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Bruker-AXS User Meeting, Sep 20 – 22, 2010

Karlsruhe

Eric HovestreydtBruker AXS

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Users Meetings; continuing …

University of Alabama, AL S Ealick, C Smith, E Westbrook Feb. 26-29, 1989 CARB, MD G Gilliland,A Howard,G Cohen,L Hannick,A Wlodawer,M Amzel Feb. 4-6, 1990 Scripps, CA I Wilson, E Stura, D McRee, M Pique May 5-7, 1991 Purdue University, IN Wladek Minor, Ivan Rayment May 3-5, 1992 GBF Braunschweig, Germany D Schomburg, H.J.Hecht, B.Hofmann Apr. 28-30, 1993 University of Pittsburgh,PA John Rose, William Furey Apr. 28-30, 1994 University of Georgia, Athens, GA B-C Wang, John Rose Apr. 17-19, 1997 Scripps, La Jolla, CA Duncan McRee, Dave Stout Feb. 21-23, 1998 University of Bergen, Norway (ESUM98) Karl Tornroos Sep.11-13, 1998 University of Toledo, OH Alan Pinkerton June 9-11, 1999 Texas A&M University, TX Joe Reibenspies Mar. 16-17, 2000 University of Wisconsin/Bruker, WI Ilia Guzei, Charles Campana May 20-22, 2001 University of Wisconsin/Bruker, WI Ilia Guzei, Charles Campana May 18-20, 2003 University of Wisconsin/Bruker, WI Ilia Guzei Sept 20-22, 2005 Bruker AXS Delft Frank van Meurs Sept 18-19, 2006 University of Wisconsin/Bruker, WI Ilia Guzei Sept 16-18, 2007 Universität Göttingen George Sheldrick Oct 10-13, 2007 Bruker AXS Delft Frank van Meurs Sept 29-1, 2008 University of Wisconsin/Bruker, WI Ilia Guzei June 1-2, 2009 Bruker AXS Karlsruhe Martin Adam Sept 20-23, 2010

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Bruker Corporation

FT-IRNMR

Raman

NIR

TD-NMR

MR Imaging

EPR ESI-TOF MS

FT-MS

ESI Ion Trap MS

MALDI-TOF MS

Bruker BioSpin Bruker DaltonicsBruker AXS Bruker Optics

XRFSC-XRD

XRD

Automation

MAOESAFM

Bruker EST

Synchrotron Instrumentation

Hydr. ExtrusionLow-Tc SCHigh-Tc SC

Magnets

PowerElectronicsTerahertz

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Bruker AXSProduct Lines

X-ray Fluorescence Spectrometry (XRF)Non destructive determination of the elemental composition of solidsand liquids

Optical Emission Spectroscopy (OES)Elemental analysis of metals

Gas Analysis (GA)ONH and CS analysis, specific surface area determination

X-ray Microanalysis (MA)Elemental analysis for electron microscopes

Atomic Force Microscopy (AFM)Surface characterization with sub-nanometer resolution

X-ray Diffraction (XRD)Structure, material properties and phase analysis of solid and liquid polycrystalline material

Single Crystal X-ray Diffraction (SC-XRD)Determination of the 3D structure of crystalline chemical and biologicalcompounds

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X-ray Fluorescence (XRF)Non-destructive Element Analysis

qualitative & quantitative standardless XRF analysis all elements from Be to U all solid, powder and liquid samples sub ppm to 100 % conc. accuracy up to 0.05 % rel. typical LLD: 1 to 10 ppm LLD down to 100 ppb in light

materials (oil, plastics) LLD 100 to 1000 ppm for O, N, C,

B and Be

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X-ray Fluorescence (XRF)Product Line

S4 PIONEERS8 TIGER(((

S2 RANGERS2 PICOFOXARTAX S1 TRACER

S8 LION(((

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Micro X-ray Fluorescence (XRF)Product Line

M1 ORA M4 TORNADOM1 MISTRAL

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Optical Emission Spectroscopy (OES)Product Line

Q8 MAGELLAN Q6 COLUMBUS Q8 CORONADO

Elemental analysis for qualitiy and process control in all fields of metal production and processing

Q4 TASMAN

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Gas Analysis (GA)Product Line

AREAMAT

Analysis of O, N, H as well as C and S Specific surface area determination Metals, minerals and inorganic compounds

