 is that the conductance is so low that the resulting pumping speed
for permanent gases is impaired. This is a serious handicap since the
operating pressure of systems using liquid-nitrogen-cooled traps is very
334 VACUUM SCIENCE AND ENGINEERING
low SO that the highest possible pumping speed is needed to accommodate
any appreciable throughput. The problem is to achieve the blocking
effect of a well-designed vapor trap without introducing such a low
conductance for the pumping of permanent gases. A commercial
Liquid-nitrogen
trap
Water-cooled
baffle
Fig. 8-31. Water-cooled baffle andliquid-nitrogen-cooled trap with sur-
face creep barrier. [Taken with
permission from J. R. Ullman, in
1957 Vacuum Symposium Trans-
actions (Pergamon Press, London,
1958).]
r^^ W/D
2 001.33
1,00
P
Expenmentol
0.44
0.39
0.32v^ii QBulged elbo* t***)
GBulged elbow with
9jet cop
2,00
1.33
33
0.30
GBulged elbow on d ffusic n pufnp
2001 33
32
27
Bulged elbow with
A/B-5
chev on
2001.66
1 33
0.38
0.35
0.31
Fig. 8-32. Several bulged-elbow vapor-
trap designs together with the experi-
mentally determined value of the
transmission probability p. [Taken
with permission from L. L. Levenson,
N. Milleron, and D. H. Davis, in
1960 Vacuum, Symposium, Transactions
(Pergamon Press, London, 1961).] ,
vapor trap meeting these objectives is that shown in Fig. 6-19. Thepumping speed of the 6-in. diffusion pump alone, as indicated by the
performance curve in Fig. 6-18, is about 1,400 liters /sec. The combinedpumping speed with the vapor trap is about 600 liters/sec, as shown in
Fig. 6-20, so that the diffusion pump and vapor trap combination
delivers about 43 per cent of the pumping speed of the pump alone.
The optimization of the vapor trap and diffusion pump for maximum
THE DESIGN OF VACUUM SYSTEMS 335
transmission probability for molecules leaving the chamber is discussedby Levenson, Milleron, and Davis.i'^ Among vapor-trap configurationsrecommended by these authors is the "bulged-elbow" model, severalversions of which are shown schematically in Fig. 8-32, together withmeasured values of the transmission probability p, defined as
conductance of the trap configuration
conductance of an aperture of diameter Dwhere D is the diameter of the opening into the trap from the vacuumchamber and also of the opening out of the trap into the diffusion pump.p is thus a measure of transmission efficiency of the trap comparedwith that of a simple aperture utilizing the same wall area of thevacuum chamber. Figure 8-33 is a cutaway drawing of a commercialadaptation of the bulged-elbow trap with a chevron baffle combined
Cooling-medium inlet
and outlet connections"
Lifting lugs
Chevron-valve-baffle seal
Stoiniess-steel
coolant tubing
Copper chevron
CValve-plate actuator
KVB-32
Cooling -woter
connections
Volve-plate gasket
Valve plate
Oil drain valve
Vocuum-chombermating flonge
Heaters
Fig. 8-33. Bulged-elbow trap with chevron baffle combined with disk valvmounted on 32-in. diffusion pump.
336 VACUUM SCIENCE AND ENGINEERING
with a disk valve as used on a 32-in. diffusion pump. The "pumping
speed" at the inlet of the 32-in. diffusion pump as a function of the
inlet pressure and also the pumping speed of the pump and trap
combination are shown graphically in Fig. 8-34. From the perform-
ance curves the pumping speed at the pump flange is S„ = 30,400
~~'
35,000
70P00
V 30P00^E 60P00o Un
1
)alt
1
ed //
/
I — 25,000
"S 50POO —
1
/
/
\ 20,000
iping
'
Vol
1—
1
ve-t off ed ^y] \ 15,000
5 30300Q-
(
\V- 10,000
2Q0O0/ \
^ 'i.nonlOPOO
1
0-' 0-^1(
Pr
)-5
;ssu re, to
1(
rr
,-4 10-' ic-^
Fig. 8-34. Typical puraping-speed curve of Kinney Model KDP-32 diffusion
pump with and without bulged-elbow chevron baffle.
liters/sec and the resultant pumping speed at the inlet to the bulged
elbow is S, = 15,000 liters/sec. From Eq. (6-28)
and the measured values of S^ and S,, the conductance of the trap is
(15,100)(30,400)Ct
= 30,350 liters/sec
30,400 - 15,100
The cross-sectional area of a 32-in.-diameter aperture is about 5,190
cm^, so that the conductance of the aperture is
G^ = 11.6^4 = 60,200 liters/sec
Thus for this case the transmission probability is p = C,lC„'!v 0.50,
which is somewhat higher than the values reported by Levenson,
Miheron, and Davis for a similar trap. Overall efficiericy of the pump
trap combination may be stated as
S, 15,1000.25
C„ 60,200
which is about as high as the overall pumping efficiency ever is in
practice.
THE DESIGN OF VACUUM SYSTEMS 337
The pumping-speed curve for the baffled 32-in. diffusion pumpshown in Fig. 8-34 and that for the baffled 6-in. diffusion pump shownin Fig. 6-20 both show a peak in pumping speed in the pressure range
from about 10^* torr to about 10"^ torr. In this pressure range the
molecular mean free path is equal to or less than the openings throughthe baffle so that in this pressure range the conductance of the baffle
system is greater than its value at lower pressure. The performance
curve finally falls off with increasing pressure even though the con-
ductance of the baffle system continues to increase because the pumpingspeed of the pump is falling rapidly. In this pressure region the char-
acter of flow through the baffle system is becoming viscous in character
so that molecules no longer are assured of colliding with surfaces but
may experience significant collisions with other molecules. Thus
molecules which should condense on baffle surfaces can pass entirely
through the trap without encountering the cold surfaces. In systems
which use trapped oil diffusion pumps, but which must be kept free of
organic contaminants, this awkward pressure region must be avoided
as much as possible by arranging to pass through the pressure range
from 10~3 to 10~^ torr as quickly as possible.
When a liquid-nitrogen-cooled trap is filled periodically, the liquid
level falls significantly between fillings, resulting in a portion of the
trap surface warming up slightly. The result is a sequence of abrupt
drops and slow increases in the pressure recorded on an ionization
gauge. There are a number of systems commercially available, such
as that illustrated in Fig. 8-35, to maintain the Kquid level in the trap
G B WSolenoid cord
SL-l-308
Rubber stopper
Fig. 8-35. Liquid-nitrogen automatic-level control, {a) General arrangement;
(6) controller circuit.
338 VACUUM SCIENCE AND ENGINEERING
nearly constant, so that only an occasional change of the large liquid-
nitrogen dewar is necessary to keep the trap continuously filled.
Another solution to the problem of automatic liquid-nitrogen supply
and also an alternative effective form of vapor baffle with a surface
migration barrier are described byTaylor^^ and illustrated in Fig.
8-36. In the reference is shown a
schematic diagram for the auto-
matic control of the liquid-nitrogen
flow through the cooling coil. Theliquid-nitrogen-cooled baffle is
shielded from the direct blast of
vapor from the pump by the 45°
shield built into the water-cooled
elbow. The baffle is a simple
array with a minimum of twobounces for molecules to penetrate
the trap. The pressures attain-
able with this trap proved to be
about 3x10-' torr without bake-
out and about 1.5 x lO-^" ton-
after baking the system at 250°Cfor 12 hours. The design of the
trap is such that it can be installed
either in the horizontal position as
shown in the figure or in the ver-
tical position. The high-conduc-
tance water-cooled elbow with the45° shield eliminates the need for
other water-cooled baffling over
the oil diffusion pump, increasing
somewhat the transmission prob-
ability for the combination. Thecalculated conductance for a 4-in.
baffle is 800 liters/sec and for a 6-in. baffle is 4,000 liters/sec. Themeasured pumping speed of the 4-in. pumping system was 367 liters/sec
for air at 7 x 10"' torr and 1,024 liters/sec for hydrogen at 8.5 x 10"'
torr.
Vapor traps in large systems are sometimes preferably cooled bylow-temperature mechanical refrigerators rather than by dry ice or
liquid nitrogen. From the data in Table 8-4 it is evident that for manypurposes a temperature intermediate between that of dry ice and liquid
nitrogen would be entirely satisfactory from the point of view of the
Fig. 8-36. Liquid-nitrogen circulating
vapor baffle. (1) Baffle structure
(tough pitch copper); (2) liquid-
nitrogen coil, inlet, and outlet (copper)
;
(3) oil-migration barrier (stainless
steel); (4) heat shields; (5) water-cooled elbow; (6) line-of-sight heatshield with drain hole; (7) dam to
stop oil condensed on the elbow fromdraining into the baffle housing; (8)
baffle housing with low heat con-
ductance inlet and outlet tubes.
[Taken with permission from A. R.Taylor, in 1961 Vacuum, SymposiumTransactions (Pergamon Press,
London, 1962).]
THE DESIGN OF VACUUM SYSTEMS 339
indicated vapor pressures. This is, for example, true in the case of amercury-pumped system if the traps over the diffusion pumps areprimarily intended to maintain a sufficiently low vapor pressure ofmercury in the chamber. Liquid-nitrogen-cooled thimble traps maybe used for rapid pumping of water vapor and other high-vaporpressure materials. Mechanical refrigerators of cascade or compound
Water
fWrr
Boffle
Receiver
Fig. 8-37. Schematic drawing of a double-cascade refrigeration system for
cooling chevron type of baffle system on a mercury diffusion pump. [Takenwith permission from H. R. Smith and P. B. Kennedy, in 1959 Vacuum Sym-posium, Transactions (Pergamon Press, London, I960).]
designs are capable of maintaining temperatures in the range —100to — 150°C with an adequate heat capacity for most vapor-trap
applications. A number of such systems are discussed by Smith andKennedy, 1' among them the double-cascade system illustrated in Fig.
8-37. The installation and operating costs of several types of low-
temperature refrigerators are compared with those of liquid nitrogen
in Table 8-5 from the paper of Smith and Kennedy. The binary
system mentioned in the table was developed for the heavy-ion linear
accelerator at Berkeley and is still in service after many years of
operation. Whereas the savings in liquid-nitrogen costs have beenvery large, the refrigerator units have been a major source of downtime on the accelerator because of excessive servicing requirements.
Experience to date is that the specialized servicing required and the
frequency of failure largely negate the savings on liquid nitrogen byloss of operating time.
340 VACUUM SCIENCE AND ENGINEERING
The working fluid of a diffxision pump can be lost from the boiler bymigration into the forevacuum portion of the system as well as bybackstreaming into the high-vacuum region. Also the working fluid
of a diffusion pump can be contaminated by oil vapor from the backing
pump. These two problems can be partially solved by the use of
forevacuum condensers or traps the design of which is rather different
Table 8-5. Cost Comparison between Refrigebated and Liquid-nitrogbn-
cooLED Traps*
CostCompoundcascade
Cascade BinaryLiquid
nitrogen
Operating:
Maintenance . . .
Refrigerant ....
WaterPower
Initial installation.
Total, first year . . .
Yearly^
$330
315«
270<*
6,800«
7,715
1,595
$330
315-^
270*
6,050'^
6,965
1,520
$330
315<^
270*
7,300'^
8,215
1,645
$ 1,200"
6,100*
500^
7,800
7,350
* Taken with permission from H. R. Smith and P. B. Kennedy, in 1959
Vacuum Symposium Transactions (Pergamon Press, London, 1960), p. 271.« Servicing trap or baffle. <* % 0.0085 kW/hr." $ 0.107/liter 25% loss. " Does not include baffle.
" $ 0.0003/gal. f Operating cost + 10% depreciation.
from that of the high-vacuum vapor trap. The pressure in the fore-
vacuum line is usually in the range of viscous flow, well above the
region of molecular flow, so that molecular encounters with the walls
of the forevacuum system are normally rather rare events. In order
to ensure reasonable efficiency of condensing vapor is it is necessary to
provide a fairly long and tortuous flow path through a maze of con-
densing surfaces so arranged that the condensate will flow in the desired
direction. Many commercial diffusion pumps include a vapor con-
denser at the outlet with provisions for cooling either by water or bya refrigerator unit. The need for an effective exhaust baffle systemis particularly vital when mercury is used as the working fluid. Therefrigerator coil used for cooling the inlet baffle and the top of the
diffusion-pump barrel can conveniently be extended to cool the exhaust
baffle as well. To prevent excessive backstreaming of mechanical
pump oil into the diffusion pump, a rather large trap similar to a thimble
trap built into an expanded section of the forevacuum line or a U bendcooled by a slush of dry ice in trichlorethylene as shown in the sketches
in Fig. 8-38 is fairly effective. Such a trap should be placed far enough
THE DESIGN OF VACUUM SYSTEMS 341
from the inlet to the mechanical pump and preferably upstream from a
bend in the pipe to avoid accumulation of oil due to the direct spitting
of oil droplets into the pumping line which most mechanical pumpsexhibit to some degree. Eliminating completely the back migration
of mechanical pump sealing oil into the high-vacuum portion of the
system and the consequent hydrocarbon contamination from this source
by the precautions described above is probably not feasible. However,
Thin-wGll —stainless-steel
tubing
Quick-disconnect couplings
Flow
Liquid-nitrogen
Dry-ice "slush"
Dewar'
flosk
Copper tubing
Fig. 8-38. Two types of forevacuum traps which may be cooled by dry ice in
trichlorethylene or by liquid nitrogen.
for the great majority of applications the measures described above
are entirely adequate and in some cases even superfluous. A more
effective method of preventing back migration of oil vapor is the use
of an absorption trap utilizing artificial zeolite or alumina as an ab-
sorbing medium as described in the following section.
A system incorporating the features of liquid-nitrogen-cooled high-
vacuum trap, water-cooled inlet, and exhaust baffle for the diffusion
pump and a thimble trap near the inlet to the mechanical pump is
illustrated in Fig. 8-39. The valve and manifold arrangement together
with the forevacuum ballast tank permits rapid cycling of the system
without shutting down the diffusion pump.8-6. Absorption Traps. In the vacuum lore of hand-assembled
glass vacuum systems the practice of using a bulb partly filled with
phosphorous pentoxide for absorbing water vapor from atmospheric
air periodically admitted to the system and an absorption tube loosely
filled with charcoal placed in the forevacuum line to prevent back-
streaming of mechanical pump oil into the high-vacuum system was
well known." Chemical and physical absorption have been used in
many forms in vacuum practice. In recent years further significant
342 VACUUM SCIENCE AND ENGINEERING
advances have been made in absorption traps, both for forevacuumand high-vacuum apphcations. A few examples will suffice to give animpression of what can now be done with absorbing traps and whatcomponents can be obtained commercially.The development of modern absorption traps appears to have
started with the report by Alpert" of the results observed when he
Flexible
connector
Main vocuum
isolation valve
Baffle
lonizotion-
gauge tube
Haas Thermocouple-
chamber gauge tube
Roughing and
ocking pump
Fig. 8-39. Diffusion-pump system incorporating traps and baffles to preventoil migration both in th© high-vacuum and forevacuum portions of the system.
added a roll of corrugated copper foil to a glass liquid-nitrogen-cooledvapor trap to reduce fluctuations in the gas pressure due to change in
the liquid-nitrogen level on the outside wall of the trap, as shown in
Fig. 8-40. The procedure had been to bake out the trap with its spiral
of copper foil and then cool it down to liquid-nitrogen temperature tomake observations at very low pressure. During the course of theexperiments, however, it was found that after high-temperature bake-out the copper-foil trap became fully effective at room temperatureand did not have to be cooled down to low temperature.
Carmichael and Lange^" have conducted a series of tests to determine
THE DESIGN OF VACUUM SYSTEMS 343
the period of time a room-temperature copper-foil trap remains effective
after bakeout. In a small, glass vacuum system using a two- or
three-stage glass diffusion pump with Octoil-S as the working fluid
a copper-foil trap 6 in. in length and 2 in. in diameter was installed
between the diffusion pump and the test chamber. The base pressure
attainable after bakeout was typically in the range lO-i" torr. The
graph in Fig. 8-41 shows the history of the pressure recorded by the
ionization gauge on the test chamber over a period of several days.
For a period of nearly twenty days
the pressure rose slowly but re-
mained below 10-9 ^orr. However,
at about twenty days after initiation
of the test the pressure then rose
rapidly to about 10^' torr. Mass
spectrometer analysis of the gases
after saturation was reached in-
dicated that carbon monoxide was
by far the major gas present.
Carmichael and Lange then madeup a number of combinations of
small (2-in. -diameter) copper-foil
traps and measured the "stay-down
time" for each combination, as
shown in Fig. 8-42. Additional
experiments were carried out vary-
ing the conductance between the
oil diffusion pump and the copper-
foil trap with the result that the
smaller the conductance the longer the stay-down time of the trap
became. This very simple type of trap is useful on small systems in
which performance of a week or less is all that is required. However,
efforts to make a high-conductance trap of the copper-foil type for use
on large systems have thus far not been successful because of the very
short stay-down time or period of effectiveness which results.
A much more promising type of absorption trap is that described by
Biondi^i utilizing artificial zeolite* or activated aluminaf pellets. Asmall glass trap of this type and the arrangement for testing is shown mFig. 8-43. Either with 3^-in.-diameter pellets of zeolite or with 8-14
mesh chips of alumina in the trap the system after bakeout of 8 hr
* A porous alkaU metal aluminosilicate, type 13X, manufactured by Linde
division of Union Carbide Corp.
t A highly porous material provided for these tests in the form of 8-14 mesh
chips by Aluminum Company of America.
Fig. 8-40. Copper-foil trap. [Taken
with permission from D. Alport, Rev.
Sci. Instr. 24, 1004 (1953).]
344
10-^
VACUUM SCIENCE AND ENGINEERING
Diffusion Copper X~IO-8[_ pump trap ,„„ g^^^^
T 1
Vacuum system
Experiment Type of trap Stay down time
1~2 days
-*^\"\^
2k2"^
~ 6 days
3 ~ 6 days' fc—^ ^= ^^ i"k2"*^ 1" k-
4
U-2"-*l
~15days
Fig. 8-42. Stay-down times for
various copper-foil trap arrangements.
[Taken with permission from J. H.Carmichael and W. J. Lange, in 1958
Vacuum Symposium Transactions
(Pergamon Press, London, 1959).]
10 15 20
Time, days
Fig. 8-41. Typical pressure depend-
ence with time over a period of
several days for a small system in
which a room-temperature copper-
foil trap 6 in. in length is used betweenthe oil diffusion pump and the test
chamber. [Taken with permission
from J. H. Carmichael and W. J.
Lange, in 1958 Vacuum Sym-posium Transactions (PergamonPress, London, 1959).]
at 450°C remained in the lO-^" torr range for about three months. Thediffusion-pump fluid used for these tests was Octoil-S.
Biondi^i also describes the performance of the large room-tempera-
ture zeolite trap illustrated in Fig. 8-44. The trap provides a series of
trays in which artificial zeolite pellets are placed. The trays are so
arranged that molecules in passing through the trap must encounter
zeolite several times. Before each test the trap and test chamberwere baked out and the system typically reached an ionization-gauge
reading of slightly over lO"!" torr after cooling to room temperature.
Using Octoil-S in the diffusion pump resulted in a stay-down time
(below 10^^ torr) of only about twenty days. However, when Con-
voil-20 was substituted for the Octoil-S the base pressure remained at
1 X 10~"i" for more than one-hundred days without any evidence of
rising. The results of these tests are given in Fig. 8-45 showing three
different tests with Octoil-S and one test run with Convoil-20. Thestriking difference in performance of the room-temperature zeolite
trap depending upon the choice of fluid used in the diffusion pump is
apparently not understood. Room-temperature traps with zeolite
or alumina apparently provide no protection whatever against mercurybackstreaming.
THE DESIGN OF VACUUM SYSTEMS 345
The principal disadvantage encountered in the use of zeolite andalumina in vapor traps is the enormous amount of gas and vaporgiven off by the material in the bakeout period. Milleron and Leven-son22 measured an output of 28 g of water from 250 g of zeolite pellets
baked at 450°C for 48 hr. This measurement was made in the courseof developing a high-conductance room-temperature trap as illustrated
in Fig. 8-46. The trap was made by lining a right-angle elbow withabout two layers of zeolite pellets, the pellets being about K in. in
diameter and length. A No. 10 mesh stainless steel screen was usedto retain the zeolite pellets as shown in the figure. After bakeout thepressure history observed was similar to that reported by Biondi,^!
but in this case the test was continued for a much longer period. Thepressure after bakeout was 3 x lO"!" torr initially but rose to 1 x 10"^
torr where it remained for a period of about one year. Biondi^i
To ultrahigh
vocuum system
Bokeout oven
(b)
Fig. 8-43. (a) .Scale drawing ofglass trap utilizing artificial zeolite
or activated alumina; (h) diagramof arrangement used for testingthe effectiveness of the trap.
[Taken with permission from M.A. Biondi, in 1960 Vacuum Sym-posium Transactions (PergamonPress, London, 1961).]
Flow poth Flow path]
1 r I
Scale- in.
Fig. 8-44. Scale drawing of an 8-in.-
diameter nonrefrigerated trap for use
with a metal oil diffusion pump. The
central trays are supported by tabs
attached to the ajiter walls. [Taken
with permission from M. A. Biondi,
in 1960 Vacuum Symposium Trans-
actions (Pergamon Press, ^London,
1961).]
346 VACUUM SCIENCE AND BNGINEEEING
"O 5 10 15 20 25 30 35 40 45 50
Timej days
Fig. 8-45. History of ionization
gauge reading in test chamberprotected from oil diffusion pumpby zeolite room-temperature trap
over a period of many days with
Ootoil-S and Convoil 20 as working
fluids. [Taken with permission from
M. A. Biondi, in 1960 VacuumSymposium Transactions (PergamonPress, London, 1961).]
reports that repeated exposure of
the zeolite to gases such as nitro-
gen, carbon monoxide, hydrogen,
hehum, and argon at pressures as
high as 10^^ torr does not impair
the effectiveness of the zeolite in
trapping hydrocarbons. After such
exposures for extended periods of
time the system remained free of
hydrocarbons. Levenson and Mil-
leron^^ also studied the adsorption
of various gases by zeolite at roomtemperature and found no evidence
of absorption of hydrogen, helium,
nitrogen, argon, carbon monoxide,
and methane, but did observe some
absorption for carbon dioxide and
n-butane. In the tests performed
by Milleron and Levenson, power
failures occurred and in one in-
stance the forevacuum valve was closed and the power to the diffusion-
pump heater turned off. Recovery to nearly the original pressure
Ion gauge
'Water-cooled baffle
-MCF 300 diffusion pump
Fig. 8-46. High conductance, nonrefrigerated isolation trap using artificial
zeolite. [Taken with permission from N. Milleron and L. L. Levenson, in 1960
Vacuum Symposium Transactions (Pergamon Press, London, 1961).]
THE DESIGN OF VACUUM SYSTEMS 347
occurred within about a half hour after the diffusion pump was put backinto operation. In a subsequent experiment Levenson and Milleron^*
determined that the evaporation of less than 1 cm^ of Convoil-20 into
a room-temperature trap containing about 436 g of zeolite resulted in
the eifective saturation of the zeolite. Also in these tests the stainless
steel housing of the zeolite trap wascooled with liquid nitrogen with the
result that the pressure typically
dropped from 2 x 10~* torr at
room temperature to 6 X lO^^" torr
reached in about one hour after
application of liquid-nitrogen cool-
ing. The role of the zeolite versus
that of the more effectively cooled
stainless steel walls in lowering the
pressure on application of liquid-
nitrogen cooling is not entirely clear
from these experiments, but the
authors conclude that the effect is
mainly due to the walls.
The use of liquid-nitrogen-cooled
zeolite adsorbing units instead of
pumps has recently become commonin two distinctly different types of
service. In Fig. 8-47 is illustrated
an ultrahigh-vacuum adsorbing
pump developed by Batzer and
McFarland^* to provide a hydro-
carbon free vacuum for electron
beam excitation and ionization experiments. The base pressure in-
dicated on a Bayard-Alpert gauge is typically of the order of 10~* torr.
The second application of liquid-nitrogen-cooled zeolite is in the
adsorption pumping of a clean vacuum system from atmospheric
pressure down to a pressure of about 10"^ torr, at which point getter-ion
pumps can take over. The obvious advantage of this combination of
roughing by adsorption pumping and finishing by getter-ion pumping
is the complete elimination of hydrocarbon comtaminants. In this
application the zeolite pumping unit is first outgassed by baking at a
temperature of about 200°C with a valve open to the atmosphere so
that water vapor and other adsorbed gases can escape. The vent valve
is then closed and the unit allowed to cool down with both valves, the
vent valve and the valve to the system, closed. The unit is then
immersed in liquid nitrogen and the valve to the system opened. By
Fig. 8-47. Liquid-nitrogen-cooled
ultrahigh-vacuum adsorption pump.
(1) Zeolite; (2) copper wool; (3)
copper retaining screen; (4) stainless
steel heat shield; (5) liquid-nitrogen
reservoir; (6) bakable pressure
release; (7) copper pinch gasket.
[Taken with permission from T. H.Batzer and R. H. McFarland, Rev.
Sci. Instr. 36, 328 (1965).]
348 VACUUM SCIENCE AND BNGINEBBING
having a number of units of this type connected to a manifold, large
vacuum chambers can be quickly pumped down from atmospheric
pressure to the point where a getter-ion pump can be put into operation.
This topic will be discussed further in Chap. 9.
8-7. The Pumpdown Time. The simplest situation one can
imagine for computing the pumpdown time of a vacuum system is one
in which there is no leakage from the outside, no outgassing from the
walls, and the pumping speed is independent of the pressure. In-
tegration of Eq. (7-9) then yields the pressure as a function of the time
P^ = Pie-<-^"'>* (8-4)
where P^ = initial pressure
P, = pressure after pumping for the time t
S = pumping speed
V = volume of the system
Thus the pumpdown time for such a simple case is
V
.
Pit = 2.30-log,„^ (8-5)
In the operating pressure range of mechanical roughing pumps the
assumptions made above are frequently all nearly valid except that the
pumping speed decreases with the pressure, as shown in the performance
curves of Figs. 5-5 and 5-6. However, even in this case one can apply
Eq. (8-5) to successive intervals of the pressure and obtain a set of time
intervals as follows
:
<i.2 = 2.30^^1ogio^
2.30
'S'1,2
Flogio
2,3
F
P.
P.,2.30 -—logio-^ etc. (8-6)
in which S^^^ S^^s, S^^, etc., are the average values of the pumpingspeed in the pressure intervals Pj to Pj, P2 to P3, P3 to P4, etc. Thenthe total pumpdown time is
tl.2 +
2.30F/lo^
<3,4 4
PilP:
Si.
etc.
^
logioP,/P3
So n S3 ,
etc. (8-7)
The quantity within the brackets of the above equation can be obtained
directly from the performance curve of the pump in question. If, as in
Sec. 5-3, we designate Sjj the theoretical displacement speed of the
THE DESIGN OF VACUUM SYSTEMS 349
pump and e the volumetric efficiency, then the pumping speed is
S = eS^ and (8-7) becomes
^ ^ 2 3, Z(l^gilZl/^ + i^gi^Zi^ + l^iliZi/£f + etcSd\ Cj 2 ^2,3 ^3,4
) (8-8)
Experience at the Kinney Vacuum Laboratory has shown that the
volumetric efficiencies of pumps of different displacement speeds but
of the same general design are very nearly the same at various values
of the pressure. Thus for such a series of pumps one may write
F = 2.30 P"g-^-^^- + '°g- ^-^^- + '''- ^-^"^^
+ etc.) (8-9)\ ^1,2 ^2,3 ^3,4 '
which is very nearly the same for all pumps of the series regardless of
size.
The pumpdown time then becomes
t
_F
Sr^1\'P, (8-10)
where P, is the last pressure value in the series in Eq. (8-9) and is the
pressure for which the pumpdown time is to be determined. Generally
in calculations of interest P^ = 760 torr, but the F curve may be used
in calculating the pumpdown time from any other initial value of the
pressure as desired.
The quantity F is referred to as the pumpdown factor for the
particular type of pump and is calculated from the measured per-
formance curves. In Fig. 8-48 is shown the pumpdown factor P as a
function of the pressure for single-stage and compound Kinney mech-
anical pumps as a function of the pressure. Obviously F is just the
time required for a pump to reach the pressure P( from atmospheric
pressure when evacuating a chamber of volume equal to the displace-
ment speed; i.e., when F = Sj).
The pumpdown factor of a combination consisting of a mechanical
roughing pump backing a mechanical booster pump can be computed
from the performance curves such as those shown in Fig. 5-14 and that
in Fig. 5-5, choosing an appropriate pressure for the changeover from
bypassing to pumping through the mechanical booster pump. Such a
pumpdown factor P as a function of the pressure is shown in Fig. 8-49
for the combination of a 1,200-cfm mechanical booster pump (KMB-
1200) and a 130-cfm backing pump (KDH-130).
From the curves of the type shown in Figs. 8-48 and 8-49 the pump-
down time from atmospheric to any desired pressure can be calculated
by multiplying the value of F on the graph by the ratio F/;S^ for the
iU
\ 1
^^i
T 1
—1-
\1
14
22 \]
1—t-
\ \
1
1
20
\ \ 1
18
16
14
-^
\,
—
A
\II III
.Kinney single -stage pumps
1
1
\ \ // H 1
\tmosphere -
11^
1
-t-
^ ^,\ /
12
10
8
6
/I \<s
1
1" Kinney compound pumps
'
1 1 1 1
^^ 1
VV. ^^
1
1
'^
^ 1
—1-
2
0(
-^ 1
> 1
1
)00 001 0.01 00
Pr 'ssure ,tor
1
r
100 1,0
Fig. 8-48. Pumpdown factor F as a function of the pressure for Kinney .single-
stage and compound mechanical vacuum pumps.
30
28
26
24
22
20
t 18O
i 14o
i" 12
^ 10
\
\V \\s \
\ 1 \KMBl?On s KDH 130
1-
^^F I\s l/ \ 1/
/ t ansition pressure
<J^,< T
n KMB1200i
^"v
\,1
r
^ ^^..^^
^v-4.^^ "'^
\N ^_0.0001 0.001 0.01 0.1 1.0
Pressure, torr
10 15 100 1,000
Fig. 8-49. Pumpdown factor F for the combination of a mechanical booster
and a single-stage mechanical backing pump (KMB-1200 and KDH-130).
350
THE DESIGK OF VACUUM SYSTEMS 351
system, provided only that there is no significant leakage or outgassing.
With the leak-hunting and welding techniques available today actual
leaks of any significance need not be tolerated so that it is reasonable
to insist upon a sound system in which the throughput Q = 0. Out-
gassing, however, is another matter. By avoiding porosity and
crevices inside the vacuum system and by thorough cleaning, the
Table 8-6. Observed Pumpdown Compared with That Computed byPumpdown Factor F
Volume of System: V = 11,800 ft^
Displacement Speed of Roughing Pump: So = 500 cfm
Computed Pumpdown Time: t = ' F = 23.6 i*' min
P, torrF, t computed, t observed,
System factormin mm
760 1.0
200 1.5 35.4 34 0.96
100 2.2 52.0 52 1.00
50 2.9 68.7 70 1.02
20 3.9 92 94 1.02
10 4.6 106 112 1.06
5 5.2 125 130 1.04
3 5.9 139 144 1.04
2 6.2 146 156 1.06
1 7.1 168 178 1.06
0.5 8.1 182 203 1.11
0.3 8.8 208 270 1.30
0.14 10.0 236 865 3.66
pressure at which outgassing becomes important can be made quite
low. In Table 8-6 is shown the pressure at various times during the
evacuation from atmospheric pressure of a vacuum tank of volume
11,800 ft^ by a Kinney single-stage pump of displacement speed equal
to 500 cfm. The pumpdown curve is plotted in Fig. 8-50. The
errors between the computed and observed pumpdown times are not
large until the system pressure becomes less than about 1 torr. For
pressure values below 1 torr experience indicates an increasmg dis-
crepancy between the calculated and observed pumpdown times.
