Post on 10-Jan-2020
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography Copyright © 2015 Gigaphoton Inc. International Symposium on Extreme Ultraviolet Symposium 2015
Update of One Hundred watt HVM LPP-EUV Source performance 5-7.Oct. 2015 EUVL Symposium, Maastricht, Netherland
Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki , Shinji Okazaki and Takashi Saitou Gigaphoton Inc. Hiratsuka facility: 3-25-1 Shinomiya Hiratsuka Kanagawa,254-8567, JAPAN
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Power-Up Scenario and Key Technologies Update
• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2
• New Pilot System Development Update • Summary
OUTLINE
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Power-Up Scenario and Key Technologies Update
• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2
• New Pilot System Development Update • Summary
OUTLINE
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Gigaphoton’s LPP Light Source Concept
• High ionization rate and CE EUV tin (Sn) plasma generated by CO2 and pre-pulse solid laser dual wavelength shooting
• Hybrid CO2 laser system with short pulse high repetition rate oscillator and commercial cw-amplifiers
• Accurate shooting control with droplet and laser beam control
• Tin (Sn) debris mitigation with a super conductive magnetic field
• High efficient out of band light reduction with grating structured C1 mirror
Droplet Generator
Super Conductive Magnet
Corrector Mirror
Pre-pulse Laser
CO2 Pulse Laser Droplet Catcher
Ion Catcher
4
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Power up scenario 5
Current configuration High speed droplet
DoneReady DevelopmentResearch
27kWCO2
3.5% CE 4% CE
20kWCO2
50% Mirror 45% Mirror
17kWCO2 14kWCO2 2kWCO2
3.0% CE
20kHz 35kHz 70kHz 100kHz
Ave
rage
Pow
er
with
dose
contr
ol
Conversion Efficiency
CO2 laser power
Repetition rate
Reflectance of C1 mirror
Pres
ent
Nex
t
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Based on basic physical consideration and experiments, Gigaphoton has chosen to adopt the pre-pulse technology since 2009
• In 2012 Gigaphoton discovered that shortening the pre-pulses duration dramatically enhance the conversion efficiency
Pre-Pulse Technology (1) 6
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• The mist shape of a picosecond pre-pulse is different from the nanosecond
• Nano-cluster distribution could be a key factor for high CE
Pre-Pulse Technology (2) Fragment distribution measurement
7
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Pre-Pulse Technology (5) 8
EUV plasma parameters measurement by “Thomson Scattering” is ongoing in Kyushu University
To develop a diagnostic system for laser-produced plasmas for extreme ultraviolet (EUV) light sources, collective laser Thomson scattering (LTS) was applied to laser-produced carbon plasmas to measure plasma parameters such as electron density (ne) and electron temperature (Te). Plasmas having parameters necessary for an EUV light source (ne = 1024-1025 m-3, Te = 30-50 eV) were achieved, and these parameters were successfully evaluated by a pilot diagnostic system with errors below 10%. From these results, an LTS system for diagnostics of tin plasmas for real EUV light sources was designed. © 2013 The Japan Society of Applied Physics
A Collective Laser Thomson Scattering System for Diagnostics of Laser-Produced Plasmas for Extreme Ultraviolet Light Sources Kentaro Tomita1, Kazuki Nakayama1, Kazuya Inoue1, Atsushi Sunahara2, and Kiichiro Uchino1
1Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan 2Institute for Laser Technology, Suita, Osaka 565-0871, Japan
→Dr. K. Tomita will be report New data in EUV Source Workshop in Dublin Nov. 2015
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
9
International Symposium on Extreme Ultraviolet Symposium 2015
10ショット平均値5.5% average in
10 pulses
- In small experimental device, we observed 5.5% Ce under optimized condition.
- 17 % increase from old champion data ( Ce=4.7%).
Pre-Pulse Technology (6)
Small experrimental device
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
10
2013 Jan Proto#1
2014 Sep Proto#2
2015 Oct Pilot#1
Droplet speed m/s 45 60 90
Repetition rate limit
kHz 50 70 100
Status Proven Proven under Development
• Droplet generator for higher power will 100kHz operation from Oct 2015.
• High speed droplet is one of key item to reduce the plasma interaction.