G8 GALILEO

AR

EAM

AT

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X-ray Microanalysis (MA)Element Analysis for Electron Microscopes

QUANTAX - EDS with XFlash®

Silicon Drift Detectors Add-on for electron

microscopes

Nanoscale element mapping

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Atomic Force Microscopy (AFM)Surface Characterization

Surface characterization with sub-nanometer resolution Combination of high quality optical microscope with

high resolution AFM

DVD master

Etch structure in GaAsMagnetic structuresin storage media

Image of a TFT element

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Atomic Force Microscopy (AFM)Product Line

N8 ARGOS

N8 RADOS

N8 NEOS

N8 TITANOS

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Atomic Force Microscopy (AFM)Veeco Product Line

MultiMode Scanning Probe Microscope

Dimension Icon AFM

Dimension Edge AFM

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X-ray Diffraction (XRD)Material Properties and Phase Analysis

No competition from other methods

Non destructive method Qualitative and quantitative

composition analysis Material structure analysis:

• crystallite size / particle size in the nm range

• microstrain• residual stress / fatigue stress• texture / preferred orientation• thin films and multilayers:

thickness, layer sequence, density, surface and interface roughness

• nanostructure analysis (particle shape, size and orientation)

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X-ray Diffraction (XRD)Product Line

D8 DISCOVERD8 ADVANCE

D8 FABLINE

NANOSTAR

D8 FOCUS D4 ENDEAVOR

D8 SCREENLAB

D2 PHASER

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Bruker AXS, Madison, WI, USA

SC-XRD Product Line Manager Roger Durst,

CTO, EVP Bruker AXS IncProduct Manager, Marketing Michael RufR&D Manager Detlef BahrSoftware Manager Joerg KaercherBusiness Manager Sue Byram Michael Ruf

Roger Durst

Sue Byram

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Bruker AXS, Madison, WI, USA

Application Charles Campana Bruce NollService Scott Tarran Pete McDonald

Charles Campana

Bruce Noll

Scott Tarran

Pete McDonald

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Bruker AXS, Karlsruhe, Germany

Business Manager Eric Hovestreydt

Product Manager, Marketing Martin Adam

Sales Vernon Smith (bio) Bernd Hinrichsen (X2S)

Martin Adam

Vernon Smith

Eric Hovestreydt

Bernd Hinrichsen

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Bruker AXS, Karlsruhe, Germany

Application Marianna Biadene Holger Ott

Marianna Biadene

Holger Ott

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Service Karl-Heinz Bast Oliver Knaus Markus Nuesse Klaus Orth Felix Schmidt Daniel Stern

Bruker AXS, Karlsruhe, Germany

Karl-Heinz Bast Oliver Knaus Markus Nüsse

Klaus Orth Felix Schmidt Daniel Stern

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Bruker AXS Delft, the Netherlands

R&D Jaap Toorn

Application Leo Straver

Service Cees Baas Henk Lief Dirk Parlevliet Frank Vredenbregt

Cees Baas Henk Lief

Dirk ParlevlietFrank Vredenbregt

Leo Straver

Jaap Toorn

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Partners in SC-XRD

Incoatec GmbH, Germany Carsten Michaelsen Jörg Wiessmann Till Samtleben Jürgen Graf

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bruker-axs@lists.wisc.edu

forum supervisor Ilia Guzei

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Changes

Finalised consolidation of SC-XRD (outside Northern America) Sales & Marketing out of Karlsruhe Service coordinated in Karlsruhe Stock of all spares in Karlsruhe Shipment of systems and Spares from Karlsruhe Expertise of Delft products located in Delft

Frank van Meurs has retired

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BRUKER family for Chemical Crystallography

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Structure discovery the way it was meant to be.

Truly automated operation Virtually no maintenance costs Low price Ideal for every synthetic chemistry laboratory

SMART X2S – From Crystal to Structure with True Walk Away Automation

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Automation flowchart - overview

The automation layer ties all individual steps together

Makes intelligent decisions

Controls the flow of input and output files

Automation layer

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HTML Report Experimental information J-mol applet for structure

display Tables with structural

information Bond lengths and distances

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X-presso plug-in for APEX2

Based on X2S automation

Start after crystal centered

Begin experiment within minutes

Can be run against existing data

Copper or Moly radiation

Single- or dual-source

Kappa or 3-circle goniometers

Structure solution and refinement

Report generation

Diagnostics log file

2 February 201030

Automate experiment for research instruments

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AutoStructure in APEX suite

Automated structure determination for “routine structures”

