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Transcript of 10 sinton sinton instruments
Characterization Issues for Bifacial Solar Cells
Ronald A. Sinton Sinton Instruments, Inc., Boulder, Colorado USA
Characterization of bifacial solar cells.
-Device Physics and IV-curves-Low-efficiency vs. high-efficiency-Complex IV-curve interpretation-2D Effects: So-called “electrical shading”-Passivation stability (Al BSF was stable, opaque, and eff limiting)
-Measurement Strategies-Ambiguous Voltage: Bifacial cells have shadow loss due to
2
-Ambiguous Voltage: Bifacial cells have shadow loss due to back metalization. Therefore metal is minimized.-Small contact pads at high current densities-Cheating
-Capacitance issues for high-efficiency and n-type solar cells
NASA Helios goes to 96863 ft (29.7 km) on Bifacial Solar Cells
Oops!
Bummer
SunPower Backside-Contact Bifacial Cells
Reduced metalization fraction on back reduces front efficiency.
Zhou, Verlinden, Crane, Swanson, Sinton PVSC 1997.
Differences Between Traditional &High-Efficiency-Bifacial CellsHigh-Efficiency-Bifacial Cells
Classic Al BSF Production Solar Cell
heavy n+ diffusion (40 ohms/sq)
Fully 1DIdeality factor = 1, enforced by Al BSF and heavy n+ diffusion
[ ] ( )( )[ ]2,,
i
Abackoefrontoe
bulkGen
n
npNJJ
nqWJJ
∆∆++−∆−=τ
Al BSF
Classic Al BSF Production Solar Cell
heavy n+ diffusion (40 ohms/sq)
Al BSF
Fully 1D !
Ideality factor = 1, enforced by Al BSF and heavy n+ diffusion
Lsh
ssJ
R
IRV
kT
IRVqJJ −−+
−
−= )(1
)(exp0
One-diode model!
Suns-Voc Curves, Al BSF
0,02
0,03
0,04
Cu
rre
nt
De
nsi
ty (
A/c
m2) FZ (n=1)
5 x 1011 cm-3 Fe
0
0,01
0,0 0,2 0,4 0,6
Cu
rre
nt
De
nsi
ty (
A/c
m
Voltage (V)
B:O CZ
1.6 ohm-cm p-type substrate, 250 µm thick
Prototypical Bifacial Point-Contact Cell
Light n+ diffusion (120 ohms/sq), with nitride passivation, selective emitter
Ideality factor = ?
[ ] ( )( )[ ]2,,
i
Abackoefrontoe
bulkGen
n
npNJJ
nqWJJ
∆∆++−∆−=τ
Al2O3 with light B diffusion, selective emitter
Suns-Voc Curves, Passivated Backside
0,015
0,02
0,025
0,03
0,035
0,04
Cu
rre
nt
De
nsi
ty (
A/c
m2)
FZ
Fe
0
0,005
0,01
0 0,2 0,4 0,6
Cu
rre
nt
De
nsi
ty (
A/c
m
Voltage (V)
B:O CZ
Lsh
ssJ
R
IRV
nkT
IRVqJJ −−+
−
−= )(1
)(exp0
Completely General Analysis (Good Physics)
Parameters
Eff pEff
Jsc
Jmp
Voc
Vmp Voc (0.1 sun)Vmp Voc (0.1 sun)
FF pFF
Rs Rs
Rsh
Suns-Voc curve
Injection-dependence: Both Bulk and Surface
Injection dependence needs to be taken into account.
This has been pointed out many times:
Fe:B (Macdonald PIP 2000)B:O (Bothe 2006)Al2O3 vs. SiNx (Schmidt EPSEC 2008)Highly-injected substratesHighly-injected substrates
1-diode or 2-diode models almost never apply real-world solar cells. It is best to avoid forcing data into inappropriate models.
Suns-Voc analysis automatically incorporates the full injection dependence.