Droplet Generator technology (1)
Oct. 5, 2015 DOC#: ED15L-498
GIGAPHOTON CONFIDENTIAL International Symposium on Extreme Ultraviolet Symposium 2015
T T T T T T PO PO T PM PO PO PM PM PM PO PM PO PM PM PM
225
PO PO
249
206
88
050010001500200025003000350040004500500055006000
0
50
100
150
200
250
300'1
4-M
ay-1
'14-
May
-2'1
4-M
ay-3
'14-
Jun-
1'1
4-Ju
n-2
'14-
Jun-
3'1
4-Ju
l-4'1
4-Au
g-1
'14-
Aug-
2'1
4-Se
p-1
'14-
Sep-
2'1
4-O
ct-1
'14-
Oct
-2'1
4-N
ov-1
'14-
Nov
-2'1
4-De
c-1
'15-
Jan-
1'1
5-Ja
n-2
'15-
Mar
-1'1
5-M
ar-2
'15-
Mar
-3'1
5-M
ay-1
'15-
Jun-
1'1
5-Ju
n-2
'15-
Jul-1
'15-
Jul-2
'15-
Jul-3
EUV
Emis
sion
pul
se (M
pls)
Ope
ratio
n Ti
me
in S
yste
m (h
our)
Droplet Generator Operation Status in System
Operation Time in System(via TB) Operation Time in System(Proto Direct) EUV Emission
Droplet Generator technology (2) 11
Process improvement enables more than 200hrs droplet generation
Process improvement-1
> 300
Process improvement-2
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Gigaphoton Oscillator Laser
High Power CO2 Laser Technology (1) 12
Driver Laser System
July 30, 2015 DOC#: ED15L-020
Timing Controller
Main Pulse CO2 Laser System
PA MA#1 MA#2 OSC EO isolator MA#3
Amplifier Lasers
DLG
Gigaphoton, in cooperation with CW-CO2 laser companies, has been jointly developing a unique high power pulsed CO2 laser system since 2004
plifier
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
13
• Potential of 20kW CO2 power at plasma was confirmed in proto#2 system. This is close to 250W target in pilot#1 system, which is 23kW.
Osc Pre amp. MA2 MA3 Is
olat
or
MA1
QCL Seeder 1
(λ1)
Special design custom-built “regenerative” CO2 amplifier
QCL Seeder 2
(λ2)
QCL Seeder n
(λn)
● ●
Multi-line oscillator and regenerative amplifier (Patented)
λ11=P18 λ22=P20 λ32=P22 λ42=P24
14 ns FWHM
Plasma
20kW
17kW
High Power CO2 Laser Technology (2)
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
14
Laser Power
System Oscillator Pre-Amplifier Main Amplifier
5kW Endurance Testing Platform
8kW Power Up Testing
20kW Power Up Testing
>27kW Customer Beta Unit
GPI R T T
GPI R T T T
GPI M T T T
GPI M M M M
Proto #1
Proto #2
Under Construction Pilot #1
validated performances at system
High Power CO2 Laser Technology (3)
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Driver CO2 laser Sn Droplet
Magnetic Mitigation
EUV Plasma
Corrector Mirror
Intermediate Focus
EUV light clean power >250W@13.5nm
Corrector Mirror
4
Role of Corrector Mirror - Transmit the EUV light from plasma point to
intermediate focus - Filtering the IR light originate from driver CO2
laser ( Patented ) - Periodical maintenance is required
( Refurbishments )
15/40
Corrector Mirror Technology (1)
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Collector reflectivity is one of the key item for power improvement
Corrector Mirror Technology (2) 16
Current 250W target
Collector type V5 V5+
H2 Pressure <20Pa <20Pa
Collector Efficiency >74% >74%
Collector Reflectivity >45% >50%
Gas Transmittance >95% >95%
Plasma to clean 31.6% 35.1%
V5: 45.1%
Current status: 48.1%
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Power-Up Scenario and Key Technologies Update
• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2
• New Pilot System Development Update • Summary
OUTLINE
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Gigaphoton EUV Sources
EV
EV
Back
yard
Utilities Area
B#1
B#3
B#2
Proto #1 From Oct 2012
Proto #2 From Nov 2013
Pilot #1 (under construction)
2 – proto system are in operation 1 – pilot system is under construction
NEW
18
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Proto Systems in Operation 19
Target System Specification
Operational Specification Proto #1 Proto #2 Pilot #1 (under construction)
Target Performance
EUV Power 25 W > 100 W 250 W
CE 3% 3.5% 4%
Pulse rate 100 kHz 100 kHz 100 kHz
Output angle Horizontal 62°upper (matched to NXE)
62°upper (matched to NXE)