This discrepancy is due to outgassing effects mostly associated with the
presence of water vapor on the walls of the vacuum chamber. When
a svstem which has been under vacuum is "let down" to atmospheric
pressure by admitting dry nitrogen, then on subsequent evacuation
the pumpdown curve follows that computed from the pumpdown factor
down to much lower values of the pressure.
352 VACUUM SCIENCE AND ENGINEERING
The discrepancy between the actual pumpdown curve and that
computed by use of the pumpdown factor (provided that the pumpis in good condition) is due to the extent to which the surfaces of the
vacuum system evolve adsorbed gases. This discrepancy is therefore
not an indication of the failure of the pump to do its job, but is anindication of the extent to which the internal surfaces of the system
1,000
100
a 10
10
s.
\\\
V
\\\
1 —
\\ / Observed
rompu ^pH -J<\.
N Otor35 m
~^
:>\ at 81
n —30 60 90 120 150 210 240 270 300 330
Min.
Fig. 8-50. Pumpdown curve compared with that computed by use of the pump-down factor F. Data of Table 8-6.
are contaminated by oil films, adsorbed water, and possibly other
condensable materials. The ratio between the observed and calcu-
lated pumpdown times may conveniently be called the system factor,
values of which for the pumpdown data in Table 8-6 are given in the
last column. Because of minor errors in pressure readings, changes in
temperature during the period of the pumpdown, minor discrepahcy
in the actual as compared with the assumed rotational speed of the
pump, etc., a system factor in the range 0.95 to 1.05 may be considered
not to be significantly different from 1.00. It will be noted, however,that the computed system factor in this case rapidly exceeds 1.05 whenthe pressure drops below 1 torr. The very large increase in the systemfactor for pumpdown to 0.14 torr is not typical and was most probablycaused by the presence of a leak of the order of 40 torr cfm. Thepump is capable of reaching an ultimate pressure of the order of
THE DESIGN OF VACUUM SYSTEMS 353
0.005 to 0.010 torr on a tight, dry system, but it seems doubtful whethera continuation of the pumpdown test illustrated would ever reach apressure less than 0.1 torr.
In the above discussion the conductance of the connecting pipinghas not been taken into account. However, the criterion used forselecting the pipe size for connecting a roughing pump is such that theimpedance offered by the piping is not likely to be a measurable factorin determining the pumpdown time. As discussed in Sec. 2-4, thepipe size is selected to ensure an acceptably small pressure drop whenthe system has reached its normal operating range (i.e., the lowestpressure of practical interest). The criterion frequently applied is thatthe pressure drop in the line (up to the inlet of the mechanical pumps)should not exceed 10 per cent of the pressure. However, duringpumpdown from atmospheric pressure this pressure drop is negligibleas compared with the pressure itself. The conductance of the con-necting piping is proportional to the pressure in this pressure range sothat over most of the pumpdown cycle the conductance is very largeindeed as compared with the pumping speed of the pump and is there-fore not normally a significant factor in determining the pumpdowntime within the range of mechanical pump operation.
Many pumpdown experiments have been carried out under bothfavorable and unfavorable conditions. When there are sizable leakspresent in the system or when puddles of water have accumulated atsome low point in the plumbing, then the pumpdown process becomesstalled and the system factor approaches infinity. However, whenthere are no leaks present, when the interior of the system has beencleaned section by section before assembly, and when no unforeseenevent has created puddles of water somewhere in the system, thenexperience shows that rather definite values of the system factor applyto the pumpdown time, depending upon the pressure limit involved,such that
^(actual) = (system factor)^ (calc)
V(system factor) -— i^^^^^ (8-11)
The recommended system factor makes allowances for the normaloutgassing of surfaces exposed to atmospheric air and provides a basisfor judging whether the system is pumping down normally or whethersome problem exists which must be corrected. On the basis of ex-perience, therefore, recommended system factors are given in Table8-7 not only for single-stage mechanical pumps, but also for compoundpumps and mechanical booster pumps. It should be emphasized thatby special care, such as letting down the system to atmospheric
354 VACXJUM SCIENCE AKD ENGINEBBING
pressure by admitting only dry nitrogen, shorter pumpdown times than
those computed using the recommended system factors can be reahzed.
Naundorf25 has attempted a rather complete and systematic ap-
proach to the determination of the pumpdown time extending into the
lange of diffusion-pump operation. His approach leads to a solution
based upon the graphical representation of two quantities which typify
Table 8-7. Recommended System Factors
Pressure range,
torr
System factor
Single-stage
mechanical pumpCompound
mechanical pumpMechanical booster
pump*
760-2020-1
1-0.5
0.5-0.1
0.1-0.02
0.02-0.001
1.0
1.1
1.25
1.5
1.0
1.1
1.25
1.25
1.25
1.15
1.15
1.35
1.35
2.0
* Based upon bypass operation until the booster pump is put into operation.
Larger system factors apply if rough pumping flow must pass through the
idling mechanical booster. Any time needed for operating valves and gettmg
the mechanical booster pump up to speed must also be added.
the system: (1) the throughput as a function of the pressure as repre-
sented in Fig. 8-51 and (2) the gas load as a function of the time as
represented in Fig. 8-52. At every instant of time, in order for the
pressure to be the observed value P, the throughput of the system Qmust equal the gas load L existing at the time of the observation.
Unless there is a dominating leak in the system, the gas load will
decrease with the time more or less as illustrated in Fig. 8-52. There
is no difficulty about determining the form of the throughput as a
function of the pressure. This curve can be quite accurately predicted
from the pumping speeds of the pumps used and the conductances of
traps and other components introduced. At each value of the pressure
the throughput Q = PS, where S is the resultant pumping speed of the
combined system. The gas load L as a function of the time is some-
what more difficult to construct.
In order to predict the form of the gas-load curve as a function of the
time one must know a great deal in detail about the processes of
adsorption, chemisorption, diffusion of gases through materials, and the
solubilities of gases in materials of construction. These topics are
discussed at length by Dayton^" in a paper in which tables of data are
given for all these processes for many metals, plastics, elastomers,
THE DESIGN OF VACUUM SYSTEMS 355
and ceramics. The difficulty is that a calculation of the gas load as afunction of the time for most practical situations would be a formidabletask. However, in the case of the relatively simple case of a stainlesssteel chamber 4 ft in diameter and 6 ft in length, evacuated by a 32-indiffusion pump, Naundorf was able to demonstrate good agreementbetween the predicted and actual pumpdown schedule. The out-gassing rate was determined experimentally by closing the valve into
£ 10 -
10 .
10'
10"
Qi•
-
/f Net pumping
capacity
/
/
/
- Pz P,,
10"^ 10"^ 10"
Pressure P.torr
10"
Fig. 8-51. Throughput of a diffusion-
pump system as a function of thepressure. [Taken with permissionfrom C. H. Naundorf, in 19(i0
Vacuum Symposium Transactions(Pergamon Press, London, 1961).]
10"'
10^Oi
V
\
I
(J V
"> 3S 10
-
\5-0^ -
\^^Gos load
o
^10' Q2
,0°T, T2
1 '
^^^1
10"' 10" 10'
Time t,hr
10^
Fig. 8-52. Gas load as a functionof the time. [Taken with permis-sion from C. H. Naundorf, in 1960Vacuum Si/m,posium, Transactions
(Pergamon Press, London, 1961).]
the diffusion pump once each hour and measuring the rate of pressurerise, which multiplied by the volume of the tank gave the gas load dueto outgassing. The data thus obtained were plotted as shown in Fig.
8-53, and prove to be in excellent agreement with the data on outgas-sing of stainless steel contained in Dayton's paper. The result of
combining the gas-load curve with the throughput-capacity curve of
the pumping system is shown in Fig. 8-54. A horizontal line drawnthrough any value of the throughput and gas load intersects the
throughput-vs. -pressure curve and the load-vs. -time curve. Droppingvertical lines down from each intersection yields the pumpdown timefor a particular value of the pressure.
This procedure is alleged to provide an excellent prediction of the
pumpdown time provided the pressure in question is not seriously
limited by some other process than outgassing, such as leakage andpermeation. In the event that these other processes are important.
356 VACUUM SCIENCE AND ENGINEERING
Gas load
(by rate-of-rise method)
f-Throughput vs. pressure
\ for mcf-15,000 system
\. used
Predicted ».
gas lood vs.
time ^y* \\
f 10°
I 10''
^ 10"'
.''Key:
« Pressure read at
valve inlet
• Measured values
Note: Untrapped ion
and McLeod gauge
data
Log time.hr
Fig. 8-53. Experimental gas load
as a function of the time for a
stainless steel tank of total surface
area of 165 sq ft. [Taken with
permission from C. H. Naundorf,
in 1960 VacuumSymposium Trans-
actions (Pergamon Press, London,
1961).]
10"' 10° 10' 10^ Time,hr
10"^ 10"' 10"^ 10"' Pressure,
torr
Fig. 8-54. Gas load as a function of the
time combined with throughput as a
function of the pressure. A vertical
line drawn at any value of the pressure
to the throughput curve, then a horizon-
tal line drawn to the intersection with
the gas-load-vs.-time curve, and finally a
vertical line drawn down from this inter-
section gives the pumpdown time for
the chosen value of the pressure. [Taken
with permission from C. H. Naundorf,
in 1960 Vacuum Symposium Trans-
actions (Pergamon Press, London, 1961).]
the gas-load curve must be corrected and in general will have the form
shown in Fig. 8-55.
Further understanding of the problem of predicting pumpdown times
is provided in a paper by Kraus" in which it is stated that for a metal
apparatus the pressure as a function of the time is expressed by the
following differential equation
:
dt
d{P - P^;)-S = const (8-12)
P is the pressure attained after pumping for the time t, P^ is the ulti-
mate pressure attainable after pumping for a long time, and S is the
pumping speed of the system. The prediction of this equation is that
the quantity (P - P^)"! is a linear function of the pumping time
provided that the pumping speed *S is a constant. That this is indeed
true in cases of interest is shown by the graph in Fig. 8-56. The two
curves in the figure were obtained from the same system, the steeper
curve after the system had been exposed to atmosphere for only 2 mmand the less steep curve after an exposure to atmosphere of 2 hr. The
value of the constant a in the above equation depends upon the initial
THE design of VACUUM SYSTEMS
state as well as dimensions and pumping speed of the system,gration of (8-12) is shown to lead to the expression
V
S P + C
357
Inte-
(8-13)
for the pumpdown time, provided P^ > P > Pj^. Here P^ is a param-eter of the system being defined as P^ = aj V, where a is the sameas that in Eq. (8-12) and V is the volume of the system. The widerange over which the above pumpdown time relationship holds in
practice is demonstrated in Fig. 8-57. When organic materials suchas elastomers and plastics dominate the outgassing properties of a
system, however, the pumpdown relationship is more complicated.
In this case (P — Pe)~^ is more nearly a linear function of the pump-down time, and the equation cannot be integrated to anything approxi-
mating Eq. (8-13).
From this discussion of pumpdown time in the range of diffusion-
pump operation it is evident that firm predictions are much moredifficult to make than in the pressure range for mechanical pumps.Factors not taken into consideration are the use of refrigerated traps
and the application of mild heating to the vacuum chamber. Thereferences cited in the above discussion will assist the vacuum designer
to make reasonable choices in pump sizes to make possible the attain-
ment of the desired pressures in the specified time. However, the
precautions taken during preparation and operation of the system will
Sio^
10'
Adsorbed
and absorbed S^ Total gas loadgas load vsJimeX^
vs. time
Inleakage and
permeation
10" 10°
Time.hr
10' 10^
Fig. 8-55. Gas load as a function
of the time corrected for the
presence of significant leakage andpermeation. [Taken with permis-
sion from C. H. Naundorf, in 1960Vacuum Symposium Transactions
(Pergamon Press, London, 1961).]
MO"'
2'10"'
5-10"
1
// y
//
1
,'VA
,;> ^t4 6
Min
10
Fig. 8-56. Relationship between
1/(P = P^) and the pumpingtime t. [Taken with permission
from Th. Kraus, in 1968 VacuumSymposium, Transactions (Perga-
mon Press, London, 1959).]
358 VACUUM SCIEKCE AND ENGINEERING
10"
10"
i 10'-3
10"
\,\>•
/y' Switchover to
• diffusion pump
^:)
\\V
Log(P-PE) \t \V
^-Log(t-K1
1 10 100
Min
Fig. 8-57. Pressure-time curve for
a vacuum annealing furnace demon-strating the wide pressure range
over which Eq. (8-13) is applicable.
[Taken with permission from Th.
Kraus, in 195& Vacuum Sympo-sium Transactions (Pergamon Press,
London, 1959).]
in many cases affect the perform-
ance much more than minor changes
in the original choice of design
parameters.
8-8. Selection of Vacuum Com-ponents. The conventional vacuum
system consists of mechanical pumps,
diffusion pumps, valves, vapor traps,
vacuum gauges, and interconnecting
plumbing all assembled for the pur-
pose of attaining and maintaining the
specified environment in a vacuum
chamber. Because the vacuum de-
signer is faced with several alterna-
tive combinations of components
which will meet the specified per-
formance, the final choice involves
judgment regarding the most con-
venient and economical combination
of components which will serve the
purpose. In this section the func-
tions of each of the components in
meeting the operating requirements
of the system will be discussed
briefly and some criteria will be
given for specifying the combina-
tions and capacities of components needed.
Mechanical Pumps. The mechanical pumps of a conventional
high-vacuum system have two rather separate functions: (1) to pumpdown the system to the level necessary for the diffusion pumps to be
put into operation and (2) to maintain the backing pressure during
regular operation at an acceptable pressure for optimum operation
of the diffusion pumps. These two requirements frequently lead to
very different values of the capacity for the mechanical pumps.
In many large systems the time for roughing down the system is
much longer than that required to reach operating pressure once the
diffusion pumps and refrigerated traps can be put into operation, after
which the mechanical-pump capacity required to maintain the needed
backing pressure is very small. In such systems, as illustrated in
Fig. 8-58, it is economical and convenient to install a battery of large-
capacity mechanical pumps connected directly to the vacuum vessel
by means of a bypass line to rough out the system to a pressure below
that at which the diffusion pumps can operate. The capacity of the
THE DESIGN OF VACUUM SYSTEMS 359
roughing pumps required for this function can be computed with verylittle uncertainty from Eq. (8-11) using the system factors given in
Table 8-7. Whether this battery of roughing pumps consists ofsingle-stage pumps alone or mechanical booster pumps backed bysingle-stage pumps is an economic question which can only be answered
Nude ion Ion gouge Cold trapGote valve
Interconnecting
valve
Roughing
,0 wjvolve
-—@)-^14
^Thermocouple
Diffusion-pump^
foreline trapFreon^
compressorRoughing pump
Fig. 8-58. Representative conventional high-vacuum system. (1) Vacuumchamber; (2) internal liquid-nitrogen thimble trap; (3) liquid-nitrogon-cpoled
diffusion pump baffle; (4) gate valve (in optimum design the connecting pipe
would be as short as possible; (5) Freon-cooled baffle; (6) diffusion pump with
Freon-cooled exhaust condenser; (7) forevacuum oil vapor trap; (8) forevacuum
valve; (9) backing pump; (10) roughing pipe and valve with oil vapor trap;
(II) roughing pump; (12) interconnection between roughing and backing lines
with close-off valve; (13) ionization gauges—nude and tubulated—in vacuumchamber; (14) thermocouple gauges in roughing and backing lines.
by computing the pumpdown time for various combinations of pumps
and their associated plumbing and then comparing the resulting
performance with the cost of each combination.
In principle the determination of the capacity of the backing pumpis a simple matter. If the throughput Q of the system during normal
operation is known, then the pumping speed for backing is Sj, = QjPi,,
where Q is the throughput and P^ is the backing pressure required
during operation. This determination is generally much more difficult
to judge in advance than the pumpdown capacity required because of
the uncertainty in the value of Q due to gas flow, outgassing, and
360 VACUUM SCIENCE AND ENGINEERING
permeation. The system should furthermore have some excess
capacity to override minor leaks sufficiently to get the diffusion pumps
into operation and expedite leak hunting. An interconnection between
the backing and roughing pumps as shown in Fig. 8-58 can be invaluable
during periods of difficulty. However, even with this added flexibility
ill the system, a factor of 2 in capacity of the backing pump above the
minimum calculated from the anticipated throughput is recommended.
Because of uncertainty in the knowledge of the value of the throughput,
an even larger margin in capacity may be required. Even with a
fairly generous factor applied to the throughput for determining the
capacity of the backing pump, however, in most cases that capacity
is very much smaller than that required for the roughing pump.
Operation of a system thus usually consists of pumping the system
down through the bypass and roughing pumps to a pressure of perhaps
0.1 or 0.2 torr, then closing the bypass valve and opening the gate valve
into the diffusion pump. The diffusion pump has presumably already
been in operation with the gate valve closed and backed by the backing
pump. The next step is then to cool down the liquid-nitrogen-cooled
baffle over the diffusion pump and also to fill the thimble trap with
liquid nitrogen (assuming a thimble trap is used). Meanwhile the
large capacity mechanical pumps used for roughing the system down
from atmospheric pressure can be stopped.
Diffusion Pumps. The pumping speed required for the diffusion
pump and associated baffles and gate valves must also be considered
from the point of view both of pumpdown time and of the required
operating pressure. The pumpdown time can best be approached by
the method ofNaundorf^^ outlined in the previous section. For
various combinations of diffusion pumps, gate valves, and baffles one
can estimate the throughput capacity of the system as a function
of the pressure. From the outgassing data supplied in the paper by
Dayton^' and the exposed areas of various materials one can construct
a gas-load curve as a function of the time. By combining these curves
as in Fig. 8-54 the pumpdown time as a function of the pressure can
be roughly predicted for any particular combination of diffusion pump,
baffle system, and gate valve for which the overall pumping speed is
known. The choice from this point of view must then be compared
with the pumping speed required to maintain the desired operating
pressure for the predicted gas load by applying S = QjPo, where P„
is the operating pressure. The choice of diffusion-pump, baffle, and
gate-valve pumping speed is usually determined by this latter con-
sideration. Although additional construction cost always results from
oversizing the system by providing excess pumping speed to override
THE DESIGN OF VACUUM SYSTEMS 361
accidental leakage or a larger gas flow for whatever process is involved,this additional construction cost will in most cases be at least partlycompensated for by the reduced pumping and processing time whichusually result from excess pumping capacity. A vacuum system withpumping capacity which is too small to do the allotted job is much less
economically sound than one which has a moderate excess capacity.Loss of time during operation can be very expensive and in a short timedissipate the initial savings one might make by installing insufficientpumping capacity.
Accessories. The accessories which are useful to include in a con-ventional vacuum system such as that illustrated in Fig. 8-58, asidefrom those specifically shown in the drawing, are
:
1. Multiplicity of ionization gauges. In many large systems it is
convenient to install ionization gauges in pairs, one with and one with-out a glass liquid-nitrogen trap. The discrepancy between the gaugesis due primarily to condensables (mostly water vapor) so that anexperienced operator can readily ascertain the condition of the systemand diagnose many troubles.
2. Thermocouple or Pirani gauges are indicated in Fig. 8-58, butthe advantage of a multiplicity of such gauges in the roughing andbacking sections of the system should be emphasized.
3. Although vacuum valves are expensive, the flexibility introducedinto the system by the inclusion of valves at strategic points is well
worth the cost. Aside from the gate valve for isolating the diffusion
pump from the vacuum chamber, valves should be installed at thefollowing positions : (a) at the vacuum chamber end of the roughingline, (b) in the forevacuum line near the outlet of each diffusion pump,(c) at the inlet of each mechanical pump, either roughing or forevacuum,and (d) in a line interconnecting the forevacuum and roughing lines.
Also recommended are small, normally closed valves installed betweeneach shutoff valve and its mechanical pump for testing and diagnosing
the source of trouble in the system, and a small, normally closed valve
on the vacuum chamber for letting down the chamber to atmospheric
pressure. Provision should be made to admit commercial dry nitrogen
or dry air through a drying unit.
Conventional vacuum systems of the type described above should
give excellent service with base pressure (untrapped ionization-gauge
reading) of 10^' torr and should perform well in the range of 10-^
torr. When operation at significantly lower pressure is desired, the
techniques of ultrahigh vacuum are required. This is the topic of the
next chapter.
362 VACUUM SCIENCE AND ENGINEERING
REFERENCES
1. L. L. Levenson, Xorman Milleron, and D. H. Davis, in 1960 Vacuum Sym-
posium Transactions (Pergamon Press, London, 1961), p. 372.
2. I. Farkass and E. J. Barry, in 1960 Vacuum Symposium Transactions
(Pergamon Press, London, 1961), p. 35.
3. A. Guthrie and R. K. Wakerling (eds.). Vacuum Equipment and Techniques
(McGraw-Hill Book Company, New York, 1949), pp. 148-158.
4. R. R. Addis, Jr., L. Pensak, and Nancy J. Scott, in 1960 Vacuum Symposium
Transactions (Pergamon Press, London, 1961), p. 39.
5. R. R. Wilson, Rev. Sci. Instr. 12, 91 (1941).
6. R. H. V. M. Dawton, Brit. J. Appl. Phys. 8, 414 (1957).
7. R. W. Roberts, Rev. Sci. Instr. 32, 750 (1961).
8. J. F. Gerber, Rev. Sci. Instr. 34, 1111 (1963).
9. F. N. D. Kurie, Rev. Sci. Instr. 19, 485 (1948).
10. J. S. Wahl, S. G. Forbes, W. E. Nyer, and R. N. Little, Rev. Sci. Instr. 23,
379 (1952).
11. William E. Bush, A. Guthrie, and R. K. Wakerling (eds.). Vacuum Equip-
ment and Techniques (McGraw-Hill Book Company, New York, 1949),
Chap. 4, p. 179.
12. J. W. Johnson and W. M. Good, Rev. Sci. Instr. 32, 219 (1961).
13. Norman Milleron, in 1958 Vacuum Symposium Transactions (Pergamon
Press, London, 1959), p. 140.
14. J. R. Ullman, in 1957 Vacuum Symposium Transactions (Pergamon Press,
London, 1958), p. 95.
15. L. L. Levenson, Norman Milleron, and D. H. Davis, in 1960 Vacuum Sym-
posium Transactions (Pergamon Press, London, 1961), p. 372.
16. A. R. Taylor, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962), p. 1328.
17. H. R. Smith and P. B. Kennedy, in 1959 Vacuum Symposium Transactions
(Pergamon Press, London, 1960), p. 271.
18. John Strong in collaboration with H. Victor Neher, Albert E. Whitford,
C. Hawloy Cartwright, and Roger Hayward, Procedures in Experimental
Physics (Prentice-Hall, Inc., Englewood Cliffs, N.J., 1938), pp. 105, 124.
19. D. Alpert, Rev. Sci. Instr. 24, 1004 (1953).
20. J. H. Carmichael and W. J. Lange, in 1958 Vacuum Symposium Transactions
(Pergamon Press, London, 1959), p. 137.
21. M. A. Biondi, in 1960 Vacuum Symposium Transactions (Pergamon PreSs,
London, 1961), p. 24.
22. N. Milleron and L. L. Levenson, in 1960 Vacuum Symposium Transactions
(Pergamon Press, London, 1961), p. 213.
23. L. L. Levenson and N. Milleron, in 1961 Vacuum Symposium Transactions
(Pergamon Press, London, 1962), p. 91.
24. T. H. Batzer and R. H. McFarland, Rev. Sci. Instr. 36, 328 (1965).
25. C. H. Naundorf, in 1960 Vacuum Symposium Transactions (Pergamon Press,
London, 1961), p. 60.
26. B. B. Dayton, in 1959 Vacuum Symposium Transactions (Pergamon Press,
London, 1960), p. 101.
27. T. Kraus, in 1958 Vacuum Symposium Transactions (Pergamon Press, London,
1959), p. 38.
CHAPTER 9
ULTRAHIGH VACUUM
The term ultrahigh vacuum has come into use in recent years todesignate the range of pressure below about IQ-' torr which cannoteasily be attained by the conventional methods and techniques de-scribed in the previous chapter. In order to reach significantly lowerpressure, additional or alternative techniques must be applied. Thetechniques thus far found to be useful in attaining operating pressuresin the range IQ-s to lO"" torr or lower will be briefly described in thischapter.
9-1. The Dominance of Surface Phenomena. From the papersof Daytoni-3* on the outgassing of "clean" metal surfaces at roomtemperature it is evident that after exposure to normal atmosphericair for several hours the amount of gas readily available for desorptionfrom the surface at room temperature amounts to many molecularlayers. As an example, Dayton's tables^ show that after 10 hr ofvacuum pumping the outgassing rate for a stainless steel surface is
about 2 X 10-5 torr liter/sec ft^ and is decreasing very slowly. There-fore to maintain a base pressure of IQ-s torr in the presence of such anoutgassing rate requires a pumping speed of at least 20 liters/sec foreach square foot of internally exposed surface. Most large vacuumchambers consist of outer walls and a complex inner structure, thetotal surface area of which must be considered. Also the wall areaavailable for vacuum pumping is usually limited by the many otherdemands of the system for access ports, high voltgage insulators, and avariety of accessories essential to the vacuum process. The result is
that a design figure of 20 liters/sec for each square foot of internalsurface can generally be realized or even somewhat exceeded in practiceso that the base pressure is limited to about lO"" torr even after manyhours or days of pumping.
In the previous chapter mention was made of speeding up theprocess of outgassing by increasing the temperature of the vacuum
References indicated by superscript numbers are listed at the end of thechapter.
363
364 VACUUM SCIENCE AND ENGINEEBmo
chamber, and this practice has been followed for many years. How-
ever, the gain in the ultimate pressure attainable by a system is not
improved by a mild baking (say to 100°C) by a large factor. The
principal advantage is that the time required to reach the typical
limit of the system may be greatly reduced. To reduce significantly
the attainable operating pressure requires baking at temperatures
much greater than 100°C. This requirement introduces a number of
complications into the design which are not encountered in conventional
vacuum-system design.
Experience has shown that outgassing from metal surfaces in vacuum
is predominantly due to water vapor. The character of the surface
deposition of water on metal surfaces is discussed by many investi-
gators: Kraus,* Hayashi,^ Lichtman and Hebling,« Mongodin and
Prevot,' and Flecken and Noller.* Because the surfaces of metals
generally used in vacuum-chamber construction consist of somewhat
porous oxides, the problem of defining the exact physical state of the
water and other contaminants on the surface of the metal is complicated.
As Dushman* has explained, there are three mechanisms by which a
gas can be taken up by a solid material, all generally included under the
general term sorption.
1. Chemisorption refers to the formation of a chemical compound
by interaction of a gas with the wall material, as in the case of the
formation of an oxide film.
2. Adsorption refers to the surface condensation of a gas on a metal
surface. This process is generally believed to result in a film of only
a very few molecular layers of gas.
3. Absorption refers to a process by which the gas molecules penetrate
into the interior of the wall material and in a sense the gas is dissolved
in the solid.
The outgassing history is expected on theoretical grounds to depend
critically upon which of these three mechanisms of sorption are in-
volved. Research on this question, which has been very extensive, is
complicated by the definition of the effective surface area. The
roughness factor (i.e., the effective microscopic surface area compared
with the gross, or macroscopic, surface area) inferred by various
investigators ranges from about 20 to 100 depending upon the details
of outgassing experiments and the assumptions of the theory applied
to the situation. Because of the complexity of the theory and the lack
of sufficient detailed knowledge of the microscopic character of the
surfaces, an empirical approach to the problem based upon experi-
mental outgassing results at various temperatures seems to be the only
practical course to follow at the present time . Dayton^ has summarized
ULTRAHIGH VACUUM 365
experimental data of this type in the curves shown in Fig. 9-1 for steel
and in Fig. 9-2 for aluminum. Based upon the macroscopic surface area,the total amount of gas given off by metal surfaces at room temperatureover a period of 10 to 50 hr of vacuum pumping ranges from 20 to 100molecular layers. What is perhaps more to the point is that untreated
Fig. 9-1. Outgassing rate versus
time for steel at room temperature.
Curves for rusty steel, sandblasted
steel, and stainless steel (curve 1)
from the data of Blears et al.^"
Stainless steel curve 2 from thedata of Gellor,!' and curve 3 fromthat of Basalaova'^ on untreated
stainless steel. [Taken with per-
mission from B. B. Dayton, in 1961Vacuum Symposium Transactions
(Pergamon Press, London, 1962).]
5 10-7
J'iG. 9-2. Outgassing rate versustime at room temperature. Curve 1,
untreated duraluminum, and curve 3,
duraluminum scoured and washedwith benzol and acetone, are basedon the data of Basalaeva.i^ Curve 2,
duraluminum, is based on the dataof Geller.ii Curve 4, aluminumbright-rolled and cleaned in Stergene,
and curve 5, anodized aluminum, are
based on the data of Blears et al.^"
[Taken with permission from B. B.Dayton, in 1961 Vacuum Stjmpo-
sium Transactions (Pergamon Press,
London, 1962).]
metal samples outgas at the rate of about I0-' torr liter/sec cm^ after
1 hr of vacuum pumping at room temperature, and this rate of out-
gassing is about inversely proportional to the pumping time. Thesestatements have to do with room-temperature outgassing for whichwater vapor is by far the dominating substance. At high temperatureother factors, such as diffusion of absorbed gases through the metal,
become important so that high-temperature outgassing cannot beinferred simply by integrating the room-temperature curves andcompressing the resulting output over a shorter period of time.
9-2. High-tetnperature Bakeout. In the previous section it
was stated that operating pressures much less than about 10^* torr
366 VACUUM SCIENCE AND ENGHSTEEEING
cannot easily be attained because of the long-persisting outgassing of
internally exposed surfaces at room temperature. The total amount
of gas available on metal surfaces is so great that even with the inverse
dependence upon the pumping time of the outgassing rate the base
pressure attainable is seldom as low as lO"' unless some action is taken
to change drastically the source of gas available for desorption. The
10-^
10'* -
:
10"
Mc
on
Base pre
before
bokeout
V
X system te
first bake
ssure /Sp
//I
/ /'
/Max/ temp
/ bake
1 Time '
mp = 400°C
\ \\ \^
system N. Cut heat
on 2nd \^ 1st bake System= 200°C \ -^ cooling 1
\ \ ^ ^>\< Cut heot \| 1
\ X Air 1
\ 1\l f°"s
1
\ \ 1
^^ Pressure pips occurred wherA. 1^
\ liquid-nitrogen trap filled \^^^
>C^y-K A^i aK1 1
1 1
1 1 1 1 1 1 1
Pressure rose
w
be
1x10-'
en creep
rrier out
8hr
1 to heot
1
1 muffle 1
-5x10"'°
1
Bokeout
2 3 4 5 6 7 8
Time,lir
—>|~2weeks
10"
started
Fig. 9-3. Plot of the pressure versus the time for two typical bakoout cycles of
a chamber evacuated by an oil diffusion pump through a liquid-nitrogen trap
with and without anticreep barrier. [Taken with permission from N. Milleron,
in 1958 Vacuum Symposium Transactions (Pergamon Press, London, 1959).]
most effective means of affecting such a drastic change is to bake the
entire vacuum chamber up to and including the liquid-nitrogen-cooled
baffle system at a high temperature for an extended period of time.