Passivation stability
Both front and back surface passivations need:Both front and back surface passivations need:-UV stability-Temperature/humidity stability
To be measured in a flash tester:-Light-soaking, time-dependent effects need to be absent or characterized (Fe, B:O, passivation charging*)
*Seiffe et al, JAP 109 064505 2011
2D Effects: N-type IBC Cell
Light n+ diffusion (200 ohms/sq), with nitride passivation
Ideality factor = ? 2D, 3D effects, high-level injection.
[ ] ( )( )[ ]2,,
i
Dbackoefrontoe
bulkGen
n
nnNJJ
nqWJJ
∆∆++−∆−=τ
Light IV vs. Suns-Voc vs. Dark IV
Follow the holes at V = Vmp: (for example 620 mV)
Light IV
Suns-Voc
Dark IV
Dark IV weights the shortest current path between electrodes. May be irrelevant.+-
Light IV vs. Suns-Voc vs. Dark IV
Follow the holes at V = Vmp: (for example 620 mV)
Light IV
Suns-Voc
Dark IV
Dark IV weights the shortest current path between electrodes. May be irrelevant.+-
Shading
n+nn+ n+np+n+nn+ n+np+
“Electrical Shading” ???
n+nn+ n+np+
V
n+nn+ n+np+
“Shadow-like losses” Dross et al. 2005“Shading effects” Hermle et al. 2008“Electrical Shading” Granek 2010
So-Called Electrical Shading: Diagram at Short Circuit
n+nn+ n+np+
0,04
Pile-up of holes due to 2-D current crowding
Local implied Voc of 625 mV, even at short circuit!
0
0,005
0,01
0,015
0,02
0,025
0,03
0,035
0 0,2 0,4 0,6
Cu
rre
nt
De
nsi
ty (
A/c
m2)
Voltage (V)
-Distance from junction-Current crowding-High local voltage (pn product)-Recombination loss
Shading is not a good physical analogy.
n-type, 3e15 cm-2 doping, 1- mm n-type stripes, 180-µm thick wafer
So-Called Electrical Shading: Diagram at Short Circuit
n+nn+ n+np+
Pile-up of holes due to 2-D current crowding
Local implied Voc of 625 mV, even at short circuit!
Stranded regions?Stranded regions?Carrier-diffusion bottlenecks?High-voltage islands?Carrier diffusion constriction?Lateral carrier-collection bottlenecks?
Seitliche Überschüssigeladungsträgerdichte Samlung Engpässe?
Measurement Challenges
Cells with Contact Pads, High Current Per Pad
SunPower A-300 specification sheet, circa 2003.
Multi-busbar cells have ambiguous voltage prior to interconnection
-Cu ribbons are an essential part of the cell metalization
-Bifacial cells need minimal metalization shadowing (on back)
-Trends to minimize Ag also lead in this direction
-Less metal means higher series-resistance losses:-ambiguous “cell voltage”.-ambiguous “cell voltage”.
-New designs sometimes lack redundant metalization connections-Almost-isolated cells in parallel, prior to ribbon connection.
The cell voltage of cell without ribbons can vary widely across the cell. Be careful!
Strategy: Pull fixed current from each pin
This makes the result independent of pin and harness resistance, and balances both the current and voltage on the cell.
Su
I-I+
Place the voltage pin close, but not too close to the current pin.
In more complex designs, engineer the measurement so that the current from each pin is proportional to the area of the cell that it “drains”. This is generally a good emulation of what will happen for the cell with interconnects.
Voltage pins can be averaged, or usually one is enough if you have enforced a single operating point across the cell.
Size of future metal tab
Current PinVoltage Pin
Measuring Short-circuit current with no shadow? Is it valid?
This seems likely to lead to “cheating”:
Designing cells to test high prior to interconnect.This leads to disappointing results at the module level.
Also, in standard measurements, placement of voltage probes can be used to “optimize” the FF.
Capacitance
High efficiency cells, especially n-type, are difficult to measure with flash testers.