Availability 1 week operation 1 week operation > 75%
Technology
Droplet generator 20 – 25 μm 20 μm < 20 μm
CO2 laser 5 kW 20 kW 27 kW
Pre-pulse laser picosecond picosecond picosecond
Debris mitigation validation of magnetic mitigation in system 10 days > 3 month
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Gigaphoton’s High Power EUV Light Source 20
Prototype high power EUV light source is in operation
Light Outlet
Chamber
Magnet
Proto 1 Exposure & Mitigation test Proto 2 High power Experiment
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Long lifetime operation in Proto#1 system 21
77 hours
Dose control, 20kHz, 80% duty cycle
• 77 hours operation with 25% dose margin
0.14%
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Tin Back-diffusion Issue from the Ion Catcher 22
Tim Deposition Simulation Actual Tin Deposited on Collector
• Issue: tin depositions on mirror caused by back-diffusion from the ion catcher • Reduction of the back-diffusion from the ion catcher is key
Ion Catcher
Back-diffusion Back-diffusion
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Proto #2: EUV Power Data (short term) 23
Champion Data: 140W EUV in burst power with 70kHz, 50% duty cycle
2014/8/20 Number of Pulses
Puls
e En
ergy
[mJ]
140W@50%Duty
Rep. rate [kHz]
EUV
Pow
er [W
]
(data shown at SPIE Feb. 2015)
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Proto#2: 74W in burst, 6 hours operation (July 2015) » 50kHz, 25-50% Duty cycle, Closed loop
24
Proto#2: Long-term operation with Dose Control
6 hrs.
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Proto#2: High Duty Cycle with Dose Control 25
Dose control capability up to 95% duty cycle with 20% dose margin was confirmed in proto#2 system at 75W in burst level operation
35kHz, 20% dose margin
70W
37W
75W
Oct. 5, 2015 DOC#: ED15L-498
GIGAPHOTON CONFIDENTIAL
30%
Dose stability
Power (in Burst) 49-87W Operation time 24.9 hr Number of Pulse 1.5BPls Repetition rate 35kHz
Duty ratio 50-90% Power (average) 24-83W Dose3σ <0.2%
Proto#2
Proto #2: EUV Power Data (long term)
Oct. 5, 2015 DOC#: ED15L-498 International Symposium on Extreme Ultraviolet Symposium 2015
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Power-Up Scenario and Key Technologies Update
• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2
• New Pilot System Development Update • Summary
OUTLINE
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Pilot #1 EUV Light Source for HVM Layout of 250W EUV Light Source
Operational specification (Target) HVM Source
Performance
EUV Power > 250W
CE > 4.0 %
Pulse rate 100kHz
Availability > 75%
Technology
Dropletgenerator Droplet size < 20mm
CO2 laser Power > 20kWPre-pulselaser
Pulseduration psec
Debrismitigation
Magnet,Etching > 15 days ( >1500Mpls)
Operational specification (Target) HVM Source
Performance
EUV Power > 250W
CE > 4.0 %
Pulse rate 100kHz
Availability > 75%
Technology
Dropletgenerator Droplet size < 20mm
CO2 laser Power > 20kWPre-pulselaser
Pulseduration psec
Debrismitigation
Magnet,Etching > 15 days ( >1500Mpls)
EUV Exposure Tool First HVM EUV Source
• 250W EUV source
28
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Pre-AMP
Main-AMP
Pilot #1: Configuration 29
2,30
0
Driver Laser system
EUV chamber System
Beam Transfer System
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
• GPI specification of Pilot#1. • It is remarkable low consumption compare with other source.
30
Pilot#1 Specification (EXPECTED) Value Units
EUV Power 250 W Electrical power input (at full load) 880 kVA Thermal load to water 780 kW Cooling water flow rate (at 17 ºC) 1,608 L/min Hydrogen gas consumption 30 NL/min
Pilot #1: Utility Specification
Oct. 5, 2015 DOC#: ED15L-498 International Symposium on Extreme Ultraviolet Symposium 2015
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
Pilot #1 construction status (1) : Driver Laser System
• Mitsubishi CO2 amplifiers were set in driver laser frame.