The supply of gas sorbed in the metal is desorbed rapidly and pumped
at a much higher pressure during the period the chamber is maintained
at high temperature, so that the total throughput of desorbed gas is
increased during this period by a large factor. When the system is
then allowed to cool back down to room temperature, the great quan-
tities of easily desorbed gas have been removed from the surfaces, the
outgassing rate is decreased by many factors of 10, and the resulting
base pressure is correspondingly decreased.
The results of two typical bakeout cycles reported by Milleron"
are shown graphically in Fig. 9-3. The system was evacuated by a
ULTRAHIGH VACUUM 367
conventional stainless steel diffusion pump using Octoil-S as the work-ing fluid. The liquid-nitrogen-cooled vapor trap was that illustratedin Fig. 8-30, featuring an oil-creep barrier and a water- or radiation-cooled baffle to take the blast of hot oil vapor from the diffusion-pumpjet. The volume of the vacuum chamber was 70 liters and wasequipped with metal gaskets to permit bakeout temperatures up to450°C. The vacuum chamber had been used for many previousultrahigh-vacuum experiments so that the stainless steel walls werefar cleaner than those of a newly constructed chamber. As indicatedin Fig. 9-3 the base pressure attained with the chamber at roomtemperature was about 2 x 10"' torr. During bakeout the tempera-ture reached the value of 400°C in about 1 hr and was maintained at
that temperature for about 5 hr, the heater power having been on for
6 hr. The pressure in the chamber reached a maximum of 10~* torr
at about the same time the temperature reached 400°C and thenslowly decreased until it had declined to a value of about 2 x 10"' torr
after 6 hr of baking when the heater was turned off. A crude in-
tegration of the area under the outgassing curve yields a total gas
output of about 30 torr liters during the bakeout, since the measuredpumping speed of the system was about 40 liters/sec. The projected
area of the interior walls of the vacuum chamber was about 7,500 cm^.
Since the number of molecules in 1 torr liter of gas is 4.5 x 10", the
gas removed during bakeout was equivalent to 30 x 4.5 x 10"/7,500 =2 X 10" molecules/cm^ of projected area. If one assumes a roughnessfactor of 50, which may be somewhat generous, the gas extracted fromthe metal during bakeout was equivalent to about 40 molecular layers.
At the pressure existing before bakeout the time required to removethis quantity of gas would be about 100 hr. However, at the end of
the bakeout when the chamber reached room temperature the pressure
had dropped to 5 x lO"" torr, where it remained for the period of the
test with no indication of rising.
A similar test run without the oil-creep barrier in place reached a
base pressure of about 1 x lO"" torr after a shorter bakeout period
(about two hours) but then began to rise rapidly after about two weeksoperation and in a period of one day rose back up to a value of 1 X 10~'
torr, where it then remained. For the conditions of this test, therefore,
the surface migration time for the oil film to bypass the liquid-nitrogen-
cooled trap along the approximately room-temperature surface of the
housing surrounding the vapor trap was apparently about two weeks.
From this result one may conclude that the oil-creep barrier is not a
necessity for the attainment of ultrahigh vacuum with an oil diffusion
pump as long as the period of interest is less than about two weeks,
but for longer periods the barrier is an absolute necessity.
368 VACUUM SCIENCE AND ENGINEERING
Ion gouge
±
wR-f moss spectrometer
Go-ln-Sn seol
To oil
ditfusion
pump
Furncce
Thermocouple
Fig. 9-4. Gas analytical apparatus for analysis and quantitative moasuromentof gases given out during bakeout. [Taken with permission from P. F. Varadi,
in 1960 Vacuum Symposium Transactions (Pergamon Press, London, 1961).]
Outgassing experiments of the type just described are very in-
formative from an empirical point of view and lead to concrete in-
dications of the ultrahigh-vacuum capabilities of oil diffusion pumpscoupled with appropriately designed vapor traps. However, the
outgassing in the case just discussed was measured with an ionization
gauge so that the details of the outgassing process in terms of the
gases being evolved as a function of time were not determined. This
point is covered by Varadi^* in a cleverly executed experiment in which
the throughput of the evolved gases are analyzed and measured
quantitatively during the bakeout cycle. Varadi's apparatus is
illustrated in Fig. 9-4 and incorporates a known conductance and r-f
mass spectrometer to identify and measure the quantity of each com-
ponent of gas evolved as a function of time as the sample is put through
the bakeout cycle. In Fig. 9-5 are shown graphically the quantitative
results of outgassing a nickel cathode sample at a temperature of 850°C
for a period of several minutes. The data shown in the figure are taken
from three separate samples prepared in the same way, showing the
excellent reproducibility of the results. The predominance of hydro-
gen during the early phase of the outgassing period and its subsequent
rapid decrease to a minor constituent is an interesting feature of the
process. Since the materials being tested in Varadi's experiment are
cathodes already prepared for use in vacuum tubes, the material had
been treated for an hour in a hydrogen atmosphere at 1150°C. The
ULTRAHIGH VACUUM 369
results are therefore not indicative of the gas content of raw nickel
generally, but illustrate a method of quantitative analysis whichshould be of considerable help in disentangling the contributions ofadsorption, absorption, chemisorption, and diffusion to the process ofoutgassing.
Even though processes involved in sorption and outgassing are notyet understood quantitatively in the detail desired, experience hasshown that a well-designed diffusion-pump and vapor-trap systemaugmented by baking the vacuum chamber at temperatures from 250to 450°C can attain base pressures of 10^" torr or less. Experiencefurther indicates that a newly fabricated and carefully cleaned systemmust generally be subjected to a baking temperature of at least 300°Cfor about 24 hours in order to reach the lO"!" torr range. Subsequentbakeout temperatures can be at lower temperatures and for shorter
periods of time, depending upon the character of the gas exposure
Fig. 9-5. Graphical presentation of the thermal degassing properties of a cathode
nickel material. [Taken with permission from P. V. Varadi, in 1960 Vacuum
Symposium Transactions (Pergamon Press, London, 1961).]
370 VACUUM SCIENCE AND ENGINEERING
Flange Cylinder
wall
during the intervening period. Best results are obtained by admitting
nitrogen from evaporating liquid nitrogen to the system and maintaining
a flow of dry nitrogen while the system is open so that a pressure slightly
in excess of atmospheric pressure is maintained in the system. Bythis procedure water vapor can be almost completely excluded from
the system for the subsequent pumpdown cycle.
The necessity of baking the vacuum chamber and all its accessories
at high temperature introduces a number of
design problems not encountered in conven-
tional high-vacuum systems. Since elas-
tomers are restricted to a relatively limited
temperature range, the sealing of flanges and
valve seats presents serious problems to
which reasonably satisfactory solutions have
been found.
9-3. Metal Gaskets. The fact that
rubber and elastomers generally are not
entirely suitable for use as gaskets in vacuumsystems because of outgassing and permea-
tion has been recognized for many years.
In Chap. 8 the properties of a number of
elastomers are discussed and the advantage
particularly of Viton A and B for use in
systems with bakeout temperatures up to
300°C is mentioned. Another technique
discussed is that of circulating a coolant
through a guard ring between two rings
with the result that the outgassing and per-
meation of the 0-ring material is substantially reduced. Alternatively,
a copper tubing for circulating the coolant may be installed in the
guard ring thus avoiding a rather messy situation when the flange is
disassembled. These alternatives are available, and in those instances
in which the resulting base pressure is satisfactory for the process in
hand more exotic solutions to the problem may not be justified.
The fact that the best of elastomers, even with the improved tech-
niques for their use, are not satisfactory for many applications still
remains. The use of various softer metals such as gold, indium, and
lead fuse wire has been mentioned in the vacuum literature for manyyears. In Procedures in Experimental Physics by Strong^^ a design
of metal gasketed flanges, as shown in Fig. 9-6, is described. It is
emphasized that lead wire gaskets joined by butt welding to form a
ring can be used to high bakeout temperature and that aluminum wire
remains vacuum tight for even higher bakeout temperatures. The
Fig. 9-6. Metal gasketed
flange design described
by John Strong. [Taken
with permission fromJohn Strong, Procedures
of Experimental Physics
(Prentice-Hall, EnglowoodCHffs, N.J., 1938).]
ULTRAHIGH VACUUM 371
lOmils
20mils
temperatures used for baking out the system are not stated. Con-sidering that these techniques were in use in the mid-thirties emphasizesthat the eff'ort to develop satisfactory metal gaskets has a long history.
The most extensive early use of lead wire gaskets in the author'sexperience" was in the design and construction of the accelerating
tube for the 2.5-million-volt Van de Graaff generator built at MIT in
1937. The vacuum system wasevacuated by mercury diffusion
pumps and was constructed of
porcelain and steel with fuse-wire
gaskets at all metal-to-porcelain
joints and at all demountable
flanges. The disadvantages of the
use of fuse wire are that the bake-
out temperature is limited to
about 250°C and that the fuse
wire cold-flows even at room tem-
perature. If the mechanical de-
sign of the flange is such that the
compressional loading is main-
tained as the fuse-wire material
creeps, the gasket eventually be-
comes very thin and usually de-
velops a leak. In spite of this
feature fuse-wire gaskets have been used to advantage in a great manysituations in which the available elastomer gaskets could not be used.
Another metal wire material which has proved to be useful is an
indium- tin alloy which is, however, limited to bakeout temperatures of
about 100°C. This material has the advantage that fusing joints is not
necessary. The wire can be overlapped at the joint and will seal
tightly when the flange surfaces are pulled up snugly compressing the
gasket joint. On large or irregularly shaped flanges this feature of the
indium-tin wire may be a distinct advantage.
In recent years with the greater demand for ultrahigh-vacuum
systems requiring high-temperature (450°C) bakeout there has been
a greatly enhanced effort on the development of metal gaskets.
Copper gaskets have been developed in a number of different forms
and have been used with some degree of success. In Fig. 9-7 is illus-
trated the copper shear gasket" developed for the Atomic Energy
Commission by the Westinghouse Research Laboratories. The mating
flanges are designed with an interleaving step form so that when the
two flanges are forced together under loading from the bolt circle,
the flat copper gasket 0.045 to 0.050 in. thick is sheared to a depth of
20 mils
Fig. 9-7. Copper shear gasket. [Taken
with permission from Lawrence Radia-
tion Lab. Eng. Note EXA-122, Mar.
16, 1961, by T. H. Batzer and J. R.
Ullman.]
372 VACUUM SCIENCE AND ENGINEERING
0.005 in.
+0.002_i_
<- 0.015 in. + 0.005
t
r-
.
A>'/i6 in. B>V32 in. C = V8 in.
about one-half its thickness. Annealed OPHC copper sheet material
was at first recommended for this purpose until cold-flow difficulties
developed during high-temperature bakeout. Details of the flange
and gasket design were developed in some detail by Batzer and
Ullman," who found that annealed cupronickel is a much more satis-
factory material than copper for
this type of seal. As developed
by Batzer and Ullman the shear
gasket is very reliable for use
with stainless steel flanges and
bakeout temperatures up to 450°C.
The proper machining of the
flanges requires adherence to close
tolerances, and the resulting prod-
uct is easily subject to damage.
The sheet stock selected for
making gaskets must be free of
scratches. If properly made, shear
gasket joints are consistently re-
liable and can be opened and
closed several times before the
gasket must be replaced. Theprincipal disadvantage is the rela-
tively high cost as compared particularly with the aluminum-foil
gaskets to be discussed later.
Milleron^^ describes a form of gasket which he calls the copper bead
gasket, the cross section of which is shown in Fig. 9-8. The gasket as
shown in the flgure is placed between polished flanges with plane sur-
faces and is compressed by a symmetric tightening of the bolts on the
bolt circle. The total area of the protruding beads is small with the
result that the concentrated loading of the flanges flattens the beads
until the steel flange surfaces come into contact with the much larger
area of the main body of the gasket. Further tightening of the bolts
results in no signiflcant further compression of the gasket but a stretch-
ing of the bolts, the stress due to which keeps the seal tight during the
bakeout and cooling cycle. This gasket configuration proved to be
much superior to copper or aluminum wire gaskets, which do not have
the feature of the greatly increased eff'ective area and therefore develop
leaks due to creep of the metal. Since the flanges are flat, there are no
difficult tolerances to hold or expensive operations to carry out in the
fabrication of the flanges. Making satisfactory copper bead gaskets,
however, has proved to be somewhat more difficult, but the problem
has been solved by the use of chemical milling using concentrated
nitric acid.
Fig. 9-8. Cross section of the soft
copper bead gasket before compression
between steel flanges with plane faces.
[Taken with permission from N.
Milleron, in 195S Vacuum SymposiumTransactions (Pergamon Press, London,
1959).]
ULTRAHIGH VACUUM 373
A somewhat similar type of copper ridge seal is described by Goerzi"
for use on the Stanford 2-mi electron accelerator. As shown in Fig.
9-9, the rather thick (3/16-in.) copper gasket has a narrow ridge of
height equal to about 0.010 in. and width at its base of 0.018 in. Whenthe gasket is compressed between the flanges, the ridges are distorted as
shown in the figure. The complete assembly of the waveguide flange
joint is shown in Fig. 9-10. This case is interesting in that the wave-
2A
±16
Clomping bar
Before seolinq After seoling
Ridge Detoil
Fig. 9-9. Cross section of ridged
copper gasket before and after com-pression. [Taken with permission
from D. J. Goerz, Jr., in 1960
Vacuum Sym,posium Transactions
(Pergamon Press, London, 1961).]
Fig. 9-10. Waveguide flange assem-
bly utilizing ridged copper gasket of
Fig. 9-9. [Taken with permission
from D. J. Goerz, Jr., in 1960
Vacuum Symposium, Transactions
(Pergamon Press, London, 1961).]
guide, and therefore also the copper gasket, is rectangular but appar-
ently seals very well. It is reported that klystrons using these seals
have not shown an increase in pressure over a period of several months,
the pressure being in the 10~* torr range.
There have been a number of designs of knife-edge seals reported, one
example of which is that reported by Lichtman and Hebling^' and
illustrated in Fig. 9-11. The rather thick OFHC copper gasket is
silver-plated. Both stainless steel flanges have machined on them
circular ridges, referred to as knife edges, which deform the copper
gaskets as the flanges are drawn together. The mechanical process
involved would appear to be somewhat similar to that of the copper
ridge gasket. In any case the authors report excellent reliability at
bakeout temperatures up to 600°C with a system utilizing many such
seals up to a flange diameter of 12 in.
374 VACUUM SCIENCE AND ENGINEERING
Knife edges
O.OIOR
ULTBAHIGH VACUUM 375
A-7o°-A
stainless steel
Stoinless-steel
Stainless -steel
^>«^swivel flange
Silver-plated
oxygen -free
copper washer
Fig. 9-11. All-metal knife-edge seal. [Taken with permission from D. Lichtmanand A. Hebling, in 1960 Vacuum Symposium Transactions (Pergamon Press,London, 1961).]
Lichtman and Hebling^" also report on an all-metal flare seal shownin Fig. 9-12 which provides a compact and reliable means of connectinga small-diameter copper tubing to a fitting on a manifold or chamber.The authors state that the seal is assembled by slipping the coppertubing through the stainless steel flange and then flaring the tubingwith a standard tool. The seal is said to be reliable even after severalcycles of disassembling and reassembling and to withstand the highbakeout temperatures required.
Gold wire has been used to seal vacuum flanges in a variety ofdiff'erent designs. The design shown in Fig. 9-13 is used on the
Three No. 10-32 bolts
Fitting
Copper tubing
Compression
Braze seal
^Manifoldtubing
Fig. 9-12. All-metal flare seal. [Takenwith permission from D. Lichtman andA. Hebling, in 1960 VacuumSymposiumTransactions (Pergamon Press, London,1961).]
0.020 diam gold wire
Fig. 9-13. Simple gold seal. [Takenwith permission from D. J. Grove,
in 1958 Vacuum' Symposium Trans-
actions (Pergamon Press, London,1959).]
Stellarator devices at Princeton and is described by Grove. ^^ Groveattributes the origin of this type of seal to Hickam,^^ but the idea
seems to have occurred independently to others as well. According to
Grove the important factors in the design are a radial clearance of
0.001 or 0.002 in. between the inner and outer members of flanges
which slide together, a surface finish of 16 microin. and a snug fit for the
gold ring in the corner of the flange. The material is 24-karat gold.
The initial diameter of the wire is 0.020 in., and it is compressed to
0.010 in. when the flanges are pulled tightly together closing the
crevice between them on the inner surface. These seals have repeatedly
withstood bakeout to 450°C without failure, and were in use in sizes
from K in. to 8 in. diameter at the time the report was written.
Power and Robson^^ summarize a series of experiences using wire
gaskets between flat stainless steel flanges. One difficulty encountered
during their tests, and indeed also encountered by others, is the tend-
ency of an aluminum-5 per cent silicon wire gasket to form a strong
bond to the surface of the flange, resulting in tearing the gasket and
leaving portions thereof tightly stuck to the flange. Their practice
was to compress the 0.040-in.-diameter wire to 0.011 in. between the
flanges, controlling the limit of compression by using shims placed
between the flange faces. The adherence of the gasket material to the
flange is a major nuisance since cleaning up the flange for subsequent
use is then a tedious chore. Power and Robson report that this
difficulty is completely eliminated by applying a surface coating of
indium to the aluminum wire gasket. An unexpected advantage is
that the compressive force required is reduced by a factor of 2 or 3
when the indium coating is applied. The authors report that the
difficulties in making successful seals in the manner described increase
with the dimensions of the flange, and that they have not been con-
sistently successful in sealing flanges for 400°C bakeout for diameters
of 12 in. or greater.
A metal gasket development of particular promise is that of Batzer
and Ryan, 2* who have devised a bakable aluminum gasketed flange
which appears to be more reliable than any previously described up to
large diameters and is far less expensive than most other designs. The
aluminum-foil flange is illustrated in Fig. 9-14. The mating flanges,
which may be either stainless steel or aluminum, are machined with
mating faces which are slightly conical at the angle Q relative to the plane
of the flange. A gasket is cut from commercial aluminum foil 0.015 in.
thick (using tin snips, for example) and placed between the flanges,
which are then bolted together. Contact will initially occur at the inner
diameter of the contacting conical surfaces, but the point of contact wifl
move to larger and larger radii as the bolts are tightened and the flanges >
376 VACUUM SCIENCE AND ENGINEERING
Pipe 0D + 2t
0.0015 Alfoil
type 1145-0
respond with a rotational deflection. The figure includes the formulafor the rotational deflection as a function of the modulus of elasticity
of the flange material, the dimensions, and the applied loading.
The aluminum-foil seal is loaded at 2,000 to 3,000 Ib/lin in. of gasket.
The strain energy stored in the
distorted flanges ensures that the
gasket is under compression for a
wide range of temperature. Ther-
mal cycling of aluminum-foil seals
between liquid-nitrogen tempera-
ture and 450°C has been carried
out repeatedly without damage or
development of detectable leaks.
Aluminum-foil seals with gaskets
cut from single widths of foil
material have been tested andused successfully with diameters
ranging from l}4. to 22 in. It has
been privately reported to the
author by Batzer that a 48-in.-
diameter flange, the gasket for
which was made up of several
sections of aluminum foil over-
lapped at their ends, was tested
successfully. The additional com-pressional loading at the points of
overlap was apparently sufficient
to eliminate the gaps which wouldnormally be expected to be formed
at the edges of the overlapping
sections. From this experience
flanges of larger diameters will be
attempted using the aluminutti-foil
technique with overlapping sec-
tions in order to meet an, actual
need in the controlled-fusion pro-
gram. Presumably because of the relatively low local pressures de-
veloped between the flanges and the foil gasket no serious difficulty of
bonding of the gasket material to the flanges has been experienced.From the performance to date the aluminum-foil seal appears to bethe most economical and successful demountable, bakable all-metal
seal for ultrahigh-vacuum application.
Another form of aluminum-foil seal which has been found to be
7/16diam(approx, 2.00"
spacing)
Fig. 9-14. The aluminum-foil vacuumflange. Maximum stress in flange:
cr(max) = MRjZ. Rotational deflec-
tion in flange: = MR^jEI. M =moment due to bolt load and gasketreaction. R = radius of bolt circle.
Z = hd^jQ, flange section modulus./ = 6d^/12, moment of inertia of flange
section. E = modulus of elasticity ofthe flange. [Reprinted with permis-sion from The Macmillan Co., fromT. H. Batzer and J. F. Ryan, in 1963Vacuum Symposium Transactions.
Copyright © 1963 by The AmericanVacuum Society, Inc.]
ULTRAHIGH VACUUM 377
thoroughly reliable is that illustrated in Fig. 9-15. This seal has been
used extensively in ultrahigh-vacuum applications by the Compagnie
General de Telegraphic sans Fil. The flanges are stainless steel and
are machined with a ridge on one flange and a mating groove on the
other. Since the half-angle of the ridge is 30° and that of the groove
is 45°, the aluminum foil, which is compressed into the groove by the
ridge, is under a tapering compressional load. The flange distortion
and stretching of the bolts provides the stored energy necessary to
ensure that a compressional load will be sustained at all times during
the bakeout.
All dimensions in mm
*nnii»
iJliil
ntO.l0*0
r+u.i'.-to
rto.l
p tO.2
r^r^
-0.3mm
Aluminum-
foil gasket
Fig. 9-15. Aluminum-foil gasket with wedge seal flange of the Compagnie
Generale de Telographie sans Fil. The circular gasket is cut from 99.95 per
cent pure aluminum foil of 0.3 mm thickness. [Taken with permission from
Societe de Reoherches Techniques et Industrielles, HI, rue la Boetie, Pans.]
378 VACUUM SCIENCE AND ENGINEERING
A method of sealing flanges which avoids entirely the necessity of a
gasket of any kind has been described by Farkass and Vanderschmidt.^^
The method as illustrated in Fig. 9-16 consists of welding onto each
flange a thin, stainless steel skirt which protrudes out beyond the
flange. The machining of the flange to provide a thin lip of metal
onto which to weld the skirt is a typical ex-
ample of the proper preparation for a Heliarc
weld of a thin section of metal to a heavy
member. The two flanges are mounted in
position with the outer peripheries of the skirts
in contact, and the edge is then welded shut all
the way around. The resulting joint is then
completely sealed by welding . When the flange
is to be disassembled, the weld around the edge
is ground off. Such a seal can be rewelded
several times before the old skirtings must be
replaced. The advantage of absolute welded
tightness is obvious. In many situations, how-
ever, the frequency with which the weld would
have to be ground off and the seal rewelded
might become a major handicap.
9-4. Bakable Valves. In the previous
chapter, vacuum valves of several varieties
were described and illustrated. Many of the
designs discussed have metal bellows to trans-
mit the motion for opening and closing the
valve port. However, in all the examples given
the sealing of the valve port is accomplished by
some type of elastomer, so that the maximumtemperature for bakeout is limited by the choice
of seal material. The steel-fabricated valve
shown in Fig. 8-19 and Fig. 8-20 is capable of
bakeout to 175°C when supplied with silicone valve disk and gaskets.
The same valve could be supplied for somewhat higher-temperature
bakeout with Viton A or B for these parts. For many ultrahigh-
vacuum applications the bakeout temperature must be much higher
than any available elastomer will tolerate.
The first major step toward the solution to the bakable valve
problem is that reported by Alpert^' and illustrated in Fig. 9-17. The
valve consists of two main components: (1) a vacuum-tight capsule
with a heavy OFHC copper base sealed over one side by a corrugated
Kovar diaphragm which carries a Kovar plunger which can be driven
snugly into one of two 0.25-in. holes drilled through the base and
Fig. 9-16. Reweldable
seal connection between
two heavy flanges, upto 30 in. in diameter.
[Taken with permission
from I. Farkass and G.
F. Vanderschmidt, in
1959 Vacuum Sympo-sium Transactions (Per-
gamon Press, London,
I960).]
ULTRAHIGH VACUUM 379
(2) a driver assembly with a differential screw thread by which theplunger is driven into or withdrawn from the sealing hole. Kovartubes are soldered into the two holes in the
copper base plate and are connected to the
system either by glass or metal tubing.
The Kovar plunger has a 60° tapered tip
and forms its own seat by deforming the
copper about the entrance to the sealing
hole. The conductance of the valve whenclosed is reported to be in the range 10"" to
10-11 liter/sec which is almost beyond the
detectable limit. Valves of the Alpert type
are available commercially and permit opera-
tion in the pressure range IQ-i" torr or less.
The virtue of this type of valve is that it
may be thoroughly outgassed by high-tem-
perature bakeout either in the open or closed
position. Its principal disadvantage is its
relatively low conductance even when fully
open.
A considerably larger valve having manyof the features of that just described is that
reported by Grove^^ and shown in cross sec-
tion in Fig. 9-18. The open conductance of
the valve shown is 80 liters/sec and the closed
conductance is typically 10"^ liter/sec. In
this design the nose piece with the 45° face
is of copper and the seat is stainless steel
with a 1%-in. opening. A stainless steel
bellows allows adequate motion to provide
the open conductance stated above. Valves
of this design have been used extensively in
the construction of Stellarators and have
been baked at 450°C in the closed position
repeatedly without deterioration in their
ability to seal properly. The differential
screw method of applying final loading on
the valve is provided by a separate assembly
which is removed when the valve is baked.
A new design principle has been introduced in the gasketless valve
described by Wishart and Bancroft." When a conical spring washer
is flattened by compression between two flat surfaces, the washer
increases in diameter. The objective was to utilize this effect to seal
U'-'-l--i Y'l
Fig. 9-17. All-metal bak-
able vacuum valve. Thevalve body consists of
(1) a 1^ -in.-diameter
copper cup with l/4-in.-
diameter holes for the
valve seat and openings,
(2) a flexible Kovar dia-
phragm brazed to the
copper cup and to (3) a
Kovar member with a
highly polished conical sur-
face. The driver mecha-
nism consists of (1) an
outside screw and stainless
steel housing, (2) a silicon-
bronze differential screw,
(3) a drive screw, (4) a
backing plate to withstand
the large forces exerted
upon the valve body.
[Taken with permission
from D. Alpert, Rev. Sci.
Instr. 22, 536 (1951).]
Fig. 9-18. Large-aperture bakable
valve. [Taken with permission fromD. J. Grove, in 1958 Vacuum Sym-posium Transactions (PergamonPress, London, 1959).]
Flattened position Relaxed position
m
Fig. 9-19. Sealing principle for a
gasketless metal valve. [Taken with
permission from J. Wishart and
G. H. Bancroft, in 1960 VacuumSymposium, Transactions (PergamonPress, London, 1961).]
Fig. 9-20. One-half inch bakable
valve utilizing the sealing principle
illustrated in Fig. 9-19. (1) Pressure
ring; (2) expanding disk; (3) valve
body; (4) shoulder to limit travel of
valve-disk assembly; (5) end piece of
valve body; (6) operating nut for
opening and closing valve; (7) pinnedcolor for retracting valve-disk assem-
bly; (8) disk carrying assembly.[Taken with permission from J.
Wishart and G. H. Bancroft, in 1960Vacuum, Sym,posium Transactions(Pergamon Press, London, 1961).]
Kinematical alignment
of gate
Pressure
chamber
OFHC copper
gate
Stpinless
knife edge
Fig. 9-21. Schematic drawing of 4-in.
bakable gate valve. [Taken with
permission from R. J. Conner, R. S.
Buritz, and T. von Zwock, in 1961
Vacuum Symposium Transactions
(Pergamon Press, London, 1962).]
380
ULTEAHIGH VACUUM 381
the aiaerture of a valve in the manner illustrated in Fig. 9-19. A H-in.
valve utilizing this principle is shown in cross section in Fig. 9-20.
The clearance between the disk and the bore within which it travels
is only a few thousandths of an inch, so that as the disk is thrust
against the circular stop, the disk expands radially and seals against the
cylindrical wall. It is found that in applying this principle of sealing
it is not necessary to use a soft metal such as copper. The disk is
made of a spring steel material and the body of type 304 stainless steel.
The difference in hardness between these two materials is sufficient
to ensure a tight seal. The seating principle involved in this design has
been tested for disks from % to 10 in. in diameter with no indication of
difficulty in obtaining satisfactory sealing. Valves of the 2-in. size
have been baked out repeatedly to 250°C without impairment in opera-
tion, although it would appear from the lack of mention of successful
bakeout at high temperature that 250°C may be the practical limit of
the design as presently developed. A 3^-in. valve was tested to more
than 1,000 openings and closings, and a 2-in. valve to 300 without any
evidence of significant leakage rate through the closed seat.
A bakable gate valve as described by Conner et al.^^ utilizes a
stainless steel knife-edge seal against an OFHC copper disk and pneu-
matic pressure between a pair of concentric metal bellows to provide
the necessary seal loading. A schematic drawing of a 4-in. valve of
this design is shown in Fig. 9-21. The copper valve disk is raised and
lowered by a toggle mechanism sealed by a stainless steel bellows. The
valve has been tested in repeated opening and closing operations,
is bakable to 450°C, and is reported to have a closed leakage rate less
than 10-12 liter/sec atmospheric pressure. No leakage was detected
by a mass spectrometer with helium at atmospheric pressure maintained
on one side of the valve for 3^ hr. The authors state that the design
is not limited to the simple circular aperture but has been successfully
applied to a rectangular aperture of 2 by 11 in.
A large bakable gate valve has been described by Batzer^^ and is
illustrated in Fig. 9-22. The valve incorporates an inflatable metal
bladder the expansion of which under the pressure applied by hydraulic
fluid affects the seal. The valve disk is put into position by a rotary
motion seal with a metallic bellows and an internal mechanical linkage
while the disk is under no load, so that the disk slides into place and
is raised to a position of close contact with the bladder seal. Hydraulic
fluid in the bladder chamber is then pressurized as shown most clearly
in Fig. 9-22a. The design shown utilizes copper shear gasket joints
for assembly of the demountable parts. The bladder consists of an
annular diaphragm 0.032 in. thick clamped vacuum tight between
flanges utilizing the shear seal technique. The hydraulic pressure
required for sealing is typically 6,000 psi.
382 VACUUM SCIENCE AND ENGINEERING
(a)
(6)
Fig. 9-22. (a) Valve seat and gate for bakable gate valve. [Taken with per-
mission from T. H. Batzer, in 1959 Vacuum Symposium Transactions (PergamonPress, London, I960).] (6) Cross-sectional view of bakablo gate valve. [Takenwith permission from T. H. Batzer, in 1959 Vacuum Symposium Transactions
(Pergamon Press, London, I960).]
9-5. Two-region Vacuum Systems. An approach to the design
of an ultrahigh-vacuum system which in some cases greatly simphfies
the problems of motion seals and demountable joints is that of sur-
rounding the ultrahigh-vacuum chamber by a conventional vacuumchamber so that the pressure difference determining the leakage into
the inner chamber is of the order of 10~^ torr instead of atmospheric
pressure.
A commercial vacuum system designed on the two-region principle is
shown schematically in Fig. 9-23 from a paper by Rivera and Le
ULTRAHIGH VACUUM - 383
Riche.^" The outer vacuum region is evacuated by means of a con-
ventional system utilizing a 4-in. oil diffusion pump. The inner
chamber is evacuated by a 6-in. diffusion pump through a liquid-
nitrogen-cooled chevron baffle. The 6-in. diffusion pump is backedby a 2-in. diffusion pump and a compound mechanical vacuum pumpwith a cold trap (usually dry-ice-cooled) between the 2-in. diffusion
pump and the mechanical pump.The inner chamber is a stainless steel bell jar, the bottom seal for
which is a 13-in.-diameter flat flange on a plane face plate with asimple copper wire gasket. The flange loading is provided by 12 drop-
forged C clamps. Two 3-in. sight ports are mounted on the inner
chamber wall, secured by flanges with metal wire seals.
