1 Lecture 12 The cooperative relaxation of water at the pore surface of silica glasses.
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Transcript of 1 Lecture 12 The cooperative relaxation of water at the pore surface of silica glasses.
1
Lecture 12Lecture 12
The cooperative relaxation of water at the pore surface of silica glasses The cooperative relaxation of water at the pore surface of silica glasses
2
Complex systems? Complex systems? Complex systems involve the appearance of a new Complex systems involve the appearance of a new ("mesoscopic") length scale, intermediate between ("mesoscopic") length scale, intermediate between
molecular and macroscopic.molecular and macroscopic.
Complex systems? Complex systems? Complex systems involve the appearance of a new Complex systems involve the appearance of a new ("mesoscopic") length scale, intermediate between ("mesoscopic") length scale, intermediate between
molecular and macroscopic.molecular and macroscopic.
Complex liquids (microemulsions, Complex liquids (microemulsions, emulsions, organic particulate systems )emulsions, organic particulate systems )
Glass forming liquids and polymers.Glass forming liquids and polymers.
Porous materials (sol-gel glasses, porous Porous materials (sol-gel glasses, porous glasses, porous silicon, etc.)glasses, porous silicon, etc.)
Biological systems ( protein solutions, Biological systems ( protein solutions, membranes and cell suspensions)membranes and cell suspensions)
Complex liquids (microemulsions, Complex liquids (microemulsions, emulsions, organic particulate systems )emulsions, organic particulate systems )
Glass forming liquids and polymers.Glass forming liquids and polymers.
Porous materials (sol-gel glasses, porous Porous materials (sol-gel glasses, porous glasses, porous silicon, etc.)glasses, porous silicon, etc.)
Biological systems ( protein solutions, Biological systems ( protein solutions, membranes and cell suspensions)membranes and cell suspensions)
3
Initial sodium borosilicate glass of the following composition (% by weight): 62.6% SiO2, 30.4% B2O3, 7%Na2O
Initial sodium borosilicate glass of the following composition (% by weight): 62.6% SiO2, 30.4% B2O3, 7%Na2O
heat treatment at 650heat treatment at 65000C for 100hC for 100hheat treatment at 490heat treatment at 49000C for 165hC for 165himmersion in deionised waterimmersion in deionised water
0.5N HCL0.5N HCL
drying at 200drying at 20000CCrinsing in deionized waterrinsing in deionized water
additional treatment in 0.5N KOHadditional treatment in 0.5N KOH
drdryying at 200ing at 20000CCrinsing in deionized waterrinsing in deionized water
Porous borosilicate glass samplesPorous borosilicate glass samplesPorous borosilicate glass samplesPorous borosilicate glass samples
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additional treatment in 0.5M KOHadditional treatment in 0.5M KOH
dryingdryingrinsing in deionized waterrinsing in deionized water
dryingdrying
bithermal heat treatment bithermal heat treatment treatment at 650 treatment at 650 00C and at C and at 5530 30 00CCthermal treatment at 530thermal treatment at 53000CC
