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F. Kreupl et al. 1

Carbon-based Resistive Memory

Franz Kreupl, Rainer Bruchhaus+, Petra Majewski , Jan B. Philipp,

Ralf Symanczyk, Thomas Happ*, Christian Arndt*, Mirko Vogt*,

Roy Zimmermann*, Axel Buerke*, Andrew P. Graham*, Michael Kund

Qimonda AG,

+Qimonda North America, *Qimonda Dresden GmbH & Co. OHG franz.kreupl@qimonda.com

F. Kreupl et al. 2

Outline of Presentation • Introduction and Motivation • Basic Switching in Carbon • Carbon Allotropes • Carbon Nanotubes • Graphene-like Conductive Carbon • Insulating Carbon • Conclusions

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Introduction and Motivation • Resistive Memories like

– Phase Change (GexSbyTez,.... ) – Nano-Ionic, (CBRAM-like, e.g. Ag2S, Ag-GeSe, Cu2S....) – Transition-Metal-Oxide ( NiO, TiO2,.....) are very promising memory technologies

• but are binary, ternary or even more complex materials: – what about scalability – how do they respond to volume/surface ratio – what about variability, if scaled

• Are there other, simpler materials available?

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Introduction and Motivation • The available current in a memory cell

is given by the select device (FET, diode) An upper limit may be estimated by:

j= e*Nd*vsat= e*1019*107 = 16 MA/cm2

• Typical currents in phase change

memories are ~10 MA/cm2 Are there options or materials

which enable switching at low currents (some µA)?

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Introduction: Carbon Memory sp3 sp2

I2 > I1

high conductance low conductance

I1

sp2 to sp3 conversion of disordered graphitic carbon (phase change of carbon) inherently scalable to atomic scale (no phases of different materials)

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Basic Switching in Carbon I1

TEM image by courtesy of J. Huang et al., Nano Letters 2006 Vol. 6, No. 8 pp. 1699-1705

• Current changes structure and resistance • Resistance changes by a factor of ~ 100 • High Low well known from e-fuses • New: switch to disorder by short pulse

I + -

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Short Laser Pulses on Graphite

Bonelli et al., Laser-irradiation-induced structural changes on graphite, Phys. Rev. B 59, 13513 (1999)

• Short laser pulse induces disorder (D-band) • D-band overlaps with sp3-peak at 1332 cm-1 • Diamond cubic phase observed by

e-beam diffraction Disordered, quenched state by short energy pulse

0 1000 2000 30000

5001000150020002500

Inte

nsity

(a.u

)

Raman shift cm-1 0 1000 2000 30000

500

1000

1500

Inte

nsity

(a.u

.)

Raman shift cm-1

pulse 20 ns

1580 cm-1 G=1580 D=1355

before after overtones

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3 ps Laser Pulse on Graphite

source: Anming Hu, PhD Thesis, U Waterloo, 2008

sp3 sp

632 nm 325 nm

sp3

• The shorter the laser pulse the more disorder Disordered, quenched state by short energy pulse

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Short Energy Pulses

• Fluence of the laser pulse at graphite ablation threshold =~ 285 mJ/cm2

Energy density (energy/volume) = 95 KJ/cm3 • Energy density for a wire subjected to a current:

E/V = j2ρt = 1GA/cm2 ·1mΩcm · 20 ns = 2 MJ/cm3

Disordered, quenched state by short current pulse

K. Sokolowski-Tinten et al., CLEO 2000

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Short Current Pulse

temperature distribution in carbon filament after 1 ns current pulse with 1.7 GA/cm2 : Tpeak ~ 3900 K; rapid cool down (0.05 ns)

carbon cell

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Carbon Nanotubes

• Nanotubes have a length dependent switching current • 25 nm long tubes need ~ 100µA @ 1.5 V

and have no phonon-limited transport • tubes > 200 nm need ~ 30 µA @ 4V (phonon-limited) Select device needs to handle ~ 30 µA and 4-8 Volt

0 1 2 3 40

20µ

40µ

60µ

80µ

100µ

200 nm 25 nm

voltage [V]

curre

nt [A

]

local modification of sp2 structure by

current pulse

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Carbon Nanotubes In vacuum ~ 12 µA current possible