The outer chamber is fitted with heater elements on the inner surface
and water-cooling coils on the outer surface. The system is normally
pumped down with the outer chamber removed. After leak checks
are completed, the outer chamber reaches a peak temperature of about
490°C. The inner chamber pressure as a function of the time during
bakeout and subsequent cooling to room temperature is shown graph-
ically in Fig. 9-24. At the end of the baking cycle compressed air is
first blown through the cooling coils on the inner chamber to facilitate
rapid cooling to room temperature. Liquid nitrogen is then circulated
Sight ports
Representative
power feed-throughs
ar)d rotary motion
High-vacuum valve
Radiation shielding
Inner bell jar
Outer bell jar
, Outer bel l-|ar water cooling
Heater windings
Gouge
Chevron trap
High -vacuum valve
Roughing valve
5-cfm
mechanical
pump
Fig. 9-23. Two-region ultrahigh-vacuum system. [Taken with permission from
M. Rivera and R. LeRiche, in 1959 Vacuum Symposium Transactions (Pergamon
Press, London, I960).]
384 VACUUM SCIENCE AND ENGINEEBING
t: 10"
X - Average curve -L 31Pressure of inner chamber (P,)osa function
!i of time^
Bakeout begon_
P,=f(t)
+ - C0(
Bakeout terminated.
cooling initiated —iguid-nitrogen —
through the trap and the pressure
drops rapidly, usually into the 10~i*
torr range. The complete bakeout
and cooling cycle typically requires
about fifteen hours.
A somewhat similar two-region
vacuum system described by Ehlers
and Molpi is illustrated schemati-
cally in Fig. 9-25. The inner
chamber is thin-walled and is bak-
able to a temperature of 450°C bypassing an electrical current through
the thin metal wall material. Be-
cause of the low heat capacity the
heating period is very short and the
total bakeout period at 400 to
450°C is about iH hr. The inner
chamber and an internal coil are then cooled by circulating compressedair, and finally liquid-nitrogen cooling is applied not only to thediffusion-pump trap but also the internal cooling coil. The result is arelatively short bakeout and cool-down cycle with a total about 6 hr to
operating pressures in the range 3 x ID"' to 5 x lO"" torr as read ona Bayard-Alpert gauge, depending upon the detailed features of thesystem and the operating cycle.
3 6 9 12 15 18 21
Time.hr
Fig. 9-24. Pressure vs. time for theinner chamber of a two-region ultra-
high-vacuum system. [Taken withpermission from M. Rivera and R.LeRiche, in 1959 Vacuum Sympo-sium Transactions (Pergamon Press,
London, I960).]
Window system
Ttiin-wall bakoble
contoiner
(Heated by higti o-c
Alpert gauge o
Cooling -water boffle
Oil diffusion pump
Rotary pump
High vacuum 10"* to 10"* torr
\^^ ^/ Ultrahigh vacuum
(\>'^~y'^0-' to 10"'° torr
5r^ ^,Alpert gouge b
(j)!^ Simple metal gosket
„('i Liguid -air trap
= °=>^'^~\ Bokable tube
pfT~^ \ Liquid -air baffle
-Cooling -water baffle
I
^Oil diffusion pump
Quick cooling
Fig. 9-25. Two-region ultrahigh-vacuum system with thin-wall inner chamber.[Taken with permission from H. Ehlers and J. Moll, in 1959 Vacuum SymposiumTransactions (Pergamon Press, London, I960).]
ULTRAHIGH VACUUM 385
Radiation shields
Another example of a two-region system is described by Metcalfeand Trabert^^ ^^d illustrated schematically in Fig. 9-26. The outervacuum chamber is 48 in. in diameter and is evacuated by a conven-tional diffusion-pump system consisting of a 12-in. diffusion pump witha water-cooled baffle typically producing a pressure of 2 x 10-* torrafter the bakeout cycle is completed. The inner chamber is 32 in.in diameter and is fabricated of Inconel, H in. thick, the total workingvolume of which is 16 ft^. The inner chamber is evacuated through a20-in.-diameter pumping manifoldwithin which there are two chev-
ron baffles separated from eachother in the manifold and isolated
thermally by ring- and disk-radia-
tion baffles. The inner chamberand the portion of the manifoldcontaining the innermost chevronbaffle are heated by radiation
heaters in one zone of the outer
vacuum space, and the portion of
the manifold containing the outer-
most chevron baffle is similarly
heated by heaters in the secondzone of the outer vacuum space.
The elbow leading from the pumping manifold to the diffusion pump is
separately heated by heater elements on its outer surface. There is athird chevron baffle just over the diffusion pump. According to theauthors the net pumping speed out of the inner chamber is calculatedto be 750 liters/sec.
After bakeout of the inner chevron trap and the inner chamber to400°C for 6 to 8 hr, cooling for several hours, and finally cooling theinner chevron trap with liquid nitrogen, Bayard-Alpert gauge readings"corrected for X-ray limit" reached base pressures in the range 2 to3 X 10-" torr. The pressure-versus-time curve for the bakeout andpumpdown is shown in Fig. 9-27. An interesting feature of the curveis the series of ionization-gauge peaks which are observed as the liquid-nitrogen supply to the chevron baffles is shut off and the baffles slowlywarm up. These peaks are interpreted as being due to the fractionaldistillation of the condensed gases off the baffle surfaces.
9-6. Getter-ion Pumping. Thus far in this chapter we haveconsidered various ways in which the performance of the conventionaldiffusion pump and vapor-trap combination, together with variousmodifications in the methods of sealing and the technique of bakingto high temperature, could be improved for the purpose of attaining
Heaters
'
Fig. 9-26. Schematic drawing oftwo-region ultrahigh-vacuum system.[Taken with permission from R. A.Metcalfe and F. W. Trabert, in 1961Vacuum Symposium Transactions(Pergamon Press, London, 1962).]
386 VACUUM SCIENCE AND ENGINEERING
much lower pressures than are typically obtained in conventional
vacuum systems. The diffusion pump and its mechanical backing
pump are sources of contaminants
which must be prevented from
backstreaming into the high-
vacuum portion of the system and
limiting the base pressure to some
much higher pressure than that
desired. Rather than combat this
problem of backstreaming, engi-
neers in recent years have madean intensified effort to exploit
methods of pumping which do not
generate hydrocarbon contami-
nants and give promise of provid-
ing "clean" vacuum spaces with
relatively simple combinations of
equipment. One approach to this
problem which has had some
degree of success was discussed
toward the end of Chap. 5, where
recent progress in the development
of molecular pumps and axial-flow
molecular turbine pumps was de-
scribed. We shall devote the re-
mainder of this chapter to other
methods of pumping, some of
which have already been demon-
strated to provide important capabilities in the ultrahigh-vacuum
pressure range.
It is well known that gas discharges have the ability to pump to some
degree. This is particularly true of discharges in magnetic fields, since
30 40-
Time.hr
Fig. 9-27. Typical bakeout and pump-down cycle of the two-region vacuumsystem shown in Fig. 9-26. [Taken
with permission from R. A. Metcalfe
and F. W. Trabert, in 1961 VacuumSymposium Transactions (Pergamon
Press, London, 1962).]
Exit-gas leakPressure ~10'^ torr
Side magnet
Pressure ~5)(10" torr
"To forevocuumAnode constriction'
Hollow cold
ttiode
-300volts
Pressure~5xlO"'' torr
End view
Fig. 9-28. An ion pump based upon the pumping action of an intense discharge in
a magnetic field. [Taken with permission from .J. S. Foster, Jr., E. O. Lawrence,
and E. J. Lofgren, Rev. Sci. Instr. 24, 388 (1953).]
ULTRAHIGH VACUUM 387
the ions and electrons formed by ionization are constrained to move inmore or less tight spirals along the lines of force. A neutral moleculewhich wanders into a discharge column in a magnetic field quicklybecomes ionized, trapped in a spiral path in the magnetic field, andforced to leave the region where it entered the discharge by spir'alingalong the magnetic field. The pumping action of discharges in mag-netic fields has therefore been well known for a long time. However,the first serious attempt to develop a vacuum pump utilizing thiseff'ect appears to be that of Foster, Lawrence, and Lofgren. ^s Thedevice took the form shown in Fig. 9-28, which illustrates a dischargeion pump capable of pumping at the rate of about 5,000 liters/sec.
The axial magnetic field was produced by an array of coils mounted onthe long, cylindrical body of the pump, except for the central regionwhere the pump housing is enlarged to provide high entrance conduct-ance. Across this enlarged section of the pump the coil was in the formof a rather open spiral conductor carrying a large current to maintainthe magnetic field strength and still permit gas molecules to diffusefreely into the discharge. The distribution of currents in the coils
determines the shape of the magnetic field which is optimum when thelines of force bulge slightly in the central section of the pump andconverge somewhat symmetrically toward both ends.The discharge is a large PIG discharge first investigated by Penning. »«
There are two cathodes, one on each end of the device. Experiencewith a variety of hot- and cold-cathode designs resulted in the final
selection of a hot, hollow cathode on one end and a cold, hollow cathodeon the other, as shown in the figure. The anode for the dischargeis the long cylindrical pump body reaching from the enlarged pump-inlet section to the anode constriction on each end. The dischargecolumn is limited in diameter by the anode constrictions. The shapeof the magnetic field and the diameter of the cylindrical anode from theconstriction to the pumping section of the device are sensitive param-eters. In order to maintain the proper discharge conditions in thecentral region of the pump it was found to be necessary to maintain aneutral gas density in the cathode chambers not less than about5 X 10-* torr, which is the forevacuum against which the ion pumpworks. The gas from the cathode chambers fiows in from both endsof the pump, is ionized, and as positive ions is carried back to thecathodes, where the ions are neutralized. Molecules fiowing into thedischarge column in the central section are ionized and also are carriedout the ends as ions and are neutralized at the cathodes. Many of theions striking the cathodes interact chemically. This process proceedsat such a rate that the forevacuum valves at the two ends of thepump could frequently be closed and even then gas had to be bled
388 VACUtTM SCIENCE AND ENGINEERING
into the cathode chambers in order to maintain the minimum operating
pressure of 5 x 10"* torr required to maintain the discharge.
The operating characteristics of the pump are shown in Table 9-1.
From these characteristics it is evident that the ion pump of Foster,
Lawrence, and Lofgren cannot be classed as an ultrahigh-vacuum
pump since the typical base pressure was about 1 X 10"* torr. How-
ever, the pump did have the specific advantage of not producing
hydrocarbon impurities. The feature of continuing to pump even
Table 9-1. Opekating Pabametbes of the Ion Pump Shown in Fig. 9-28*
Pumping speed 3,000-7,000 liters/sec
Base pressure 0.8-5 x 10"* torr
Arc voltage 400-300 VArc current 20-10 ACathode Radiantly heated tungsten cathode
Heating power, 4.5 kWMagnet power Side magnets, 20 kW
Center helix, 12 kW
* Reproduced by permission from J. S. Foster, Jr., E. O. Lawrence, and E. J.
Lofgren, Rev. Sci. Instr. 24, 388 (1953).
when the forevacuum valves were closed contributed further to the
cleanliness of the system relative to hydrocarbon contaminants.
Unfortunately, the pressure in the cathode region had to be maintained
at least at 5 x 10~* torr, and the compression ratio which the pumpcould maintain against the pressure in the cathode chambers was never
better than about 10^, so that pumping at pressures much lower than
10~* torr with this particular type of ion pump does not appear to be
promising.
During studies of the performance of closed-off systems with a
Bayard-Alpert gauge in operation Bayard and Alpert^^ observed a very
definite pumping action of the gauge involving chemisorption and ion
burial in metal coatings in the gauge tube. Herb and his collafcora-
^Qj.g36,37 have reported on the operation of a large device designed
specifically to exploit these mechanisms for vacuum pumping. ' The
device, known as the Evapor-ion pump, is illustrated schematically in
Fig. 9-29, and involves two principal features: (1) A feed mechanism
by which titanium wire is fed in a sequence of discrete steps from an
internal spool down a guide so that the tip of the wire periodically
touches a post of tantalum-tungsten alloy which is heated by electron
bombardment to such a high temperature that a short length of the
wire is evaporated each time the tip of the wire touches the post. The
evaporated titanium coats the walls of the pump housing, which is
ultrahigh vacuum 389
Filament F
Inner grid G|
Outer grid Gj
about 12 in. in diameter. (2) An electron-emitting filament and doublegrid system which accelerates electrons radially outward, ionizes residualgas molecules, and drives the ions with energies up to 1,000 eV intothe walls of the pump body which are coated with the evaporatedtitanium.
Freshly evaporated titanium is very active in the chemisorption ofmost of the common gases except the noble gases. These latter gasesare ion pumped in the Evapor-ionpump, driven into the wall coat-
ing, and covered up by subse-
quent layers of evaporated metal.
Pumping speeds measured for
various gases by Swartz^* were as
given in Table 9-2 when the rate
of titanium evaporation was 5.3
mg/min.
The most extensive use of the
Evapor-ion type of pump is onthe 30 X lOi'-eV AGS proton syn-
chroton at Brookhaven, whereover 50 units have been in use for
several years. Gould^^ reported
briefly on experiences and diffi-
culties encountered in the early
use of these pumps in such great
multiplicity. The method of evap-oration of titanium has beenchanged to one of sublimationfrom a heated titanium rod as de-
scribed by Gould and Mandel*"and also by Herb, Pauly, Welton,and Fisher.*! The Evapor-ionpumps which have been changedover to the new continuous subli-
mation technique are operated as
described by Gould and Mandel"under the control of an automaticpressure detector in the pressure range 2 x 10"' to 2 x 10"* torr. Theultimate pressure thus far attainable using the new technique is 2 x 10^'
torr, which the authors believe is determined by the impurities presentin the commercial (non-vacuum-processed) titanium which is used.The pumps equipped with three sections of titanium rod for sublimationdeposit, as shown in the photograph in Fig. 9-30, are expected to
Bleeder system
Fig. 9-29. The Evapor-ion[Taken with permission fromDavis and A. S. Divatia,
Instr. 25, 1193 (1954).]
pump.R. H.
Rev. Sci.
390 VACUUM SCIENCE AND ENGINBEBING
Table 9-2. Pumping Speeds for Various Gases for the Evapor-ionPump*
Gas Partial pressure,
torr
Pumping speed,
liters/sec
Air
OxygenNitrogen
HydrogenCarbon monoxide . . .
MethaneArgon
1 X 10-5
1 X 10-5
3 X 10-6
1.7 X 10-6
5 X 10-6
1 X 10-5
5 X 10-5
370
1,000
2,000
3,300
1,000
20
5
* Reproduced by permission from J. C. Swartz, in 1955 Vacuum SymposiumTransactions (Committee on Vacuum Techniques, Boston, 1956), p. 38.
Fig. 9-30. Inner structure of Evapor-ion pump with three sections of titanivim
for sublimation coating. [Reprinted with permission from The Macmillan Co.,
from C. L. Gould and P. Mandel, in 1962 Vacuum, Symposium, Transactions.Copyright © 1962 by The American Vacuum Society, Inc.]
ULTRAHIGH VACUUM 391
Penning
gaugePenning
gauge
operate satisfactorily for a period of about two years before replace-ment of the titanium rods will be required.
Although as used on the Brookhaven AGS the operating pressure is
not very low, it is an acceptable range for the present needs. What is
important is that the system appears to be essentially free of hydro-carbon contaminants. The system is initially pumped down to apressure of about 10-* torr by a group of compound mechanical boosterpumps backed by single-stage mechanical roughing pumps. Thesystem is then isolated from the mechanical pumps and the Evapor-ionpumps are put into operation.
The relative simplicity of the
system in other respects seems to
have fully justified the consider-
able expenditure of effort in per-
fecting the Evapor-ion pump to
the point of high reliability.
A getter-ion pump in which the
ionization and gettering processes
are more completely separated
than in the Evapor-ion pump has
been described by Gale.*^ Thepumping unit together with the
test reservoir for admitting various
gases under controlled conditions
is shown in Fig. 9-31. The pump-ing unit consists of two chambers
;
within one titanium metal is evaporated from heated tungsten filaments
wound with titanium wire, and within the other is a Penning type of
ionization gauge. One interesting feature of this arrangement is that
ions formed in the Penning discharge unit cannot strike directly the walls
on which the titanium metal is deposited. Even so, there is a markeddifference in the pumping characteristics, depending upon whether the
Penning discharge is in operation . Particularly in the pumping of argonand helium the pumping speed is greatly enhanced. To determine the
pumping effectiveness of the combined unit, the procedure followed wasfirst to pump out the entire system with a diffusion pump and outgasthe pump and structure by heating the tungsten filaments below the
evaporating temperature. The valve to the diffusion pump was thenclosed and the filaments were raised arbitrarily to a temperature at
which titanium was evaporated onto the walls of the chamber and thenthe filament current was turned off. The valve between the reservoir
and the getter-ion pump was then closed and gas admitted to the reser-
voir to a predetermined pressure. The gas sample was shared with the
Tungsten filaments
overwound with titonium
Fig. 9-31. Getter-ion pump of Gale*^
together with test reservoir for
admitting various gases under con-
trolled conditions. [Taken with per-
mission from A. J. Gale, in 1956Vacuum Symposium Transactions
(Pergamon Press, London, 1957).]
392 VACUUM SCIEKCE AND ENGINEERING
pump chamber by opening the interconnecting valve, and finally
the pressure in the reservoir was observed as a function of time. Since
the volume of the reservoir, which was about 700 cm', was about equal
to that of the pumping unit including the Penning discharge chamber,
the operation of opening the valve to the reservoir and sharing the gas
sample between the two volumes accounted for an immediate drop in
pressure to one-half that initially
in the reservoir. Thereafter, the
fall in pressure with time provided
a measurement of the pumping
speed. In the test runs reported,
the initial pressure in the reservoir
was 7 X 10^2 torr or 3.5 x lO-^
torr after sharing with the getter-
ion pump. The results of nine
runs in sequence are shown graphi-
cally in Fig. 9-32. Three regions
of performance can be distinguish-
ed: (1) the pressure range from
3.5 X 10-2 cio^n to about 3 x 10-*
torr in which the slope of the pump-down curves, and therefore the
pumping speed, is generally less
than that for the next lower pres-
sure range, and furthermore de-
creases from run to run as the
getter surface appears to become
saturated; (2) the pressure range
from 3 X 10-* to about 5 x 10-«
torr, over which the pumping
S 10"
Absorption choVocteristic of
getter-ion pump for dry oir
5 10 15 20 25 30 35 40 45 50 55 60
Elapsed time.min
Fig. 9-32. Pressure-vs.-time curves
from which the performance of the
getter-ion pump shown in Fig. 9-31
was determined for dry air. [Takenwith permission from A. J. Gale, in
1956 VacuumSymposium Transactions
(Pergamon Press, London, 1957).]
speed is the same from run to run
for a large number of cycles, indicating that the pumping speed in
this pressure range is relativelj' insensitive to the amount of gas already
absorbed by the getter surface; (3) the pressure range from about
5 X 10-* to 6 or 7 X 10-' torr, over which the pumping speed decreases
toward zero at an ultimate pressure at which the absorption and
desorption rates of the getter surface appear to reach equilibrium.
The pumping speed in the pressure region (2), in which it is constant
and insensitive to the gas absorbed by the getter surface, is shown in
Table 9-3 for several gases. According to Gale*^ the pumping speed
for hydrogen is much greater than that for other gases, with the result
that the slopes of the curves were too steep to permit a measurementof its value. The most interesting feature of the performance of the
ULTRAHIGH VACUUM 393
Table 9-3. Pumping Speed op the Getter-ion System of Fig. 9-31 fobVarious Gases*
^'^ Pum,ping speed, cmfijsec
Air 16Oxygen 28Nitrogen igCarbon dioxide 24Helium 9
* Reproduced by permission from A. J. Gale, in 1956 Vacuum SymposiumTransactions (Pergamon Press, London, 1957), p. 12.
pumping unit is the anomalously high pumping speed for helium andargon.
When an evaporated metal coating has reached saturation and losesits pumping efficiency, the surface can be restored to its original
t3
^Fig. 9-33. Schematic drawing of theVac Ion pump. [Taken with per-mission from L. D. Hall, in 1958Vacuum Symposium Transactions(Pergamon Press, London, 1959).]
00 60s molecule
o6as atom
>Gos ion
• Titoniumatom
• Electron
Anode
Cathode
Fig. 9-34. Assumed pumping mech-anism of the Vac Ion getter-ion pump.[Taken with permission from L. D. Hall,
in 1958 Vacuum, Symposium Transac-tions (Pergamon Press, London, 1959).]
performance by heating the filaments for a few minutes and depositinga new coating of evaporated titanium. This process can be repeateduntil the titanium wound on the tungsten filaments has been essentiallycompletely consumed by evaporation.A major advance in the development of getter-ion pumping was
initiated by Hall« in the development of the Vac Ion pump, which is
illustrated in Fig. 9-33. The device consists of a rectangular box withinwhich is mounted an electrically insulated "egg crate" electrode made
394 VACUUM SCIENCE AND ENGINEERING
of thin metal plates (usually titanium) arranged to produce an array
of cells with square cross section. On each of the inner flat surfaces of
the boxlike stainless steel casing a plate of titanium or other active
metal is secured with a small clearance between the surface of the two
fiat electrodes and the insulated cell structure. The rather flat
assembly is put between the poles of a magnet so that the field lines
pass through the square cells of the insulated electrode and are per-
pendicular to the surfaces of the two titanium plates on either side.
When a positive electric potential is applied to the insulated electrode,
each cell of the device acts like a separate PIG or Penning discharge.
Because of the large cathode area involved the pressure at which the
discharge will start and continue to pass current is very low when a
potential difference of the order of 5,000 V is applied to the central
electrode.
The mechanism of pumping by the Vac Ion pump as visualized by
Hall" is illustrated in Fig. 9-34. As in any PIG discharge any electrons
which are present oscillate in the electric field between the cathodes and
are restricted from moving to the side and striking an anode plate by
the magnetic field. The electrons are thus very efficiently used for
producing ionization, i.e., not only is a positive ion produced and drawn
by the electric field into the surface of the cathode but in addition in
each ionizing event another electron is produced which carries on the
process of producing more ions. The ions are propelled into the cathode
plate with energies of several kiloelectron volts and sputter cathode
material (such as titanium), some of which settles on the surfaces of the
anode plate structure. The freshly deposited active metal has strong
chemical affinity for most gases with the result that gas atoms are
accumulated and held by chemisorption on the anode plates. The
cathode plates are slowly eroded by the sputtering process. Figure
9-35 is a photograph of a cathode plate after long service showing
the deep holes eroded opposite each cell of the anode.
Hall" reports that hydrocarbon contamination of the Vac Ion type
ofpump can easily prevent the pump from starting to operate. Several
hours of exposure to the pumping action of a mechanical vacuum pump
will make the Vac Ion pump difficult to start. Baking the Vac Ion
pump to 400°C for 2 hr in air may restore the pump to normal operation.
However, repeated contamination by hydrocarbons eventually results
in the pump no longer responding to air baking and the cathodes must
be replaced to put the pump back into operation.
The gas which is absorbed on the anode surfaces is partly very
tenaciously held and is partly rather weakly bound. A pump will
therefore both pump and release gas during operation, and the question
is what limit of base pressure can one hope to realize when the balance
ULTRAHIGH VACUUM395
of these two processes is reached. In a test of this point a small VacIon pump was heated to 400°C while it was in its magnet with thevoltgage applied to the anode. The pump continued to operate at thistemperature and reduced the pressure at this temperature to about2 X 10-* torr at the end of a 3-hr bakeout. After the system wasallowed to cool down to room temperature, the pressure reading was5 X 10-10 torr.
^ diQ^: I >
2i ' i '3'
Fig. 9-35. Cathode plate of Vac Ion pump after long service showing patternof erosion due to sputtering. [Taken with permission from L. D. Hall, in 1958Vacuum Symposium Transactions (Pergamon Press, London, 1959), and throughthe courtesy of Varian Associates, Palo Alto, Calif.]
The earliest pumps of the Vac Ion type were quite small and typically
had pumping speeds for air of the order of 5 liters/sec. Zaphiropoulosand Lloyd*^ have discussed some of the design considerations whicharise in scaling up the Vac Ion tjrpe of pump to much larger sizes.
Figure 9-36 shows schematically a quadrupole and an octupole con-
figuration for very large pumps of this type. Figure 9-37 is a photo-graph of a 5,000-liters/sec Vac Ion pump, showing one example of asatisfactory scaling up of the Vac Ion concept. For the 5,000-liters/sec
396 VACUUM SCIENCE AND ENGINBEBING
Cathode -anode
sections
Inner bore
W=W
L' = 2L
pump the applied voltage is 6 kV and the current is 65 mA at a pressure
of 10-« torr, which is about 400 watts. Since the current is pro-
portional to the pressure for this type of pump, the power would
become excessive at a pressure of IQ-^ torr. To alleviate this problem
the power supply is current-limited beyond a specified value and the
potential drops to about 500 V. In some applications of large pumps,
the sections are brought into opera-
tion one at a time in order to avoid
excessive power drain, and all units
are turned on only when the pres-
sure has decreased to 10"^ torr or
less.
A problem in the operation of
the Vac Ion type of pump is an
instability in the pumping of
argon. Surprisingly, helium, for
which normal sorption by any
material is insignificant, is pumpedquite well, apparently by being
rather deeply buried in the cath-
ode material. With argon the
situation is quite different, and
the problem is discussed in some
detail by Jepsen et al.*« A typical
pattern of the pressure versus time
for a getter-ion pump exhibiting
argon instability is shown in Fig.
9-38. The periodic jumps in pres-
sure by a factor of 10 or more are characteristic of this difficulty. One
solution to this problem which was proposed by Brubaker*' is to incor-
porate a third electrode in the form of a grid between the anode and the
outer plate electrode, such that the new grid becomes the true cathode
and the side plates become auxihary electrodes as illustrated in Fig. 9-39.
This arrangement is referred to as the triode getter-ion pump. By a suit-
able choice of design and operating parameters for the triode pump
Brubaker was able to show a generally improved pumping speed for the
noble gases and completely stable pumping of argon and air. However,
there are several disadvantages to the triode design, the principal one of
which seems to be the very much shortened life of the cathodes.
In order to avoid the complexities and loss of cathode lifetime
resulting from the triode getter-ion pump design, Jepsen et al.*
investigated the effect of slotting the cathodes of the diode type of
pump in the manner shown in Fig. 9-40. The result of the slotted
Fig. 9-36. Illustration of configuration
for large Vac Ion pump designs
(magnets not shown). [Taken with
permission from R. Zaphiropoulos and
W. A. Lloyd, in 1959 Vacuum Sympo-
sium Transactions (Pergamon Press,
London, I960).]
ULTEAHIGH VACUUM397
Fig. 9-37. Photograph of 5,000 liters/sec Vac Ion pump. [Taken with permissionfrom R. Zaphiropoulos and W. A. Lloyd, in 1959 Vacuum Symposium Trans-actions (Pergamon Press, London, I960).]
cathodes appears to be to provide an optimum solution. (1) Pumpingfor air is completely stable, and the pumping speed slightly higher than
with the plane cathodes. (2) The pumping speed for argon is about
10 per cent of that for air and is stable for all values of the pressure
below 10-^ torr. (3) The cathode life does not seem to have been
XlO"''
MO"'
xlO"^
xlO"''
Time
Fig. 9-38. Typical pattern of pressure vs. time for a getter-ion pump exhibiting
the argon instability. [Taken with permission from R. L. Jepsen, A. B. Francis,
S. L. Rutherford, and B. E. Kietzmann, in 1960 Vacuum Symposium Transactions .
(Pergamon Press, London, 1961).]
398 VACUUM SCIENCE AND ENGINEERING
impaired by the slotting nor do the benefits of the slotting disappear
with aging of the cathode.
Aside from the problem of rather extreme sensitivity to hydrocarbon
contamination of the cathodes, the getter-ion pump of the Vac Ion type
has undergone steady improvement and certainly must be regarded as
one of the most effective available means for ultrahigh-vacuum pump-ing. The question of hydrocarbon contamination can be completely
V=V|
Auxiliary
electrode"-*^^^^^^^^^^'-^^^^^^^^^^^^^^v^^^'^
Cathode
^=°~-Hl D D D D D ID D r^—-j^Clouds of tropped
v=o-
V=V,
Positive
Slotted
cathode
Sputtered
atoms of A^xx^xxs!
of cathodematerial
Fig. 9-39. Cross section of the triode
getter-ion pump showing the opencathode structure and the side plate
as an auxihary electrode. [Taken with
permission from R. L. Jepsen, A. B.
Francis, S. L. Rutherford, and B. E.
Kietzmann, in 1960 Vacuum Sympo-sium Transactions (Pergamon Press,
London, 1961).]
Fig. 9-40. Cross section of slotted
cathode configuration of the diode
getter-ion pump. [Taken with per-
mission from R. L. Jepsen, A. B.
Francis, S. L. Rutherford, and B. E.
Kietzmann, in 1960 Vacuum Sym,po-
sium, Transactions (Pergamon Press,
London, 1961).]
avoided in systems in which the roughing-down operation is carried
out by a mechanical pump with an artificial zeolite trap in the pumpingline or by the use of absorption pumping starting from atmospheric
pressure.
9-7. Absorption Pumping. Artificial zeolite* as a vapor-trap
material has already been discussed at length in Sec. 8-6. The recent
practice of utilizing one or more zeolite absorption pumps for roughing
out vacuum systems of large volume in order to avoid the possibility
of hydrocarbon contamination from the sealing oil of a mechanical
roughing pump is of considerable practical interest.
* 13X Zeolite is an alkali methal aluminosilicate of unusually porous structure
manufactured by the Linde Division of the Union Carbide Cornpany.
ULTRAHIGH VACUUM 399
4 5 6
L(760mmHg)
lOOg zeolite
(b)
Fig. 9-41. (a) Pumping speed of a molecular sieve pump at 0.1 torr as a functionof amount of gas already pumped. (6) Final base pressure as a function of theamount of gas pumped. [Taken with permission from P. F. Varadi and K. Ettre,in 1960 Vacuum Symposium Transactions (Pergamon Press, London, 1961).]
Varadi and Ettre''* have carried out a series of tests on a 13X Zeolite
type of "molecular sieve" absorption pump to determine (1) the pump-ing speed of the absorption pump for various gases as a function of the
amount already absorbed, and (2) the final pressure attainable as afunction of the amount of each gas absorbed. The pumping-speedmeasurements were all made at a pressure of 0.1 torr. The results of
these two types of tests are shown graphically in Fig. 9-41. Theabsorption pump contained 100 g of 13X Zeolite which was cooled byliquid nitrogen.
400 VACUUM SCIENCE AND ENGINEERING
The rather large variation of pumping speeds for different species of
gas is very striking. As will be noted by the very small line near the
origin of the figure, the ability of 13X Zeolite to absorb hydrogen is
almost nil. Another interesting feature of the tests is the apparent
fatigue effect due to repeated absorption and expulsion of air. It will
be noted that there are two curves for air in the figure: (1) for the first
run on a new sample of zeolite and (2) for zeolite which had been
recycled several times through the absorption and degassing routine.
800 liters/sec
Main chamber \Bellows valve
Auxiliary
ion-getter
pump.
