2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of...

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2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology

Transcript of 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of...

Page 1: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

2. VLSI Basic

Hiroaki Kunieda

Dept. of Communication and Integrated Systems

Tokyo Institute of Technology

Page 2: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Logic Design Logic Verification

System Verification

Layout Design

System Design

Layout Verification

Specification

RTL

Netlist

Mask DataTest Data

VLSI Design with Verification

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1.3 Logic Gate

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Logic Gate

Class

Static Logic

CMOS Logic

Pseudo NMOS Logic

NMOS Logic

Dynamic Logic CMOS Domino Logic

Characteristics

Logic Delay

Rise Time

Fall Time

Fan-in/ Fan-out

Power Consumption

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[Completeness]•Function {|}=NAND function: complete

•1: a|(a|a) = a|a’ = 1•0: {a|(a|a}|{a|(a|a)} = 1|1 = 0.•a’: a|a = a’.•ab: (a|b)|(a|b) = ab•a+b: (a|a)|(b|b) = a’|b’=a+b

•NOR function: complete•AND and OR function: not complete

[Irredundant] no literal can be removed. redundant Ab+ab’=a

Logic Theory

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Data sheet for 45nm Process

Parameter Symbols Data

Oxide Thickness Tox 1.3 (1.7) nm

Unit MOS Capacitor Cox 15.67 fF/um2

Gate Capacitor (W=250nm, L=25nm)

Cg 0.160 fF

Sheet registance Rsheet 875 Ω/□

Relative permittivity εr 2.3

Vacuum permittivity ε0 8.85418782 pF/m

NMOS On current ( L=35nm) Ion(n) 1360uA/um

PMOS Off current (L=35nm) Ion(p) 1070uA/um

Off leak current (L=35nm) Ioff 100nA/um

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Data sheet for 45nm Process

Parameter Symbols Data

Power Supply Voltage VDD 1.0 V

Gain factor K 7.81 uA/V2

Threshold voltage Vth 0.4 V

Gate delay Tau 10 psec

Unit on resistor (L=35nm) Ro 220.6 Ω-um

Unit Capacitor (L=35nm) Co 45.3 fF/um

Wire R Rline 500 Ω/mm

Wire C Cline 300 fF/mm

#layer for wire #layer 12

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“MOS” : sandwich structure of Metal, Oxide, and Silicon (semiconductor substrate).

The positive voltage on the polysilicon forms gate attracts the electron at the top of the channel.

The threshold voltage (Vt) collects enough electrons at the channel boundary to form an inversion layer (p -> n).

MOS   

Gate Oxide

Field Oxide

Page 9: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Cg: gate capacitance= 0.9fF/μm2 (2 μprocess)

Cgs/Cgd: source/drain overlap capacitance=Cox W (Cox: gate/bulk overlap capacitance)

Transistor Parasitics

Page 10: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Linear region

Saturated region

])[('2

1 2tgsd VV

L

WkI

]2

1)[(' dsdstgsd VVVV

L

WkI 2

A Simple Transistor Model

tgsds VVV

tgsds VVV

nMOS transistor become on by applying high voltage to gate to provide current.

pMOS transistor becomes on by applying low voltage to gate to provide current

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Static Complementary Gates

Pullup network (pMOS)

•output is connected to VDD

Pulldown network (nMOS)

•Output is connected to VSS

VDD

VSS

Ro/W

CoW

CoW

Ro/W

Pull up Pull down

Page 12: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Vin-Vout DC Characteristics

VIL

VIHVOL

VOHNoise Margin

NML = VIL-VOL

NMH = VOH-VIH

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Pullup network (pMOS)•output is connected to VDD when ab=0.

Pulldown network (nMOS)•Output is connected to VSS when ab=1.

VDD

VSS

CMOS NAND & NOR

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Relation between nMOS and pMOS

Dual graph

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And Or Inverter (AOI) gate(ab+c)’

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Adderssi =aibici =(aibi)ci = Pici

ci+1=aici+bici+aibi=(aibi)ci+aibi =Pici+Gi

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1.3 Gate Delay and Wire Delay

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Gate Delay (delay model)

   

Let’s suppose that Wp = 2 Wn which makes the same pull up and pull down current with ON-resistance of,

Ro/W where Ro is the resistance per unit width. (ex. 200 Ωum )

Load capacitance consisting of drain junction capacitance is corresponded by the area of the drain such as

CoWwhere Co is the capacitance per unit width (ex. 50 fF/um)

Input capacitance is also represented byCoW

L=35 nm=0.035 um (45nm)

Either oneBecomes

On.