• Oscillator construction is going on.
GIGAPHOTON CONFIDENTIAL
31
PA-RF
PA-Chamber
Sub Fab Area
Left side of driver laser
Right side of driver laser
MA3
MA2
MA1
PA
OSC PPL
→Dr. K.Yasui will report at next aural presentation; “Low-loss and high-gain CO2 amplifiers to generate extreme ultraviolet, ・・・”
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
• Super conductive magnet » Installation is finished
• EUV Vessel » Under fabrication
EUV chamber system
Pilot #1 construction status (3) : EUV Chamber System
Oct. 5, 2015 DOC#: ED15L-498 International Symposium on Extreme Ultraviolet Symposium 2015
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
• Power-Up Scenario and Key Technologies Update
• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2
• New Pilot System Development Update • Summary
OUTLINE
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Power-Up Milestones 34
We are achieving solid and steady progress towards realizing our HVM EUV source
Proto #2 (current work)
Pilot #1 (under construction)
2015 Feb 2015 Mar. 2015 Jul 2015 Aug MS1 MS2
System Proto#2 Proto#2 Proto#2 Proto#2 Proto#2 Pilot#1
Main Performance
Average with dose 57W 70W 19/38W 24-83W 100W 200W
Duty ratio 90% 95% 25/50% 50-95% >90% >90%
In burst power 64W 74W 76W 49-87W 120W 250W
Dose margin 30% 20% 30% 55-20% 20% <20%
CE 3.2% 3.2% 2.8% 3.5% 3.5% 4.0%
Availability (10x5) 12.8% 14.1% 10.1% 16.3% 20% >75%
Operation time Pulse number
- 0.5hour 60Mpls
6h 450Mpls
24.9h 1.5Bpls
24hour 5.4Bpls
>3 month -
Repetition rate 40kHz 35kHz 50kHz 35kHz 70kHz 100kHz
CO2 power 9.5kW 7.2kW 12.9kW 10kW ⒛kW 27kW
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
Summary
• Progress of Proto #1 unit » Further improvement of “Magnetic debris mitigation” » Simulation expect further improvement of back-diffusion » Report new data: 77 hrs., 10W operation data without maintenance was reported. » Magnetic mitigation capability is discussed by using Tin distribution simulation.
• Progress of Proto #2 unit » Driver CO2 laser system achieved 20 kW by multiline amplification with new pre-amplifier. » Maximum power champion data:140 W (CE 3.7%) in burst at 70 kHz, 50% duty. » Report new data: 49-87 W power in burst, 50-95 % duty under closed loop, 24-87W average
( 60W long time average ) was demonstrated for more than 24 hours. » Next step is higher average power operations during more than 24 hrs.
• Pilot #1 is under construction » Design of system is almost fixed - most parts are already ordered » Construction will finish in Q4, 2015. First data will be expected in Q1, 2016
35
Oct. 5, 2015 DOC#: ED15L-498 International Symposium on Extreme Ultraviolet Symposium 2015
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015
Acknowledgements 36
Thanks for co-operation: Mitsubishi electric CO2 laser amp. develop. team: Dr. Yoichi Tanino*, Dr. Junichi Nishimae, Dr. Shuichi
Fujikawa and others. * The authors would like to express their deepest condolences to the family of Dr. Yoichi Tanino who suddenly passed
away on February 1st, 2014. We are all indebted to his incredible achievements in CO2 amplifier development. He will be missed very much.
Dr. Akira Endo :HiLase Project (Prague) and Prof. Masakazu Washio and others in Waseda University Dr. Kentaro Tomita, Prof. Kiichiro Uchino and others in Kyushu University Dr. Jun Sunahara, Dr. Katsunori Nishihara, Prof. Hiroaki Nishimura, and others in Osaka University Thanks for you funding: EUV source development funding is partially support by NEDO( New Energy and Industrial Technology
Development Organization) in JAPAN Thanks to my colleagues:
EUV development team of Gigaphoton; Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida,Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou and other engineers.
Oct. 5, 2015 DOC#: ED15L-498
Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography
THANK YOU
Oct. 5, 2015 DOC#: ED15L-498