Liquid helium
trap
Liquid
helium trap
Omegatron
8 liters/sec
Bellows
Pironi
gouge
Work spoce
Support
lonizotion
gouge5W
Main
ion -getter
pump
25
I iters /sec
Front View
Sorption
pump
Fig. 9-42. Schematic diagram of ultrahigh-vaouum system incorporating sorp-
tion, ion-getter, and liquid helium cryogenic pumping. [Taken with permission
from R. H. Honig, in 1961 Vacuum Symposium Transactions (Pergamon Press,
London, 1962).]
From these quantitative figures it should be possible to design zeolite
traps with fair assurance as to the capacity and pumping speed based
upon the amount of zeolite contained.
The use of a sorption pump under conditions in which avoidance of
hydrocarbon contaminants is necessary is represented in the system
shown in Fig. 9-42, which illustrates the arrangement developed byHonig.*' The system is one of fairly small volume and is roughed
out to 10~^ torr by a sorption pump cooled to liquid-nitrogen tempera-
ture. The system is then further pumped by the getter-ion pumpand finally liquid nitrogen is introduced to cool thoroughly the sur-
roundings of the liquid-helium thimble trap before introducing the
liquid helium. When the pumpdown cycle was preceded by a bakeout
at 350°C for 15 hr, the base pressure realized in this system was judged
to be less than IQ-i" torr on the most favorable run. Typical pressure
readings were between 10""' and 10"!" torr. This system represents
most of the more advanced techniques of fully bakable systems with
freedom from hydrocarbon contamination and the introduction of
I
ULTRAHIGH VACUUM 401
liquid-helium cryogenic pumping to obtain the lowest possible basepressure.
9-8. Evaporative Deposition of Reactive Metals. Getter-ion
pumps utilize the evaporation or sputtering of active metals, usually
titanium, together with ionization of the gas by electron collisions
to enhance the gettering effectiveness of the newly deposited reactive
metal. This combination provides very satisfactory vacuum pumpingand freedom from hydrocarbon contaminants. However, for manyapplications the evaporative deposition of an active metal without
ionization of the residual gas has also been found to be useful andeffective. For many years barium particularly has been used as getter
material in the manufacture of electronic tubes. In the mass pro-
duction of receiving tubes, vacuum pumping is normally accomplished
by mechanical pumps arranged in groups on a rotating and indexing
machine having a large number of ports to which the tubes being
evacuated are connected. As the machine rotates, each tube is
connected in turn to a rough pumping section followed by stages
operating at lower pressures. Simultaneously the tube is subjected to
induction heating of the internal metallic parts and oven heating of the
glass envelope to ensure thorough outgassing. The tubulation is then
sealed off and a getter capsule is flashed dispensing barium metal as a
getter material to clean up by chemisorption the residual gas remaining
in the tube after the rather rough vacuum pumping provided in the
process. The use of a getter for completing the evacuation process
reduces by a large factor the cost of initial evacuation of electronic
tubes and in addition provides a means of continued chemisorption of
any gases which might be produced during the operation of the tube
in service.
In recent years there has been an intensive investigation of the
effectiveness of evaporated coatings of reactive metals, particularly
titanium and molybdenum, deposited on surfaces within a vacuum
chamber in pumping out residual gas by chemisorption. This tech-
nique has proved to be effective in two specific situations: (1) as a
separate pumping unit acting as a getter pump which can be attached
to a vacuum chamber, the evaporated metal being confined in this case
to the inner walls of the getter pump itself, and (2) within the vacuum
chamber itself, in which case the evaporated metal is deposited directly
on the walls of the vacuum chamber. In case ( 1 ) the getter pump must
be connected to the vacuum chamber and is therefore limited in pump-
ing speed by the conductance of the connecting tube or manifold.
In case (2) the walls of the vacuum chamber itself become absorbing
with the result that a much larger effective pumping speed can be
achieved.
402 VACUUM SCIENCE AND ENGINEERING ULTRAHIGH VACUUM 403
Negatively biased
cylindrical grid
5'
5-10 kv/^"0.030-1
0.1 amp
High
vacuum
0.030 tungsten wire
electron emitter
Nickel supports
-Molten ball
'^ Capillary tube
surrounded by
water
2
Feeder rolls
through liquid
metol vacuumseals
In contrast with the performance of a getter-ion pump (see Sec. 9-6)
which is capable of pumping the noble gases to some degree, a getter
device without ionization has no such capability. Only those gaseswhich interact chemically with the evaporated metal are effectively
pumped. Getter pumps are therefore usually supplemented by the
pumping action of a well-baffled
diffusion pump. Since the noble
gases make up a small fraction
(about 1 per cent) of atmospheric
air at sea level, active metal pump-ing of high pumping speed for re-
active gases supplemented by a
trapped diffusion pump of rela-
tively small pumping speed is aneffective combination for manyapplications. Such a getter pumpmay, for example, consist of achamber with one or more units
for evaporating a reactive metal
on the interior surfaces connected
to a well-baffled diffusion pumpbacked by a mechanical vacuumpump.
Several methods of evaporating
metals such as titanium, zirconium,
and molybdenum, all of which
have been used as getter materials,
have been developed. Milleron^"
has described a method of evap-
oration from the end of a wire, the
tip of which was heated by elec-
tron bombardment in the device
illustrated in Fig. 9-43. The wire
is stored on a reel in an auxiliary vacuum chamber, where it is outgassed
by being heated to as high a temperature as the material will stand by anelectric current. The wire is then fed by a system of rolls through a
water-cooled copper capillary tube into the evaporation chamber.
The small conductance around the wire through the capillary tube
prevents any appreciable flow of gas desorbed by the wire from entering
the evaporation chamber. The end of the wire protruding from the
capillary tube is bombarded and heated by electrons from a circular
filament at 5 to 10 kV negative potential relative to the wire. Theend of the wire is heated beyond the melting point, resulting in the
Wire degassed
byl^R heating
. Etficient
_liquid-nitrogen-
,trapped 4 in.
oil diffusion
pump
Insulated
Fig. 9-43. Device for evaporatingactive metals by electron bombard-ment. [Taken with permission fromN. Milleron, in 1957 VacuumSymposiumTransactions (Pergamon Press, London,1958).]
formation of a molten drop of metal, which is supported on the tip of thewire by surface tension forces. For metals such as titanium and molyb-denum there is no serious problem in controlling the electron bombard-ment heating so that the molten ball at the end of the wire is stable
and the rate of evaporation steady. Typical evaporating rates are
given as 0.05 g/min, which could be maintained for several hours byfeeding the wire at the proper rate from the reel in through the capillary
channel.
Using the above method of evaporating molybdenum, Milleron andPopp^i have measured the pumping of hydrogen gas admitted to the
chamber in pulses. The conditions of the test were as follows
:
Volume of chamber—70 liters
Projected area of coated wall—7,500 cm^
Microscopic area as measured by low-temperature adsorption of argon
on molybdenum surface—more than 20 times the projected area
Base pressure—less than 10~i° torr
Quantity of hydrogen per pulse—10~^ torr liter
Time duration of gas pulse—less than 1 sec
Maximum pressure rise per gas pulse with newly coated walls— 1 x 10~'
torr
Equivalent pumping speed—greater than 10* liters/sec
Quantity of hydrogen to saturate coating and raise pressure to 10~^
torr—approximately 1 torr liter
Molybdenum, zirconium, and titanium are all effective in the above
type of gettering device, but molybdenum is found to be more effective
in pumping hydrogen (the gas of major concern in the Milleron and
Popp development) in the pressure range below 10"^ torr, whereas
titanium was found to be capable of absorbing more hydrogen gas.
The reason for this difference would appear to be that molybdenummay be heated to a higher temperature without the danger of melting
than titanium or zirconium, resulting in a more thorough outgassing
of the metal before it is evaporated into the pump chamber, whereas
the latter two metals have a greater total capacity for reacting with
hydrogen.
Other methods of evaporating the most commonly used reactive
metals, titanium and molybdenum, than that described above are
mentioned in Sec. 9-6, particularly as an adjunct to the Evapor-ion
pump. The simplest and most convenient method thus far developed
is similar to that described by Gale,*^ in which a wire of the metal to be
evaporated is wound on a somewhat larger-diameter tungsten wire,
which acts as a heater element. In one of the large thermonuclear
research machines at the University of California Lawrence Radiation
404 VACUUM SCIENCE AND ENGINEERING
Laboratory (Livermore) known as ALICE, both titanium and molyb-
denum units are used in a beam tube in which the pressure must be
reduced from about 10~^ torr of hydrogen and water vapor at one end
to an operating pressure of about 10~' torr over a distance of about ten
feet. Titanium evaporation combined with well-baffled diffusion pumpsis used in pumping units as shown schematically in Fig. 9-44 in portions
of the system in which the pressure
is comparatively high and the mainrequirement is that of relatively
high throughput. In the mainvacuum chamber where the pres-
sure must be maintained at 10~' or
less with the beam on, molybdenumis evaporated directly on a liquid-
nitrogen-cooled stainless steel liner
which covers a large fraction of the
chamber wall. The evaporator
units in each case consist of a 0.060-
diameter tungsten filament
Flap valve
Metollic
evaporotor
Liquid-nitrogen
cooled liner
" " n nn
Liquid -nitrogen-
cooled trap
Diffusion pump in
Fig. 9-44. Pumping unit consisting of
a titanium evaporator unit backed byan oil diffusion pump with a liquid-
nitrogen-cooled baffle. [This drawing
was kindly provided by Mr. William
S. Neef, Jr., Lawrence Radiation
Laboratory, Livermore, California.]
wound with a 0.020-in.-diameter
titanium or molybdenum wire.
The heating current for the tita-
nium evaporators is about 125 A,
whereas that for the molybdenumis about 190 A, consistent with the
high-temperature characteristics of
the molybdenum. Herb et al.*^ quote the data given in Table 9-4 from
the RCA Review ofJune 1957, from which it is evident that vapor pres-
sures for titanium of the order of 10~' torr are attainable for sublima-
tion, i.e., before the melting point is reached. Herb et al. estimate that
at a temperature of 1715°K sublimation from a titanium surface of 10
cm^ should produce a pumping speed for active diatomic gases of about
1,000 liters/sec when the pressure is 10~^ torr, or should absorb a
throughput of 10"^ torr liter/sec at whatever equilibrium pressure
results. This capacity or pumping speed is increased by a factor of 10
if the temperature of the titanium is raised to 1850°K. Whetherperformance of this order is realized in practice will depend greatly
upon the extent to which the titanium metal is outgassed before
evaporation. The process of evaporative deposition of active metals
for getter pumping includes a preliminary baking of the system and
thorough outgassing of the getter metal at a temperature which is high
enough not to evaporate any significant portion of the metal but high
enough to drive out absorbed gases. In some cases the baking and
ULTRAHIGH VACUUM 405
outgassing may require many hours before the system can be cooled
down and the evaporative deposition process started under conditions
which will ensure effective pumping at pressures less than 10"* torr.
The practice of coating a liquid-nitrogen-cooled inner liner of the
vacuum chamber has become accepted for certain classes of controlled-
fusion research devices. One of the most famous such installation
is the Ogra machine of the Kurchatov Institute for Atomic Energy in
Moscow. The central chamber of the machine is 1.6 m in diameter
and 19 m in length, so that the volume is about 38,500 liters. The
Table 9-4. The Vapob Pressure of Titanium at Various Temperatures*
Temperature, °K Ti vapor pressure,'\ torr
1330 1 X 10-8
1415 1 X 10-'
1500 1 X 10-6
1600 1 X 10-^5
1715 1 X 10-«
1850 1 X 10-3
1945 (melting point) 4 x IQ-^
2000 1 X 10-2
* Quoted with permission from the RCA Review, June, 1957.
t These values of vapor pressure are considerably lower than those quoted in
the Smithsonian Physical Tables (Smithsonian Institution, 1954) from the results
of Brewer, The Thermodynamic and Physical Properties of the Elements, Report
for the Manhattan Project, 1946. This suggests that many of the older data on
vapor pressures of metals are suspect.
steel vacuum chamber has been equipped with a thin-walled stainless
steel liner on which titanium is evaporated periodically from several
evaporating units placed along the length of the chamber. An electron
beam of current up to 1 A at 3 keV bombards the end of a 2-cm-
diameter titanium rod on each evaporator, resulting in a maximumevaporation rate of about 50 g/hr of titanium. According to Simonov,
Kleimenov, Mileshkin, and Kochnev^^ the combination of the active
metal coating on the cooled liner backed by an array of well-baffled
mercury diffusion pumps provides a pumping speed for hydrogen of
2 X 10" liters/sec, a base pressure of 1 x lO-i" torr, and an operating
pressure during injection of a powerful molecular ion beam of about
5 X 10-" torr. Effective pumping speeds of millions of liters per
second could not possibly be achieved unless the walls of the chamber
themselves are highly absorbing. Only limited portions of the chamber
walls, primarily the ends, are available for openings into pumping
manifolds, so that no matter how high the pumping speed of the pumps
connected to these manifolds the net pumping speed limited by the
conductance of the openings alone would not exceed 100,000 liters/sec. (
406 VACUUM SCIENCE AND ENGINEERING
If in addition one allows for the conductance of the chamber itself
toward both ends from the middle, the net conductance from the medianplane (where most of the gas originates in this machine) to both ends,
assuming that both ends of the tank are completely open, is only about
50,000 liters/sec. From this it is clear than the only possibility of
achieving pumping speeds of several
million liters per second in such a
machine is to make the walls as
completely absorbing as possible.
Simonov et al.^^ investigated the
sorption of hydrogen gas by renew-
able surfaces of chemically active
metals as a function of the tem-
perature of the surface using the
apparatus shown schematically in
Fig. 9-45. The metal to be investi-
gated was evaporated either con-
tinuously or periodically andcondensed upon a substrate, the
temperature of which could be con-
trolled and measured over the range
-195 to +100°C. Two time-of-
flight mass spectrometers were
used, one for determining the com-
position of the gas desorbed by the
specimen under test and the other
for determining the composition of
the gas generally throughout the
chamber.
The authors state that one of the
most important characteristics of
the sorption of hydrogen by a reac-
tive metal is that the sorbed hydro-
gen molecules are dissociated into atoms which migrate over the surface
of the metal and readily react with other sorbed atoms producing vola-
tile compounds which may be desorbed. This process at least partly
defeats the purpose of the original sorption process, resulting in a
portion of the sorbed hydrogen and other gases being reemitted from
the surface in a form which is no longer effectively sorbed by the surface
but must be pumped out through the diffusion pumps or otherwise
disposed of. Gases whose presence greatly affects the rate of per-
manent sorption of hydrogen are oxygen and nitrogen. For a typical
freshly deposited surface of titanium exposed only to pure hydrogen
Fig. 9-45. Apparatus for the inves-
tigation of the sorption of gases at
low pressures on renewable surfaces
of reactive metals and surfaces of
structural materials. (1) Vacuumchamber; (2) surface for condensa-
tion of metal; (3) evaporator of
metal under study; (4) sample of
structural material under investiga-
tion; (5) mass spectrometer for
analysis of the gas desorbed from the
surface of the specimen; (6) massspectrometer for analysis of the gas
in the chamber; (7) mercury vapor
pump with liquid-nitrogen-cooled
baffles; (8) getter-ion pump.
ULTRAHIGH VACUUM 407
(a)
Dz
/
fH2
/<
i- HD
-200 -100
TemperQture,°C
100
the probability of absorption per surface encounter is stated to beabout 0.1 ; that is, about 10 collisions with the coated wall are necessary
on the average for a hydrogen mole-
cule to stick under the conditions
of the experiments. As gases are
sorbed by the surface, the probability
of absorption of hydrogen decreases
markedly. The process of dissoci-
ative chemisorption of pure hydro-
gen on a pure metal surface is said
by the authors to be independent of
the temperature over a wide range.
The unfavorable aspects of chemi-
sorption of hydrogen are due to the
development of catalytic reactions
resulting in the formation of products
which are weakly bound to the metal
and are thus desorbed.
The authors have shown, how-
ever, that when the absorbing sur-
face is cooled to a sufficiently low
temperature, the mechanism of
chemisorption of hydrogen changes
drastically, leading to a pronounced
increase in the specific rate of sorp-
tion, a suppression of the catalytic
reactions which lead to the forma-
tion of volatile products, and a re-
duction in the rate of desorption of
gas from the surface. In Fig. 9-46
are shown experimental curves of the
partial pressure of hydrogen (Hg),
deuterium (D^), deuterium-hydrogen
(HD), methane and deuterio-meth-
ane [IiC(H, 0)4] resulting from the
admission of a constant flow of a
mixture of hydrogen and deuterium
into the vacuum chamber in which
the active metal surface was con-
tinuously renewed by evaporation
onto a substrate, the temperature of which was varied,
and nickel were studied in this manner.
-100 +100
Temperature, °C
Fig. 9-46. Dependence of the rate of
sorption of hydrogen, the rate of
deuterium exchange, and the rate
of methane production on the
temperature of the active metal
surface continually renewed by
evaporation as indicated by the
ambient pressures of these gases in
the chamber. The evaporated
metals are {a) nickel and (6)
titanium. The rates of admission
of hydrogen-deuterium mixture
wore (a) 0.0,5 /d/sec and (6) 0.06 filj
sec. The conductance of the input
pipe was 4,000 liters/sec.
Titanium
It is evident from the curves
that the sticking coefficient remained unchanged from 100 to — 170°C
408 VACUUM SCIENCE AND ENGINEERING
for nickel (a) and from 100 to — 130°C for titanium (b) and the catalytic
reactions of hydrogen-deuterium exchange and the formation of
methane do not decrease significantly with the temperature over these
temperature ranges. Further cooling below — 170°C for nickel and— 130°C for titanium results in a marked increase in the sticking
coefficient for hydrogen and a very marked decrease in the rate of
catalytic reactions. Thus the major problem in the use of evaporated
metal coatings for gettering hydrogen which arises from the catalytic
processes which occur at a high rate at high temperatures appears to be
completely solved by cooling the surface below a critical temperature,
depending upon the metal being evaporated, such as — 170°C for nickel
and — 130°C for titanium.
The sorption of oxygen, nitrogen, water vapor, carbon monoxide,
and carbon dioxide by evaporated metal surfaces at low temperatures
was also investigated by Simonov et al.^^ somewhat less quantitatively.
However, they report that all these gases are sorbed with considerable
effectiveness. Argon is also sorbed but with rather poor sticking
probability on titanium at temperatures from —170 to — 195°C.
Lower temperatures were not investigated. For practical applications
Simonov et al. recommend titanium as the best metal for evaporative
coating of surfaces as a gettering agent because of its relatively wide
temperature range for nondissociative sorption, ease of evaporation,
and availability in sufficiently pure form.
The findings of Simonov et al.*^ are generally consistent with those
of Milleron and Popp.^^ However, as a practical matter both titanium
and molybdenum are found to be useful in ultrahigh-vacuum pumpingin the ALICE machine, with molybdenum being the most effective
in the region of pressure below about 10"^* torr as was previously
mentioned.
Evaporative deposition of active metals on low-temperature surfaces
is particularly effective for providing very high pumping speeds for
short periods of time, e.g., for periods of a few minutes. For long
periods of continuous operation the accumulated deposit of evaporated
metal flakes off the cold surface. If a fairly large throughput is to be
pumped in this manner, the rate of evaporation of the active jnetal
must also be large so that the problem of supplying metal at the high
rate for a long period of continuous pumping is not easy to solve in a
convenient manner.
9-9. Cryogenic Pumping. The process of cryogenic pumpingconsists of exposing surfaces maintained at low temperature to the
gases in a vacuum chamber so that the gases condense on the cooled
surfaces as long as the partial pressures of the component gases are
above the equilibrium vapor pressure at the temperature of the
ULTRAHIGH VACUUM 409
condensing surfaces. Liquid nitrogen and refrigerated traps generally
may, for example, be regarded as cryogenic pumps for the hmitednumber of gases, such as water vapor, for which the resulting vaporpressure is sufficiently low for the purpose at hand. Cryogenic pump-ing utilizing condensing temperatures well below that of liquid nitrogen
is not a new concept. However, with the need for high pumping speeds
at low pressure both in controlled fusion research and more recently
in space research the development of large-scale cryopumping systems
has undergone a considerable acceleration. This acceleration has beengreatly aided by the spectacular growth of the cryogenics industry to
meet the needs of the missile program for huge quantities of liquid
oxygen, nitrogen, hydrogen, and helium.
As is well known, the vapor pressure of a solidified gas as a function
of the absolute temperature can conveniently be represented by an
equation of the formB
logio P = A (9-1)
Thus for any gas, a plot of the logarithm of the vapor pressure as a
function of the reciprocal of the absolute temperature ( 1/T) is a straight
line. Such a graph is shown in Fig. 9-47 for several of the commongases. From these curves it is evident that neon and especially hy-
drogen stand out as gases which may present special difficulties because
of their relatively high vapor pressures at low temperatures. Helium
is not even shown on the graph. Since the vapor pressure of helium
is equal to atmospheric pressure at a temperature of only 4.2°K,
cryogenic pumping of helium is not feasible at temperatures which are
at present of practical interest. For all other gases the vapor pressure
is well into the ultrahigh-vacuum range at a temperature of 20.4°K,
the highest vapor pressure of these then being about 5 x lO'^" torr
due to nitrogen. The vapor pressure of hydrogen is much higher so
that even at liquid-helium temperature (4.2°K) it is about 3 x 10"'
torr and rising very rapidly with the temperature. Neon, however,
can be satisfactorily cryopumped in the ultrahigh-vacuum range by
surfaces maintained at 6°K, at which temperature the vapor pressure
of neon is about 10~ii torr.
Temperatures which can be conveniently maintained and are
frequently used in cryogenic pumping are those corresponding to the
boiling points of common gases at normal atmospheric pressure. These
temperatures are for helium, 4.2°K; for hydrogen, 20.4°K; for neon,
27.3°K; and for nitrogen, 77.4°K. In practice Hquid helium and
liquid hydrogen are widely used for maintaining surfaces at the desired
condensing temperature, and liquid nitrogen is used extensively to
410 VACUUM SCIENCE AND ENGINEERING
provide an intermediate temperature for a protective shield betweenthe cryogenic pumping surface and the room-temperature walls of the
chamber to reduce the evaporation-loss rate of the liquid helium or
hydrogen by radiative heat transfer.
In the description above, emphasis has been placed upon cryo-
pumping in the ultrahigh-vacuum range. Bailey and Chuan^^ haveapplied cryopumping on a large scale to a low-density wind-tunnel
+3
+2
+ 1
-1
-2
t -3
O
5-5
-6
-7
-10
v
\ \ —\
s
s\>s
\\.
V\\
s
V\ H 2
N2
CO
\ \s.^ \ ^ ^e NS
'\\\^f s \s.
IkA
\ \N
1 \ \NKw \,
\S
CO\m \
V
\,N
1 \\,
°m\\\:^
0.02 0.04 Q06 008 O.IO 0.12 0.14 0.16 018 O20 0.22 Q24 l/Temperature
I, J 1,1 I II i_ I I 1^
100 50 3025 20 15 12 10 i-_L
Tennperature,°K
Fig. 9-47. The logarithm of the vapor pressure plotted as a function of thereciprocal of the absolute temperature of a number of the common gases.
installation to provide very high pumping speeds in the relatively high
pressure range from about 1 torr down to about lO"* torr. A limitation
in the cryopumping of atmospheric air arises from the mixture of
component gases present, as listed in Table 9-5. The components neon,
helium, and hydrogen add up to a total of 23.8 x 10-4 per cent of the
total atmosphere or a total pressure of about 1.84 x 10-^ torr. If a
chamber were to be evacuated simply by condensing all the air from
atmospheric pressure on surfaces at a temperature of 20°K these three
gases would not be condensed by the cooled surface, but would continue
to make collisions with the outer wall of the chamber at room tempera-
ture and maintain a pressure of the order of 2 x 10-^ torr in the
chamber. To operate a large condensing surface at lower temperature
to reduce this base pressure significantly under conditions of large
ulteahigh vacuum 411
Table 9-5. Nobmal Composition of Dry Air* near Ground Level
GasMolecular
weight
Per cent byvolume
Partial pressure,
torr
Nitrogen (Ng)
Oxveen fOoi
28.01
32.00
39.95
44.01
20.18
4.003
16.04
83.80
2.016
131.3
78.08
20.95
0.934
0.03
18 X 10-4
5.3 X 10-4
2 X 10-4
1.1 X 10-4
0.5 X 10-4
0.08 X 10-4
593
159Argon (Ar)
Carbon dioxide (COj) . .
7.2
0.24
1.4 X 10-2
Helium (He) 4.0 X 10-3
Methane (CH4)
Krypton (Kr)
Hydrogen (Hg)
Xenon (Xe)
1.5 X 10-3
8.4 X 10-4
3.8 X 10-4
6.1 X 10-B
cryopump
* See U.S. Standard Atmosphere, 1962 (National Aeronautics and Space
Administration, U.S. Air Force and U.S. Weather Bureau, Washington, D.C.,
December, 1962), table I. 2.7, p. 9.
gas throughput would be prohibitively expensive. Bailey and Chuan
therefore adopted a combination of a mechanical vacuum pump and a
cryopump, reducing the pressure to
about 1 torr by use of mechanical
roughing pumps and then applying
cryopumping at a total pressure
such that the remaining pressure
due to the uncondensed gases is
reduced to a value of about 2.4 x10-5 torr. Bailey and Chuanillustrate the pumpdown from at-
mospheric pressure of a 200-ft3
chamber for four different pumpingcombinations: (1) a 40-hp cryo-
pump alone, (2) a 4-hp mechanical
vacuum pump alone, (3) a 40-hp
mechanical vacuum pump alone,
and (4) the combination of the
40-hp mechanical vacuum pumproughing the chamber down to a
pressure of 1 torr and then a cryo-
pump of low horsepower condens-
ing the remaining gas for a rapid reduction of the pressure to a value
well below 10-* torr. The results of these four pumpdown methods
are illustrated in Fig. 9-48, the dotted line indicating the pressure
decrease when cryopumping is applied at a pressure of 1 torr in the
0.1 500 ipOO0.5 1.0 5.0 10 50 100
Pumping time,min
Fig. 9-48. Pumpdown of a 200-ft3
chamber by mechanical pumps andcryopump and by a combination
system (dotted line) applying cryo-
pumping after pumping down to
1 torr by mechanical pumps.[Taken with permission from B. M.Bailey and R. L. Chuan, in 19S8
Vacuum Sym,posium Transactions
(Pergamon Press, London, 1959).]
412 VACUUM SCIENCE AND ENGINEERING
combined system. In the combination system the heat load of con-
densing the gas is mostly eliminated so that a cryopump of "nominal"
horsepower is all that is required to obtain very rapid pumpdownfrom 1 torr on down.
For dynamic pumping of gas in a low-density wind tunnel, Bailey
and Chuan developed a gas-cycle helium refrigerator with power input
of 37.5 kW and space requirement of 105 ft^ of floor space. In Table
9-6 the performance of this cryopump is compared in terms of power
Table 9-6. Dynamic Pumping Speeds of Cryopump op 37.5 kW PowerInput and 300 Watts Capacity at 20°K with Floor-area Requirementsor 105 ft^ Compared with Power and Floor-area Requirements for
Conventional Pumping Equipment of Comparable Performance*
Pumpingspeed,
liters/sec
Floor area and power requirements for
conventional pumping equipment
Pressure,
torr
Diffusion
pumpsMechanical
pumpsTotals
Space,
ft2
Power,
kWSpace,
ft2
Power,
kWSpace,
ft2
Power,
kW
6.5 X 10-«
6 X 10-3
0.1
1.0
4.8 X lO^t
9.9 X 10«t6.5 X 103
8.4 X 10-2
360
360
300
300
286
352
308
44
145
180
156
22
646
712
308
44
445
480
156
22
* Taken with permission from B. M. Bailey and R. L. Chuan, in 1958 VacuumSymposium Transactions (Pergamon Press, London, 1959), p. 262.
f These pumping speeds based upon data obtained at one-third full capacity
(100-watt refrigeration) and multiplied by 3 to make a direct comparison with:
the other figures.
requirements and floor area needed with conventional pumping systems
consisting of diffusion and mechanical pumps or mechanical pumps
alone, depending upon the operating pressure. According to the
authors these results show that the cryopumping system provides »
clear advantage over the conventional system for all values of the
operating pressure less than about 1 torr. At higher pressures the
conventional system of mechanical vacuum pumps obviously is
preferable.
Cryopumping in the molecular-flow regime has been investigated
theoretically and experimentally by Moore. 5* The cryopumping
process is analyzed in some detail for a simple model consisting of an
infinite plane source of gas separated by a distance L from an infinite
ULTRAHIGH VACUUM 413
plane surface condenser as shown in Fig. 9-49.
are:
The assumptions made
Source •^ Condenser
1. The molecular mean free path is large as compared with the
distance L between the surfaces.
2. The condensing surface is maintained at temperature T^ and has
a deposit of condensed solid formed from gas from the source surface.
3. Of the mass flow rate w-^ of
molecules from the source surface
that strike the condensing surface,
the fraction / stick and the rest
are diffusely reflected.
4. The reflected molecules leaving
the condenser constitute a mass
flow of (1 — /)Wi and have a ve-
locity distribution corresponding to
the temperature T^ of the condens-
ing surface, i.e., the accommodation
coefficient is unity.
5. The solid deposit also emits
molecules by evaporation at the
temperature Tj ^t ^^e same rate
(IF^a) ^-s if it were in equilibrium
with a gas at temperature T^.
6. The mass flow from the source
(Wj) consists of molecules emitted
by the source (Tfj) and diffusely
reflected molecules {w^ which strike
the source surface, all leaving the source surface with a velocity dis-
tribution corresponding to the temperature T^.
7. The velocity distributions of all molecular streams are Maxwellian.
The gas flow between the source and condensing surfaces consists of
two oppositely directed streams : w-^ flowing from the source toward the
condensing surface with a velocity distribution corresponding to a
temperature of Tj, and w^ flowing from the condensing surface toward
the source with a velocity distribution corresponding to a temperature
of T^. On the basis of the infinite plane model adopted and the
assumptions listed above, Moore^* finds that the mass flows for these
two opposing streams are given by
Fig. 9-49. Model for analysis of
cryopumping between infinite parallel
planes. [Taken with permission from
R. W. Moore, Jr., in 7.967 Vacuum.
Symposium Transactions (Pergamon
Press, London, 1962).]
W, = w^ + w.
f(9-2)
414 VACUUM SCIENCE AND ENGINEERING ULTRAHIGH VACUUM 415
and w.W,{\ -/) + W,,
f(9-3)
The flow densities associated with each of these gas streams may be
obtained by reference to Eqs. (1-31) and (1-32) and are
o ©Cose A
Pp="ikT,VT^V [j
Case B
41-
Pp = fn,kT, M^.^T./I
Case C
Wi mnA ^
W2 mn2V2. (mkT\^= W, I—:—
I
\ 27
(9-4)
(9-5)
Pp-"2kVl£
Fig. 9-50. Pressure determined byopen-ended probes variously orien-
ted in a region between infinite
plane source and condensing sur-
faces. [Taken with permission
from R. W. Moore, Jr., in 1961
Vacuum Symposium Transactions
(Pergamon Press, London, 1962).]
where 7^1A = mass flux through a
unit area
m = molecular mass of the
gas component under
consideration
V = average molecular ve-
locity given by Eq.
(1-23)
The molecular densities of the two
streams can then be determined from
the preceding four equations.
_ / 277 V^ W,*' ~ [mkTj
Tf.