immersion in deionised waterimmersion in deionised water3M HCL3M HCL
rinsing in deionized waterrinsing in deionized water
Commercial alkali borosilicate glass DV1 of the following composition (mol.%):
7% Na2O, 23% B2O3, 70% SiO2
Commercial alkali borosilicate glass DV1 of the following composition (mol.%):
7% Na2O, 23% B2O3, 70% SiO2
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SamplesPorosity ,
%Pore diameter,
nmPresence of
silica-gelHumidity h,
%
A 38 40-70 With 1.2
B 48 40-70 Very Small 1.4
C 38 280-400 Small 3.2
D 50 300 Very Small 1.6
I 26.5 5.4 With 3.6
II 42.5 88 No 0.63
III 25.5 11 With 3.39
SamplesPorosity ,
%Pore diameter,
nmPresence of
silica-gelHumidity h,
%
A 38 40-70 With 1.2
B 48 40-70 Very Small 1.4
C 38 280-400 Small 3.2
D 50 300 Very Small 1.6
I 26.5 5.4 With 3.6
II 42.5 88 No 0.63
III 25.5 11 With 3.39
Structure parameters and water contentStructure parameters and water content
10-4
10-2
100
102
Per
mitt
ivity
'' []
10-4
10-2
100
102
Per
mitt
ivity
'' []
Sample CSample C Sample CSample C Sample C after heating Sample C after heating Sample C after heating Sample C after heating
Dielectric response of the porous glass materials Dielectric response of the porous glass materials
7
10-4
10-3
10-2
10-1
100
101
102
Perm
ittivi
ty'' [
]
10-4
10-2
100
102
Pe
rmitt
ivity
'' []
3-D PLOTS OF THE DIELECTRIC LOSSES 3-D PLOTS OF THE DIELECTRIC LOSSES FOR THE POROUS GLASS MATERIALSFOR THE POROUS GLASS MATERIALS
Sample CSample C
Sample IISample II
8
-100 0 100 200 300
0
20
40
60
80
100
'
Temperature ( 0C )
-100 0 100 200 300
0
20
40
60
80
100
'
Temperature ( 0C )
-100 0 100 200 300
0
10
20
30
40
50
''
Temperature ( 0C )
-100 0 100 200 300
0
10
20
30
40
50
''
Temperature ( 0C )
Low frequency behaviour ~20 Hz
-100 0 100 200 300
6
5
4
3
2
'
Temperature ( 0C )
-100 0 100 200 300
6
5
4
3
2
'
Temperature ( 0C )
-100 0 100 200 30010
-3
10-2
10-1
100
101
''
Temperature ( 0C )
-100 0 100 200 30010
-3
10-2
10-1
100
101
''
Temperature ( 0C )
High frequency behaviour ~ 100 kHz
CC
CC
9
10-1
100
101
102
103
104
105
106
100
101
102
' ''
', '
'Frequency (Hz)
12
*( ) = B* n-1, >> 1 *( ) = B* n-1, >> 1
*( ) = -i0/0*( ) = -i0/0
1)
Jonscher
Conductivity
*( ) = / [1 + ( i ) ] + *( ) = / [1 + ( i ) ] +
2) Havriliak-Negami
The fitting modelThe fitting model
10
4.4 4.6 4.8 5.0 5.2 5.4 5.6 5.8
10-7
10-6
10-5
10-4
10-33.3 3.5 3.7 3.9 4.1 4.3 4.5 4.7
Sample I II III Ice
, [s
]
1000/T, [K-1]
4.4 4.6 4.8 5.0 5.2 5.4 5.6 5.8
10-7
10-6
10-5
10-4
10-33.3 3.5 3.7 3.9 4.1 4.3 4.5 4.7
Sample I II III Ice
, [s
]
1000/T, [K-1]
A - 50 kJ/mol B - 42 kJ/mol
C - 67 kJ/mol D - 19 kJ/mol
Ice - 60 kJ/mol
A - 50 kJ/mol B - 42 kJ/mol
C - 67 kJ/mol D - 19 kJ/mol
Ice - 60 kJ/mol
I - 64 kJ/mol II - 36 kJ/mol
III - 61 kJ/mol
Ice - 60 kJ/mol
I - 64 kJ/mol II - 36 kJ/mol
III - 61 kJ/mol
Ice - 60 kJ/mol
11stst Process Process11stst Process Process
4.6 4.8 5.0 5.2 5.4 5.6 5.8
10-7
10 -6
10 -5
10 -4
10 -33.5 3.7 3.9 4.1 4.3 4.5 4.7
Sample
A
B
C
D
Ice, [s
]
1000/T, [K-1
]
4.6 4.8 5.0 5.2 5.4 5.6 5.8
10-7
10 -6
10 -5
10 -4
10 -33.5 3.7 3.9 4.1 4.3 4.5 4.7
Sample
A
B
C
D
Ice, [s
]
1000/T, [K-1
]
11
-17 -16 -15 -14 -13 -12 -11 -10 -9 -8
