C2c.slides v1 - pdf

Very low defect remote hydrogen plasma clean of Si (100) for homoepitaxy

Remote plasma-enhanced CVD of silicon: Reaction kinetics as a function of growth parameters

The use of langmuir probe measurements to investigate the reaction mechanisms of remote plasma-enhanced chemical vapor deposition

Patient safety and image transfer between referring hospitals and neuroscience centres: could we do better?

The true value of C-reactive protein measurement in neurosurgical patients