/
_ / 27r f W.il -/)
[mkTj f
(9-6)
(9-7) i
Whereas the total molecular density between the source and con-
denser surfaces is the average of the above two expressions, the dis-
tribution in general is not isotropic. Thus the "pressure" in the usual
sense of an isotropic pressure does not exist. If one were to measure
the pressure in the region between the two surfaces with a probe device,
the reading would depend upon the orientation of the opening to the
probe and upon the temperature of the probe, as illustrated in Fig.
9-50. Assuming that the pressure sensed by the probe oriented in
either of the three directions shown in the figure will be determined by
the molecular density in the probe space at which the influx of molecules
is just equal to the efflux and by the probe temperature, Moore arrived
at the probe pressures Pj, given in Fig. 9-50. These probe pressures
may be expressed in terms of the symbols W^ and W^^ by use of Eqs.
(9-6) and (9-7) as follows:
Case A :
Case B:
Case C:
^ /2nkTX\ m /
^ /2nkTX\ m j
/27TkT:'
W^i(2 -/) 2 If.
m
2Af
W,{1 -/) 4 W^
Af
(9-8)
(9-9)
(9-10)
where T^ is the temperature of the pressure probe.
One important conclusion is that the contribution to the probe
pressure indication, by the mass flow rate due to evaporation from the
condenser deposit W^^, is always the same and equal to
^277fcT.,V-^W^
Af
On the basis of assumption 5 of this derivation
A
^ l2jrkTX'
\ m /
)f this deri^
(9-11)
(9-12)
where P^a is the vapor pressure of the condensed gas at the temperature
T2 of the condenser.
Thus the contribution due to reevaporation from the condensing
surface to the probe pressure indication is always
~ ^"^ [tJ(9-13)
that is, the vapor pressure of the deposition on the condenser corrected
for the diff'erence in temperature between the pressure probe and the
condenser. This quantity is thus independent of the sticking co-
efficient /.
The contribution to the pressure probe indication by the molecular
flow into the system from the source W^ is, however, dependent upon
the value of the sticking coefficient /, as illustrated in Table 9-7, in
which the probe pressures are listed on the assumption that the con-
tribution due to reevaporation from the condensing surface P^^. =for extreme values of the sticking coefficient / < 1 and / = 1. Ob-
viously, since / < 1 results in no appreciable cryopumping by the
condensing surface, the pressure is independent of the orientation of
the probe, i.e., the pressure is isotropic. However, whenever there is
significant cyropumping, the pressure is nonisotropic, as shown in the
right-hand column of the table.
416 VACUUM SCIENCE AND ENGINEERING
Moore^* proceeds from the above analysis to offer two alternative
definitions for the pumping speed of a cryogenic system such as that
shown in Fig. 9-49. Because the pressure in the region between the
source and the condensing surfaces is not isotropic, it is not immediately
evident what value of pressure to use in an equation such a,s S = QjPfor the pumping speed. For some purposes a pumping speed per unit
of area Sg^jA based upon the molecular density %i sensed by the source
of gas is most significant, e.g., in the case of space simulation. A
Table 9-7. Probe Pressure Indications for Various Orientations of theProbe and Extreme Values of the Sticking Coefficient / when Re-evaporation trom the condensing surface is unimportant {wg2 =0)*
Case f< 1 / = 1
A
B
\ m j Af
(2nkTj^^ W^
\ m j Af
\ m J A
c
\ m J 2A
\ m J Af
* Reproduced by permission from R. W. Moore, Jr., in 1961 Vacuum Sym-posium Transactions (Pergamon Press, London, 1962), p. 426.
cavity in the source surface would receive the same molecular flux
as the pressure probe in Case C of Fig. 9-50 and the corresponding
pressure would be that for Case C with T^ substituted for T^. Thusfrom (9-10) and (9-13)
SI P,(T, = T,) =l 27TkT^Y\ m / Af m
so that since-^ SI
kT,
the pumping speed per unit area is given by
SSIA
Q,SI W, fAP. Amric
K
(9-14)
(9-15)
SI ^""'si ^ — / 4
As long as the vapor pressure P^a ^^ the condenser temperature T^ is
very small as compared with the pressure P^i sensed by the gas source
(P„2 ^ -Psi); then the pumping speed apparent to the gas source is
independent of the pressure and the temperature of the condenser and
has the value ,
/ Vl
1-/4
Psi\T2
ULTRAHIGH VACUUM 417
As Pgi approaches the value P^^iTiJT^f'^, the value of the pumpingspeed apparent to the source approaches zero. From this analysis
it is clear that in order to ensure maximum pumping speed at the source,
the temperature of the condensing surface Tg must be low enoughsuch that Pj,2 < Ps\\ then the pumping speed sensed per unit area
of the source is
8 SI f1-/4
which is such that when / < 1
and when / = 1
A ~'-' 4
S.SI00
(9-17)
(9-18)
(9-19)
because in this latter case the gas flux returning to the source is essenti-
ally zero, as one would like to achieve in simulating the space environ-
ment.
An alternative definition of pumping speed 8^, for the cryopumping
system which is also useful is based upon the mass flow input W^ and
the pressure sensed by a probe in the position corresponding to Case
B of Fig. 9-50. This definition corresponds more directly to that
normally used for diff"usion pumps. In this case the pumping speed
per unit of area is
A Amrij, AmPj,(9-20)
From Eqs. (9-9) and (9-12) this expression becomes
8^ 2/
/ 1
P ITm /kj\f\277m/
(9-21)
in
(9-22)
As before, maximum pumping speed is realized when P^j
which case
8,^ 2/ /kT,f_ 2/ v^
A 2-f\27rm} 2-/4and the pumping speed is independent of the pressure as long as the
pressure due to reevaporation from the condenser is sufficiently small.
The significant temperature is that of the pressure probe, which in
conventional pumping systems does not normally present a problem
since the temperatures of all components of the system (with minor
exceptions) are ambient. However, in a cryogenic system high-
temperature gradients exist and the pressure probe temperature may
418 VACUUM SCIENCE AND ENGINEERING
not be the ambient value, and this effect must then be taken into
account. From Eq. (9-22) it follows that for/ < 1 the pumping speed
per unit area becomes „
Zlr-.f'Hl (9-23)
and when / 1
A
2(9-24)
Of these two results (9-23) is similar to that given in (9-18), but (9-24)
differs markedly from that given in (9-19) because the pressure probe
Surface Temperature Emissivity
Chevrons
Condenser
Bock shield
Tank wall
77°-100°K
20° K
77°-100°K300° K
0.90
0.50
0.20
0.50Vacuum
,,,,,,-,,,,,,,,/,,,,,/,/,/,,/,/,,,,/,,//////chamberwoll
Back shield: condenser
>>>>>>>>>>>>>>>>>ChevronsInlet Heat
r?'^"^rodiotion y^, /r
fExperiment]
Fig. 9-51. Portion of a cryogenic
pumping array. [Taken with per-
mission from R. W. Moore, Jr., in
1961 VacuumSymposium Transactions
(Pergamon Press, London, 1962).]
0.2 0.4 0.6 0.8 1.0
Condenser sticking coefficient f
Fig. 9-52. Dependence of the overall
capture probability of a cryogenic
pumping array on the sticking
coefficient at the condensing surface.
[Taken with permission from B. W.Moore, Jr., in 1961 Vacuum Sympo-
sium, Transactions (Pergamdn Press,
London, 1962).]
in the orientation of Case B still receives some molecular flux even
when the sticking coefficient at the condensing surface/ = 1.
Cryopumping surfaces cannot generally be exposed directly to^ a
source of gas at normal room temperature because the heat load due to
radiation would then exceed by far that due to the condensation of gas
molecules. Therefore, the cryogenic surface is usually protected on the
side facing the gas source by an optically opaque baffle system at an
intermediate temperature to act as a radiation shield. Gas from the
source must penetrate the baffle to be condensed on the cold surface,
but is impeded by the limited conductance of the baffle system. The
sticking coefficient / of the cryogenic surface is then not the only factor
^ULTEAHIGH VACUUM 419
determining the pumping speed of the device, because a fraction of themolecules incident on the radiation baffle is reflected back toward thesource and fails to reach the condensing surface. For such an arrayMoore^* introduces an overall capture probability G, which is the frac-tion of the total number of molecules incident upon the baffle systemwhich is finally captured on the cryogenic surface. The impedance togas flow interposed between the source and the condensing surface is
not quite as disadvantageous as would first appear because that sameimpedance ensures that those molecules which do penetrate the bafflebut are not condensed on the first encounter with the cryogenic surface,do not necessarily escape back toward the source. This same im-pedance results in many such molecules being reflected back towardthe cryogenic surface for a second opportunity to be condensed.
In Fig. 9-51 is shown schematically a typical cryogenic pumpingarray. In addition to the condensing surface and the front shieldconsisting of a chevron baffle system there is a back shield at an inter-
mediate temperature to reduce radiation loss to the wall of the vacuumchamber, which is normally maintained near the normal room tempera-ture. The temperatures and emissivities of the various surfaces typical
of such an array are also given in the figure. The condensing surface,
as shown in the figure, generally consists of an array of shields withgaps between so that some of the molecules which penetrate thechevron baffle will pass through one of these gaps, be refiected from theback shield, and have a second chance to condense on the back side ofthe condensing panels. The pumping effectiveness of the entire arrayis analyzed in terms of the overall capture probability G for gases whichwill be cryopumped on a surface maintained at 20°K.
HQs is the probability that a molecule wiU pass through the chevronbaffle, / is the sticking coefficient for molecules which strike the con-
denser surface, and g^ is the probability that a molecule incident on the
plane of the condenser will pass through one of the gaps (equal to the
fractional open area) then Moore shows that the overall capture
probability is given by
G =1 - 2(1 - sr,)(l -/) + (1 - yJ2(i ^fY „ g,
1 -(1 -g,){l -f){2~g,) +(1 -grj[(l -g^)^l - ff ~ g,^]
(9-25)
Assuming that for the chevron shield gr, = 0.23 and that for pene-
tration through the gaps of the condenser surface g^ = 0.25, Moorehas computed the value of the capture probability (? as a function of
the sticking coefficient / on the condenser. The results of this calcula-
tion are shown graphically in Fig. 9-52. The pumping speed of such
420 VACUUM SCIENCE AND ENGINEERING
an array, as defined by a pressure probe in the orientation of Case Bof Fig. 9-50, is the same as that given in Eq. (9-22) with / replaced
by G, so that
S^ ^ ^^'"_E (9-26)
^ 2 -G4
From the curve in Fig. 9-52 it is evident that the overall capture
probability is not a sensitive function of the sticking coefficient /provided that / is greater than about 0.4. This feature arises from the
NoiicondensobleJT]_flow
Black
J,
Sapphire
window
Liquid-nitrogen
back shields (77
Liquid-nitrogen-cooled
outer shields (77°K)
Fig. 9-53. Cross section of cryogenic pumping system and vacuum chamber.
[Taken with permission from R. W. Moore, Jr., in 1961 Vacuum Symposium
Transactions (Pergamon Press, London, 1962).]
fact previously mentioned that once a molecule penetrates the chevron
baffle it is to some degree trapped between the baffle and the condenser
and has considerably more than a single encounter with the condensing
surface.
The chevron baffle at a temperature of 77 to 100°K serves an addi-
tional role as an unshielded cryopump for gases such as water vapor,
the vapor pressure of which at the chevron temperature is sufficiently
low. Because molecules incident upon a chevron baffle system bounce
several times on the average against the baffle surfaces, the capture
probability of such an array as a cryopump exceeds the sticking
coefficient / by a large factor. The advantages in a system involving
the pumping of appreciable quantities of water vapor would be an
ULTRAHIGH VACUUM 421
abnormally high pumping speed for water vapor and other gases of
relatively low vapor pressure and a reduction in the heat load on the
low-temperature cryogenic surface by eliminating the heat of con-
densation of these gases.
Moore^* has determined experimentally the pumping speed of the
cryogenic pumping system shown in Fig. 9-53 incorporating the
features discussed above. The results of these measurements are
600
500
p400
r300
200
100
» Run 1,6/6/61 05D0FC,P4' Run 1,6/6/61 FP-J16-G5' Run2,6/6/6l 05D0FC,P4 with N? deposit» Run 1,6/7/61 05D OFC, P4s Run 1,6/7/61 oil man's
Run 2,6/7/61 05D OFC ,P4 with Njdeposit
Run 2,6/7/61 oil man's
4/17/61 oil man's
f=0,7
-t = 0,4
10-' 10" I0-' lO' 10-" 10"^
P,,torr
Fig. 9-54. Pumping speed as a function of pressure for the cryogenic pumpingsystem shown in Fig. 9-53. [Taken with permission from R. W. Moore, Jr., in
1961 Vacuum Symposium, Transactions (Pergamon Press, London, 1962).]
shown in Fig. 9-54 in which the pumping speed for nitrogen as defined
in (9-26) is measured as a function of the pressure in the vacuumchamber. Note that the units of pumping speed are cubic feet per
second (cfs). An interesting feature of the pumping-speed curve is the
increase in pumping speed with increasing pressure for values of the
pressure in excess of about 10~^ torr. By comparison of the results
below 10~5 torr with the theory, Moore concludes that the value of the
sticking coefficient/ for nitrogen is between 0.4 and 0.7, the value of the
overall capture probability is between 0.177 and 0.209, and the pumpingspeed per unit area of the array for nitrogen is between 71.4 and 84.9
cfs/ft2.
The large-scale cryopumping of hydrogen at modest temperatures
with the aid of a catalytic surface has been demonstrated by Grobman.^^
As has been previously pointed out, the cryopumping of hydrogen
by a pure condensation process requires that the condensing surface
422 VACUUM SCIENCE AND ENGINEERING
be maintained at a temperature which is much lower than is practical
for most apphcations. Grobman introduces a catalytic surface
consisting of palladium-coated alumina pellets to convert hydrogen
gas to water vapor, which is then readily condensed at liquid-nitrogen
(77°K) or lower temperatures. Two arrangements of catalytic beds
were tested in a chamber as shown in Fig. 9-55a and b. A 6-in. dif-
fusion pump with a cold trap and a 15-cfm mechanical pump evacuated
^Hydrogen -««^n / r**»-
Stainless-Steel
cover plote
Instrument port /
Oxygen /
Instrument port
Hydrogen -««i-| / H-x-Oxygen
Cotolyst bed—Gloss cylinder
Spiral cold trop
(| copper tubing)
Stoinless- steel ;.
manitold^^.
Nichrome wire heater
50-mesh screen/ l"
f*—I2"0D^
-I7JID
I
Instrument ports
2"
J.
Radiation
heater
Annular
cotolyst
bed
qi" 21
Instrument port
lO 6 pipe JUl(b)
Fig. 9-55. Schematic drawings of test chamber with catalytic bed arrangementsfor converting hydrogen to water vapor and condensing the water vapor on acryogenic surface, (a) Flat cyhndrical arrangement of the catalytic bed (con-
figuration A); (b) annular arrangement of the catalytic bed (configuration B).
[Taken with permission from Jack Grobman, in 1961 Vacuum SymposiumTransactions (Pergamon Press, London, 1962).]
the chamber. An instrument port and means of introducing 9on-
trolled flows of hydrogen and oxygen were provided at the top of the
chamber. The performance of configuration A was tested with 3.1
and 5.8 lb of catalyst and that of configuration B with 6.5 lb of catalyst.
In each case performance was measured (1) with the oil diffusion pumpin operation and backed by the mechanical pump and (2) with the
diffusion-pump heater off and only the mechanical pump in operation.
The temperature of the catalyst bed was varied from to 600°F. Thetest chamber was outgassed for a period of 24 hr with the catalyst
ULTRAHIGH VACUUM 423
maintained at the intended operating temperature before each series ofmeasurements. A representative set of data is shown graphically inFig. 9-56 for which the diffusion-pump heaters were turned off Amarked decrease is observed for the chamber pressure when the oxveenflow is turned on and set at an optimum value depending upon thehydrogen flow. The optimum setting for the oxygen flow proved not
1,400
-So 1,200
I'S 1,000
^ S 800£ -?
S ^ 600
I 400
^ 200
Without oxygen
oddition
With oxygen^
odditionJ
.--ti-nn'
I 10 100
Pressure upstream of cotolyst bed,
microns Hg
Fig. 9-56. Variation in tost chamberpressure as a function of total
hydrogen throughput with and with-
out oxygen addition for configuration
A of Fig. 9-55 with 3.1 lb of catalyst.
Diffusion-pump heaters turned off.
[Taken with permission from JackGrobman, in 1961 Vacuum Sym,po-
sium, Transactions (Pergamon Press,
London, 1962).]
Config-
uration
Cotolyst,
lb
Diffusion
pumps
6,000
5,000
a
b
c
d
e
- f
A
A
A
A
B
B
3.1
3.1
5.8
5.8
6.5
6.5
Oft
On
Off
On
Off
On1
4,000 -
/3,000 -
/2,000 - /•
1,000-
i // /n 1 1 LJ^Ill /_fc—1-3TtTlll
Pressure upstreom of cotolyst bed,
microns Hg
Fig. 9-57. Variation in the net
hydrogen throughput of each of the
configurations shown in Fig. 9-55
with test chamber pressure for
various quantities of catalyst in the
bed. [Taken with permission fromJack Grobman, in 1961 VacuumSymposium Transactions (PergamonPress, London, 1962).]
to be particularly sensitive but in any case was ±30 per cent of the
stoichiometric value.
The performance of the catalytic-cryogenic pumping system wasstudied as a function of the temperature of the catalytic bed and found
not to depend noticeably on the temperature. Heaters are essential,
however, to outgas the catalytic bed before each period of use. Theperformance of each of the two configurations was measured for differ-
ent quantities of catalyst as shown in Fig. 9-57. The net hydrogen
throughput in this figure represents the additional hydrogen throughput
424 VACUUM SCIENCE AND ENGINEERING
resulting from turning on and optimizing the oxygen flow. Although
the demonstration of the cryopumping of hydrogen by catalysis as
described by Grobman^^ was carried out at relatively high temperatures
and pressures, the results are suggestive of a method which might be
extended to low condensing temperatures and pressures by a careful
study of various catalysts and alternative geometries.
Of much greater promise for ultrahigh-vacuum systems is the
process of cryotrapping, which has been investigated by Brackman
3 4 5 6
M, grams of HjO
Fig. 9-58. Quantity of nitrogen andargon required to saturate an ice
coating deposited by condensation
as a function of the accumvilated
mass ofcondensate . (Temperature
:
77°K.) [Reprinted with permission
from The Macmillan Co., fromF. W. Schmidlin, L. O. Hefiinger,
and E. L. Garwin, in 1962 VacuumSymposium Transactions. Copy-right © 1962 by American VacuuinSociety.]
/^^/Theory:
col fit:
/".Qt. ^P
/Emperi
R m fiP
/3=3.3 forr"'w= 8x10-'
-ii 10"
10'
•5 S. 10"
^ 10"* 10"' 10"2 10"'
Pressure p.torr
Fig. 9-59. Number of molecules of
nitrogen trapped per molecule of
water condensed on a surface at 77°Kas a function of the partial pressure
of nitrogen. [Reprinted with permis-
sion from The Macmillan Co., fromF. W. Schmidlin, L. O. Hefiinger,
and E. L. Garwin, in 1962 VacuumSymposium, Transactions. Copy-right © 1962 by American VacuumSociety.]
and Fite,^' Degras,^' SchmidHn, Heflinger, and Garwin,^^ and Henge-voss and Trendelenburg.^' Brackman and Fite reported that gases
are trapped on cooled surfaces on which water vapor has been con-
densed with the result that the partial pressures attainable for a numberof the common gases using cryopumping techniques may be sig-
nificantly lower than the equilibrium vapor pressures at the temperature
of the cooled surface. This process is referred to as cryotrapping andoffers the possibility of cryopumping of gases such as nitrogen, hydrogen,
and argon much more effectively in the presence of a "contaminating"
agent such as water vapor than in a system from which all such agents
have been carefully removed and subsequently excluded.
ULTRAHIGH VACUUM 425
Schmidlin et al.ss have studied the trapping of normally nonconden-sible gases, nitrogen and argon, by condensed water vapor depositedon a stainless steel surface maintained at about 77°K by liquid-nitrogen cooling. From combined measurements of adsorption andtrapping the authors conclude that water vapor condensed at 77°Kforms a porous deposit with aneffective area of about six hundredsquare meters per gram of water.
The quantity of nitrogen and argonrequired to saturate the surface
deposit of water is proportional to
the quantity of water deposited,
as is shown in Fig. 9-58. Thenumber of molecules of nitrogen
trapped per molecule of water con-
densed on the surface is showngraphically in Fig. 9-59. This
number appears to have the con-
stant value ofabout 10-2 for partial
pressures of nitrogen above about0.1 torr and then decreases with
decreasing partial pressure to a
value of about 5 X 10"^ at 10^^
torr.
Hengevoss and Trendelenburg^'
have investigated the cryotrap-
ping of hydrogen and helium bycondensed argon at a temperatureof 4.2°K in a pressure range of
much greater interest for ultra-
high-vacuum application. Theapparatus used in these measure-
ments is shown in Fig. 9-60. Theentire vacuum chamber was ini-
tially baked at a temperature of 450°C and was evacuated by two oil
diffusion pumps in series through a low-conductance tube. The pump-ing speed of the evacuating system is largely determined by the conduct-ance of the connecting tube and was carefully calibrated for the gases
used in the experiments. After bakeout the pressure in the vacuumchamber before refrigeration was less than 10-' torr (nitrogen equivalent)as read on a Bayard-Alpert gauge. The conductance of the gaugeconnection tubing for hydrogen was 19 liters/sec, which by preliminary
tests was proved to be adequate to prevent the measured pumping speed
Liquid he!
Slit width
0.3 mm
Cryosurface ^A PTh Surface at(Ag 8cmM \-^\ W M liquid-air
temperature
(900 cmM
Fig. 9-60. Cryostatic vacuum systemused for measuring the cryotrappingof hydrogen and helium by a deposit
of condensed argon on a silver surface
at 4.2°K. [Reprinted with permis-
sion from The Macmillan Co., fromJ. Hengevoss and E. A. Trendelenburg,
in 1963 Vacuum, Sym^posium Trans-actions. Copyright © 1963 byAmerican Vacuum Society.]
426 VACUUM SCIENCE AND ENGINEEBING ULTEAHIGH VACUUM 427
of the gauge from falsifying the pressure reading by the gauge or the
mass spectrometer also connected to the same tubing for measurement
of partial pressures. Since the ionization gauge and mass spectrom-
eter were both at room temperature (300°K), whereas the gas in the
chamber was 83°K, the readings were multiplied by (83/300)'-^ to
determine the correct value of the pressure.
Liquid helium was used to cool the isolated inner cylinder to 4.2°K.
At the bottom of this cylinder a section of silver protrudes through
an aperture between the upper and lower sections of the vacuum
chamber and exposes a surface area of 8 cm^ to the lower section of the
chamber. The conductance between the upper and lower sections of
the chamber through the clearance around this protruding surface is
very small so that the cryostatic pumping speed exposed to the lower
chamber was that due to the protruding surface only and not to any
significant degree due to flow through the annular clearance.
With the chamber immersed in liquid nitrogen and with liquid
helium in the inner cylinder, pure hydrogen was first admitted at a
steady flow rate and the pressure resulting from the dynamic balance
between the throughput and pumping action of the system was
measured. At small flow rates for which the hydrogen pressure was
below the saturated value corresponding to the temperature of 4.2°K
the pumping speed was entirely due to the diffusion-pump arrangement.
At sufficiently high flow rates such that the resulting hydrogen pressure
exceeded the saturated value the pumping action was the sum of the
pumping speed of the diffusion-pump arrangement and the condensing
speed of the cryogenic surface. Under the conditions of the experiment
corresponding to the chamber temperature of 83°K the saturation
hydrogen pressure was 1.3 x 10^« torr. The next step consisted of
adding argon initially at a very small flow rate and then progressively
increasing the argon-flow rate with the hydrogen flow held constant.
As is evident from Fig. 9-47, the saturation vapor pressure of argon
at 4.2°K is unmeasurably small so that even a very small addition
of argon results in condensation on the cryogenic surface, for which
process a sticking probability of 0.7 was measured in preliminary
experiments. The partial pressures of hydrogen and argon were then
measured for various values of the argon-flow rate holding the hydrogen-
flow rate constant. This procedure was repeated for several different
values of the hydrogen-flow rate. The results are shown graphically
in Fig. 9-61, in which the hydrogen partial pressure is plotted against
the argon partial pressure for three different values of the hydrogen-
flow rate.
For the curves (a) and (b) the hydrogen-flow rates are both so low
that the equilibrium pressure is below that for saturation at 4.2°K so
-«
Impinging flrgon, atoms/cm^ sec
10'° lo" 10'2 lo" in'" '"'5
I I I III I I III II I I il
10'
ml-r
S 10
°-io
10
~ ~~
N
— H T-'>,u... V /
i
PotO withnnf 1
> AX .
argo n addit ion Jw ."y V11-2= U.I
' •
/V A
A10' 10"' n-9
10 ' 10 ° 10 ' lO'" IlO6-
10"
Iio'Ve
that no condensation occurs and the pumping action is only that of thediffusion pumps. In each of these cases, when the argon partialpressure reaches about 0.1 that of the hydrogen, the hydrogen partialpressure drops suddenly by a factor of 10 or more and then remainsat this lower value as the argon-flow rate and partial pressure areincreased further. The decrease in hydrogen partial pressure is due toadditional pumping resulting from the trapping of hydrogen by thecondensed argon. From the trap-
ping rates and the area of the cryo-
static surface the sticking coefficient
for hydrogen on the argon deposit
was determined to be 0.4, so that 4
out of 10 hydrogen molecules strik-
ing the surface are trapped. Astraight line is drawn at 45° in the
figure and is found to pass throughthe lower inflection points of curves
(a) and (6). Auxiliary scales show-ing flow rates in terms of molecules
per square centimeter per secondare included. The 45° line corre-
sponds to the case in which one hy-
drogen molecule is trapped by one
condensed argon molecule.
Curve (c) is taken at a hydrogen-flow rate which is great enough that
the hydrogen partial pressure ex-
ceeds the saturated value at 4.2°Kso that condensation on the cryostatic surface occurs even in the absenceof any argon. Thus in curve (c) both condensation and trapping occurat the same time so that the break in the curve corresponding to theonset of cryotrapping by argon occurs at an appreciably lower argon-flow rate than that corresponding to the intercept with the 45° line
drawn through the inflection points of (a) and (6), indicating that about10 times as many hydrogen molecules are deposited by the combinationof condensation and trapping as are argon molecules.
In a subsequent experiment the connection to the diffusion pumpwas sealed off and a large amount of hydrogen admitted to the chamber.After cutting off the hydrogen flow an equilibrium hydrogen pressureof 1.3 X 10-', corresponding to the saturation value at 4.2°K, wasreached. A continuous flow of argon resulting in an argon partial
pressure of 4 x 10~' torr was then introduced, and the partial pressure
of hydrogen slowly fell to 2 x 10^* torr. The argon flow was then
Argon partial pressure, lorr
Fig. 9-61. Hydrogen cryotrappingby argon for different values ofhydrogen and argon flow rates.
[Reprinted with permission from TheMaomillan Co., from J. Hengevossand E. A. Trendelenburg, in 2.963
Vacuum Symposium Transactions.
Copyright © 1963 by AmericanVacuum Society.]
428 VACUUM SCIENCE AND ENGINEEKING
turned off and the partial pressure of the argon fell to an unmeasurable
value, whereas the partial pressure of hydrogen remained at 2 x 10~*
torr, indicating that the hydrogen was permanently trapped by the
condensed argon deposit.
Similar experiments were carried out to determine whether helium
could also be cryotrapped by condensing argon. The results showed
that the sticking probability of helium on the argon deposit is about
Fig. 9-62. Model of liquid-hydrogen-
cooled charcoal adsorption pumpwith liquid-nitrogen-cooled shield
having an adsorbing section up-
stream from the liquid-hydrogen-
cooled section and of the samediameter. [Taken with permission
from the American Institute of
Physics, from B. G. Lazarev andM. F. Fedorova, Soviet Phys.-Tech.
Phys. 6, 624 (1962).]
Fig. 9-63. Model of liquid-hydrogen-
cooled charcoal adsorption pumpwith liquid-nitrogen-cooled shield
having an adsorbing layer completely
surrounding a similar liquid-hydro-
gen-cooled adsorbing unit except for
the pumping aperture. [Taken with
permission from the American Insti-
tute of Physics, from B. G. Lazarev
and M. F. Fedorova, Soviet Phys.-
Tech. Phys. 6, 624 (1962)[.]
0.03 and that about 30 argon molecules are required to trap one mole-
cule of helium.
Although the process of cryotrapping has been only partially investi-
gated and the mechanism of the process is not understood, the results
described above are most encouraging for the enhancement of the
normal cryopumping process by the trapping of otherwise noncon-
densable gases on low-temperature surfaces.
The process of adsorption pumping discussed in Sees. 8-6 and 9-7
has been extended into the cryogenic region by Lazarev and Fedorova*"
particularly for the purpose of pumping hydrogen with high pumping
speeds at low pressure. Several designs of liquid-hydrogen-cooled
adsorption pumps were developed, two of which are illustrated in
ULTRAHIGH VACUUM 429
Figs. 9-62 and 9-63. Because hydrogen cannot be condensed atliquid-hydrogen temperature, there is great advantage in addingmaterials which are effective in adsorbing hydrogen, particularly in
situations in which hydrogen is the major gas component present, as in
controlled-fusion research. The two adsorption pumps illustrated aretypical of a series of such devices developed by Lazerev and Fedorovaprimarily for the purpose of meeting the needs of the Soviet controlled-
fusion research program. As is evident from Figs. 9-62 and 9-63
together with their captions, the cryogenic adsorption pumps consist
of a central, double-walled cylinder, open at one end as the pumpingaperture and lined with small chunks of graphite held in place by a wiremesh. The liquid-nitrogen-cooled shield is designated as component1 and not only serves to reduce the radiation heat load on the inner
liquid-hydrogen-cooled component 2, but also acts as an auxiliary
adsorption pump for nitrogen, oxygen, and argon. This feature is said
to be important because it permits evacuation of the system to 10~*
torr or less of other common gases before pouring in the liquid hydrogenand cooling the central component 2 to 20.4°K. The inner adsorbing
surface is thus preserved for pumping hydrogen without appreciable
contamination due to the adsorption of the other more easily adsorbedgases.
Each adsorption pump is equipped with a valve (4) for connecting it
to the vessel to be evacuated and a valve (5) for connecting it to a
mechanical vacuum pump for roughing out the system. The sequence
of operation is first to rough out the system with both valves open to a
pressure of about 10"^ torr, then close valve 5. Liquid nitrogen is then
poured into the reservoir of component 1 after which the pressure in
the system quickly drops to a value of 10~^ or 10^* torr. Liquid
hydrogen is then introduced into the reservoir of component 2 and the
adsorption pump is then ready to pump hydrogen, which can then be
admitted to the vacuum chamber as needed. The pumping speed of
the adsorption pump illustrated in Fig. 9-62 is shown as a function
of the pressure (on a logu scale) in Fig. 9-64, in which the pressure
indicated is that measured at the inlet to the pump. Over the pressure
range tested, the pumping speed for hydrogen increased from about
400 liters/sec at 8 x 10~* torr to about 900 liters/sec at 10~^ torr.