0.36
0.39
0.42
0.45
0.48
0.51
0.54
0.57
0.60
0.63
A
B
C
D
I
II
III
ln()-17 -16 -15 -14 -13 -12 -11 -10 -9 -8
0.36
0.39
0.42
0.45
0.48
0.51
0.54
0.57
0.60
0.63
A
B
C
D
I
II
III
ln()
SamplesHumidity h,
%
II 0.63
A 1.2
B 1.4
D 1.6
C 3.2
III 3.39
I 3.6
Dependence of the Cole-Cole parameter Dependence of the Cole-Cole parameter from ln( from ln())
12
170 180 190 200 210 2200.01
0.1
1
A
B
C
D
Temperature, [K]
170 180 190 200 210 2200.01
0.1
1
A
B
C
D
Temperature, [K]
170 180 190 200 210 220
0.1
1
I
II
III
Temperature, [K]
170 180 190 200 210 220
0.1
1
I
II
III
Temperature, [K]
235 240 245 250 255 260 265 270
60
63
66
69
72
75
Ice
Temperature, [K]
235 240 245 250 255 260 265 270
60
63
66
69
72
75
Ice
Temperature, [K]
Temperature dependence of the dielectric strengthTemperature dependence of the dielectric strength
13
170 180 190 200 210 220 230
101
102
(A)
(B)
(D)
(II)
B(T
)
Temperature, [K]
170 180 190 200 210 220 230
101
102
(A)
(B)
(D)
(II)
B(T
)
Temperature, [K]
)()32(
11
111 TBT
)()32(
11
111 TBT
Parallel and anti-parallel Parallel and anti-parallel orientationorientation
170 180 190 200 210 220
6
8
10
12
14
16 B(T)C
B(T)I
B(T)III
B(T
)*1
02
Temperature, [K]
170 180 190 200 210 220
6
8
10
12
14
16 B(T)C
B(T)I
B(T)III
B(T
)*1
02
Temperature, [K]
B(T
)
anti-parallelanti-parallel
Temperature
Orientation of the relaxing dipole units
parallelparallel non-non-correlated correlated
systemsystem
14
010
2030
Perm
ittiv
ity'' [
]
Ewa C1 97-06-01 moisture=3.21%
010
2030
Perm
ittiv
ity'' [
]
Ewa C1 97-06-01 moisture=3.21%
22
220 240 260 280 300 320 340 360 380 40015
20
25
30
35
40
45
50
55
A
B
C
Temperature, [oK]
220 240 260 280 300 320 340 360 380 40015
20
25
30
35
40
45
50
55
A
B
C
Temperature, [oK]
200 250 300 350 400 450 500 5500
10
20
30
40
50
60
70
80
I
III1
III2
Temperature, [oK]
200 250 300 350 400 450 500 5500
10
20
30
40
50
60
70
80
I
III1
III2
Temperature, [oK]
Second ProcessSecond Process
15
L -defectL -defect
V* is the defect effective volume
Vf is the mean free volume for one defect
N is the number of defects in the volume of system V
0 exp
HkT C ea
HkT
d
0 exp
HkT C ea
HkT
d
pV
Vff
~ exp*
p
V
Vff
~ exp*
V V Nf for VV
*
f1V V Nf for
VV
*
f1
N T NHkT
d( ) exp
0N T N
HkT
d( ) exp
0
, where, where, where, where ~1
p por f ~
1p por f
kT
Hp a
or exp~
kT
Hp a
or exp~
SiSi
OO
SiSi
OOOO
SiSi
Orientation DefectOrientation Defect Orientation DefectOrientation Defect
D-defectD-defect
0
*1N
V
VC
0
*1N
V
VC
16
Ha is the activation energy of the reorientationHd is the activation energy of the defect formationo is the reorientation (libration) time of the restricted water molecule in the hydrated cluster is the maximum possible defect concentration
Ha is the activation energy of the reorientationHd is the activation energy of the defect formationo is the reorientation (libration) time of the restricted water molecule in the hydrated cluster is the maximum possible defect concentration
2.4 2.6 2.8 3.0 3.2 3.4 3.6 3.8 4.0 4.2 4.4 4.6
10-5
10-4
10-3
10-2
A
B
C
, [s
]
1000/T, [K-1]
2.4 2.6 2.8 3.0 3.2 3.4 3.6 3.8 4.0 4.2 4.4 4.6
10-5
10-4
10-3
10-2
A
B
C
, [s
]
1000/T, [K-1]
2.0 2.5 3.0 3.5 4.0 4.510