CoWCoW

Ro/ W

Ro/ W

Page 19: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Gate Delay

   

Gate Delay(W=0.35um, L=0.035um)

= (Ro/W) x (CoW)

= Ro Co

= 200 Ωum  x  50 pF/um

= 10 psec

Pull up current is represented by VDD/Ron(p).Pull down current is represented by VDD/Ron(n)

Ro/W

CoW

CoW

Ro/W

Pull up Pull down

Pull up/down currents are represented by ON resistance,which are reversely corresponded by the channel width W.

Either oneBecomes

On.

CoWCoW

Ro/ W

Ro/ W

Page 20: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

2 stage gates without load

The first term represents the delay of the 1st stage, where the output charge and the input charge of the 2nd stage is pull up or down by the current driven by the 1st gate. Both charge and current corresponds to the size or the channel width w.

The second term represents the delay of the 2nd stage. Without any load to the gates, the delay becomes identical to, which depends on the process.

Delay = 1st stage delay + 2nd stage delay = (Ro/W1) (CoW1+CoW2) + (Ro/W2)(CoW2) = RoCo (2+W2/W1) = 10 psec x 3 = 30 psec

Either oneBecomes

On.

CoW1

CoW1

Ro/ W1

Ro/ W1

Either oneBecomes

On.

CoW2

CoW2

Ro/ W2

Ro/ W2

Page 21: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

2 stage gates with load

Load Capacitance is total sum of input capacitance CoWload

Delay = 1st stage delay + 2nd stage delay = (Ro/W1) (CoW1+CoW2) + (Ro/W2)(CoW2+CoWload) = RoCo (2+W2/W1+Wload/W2)

Case 1. W2=W1, Load=10W1Delay = 10 psec (2+1+10) = 130.0 psec

Case 2. W2=3W1, Load=10W1Delay = 10 psec (2+3+3.33) =83.3 psec

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Delta1=r1 x (C1+---+Cn) =n t c

Delta2=r2 x (C2+----+Cn) =(n-1) t c

DeltaN=rn x Cn = t c

total=Delta1+ ----- + DeltaN =[n(n+1)/2] t c

Wires DelayElmore Delay Model

Page 23: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Wire Delay

Rline=2.0 Ω-umCline=0.3 fF/umRo=200 Ω*umCo= 50 fF/um

W1=W2=0.35uLine=2N um

Delay=(R0/W1) (CoW1+CoW2+ClineLine) +(RlineLine) (CoW2+(Cline/2)Line) =200 x ( 2x50f + 2xN)+2 x (10f+0.5N) = 50 nsec + 26*N nsec (line =2xN um)

Delay = Ro/W1 (CoW1+CoW2) =2.5K x 20fF =50.0 nsec (line=0)

Page 24: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Wire Delay

Rline=500 Ω/umCline=300 fF/umRo=25 kΩ*umCo=0.5 fF/um

W1=W2=0.35uLine=0.5um

Delay=(R0/W1) (CoW1+CoW2+ClineLine) +(Ro/W1+RlineLine) (CoW2+(Cline/2)Line) =50K x ( 0.5 f + 50K x (0.25+0.125) = 37.5 nsec + 18.8 nsec =56.3 nsec (line =0.5 um)

Delay = Ro/W1 (CoW1+CoW2) =50K x 0.5fF =25 nsec (line=0)

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1.4 Flipflop and Memory

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Switch Logic

Logic 0 transfer

Logic 1 transfer

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Latch

Charge sharing: the stored data of A is connected to the latch’s output. Additionalbuffer may be required to drive output load.

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Clocked Inverter

tristate inverter produces restored output or Hi-Impedance Z

Used as latch circuit

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Latch

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D Flip-flop Operation

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31ACSEL Lab University of

California, Davis

Scan in DFF

Functional Schematic of DFF with Scan

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Memory Structure

Read-Only Memory (ROM)Random Access Memory (RAM)

Static RAM (SRAM)Dynamic RAM (DRAM)

Page 33: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Static RAM Cell

•Read•Precharge bit and bit’•Asert Select line

•Write•Bit and bit’ lines are set to desired values.•Select is set to 1.

Page 34: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Write set bit line

Read

Precharge firstly bit line

Activate word line

RAM  Cell

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1.5 Data Path and Control Circuit

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Data Path 1

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Control Sequential Logic Circuit

Page 39: 2. VLSI Basic Hiroaki Kunieda Dept. of Communication and Integrated Systems Tokyo Institute of Technology.

Data Path 2

0 1 2 3 4 5 6 7

BUS DA1 DB1 * DC1 DA2 DB2 * DC2

LoadA 1 0 0 0 1 0 0 0

RegA * DA1 DA1 DA1 DA1 DA2 DA2 DA2

LoadB 0 1 0 0 0 1 0 0

RegB * * DB1 DB1 DB1 DB1 DB2 DB2

LoadC 0 0 1 0 0 0 1 0

RegC * * * DC1 DC1 DC1 DC1 DC2

During Clk=2, adder operation must be completed within 1 clock.

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1.6 Design and Verification