Finds and models a structure within seconds

Requires only a formula and the space group

Automated structure check to IUCr standards

Available as module in APEX2 software – can read SMART frames, or online collecting data in APEX format

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New Benchtop Powder Unit: D2 PHASERsee it in the demo labs

World's fastest desktop X-ray diffractometer• LYNXEYE detector• Scintillation counter

Innovative high-end goniometer design (patent pending)

Sample always horizontal• Theta / Theta geometry

(Bragg-Brentano)

Sample spinner • 1 rpm to 80 rpm

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SMART BREEZE floor-mount instrument

exceptionally easy to use

more automated molecular 3D structure analysis

Low maintenance air-cooled BREEZE 4K CCD detector – the second best CCD detector in the world!

Rock-solid goniometer

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KAPPA APEX II and SMART APEX II

SMART APEX IIKAPPA APEX II

consolidation finished

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high intensity (upto 3.5 X) flexible beam size (set by collimator selection)

• matches typical samples sizes advantageous price/performance ratio best choice for general purpose/service work

TRIUMPH

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APEX II QUAZAR

03.11.2010Bruker Confidential36

37 37/18Juergen Graf – ACA 2009

Incoatec Microfocus Source – IµSTM

Long lifetime and high reliability

Advanced anode and cathode technology

>6 year tube life (3 years warranty) Small spot size for high brilliance < 50 µm Low power: 30 W Air-cooled Cu, Cr, Mo and Ag radiation QuazarTM Optics

larger collection angle and higher reflectivity Reliable and patented mirror housing (optional motors)

Tube change as easy as for a conventional sealed tube Variable divergence aperture

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APEX II DUO with IS

03.11.2010Bruker Confidential38

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Juergen Graf – ACA 2010

IµS for Ag-K Radiation

• Ag-IµS:

- Power Settings: 50 kV, 600 µA

- FWHM = 0.09 mm&; FW0.1M = 0.23 mm

- Divergence = 5 mrad

- F.D. = 2 x 109 cts/(s mm2) @ 30 W

Mo-IµS: 1 x 109 cts /(s mm2) @ 30 W

- Benefits of Ag-Radiation:

- Less absorption, less extinction

- “Compressed” reciprocal space2D and 3D beam profiles of theattenuated beam from the Ag-IµS&

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APEX II ULTRA –ultimate performanceElectron Density Studies – high angle Mo data

APEX II ULTRA shown with molybdenum target Turbo Xray Source (higher intensity)

Applications:• nano-sized crystals• high pressure studies• higher quality data on strong

diffractors – charge density studies

Prof. Dietmar Stalke, multipole refinement(Uni Goettingen, Germany)‘exquisite data from APEX II ULTRA’

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Source/optics comparison matrix

gain* Compatible systems Miracol / Monocap 1.3-2x (Mo) All Triumph monochromator >3x (Mo) KAPPA APEX II / recent SMART

(Mo only) IS microfocus source >4x (Mo) D8-based

Turbo X-ray Source >60x (Mo) D8-based

* Intensity compared to sealed tube, standard graphite monochromator

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Upgrades for chemical crystallography

BRUKER has always designed its systems with upgrade capability in mind

Protect the value of your system investment by exploiting the latest technology in:

sources, optics detectors automation software

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CE

CE certified, including 2010 Machine Directive • Absolute Safety is our Top Priority

o no (legal) risk for end usero end user has personal liabilityo Bruker is committed to protect its users

Under the provision and use of work equipment regulations, users take final responsibility for the safety of any machinery that they operate

National authorities may forbid use of non-compliant machinery until the product is brought into conformity; failure to do so may result in product withdrawal from the market

In case of accidents legal proceedings of all kinds may be initiated by state prosecutors, victim's lawyers or insurance companies

Penalties are subject of national law, and range from fines up to imprisonment

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CE (cont.)

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Summary

BRUKER now offers a broad range of systems to fit your application requirements

Most new technologies are also available as upgrades to extend and expand the capabilities of your existing system

Source• TRIUMPH monochromator – also for recent SMART• IµS – new for Ag radiation• TXS• dual wavelength (DUO)

Detector• APEX II

Software• AUTOSTRUCTURE• X-PRESSO