Ramp-rate Artifacts
Hypothetical 720mV 200 µµµµm Silicon CellIV Curves for Different Ramp Rates
0.03
0.035
0.04
0.045
Steady State100 ms50 ms20 ms10 ms5 ms2 ms
Voltage Ramp Rates
0.6
0.7
0.8
50 20 105
0
0.005
0.01
0.015
0.02
0.025
0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8
0
0.1
0.2
0.3
0.4
0.5
0.6
0 20 40 60 80 100Time (ms)
Vol
tage
per
Cel
l
100 ms ramprate
High-Efficiency n-type Cells: 100X Higher Capacitance!
SunPower,Sanyo HIT
Junction Voltage (mV)
Conventional Devices
Brute-Force Works, Use 200+ ms, or 1mV/ms Ramp
Hypothetical 720mV 200 µµµµm Silicon CellIV Curves for Different Ramp Rates
0.025
0.03
0.035
0.04
0.045
Steady State100 ms50 ms20 ms10 ms5 ms2 ms
Voltage Ramp Rates
0.6
0.7
0.8
Vol
tage
per
Cel
l
50 20 105
0
0.005
0.01
0.015
0.02
0.025
0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8
0
0.1
0.2
0.3
0.4
0.5
0 20 40 60 80 100Time (ms)
Vol
tage
per
Cel
l
100 ms ramprate
Novel Approach to Neutralize Capacitance Artifacts
Intensity and Module Voltage vs Time
1.5
2.0
2.5
Ligh
t Int
ensi
ty (
suns
)
50.0
52.0
54.0
56.0
58.0
60.0
Mod
ule
Vol
tage
(V
)
0.0
0.5
1.0
0.0000 0.0020 0.0040 0.0060 0.0080Time (s)
Ligh
t Int
ensi
ty (
suns
)
40.0
42.0
44.0
46.0
48.0
50.0
Mod
ule
Vol
tage
(V
)
Sinton, De Ceuster, Wilson, Barbosa, EPSEC, Barcelona 2005 US patents 7309850 (2007), 7696461 (2010).
Short Pulses
Intensity vs Time
2.0
2.5
3.0
3.5
Ligh
t Int
ensi
ty (
suns
)
1/4
0.0
0.5
1.0
1.5
0.000 0.002 0.004 0.006 0.008Time (s)
Ligh
t Int
ensi
ty (
suns
)
1/2
Full
Capacitance Artifacts in Solar Cell IV Curves.
6
8
10
12
14
16
Err
or in
Pow
er M
easu
rem
ent (
%) Terminal Voltage = Vmp
NEW METHOD: V = Constant - (K*current)
1/2
1/4
0
2
4
6
- 180 suns/sec - 340 suns/sec - 660 suns/sec
Light pulse slew rate at One Sun
Err
or in
Pow
er M
easu
rem
ent (
%)
Full pulse
1/2
0.2%0.1%
Use Engineered Cell Measurements: Only Module Eff Counts
Cell Measurements are NOT comparable between labs, unless you duplicate thethe chuck, the current and voltage probe placements, and other details.
FF matching between labs is difficult. Naked cells have ambiguous voltages.
Know what you are (and are not) measuring. (Cell design and device physics)
Pull the cell down to a conducting chuck? -information is lost about lateral back metalization conductance.
Spectrum:-Class A does not solve all issues.
-900-1100 band (light trapping)-300-400 band (EVA vs. Silicone, glass quality, selective emitters)-measurements on naked cells do not see AR, texture, encapsulant effects.
It is best to understand your cells, and use detailed spectral response to optimize current from the cell. A simulator is a crude instrument for this optimization.
Target measurements to determine the critical parameters.
Conclusions
Characterization issues for Bifacial Cells.
-Pay attention to 2-D effects and the injection dependence of substrates
and surface passivations. Be wary of ideal-diode curve fits.
-Bifaciality requires a compromise between metalization shadowing and
series resistance
-ambiguous voltages during measurement!
39
-High-efficiency cells can have capacitance artifacts during measurements
-especially n-type.
-Use an engineered approach to cell measurement. Know your cells, what
you are measuring, control the measurement, and avoid the temptation to
cheat, (since this will only cause disappointment at the module level).
This work was supported by the customers of Sinton
Instruments that are so kind as to buy stuff
Special thanks for Keith Forsyth and Adrienne Blum at Sinton
Instruments.