Silicate formation and thermal stability of ternary rare earth oxides as high-k dielectrics
Effect of hafnium germanate formation on the interface of HfO[sub 2]/germanium metal oxide semiconductor devices
![Effect of hafnium germanate formation on the interface of HfO[sub 2]/germanium metal oxide semiconductor devices](https://static.fdocuments.in/doc/330x215/5750a90b1a28abcf0ccd287a/effect-of-hafnium-germanate-formation-on-the-interface-of-hfosub-2germanium.jpg)