From the dimensions of the inlet it is clear that even at the higher
pressure the pump is not choked by the conductance of the inlet,
which for hydrogen must be at least a factor of 5 greater than the
measured pumping speeds. The lower curve 2 is the pumping speed
as a function of inlet pressure which would normally be realized in
the second step of the evacuating procedure when the valve 5 is turned
off and component 1 of the pump is cooled with liquid nitrogen. Curve
430 VACUUM SCIENCE AND ENGINEERING
1,000
800
600
400
200
10 10'" 10"'
Pressure, torr
10
3 is similar to curve 2 except that both component 1 and component
2 were cooled with liquid nitrogen. Substitution of liquid-hydrogen
cooling (20.4°K) for liquid-nitrogen cooling (77°K) appears to increase
the pumping speed of the adsorption
pump for hydrogen by a factor of 3 or
more and reduces the attainable base
pressure by nearly a factor of 10. Ifis worth noting that the liquid-nitro-
gen filling lasts for a period of 20 to
40 hr and that of liquid hydrogen for
24 hr or more depending on the
details of design.
Preliminary tests have been madeon a similar design of adsorption
pump by Lazarev and Fedorova using
liquid-helium (4.2°K) cooling on the
inner component for the cryogenic
pumping of helium in the pressure
range 10~^ to 10~* torr.
Bachler, Klipping, and Mascher*^
have made a study of cryopumping
in the temperature range from 4.2 to
2.5°K by controlling the pressure
over liquid helium. Because of the
very steep dependence of the equilib-
rium vapor pressure of hydrogen on
temperature in this range, this pro-
cedure provides a possible solution to
the cryogenic pumping of hydrogen
by condensation. The pumping and
pressure control system by which the
liquid helium in the cooling coil is
maintained at any desired tempera-
ture, either higher or lower than
4.2°K, is shown in Fig. 9-65. Valve
7 is throttled to obtain the required flow of refrigerant, and valve 6 is
adjusted to provide the needed pumping speed to attain any desired
temperature in the condenser. Bachler et al. report that control of the
temperature to within 0.01°K is achievable by this system.
In Fig. 9-66 is shown a schematic drawing of a condenser unit to be
operated at temperatures below 4.2°K. The low-temperature coil is
shielded above and below by chevron brffles which are cooled by the
cold exhaust gas evaporated from the low-temperature coil. These
Fig. 9-64. Porformance of the
adsorption pump illustrated in Fig.
9-62. Curve 1: Pumping speed
for hydrogen as a function of the
pressure, liquid-hydrogen cooled.
Curve 2: Pumping speed of the
adsorption pump with liquid-
nitrogen cooling in component 1
only as a function of the pressure.
Curve 3: Pumping speed of the
adsorption pump with liquid-
nitrogen cooling in both compo-nent 1 and component 2. [Taken
with permission from the AmericanInstitute of Physics, from B. G.
Lazarev and M. F. Fedorova,
Soviet Phys.-Tech. Phys. 6, 624
(1962).]
ULTRAHIGH VACUUM 431
baffles not only serve as heat shields but also condense gases such asnitrogen with very high effective pumping speed. The pumping speedfor hydrogen achieved was about 2,000 liters/sec and that for nitrogenwas about 3,000 liters/sec. The consumption rate of helium was about0.5 liter/hr. According to measurements of Bachler et al. and thoseof Borovik, Grishin, and Grishina,^^ the equilibrium vapor pressureof hydrogen is approximately lO-^ torr at about 3.3°K, so that at 2.5°K
Pressure gauge
Vacuum chamber
Auxiliary pump
Liquefied gas
reservair
1 2
Fig. 9-65. Arrangement for controlling pressure of cryogenic gas and thereforethe temperature of the condenser. By this system temperatures as low as2.5°K are achieved in condensing hydrogen. [Reprinted with permission fromThe Macmillan Co., from W. Bachler, G. Klipping, and W. Mascher, in 1963Vacuum Symposium Transactions. Copyright © 1963 by American VacuumSociety.]
the vapor pressure of hydrogen should be well below IQ-i" torr, ensuringthat the sticking coefficient and pumping speed for hydrogen due tocondensation on a surface maintained at 2.5°K will be independent ofthe pressure well into the ultrahigh-vacuum range. Bachler et al.
note that whereas in their device nitrogen is pumped with about themaximum speed anticipated from theoretical calculations, hydrogenis pumped with about half the theoretical rate. However, since for
hydrogen the theoretical rate is nearly four times that of nitrogen, theresult is still very favorable for pumping hydrogen.The use of a liquid-helium-cooled condensing surface under conditions
in which the heat load from the process going on within the vacuumchamber (in this case a controlled-fusion plasma) may be a problem
432 VACUUM SCIENCE AND ENGINEERING
has been investigated by Borovik, Busol, and Kovalenko."' In a series
of experiments with trapping surfaces of various geometries Borovik
et al. determined the maximum thermal load tolerable for the proper
maintenance of the temperature near the value 4.2°K typical of liquid
helium at normal atmospheric
/
UooooocoooppociooooocB
Fig. 9-66. Condenser unit with pro-
tective chevron radiation baffles
cooled by the exhaust gas from the
low-temperature condenser. These
baffles serve to condense gases such
as nitrogen, and the low-temperature
condenser condenses hydrogen. [Re-
printed with permission from The
Macmillan Co., from W. Bachler,
G. Klipping, and W. Mascher, in 1963
Vacuum Symposium Transactions.
Copyright © 1963 by American
Vacuum Society.]
pressure. Since the heat of evap-
oration of liquid helium is small
(about twenty calories per mole)
the conditions of heat transfer be-
come characterized by eruptive
boiling at the metal surface if the
heat load g (watts per square
centimeter) reaches some critical
value g,r- The experiments were
generally such as to determine the
temperature of the condensing
surface as a function of the heat
load. From these experiments it
was observed that the tempera-
ture of the surface was relatively
independent of the heat load (in-
creasing very slowly with the heat
load) until a critical value sr„ was
reached in the range 3 to 5 x
10^* watt/cm^ above which value
the surface temperature increased
abruptly due to the onset of erup-
tive boiling.
In order to screen the liquid-
helium-cooled surface from the
source of radiation and still per-
mit fairly effective condensation
of gas on the surface, Borovik et
al.** devised the condensation
pump illustrated in Figs. 9-67
and 9-68. The liquid-helium-cooled, double-walled cylindrical surface
(3) is protected from the chamber wall by a liquid nitrogen-cooled
cylinder with skirts above and below the condenser unit connected
to the reservoir for a set of liquid-nitrogen-cooled louver-type baffles.
Concentric with and within this assembly is another cylindrical
arrangement of louver-type baffles, in this case water-cooled. The
outer surface of the liquid-nitrogen-cooled outer shield was brightly
polished (copper), whereas the inner liquid-nitrogen- and water-cooled
ULTRAHIGH VACUUM 433
surfaces were blackened. The liquid-helium-cooled condenser wasmade of sheet copper, 2 mm thick, and was also highly polished.These precautions ensured minimum radiation heat load on the liquid-helium-cooled condenser, preserving as much of the heat capacity as
^^www;^
i=LJ#^^^^^^^Fig. 9-67. Vertical cross-sectional
view of liquid-helium-cooled lou-
vers as radiation shields. (1)
Chamber outer wall; (2) liquid-
nitrogen-cooled .shield; (3) liquid-
helium-cooled condensing surface;
(4) liquid-nitrogen-cooled louver;
(5) water-cooled baffle. [Takenwith permission from the AmericanInstitute of Physics, from E. S.
Borovik, F. I. Busol, and V. A.Kovalenko, Soviet Phys.-Tech.Phys. 8, 68 (1963).]
Fig. 9-68. Horizontal cross-
sectional view of the liquid-
helium-cooled condensationpumpshown in Fig. 9 -67 . The numbersdesignate the same componentslisted in Fig. 9-67. [Taken withpermission from the AmericanInstitute of Physics, from E. S.
Borovik, F. I. Busol, and V. A.Kovalenko, Soviet Phys.-Tech.
Phys. 8, 68 (1963).]
possible for the heat of condensation of gas in cryogenic pumping.Borovik et al."* report that:
1. With a heater of 10.5 kW output inside the inner shield the rateof evaporation of liquid helium due to the heat input was only 0.04
liter/hr, corresponding to a thermal load on the heat transfer surface
of only 7.5 x 10^^ watt/cm^, which is about a factor of 5 below thecritical value.
2. The pumping speed of the condensation pump was found to beabout II per cent of that of a perfectly condensing surface or about 1.25
liters/sec cm^ of the inner, water-cooled louver surface. The authors
434 VACUUM SCIENCE AND ENGINEERING
^
assume that the pumping speed for hydrogen would be 4.68 Hters/seccm^, but did not make the measurement.
Borovik et al. conclude that cryogenic pumping is an effective meansof pumping hydrogen in controlled-fusion research devices. Privatecommunication with Professor Borovik reveals that a magnetic mirrormachine utilizing liquid-helium-cooled surfaces for cryogenic pumpinghas been constructed and is now in operation.
9-10. Ultrahigh-vacuum Systems. In this chapter and tosome extent in the preceding chapter the techniques of ultrahigh vacuumhave been discussed. The problem of the vacuum engineer is to utilize
these techniques in the design of ultrahigh-vacuum systems to achievethe required performance as economically and effectively as possible.
Some of the techniques described have been applied under ratherspecialized circumstances and are not necessarily applicable to a widerange of vacuum problems. However, the most important parametersto be considered are
:
1. The gas load expected in terms of the quantities of various com-ponent gases.
2. The operating pressure desired for the process to be carried out,either in terms of total pressure or in terms of the partial pressure of aparticular component gas.
Ultrahigh-vacuum systems tjrpically utilize some combination of thetechniques discussed in this and the preceding chapters. For systemsinvolving essentially no throughput of gas other than the outgassingof the surfaces, the achievement of very low pressures can be accom-plished with low pumping speed and the thorough outgassing of thesurfaces by baking the system at temperatures up to 450°C or higher.
Oil or mercury diffusion pumps with a combination of Freon- andliquid-nitrogen-cooled baffles can provide the modest pumping speedsrequired for such systems. Indeed, as was shown by Alpert,^^ athoroughly outgassed system can be maintained in the ultrahigh-vacuum range by the pumping action of the ionization gauge alone whenclosed off from the vacuum pump by a sufficiently tight bakable valve.
Systems of this type may be regarded as static systems in whichultrahigh-vacuum conditions are attained on a small scale with essen-
tially zero throughput.
Beginning with the requirements of controlled-fusion research, static
systems could no longer be relied upon to maintain the desired lowpressure because the experimental equipment was relatively large in
volume and an appreciable gas throughput required high pumpingspeeds. This need was initially met by optimizing the diffusion pump,
ULTRAHIGH VACUUM 435
valve, and trap combination to provide much higher overall system
pumping speeds at low pressure than had been previously attempted.
As the requirements of the controlled-fusion program became more
demanding, auxiliary techniques were added, such as the evaporation
of active metals, first on the walls of the vacuum chamber at roomtemperature and then on liquid-nitrogen-cooled inner liners. Elimina-
tion of hydrocarbon contaminants by the use of either room-tem-
perature or liquid-nitrogen-cooled absorption pumps combined with
getter-ion pumps provides another solution to the problem of relatively
high-speed pumping in the ultrahigh-vacuum range.
The more recent advent of space research and simulation has ex-
panded much further the demand for large ultrahigh-vacuum chambers
with extreme requirements of high pumping speed at very low pressure.
For this service the combination of very large diffusion pumps with
Freon- and liquid-nitrogen-cooled traps, augmented by the extensive
use of cryopumping at liquid-hydrogen or liquid-helium temperatures
to achieve pumping speeds in the multimillion liters per second range,
has been most commonly adopted.
Each ultrahigh-vacuum system is itself a special design problem
which must be solved by a careful appraisal of the requirements to be
met and the selection of the most effective combination of the techniques
described in the preceding sections capable of meeting the require-
ments. Because of the requirements of metal gaskets, bakable
components, and extreme freedom from leaks, and the difficulties in
pressure measurement and the like, an improper choice of techniques
to be applied can result in excessive costs of construction and operation
and seriously jeopardize the chances of achieving the required per-
formance. However, the means are now available for achieving
almost any desired base pressure and enormous pumping speeds at
low pressure. If properly applied, the methods already developed are
capable of achieving spectacular goals. What is perhaps more im-
portant, the development of new techniques proceeds at such a pace
that what seems spectacular today will most certainly be commonplace
within the near future in the rapidly expanding field of ultrahigh
vacuum.
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APPENDIX I
Molecular Weights of Gases*
Gas Formula Molecular weight, g/mole
Helium HeNeArKrXe
H2N2O2CI2
HClH2SSO2NON2ONH3
COCO2CH4C2-H.2
C2H4
4.003
20.18
Argon 39.944
83.70
131.30
2.016
Nitrooren 28 02
Oxvoren 32 000
Chlorine 70.91
Air 28.98 (mean)
36.47
34.08
64.06
30.01
44.02
17.03
Hydrogen chloride . . .
Hydrogen sulfide. . . .
Sulfur dioxide
Nitric oxide
Nitrous oxide
Carbon monoxide ....
Carbon dioxide
28.01
44.01
16.04
26.04
Ethylene . 28.05
* Source: Handbook of Chemistry and Physics (Chemical Rubber Publishing
Co., Cleveland, 1963), 44th ed.
439
APPENDIX II
Critical Constants, Van der Waals' Constants, Molecular Diameters,AND Mean Free Paths Computed from the Constant 6 According to
EqS. (1-40) AND (1-38)
Gas
HeliumNeonArgonKryptonXenon
HydrogenNitrogenOxygenChlorine
Mercury
Hydrogen chloride
Water vapor ....
Hydrogen sulfide.
Sulfur dioxide . . .
Nitric oxide
Nitrous oxide. . . .
Ammonia
Carbon monoxideCarbon dioxide . .
MethaneAcetylene
EthyleneCarbon disulfide .
Formula
HeNeArKrXe
HaNaO2Clj
Hg
HClH2OHjSSO2NON2ONH3
COC02CH,CgHjC2H4cs.
— 267.9— 228.7— 122.
— 63.0
16.6
— 239.9— 147.1
— 118.8
144.0
>1500
51.4
374.0
100.4
157.2
— 94.0
36.5
132.4
— 139.0
31.1
>155036.0
9.7
273.0
P*atm
2.26
25.9
48.0
54.0
58.2
12.8
33.5
49.7
76.1
>200
81.6
217.72
88.9
77.7
65.0
71.7
111.5
35.0
73.0
>20062.0
50.9
76.0
A*(cm^/mole)'
atmX io-«
0.03412
0.2107
1.345
2.318
4.194
0.245
1.390
1.360
6.493
8.093
3.667
5.464
4.431
6.714
1.340
3.782
4.170
1.485
3.592
2.253
4.390
4.471
11.62
cm^/mole
23.70
17.09
32.19
39.78
51.05
26.61
39.13
31.83
56.22
17.0
40.81
30.49
42.87
56.36
27.89
44.15
37.07
39.9
42.67
42.78
51.4
57.14
76.9
cmX 10-
2.62
2.38
2.94
3.«(6
3.43
2.76
3.14
2.93
3.55
2,38
3.19
2.89
3.24
3.55
2.81
3.27
3.09
3.16
3.22
3.24
3.44
3.56
3.94
X cmP = 1 torr
T = O^C
X 10-3
9.26
10.3
7.34
6.38
5.40
8.33
6.44
7.40
5.08
11.2
6.27
7.61
6.07
5.05
8.08
5.96
6.68
6.36
6.13
6.07
5.38
5.01
4.11
* Sources: AmericMn Institute of Physics Handbook (McGraw-Hill Book Company, New^York,1963), 2nd ed.; Handbook of Physics and Chemistry (Chemical Rubber Publishing Co., Cleveland,1963), 44th ed.
APPENDIX III
Viscosity op Gases at 0°C and 760 Torr together with Computed ValuesOP Molecular Diameters and Mean Free Paths in Accordance with
Eqs. (1-62) and (1-38)
Gas FormulaViscosity, fi*
micropoises
1
cmX 10-8
A cmP = 1 torr
T = 0°CX 10-3
Helium HeNeArKrXe
H2N2O2CI2
HClHjSSO2NON2ONHg
COCO2CH4C2H2C2H4
186.9
312.4
208.8
224.9
216.5
84.7
166.6
191.0
124.0
171.2
132.5
117.5
117
179.0
136.1
88.9
165.8
137.6
103.2
93.5
93.6
2.20
2.55
3.69
4.27
4.87
2.68
3.78
3.65
5.51
3.76
4.53
4.73
5.55
3.71
4.69
4.57
3.79
4.66
4.18
4.96
5.05
13.2
Neon 9.82
4.67
3.49
2.68
Hvdrosren 8.83
4.45
4.77
Chlorine 7.61
Air 4.49
Hydrogen chloride. .
Hydrogen sulfide . . .
Sulfur dioxide
Nitric oxide
Nitrous oxide
3.10
2.84
2.07
4.62
2.90
3.05
Carbon monoxide . . .
Carbon dioxide
4.42
2.93
3.64
2.59
Ethylene 2.50
* Source: Handbook of Chemistry and Physics (Chemical Rubber Publishing
Co., Cleveland, 1963), 44th ed.
440 441
APPENDIX IV 443
1 cubic foot per minute (cfm)
APPENDIX IV
Units and Convebsion Factoes of Use in Vacuum Technology*
Pressure
1 standard atmosphere (atm) = 760 mm Hg of density 13.595 g/cm^where g = 980.665 cm/sec^ = 760 torr
= 1.0133 X 10«dynes/cm2= 14.696 psi = 2,116.2 Ib/ft^
= 29.921 in. Hg at 32°F= 33.899 ft of water at 39.1 °F
1 bar = 10* dynes/cm^ = 10*/ibar
= 750.06 mm Hg of density 13.595 g/cm^where g = 980.665 cm/sec^ = 750.06 torr
= 0.98692 atm= 14.504 psi
1 torr = 1 mm Hg of density 13.595 g/cm^where g = 980.665 cm/sec^
= 1,333 fih&T (dynes/cm^)
1 micron {/i) = 10^^ torr = 1 millitorr
= 1.333 /^bar (dynes/cm^)
Pumping Speed and Conductance
1 cubic centimeter per second (cm^/sec) = 10-^ liter/sec = 6 x 10^^ liter/min
= 3.6 liters/hr = 10~' m^/sec
= 6 X lO-^mS/min = 3.6 x lO-^m^/hr= 3.531 X 10-5 cfs ^ 2.119 x 10-3 cfm
1 liter per second (liter/sec) =10^ cm'/sec =6x10* cm^/min= 3.6 X 106cm3/hr = IQ-Sm^/sec= 6 X 10-2ni3/jnin = 3.6 m^/hr= 3.532 X 10-2 cfs = 2.119 cfm
1 liter per hour (liter/hr) = 2.778 x 10"* liter/sec
= 1.667 X 10-2 liter/min = IQ-^m^/hr= lO^cm^/hr = 1.667 x lO-Sm^/min'= 16.67 cmS/min = 5.886 x 10-* ofm= 9.72 X lO-Scfs
1 cubic meter per hour (m^/hr) = 2.778 x 10-* m^/sec= 1.667 x 10-2m3/min = 10^ Hters/hr
= 10* cm3/hr = 0.2778 liter/sec
= 277.8 cm3/sec = 0.583 cfm= 9.72 X 10-3 gfg
* Source: Handbook of Chemistry and Physics (Chemical Rubber PublishingCo., Cleveland, 1963), 44th ed.
442
1.667 X 10-2 cfs
= 471.95 cm3/sec = 0.47195 liter/sec
= 28.32 liters/min = 1,699 liters/hr= 1.699 mS/hr = 0.0283 m^/min
Throughput or Oas Flow1 torr cm^/sec = \ fx liter/sec (fi l/sec)
= 10-3 torr liter/sec
= 2.119 X 10-3 torr cfm= 2.119 /« cfm
1.316 X 10-3 atm cm3/sec1,000 n liters/sec (fi I/sec)
= 1,000 torr cm3/sec= 2.119 torr cfm= 2,119 /< ofm
1.316 atm om3/sec10-3 ^Qj.j. liter^ggQ
= 1 torr cm3/sec= 2.119 /< cfm= 2.119 X 10-3 torr cfm
= 1.316 X 10-3 atm cm3/soc= 760 torr cm3/sec: 760 ^ liter/sec
- 0.760 torr liter/sec
- 1.610 torr ofm1,610 n ofm
- 1,000 /< cfm- 0.4719 torr hter/sec
- 471.9 torr cm^/sec
: 471.9 /< liters/sec
0.6210 atm cm3/sec10-3 ^QJ.J. pfjj^
0.4719 /« Hter/sec
= 0.4719 torr cm3/sec= 4.719 X 10-* torr hter/sec
= 6.210 X 10-* atm cm3/sec
Length
0.01 m = 10 mm= 0.3937 in.
= 3.281 X 10-2 ft
= 100 cm = 1,000 mm= 39.37 in.
= 3.281 ft
0.08333 ft
2.540 cm = 25.40 mm12 in.
30.48 cm = 304.8 mm
1 torr liter/sec
1 fi hter/sec {fi 1/seo)
1 atm cm3/sec
1 torr cfm
1 /i cfm
1 contimetor (cm)
1 meter (m)
1 inch (in.)
1 foot (ft)
Area
1 square centimeter (cm2) = 10-* m2 = 100 mm2= 0.1550 in.2
= 1.0764 X 10-3 ft2
444 VACUUM SCIENCE AND ENGINEERING
1 square meter (m^) =10* cm^ =10' mm^= 1,550.0 in.2
= 10.764 ft2
1 square inch (in.^) = 6.944 x lO-^ ft^
= 6.452 cm2 = 645.2 mm^= 6.452 X 10-* m2
1 square foot (ft^) = 144 in.^
= 929.0 cm2 = 9.29 x 10* mm^= 9.290 X 10-2 m2
Volume
1 cubic centimeter (cm^) = 0.99997 x 10-' liter = lO^^m' = 10' mm'= 6.1023 x 10-2 in.s
= 3.531 X 10-5 ft3
1 liter = 1,000.027 cm' = 1.000027 x 10-' m'
We use hereafter the approximation1 liter = 10' cm' = 10-' m' = 10* mm'
= 3.531 X 10-2 ft' = 61.025 in.'
1 cubic meter (m') = 10' liters = 10* cm' = 10^ mm'= 6.1023 X 10* in.' = 35.31 ft'
1 cubic inch (in.') = 1.639 x 10-2 liter ^ i6.39 cm' = 1.639 x 10* mm'= 5.787 X 10-* ft'
1 cubic foot (ft') = 28.316 liters
= 2.8317 X 10* cm' = 2.8317 x 10' mm'= 1,728 in.'
Temperature
Kelvin to centigrade °K = °C + 273.16
Rankine to Fahrenheit "R = °F + 459.69
Fahrenheit to centigrade °F = 32 + 1.8°C
Rankine to centigrade °R = 1.8°C
APPENDIX V
Values op Some Physical Constants*
Symbol Name Value
Losohmidt's number (molecular density of a
gas at 760 ton- and 0°C) 2.687 X lO'Vcm'
Avogadro's number (number of molecules in
1 g mole) 6.023 X 1023/g mole
V Volume of 1 g mole of gas at 760 torr and 0°C 22,415 cm'
R Gas constant 8.3143 X 10' erg/g mole "K
^ = ^oln^ol Boltzmann's constant 1.3805 X 10-" erg/°K
Atomic mass unit (chemical scale in which
O2 = 32 mi exactly) 1.660 X 10-2* g
Electronic rest mass 9.109 X 10-28 g
e Electronic charge 4.803 X 10-"> esu
= 1.602 X 10-1" coulomb
P = »mol« Faraday 2.893 X 10" esu/g mole= 9.649 X 10* coulombs/g mole
9 Acceleration due to gravity:
Approximate range over U.S.A. 979.0-980.9 cm/sec^
Assumed "standard" value 980.665 cm/sec^
* Source: Handbook 0/ Chemistry and Physics (Chemical Rubber Publishing Co,
1963), 44th ed.
,Cleveland
Item °C °K op °R
Boiling point of water* 100
-78.2-185.8-252.9-268.95-273.16
373.16
273.16
195.0
77.35
20.3
4.215
212
32
-108.7-320.5-423.2-452.10-459.69
671 69Melting point of ice*
Sublimation point of dry ice* ....
Boiling point of liquid Nj*Boiling point of liquid H2*Boiling point of liquid He*Absolute zero
491.69
351.0
139.2
36.5
7.59
At standard atmospheric pressure.
445
AUTHOR INDEX
Tho page numbers in italics are those of references at the ends of the chapters.
-^
Abbott, T. A., 140, 168
Ackley, J. W., 165-167, 1(>8
Addis, R. R., Jr., 312, 362
Alexander, P., 234, 27.3
Alpert, D., 99, 103, 104, 131, 342, 343,
362, 378, 388, 434, 436, 437
Biichler, W., 250, 252, 273, 289, 302,
430-432, 438
Backus, J., 133, 135
Bailey, B. M., 410-412, 437
Bancroft, G. H., 379, 380, 436
Barrington, A. E., 165-167, 168
Barry, E. J., 309, 311, 312, 362
Basalaeva, N., 365, 436
Batzer, T. H., 243, 272, 273, 347, 362,
371, 372, 375, 376, 381, 382, 436
Bayard, R. T., 99, 103, 104, 131, 388,
437
Beams, J. W., 212, 213, 218, 313
Beck, A. H., 118, 132
Becker, J. A., 89, 131
Becker, Wilh, 214, 215, 218
Bennett, W. H., 155, 168
Benson, J. M., 85, 86, 131
Bills, D. G., 107, 132
Biondi, M. A., 343-346, 362
Blears, J., 100, 131, 242, 273, 365, 436
Borovik, E. S., 431-434, 438
Bowie, R. M., 99-101, 131
Brackman, R. T., 424, 437
Briggs, W. F., 162-165, 168
Brisbane, A. D., 118, 132
Brubaker, W. M., 396, 437
Buckley, O. E., 95, 131
Burch, R. C, 268, 273
Buritz, R. S., 380, 381,436
Bush, William E., 328, 362
Busol, F. I., 432-434, 438
Carmichaol, J. H., 342-344, 362
Cartwright, C. Hawley, 341, 362
Chapman, S., 21, 2^
Charles, D., 145, 147-149, 168
Charpentier, D. E., 139, 142, 143, 167,
168
Chuan, R. L., 410-412, 437
Chupp, Warren W., 247, 273
Clausing, P., 51, 53, 54, 62
Cleveland, J. F. 285, 286, 302
Conner, R. J., 380, 381, 436
Crawley, D. .T., 230, 24.5-247, 258, 260,
264, 273
Davis, D. H., 52, .54-57, 61, 62, 306,
3.34, 335, 362
Davis, R. H., 388, 389, 437
Davis, W. D., 140, 141, 168
Dawton, R. H. V. M., 314, 362
Dayton, B. B., 99, 285, 294-296, 302,
354, 355, 360, 362, 363-365, 435
Degras, D. A., 424, 437
Dempster, A. J., 133, 167
Denison, D. R., 107, 132
Dennis, N. T. M., 241, 244-247, 271,
273
Divatia, A. S., 388, 389, 437
Dobrowolski, Z. C, 200, 218
Doughty, E. G., 140, 168
447
448 AUTHOR INDEX
Downing, J. R., 122, 132
Dubrovin, J., 68, 131
Dunlop, G. C, 83, 131
Dunoyer, L., 272
Dushman, Saul, 82, 83, 139, 211, 218,
227, 273, 364, 43G
East, H. G., 65, 131
Ehlbeck, H. W., 154, 156, 157, 168
Ehlers, H., 384, 437
Eklund, S., 212, 218Enskog, T>., 21, 22
Ettre, K., 399, 437
Farkass, I., 309, 311, 312, 362, 378, 436
Feaks, F., 129, 132
Fedorova, M. F., 428-430, 438
Fisher, K. J., 389, 437
Fite, W. L., 424, 437
Flecken, F. A., 364, 436
Florescu, N. A., 230, 233, 234, 261, 262,
273
Fondrk, V. V., 220, 223, 224, 272
Forbes, S. G., 324, 325, 362
Forsythe, W. E., 4
Foster, J. S., Jr., 386-388, 437
Francis, A. B., 165-167, 168, 396-398,
437
Frank, N. H., 16, 22
Gaede, W., 179, 205, 211, 218, 227, 230,
273
Gale, A. J., 391, 392, 403, 437
Garwin, E. L., 424, 438
Geller, R., 365, 436
Gerber, J. F., 317, 318, 362
Goerz, D. J., Jr., 373, 436
Good, W. M., 328, 362
Gould, C. L., 389, 390, 437
Green, C. B., 89, 131
Greer, E. J., 365, 436
Grishin, S. F., 431, 438
Grishina, E. I., 431, 438
Grobman, Jack, 421-424, 437
Grove, D. J., 374, 375, 379, 380, 436Guthrie, A., 133, 136, 138, 162, 167,
168, 309, 310, 362
Hablanian, M. H., 261-264, 273, 289,
302
Haefer, R. A., 102, 118, 131, 132
Hall, L. D., 393-395, 437
Hall, L. G., 142, 168
Hamilton, A. R., 87, 89, 131
Hasse, T., 83, 131
Hayashi, C., 364, 436
Hayward, Roger, 341, 362
Hobling, A., 150, 168, 364, 373, 374,
436
Heflinger, L. O., 424, 438
Hengevoss, J., 102, 131, 424, 425, 427,
438
Herb, R. G., 388, 389, 404, 437
Hickam, W. M., 375, 436
Hickey, J. S., 159, 168
Hickman, K. C. D., 64, 131, 243, 244,
263, 268, 269, 271, 273
Hippie, J. A., 139, 143, 167, 168
Ho, T. L., 240, 253, 273
Honig, R. H., 400, 437
Hustrulid, A., 140, 168
Ishii, H., 125, 127, 132
Jacobs, Robert B., 209, 218
Jaokel, R., 230, 237, 273
Jaycox, E. K., 99
Jepsen, R. L., 165-167, 168, 396-398,
437
Johnson, J. W., 328, 362
Jones, A. C., 162-165. 168
Kenna, R. A., 180, 218
Kennard, E. H., 78, 131, 231, 235, 273
Kennedy, P. B., 339, 340, 362
Kietzmann, B. E., 396-398, 437
Kingdon, K. H., 159, 168
Kinsella, J. J., 269, 273
Klages, G., 83, 131
Kleimenov, G. F., 405-408, 437
Klipping, G., 430-432, 438
Klopfer, A., HI, 112, 132
Klumb, H., 83, 131
Knox, F. A., 184, 218
Knudsen, M., 36, 44, 53-56, 60, 62, 62,
123, 132
AUTHOR INDEX 449
Kochnev, V. A., 405-408, 437Kovalenko, V. A., 432-434, 438Kraus, Th., 356-358, 362, 364, 435Kruger, Charles H., 215-217, 218Kuhn, H. J., 65, 131
Kurie, F. N. D., 323, 324, 362
Moll, J., 384, 437
Mongodin, G., 364, 436Moody, R. E., 153-155, 168Moore, R. W., Jr., 412-421, 437Morse, R. S., 99-101, 131
Lafferty, J. M., 107, 108, 110, 111, 132
Lampson, C. W., 98, 131
Landfors, A. A., 289, 302Lane, C. T., 83, 131
Lange, W. J., 342-344, 362Langmuir, I., 101, 131, 159, 168Latham, D., 241, 244, 271, 273Lauer, E. J., 106, 132
Lavender, R., 87, 88, 131
Lawrence, E. O., 386-388, 437
Lazarev, B. G., 428-430, 438LeBlanc, M., 219, 272Lech, J., 145-147, 151, 152, 168
Leek, J. H., vi, 67, 77, 87, 92, 94, 97-99,
113, 115, 123, 132, 283, 302LeRiche, R., 382-384, 436Levenson, L. L., 52, 54-57, 61, 62, 265,
273, 306, 334, 335, 345-347, 362Lichtman, D., 150, 168, 364, 373, 374,
436
Little, R. N., 324, 325, 362Lloyd, W. A., 395-397, 437
Loeb, L. B., 12, 14, 22
Loecherer, K. H., 154, 156, 157, 168
Loevinger, R., 138, 167
Lofgren, E. J., 386-388, 437
Lothrop, C. F., 165-167, 168
McFarland, R. H., 347, 362
McLeod, H., 69, 131
Mandel, P., 389, 390, 437
Mandoli, H., 165-167, 168
Marks, Lionel S., 4
Mascher, W., 430-432, 438
Mellen, G., 122, 132
Menshikov, M. I., 247, 259, 260, 273Metcalfe, R. A., 385, 437Mileshkin, A- G., 405-408, 437
Milleron, Norman, 52, 54-57, 61, 62,
265, 273, 301, 302, 306, 332-335,
34.5-347, 362, 366, 372, 402, 403, 408,
436, 437
Nakayama, K., 125, 127, 132Naundorf, C. H., 354-356, 360, 362Neef, W. S., Jr., 404Noher, H. Victor, 341, 362Nicollian, E. H., 149, 150, 168Nienhuis, K., 114, 132
Nier, A. O. C, 140, 167, 168Nightingale, J., 365, 436
Noeller, H. G. (see Noller, H. G.)