-7
10-6
10-5
10-4
10-3
10-2
I
III1
III2
, [s
]
1000/T, [K-1]
2.0 2.5 3.0 3.5 4.0 4.510
-7
10-6
10-5
10-4
10-3
10-2
I
III1
III2
, [s
]
1000/T, [K-1]
Sample Ha
[kJ/mol]
Hd
[kJ/mol]
0
[s]
A 55 39 310-14 910-7
B 54 31 310-15 810-6
C 42 30 910-13 210-5
I 41 29 810-13 510-5
III1 45 33 410-14 110-5
III2 39 22 410-12 210-4
Sample Ha
[kJ/mol]
Hd
[kJ/mol]
0
[s]
A 55 39 310-14 910-7
B 54 31 310-15 810-6
C 42 30 910-13 210-5
I 41 29 810-13 510-5
III1 45 33 410-14 110-5
III2 39 22 410-12 210-4
The fitting results for the second process
17
( t /) ~ et / , Df = 3, where Df is a fractal dimension
Percolation:Percolation: Transfer of electric excitation through the developed system of open pores
*
s
dd t tF
*
s
dd t tF
-100 -50 0 50 100 150 200
Temperature [°C]
020
4060
Perm
ittivit
y' []
Freq. [Hz]=5.10e+03 Freq. [Hz]=1.13e+04 Freq. [Hz]=3.24e+04
-100 -50 0 50 100 150 200
Temperature [°C]
020
4060
Perm
ittivit
y' []
Freq. [Hz]=5.10e+03 Freq. [Hz]=1.13e+04 Freq. [Hz]=3.24e+04
Dielectric relaxation in percolationDielectric relaxation in percolation
10-3 10-2 10-1 100
0.0
0.2
0.4
0.6
0.8
Sample A
Sample B
Sample C
Cor
rela
tion
func
tion
time ( s )10-3 10-2 10-1 100
0.0
0.2
0.4
0.6
0.8
Sample A
Sample B
Sample C
Cor
rela
tion
func
tion
time ( s )
18
The Fractal Dimension of Percolation PassThe Fractal Dimension of Percolation Pass
Sample AA BB CC DD II IIII IIIIII
Fractal dimension Df 00..9999 11..8899 11..3311 22..55 11..9966 22..44 22..22
Sample AA BB CC DD II IIII IIIIII
Fractal dimension Df 00..9999 11..8899 11..3311 22..55 11..9966 22..44 22..22
19
d D
d D
w A a exp w A a exp
w w : size distribution function
, , , A, A: empirical parameters
w w : size distribution function
, , , A, A: empirical parameters
V
Vp
V
Vp : porosity of two phase solid-pore system
Vp : volume of the whole empty space
V : whole volume of the sample
: porosity of two phase solid-pore system
Vp : volume of the whole empty space
V : whole volume of the sample
, , : upper and lower limits of self-similarity
DD : regular fractal dimension of the system
, , : upper and lower limits of self-similarity
DD : regular fractal dimension of the system
,D w d1
,D w d1
= /
: scale parameter [,1]
= /
: scale parameter [,1]
Porous medium in terms of regular and random fractalsPorous medium in terms of regular and random fractals
20
,
when a << 1, << 1
1
11
1
1
1
d D
d D
,
when a << 1, << 1
1
11
1
1
1
d D
d D
1
4 D
1
4 D
10
<< 1d=3, << 1
, 10
<< 1d=3, << 1
,
Sample
Fractal
dimension
Df
Porosity (%)
( obtained from relative
mass
decrement measurements )
Porosity (%)
( obtained from
dielectric
measurements )
A 0.99 38 33
B 1.89 48 47
C 1.31 38 37
D 2.5 50 68
I 1.96 26.5 49
II 2.4 42.5 63
III 2.2 25.5 56
Sample
Fractal
dimension
Df
Porosity (%)
( obtained from relative
mass
decrement measurements )
Porosity (%)
( obtained from
dielectric
measurements )
A 0.99 38 33
B 1.89 48 47
C 1.31 38 37
D 2.5 50 68
I 1.96 26.5 49
II 2.4 42.5 63
III 2.2 25.5 56
Porosity DeterminationPorosity DeterminationPorosity DeterminationPorosity Determination (A.Puzenko,et al., Phys. Rev. ((A.Puzenko,et al., Phys. Rev. (BB), ), 6060, 14348, 1999), 14348, 1999)