Post on 04-Jul-2020
ChE 384T / 323
Lecture 11Chemical Engineering for Micro/Nano Fabrication
Oskar Süẞ (Suess)
ChE 384T / 3232
Blue Print Chemistry
ChE 384T / 323
ChE 384T / 3234
ChE 384T / 323
MeyerBaekeland
The History of Novolac
C.H. Meyer and L.H. Baekeland Discovered Novolac ca. 1900
OH
CH3
ChE 384T / 323
ChE 384T / 323
Novolac Resin Production!!
Workers at Albert Co. in Wiesbaden, Germany
“zerkleinert das Harz von Hand” (ca. 1910)
ChE 384T / 323
Oskar SüẞDer Diazo König
N2
O
SO3R
ChE 384T / 323
ChE 384T / 323
Novolac/DNQ Photoresists
Develop
OH
CH3
Inhibited Novolac (I)
LogR
Novolac
UV
Coat
Expose
Substrate
II
I
I
I
I
I
I
I
I
I I
Substrate
II
I
I
I
I
I IP
PP
P
P
P
Substrate
I
I
I
II
I I
I
N2
O
SO3R SO3R
OOH
UV
OH
CH3
Photoproduct (P)
365-nm exposureAdd DNQ
I
P
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DNQ – Novolac Resists
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Wolff Rearrangement and Reaction of the ketene with water
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ChE 384T / 323
Polyphotolysis
I → S
I-I → S-I → S-S
I-I-I → S-I-I → S-S-I → S-S-S
This contributes to a threshold like
dissolution rate response to exposure
ChE 384T / 323
ChE 384T / 323
I
No Swelling!!!!
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Quantifying Resist Performance
•Sensitivity• Intrinsic radiation sensitivity•Lithographic Sensitivity
•Contrast• Etch resistance
• Adhesion
• Shelf life
• Etc, etc, etc.
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Threshold like Response of ArF Resist
0.01
0.1
1
10
100
1000
10000
100000
1.0 10.0 100.0
DOSE(mJ/cm2)
dis
so
lutio
n r
ate
(A/s
ec)
total
surface
middle
bottom
E0
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Fundamental Measure of Resist Response
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