Nollcr, H. G., 202, 205, 218, 230, 237,
250, 252, 273, 289, 302, 364, 437
Normand, C. E., 253, 273
Northrop, D. L., 371, 436
Nottingham, W. B., 95, 96, 102, 107,
131, 132
Nyer, W. E., 324, 325, 362
Oatloy, C. W., 300, 302
Pauly, T., 389, 437
Pearson, G. L., 89, 131
Peck, A. W., 298, 302
Penning, F. M., 113-115, 132, 387, 437
Pensak, L., 312, 362
Perkins, G. D., 142, 143, 168
Peters, J. L., 141, 142, 168
Pinson, J. D., 298, 302
Pirani, M., 86, 131
Popp, E. C., 403, 408, 437
Post, R. F., 333
Power, B. D., 180, 218, 230, 241, 244-
247, 258, 259, 264, 271, 273, 375, 436
Pressey, D. C, 67, 131
Prevot, F., 364, 436
Rabinovich, I. S., 247, 259, 260, 273
Redhead, P. A., 68, 105, 118-122, 128,
129, 132, 154, 168
Reich, G., 101, 131, 157-159, 168, 250,
252, 273, 289, 302
Rhodin, T. N., 121, 132
450
Riddiford, L., 101, 131
Riddoch, A., 115, 132Ridenour, L. N., 98, 131Rivera, M., 382-384, 436Roberts, J. A., 162-165, 168Roberts, R. W., 315, 362Robinson, C. F., 142, 168Robson, F. C, 375, 436Roehrig, J. R., 126, 127, 132Romann, M. P., 77, 131Rovner, L. H., 121, 132Ruf, J., 154, 156, 157, 168Rufer, C. E., 288, 302Rutherford, S. L., 396-398, 437Ryan, J. F., 375, 376, 436
Santeler, D. J., 106, 129, 130, 132Saxon, D., 388, 437Schmidlin, F. W., 424, 438Schuemann, W. C, 104, 105, 73,2
Schuetze, H. J., 104, 131, 154, 156, 157,
168
Schwartz, C. M., 87, 88, 131Schwarz, Helmut, 118
Scott, Nancy J., 312, 362Shapiro, Ascher H., 215-217, 218Siegbahn, S., 211
Simmons, J. C, Jr., 126, 127, 132Simonov, V. A., 405-408, 437Slater, J. C, 16, 22
Smith, H. R., 260, 273, 339, 340, 362Smith, J. H., 272Smith, P. T., 93, 131
Sommer, H., 143, 168
Stoinherz, H. A., 261-263, 273Stevens, C. M., 140, 168Stevenson, D. L., 250, 253, 254, 265-
267, 273, 287, 302Stork, F., 104, 131
Strong, John, 341, 362, 370, 436Swartz, J. C, 389, 390, 437Sylvester, R. L., 186, 218
Tate, J. T., 93, 131
Taylor, A. R., 338, 362Thees, R., 203, 218Thomas, H. A., 139, 143, 167, 168
AUTHOR INDEX
Torney, F. L., Jr., 95, 96, 129, 131,
132, 160, 161, 168
Trabert, F. W., 385, 437
Trendelenburg, E. A., 424, 425, 427,
438
Trump, H. G., 83, 131
Ullman, J. R., 333, 334, 362, 371, 436
Vacca, R. H., 123, 132
Van Atta, C. M., 186, 195-198, 218,
371, 436
Van Atta, L. C, 371, 436
Van de Graaff, R. J., 371, 436Vanderschmidt, G. F., 378, 436
Vandershce, T. A., 140, 141, 168van Oostrom, A., 103, 131
Varadi, P. F., 368, 369, 399, 436, 437Vekshinsky, S. A., 247, 259, 260, 273Voego, W., 83, 131
Von Friesen, S., 211, 218von Zweck, T., 380, 381, 436
Wahl, J. S., 324, 325, 362Wakerling, R. K., 133, 136, 138, 162,
167, 168, 309, 310, 362Wallace, R. A., 145-147, 151, 152, 168Warnecke, R. J., Jr., 145, 147-149, 168Watson, W. R., 145-147, 151, 152, 168Webber, R. J., 83, 131
Weinhart, H. W., 99
Welton, R. D., 389, 437
White, W. H., 159, 168Whitford, Albert E., 341, 362Williams, C. E., 212, 213, 218, 313Williams, T. W., 139, 167Wilson, R. R., 313, 314, 362Winters, H. F., 107, 132
Winzenburger, E. A., 186, 189, 190, 218Wishart, J., 379, 380, 436
Worcester, W. G., 140, 168
Zaphiropoulos, R., 395-397, 437Ziock, K., 186, 218
SUBJECT INDEX
Absorption, definition of, 364pumping by ahimina, copper and
zeolite, 343-348, 398-400Accommodation coefficient, definition
of, 79
role, in Knudsen radiometer gauge,124
in thermal conductivity gauge,79-81
Adsorption, definition of, 364pumping by graphite at cryogenic
temperatures, 428-430Air, effective molecular weight of, 2
normal composition of, 411Alphatron gauge, 122Argon, instability in Vac Ion pumps,
396-398
normal content of air, 411Avogadro's law, 2, 4
Avogadro's number, 4
Backstreaming in diffusion pumps,257-268, 329
catalytic effect of materials of nozzle
assembly, 267dependence, on pressure, 263on shape of first-stage nozzle,
265-267effect on ultimate pressure, 257-268measurement of, 258, 261-264reduction by water-cooled cap over
first-stage nozzle, 259, 263role of jet from first-stage nozzle,
259-264Bayard-Alport ionization gauge, 103-
107
comparison, with conventional ion-
ization gauge, 103with hot cathode magnetron gauge,
109
Bayard-Alpert ionization gauge, errorsdue to accumulation of surfacecoating, 106
limits of operation, 103-105low temperature cathodes, 106nude gauge construction, 106principles of operation, 103pumping effects, 105reduced x-ray hmit, 103sensitivity, 103, 107(See also Ionization gauge, conven-
tional hot cathode type; Magnetronionization gauges; Penning dis-
charge gauge; Pressure gauges)Bellows seals (see Metal bellows)
Blears's effect, 100-102, 242, 297Boiling points of common gases, 409Boltzmann constant, 7
Booster diffusion pumps, 257Boyle's law, 1
Calibration of vacuum gauges, 124-128aperture method for ionization
gauges, 126-128McLeod gauge, as absolute standard,
124-126
error due to use of vapor trap, 72,
125, 127
Charles's and Gay-Lussac's law, 1
Chemisorption, definition, 364Collision cross section, 21
dependence, on molecular diameter,
21
on viscosity, 21
Compression ratio, for diffusion pumps,230-240
for mechanical booster (blower)
pumps, 185, 188, 199-201, 204for mechanical oil-sealed pumps, 171
for molecular drag pumps, 205-214
451
462 SUBJECT INDEX
Compression ratio, for molecular tur-
bine pumps, 217
Condensable vapors, accelerated re-
moval by high-temperature bake-out, 363-370
backstreaming, from diffusion
pumps, 258-268, 329from oil-sealed mechanical pumps,
174, 340
from steam ejectors, 227dominance of water vapor following
pumpdown, 137, 330-332effect, on performance of mechanical
oil-sealed pumps, 177-179, 351
on reading of McLeod gauge, 71
elimination from oil-sealed mechan-ical pumps, 179-185
vapor compression action of mechan-ical booster pumps, 204
vapor traps, absorption type, 341-348
refrigerated, 328-341Conductance, definition, 24, 58
general formulas, combined withpumping speed, 25, 58
conductances, in parallel, 26, 58in series, 25, 58
molecular flow pressure range,
43-51, 60-62
annulus between two concentric
tubes, 51, 62
aperture in thin wall, 47-49, 60
channel of rectangular cross
section, 50, 61
long tube of circular cross
section, 44-47
Monte Carlo calculation of, 51-
57
narrow slot with end correction,
51, 61
tube with end correction, 49,
60
summary of, 57-62transition pressure range, 15, 23,
36-43, 59
dependence on pressure, 37-43formula for long tube, 37, 41, 59limits of, 40-42
viscous flow pressure range, 26-30,
34-36, 58change in character due to
surface slip, 34
Conductance, general formulas, viscous
flow pressure range, formulafor long tube, 29, 58
pipe -size formula based onpressure drop, 30, 59
Conductance factors, Knudsen andClausing, 52-57
Cryo-adsorption, 421-424, 428-430Cryogenic pumping, 408-434
boiling points of common gases, 409combined, with catalytic process,
421-424
with mechanical pumping, 410-412
cryo-adsorption, 421-424
cryotrapping, 424-428
liquid-helium-cooled thimble trap,
400
pumping speed of cryogenic pumps,411-421
shielded liquid-helium-cooled con-
densers, 430-434theory of, 412-421
vapor pressure dependence on tem-perature, 409
Cryotrapping, 424-428
Diffusion pump working fluids, 240-249decomposition of organic, 242-245,
264mercury and organic, comparative
advantages, 244-249vapor pressures of, 240-244
Diffusion pumps, 227-272
backstreaming, 257-268, 329
Blears's effect, 100-102, 242, 297booster, 257
compression ratio, 230-240
ejector, oil vapor, 257
forepressure, limiting valvie of, 254-
257
fractionating, 268-271Ho coefficient, 248-250, 253modern types of, 227-229
principles of operation, 227-240
^ pumping speeds of, 240, 249-254,
293-302
with vapor trap, 240, 252
purging, 271
speed factor, 253, 272
ultimate pressure, 257-268working fluids, 240-249
SUBJECT INDEX 453
Displacement speed of mechanicalvacuum pumps, 172
Dubrovin gauge, 68
Elastomers, 307-316Electron volt, unit of energy, 91
Electronic charge, definition and value,
4
Emissivity, definition, 81
Evapor-ion pump, 388-391
Faraday, definition and value, 4Farvitron mass spectrometer, 157-159Forepressure limit of diffusion pumps,
254-257
dependence on design and operating
parameters, 255design compromises, 255limitation due to decomposition of
working fluid, 256process of jet breakdown, 254throughput dependence on, 256
booster diff'usion pumps, 257oil vapor ejector pumps, 257
Gas ballast, 179-183Gas flow, 14, 23-62, 277-291through a hole, 12, 47-49low pressure range, 43-57methods of measurement of, 277-291molecular flow, 14, 23, 43-57, 60Poiseuille's law, 26-30, 34-36Reynolds number, 31
transition pressure range, 15, 23,
36-43, 59
turbulent flow, 31-34viscous flow, 14, 23, 26-30, 34-36, 58
Gas law, general, 1-4
Boyle's law, 1
Charles's and Gay-Lussac's law, 1
Gases, boiling points of, 409general gas law, 1-4
ideal gas, deflnition, 2
molecular constitution of, 4molecular weights of, 2
molecules per unit volume, 5nature and behavior of, 1-22ratio of specific heats, y, 11, 220specific heats at constant pressure
and at constant volume, 11
Gases, universal gas constant, 3vapor pressures at low temperatures,
409velocity of sownd in, 11
Gaskets, elastomer, 307-316metal, 370-378O ring, 307-313, 315
Getter-ion pumps, 385-398Bayard-Alpert gauge pumping ac-
tion, 105, 388discharge in axial magnetic fleld,
386-388Evapor-ion pump, 388-391gettering and ionization processes,
391-393
leak detection application of, 165-167
pumping action of gas discharges,
386triode getter-ion pump, 396-398Vac Ion pump, 393-398
argon instability, 396hydrocarbon contamination, 394mechanism of operation, 394slotted cathode construction, 396-
398
triode getter-ion pump, 396-398Getter pumping, 401-408
deposition of reactive metals, 401-408
molybdenum, 402-404, 408nickel, 407titanium, 401-408zirconium, 402
pumping effectiveness as function of
temperature of coated surface,
406-408
Halogen leak detectors, 159-161, 162
Helium leak detectors {see Leakdetectors)
Ideal gas, deflnition, 2
Ionization of gases, 90-98
cross section for electrons, 93
ionization potential, 92
ionization probability, 93
Ionization gauge, conventional hot-
cathode type, 90-102
454 SUBJECT INDEX
Ionization gauge, conventional hot-
cathode type, alternative meth-ods of operation, 92
Blears's effect, 100-102, 242, 297cahbration of, 97, 125-128
cross section for ionization, 93
design of gauge tubes, 99-101
ionization process (see Ionization
of gases)
Nottingham x-ray limit, 102
nude gauge arrangement, 100-102outgassing of gauge elements, 101
parameters for various gaugetubes, 99
principles of operation, 90-94range of useful application, 97
regulated power supplies for, 98
sensitivity of, 95-99
simplified electrical circuit for, 94x-ray limit, 102
(See also Bayard-Alpert ionization
gauge; Magnetron ionization
gauges; Penning discharge
gauge)
Isentropic flow, 219-221, 278-282
Kelvin temperature scale, 2
Knudsen radiometer gauge, 123
accommodation coefficient, effect onsensitivity, 124
pressure range, 124
principles of operation, 122-124
Lambert's law of molecular emission,
52
Leak detection techniques, 161-167bubbles from air pressurizing, 162halide torch technique, 162halogen leak detector, 159-161mass spectrometer leak detection
methods, 164
Vac Ion pump current, 165-167variations in pressure gauge readings,
162-164
Leak detectors, halogen sensitive, 159-161
helium (see mass spectrometer typesof, below)
mass spectrometer types of, cyoloidal
focusing, 142Dempster 180 degree magnetic
deflection, 137-140
Leak detectors, mass spectrometer typesof, double magnetic fociising, 141
linear resonance accelerators, 152-
154
Nier 60° magnetic deflection,
140
omegatron, 149
Liquid nitrogen (LN), automatic level
control, 337
coolant, for absorption traps, 342,
347, 399
for coated getter surfaces, 404-
408, 435for vapor condensation traps, 330,
332
cryotrapping on LN-cooled surfaces,
424intermediate coolant from cryo-
pumping systems, 426-430, 432-
434
McLeod gauge, 69-78
calibration methods, 72
criterion for validity, 71
effect of condensable vapor onreading, 71
error, due to connecting tube, 73-75,
125
due to liquid-nitrogen-cooled trap,
72, 125, 127
methods of controlling mercurylevel, 75-77
primary standard for pressure meas-urement, 72
response formula, 70-72
scales, linear and quadratic, 71
multiple, 77
sensitivity, 72
Magnetron ionization gauges, cold
cathode inverted magnetron, 118-
120
cold-cathode magnetron, 120-122hot-cathode magnetron, 107-111
{See also Bayard-Alpert ionization
gauge; Ionization gauge, con-
ventional hot-cathode type;
Penr'ing discharge gauge; Pres-
sure gauges)
Manometers, diaphragm, 65-68
hquid, 63-65
(iS'ee also Pressure gauges)
SUBJECT INDEX 455
Mass flow, definition, 24relation to throughput, 24of steam ejectors, 223
Mass spectrometer leak detectors (see
Leak detectors)
Mass spectrometer vacuum analyzers,
133-159
magnetic deflection types, 133-143cycloidal focusing, 142
Dempster magnetic focusing, 133-140
Nier 60 degree deflection, 140Vanderslice 90 degree deflection,
140
resonance types, Farvitron, 157-159linear accelerator, 152-157omegatron, 143-152
Maxwell-Boltzmann distribution law,8-11
average molecular velocity, 9
most probable molecular velocity, 9root-mean square velocity, 7-10
Mean free path, 5, 13-15, 21, 23Measurement, of gas flow, 277-291
of gas pressure, partial, 133-159total, 63-128
of pumping speeds, 291-302Mechanical booster pumps (vacuum
blowers), 185-205
analysis of pumping performance,186-194
compression ratio, 185, 188, 199-201,204
net pumping speed, 187-190overheating of exhaust, 202pumping speed dependence on pres-
sure, 189, 193-202reverse flow or slip, 186-188vapor compressor action, 204
Mechanical oil-sealed pumps, 169-185compression ratio, 171
condensable vapor, effect on per-
formance, 177-179
methods of elimination, 179-185air stripping (Knox method), 184drop-out tank, 179
gas ballast, 179-183hot pump, 184inlet condensers and vapor traps,
184oil purification and circulation,
184
Mechanical oil-sealed pumps, functionsin vacuum systems, 358-360
oil, lubrication and sealing, 172operating features, 169-172pumping speed, 171-177, 291-293selection of sizes, 359stages, single and double, 171throughput, 175-178types, 169
Mechanical vacuum pumps, 169-218booster pumps (blowers), 185-205functions of various types, 169molecular-drag type, 205-214molecular turbine type, 214-218oil-sealed rotary types, 169-185
Metal bellows, 316for rotary motion seals, 317-318for translational motion seals, 316for valve-stem seals, 320-323
Metal gaskets, 370-378aluminum foil, 375-377copper bead, 372copper ridge, 373copper shear, 371flare seal, 374
knife-edge seals, 373soft metal ring, 370, 374reweldable flanges, 378
Molecular drag pumps, 205-214analysis of performance, 205-210performance of various designs, 211-
214
Molecular mean free path, 5, 13-15, 21,
23
derived in terms of molecular diam-eter, 13
relationship to viscosity of a gas, 21
role in determining character of gasflow, ''2, 23
Molecular tu.bine pump, 214-218Molecular weights, 2, 10
of various common gases, 2
Molecules, diameters of, 13-21
diatomic, 11
elastic sphere model of, 5-15ionization of, by electron impact,
90-94
masses of, 10
Maxwell-Boltzmann velocity distri-
bution of, 8-11
mean free path of, 5, 13-15, 21, 23
monatomic, 11
456 SUBJECT INDEX
Molecules, polyatomic,
velocities of, 7-1
1
Motion seals, 313-318
11
Nozzles, converging-diverging type,
219
critical pressure, 220
diffusion pump, 227-230, 265-267
isontropic flow, 219-221
mass flow through, 221
velocity of gas flow through, 220
O rings, 307-313, 315
Oil ejector pumps, 257
Omegatron, 143-152
argon vs. helium leak detection
sensitivity, 149
partial pressure analyzer, 150-152
principles of operation, 143-149
Orifices, calibrated, 278-282
critical gas flow through, 278-281
critical pressure for, 278, 280
mass gas flow through, 278,
280-282
standardized dimensions of, 280
subcritical gas flow through, 280,
282
Outgassing, bakeout procedures and
effectiveness, 365-370
effect on ionization gauge readings,
101
effect on pumpdown time, 351-358
quantity of gas released by metal
surfaces, 363-369
rate of gas evolution at roomtemperature, 365
Partial pressure gauges (see Mass
spectrometer vacuum analyzers)
Penning discharge gauge (PIG), 113-
118
erratic behavior of, 114-116
principles of operation, 113
useful pressure range, 114-118
Pipe sizes, selection of, for viscous flow,
30
Pirani pressure gauge {see Thermalconductivity pressure gauges)
Poiseuille's law, 26-30, 34-36
Pressure, gas, definition of, 1
dependence, on kinetic energy of
molecules, 5-8
on mass of gas, 2
on temperature, 1-3
on volume, 1-3
direction effects of nonisotropic
distribution, 129-131, 412-416
gauge pressure, definition, 63
kinetic theory of, 5-8
measurement, ambiguities at low
pressure, 124
partial, 63, 133, 250, 434
permanent, 18, 63
vapor pressure, 17, 71, 331, 409
Pressure drop formula for viscous flow,
30
Pressure gauges, 63-128
caUbration methods for, 124-128
Dubrovin, 68
ionization, 90-123
Alphatron, 122
cold-cathode types, 113-122
Haefer inverted magnetron,
118-120
Penning discharge, 113-118
Redhead magnetron, 120-122
hot-cathode types, 90-113
Klopfer magnetically collimated
electron beam gauge, 111-113
Lafferty hot-cathode magne-
tron, 107-111
{See also Bayard-Alpert ioniza-
tion gauge; Ionization gauge,
conventionalhot-cathode type)
Knudsen radiometer type, 123
McLeod, 69-78
manometer, diaphragm, 65-68
liquid, 63-65
partial {see Mass spectrometer vac-
uum analyzers)
thermal conductivity, 78-90
Pirani type {see Thermal con-
ductivity pressure gauges)
thermocouple type (see Thermal
conductivity pressure gauges)
Pumpdown factor for mechanical
pumDS, 349-351
Pumpdown time, 348-361
effect of outgassing, 351-358
factor F for mechanical pumps,
349-351
SUBJECT INDEX 457
Pumpdown time, formula for roughingdown system, 348-354
functional dependence at low pres-
sure, 354-358graphically determined from through-
put and load curves, 354-356system factors, 352-354
Pumping speed, deflnitions, for iso-
tropic molecular distribution,
23-25, 58, 274-277for nonisotropic molecular distri-
bution, 416-418methods of measurement, 291-302performance, adsorption pumps, 347
cryogenic pumps, 411-421diffusion pumps, 249-254Evapor-ion pumps, 390getter-ion pumps, 391-393mechanical booster (blower)
pumps, 189, 193-202mechanical oil-sealed pumps, 171-
177
molecular drag pumps, 212molecular turbine pumps, 218steam ejectors, 223-227Vac Ion pumps, 395vacuum systems, 26, 277, 360
resultant for pump combined with aconductance, 25, 58
units of, 24
Pumping speed factor for diffusion
pumps, 253
Pumps, vacuum, absorption, 398-400cryogenic, 408-434diffusion, 227-272diffusion booster, 257Evapor-ion, 388-391
getter-ion, 385-398mechanical booster (blower), 185-
205
mechanical oil-sealed rotary, 169-
185
molecular drag, 205-214
molecular turbine, 214-218oil vapor ejector, 257
steam ejector, 219-227Vac Ion, 393-398
Reynolds number, 31
Seals, elastomer, 307-318O-ring gaskets, 307-313, 315
Seals, elastomer, O-ring gaskets, coup-lings, quick connect, 309
groove designs for, 307-309guard ring with double seal, 309
properties of various elastomers,311-313
square-cross-section gaskets, 309Solvents, properties of, 304Sorption processes, absorption, 364
absorption pumping, 398-400adsorption, 364adsorption pumping, 428-430chemisorption, 364cryosorption, 421-424cryotrapping, 424-428desorption, 365-370
Specific heats of gases, 1
1
Standard conditions of temperatureand pressure, 3
Steam ejector pumps, 219-227backstreaming of water vapor, 227components of, 219
isentropic expansion and compres-sion, 219-221, 223
principles of operation, 219-223pumping speed of multistate units,
223-227stalling condition, 226steam consumption, 227
Stefan-Boltzmann law, 81
System factors for determining pump-down time, 352-354
Temperature, absolute scales, 2, 4
absolute zero of, 2
centigrade scale, 2, 4
dependence, of gas pressure on, 1-3
of vapor pressure at low tempera-ture, 409
Fahrenheit scale, 4
Kelvin scale, 2, 4
Rankine scale, 4
Thermal conductivity of gases, 78
free molecul' . conduction at low
pressure,, 78
for rarefied gases, 78
Thermal conductivity pressure gauges,
78-90
basic principles, 78-83
accommodation coefficient, 79-81
emissivity of gauge elements, 81
458 SUBJECT INDEX
Thermal conductivity pressure gauges,
basic principles, energy transfer
from heated element, 78
free molecular thermal conduction,
78
Stefan-Boltzmann law, 81
thermal conduction loss along
filament, 81-83
thermal conductivity of rarefied
gases, 78
Pirani gauge, 86-90
control circuits for, alternative, 87
pressure range of, 87
principles of operation of, 86
response curve vs. pressure, 89-91
thermistor type of, 87-91
thermocouple gauge, 83-86
compensation for ambient tem-
perature, 85
matched tubes, 84
multi-station control circuit, 85
principles of operation, 83
response curves for several gases, 83
Thermocouple gauge (see Thermalconductivity pressure gauges)
Throughput, curves for mechanical
vacuum pumps, 175-178
definition, 24, 57, 175
relation to mass flow, 24
system pumpdown time based upon,
354-356
Titanium, getter pumping by de-
position of, 401-408
vapor pressure vs. temperature, 405Transition pressure in gas flow, 39-41
Trap{s), absorption, 341-348, 398-400
absorption materials, 341-343
bakeout cycle, 342-345, 347
capacity for gases and vapors,
344-348
copper foil type, 342-344
stay-down times for, 342
effectiveness as a pump, 347,
398-400
liquid-nitrogen-cooled, 347
tray design, 344
ultimate pressure, 344-347
vapor, 328-341
automatic liquid nitrogen level
control, 337
conductance of baffle systems,
333 337
Traps, vapor, creep barrier for organic
fluids, 332, 367
exhaust baffles for diffusion pumps,340
forevacuum, 340-342
functions of, 328-330
inlet baffles for diffusion pumps,
240, 252, 329-339
mechanically refrigerated, 338-
340
performance of diffusion pumpwith, 240, 252, 335-337
surface migration of organic fluids,
332
temperatures for various applica-
tions, 244, 246, 329-331
thimble traps, 330-332
Turbulent flow, 31-34
occurrence in vacuum systems, 32-
34
Reynolds number, 31
Two-region vacuum systems, 382-385
Ultrahigh vacuum techniques, 363-435
absorption pumping, 398-400
bakeable valves, 378-382
bakeout procedures, 364-370
cryogenic pumping, 408-434
getter-ion pumps, 385-398
liquid-helium-cooled thimble trap,
400metal gaskets, 370-378
reactive metal deposition, 401—408
surface phenomena, dominance of,
363-370
system design, 434
two-region vacuum systems, 382-385
Universal gas constant, 3
value of, in various systems of units,
4
Vac Ion pump, 393-398
Vacuum components, criteria for selec-
tion, 358-361
diffusion pumps, 360
mechanical pumps, 358-360
pressure gauges, 361
valves, 361
Vacuum gauges (see Pressure gauges)
SUBJECT INDEX459
Vacuum pumps, mechanical, 169-218
vapor-jet, 219-272Vacuum vessels, 303-307
cleaning of interior surfaces, 304
external pressure requirement, 303
finish of interior surfaces, 304
leak hunting, 161-167, 307
materials of construction, 303
pumping ports, criterion for, 306
solvents, properties of, 304
virtual leaks, avoidance of, 306
welding specifications, 305
Valves, vacuum, 318-328, 378-382
bakeable, 378-382functions of, in vacuum systems,
319
gate, 323-328
butterfly type, 324-326disk typos, 325, 327
modified plumbing types, 323sliding plate typos, 324-326
globe, 318-323
bellows sealed types, 318, 320-
323
diaphragm sealed type, 320
elastomer sealed types, 318
needle type, for control of gas
flow, 325, 328
Van dor Waals' equation of state, 15-18
change of phase (liquid, vapor andgas), 17
critical pressure, temperature andvolume, 16
permanent gas, definition of, 18
triple point, 16
\'an dor Waals' constants, 17
Vapor baffles and traps, 328-341
Vapor pressure, of gases at lowtemperatures, 409
of water vs. temperature, 331
Velocities of gas molecules, 7-11average, 9, li
Maxwell-Boltzmann distribution of,
most probable, 9, 10root mean square, 7, 9, nsound velocity, relation to, 11
Viscous fiow, 14, 23, 26-30, 34-36correction to Poiseuille's law, 34-36drag, coefficient of, 35Poiseuille's law, 26-30, 34-36pressure drop formula, 30selection of pipe sizes for, 30slip, coefficient of, 34
Volumetric efficiency of mechanicalvacuum pumps, 172
Water \'apor, contamination of oil-
sealod mechanical pumps, 177-179dominant component gas following
pumpdown, 133, 330-332, 364effectiveness of thimble trap in
pumping, 330-332elimination from oil-sealed mechan-
ical pumps (see Mechanicalvacuum pumps)
steam ejectors, attainable watervapor pressure, 223-225
backstreaming in, 227
vapor pressure as function of tem-perature, 331
Zeolite, absorbent material for vaportraps, at room temperature, 343-
347
refrigerated, 347, 398-400
effectiveness in absorbing various
gases, 344-347, 399
quantity of vapor and gas evolved
during bakeout, 345
t- (continued from front flap)
Other special features include a
thorough treatment of the ultrahigh vac-
uum development, and a discussion of
methods of pumping by the use of vapor
deposition of active metals.
Here is unique, comprehensive, and
authoritative coverage of vacuum sys-
tems, their components, operation, and
design—a book which enables the reader
to solve practical problems associated
Vifith every aspect of vacuum technology.
About the AuthorSince 1935, Dr. C. M. Van Atta has
been involved with physical apparatus
requiring larger than normal vacuumsystems. Since 1937, he has acted as
consultant in vacuum technology to in-
dustrial firms and has been actively en-
gaged in the new-product development
effort of the Kinney Vacuum Division of
The NewYorkAir Brake Company.His experience includes teaching and
research at MIT; applied physics re-
search at the Naval Ordnance Labora-
tory, Washington, D.C.; research and de-
velopment on electromagnetic separa-
tion ofthe isotopes of uranium. University
of California, Lawrence Radiation Labora-
tory; Chairman of the Division of the
Physical Sciences and Mathematics and
Supervisor of Physics Research, Uni-
versity of Southern California; develop-
ment of high-current particle accelera-
tors and controlled thermonuclear
research. University of California,
Lawrence Radiation Laboratory, Berke-
ley and Livermore, California.
' A comprehensive guide to the
modern theories, instruments, and uses of
high vacuum
FUNDAMENTALS OFVACUUM SCIENCEAND TECHNOLOGY
By GERHARD LEWIN
Plasma Physics Laboratory, Princeton University
248 pages. 6x9. 104 illustrations
Designed for the man whose work requires a
practical knowledge of vacuum technology, this
- unique reference fully explains pertinent kinetic
" theory equations . . . gas flow . . . surface effects ...
punnping processes . . .measurements . . . com-
ponents ... and design calculations.
The book critically evaluates all basic vacuum
systems — helps you select the most efficient
equipment for your specif ic purposes— and guides
you in the actual design of special equipment.
Filled with facts, figures, tables, charts, and
diagrams, this helpful book provides a complete
graphic analysis of high vacuum as a working tech-
nological tool.
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