Jin et al., nature 18 nanotechnology | VOL 3 | JANUARY 2008 |

on-state off-state 12 uA

switch on 6 uA, 1.6V

on-state

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Allotropes of Carbon (investigated)

• Carbon Nanotubes - sp2-type - difficult to integrate - high conductivity

• Graphene or Conductive Carbon - sp2-type - easy to integrate

- high conductivity

• Insulating carbon - sp3-type, diamond-like

- easy to integrate - high resistivity

graphene layers

SiO2

nanotube

source: J. Robertson

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Conductive Carbon (CC)

• Conductive Carbon is – graphene-like – easily deposited (CVD) – can be used as interconnect

material (highly conductive) – easy to pattern

SiO2

conductive carbon in via

R. Seidel. et al., Chemical Vapor Deposition Growth of Single-Walled Carbon Nanotubes at 600 °C and a Simple Growth Model J. Phys. Chem. B, (2004) G. Aichmayr et al., Carbon-high-k Trench Capacitor for the 40nm DRAM Generation, VLSI Technology, (2007)

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Conductive Carbon: Memory Cell

• Carbon memory cells with varying diameter

30 nm

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Conductive Carbon: Critical Current

• Critical current density of 350 MA/cm2 observed • Appropriate cell diameter ~ 6 nm for I < 100 µA Use spacer, cladding or self-assembled nano-pores

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Conductive Carbon (CC): Switching

• Shmoo-plot of 40 nm diameter CC memory cell smaller diameter, current compliance and optimized

pulses required

1 2 3 4 5 6 7 8 9 10 11 12102103104105106107108109

1010

Reset 1 Set 1 Reset 2

Resi

stan

ce (O

hm)

Pulse Amplitude (V) 1 2 3 4103104105106107108109

Resi

stan

ce (O

hm)

Cycle

Reset Set

5 ns reset 300 ns set pulse

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Insulating Carbon (IC): Memory Cell

• Insulating diamond-like carbon film • First switching occurs now from high to low state

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Insulating Carbon (IC): Critical Field

• Quasi-static switching curves determine critical field • Switching power is about 50µW with leakage currents. • Very low power levels: 5 µA @ 1.5 V (P= 7.5 µW)

350 nm wide

150 nm wide

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Ins. Carbon: Read Endurance & Speed

• Read endurance at 75 degree C: 2.3*1013 read cycles at 0.1 V.

• Switching speed is faster than 11 ns.

0 100 200 300 400 500 6000

2

4

switching event

11 ns

puls

e he

ight

(V)

t (ns)10M 100M 1G 10G 100G 1T 10T0

25p50p75p

10µon-state

off-state

re-adjustmentof the probes

curre

nt [A

] @ 0

.1 V

number of read cycles

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Insulating Carbon: Switching

• I(V) curves show similar behavior after pulses • Resistance level can be trimmed by individual

voltage pulses (multi-level capability)

0.02 0.04 0.06 0.08 0.10

10p

100p

1n

10n

100n

after 5 V 500 µs after 5 V 100 ns after 5 V 500 µs after 5 V 100 ns

curre

nt [A

]

Voltage [V]0 1 2 3 4 5 6 7 8

6k8k

10k12k14k16k18k20k22k

w=100 ns w=5 ns

Resi

stan

ce [Ω

]

Voltage [V]

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Insulating Carbon: Filament size

crater with ~10 nm diameter

10 V pulse evaporates metal filament ~ 10 nm @ 10 V use carbon as current spreader

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Conclusions • New carbon memory proposed based on

sp2 to sp3 conversion • Inherently fast: reset ~ ns, set ~ ns • Nanotubes need ~30 µA @ 8V • Graphene-like Conductive Carbon

needs pores < 6 nm • Insulating Carbon shows lowest switching

power: 5 µA @ 1.5 V (P= 7.5 µW) • Pulses and cell design needs to be optimized • Should also work with Fullerens, Graphene and

Diamonds

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Acknowledgement Qimonda Fab Dresden Roland Thewes, Werner Pamler, Walter Weber, Uli Klostermann, Klaus-Dieter Ufert, Henning Riechert Stanford University Questions?

Thank you!